JPH08318129A - Exhaust gas cooling treatment method and treatment equipment for organic halogen compound treatment equipment - Google Patents
Exhaust gas cooling treatment method and treatment equipment for organic halogen compound treatment equipmentInfo
- Publication number
- JPH08318129A JPH08318129A JP7126868A JP12686895A JPH08318129A JP H08318129 A JPH08318129 A JP H08318129A JP 7126868 A JP7126868 A JP 7126868A JP 12686895 A JP12686895 A JP 12686895A JP H08318129 A JPH08318129 A JP H08318129A
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- exhaust gas
- plasma
- cooling
- frequency induction
- induction thermal
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Abstract
(57)【要約】
【目的】 高周波誘導熱プラズマ装置のプラズマトーチ
部及びプラズマ反応炉内の圧力変動を極力小さくし、２
００〜４００ｔｏｒｒの圧力を一定に保ち、プラズマで
の運転を安定させ、且つ真空ポンプの能力を小さくする
ことにより運転費を軽減させる。
【構成】 高周波誘導熱プラズマ装置、プラズマ反応炉
を有する高周波誘導熱プラズマ装置を用いて有機ハロゲ
ン化合物を高温加水分解し発生した高温で、且つ強酸性
の分解処理排ガスを冷却する方法において、プラズマ反
応炉の下部に設けられた噴霧式冷却器から排ガス処理液
を分解処理排ガスに噴霧して冷却することを特徴とする
分解処理排ガスの冷却方法、及び高周波誘導熱プラズマ
装置、プラズマ反応炉を有する高周波誘導熱プラズマ装
置の冷却処理装置において、プラズマ反応炉の下部に噴
霧式冷却器を設けたことを特徴とする冷却装置。
(57) [Abstract] [Purpose] Minimize the pressure fluctuations in the plasma torch part and plasma reactor of the high frequency induction thermal plasma device to 2
The operating cost is reduced by keeping the pressure of 00 to 400 torr constant, stabilizing the operation in plasma, and reducing the capacity of the vacuum pump. A plasma reaction in a method for cooling exhaust gas at a high temperature and a strong acid generated by high-temperature hydrolysis of an organic halogen compound using a high-frequency induction thermal plasma device and a high-frequency induction thermal plasma device having a plasma reactor A method for cooling a decomposition treatment exhaust gas, characterized by spraying an exhaust gas treatment liquid onto a decomposition treatment exhaust gas from a spray cooler provided in the lower part of the furnace, a high frequency induction thermal plasma device, and a high frequency wave having a plasma reactor. A cooling apparatus for an induction thermal plasma apparatus, wherein a spray-type cooler is provided below a plasma reactor.
Description
【０００１】[0001]
【産業上の利用分野】本発明は、有機ハロゲン化合物の
分解処理に関し、特に、高周波誘導熱プラズマを用い
て、高温加水分解により有機ハロゲン化合物の分解処理
を行ない、発生した有害成分を含む排ガスを処理する排
ガスの冷却処理方法及びその処理装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to decomposition treatment of organic halogen compounds, and more particularly to decomposition treatment of organic halogen compounds by high-temperature hydrolysis using high-frequency induction thermal plasma to produce exhaust gas containing harmful components. The present invention relates to a cooling treatment method for exhaust gas to be treated and a treatment device therefor.
【０００２】[0002]
【従来の技術】フロンガスなどの有機ハロゲン化合物
は、大気中に放出されるとオゾン層を破壊するなど環境
に対して悪影響を与えるので、有機ハロゲン化合物を分
解処理する技術として、高周波誘導熱プラズマを用いた
高温加水分解法がある。2. Description of the Related Art Organohalogen compounds such as Freon gas have a bad influence on the environment such as destroying the ozone layer when they are released into the atmosphere. Therefore, high-frequency induction thermal plasma is used as a technique for decomposing organic halogen compounds. There is a high temperature hydrolysis method used.
【０００３】従来、有機ハロゲン化合物を高温加水分解
処理する設備として、例えば、特開平７ー２４０８１号
公報には、図２に示すような高周波誘導熱プラズマ装置
を用いた有機ハロゲン化合物分解処理設備が開示されて
いる。[0003] Conventionally, as equipment for high-temperature hydrolysis treatment of organic halogen compounds, for example, Japanese Patent Application Laid-Open No. 7-24081 discloses an equipment for decomposition treatment of organic halogen compounds using a high frequency induction thermal plasma device as shown in FIG. It is disclosed.
