JPH0845022A - Thin film magnetic head - Google Patents

Abstract

PURPOSE:To increase the output of a thin film magnetic head used in a magnetic disk device, etc., especially the output in a high line density region and to obtain a thin film magnetic head adaptable to the attainment of high density. CONSTITUTION:The slider face la of a thin film magnetic head 1 is coated with a carbon coating film 3 having <=200Angstrom thickness and a middle layer 2 is formed between the carbon coating film 3 and the slider face la of the thin film magnetic head 1. The slider face 1a of the thin film magnetic head 1 and side face parts 1b, 1c close to the edges of the slider face 1a may be coated with a carbon coating film 3.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a thin film magnetic head used in a magnetic disk device or the like.

[0002]

2. Description of the Related Art A thin film magnetic head is used as a magnetic head for a magnetic disk device or the like because it has excellent frequency characteristics and can achieve high density recording by reducing track width and bit length. .

Such a thin film magnetic head is slightly lifted from the magnetic recording medium when the magnetic recording medium is started and rotated, and a lubricating air is provided between the slider surface of the thin film magnetic head and the magnetic recording medium. A film is formed. However, when the activation of the magnetic recording medium is stopped, the slider surface of the thin-film magnetic head comes into direct contact with the magnetic recording medium. Therefore, the slider surface of the thin film magnetic head is required to have wear resistance. In addition, since the portion of the thin film transducer including the magnetoresistive effect element is easily corroded, it is necessary to protect this portion.

Japanese Patent Publication No. 6-18054 proposes a method of forming a film such as molybdenum disulfide on the facing surface of the thin film magnetic head, that is, on the slider surface. Here, there is disclosed a method of forming a coating film of molybdenum disulfide, carbon or the like having a film thickness of 200 to 800 Å on the slider surface of a thin film magnetic head by a sputtering method. By forming such a protective film, it is possible to improve wear resistance and corrosion resistance.

[0005]

However, in the conventional thin film magnetic head having such a protective film formed, there is a problem that the output reduction is large, particularly in the high linear density region.

Further, in magnetic recording using a magnetic disk or the like, there is a demand for higher density, and a thin film magnetic head capable of coping with such higher density is demanded.

An object of the present invention is to provide a thin-film magnetic head which solves the above-mentioned conventional problems and can increase the output, particularly in the high linear density region, and can cope with high density. To do.

[0008]

A thin-film magnetic head according to a first aspect of the present invention is a thin-film magnetic head that moves relatively on a magnetic recording medium to write and / or read information. The slider surface of the thin film magnetic head facing each other is covered with a carbon film having a film thickness of 200 Å or less, and an intermediate layer is formed in at least a part of the region between the carbon film and the slider surface of the thin film magnetic head. Is characterized by.

A thin film magnetic head according to a second aspect of the present invention is a thin film magnetic head which moves relatively on a magnetic recording medium to write and / or read information, and is a thin film magnetic head facing the magnetic recording medium. The slider surface and the side surface portion near the edge of the slider surface are covered with a carbon coating. The thickness of the carbon coating is preferably 200 Å or less as in the first aspect.

Further, the film thickness of the carbon coating in the first aspect and the second aspect of the present invention is preferably 10 Å or more. If the film thickness is thinner than this, the wear resistance and corrosion resistance may be insufficient.

In the second aspect of the present invention, an intermediate layer may be formed between the carbon coating and the slider surface of the thin film magnetic head. Such an intermediate layer is formed in at least a partial region between the carbon film and the slider surface of the thin film magnetic head.

In the first aspect and the second aspect of the present invention, the intermediate layer is formed in at least a partial region between the carbon film and the slider surface of the thin film magnetic head. Therefore,
The intermediate layer is formed on the entire surface or a partial area between the carbon coating and the slider surface of the thin film magnetic head. Therefore, in the first aspect and the second aspect of the present invention, the intermediate layer may not be formed as a continuous film, but may be formed by being dispersed in an island shape, for example.

