JPH09138302A - Wollaston prism and its production - Google Patents
Wollaston prism and its productionInfo
- Publication number
- JPH09138302A JPH09138302A JP29700695A JP29700695A JPH09138302A JP H09138302 A JPH09138302 A JP H09138302A JP 29700695 A JP29700695 A JP 29700695A JP 29700695 A JP29700695 A JP 29700695A JP H09138302 A JPH09138302 A JP H09138302A
- Authority
- JP
- Japan
- Prior art keywords
- frame
- prism
- adhesive
- plating
- contact liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 12
- 239000000853 adhesive Substances 0.000 claims abstract description 39
- 230000001070 adhesive effect Effects 0.000 claims abstract description 39
- 239000007788 liquid Substances 0.000 claims abstract description 28
- 238000007747 plating Methods 0.000 claims abstract description 24
- 230000003287 optical effect Effects 0.000 claims abstract description 21
- 239000010409 thin film Substances 0.000 claims abstract description 20
- 230000002093 peripheral effect Effects 0.000 claims abstract description 8
- 229910052751 metal Inorganic materials 0.000 claims description 18
- 239000002184 metal Substances 0.000 claims description 18
- 238000000034 method Methods 0.000 claims description 5
- 230000008020 evaporation Effects 0.000 abstract 2
- 238000001704 evaporation Methods 0.000 abstract 2
- 239000010408 film Substances 0.000 description 14
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 9
- 229910052802 copper Inorganic materials 0.000 description 9
- 239000010949 copper Substances 0.000 description 9
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 8
- 238000007772 electroless plating Methods 0.000 description 7
- 230000002265 prevention Effects 0.000 description 7
- 238000009713 electroplating Methods 0.000 description 6
- 239000010410 layer Substances 0.000 description 6
- 239000010453 quartz Substances 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 239000012790 adhesive layer Substances 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 5
- 239000013078 crystal Substances 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- 229910013641 LiNbO 3 Inorganic materials 0.000 description 4
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 4
- 229910052759 nickel Inorganic materials 0.000 description 4
- 229910052717 sulfur Inorganic materials 0.000 description 4
- 239000011593 sulfur Substances 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 230000001747 exhibiting effect Effects 0.000 description 2
- 238000005304 joining Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 239000011574 phosphorus Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical class [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- -1 bromine compound Chemical class 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000010828 elution Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 239000013464 silicone adhesive Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
Landscapes
- Optical Elements Other Than Lenses (AREA)
- Polarising Elements (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は光学素子として用い
られるウォラストンプリズムおよびその製造方法に関す
る。TECHNICAL FIELD The present invention relates to a Wollaston prism used as an optical element and a manufacturing method thereof.
【０００２】[0002]
【従来の技術】ウォラストンプリズムは複屈折結晶体か
らなる複数のプリズムを接合することで構成されてい
る。このウォラストンプリズムは偏光膜や偏光板と共に
用いることで、偏光プリズムとして利用されている。2. Description of the Related Art A Wollaston prism is constructed by joining a plurality of prisms made of a birefringent crystal. This Wollaston prism is used as a polarizing prism when used together with a polarizing film or a polarizing plate.
【０００３】ウォラストンプリズムとしての複屈折結晶
体としては、従来、特開平５−１８１０１６号公報に示
されるように、人工水晶が用いられ、この人工水晶が接
着剤により接合されている。接着剤としては、組立性の
良さから低粘度の紫外線硬化形接着剤が用いられてい
る。これに対して、近年では、ＬｉＮｂＯ3 やＬｉＴａ
Ｏ3 が人工水晶よりも屈折率が高いところから、複屈折
結晶体として有望視されている。As a birefringent crystal body as a Wollaston prism, an artificial quartz is conventionally used as shown in JP-A-5-181016, and the artificial quartz is bonded by an adhesive. As the adhesive, a low-viscosity UV-curable adhesive is used because of its easy assembly. On the other hand, in recent years, LiNbO 3 and LiTa
Since O 3 has a higher refractive index than artificial quartz, it is regarded as a promising birefringent crystal.
