JPH0848725A - High-refractive index resin for optical material excellent in heat resistance - Google Patents
High-refractive index resin for optical material excellent in heat resistanceInfo
- Publication number
- JPH0848725A JPH0848725A JP18374094A JP18374094A JPH0848725A JP H0848725 A JPH0848725 A JP H0848725A JP 18374094 A JP18374094 A JP 18374094A JP 18374094 A JP18374094 A JP 18374094A JP H0848725 A JPH0848725 A JP H0848725A
- Authority
- JP
- Japan
- Prior art keywords
- refractive index
- vinylbiphenyl
- weight
- resin
- styrene
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229920005989 resin Polymers 0.000 title claims abstract description 26
- 239000011347 resin Substances 0.000 title claims abstract description 26
- 239000000463 material Substances 0.000 title claims abstract description 15
- 230000003287 optical effect Effects 0.000 title claims abstract description 15
- HDBWAWNLGGMZRQ-UHFFFAOYSA-N p-Vinylbiphenyl Chemical group C1=CC(C=C)=CC=C1C1=CC=CC=C1 HDBWAWNLGGMZRQ-UHFFFAOYSA-N 0.000 claims abstract description 46
- 239000000178 monomer Substances 0.000 claims abstract description 28
- 229920001577 copolymer Polymers 0.000 claims abstract description 6
- 229920000642 polymer Polymers 0.000 claims description 16
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 abstract description 40
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 abstract description 17
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 abstract description 12
- 229920002554 vinyl polymer Polymers 0.000 abstract description 8
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 abstract description 6
- 230000009477 glass transition Effects 0.000 abstract description 5
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 abstract 1
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 72
- 239000002994 raw material Substances 0.000 description 20
- 238000006116 polymerization reaction Methods 0.000 description 17
- 239000000243 solution Substances 0.000 description 15
- -1 acryl Chemical group 0.000 description 13
- 239000000203 mixture Substances 0.000 description 12
- 239000002904 solvent Substances 0.000 description 12
- 238000006243 chemical reaction Methods 0.000 description 11
- 229920006026 co-polymeric resin Polymers 0.000 description 10
- 239000003999 initiator Substances 0.000 description 8
- 239000011342 resin composition Substances 0.000 description 7
- IYMZEPRSPLASMS-UHFFFAOYSA-N 3-phenylpyrrole-2,5-dione Chemical compound O=C1NC(=O)C(C=2C=CC=CC=2)=C1 IYMZEPRSPLASMS-UHFFFAOYSA-N 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 5
- 238000007334 copolymerization reaction Methods 0.000 description 4
- 239000004926 polymethyl methacrylate Substances 0.000 description 4
- 150000003440 styrenes Chemical class 0.000 description 4
- KDGNCLDCOVTOCS-UHFFFAOYSA-N (2-methylpropan-2-yl)oxy propan-2-yl carbonate Chemical compound CC(C)OC(=O)OOC(C)(C)C KDGNCLDCOVTOCS-UHFFFAOYSA-N 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 230000000977 initiatory effect Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000012778 molding material Substances 0.000 description 3
- ZOKCNEIWFQCSCM-UHFFFAOYSA-N (2-methyl-4-phenylpent-4-en-2-yl)benzene Chemical compound C=1C=CC=CC=1C(C)(C)CC(=C)C1=CC=CC=C1 ZOKCNEIWFQCSCM-UHFFFAOYSA-N 0.000 description 2
- MEBONNVPKOBPEA-UHFFFAOYSA-N 1,1,2-trimethylcyclohexane Chemical compound CC1CCCCC1(C)C MEBONNVPKOBPEA-UHFFFAOYSA-N 0.000 description 2
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 2
- HIDBROSJWZYGSZ-UHFFFAOYSA-N 1-phenylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1=CC=CC=C1 HIDBROSJWZYGSZ-UHFFFAOYSA-N 0.000 description 2
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- ZZLCFHIKESPLTH-UHFFFAOYSA-N 4-Methylbiphenyl Chemical group C1=CC(C)=CC=C1C1=CC=CC=C1 ZZLCFHIKESPLTH-UHFFFAOYSA-N 0.000 description 2
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 2
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 2
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 238000001746 injection moulding Methods 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- ADFPJHOAARPYLP-UHFFFAOYSA-N methyl 2-methylprop-2-enoate;styrene Chemical compound COC(=O)C(C)=C.C=CC1=CC=CC=C1 ADFPJHOAARPYLP-UHFFFAOYSA-N 0.000 description 2
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 2
- 239000003607 modifier Substances 0.000 description 2
- 229930003658 monoterpene Natural products 0.000 description 2
- 150000001451 organic peroxides Chemical class 0.000 description 2
- WRAQQYDMVSCOTE-UHFFFAOYSA-N phenyl prop-2-enoate Chemical compound C=CC(=O)OC1=CC=CC=C1 WRAQQYDMVSCOTE-UHFFFAOYSA-N 0.000 description 2
- OJMIONKXNSYLSR-UHFFFAOYSA-N phosphorous acid Chemical compound OP(O)O OJMIONKXNSYLSR-UHFFFAOYSA-N 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 239000003505 polymerization initiator Substances 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- 239000011593 sulfur Substances 0.000 description 2
- KYPOHTVBFVELTG-OWOJBTEDSA-N (e)-but-2-enedinitrile Chemical compound N#C\C=C\C#N KYPOHTVBFVELTG-OWOJBTEDSA-N 0.000 description 1
- KYPOHTVBFVELTG-UPHRSURJSA-N (z)-but-2-enedinitrile Chemical compound N#C\C=C/C#N KYPOHTVBFVELTG-UPHRSURJSA-N 0.000 description 1
- XIRPMPKSZHNMST-UHFFFAOYSA-N 1-ethenyl-2-phenylbenzene Chemical group C=CC1=CC=CC=C1C1=CC=CC=C1 XIRPMPKSZHNMST-UHFFFAOYSA-N 0.000 description 1
- SRQOBNUBCLPPPH-UHFFFAOYSA-N 1-ethyl-4-phenylbenzene Chemical group C1=CC(CC)=CC=C1C1=CC=CC=C1 SRQOBNUBCLPPPH-UHFFFAOYSA-N 0.000 description 1
- LVUDMQWOFGGAFN-UHFFFAOYSA-N 1-phenylpyrrole-2,5-dione;prop-2-enenitrile;styrene Chemical compound C=CC#N.C=CC1=CC=CC=C1.O=C1C=CC(=O)N1C1=CC=CC=C1 LVUDMQWOFGGAFN-UHFFFAOYSA-N 0.000 description 1
- IGGDKDTUCAWDAN-UHFFFAOYSA-N 1-vinylnaphthalene Chemical compound C1=CC=C2C(C=C)=CC=CC2=C1 IGGDKDTUCAWDAN-UHFFFAOYSA-N 0.000 description 1
- YAJYJWXEWKRTPO-UHFFFAOYSA-N 2,3,3,4,4,5-hexamethylhexane-2-thiol Chemical compound CC(C)C(C)(C)C(C)(C)C(C)(C)S YAJYJWXEWKRTPO-UHFFFAOYSA-N 0.000 description 1
