JPH08245441A - Liquid crystal compound containing fluoro-substituted alkyl group and liquid crystal composition - Google Patents
Liquid crystal compound containing fluoro-substituted alkyl group and liquid crystal compositionInfo
- Publication number
- JPH08245441A JPH08245441A JP7332329A JP33232995A JPH08245441A JP H08245441 A JPH08245441 A JP H08245441A JP 7332329 A JP7332329 A JP 7332329A JP 33232995 A JP33232995 A JP 33232995A JP H08245441 A JPH08245441 A JP H08245441A
- Authority
- JP
- Japan
- Prior art keywords
- group
- liquid crystal
- compound
- added
- phenylene group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 150000001875 compounds Chemical class 0.000 title claims abstract description 304
- 239000000203 mixture Substances 0.000 title claims abstract description 183
- 239000004973 liquid crystal related substance Substances 0.000 title claims abstract description 132
- 125000001140 1,4-phenylene group Chemical group [H]C1=C([H])C([*:2])=C([H])C([H])=C1[*:1] 0.000 claims abstract description 40
- 125000004955 1,4-cyclohexylene group Chemical group [H]C1([H])C([H])([H])C([H])([*:1])C([H])([H])C([H])([H])C1([H])[*:2] 0.000 claims abstract description 36
- 229910052731 fluorine Inorganic materials 0.000 claims abstract description 31
- 125000001153 fluoro group Chemical group F* 0.000 claims abstract description 17
- 125000003709 fluoroalkyl group Chemical group 0.000 claims abstract description 9
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 9
- 229910052760 oxygen Inorganic materials 0.000 claims abstract 3
- -1 chlorhexylene group Chemical group 0.000 claims description 72
- 239000000126 substance Substances 0.000 claims description 55
- 239000007788 liquid Substances 0.000 claims description 28
- 125000004432 carbon atom Chemical group C* 0.000 claims description 20
- 125000000217 alkyl group Chemical group 0.000 claims description 17
- 229910052739 hydrogen Inorganic materials 0.000 claims description 15
- 238000000034 method Methods 0.000 claims description 14
- 125000005407 trans-1,4-cyclohexylene group Chemical group [H]C1([H])C([H])([H])[C@]([H])([*:2])C([H])([H])C([H])([H])[C@@]1([H])[*:1] 0.000 claims description 9
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 claims description 8
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 6
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical group CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 claims description 4
- 229910052799 carbon Inorganic materials 0.000 claims description 4
- 239000008096 xylene Substances 0.000 claims description 4
- 125000003545 alkoxy group Chemical group 0.000 claims description 3
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 claims description 3
- 125000003342 alkenyl group Chemical group 0.000 claims description 2
- 125000004849 alkoxymethyl group Chemical group 0.000 claims description 2
- 229910052801 chlorine Inorganic materials 0.000 claims description 2
- 125000004956 cyclohexylene group Chemical group 0.000 claims description 2
- 229910052757 nitrogen Inorganic materials 0.000 claims description 2
- 125000000876 trifluoromethoxy group Chemical group FC(F)(F)O* 0.000 claims description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 2
- 239000001301 oxygen Substances 0.000 claims 2
- 125000005714 2,5- (1,3-dioxanylene) group Chemical group [H]C1([H])OC([H])([*:1])OC([H])([H])C1([H])[*:2] 0.000 claims 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 1
- 101100386054 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) CYS3 gene Proteins 0.000 claims 1
- 241000219289 Silene Species 0.000 claims 1
- 229910052918 calcium silicate Inorganic materials 0.000 claims 1
- 125000004836 hexamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 claims 1
- 101150035983 str1 gene Proteins 0.000 claims 1
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 191
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 118
- 239000002904 solvent Substances 0.000 description 111
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 102
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 102
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 100
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 98
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 76
- 239000000047 product Substances 0.000 description 67
- 238000006243 chemical reaction Methods 0.000 description 66
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 50
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 50
- 235000019341 magnesium sulphate Nutrition 0.000 description 50
- 229920006395 saturated elastomer Polymers 0.000 description 50
- 239000003054 catalyst Substances 0.000 description 49
- 235000017557 sodium bicarbonate Nutrition 0.000 description 49
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 49
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 40
- 239000012044 organic layer Substances 0.000 description 35
- HIXDQWDOVZUNNA-UHFFFAOYSA-N 2-(3,4-dimethoxyphenyl)-5-hydroxy-7-methoxychromen-4-one Chemical compound C=1C(OC)=CC(O)=C(C(C=2)=O)C=1OC=2C1=CC=C(OC)C(OC)=C1 HIXDQWDOVZUNNA-UHFFFAOYSA-N 0.000 description 33
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 33
- 238000004440 column chromatography Methods 0.000 description 31
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 29
- 150000004795 grignard reagents Chemical class 0.000 description 29
- 239000000741 silica gel Substances 0.000 description 29
- 229910002027 silica gel Inorganic materials 0.000 description 29
- 239000007818 Grignard reagent Substances 0.000 description 28
- 150000004768 bromobenzenes Chemical class 0.000 description 24
- CSJLBAMHHLJAAS-UHFFFAOYSA-N diethylaminosulfur trifluoride Chemical compound CCN(CC)S(F)(F)F CSJLBAMHHLJAAS-UHFFFAOYSA-N 0.000 description 18
- KDLHZDBZIXYQEI-UHFFFAOYSA-N palladium Substances [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 17
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 16
- WMPPDTMATNBGJN-UHFFFAOYSA-N 2-phenylethylbromide Chemical class BrCCC1=CC=CC=C1 WMPPDTMATNBGJN-UHFFFAOYSA-N 0.000 description 15
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 15
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 15
- 229910001873 dinitrogen Inorganic materials 0.000 description 15
- 239000011777 magnesium Substances 0.000 description 15
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 15
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 14
- 239000000010 aprotic solvent Substances 0.000 description 14
- 239000012298 atmosphere Substances 0.000 description 14
- 239000013078 crystal Substances 0.000 description 14
- FGXQQTSLFAVOCN-UHFFFAOYSA-N 1,4-dioxaspiro[4.5]decan-6-one Chemical compound O=C1CCCCC11OCCO1 FGXQQTSLFAVOCN-UHFFFAOYSA-N 0.000 description 12
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 12
- MZRVEZGGRBJDDB-UHFFFAOYSA-N N-Butyllithium Chemical compound [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 description 12
- HEDRZPFGACZZDS-MICDWDOJSA-N Trichloro(2H)methane Chemical compound [2H]C(Cl)(Cl)Cl HEDRZPFGACZZDS-MICDWDOJSA-N 0.000 description 12
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 12
- 229910052794 bromium Inorganic materials 0.000 description 12
- 239000012071 phase Substances 0.000 description 12
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 12
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 11
- 229920001429 chelating resin Polymers 0.000 description 11
- JHIVVAPYMSGYDF-PTQBSOBMSA-N cyclohexanone Chemical class O=[13C]1CCCCC1 JHIVVAPYMSGYDF-PTQBSOBMSA-N 0.000 description 11
- 229910052749 magnesium Inorganic materials 0.000 description 11
- 229910052763 palladium Inorganic materials 0.000 description 11
- 238000001556 precipitation Methods 0.000 description 11
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 10
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 10
- 238000005160 1H NMR spectroscopy Methods 0.000 description 9
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 9
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 9
- 238000002156 mixing Methods 0.000 description 9
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 9
- LPNYRYFBWFDTMA-UHFFFAOYSA-N potassium tert-butoxide Chemical compound [K+].CC(C)(C)[O-] LPNYRYFBWFDTMA-UHFFFAOYSA-N 0.000 description 9
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 8
- QARVLSVVCXYDNA-UHFFFAOYSA-N bromobenzene Chemical compound BrC1=CC=CC=C1 QARVLSVVCXYDNA-UHFFFAOYSA-N 0.000 description 8
- 238000006297 dehydration reaction Methods 0.000 description 8
- 235000019253 formic acid Nutrition 0.000 description 8
- 238000005984 hydrogenation reaction Methods 0.000 description 8
- 238000010992 reflux Methods 0.000 description 8
- SHWZFQPXYGHRKT-FDGPNNRMSA-N (z)-4-hydroxypent-3-en-2-one;nickel Chemical compound [Ni].C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O SHWZFQPXYGHRKT-FDGPNNRMSA-N 0.000 description 7
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 7
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 7
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 7
- 108090000623 proteins and genes Proteins 0.000 description 7
- WRMNZCZEMHIOCP-UHFFFAOYSA-N 2-phenylethanol Chemical class OCCC1=CC=CC=C1 WRMNZCZEMHIOCP-UHFFFAOYSA-N 0.000 description 6
- NPXOKRUENSOPAO-UHFFFAOYSA-N Raney nickel Chemical compound [Al].[Ni] NPXOKRUENSOPAO-UHFFFAOYSA-N 0.000 description 6
- 229910000564 Raney nickel Inorganic materials 0.000 description 6
- ZVQOOHYFBIDMTQ-UHFFFAOYSA-N [methyl(oxido){1-[6-(trifluoromethyl)pyridin-3-yl]ethyl}-lambda(6)-sulfanylidene]cyanamide Chemical compound N#CN=S(C)(=O)C(C)C1=CC=C(C(F)(F)F)N=C1 ZVQOOHYFBIDMTQ-UHFFFAOYSA-N 0.000 description 6