【０００４】前記分解処理設備は、ダウンカマー式分解
処理排ガス冷却装置であり、その主要構成は、プラズマ
を発生させる高周波誘導熱プラズマ装置１、プラズマに
よる高温雰囲気で有機ハロゲン化合物を分解させるプラ
ズマ反応炉２、プラズマ反応炉２の下部に接続された耐
熱性及び耐腐食性に優れた材料で構成され、その下部に
バッフルプレート１３を有するダウンカマーチューブ１
２、排ガス処理液４が貯留される冷却缶３、冷却缶３か
らの排ガスを処理する排ガス処理装置７、冷却缶３と排
ガス処理装置７へ排ガス処理液４を循環させる排ガス処
理液循環ポンプ８、プラズマ反応炉内圧力を所定圧力、
例えば２００〜４００ｔｏｒｒに保つ真空ポンプ１０を
具備している。The decomposition treatment equipment is a downcomer type decomposition treatment exhaust gas cooling device, and its main components are a high-frequency induction thermal plasma device 1 for generating plasma and a plasma reactor for decomposing organic halogen compounds in a high temperature atmosphere by plasma. 2. The downcomer tube 1 which is connected to the lower part of the plasma reactor 2 and is made of a material having excellent heat resistance and corrosion resistance, and has a baffle plate 13 at its lower part.
2, a cooling can 3 in which the exhaust gas treatment liquid 4 is stored, an exhaust gas treatment device 7 for treating the exhaust gas from the cooling can 3, an exhaust gas treatment liquid circulation pump 8 for circulating the exhaust gas treatment liquid 4 to the cooling can 3 and the exhaust gas treatment device 7. , The plasma reactor pressure is a predetermined pressure,
For example, the vacuum pump 10 is maintained at 200 to 400 torr.
【０００５】高周波誘導熱プラズマ装置１及びプラズマ
反応炉２によって、フロン（ＣＦＣー１２）を高温加水
分解した場合、 ＣＣｌ2Ｆ2＋２Ｈ2Ｏ→２ＨＣｌ＋２ＨＦ＋ＣＯ2・・・・・（１） の分解反応が起こり、発生した排ガス中には、１０００
°Ｃ以上の高温で、強酸性の有害ガスであるＨＣｌ及び
ＨＦが含まれる。これらの有害ガスを含む排ガスは、真
空ポンプ１０によりダウンカマーチューブ１２に導か
れ、ダウンカマーチューブ１２の下部に位置するバッフ
ルプレート１３から冷却缶３に貯留されている排ガス処
理液４に接し、排ガス中のＨＣｌ及びＨＦの酸性ガス成
分は排ガス処理液４中にバブリングによる細かい泡とし
て放出され、排ガスは排ガス処理液４に接するので、排
ガス中の酸性ガス成分は、酸とアルカリの中和反応によ
り排ガス処理液４に吸収されて無害化され、且つ高温状
態から断熱冷却により熱を急激に奪われて６０〜７０°
Ｃまで冷却される。冷却缶３を出た排ガスは、耐腐食性
に優れた材質で構成された排ガスダクト１１を経て、排
ガス処理装置７に導かれ、完全に無害化されて真空ポン
プ１０により大気に放散される。また、排ガス処理液４
は、排ガス処理液循環ポンプ８により排ガス処理液冷却
器１４を経て排ガス処理装置７、冷却缶３へ循環させ
る。When CFC-12 is hydrolyzed at a high temperature by the high frequency induction thermal plasma apparatus 1 and the plasma reactor 2, the decomposition reaction of CCl 2 F 2 + 2H 2 O → 2HCl + 2HF + CO 2 (1) Occurs, and the generated exhaust gas contains 1000
At high temperatures above ° C, it contains HCl and HF, which are highly acidic harmful gases. Exhaust gas containing these harmful gases is guided to the downcomer tube 12 by the vacuum pump 10, contacts the exhaust gas treatment liquid 4 stored in the cooling can 3 from the baffle plate 13 located under the downcomer tube 12, The acidic gas components of HCl and HF in the exhaust gas are discharged into the exhaust gas treatment liquid 4 as fine bubbles due to bubbling, and the exhaust gas comes into contact with the exhaust gas treatment liquid 4. It is absorbed by the exhaust gas treatment liquid 4 and rendered harmless, and the heat is rapidly removed from the high temperature state by adiabatic cooling, and the temperature is 60 to 70 °.
