JPH0883862A - Circuit board and method for manufacturing circuit board - Google Patents
Circuit board and method for manufacturing circuit boardInfo
- Publication number
- JPH0883862A JPH0883862A JP21590594A JP21590594A JPH0883862A JP H0883862 A JPH0883862 A JP H0883862A JP 21590594 A JP21590594 A JP 21590594A JP 21590594 A JP21590594 A JP 21590594A JP H0883862 A JPH0883862 A JP H0883862A
- Authority
- JP
- Japan
- Prior art keywords
- chip
- insulating sheet
- circuit board
- substrate
- conductive wire
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims description 32
- 238000004519 manufacturing process Methods 0.000 title claims description 24
- 239000000758 substrate Substances 0.000 claims description 34
- 239000000463 material Substances 0.000 claims description 27
- 239000004020 conductor Substances 0.000 claims description 24
- 239000004642 Polyimide Substances 0.000 abstract description 17
- 229920001721 polyimide Polymers 0.000 abstract description 17
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 5
- 229910052802 copper Inorganic materials 0.000 description 5
- 239000010949 copper Substances 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 230000008602 contraction Effects 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 238000005530 etching Methods 0.000 description 3
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- 230000001771 impaired effect Effects 0.000 description 2
- 238000003672 processing method Methods 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 229910001369 Brass Inorganic materials 0.000 description 1
- 229910000906 Bronze Inorganic materials 0.000 description 1
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- 229910000737 Duralumin Inorganic materials 0.000 description 1
- 238000002679 ablation Methods 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 239000010974 bronze Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
Landscapes
- Wire Bonding (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、回路基板及び回路基板
の製造方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a circuit board and a method for manufacturing the circuit board.
【0002】[0002]
【従来の技術】従来、回路基板を小型化し、ICチップ
を高密度に実装することを目的として、回路基板上にベ
アチップと呼ばれるパッケージを設けていないICチッ
プを実装するベアチップ実装方法が多く行われ、また、
このベアチップ実装方法によりICチップが実装された
回路基板が各種の装置に使用されている。2. Description of the Related Art Conventionally, a bare chip mounting method for mounting an IC chip, which is not provided with a package called a bare chip on a circuit board, has been often performed for the purpose of miniaturizing a circuit board and mounting IC chips at a high density. ,Also,
Circuit boards on which IC chips are mounted by this bare chip mounting method are used in various devices.
【0003】このベアチップ実装方法としては、フリッ
プチップ法が知られている。この方法は、基板上に、I
Cチップの回路面を伏せるフェイスダウンの形でICチ
ップを配置して、ICチップの端子と基板上の導線とを
直接接続するという方法である。この方法では、ICチ
ップの端子と導線は、通常半田メッキ等により接合さ
れ、各接合点は、ICチップ毎に同時に全て接合され
る。このため、フリップチップ法は、多数の接合点を要
する場合に非常に適しており、さらに各接合点はICチ
ップの基板上への投影面内にあるため、ICチップの高
密度実装にも優れているという特徴がある。A flip chip method is known as a bare chip mounting method. This method consists of
This is a method of arranging the IC chip in a face-down manner in which the circuit surface of the C chip is turned down, and directly connecting the terminals of the IC chip and the conducting wires on the substrate. In this method, the terminals of the IC chip and the conductive wires are usually joined by solder plating or the like, and all the joining points are joined simultaneously for each IC chip. Therefore, the flip-chip method is very suitable when a large number of bonding points are required, and since each bonding point is on the projection plane of the IC chip on the substrate, it is also excellent in high-density mounting of IC chips. There is a feature that
【0004】このフリップチップ法によるICチップ実
装方法は、本出願人の出願にかかる特願平5−1068
84号の明細書に開示される画像形成装置用記録ヘッド
を製造する場合にも適用することができる。この画像形
成装置用記録ヘッドでは、図9に示すように、保持部材
130上にポリイミドからなる絶縁シート102を保持
し、当該絶縁シート102上に導線132を形成してい
る。そして、絶縁シート2上に複数のICチップ133
を絶縁シート2の長手方向に一列に載置して、前記導線
132にICチップ133の端子を接続している。This IC chip mounting method by the flip chip method is disclosed in Japanese Patent Application No. 5-1068 filed by the present applicant.
It can also be applied to the case of manufacturing the recording head for the image forming apparatus disclosed in the specification of No. 84. In this recording head for an image forming apparatus, as shown in FIG. 9, an insulating sheet 102 made of polyimide is held on a holding member 130, and a conductive wire 132 is formed on the insulating sheet 102. Then, a plurality of IC chips 133 are formed on the insulating sheet 2.