- 239000002253 acid Substances 0.000 description 6
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 6
- 239000012264 purified product Substances 0.000 description 6
- 238000003756 stirring Methods 0.000 description 6
- 125000001424 substituent group Chemical group 0.000 description 6
- 235000005074 zinc chloride Nutrition 0.000 description 6
- 239000011592 zinc chloride Substances 0.000 description 6
- JHLKSIOJYMGSMB-UHFFFAOYSA-N 1-bromo-3,5-difluorobenzene Chemical compound FC1=CC(F)=CC(Br)=C1 JHLKSIOJYMGSMB-UHFFFAOYSA-N 0.000 description 5
- 239000007795 chemical reaction product Substances 0.000 description 5
- 125000004428 fluoroalkoxy group Chemical group 0.000 description 5
- 230000001965 increasing effect Effects 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 239000011541 reaction mixture Substances 0.000 description 5
- 239000012279 sodium borohydride Substances 0.000 description 5
- 229910000033 sodium borohydride Inorganic materials 0.000 description 5
- 230000002194 synthesizing effect Effects 0.000 description 5
- MSWCBPBZUARGEU-UHFFFAOYSA-N 1-(2-bromoethyl)-4-(trifluoromethoxy)benzene Chemical compound FC(F)(F)OC1=CC=C(CCBr)C=C1 MSWCBPBZUARGEU-UHFFFAOYSA-N 0.000 description 4
- 125000005451 3-fluoro-1,4-phenylene group Chemical group [H]C1=C([*:1])C([H])=C(F)C([*:2])=C1[H] 0.000 description 4
- QJPJQTDYNZXKQF-UHFFFAOYSA-N 4-bromoanisole Chemical compound COC1=CC=C(Br)C=C1 QJPJQTDYNZXKQF-UHFFFAOYSA-N 0.000 description 4
- IKHGUXGNUITLKF-UHFFFAOYSA-N Acetaldehyde Chemical compound CC=O IKHGUXGNUITLKF-UHFFFAOYSA-N 0.000 description 4
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 4
- 239000005977 Ethylene Substances 0.000 description 4
- 239000007868 Raney catalyst Substances 0.000 description 4
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 4
- 238000009903 catalytic hydrogenation reaction Methods 0.000 description 4
- 239000012295 chemical reaction liquid Substances 0.000 description 4
- 239000003153 chemical reaction reagent Substances 0.000 description 4
- 125000004093 cyano group Chemical group *C#N 0.000 description 4
- HPXRVTGHNJAIIH-PTQBSOBMSA-N cyclohexanol Chemical class O[13CH]1CCCCC1 HPXRVTGHNJAIIH-PTQBSOBMSA-N 0.000 description 4
- GVLGAFRNYJVHBC-UHFFFAOYSA-N hydrate;hydrobromide Chemical compound O.Br GVLGAFRNYJVHBC-UHFFFAOYSA-N 0.000 description 4
- 238000006138 lithiation reaction Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000012046 mixed solvent Substances 0.000 description 4
- IPNPIHIZVLFAFP-UHFFFAOYSA-N phosphorus tribromide Chemical compound BrP(Br)Br IPNPIHIZVLFAFP-UHFFFAOYSA-N 0.000 description 4
- 239000002243 precursor Substances 0.000 description 4
- 238000000746 purification Methods 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- XETDBHNHTOJWPZ-UHFFFAOYSA-M 2-(1,3-dioxan-2-yl)ethyl-triphenylphosphanium;bromide Chemical compound [Br-].O1CCCOC1CC[P+](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 XETDBHNHTOJWPZ-UHFFFAOYSA-M 0.000 description 3
- POLPIGVTBCQYSK-UHFFFAOYSA-N 3-fluoropropylcyclohexane Chemical compound FCCCC1CCCCC1 POLPIGVTBCQYSK-UHFFFAOYSA-N 0.000 description 3
- SBSFDYRKNUCGBZ-UHFFFAOYSA-N 4-bromo-2-fluoro-1-(trifluoromethoxy)benzene Chemical compound FC1=CC(Br)=CC=C1OC(F)(F)F SBSFDYRKNUCGBZ-UHFFFAOYSA-N 0.000 description 3
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical class [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- CPELXLSAUQHCOX-UHFFFAOYSA-N Hydrogen bromide Chemical compound Br CPELXLSAUQHCOX-UHFFFAOYSA-N 0.000 description 3
- 239000004988 Nematic liquid crystal Substances 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- LFYJSSARVMHQJB-QIXNEVBVSA-N bakuchiol Chemical compound CC(C)=CCC[C@@](C)(C=C)\C=C\C1=CC=C(O)C=C1 LFYJSSARVMHQJB-QIXNEVBVSA-N 0.000 description 3
- JFDZBHWFFUWGJE-UHFFFAOYSA-N benzonitrile Chemical compound N#CC1=CC=CC=C1 JFDZBHWFFUWGJE-UHFFFAOYSA-N 0.000 description 3
- 125000000596 cyclohexenyl group Chemical class C1(=CCCCC1)* 0.000 description 3
- 230000018044 dehydration Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000001747 exhibiting effect Effects 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- 229910052740 iodine Inorganic materials 0.000 description 3
- 125000005647 linker group Chemical group 0.000 description 3
- DLEDOFVPSDKWEF-UHFFFAOYSA-N lithium butane Chemical compound [Li+].CCC[CH2-] DLEDOFVPSDKWEF-UHFFFAOYSA-N 0.000 description 3
- 125000006239 protecting group Chemical group 0.000 description 3
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 3
- 238000011282 treatment Methods 0.000 description 3
- GQHWSLKNULCZGI-UHFFFAOYSA-N trifluoromethoxybenzene Chemical compound FC(F)(F)OC1=CC=CC=C1 GQHWSLKNULCZGI-UHFFFAOYSA-N 0.000 description 3
- GVXPKVWXCHGWPG-UHFFFAOYSA-N 1,3-difluoro-5-[4-(3-fluoropropyl)cyclohexyl]-2-[2-[3-fluoro-4-(trifluoromethoxy)phenyl]ethyl]benzene Chemical compound C1CC(CCCF)CCC1C(C=C1F)=CC(F)=C1CCC1=CC=C(OC(F)(F)F)C(F)=C1 GVXPKVWXCHGWPG-UHFFFAOYSA-N 0.000 description 2
- LYAXJISHJZCFCP-UHFFFAOYSA-N 1,3-difluoro-5-[4-(3-fluoropropyl)cyclohexyl]benzene Chemical compound C1CC(CCCF)CCC1C1=CC(F)=CC(F)=C1 LYAXJISHJZCFCP-UHFFFAOYSA-N 0.000 description 2
- GNDFMCHYXPCYBW-UHFFFAOYSA-N 1-(2-bromoethyl)-3,5-difluorobenzene Chemical compound FC1=CC(F)=CC(CCBr)=C1 GNDFMCHYXPCYBW-UHFFFAOYSA-N 0.000 description 2
- WTCVMJLGKMOROW-UHFFFAOYSA-N 1-(2-bromoethyl)-4-(trifluoromethyl)benzene Chemical compound FC(F)(F)C1=CC=C(CCBr)C=C1 WTCVMJLGKMOROW-UHFFFAOYSA-N 0.000 description 2
- ZAUDUSMRXPRMEP-UHFFFAOYSA-N 1-(2-methoxyethenyl)-4-(trifluoromethoxy)benzene Chemical compound COC=CC1=CC=C(OC(F)(F)F)C=C1 ZAUDUSMRXPRMEP-UHFFFAOYSA-N 0.000 description 2
- RIWRRCCGDWWMFE-UHFFFAOYSA-N 1-[2-[4-[4-(3-fluoropropyl)cyclohexyl]cyclohexyl]ethyl]-4-(trifluoromethoxy)benzene Chemical compound C1CC(CCCF)CCC1C1CCC(CCC=2C=CC(OC(F)(F)F)=CC=2)CC1 RIWRRCCGDWWMFE-UHFFFAOYSA-N 0.000 description 2
- SEAOBYFQWJFORM-UHFFFAOYSA-N 1-bromo-4-(trifluoromethoxy)benzene Chemical compound FC(F)(F)OC1=CC=C(Br)C=C1 SEAOBYFQWJFORM-UHFFFAOYSA-N 0.000 description 2
- MEKOFIRRDATTAG-UHFFFAOYSA-N 2,2,5,8-tetramethyl-3,4-dihydrochromen-6-ol Chemical compound C1CC(C)(C)OC2=C1C(C)=C(O)C=C2C MEKOFIRRDATTAG-UHFFFAOYSA-N 0.000 description 2
- PWECAMSBQAAGJI-UHFFFAOYSA-N 2-[3,5-difluoro-4-(trifluoromethyl)phenyl]-1,3-difluoro-5-[2-[4-(3-fluoropropyl)cyclohexyl]ethyl]benzene Chemical compound C1CC(CCCF)CCC1CCC1=CC(F)=C(C=2C=C(F)C(=C(F)C=2)C(F)(F)F)C(F)=C1 PWECAMSBQAAGJI-UHFFFAOYSA-N 0.000 description 2
- WWRPUUDHUYRNBI-UHFFFAOYSA-N 3-[4-[2-[3-fluoro-4-(trifluoromethoxy)phenyl]ethyl]cyclohexyl]propan-1-ol Chemical compound C1CC(CCCO)CCC1CCC1=CC=C(OC(F)(F)F)C(F)=C1 WWRPUUDHUYRNBI-UHFFFAOYSA-N 0.000 description 2
- BEFDXOOPCJKOOQ-UHFFFAOYSA-N 3-[4-[2-[3-fluoro-4-(trifluoromethoxy)phenyl]ethyl]cyclohexyl]propanal Chemical compound C1=C(OC(F)(F)F)C(F)=CC(CCC2CCC(CCC=O)CC2)=C1 BEFDXOOPCJKOOQ-UHFFFAOYSA-N 0.000 description 2
- YINNFJRYLVDXAJ-UHFFFAOYSA-N 3-[4-[4-[2-[4-(trifluoromethyl)phenyl]ethyl]cyclohexyl]cyclohexyl]propan-1-ol Chemical compound C1CC(CCCO)CCC1C1CCC(CCC=2C=CC(=CC=2)C(F)(F)F)CC1 YINNFJRYLVDXAJ-UHFFFAOYSA-N 0.000 description 2
- ZEVHSBKTGFKIJG-UHFFFAOYSA-M 3-fluoropropyl(triphenyl)phosphanium;bromide Chemical compound [Br-].C=1C=CC=CC=1[P+](C=1C=CC=CC=1)(CCCF)C1=CC=CC=C1 ZEVHSBKTGFKIJG-UHFFFAOYSA-M 0.000 description 2
- LHELOYUWBUCWBE-UHFFFAOYSA-N 4-(3,5-difluorophenyl)cyclohexan-1-one Chemical compound FC1=CC(F)=CC(C2CCC(=O)CC2)=C1 LHELOYUWBUCWBE-UHFFFAOYSA-N 0.000 description 2
- NSGMZTNTQKRAFA-UHFFFAOYSA-N 4-(4-heptylcyclohexyl)benzonitrile Chemical compound C1CC(CCCCCCC)CCC1C1=CC=C(C#N)C=C1 NSGMZTNTQKRAFA-UHFFFAOYSA-N 0.000 description 2
- DYUHDFHOGDLWLD-UHFFFAOYSA-N 4-[2-(1,3-dioxan-2-yl)ethyl]cyclohexan-1-one Chemical compound C1CC(=O)CCC1CCC1OCCCO1 DYUHDFHOGDLWLD-UHFFFAOYSA-N 0.000 description 2
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Landscapes
- Liquid Crystal Substances (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、液晶組成物の成分
として有効な液晶性化合物、特にTFT用液晶組成物に
用いるのに好適な液晶性化合物、これを含む液晶組成物
およびこの液晶組成物を用いて構成した液晶組成物に関
する。TECHNICAL FIELD The present invention relates to a liquid crystal compound effective as a component of a liquid crystal composition, particularly a liquid crystal compound suitable for use in a liquid crystal composition for TFT, a liquid crystal composition containing the same and a liquid crystal composition thereof. The present invention relates to a liquid crystal composition constituted by using.
【0002】[0002]
【従来の技術】液晶表示素子は液晶物質がもつ光学異方
性および誘電率異方性を利用したものであるが、その表
示様式によってTN型(ねじれネマチック型)、DS型
(動的散乱型)、ゲスト・ホスト型、DAP型(配向相
変型)、STN型など各種の方式に分けられ、それぞれ
の使用に適する液晶物質の性質は異なる。最近は特に液
晶表示素子の表示品位のより高いものが要求されてお
り、その要求に応えるために、薄膜トランジスタ(TF
T)に代表されるアクティブマトリックス方式の表示素
子に対する需要が高まっている。いずれの表示素子に用
いられる液晶物質も、水分、空気、熱、光等に安定であ
ることが必要であるうえ、室温を中心としてできるだけ
広い温度範囲で液晶相を示し、低粘性であり、相溶性が
よく、大きな誘電率異方性値(Δε)を持ち、最適な屈
折率異方性値(Δn)を持たなければならない。しか
し、現在のところ単一化合物ではこのような条件をすべ
て満たす物質はなく、数種の液晶化合物や非液晶化合物
を混合して得られる液晶組成物を使用しているのが現状
である。2. Description of the Related Art A liquid crystal display device utilizes optical anisotropy and dielectric anisotropy of a liquid crystal material. Depending on its display mode, TN type (twisted nematic type), DS type (dynamic scattering type) are used. ), Guest-host type, DAP type (alignment phase change type), STN type, etc., and the properties of the liquid crystal substance suitable for each use are different. Recently, a liquid crystal display element having a higher display quality has been particularly demanded, and in order to meet the demand, a thin film transistor (TF) is used.
