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JPH09150051A - Gas dispersing device for fluidized bed - Google Patents

Gas dispersing device for fluidized bed

Info

Publication number
JPH09150051A
JPH09150051A JP30959395A JP30959395A JPH09150051A JP H09150051 A JPH09150051 A JP H09150051A JP 30959395 A JP30959395 A JP 30959395A JP 30959395 A JP30959395 A JP 30959395A JP H09150051 A JPH09150051 A JP H09150051A
Authority
JP
Japan
Prior art keywords
fluidized bed
gas
support plate
holes
supply means
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP30959395A
Other languages
Japanese (ja)
Other versions
JP3065921B2 (en
Inventor
Takeshi Ohara
武 大原
Hiromitsu Shibuya
博光 渋谷
Yasuo Suzuki
康夫 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JGC Corp
Original Assignee
JGC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by JGC Corp filed Critical JGC Corp
Priority to JP7309593A priority Critical patent/JP3065921B2/en
Publication of JPH09150051A publication Critical patent/JPH09150051A/en
Application granted granted Critical
Publication of JP3065921B2 publication Critical patent/JP3065921B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Devices And Processes Conducted In The Presence Of Fluids And Solid Particles (AREA)
  • Drying Of Solid Materials (AREA)

Abstract

PROBLEM TO BE SOLVED: To certainly prevent the falling of particles by simple constitution. SOLUTION: A perforated plate having holes 4a supplying gas for a fluidized bed formed thereto is provided to the bottom part of a fluidizing chamber forming solid-gas flow. A support plate 5 is provided under the perforated plate and a plurality of cylindrical gas supply means 6 pierce the support plate so that they are not overlapped with the holes of the perforated plate and the upper end parts of them protrude upwardly from the support plate. The upper openings 6a of the clindrical gas supply means are arranged at the position above the piling slope 8 of particles 7 falling from the holes of the perforated plate to be piled up on the support plate at a predetermined angle of repose.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、流動層型反応器あ
るいは流動層型乾燥器等における固体粒子の流動層用ガ
ス分散器に関する。
TECHNICAL FIELD The present invention relates to a gas dispersion device for a fluidized bed of solid particles in a fluidized bed reactor, a fluidized bed dryer or the like.

【0002】[0002]

【従来の技術】流動層反応器用ガス分散器には、キャッ
プタイプ、マニホールドタイプ、オリフィスタイプ、焼
結板、あるいは多孔板を利用したもの等がある。流動層
反応器(気泡流動層)での反応率、選択率は気泡の大き
さに影響される。特に、反応速度の遅い系では、上記反
応率等を高めるために小気泡径が望まれる。一般に小気
泡径を生成するには、ガス分散器にガス噴出孔の多い焼
結板または多孔板などが用いられる。しかしながら、焼
結板は粒子により目詰まりを起こし易く、大量処理には
不向きであった。このため、工業装置用の小気泡径の生
成には一般に多孔板を利用したものが用いられている。
2. Description of the Related Art Gas distributors for fluidized bed reactors include cap type, manifold type, orifice type, sintered plates, and porous plates. The reaction rate and selectivity in a fluidized bed reactor (bubble fluidized bed) are affected by the size of bubbles. In particular, in a system with a slow reaction rate, a small bubble diameter is desired in order to increase the reaction rate and the like. Generally, in order to generate a small bubble diameter, a sintered plate or a perforated plate having many gas ejection holes is used for the gas disperser. However, the sintered plate is apt to be clogged with particles and is not suitable for large-scale processing. For this reason, generally, a porous plate is used to generate small bubble diameters for industrial equipment.