Are placed in a line in the longitudinal direction of the insulating sheet 2, and the terminals of the IC chip 133 are connected to the conducting wires 132.
【0005】ICチップ133の載置部分は、図10及
び図11に示す拡大図のように、ポリイミドからなる絶
縁シート102上に銅膜による導線132が固着され、
この各導線132とICチップ133の端子は、バンプ
138によって接合されている。At the mounting portion of the IC chip 133, as shown in the enlarged views of FIGS. 10 and 11, the conductive wire 132 made of a copper film is fixed on the insulating sheet 102 made of polyimide.
The leads 132 and the terminals of the IC chip 133 are joined by bumps 138.
【0006】[0006]
【発明が解決しようとする課題】しかしながら、上述し
たようなフリップチップ法を採用した回路基板では、絶
縁シート102を構成するポリイミドとICチップ13
3を構成するシリコンの熱膨張率が異なることにより、
温度変化に伴って、絶縁シート102とICチップ13
3の膨張量に差が生じることがある。このとき、ICチ
ップ133の端子が接合されている導線132は、絶縁
シート102上に固着されているので、導線132は絶
縁シート102に拘束されて、ICチップ133の膨張
に追随することはできない。従って、ICチップ133
と導線132を接合するバンプ138の部分に歪が生
じ、ICチップ133とバンプ138の接合が外れた
り、バンプ138と導線132の接合が外れたりするこ
とがあり、信頼性の点で大きな問題となっていた。However, in the circuit board adopting the flip chip method as described above, the polyimide forming the insulating sheet 102 and the IC chip 13 are formed.
Since the coefficient of thermal expansion of the silicon constituting 3 is different,
As the temperature changes, the insulating sheet 102 and the IC chip 13
There may be a difference in the expansion amount of No. 3. At this time, since the conductor wire 132 to which the terminals of the IC chip 133 are joined is fixed on the insulating sheet 102, the conductor wire 132 is restrained by the insulating sheet 102 and cannot follow the expansion of the IC chip 133. . Therefore, the IC chip 133
There is a case where distortion occurs in the bump 138 portion that joins the lead wire 132 and the lead wire 132, and the IC chip 133 and the bump 138 may come off, or the bump 138 and the lead wire 132 may come off, causing a serious problem in terms of reliability. Was becoming.
【0007】本発明は、上述した問題点を解決するため
になされたものであり、安価で信頼性にも優れた回路基
板及び回路基板の製造方法を提供することを目的にして
いる。The present invention has been made to solve the above-mentioned problems, and an object of the present invention is to provide a circuit board and a method of manufacturing the circuit board which are inexpensive and have excellent reliability.
【0008】[0008]
【課題を解決するための手段】この目的を達成するため
に請求項1の発明の回路基板では、絶縁性基材により構
成される基板と、当該基板上に設けられた導線と、前記
基板上に載置され、前記導線に接続されたICチップ
と、前記ICチップの近傍において、前記導線に対応し
て前記基板に各々設けられた孔とを備えている。In order to achieve this object, in a circuit board according to a first aspect of the present invention, there is provided a substrate formed of an insulating base material, a conductor wire provided on the substrate, and the substrate. And an IC chip mounted on the substrate and connected to the conducting wire, and a hole provided in the substrate in the vicinity of the IC chip so as to correspond to the conducting wire.
【0009】また、請求項2の発明の回路基板の製造方
法では、絶縁性基材により構成される基板上に導線を設
ける行程と、前記基板上の導線を設けた面にICチップ
を載置し、前記導線とICチップを接続する行程と、前
記基板のICチップを載置していない側の面から前記絶
縁性基材を選択的に除去する行程とを設けている。In the method of manufacturing a circuit board according to a second aspect of the present invention, the step of providing a conductive wire on a substrate made of an insulating base material and the IC chip placed on the surface of the substrate on which the conductive wire is provided. Then, a step of connecting the conducting wire and the IC chip and a step of selectively removing the insulating base material from the surface of the substrate on which the IC chip is not mounted are provided.
【0010】さらに、請求項3の発明の回路基板の製造
方法では、請求項2の発明の絶縁性基材を選択的に除去
する行程で、前記ICチップと接続される各導線に対応
して、前記基板の絶縁性基材を、当該ICチップの近傍
おいて、各々除去するようにしている。Further, in the method of manufacturing a circuit board according to a third aspect of the present invention, in the process of selectively removing the insulating base material according to the second aspect of the invention, corresponding to each conductor wire connected to the IC chip. The insulating base material of the substrate is removed in the vicinity of the IC chip.