The intermediate layer provided in the first aspect and the second aspect of the present invention is provided to enhance the adhesion between the carbon coating and the slider surface of the thin film magnetic head, and its thermal expansion coefficient is carbon. It is preferably close to the coefficient of thermal expansion of the coating. The coefficient of thermal expansion of the carbon coating is 1.0 to
Since it is 6.1 × 10 ⁻⁶ / ° C., the thermal expansion coefficient of the intermediate layer is preferably 1.0 to 10.0 × 10 ⁻⁶ / ° C.

In the first and second aspects of the present invention, S is a specific material used as the intermediate layer.
Examples thereof include i, Zr, Ti, Ru, and Ge, and oxides, nitrides, and carbides thereof.

The thermal expansion coefficients of the main materials of these materials are shown below. Si: 2.6 to 7.3 × 10 ⁻⁶ / ° C. Zr: 5.4 to 5.9 × 10 ⁻⁶ / ° C. Ti: 8.4 to 8.6 × 10 ⁻⁶ / ° C. Ru: 9.1 × 10 ^-6 / ° C Ge: 5.7 to 6.0 × 10 ^-6 / ° C SiO ₂ : 0.4 to 7.8 × 10 ^-6 / ° C

The thickness of these intermediate layers is 5 to 15
0Å is preferable, and 10 to 50Å is more preferable. If the thickness of the intermediate layer is too thin, the adhesiveness becomes insufficient, and if the thickness of the intermediate layer is too thick, there is no change in the effect of improving the adhesiveness, which is a factor of lowering the output, which is not preferable.

In the first aspect and the second aspect of the present invention, the intermediate layer does not need to be homogeneous throughout. For example, when the intermediate layer is made of carbide, the intermediate layer is formed from the slider surface of the thin film magnetic head. The intermediate layer may have an inclined structure in which the carbon content increases toward the carbon coating.

The carbon film formed in the present invention includes crystalline diamond and amorphous diamond-like film, but the amorphous diamond-like film is preferable from the viewpoint of lubricity.

[0019]

In the thin film magnetic head according to the first aspect of the present invention, the slider surface of the thin film magnetic head is covered with a carbon film having a film thickness of 200 Å or less. Since the thickness of the protective film made of a carbon film is as thin as 200 Å or less, the portion of the thin film transducer can be brought closer to the magnetic recording medium, and the output, especially in the high linear density region, can be increased. Further, it is possible to increase the recording / reproducing density.

In the first aspect of the present invention, the intermediate layer is formed in at least a partial region between the carbon film and the slider surface of the thin film magnetic head. By forming such an intermediate layer, the adhesion between the slider surface of the thin film magnetic head and the carbon coating can be enhanced.

In the second aspect of the present invention, the slider surface of the thin film magnetic head and the side surface portion near the edge of the slider surface are covered with a carbon coating. As mentioned above,
When the magnetic recording medium is activated and rotating, the thin film magnetic head is slightly floating above the surface of the magnetic recording medium, but when the activation is stopped, the thin film magnetic head comes into contact with the magnetic recording medium. At this time, since the thin film magnetic head is slightly tilted with respect to the magnetic recording medium, one edge of the slider surface of the thin film magnetic head comes into contact with the magnetic recording medium. According to the second aspect of the present invention, since the side surface portion near the edge is covered with the carbon coating, the thin film magnetic head is provided even when the magnetic recording medium is violently contacted when starting and stopping. It can be effectively protected and wear resistance can be improved. Further, if the thin film magnetic head is used in a state of being brought closer to the magnetic recording medium for the purpose of improving the output and increasing the density, the edge portion of the end surface of the slider surface easily comes into contact with the recording medium. In the thin film magnetic head according to the second aspect of the present invention, since the carbon coating is also formed on the side surface portion near the edge, the magnetic head can be brought closer to the recording medium, and the output can be improved and the density can be increased. Can be planned.