It is cooled to C. The exhaust gas from the cooling can 3 is guided to the exhaust gas treatment device 7 through the exhaust gas duct 11 made of a material having excellent corrosion resistance, is completely detoxified, and is emitted to the atmosphere by the vacuum pump 10. Also, the exhaust gas treatment liquid 4
Is circulated through the exhaust gas treatment liquid cooler 14 by the exhaust gas treatment liquid circulation pump 8 to the exhaust gas treatment device 7 and the cooling can 3.
【０００６】[0006]
【発明が解決しようとする課題】前述の有機ハロゲン化
合物の分解処理は、排ガスと冷却缶内アルカリ溶液とが
十分に接触するので、酸性ガス成分のアルカリ吸収無害
化能力及び断熱冷却による排ガスの急速冷却能力を有し
ている点では優れている。In the above-mentioned decomposition treatment of the organic halogen compound, since the exhaust gas and the alkaline solution in the cooling can sufficiently contact with each other, the alkali absorption detoxifying ability of the acidic gas component and the rapid exhaust gas cooling by the adiabatic cooling. It is excellent in that it has a cooling capacity.
【０００７】しかしながら、高周波誘導熱プラズマ装置
を用いた有機ハロゲン化合物の分解処理設備は、排ガス
がダウンカマーチューブ及びバッフルプレートから排ガ
ス処理液を突き破りながら冷却缶内に出てくる際に安定
的な連続バブリングが行なわれないため、プラズマ反応
炉及びダウンカマーチューブ内の排ガスの流れに脈動が
生じ、また、冷却缶内の排ガス処理液の液面変動を生じ
させるので、その上部に位置する高周波誘導熱プラズマ
装置のプラズマトーチ部に圧力変動が生じ、その結果、
プラズマの安定性を損ない、有機ハロゲン化合物破壊処
理効率の悪化を招き、また、プラズマを失火させ分解処
理設備の緊急停止につながることがある。However, the facility for decomposing organic halogen compounds using the high-frequency induction thermal plasma device is stable and continuous when the exhaust gas passes through the downcomer tube and the baffle plate into the cooling can while breaking through the exhaust gas processing liquid. Since bubbling is not performed, pulsation occurs in the flow of exhaust gas in the plasma reactor and downcomer tube, and fluctuations in the liquid level of the exhaust gas treatment liquid in the cooling can occur. Pressure fluctuation occurs in the plasma torch part of the plasma device, and as a result,
This may impair the stability of the plasma, deteriorate the efficiency of the organic halogen compound destruction treatment, and may cause the plasma to ignite, leading to an emergency stop of the decomposition treatment facility.
【０００８】また、同設備のダウンカマー式分解処理排
ガス冷却装置は、排ガスを冷却缶内に貯留されている排
ガス処理液中に放出させ、バブリングにより細かい泡に
するため、処理過程での圧力損失が大きく、後流部に位
置する真空ポンプに過大な能力を持たせなければならな
いという問題がある。Further, the downcomer-type decomposition treatment exhaust gas cooling device of the same equipment discharges the exhaust gas into the exhaust gas treatment liquid stored in the cooling can, and makes fine bubbles by bubbling, resulting in pressure loss in the treatment process. However, there is a problem in that the vacuum pump located at the downstream side must have an excessive capacity.
【０００９】そこで、本発明は、高周波誘導熱プラズマ
装置のプラズマトーチ部及びプラズマ反応炉内の圧力変
動を極力小さくして、所定圧力に一定に保ち、プラズマ
の運転を安定させ、且つ真空ポンプの能力を小さくする
ことにより運転費を軽減させる処理方法及びその処理装
置を提供するものである。Therefore, according to the present invention, the pressure fluctuations in the plasma torch portion and the plasma reaction furnace of the high frequency induction thermal plasma device are kept as small as possible to keep the pressure constant at a predetermined pressure, the plasma operation is stabilized, and the vacuum pump The present invention provides a processing method and a processing apparatus for reducing the operating cost by reducing the capacity.