- AVTLBBWTUPQRAY-UHFFFAOYSA-N 2-(2-cyanobutan-2-yldiazenyl)-2-methylbutanenitrile Chemical compound CCC(C)(C#N)N=NC(C)(CC)C#N AVTLBBWTUPQRAY-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 1
- SBYMUDUGTIKLCR-UHFFFAOYSA-N 2-chloroethenylbenzene Chemical compound ClC=CC1=CC=CC=C1 SBYMUDUGTIKLCR-UHFFFAOYSA-N 0.000 description 1
- OYUNTGBISCIYPW-UHFFFAOYSA-N 2-chloroprop-2-enenitrile Chemical compound ClC(=C)C#N OYUNTGBISCIYPW-UHFFFAOYSA-N 0.000 description 1
- FAVWXKQADKRESO-UHFFFAOYSA-N 2-methylprop-2-enoic acid;prop-1-ene Chemical compound CC=C.CC(=C)C(O)=O FAVWXKQADKRESO-UHFFFAOYSA-N 0.000 description 1
- IKEHOXWJQXIQAG-UHFFFAOYSA-N 2-tert-butyl-4-methylphenol Chemical compound CC1=CC=C(O)C(C(C)(C)C)=C1 IKEHOXWJQXIQAG-UHFFFAOYSA-N 0.000 description 1
- NXAFRGRYHSKXJB-UHFFFAOYSA-N 2-tert-butylperoxy-3,5,5-trimethylhexanoic acid Chemical compound CC(C)(C)CC(C)C(C(O)=O)OOC(C)(C)C NXAFRGRYHSKXJB-UHFFFAOYSA-N 0.000 description 1
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 1
- NFWPZNNZUCPLAX-UHFFFAOYSA-N 4-methoxy-3-methylaniline Chemical compound COC1=CC=C(N)C=C1C NFWPZNNZUCPLAX-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- XNYIZUGABQUVDC-UHFFFAOYSA-N C(=C)C1=CC2=CC=CC=C2C=C1.C(C(=C)C)(=O)OC.CC(=C)C1=CC=CC=C1 Chemical compound C(=C)C1=CC2=CC=CC=C2C=C1.C(C(=C)C)(=O)OC.CC(=C)C1=CC=CC=C1 XNYIZUGABQUVDC-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- YIVJZNGAASQVEM-UHFFFAOYSA-N Lauroyl peroxide Chemical compound CCCCCCCCCCCC(=O)OOC(=O)CCCCCCCCCCC YIVJZNGAASQVEM-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical class CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- GYCMBHHDWRMZGG-UHFFFAOYSA-N Methylacrylonitrile Chemical compound CC(=C)C#N GYCMBHHDWRMZGG-UHFFFAOYSA-N 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- MOYAFQVGZZPNRA-UHFFFAOYSA-N Terpinolene Chemical compound CC(C)=C1CCC(C)=CC1 MOYAFQVGZZPNRA-UHFFFAOYSA-N 0.000 description 1
- YMOONIIMQBGTDU-VOTSOKGWSA-N [(e)-2-bromoethenyl]benzene Chemical compound Br\C=C\C1=CC=CC=C1 YMOONIIMQBGTDU-VOTSOKGWSA-N 0.000 description 1
- KYIKRXIYLAGAKQ-UHFFFAOYSA-N abcn Chemical compound C1CCCCC1(C#N)N=NC1(C#N)CCCCC1 KYIKRXIYLAGAKQ-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 229920001893 acrylonitrile styrene Polymers 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 239000012752 auxiliary agent Substances 0.000 description 1
- GCTPMLUUWLLESL-UHFFFAOYSA-N benzyl prop-2-enoate Chemical compound C=CC(=O)OCC1=CC=CC=C1 GCTPMLUUWLLESL-UHFFFAOYSA-N 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- KBLWLMPSVYBVDK-UHFFFAOYSA-N cyclohexyl prop-2-enoate Chemical compound C=CC(=O)OC1CCCCC1 KBLWLMPSVYBVDK-UHFFFAOYSA-N 0.000 description 1
- 230000003412 degenerative effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 239000012933 diacyl peroxide Substances 0.000 description 1
- WNAHIZMDSQCWRP-UHFFFAOYSA-N dodecane-1-thiol Chemical compound CCCCCCCCCCCCS WNAHIZMDSQCWRP-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 238000004945 emulsification Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- LNCPIMCVTKXXOY-UHFFFAOYSA-N hexyl 2-methylprop-2-enoate Chemical compound CCCCCCOC(=O)C(C)=C LNCPIMCVTKXXOY-UHFFFAOYSA-N 0.000 description 1
- LNMQRPPRQDGUDR-UHFFFAOYSA-N hexyl prop-2-enoate Chemical compound CCCCCCOC(=O)C=C LNMQRPPRQDGUDR-UHFFFAOYSA-N 0.000 description 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 1
- PBOSTUDLECTMNL-UHFFFAOYSA-N lauryl acrylate Chemical compound CCCCCCCCCCCCOC(=O)C=C PBOSTUDLECTMNL-UHFFFAOYSA-N 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 150000002689 maleic acids Chemical class 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- NEHSDFGBKFTKLJ-UHFFFAOYSA-N methyl 2-methylprop-2-enoate;prop-1-en-2-ylbenzene Chemical compound COC(=O)C(C)=C.CC(=C)C1=CC=CC=C1 NEHSDFGBKFTKLJ-UHFFFAOYSA-N 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229930014626 natural product Natural products 0.000 description 1
- KZCOBXFFBQJQHH-UHFFFAOYSA-N octane-1-thiol Chemical compound CCCCCCCCS KZCOBXFFBQJQHH-UHFFFAOYSA-N 0.000 description 1
- 229940065472 octyl acrylate Drugs 0.000 description 1
- ANISOHQJBAQUQP-UHFFFAOYSA-N octyl prop-2-enoate Chemical compound CCCCCCCCOC(=O)C=C ANISOHQJBAQUQP-UHFFFAOYSA-N 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 1
- LGOPTUPXVVNJFH-UHFFFAOYSA-N pentadecanethioic s-acid Chemical compound CCCCCCCCCCCCCCC(O)=S LGOPTUPXVVNJFH-UHFFFAOYSA-N 0.000 description 1
- GYDSPAVLTMAXHT-UHFFFAOYSA-N pentyl 2-methylprop-2-enoate Chemical compound CCCCCOC(=O)C(C)=C GYDSPAVLTMAXHT-UHFFFAOYSA-N 0.000 description 1
- ULDDEWDFUNBUCM-UHFFFAOYSA-N pentyl prop-2-enoate Chemical compound CCCCCOC(=O)C=C ULDDEWDFUNBUCM-UHFFFAOYSA-N 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- QIWKUEJZZCOPFV-UHFFFAOYSA-N phenyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=CC=C1 QIWKUEJZZCOPFV-UHFFFAOYSA-N 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- SCUZVMOVTVSBLE-UHFFFAOYSA-N prop-2-enenitrile;styrene Chemical compound C=CC#N.C=CC1=CC=CC=C1 SCUZVMOVTVSBLE-UHFFFAOYSA-N 0.000 description 1
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- JAYKPAAGOYELFD-UHFFFAOYSA-N tris(2,4-ditert-butylphenyl)phosphane Chemical compound CC(C)(C)C1=CC(C(C)(C)C)=CC=C1P(C=1C(=CC(=CC=1)C(C)(C)C)C(C)(C)C)C1=CC=C(C(C)(C)C)C=C1C(C)(C)C JAYKPAAGOYELFD-UHFFFAOYSA-N 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
Landscapes
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は光学材料用ビニル系樹脂
に関するものであり、詳しくは、4-ビニルビフェニルを
ビニル系重合体主鎖に組み込むことにより、製品品質面
において屈折率と耐熱性に優れた光学材料用樹脂を提供
することである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a vinyl-based resin for optical materials. More specifically, by incorporating 4-vinylbiphenyl into a vinyl-based polymer main chain, it is possible to improve the refractive index and heat resistance in terms of product quality. An object is to provide an excellent resin for optical materials.
