JPH08260193A - Sealing method of gold plated material - Google Patents
Sealing method of gold plated materialInfo
- Publication number
- JPH08260193A JPH08260193A JP6576395A JP6576395A JPH08260193A JP H08260193 A JPH08260193 A JP H08260193A JP 6576395 A JP6576395 A JP 6576395A JP 6576395 A JP6576395 A JP 6576395A JP H08260193 A JPH08260193 A JP H08260193A
- Authority
- JP
- Japan
- Prior art keywords
- formula
- alkyl
- general formula
- alkali metal
- gold
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000007789 sealing Methods 0.000 title claims abstract description 34
- 239000000463 material Substances 0.000 title claims abstract description 24
- 238000000034 method Methods 0.000 title claims description 20
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 title claims description 15
- 229910052737 gold Inorganic materials 0.000 title claims description 15
- 239000010931 gold Substances 0.000 title claims description 15
- 150000001875 compounds Chemical class 0.000 claims abstract description 21
- 239000001257 hydrogen Substances 0.000 claims abstract description 18
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 18
- 229910052783 alkali metal Inorganic materials 0.000 claims abstract description 17
- 150000001340 alkali metals Chemical class 0.000 claims abstract description 16
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 16
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 claims abstract description 11
- 125000000547 substituted alkyl group Chemical group 0.000 claims abstract description 11
- 239000012964 benzotriazole Substances 0.000 claims abstract description 6
- 235000014113 dietary fatty acids Nutrition 0.000 claims abstract description 6
- 239000000194 fatty acid Substances 0.000 claims abstract description 6
- 229930195729 fatty acid Natural products 0.000 claims abstract description 6
- 150000004665 fatty acids Chemical class 0.000 claims abstract description 6
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 claims abstract description 5
- 150000002148 esters Chemical class 0.000 claims abstract 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 26
- 238000007747 plating Methods 0.000 claims description 21
- 239000007788 liquid Substances 0.000 claims description 18
- -1 mercaptobenzothiazole compound Chemical class 0.000 claims description 13
- 229910052759 nickel Inorganic materials 0.000 claims description 13
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 9
- 150000002431 hydrogen Chemical class 0.000 claims description 8
- 229910001020 Au alloy Inorganic materials 0.000 claims description 6
- 229910045601 alloy Inorganic materials 0.000 claims description 6
- 239000000956 alloy Substances 0.000 claims description 6
- 239000007864 aqueous solution Substances 0.000 claims description 6
- 239000003353 gold alloy Substances 0.000 claims description 6
- 239000007769 metal material Substances 0.000 claims description 6
- 239000002253 acid Substances 0.000 claims description 5
- 238000012545 processing Methods 0.000 claims description 4
- 239000004215 Carbon black (E152) Substances 0.000 claims description 3
- 125000003277 amino group Chemical group 0.000 claims description 3
- 125000003118 aryl group Chemical group 0.000 claims description 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 3
- 238000005868 electrolysis reaction Methods 0.000 claims description 3
- 229930195733 hydrocarbon Natural products 0.000 claims description 3
- 150000002430 hydrocarbons Chemical class 0.000 claims description 3
- 229920006395 saturated elastomer Polymers 0.000 claims description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 2
- 239000002585 base Substances 0.000 claims description 2
- 229910052799 carbon Inorganic materials 0.000 claims description 2
- 238000003672 processing method Methods 0.000 claims 1
- 230000007797 corrosion Effects 0.000 abstract description 13
- 238000005260 corrosion Methods 0.000 abstract description 13
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 abstract description 3
- 239000000356 contaminant Substances 0.000 abstract 1
- 230000007613 environmental effect Effects 0.000 abstract 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 abstract 1
- 125000000896 monocarboxylic acid group Chemical group 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 10
- 239000000126 substance Substances 0.000 description 9
- 238000012360 testing method Methods 0.000 description 7
- 229910019142 PO4 Inorganic materials 0.000 description 6
- 235000021317 phosphate Nutrition 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 238000003780 insertion Methods 0.000 description 5
- 230000037431 insertion Effects 0.000 description 5
- 239000003112 inhibitor Substances 0.000 description 4
- 239000010452 phosphate Substances 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 230000002411 adverse Effects 0.000 description 3
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 3
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 3
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 239000000314 lubricant Substances 0.000 description 3
- WRIDQFICGBMAFQ-UHFFFAOYSA-N (E)-8-Octadecenoic acid Natural products CCCCCCCCCC=CCCCCCCC(O)=O WRIDQFICGBMAFQ-UHFFFAOYSA-N 0.000 description 2