There is an increasing demand for active matrix type display devices represented by T). The liquid crystal substance used in any of the display elements needs to be stable to moisture, air, heat, light, etc., and exhibits a liquid crystal phase in a temperature range as wide as possible around room temperature, has a low viscosity, and It must have good solubility, a large dielectric anisotropy value (Δε), and an optimum refractive index anisotropy value (Δn). However, at present, there is no substance that satisfies all such conditions with a single compound, and at present the liquid crystal composition obtained by mixing several kinds of liquid crystal compounds and non-liquid crystal compounds is used.
【0003】TFT型液晶表示素子に特に要求される特
性は、フレーム時間の間、高コントラストを保持するこ
とであり、従ってこの目的のために用いられる液晶物質
は上記の条件に加えて比抵抗値の大きいことが必要とさ
れる。また、最近はTFT型液晶表示素子に低電圧駆動
が求められており、この要求に応えるため、これまでT
FT型液晶表示素子に用いられていた液晶材料より大き
なΔεを持つ液晶性化合物や液晶組成物が必要となって
きた。A characteristic particularly required for the TFT type liquid crystal display device is to maintain a high contrast during the frame time. Therefore, the liquid crystal material used for this purpose has a specific resistance value in addition to the above conditions. Is required to be large. Recently, a TFT type liquid crystal display element is required to be driven at a low voltage.
A liquid crystal compound or a liquid crystal composition having a larger Δε than the liquid crystal material used for the FT type liquid crystal display element has been required.
【0004】一般の液晶性化合物はシアノ基をもつもの
が多いが、シアノ基はTFT型液晶表示素子で使用する
場合、高電圧がかかると分解が起こるため、表示動作中
に高い比抵抗値を維持できない。このため、シアノ基を
含む液晶性化合物は、高いΔεを有しているにもかかわ
らずTFT型液晶表示素子に使用することは不可能であ
る。これを改善するため、高い比抵抗値を示しながらも
高いΔεを有する液晶材料の開発が活発になされてい
る。高い比抵抗値を有する液晶性化合物としては、フッ
素系化合物が適している。これらの化合物、一般にフッ
素原子を置換基として有する液晶性化合物は、以下の通
り知られている。例えば、特公平02−40048号に
は次式(1)で示される化合物が開示されている。Many of the general liquid crystalline compounds have a cyano group, but when used in a TFT type liquid crystal display element, the cyano group decomposes when a high voltage is applied, so that a high specific resistance value is exerted during the display operation. I can't keep up. Therefore, a liquid crystal compound containing a cyano group cannot be used for a TFT type liquid crystal display device, despite having a high Δε. In order to improve this, a liquid crystal material having a high specific resistance value and a high Δε has been actively developed. A fluorine-based compound is suitable as the liquid crystal compound having a high specific resistance value. These compounds, generally liquid crystal compounds having a fluorine atom as a substituent, are known as follows. For example, Japanese Patent Publication No. 02-40048 discloses a compound represented by the following formula (1).
【0005】[0005]
【化8】 Embedded image
【0006】該化合物(1)は、シアノ基を有する化合
物に比べ高い比抵抗を有するため工業的に使用されては
いるが、Δεが約4と小さく、十分な低電圧駆動を実現
できるものではない。上記化合物(1)より大きなΔε
を有する化合物として、特開平02−233626号に
次式(2)で示されるトリフルオロフェニル化合物が開
示されている。The compound (1) is industrially used because it has a higher specific resistance than a compound having a cyano group, but it has a small Δε of about 4 and cannot be driven at a sufficiently low voltage. Absent. Greater Δε than the above compound (1)
JP-A-02-233626 discloses a trifluorophenyl compound represented by the following formula (2) as a compound having
【0007】[0007]
【化9】 [Chemical 9]
【0008】しかしながらこの化合物は約8程度の不充
分なΔεを示すに過ぎない上、フッ素原子を前記(1)
式の化合物よりさらに多く導入した構造となっているた
め、液晶相温度範囲が非常に狭く、液晶組成物を構成す
る1成分としては不適である。さらにN−I点について
みても、(2)式例の1−(4−プロピルシクロヘキシ
ル)−4−(3,4,5−トリフルオロフェニル)シク
ロヘキサンは、モノフルオロ化合物例である1−(4−
プロピルシクロヘキシル)−4−(4−フルオロフェニ
ル)シクロヘキサンに比べ約60℃、ジフルオロ化合物
例である1−(4−プロピルシクロヘキシル)−4−
(3,4−ジフルオロフェニル)シクロヘキサンに比べ
約25℃それぞれ低くなることが確認されている。However, this compound only shows an insufficient Δε of about 8 and the fluorine atom is added to the above (1).
Since it has a structure in which a larger amount than that of the compound of the formula is introduced, the temperature range of the liquid crystal phase is extremely narrow and it is unsuitable as one component constituting the liquid crystal composition. Further regarding the NI point, 1- (4-propylcyclohexyl) -4- (3,4,5-trifluorophenyl) cyclohexane of the formula example (2) is 1- (4) which is a monofluoro compound example. −
Propylcyclohexyl) -4- (4-fluorophenyl) cyclohexane is about 60 ° C., which is a difluoro compound example, 1- (4-propylcyclohexyl) -4-
It has been confirmed that the temperature is lower by about 25 ° C. than that of (3,4-difluorophenyl) cyclohexane.
【0009】また、特開平04−506361号には、
次式(3)および(4)で示される化合物が開示されて
いる。Further, in Japanese Patent Laid-Open No. 04-506361,
The compounds represented by the following formulas (3) and (4) are disclosed.
【0010】[0010]
【化10】 [Chemical 10]
【0011】これらの化合物は、比較的大きなΔεを持
つ(例えば化合物(4)と(5)のΔεは約7である)
が、既存の液晶性化合物に対し低温での相溶性が非常に
悪く、液晶組成物の構成成分としては不適であった。こ
の相溶性を改善するため、アルキル基であるR中にフッ
素原子を導入した化合物が特表平04−506817号
に開示されている。該開示化合物は、末端にシクロヘキ
シル基とフェニル基を有する2ないし3環の化合物、例
えば下記式(6)に示すような化合物であるが、このも
のは分子中央部に結合基として単結合を有しているのみ
であって、他の結合基、例えば1,2−エチレン基につ
いてはこれを有していない。さらに、上記末端のフェニ
ル基上の置換基はフッ素原子に限られており、他の置換
基、例えばフルオロアルキル基やフルオロアルコキシ基
を何ら教えていないし、示唆もしていない。These compounds have relatively large Δε (for example, Δε of compounds (4) and (5) is about 7).
However, the compatibility with existing liquid crystalline compounds at low temperatures was extremely poor, and it was unsuitable as a constituent component of a liquid crystal composition. In order to improve the compatibility, a compound in which a fluorine atom is introduced into R which is an alkyl group is disclosed in JP-A-04-506817. The disclosed compound is a 2- or 3-ring compound having a cyclohexyl group and a phenyl group at the terminal, for example, a compound represented by the following formula (6), which has a single bond as a bonding group in the central part of the molecule. However, it does not have other linking groups, such as the 1,2-ethylene group. Further, the substituents on the terminal phenyl group are limited to fluorine atoms, and do not teach or suggest other substituents such as fluoroalkyl groups and fluoroalkoxy groups.
【0012】[0012]
【化11】 [Chemical 11]
【0013】しかしながらこのような化合物は相溶性を
全く改善するものではなく、特に式(6)の化合物は液
晶相すら示さない。このように大きなΔεを持ちかつ相
溶性の良い化合物は未だ知られていないので、大きなΔ
εを有する液晶性化合物を組成物成分として用いる場
合、その混合比を大きくすることができず、組成物のΔ
ε値の大きさは制限されてしまうのが現状である。従っ
て高い比抵抗値と大きなΔεを持ちながら、既存の液晶
性化合物との相溶性に優れた液晶性化合物の出現が嘱望
されている。However, such a compound does not improve the compatibility at all, and in particular, the compound of the formula (6) does not show even a liquid crystal phase. A compound having such a large Δε and good compatibility is not known yet, and therefore, a large Δ
When a liquid crystalline compound having ε is used as a composition component, the mixing ratio cannot be increased, and
At present, the size of the ε value is limited. Therefore, it is expected that a liquid crystal compound having a high specific resistance value and a large Δε and excellent compatibility with the existing liquid crystal compound will appear.
【0014】[0014]
【発明が解決しようとする課題】本発明の目的は、前記
した従来技術の欠点を解消し、Δε値が大きく、電気
的、化学的に安定であり、かつ既存の液晶性化合物との
相溶性についても良好な液晶性化合物、これを含む液晶
組成物、およびこれを用いて構成した液晶表示素子を提
供することにある。The object of the present invention is to solve the above-mentioned drawbacks of the prior art, have a large Δε value, be electrically and chemically stable, and be compatible with existing liquid crystal compounds. With respect to the above, it is to provide a good liquid crystal compound, a liquid crystal composition containing the same, and a liquid crystal display device constituted by using the same.