【0011】また、請求項4の発明の回路基板の製造方
法では、請求項2または請求項3の発明の絶縁性基材を
除去する行程で、レーザ光照射により絶縁性基材の除去
を行うようにしている。Further, in the method of manufacturing a circuit board according to a fourth aspect of the invention, in the step of removing the insulating base material of the second or third aspect of the invention, the insulating base material is removed by laser light irradiation. I am trying.
【0012】[0012]
【作用】上記の構成を有する請求項1の発明の回路基板
では、絶縁性基材により構成される基板上に導線が設け
られ、かつ、ICチップが載置される。この基板では、
ICチップの近傍において、前記導線に対応して前記基
板に各々孔が形成されており、熱膨張によるICチップ
と基板との間の歪は、この孔を跨ぐ導線が基板に拘束さ
れないので、孔を跨ぐ導線部分の伸縮によって吸収され
る。従って、熱膨張率によって、ICチップの端子と導
線の接合点とが外れたり、ずれたりすることがない。In the circuit board according to the first aspect of the present invention having the above structure, the conductive wire is provided on the board made of the insulating base material, and the IC chip is mounted. With this board,
Holes are formed in the substrate in the vicinity of the IC chip so as to correspond to the conductive wires, and the strain between the IC chip and the substrate due to thermal expansion is prevented because the conductive wires straddling the holes are not bound by the substrate. It is absorbed by the expansion and contraction of the conductor part that crosses over. Therefore, the terminal of the IC chip and the connecting point of the conductive wire are not displaced or displaced due to the coefficient of thermal expansion.
【0013】請求項2の回路基板の製造方法の発明で
は、絶縁性基材により構成される基板上に導線が形成さ
れ、その後、前記基板上の導線を設けた面にICチップ
が載置され、前記導線とICチップが接続される。その
後、前記基板のICチップを載置していない側の面から
前記基板の絶縁性基材が選択的に除去されるので、導線
によってICチップが保持される基板が製造される。According to another aspect of the invention of the method of manufacturing a circuit board, the conductive wire is formed on the substrate made of an insulating base material, and then the IC chip is placed on the surface of the substrate on which the conductive wire is provided. , The conductor and the IC chip are connected. After that, since the insulating base material of the substrate is selectively removed from the surface of the substrate on the side where the IC chip is not mounted, the substrate on which the IC chip is held by the conductive wire is manufactured.
【0014】請求項3の回路基板の製造方法の発明で
は、請求項2の回路基板の製造方法の発明の絶縁性基材
を選択的に除去する行程で、前記ICチップと接続され
る各導線に対応して、前記基板の絶縁性基材を当該IC
チップの近傍において、各々除去しているので、回路基
板の強度を損なうことなく、ICチップ近傍の各導線に
対応して、前記基板に各々孔を有する回路基板が製造さ
れる。According to the invention of the method for manufacturing a circuit board of claim 3, in the step of selectively removing the insulating base material of the invention of the method for manufacturing a circuit board according to claim 2, each conductive wire connected to the IC chip is connected. Corresponding to, the insulating base material of the substrate is
Since each is removed in the vicinity of the chip, the circuit board having holes in the board is manufactured in correspondence with the respective conductive wires in the vicinity of the IC chip without impairing the strength of the circuit board.
【0015】請求項4の回路基板の製造方法の発明で
は、請求項2または請求項3の回路基板の製造方法の発
明の絶縁性基材を選択的に除去する行程で、レーザ光照
射により前記絶縁性基材を除去している。従って、絶縁
性基材の除去が容易、確実にでき、また、導線を断線さ
せることがない。In the invention of the method for manufacturing a circuit board according to claim 4, in the step of selectively removing the insulating base material of the invention of the method for manufacturing a circuit board according to claim 2 or 3, the irradiation with laser light is performed. The insulating base material is removed. Therefore, the insulating base material can be easily and surely removed, and the conductor wire is not broken.
【0016】[0016]
【実施例】以下、本発明を具体化した一実施例を図面を
参照しながら説明する。An embodiment of the present invention will be described below with reference to the drawings.
【0017】先ず、図1を参照して、本発明の回路基板
の一実施例である画像形成装置用記録ヘッド1の構造に
ついて説明する。First, the structure of a recording head 1 for an image forming apparatus, which is an embodiment of the circuit board of the present invention, will be described with reference to FIG.