【０００４】[0004]
【発明が解決しようとする課題】複屈折結晶体として人
工結晶を用いた場合、人工水晶の屈折率が１．４６で、
接合に用いる接着剤の屈折率が１．４〜１．６であり、
これらの屈折率がほぼ等しいため、界面の反射は殆どな
く、また接着剤の屈折率が人工水晶と多少異なっていて
も、人工水晶の接合面に反射防止コーティングを施すこ
とで、反射を減らすことが可能である。しかしながら、
ＬｉＮｂＯ3 やＬｉＴａＯ3 は屈折率が２．０以上のた
め、通常用いる接着剤と屈折率が大きく異なり、界面の
反射を無視することができない。また、このような場
合、反射防止コートを用いて垂直の入射光の反射を防い
でも、斜めに入射する光の反射は防ぐことができず、全
反射する。When an artificial crystal is used as the birefringent crystal, the refractive index of the artificial quartz is 1.46,
The refractive index of the adhesive used for joining is 1.4 to 1.6,
Since these refractive indexes are almost the same, there is almost no reflection at the interface, and even if the refractive index of the adhesive is slightly different from that of synthetic quartz, the reflection is reduced by applying an antireflection coating to the joint surface of the synthetic quartz. Is possible. However,
Since the refractive index of LiNbO 3 or LiTaO 3 is 2.0 or more, the refractive index is largely different from that of the adhesive used normally, and the reflection at the interface cannot be ignored. In such a case, even if the reflection of the vertically incident light is prevented by using the antireflection coating, the reflection of the obliquely incident light cannot be prevented, and the light is totally reflected.
【０００５】この全反射を防ぐためには入射角にもよる
が、屈折率で１．７〜１．８以上の接着剤が必要である
が、通常の接着剤ではそのような屈折率の接着剤を得る
ことは困難である。そこで、本発明者が鋭意研究した結
果、燐、硫黄、臭素化合物をベンゼン系あるいは水等の
溶媒に溶かした液体を高屈折率接触液としてプリズム間
に満たす手段が有効であることが判明した。To prevent this total reflection, an adhesive having a refractive index of 1.7 to 1.8 or more is required, depending on the incident angle, but an ordinary adhesive has an adhesive having such a refractive index. Is hard to get. Therefore, as a result of diligent research by the present inventor, it has been found that a means for filling the space between the prisms with a liquid having a phosphorus, sulfur, or bromine compound dissolved in a solvent such as benzene or water as a high refractive index contact liquid is effective.
【０００６】ところが、溶媒は基本的に揮発性があるた
め、長期間の間に揮発して、不揮発性の燐、硫黄、臭素
化合物のみが残ると共に、接触液体積が著しく減少し、
接合面に気泡が発生する問題を有している。又、気泡が
光学有効領域に発生すると、気泡部分で全反射するため
に、プリズムとして使用できないことになる。そのため
長期間にわたって性能を発揮するためには、接合層の接
着剤による封止が不可欠であるが、通常の接着方法では
塗布すると同時に毛細管現象による接合層への流入が発
生し、屈折率の変化あるいは接着剤の硬化不良等によ
り、均一な接合層を形成することが困難であった。However, since the solvent is basically volatile, it volatilizes over a long period of time, leaving only non-volatile phosphorus, sulfur, and bromine compounds, and the contact liquid volume remarkably decreases.
There is a problem that bubbles are generated on the joint surface. Further, when bubbles are generated in the optically effective area, they cannot be used as prisms because they are totally reflected by the bubble portion. Therefore, in order to exert its performance over a long period of time, it is essential to seal the bonding layer with an adhesive.However, in the normal bonding method, at the same time as applying it, the flow into the bonding layer due to the capillary phenomenon occurs, and the change in the refractive index. Alternatively, it was difficult to form a uniform bonding layer due to poor curing of the adhesive.
【０００７】これに対して、接着剤等を用いて接触液を
注入する枠体を予め製作しておくことも考えられるが、
微小なプリズムを用いる場合には、枠体も微小なため製
作が困難となっている。加えて、接着剤の粘度が高いと
微少量の吐出が難しいため、粘度の低い接着剤を使用す
る必要があるが、粘度の低い接着剤はプリズムへの塗布
直後に濡れによって拡散するため、微小な枠体を作製す
ることはさらに困難となっている。On the other hand, it is possible to preliminarily manufacture a frame body for injecting the contact liquid by using an adhesive or the like.
When a minute prism is used, it is difficult to manufacture because the frame is also minute. In addition, if the viscosity of the adhesive is high, it is difficult to eject a minute amount, so it is necessary to use an adhesive with a low viscosity, but an adhesive with a low viscosity diffuses due to wetting immediately after application to the prism, so It is even more difficult to manufacture such a frame.