【0015】[0015]
【課題を解決するための手段】上記目的を達成するた
め、本願で特許請求される発明は以下の通りである。 (1) 一般式(I)In order to achieve the above object, the invention claimed in the present application is as follows. (1) General formula (I)
【0016】[0016]
【化12】 F-(CH2)n −E-(CH2CH2)k −G-(CH2CH2)1−L-(CH2CH2)m −Z−Q−Y (I) (式中、nは1〜10の整数、k、l、mはそれぞれに
独立して0〜2の整数であり、環Eは六員環上の1個以
上の水素原子がフッ素原子で置換されていてもよい1,
4−シクロヘキシレン基または1,4−フェニレン基を
示し、GおよびLはそれぞれに独立して共有結合または
六員環上の1個以上の水素原子がフッ素原子で置換され
ていてもよい1,4−シクロヘキシレン基または1,4
−フェニレン基を示すが、共有結合である場合にはGが
優先し、環Zはフッ素置換されていてもよい1,4−フ
ェニレン基であり、Qは共有結合または−O−であり、
Yは炭素数1〜3のフルオロアルキル基またはフッ素原
子である。ただし、環Eが1,4−シクロヘキシレン基
でかつGおよびLの少なくとも一方が共有結合である場
合はk+l+m≠0であり、またQが−O−である場合
は、Yがフッ素原子であることはない。)で表わされる
液晶性化合物。 (2) k、l、mがそれぞれに独立して0または1で
あり、環Eが1,4−フェニレン基またはフッ素置換
1,4−フェニレン基である(1)に記載の液晶性化合
物。 (3) k、l、mがそれぞれに独立して0または1で
あり、環Eが1,4−シクロヘキシレン基である(1)
に記載の液晶性化合物。 (4) kが1、lおよびmが0、Gは共有結合であ
り、Lは1,4−シクロヘキシレン基、1,4−フェニ
レン基またはフッ素置換1,4−フェニレン基である
(3)に記載の液晶性化合物。 (5) Lが1,4−シクロヘキシレン基である(4)
に記載の液晶性化合物。 (6) Lが1,4−フェニレン基またはフッ素置換
1,4−フェニレン基である(4)に記載の液晶性化合
物。 (7) kおよびlが0、mが1、Gは共有結合、Lは
1,4−シクロヘキシレン基、1,4−フェニレン基ま
たはフッ素置換1,4−フェニレン基である(3)に記
載の液晶性化合物。 (8) Lが1,4−シクロヘキシレン基である(7)
に記載の液晶性化合物。 (9) Lが1,4−フェニレン基またはフッ素置換
1,4−フェニレン基である(7)に記載の液晶性化合
物。 (10) kおよびmが1、lが0、Gは共有結合、L
は1,4−シクロヘキシレン基、1,4−フェニレン基
またはフッ素置換1,4−フェニレン基である(3)に
記載の液晶性化合物。 (11) kが1、lおよびmが0、GおよびLが共有
結合である(3)に記載の液晶性化合物。 (12) G、Lがそれぞれに独立して1,4−シクロ
ヘキシレン基、1,4−フェニレン基またはフッ素置換
1,4−フェニレン基である(1)に記載の液晶性化合
物。 (13) (1)〜(12)に記載の液晶性化合物を少
なくとも一種類含有することを特徴とする液晶組成物。 (14) 第一成分として、(1)〜(12)のいずれ
かに記載の液晶性化合物を少なくとも1種類含有し、第
二成分として、一般式(II)、(III)および(IV)Embedded image F- (CH 2) n -E- ( CH 2 CH 2) k -G- (CH 2 CH 2) 1 -L- (CH 2 CH 2) m -Z-Q-Y (I) (In the formula, n is an integer of 1 to 10, k, l, and m are each independently an integer of 0 to 2, and the ring E is one or more hydrogen atoms on the 6-membered ring substituted with a fluorine atom. May have been 1,
4-cyclohexylene group or 1,4-phenylene group, G and L are each independently a covalent bond or one or more hydrogen atoms on the 6-membered ring may be substituted with a fluorine atom, 1, 4-cyclohexylene group or 1,4
-A phenylene group is shown, but when it is a covalent bond, G is preferred, ring Z is a 1,4-phenylene group which may be fluorine-substituted, and Q is a covalent bond or -O-.
Y is a fluoroalkyl group having 1 to 3 carbon atoms or a fluorine atom. However, when ring E is a 1,4-cyclohexylene group and at least one of G and L is a covalent bond, k + l + m ≠ 0, and when Q is —O—, Y is a fluorine atom. There is no such thing. )). (2) The liquid crystalline compound according to (1), wherein k, l and m are each independently 0 or 1, and the ring E is a 1,4-phenylene group or a fluorine-substituted 1,4-phenylene group. (3) k, l, m are each independently 0 or 1, and ring E is a 1,4-cyclohexylene group (1)
The liquid crystal compound according to item 1. (4) k is 1, l and m are 0, G is a covalent bond, and L is a 1,4-cyclohexylene group, a 1,4-phenylene group or a fluorine-substituted 1,4-phenylene group (3) The liquid crystal compound according to item 1. (5) L is a 1,4-cyclohexylene group (4)
The liquid crystal compound according to item 1. (6) The liquid crystal compound according to (4), wherein L is a 1,4-phenylene group or a fluorine-substituted 1,4-phenylene group. (7) k and l are 0, m is 1, G is a covalent bond, L is a 1,4-cyclohexylene group, a 1,4-phenylene group or a fluorine-substituted 1,4-phenylene group. Liquid crystalline compounds. (8) L is a 1,4-cyclohexylene group (7)
The liquid crystal compound according to item 1. (9) The liquid crystalline compound according to (7), wherein L is a 1,4-phenylene group or a fluorine-substituted 1,4-phenylene group. (10) k and m are 1, l is 0, G is a covalent bond, L
Is a 1,4-cyclohexylene group, a 1,4-phenylene group or a fluorine-substituted 1,4-phenylene group, (3). (11) The liquid crystal compound according to (3), wherein k is 1, l and m are 0, and G and L are covalent bonds. (12) The liquid crystalline compound according to (1), wherein G and L are each independently a 1,4-cyclohexylene group, a 1,4-phenylene group or a fluorine-substituted 1,4-phenylene group. (13) A liquid crystal composition comprising at least one kind of the liquid crystalline compound described in (1) to (12). (14) As a first component, at least one kind of the liquid crystalline compound according to any one of (1) to (12) is contained, and as a second component, general formulas (II), (III) and (IV) are included.
【0017】[0017]
【化13】 [Chemical 13]
【0018】(式中、R1 は炭素数1〜10のアルキル
基を示し、VはF、Cl、CF3 、OCF3 、OCF2
Hまたは炭素数1〜10のアルキル基を示し、L1 、L
2 、L 3 、L4 はそれぞれ独立してHまたはFを示し、
Z1 、Z2 はそれぞれ独立して−(CH2)2 −、−CH
=CH−または共有結合を示し、環Aはトランス−14
−シクロヘキシレン基または1,4−フェニレン基を示
し、aは1または2を示し、bは0または1を示す。)
からなる群から選択される化合物を少なくとも1種類含
有することを特徴とする液晶組成物。 (15) 第一成分として、(1)〜(12)のいずれ
かに記載の液晶性化合物を少なくとも1種類含有し、第
二成分として、一般式(V)、(VI)、(VII)、(VII
I)および(IX)(Where R is1Is alkyl having 1 to 10 carbons
Group, V is F, Cl, CF3, OCF3, OCF2
H or an alkyl group having 1 to 10 carbon atoms, L1, L
2, L 3, LFourEach independently represent H or F,
Z1, Z2Are each independently-(CH2)2-, -CH
═CH— or a covalent bond, and ring A is trans-14
Represents a cyclohexylene group or a 1,4-phenylene group
, A represents 1 or 2, and b represents 0 or 1. )
Containing at least one compound selected from the group consisting of
A liquid crystal composition having: (15) Any of (1) to (12) as the first component
Containing at least one liquid crystal compound according to
Two components are represented by the general formulas (V), (VI), (VII), (VII
I) and (IX)
【0019】[0019]
【化14】 Embedded image
【0020】(式中、R2 はF、炭素数1〜10のアル
キル基または炭素数2〜10のアルケニル基を示す。い
ずれにおいてもそのうちの任意のメチレン基(−CH2
−)は酸素原子(−O−)によって置換されていてもよ
いが、2つ以上のメチレン基が連続して酸素原子に置換
されることはない。Z3 は−(CH2)2 −、−COOま
たは共有結合を示し、L5 およびL6 はそれぞれ独立し
てHまたはFを示し、D 1 はトランス−1,4−シクロ
ヘキシレン基、1,4−フェニレン基または1,3−ジ
オキサン−2,5−ジイル基を示し、環Uはトランス−
1,4−シクロヘキシレン基または1,4−フェニレン
基を示し、c、dはそれぞれ独立して0または1を示
す。)(Where R is2Is F, al having 1 to 10 carbon atoms
A kill group or an alkenyl group having 2 to 10 carbon atoms is shown. I
Even if there is a gap, any methylene group (-CH2
-) May be substituted by an oxygen atom (-O-)
However, two or more methylene groups are continuously replaced by oxygen atoms.
It will not be done. Z3Is-(CH2)2-,-COO
Or covalent bond, LFiveAnd L6Are each independent
Indicates H or F, and D 1Is trans-1,4-cyclo
Hexylene group, 1,4-phenylene group or 1,3-di
Oxane-2,5-diyl group, and ring U is trans-
1,4-cyclohexylene group or 1,4-phenylene
Group, c and d each independently represent 0 or 1.
You )
【0021】[0021]
【化15】 [Chemical 15]
【0022】(式中、R3 は炭素数1〜10のアルキル
基を示し、L7 はHまたはFを示し、eは0または1を
示す。)(In the formula, R 3 represents an alkyl group having 1 to 10 carbon atoms, L 7 represents H or F, and e represents 0 or 1.)
【0023】[0023]
【化16】 Embedded image
【0024】(式中、R4 は炭素数1〜10のアルキル
基を示し、Iはトランス−1,4−シクロヘキシレン基
または1,4−フェニレン基を示し、L8 、L9 はそれ
ぞれに独立してHまたはFを示し、Z4 は−COO−ま
たは共有結合を示し、Z5 は−COO−または−C≡C
−を示し、f、gはそれぞれ独立して0または1を示
す。)(In the formula, R 4 represents an alkyl group having 1 to 10 carbon atoms, I represents a trans-1,4-cyclohexylene group or 1,4-phenylene group, and L 8 and L 9 respectively represent Independently representing H or F, Z 4 represents —COO— or a covalent bond, and Z 5 represents —COO— or —C≡C.
Represents-, and f and g each independently represent 0 or 1. )
【0025】[0025]
【化17】 [Chemical 17]
【0026】(式中、R5 、R6 はそれぞれ独立して炭
素数1〜10のアルキル基、アルコキシ基またはアルコ
キシメチル基を示し、Wはトランス−1,4−シクロヘ
キシレン基、1,4−フェニレン基または1,3−ピリ
ミジン−2,5−ジイル基を示し、Kはトランス−1,
4−シクロヘキシレン基または1,4−フェニレン基を
示し、Z6 は−C≡C−、−COO−、−(CH2)2 −
または共有結合を示す)(In the formula, R 5 and R 6 each independently represent an alkyl group, an alkoxy group or an alkoxymethyl group having 1 to 10 carbon atoms, W is a trans-1,4-cyclohexylene group, 1,4 -Phenylene group or 1,3-pyrimidine-2,5-diyl group, K is trans-1,
A 4-cyclohexylene group or a 1,4-phenylene group is shown, and Z 6 is -C≡C-, -COO-,-(CH 2 ) 2-.