- LQJBNNIYVWPHFW-UHFFFAOYSA-N 20:1omega9c fatty acid Natural products CCCCCCCCCCC=CCCCCCCCC(O)=O LQJBNNIYVWPHFW-UHFFFAOYSA-N 0.000 description 2
- QSBYPNXLFMSGKH-UHFFFAOYSA-N 9-Heptadecensaeure Natural products CCCCCCCC=CCCCCCCCC(O)=O QSBYPNXLFMSGKH-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- 229910000906 Bronze Inorganic materials 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 239000005642 Oleic acid Substances 0.000 description 2
- ZQPPMHVWECSIRJ-UHFFFAOYSA-N Oleic acid Natural products CCCCCCCCC=CCCCCCCCC(O)=O ZQPPMHVWECSIRJ-UHFFFAOYSA-N 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- 239000010953 base metal Substances 0.000 description 2
- 239000010974 bronze Substances 0.000 description 2
- POULHZVOKOAJMA-UHFFFAOYSA-N dodecanoic acid Chemical compound CCCCCCCCCCCC(O)=O POULHZVOKOAJMA-UHFFFAOYSA-N 0.000 description 2
- 238000003912 environmental pollution Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- IPCSVZSSVZVIGE-UHFFFAOYSA-N hexadecanoic acid Chemical compound CCCCCCCCCCCCCCCC(O)=O IPCSVZSSVZVIGE-UHFFFAOYSA-N 0.000 description 2
- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 239000012188 paraffin wax Substances 0.000 description 2
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- HXQHRUJXQJEGER-UHFFFAOYSA-N 1-methylbenzotriazole Chemical compound C1=CC=C2N(C)N=NC2=C1 HXQHRUJXQJEGER-UHFFFAOYSA-N 0.000 description 1
- RBYFKCAAFQIZAQ-UHFFFAOYSA-N 1h-1,3,5-triazine-2-thione Chemical compound S=C1N=CN=CN1 RBYFKCAAFQIZAQ-UHFFFAOYSA-N 0.000 description 1
- JXLJLMGBTDHWLJ-UHFFFAOYSA-N 3h-1,3-benzothiazole-2-thione;potassium Chemical compound [K].C1=CC=C2SC(=S)NC2=C1 JXLJLMGBTDHWLJ-UHFFFAOYSA-N 0.000 description 1
- CMGDVUCDZOBDNL-UHFFFAOYSA-N 4-methyl-2h-benzotriazole Chemical compound CC1=CC=CC2=NNN=C12 CMGDVUCDZOBDNL-UHFFFAOYSA-N 0.000 description 1
- 229910001369 Brass Inorganic materials 0.000 description 1
- 229910000531 Co alloy Inorganic materials 0.000 description 1
- 229910000640 Fe alloy Inorganic materials 0.000 description 1
- 239000005639 Lauric acid Substances 0.000 description 1
- OYHQOLUKZRVURQ-HZJYTTRNSA-N Linoleic acid Chemical compound CCCCC\C=C/C\C=C/CCCCCCCC(O)=O OYHQOLUKZRVURQ-HZJYTTRNSA-N 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 235000021314 Palmitic acid Nutrition 0.000 description 1
- 235000021355 Stearic acid Nutrition 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical compound OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 description 1
- 150000001565 benzotriazoles Chemical class 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- SFOSJWNBROHOFJ-UHFFFAOYSA-N cobalt gold Chemical compound [Co].[Au] SFOSJWNBROHOFJ-UHFFFAOYSA-N 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- JTXUVYOABGUBMX-UHFFFAOYSA-N didodecyl hydrogen phosphate Chemical compound CCCCCCCCCCCCOP(O)(=O)OCCCCCCCCCCCC JTXUVYOABGUBMX-UHFFFAOYSA-N 0.000 description 1
- 239000001177 diphosphate Substances 0.000 description 1
- XPPKVPWEQAFLFU-UHFFFAOYSA-J diphosphate(4-) Chemical compound [O-]P([O-])(=O)OP([O-])([O-])=O XPPKVPWEQAFLFU-UHFFFAOYSA-J 0.000 description 1
- 235000011180 diphosphates Nutrition 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- TVACALAUIQMRDF-UHFFFAOYSA-N dodecyl dihydrogen phosphate Chemical compound CCCCCCCCCCCCOP(O)(O)=O TVACALAUIQMRDF-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000004945 emulsification Methods 0.000 description 1
- 239000003995 emulsifying agent Substances 0.000 description 1
- 230000001804 emulsifying effect Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 235000020778 linoleic acid Nutrition 0.000 description 1
- OYHQOLUKZRVURQ-IXWMQOLASA-N linoleic acid Natural products CCCCC\C=C/C\C=C\CCCCCCCC(O)=O OYHQOLUKZRVURQ-IXWMQOLASA-N 0.000 description 1
- 230000001050 lubricating effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- GPJPBLLWYCLERP-UHFFFAOYSA-N n-(benzotriazol-1-ylmethyl)-n-octyloctan-1-amine Chemical compound C1=CC=C2N(CN(CCCCCCCC)CCCCCCCC)N=NC2=C1 GPJPBLLWYCLERP-UHFFFAOYSA-N 0.000 description 1
- WQEPLUUGTLDZJY-UHFFFAOYSA-N n-Pentadecanoic acid Natural products CCCCCCCCCCCCCCC(O)=O WQEPLUUGTLDZJY-UHFFFAOYSA-N 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 1
- 235000021313 oleic acid Nutrition 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 238000005554 pickling Methods 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- VLDHWMAJBNWALQ-UHFFFAOYSA-M sodium;1,3-benzothiazol-3-ide-2-thione Chemical compound [Na+].C1=CC=C2SC([S-])=NC2=C1 VLDHWMAJBNWALQ-UHFFFAOYSA-M 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- TUNFSRHWOTWDNC-HKGQFRNVSA-N tetradecanoic acid Chemical compound CCCCCCCCCCCCC[14C](O)=O TUNFSRHWOTWDNC-HKGQFRNVSA-N 0.000 description 1
- 150000003918 triazines Chemical class 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Landscapes
- Electroplating Methods And Accessories (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Preventing Corrosion Or Incrustation Of Metals (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、鉄合金、鉄、ステンレ
ス鋼、高ニッケル合金等の金属材料のニッケルまたはニ
ッケル含有合金めっきを下地として具備する金または金
合金めっき材の封孔処理方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for sealing a gold or gold alloy plated material having nickel or nickel-containing alloy plating of a metal material such as iron alloy, iron, stainless steel, high nickel alloy as an underlayer. It is a thing.
