JPH08281502A - Crystal orientating coated tool - Google Patents
Crystal orientating coated toolInfo
- Publication number
- JPH08281502A JPH08281502A JP11372195A JP11372195A JPH08281502A JP H08281502 A JPH08281502 A JP H08281502A JP 11372195 A JP11372195 A JP 11372195A JP 11372195 A JP11372195 A JP 11372195A JP H08281502 A JPH08281502 A JP H08281502A
- Authority
- JP
- Japan
- Prior art keywords
- hard film
- plane
- coating
- layer
- coated tool
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000013078 crystal Substances 0.000 title claims abstract description 31
- 239000000758 substrate Substances 0.000 claims abstract description 33
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 21
- 239000000956 alloy Substances 0.000 claims abstract description 21
- 230000000737 periodic effect Effects 0.000 claims abstract description 4
- 238000000576 coating method Methods 0.000 claims description 36
- 239000011248 coating agent Substances 0.000 claims description 33
- 239000011247 coating layer Substances 0.000 claims description 13
- 239000010410 layer Substances 0.000 claims description 12
- 239000000203 mixture Substances 0.000 claims description 12
- 238000002441 X-ray diffraction Methods 0.000 claims description 6
- 239000000919 ceramic Substances 0.000 claims description 6
- 150000001875 compounds Chemical class 0.000 claims description 6
- 229910052751 metal Inorganic materials 0.000 claims description 5
- 239000002184 metal Substances 0.000 claims description 5
- 150000001247 metal acetylides Chemical class 0.000 claims description 4
- 239000006104 solid solution Substances 0.000 claims description 4
- 150000004649 carbonic acid derivatives Chemical class 0.000 claims description 3
- 150000004767 nitrides Chemical class 0.000 claims description 3
- 239000002356 single layer Substances 0.000 claims description 3
- 238000005524 ceramic coating Methods 0.000 claims description 2
- 238000005299 abrasion Methods 0.000 abstract 1
- 239000010936 titanium Substances 0.000 description 25
- 230000000052 comparative effect Effects 0.000 description 9
- 238000000034 method Methods 0.000 description 9
- 238000005240 physical vapour deposition Methods 0.000 description 7
- 230000008020 evaporation Effects 0.000 description 6
- 238000001704 evaporation Methods 0.000 description 6
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 5
- 239000000463 material Substances 0.000 description 4
- 229910017150 AlTi Inorganic materials 0.000 description 3
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- 229910000838 Al alloy Inorganic materials 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229910000997 High-speed steel Inorganic materials 0.000 description 2
- 229910008651 TiZr Inorganic materials 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000010849 ion bombardment Methods 0.000 description 2
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- PIGFYZPCRLYGLF-UHFFFAOYSA-N Aluminum nitride Chemical compound [Al]#N PIGFYZPCRLYGLF-UHFFFAOYSA-N 0.000 description 1
- GQPLMRYTRLFLPF-UHFFFAOYSA-N Nitrous Oxide Chemical class [O-][N+]#N GQPLMRYTRLFLPF-UHFFFAOYSA-N 0.000 description 1
- 229910001069 Ti alloy Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000011225 non-oxide ceramic Substances 0.000 description 1
- 229910052575 non-oxide ceramic Inorganic materials 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 102220033831 rs145989498 Human genes 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Landscapes
- Cutting Tools, Boring Holders, And Turrets (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、基体上に結晶配向させ
た硬質膜を被覆した結晶配向性被覆工具に関し、具体的
には、例えば旋削工具，フライス工具，ドリルなどの切
削工具、または型工具，切断刃，裁断刃などの耐摩耗工
具として適する結晶配向性被覆工具に関するものであ
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a crystallographically-oriented coated tool in which a hard film having a crystallographic orientation is coated on a substrate. The present invention relates to a crystal-oriented coated tool suitable as a wear resistant tool such as a tool, a cutting blade, and a cutting blade.
【０００２】[0002]
【従来の技術】従来からＴｉ合金，Ａｌ合金，高速度
鋼，耐熱合金などの合金、超硬合金，サ−メットなどの
焼結合金またはＡｌ2Ｏ3，ＺｒＯ2に代表される酸化物
系セラミックス，Ｓｉ3Ｎ4，ＡｌＮに代表される非酸化
物系セラミックスなどの各種セラミックス焼結体の基体
上に、周期律表４ａ，５ａ，６ａの炭化物，窒化物，炭
酸化物，窒酸化物およびこれらの相互固溶体の中から選
ばれた少なくとも１種の単層もしくは多層でなる硬質膜
が被覆された被覆工具が検討され、実用化されている。2. Description of the Related Art Conventionally, alloys such as Ti alloys, Al alloys, high speed steels and heat resistant alloys, cemented carbides, sintered alloys such as cermets, or oxides represented by Al 2 O 3 and ZrO 2. On the substrates of various ceramics sintered bodies such as ceramics, non-oxide ceramics represented by Si 3 N 4 and AlN, carbides, nitrides, carbonates, nitrous oxides of the periodic tables 4a, 5a, 6a and A coated tool coated with a hard film of at least one single layer or multiple layers selected from these mutual solid solutions has been studied and put into practical use.