【0002】[0002]
【従来の技術】ビニル系樹脂は、家電,雑貨,自動車等多
岐にわたり使用され、我々の生活になくてはならない材
料の1つである。光学材料分野でもビニル系樹脂の用途
は広く、プラスチックレンズ,プリズム等に使用されてい
る。そのなかでも特に、ポリメチルメタクリレート樹脂
(PMMA樹脂)はその透明性,表面硬度,耐熱性,屈折率に
より光学用途,透明性成形材料として利用されている。
これらのビニル系樹脂の利用分野の要望により、耐熱性
と屈折率を更に向上させることが望まれている。そこ
で、メタクリル酸メチルにスチレンを共重合させたメタ
クリル酸メチル-スチレン樹脂(MS樹脂)が使われてい
る。2. Description of the Related Art Vinyl resins are widely used in home appliances, sundries, automobiles, etc., and are one of the essential materials in our daily lives. Vinyl resins are also widely used in the field of optical materials, and are used for plastic lenses, prisms and the like. Among them, especially polymethylmethacrylate resin
Due to its transparency, surface hardness, heat resistance, and refractive index, (PMMA resin) is used for optical applications and as a transparent molding material.
It is desired to further improve the heat resistance and the refractive index according to the demands of the fields of application of these vinyl resins. Therefore, a methyl methacrylate-styrene resin (MS resin) obtained by copolymerizing styrene with methyl methacrylate is used.
【0003】[0003]
【発明が解決しようとしている課題】MS樹脂はPMMA樹脂
よりも安価でかつ屈折率が高く成形性に優れているが、
耐熱性と表面硬度に難が有り、大型プロジェクションテ
レビのフルネルレンズ等の大型光学用成形材料分野から
の改良の要望は尽きない。成形材料の大型薄肉軽量化と
収差の抑制,除去がレンズ設計において最大のポイント
であり、このためには屈折率の高い材料が必要である。
また、屈折率の温度安定性も必要であり、ガラス転移温
度(耐熱性)が高く線膨張係数が小さい材料が望まれてい
る。[Problems to be Solved by the Invention] Although MS resin is cheaper than PMMA resin and has a high refractive index and excellent moldability,
Due to its poor heat resistance and surface hardness, there is no end to the demand for improvements in the field of large-sized optical molding materials such as the full-nel lens of large-screen projection TVs. The biggest points in lens design are the reduction in the size and weight of molding materials, and the suppression and elimination of aberrations. To this end, materials with a high refractive index are required.
Further, temperature stability of the refractive index is also required, and a material having a high glass transition temperature (heat resistance) and a small linear expansion coefficient is desired.
【0004】[0004]
【課題を解決するための手段】本発明者らは、以上の現
状にかんがみ、研究の結果、耐熱性と高屈折率を与える
本発明をするに至った。すなわち、本発明は、 4-ビニ
ルビフェニルとラジカル重合可能な単量体の単独もしく
は複数種を共重合させることにより得られた共重合体か
らなることを特徴とする耐熱性に優れた光学材料用高屈
折率樹脂に関するものである。又樹脂総量の10重量%以
上90重量%以下の範囲内で4-ビニルビフェニル重合体を
含有する耐熱性に優れた光学材料用高屈折率樹脂であ
る。SUMMARY OF THE INVENTION In view of the above circumstances, the present inventors have conducted research and as a result have made the present invention which provides heat resistance and a high refractive index. That is, the present invention is for an optical material having excellent heat resistance, which is characterized by comprising a copolymer obtained by copolymerizing 4-vinylbiphenyl and a radical-polymerizable monomer, alone or in combination. The present invention relates to a high refractive index resin. Further, it is a high-refractive-index resin for optical materials having excellent heat resistance, which contains a 4-vinylbiphenyl polymer within a range of 10% by weight or more and 90% by weight or less of the total amount of the resin.
【0005】本発明に於いて使用する4-ビニルビフェニ
ルは、融点が121℃の粉末結晶であり、製造の際若干
の4-エチルビフェニル,4-メチルビフェニル等のアルキ
ルビフェニルの不純物を含むが、これらは全体の10重量
%以下であることが好ましく5重量%以下であることが
特に好ましい。これら不純物はレンズ等の成形体にした
後経時的に溶出しレンズ表面が曇ったり、汚れたり耐候
性を阻害する因子となる。また、レンズの表面処理にお
いてハードコーティングやマルチコーティングの均一性
を欠き、処理層の剥離現象を招く原因となるので極力少
ないほうが良い。4-ビニルビフェニルの原料単量体総量
にたいする配合量は特に限定するものではなく、通常は
原料単量体総量の0.05重量%以上あれば良いが、特に産
業用光学レンズの耐熱グレードとしてメチルメタクリレ
ート樹脂(PMMA)以上のガラス転移温度(Tg)を基準にする
と、Tg≧107℃を得るためには、Tgの低いスチレンを共
重合の単量体とした場合には4-ビニルビフェニルを原料
単量体総量の10重量%以上90重量%以下が好ましく、高
屈折率性付与を考慮すると原料単量体総量の15重量%以
上80重量%以下の範囲内が更に好ましい。The 4-vinylbiphenyl used in the present invention is a powder crystal having a melting point of 121 ° C. and contains some alkylbiphenyl impurities such as 4-ethylbiphenyl and 4-methylbiphenyl during the production. These are preferably 10% by weight or less, and particularly preferably 5% by weight or less based on the whole. These impurities elute over time after forming a molded article such as a lens, and become a factor that obstructs the lens surface such as clouding, dirt, and weather resistance. In addition, the uniformity of hard coating or multi-coating is lacked in the surface treatment of the lens, which may cause the phenomenon of peeling of the treatment layer, so it is preferable that the amount is as small as possible. The compounding amount of 4-vinylbiphenyl with respect to the total amount of the raw material monomers is not particularly limited, and usually 0.05% by weight or more of the total amount of the raw material monomers is sufficient, but especially methyl methacrylate resin is used as a heat-resistant grade for industrial optical lenses. Based on the glass transition temperature (Tg) of (PMMA) or higher, in order to obtain Tg ≧ 107 ° C., 4-vinylbiphenyl is used as a starting material when styrene with a low Tg is used as a copolymerization monomer. It is preferably 10% by weight or more and 90% by weight or less of the total amount of the body, and more preferably 15% by weight or more and 80% by weight or less of the total amount of the raw material monomers in consideration of imparting high refractive index.