【００１０】[0010]
【課題を解決するための手段】有機ハロゲン化合物の分
解処理設備において、高温で、且つ強酸性の排ガスの冷
却及びその酸成分の吸収可能な高周波誘導熱プラズマ装
置のプラズマトーチ部及びプラズマ反応炉内部の圧力変
動を軽減させ、一定圧力を保つことでプラズマの安定性
及び対象物の破壊処理効率を向上させる噴霧式冷却管を
採用したことを特徴とするものである。In an apparatus for decomposing an organic halogen compound, a plasma torch part of a high-frequency induction thermal plasma device capable of cooling high temperature and strongly acidic exhaust gas and absorbing the acid component thereof and a plasma reactor. It is characterized by adopting a spray-type cooling pipe which reduces the pressure fluctuation and maintains a constant pressure to improve the stability of plasma and the destruction processing efficiency of the object.
【００１１】高周波誘導熱プラズマ装置、プラズマ反応
炉を有する高周波誘導熱プラズマ装置を用いて有機ハロ
ゲン化合物を高温加水分解し発生した排ガスを冷却する
方法において、プラズマ反応炉の下部に設けられた噴霧
式冷却管から排ガス処理液を排ガスに噴霧して冷却する
ことを特徴とする排ガス処理方法であり、そのための装
置は、高周波誘導熱プラズマ装置、プラズマ反応炉を有
する高周波誘導熱プラズマ装置において、プラズマ反応
炉の下部に噴霧式冷却管を設け、さらに前記噴霧式冷却
管の下部に冷却缶を有することを特徴とする冷却装置で
ある。In a method for cooling exhaust gas generated by high-temperature hydrolysis of an organic halogen compound using a high-frequency induction thermal plasma device and a high-frequency induction thermal plasma device having a plasma reaction furnace, a spray type provided at the bottom of the plasma reaction furnace An exhaust gas treatment method, characterized in that an exhaust gas treatment liquid is sprayed onto an exhaust gas from a cooling pipe to cool the exhaust gas, and an apparatus therefor is a high-frequency induction thermal plasma device, a high-frequency induction thermal plasma device having a plasma reactor, and a plasma reaction The cooling device is characterized in that a spray cooling pipe is provided at the bottom of the furnace, and a cooling can is provided at the bottom of the spray cooling pipe.
【００１２】[0012]
【作用】本発明は、高周波誘導熱プラズマ装置を用いた
有機ハロゲン化合物の分解処理設備において、噴霧式冷
却管を採用することによって、排ガスを直接冷却でき、
圧力変動が小さいので、高周波誘導熱プラズマ装置のプ
ラズマトーチ部及びプラズマ反応炉内部圧力を所定の圧
力に一定に保つことができる。The present invention can directly cool the exhaust gas by adopting the spray type cooling pipe in the decomposition treatment facility of the organic halogen compound using the high frequency induction thermal plasma device,
Since the pressure fluctuation is small, the internal pressures of the plasma torch part and the plasma reactor of the high frequency induction thermal plasma device can be kept constant at a predetermined pressure.
【００１３】[0013]
【実施例】本発明の１実施例を図面を用いて説明する。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described with reference to the drawings.
【００１４】図１は、出力１００ＫＷ高周波誘導熱プラ
ズマを用いてフロンを５０〜８０ｋｇ／ｈの処理能力で
分解処理した場合のものである。FIG. 1 shows a case where CFCs are decomposed by using a high-frequency induction thermal plasma with an output of 100 KW with a processing capacity of 50 to 80 kg / h.
【００１５】本発明による有機ハロゲン化合物の分解処
理設備は、有機ハロゲン化合物を分解処理するためのプ
ラズマを発生させる高周波誘導熱プラズマ装置１、プラ
ズマで１４００〜２０００°Ｃの高温雰囲気で有機ハロ
ゲン化合物を分解させるため耐熱及び耐腐食性に優れた
高アルミナ系耐火物で構成されているプラズマ反応炉
２、その下部に接続され冷却缶３からの排ガス処理液４
が噴霧される高温ガス用冷却器５、低温ガス用冷却器
６、排ガス処理液４が貯留される冷却缶３、冷却缶３か
らの排ガスを無害化する排ガス処理装置７、排ガス処理
液循環ポンプ８、排ガス処理液冷却器９、プラズマ反応
炉内の圧力を２００〜４００ｔｏｒｒに保つ真空ポンプ
１０により構成されている。The apparatus for decomposing an organohalogen compound according to the present invention comprises a high-frequency induction thermal plasma device 1 for generating a plasma for decomposing an organohalogen compound, and the plasma treatment of an organohalogen compound in a high temperature atmosphere of 1400 to 2000 ° C. A plasma reactor 2 composed of a high alumina refractory having excellent heat resistance and corrosion resistance for decomposing, and an exhaust gas treatment liquid 4 from a cooling can 3 connected to the lower part thereof.