[0022]

1 to 3 show a thin film magnetic head according to an embodiment of the present invention. 3 is a perspective view, FIG. 1 is a cross-sectional view taken along line AA shown in FIG. 3, and FIG. 2 is B shown in FIG.
It is sectional drawing which follows the -B line. Referring to FIG. 1 and FIG.
An intermediate layer is formed on the slider surface 1 a of the thin-film magnetic head 1 facing the magnetic recording medium, and a carbon coating 3 is formed on the intermediate layer 2. Rail portions 10 and 11 are formed on both edge portions of the thin-film magnetic head 1. The present example is an example according to the first aspect of the present invention and also according to the second aspect. Therefore, the carbon coating 3 is not limited to the slider surface 1a but also the slider surface 1a.
It is formed so as to also cover the side surface portions 1b to 1e near the edge of a.

FIG. 4 is a partial cross-sectional view for explaining the second aspect according to the present invention. FIG. 4 shows a portion in the vicinity of the edge of the slider surface 1a of the thin film magnetic head 1.
According to the first aspect of the present invention, the carbon coating 3 is formed so as to cover the slider surface 1a and the side surface portion 1c near the end edge 1f of the slider surface 1a. The length X of the carbon coating 3 covering the side surface portion 1c from the edge 1f is appropriately selected depending on the shape and size of the thin film magnetic head, but is generally in the range of about 5 μm to 150 μm. Are preferably formed. The carbon coating 3 covering the side surface portion 1c is usually formed to have a thickness equal to or less than that of the carbon coating 3 covering the slider surface 1a. Generally 2
It is preferably 00 Å or less.

In the embodiment shown in FIG. 4, the thin film magnetic head 1
Although the carbon coating 3 is formed directly on the slider surface 1a, the intermediate layer 2 may be formed between the carbon coating 3 and the slider surface 1a as in the first aspect of the present invention. . FIG. 5 shows an example in which the intermediate layer 2 is formed. In the embodiment shown in FIG. 5, the intermediate layer 2 is not formed on the side surface portion 1c. FIG. 6 shows another embodiment, in which the intermediate layer 2 is also formed on the side surface portion 1c.

The intermediate layer in the first aspect and the second aspect of the present invention is formed in at least a partial region between the carbon coating and the slider surface. Therefore, it does not necessarily have to be formed on the entire surface. FIG. 7 shows an embodiment in which the intermediate layer 2 is dispersedly formed on the slider surface 1a in an island shape. Here, the intermediate layer 2 is formed as a discontinuous film. Such a discontinuous film is generally used as the intermediate layer 2
Is formed when the thickness of is reduced. As the film thickness,
It is preferably 100 Å or less, more preferably about 5 to 50 Å.

FIG. 8 shows an embodiment in which the intermediate layer 2 is formed as a continuous film. In order to obtain such a continuous film, it is generally necessary to increase the film thickness, and the film thickness is generally preferably about 100 to 150Å.

FIG. 9 is a schematic sectional view showing an example of an apparatus for forming an intermediate layer and a carbon film on the thin film magnetic head of the embodiment according to the present invention. Referring to FIG. 9, the vacuum chamber 28 is provided with a plasma generation chamber 24. One end of the waveguide 22 is attached to the plasma generation chamber 24. The microwave supply means 21 is provided at the other end of the waveguide 22. Microwave supply means 2
The microwave generated in 1 is guided to the plasma generation chamber 24 through the waveguide 22 and the microwave introduction window 23. The plasma generation chamber 24 is provided with a discharge gas introduction pipe 25 for introducing a discharge gas such as argon (Ar) gas into the plasma generation chamber 24. Plasma generation chamber 24
A plasma magnetic field generator 26 is provided around the. A high-density plasma is formed in the plasma generation chamber 24 by causing the high-frequency magnetic field generated by the microwave and the magnetic field from the plasma magnetic field generator 26 to act.

A cylindrical substrate holder 32 is provided in the vacuum chamber 28. The substrate holder 32 is rotatably provided around an axis (not shown) provided perpendicularly to the wall surface of the vacuum chamber 28. A plurality of thin film magnetic heads 33 are mounted on the peripheral surface of the substrate holder 32 at equal intervals. The high frequency power supply 30 is connected to the substrate holder 32.

