JPH0825487A - Support formation method in stereolithography - Google Patents
Support formation method in stereolithographyInfo
- Publication number
- JPH0825487A JPH0825487A JP6187920A JP18792094A JPH0825487A JP H0825487 A JPH0825487 A JP H0825487A JP 6187920 A JP6187920 A JP 6187920A JP 18792094 A JP18792094 A JP 18792094A JP H0825487 A JPH0825487 A JP H0825487A
- Authority
- JP
- Japan
- Prior art keywords
- support
- unit
- modeled
- article
- stereolithography
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Heating, Cooling, Or Curing Plastics Or The Like In General (AREA)
Abstract
(57)【要約】
【目的】 造形物のオーバーハング部分を選択的にサポ
ートでき、造形後のサポート除去作業が楽な光造形法に
おけるサポート形成方法を提供する。
【構成】 XY平面上で単位光硬化層3a、1aを形成
する際に、造形物1とサポート3との間に所定のギャッ
プ2aを持たせるので、造形物1の直立面11や傾斜面
(オーバーハングしていない斜面)とサポート3との間
にはスキマ17が開き、サポート3は造形物1に連結さ
れない。一方、オーバーハングの角度がある程度以上に
なると、造形物の単位光硬化層1fの端部は一層下のサ
ポートの単位光硬化層3eの上部に乗るようになる。し
たがって、造形物1のオーバーハングした部分15が選
択的にサポートされ、それ以外の部位では造形物1とサ
ポート3とはつながっていない。そのため、造形物とサ
ポートの連結部が最小限となるので、造形後のサポート
除去作業が楽になる。
(57) [Abstract] [Purpose] To provide a support forming method in an optical molding method capable of selectively supporting an overhang portion of a molded article and facilitating support removal work after molding. [Configuration] Since a predetermined gap 2a is provided between the modeled article 1 and the support 3 when the unit photo-cured layers 3a, 1a are formed on the XY plane, the upright surface 11 and the inclined surface ( A gap 17 is opened between the support 3 and the slope (not overhanging), and the support 3 is not connected to the model 1. On the other hand, when the angle of the overhang becomes a certain amount or more, the end portion of the unit photo-curable layer 1f of the shaped article rides on the upper part of the unit photo-curable layer 3e of the support which is one layer below. Therefore, the overhanging portion 15 of the modeled article 1 is selectively supported, and the modeled article 1 and the support 3 are not connected at other portions. Therefore, the connecting portion between the modeled article and the support is minimized, which facilitates the support removing work after modeling.
Description
【0001】[0001]
【産業上の利用分野】本発明は、光造形法において造形
物本体を造形中に支持するサポートの形成方法に関す
る。特には、造形物のオーバーハング部とのみ接触する
ので、真にサポートが必要な造形物の部位を確実に支持
しつつ、かつ、造形後のサポート除去作業が最少で済む
という利点を有するサポート形成方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of forming a support for supporting a main body of a modeled article during modeling in a stereolithography method. In particular, since it only contacts the overhanging part of the modeled object, it has the advantage of reliably supporting the part of the modeled object that really needs support and minimizing the work of removing the support after modeling. Regarding the method.
【0002】[0002]
【従来の技術】光造形法により造形物を作成する際に、
造形中にその造形物が変形しないよう、造形物を支持す
るサポートを同時に光造形しつつ造形を行う技術があ
る。具体的にどのようなサポートとするかは、造形物の
形状に合わせて個々にサポートを設計して光造形CAD
データに付け加える方法(個別設計法)がある。しか
し、よく行われるのは、造形物本体の周囲(あるいは
中)にサポートを形成する領域を光造形装置の専用デー
タ編集システムに対して指示すれば、その領域内に等間
隔で薄肉の格子状のサポートを自動的に形成してしまう
やり方である(格子法)。個別設計法よりも格子法の方
が、サポート設計をしなくてすむので面倒がない。2. Description of the Related Art When creating a molded article by a stereolithography method,
There is a technique for performing modeling while simultaneously performing stereolithography on a support that supports the modeled object so that the modeled object does not deform during modeling. As for what kind of support is specifically used, the support is individually designed according to the shape of the modeled object and stereolithography CAD is performed.
There is a method to add to the data (individual design method). However, what is often done is that if an area for forming a support around (or in) the main body of the object is instructed to the dedicated data editing system of the stereolithography apparatus, a thin-walled grid pattern is formed in the area at equal intervals. This is a method of automatically forming the support of (grid method). The lattice method is less troublesome than the individual design method because support design is not required.