【０００８】本発明は、このような従来技術の問題点を
考慮してなされたものであり、安定した性能を有する高
屈折率のウォラストンプリズム及びその製造方法を提供
することを目的とする。The present invention has been made in view of the above problems of the prior art, and an object of the present invention is to provide a high refractive index Wollaston prism having stable performance and a manufacturing method thereof.
【０００９】[0009]
【課題を解決するための手段】本発明のウォラストンプ
リズムは、少なくとも一方のプリズムの接合面内に存在
する有効光学領域外周に形成された金属薄膜からなる下
地枠と、この下地枠上に形成されためっき枠との２層か
らなる枠体を有し、この枠体で囲まれた領域が接触液で
満たされ、プリズム外周部が接着剤により接合されてい
ることを特徴とする。A Wollaston prism according to the present invention comprises a base frame made of a metal thin film formed on the outer periphery of an effective optical region existing in the cemented surface of at least one prism, and a base frame formed on the base frame. It is characterized in that it has a frame body composed of two layers with the plated frame, the region surrounded by the frame body is filled with the contact liquid, and the outer peripheral portion of the prism is joined by an adhesive.
【００１０】本発明における製造方法は、少なくとも一
方のプリズムの接合面内に存在する有効光学領域外周に
金属薄膜からなる下地枠を形成した後、この下地枠の上
にめっき枠を形成して枠体を形成し、この枠体で囲まれ
た領域に接触液を注入し、プリズムを貼り合わせた状態
でプリズム外周部を接着剤により接合することを特徴と
する。According to the manufacturing method of the present invention, a base frame made of a metal thin film is formed on the outer circumference of the effective optical region existing in the bonding surface of at least one prism, and then a plating frame is formed on the base frame. It is characterized in that a body is formed, a contact liquid is injected into a region surrounded by the frame body, and the prism outer peripheral portion is bonded with an adhesive in a state where the prisms are bonded together.
【００１１】本発明に用いる金属薄膜からなる下地枠は
膜厚が０．１〜０．５μｍである。下地枠としては、ア
ルミニウム、銅、金等の各種の金属を用いることができ
る。下地枠の成膜プロセスとしては、真空蒸着、スパッ
タリング、イオンプレーティング等種々の手段を採択す
ることができる。この場合において、プリズムの有効光
学領域をマスキングすることで、有効光学領域外周部分
にのみ金属薄膜を形成させることができる。The base frame made of a metal thin film used in the present invention has a film thickness of 0.1 to 0.5 μm. As the base frame, various metals such as aluminum, copper and gold can be used. Various means such as vacuum deposition, sputtering, and ion plating can be adopted as the film forming process of the base frame. In this case, by masking the effective optical region of the prism, the metal thin film can be formed only on the outer peripheral portion of the effective optical region.
【００１２】めっき枠はその膜厚が１〜１５μｍとなる
ように形成され、その材料としては、銅、ニッケル、ア
ルミニウム等の種々の金属を使用することができる。め
っきもプロセスとしては、電解めっき、無電解めっきの
いずれも使用できる。この場合、均一な皮膜形成ができ
るという観点からは、無電解めっきが良好である。な
お、電解めっきでは下地枠の上に電極を設置する必要が
ある。The plating frame is formed to have a film thickness of 1 to 15 μm, and various metals such as copper, nickel and aluminum can be used as its material. As the plating process, either electrolytic plating or electroless plating can be used. In this case, electroless plating is preferable from the viewpoint that a uniform film can be formed. In addition, in electrolytic plating, it is necessary to install an electrode on a base frame.
【００１３】上述した本発明のウォストランプリズムに
おいて、下地枠の金属薄膜及びめっき枠のめっき皮膜は
溶媒に対して安定であり、長期間にわたって溶出などが
発生することがない。また均一な皮膜であるために、接
合されるプリズム面を密着させることが可能である。こ
のため接着剤を用いてプリズムを貼り合わせて接触液を
封入した空間が密閉でき、接触液の流出、揮発等が発生
することがない。In the Wustran prism of the present invention described above, the metal thin film of the base frame and the plating film of the plating frame are stable to the solvent, and elution and the like will not occur for a long period of time. Further, since it is a uniform film, it is possible to closely adhere the prism surfaces to be joined. For this reason, the space in which the contact liquid is sealed by adhering the prisms using an adhesive can be sealed, and the contact liquid does not flow out or volatilize.