【0018】この画像形成装置用記録ヘッド1では、そ
の中央部に長手方向に連続したスリット部35を有する
保持部材30上に、厚さ25μmのポリイミド製の絶縁
シート2を載置し、当該絶縁シート2上に8μm厚の銅
膜による導線32が複数平行に形成されている。当該導
線32の端部の絶縁シート2上には、絶縁シート2の長
手方向に一列に複数のICチップ33が載置され、この
ICチップ33の各端子は各々導線32に接続されてい
る。In the recording head 1 for the image forming apparatus, the insulating sheet 2 made of polyimide having a thickness of 25 μm is placed on the holding member 30 having the slit portion 35 which is continuous in the longitudinal direction at the center thereof. A plurality of conductors 32 made of a copper film having a thickness of 8 μm are formed in parallel on the sheet 2. On the insulating sheet 2 at the end of the conductor 32, a plurality of IC chips 33 are placed in a line in the longitudinal direction of the insulating sheet 2, and each terminal of the IC chip 33 is connected to the conductor 32.
【0019】また、導線32のICチップ33を載置し
ない側の端部には、図示しないが、トナーを通過させる
ための直径約60μmの孔である複数のアパチャが、絶
縁シート2の長手方向に一列に形成されている。また、
各アパチャの周囲には、アパチャに電界のオン・オフを
行いトナー流を制御するための図示しない制御電極が設
けられている。Although not shown, a plurality of apertures each having a diameter of about 60 μm for allowing toner to pass through are provided at the end of the conductor 32 on the side where the IC chip 33 is not mounted, in the longitudinal direction of the insulating sheet 2. Are formed in a row. Also,
Around each aperture, a control electrode (not shown) for controlling the toner flow by turning on / off an electric field in the aperture is provided.
【0020】ここで、前記ICチップ33は、前記導線
32を介して、図示しない各制御電極への電圧の印加の
制御を行うために設けられているものである。Here, the IC chip 33 is provided to control the application of a voltage to each control electrode (not shown) via the conductor 32.
【0021】尚、上記絶縁シート2の材質としては、通
常はポリイミドが電気的、機械的特性から好ましいが、
ポリエステル等でも使用できる。さらに、絶縁シート2
の長手方向の端部には、コネクターとなる接続部36が
設けられている。As a material for the insulating sheet 2, polyimide is usually preferable because of its electrical and mechanical characteristics.
It can also be used with polyester. Furthermore, the insulation sheet 2
A connecting portion 36 serving as a connector is provided at an end portion in the longitudinal direction of the.
【0022】そして、前記画像形成装置用記録ヘッド1
は、図1に示すように、保持部材30上に固着されてい
る。ここで、保持部材30は剛体であれば足りるが、絶
縁シート2の材質であるポリイミドと同程度の熱膨張係
数を有する部材から構成されることが望ましい。例え
ば、保持部材30の材料としては、ジュラルミン等のア
ルミ系合金、青銅や黄銅等の銅系合金、ステンレス等の
金属材料が使用できる。さらに、この保持部材30の中
央に設けられているスリット部35は、トナーを前記ア
パチャに供給するために設けられているものである。Then, the recording head 1 for the image forming apparatus.
Are fixed on the holding member 30 as shown in FIG. Here, the holding member 30 is sufficient as long as it is a rigid body, but it is preferable that the holding member 30 is made of a member having a coefficient of thermal expansion similar to that of polyimide, which is a material of the insulating sheet 2. For example, as the material of the holding member 30, an aluminum alloy such as duralumin, a copper alloy such as bronze or brass, or a metal material such as stainless steel can be used. Further, the slit portion 35 provided at the center of the holding member 30 is provided for supplying the toner to the aperture.
【0023】次に、前記画像形成装置用記録ヘッド1の
ICチップ33の実装部の構成を図2を参照しながら説
明する。Next, the structure of the mounting portion of the IC chip 33 of the recording head 1 for the image forming apparatus will be described with reference to FIG.
【0024】図2は、前記画像形成装置用記録ヘッド1
のICチップ33の実装部の拡大図である。図3は、図
2に示す画像形成装置用記録ヘッド1のICチップ33
の実装部の拡大図のA−A’線に於ける断面図である。FIG. 2 shows the recording head 1 for the image forming apparatus.
3 is an enlarged view of a mounting portion of an IC chip 33 of FIG. FIG. 3 shows an IC chip 33 of the recording head 1 for the image forming apparatus shown in FIG.
FIG. 9 is a cross-sectional view taken along the line AA ′ of the enlarged view of the mounting portion of FIG.
【0025】絶縁シート2上には、一つのICチップ3
3に対し多数の導線32が入り込んでいる。ここで、I
Cチップ33と導線32は、後述するバンプ38を介し
て接合されている。また、図2及び図3に示すように、
ICチップ33の近傍の絶縁シート2には、各導線32
よりもやや広い幅を有する孔34が、各導線32に対応
して、各々設けられている。One IC chip 3 is formed on the insulating sheet 2.
A large number of conducting wires 32 are inserted into the number 3. Where I
The C chip 33 and the conductive wire 32 are joined via a bump 38 described later. In addition, as shown in FIG. 2 and FIG.