【0003】ところで、多孔板を利用した流動層用ガス
分散器には、流動層を形成する粒子が多孔板の孔から下
方へ落下する問題がある。このような問題に対処するも
のとして、例えば、特開昭62−201634号公報
に、多孔板の下方に下部多孔板を、孔どうしが重ならな
いようにずらして配置する技術が開示されている。ま
た、特開平3−193134号公報に、多孔板の孔の下
方に円柱状の粒子受け部材を配置し、前記孔から下方へ
落下する粒子を粒子受け部材で受けて、孔からのそれ以
上の粒子の落下を防ぐようにした技術も開示されてい
る。
A fluidized bed gas disperser using a perforated plate has a problem that particles forming the fluidized bed fall downward from the holes of the perforated plate. As a method for dealing with such a problem, for example, Japanese Patent Application Laid-Open No. 62-201634 discloses a technique in which a lower porous plate is arranged below a porous plate in a shifted manner so that holes do not overlap with each other. Further, in Japanese Patent Application Laid-Open No. 3-193134, a cylindrical particle receiving member is arranged below a hole of a perforated plate, particles falling downward from the hole are received by the particle receiving member, and a further particle from the hole is received. A technique for preventing particles from falling is also disclosed.

【0004】[0004]

【発明が解決しようとする課題】上記した従来の流動層
用ガス分散器にあっては、いずれの技術にも、孔からの
粒子の落下を完全に防止することができないという問題
があった。すなわち、前者の技術にあっては、多孔板の
下方にさらに下部多孔板を設ける構造のものであるが、
たとえ、多孔板の孔から落下堆積する粒子の安息角を考
慮して下部多孔板を配置したところで、多孔板上の粒子
の径あるいは形状は一様ではなく、小径の粒子の場合、
下部多孔板の孔からさらに下方へ落下する問題がある。
このような問題は、後者の多孔板の孔の下方に粒子受け
部材を配置する技術でも振動等が発生した場合、同様に
起こり得る。加えて、上記した従来の技術には、構造的
に複雑になるという問題もあった。
In any of the above-described conventional fluidized bed gas dispersers, there is a problem in that it is not possible to completely prevent the particles from falling through the holes. That is, in the former technique, the lower porous plate is further provided below the porous plate,
For example, when the lower porous plate is arranged in consideration of the angle of repose of the particles falling and accumulated from the holes of the porous plate, the diameter or shape of the particles on the porous plate is not uniform, and in the case of small-diameter particles,
There is a problem of dropping further downward from the holes of the lower porous plate.
Such a problem may similarly occur when vibration or the like occurs even in the latter technique of disposing the particle receiving member below the holes of the porous plate. In addition, the above-mentioned conventional technique has a problem that it is structurally complicated.

【0005】本発明は、上記事情に鑑みてなされたもの
であり、簡単な構成で、粒子の落下を確実に防止できる
流動層用ガス分散器を提供することを目的とする。
The present invention has been made in view of the above circumstances, and an object thereof is to provide a gas disperser for a fluidized bed, which has a simple structure and can reliably prevent particles from falling.

【0006】[0006]

【課題を解決するための手段】上記の目的を達成するた
めに、請求項1記載の発明では、固気系流を形成する流
動室の底部に流動層用ガスを供給する孔が形成された多
孔板を有する流動層用ガス分散器において、多孔板の下
方に支持板が設けられ、該支持板には複数の筒状のガス
供給手段が支持板を貫通するとともに前記多孔板の孔と
重ならないように、かつ、該筒状のガス供給手段の各上
端部が該支持板から上方へ突出するように設けられてい
ることを特徴とする。請求項2記載の発明では、前記筒
状のガス供給手段の上部開口は、前記多孔板の孔から落
下して支持板上に所定の安息角をもって堆積する粒子の
堆積斜面より上方位置に配されることを特徴とする。
In order to achieve the above object, in the invention described in claim 1, a hole for supplying a fluidized-bed gas is formed at the bottom of a fluid chamber which forms a solid-gas flow. In a fluidized bed gas disperser having a perforated plate, a support plate is provided below the perforated plate, and a plurality of cylindrical gas supply means penetrates through the support plate and overlaps with holes of the perforated plate. It is characterized in that each upper end portion of the cylindrical gas supply means is provided so as to protrude upward from the support plate so as not to become the above. In the invention according to claim 2, the upper opening of the cylindrical gas supply means is arranged at a position higher than a deposition slope of particles that fall from the holes of the perforated plate and are deposited on the support plate at a predetermined angle of repose. It is characterized by