【００１４】本発明の製造方法において、プリズム表面
に形成された金属薄膜は０．１〜０．５μｍと非常に薄
く、金属薄膜のみでは接触液を封入する枠として使用す
ることは難しいが、マスクを使用することで任意の場所
に正確に成膜することが可能である。次にこの金属薄膜
からなる下地枠の上にめっきを施すが、金属薄膜に電極
を設置した電解めっきの場合は、導電性を有する金属薄
膜部分のみにめっき皮膜が形成される。一方、無電解め
っきを行う場合も、金属薄膜部分以外にはめっき析出に
必要な触媒核となるものが存在しないため、結果として
金属薄膜部分のみにめっき皮膜が析出する。めっき皮膜
の厚さは、薄膜から厚膜まで制御可能であるが、めっき
に要する時間及び接触液注入時の作業性を考慮すると、
３〜１５μｍ程度が好ましい。In the manufacturing method of the present invention, the metal thin film formed on the prism surface is as thin as 0.1 to 0.5 μm, and it is difficult to use the metal thin film alone as a frame for enclosing the contact liquid. By using, it is possible to form a film accurately at any place. Next, plating is performed on the base frame made of this metal thin film. In the case of electrolytic plating in which electrodes are provided on the metal thin film, the plating film is formed only on the metal thin film portion having conductivity. On the other hand, even when electroless plating is performed, there is no catalyst nucleus necessary for plating deposition other than the metal thin film portion, and as a result, the plating film is deposited only on the metal thin film portion. The thickness of the plating film can be controlled from thin film to thick film, but considering the time required for plating and workability at the time of injecting the contact liquid,
About 3 to 15 μm is preferable.
【００１５】めっきに無電解めっきを用いた場合、めっ
き自体は必ずしも下地に導電性を有する必要はないが、
前工程として表面の粗面化及びＰｄ、Ａｇ等の触媒核を
形成させておく必要があり、本発明のような面精度が要
求される光学面に無電解めっきだけで枠体を形成するこ
とは不適である。When electroless plating is used for the plating, the plating itself does not necessarily have conductivity on the base,
As a pre-process, it is necessary to roughen the surface and to form catalyst nuclei such as Pd, Ag, etc., and to form a frame body only on electroless plating on an optical surface requiring surface accuracy as in the present invention. Is not suitable.
【００１６】また、下地枠に金属薄膜を形成した場合、
電解めっきを適用することが可能であるが、電解めっき
と無電解めっきを比較した場合、電解めっきは電源、電
極が必要となり、特に均一な析出性という点で劣るため
に、液体を密閉する枠体としては無電解めっきの方が適
している。When a metal thin film is formed on the base frame,
Although electrolytic plating can be applied, when electrolytic plating and electroless plating are compared, electrolytic plating requires a power supply and electrodes, and since it is particularly inferior in terms of uniform deposition, a frame that seals the liquid Electroless plating is more suitable for the body.
【００１７】[0017]
（実施の形態１）図１は実施の形態１によって作製され
たプリズムを示し、１はＬｉＮｂＯ3 （ＬＮ）製のプリ
ズムである。２はこのプリズム１を相互に接合している
接着剤層である。(Embodiment 1) FIG. 1 shows a prism manufactured according to Embodiment 1, and 1 is a prism made of LiNbO 3 (LN). Reference numeral 2 is an adhesive layer that bonds the prisms 1 to each other.
【００１８】図２は一方のプリズム接合面を示してお
り、３は接触液を封入する枠体、４はプリズム１の有効
光学領域である。図３はこのプリズム１の平面図であ
り、接触液が封入される枠体３はアルミニウム薄膜から
なる下地枠５及びこの下地枠５の上に形成された銅から
なるめっき枠６の２層構造になっている。FIG. 2 shows one prism joint surface, 3 is a frame for enclosing the contact liquid, and 4 is an effective optical region of the prism 1. FIG. 3 is a plan view of the prism 1. The frame body 3 in which the contact liquid is sealed has a two-layer structure of a base frame 5 made of an aluminum thin film and a plating frame 6 made of copper formed on the base frame 5. It has become.