【０００３】これらの被覆工具の中でも硬質膜の結晶性
または結晶配向性に着目し、硬質膜をＸ線回折法により
検討し、提案されている代表的なものとして、特公昭５
９−１８４７４号公報および特開平２−１５９３６３号
公報がある。Among these coated tools, focusing on the crystallinity or crystal orientation of the hard film, the hard film was examined by the X-ray diffraction method, and as a typical one proposed, Japanese Patent Publication No.
9-18474 and JP-A-2-159363.
【０００４】[0004]
【発明が解決しようとする課題】基体に被覆した硬質膜
の結晶性または結晶配向性に着目した従来の被覆工具の
内、特公昭５９−１８４７４号公報には、超硬合金の基
体表面に被覆したＢ１型固溶体でなる硬質膜の（２０
０）面からのＣｕ−Ｋα線によるＸ線回折曲線の半価幅
が２θで０．４°以上からなる切削用被覆超硬合金チッ
プについて開示されている。Among the conventional coated tools which pay attention to the crystallinity or crystal orientation of the hard film coated on the substrate, Japanese Patent Publication No. 59-18474 discloses a cemented carbide substrate coated on its surface. Of the hard film made of the B1 type solid solution
A coated cemented carbide tip for cutting is disclosed in which the half width of the X-ray diffraction curve by Cu-Kα ray from the (0) plane is 0.4 ° or more at 2θ.
【０００５】また、特開平２−１５９３６３号公報に
は、超硬合金の基体表面にイオンプレ−ティングにより
被覆した基体表面に接するＴｉの化合物膜でなる第１層
がＣｕ−Ｋα線によるＸ線回折において、（１１１）結
晶面が最も高く、かつ半価幅が最も狭い回折ピ−クが現
れるという被覆超硬合金切削工具について開示されてい
る。Further, in Japanese Laid-Open Patent Publication No. 2-159363, the first layer made of a Ti compound film in contact with the surface of a substrate made of a cemented carbide by ion plating is a Cu-Kα ray for X-ray diffraction. Discloses a coated cemented carbide cutting tool in which a diffraction peak having the highest (111) crystal plane and the narrowest half-value width appears.
【０００６】これら両公報に記載の被覆超硬合金切削工
具は、前者が結晶性に着目したものと推測され、後者が
結晶配向性に着目したものと推測されるが、硬質膜の結
晶構造とそれから生ずる残留応力について配慮していな
いために、同一組成成分の硬質膜であっても硬質膜の硬
さ及び強度が最高に達していなく、その結果耐摩耗性が
まだ満足できなく、工具として短寿命であるという問題
がある。In the coated cemented carbide cutting tools described in both of these publications, it is assumed that the former focused on crystallinity and the latter focused on crystal orientation. Since no consideration was given to the residual stress generated from it, the hardness and strength of the hard film did not reach the maximum even with a hard film of the same composition component, and as a result, the wear resistance was not yet satisfactory and the tool was short. There is a problem of being a lifespan.
【０００７】本発明は、上述のような問題点を解決した
もので、具体的には、硬質膜の結晶粒と結晶面の配向性
を主とする硬質膜の結晶構造に着目し、硬質膜の残留応
力を最適にして硬質膜の硬さおよび強度を高め、その結
果、耐剥離性および耐摩耗性に優れるようにした結晶配
向性被覆工具の提供を目的とするものである。The present invention solves the above-mentioned problems. Specifically, the present invention focuses on the crystal structure of the hard film, which mainly consists of the crystal grains of the hard film and the orientation of the crystal planes. It is an object of the present invention to provide a crystallographically-oriented coated tool in which the residual stress of (1) is optimized to increase the hardness and strength of a hard film, and as a result, the peeling resistance and wear resistance are excellent.
【０００８】[0008]
【課題を解決するための手段】本発明者らは、長年に亘
り、上述に代表的なものとして例示した従来から用いら
れている合金，焼結合金，セラミックス焼結体の基体上
に、硬質膜を被覆した被覆工具について検討していたと
ころ、被覆条件により硬質膜の結晶を配向させ得るこ
と、硬質膜を結晶配向させると硬質膜に残留する応力が
変化すること、硬質膜の結晶を（１１１）面に強く配向
させて、かつ（２００）面の結晶成長を抑制して、より
微細な（２００）面の結晶粒として存在させることによ
り、硬質膜に圧縮応力が残存し、硬質膜の強度および耐
摩耗性が向上するという知見を得て、本発明を完成する
に至ったものである。SUMMARY OF THE INVENTION The inventors of the present invention have developed a hard alloy on a substrate of an alloy, a sintered alloy, or a ceramics sintered body, which has been used as a typical example above for many years. As a result of studying a coated tool coated with a film, it is possible to orient the crystals of the hard film depending on the coating conditions, that the stress remaining in the hard film changes when the hard film is crystallized, and the crystals of the hard film are By strongly orienting to the (111) plane and suppressing the crystal growth of the (200) plane so as to exist as finer crystal grains of the (200) plane, compressive stress remains in the hard film and The present invention has been completed based on the finding that strength and wear resistance are improved.