【0007】本発明によれば、運転時においては、ガス
の流れによって粒子は孔から多孔板の上方へ吹き上げら
れ、孔から粒子が落下することはない。運転停止時に
は、粒子が多孔板の孔から下方へ落下するが、この落下
する粒子は支持板上に所定の安息角をもって堆積する。
このとき、複数の筒状のガス供給手段は支持板を貫通し
それらの上端部が該支持板から上方へ突出しているの
で、それら筒状等のガス供給手段の壁部自体が堰として
機能することとなり、これらのガス供給手段から粒子が
下方へ落下することはない。
According to the present invention, during operation, the particles are blown up from the holes to above the perforated plate by the flow of gas, and the particles do not fall from the holes. When the operation is stopped, particles fall downward from the holes of the perforated plate, and the falling particles are deposited on the support plate at a predetermined angle of repose.
At this time, since the plurality of tubular gas supply means penetrates through the support plate and their upper ends project upward from the support plate, the wall portions of the tubular gas supply means themselves function as weirs. This means that particles will not drop downward from these gas supply means.

【0008】[0008]

【発明の実施の形態】以下、図1〜図4に基づいて本発
明の実施の形態を説明する。図1において符号1は下部
にガス流入孔1a、上部にガス流出孔1bを有する流動
層反応器。2は流動層反応器1の下部の流動室3の底部
に固気系流を形成するように設けられた本発明にかかる
流動層用ガス分散器である。
BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below with reference to FIGS. In FIG. 1, reference numeral 1 is a fluidized bed reactor having a gas inflow hole 1a in the lower part and a gas outflow hole 1b in the upper part. Reference numeral 2 denotes a fluidized bed gas disperser according to the present invention, which is provided at the bottom of the fluidized chamber 3 below the fluidized bed reactor 1 so as to form a solid-gas flow.

【0009】流動層用ガス分散器2は、反応器1内の所
定高さ位置に略水平面に沿って配置された多孔板4と、
その下方に所定の間隔をあけて略平行に配置された支持
板5とを備える。多孔板4は、図2に示すように流動室
3の下方から上方へ流動層用ガスを供給するための多数
の孔4a,…が規則正しく形成されている。一方、支持
板5には、複数の筒状のガス供給手段6,…が支持板5
を貫通するとともに、多孔板4の孔4aと重ならないよ
うに、かつ、筒状のガス供給手段6の各上端部が支持板
5から上方へ突出するように設けられている。多孔板4
の孔4aとその下方の支持板5に形成されるガス供給手
段6との配置例は図2(a)で示すが、その他に、図2
(b),(c)に示すものも考えられる。これら図2
(b),(c)に示すものは、孔4aとガス供給手段と
の配置密度を同じに設定している。また、筒状のガス供
給手段6の上部開口6aは、図4に示すように多孔板4
の孔4a,…から落下して支持板5上に所定の安息角θ
をもって堆積する粒子7,…の堆積斜面8より上方位置
に配される。
The fluidized bed gas disperser 2 comprises a perforated plate 4 arranged at a predetermined height in the reactor 1 along a substantially horizontal plane,
A support plate 5 is disposed below the support plate 5 and is arranged substantially in parallel at a predetermined interval. As shown in FIG. 2, the perforated plate 4 is regularly formed with a large number of holes 4a, ... For supplying the fluidized-bed gas from below to above the fluidized chamber 3. On the other hand, the support plate 5 is provided with a plurality of cylindrical gas supply means 6 ,.
Is provided so as not to overlap the holes 4a of the perforated plate 4 and the upper ends of the tubular gas supply means 6 project upward from the support plate 5. Perforated plate 4
2 (a) shows an example of the arrangement of the holes 4a of FIG. 2 and the gas supply means 6 formed on the support plate 5 therebelow.
Those shown in (b) and (c) are also conceivable. These Figure 2
In the structure shown in (b) and (c), the arrangement density of the holes 4a and the gas supply means is set to be the same. Further, the upper opening 6a of the cylindrical gas supply means 6 has a porous plate 4 as shown in FIG.
Falling from the holes 4a, ...
Are arranged above the deposition slope 8 of the particles 7 ,.