Each conductive wire 32 is attached to the insulating sheet 2 near the IC chip 33.
Holes 34 having a width slightly wider than that of the conductors 32 are provided corresponding to the conductors 32, respectively.
【0026】次に、この画像形成装置用記録ヘッド1の
製造方法について、図4を参照して説明する。Next, a method of manufacturing the recording head 1 for the image forming apparatus will be described with reference to FIG.
【0027】図4は、本発明の一実施例のである画像形
成装置用記録ヘッド1の製造行程を示す図である。FIG. 4 is a diagram showing a manufacturing process of the recording head 1 for an image forming apparatus according to an embodiment of the present invention.
【0028】先ず、図4(a)に示すように、ポリイミ
ド製の絶縁シート2上に導線32が形成される。この導
線32の形成は、エッチング法や印刷法等いかなる導線
形成法にても形成する事は可能であるが、剛性のある導
線を形成するには、例えば、ポリイミド製の絶縁シート
2上に銅膜付きフィルム接着し、その銅膜にパターンと
して残す部分に保護膜を形成し、その後、酸により保護
膜の無い銅膜部分を溶解するエッチング法が望ましい。
このエッチング法では、パターンとして残す部分は印刷
法によって保護膜を形成しても良いし、写真法によって
保護膜を形成してもよい。First, as shown in FIG. 4A, the conductive wire 32 is formed on the insulating sheet 2 made of polyimide. The conductive wire 32 can be formed by any conductive wire forming method such as an etching method or a printing method, but in order to form a rigid conductive wire, for example, copper is formed on the insulating sheet 2 made of polyimide. It is desirable to use an etching method in which a film with a film is adhered, a protective film is formed on a portion of the copper film to be left as a pattern, and then the copper film portion having no protective film is dissolved with an acid.
In this etching method, a protective film may be formed on a portion to be left as a pattern by a printing method or may be formed by a photographic method.
【0029】次に、図4(b)に示すように、導線32
のICチップ33に接触する部分にバンプ38を形成す
る。このバンプ38は、金やハンダ等でできた厚さ数十
μmの部材であり、ICチップ33と導線32が良好な
接合が行われるように設けられるものである。このバン
プ38は、本実施例のように導線32に設けても良い
し、また、ICチップ33の端子側に設けていても良
い。このバンプ38を導線32に形成するには、転写バ
ンプ等の手法で導線32に転写して形成する。また、バ
ンプ38を設けずにICチップ33と導線32を直接接
合するようにしてもよい。Next, as shown in FIG.
The bumps 38 are formed on the portions that come into contact with the IC chip 33. The bump 38 is a member made of gold, solder, or the like and having a thickness of several tens of μm, and is provided so that the IC chip 33 and the conductive wire 32 are well bonded. The bump 38 may be provided on the conductive wire 32 as in the present embodiment, or may be provided on the terminal side of the IC chip 33. To form the bumps 38 on the conductive wire 32, the bumps 38 are transferred onto the conductive wire 32 by a method such as a transfer bump. Further, the IC chip 33 and the conductive wire 32 may be directly bonded without providing the bump 38.
【0030】次いで、図4(c)に示すように、ICチ
ップ33をフェイスダウンの形で導線32上にマウント
する。そして、加圧もしくは加熱することにより、バン
プ38によってICチップ33と導線32は接合され
る。Next, as shown in FIG. 4C, the IC chip 33 is mounted face down on the conductive wire 32. Then, by applying pressure or heating, the IC chip 33 and the conductive wire 32 are joined by the bump 38.
【0031】次に、図4(d)に示すように、絶縁シー
ト2の導線32を設けていない側の面から絶縁シート2
に対しエキシマレーザ光を照射する。エキシマレーザ光
は、絶縁シート2を構成するポリイミドを選択的にアブ
レーション作用により除去することができるため、照射
されたエリアのポリイミドは無くなり、導線32やIC
チップ33を破損することが無く、各導線32に対応し
て絶縁シート2に孔34を各々形成することができる。
ここで、エキシマレーザ光のビームは、孔34の形に整
形して照射するか、または、孔34の形になるようにス
キャンすればよく、図2及び図3に示すように、ICチ
ップの近傍において、絶縁シート2に導線32に各々対
応した孔を有する画像形成装置用記録ヘッド1が製造で
きる。Next, as shown in FIG. 4 (d), the surface of the insulating sheet 2 on which the conductive wire 32 is not provided is cut off from the surface of the insulating sheet 2.
The excimer laser light is irradiated to. Since the excimer laser light can selectively remove the polyimide forming the insulating sheet 2 by the ablation action, the polyimide in the irradiated area disappears, and the conductive wire 32 and the IC are removed.