【０００９】すななち、本発明の結晶配向性被覆工具
は、合金，焼結合金またはセラミックス焼結体の基体上
に、金属および／またはセラミックスの被膜が被覆され
た被覆工具であって、該被膜は、周期律表４ａ，５ａ，
６ａ族元素の炭化物，窒化物，炭酸化物，窒酸化物およ
びこれらの相互固溶体の中から選ばれた少なくとも１種
の単層もしくは多層の硬質膜でなり、該硬質膜は、Ｃｕ
−Ｋα線のＸ線回折線ピ−クによる（２００）面に対す
る（１１１）面の強度比が２〜６０［（１１１）面の強
度をｈ（１１１）とし、（２００）面の強度をｈ（２０
０）とすると、ｈ（１１１）／ｈ（２００）＝２〜６０
でなる］でなり、（２００）面の半値幅が０．５〜１．
２からなり、かつ（２００）面の半値幅が（１１１）面
の半値幅よりも大きいことを特徴とするものである。That is, the crystallographically-oriented coated tool of the present invention is a coated tool in which a metal and / or ceramic coating is coated on a substrate of an alloy, a sintered alloy or a ceramics sintered body, The coating is composed of periodic tables 4a, 5a,
The hard film is a single-layer or multi-layer hard film of at least one selected from the group consisting of carbides, nitrides, carbonates, oxynitrides of 6a group elements and their mutual solid solutions.
The intensity ratio of the (111) plane to the (200) plane by the X-ray diffraction peak of -Kα ray is 2 to 60 [the intensity of the (111) plane is h (111), and the intensity of the (200) plane is h. (20
0), h (111) / h (200) = 2-60
And the half-value width of the (200) plane is 0.5 to 1.
And the half width of the (200) plane is larger than that of the (111) plane.
【００１０】本発明の被覆工具における基体は、従来か
らの被覆工具に用いられている硬質膜を被覆するための
各種の基体、具体的には、［従来の技術］の欄に記載し
た各種の合金，焼結合金またはセラミックス焼結体であ
り、好ましくは焼結合金、特に超硬合金でなる場合には
硬質膜の効果を最大に発揮させ得ることから好ましい。The substrates in the coated tool of the present invention are various substrates for coating a hard film used in conventional coated tools, specifically, various substrates described in the "Prior Art" section. An alloy, a sintered alloy or a ceramics sintered body, preferably a sintered alloy, particularly a cemented carbide is preferable because the effect of the hard film can be maximized.
【００１１】この基体上に被覆する硬質膜は、具体的に
は、例えばＴｉＣ，ＺｒＣ，ＨｆＣ，ＴａＣ，ＮｂＣ，
ＶＣ，ＷＣ，Ｍｏ2Ｃ，Ｃｒ3Ｃ2，ＴｉＮ，ＺｒＮ，Ｈ
ｆＮ，ＴａＮ，ＮｂＮ，ＶＮ，ＣｒＮ，Ｔｉ（ＣＮ），
Ｔｉ（ＣＯ），Ｔｉ（ＮＯ），Ｔｉ（ＣＮＯ），Ｚｒ
（ＣＮ），Ｔａ（ＣＮ），Ｈｆ（ＣＮ）を挙げることが
できる。この硬質膜は、被膜の強度および耐摩耗性、並
びに被覆工具全体の寿命を高めるために、０．５〜１５
μｍの膜厚でなることが好ましく、特に１〜１０μｍの
膜厚でなることが好ましい。The hard film to be coated on this substrate is specifically, for example, TiC, ZrC, HfC, TaC, NbC,
VC, WC, Mo 2 C, Cr 3 C 2 , TiN, ZrN, H
fN, TaN, NbN, VN, CrN, Ti (CN),
Ti (CO), Ti (NO), Ti (CNO), Zr
(CN), Ta (CN), Hf (CN) can be mentioned. This hard film is added in an amount of 0.5 to 15 in order to improve the strength and wear resistance of the coating and the life of the coated tool as a whole.
The film thickness is preferably μm, and particularly preferably 1 to 10 μm.
【００１２】この硬質膜は、Ｃｕタ−ゲットによるＫα
線でＸ線回折したときの回折線ピ−ク高さの比、具体的
には、（２００）結晶面のピ−ク高さ：ｈ（２００）に
対する（１１１）結晶面のピ−ク高さ：ｈ（１１１）の
比が２〜６０［ｈ（１１１）／ｈ（２００）＝２〜６
０］でなるように結晶配向されており、さらに（２０
０）結晶面の半価幅が０．５〜１．２で、かつ（２０
０）結晶面の半価幅が（１１１）結晶面の半価幅より大
きくすることにより（２００）結晶面の成長を抑制して
いるものであり、（２００）結晶面の半価幅が（２２
０）結晶面の半価幅よりも小さいことが好ましいことで
ある。This hard film is made of Kα by Cu target.
