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JPH0842714A - Leakage preventing mechanism for rotary sliding valve plate - Google Patents

Leakage preventing mechanism for rotary sliding valve plate

Info

Publication number
JPH0842714A
JPH0842714A JP6178342A JP17834294A JPH0842714A JP H0842714 A JPH0842714 A JP H0842714A JP 6178342 A JP6178342 A JP 6178342A JP 17834294 A JP17834294 A JP 17834294A JP H0842714 A JPH0842714 A JP H0842714A
Authority
JP
Japan
Prior art keywords
sliding valve
valve plate
rotary sliding
gas
rotary
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6178342A
Other languages
Japanese (ja)
Other versions
JP3294010B2 (en
Inventor
Masaaki Yamamoto
雅章 山本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Heavy Industries Ltd
Original Assignee
Mitsubishi Heavy Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Heavy Industries Ltd filed Critical Mitsubishi Heavy Industries Ltd
Priority to JP17834294A priority Critical patent/JP3294010B2/en
Publication of JPH0842714A publication Critical patent/JPH0842714A/en
Application granted granted Critical
Publication of JP3294010B2 publication Critical patent/JP3294010B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Sliding Valves (AREA)
  • Separation Of Gases By Adsorption (AREA)

Abstract

PURPOSE:To prevent a separated gas from being leaked from the sliding part of a rotary sliding valve plate used for a gas separating device. CONSTITUTION:Sealed spaces D for enclosing rotary sliding valve plates 2a, 2b, respectively, are formed of an adsorption a tower body 1a slid with the rotary sliding valve plates 2a, 2b, and sliding members such blind patches 3a, 3b, and radial first bypass circuits A, A' are provided on the rotary sliding valve plates 2a, 2b, avoiding opening parts 21a, 21b, 22a, 22b provided for switching the flows, respectively. Further, second bypass circuits B for allowing the sealed spaces D to mutually communicate are provided on the absorption tower body 1a slid with the rotary sliding valve plates 2a, 2b on both the end parts, and a third bypass circuit C for connecting the sealed space D to a specified port of the adsorption tower body is provided on one of the blind patches 3a, 3b slid with the outsides of the rotary sliding valve plates 2a, 2b.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、回転摺動形弁板を使用
する気体分離装置、溶剤回収装置、又はガス熱交換機の
回転機器等に適用され、回転摺動する弁板の回転摺動部
からの流体の漏洩を防止する回転摺動弁板漏洩防止機構
に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention is applied to a gas separator, a solvent recovery device, a rotary device of a gas heat exchanger, etc., which uses a rotary slide type valve plate, and the rotary slide of a rotary sliding valve plate. The present invention relates to a rotary sliding valve plate leakage prevention mechanism that prevents fluid from leaking from a portion.

【0002】[0002]

【従来の技術】回転摺動弁板を具える回転機器の代表例
として、気体分離装置がある。このような気体分離装置
は、脱湿装置、酸素製造装置、窒素製造装置等に見られ
るように、気体中の特異成分を、内部に収容した吸着剤
を使用して分離するものが一般的である。
2. Description of the Related Art A gas separating device is a typical example of a rotary device having a rotary sliding valve plate. Such a gas separation device is generally a device that separates a specific component in a gas using an adsorbent housed inside, as seen in a dehumidification device, an oxygen production device, a nitrogen production device, and the like. is there.

【0003】また、このような気体分離装置における、
吸着剤に吸着された被吸着物質を分離する技術として
は、温度差による吸着力の変化を利用した温度スイング
法と、圧力差による吸着力の変化を利用した圧力スイン
グ法が一般的に良く知られているが、そのいずれも、原
料気体を供給して吸着剤に被吸着物質を吸着させる供給
側、および被吸着物質を分離して吸着剤を再生する再生
側で独立した気体の流れを形成させる必要がある。その
具体的な手段として、供給、再生用として、完全に分離
独立した開口部を設けた回転摺動弁板を、連続的に回転
摺動させることにより、独立した気体の流れを形成する
ようにしている。
Further, in such a gas separation device,
As a technique for separating the adsorbed substance adsorbed by the adsorbent, a temperature swing method that uses a change in adsorption force due to a temperature difference and a pressure swing method that uses a change in adsorption force due to a pressure difference are generally well known. In both cases, an independent gas flow is formed on the supply side that supplies the raw material gas to adsorb the adsorbed substance to the adsorbent and on the regeneration side that separates the adsorbed substance and regenerates the adsorbent. Need to let. As a concrete means, a rotary sliding valve plate provided with completely separate and independent openings for supply and regeneration is continuously slid to form an independent gas flow. ing.