Or indicates a covalent bond)
【0027】[0027]
【化18】 Embedded image
【0028】(式中、R7 は炭素数1〜10のアルキル
基またはアルコキシ基を示し、R8 は炭素数1〜10の
アルキル基を示す。R8 の任意のメチレン基(−CH2
−)は酸素原子(−O−)によって置換されていてもよ
いが、2つ以上のメチレン基が連続して酸素原子に置換
されることはない。Mはトランス−1,4−シクロヘキ
シレン基または1,3−ピリミジン−2,5−ジイル基
を示し、環NおよびPはそれぞれ独立してトランス−
1,4−シクロヘキシレン基または1,4−フェニレン
基を示し、Z7 は−COO−、−(CH2)2 −、−CH
=CH−または共結合を示し、Z8 は−C≡C−、−C
OO−、または共有結合を示し、hは0または1を示
し、L10はHまたはFを示す。)からなる群から選択さ
れる化合物を少なくとも1種類含有することを特徴とす
る液晶組成物。 (16) 第一成分として、(1)〜(12)のいずれ
かに記載の液晶性化合物を少なくとも1種類含有し、第
二成分の一部分として、一般式(II)、(III)および
(IV)からなる群から選択される化合物を少なくとも1
種類含有し、第二成分の他の部分として、一般式
(V)、(VI)、(VII)、(VIII)および(IX)からな
る群から選択される化合物を少なくとも1種類含有する
ことを特徴とする液晶組成物。 (17) (13)〜(16)のいずれかに記載の液晶
組成物を用いて構成した液晶表示素子。[0028] (wherein, R 7 represents an alkyl group or an alkoxy group having 1 to 10 carbon atoms, R 8 is optional methylene group (-CH 2 of .R 8 represents an alkyl group having 1 to 10 carbon atoms
-) May be substituted by an oxygen atom (-O-), but two or more methylene groups are not continuously substituted by an oxygen atom. M represents a trans-1,4-cyclohexylene group or a 1,3-pyrimidine-2,5-diyl group, and the rings N and P are each independently trans-.
1,4-cyclohexylene group or 1,4-phenylene group is shown, Z 7 is —COO—, — (CH 2 ) 2 —, —CH
═CH— or a co-bond, Z 8 is —C≡C—, —C
OO- or a covalent bond is shown, h is 0 or 1, and L 10 is H or F. And a liquid crystal composition containing at least one compound selected from the group consisting of: (16) At least one liquid crystal compound according to any one of (1) to (12) is contained as a first component, and as a part of the second component, one of the general formulas (II), (III) and (IV ) At least one compound selected from the group consisting of
And containing at least one compound selected from the group consisting of the general formulas (V), (VI), (VII), (VIII) and (IX) as the other part of the second component. A characteristic liquid crystal composition. (17) A liquid crystal display device constituted by using the liquid crystal composition according to any one of (13) to (16).
【0029】本発明の一般式(I)で示す液晶性化合物
は、一方の分子末端環であるフェニル基上にフッ素原
子、炭素数1から3のフルオロアルキル基およびフルオ
ロアルコキシ基からなる群から選ばれる基を有し、もう
一方の末端環上にフッ素原子含有基を有する2〜4環構
造で、かつ2〜3環構造の場合には、分子中央の結合部
に少なくとも一つの1,2−エチレンまたは1,4−ブ
チレン結合基が導入されていることを特徴とする。この
ような構造とすることにより、本発明の化合物(I)
は、いずれも大きなΔεと良好な相溶性を合わせ持つ
上、低い粘性と高い安定性、すなわち高い比抵抗値を示
し、かつほとんどのものが広い液晶温度範囲を持つもの
となる。従って、本発明のこれらの化合物を液晶組成物
の成分として用いた場合、好ましい特性を有する新たな
液晶組成物を提供し得る。The liquid crystalline compound represented by the general formula (I) of the present invention is selected from the group consisting of a fluorine atom, a fluoroalkyl group having 1 to 3 carbon atoms and a fluoroalkoxy group on the phenyl group which is one of the terminal rings. 2 to 4 ring structure having a fluorine atom-containing group on the other terminal ring, and in the case of 2 to 3 ring structure, at least one 1,2- It is characterized in that an ethylene or 1,4-butylene bonding group is introduced. By having such a structure, the compound (I) of the present invention
In addition to having a large Δε and good compatibility, each of them has a low viscosity and a high stability, that is, a high specific resistance value, and most of them have a wide liquid crystal temperature range. Therefore, when these compounds of the present invention are used as a component of a liquid crystal composition, a new liquid crystal composition having preferable properties can be provided.
【0030】本発明の一般式(I)で示される液晶性化
合物は、上記した通り、いずれも優れた特性を持つが、
このうち特に、次に挙げる式(1−1)〜(1−25)
で示す化合物が大きなΔεと良好な相溶性を持つ点で好
ましい。なお各式中、Q、Yは前述と同じ意味を、T1
からT8 はそれぞれに独立してHまたはFを、S1 は
(CH2 CH2)k 、S2 は(CH2 CH2)l 、S3 は
(CH2 CH2)m をk、l、mは前述と同じ意味をそれ
ぞれ示す。The liquid crystalline compounds represented by the general formula (I) of the present invention have excellent properties as described above,
Among these, particularly, the following formulas (1-1) to (1-25)
The compound represented by is preferable because it has a large compatibility with Δε. In each formula, Q and Y have the same meanings as described above, and T 1
To T 8 are independently H or F, S 1 is (CH 2 CH 2 ) k , S 2 is (CH 2 CH 2 ) l , and S 3 is (CH 2 CH 2 ) m , k and l. , M have the same meanings as described above.
【0031】[0031]
【化19】 [Chemical 19]
【0032】[0032]
【化20】 Embedded image
【0033】[0033]
【化21】 [Chemical 21]
【0034】これらの中で、2環系の式(1−1)、
(1−2)および(1−17)で示される化合物はきわ
めて相溶性が良くかつ粘性も低いという優れた特性を有
するが、中でも特に2個の環が共にフェニル基である式
(1−1)および(1−2)に含まれるものは、さらに
Δnも大きいという特徴を有する。このため、これらの
2環系化合物は、低粘性が必要とされる組成物の成分と
して用いられることが有効である。Among these, two-ring system formula (1-1),
The compounds represented by (1-2) and (1-17) have excellent properties such that they are extremely compatible and have low viscosity, and in particular, the compounds represented by the formula (1-1) in which two rings are both phenyl groups ) And (1-2) have a feature that Δn is also large. Therefore, it is effective that these bicyclic compounds are used as a component of a composition that requires low viscosity.
【0035】3環系化合物(1−3)〜(1−16)と
4環系化合物(1−18)〜(1−25)は共に透明点
が高いので、液晶温度範囲を広げる効果を有する。この
ことに加え、3環系化合物の中でも特に環と環の間にエ
チレン結合を持つ化合物は相溶性も良いため、かかる特
性が嘱望されている用途、例えば自動車掲載用テレビ等
に用いられるTFT方式の液晶表示素子において、これ
に用いられる液晶組成物の成分として有効である。また
4環系化合物は、少量の使用でこれを含む組成物の透明
点の上限を大きく上げるという効果を有する。それらの
使用に際し、低粘性が要求される組成物に対しては各環
間が共有結合で結ばれた直環のものを、一方、さらに広
い液晶温度範囲が要求される組成物に対してはさらに相
溶性に優れた、環と環の間にエチレン結合を持つものを
用いるのがよい。Since the tricyclic compounds (1-3) to (1-16) and the tetracyclic compounds (1-18) to (1-25) both have high clearing points, they have the effect of widening the liquid crystal temperature range. . In addition to this, among the three-ring compounds, compounds having an ethylene bond between the rings have good compatibility, so that the TFT system used in applications for which such characteristics are expected, such as televisions for automobiles, is expected. It is effective as a component of a liquid crystal composition used in the liquid crystal display element. Further, the tetracyclic compound has the effect of greatly increasing the upper limit of the clearing point of the composition containing it, even if used in a small amount. When using them, a straight ring having a covalent bond between the rings is used for a composition requiring low viscosity, while a composition having a wider liquid crystal temperature range is required for the composition. Further, it is preferable to use one having an ethylene bond between the rings, which has excellent compatibility.
【0036】置換基Q−Yのうち、特に優れた特性を持
つものはCF3 、OCF3 、−OCF2 H、OCF2 C
FHCF3 、−CF2 CF2 HまたはFである。ただし
該置換基がFの場合には、このものはΔεを大きくする
性質を有するため、1,4−フェニレン基Zにおいて、
該F以外に置換されるFは3位置換のもの、または3位
と5位置換のものであればよい。置換基Q−YがF以
外、すなわち炭素数1〜3のフルオロアルキル基または
フルオロアルコキシ基である場合の液晶性化合物は、特
に大きなΔεを発現する。その際、特にQ−Yが−CF
3 である化合物は非常に大きなΔεを示し、Q−Yが−
OCF3 である化合物は大きなΔεとともに低い粘性を
示し、また、Q−Yが−OCF2 CFHCF3 または−
OCF2 CF2 Hである化合物は大きなΔεとともに特
に大きなΔnを示すものとなる。すなわち、Q−Yを上
記に従って種々変更することにより、所望の特性を持つ
化合物を得ることができる。Among the substituents Q--Y, those having particularly excellent characteristics are CF 3 , OCF 3 , --OCF 2 H, OCF 2 C.
FHCF 3, a -CF 2 CF 2 H or F. However, when the substituent is F, it has the property of increasing Δε, so that in the 1,4-phenylene group Z,
F other than F may be substituted at the 3-position or substituted at the 3-position and the 5-position. The liquid crystal compound in which the substituent Q-Y is other than F, that is, a fluoroalkyl group or a fluoroalkoxy group having 1 to 3 carbon atoms exhibits particularly large Δε. At that time, especially Q-Y is -CF
The compound of 3 has a very large Δε and Q−Y is −
The compound that is OCF 3 exhibits low viscosity with a large Δε, and Q-Y has —OCF 2 CFHCF 3 or —.
The compound which is OCF 2 CF 2 H exhibits a particularly large Δn together with a large Δε. That is, a compound having desired characteristics can be obtained by variously changing Q-Y according to the above.
【0037】さらに大きなΔε値を必要とする場合に
は、環E、G、LおよびZにフッ素原子をさらに導入す
ればよい。また、より大きなΔnを必要とする場合に
は、フェニル基をより多く含む化合物を選択すればよ
い。本発明の一般式(I)で示される化合物は、公知の
方法、例えば、以下に示す方法により効果的に合成でき
る。When a larger Δε value is required, a fluorine atom may be introduced into the rings E, G, L and Z. Further, when a larger Δn is required, a compound containing more phenyl groups may be selected. The compound represented by the general formula (I) of the present invention can be effectively synthesized by a known method, for example, the method shown below.
【0038】「Q−Y基の導入」以下の説明において、
式中T1 およびT2 は前記と同様の意味を示し、r1 は
0〜2、r0 、r2 およびr3 は0〜1のそれぞれ整数
である。 Q−Yがペルフルオロアルコキシ基の場合:このもの
は、公知の方法で、例えば「特開平4−501575.
7〜9頁」に記載されているような、フェノール類に四
塩化炭素とHFを作用させる方法に準じて合成できる。"Introduction of Q-Y group" In the following description,
In the formula, T 1 and T 2 have the same meanings as described above, r 1 is 0 to 2, r 0 , r 2 and r 3 are integers of 0 to 1, respectively. When Q-Y is a perfluoroalkoxy group: This can be prepared by a known method, for example, as described in "JP-A-4-501575.
It can be synthesized according to the method of reacting carbon tetrachloride and HF with phenols as described in "Pages 7 to 9".