【００１９】この実施の形態のウォラストンプリズムの
作製は以下のように行った。まず、一方のプリズム１の
有効光学領域にアルミニウムの蒸着を防止するマスクを
設置し、この状態でプリズム１を真空蒸着炉内にセット
した。そして、真空蒸着によってアルミニウムを０．３
μｍの厚さに成膜し、下地枠５を形成した。The Wollaston prism of this embodiment was manufactured as follows. First, a mask for preventing aluminum vapor deposition was installed in the effective optical region of one prism 1, and in this state, the prism 1 was set in a vacuum vapor deposition furnace. Then, aluminum is vacuum-deposited to 0.3
A film having a thickness of μm was formed to form a base frame 5.
【００２０】次に、無電解銅めっきによって下地枠５上
に銅からなる皮膜を８μｍの厚さで形成し、銅のめっき
枠６を形成し、これにより枠体３をプリズム１の有効光
学領域外周部分に形成した。Next, a film made of copper is formed on the base frame 5 to a thickness of 8 μm by electroless copper plating to form a copper plating frame 6, whereby the frame body 3 is formed into an effective optical area of the prism 1. It was formed on the outer peripheral portion.
【００２１】さらに枠体３で囲まれたプリズム１の有効
光学領域４に硫黄を主成分とした接触液を注入し、その
後２つのプリズムを気泡が混入しないように貼り合わせ
た状態で固定治具にセットし、これらの外周部をシリコ
ーン系接着剤で接合した。Further, a contact liquid containing sulfur as a main component is injected into the effective optical area 4 of the prism 1 surrounded by the frame 3, and then the two prisms are bonded together so that air bubbles are not mixed therein, and then the fixing jig is attached. , And the outer peripheral portions of these were bonded with a silicone adhesive.
【００２２】このような構造のウォラストントプリズム
において、接触液はそれぞれのプリズムの有効光学領域
４と枠体３によって密閉され、長期間にわたって、接触
液の溶媒が揮発することがない。また、枠体３の最表面
はもう一方のプリズムに密着しているために、接触液の
流出も、接着剤の有効光学領域への流入も発生すること
がない。これにより高屈折率を有し、長期間にわたって
安定した性能を発現させることが可能なプリズムとする
ことができる。In the Wollastont prism having such a structure, the contact liquid is sealed by the effective optical region 4 and the frame 3 of each prism, and the solvent of the contact liquid does not evaporate for a long period of time. Further, since the outermost surface of the frame body 3 is in close contact with the other prism, neither the contact liquid flows out nor the adhesive flows into the effective optical region. This makes it possible to obtain a prism having a high refractive index and capable of exhibiting stable performance over a long period of time.
【００２３】（実施の形態２）図４は実施の形態２にお
ける一方のプリズム７を示し、ＬｉＴａＯ3 （ＬＴ）に
よって成形されている。このプリズム７の接合面には、
内側から外側に向かって有効光学領域１１、接触液を封
入する枠体９、接着剤流入防止のための空間１２、枠体
９の外側に位置する接着剤流入防止のための防止枠１０
及び接着剤層８が順に設けられている。(Second Embodiment) FIG. 4 shows one prism 7 in the second embodiment, which is formed of LiTaO 3 (LT). On the joint surface of this prism 7,
The effective optical region 11 from the inside to the outside, the frame 9 for enclosing the contact liquid, the space 12 for preventing the inflow of the adhesive, and the prevention frame 10 for preventing the inflow of the adhesive located outside the frame 9.
And the adhesive layer 8 are provided in order.
【００２４】図５はプリズムの接合面に垂直な断面図で
あり、接触液を封入する枠体９及び接着剤流入防止枠１
０が共に銅薄膜からなる下地枠１３及びニッケルからな
るめっき枠１４の２層構造に形成されている。FIG. 5 is a cross-sectional view perpendicular to the joint surface of the prism. The frame 9 for enclosing the contact liquid and the adhesive inflow prevention frame 1 are shown.
0 is formed in a two-layer structure including a base frame 13 made of a copper thin film and a plating frame 14 made of nickel.
【００２５】このプリズムの作製方法を次に説明する。
まず、プリズム７の接合面における有効光学領域１１及
び接着剤流入防止用の空間１２及び接着層８形成部分に
は銅がスパッタ蒸着されるのを防ぐマスクを設置し、こ
の状態でプリズム７をスパッタ装置に設置し、その後ス
パッタ蒸着によって銅を０．５μｍの厚さに成膜し、接
着剤流入防止枠１０及び枠体９の各下地枠１３を形成し
た。A method of manufacturing this prism will be described below.