【0010】前記多孔板4に形成される孔4aは、多孔
板4上に配される流動層用粒子の径等の諸条件によって
も種々異なるが、均一径であって直径が1〜5mmに設
定されたものが好ましく、その開口面積比は1〜10%
に設定されたものが好ましい。また、支持板5に設けら
れる前記筒状のガス供給手段6としては、具体的には均
一径であって前記孔4aの径よりも大きく、3〜10m
m程度に設定された断面円形のパイプ材を用いるのが好
ましい。また、多孔板4と支持板5に設けられる筒状の
ガス供給手段6の上端部との距離nは、ガス供給手段6
を構成するパイプ材の直径の1/4〜1程度に設定され
るのが好ましい。また、多孔板4の孔4a並びに支持板
5のガス供給手段6を運転条件から見ると、孔4aを通
過するガスの流速は5〜80m/secに設定するのが
好ましく、10〜60m/secに設定するのがより好
ましい。また、筒状のガス供給手段6を通過するガスの
流速は、2.5〜80m/secに設定するのが好まし
く、5〜60m/secに設定するのがより好ましい。
また、孔4aを通過するガスの流速と筒状のガス供給手
段6を通過するガスの流速との比は1:0.5〜1が好
ましい。また、流動層反応器1内を通過するガスの流速
は5〜300cm/secに設定するのが好ましい。
The holes 4a formed in the perforated plate 4 have a uniform diameter and a diameter of 1 to 5 mm, although they vary depending on various conditions such as the diameter of the particles for fluidized bed arranged on the perforated plate 4. Those that are set are preferable, and the opening area ratio is 1 to 10%
Those set to are preferable. The cylindrical gas supply means 6 provided on the support plate 5 has a uniform diameter, which is larger than the diameter of the hole 4a, and is 3 to 10 m.
It is preferable to use a pipe material having a circular cross section set to about m. Further, the distance n between the porous plate 4 and the upper end of the cylindrical gas supply means 6 provided on the support plate 5 is determined by the gas supply means 6
It is preferable to set the diameter to about 1/4 to 1 of the diameter of the pipe material constituting the. When the holes 4a of the perforated plate 4 and the gas supply means 6 of the support plate 5 are viewed from the operating condition, the flow velocity of the gas passing through the holes 4a is preferably set to 5 to 80 m / sec, and 10 to 60 m / sec. It is more preferable to set to. The flow velocity of the gas passing through the tubular gas supply means 6 is preferably set to 2.5 to 80 m / sec, more preferably 5 to 60 m / sec.
Further, the ratio of the flow velocity of the gas passing through the hole 4a and the flow velocity of the gas passing through the tubular gas supply means 6 is preferably 1: 0.5 to 1. The flow velocity of the gas passing through the fluidized bed reactor 1 is preferably set to 5 to 300 cm / sec.