【0039】[0039]
【化22】 [Chemical formula 22]
【0040】Q−Yがペルフルオロアルキル基の場合:
このものは、公知の方法で、例えば「第4版 実験化学
講座19.403頁」に記載されているような、非プロ
トン性溶媒中で銅粉とペルフルオロアルキル化剤例のペ
ルフルオロアルキルハライドを反応させ、ここで生じた
CF3 ・Cu錯体の溶液にヨードベンゼン誘導体を作用
させる方法に準じて合成できる。When Q-Y is a perfluoroalkyl group:
This is obtained by reacting copper powder with a perfluoroalkyl halide as an example of a perfluoroalkylating agent in an aprotic solvent by a known method, for example, as described in "4th Edition Experimental Chemistry Course, page 19.403". Then, it can be synthesized according to the method in which the solution of the CF 3 .Cu complex generated here is reacted with an iodobenzene derivative.
【0041】[0041]
【化23】 [Chemical formula 23]
【0042】また、「第4版 実験化学講座19.39
0頁」に記載されているように、カルボン酸をSF4 で
処理することによっても好適な結果が得られる。なおペ
ルフルオロアルキル化剤としては、上記の他CF3 CO
2 Na、FO2 SCF2 CO 2 Me、n−Bu4 N+ H
2 F3 - 、CF3 SiMe3 、CF2 Br2 なども好適
に使用することができる。[4th Edition Experimental Chemistry Course 19.39]
Carboxylic acid as described in "Page 0".Fourso
Suitable results can also be obtained by processing. In addition,
As the fluoroalkylating agent, other than the above, CF3CO
2Na, FO2SCF2CO 2Me, n-BuFourN+H
2F3 -, CF3SiMe3, CF2Br2Is also suitable
Can be used for
【0043】[0043]
【化24】 [Chemical formula 24]
【0044】Q−Yが水素原子を含むフルオロアルコキ
シ基の場合:このものは公知の方法で、例えば不飽和フ
ルオロアルケン類を用いることによって好適に目的物を
合成することができる。例えばヘキサフルオロプロペン
やテトラフルオロエチレンを用いて、次の様にして水素
原子を含むフルオロアルコキシ部位を構築することがで
きる。When Q-Y is a fluoroalkoxy group containing a hydrogen atom: This compound can be suitably synthesized by a known method, for example, by using an unsaturated fluoroalkene. For example, hexafluoropropene or tetrafluoroethylene can be used to construct a fluoroalkoxy moiety containing a hydrogen atom as follows.
【0045】[0045]
【化25】 [Chemical 25]
【0046】また、フルオロアルキルハライド、例えば
フルオロアルキルヨウ化物を用いて、塩基性条件下でエ
ーテル化反応を行なうことによっても合成することがで
きる。It can also be synthesized by carrying out an etherification reaction under basic conditions using a fluoroalkyl halide such as fluoroalkyl iodide.
【0047】[0047]
【化26】 [Chemical formula 26]
【0048】Q−Yが水素原子を含むフルオロアルキル
基の場合:このものは、例えば、ベンズアルデヒド誘導
体を「J.O.C.,40,578(1975)」に記
載されているように、ジエチルアミノサルファートリフ
ルオライド(DAST)で処理するか、もしくは「有機
合成化学 第41巻第5号.53頁」に記載されている
ように、フルオロアルキルヨウ化物と亜鉛の存在下、超
音波で処理した後DASTで処理するか、または公知の
方法であるフェニルリチウム誘導体にフルオロアルキル
ヨウ化物を作用させることにより合成することができ
る。When Q-Y is a fluoroalkyl group containing a hydrogen atom: This can be used, for example, as a benzaldehyde derivative as described in "JOC, 40,578 (1975)". After treatment with sulfur trifluoride (DAST) or sonication in the presence of fluoroalkyl iodide and zinc as described in "Synthetic Organic Chemistry Vol. 41 No. 5, p. 53". It can be synthesized by treating with DAST or by reacting a fluoroalkyl iodide with a phenyllithium derivative which is a known method.
【0049】[0049]
【化27】 [Chemical 27]
【0050】「本発明化合物の合成」上記によりQ−Y
基の導入された化合物や市販のフッ素置換されたフェニ
ル誘導体を用いて、本発明の化合物、例えば式(1−
1)から(1−25)に示す代表的な化合物を合成する
ことができる。以下、まず2〜3環化合物の合成法を示
す。[Synthesis of Compound of the Present Invention] Q-Y
A compound of the present invention, for example, a compound of the formula (1-
Representative compounds shown in 1) to (1-25) can be synthesized. Hereinafter, first, a method for synthesizing a 2-3 ring compound will be described.
【0051】式(1−1)の化合物:まず両末端がそれ
ぞれ水酸基と臭素などのハロゲンで置換されたノルマル
アルカン誘導体の水酸基を保護し、これとマグネシウム
をエーテルやテトラヒドロフラン(以下THFと略
す。)等の非プロトン性溶媒中、−50℃〜室温下で作
用させてグリニヤール試薬を得、これにブロモベンゼン
誘導体(6)をニッケルアセチルアセトナート等の触媒
の存在下で作用させ、次いで脱保護することによりアル
コール誘導体(7)を合成する。この誘導体(7)にク
ロロホルムやジクロロメタン等の溶媒中、−50℃〜溶
媒の沸点下でDASTを作用させ、フルオロアルキル誘
導体(8)を合成する。この誘導体(8)にブチルリチ
ウムなどのアルキルリチウムをTHF中、−50℃〜室
温下で作用させ、化合物(9)を調製する。ただし、原
料であるベンゼン誘導体(6)がブロモベンゼンである
場合には、化合物(8)から(9)へのリチオ化反応が
好適には進行しないため、化合物(8)に塩化アルミニ
ウム等の触媒の存在下、臭素を作用させて一旦4−(ω
−フルオロアルキル)ブロモベンゼンを合成し、これを
リチオ化することにより化合物(9)を得ることが好ま
しい。かくして得られた化合物(9)にTHF中、塩化
亜鉛を−50℃〜室温下で作用させ、化合物(10)を
合成する。この化合物(10)のTHF溶液にテトラキ
ストリフェニルホスフィンパラジウムを触媒として加え
た後、ブロモベンゼン誘導体(11)を滴下し、室温で
攪拌または還流し、次いで再結晶することにより化合物
(1−1)を合成することができる。Compound of the formula (1-1): First, both ends are protected with a hydroxyl group and a hydroxyl group of a normal alkane derivative substituted with halogen such as bromine, and this and magnesium are ether or tetrahydrofuran (hereinafter abbreviated as THF). Etc. in an aprotic solvent such as -50 ° C. to room temperature to obtain a Grignard reagent, to which a bromobenzene derivative (6) is allowed to act in the presence of a catalyst such as nickel acetylacetonate, and then deprotected. Thus, the alcohol derivative (7) is synthesized. The derivative (7) is allowed to act on DAST in a solvent such as chloroform or dichloromethane at -50 ° C to the boiling point of the solvent to synthesize a fluoroalkyl derivative (8). An alkyllithium such as butyllithium is allowed to act on this derivative (8) in THF at −50 ° C. to room temperature to prepare a compound (9). However, when the benzene derivative (6) as the raw material is bromobenzene, the lithiation reaction from the compound (8) to the compound (9) does not proceed properly, so that the compound (8) is treated with a catalyst such as aluminum chloride. In the presence of bromine, 4- (ω
Compound (9) is preferably obtained by synthesizing -fluoroalkyl) bromobenzene and lithiation thereof. The compound (9) thus obtained is reacted with zinc chloride in THF at −50 ° C. to room temperature to synthesize the compound (10). Tetrakistriphenylphosphine palladium was added as a catalyst to a THF solution of this compound (10), then the bromobenzene derivative (11) was added dropwise, the mixture was stirred or refluxed at room temperature, and then recrystallized to give the compound (1-1). Can be synthesized.
【0052】[0052]
【化28】 [Chemical 28]
【0053】式(1−2)の化合物:まず、前記ブロモ
ベンゼン誘導体(11)を原料として得られるグリニヤ
ール試薬(以下(11)−Mgと略す。)を、エーテル
やTHF等の非プロトン性溶媒中、−50℃〜室温下で
調製し、これにその温度でエチレンオキシドを滴下し、
フェネチルアルコール誘導体(12)を得る。この誘導
体(12)をHBrやトリブロモホスフィン等の臭素化
試薬と反応させ、フェネチルブロミド誘導体(13)を
合成する。一方、前記の化合物(9)にTHF中でヨウ
素を作用させて化合物(14)を合成し、これを、上記
フェネチルブロミド誘導体(13)を原料とし、エ−テ
ルやTHF等の非プロトン性溶媒中で調製したグリニヤ
ール試薬(13)−Mgに加え、ニッケルアセチルアセ
トナート等の触媒の存在下、−50℃から室温下で作用
させ、化合物(1−2)を合成することができる。Compound of formula (1-2): First, the Grignard reagent (hereinafter abbreviated as (11) -Mg) obtained by using the bromobenzene derivative (11) as a raw material is aprotic solvent such as ether or THF. Medium, prepared at −50 ° C. to room temperature, to which ethylene oxide was added dropwise at that temperature,
A phenethyl alcohol derivative (12) is obtained. This derivative (12) is reacted with a brominating reagent such as HBr or tribromophosphine to synthesize a phenethyl bromide derivative (13). On the other hand, the compound (9) was reacted with iodine in THF to synthesize the compound (14), which was prepared from the phenethyl bromide derivative (13) as a raw material and was used as an aprotic solvent such as ether or THF. In addition to the Grignard reagent (13) -Mg prepared in the above, the compound (1-2) can be synthesized by allowing it to act at −50 ° C. to room temperature in the presence of a catalyst such as nickel acetylacetonate.
【0054】[0054]
【化29】 [Chemical 29]
【0055】式(1−3)または(1−5)の化合物:
前記化合物(9)に、THF中臭素を作用させ、化合物
(15)を合成する。ただし、4−(ω−フルオロアル
キル)ブロモベンゼンを合成する場合には、前述したよ
うにフルオロアルキル誘導体(8)を塩化アルミニウム
等の触媒の存在下で臭素化することにより化合物(1
5)を得ればよい。次いで、かくして得られる化合物
(15)のグリニヤール試薬を調製し、これにシクロヘ
キサンジオンモノエチレンケタールをTHF中、0℃〜
室温下で作用させアルコール誘導体(17)を合成す
る。この化合物(17)にイオン交換樹脂やパラトルエ
ンスルホン酸などの有機酸を作用させ脱水反応を行な
い、シクロヘキセン誘導体(18)を合成する。この誘
導体(18)にPd/Cやラネーニッケルなどの不均一
系触媒の存在下接触水素添加を行ない、化合物(19)
を合成する。この化合物(19)の保護基に酸を作用さ
せることにより除去し、かくして得られる化合物(2
0)に、エーテルやTHF等の非プロトン性溶媒中で調
製したグリニヤール試薬(11)−Mgまたは(13)
−Mgを作用させ、次いで上記化合物(17)から(1
9)への反応と同様にして脱水および接触水素添加を行
ない、その後再結晶等の精製操作を施して化合物(1−
3)または(1−5)を得ることができる。Compounds of formula (1-3) or (1-5):
Bromine in THF is allowed to act on the compound (9) to synthesize the compound (15). However, when synthesizing 4- (ω-fluoroalkyl) bromobenzene, as described above, the fluoroalkyl derivative (8) is brominated in the presence of a catalyst such as aluminum chloride to give the compound (1
5) should be obtained. Then, a Grignard reagent of the compound (15) thus obtained is prepared, and cyclohexanedione monoethylene ketal is added thereto in THF at 0 ° C. to
It is allowed to act at room temperature to synthesize an alcohol derivative (17). An ion-exchange resin or an organic acid such as paratoluenesulfonic acid is allowed to act on the compound (17) to cause a dehydration reaction to synthesize a cyclohexene derivative (18). This derivative (18) is subjected to catalytic hydrogenation in the presence of a heterogeneous catalyst such as Pd / C or Raney nickel to give compound (19)
To synthesize. The protecting group of this compound (19) is removed by reacting it with an acid, and thus the compound (2
0) to Grignard reagent (11) -Mg or (13) prepared in an aprotic solvent such as ether or THF.