A metal cylindrical shield cover 34 is provided around the substrate holder 32 at a predetermined distance. The shield cover 34 is connected to the ground electrode. The shield cover 34 has a structure in which the substrate holder 32 and the vacuum chamber 2 other than the film forming portion are formed by the RF voltage applied to the substrate holder 32 when forming the film.
It is provided in order to prevent the occurrence of discharge between 8 and. The gap between the substrate holder 32 and the shield cover 34 is arranged so as to have a distance equal to or less than the mean free path of gas molecules, and in this embodiment, it is about 1/10 or less of the mean free path of gas molecules. The distance is set to 5 mm.

The shield cover 34 has a first opening 3
5 is formed. Through this first opening 35,
The plasma extracted from the plasma generation chamber 24 is radiated to the thin film magnetic head 33 mounted on the substrate holder 32. A reaction gas introduction pipe 36 is provided in the vacuum chamber 28. The tip of this reaction gas introduction pipe 36 is
Located above the opening 35 of the.

FIG. 10 is a plan view showing the vicinity of the tip portion of the reaction gas introducing pipe 36. Referring to FIG. 10, the reaction gas introducing pipe 36 is provided with a gas introducing portion 36a for introducing a raw material gas such as CH ₄ gas into the vacuum chamber from the outside.
And a gas discharge portion 36b which is vertically connected to the gas introduction portion 36a. The gas discharge part 36b is
It is arranged in a direction perpendicular to the rotation direction A of the substrate holder 32, and is provided so as to be located above the first opening 35 and upstream in the rotation direction. The gas discharge part 36b includes
A plurality of holes 41 are formed downward in a direction of about 45 degrees. In this embodiment, eight holes 41 are formed.

Referring again to FIG. 9, a second opening 43 is formed on the side opposite to the first opening 35. Second
A target 46 made of material atoms forming the intermediate layer is provided below the opening 43 of the. Target 4
An ion gun 47 is provided near 6 to irradiate the target 46 with ions of an inert gas for sputtering the target 46. In this embodiment, Ar gas is used as the inert gas. The target 46 and the ion gun 47 can radiate the material atoms forming the intermediate layer on the thin-film magnetic head 33 through the second opening 43.

Examples 1 and 2 Using the apparatus shown in FIG. 9, a SiO ₂ layer as an intermediate layer and a carbon film were formed on a thin film magnetic head.

First, the inside of the vacuum chamber 28 is set to 10 ⁻⁵ to 10 ^−5.
-Evacuate to ^-7 Torr and move the substrate holder 32 to about 10 rp
Rotate at a speed of m. Next, oxygen is introduced into the vacuum chamber 28, Ar gas is supplied to the ion gun 47, and A
r ion is taken out, and this is the target 4 made of Si.
Radiates to the surface of 6. At this time, the acceleration voltage of Ar ions was set to 900 eV and the ion current density was set to 0.4 mA / cm ² . The oxygen partial pressure was 1 × 10 ⁻⁴ Torr.

The above steps are carried out for about 1 minute and the thin film magnetic head is
SiO2 with a film thickness of 20Å on the surface of the cord 33 ₂An intermediate layer consisting of
Formed.

Next, after the supply of oxygen gas to the vacuum chamber 28 and the emission of Ar ions from the ion gun 47 are stopped, Ar gas is supplied from the discharge gas introduction pipe 25 of the ECR plasma generator at 5.7 × 10 ^-4. It is supplied at Torr and is supplied from the microwave supply means 21 at 2.45 GHz, 10
A microwave of 0 W is supplied to form Ar plasma in the plasma generation chamber 24, and the formed Ar plasma is first
The light is radiated to the surface of the thin film magnetic head 33 through the opening 35. At the same time, an RF voltage of 13.56 MHz is applied to the substrate holder 32 from the high frequency power source 30 so that the self-bias generated in the thin film magnetic head 33 becomes −50 V, and CH ₄ gas of 1. 3 x 10
-Supply at ³ Torr.