Of peak height of diffraction line when X-ray diffracted by X-ray, specifically, peak height of (200) crystal plane: peak height of (111) crystal plane with respect to h (200) S: The ratio of h (111) is 2 to 60 [h (111) / h (200) = 2 to 6
0] and the crystal orientation is
0) The full width at half maximum of the crystal plane is 0.5 to 1.2, and (20)
The growth of the (200) crystal plane is suppressed by setting the half width of the (0) crystal face to be larger than the half width of the (111) crystal face, and the half width of the (200) crystal face is ( 22
0) It is preferable that it is smaller than the full width at half maximum of the crystal plane.
【００１３】また、この硬質膜は、Ｔｉを含む立方晶構
造化合物、具体的には、例えばＴｉＣ，ＴｉＮ，Ｔｉ
（ＣＮ），Ｔｉ（ＣＯ），Ｔｉ（ＮＯ），Ｔｉ（ＣＮ
Ｏ），（ＴｉＺｒ）Ｃ，（ＴｉＺｒ）Ｎでなる立方晶構
造化合物でなることが好ましく、このＴｉを含む立方晶
構造化合物であって同一組成の被覆層でなる２層とこの
同一組成の被覆層とは異なる異種組成の被覆層でなる１
層とが被覆されており、前者の同一組成の被覆層が後者
の異種組成の被覆層を挟持（サンドイッチ）した少なく
とも３層の被膜が被覆された被膜構成になっていること
もより好ましいことである。具体的には、例えばＴｉＮ
層−ＴｉＣ層−ＴｉＮ層、ＴｉＮ層−Ｔｉ（ＣＮ）層−
ＴｉＮ層、Ｔｉ（ＣＮ）層−ＴｉＮ層−Ｔｉ（ＣＮ）
層，ＴｉＮ層−（ＡｌＴｉ）Ｎ層−ＴｉＮ層の被膜構成
である。The hard film is made of a cubic structure compound containing Ti, specifically TiC, TiN, Ti.
(CN), Ti (CO), Ti (NO), Ti (CN
O), (TiZr) C, and (TiZr) N are preferably cubic crystal structure compounds, and the cubic crystal structure compound containing Ti and two coating layers having the same composition and the coating having the same composition. Consisting of a coating layer of a different composition from the layer 1
It is also more preferable that the first and second coating layers have the same composition and the latter coating layer has the same composition and at least three coating layers sandwiching the latter coating layers having different compositions are coated. is there. Specifically, for example, TiN
Layer-TiC Layer-TiN Layer, TiN Layer-Ti (CN) Layer-
TiN layer, Ti (CN) layer-TiN layer-Ti (CN)
And a TiN layer- (AlTi) N layer-TiN layer.
【００１４】基体上に被覆される被膜は、上述の硬質膜
が基体に直接被覆されている場合、または基体と硬質膜
との間に金属の下地層を介在させる場合、具体的には、
例えばＴｉ，Ｚｒ，Ｖ，Ｍｏ，Ｗ，Ｔａ，Ｃｏ，Ｎｉ，
Ａｌおよびこれらの相互合金の中の少なくとも１種の金
属の下地層を介在させることである。特に、基体がＴｉ
合金，Ａｌ合金，高速度鋼，耐熱合金に代表される合金
でなる場合には、基体と硬質膜との間に厚さが１μｍ以
下の金属の下地層（例えば、Ｔｉ，Ａｌ）を介在させる
と、硬質膜を含めた被膜全体の耐剥離性が高まることか
ら好ましいことである。The coating film coated on the substrate is, when the above-mentioned hard film is directly coated on the substrate or when a metal underlayer is interposed between the substrate and the hard film, specifically,
For example, Ti, Zr, V, Mo, W, Ta, Co, Ni,
Interposing an underlayer of at least one metal in Al and their mutual alloys. Especially when the base is Ti
In the case of alloys, Al alloys, high speed steels, and alloys typified by heat resistant alloys, a metal underlayer (for example, Ti, Al) having a thickness of 1 μm or less is interposed between the substrate and the hard film. Is preferable because the peeling resistance of the entire coating including the hard coating is enhanced.
【００１５】基体上に直接または下地層を介して硬質膜
を被覆した被覆工具の他に、さらに工具の形状もしくは
用途に最適になるように硬質膜の表面に、従来からの被
覆層、例えばＡｌ2Ｏ3，（ＡｌＴｉ）Ｎ，（ＡｌＴｉ）
（ＣＮ）を被覆することも好ましいことである。In addition to a coated tool in which a hard film is coated on a substrate directly or via an underlayer, a conventional coating layer such as Al may be formed on the surface of the hard film so as to be optimized for the shape or application of the tool. 2 O 3 , (AlTi) N, (AlTi)
It is also preferred to coat (CN).