First, a mask for preventing copper from being sputter-deposited is provided on the effective optical area 11, the space 12 for preventing the inflow of the adhesive, and the portion where the adhesive layer 8 is formed on the joint surface of the prism 7, and the prism 7 is sputtered in this state. After being installed in the apparatus, copper was deposited to a thickness of 0.5 μm by sputter deposition to form the adhesive inflow prevention frame 10 and each base frame 13 of the frame body 9.
【００２６】次に無電解ニッケルめっきによってニッケ
ルを１０μｍの厚さに形成し、接着剤流入防止枠１０及
び枠体９の各めっき枠１４を作製した。Next, nickel was formed to a thickness of 10 μm by electroless nickel plating, and the plating frame 14 of the adhesive inflow prevention frame 10 and the frame body 9 was produced.
【００２７】そして枠体９及び接着剤流入防止枠１０が
形成されたプリズム７の有効光学領域１１に硫黄を主成
分とする接触液を注入し、その後、２つのプリズムを気
泡が混入しないように相互に貼り合わせた状態で固定治
具にセットした。そして低粘度（２５０ＣＰＳ）の紫外
線硬化型接着剤によって接着剤層８を固定した。Then, a contact liquid containing sulfur as a main component is injected into the effective optical region 11 of the prism 7 on which the frame 9 and the adhesive inflow prevention frame 10 are formed, and thereafter, bubbles are not mixed into the two prisms. The pieces were attached to each other and set on a fixing jig. Then, the adhesive layer 8 was fixed with a low-viscosity (250 CPS) UV-curable adhesive.
【００２８】このような実施の形態においては、実施の
形態１と同様に接触液の溶媒が長期間にわたって揮発す
ることがない。また、低粘度の接着剤を用いるため、接
着剤を少量滴下すると、接着剤は毛細管現象により瞬間
的に接着層８の全周に行き渡る。このため接着剤を全周
に渡って塗布する手間を省くことができ、作業性が向上
する。また、接着剤が低粘度であるために、接着剤の一
部は毛細管現象により、接着剤流入防止枠１０とプリズ
ム面との微小な隙間に侵入するが、侵入できる接着剤は
微量であるために、接着剤流入防止空間１２に到達した
ところで張力により停止し、それ以上侵入することはな
い。これにより高屈折率を有し、長期間にわたって安定
した性能を発現させることが可能なプリズムをより簡便
に作製することができた。In this embodiment, as in the first embodiment, the solvent of the contact liquid does not evaporate for a long period of time. Further, since a low-viscosity adhesive is used, when a small amount of the adhesive is dropped, the adhesive instantaneously reaches the entire circumference of the adhesive layer 8 due to a capillary phenomenon. Therefore, it is possible to save the labor of applying the adhesive over the entire circumference and improve the workability. In addition, since the adhesive has a low viscosity, a part of the adhesive enters the minute gap between the adhesive inflow prevention frame 10 and the prism surface due to the capillary phenomenon, but a small amount of the adhesive can penetrate. In addition, when it reaches the adhesive inflow prevention space 12, it is stopped by the tension and does not enter any more. As a result, a prism having a high refractive index and capable of exhibiting stable performance for a long period of time could be manufactured more easily.
【００２９】[0029]
【発明の効果】本発明のウォラストンプリズムは、金属
薄膜の下地枠及びめっき枠からなる枠体を有効光学領域
外周に形成し、この枠体によって囲まれた領域に接触液
を注入して、他方のプリズムを接合するため、接触液が
流出したり、揮発することがなく、長期間安定した性能
を発揮することができる。本発明の製造方法はこのウォ
ラストンプリズムを簡単に、しかも確実に作製すること
ができる。According to the Wollaston prism of the present invention, a frame body consisting of a metal thin film base frame and a plating frame is formed on the outer periphery of the effective optical region, and the contact liquid is injected into the region surrounded by the frame body, Since the other prism is joined, the contact liquid does not flow out or volatilize, and stable performance can be exhibited for a long period of time. The manufacturing method of the present invention can easily and surely manufacture this Wollaston prism.
【図１】実施の形態１の斜視図である。FIG. 1 is a perspective view of a first embodiment.