【0003】[0003]
【発明が解決しようとする課題】しかし、格子法では、
造形物周囲に、言わばむやみにサポートを立てて造形物
に連結させるので、造形後に造形物からサポートを除去
し、造形物表面を手入れする作業が大変になる。However, in the lattice method,
Since a support is erected around the modeled object and connected to the modeled object, it is difficult to remove the support from the modeled object after the modeling and care for the surface of the modeled object.
【0004】特開平5−301293号には、この問題
を改善するためのサポート形成方法が提案されている。
この特開平5−301293号の方法は、造形物表面と
これと接続するサポートとのなす角度がある程度以下と
なる(サポートが造形物表面に沿うようになる)とき
は、そのようなサポートの部分(格子状の薄板の1エレ
メント)を形成しない(光を当てない)ようにする等の
処置を行い、上述の問題の改善を目指すものである。Japanese Unexamined Patent Publication (Kokai) No. 5-301293 proposes a support forming method for solving this problem.
In the method disclosed in Japanese Patent Laid-Open No. 5-301293, when the angle between the surface of the modeled object and the support connected thereto is below a certain degree (the support comes along the surface of the modeled object), the portion of such support is used. The purpose is to improve the above-mentioned problem by taking measures such as not forming (one element of a lattice-shaped thin plate) (not shining light).
【0005】しかし、この特開平5−301293号の
方法を具体的に光造形装置の専用データ編集システム上
で実現しようとすると、上記角度の計算の量が膨大とな
ってしまい、サポートの設計時間が極めて長くなるのが
新たな問題である。また、サポートの基本に立ち返って
考えれば、サポートが真に必要なのは、造形物がある程
度以上オーバーハングした部分であり、造形物の壁面が
直立しているような部分には、サポートは不要である場
合がほとんどである。しかるに、オーバーハング部分を
選択的に支えることができ、設計も楽なサポートの提案
はなされていなかった。However, if the method disclosed in Japanese Unexamined Patent Publication No. 5-301293 is specifically implemented on a dedicated data editing system of a stereolithography apparatus, the amount of calculation of the angle becomes enormous and the support design time is increased. Is a new problem. In addition, returning to the basics of support, what really needs support is the part where the model is overhanging to some extent, and the part where the wall surface of the model is upright does not require support. In most cases. However, there has been no suggestion of support that can selectively support the overhang portion and that is easy to design.
【0006】本発明は、造形物のオーバーハング部分を
選択的にサポートでき、造形後のサポート除去作業が楽
な光造形法におけるサポート形成方法を提供することを
目的とする。It is an object of the present invention to provide a support forming method in an optical molding method which can selectively support an overhang portion of a molded article and facilitates support removal work after molding.
【0007】[0007]
【課題を解決するための手段】上記課題を解決するた
め、本発明の光造形法におけるサポート形成方法は、光
造形法により造形物を作成する際に造形物を支持するた
めに、同じく光造形法により形成されるサポートの形成
方法であって;造形物及びサポートは、重力方向軸(Z
軸)及びこのZ軸と直交する平面上の2軸(X軸、Y
軸)上の座標によって規定される空間内において、Z軸
方向にある厚みを有するとともにXY平面にてある形状
を有するように形成された単位光硬化層をZ軸方向に積
層接着しつつ形成され;XY平面上で造形物とサポート
との間に所定のギャップを持たせつつ単位光硬化層を形
成することを特徴とする。In order to solve the above-mentioned problems, the support forming method in the stereolithography method of the present invention is the same as the stereolithography method for supporting the sculpture when the sculpture is produced by the stereolithography method. A method of forming a support formed by a method;
Axis) and two axes (X axis, Y) on a plane orthogonal to this Z axis
(Axis) in the space defined by the coordinates, the unit photo-curing layers having a certain thickness in the Z-axis direction and a certain shape in the XY plane are formed while being laminated and bonded in the Z-axis direction. A feature is that the unit photocurable layer is formed with a predetermined gap between the modeled article and the support on the XY plane.