【００１６】本発明の結晶配向性被覆工具は、従来から
使われている基体の表面に従来から行われている物理蒸
着法（ＰＶＤ法），化学蒸着法（ＣＶＤ法）またはプラ
ズマＣＶＤ法を応用して作製することができる。特に、
硬質膜は、ＰＶＤ法により作製すると硬質膜の構成の調
整が容易になることから、好ましいことである。したが
って、本発明の結晶配向性被覆工具は、ＰＶＤ法により
作製した硬質層のみでなる被膜構成、またはＰＶＤ法，
ＣＶＤ法もしくはプラズマＣＶＤ法により作製した従来
の被覆層とＰＶＤ法により作製した硬質膜とを組み合わ
せて作製した被膜構成にすることが好ましいことであ
る。The crystallographically-oriented coated tool of the present invention applies the conventional physical vapor deposition method (PVD method), chemical vapor deposition method (CVD method) or plasma CVD method to the surface of a conventionally used substrate. Can be manufactured. In particular,
The hard film is preferable because it is easy to adjust the constitution of the hard film when it is manufactured by the PVD method. Therefore, the crystallographically-oriented coated tool of the present invention has a coating structure composed of only a hard layer produced by the PVD method, or a PVD method,
It is preferable to have a coating structure produced by combining a conventional coating layer produced by the CVD method or the plasma CVD method and a hard film produced by the PVD method.
【００１７】硬質膜を作製するには、具体的には、基体
を被覆処理前に予備加熱，イオンボンバ−ド処理などを
行って基体表面に付着している不純物の除去、硬質膜を
構成するための前駆体物質を蒸発させる速度、反応容器
内のガス流量および圧力、被覆時の基体へのバイアス電
圧を調整することが重要である。In order to form a hard film, specifically, the substrate is preheated before the coating process, the ion bombardment process is performed to remove the impurities adhering to the surface of the substrate, and the hard film is formed. It is important to adjust the rate at which the precursor material is vaporized, the gas flow rate and pressure in the reaction vessel, and the bias voltage to the substrate during coating.
【００１８】[0018]
【作用】本発明の結晶配向性被覆工具は、主として基体
の熱膨張係数と被膜の熱膨張係数との関係から基体の材
質に大きく影響されるが、特に合金，焼結合金でなる基
体の場合には、（１１１）結晶面を成長させて、かつ
（２００）結晶面の成長を抑制させて、その方位面の結
晶粒を小さくした硬質膜が被膜に圧縮応力を残留させる
作用をし、その結果、硬質膜の強度，耐摩耗性を高める
作用が強くなっているものである。In the crystal-oriented tool of the present invention, the material of the substrate is greatly affected mainly by the relationship between the coefficient of thermal expansion of the substrate and the coefficient of thermal expansion of the coating, but especially in the case of a substrate made of an alloy or a sintered alloy. In addition, the hard film, which grows the (111) crystal face and suppresses the growth of the (200) crystal face, and has the crystal grains in the orientation plane made smaller, acts to leave compressive stress in the film. As a result, the action of enhancing the strength and wear resistance of the hard film is strengthened.
【００１９】[0019]
【実施例】ＪＩＳ規格Ｂ４１０４（超硬チップ）に記載
の材質：Ｋ１０相当、形状：ＳＮＧＡ１２０４０８でな
る市販の超硬合金を基体とし、この基体表面を従来から
行われているような有機溶媒による洗浄および乾燥を施
した後、ＰＶＤ反応容器内に設置し、プラズマ電流：２
４０Ａ，圧力：１．５×１０-3Ｔｏｒｒ，Ａｒガス流
量：１００ｓｃｃｍ，時間：６０ｍｉｎの条件で予備加
熱し、次にプラズマ電流：１００Ａ，圧力：１．１×１
０-3Ｔｏｒｒ，Ａｒガス流量：７０ｓｃｃｍ，基体バイ
アス：−２５０Ｖ，時間：３０ｍｉｎの条件でイオンボ
ンバ−ド処理を施し、次いで表１に示す第１被覆工程
（Ｔｉ蒸発，プラズマ電流：１００Ａ，時間：５ｍｉ
ｎ，その他の変動条件は表１に記載），第２被覆工程
（Ｔｉ蒸発，プラズマ電流：２５０Ａ，時間：９０ｍｉ
ｎ，その他の変動条件は表１に記載）を経て基体表面に
窒化チタンの被膜を被覆して本発明品１〜４および比較
品１〜３の被覆工具を得た。EXAMPLE A commercially available cemented carbide of JIS KB4104 (carbide chip) material: K10 equivalent, shape: SNGA120408 is used as a substrate, and the surface of the substrate is washed with an organic solvent as is conventionally done. After drying and drying, it was placed in a PVD reactor and plasma current: 2
Preheating is performed under the conditions of 40 A, pressure: 1.5 × 10 −3 Torr, Ar gas flow rate: 100 sccm, time: 60 min, then plasma current: 100 A, pressure: 1.1 × 1.
Ion bombardment was performed under the conditions of 0 -3 Torr, Ar gas flow rate: 70 sccm, substrate bias: -250 V, time: 30 min, and then the first coating step (Ti evaporation, plasma current: 100 A, time) shown in Table 1. : 5mi
n, other variable conditions are shown in Table 1), the second coating step (Ti evaporation, plasma current: 250 A, time: 90 mi)
n and other variable conditions are shown in Table 1), and a titanium nitride film was coated on the surface of the substrate to obtain coated tools of the present invention products 1 to 4 and comparative products 1 to 3.