【0002】[0002]
【従来の技術】電子機器用接続部品であるコネクタに
は、黄銅やりん青銅にニッケル下地めっきを施し、さら
にその上に金めっきを施した材料が一般に使用される。
しかし金は高価であるために、コネクタ製造コストを下
げる目的で様々な方法が採られている。その代表的な方
法が金めっきの厚みを下げる方法であるが、金めっき厚
を薄くするとともに、皮膜のピンホールが指数関数的に
増え、耐食性が著しく低下するという問題を抱えてい
る。この問題を解決する方法のひとつに封孔処理があ
る。すなわち、各種の無機あるいは有機性の薬品で金め
っき表面を処理し、ピンホールを塞ぎ、耐食性を向上さ
せようとするものである。封孔処理液には有機系と水系
の2種類がある。有機系では溶媒としてハロゲン系有機
溶剤が一般に使用されているため、オゾン層破壊などの
問題で現在有機系封孔処理液の使用は大きく制限されて
いる。一方水系では溶媒として水を使用するため環境汚
染の点で問題はないが、従来の有機系封孔処理液に使用
されている水に難溶性のパラフィン等の潤滑剤が使用で
きないため、水系で処理しためっきは潤滑性が低く、コ
ネクタの耐久性が溶剤系よりも劣るという問題があっ
た。2. Description of the Related Art A connector, which is a connecting component for electronic equipment, is generally made of brass or phosphor bronze, which is plated with nickel underlayer and further plated with gold.
However, since gold is expensive, various methods have been adopted in order to reduce the connector manufacturing cost. A typical method thereof is a method of reducing the thickness of gold plating. However, there is a problem that as the thickness of gold plating is reduced, the number of pinholes in the film exponentially increases and the corrosion resistance significantly decreases. One of the methods for solving this problem is sealing treatment. That is, the gold plating surface is treated with various kinds of inorganic or organic chemicals to close the pinholes and improve the corrosion resistance. There are two types of sealing liquids, organic and water-based. Since a halogen-based organic solvent is generally used as a solvent in an organic system, the use of an organic sealing treatment liquid is currently greatly restricted due to problems such as ozone layer destruction. On the other hand, in the water system, since water is used as a solvent, there is no problem in terms of environmental pollution, but since it is not possible to use a lubricant such as paraffin, which is hardly soluble in the water used in conventional organic sealing treatment liquids, The treated plating had low lubricity and had a problem that the durability of the connector was inferior to that of the solvent-based plating.
【0003】[0003]
【発明が解決しようとする課題】そこで環境汚染性に問
題なく、かつ従来と同等もしくはそれ以上の封孔処理効
果を有する封孔処理液および封孔処理方法が必要となっ
ている。本発明は、このような要求を満たすことのでき
る改善された封孔処理方法を提供することを目的とした
ものである。Therefore, there is a need for a pore-sealing solution and a pore-sealing method that have no environmental pollution and have the same or higher level of pore-sealing effect as conventional ones. The present invention aims to provide an improved method for sealing treatment which can meet such requirements.
【0004】[0004]
【課題を解決するための手段】上記問題点を解決するた
めに本発明者が研究を行った結果、以下に示す表面処理
方法を発明するに至った。すなわち本発明は、 (1)金属材料にニッケルまたはニッケルを含有する合
金を下地めっきとして具備する金または金合金めっき材
の封孔処理方法において、工程1として、一般式(1)
で示されるベンゾトリアゾール系化合物、一般式(2)
で示されるメルカプトベンゾチアゾール系化合物、及び
一般式(3)で示されるトリアジン系化合物からなる群
から選ばれた1種もしくは2種以上合計で0.001〜
1wt%含有する水溶液中で前記材料を陽極として電解
した後、前記めっき材を水溶液中から取り出してから、
工程2として、一般式(4)で示される脂肪酸を1種も
しくは2種以上合計で0.05〜2wt%および、一般
式(5)と一般式(6)で示される群から選ばれたアル
キルりん酸エステルを1種もしくは2種合計で0.05
〜2wt%を必須成分とする液を前記めっき材に塗布す
ることを特徴とする表面処理方法。As a result of the research conducted by the present inventor to solve the above problems, the inventors have invented the following surface treatment method. That is, the present invention provides: (1) In a method for sealing a gold or gold alloy plated material, which comprises a metal material containing nickel or an alloy containing nickel as an undercoat, a step of the general formula (1)
A benzotriazole compound represented by the general formula (2)
0.001 to a total of one kind or two or more kinds selected from the group consisting of the mercaptobenzothiazole-based compound represented by and the triazine-based compound represented by the general formula (3).