【0004】図2は、こうした独立した気体の流れを可
能とする回転摺動弁板を使用した気体分離装置の一般的
な構造分解図を示す。
FIG. 2 shows a general structural exploded view of a gas separation device using a rotary sliding valve plate which enables such independent gas flows.

【0005】図において、原料気体mは、ブロア08に
より、気体分離装置010の下側盲板03bにあけられ
た開口031bを通過して、流れ切換え用の開口部02
1b,022bが設けられ、下側盲板03bの上面と吸
着塔01の下面との間で摺動回転する回転摺動弁板02
bの、開口031bに対応する側の開口部021bを通
し、開口021bに連通する開口011(図3参照)を
持つ吸着工程槽01aを具える吸着塔01に送られる。
吸着塔01に装填された吸着剤01cで、原料気体m中
の被吸着物質を吸着したあとの排出気体eは、流れ切換
え用の開口部021a,022aが設けられ、吸着塔0
1の上面と上側盲板03aの下面との間で摺動回転する
回転摺動弁板02aの、吸着工程槽の出口012に連通
する開口021aを通過した後、上側盲板03aの、開
口021aに対応してあけられた開口031aを通過し
て、気体分離装置010の外部へ排出される。
In the figure, the raw material gas m passes through an opening 031b formed in a lower blind plate 03b of the gas separation device 010 by a blower 08, and an opening 02 for flow switching.
1b and 022b are provided, and the rotary sliding valve plate 02 is slidably rotated between the upper surface of the lower blind plate 03b and the lower surface of the adsorption tower 01.
b through the opening 021b on the side corresponding to the opening 031b, and is sent to the adsorption tower 01 having an adsorption step tank 01a having an opening 011 (see FIG. 3) communicating with the opening 021b.
The exhaust gas e after adsorbing the substance to be adsorbed in the raw material gas m with the adsorbent 01c loaded in the adsorption tower 01 is provided with the openings 021a and 022a for switching the flow.
No. 021a of the upper blind plate 03a after passing through the opening 021a communicating with the outlet 012 of the adsorption process tank of the rotary sliding valve plate 02a that slides and rotates between the upper surface of 1 and the lower surface of the upper blind plate 03a. Is discharged to the outside of the gas separation device 010.

【0006】また、再生用気体rは、原料気体mの流れ
とは完全に分離、独立された気体の流れを形成する。す
なわち、再生用気体rは、気体分離装置010の上部盲
板03aの開口032aを通過して、前記回転摺動弁板
02aの、開口032aに対応してあけられた、開口0
22aを通過して吸着塔01に送られる。吸着塔01
の、開口022aに連通する、開口013を通って吸着
塔01に流入した再生用気体rは、吸着塔01の再生工
程槽01bに装填された吸着剤01cに吸着された被吸
着物質を、吸着剤01cから脱着し、再生用気体rとと
もに、前記回転摺動弁板02bの、再生工程槽01bの
出口014に連通する、開口022bを通過し、下側盲
板03bの、開口022bに対応してあけられた、開口
032bを通過して気体分離装置010の外部へ排出
し、再生工程槽01b内の吸着剤は再生される。
The regeneration gas r is completely separated from the flow of the raw material gas m to form an independent gas flow. That is, the regeneration gas r passes through the opening 032a of the upper blind plate 03a of the gas separation device 010, and the opening 0 is opened corresponding to the opening 032a of the rotary sliding valve plate 02a.
It is sent to the adsorption tower 01 through 22a. Adsorption tower 01
The regeneration gas r, which communicates with the opening 022a and flows into the adsorption tower 01 through the opening 013, adsorbs the substance to be adsorbed by the adsorbent 01c loaded in the regeneration process tank 01b of the adsorption tower 01. It is desorbed from the agent 01c, passes through the opening 022b of the rotary sliding valve plate 02b communicating with the outlet 014 of the regeneration process tank 01b together with the regeneration gas r, and corresponds to the opening 022b of the lower blind plate 03b. The adsorbent in the regeneration process tank 01b is regenerated by passing through the opened opening 032b and discharged to the outside of the gas separation device 010.