A carbon coating having a film thickness of 100Å was formed on the intermediate layer by carrying out the above steps for about 1.7 minutes (Example 1).
Then, the above steps are performed for about 3.1 minutes and a film thickness of 1 is formed on the intermediate layer.
One having a carbon film of 80 Å formed (Example 2) and one having a carbon film having a film thickness of 380 Å formed on the intermediate layer (Comparative Example 1) were prepared by performing the above steps for about 6.5 minutes.

Examples 1 and 2 obtained as described above
The relationship between frequency and head output was measured using the thin film magnetic head of Comparative Example 1. The measurement result is shown in FIG. As shown in FIG. 11, Examples 1 and 2 in which the total thickness of the intermediate layer and the carbon coating was 200 Å or less showed a high head output, and particularly a high output at a linear density of 50 kfcI or more.

Table 1 shows the results of the abrasion test using the samples in which the intermediate layer and the carbon coating were formed on the base material of the thin film magnetic head under the same conditions as in Examples 1 and 2. In addition,
The test was conducted by rubbing the sample surface with an alumina ball (φ10 mm) to which a constant load (100 gf) was applied. In Table 1, for comparison, the wear amount of the base material on which the intermediate layer and the carbon coating are not formed is 1.

[0040]

[Table 1]

From Table 1, it can be seen that the wear resistance is improved in Examples 1 and 2.

Examples 3 and 4 In the same manner as in Example 1, an intermediate layer and a carbon coating were formed on the thin film magnetic head. In Example 3, S was used as the intermediate layer.
Using iO ₂ , the film thickness was set to 20 Å, and a carbon film having a film thickness of 100 Å was formed. In Example 4, an intermediate layer made of Si was formed as the intermediate layer. The intermediate layer was formed to have a film thickness of 9Å. As the intermediate layer made of Si, a target 46 made of Si was used and oxygen was not introduced into the vacuum chamber to form an intermediate layer made of Si. The carbon coating was formed to have a film thickness of 111Å.

In Comparative Example 2, a thin film magnetic head in which the intermediate layer and the carbon coating were not formed on the slider surface was prepared. In Comparative Example 3, a carbon film having a film thickness of 120Å was directly formed on the thin film magnetic head without forming the intermediate layer.

Examples 3 and 4 obtained as described above
A corrosion resistance test was performed on the thin film magnetic heads of Comparative Examples 2 and 3. After the thin film magnetic head was exposed to the corrosive solution for a predetermined time, the head resistance value was measured and the relationship between the head resistance value and the exposure time was measured. The result is shown in FIG. The corrosion resistance test was performed by using an appropriately diluted iron chloride aqueous solution as a corrosive solution, and immersing and exposing it in the aqueous solution.

As is clear from FIG. 12, in Comparative Example 2 in which the carbon coating is not provided, the head resistance sharply increases. Examples 3 and 4 in which the carbon layer was formed after forming the intermediate layer according to the present invention showed more excellent corrosion resistance than Comparative Example 3 in which the intermediate layer was not formed.

Examples 5 to 8 Next, as the target 46, Zr, Ti, Ru, Ge was used.
As the intermediate layer, ZrO ₂ (Example 5), TiO 2
₂ (Example 6), RuO ₂ (Example 7), and GeO ₂ (Example 8) were each formed to have a film thickness of 20Å.
Thin-film magnetic heads each having a carbon film formed on the intermediate layer with a thickness of 100Å were manufactured.

The thin film magnetic head thus obtained was subjected to a corrosion resistance test in the same manner as in Examples 3 and 4 above. The result is shown in FIG. As is clear from FIG. 13, excellent corrosion resistance is obtained even when these materials are formed as the intermediate layer. Also, the linear density is 50 kfc
It was confirmed that in I, a high head output was obtained as in Example 1.