【0008】[0008]
【作用】XY平面上で単位光硬化層を形成する際に、造
形物とサポートとの間に所定のギャップを持たせるの
で、造形物の直立面や傾斜面(オーバーハングしていな
い斜面)とサポートとの間にはスキマが開き、サポート
は造形物に連結されない。一方、オーバーハングの角度
がある程度以上になると、造形物の単位光硬化層の端部
は一層下のサポートの単位光硬化層の上部に乗るように
なる。すなわち、XY平面上では造形物とサポート間に
ギャップがあるのであるが、Z方向で造形物の単位光硬
化層とサポートの単位光硬化層との連結が生じるように
なる。したがって、造形物のオーバーハングした部分が
選択的にサポートされ、それ以外の部位では造形物とサ
ポートとはつながっていない。そのため、造形物とサポ
ートの連結部が最小限となるので、造形後のサポート除
去作業が楽になる。なお、上述のXY座標の替わりに平
面極座標を用いるような光造形システムにおいても、本
発明の方法は有用であることはもちろんである。When a unit photocurable layer is formed on the XY plane, a predetermined gap is provided between the modeled object and the support, so that the modeled object can be used as an upright surface or an inclined surface (a sloped surface that does not overhang). A gap is opened between the support and the support, and the support is not connected to the modeled object. On the other hand, when the angle of the overhang exceeds a certain level, the end portion of the unit light-cured layer of the shaped article comes to rest on the upper portion of the unit light-cured layer of the lower support. That is, although there is a gap between the modeled article and the support on the XY plane, the unit photo-cured layer of the modeled article and the unit photo-cured layer of the support are connected in the Z direction. Therefore, the overhanging portion of the modeled article is selectively supported, and the modeled article and the support are not connected to each other at other portions. Therefore, the connecting portion between the modeled article and the support is minimized, which facilitates the support removing work after modeling. It is needless to say that the method of the present invention is also useful in a stereolithography system that uses plane polar coordinates instead of the above XY coordinates.
【0009】[0009]
【実施例】以下、本発明の実施例を説明する。図1は、
本発明の一実施例に係る光造形法におけるサポート形成
方法により造形された造形物及びサポートの説明図であ
る。(A)は斜視図、(B)は(A)におけるB−B断
面図、(C)は(B)における部分Cの拡大概念図であ
る。Embodiments of the present invention will be described below. Figure 1
FIG. 7 is an explanatory diagram of a modeled object and a support modeled by the support forming method in the stereolithography method according to the embodiment of the present invention. (A) is a perspective view, (B) is a BB sectional view in (A), and (C) is an enlarged conceptual view of a portion C in (B).
【0010】図1に示されている造形物1は、断面図
(B)に示されているように、下部の円柱軸の上に、上
方に向かって徐々に径の拡大する円錐を載せたような形
をしている。この造形物1の周囲には、直交格子状のサ
ポート3が形成されている。本発明のポイントは、
(B)に示されているように、造形物1上の直立壁11
や小オーバーハング部13が、サポート3とは接してお
らず、両者間にスキマ17があることである。一方、大
オーバーハング部15とサポート3とは接しており、同
部15のみが選択的に支持されている。As shown in the sectional view (B), the molded article 1 shown in FIG. 1 has a cone whose diameter gradually increases upward on the lower cylindrical shaft. It has a shape like this. Around the modeled article 1, supports 3 in the form of an orthogonal lattice are formed. The point of the present invention is
As shown in (B), the upright wall 11 on the molded article 1
The small overhang portion 13 is not in contact with the support 3 and there is a gap 17 between them. On the other hand, the large overhang portion 15 and the support 3 are in contact with each other, and only the same portion 15 is selectively supported.
【0011】そのようになる仕組について、図1(C)
を参照しつつ説明する。図1(C)は、図1(B)のC
部の拡大概念図である。造形物1は、造形物単位光硬化
層1a〜1gが積層接着されたものである。また、サポ
ート3はサポート単位光硬化層3a〜3fが積層接着さ
れたものである。そして、各層、例えばサポート単位光
硬化層3aと造形物単位光硬化層1aとの間には、ギャ
ップ(空間)2aが存在している。このギャップ2aの
巾はS(例えば0.3mm)であり、単位光硬化層1
a、3aの厚さはt(例えば0.1mm)である。FIG. 1 (C) shows such a mechanism.
Will be described with reference to. FIG. 1C is C of FIG.
It is an enlarged conceptual diagram of a part. The modeled article 1 is formed by laminating the modeled unit photocurable layers 1a to 1g. The support 3 is formed by laminating support unit photo-curing layers 3a to 3f. Then, a gap (space) 2a exists between each layer, for example, the support unit photo-curing layer 3a and the shaped object unit photo-curing layer 1a. The width of this gap 2a is S (for example, 0.3 mm), and the unit photocurable layer 1
The thickness of a and 3a is t (for example, 0.1 mm).