Cooler 5 for spraying the gas, cooler 6 for low temperature gas, cooling can 3 in which the exhaust gas treatment liquid 4 is stored, exhaust gas treatment device 7 for detoxifying exhaust gas from the cooling can 3, exhaust gas treatment liquid circulation pump 8, an exhaust gas treatment liquid cooler 9, and a vacuum pump 10 for keeping the pressure in the plasma reactor at 200 to 400 torr.
【００１６】高周波誘導熱プラズマ装置１及びプラズマ
反応炉２で有機ハロゲン化合物の高温加水分解により発
生する排ガスは、前述のとおりＨＣｌあるいはＨＦのよ
うな高温で強酸性のガスを含有するものであり、真空ポ
ンプ１０により高温ガス用冷却器５に導かれる。The exhaust gas generated by the high-temperature hydrolysis of the organic halogen compound in the high-frequency induction thermal plasma apparatus 1 and the plasma reactor 2 contains a strongly acidic gas at a high temperature such as HCl or HF as described above. It is guided to the high temperature gas cooler 5 by the vacuum pump 10.
【００１７】高温ガス用冷却器５は、例えば、内径２２
０ｍｍ、高さ５５０ｍｍで二重管構造となっており、内
管の材質は浸透性カーボン、外管の材質は不浸透性カー
ボンで、両者は共に耐熱及び耐腐食性に優れている。高
温ガス用冷却器５の二重管部には、冷却缶３から排ガス
処理液４がポンプ９により３６００ｋｇ／ｈで排ガス処
理液冷却器９を経て供給され、且つ循環しており、高温
ガス用冷却器５内管を冷却するとともに内管に設置され
たカーボン製のスプレーノズルより排ガス処理液を小さ
な粒子として破壊処理排ガス中に噴霧し、主に排ガスの
冷却を行なう。高温ガス用冷却器５により冷却された排
ガスは、次に低温ガス用冷却器６に導かれる。低温ガス
冷却器６は、例えば、内径２２０ｍｍ、高さ７９０ｍｍ
の不浸透カーボン製の円筒にスプレーノズルが設置され
たものであり、高温ガス用冷却器５により冷却された排
ガス中に排ガス処理液４を５０００Ｋｇ／ｈで噴霧し、
排ガスと排ガス処理液とを十分に混合して冷却すると共
に酸成分を吸収する。The high-temperature gas cooler 5 has, for example, an inner diameter 22.
It has a double tube structure with a height of 0 mm and a height of 550 mm. The material of the inner tube is permeable carbon and the material of the outer tube is impermeable carbon, both of which are excellent in heat resistance and corrosion resistance. The exhaust gas treatment liquid 4 is supplied from the cooling can 3 at 3600 kg / h through the exhaust gas treatment liquid cooler 9 from the cooling can 3 to the double pipe portion of the cooler 5 for high temperature gas, and is circulated. While cooling the inner pipe of the cooler 5, the exhaust gas treatment liquid is sprayed as small particles into the destruction treatment exhaust gas from a carbon spray nozzle installed in the inner pipe to mainly cool the exhaust gas. The exhaust gas cooled by the high temperature gas cooler 5 is then introduced to the low temperature gas cooler 6. The low temperature gas cooler 6 has, for example, an inner diameter of 220 mm and a height of 790 mm.
The spray nozzle is installed in a cylinder made of impermeable carbon of No. 1, and the exhaust gas treatment liquid 4 is sprayed at 5000 Kg / h into the exhaust gas cooled by the cooler 5 for high temperature gas,
The exhaust gas and the exhaust gas treatment liquid are sufficiently mixed and cooled, and at the same time, the acid component is absorbed.