【0011】より具体的に検討すると、例えば、多孔板
4上に配置する流動層用粒子がFCC触媒の場合、多孔
板4の孔4aには直径3mmの均一径に設定されたもの
が用いられ、支持板5の筒状のガス供給手段6には直径
が6mmで長さが20mmのパイプ材が用いられ、多孔
板4と支持板5に設けられるパイプ材の上端部との距離
nは5mmに設定され、多孔板4の孔4aどうしは図2
(a)に示すように正三角形の頂点に位置するように互
いの距離hを略20mm程度離されて配される。また、
このときの流動層反応器1内を流れるガスの速度は20
〜40cm/secであり、FCCの安息角θは32゜
である。なお、多孔板4上に配される粒子7がアルミナ
の場合の安息角θは39゜である。また、カーボンブラ
ックの場合の安息角θは35゜、ガラスビーズの場合の
安息角θは15゜、シリカゲルの場合の安息角θは50
゜であり、また、それら粒子の径は10〜1000μm
程度である。
More specifically, for example, when the fluidized bed particles placed on the porous plate 4 are FCC catalysts, the holes 4a of the porous plate 4 having a uniform diameter of 3 mm are used. A pipe material having a diameter of 6 mm and a length of 20 mm is used for the tubular gas supply means 6 of the support plate 5, and the distance n between the porous plate 4 and the upper end of the pipe material provided on the support plate 5 is 5 mm. 2 and the holes 4a of the perforated plate 4 are shown in FIG.
As shown in (a), they are arranged at a distance of about 20 mm from each other so that they are located at the vertices of an equilateral triangle. Also,
The velocity of the gas flowing in the fluidized bed reactor 1 at this time is 20
The angle of repose θ of the FCC is 32 °. The angle of repose θ is 39 ° when the particles 7 placed on the porous plate 4 are alumina. The repose angle θ of carbon black is 35 °, the repose angle θ of glass beads is 15 °, and the repose angle θ of silica gel is 50.
And the diameter of the particles is 10 to 1000 μm.
It is about.

【0012】しかして、上記構成の流動層ガス分散器に
よれば、運転時では、ガスが流動層反応器1の底部のガ
ス流入孔1aから流動層反応器1内に侵入し、図3に示
すようにガス供給手段6を上方に吹き抜けた後、側方へ
流れを変えてさらに多孔板4の孔4,…を通り、所定の
経路を経て流動層反応器1の上部のガス流出孔1bから
外部へ流出する。このとき、ガスが常に多孔板4の孔4
aを上方へ流れるので、このガスの流れによって押し返
されるため、多孔板4上の粒子7は孔4aから下方へ落
下することはない。
According to the fluidized bed gas disperser having the above construction, however, gas is introduced into the fluidized bed reactor 1 through the gas inlet hole 1a at the bottom of the fluidized bed reactor 1 during operation, as shown in FIG. As shown in the drawing, after the gas supply means 6 is blown upward, the flow is changed to the side and further passes through the holes 4, ... To the outside. At this time, the gas is always in the holes 4 of the perforated plate 4.
Since it flows upward in a, it is pushed back by this gas flow, so that the particles 7 on the porous plate 4 do not fall downward from the holes 4a.

【0013】一方、運転停止時には、図4に示すように
多孔板4上の粒子7が孔4a,…を通って下方へ落下す
るが、この落下する粒子は支持板5上に所定の安息角θ
をもって堆積する。このとき、支持板5に設けられた複
数の筒状のガス供給手段6は、各上端部が支持板5から
上方へ突出していること、多孔板4の孔4a,…と重な
らない位置に設けられていること、並びに、その上端部
が支持板5上に堆積する粒子7の堆積斜面8よりも上方
に位置していることから、それら筒状等のガス供給手段
6の壁部自体が堰として機能することとなり、この結
果、支持板5上に堆積する粒子7が、これらガス供給手
段6から下方へ落下することはない。
On the other hand, when the operation is stopped, the particles 7 on the perforated plate 4 fall downward through the holes 4a, ... As shown in FIG. 4, and the falling particles fall on the support plate 5 at a predetermined angle of repose. θ
To deposit. At this time, the plurality of cylindrical gas supply means 6 provided on the support plate 5 have upper end portions projecting upward from the support plate 5, and are provided at positions that do not overlap the holes 4a of the perforated plate 4. And the upper end portion thereof is located above the deposition slope 8 of the particles 7 deposited on the support plate 5, the wall portion itself of the gas supply means 6 having such a cylindrical shape is a weir. As a result, the particles 7 deposited on the support plate 5 do not fall downward from the gas supply means 6.