【0012】サポート単位光硬化層3aは、造形物単位
光硬化層1aを光造形するのと同タイミング(一連の平
面露光タイミング)で造形される。その後、単位光硬化
層3a、1a上に厚さtの光硬化樹脂が導入され、次の
単位光硬化層3b、1bが造形される。単位光硬化層3
b、1b間にも同様のスキマ2bが存在する。このよう
にして、次々に単位光硬化層を積層していく。The support unit photo-curable layer 3a is formed at the same timing (a series of planar exposure timing) as when the model-formed unit photo-curable layer 1a is photo-formed. After that, a photocurable resin having a thickness t is introduced onto the unit photocurable layers 3a and 1a, and the next unit photocurable layers 3b and 1b are molded. Unit photocurable layer 3
A similar gap 2b exists between b and 1b. In this way, the unit photocurable layers are laminated one after another.
【0013】造形物1の壁面は、上に行くほどオーバー
ハングの度が強くなっているため、造形物単位光硬化層
1dに至って、その左下端が、一層下のサポート単位光
硬化層3cの右上端と接している。さらに、造形物単位
光硬化層1fでは、その左端部下面が、一層下のサポー
ト単位光硬化層3e上に乗っている。このため、造形物
単位光硬化層1fとサポート単位光硬化層3eとがZ方
向に接触連結されている。Since the degree of overhang on the wall surface of the modeled object 1 becomes higher as it goes up, the modeled unit photocurable layer 1d is reached, and the lower left end of the modeled unit photocurable layer 3c is the lower support unit photocurable layer 3c. It touches the upper right corner. Further, the lower surface of the left end portion of the shaped object unit photo-curable layer 1f is on the support unit photo-cured layer 3e which is one layer below. Therefore, the molded object unit photo-curing layer 1f and the support unit photo-curing layer 3e are contact-connected in the Z direction.
【0014】すなわち、オーバーハングの傾斜がSIN
-1t/sを越えた時点から、オーバーハングは、選択的
にサポートとZ方向に接触して支持されることとなる。
そのため、真にサポートの必要な造形物の部位のみを選
択的にサポートできる。That is, the inclination of the overhang is SIN
From the time point over -1 t / s, the overhang is selectively supported in contact with the support in the Z direction.
Therefore, it is possible to selectively support only the part of the modeled object that really needs to be supported.
【0015】図2は、図1のサポートを光造形するため
の形状データを構築する方法の一例の説明図である。
(A)に示されているように、Y軸に沿う線a上でのサ
ポートの形状データ構築方法について説明する。線a上
の太い線23は、同線上におけるサポートの一次単位線
である。すなわち、造形物単位光硬化層21の一定周囲
部分を含む領域内に格子状に引かれた線の一単位線であ
る。従来のサポートにおいては、このサポート一次単位
線23から造形物単位光硬化層21と重なる部分を差し
引いた残りが現実のサポート形状データとなっていた。FIG. 2 is an explanatory view of an example of a method for constructing shape data for stereolithography the support shown in FIG.
As shown in (A), a method for constructing the shape data of the support on the line a along the Y axis will be described. The thick line 23 on the line a is the primary unit line of the support on the same line. That is, it is a unit line of a line drawn in a lattice pattern in a region including a constant peripheral portion of the shaped product unit photo-curable layer 21. In the conventional support, the actual support shape data is the rest of the support primary unit line 23 after subtracting the portion that overlaps with the modeling unit photocurable layer 21.
【0016】本実施例においては、サポートと造形物と
の間に適当なギャップを開けるために以下の操作を行
う。まず、線aからX方向に想定ギャップ巾Sだけ離れ
た2本の線c、bをY軸方向に引く。そして、線c、b
上における造形物の形状データ(造形物単位線25、2
7)を計算する。In the present embodiment, the following operation is performed in order to open a proper gap between the support and the shaped article. First, two lines c and b separated from the line a by the assumed gap width S in the X direction are drawn in the Y axis direction. And the lines c, b
Shape data of the modeled object above (modeled object unit lines 25, 2
Calculate 7).
【0017】次に、図2(B)に示されているように、
線a、b、c上における造形物単位線31、25、27
に対して、想定ギャップ幅Sを付加するギャップ量分の
オフセットを行う。そして、線C上のトータルの形状デ
ータ(造形物単位線27+キャップオフセット37、3
7’)、線a上のトータルの形状データ、線b上のトー
タルの形状データのY軸上の全ての論理和を求める(各
線を線a上に重ね合せる)。Next, as shown in FIG.