【0006】ここで4-ビニルビフェニルとラジカル重合
可能な単量体とは、スチレン等の芳香族ビニル系単量
体,アクリロニトリル等のシアン化ビニル系単量体,メチ
ルメタクリレート等の(メタ)アクリル酸エステル類,
その他の単量体類である。かかる単量体を単独もしくは
任意の複数種に組み合せて4-ビニルビフェニルと共重合
させることができる。Here, 4-vinylbiphenyl and a radical-polymerizable monomer are aromatic vinyl monomers such as styrene, vinyl cyanide monomers such as acrylonitrile, and (meth) acryl such as methyl methacrylate. Acid Ester,
Other monomers. These monomers may be copolymerized alone or in any combination of plural kinds with 4-vinylbiphenyl.
【0007】詳しくは芳香族ビニル系単量体として、ス
チレン、α-メチルスチレン等の側鎖アルキル置換スチ
レン,ビニルトルエン等の核アルキル置換スチレン,ブロ
モスチレン、クロルスチレン等のハロゲン化スチレン,
ジビニルベンゼン、ビニルナフタレン等をあげることが
できる。シアン化ビニル系単量体としては、アクリロニ
トリル、メタクリロニトリル,フマロニトリル,マレオニ
トリル,α-クロロアクリロニトリル等をあげることがで
きる。(メタ)アクリル酸エステル類としては、メチル
メタクリレート、エチルメタクリレート,プロピレンメ
タクリレート,ブチルメタクリレート,アミルメタクリレ
ート,ヘキシルメタクリレート,フェニルメタクリレー
ト、メチルアクリレート,エチルアクリレート,アミルア
クリレート,ヘキシルアクリレート,オクチルアクリレー
ト,2-エチルヘキシルアクリレート,シクロヘキシルアク
リレート,ドデシルアクリレート,フェニルアクリレー
ト,ベンジルアクリレート等である。Specifically, as aromatic vinyl monomers, side chain alkyl-substituted styrenes such as styrene and α-methylstyrene, nuclear alkyl-substituted styrenes such as vinyltoluene, halogenated styrenes such as bromostyrene and chlorostyrene,
Examples include divinylbenzene and vinylnaphthalene. Examples of vinyl cyanide-based monomers include acrylonitrile, methacrylonitrile, fumaronitrile, maleonitrile, α-chloroacrylonitrile and the like. (Meth) acrylic acid esters include methyl methacrylate, ethyl methacrylate, propylene methacrylate, butyl methacrylate, amyl methacrylate, hexyl methacrylate, phenyl methacrylate, methyl acrylate, ethyl acrylate, amyl acrylate, hexyl acrylate, octyl acrylate, 2-ethylhexyl acrylate. , Cyclohexyl acrylate, dodecyl acrylate, phenyl acrylate, benzyl acrylate, etc.
【0008】その他の単量体としては、マレイン酸,マ
レイン酸エステル類,イタコン酸およびイタコン酸エス
テル類,N-アルキルマレイミド類,N-フェニルマレイミド
(PMI)類等の各種重合性単量体が利用できる。上記した単
量体に塩素,臭素,ヨウ素,等のハロゲン基,硫黄等を導入
した誘導体も屈折率向上の手段として有効に利用でき
る。Other monomers include maleic acid, maleic acid esters, itaconic acid and itaconic acid esters, N-alkylmaleimides, N-phenylmaleimide.
Various polymerizable monomers such as (PMI) s can be used. Derivatives obtained by introducing a halogen group such as chlorine, bromine or iodine, or sulfur into the above-mentioned monomers can also be effectively used as a means for improving the refractive index.
【0009】本発明の共重合体の製造においては、重合
の際、予めラジカル重合可能な単量体に,必要に応じて
重合開始剤,分子量調節剤,溶媒その他の重合助剤等と同
時に該4-ビニルビフェニルを所定量添加配合する。重
合方法自体は、懸濁,乳化,溶液、塊状等のバッチ重合あ
るいは連続重合方式等に適するが、融点以上の温度で4
-ビニルビフェニルを重合系にメルトフイードしたり、
重合単量体等に溶解して重合系にフイードしてもよく、
プロセスへの適用範囲は広い。In the production of the copolymer of the present invention, at the time of polymerization, a radically polymerizable monomer is preliminarily added, if necessary, together with a polymerization initiator, a molecular weight modifier, a solvent and other polymerization auxiliary agents. 4-vinyl biphenyl is added and blended in a predetermined amount. The polymerization method itself is suitable for batch polymerization such as suspension, emulsification, solution, and bulk, or continuous polymerization, but at a temperature above the melting point.
-Melt-feed vinyl biphenyl to the polymerization system,
It may be dissolved in a polymerized monomer or the like and fed to the polymerization system,
It has wide application to the process.