【0014】なお、本発明の流動層用ガス分散器は、前
記した実施の形態に限られることなく、流動室3の形
状、あるいは多孔板4に形成される孔4aや支持板5に
設けられるガス供給手段6の形状等は種々変更可能であ
る。例えば、上記実施の形態では、流動層反応器1に組
み付けられる流動層用ガス分散器2を例に挙げて説明し
たが、これに限られることなく、流動層型乾燥器にも本
発明の流動層用ガス分散器は適用可能である。また、上
記実施の形態では、支持板5に設けるガス供給手段6と
して断面円形のパイプを用いているが、これに限られる
ことなく、筒状であれば、断面が正方形、三角形あるい
は他の多角形の筒状体をガス供給手段6として用いても
よい。
The fluidized bed gas disperser of the present invention is not limited to the above-described embodiment, and is provided in the shape of the fluid chamber 3, or in the holes 4a formed in the perforated plate 4 and the support plate 5. The shape and the like of the gas supply means 6 can be variously changed. For example, in the above-described embodiment, the fluidized bed gas disperser 2 assembled to the fluidized bed reactor 1 has been described as an example, but the present invention is not limited to this, and the fluidized bed dryer also includes the fluidized bed of the present invention. A bed gas disperser is applicable. Further, in the above embodiment, a pipe having a circular cross section is used as the gas supply means 6 provided on the support plate 5, but the present invention is not limited to this, and if the pipe is tubular, the cross section may be a square, a triangle, or any other shape. A rectangular tubular body may be used as the gas supply means 6.

【0015】[0015]

【発明の効果】以上説明したように本発明は以下の優れ
た効果を奏する。請求項1記載の発明によれば、多孔板
の下方に設ける支持板に、複数の筒状のガス供給手段が
支持板を貫通するとともに多孔板の孔と重ならないよう
に、かつ、筒状のガス供給手段の各上端部が該支持板か
ら上方へ突出するように設けているから、筒状のガス供
給手段の壁部自体が堰として機能し、簡単な構成である
にも拘わらず、運転停止時に粒子がガス供給手段から下
方へ落下することはない。請求項2の発明によれば、筒
状のガス供給手段の上部開口は、多孔板の孔から落下し
て支持板上に所定の安息角をもって堆積する粒子の堆積
斜面より上方位置に配されるから、より確実に、粒子が
ガス供給手段から下方へ落下するのを防止できる。
As described above, the present invention has the following excellent effects. According to the first aspect of the invention, the support plate provided below the perforated plate is provided with a plurality of tubular gas supply means so as to penetrate the support plate and not overlap the holes of the perforated plate, and the tubular plate has a tubular shape. Since each upper end of the gas supply means is provided so as to project upward from the support plate, the wall portion of the tubular gas supply means itself functions as a weir, and the operation is performed despite the simple structure. The particles do not fall downward from the gas supply means when stopped. According to the invention of claim 2, the upper opening of the cylindrical gas supply means is arranged at a position higher than the deposition slope of the particles that fall from the holes of the perforated plate and are deposited on the support plate at a predetermined angle of repose. Therefore, it is possible to more reliably prevent the particles from dropping downward from the gas supply means.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明にかかる流動層ガス分散器を備える流動
層型反応器の断面図である。
FIG. 1 is a sectional view of a fluidized bed reactor equipped with a fluidized bed gas disperser according to the present invention.

【図2】(a)は図1のA方向から見た矢視図、(b)
は多孔板の孔と支持板のガス供給手段の他の配置例を示
す図、(c)は多孔板の孔と支持板のガス供給手段のさ
らに他の配置例を示す図である。
FIG. 2A is a view seen from the direction A in FIG. 1, and FIG.
FIG. 6 is a diagram showing another arrangement example of the holes of the perforated plate and the gas supply means of the support plate, and (c) is a diagram showing still another arrangement example of the holes of the perforated plate and the gas supply means of the support plate.

【図3】図1の流動層ガス分散器の運転時の挙動を示す
断面図である。
FIG. 3 is a cross-sectional view showing the behavior of the fluidized bed gas disperser of FIG. 1 during operation.

【図4】図1の流動層ガス分散器の運転停止時の挙動を
示す断面図である。
FIG. 4 is a cross-sectional view showing the behavior of the fluidized bed gas disperser of FIG. 1 when the operation is stopped.