After electrolyzing the material as an anode in an aqueous solution containing 1 wt%, the plated material is taken out of the aqueous solution,
In step 2, one or more fatty acids represented by the general formula (4) are added in a total amount of 0.05 to 2 wt% and an alkyl selected from the group represented by the general formulas (5) and (6). One or two phosphate ester in total 0.05
A surface treatment method, which comprises applying a liquid containing 2 wt% as an essential component to the plating material.
【0005】[0005]
【化5】 Embedded image
【0006】(式中、R1は水素、アルキル、置換アル
キルを表わし、R2はアルカリ金属、水素、アルキル、
置換アルキルを表わす)(In the formula, R 1 represents hydrogen, alkyl, or substituted alkyl, and R 2 represents alkali metal, hydrogen, alkyl,
Represents a substituted alkyl)
【0007】[0007]
【化6】 [Chemical 6]
【0008】(式中、R3はアルカリ金属又は水素を表
わす)(In the formula, R 3 represents an alkali metal or hydrogen)
【0009】[0009]
【化7】 [Chemical 7]
【0010】〔式中、R4は−SH,アルキル基かアリ
ール基で置換されたアミノ基、又はアルキル置換イミダ
ゾリルアルキル、R5,R6は−NH2,−SH又は−S
M(Mはアルカリ金属を表わす)を表わす〕 R7−COOH (4) (式中、R7は炭素数10〜20個の飽和及び不飽和鎖
式炭化水素を表わす)[Wherein R 4 is —SH, an amino group substituted with an alkyl group or an aryl group, or an alkyl-substituted imidazolylalkyl, and R 5 and R 6 are —NH 2 , —SH or —S
M (M represents an alkali metal) represent] R 7 -COOH (4) (wherein, R 7 represents a 10 to 20 saturated and unsaturated chain hydrocarbon having a carbon number)
【0011】[0011]
【化8】 Embedded image
【0012】(式中、R8はアルキル、置換アルキルを
表わし、Mは水素、アルカリ金属を表わす) (2)電解を極間電圧1〜5V、電流密度0.1A/m
2以上で実施する前記(1)に記載の封孔処理方法。 (3)陽極が金属材料にニッケルまたはニッケルを含有
する合金を下地めっきとして具備する金または金合金め
っき材を加工したものであることを特徴とする前記
(1)または(2)に記載の封孔処理方法である。(Wherein R 8 represents alkyl or substituted alkyl, M represents hydrogen or alkali metal) (2) Electrolysis voltage between electrodes 1 to 5 V, current density 0.1 A / m
The sealing treatment method according to (1) above, which is carried out at 2 or more. (3) The seal according to (1) or (2) above, wherein the anode is a processed gold or gold alloy plated material having nickel or an alloy containing nickel as a base plating in a metal material. This is a hole treatment method.
【0013】本発明の封孔処理方法の工程1で使用する
水溶液には、インヒビターとして以下に示される化合
物、すなわちベンゾトリアゾール系化合物、メルカプト
ベンゾチアゾール系化合物、トリアジン系化合物の中か
ら1種もしくは2種以上選択され、処理液に添加され
る。これらのインヒビターは、金めっきのピンホール内
部の下地金属であるニッケルと反応して錯化合物を生成
し、この錯化合物によりピンホールが埋められるので、
結果的に金めっきの耐食性は向上する。本発明に使用さ
れるベンゾトリアゾール系化合物は一般式(1)In the aqueous solution used in step 1 of the sealing treatment method of the present invention, one or two compounds selected from the compounds shown below as an inhibitor, that is, benzotriazole compounds, mercaptobenzothiazole compounds and triazine compounds, are used. More than one species are selected and added to the treatment liquid. These inhibitors react with nickel, which is the base metal inside the gold-plated pinhole, to form a complex compound, and the complex compound fills the pinhole.
As a result, the corrosion resistance of gold plating is improved. The benzotriazole-based compound used in the present invention has the general formula (1)
【0014】[0014]
【化9】 [Chemical 9]
【0015】(式中、R1は水素、アルキル、置換アル
キルを表わし、R2はアルカリ金属、水素、アルキル、
置換アルキルを表わす)で表わされる。この一般式
(1)で表わされる化合物のうち好ましいものを挙げる
と、例えば、ベンゾトリアゾール(R1,R2とも水
素)、1−メチルベンゾトリアゾール(R1が水素、R2
がメチル)、トリルトリアゾール(R1がメチル、R2が
水素)、1−(N,N−ジオクチルアミノメチル)ベン
ゾトリアゾール(R1が水素、R2がN,N−ジオクチル
アミノメチル)などである。(In the formula, R 1 represents hydrogen, alkyl or substituted alkyl, and R 2 represents alkali metal, hydrogen, alkyl,
Represents a substituted alkyl). Among the compounds represented by the general formula (1), preferred examples include, for example, benzotriazole (R 1 and R 2 are both hydrogen), 1-methylbenzotriazole (R 1 is hydrogen, R 2
Is methyl), tolyltriazole (R 1 is methyl, R 2 is hydrogen), 1- (N, N-dioctylaminomethyl) benzotriazole (R 1 is hydrogen, R 2 is N, N-dioctylaminomethyl), etc. is there.