Modeling unit lines 31, 25, 27 on the lines a, b, c
On the other hand, an offset corresponding to the gap amount to which the assumed gap width S is added is performed. Then, the total shape data on the line C (model object unit line 27 + cap offset 37, 3
7 ′), the total OR on the Y-axis of the total shape data on the line a and the total shape data on the line b is calculated (each line is superposed on the line a).
【0018】次に、(A)のサポート一次単位線23か
ら、(B)の処理で得られた線a、b、c上における造
形物単位線とギャップオフセットとの重ね合せ線を差し
引く。その残りを、図2(C)に示されているように、
最終のサポート形状データとして再構築する。このよう
にすれば、X軸上の干渉をも考慮してY軸方向ギャップ
オフセットを行ったサポートCADデートを構築でき
る。Next, from the support primary unit line 23 of (A), the line of superimposition of the unit line of the shaped article and the gap offset on the lines a, b and c obtained by the process of (B) is subtracted. The rest, as shown in FIG. 2 (C),
It is reconstructed as the final support shape data. By doing so, it is possible to construct the support CAD date in which the gap offset in the Y-axis direction is performed in consideration of the interference on the X-axis.
【0019】以上説明した本発明の方法及び従来の方法
を用いて、パソコン操作用マウスのカバーのモデルを作
成するテストを行った。図3は、テスト造形したマウス
の形を示す図である。(A)は外面の斜視図、(B)は
底面図である。マウスカバー41は、薄肉(約2mm)
の屋根状の形をしており、寸法は、長さ100mm、巾
60mm、高さ31mmである。Using the method of the present invention and the conventional method described above, a test for making a model of a mouse cover for operating a personal computer was conducted. FIG. 3 is a diagram showing the shape of a mouse that was test-molded. (A) is a perspective view of the outer surface, and (B) is a bottom view. The mouse cover 41 is thin (about 2 mm)
It has a roof-like shape with dimensions of 100 mm in length, 60 mm in width and 31 mm in height.
【0020】マウスカバー41の内部45に、直交格子
状にサポート47を形成した。この際、ギャップのパラ
メーターとして0.3mmを与え、格子の厚さは0.2
mmとした。光造形には、帝人製機株式会社製の光造形
装置SOLIFORMを用いた。また、光硬化樹脂はS
OMOS3100を用いた。また、主要な造形データ諸
元は積層ピッチ0.15mm、レーザパワー170m
W、スキャンピッチ0.0508mmとした。Supports 47 are formed on the inside 45 of the mouse cover 41 in the form of a rectangular lattice. At this time, 0.3 mm is given as a parameter of the gap, and the thickness of the lattice is 0.2
mm. For the stereolithography, a stereolithography device SOLIFORM manufactured by Teijin Seiki Co., Ltd. was used. Also, the photocurable resin is S
OMOS3100 was used. Also, the main modeling data specifications are stacking pitch 0.15 mm, laser power 170 m.
W and scan pitch were 0.0508 mm.
【0021】造形終了後、後処理として行われているサ
ポートの取り外し、アルコールによる洗浄、表面仕上げ
を行った。従来技術での後処理時間は2時間15分であ
ったのに対し、今回実施した例での後処理時間は、1時
間5分であり、後処理工程にかける時間を短縮すること
ができた。また、不必要なサポートの接触が避けられる
ため、表面粗度が従来技術を適用したものと比較し45
%向上できた。After the completion of modeling, the support was removed as post-treatment, cleaning with alcohol and surface finishing were performed. While the post-processing time in the prior art was 2 hours 15 minutes, the post-processing time in this embodiment and examples, 1:00
The time was 5 minutes , and the time required for the post-treatment process could be shortened. In addition, since unnecessary contact with the support is avoided, the surface roughness is 45 compared to that of the conventional technology.
I was able to improve it.