【0007】一般的には、再生用気体rの搬送には、本
図に示すように真空ポンプ09を利用した吸引方式が採
用されるが、気体分離装置010の上部から再生用気体
rを送風して作動する強制送風方式が採用されることも
ある。
Generally, a suction system utilizing a vacuum pump 09 as shown in the figure is adopted to convey the regeneration gas r, but the regeneration gas r is blown from the upper part of the gas separation device 010. In some cases, a forced air blowing method that operates by being used is adopted.

【0008】なお、上述した説明では、吸着工程槽01
aと再生工程槽01bとは、別体である如く説明した
が、これは内部に収容されている吸着剤01cが、吸着
状態にあるか、再生状態にあるかを、単に区別する為に
だけ呼称したものである。
In the above description, the adsorption process tank 01
Although the a and the regeneration process tank 01b are described as separate bodies, this is merely for distinguishing whether the adsorbent 01c contained therein is in the adsorption state or the regeneration state. It is called.

【0009】次に、図3は前述した気体分離装置010
の一般的な断面構造図を示す。図に示すように、吸着塔
01は支持材01eを介して構造体01dに支持され、
吸着塔01の上、下に取付けられる回転摺動弁板02
a,02bは、それぞれ上、下の盲板03a,03bを
介して押圧するスプリング07a,07bによって、吸
着塔01の上、下面に形成された摺動面に、それぞれ押
し付けられ、軸04a、軸受04b、キー04c、継手
05を介して駆動装置06により回転される。
Next, FIG. 3 shows the gas separation device 010 described above.
The general cross-section figure of is shown. As shown in the figure, the adsorption tower 01 is supported by the structural body 01d through the support material 01e,
Rotary sliding valve plate 02 mounted above and below the adsorption tower 01
a and 02b are pressed against the sliding surfaces formed on the upper and lower surfaces of the adsorption tower 01 by springs 07a and 07b that press through the upper and lower blind plates 03a and 03b, respectively, and the shaft 04a and the bearing It is rotated by the drive device 06 via 04b, the key 04c, and the joint 05.

【0010】このように、回転摺動弁板02bと下側盲
板03bの上面、および吸着塔01の下面との摺動部の
内周側および外周側、並びに回転摺動弁板02aと上側
盲板03aの下面、および吸着塔01の上面との摺動部
の内周側および外周側は、何れも気体分離装置010の
外部に開放しており、気体分離装置010を流過する原
料気体m、排出気体e、再生用気体rおよび被吸着物質
を含有する再生用気体cは、これらの摺動部を通って気
体分離装置010の外部へ漏洩する。
Thus, the inner and outer peripheral sides of the sliding portion between the rotary sliding valve plate 02b and the lower blind plate 03b and the lower surface of the adsorption tower 01, and the rotary sliding valve plate 02a and the upper side. The lower surface of the blind plate 03a and the inner peripheral side and outer peripheral side of the sliding portion with the upper surface of the adsorption tower 01 are both open to the outside of the gas separation device 010, and the raw material gas flowing through the gas separation device 010. The m, the exhaust gas e, the regeneration gas r, and the regeneration gas c containing the substance to be adsorbed leak to the outside of the gas separation device 010 through these sliding parts.