-Mg, and then from the above compound (17) (1
Dehydration and catalytic hydrogenation are carried out in the same manner as in the reaction of 9), and then purification operations such as recrystallization are carried out to give the compound (1-
3) or (1-5) can be obtained.
【0056】[0056]
【化30】 Embedded image
【0057】式(1−4)または(1−9)の化合物:
化合物(11)を化合物(15)に代える以外は化合物
(1−2)を得る場合の工程と同様にして、フェネチル
ブロミド誘導体(22)を合成する。次いで、化合物
(15)に代え該誘導体(22)を用いる以外は化合物
(1−3)または(1−5)を得る場合の工程と同様に
して化合物(1−4)または(1−9)を得ることがで
きる。Compounds of formula (1-4) or (1-9):
The phenethyl bromide derivative (22) is synthesized in the same manner as in the step of obtaining the compound (1-2) except that the compound (11) is replaced with the compound (15). Then, the compound (1-4) or (1-9) is prepared in the same manner as in the step of obtaining the compound (1-3) or (1-5) except that the derivative (22) is used instead of the compound (15). Can be obtained.
【0058】[0058]
【化31】 [Chemical 31]
【0059】式(1−6)の化合物:前記した化合物
(10)のTHF溶液にテトラキストリフェニルホスフ
ィンパラジウムを触媒として加えた後、前記ブロモベン
ゼン誘導体(6)を滴下し、室温で攪拌または還流して
化合物(26)を得る。化合物(8)を化合物(26)
に代える以外は化合物(1−1)を得る場合の工程と同
様にして化合物(1−6)を得ることができる。Compound of formula (1-6): Tetrakistriphenylphosphine palladium is added as a catalyst to a THF solution of the above-mentioned compound (10), and then the bromobenzene derivative (6) is added dropwise, followed by stirring or refluxing at room temperature. The compound (26) is obtained. Compound (8) with compound (26)
Compound (1-6) can be obtained in the same manner as in the step of obtaining compound (1-1) except for substituting
【0060】[0060]
【化32】 Embedded image
【0061】式(1−7)の化合物:前記ブロモベンゼ
ン誘導体(6)を原料として得られるグリニヤール試薬
を、エーテルやTHF等の非プロトン性溶媒中、−50
℃〜室温下で調製し、これにその温度でエチレンオキシ
ドを滴下し、フェネチルアルコール誘導体(29)を得
る。この誘導体(29)をHBrやトリブロモホスフィ
ン等の臭素化試薬と反応させてフェネチルブロミド誘導
体(30)とし、このもののグリニヤール試薬を、エー
テルやTHF等の非プロトン性溶媒中、−50℃〜室温
下で調製し、これに前記化合物(15)をニッケルアセ
チルアセトナート等の触媒の存在下で作用させ、化合物
(31)を得る。化合物(8)を化合物(31)に代え
る以外は化合物(1−1)を得る場合の工程と同様にし
て化合物(1−7)を得ることができる。Compound of formula (1-7): The Grignard reagent obtained by using the bromobenzene derivative (6) as a raw material is treated with -50 in an aprotic solvent such as ether or THF.
It is prepared at ℃ to room temperature, and ethylene oxide is added dropwise thereto at that temperature to obtain a phenethyl alcohol derivative (29). This derivative (29) is reacted with a brominating reagent such as HBr or tribromophosphine to give a phenethyl bromide derivative (30), and this Grignard reagent is treated in an aprotic solvent such as ether or THF at -50 ° C to room temperature. It is prepared under the following conditions, and the compound (15) is allowed to act on it in the presence of a catalyst such as nickel acetylacetonate to obtain the compound (31). Compound (1-7) can be obtained in the same manner as in the step of obtaining compound (1-1) except that compound (31) is used instead of compound (8).
【0062】[0062]
【化33】 [Chemical 33]
【0063】式(1−8)または(1−10)の化合
物:前記化合物(27)または(32)にTHF中、臭
素を作用させるか、前記化合物(26)または(31)
に塩化アルミニウム等の触媒の存在下で臭素を作用させ
るかにより化合物(33)または(34)を合成し、こ
れにエーテルやTHF等の非プロトン性溶媒中、−50
℃〜室温下で調製した前記化合物(13)のグリニヤー
ル試薬を、ニッケルアセチルアセトナート等の触媒の存
在下で作用させ、化合物(1−8)または(1−10)
を得る。Compound of formula (1-8) or (1-10): The compound (27) or (32) is reacted with bromine in THF, or the compound (26) or (31) is used.
Compound (33) or (34) is synthesized by reacting bromine with bromine in the presence of a catalyst such as aluminum chloride.
The Grignard reagent of the compound (13) prepared at ℃ to room temperature is allowed to act in the presence of a catalyst such as nickel acetylacetonate to give the compound (1-8) or (1-10)
Get.
【0064】[0064]
【化34】 Embedded image
【0065】式(1−11)の化合物:4−(2−(4
−オキソシクロヘキシル)エチル)シクロヘキサノンか
ら得られる化合物(35)を、適当なホスホニウム塩を
用いてウィッティヒ反応に付して化合物(36)を合成
し、これをラネーニッケルやPd/Cなどの不均一系触
媒の存在下で水素添加し、化合物(37)を得る。化合
物(24)を化合物(37)に代える以外は化合物(1
−4)を得る場合の工程と同様にして化合物(1−1
1)を得ることができる。Compound of formula (1-11): 4- (2- (4
Compound (35) obtained from -oxocyclohexyl) ethyl) cyclohexanone is subjected to Wittig reaction using a suitable phosphonium salt to synthesize compound (36), which is a heterogeneous catalyst such as Raney nickel or Pd / C. Hydrogenation in the presence of gives compound (37). Compound (1) except that compound (24) is replaced with compound (37)
-4) in the same manner as in the step of obtaining compound (1-1)
1) can be obtained.
【0066】[0066]
【化35】 Embedded image
【0067】式(1−12)の化合物:前記化合物(3
5)を化合物(16)に代える以外は化合物(1−1
1)を得る場合の工程と同様にして化合物(39)を合
成し、これにエーテルやTHFなどの非プロトン性溶媒
中、−50℃〜室温下で調製した前記化合物(30)の
グリニヤール試薬をその温度で作用させ、次いで脱水反
応と水素添加を順次行ない、化合物(40)を合成す
る。化合物(8)を化合物(40)に代える以外は化合
物(1−1)を得る場合の工程と同様にして化合物(1
−12)を得ることができる。Compound of formula (1-12): Compound (3)
Compound (1-1) except that 5) is replaced with compound (16).
Compound (39) was synthesized in the same manner as in the step of obtaining 1), and the Grignard reagent of compound (30) prepared above was prepared in an aprotic solvent such as ether or THF at −50 ° C. to room temperature. The mixture is allowed to act at that temperature, and then dehydration reaction and hydrogenation are sequentially performed to synthesize the compound (40). Compound (1) is obtained in the same manner as in the case of obtaining compound (1-1) except that compound (8) is replaced with compound (40).
-12) can be obtained.
【0068】[0068]
【化36】 Embedded image
【0069】式(1−13)の化合物:前記化合物(3
5)を化合物(42)に代える以外は化合物(1−1
1)を得る場合の工程と同様にして化合物(43)を合
成し、前記化合物(20)を化合物(43)に代える以
外は化合物(1−5)を得る場合の工程と同様にして化
合物(1−13)を得ることができる。Compound of formula (1-13): Compound (3)
Compound (1-1) except that 5) is replaced with compound (42).
Compound (43) is synthesized in the same manner as in the step of obtaining 1), and compound (43) is synthesized in the same manner as in the step of obtaining compound (1-5) except that compound (20) is replaced with compound (43). 1-13) can be obtained.
【0070】[0070]
【化37】 Embedded image
【0071】式(1−14)の化合物:前記シクロヘキ
サノン誘導体(39)に、エーテルやTHFなどの非プ
ロトン性溶媒中、−50℃〜室温下で調製した前記化合
物(6)のグリニヤール試薬をその温度で作用させ、次
いで脱水反応と水素添加を順次行ない、化合物(44)
を合成する。これにブチルリチウムなどのアルキルリチ
ウムをTHF中、−50℃〜室温下で作用させ、化合物
(45)を調製する。次いでこれにTHF中臭素を作用
させ、化合物(46)を得る。ただし、化合物(44)
が1−フルオロアルキル−4−フェニルシクロヘキサン
である場合には、これに塩化アルミニウム等の触媒の存
在下、臭素を作用させ、もって化合物(46)を合成す
る方が好ましい。化合物(33)を化合物(46)に代
える以外は化合物(1−8)を得る場合の工程と同様に
して、化合物(1−14)を得ることができる。Compound of formula (1-14): The cyclohexanone derivative (39) was added with the Grignard reagent of the compound (6) prepared at -50 ° C to room temperature in an aprotic solvent such as ether or THF. The compound (44) is allowed to act at temperature, and then dehydration reaction and hydrogenation are carried out in order.
To synthesize. An alkyllithium such as butyllithium is allowed to act on this in THF at −50 ° C. to room temperature to prepare a compound (45). Then, this is reacted with bromine in THF to obtain a compound (46). However, compound (44)
When 1 is 1-fluoroalkyl-4-phenylcyclohexane, it is preferable to synthesize it with bromine in the presence of a catalyst such as aluminum chloride to synthesize the compound (46). Compound (1-14) can be obtained in the same manner as in the step of obtaining compound (1-8) except that compound (33) is replaced with compound (46).
【0072】[0072]
【化38】 [Chemical 38]
【0073】式(1−15)の化合物:前記化合物(2
0)を前記シクロヘキサノン誘導体(38)に代える以
外は化合物(1−5)を得る場合の工程と同様にして化
合物(1−15)を得ることができる。Compound of formula (1-15): Compound (2)
Compound (1-15) can be obtained in the same manner as in the step of obtaining compound (1-5) except that 0) is replaced with the cyclohexanone derivative (38).
【0074】[0074]
【化39】 [Chemical Formula 39]
【0075】式(1−16)の化合物:前記化合物(4
1)にTHF中臭素を作用させるか、あるいは化合物
(40)を塩化アルミニウム等の触媒の存在下で臭素化
して化合物(47)を合成する。前記化合物(33)を
化合物(47)に代える以外は(1−10)を得る場合
の工程と同様にして化合物(1−16)を得ることがで
きる。Compound of formula (1-16): Compound (4)
Bromine is allowed to act on 1) in THF, or the compound (40) is brominated in the presence of a catalyst such as aluminum chloride to synthesize the compound (47). Compound (1-16) can be obtained in the same manner as in the step of obtaining (1-10) except that compound (33) is replaced with compound (47).