【0010】上記したラジカル重合可能な単量体の一種
又は二種以上と4-ビニルビフェニルの重合開始方法は
熱開始と開始剤開始のどちらでもよい。開始剤開始の場
合の重合開始剤は、有機過酸化物やアゾ系化合物等のど
ちらでもよい。ここで有機過酸化物としては、例えばt-
ヘキシルパーオキシイソプロピルモノカーボネート、t-
ヘキシルパーオキシ-2-エチルヘキサノエート、t-ブチル
パーオキシ-3.5.5-トリメチルヘキサノエート、t-ブチル
パーオキシイソプロピルカーボネート類等のパーオキシ
エステル類、1,1-ビス(t-ヘキシルパーオキシ)3,3,5-
トリメチルシクロヘキサン等のパーオキシケタール類、
ラウロイルパーオキサイド等のジアシルパーオキサイド
類等を挙げることができる。またアゾ系化合物の開始剤
としては、例えば2,2'-アゾビスイソブチロニトリルや、
2,2'-アゾビス(2-メチルブチロニトリル)、1,1'-アゾビ
ス(シクロヘキサン-1-カーボニトリル)等のアゾニトリ
ル類を挙げることができる。開始剤の半減期温度はT1(1
時間半減期温度)が80℃から120℃程度が好ましく、重合
温度はT1+5℃から20℃程度が好ましい。開始剤の架橋効
率はプロセスの特異性、他の架橋剤や添加剤との併用の
場合等を考慮して選択する必要がある。いずれの場合も
特に限定はしない。The polymerization initiation method for 4-vinylbiphenyl and one or more of the above radical-polymerizable monomers may be either thermal initiation or initiator initiation. When the initiator is initiated, the polymerization initiator may be either an organic peroxide or an azo compound. Here, as the organic peroxide, for example, t-
Hexyl peroxyisopropyl monocarbonate, t-
Hexyl peroxy-2-ethylhexanoate, t-butylperoxy-3.5.5-trimethylhexanoate, peroxyesters such as t-butylperoxyisopropyl carbonate, 1,1-bis (t-hexyl) Peroxy) 3,3,5-
Peroxyketals such as trimethylcyclohexane,
Examples thereof include diacyl peroxides such as lauroyl peroxide. The initiator of the azo compound, for example, 2,2'-azobisisobutyronitrile,
Examples thereof include azonitriles such as 2,2'-azobis (2-methylbutyronitrile) and 1,1'-azobis (cyclohexane-1-carbonitrile). The half-life temperature of the initiator is T 1 (1
The time half-life temperature) is preferably about 80 ° C to 120 ° C, and the polymerization temperature is preferably T 1 + 5 ° C to about 20 ° C. The crosslinking efficiency of the initiator needs to be selected in consideration of the specificity of the process and the case of using it in combination with other crosslinking agents and additives. In any case, there is no particular limitation.
【0011】更にこれら樹脂を得る際適宜配合させる分
子量調節剤は、t-ドデシルメルカプタン、n-ドデシルメル
カプタン、n-オクチルメルカプタン等のメルカプタン類、
1-メチル-4-イソプロピリデンシクロヘキセン等のモノ
テルペノイド類、2,4-ジフェニル-4-メチル-1-ペンテン
等のスチレンダイマー類を挙げることができる。但しメ
ルカプタン類は臭気の欠点を持ち、モノテルペノイド類
は天然物であり不純物を多く含むこともあり、色相悪化
の懸念がある。2,4-ジフェニル-4-メチル-1-ペンテン等
は、重合温度によっては退化的連鎖移動をするため転化
率が上がらず生産性悪化の原因になる可能性がある。い
ずれの分子量調節剤もこれらの特徴を把握した上で選択
する必要がある。いずれの場合もとくに限定はされない。Further, molecular weight regulators to be appropriately blended when obtaining these resins are mercaptans such as t-dodecyl mercaptan, n-dodecyl mercaptan and n-octyl mercaptan,
Mention may be made of monoterpenoids such as 1-methyl-4-isopropylidenecyclohexene and styrene dimers such as 2,4-diphenyl-4-methyl-1-pentene. However, mercaptans have a drawback of odor, and monoterpenoids are natural products and may contain a large amount of impurities, which may cause deterioration of hue. 2,4-diphenyl-4-methyl-1-pentene and the like undergo degenerative chain transfer depending on the polymerization temperature, and thus the conversion rate does not increase and may cause deterioration of productivity. It is necessary to select any molecular weight regulator after grasping these characteristics. In either case, there is no particular limitation.
【0012】また重合に際しては、光学材料用として期
待される用途に応じて、n-オクタデシル-3-(3,5-ジ-t-ブ
チル-4-ヒドロキシフェニル)プロピオネート , 2,6-ジ-
t-ブチル-4-メチルフェノール等のヒンダードフェノー
ル系,トリスノニルフェニルフォスファイト, トリス(2,
4-ジ-t-ブチルフェニル) フォスファイト等のリン系,ペ
ンタエリスリチル テトラキス(3-ラウリルチオプロピオ
ネート)等の硫黄系,2-[1-(2-ヒドロキシ-3,5-ジ-t-ペン
チルフェニル)エチル]-4,6-ジ-t-ペンチルフェニルアク
リレート等のフェノールアクリレート系の酸化防止剤等
を添加してもよい。また、メチルエチルケトンやエチル
ベンゼンなどの溶媒、紫外線吸収剤、着色防止剤、帯電防
止剤、蛍光塗料、離型剤、その他安定剤等を添加して利用
してもよい。得られた樹脂は、射出成型方法や押出成型
法等を利用して任意の光学材料用成型体を製造すること
ができる。本発明を更に具体的に説明するために、以下
に実施例及び比較例を示した。In the polymerization, n-octadecyl-3- (3,5-di-t-butyl-4-hydroxyphenyl) propionate and 2,6-di-, depending on the use expected for optical materials.
hindered phenols such as t-butyl-4-methylphenol, trisnonylphenyl phosphite, tris (2,
4-di-t-butylphenyl) phosphorus such as phosphite, sulfur such as pentaerythrityl tetrakis (3-laurylthiopropionate), 2- [1- (2-hydroxy-3,5-di- A phenol acrylate-based antioxidant such as t-pentylphenyl) ethyl] -4,6-di-t-pentylphenyl acrylate may be added. Also, a solvent such as methyl ethyl ketone or ethyl benzene, an ultraviolet absorber, an anti-coloring agent, an antistatic agent, a fluorescent paint, a release agent, and other stabilizers may be added and used. The resin thus obtained can be used to manufacture a molded body for any optical material by using an injection molding method, an extrusion molding method, or the like. In order to more specifically describe the present invention, examples and comparative examples are shown below.
【0013】[0013]
【実施例】本発明の実施形態を説明する。重合単量体,
溶媒 ,分子量調節剤,開始剤その他添加剤からなる原料
仕込み液を熱交換器,撹拌翼と温度調節機能を具備する1
000ccのセパラブルフラスコに仕込み所定の時間重合さ
せる。得られた重合物溶液を真空乾燥器に入れ200℃,フ
ルバキュームで2時間処理し樹脂を得た。得られた樹脂
を東芝機械J-15射出成形機にて成形温度200℃で、肉厚
4.0mm、長さ76.2mm、幅50.8mmのカラープレートを成形
する。このプレートを肉厚2.0mm、長さ5.0mm、幅10.0mm
に切削し表面を研磨後、(株)アタゴ製のアッベ屈折計に
て25℃で屈折率を測定した。また、Du-Pont製熱走査熱
量計(DSC)にて樹脂組成物のガラス転移温度(Tg)を測定
した。測定方法は5℃/min.の昇温速度で室温から200℃
まで昇温し、熱エネルギー吸収カーブの初めの変極点を
Tgとして測定した。Embodiments of the present invention will be described. Polymerized Monomer,
A raw material charge liquid consisting of solvent, molecular weight modifier, initiator and other additives is equipped with heat exchanger, stirring blade and temperature control function 1.