【0011】これら、原料気体m並びに再生用気体r等
の気体分離装置010外部への漏洩は、回転摺動弁板0
2a,02bの摺動部の加工精度を向上させ、摺動面隙
間を最小限に止めることで、漏洩を抑制することが一般
的に行われているが、完全な漏洩防止は困難である。特
に、毒性、爆発性を有する危険物を含む原料気体を取り
扱う気体分離装置010では、装置内部における気体漏
洩は、ある程度許容されたとしても、装置外部への気体
漏洩は完全に防止する機構が必要となる。
The leakage of the raw material gas m and the regenerating gas r to the outside of the gas separating device 010 is caused by the rotary sliding valve plate 0.
It is generally performed to suppress the leakage by improving the processing accuracy of the sliding portions of 2a and 02b and minimizing the sliding surface gap, but it is difficult to completely prevent the leakage. In particular, in the gas separation device 010 that handles a raw material gas containing a hazardous substance having toxicity and explosiveness, even if the gas leakage inside the device is allowed to some extent, a mechanism for completely preventing the gas leakage to the outside of the device is required. Becomes

【0012】[0012]

【発明が解決しようとする課題】本発明は、このような
回転摺動弁板を具える装置における、回転摺動弁板の摺
動部から、装置の外部への流体漏洩を完全に防止するこ
とのできる回転摺動弁板漏洩防止機構を提供することを
課題とする。
DISCLOSURE OF THE INVENTION The present invention completely prevents fluid leakage from the sliding portion of the rotary sliding valve plate to the outside of the device in the device having such rotary sliding valve plate. An object of the present invention is to provide a rotary sliding valve plate leakage prevention mechanism capable of performing the above.

【0013】[0013]

【課題を解決するための手段】このため、本発明の回転
摺動弁板漏洩防止機構は、次の手段とした。 (1)回転摺動弁板と摺動し、回転摺動弁板を回転自在
に挟持する摺動部材により、2つの回転摺動弁板をそれ
ぞれ完全に包み込む密閉空間を設けた。 (2)回転摺動弁板にあけられた流体通過用の開口部を
さけて、回転摺動弁板の半径方向に第1のバイパス回路
を穿設した。 (3)2つの回転摺動弁板のそれぞれを包み込んだ2つ
の密閉空間を、互に連通する第2のバイパス回路を回転
摺動弁板の間に介装された摺動部材に穿設した。 (4)2つの回転摺動弁板をそれぞれ被包した密閉空間
のうちの1つを、外部に連通する第3のバイパス回路を
摺動部材に穿設した。
For this reason, the rotary sliding valve plate leakage prevention mechanism of the present invention has the following means. (1) A sealed space that completely encloses each of the two rotary sliding valve plates is provided by a sliding member that slides on the rotary sliding valve plate and rotatably sandwiches the rotary sliding valve plate. (2) The first bypass circuit is bored in the radial direction of the rotary sliding valve plate, avoiding the fluid passage opening formed in the rotary sliding valve plate. (3) The two sealed spaces enclosing each of the two rotary sliding valve plates are provided with the second bypass circuit communicating with each other in the sliding member interposed between the rotary sliding valve plates. (4) A third bypass circuit communicating with the outside of one of the sealed spaces enclosing the two rotary sliding valve plates is provided in the sliding member.

【0014】[0014]