【符号の説明】[Explanation of symbols]

1 流動層反応器 2 流動層用ガス分散器 3 流動室 4 多孔板 4a 孔 5 支持板 6 ガス供給手段 7 粒子 8 堆積斜面 1 Fluidized Bed Reactor 2 Gas Disperser for Fluidized Bed 3 Fluidized Chamber 4 Perforated Plate 4a Hole 5 Support Plate 6 Gas Supply Means 7 Particles 8 Slope

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 固気系流を形成する流動室(3)の底部
(3a)に流動層用ガスを供給する孔(4a)が形成さ
れた多孔板(4)を有する流動層用ガス分散器(2)に
おいて、 多孔板の下方に支持板(5)が設けられ、該支持板には
複数の筒状のガス供給手段(6)が支持板を貫通すると
ともに前記多孔板の孔と重ならないように、かつ、該筒
状のガス供給手段の各上端部が該支持板から上方へ突出
するように設けられていることを特徴とする流動層用ガ
ス分散器。
1. A gas dispersion for a fluidized bed having a perforated plate (4) having holes (4a) for supplying a gas for a fluidized bed formed in a bottom portion (3a) of a fluidized chamber (3) forming a solid-gas flow. In the vessel (2), a support plate (5) is provided below the perforated plate, and a plurality of cylindrical gas supply means (6) penetrates the support plate and overlaps with the holes of the perforated plate. The gas disperser for a fluidized bed, characterized in that each upper end portion of the cylindrical gas supply means is provided so as to not protrude from the support plate upward.
【請求項2】 請求項1記載の流動層ガス分散器におい
て、 前記筒状のガス供給手段の上部開口(6a)は、前記多
孔板の孔から落下して支持板上に所定の安息角をもって
堆積する粒子(7)の堆積斜面(8)より上方位置に配
されることを特徴とする流動層用ガス分散器。
2. The fluidized bed gas disperser according to claim 1, wherein the upper opening (6a) of the cylindrical gas supply means falls from the hole of the perforated plate and has a predetermined angle of repose on the support plate. A gas disperser for a fluidized bed, which is arranged at a position higher than a deposition slope (8) of particles (7) to be deposited.
JP7309593A 1995-11-28 1995-11-28 Gas disperser for fluidized bed Expired - Fee Related JP3065921B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7309593A JP3065921B2 (en) 1995-11-28 1995-11-28 Gas disperser for fluidized bed

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7309593A JP3065921B2 (en) 1995-11-28 1995-11-28 Gas disperser for fluidized bed

Publications (2)

Publication Number Publication Date
JPH09150051A true JPH09150051A (en) 1997-06-10
JP3065921B2 JP3065921B2 (en) 2000-07-17

Family

ID=17994906

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7309593A Expired - Fee Related JP3065921B2 (en) 1995-11-28 1995-11-28 Gas disperser for fluidized bed

Country Status (1)

Country Link
JP (1) JP3065921B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100778536B1 (en) * 2007-03-22 2007-11-28 한국기계연구원 Flow homogenizer of catalytic reactor
JP2016010758A (en) * 2014-06-27 2016-01-21 株式会社ティラド Reactor
CN109985571A (en) * 2017-12-29 2019-07-09 中国石油化工股份有限公司 It is a kind of with subtracting the hydrogenator for rushing component

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100778536B1 (en) * 2007-03-22 2007-11-28 한국기계연구원 Flow homogenizer of catalytic reactor
JP2016010758A (en) * 2014-06-27 2016-01-21 株式会社ティラド Reactor
CN109985571A (en) * 2017-12-29 2019-07-09 中国石油化工股份有限公司 It is a kind of with subtracting the hydrogenator for rushing component
CN109985571B (en) * 2017-12-29 2021-08-31 中国石油化工股份有限公司 Hydrogenation reactor with subtract towards subassembly

Also Published As

Publication number Publication date
JP3065921B2 (en) 2000-07-17

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