【００２０】こうして得た本発明品１〜４および比較品
１〜３の被膜をＣｕタ−ゲット（Ｎｉフイルタ−使用）
Ｋα線によるＸ線回折と、ＳＥＭ（走査型電子顕微鏡）
により調査し、それぞれの被膜の（１１１）面および
（２００）面の半価幅と強度を表２に示した。また、そ
れぞれの被膜の膜厚さは、逃げ面側が２．５±０．２μ
ｍ、掬い面側が４．０±０．２μｍであった。The coating films of the present invention products 1 to 4 and comparative products 1 to 3 thus obtained were Cu targets (using a Ni filter).
X-ray diffraction by Kα ray and SEM (scanning electron microscope)
Table 2 shows the full width at half maximum and the strength of the (111) plane and the (200) plane of each coating. The thickness of each coating is 2.5 ± 0.2μ on the flank side.
m, and the scooping surface side was 4.0 ± 0.2 μm.
【００２１】次に、本発明品１〜４および比較品１〜３
のそれぞれの被膜をビッカ−ス硬さ（荷重５０ｇ）によ
る硬さおよび引っ掻き硬さ試験機に相当するスクラッチ
試験機により被膜のスクラッチ強度を求めて表２に併記
した。また、本発明品１〜４および比較品に切れ刃ホ−
ニングを施した後、被削材：Ｓ４８Ｃ（ＨＢ２０５〜２
２３），切削速度：１５０ｍ／ｍｉｎ，切込み：１．５
ｍｍ，送り：０．３ｍｍ／ｒｅｖ，切削時間：２０ｍｉ
ｎの条件で、乾式切削による旋削試験を行い、そのとき
の平均逃げ面摩耗量を求めて表２に併記した。Next, products 1 to 4 of the present invention and comparative products 1 to 3
The respective scratch resistances of the respective coatings were determined by a Vickers hardness (load of 50 g) and a scratch tester corresponding to a scratch hardness tester, and the results are shown in Table 2. In addition, the cutting edge hoses of the present invention products 1 to 4 and the comparative product
After machining, the work material: S48C (HB205-2
23), cutting speed: 150 m / min, depth of cut: 1.5
mm, feed: 0.3 mm / rev, cutting time: 20 mi
A turning test by dry cutting was performed under the condition of n, and the average flank wear amount at that time was obtained and is also shown in Table 2.
【００２２】[0022]
【実施例２】実施例１で用いたと同様の基体を使用し、
かつ基体表面被膜を被覆する前段階までの前処理も実施
例１と同様に処理した後、Ｔｉ被覆の第１被覆工程（Ｔ
ｉ蒸発，プラズマ電流：１００Ａ，時間：５ｍｉｎ，そ
の他の変動条件は表３に記載、表３中の圧力は×１
０-3），窒化チタン被覆の第２被覆工程（Ｔｉ蒸発，プ
ラズマ電流：２５０Ａ，窒素ガス流量：１００〜１５０
ｓｃｃｍ，その他の変動条件は表３に記載），炭窒化チ
タン被覆の第３被覆工程（Ｔｉ蒸発，プラズマ電流：２
５０Ａ，基体バイアス−１００Ｖ，時間：本発明品１は
４０ｍｉｎ，他は４５ｍｉｎ，その他の変動条件は表３
に記載），および窒化チタン被覆の第４被覆工程（Ｔｉ
蒸発，プラズマ電流：２５０Ａ，窒素ガス流量：１００
〜１５０ｓｃｃｍ，時間：本発明品７は１５ｍｉｎ，他
は１０ｍｉｎ，その他の変動条件は表３に記載）を経て
基体表面にＴｉＮ−Ｔｉ（ＣＮ）−ＴｉＮの被膜を順次
被覆して本発明品５〜８および比較品４，５の被覆工具
を得た。Example 2 Using the same substrate as used in Example 1,
The pretreatment up to the step of coating the substrate surface coating is also performed in the same manner as in Example 1, and then the first Ti coating step (T
i evaporation, plasma current: 100 A, time: 5 min, other fluctuation conditions are shown in Table 3, and the pressure in Table 3 is × 1
0 -3 ), the second coating step of titanium nitride coating (Ti evaporation, plasma current: 250 A, nitrogen gas flow rate: 100 to 150)
sccm, other variable conditions are shown in Table 3), titanium carbonitride coating third coating step (Ti evaporation, plasma current: 2)
50 A, substrate bias -100 V, time: 40 min for the product 1 of the present invention, 45 min for others, other fluctuation conditions are shown in Table 3.
), And a fourth coating step of titanium nitride coating (Ti
Evaporation, plasma current: 250 A, nitrogen gas flow rate: 100
˜150 sccm, time: 15 minutes for the product 7 of the present invention, 10 min for others, other conditions are shown in Table 3), and the film of TiN—Ti (CN) —TiN is sequentially coated on the surface of the substrate to sequentially provide the product 5 of the present invention ~ 8 and comparative tools 4, 5 were obtained.