【作用】本発明の回転摺動弁板の漏洩防止機構は、上述
の手段により、 (1)回転摺動弁板の漏洩防止機構を具える装置へ導か
れた流体は、それぞれ摺動部材と回転摺動弁板で形成さ
れる摺動部の隙間を通って回転摺動弁板の外周、内周方
向へ漏洩しようとするが、回転摺動弁板を、それぞれ上
下で挟む摺動部材で密閉構造とした密閉空間で被包する
ことにより、装置の外部へ漏洩することが防止される。 (2)回転摺動弁板に、流れ切換え用として分離独立し
て設けられた開口部を邪魔しない位置に、半径方向に第
1のバイパス回路を設け、摺動部を回転摺動弁板の外周
方向へ流れる漏洩気体と、内周方向へ流れる漏洩気体と
を圧力的にバランスさせることができる。 (3)摺動部材の両側で摺動回転する回転摺動弁板のそ
れぞれを、被包する密閉空間を互に連通させる第2のバ
イパス回路を、回転摺動弁板の間に介装された摺動部材
に穿設することにより、2つの密閉空間にそれぞれ流入
する漏洩気体を装置内で圧力的にバランスさせることが
できる。 (4)密閉空間のうちの1つの密閉空間を形成する摺動
部材に、第3の気体バイパス回路を設けることにより、
密閉空間を装置外部と圧力的にバランスさせることがで
きる。これにより、装置の摺動部からの漏洩気体の無管
理状態での外部への放出が防止できる。また、この第3
のバイパス回路を設ける密閉空間装置の目的により、変
化するもので特に制約されるものではなく、全く別系統
の装置と接続することもできるものである。
According to the rotary slide valve plate leakage prevention mechanism of the present invention, by the above-mentioned means, (1) the fluid introduced to the device having the rotary slide valve plate leakage prevention mechanism is transferred to the sliding member respectively. An attempt is made to leak to the outer and inner peripheral directions of the rotary sliding valve plate through the gaps in the sliding part formed by the rotary sliding valve plate, but with the sliding members that sandwich the rotary sliding valve plate vertically. By enclosing in a closed space having a closed structure, leakage to the outside of the device is prevented. (2) A first bypass circuit is provided in the radial direction on the rotary sliding valve plate at a position where it does not interfere with the opening provided separately for flow switching, and the sliding part is provided on the rotary sliding valve plate. The leak gas flowing in the outer peripheral direction and the leak gas flowing in the inner peripheral direction can be pressure balanced. (3) A second bypass circuit that connects the rotary sliding valve plates that slide and rotate on both sides of the sliding member to each other in the sealed spaces that enclose the sliding members is interposed between the rotary sliding valve plates. By piercing the moving member, it is possible to balance the leakage gas flowing into each of the two sealed spaces in the apparatus in terms of pressure. (4) By providing the third gas bypass circuit in the sliding member forming one closed space of the closed spaces,
The closed space can be pressure-balanced with the outside of the device. As a result, it is possible to prevent the leakage gas from the sliding portion of the device from being released to the outside in an uncontrolled state. Also, this third
Depending on the purpose of the enclosed space device in which the bypass circuit of (1) is provided, it does not have any particular restriction because it changes, and it can be connected to a device of a completely different system.

【0015】[0015]

【実施例】以下、本発明の回転摺動弁板漏洩防止機構を
図面にもとづき説明する。図1は、本発明の回転摺動弁
板漏洩防止機構の一実施例を、気体分離装置に適用した
断面構造図を示す。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A rotary sliding valve plate leakage prevention mechanism of the present invention will be described below with reference to the drawings. FIG. 1 shows a cross-sectional structural view in which an embodiment of the rotary sliding valve plate leakage prevention mechanism of the present invention is applied to a gas separation device.

【0016】吸着塔1の吸着塔本体1a上、下に取付け
られた回転摺動弁板2a,2bは、それぞれ上側盲板3
a、下側盲板3bを介して、スプリング7a,7bの押
圧力によって、吸着塔本体1aの上面および下面に形成
された摺動面に押し付けられ、軸4a、軸受4b、キー
4c、継手5を介して駆動装置6により回転される。
The rotary sliding valve plates 2a and 2b mounted on and under the adsorption tower body 1a of the adsorption tower 1 are respectively the upper blind plate 3
a, the lower blind plate 3b, the springs 7a, 7b are pressed against the sliding surfaces formed on the upper surface and the lower surface of the adsorption tower body 1a by the pressing force of the springs 7a, 7b, and the shaft 4a, the bearing 4b, the key 4c, the joint 5 It is rotated by the drive device 6 via.

【0017】吸着塔1は、前記した吸着塔本体1a、吸
着塔本体1aに収容された吸着剤1b、吸着剤1bを固
定するための金網1c、吸着塔1を外部の構造物1fに
固定するための固定金物1eにより構成されている。吸
着塔本体1aの上、下端の外周面には回転摺動弁板2
a,2bを密閉するための鍔部が形成され、鍔部の外周
面にシール機構1dが設けられている。また、吸着塔本
体1aには、第2の(気体)バイパス回路(B)が内周
部の軸方向に設けられている。
The adsorption tower 1 fixes the adsorption tower body 1a, the adsorbent 1b housed in the adsorption tower body 1a, the wire netting 1c for fixing the adsorbent 1b, and the adsorption tower 1 to an external structure 1f. It is composed of a fixed hardware 1e for. A rotary slide valve plate 2 is provided on the outer peripheral surfaces of the upper and lower ends of the adsorption tower body 1a.
A flange portion is formed for sealing a and 2b, and a seal mechanism 1d is provided on the outer peripheral surface of the flange portion. Further, the adsorption tower body 1a is provided with a second (gas) bypass circuit (B) in the axial direction of the inner peripheral portion.