Place in a 000 cc separable flask and polymerize for a predetermined time. The obtained polymer solution was placed in a vacuum dryer and treated at 200 ° C. for 2 hours under full vacuum to obtain a resin. The obtained resin was molded by Toshiba Machine J-15 injection molding machine at molding temperature of 200 ℃
A color plate with a length of 4.0 mm, a length of 76.2 mm and a width of 50.8 mm is molded. This plate has a wall thickness of 2.0 mm, length of 5.0 mm, width of 10.0 mm
After cutting into pieces and polishing the surface, the refractive index was measured at 25 ° C. with an Abbe refractometer manufactured by Atago Co., Ltd. Further, the glass transition temperature (Tg) of the resin composition was measured with a Du-Pont thermal scanning calorimeter (DSC). The measurement method is from room temperature to 200 ° C at a heating rate of 5 ° C / min.
Up to the first inflection point of the heat energy absorption curve
It was measured as Tg.
【0014】[0014]
【実施例1】スチレン(St)と4-ビニルビフェニル(VBP)
の共重合を行った。溶媒にメチルエチルケトン(MEK)を
使用した。原料の組成比率(重量部)はSt/VBPがそれぞれ
90/10である。単量体原料総量に対しMEKを40重量部,t-
ブチルパーオキシ-3.5.5-トリメチルヘキサノエート(ト
リゴノックス42:化薬アクゾ製)を350ppm添加し、重合温
度125℃にて転化率100重量%程度まで反応させスチレン
-4-ビニルビフェニル共重合樹脂を得た。得られた重合
溶液を前述の処理を施した後カラープレートを成形して
屈折率とTgを測定した結果を表1にまとめた。Example 1 Styrene (St) and 4-vinylbiphenyl (VBP)
Was copolymerized. Methyl ethyl ketone (MEK) was used as the solvent. St / VBP is the composition ratio (parts by weight) of the raw materials.
90/10. 40 parts by weight of MEK, t-
Butyl peroxy-3.5.5-trimethylhexanoate (Trigonox 42: manufactured by Kayaku Akzo) was added at 350 ppm and reacted at a polymerization temperature of 125 ° C until a conversion rate of about 100% by weight was reached.
-4-Vinylbiphenyl copolymer resin was obtained. The obtained polymerization solution was subjected to the above-mentioned treatment, and then a color plate was molded to measure the refractive index and Tg.
【0015】[0015]
【実施例2】スチレン(St)と4-ビニルビフェニル(VBP)
の共重合を行った。原料の組成比率(重量部)はSt/VBPが
それぞれ60/40である以外は実施例1と同様とした。得ら
れた重合物溶液を前述の処理を施した後カラープレート
を成形して屈折率とTgを測定した結果を表1にまとめ
た。Example 2 Styrene (St) and 4-vinyl biphenyl (VBP)
Was copolymerized. The composition ratio (parts by weight) of the raw materials was the same as in Example 1 except that the St / VBP was 60/40, respectively. The obtained polymer solution was subjected to the above-mentioned treatment, and then a color plate was molded to measure the refractive index and Tg.
【0016】[0016]
【実施例3】スチレン(St)と4-ビニルビフェニル(VBP)
の共重合を行った。原料の組成比率(重量部)はSt/VBPが
それぞれ40/60である以外は実施例1と同様とした。得ら
れた重合物溶液を前述の処理を施した後カラープレート
を成形して屈折率とTgを測定した結果を表1にまとめ
た。Example 3 Styrene (St) and 4-vinyl biphenyl (VBP)
Was copolymerized. The composition ratio (parts by weight) of the raw materials was the same as in Example 1 except that the St / VBP was 40/60, respectively. The obtained polymer solution was subjected to the above-mentioned treatment, and then a color plate was molded to measure the refractive index and Tg.
【0017】[0017]
【実施例4】スチレン(St)と4-ビニルビフェニル(VBP)
の共重合を行った。原料の組成比率(重量部)はSt/VBPが
それぞれ20/80である以外は実施例1と同様とした。得ら
れた重合物溶液を前述の処理を施した後カラープレート
を成形して屈折率とTgを測定した結果を表1にまとめ
た。Example 4 Styrene (St) and 4-vinyl biphenyl (VBP)
Was copolymerized. The composition ratio (parts by weight) of the raw materials was the same as in Example 1 except that the St / VBP was 20/80, respectively. The obtained polymer solution was subjected to the above-mentioned treatment, and then a color plate was molded to measure the refractive index and Tg.
【0018】[0018]
【比較例1】スチレン(St)を100重量部,4-ビニルビフェ
ニル(VBP)を添加しないこと以外は実施例1と同様とし
た。得られた重合物溶液を前述の処理を施した後カラー
プレートを成形して屈折率とTgを測定した結果を表1に
まとめた。[Comparative Example 1] The same procedure as in Example 1 was carried out except that 100 parts by weight of styrene (St) and 4-vinylbiphenyl (VBP) were not added. The obtained polymer solution was subjected to the above-mentioned treatment, and then a color plate was molded to measure the refractive index and Tg.
【0019】[0019]
【実施例5】メチルメタクリレート(MMA),スチレン(S
t),4-ビニルビフェニル(VBP)の三元共重合を行った。溶
媒にメチルエチルケトン(MEK)を用いた。原料組成比率
は、MMA/St/VBPの重量比率をそれぞれ60/25/15とし重合
温度は125℃、単量体原料総量に対しMEKを40重量部,開
始剤にt-ブチルパーオキシイソプロピルカーボネート
(パーブチルI:日本油脂製)を400ppm添加した。転化率10
0重量%程度まで反応させメチルメタクリレート-スチレ
ン-4-ビニルビフェニル共重合樹脂を得た。得られた重
合物溶液を前述の処理を施した後カラープレートを成形
して屈折率とTgを測定した結果を表1にまとめた。[Example 5] Methyl methacrylate (MMA), styrene (S
Terpolymerization of t), 4-vinylbiphenyl (VBP) was performed. Methyl ethyl ketone (MEK) was used as the solvent. The raw material composition ratio was MMA / St / VBP weight ratio of 60/25/15, the polymerization temperature was 125 ° C, MEK was 40 parts by weight based on the total amount of monomer raw materials, and t-butylperoxyisopropyl carbonate was used as an initiator.