Example 9 Next, an example in which a carbide of Si is formed as an intermediate layer will be described. For such an intermediate layer, using a device as shown in FIG. 9, while rotating the holder 32, carbon is deposited in the first opening portion 35 and the second opening portion 43 is formed.
By depositing Si at the portion, it is possible to form Si and carbon by mixing. The inside of the vacuum chamber 28 is evacuated to 10 ⁻⁵ to 10 ⁻⁷ Torr, and the substrate holder 42 is rotated at a speed of about 10 rpm.

Next, Ar gas is supplied from the discharge gas introduction pipe 25 of the ECR generator at 5.7 × 10 ⁻⁴ Torr and the microwave supply means 21 is operated at 2.45 GH.
z, 100 W microwave is supplied to generate plasma 4
The Ar plasma formed therein is radiated to the surface of the thin film magnetic head 33 through the first opening 35. At the same time, the high frequency power supply 30 to 13.56M is used so that the self-bias generated in the thin film magnetic head becomes -50V.
An RF voltage of Hz is applied to the substrate holder 32, and CH ₄ gas is supplied from the reaction gas introducing pipe 36. CH at this time
₄ gas supply rate is 100 SCCM or 1.3 × 10 ^-3
Torr.

Simultaneously with the thin film forming process by the ECR plasma generator, Ar ions from the ion gun 47 are emitted to the surface of the target 46 made of Si. At this time, the acceleration voltage of Ar ions is set to 900 eV and the ion current density is set to 0.4 mA.

By performing the above steps for about 1 minute, a mixed layer of Si and C having a film thickness of 20 Å was formed. This Si and C
A carbon coating having a film thickness of 100 Å was formed on the intermediate layer consisting of.

When the head output and corrosion resistance of the obtained thin film magnetic head were measured in the same manner as in the above-mentioned examples, the same high output characteristics and excellent corrosion resistance as those in the above-mentioned examples were shown.

Example 10 As shown in FIG. 14, the CH ₄ gas supply amount in Example 9 was gradually increased with the lapse of time, and after 1 minute, 10
It was set to 0 sccm, that is, 1.3 × 10 ⁻³ Torr. Further, as shown in FIG. 15, the ion current density of Ar ions is gradually decreased with time, and 1
It was set to be 0 mA / m ² after a lapse of minutes.

As described above, the carbon deposition rate is gradually increased over time and the Si deposition rate is gradually decreased over time, so that the carbon content gradually increases as the distance from the substrate surface of the thin film magnetic head increases. An intermediate layer made of Si and C having a graded structure with a large number of layers was formed. A carbon coating having a film thickness of 100 Å was formed on the intermediate layer.

The head output and corrosion resistance of the thin-film magnetic head obtained as described above were tested in the same manner as in each of the above-mentioned examples. As a result, the thin film magnetic head of this example showed excellent output improvement in the high linear density region and also excellent corrosion resistance.

Example 11 Similar to Example 1, Si having a film thickness of 20 Å was used as an intermediate layer.
O ₂ was formed, and a carbon film having a film thickness of 100 Å was formed on the O ₂ . When the apparatus shown in FIG. 9 is used, FIGS.
As shown in, the carbon coating can extend not only to the slider surface portion but also above the side surface portion to cover the edge portion. In the case of this embodiment, X shown in FIG.
Value was 100 μm. The thickness of the carbon coating on the side surface was 50Å.

For comparison, the sputtering method is used.
A thin film magnetic head having an intermediate layer and a carbon coating of similar thickness was produced. A thin film magnetic head in which the intermediate layer and the carbon coating were scarcely formed on the side surface was obtained. For the thin film magnetic head of this comparative example and the thin film magnetic head of this embodiment, the life was calculated from the measurement of the amount of wear,
This example has a life of about 1.2 times that of the comparative example.

[0058]

In the thin film magnetic head according to the first aspect of the present invention, the slider surface of the thin film magnetic head is covered with a carbon film having a film thickness of 200 Å or less. Therefore, while having excellent wear resistance, the portion of the thin film transducer can be brought closer to the magnetic recording medium, and the output, especially in the high linear density region, can be increased. Also,
Since they can be arranged closer to each other, higher density can be supported.