【００２３】こうして得た本発明品５〜８および比較品
４，５の被膜を実施例１と同様にして調べて、その結果
を表４に示した。また、本発明品５〜８および比較品
４，５のそれぞれの被膜を実施例１と同様にして、被膜
表面からのビッカ−ス硬さと被膜のスクラッチ強度を求
めて表４に併記した。（それぞれの被膜厚さは、ほぼ実
施例１の各試料と同様であった。） 次に、実施例１
と同様にして本発明品５〜８および比較品４，５の乾式
切削による旋削試験を行い、そのときの平均逃げ面摩耗
量を求めて表４に併記した。The coating films of the invention products 5 to 8 and the comparative products 4 and 5 thus obtained were examined in the same manner as in Example 1, and the results are shown in Table 4. In addition, the Vickers hardness from the surface of the coating and the scratch strength of the coating were determined in the same manner as in Example 1 for the coatings of the present invention products 5 to 8 and the comparative products 4 and 5, and are also shown in Table 4. (Each coating thickness was almost the same as each sample of Example 1.) Next, Example 1
In the same manner as the above, the turning tests by the dry cutting of the products 5 to 8 of the present invention and the comparative products 4 and 5 were performed, and the average flank wear amount at that time was obtained and is also shown in Table 4.
【００２４】[0024]
【表１】 [Table 1]
【００２５】[0025]
【表２】 [Table 2]
【００２６】[0026]
【表３】 [Table 3]
【００２７】[0027]
【表４】 [Table 4]
【００２８】[0028]
【発明の効果】本発明の結晶配向性被覆工具は、本発明
を外れた比較品に比べて被膜の硬さが高く、被膜の強度
が優れている傾向にあり、切削試験における耐摩耗性が
顕著に優れると言う効果がある。EFFECTS OF THE INVENTION The crystallographically-oriented coated tool of the present invention tends to have a higher hardness of the coating and superior strength of the coating as compared with the comparative product deviating from the present invention, and has a wear resistance in a cutting test. It has the effect of being remarkably excellent.
Claims (5)
体の基体上に、金属および／またはセラミックスの被膜
が被覆された被覆工具において、該被膜は、周期律表４
ａ，５ａ，６ａ族元素の炭化物，窒化物，炭酸化物，窒
酸化物およびこれらの相互固溶体の中から選ばれた少な
くとも１種の単層もしくは多層の硬質膜でなり、該硬質
膜は、Ｃｕ−Ｋα線のＸ線回折線ピ−クによる（２０
０）面に対する（１１１）面の強度比が２〜６０［（１
１１）面の強度をｈ（１１１）とし、（２００）面の強
度をｈ（２００）とすると、ｈ（１１１）／ｈ（２０
０）＝２〜６０でなる］でなり、（２００）面の半値幅
が０．５〜１．２からなり、かつ（２００）面の半値幅
が（１１１）面の半値幅よりも大きいことを特徴とする
結晶配向性被覆工具。1. A coated tool in which a metal and / or ceramic coating is coated on a substrate of an alloy, a sintered alloy or a ceramics sintered body, the coating having a periodic table 4
The hard film is a single-layer or multi-layer hard film selected from the group consisting of carbides, nitrides, carbonates, oxynitrides, and their mutual solid solutions of a, 5a, and 6a group elements. X-ray diffraction peak of -Kα line (20
The intensity ratio of the (111) plane to the (0) plane is 2 to 60 [(1
If the intensity of the (11) plane is h (111) and the intensity of the (200) plane is h (200), h (111) / h (20
0) = 2 to 60], the half-width of the (200) plane is 0.5 to 1.2, and the half-width of the (200) plane is larger than the half-width of the (111) plane. A crystal-oriented coated tool characterized by:
（２２０）面の半価幅よりも小さいことを特徴とする請
求項１記載の結晶配向性被覆工具。2. The crystallographically-oriented coated tool according to claim 1, wherein the hard film has a full width at half maximum of a (200) plane smaller than a full width at half maximum of a (220) plane.
なることを特徴とする請求項１または２記載の結晶配向
性被覆工具。3. The crystallographically-oriented coated tool according to claim 1, wherein the hard film has a film thickness of 1 to 10 μm.
合物からなることを特徴とする請求項１，２または３記
載の結晶配向性被覆工具。4. The crystallographically-oriented coated tool according to claim 1, wherein the hard film is made of a cubic structure compound containing Ti.