【0022】[0022]
【発明の効果】以上の説明から明らかなように、本発明
の光造形法におけるサポート形成方法は以下の効果を発
揮する。 造形時に、造形物の連続する断面の断面形状変化が
小さいとき(オーバーハングが小さい時)は、造形物本
体とサポート間に存在するギャップにより、両者の不必
要な接触が避けられる。 造形物本体からサポートを取り外したあとに造形物
本体に残るサポートの痕跡の量が軽減され、造形物の表
面粗度が向上する。 造形物本体とサポートとは、唯一Z軸方向のみで接
触するため、本体からのサポート分離及び表面手直し作
業を行いやすい。As is apparent from the above description, the support forming method in the stereolithography method of the present invention exhibits the following effects. At the time of modeling, when the cross-sectional shape change of continuous sections of the modeled object is small (when the overhang is small), unnecessary contact between the modeled object main body and the support is avoided by the gap existing between the two. The amount of traces of the support remaining on the model body after removing the support from the model body is reduced, and the surface roughness of the model is improved. Since the main body of the modeled object and the support are in contact only in the Z-axis direction, it is easy to separate the support from the main body and perform the surface repair work.
【図1】本発明の一実施例に係るサポート形成方法によ
り造形された造形物及びサポートの説明図である。
(A)は斜視図、(B)は(A)におけるB−B断面
図、(C)は(B)における部分Cの拡大概念図であ
る。FIG. 1 is an explanatory diagram of a modeled object and a support modeled by a support forming method according to an embodiment of the present invention.
(A) is a perspective view, (B) is a BB sectional view in (A), and (C) is an enlarged conceptual view of a portion C in (B).
【図2】図1のサポートを光造形するための形状データ
を構築する方法の一例の説明図である。FIG. 2 is an explanatory diagram of an example of a method of constructing shape data for stereolithography the support of FIG.
【図3】テスト造形したマウスの形を示す図である。
(A)は外面の斜視図、(B)は底面図である。FIG. 3 is a diagram showing the shape of a mouse that was test-molded.
(A) is a perspective view of the outer surface, and (B) is a bottom view.
【符号の説明】 1 造形物 3 サポート 11 直立壁 13 小オーバー
ハング部 15 大オーバーハング部 17 スキマ 1a〜g 造形物単位光硬化層 2a〜f ギャッ
プ 3a〜f サポート単位光硬化層 21 造形物単位
光硬化層 23 サポート一次単位線 25 造形物単位
線 27 造形物単位線 31 造形物単位
線 33 ギャップオフセット 35 ギャップオ
フセット 37 ギャップオフセット 39 サポート最
終単位線 41 マウスカバー 43 側壁 45 内部 47 サポート[Explanation of reference numerals] 1 model 3 support 11 upright wall 13 small overhang part 15 large overhang part 17 skimmer 1a to g model unit photocurable layer 2a to f gap 3a to f support unit photocurable layer 21 model unit Photocuring layer 23 Support primary unit line 25 Modeling unit line 27 Modeling unit line 31 Modeling unit line 33 Gap offset 35 Gap offset 37 Gap offset 39 Support final unit line 41 Mouse cover 43 Side wall 45 Internal 47 support
Claims (1)
形物を支持するために、同じく光造形法により形成され
るサポートの形成方法であって;造形物及びサポート
は、重力方向軸(Z軸)及びこのZ軸と直交する平面上
の2軸(X軸、Y軸)上の座標によって規定される空間
内において、Z軸方向にある厚みを有するとともにXY
平面にてある形状を有するように形成された単位光硬化
層をZ軸方向に積層接着しつつ形成され;XY平面上で
造形物とサポートとの間に所定のギャップを持たせつつ
単位光硬化層を形成することを特徴とする光造形法にお
けるサポート形成方法。1. A method of forming a support, which is also formed by the stereolithography method, for supporting the molding object when forming the molding object by the stereolithography method; Z axis) and a space defined by coordinates on two axes (X axis, Y axis) on a plane orthogonal to the Z axis and having a thickness in the Z axis direction and XY
A unit photo-curing layer formed to have a certain shape in a plane is laminated and bonded in the Z-axis direction; a unit photo-curing is performed with a predetermined gap between the modeled article and the support on the XY plane. A method of forming a support in a stereolithography method, which comprises forming a layer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18792094A JP3398481B2 (en) | 1994-07-19 | 1994-07-19 | Support formation method in stereolithography |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18792094A JP3398481B2 (en) | 1994-07-19 | 1994-07-19 | Support formation method in stereolithography |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0825487A true JPH0825487A (en) | 1996-01-30 |
| JP3398481B2 JP3398481B2 (en) | 2003-04-21 |
Family
ID=16214523
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18792094A Expired - Fee Related JP3398481B2 (en) | 1994-07-19 | 1994-07-19 | Support formation method in stereolithography |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3398481B2 (en) |
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