【0016】本発明に使用されるメルカプトベンゾチア
ゾール系化合物は一般式(2)The mercaptobenzothiazole compound used in the present invention has the general formula (2)
【0017】[0017]
【化10】 [Chemical 10]
【0018】(式中、R3はアルカリ金属又は水素を表
わす)で表わされる。この一般式(2)で表わされる化
合物のうち好ましいものを挙げると、例えばメルカプト
ベンゾチアゾール、メルカプトベンゾチアゾールのナト
リウム塩、メルカプトベンゾチアゾールのカリウム塩な
どがある。一般式(2)においてR3がアルカリ金属の
場合メルカプトベンゾチアゾール系化合物の水への溶解
が容易となる。トリアジン系化合物は一般式(3)(In the formula, R 3 represents an alkali metal or hydrogen). Preferred examples of the compound represented by the general formula (2) include mercaptobenzothiazole, mercaptobenzothiazole sodium salt, and mercaptobenzothiazole potassium salt. In the general formula (2), when R 3 is an alkali metal, the mercaptobenzothiazole compound can be easily dissolved in water. The triazine-based compound has the general formula (3)
【0019】[0019]
【化11】 [Chemical 11]
【0020】〔式中、R4は−SH、アルキル基かアリ
ール基で置換されたアミノ基、又はアルキル置換イミダ
ゾリルアルキル、R5、R6は−NH2、−SH又は−S
M(Mはアルカリ金属を表わす)を表わす〕で表わされ
る。この一般式(3)で表わされる化合物のうち好まし
いものを挙げると例えば以下のものがある。[Wherein R 4 is —SH, an amino group substituted with an alkyl group or an aryl group, or an alkyl-substituted imidazolylalkyl, and R 5 and R 6 are —NH 2 , —SH or —S
M (M represents an alkali metal)]. Preferred examples of the compound represented by the general formula (3) include the following.
【0021】[0021]
【化12】 [Chemical 12]
【0022】あるいはこれらのNaまたはKなどのアル
カリ金属塩がある。一般式(3)においてR5,R6が−
SMである場合にはトリアジン系化合物の水への溶解が
容易となる。インヒビターの添加量は0.001〜1w
t%の範囲であり、0.001wt%未満では封孔処理
効果が認められず、1wt%を越えると接触抵抗への悪
影響が認められる。工程1ではめっき品を処理液中に浸
漬させ、材料を陽極として極間に直流またはパルス電流
を流して行う。めっき品を陽極にすることにより、溶液
中のインヒビターはめっき品のピンホール内部の下地金
属に吸着し、その腐食を防止する。電解時の極間電圧は
1〜5Vの範囲であり、極間電圧1V未満では十分効果
が得られず、5Vを超えるとめっき皮膜の溶解が多くな
り封孔処理の効果が得られない。電流密度は0.1A/
m2以上であり、0.1A/m2未満では封孔処理効果が
得られない。処理時間は1〜10秒が望ましい。処理後
はめっき材を水溶液中から取り出し、工程2の処理を行
う。Alternatively, there is an alkali metal salt such as Na or K. In the general formula (3), R 5 and R 6 are −
In the case of SM, the triazine compound can be easily dissolved in water. The amount of inhibitor added is 0.001 to 1w
If the amount is less than 0.001 wt%, the effect of sealing treatment is not observed, and if it exceeds 1 wt%, the contact resistance is adversely affected. In step 1, the plated product is immersed in the treatment liquid, and the material is used as an anode and a direct current or a pulse current is passed between the electrodes. By making the plated product an anode, the inhibitor in the solution is adsorbed to the base metal inside the pinhole of the plated product and prevents its corrosion. The inter-electrode voltage during electrolysis is in the range of 1 to 5 V, and if the inter-electrode voltage is less than 1 V, no sufficient effect can be obtained, and if it exceeds 5 V, the plating film is more dissolved and the sealing treatment effect cannot be obtained. Current density is 0.1A /
If it is m 2 or more and less than 0.1 A / m 2 , the effect of sealing treatment cannot be obtained. The processing time is preferably 1 to 10 seconds. After the treatment, the plated material is taken out of the aqueous solution and the treatment of step 2 is performed.
【0023】本発明の封孔処理方法の工程2で使用する
液には、第一の必須成分として脂肪酸のなかから1種も
しくは2種以上選択され、処理液に添加される。脂肪酸
は金めっき材の潤滑性向上に寄与する。本発明に使用さ
れる脂肪酸は一般式(4) R7−COOH (4) (式中、R7は炭素数10〜20個の飽和及び不飽和鎖
式炭化水素を表わす)で表わされる。この一般式(4)
で表わされる化合物のうち好ましいものを挙げると、例
えばラウリン酸、ミリスチン酸、パルミチン酸、ステア
リン酸、オレイン酸、リノール酸などである。添加量は
合計で0.05wt%〜2wt%の範囲であり、0.0
5wt%未満では十分な潤滑効果が得られず、2wt%
を越えると封孔処理後の材料の外観への悪影響が認めら
れる。The liquid used in step 2 of the sealing treatment method of the present invention is one or more selected from fatty acids as the first essential component and added to the treatment liquid. Fatty acids contribute to improving the lubricity of gold-plated products. The fatty acid used in the present invention is represented by the general formula (4) R 7 —COOH (4) (wherein R 7 represents a saturated or unsaturated chain hydrocarbon having 10 to 20 carbon atoms). This general formula (4)
Preferred examples of the compound represented by are lauric acid, myristic acid, palmitic acid, stearic acid, oleic acid, linoleic acid and the like. The total amount added is in the range of 0.05 wt% to 2 wt%, and 0.0
If it is less than 5 wt%, a sufficient lubricating effect cannot be obtained, and 2 wt%
If it exceeds the range, the appearance of the material after the sealing treatment is adversely affected.