It is possible to form the holes 34 in the insulating sheet 2 corresponding to the conductors 32 without damaging the chips 33.
Here, the beam of excimer laser light may be shaped and irradiated in the shape of the hole 34, or may be scanned so as to have the shape of the hole 34. As shown in FIGS. In the vicinity, the recording head 1 for an image forming apparatus having the holes corresponding to the conductive wires 32 in the insulating sheet 2 can be manufactured.
【0032】以上、詳述したように、本実施例の画像形
成装置用記録ヘッド1では、ICチップ33の近傍にお
いて、ポリイミド製の絶縁シート2に、導線32に対応
した孔34が各々形成されているため、シリコンで形成
されたICチップ33は導線32により保持され、IC
チップ33は、ポリイミド製の絶縁シート2からの拘束
を受けにくくなる。従って、熱膨張率に大きな差のある
ポリイミド製の絶縁シート2とシリコン製のICチップ
33とが熱膨張して生じる歪は、孔34を跨ぐ導線32
の部分の伸縮により吸収され、当該歪によりICチップ
33の端子とバンプ38、または、バンプ38と導線3
2の接合部が外れたり、ずれたりすることがない。さら
に、絶縁シート2はICチップ33の近傍で、各導線3
2に対応した一部のポリイミドを除去して孔を各々形成
するだけなので、絶縁シート2の強度を損なうこともな
い。従って、信頼性の高い画像形成装置用記録ヘッド1
を提供することができる。As described above in detail, in the recording head 1 for the image forming apparatus of this embodiment, the holes 34 corresponding to the conductors 32 are formed in the insulating sheet 2 made of polyimide in the vicinity of the IC chip 33. Therefore, the IC chip 33 formed of silicon is held by the conductive wire 32,
The chip 33 is less likely to be constrained by the insulating sheet 2 made of polyimide. Therefore, the distortion caused by the thermal expansion of the insulating sheet 2 made of polyimide and the IC chip 33 made of silicon, which have a large difference in the coefficient of thermal expansion, is caused by the conductive wire 32 straddling the hole 34.
Is absorbed by the expansion and contraction of the portion of FIG.
The joint part of 2 does not come off or shift. Further, the insulating sheet 2 is provided in the vicinity of the IC chip 33 so that each conductor 3
Since only a part of the polyimide corresponding to 2 is removed to form the holes, the strength of the insulating sheet 2 is not impaired. Therefore, the recording head 1 for a highly reliable image forming apparatus
Can be provided.
【0033】また、本実施例の画像形成装置用記録ヘッ
ドの製造方法では、絶縁シート2上に導線32を形成
し、ICチップ33を載置してから、絶縁シート2の一
部を選択的にエキシマレーザ光により絶縁シート2の背
面から除去しているので、絶縁シート2の選択的除去を
容易、確実に行うことができる。さらに、エキシマレー
ザー光により除去しているので、導線32及びICチッ
プ33を破損せずに、絶縁シート2の一部を選択的に除
去することができる。Further, in the method of manufacturing the recording head for the image forming apparatus of this embodiment, the conductive wire 32 is formed on the insulating sheet 2, the IC chip 33 is placed, and then a part of the insulating sheet 2 is selectively selected. Moreover, since the back surface of the insulating sheet 2 is removed by excimer laser light, the selective removal of the insulating sheet 2 can be performed easily and reliably. Furthermore, since it is removed by the excimer laser light, it is possible to selectively remove a part of the insulating sheet 2 without damaging the conducting wire 32 and the IC chip 33.
【0034】尚、本発明は、以上詳述した実施例に限定
されるものではなく、その主旨を逸脱しない範囲におい
て、種々の変更を加えることが可能である。The present invention is not limited to the embodiments described in detail above, and various modifications can be made without departing from the spirit of the invention.
【0035】例えば、図5及び図6に示すように、IC
チップ33を載置した背面の絶縁シート2をICチップ
33の面積より大きい面積で除去してもよい。これによ
り、ICチップ33は、完全に導線32によってのみ保
持されることになり、導線32による熱膨張による歪の
吸収は、より確実になる。For example, as shown in FIG. 5 and FIG.
The back surface insulating sheet 2 on which the chip 33 is placed may be removed in an area larger than the area of the IC chip 33. As a result, the IC chip 33 is completely held only by the conductive wire 32, and the absorption of strain due to thermal expansion by the conductive wire 32 becomes more reliable.