【００１８】低温ガス用冷却器６により冷却され、その
酸成分を排ガス処理液に吸収された排ガスと排ガス処理
液の混合物は次の冷却缶３に導かれる。冷却缶３は、例
えば、内径１２００ｍｍ、高さ１６００ｍｍの炭素鋼製
円筒容器で、その内部に耐腐食性に優れたゴムライニン
グを施している。排ガスと排ガス処理液の混合物は、冷
却缶３で排ガスと排ガス処理液に分離される。The mixture of the exhaust gas and the exhaust gas treatment liquid cooled by the cooler 6 for low temperature gas and having the acid component absorbed in the exhaust gas treatment liquid is guided to the next cooling can 3. The cooling can 3 is, for example, a carbon steel cylindrical container having an inner diameter of 1200 mm and a height of 1600 mm, and a rubber lining excellent in corrosion resistance is applied to the inside thereof. The mixture of the exhaust gas and the exhaust gas treatment liquid is separated into the exhaust gas and the exhaust gas treatment liquid by the cooling can 3.
【００１９】冷却缶３内の排ガスと排ガス処理液との混
合物より分離された排ガスは、耐腐食性に優れた材質で
構成された排ガスダクト１１を経て、排ガス処理装置７
に導かれ、完全に無害化されて真空ポンプにより大気に
放散される。The exhaust gas separated from the mixture of the exhaust gas in the cooling can 3 and the exhaust gas treatment liquid passes through the exhaust gas duct 11 made of a material having excellent corrosion resistance, and then the exhaust gas treatment device 7
, It is completely detoxified and released to the atmosphere by a vacuum pump.
【００２０】[0020]
【発明の効果】本発明の効果は、次のとおりである。The effects of the present invention are as follows.
【００２１】（１） 本発明は、有機ハロゲン化合物の
分解処理設備において、高温で、且つ強酸性の分解処理
排ガスの冷却及びその酸成分の吸収可能な高周波誘導熱
プラズマ装置のプラズマトーチ部及びプラズマ反応炉内
部の圧力変動を軽減させ、一定圧力を保つことでプラズ
マの安定性及び対象物の分解処理効率を向上させること
ができる。また、排ガスの冷却及び酸成分の吸収におけ
る圧力損失が従来法に比べて小さいため、真空ポンプの
運転費も低減される。(1) The present invention relates to a plasma torch unit and plasma of a high-frequency induction thermal plasma device capable of cooling exhaust gas of a strong acid decomposition treatment and absorbing its acid component in a decomposition treatment facility of an organic halogen compound. By reducing the pressure fluctuation inside the reaction furnace and maintaining a constant pressure, it is possible to improve the stability of plasma and the efficiency of decomposition treatment of the target. Further, since the pressure loss in cooling the exhaust gas and absorbing the acid component is smaller than that in the conventional method, the operating cost of the vacuum pump is also reduced.
【図１】本発明による破壊処理排ガス処理装置の説明
図。FIG. 1 is an explanatory view of a destruction treatment exhaust gas treatment apparatus according to the present invention.
【図２】従来の破壊処理排ガス処理装置の説明図。FIG. 2 is an explanatory diagram of a conventional destruction treatment exhaust gas treatment device.
１ 高周波誘導熱プラズマ装置、 ２ プラズマ反応
炉、 ３ 冷却缶、 ４排ガス処理液、 ５ 高温ガス
用冷却器、 ６ 低温ガス用冷却器、７ 排ガス処理装
置、 ８ 排ガス処理液循環ポンプ、 ９ 排ガス処理
液冷却器、 １０ 真空ポンプ、 １１ 排ガスダク
ト、 １２ ダウンカマーチューブ、 １３ バッフル
プレート1 high frequency induction thermal plasma device, 2 plasma reactor, 3 cooling can, 4 exhaust gas treatment liquid, 5 high temperature gas cooler, 6 low temperature gas cooler, 7 exhaust gas treatment device, 8 exhaust gas treatment liquid circulation pump, 9 exhaust gas treatment Liquid cooler, 10 vacuum pump, 11 exhaust gas duct, 12 downcomer tube, 13 baffle plate
Claims (3)
反応炉での有機ハロゲン化合物の高温加水分解により発
生した排ガスの冷却処理方法において、プラズマ反応炉
からの排ガスに排ガス処理液を噴霧して冷却することを
特徴とする排ガスの冷却処理方法。1. A method for cooling exhaust gas produced by high-temperature hydrolysis of an organic halogen compound in a plasma reactor using high-frequency induction thermal plasma, wherein the exhaust gas from the plasma reactor is sprayed with an exhaust gas treatment liquid for cooling. An exhaust gas cooling treatment method characterized by the above.