【0024】本発明の封孔処理工程2で使用する液に
は、第二の必須成分として以下に示される化合物、すな
わちモノアルキルりん酸エステル、ジアルキルりん酸エ
ステルのなかから1種もしくは2種以上選択添加され、
処理液に添加される。これらのアルキルりん酸エステル
は潤滑剤の乳化剤および潤滑剤としての機能をはたす。
本発明に使用されるモノアルキルりん酸エステルは、一
般式(5)In the liquid used in the sealing treatment step 2 of the present invention, one or more compounds selected from the compounds shown below as the second essential component, that is, monoalkyl phosphates and dialkyl phosphates are used. Selectively added,
It is added to the processing solution. These alkyl phosphates function as an emulsifier and a lubricant for lubricants.
The monoalkyl phosphate used in the present invention has the general formula (5):
【0025】[0025]
【化13】 [Chemical 13]
【0026】(式中、R8はアルキル、置換アルキルを
表わし、Mは水素、アルカリ金属を表わす)で表わされ
る。一般式(5)で表わされる化合物のうち好ましいも
のを挙げるとラウリル酸性りん酸モノエステルなどがあ
る。ジアルキルりん酸エステルは、一般式(6)(In the formula, R 8 represents alkyl and substituted alkyl, M represents hydrogen and alkali metal). Preferred examples of the compound represented by the general formula (5) include lauryl acid phosphoric acid monoester. The dialkyl phosphate ester has the general formula (6)
【0027】[0027]
【化14】 Embedded image
【0028】(式中、R8はアルキル、置換アルキルを
表わし、Mは水素、アルカリ金属を表わす)で表わされ
る。一般式(6)で表わされる化合物のうち好ましいも
のを挙げると、ラウリル酸性ジりん酸エステルなどがあ
る。アルキルりん酸エステルの添加量は合計で0.05
wt〜2wt%の範囲であり、0.05wt%未満では
乳化効果が得られず、2wt%を越えるとはんだ付け性
への悪影響が認められる。工程2で使用する液の溶媒に
は、水およびエタノール、アセトン、ノルマルパラフィ
ン等のハロゲンを含まない有機溶剤から適宜選択でき
る。溶媒が水の場合は、溶液の温度を40〜80℃に加
熱すると成分の水への乳化がより速やかに進行し、さら
に封孔処理後の材料の乾燥が容易になる。工程2では前
記の液を金めっき材に塗布するが、塗布方法としては浸
漬やスプレーなど、いずれの方法によることもできる。(In the formula, R 8 represents alkyl and substituted alkyl, M represents hydrogen and alkali metal). Preferred examples of the compound represented by the general formula (6) include lauryl acid diphosphate. The total amount of alkyl phosphate ester added is 0.05
The content is in the range of 2 wt% to 2 wt%, and if it is less than 0.05 wt%, the emulsifying effect cannot be obtained, and if it exceeds 2 wt%, the solderability is adversely affected. The solvent of the liquid used in step 2 can be appropriately selected from water and halogen-free organic solvents such as ethanol, acetone, and normal paraffin. When the solvent is water, heating the temperature of the solution to 40 to 80 ° C. accelerates the emulsification of the components into water and further facilitates the drying of the material after the sealing treatment. In step 2, the above-mentioned liquid is applied to the gold-plated material, but the application method may be any method such as dipping or spraying.
【0029】本発明において、めっき品の形状が板・
条、プレス部品であるを問わず、工程1および工程2と
もにめっき直後すなわち連続ラインであれば、そのライ
ンの中で処理することが、封孔処理の各種機能を高める
効果が高いことを見出した。さらにめっき品をプレスな
どの加工後に本発明の封孔処理液で封孔処理することも
有効である。めっき後封孔処理した金属材料であって
も、その後のプレス加工で付着したプレス油を洗浄する
工程において、封孔処理の機能の多くは喪失する。そこ
で再度の封孔処理が有効となる。In the present invention, the shape of the plated product is a plate
It has been found that, regardless of whether it is a strip or a pressed part, in both step 1 and step 2, if it is a continuous line immediately after plating, that is, if it is a continuous line, it is highly effective to enhance various functions of the sealing treatment. . Further, it is also effective to subject the plated product to a sealing treatment with the sealing treatment liquid of the present invention after processing such as pressing. Even if the metal material is subjected to the sealing treatment after plating, most of the sealing treatment function is lost in the step of washing the press oil adhered in the subsequent press working. Therefore, the sealing treatment again becomes effective.