In the thin film magnetic head according to the second aspect of the present invention, the slider surface of the thin film magnetic head and the side surface portion near the edge of the slider surface are covered with the carbon coating. Therefore, it is possible to reduce damage to the head that occurs when the head comes into contact with the disk when the startup of the disk or the like is stopped. Further, as a result, since it can be arranged closer to the magnetic recording medium such as a disk,
The output can be improved and high density can be supported.

[Brief description of drawings]

FIG. 1 is a sectional view taken along the line AA of FIG.

FIG. 2 is a sectional view taken along line BB of FIG.

FIG. 3 is a perspective view showing a thin film magnetic head of one embodiment according to the present invention.

FIG. 4 is a sectional view showing an embodiment according to the second aspect of the present invention.

FIG. 5 is a sectional view showing another embodiment according to the second aspect of the present invention.

FIG. 6 is a sectional view showing still another embodiment according to the second aspect of the present invention.

FIG. 7 is a sectional view showing an example of the form of an intermediate layer in the present invention.

FIG. 8 is a sectional view showing another example of the form of the intermediate layer in the present invention.

FIG. 9 is a schematic cross-sectional view showing an example of an apparatus for forming an intermediate layer and a carbon film in the example of the present invention.

10 is a plan view showing the vicinity of the first opening of the apparatus shown in FIG.

FIG. 11 is a diagram showing a head output of an embodiment according to the present invention.

FIG. 12 is a diagram showing the corrosion resistance of an example according to the present invention.

FIG. 13 is a diagram showing corrosion resistance of Examples according to the present invention.

FIG. 14 is a diagram showing changes in CH ₄ flow rate in an example according to the present invention.

FIG. 15 is a diagram showing a change in ion current density in an example according to the present invention.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 ... Thin film magnetic head 1a ... Slider surface of a thin film magnetic head 1b-1e ... Side surface part of a thin film magnetic head 2 ... Intermediate layer 3 ... Carbon film

 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Seiichi Kiyama 2-5-5 Keihan Hondori, Moriguchi City, Osaka Sanyo Electric Co., Ltd.

Claims (8)

[Claims] 1. A thin film magnetic head which relatively moves on a magnetic recording medium to write and / or read information, wherein a slider surface of the thin film magnetic head facing the magnetic recording medium has a carbon film whose film thickness is 200 Å or less. A thin film magnetic head characterized in that an intermediate layer is formed on at least a part of a region between the carbon film and the slider surface of the thin film magnetic head. 2. A thin-film magnetic head that relatively moves on a magnetic recording medium to write and / or read information, the slider surface of the thin-film magnetic head facing the magnetic recording medium, and the vicinity of an edge of the slider surface. A thin film magnetic head characterized in that a side surface of the is covered with a carbon coating. 3. The thin film magnetic head according to claim 2, wherein an intermediate layer is formed in at least a partial region between the carbon film and the slider surface of the thin film magnetic head. 4. The coefficient of thermal expansion of the intermediate layer is 1.0 to 10 ×.
3. The material according to claim 1, wherein the material is 10 ⁻⁶ / ° C.
The thin-film magnetic head described. 5. The intermediate layer comprises Si, Zr, Ti, Ru
4. A thin film magnetic head according to claim 1, wherein the thin film magnetic head is made of at least one material selected from the group consisting of Ge and Ge, and oxides, nitrides, and carbides thereof. 6. The thin film magnetic head according to claim 1, wherein the intermediate layer is formed on the slider surface of the thin film magnetic head so as to be dispersed in an island shape. 7. The intermediate layer is made of Si,
4. The thin film magnetic head according to claim 1, wherein the intermediate layer is formed on the slider surface of the thin film magnetic head in an island shape. 8. The intermediate layer is formed of carbide, and the intermediate layer has a graded structure in which the carbon content increases from the slider surface of the thin film magnetic head toward the carbon coating. 7. The thin film magnetic head according to any one of 7 above.