【図２】実施の形態１の一方のプリズムの接合面からの
斜視図である。FIG. 2 is a perspective view from the joint surface of one prism of the first embodiment.
【図３】一方のプリズムの平面図である。FIG. 3 is a plan view of one prism.
【図４】実施の形態２の一方のプリズムの接合面からの
斜視図である。FIG. 4 is a perspective view from a joint surface of one prism of the second embodiment.
【図５】一方のプリズムの断面図である。FIG. 5 is a cross-sectional view of one prism.
１ プリズム ３ 枠体 ４ 有効光学領域 ５ 下地枠 ６ めっき枠 1 Prism 3 Frame 4 Effective Optical Area 5 Base Frame 6 Plating Frame
Claims (2)
存在する有効光学領域外周に形成された金属薄膜からな
る下地枠と、この下地枠上に形成されためっき枠との２
層からなる枠体を有し、この枠体で囲まれた領域が接触
液で満たされ、プリズム外周部が接着剤により接合され
ていることを特徴とするウォラストンプリズム。1. A base frame made of a metal thin film formed on the outer periphery of an effective optical region existing in a joint surface of at least one prism, and a plating frame formed on the base frame.
A Wollaston prism having a frame body composed of layers, a region surrounded by the frame body being filled with a contact liquid, and an outer peripheral portion of the prism being joined by an adhesive.
存在する有効光学領域外周に金属薄膜からなる下地枠を
形成した後、この下地枠の上にめっき枠を形成して枠体
を形成し、この枠体で囲まれた領域に接触液を注入し、
プリズムを貼り合わせた状態でプリズム外周部を接着剤
により接合することを特徴とするウォラストンプリズム
の製造方法。2. A frame is formed by forming a base frame made of a metal thin film on the outer periphery of the effective optical region existing in the bonding surface of at least one prism, and then forming a plating frame on the base frame. Inject the contact liquid into the area surrounded by this frame,
A method for manufacturing a Wollaston prism, wherein the outer peripheral portion of the prism is bonded with an adhesive in a state where the prisms are bonded together.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29700695A JPH09138302A (en) | 1995-11-15 | 1995-11-15 | Wollaston prism and its production |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29700695A JPH09138302A (en) | 1995-11-15 | 1995-11-15 | Wollaston prism and its production |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH09138302A true JPH09138302A (en) | 1997-05-27 |
Family
ID=17841035
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP29700695A Withdrawn JPH09138302A (en) | 1995-11-15 | 1995-11-15 | Wollaston prism and its production |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH09138302A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003084134A (en) * | 2001-09-13 | 2003-03-19 | Ricoh Co Ltd | Manufacturing method of polarized light separating element |
| JP2009109636A (en) * | 2007-10-29 | 2009-05-21 | Sony Corp | Polarizing plate, manufacturing method of polarizing plate, and liquid crystal projector |
| CN112821173A (en) * | 2021-02-05 | 2021-05-18 | 无锡奥夫特光学技术有限公司 | A select a mirror for carbon dioxide laser |
| JP2023115127A (en) * | 2019-06-24 | 2023-08-18 | マジック リープ， インコーポレイテッド | Waveguides with integral spacers and related systems and methods |
| US12535685B2 (en) | 2019-06-24 | 2026-01-27 | Magic Leap, Inc. | Waveguides having integral spacers and related systems and methods |
-
1995
- 1995-11-15 JP JP29700695A patent/JPH09138302A/en not_active Withdrawn
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003084134A (en) * | 2001-09-13 | 2003-03-19 | Ricoh Co Ltd | Manufacturing method of polarized light separating element |
| JP2009109636A (en) * | 2007-10-29 | 2009-05-21 | Sony Corp | Polarizing plate, manufacturing method of polarizing plate, and liquid crystal projector |
| JP2023115127A (en) * | 2019-06-24 | 2023-08-18 | マジック リープ， インコーポレイテッド | Waveguides with integral spacers and related systems and methods |
| US12535685B2 (en) | 2019-06-24 | 2026-01-27 | Magic Leap, Inc. | Waveguides having integral spacers and related systems and methods |
| CN112821173A (en) * | 2021-02-05 | 2021-05-18 | 无锡奥夫特光学技术有限公司 | A select a mirror for carbon dioxide laser |
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| Date | Code | Title | Description |
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| A300 | Withdrawal of application because of no request for examination |
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