【0030】[0030]
【実施例】以下に実施例を挙げて本発明を詳細に説明す
る。バネ用りん青銅(C5210)の厚み0.2mmの
冷間圧延材を用い、雄及び雌の連続端子をそれぞれプレ
ス成形した。これらをリール・ツウ・リールの連続めっ
きラインを通して電気めっきを施した。めっきラインに
おいては、脱脂、酸洗後、ワット浴による1μmのニッ
ケルめっき、あるいはアルカリ浴による0.5μmのP
d80%−Ni20%合金めっきを行い、その上に金あ
るいは金−コバルト合金を0.1μmの厚みで接点部に
めっきした。また、連続めっきラインでは金めっき後に
封孔処理工程を設け、連続端子を通入し処理した。工程
1の条件は処理液温度25℃、極間電圧2V、電流密度
0.6A/m2、処理時間5秒間であり、工程2の条件
は処理液温度60℃(溶媒は水)、浸漬時間5秒であ
る。こうして封孔処理をした雄と雌の端子をキャリアー
部から切断しリード線を圧着した後、それぞれを嵌合し
評価試験に供した。The present invention will be described in detail below with reference to examples. Male and female continuous terminals were press-molded using a cold-rolled material of spring phosphor bronze (C5210) having a thickness of 0.2 mm. These were electroplated through a continuous reel-to-reel plating line. In the plating line, after degreasing and pickling, 1 μm nickel plating in Watts bath or 0.5 μm P in alkaline bath
d80% -Ni20% alloy plating was performed, and gold or gold-cobalt alloy was plated on the contact portion to a thickness of 0.1 μm. Further, in the continuous plating line, a sealing treatment step was provided after gold plating, and a continuous terminal was inserted and treated. The conditions of step 1 are a treatment liquid temperature of 25 ° C., a voltage between electrodes of 2 V, a current density of 0.6 A / m 2 , and a treatment time of 5 seconds. The conditions of step 2 are a treatment liquid temperature of 60 ° C. (solvent is water) and an immersion time. 5 seconds. The male and female terminals thus sealed were cut from the carrier part and the lead wires were crimped, and then fitted to each other and subjected to an evaluation test.
【0031】接触抵抗は直流10mA、開放電圧200
mVで測定した。潤滑性は処理後のコネクタ端子の挿抜
力で評価した。耐食性は以下の条件で亜硫酸ガス腐食試
験を行い、試験後の試料の表面観察と接触抵抗測定によ
り評価した。 ガス組成:SO2 10ppm 温度:40±2℃ 湿度:80±5%RH 時間:240時間 試験結果を表1に示す。Contact resistance is DC 10 mA, open voltage 200
It was measured at mV. The lubricity was evaluated by the insertion / removal force of the connector terminal after the treatment. The corrosion resistance was evaluated by performing a sulfurous acid gas corrosion test under the following conditions and observing the surface of the sample after the test and measuring the contact resistance. Gas composition: SO 2 10 ppm Temperature: 40 ± 2 ° C. Humidity: 80 ± 5% RH Time: 240 hours Table 1 shows the test results.
【0032】[0032]
【表1】 [Table 1]
【0033】注1)ただし、表中封孔処理液の略号は以
下のとおりである。 A−1 ベンゾトリアゾール A−2 メルカプトベンゾチアゾールのナトリウム塩 A−3 1,3,5−トリアジンチオールのナトリウム
塩 B−1 オレイン酸 C−1 ラウリル酸性りん酸モノエステル(りん酸モノ
ラウリルエステル) C−2 ラウリル酸性りん酸ジエステル(りん酸ジラウ
リルエステル) 注2)試験の判断基準 (1)初期接触抵抗、腐食試験後の接触抵抗 ○:10mΩ以下 △:10〜20mΩ ×:20mΩ以上 (2)腐食試験後の外観 ○:50倍拡大写真の5cm角の範囲において、腐食点
の数が10個以下 △:50倍拡大写真の5cm角の範囲において、腐食点
の数が10〜50個 ×:50倍拡大写真の5cm角の範囲において、腐食点
の数が50個以上 (3)潤滑性(挿抜力) ○:1ピンあたりの挿入力100g以下、抜去力50g
以下 △:1ピンあたりの挿入力100〜150g、抜去力5
0〜100g ×:1ピンあたりの挿入力150g以上、抜去力100
g以上Note 1) However, the abbreviations for the sealing treatment liquid in the table are as follows. A-1 Benzotriazole A-2 Sodium salt of mercaptobenzothiazole A-3 Sodium salt of 1,3,5-triazinethiol B-1 Oleic acid C-1 Lauryl acid phosphoric acid monoester (phosphoric acid monolauryl ester) C -2 Lauryl acid phosphoric acid diester (phosphoric acid dilauryl ester) Note 2) Test criteria (1) Initial contact resistance, contact resistance after corrosion test ○: 10 mΩ or less △: 10 to 20 mΩ ×: 20 mΩ or more (2) Appearance after corrosion test ○: The number of corrosion points is 10 or less in the range of 5 cm square of the 50 times enlarged photograph. Δ: The number of corrosion points is 10 to 50 in the range of 5 cm square of the 50 times enlarged photograph. The number of corrosion points is 50 or more in the 5 cm square area of the 50 times magnified photograph. (3) Lubricity (insertion / extraction force) ○: Insertion force 100 g or less per pin Removal force 50g
Below Δ: Insertion force per pin of 100 to 150 g, removal force 5
0 to 100g ×: Insertion force per pin is 150g or more, removal force is 100
g or more
【0034】[0034]
【発明の効果】以上説明したように、本発明の封孔処理
液は環境を汚染する物質を含まず、しかもこの液で処理
された金および金合金めっき材は、優れた耐食性と潤滑
性を有する。As described above, the sealing treatment liquid of the present invention does not contain a substance polluting the environment, and the gold and gold alloy plated materials treated with this liquid have excellent corrosion resistance and lubricity. Have.