(Perbutyl I: manufactured by NOF CORPORATION) was added at 400 ppm. Conversion rate 10
The reaction was carried out to about 0% by weight to obtain a methylmethacrylate-styrene-4-vinylbiphenyl copolymer resin. The obtained polymer solution was subjected to the above-mentioned treatment, and then a color plate was molded to measure the refractive index and Tg.
【0020】[0020]
【比較例2】4-ビニルビフェニル(VBP)を添加せず、メ
チルメタクリレート(MMA),スチレン(St)共重合を行っ
た。溶媒にメチルエチルケトン(MEK)を用いた。原料組
成比率は、MMA/Stの重量比率をそれぞれ60/40としたこと
以外は実施例5と同様として反応させメチルメタクリレ
ート-スチレン共重合樹脂を得た。得られた重合物溶液
を前述の処理を施した後カラープレートを成形して屈折
率とTgを測定した結果を表1にまとめた。[Comparative Example 2] Copolymerization of methyl methacrylate (MMA) and styrene (St) was performed without adding 4-vinylbiphenyl (VBP). Methyl ethyl ketone (MEK) was used as the solvent. The raw material composition ratio was the same as in Example 5 except that the weight ratio of MMA / St was set to 60/40 to obtain a methyl methacrylate-styrene copolymer resin. The obtained polymer solution was subjected to the above-mentioned treatment, and then a color plate was molded to measure the refractive index and Tg.
【0021】[0021]
【実施例6】アクリロニトリル(AN),スチレン(St),4-ビ
ニルビフェニル(VBP)の共重合を行った。溶媒にメチル
エチルケトン(MEK)を用いた。原料組成比率は、AN/St/V
BPの重量比率をそれぞれ40/42/18とした。重合温度は14
5℃で行った。単量体原料総量に対しMEKを40重量部添加
した。転化率100重量%程度まで反応させ、アクリロニト
リル-スチレン-4-ビニルビフェニル共重合樹脂組成物を
得た。得られた重合物溶液を前述の処理を施した後カラ
ープレートを成形して屈折率とTgを測定した結果を表1
にまとめた。Example 6 Acrylonitrile (AN), styrene (St), and 4-vinylbiphenyl (VBP) were copolymerized. Methyl ethyl ketone (MEK) was used as the solvent. Raw material composition ratio is AN / St / V
The weight ratio of BP was set to 40/42/18. Polymerization temperature is 14
Performed at 5 ° C. 40 parts by weight of MEK was added to the total amount of monomer raw materials. The reaction was carried out to a conversion of about 100% by weight to obtain an acrylonitrile-styrene-4-vinylbiphenyl copolymer resin composition. The obtained polymer solution was subjected to the above-mentioned treatment and then the color plate was molded to measure the refractive index and Tg.
Summarized in.
【0022】[0022]
【比較例3】4-ビニルビフェニル(VBP)を添加せず、ア
クリロニトリル(AN),スチレン(St)の共重合を行った。
溶媒にメチルエチルケトン(MEK)を用いた。原料組成比
率は、AN /Stの重量比率をそれぞれ50/50とした以外は
実施例6と同様とし、アクリロニトリル-スチレン共重合
樹脂組成物を得た。得られた重合物溶液を前述の処理を
施した後カラープレートを成形して屈折率とTgを測定し
た結果を表1にまとめた。[Comparative Example 3] Acrylonitrile (AN) and styrene (St) were copolymerized without adding 4-vinylbiphenyl (VBP).
Methyl ethyl ketone (MEK) was used as the solvent. The raw material composition ratio was the same as in Example 6 except that the AN / St weight ratio was 50/50, respectively, to obtain an acrylonitrile-styrene copolymer resin composition. The obtained polymer solution was subjected to the above-mentioned treatment, and then a color plate was molded to measure the refractive index and Tg.
【0023】[0023]
【実施例7】N-フェニルマレイミド(PMI),アクリロニト
リル(AN),スチレン(St),4-ビニルビフェニル(VBP)の4元
共重合を行った。溶媒にメチルエチルケトン(MEK)を用
いた。原料組成比率は、PMI/AN/St/VBPの重量比率をそ
れぞれ20/20/40/20とし重合温度は125°Cで、単量体原
料総量に対しMEKを40重量部添加した。転化率100重量%
程度まで反応させN-フェニルマレイミド-アクリロニト
リル-スチレン-4-ビニルビフェニル共重合樹脂組成物を
得た。得られた重合物溶液を前述の処理を施した後カラ
ープレートを成形して屈折率を測定した結果を表1にま
とめた。Example 7 N-phenylmaleimide (PMI), acrylonitrile (AN), styrene (St), and 4-vinylbiphenyl (VBP) were quaternary copolymerized. Methyl ethyl ketone (MEK) was used as the solvent. The raw material composition ratio was such that the weight ratio of PMI / AN / St / VBP was 20/20/40/20, the polymerization temperature was 125 ° C., and 40 parts by weight of MEK was added to the total amount of the monomer raw materials. Conversion rate 100% by weight
The reaction was conducted to some extent to obtain an N-phenylmaleimide-acrylonitrile-styrene-4-vinylbiphenyl copolymer resin composition. The obtained polymer solution was subjected to the above-mentioned treatment, and then a color plate was molded to measure the refractive index. The results are summarized in Table 1.
【0024】[0024]
【比較例4】4-ビニルビフェニル(VBP)を添加せず、N-
フェニルマレイミド(PMI),アクリロニトリル(AN),スチ
レン(St)の3元共重合を行った。溶媒にメチルエチルケ
トン(MEK)を用いた。原料組成比率は、PMI/AN/Stの重量
比率をそれぞれ20/20/60としたこと以外は実施例7と同
様とした。転化率100重量%程度まで反応させN-フェニル
マレイミド-アクリロニトリル-スチレン共重合樹脂組成
物を得た。得られた重合物溶液を前述の処理を施した後
カラープレートを成形して屈折率を測定した結果を表1
にまとめた。[Comparative Example 4] Without adding 4-vinylbiphenyl (VBP), N-
Terpolymerization of phenylmaleimide (PMI), acrylonitrile (AN) and styrene (St) was performed. Methyl ethyl ketone (MEK) was used as the solvent. The raw material composition ratio was the same as in Example 7 except that the weight ratio of PMI / AN / St was set to 20/20/60, respectively. The N-phenylmaleimide-acrylonitrile-styrene copolymer resin composition was obtained by reacting up to a conversion rate of about 100% by weight. The obtained polymer solution was subjected to the above-mentioned treatment and then the color plate was molded to measure the refractive index.
Summarized in.