合物であって同一組成の被覆層でなる２層と該同一組成
の被覆層とは異なる異種組成の被覆層でなる１層とが被
覆されており、かつ前者の同一組成の被覆層が後者の異
種組成の被覆層をサンドイッチにした少なくとも３層で
なる多層からなることを特徴とする請求項１，２または
３記載の結晶配向性被覆工具。5. The hard film is composed of a cubic crystal structure compound containing Ti and two layers made of a coating layer having the same composition and one layer made of a coating layer having a different composition from the coating layer having the same composition. 4. The crystal orientation according to claim 1, wherein the coating layer of the same composition of the former is a multi-layer composed of at least three layers sandwiching the coating layers of the latter of different compositions. Coated tool.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11372195A JPH08281502A (en) | 1995-04-14 | 1995-04-14 | Crystal orientating coated tool |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11372195A JPH08281502A (en) | 1995-04-14 | 1995-04-14 | Crystal orientating coated tool |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH08281502A true JPH08281502A (en) | 1996-10-29 |
Family
ID=14619465
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11372195A Pending JPH08281502A (en) | 1995-04-14 | 1995-04-14 | Crystal orientating coated tool |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH08281502A (en) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10237628A (en) * | 1997-02-20 | 1998-09-08 | Sumitomo Electric Ind Ltd | Coated tool and manufacturing method thereof |
| JP2004255482A (en) * | 2003-02-25 | 2004-09-16 | Hitachi Tool Engineering Ltd | Coated end mill |
| JP2004268250A (en) * | 2003-02-17 | 2004-09-30 | Hitachi Tool Engineering Ltd | Coating end mill and target for coating |
| JP2004298972A (en) * | 2003-03-28 | 2004-10-28 | Hitachi Tool Engineering Ltd | Coated insert |
| JP2004306216A (en) * | 2003-04-09 | 2004-11-04 | Hitachi Tool Engineering Ltd | Coated cemented carbide end mill |
| JP2004306237A (en) * | 2003-04-10 | 2004-11-04 | Hitachi Tool Engineering Ltd | Coated end mill and roughing |
| JP2004337989A (en) * | 2003-05-13 | 2004-12-02 | Hitachi Tool Engineering Ltd | Coated high-speed steel tool |
| JP2017530019A (en) * | 2014-09-26 | 2017-10-12 | ヴァルター アーゲー | Coated cutting tool insert with MT-CVD TiCN on TiAl (C, N) |
-
1995
- 1995-04-14 JP JP11372195A patent/JPH08281502A/en active Pending
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10237628A (en) * | 1997-02-20 | 1998-09-08 | Sumitomo Electric Ind Ltd | Coated tool and manufacturing method thereof |
| JP4528373B2 (en) * | 1997-02-20 | 2010-08-18 | 住友電工ハードメタル株式会社 | Coated tool and manufacturing method thereof |
| JP2004268250A (en) * | 2003-02-17 | 2004-09-30 | Hitachi Tool Engineering Ltd | Coating end mill and target for coating |
| JP2004255482A (en) * | 2003-02-25 | 2004-09-16 | Hitachi Tool Engineering Ltd | Coated end mill |
| JP2004298972A (en) * | 2003-03-28 | 2004-10-28 | Hitachi Tool Engineering Ltd | Coated insert |
| JP2004306216A (en) * | 2003-04-09 | 2004-11-04 | Hitachi Tool Engineering Ltd | Coated cemented carbide end mill |
| JP2004306237A (en) * | 2003-04-10 | 2004-11-04 | Hitachi Tool Engineering Ltd | Coated end mill and roughing |
| JP2004337989A (en) * | 2003-05-13 | 2004-12-02 | Hitachi Tool Engineering Ltd | Coated high-speed steel tool |
| JP2017530019A (en) * | 2014-09-26 | 2017-10-12 | ヴァルター アーゲー | Coated cutting tool insert with MT-CVD TiCN on TiAl (C, N) |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US7083868B2 (en) | Composite structured wear resistant coating | |
| US20040110039A1 (en) | Precipitation hardened wear resistant coating | |
| EP1736565A1 (en) | Composite coatings for finishing of hardened steels | |
| JP3420024B2 (en) | Laminated coating member including crystal oriented hard film | |
| JPH08134629A (en) | Ultrafine particle laminated film and composite high hardness material for tools having the same | |
| EP1253124B2 (en) | Highly adhesive surface-coated cemented carbide and method for producing the same | |
| KR20200047543A (en) | Cloth cutting tool and coating method of cutting tool | |
| JPH07173608A (en) | Wear resistant coated member | |
| WO1991005075A1 (en) | Surface-coated hard member for cutting and abrasion-resistant tools | |
| JP3436169B2 (en) | Surface-coated cemented carbide cutting tool with an aluminum oxide layer that forms the hard coating layer exhibits excellent toughness | |
| JPH08281502A (en) | Crystal orientating coated tool | |
| JP2002346811A (en) | Coated sintered tool | |
| CN114502774A (en) | Coated cutting tool | |
| JP3333081B2 (en) | Crystal orientation high strength coated member | |
| JPH04297568A (en) | Surface coated member excellent in wear resistance and formation of film | |
| JPH10317123A (en) | Crystalline oriented hard coated member | |
| JP3360565B2 (en) | Surface coated cemented carbide cutting tool with a hard coating layer exhibiting excellent wear resistance | |
| JP3333080B2 (en) | High-strength coated members with consistent interfaces | |
| JP2000309864A (en) | Multilayer film coated member | |
| JP3371796B2 (en) | Surface coated cemented carbide cutting tool with excellent fracture resistance | |
| JP3837959B2 (en) | Surface coated tungsten carbide based cemented carbide cutting tool with excellent wear resistance due to hard coating layer | |
| JP2926882B2 (en) | Surface-coated hard member with excellent wear resistance | |
| JP3249278B2 (en) | Tool cover | |
| JPH09241825A (en) | High strength coated body | |
| WO2022244190A1 (en) | Cutting tool |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20010820 |