ハロゲン化合物の高温加水分解により発生した排ガスの
冷却処理装置において、プラズマを発生させる高周波誘
導熱プラズマ装置と、前記プラズマによる高温雰囲気で
有機ハロゲン化合物を分解させるプラズマ反応炉と、そ
の下部に接続されたプラズマ反応炉からの排ガスを排ガ
ス処理液を噴霧して冷却する噴霧式冷却器を具備するこ
とを特徴とする排ガスの冷却処理装置。2. A cooling treatment apparatus for exhaust gas generated by high-temperature hydrolysis of an organic halogen compound using a high-frequency induction thermal plasma apparatus, wherein a high-frequency induction thermal plasma apparatus for generating plasma and an organic halogen compound in a high-temperature atmosphere generated by the plasma are used. An exhaust gas cooling treatment apparatus comprising: a plasma reaction furnace for decomposing gas and a spray-type cooler connected to the lower portion of the plasma reaction furnace for spraying and cooling the exhaust gas from the plasma reaction furnace.
却器と、その下部に低温ガス用噴霧式冷却器であること
を特徴とする請求項２記載の排ガスの冷却処理装置。3. The exhaust gas cooling treatment apparatus according to claim 2, wherein the atomizing cooler is a high temperature gas atomizing cooler and a low temperature gas atomizing cooler at a lower portion thereof.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12686895A JP3571800B2 (en) | 1995-05-25 | 1995-05-25 | Exhaust gas cooling system in organic halogen compound processing equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12686895A JP3571800B2 (en) | 1995-05-25 | 1995-05-25 | Exhaust gas cooling system in organic halogen compound processing equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH08318129A true JPH08318129A (en) | 1996-12-03 |
| JP3571800B2 JP3571800B2 (en) | 2004-09-29 |
Family
ID=14945832
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12686895A Expired - Fee Related JP3571800B2 (en) | 1995-05-25 | 1995-05-25 | Exhaust gas cooling system in organic halogen compound processing equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3571800B2 (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20030067241A (en) * | 2002-02-07 | 2003-08-14 | 주식회사 유민이엔씨 | Method and Apparatus for excluding dioxin and fly ash using high temperature plasma |
| KR20030080447A (en) * | 2002-04-08 | 2003-10-17 | 최경수 | Gas scrubber |
| KR100910875B1 (en) * | 2008-03-21 | 2009-08-06 | 한국기계연구원 | Plasma scrubber |
| JP2013086037A (en) * | 2011-10-19 | 2013-05-13 | Japan Fine Ceramics Center | Particle collection device and spray pyrolysis apparatus |
| WO2018135772A1 (en) * | 2017-01-23 | 2018-07-26 | Edwards Korea Ltd. | Nitrogen oxide reduction apparatus and gas treating apparatus |
| US11430638B2 (en) | 2017-01-23 | 2022-08-30 | Edwards Limited | Plasma generating apparatus and gas treating apparatus |
-
1995
- 1995-05-25 JP JP12686895A patent/JP3571800B2/en not_active Expired - Fee Related
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20030067241A (en) * | 2002-02-07 | 2003-08-14 | 주식회사 유민이엔씨 | Method and Apparatus for excluding dioxin and fly ash using high temperature plasma |
| WO2003066197A1 (en) * | 2002-02-07 | 2003-08-14 | Tbi Co., Ltd | Method and apparatus for excluding dioxin and fly ash using high temperature plasma |
| KR20030080447A (en) * | 2002-04-08 | 2003-10-17 | 최경수 | Gas scrubber |
| KR100910875B1 (en) * | 2008-03-21 | 2009-08-06 | 한국기계연구원 | Plasma scrubber |
| JP2013086037A (en) * | 2011-10-19 | 2013-05-13 | Japan Fine Ceramics Center | Particle collection device and spray pyrolysis apparatus |
| WO2018135772A1 (en) * | 2017-01-23 | 2018-07-26 | Edwards Korea Ltd. | Nitrogen oxide reduction apparatus and gas treating apparatus |
| US11430638B2 (en) | 2017-01-23 | 2022-08-30 | Edwards Limited | Plasma generating apparatus and gas treating apparatus |
| US11985754B2 (en) | 2017-01-23 | 2024-05-14 | Edwards Korea Ltd. | Nitrogen oxide reduction apparatus and gas treating apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3571800B2 (en) | 2004-09-29 |
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