【0025】[0025]
【実施例8】α-メチルスチレン(αMS),メチルメタクリ
レート(MMA),4-ビニルビフェニル(VBP)の3元共重合を行
った。溶媒にメチルエチルケトン(MEK)を用いた。原料
組成比率は、αMS/MMA/VBPの重量比率をそれぞれ20/60/
20とし重合温度は125℃で、単量体原料総量に対しMEKを
40重量部、開始剤にt-ブチルパーオキシイソプロピルカ
ーボネート(パーブチルI:日本油脂製)を原料に対して30
0ppm添加した。転化率100重量%程度まで反応させα-メ
チルスチレン-メチルメタクリレート-2-ビニルナフタレ
ン共重合樹脂組成物を得た。得られた重合物溶液を前述
の処理を施した後カラープレートを成形して屈折率を測
定した結果を表1にまとめた。Example 8 A ternary copolymerization of α-methylstyrene (αMS), methylmethacrylate (MMA) and 4-vinylbiphenyl (VBP) was performed. Methyl ethyl ketone (MEK) was used as the solvent. The raw material composition ratio is αMS / MMA / VBP weight ratio of 20/60 /
20, the polymerization temperature is 125 ° C, and MEK is added to the total amount of monomer raw materials.
40 parts by weight, t-butyl peroxyisopropyl carbonate (perbutyl I: NOF Corporation) as an initiator to 30 parts by weight
0 ppm was added. The reaction was performed up to a conversion of about 100% by weight to obtain an α-methylstyrene-methylmethacrylate-2-vinylnaphthalene copolymer resin composition. The obtained polymer solution was subjected to the above-mentioned treatment, and then a color plate was molded to measure the refractive index. The results are summarized in Table 1.
【0026】[0026]
【比較例5】4-ビニルビフェニル(VBP)を添加せず、α-
メチルスチレン(αMS),メチルメタクリレート(MMA)の共
重合を行った。溶媒にメチルエチルケトン(MEK)を用い
た。原料組成比率は、αMS/MMAの重量比率をそれぞれ40
/60としたこと以外は実施例8と同様としα-メチルスチ
レン-メチルメタクリレート共重合樹脂組成物を得た。
得られた重合物溶液を前述の処理を施した後カラープレ
ートを成形して屈折率を測定した結果を表1に示した。[Comparative Example 5] α-without adding 4-vinylbiphenyl (VBP)
Copolymerization of methyl styrene (αMS) and methyl methacrylate (MMA) was performed. Methyl ethyl ketone (MEK) was used as the solvent. The raw material composition ratio is 40% for each αMS / MMA weight ratio.
An α-methylstyrene-methylmethacrylate copolymer resin composition was obtained in the same manner as in Example 8 except that the ratio was / 60.
The obtained polymer solution was subjected to the above-mentioned treatment, and then a color plate was molded to measure the refractive index. Table 1 shows the results.
【0027】[0027]
【表1】 [Table 1]
【0028】[0028]
【発明の効果】以上説明した本発明によると、ガラス転
移温度(耐熱性)が高く、屈折率の高い共重合体樹脂が得
られるので、プラスチックレンズ、プリズム等の光学材
料用樹脂として好適である。EFFECTS OF THE INVENTION According to the present invention described above, a copolymer resin having a high glass transition temperature (heat resistance) and a high refractive index can be obtained, which is suitable as a resin for optical materials such as plastic lenses and prisms. .
Claims (2)
な単量体の単独もしくは複数種を共重合させることによ
り得られた共重合体からなることを特徴とする耐熱性に
優れた光学材料用高屈折率樹脂。1. A high-heat-resistant optical material characterized by comprising a copolymer obtained by copolymerizing 4-vinylbiphenyl and a radical-polymerizable monomer alone or in combination. Refractive index resin.
下の範囲内で4-ビニルビフェニル重合体を含有する請求
項1記載の耐熱性に優れた光学材料用高屈折率樹脂。2. The high refractive index resin for an optical material having excellent heat resistance according to claim 1, which contains a 4-vinylbiphenyl polymer in a range of 10% by weight or more and 90% by weight or less of the total amount of the resin.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18374094A JPH0848725A (en) | 1994-08-04 | 1994-08-04 | High-refractive index resin for optical material excellent in heat resistance |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18374094A JPH0848725A (en) | 1994-08-04 | 1994-08-04 | High-refractive index resin for optical material excellent in heat resistance |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0848725A true JPH0848725A (en) | 1996-02-20 |
Family
ID=16141152
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP18374094A Pending JPH0848725A (en) | 1994-08-04 | 1994-08-04 | High-refractive index resin for optical material excellent in heat resistance |
Country Status (1)
Country | Link |
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JP (1) | JPH0848725A (en) |
Cited By (5)
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---|---|---|---|---|
WO2010007915A1 (en) | 2008-07-16 | 2010-01-21 | 日産化学工業株式会社 | Positive-type resist composition, and method for production of microlens |
JP2010229263A (en) * | 2009-03-26 | 2010-10-14 | Nippon Steel Chem Co Ltd | Terminal end-modified soluble multifunctional vinyl aromatic copolymer, curable resin composition, and cured product |
EP2796506A1 (en) | 2011-12-19 | 2014-10-29 | Cheil Industries Inc. | Thermoplastic resin composition and molded products thereof |
CN107262057A (en) * | 2016-04-08 | 2017-10-20 | 中国科学院大连化学物理研究所 | A kind of preparation method of bilirubin resin anion (R.A.) adsorbent |
US20180305512A1 (en) * | 2017-04-25 | 2018-10-25 | Exxonmobil Chemical Patents Inc. | Styrenic Copolymers and Articles Therefrom |
-
1994
- 1994-08-04 JP JP18374094A patent/JPH0848725A/en active Pending
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2010007915A1 (en) | 2008-07-16 | 2010-01-21 | 日産化学工業株式会社 | Positive-type resist composition, and method for production of microlens |
EP2749946A1 (en) | 2008-07-16 | 2014-07-02 | Nissan Chemical Industries, Ltd. | Positive-type resist composition, microlens and planarization film formed therefrom |
US9348222B2 (en) | 2008-07-16 | 2016-05-24 | Nissan Chemical Industries, Ltd. | Positive resist composition and method for production of microlens |
JP2010229263A (en) * | 2009-03-26 | 2010-10-14 | Nippon Steel Chem Co Ltd | Terminal end-modified soluble multifunctional vinyl aromatic copolymer, curable resin composition, and cured product |
EP2796506A1 (en) | 2011-12-19 | 2014-10-29 | Cheil Industries Inc. | Thermoplastic resin composition and molded products thereof |
CN107262057A (en) * | 2016-04-08 | 2017-10-20 | 中国科学院大连化学物理研究所 | A kind of preparation method of bilirubin resin anion (R.A.) adsorbent |
CN107262057B (en) * | 2016-04-08 | 2020-04-17 | 中国科学院大连化学物理研究所 | Preparation method of bilirubin anion resin adsorbent |
US20180305512A1 (en) * | 2017-04-25 | 2018-10-25 | Exxonmobil Chemical Patents Inc. | Styrenic Copolymers and Articles Therefrom |
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