【0036】また、ポリイミド製の絶縁シート2を除去
して孔を形成するのではなく、図7及び図8に示すよう
に、段付け状の加工によりICチップ33に近い部分を
一部を残してもよい。このような形状でも、前記一部残
されたポリイミドがICチップ33のシリコンの熱変形
に従属することになり、ICチップ33とバンプ38間
やバンプ38と導線32間の接続部の損傷を防ぐことが
できる。Further, instead of removing the insulating sheet 2 made of polyimide to form the holes, as shown in FIGS. 7 and 8, part of the portion close to the IC chip 33 is left by stepwise processing. May be. Even with such a shape, the partially left polyimide is subordinate to the thermal deformation of silicon of the IC chip 33 and prevents damage to the connection between the IC chip 33 and the bump 38 or between the bump 38 and the conductive wire 32. be able to.
【0037】また、本実施例ではエキシマレーザによ
り、孔34の加工を行ったが、炭酸ガスレーザ、YAG
レーザ、半導体レーザ等の他の光加工法、化学エッチン
グ法、フライス盤等による機械加工法等も使用可能であ
る。Further, in the present embodiment, the holes 34 are processed by the excimer laser, but carbon dioxide laser, YAG
Other optical processing methods such as a laser and a semiconductor laser, a chemical etching method, a mechanical processing method using a milling machine and the like can also be used.
【0038】[0038]
【発明の効果】以上説明したことから明らかなように、
請求項1の発明の回路基板では、各導線に対応するよう
に、ICチップの近傍の基板に、各々孔が形成されてい
るので、熱膨張によるICチップと基板との間の歪は、
この孔を跨ぐ部分の導線の伸縮によって吸収され、歪に
よる応力でICチップの端子と導線の接続が外れたり、
ずれたりすることを防止することができる。As is apparent from the above description,
In the circuit board of the invention of claim 1, since holes are formed in the board in the vicinity of the IC chip so as to correspond to the respective conducting wires, the strain between the IC chip and the board due to thermal expansion is
It is absorbed by the expansion and contraction of the conductive wire in the portion that straddles this hole, and the connection between the IC chip terminal and the conductive wire is disconnected due to stress due to strain.
It is possible to prevent shifting.
【0039】また、請求項2の回路基板の製造方法の発
明では、導線によってICチップを保持することによ
り、熱膨張による基板とICチップ間の歪を導線の伸縮
で吸収し、歪による応力で、導線とICチップの接続が
外れたり、ずれたりすることのない基板の製造が可能と
なる。Further, in the invention of the method for manufacturing a circuit board according to claim 2, by holding the IC chip by the conductive wire, the strain between the substrate and the IC chip due to thermal expansion is absorbed by the expansion and contraction of the conductive wire, and the stress caused by the strain is applied. It is possible to manufacture a substrate in which the conductor wire and the IC chip are not disconnected or displaced.
【0040】また、請求項3の回路基板の製造方法の発
明では、前記ICチップと接続される各導線に対応し
て、基板の絶縁性基材を、ICチップの近傍において各
々除去し、基板に孔を各々設けるので、当該基板の強度
を損なうことがなく、かつ、熱膨張による基板とICチ
ップ間の歪を孔を跨ぐ導線部分で吸収し、歪による応力
で、導線とICチップの接続が外れたり、ずれたりする
ことのない基板の製造が可能となる。Further, in the invention of the method for manufacturing a circuit board according to claim 3, the insulating base material of the substrate is removed in the vicinity of the IC chip in correspondence with each conductive wire connected to the IC chip, Since each of the holes is provided in the substrate, the strength of the substrate is not impaired, and the strain between the substrate and the IC chip due to thermal expansion is absorbed by the conductor wire portion that crosses the hole, and the stress due to the strain connects the conductor wire and the IC chip. It is possible to manufacture a substrate that does not come off or shift.
【0041】請求項4の回路基板の製造方法の発明で
は、レーザ光照射により絶縁性基材を除去しているの
で、絶縁性基材の除去が容易、確実にでき、導線を断線
させることがない。In the invention of the method for manufacturing a circuit board according to claim 4, since the insulating base material is removed by laser light irradiation, the insulating base material can be easily and surely removed, and the conductor wire can be disconnected. Absent.
【図1】本発明の一実施例である記録ヘッドを示す斜視
図である。FIG. 1 is a perspective view showing a recording head which is an embodiment of the present invention.
【図2】図1に示す記録ヘッドのICチップ載置部の付
近の拡大図である。FIG. 2 is an enlarged view of the vicinity of an IC chip mounting portion of the recording head shown in FIG.
【図3】図2に示す記録ヘッドのICチップ載置部の付
近の拡大図のA−A’線での断面図である。FIG. 3 is a cross-sectional view taken along the line AA ′ of the enlarged view of the vicinity of the IC chip mounting portion of the recording head shown in FIG.