【0018】回転摺動弁板2a,2bには、それぞれ回
転摺動弁板2a,2bの外周、内周方向へ漏洩する気体
の圧力バランス用として、回転摺動弁板2a,2bに気
体原料mの供給、および吸着塔1内の吸着剤1bの再生
用として、それぞれ分離独立して設けられた開口部21
a,21b,22a,22bを邪魔しない位置に、第1
の(気体)バイパス回路A,A′が半径方向に設けられ
ている。
The rotary sliding valve plates 2a and 2b are provided with gas raw materials for the pressure balance of the gas leaking in the outer and inner circumferential directions of the rotary sliding valve plates 2a and 2b, respectively. m for supplying m and for regenerating the adsorbent 1b in the adsorption tower 1, the openings 21 are provided separately from each other.
a, 21b, 22a, 22b in a position that does not interfere with the first
(Gas) bypass circuits A and A'are provided in the radial direction.

【0019】また、上側盲板3a、下側盲板3bとも、
回転摺動弁板2a,2bのそれぞれを、吸着塔本体1a
と協同して密閉し、密閉空間Dを形成するために円筒状
の鍔が設けられている。下側盲板3b中心部には、駆動
用軸4aが貫通する貫通部の気密を図るために、シール
機構4dを設けられている。上側盲板3aには、気体分
離装置10内部に貯留され、第1の気体バランス回路
A,A′、第2の気体バイパス回路Bによって、圧力的
にバランスされた、摺動部からの漏洩気体を外部の貯留
装置に接続するための、第3の(気体)バイパス回路C
が設けられている。
The upper blind plate 3a and the lower blind plate 3b are also
Each of the rotary sliding valve plates 2a and 2b is attached to the adsorption tower body 1a.
In order to form a closed space D in cooperation with, a cylindrical flange is provided. At the center of the lower blind plate 3b, a seal mechanism 4d is provided in order to achieve airtightness of a penetrating portion through which the drive shaft 4a penetrates. Leakage gas from the sliding portion, which is stored in the gas separating device 10 and is pressure-balanced by the first gas balance circuits A and A ′ and the second gas bypass circuit B in the upper blind plate 3a. Third (gas) bypass circuit C for connecting the external storage device to the
Is provided.

【0020】本実施例は、上述のように構成されている
ので、下側盲板3bの開口31b、回転摺動弁板2bの
開口部21b、および吸着塔本体1aの供給ポート1g
を通過して、気体分離装置10内へ導かれる原料気体m
は、下側盲板3bの開口31bを通過したあと、回転摺
動弁板2bと下側盲板3bの間、および回転摺動弁板2
bの開口部21を通過したあと、回転摺動弁板2bと吸
着塔本体1aの下面の間に形成される、それぞれの摺動
部の隙間を通って、摺動部のパスが小さい弁板2bの外
周方向へ漏洩しようとするが、同様に、摺動部の隙間を
通って、摺動部のパスが小さい弁板2bの内周方向へ漏
洩する再生気体rと、第1の気体バイパス回路A′によ
り圧力的にバランスされる。
Since the present embodiment is constructed as described above, the opening 31b of the lower blind plate 3b, the opening 21b of the rotary sliding valve plate 2b, and the supply port 1g of the adsorption tower body 1a.
The raw material gas m which is introduced into the gas separation device 10 through
After passing through the opening 31b of the lower blind plate 3b, between the rotary sliding valve plate 2b and the lower blind plate 3b, and the rotary sliding valve plate 2
After passing through the opening 21 of b, the valve plate having a small sliding path passes through the gaps between the sliding parts formed between the rotary sliding valve plate 2b and the lower surface of the adsorption tower body 1a. 2b leaks toward the outer peripheral direction of the valve plate 2b, but similarly leaks toward the inner peripheral direction of the valve plate 2b having a small sliding portion path through the gap of the sliding portion and the first gas bypass. It is pressure balanced by the circuit A '.