Claims (3)
有する合金を下地めっきとして具備する金または金合金
めっき材の封孔処理方法において、工程1として、下記
一般式(1)で示されるベンゾトリアゾール系化合物、
下記一般式(2)で示されるメルカプトベンゾチアゾー
ル系化合物、及び下記一般式(3)で示されるトリアジ
ン系化合物からなる群から選ばれた1種もしくは2種以
上合計で0.001〜1wt%含有する水溶液中で前記
材料を陽極として電解した後、前記めっき材を水溶液中
から取り出してから、工程2として、下記一般式(4)
で示される脂肪酸を1種もしくは2種以上合計で0.0
5〜2wt%および、下記一般式(5)と一般式(6)
で示される群から選ばれたアルキルりん酸エステルを1
種もしくは2種合計で0.05〜2wt%を必須成分と
する液を前記めっき材に塗布することを特徴とする封孔
処理方法。 【化1】 (式中、R1は水素、アルキル、置換アルキルを表わ
し、R2はアルカリ金属、水素、アルキル、置換アルキ
ルを表わす) 【化2】 (式中、R3はアルカリ金属又は水素を表わす) 【化3】 〔式中、R4は−SH,アルキル基かアリール基で置換
されたアミノ基、又はアルキル置換イミダゾリルアルキ
ル、R5,R6は−NH2,−SH又は−SM(Mはアル
カリ金属を表わす)を表わす〕 R7−COOH (4) (式中、R7は炭素数10〜20個の飽和及び不飽和鎖
式炭化水素を表わす) 【化4】 (式中、R8はアルキル、置換アルキルを表わし、Mは
水素、アルカリ金属を表わす)1. A method for sealing a gold or gold alloy plated material, which comprises a metal material containing nickel or an alloy containing nickel as an undercoat, the step 1 comprising a benzotriazole-based compound represented by the following general formula (1): Compound,
0.001 to 1 wt% in total of one kind or two or more kinds selected from the group consisting of a mercaptobenzothiazole compound represented by the following general formula (2) and a triazine compound represented by the following general formula (3) After electrolyzing the material as an anode in an aqueous solution, the plating material is taken out from the aqueous solution, and then, as Step 2, the following general formula (4)
One or more of the fatty acids represented by
5 to 2 wt% and the following general formula (5) and general formula (6)
1 alkylphosphoric acid ester selected from the group
A sealing treatment method, characterized in that a liquid containing 0.05 to 2 wt% of one or two kinds as an essential component is applied to the plating material. Embedded image (In the formula, R 1 represents hydrogen, alkyl, or substituted alkyl, and R 2 represents alkali metal, hydrogen, alkyl, or substituted alkyl.) (In the formula, R 3 represents an alkali metal or hydrogen) [In the formula, R 4 is —SH, an amino group substituted with an alkyl group or an aryl group, or an alkyl-substituted imidazolylalkyl, and R 5 and R 6 are —NH 2 , —SH or —SM (M represents an alkali metal. ) represent] R 7 -COOH (4) (wherein, R 7 represents a 10 to 20 saturated and unsaturated chain hydrocarbon having a carbon number) embedded image (In the formula, R 8 represents alkyl or substituted alkyl, M represents hydrogen or alkali metal)
1A/m2以上で実施する請求項1に記載の封孔処理方
法。2. Electrolysis is carried out with a voltage between electrodes of 1 to 5 V and a current density of 0.
The sealing treatment method according to claim 1, which is carried out at 1 A / m 2 or more.
ルを含有する合金を下地めっきとして具備する金または
金合金めっき材を加工したものであることを特徴とする
請求項1または2に記載の封孔処理方法。3. The sealing hole according to claim 1, wherein the anode is formed by processing a gold or gold alloy plated material having nickel or an alloy containing nickel as a base plating on a metal material. Processing method.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6576395A JPH08260193A (en) | 1995-03-24 | 1995-03-24 | Sealing method of gold plated material |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6576395A JPH08260193A (en) | 1995-03-24 | 1995-03-24 | Sealing method of gold plated material |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH08260193A true JPH08260193A (en) | 1996-10-08 |
Family
ID=13296395
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6576395A Pending JPH08260193A (en) | 1995-03-24 | 1995-03-24 | Sealing method of gold plated material |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH08260193A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8002595B2 (en) | 2007-01-12 | 2011-08-23 | Furukawa Electric Co., Ltd. | Electrical contact material, method of manufacturing the same, and electrical contact |
JP5616969B2 (en) * | 2010-08-30 | 2014-10-29 | シャープ株式会社 | Mold manufacturing method and antireflection material manufacturing method |
-
1995
- 1995-03-24 JP JP6576395A patent/JPH08260193A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8002595B2 (en) | 2007-01-12 | 2011-08-23 | Furukawa Electric Co., Ltd. | Electrical contact material, method of manufacturing the same, and electrical contact |
KR101149709B1 (en) * | 2007-01-12 | 2012-05-23 | 후루카와 덴키 고교 가부시키가이샤 | Electrical contact member, method for producing the same, and electrical contact |
JP5616969B2 (en) * | 2010-08-30 | 2014-10-29 | シャープ株式会社 | Mold manufacturing method and antireflection material manufacturing method |
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