【図4】本発明の一実施例である記録ヘッドの製造行程
を示す断面図である。FIG. 4 is a cross-sectional view showing the manufacturing process of the recording head according to the embodiment of the invention.
【図5】本発明の第二の実施例である記録ヘッドのIC
チップ載置部の付近の拡大図である。FIG. 5 is an IC of a recording head according to a second embodiment of the present invention.
It is an enlarged view of the vicinity of the chip mounting portion.
【図6】図5に示す記録ヘッドのICチップ載置部の付
近の拡大図のA−A’線に於ける断面図である。6 is a cross-sectional view taken along the line AA ′ of the enlarged view of the vicinity of the IC chip mounting portion of the recording head shown in FIG.
【図7】本発明の第三の実施例である記録ヘッドのIC
チップ載置部の付近の拡大図である。FIG. 7 is an IC of a recording head according to a third embodiment of the present invention.
It is an enlarged view of the vicinity of the chip mounting portion.
【図8】図5に示す記録ヘッドのICチップ載置部の付
近の拡大図のA−A’線に於ける断面図である。8 is a cross-sectional view taken along the line AA ′ of the enlarged view of the vicinity of the IC chip mounting portion of the recording head shown in FIG.
【図9】従来技術の記録ヘッドを示す斜視図である。FIG. 9 is a perspective view showing a conventional recording head.
【図10】図9に示す記録ヘッドのICチップ載置部の
付近の拡大図である。10 is an enlarged view of the vicinity of an IC chip mounting portion of the recording head shown in FIG.
【図11】図10に示す記録ヘッドのICチップ載置部
の付近の拡大図のA−A’線に於ける断面図である。11 is a cross-sectional view taken along the line AA ′ of the enlarged view of the vicinity of the IC chip mounting portion of the recording head shown in FIG.
1 アパチャ電極体 2 絶縁性シート 30 保持部材 32 導線 33 ICチップ 35 スリット部 34 孔 36 接続部 38 バンプ 1 Aperture electrode body 2 Insulating sheet 30 Holding member 32 Conductive wire 33 IC chip 35 Slit part 34 Hole 36 Connection part 38 Bump
Claims (4)
プと、 前記ICチップの近傍において、前記導線に対応して前
記基板に各々設けられた孔とを備えたことを特徴とする
回路基板。1. A substrate formed of an insulating base material, a conductor wire provided on the substrate, an IC chip mounted on the substrate and connected to the conductor wire, and in the vicinity of the IC chip. And a hole provided in each of the boards in correspondence with the conductor wire.
線を設ける行程と、 前記基板上の導線を設けた面にICチップを載置し、前
記導線とICチップを接続する行程と、 前記基板のICチップを載置していない側の面から前記
絶縁性基材を選択的に除去する行程とを設けたことを特
徴とする回路基板の製造方法。2. A step of providing a conductive wire on a substrate made of an insulating base material, a step of placing an IC chip on a surface of the substrate on which the conductive wire is provided, and connecting the conductive wire and the IC chip. And a step of selectively removing the insulating base material from the surface of the substrate on which the IC chip is not mounted, the method for manufacturing a circuit substrate.
では、前記ICチップと接続される各導線に対応して、
前記基板の絶縁性基材を、当該ICチップの近傍おい
て、各々除去することを特徴とする請求項2に記載の回
路基板の製造方法。3. In the step of selectively removing the insulating base material, corresponding to each conductive wire connected to the IC chip,
The method for manufacturing a circuit board according to claim 2, wherein the insulating base material of the board is removed in the vicinity of the IC chip.
ザ光照射であることを特徴とする請求項2または請求項
3に記載の回路基板の製造方法。4. The method of manufacturing a circuit board according to claim 2, wherein the means for removing the insulating base material is laser light irradiation.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21590594A JPH0883862A (en) | 1994-09-09 | 1994-09-09 | Circuit board and method for manufacturing circuit board |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21590594A JPH0883862A (en) | 1994-09-09 | 1994-09-09 | Circuit board and method for manufacturing circuit board |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0883862A true JPH0883862A (en) | 1996-03-26 |
Family
ID=16680200
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP21590594A Pending JPH0883862A (en) | 1994-09-09 | 1994-09-09 | Circuit board and method for manufacturing circuit board |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0883862A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009117607A (en) * | 2007-11-06 | 2009-05-28 | Shinko Electric Ind Co Ltd | Wiring board, semiconductor device, and method of manufacturing the same |
-
1994
- 1994-09-09 JP JP21590594A patent/JPH0883862A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009117607A (en) * | 2007-11-06 | 2009-05-28 | Shinko Electric Ind Co Ltd | Wiring board, semiconductor device, and method of manufacturing the same |
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