【0021】同様に、吸着塔1上部の回転摺動弁板2a
についても、回転摺動弁板2aの外周方向と、内周方向
の漏洩気体は第1の気体バイパス回路Aにより圧力的に
バランスされる。
Similarly, the rotary sliding valve plate 2a above the adsorption tower 1
Also, regarding the outer peripheral direction and the inner peripheral direction of the rotary sliding valve plate 2a, the leakage gas is pressure balanced by the first gas bypass circuit A.

【0022】さらに、吸着塔1上、下に回転摺動弁板を
被包して形成された、それぞれの密閉空間Dで、前記の
通りそれぞれ圧力的にバランスされた漏洩気体は、吸着
塔1本体に設けられた第2の気体バイパス回路Bによ
り、さらに圧力的にバランスされ、最終的に、気体分離
装置10内の漏洩気体全体は圧力的にバランスされる。
また、気体分離装置10内でバランスされた漏洩気体
は、上側盲板3aに設けられた気体バイパス回路Cによ
り、密閉空間Dは気体分離装置10の外部に設けた貯留
装置内と圧力的にバランスさせることが可能となる。
Further, in the respective closed spaces D formed by enclosing the rotary sliding valve plate above and below the adsorption tower 1, the leak gas, which is pressure balanced as described above, is The second gas bypass circuit B provided in the main body further balances the pressure, and finally, the entire leaked gas in the gas separation device 10 is pressure balanced.
Further, the leakage gas balanced in the gas separation device 10 is pressure-balanced with the inside of the storage device provided outside the gas separation device 10 in the closed space D by the gas bypass circuit C provided in the upper blind plate 3a. It becomes possible.

【0023】但し、この気体バランス回路Cは、気体分
離装置10の各ポート、すなわち、吸着塔本体1aに設
けられた、供給ポート1g、排出ポート1h、再生用気
体ポート1j、又は再生ポート1kのいずれかに接続す
ることもできる。これらの選択は、気体分離装置10の
装置目的により変化するもので、特に制約されるもので
はなく、全く別系統の漏洩気体回収装置と接続すること
もできる。
However, the gas balance circuit C is provided for each port of the gas separation apparatus 10, that is, the supply port 1g, the discharge port 1h, the regeneration gas port 1j, or the regeneration port 1k provided in the adsorption tower body 1a. You can also connect to either. These selections vary depending on the purpose of the gas separation device 10, and are not particularly limited, and it is possible to connect to a leak gas recovery device of a completely different system.

【0024】[0024]

【発明の効果】以上述べたように、本発明の回転摺動弁
板漏洩防止機構によれば、特許請求の範囲に示す構成に
より、摺動部材の間で回転し、流れの切換えを行う回転
摺動弁板と摺動部材との間に形成される摺動部から漏洩
する流体は、装置の外部、すなわち、装置周辺へ流出す
ることがなくなる。
As described above, according to the rotary sliding valve plate leakage prevention mechanism of the present invention, with the structure shown in the claims, the rotation between the sliding members to switch the flow is performed. The fluid leaking from the sliding portion formed between the sliding valve plate and the sliding member does not flow out of the device, that is, around the device.

【0025】これにより、毒性、若しくは爆発性を有す
る危険物を含む原料気体を取扱う装置においても、安全
に作動させることができる。
As a result, it is possible to operate safely even in a device that handles a raw material gas containing a hazardous substance that is toxic or explosive.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の回転摺動弁板漏洩防止機構の一実施例
を示す断面図、
FIG. 1 is a sectional view showing an embodiment of a rotary sliding valve plate leakage prevention mechanism of the present invention,

【図2】従来の回転摺動弁板を使用した気体分離装置の
分解構造図、
FIG. 2 is an exploded structural view of a gas separation device using a conventional rotary sliding valve plate,

【図3】図3に示す気体分離装置の断面図、3 is a cross-sectional view of the gas separation device shown in FIG.

【符号の説明】[Explanation of symbols]

1 吸着塔 1a 摺動部材としての吸
着塔本体 1b 吸着剤 1c 全網 1d シール機構 1e 固定金物 1f 構造物 1g 供給ポート 1h 排出ポート 1j 再生用気体ポート 1k 再生ポート 2a,2b 回転摺動弁 21a,21b,22a,22b 開口部 3a 摺動部材としての上
側盲板 3b 摺動部材としての下
側盲板 31b 開口 4a 軸 4b 軸受 4c キー 5 継手 6 駆動装置 7a,7b スプリング A 第1の気体バイパス
回路 B 第2の気体バイパス
回路 C 第3の気体バイパス
回路 D 密閉空間
1 Adsorption Tower 1a Adsorption Tower Main Body as Sliding Member 1b Adsorbent 1c Whole Network 1d Sealing Mechanism 1e Fixed Hardware 1f Structure 1g Supply Port 1h Discharge Port 1j Regeneration Gas Port 1k Regeneration Port 2a, 2b Rotary Sliding Valve 21a, 21b, 22a, 22b Opening 3a Upper blind plate as sliding member 3b Lower blind plate as sliding member 31b Opening 4a Shaft 4b Bearing 4c Key 5 Joint 6 Drive device 7a, 7b Spring A First gas bypass circuit B Second gas bypass circuit C Third gas bypass circuit D Closed space

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 流れ切換え用の開口部が穿設され同軸状
に配設された2つの回転摺動弁板と、前記開口部に連通
する開口が設けられ、前記回転摺動弁板を各々回転自在
に挟持する摺動部材との摺動部からの流体漏洩を防止す
るための回転摺動弁板漏洩防止機構において、前記摺動
部材で形成され前記回転摺動弁板を各々被包する密閉空
間と、前記開口部を回避して前記回転摺動弁板の半径方
向に穿設された第1のバイパス回路と、前記回転摺動弁
板の間に介装した前記摺動部材に穿設され前記密閉空間
を互に連通する第2のバイパス回路と、前記摺動部材に
穿設され前記密閉空間のうちの1つを外部に連通する第
3のバイパス回路を設けたことを特徴とする回転摺動弁
板漏洩防止装置。
1. A rotary sliding valve plate having a flow switching opening and a coaxially arranged opening, and an opening communicating with the opening, the rotary sliding valve plate being provided in each of the rotary sliding valve plates. In a rotary sliding valve plate leakage prevention mechanism for preventing fluid leakage from a sliding portion with a sliding member that is rotatably sandwiched, each rotary sliding valve plate formed of the sliding member is encapsulated. A closed space, a first bypass circuit that is formed in the radial direction of the rotary sliding valve plate while avoiding the opening, and the sliding member that is interposed between the rotary sliding valve plate. A rotation characterized in that a second bypass circuit for communicating the sealed spaces with each other and a third bypass circuit provided in the sliding member for communicating one of the sealed spaces with the outside are provided. Sliding valve plate leakage prevention device.
JP17834294A 1994-07-29 1994-07-29 Rotary sliding valve plate leakage prevention mechanism Expired - Fee Related JP3294010B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17834294A JP3294010B2 (en) 1994-07-29 1994-07-29 Rotary sliding valve plate leakage prevention mechanism

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17834294A JP3294010B2 (en) 1994-07-29 1994-07-29 Rotary sliding valve plate leakage prevention mechanism

Publications (2)

Publication Number Publication Date
JPH0842714A true JPH0842714A (en) 1996-02-16
JP3294010B2 JP3294010B2 (en) 2002-06-17

Family

ID=16046822

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17834294A Expired - Fee Related JP3294010B2 (en) 1994-07-29 1994-07-29 Rotary sliding valve plate leakage prevention mechanism

Country Status (1)

Country Link
JP (1) JP3294010B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108126472A (en) * 2017-12-29 2018-06-08 嘉园环保有限公司 A kind of technique for organic exhaust gas adsorption concentration
CN111851715A (en) * 2020-07-03 2020-10-30 马潇涵 Wisdom city rainwater recovery system

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108126472A (en) * 2017-12-29 2018-06-08 嘉园环保有限公司 A kind of technique for organic exhaust gas adsorption concentration
CN111851715A (en) * 2020-07-03 2020-10-30 马潇涵 Wisdom city rainwater recovery system

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Publication number Publication date
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