【0076】[0076]
【化40】 [Chemical 40]
【0077】式(1−17)の化合物:前記化合物(2
0)を前記シクロヘキサノン誘導体(39)に代える以
外は化合物(1−5)を得る場合の工程と同様にして化
合物(1−17)を得ることができる。Compound of formula (1-17): Compound (2)
Compound (1-17) can be obtained in the same manner as in the step of obtaining compound (1-5) except that 0) is replaced with cyclohexanone derivative (39).
【0078】[0078]
【化41】 Embedded image
【0079】次に4環化合物の合成法を示す。なお、以
下の説明において、前記化合物(44)、(40)、
(26)または(31)に、THF中アルキルリチウム
などのリチオ化試薬を作用させるか、あるいは塩化アル
ミニウムなどを触媒として臭素を作用させ、次いでリチ
オ化試薬を作用させることにより対応して得られる化合
物(45)、(41)、(27)または(32)をAr
−Li、前記シクロヘキサン誘導体(43)、(3
8)、(20)または(25)をR=Oとそれぞれ総称
する。Next, a method for synthesizing a 4-ring compound will be shown. In the following description, the compounds (44), (40),
A compound obtained by reacting (26) or (31) with a lithiation reagent such as alkyllithium in THF, or with bromine using aluminum chloride or the like as a catalyst, and then with a lithiation reagent. (45), (41), (27) or (32) is Ar
-Li, the cyclohexane derivative (43), (3
8), (20) or (25) are collectively referred to as R = O.
【0080】式(1−19)〜(1−21)または(1
−24)の化合物:まず、これらのAr−LiまたはR
=Oを出発物質として、4環の前駆化合物(49)(5
0)、(51)または(52)を合成する。すなわち、
Ar−Liに、THF中塩化亜鉛を−50℃〜室温下で
作用させて化合物(48)を合成し、このもののTHF
溶液にテトラキストリフェニルホスフィンパラジウムを
触媒として加えた後、前記のブロモベンゼン誘導体
(6)を滴下し、室温で攪拌または還流することによ
り、化合物(49)を合成する。Formulas (1-19) to (1-21) or (1
-24) Compound: First, these Ar-Li or R
= O as a starting material, a 4-ring precursor compound (49) (5
0), (51) or (52) is synthesized. That is,
Zinc chloride in THF is allowed to act on Ar-Li at -50 ° C to room temperature to synthesize a compound (48).
After tetrakistriphenylphosphine palladium is added to the solution as a catalyst, the bromobenzene derivative (6) is added dropwise and stirred or refluxed at room temperature to synthesize the compound (49).
【0081】また、シクロヘキサノン誘導体R=Oに、
エーテルやTHF等の非プロトン性溶媒中−50℃〜室
温下で調製した、化合物(6)のグリニヤール試薬を作
用させ、次いで脱水反応と水素添加を順次行なうことに
より化合物(50)を合成する。またAr−Liに、エ
ーテルやTHF等の非プロトン性溶媒中、−50℃〜室
温下で調製した化合物(30)のグリニヤール試薬を、
ニッケルアセチルアセトナート等の触媒の存在下で作用
させることにより、化合物(51)を合成する。Further, in the cyclohexanone derivative R = O,
Compound (50) is synthesized by reacting the Grignard reagent of compound (6) prepared in an aprotic solvent such as ether or THF at −50 ° C. to room temperature, and then sequentially performing dehydration reaction and hydrogenation. Further, the Grignard reagent of the compound (30) prepared at −50 ° C. to room temperature in an aprotic solvent such as ether or THF is added to Ar—Li,
The compound (51) is synthesized by acting in the presence of a catalyst such as nickel acetylacetonate.
【0082】さらにシクロヘキサノン誘導体R=Oに、
エーテルやTHF等の非プロトン性溶媒中、−50℃〜
室温下で調製した化合物(30)のグリニヤール試薬を
作用させ、次いで脱水反応と水素添加を順次行なうこと
により化合物(52)を合成する。上記により得られる
前駆化合物(49)〜(52)に、THF中、ブチルリ
チウムなどのアルキルリチウムを作用させて化合物(5
3)を合成するか、あるいは塩化メチレンなどのハロゲ
ン系溶媒中、塩化アルミニウムを触媒として臭素を作用
させ化合物(55)を合成し、このものにTHF中、ブ
チルリチウムなどのアルキルリチウムを作用させて化合
物(56)を合成する。化合物(9)を化合物(53)
または(56)に代える以外は化合物(1−1)を得る
場合の工程と同様にして(1−19)〜(1−21)ま
たは(1−24)の化合物(m=0の場合)を合成する
ことができる。Further, in the cyclohexanone derivative R = O,
In an aprotic solvent such as ether or THF, -50 ° C
The Grignard reagent of the compound (30) prepared at room temperature is allowed to act, and then dehydration reaction and hydrogenation are sequentially performed to synthesize the compound (52). The precursor compounds (49) to (52) obtained above are treated with an alkyllithium such as butyllithium in THF to give the compound (5
3) or by reacting bromine in a halogen-based solvent such as methylene chloride with aluminum chloride as a catalyst to synthesize compound (55), which is treated with alkyllithium such as butyllithium in THF. Compound (56) is synthesized. Compound (9) with compound (53)
Alternatively, the compound of (1-19) to (1-21) or (1-24) (when m = 0) is obtained in the same manner as in the step of obtaining the compound (1-1) except that it is replaced with (56). Can be synthesized.
【0083】なお、上記化合物(53)にTHF中臭素
を作用させることにより、(54)を合成することがで
きる。この化合物(54)または上記化合物(55)
に、前記フェネチルブロミド誘導体(13)をエーテル
やTHF等の非プロトン性溶媒中−50℃〜室温下かつ
ニッケルアセチルアセトナート等の触媒の存在下で作用
させ、(1−19)〜(1−21)または(1−24)
の化合物(m=1の場合)を合成することができる。By reacting the above compound (53) with bromine in THF, (54) can be synthesized. This compound (54) or the above compound (55)
The phenethyl bromide derivative (13) is allowed to act in an aprotic solvent such as ether or THF at −50 ° C. to room temperature and in the presence of a catalyst such as nickel acetylacetonate to give (1-19) to (1- 21) or (1-24)
The compound (when m = 1) can be synthesized.
【0084】[0084]
【化42】 Embedded image
【0085】式(1−18)、(1−12)、(1−2
3)または(1−25)の化合物:まず、前記のAr−
LiまたはR=Oを出発物質として、4環の前駆化合物
であるシクロヘキサノン誘導体(58)、(63)、
(68)または(73)を合成する。すなわち、Ar−
Liに、前記シクロヘキサンジオン モノエチレンケタ
ール(16)をエーテルやTHF等の非プロトン性溶媒
中、−50℃〜室温下で作用させ、次いで順次酸による
脱水、ラネーニッケルやPd/Cを触媒とする水素添加
処理を行なって化合物(57)を合成する。この化合物
(57)の保護基を酸により除去し、シクロヘキサノン
誘導体(58)を得る。Formulas (1-18), (1-12), (1-2)
3) or the compound of (1-25): First, Ar-
Cyclohexanone derivatives (58), (63), which are 4-ring precursor compounds, starting from Li or R = O
(68) or (73) is synthesized. That is, Ar-
The cyclohexanedione monoethylene ketal (16) is allowed to act on Li at −50 ° C. to room temperature in an aprotic solvent such as ether or THF, and then dehydrated by an acid, and hydrogen is used with Raney nickel or Pd / C as a catalyst. Compound (57) is synthesized by addition treatment. The protecting group of this compound (57) is removed with an acid to obtain a cyclohexanone derivative (58).
【0086】また、R=Oに4−メトキシブロモベンゼ
ン(59)のグリニヤール試薬を作用させ、次いで順次
酸による脱水、Pd/Cを触媒とする接触水素添加処理
を行なって化合物(60)を合成する。この化合物(6
0)を酸触媒の存在下、トルエンあるいはキシレン中で
還流してフェノール誘導体(61)を得、このものをP
d/C触媒の存在下核水添し、シクロヘキサノール誘導
体(62)を得る。なおこの反応では、R中にフェニル
基が含まれている場合であっても、ほぼ選択的に水酸基
の結合したベンゼン環が水素添加される。上記のシクロ
ヘキサノール誘導体(62)は、これを酸化剤で酸化す
ることによりシクロヘキサノン誘導体(63)を合成す
る。A compound (60) was synthesized by reacting R = O with a Grignard reagent of 4-methoxybromobenzene (59), followed by dehydration with an acid and catalytic hydrogenation treatment using Pd / C as a catalyst. To do. This compound (6
0) is refluxed in toluene or xylene in the presence of an acid catalyst to obtain a phenol derivative (61).
Nuclear hydrogenation is carried out in the presence of a d / C catalyst to obtain a cyclohexanol derivative (62). In addition, in this reaction, even when R contains a phenyl group, the benzene ring having a hydroxyl group bonded thereto is almost selectively hydrogenated. The cyclohexanol derivative (62) is oxidized with an oxidizing agent to synthesize a cyclohexanone derivative (63).
【0087】また、Ar−Liにエチレンオキシドを作
用させることにより、化合物(64)を得、これをHB
rやトリブロモホスフィンで臭素化して化合物(65)
を得る。次いでこのもののグリニヤール試薬(66)に
前記の化合物(16)を作用させて化合物(67)を
得、このものの保護基を酸により除去し、シクロヘキサ
ノン誘導体(68)を得る。Further, by reacting Ar-Li with ethylene oxide, a compound (64) was obtained, which was converted into HB
Compound (65) by bromination with r or tribromophosphine
Get. Then, the Grignard reagent (66) of this product is reacted with the compound (16) to obtain the compound (67), and the protecting group of this product is removed with an acid to obtain the cyclohexanone derivative (68).
【0088】さらに、エチレンオキシドに前記4−メト
キシブロモベンゼン(59)のグリニヤール試薬を作用
させ、次いでHBrやトリブロモホスフィンで臭素化す
ることにより化合物(69)を得る。化合物(59)を
化合物(69)に代える以外は化合物(63)を合成す
る反応と同様にしてシクロヘキサノン誘導体(73)を
合成することができる。Furthermore, the compound (69) is obtained by reacting ethylene oxide with the Grignard reagent of 4-methoxybromobenzene (59) and then brominating with HBr or tribromophosphine. The cyclohexanone derivative (73) can be synthesized in the same manner as the reaction for synthesizing the compound (63) except that the compound (59) is replaced with the compound (69).
【0089】上記により得られる前駆化合物(58)、
(63)、(68)または(73)に、前記化合物(1
1)または(13)のグリニヤール試薬を作用させ、酸
による脱水とラネーニッケルやPd/C等を触媒とする
接触水素添加処理を順次行ない、化合物(1−18)、
(1−22)、(1−23)または(1−25)を合成
することができる。A precursor compound (58) obtained as described above,
In (63), (68) or (73), the compound (1
1) or (13), the Grignard reagent is allowed to act, dehydration with an acid and catalytic hydrogenation treatment using Raney nickel, Pd / C or the like as a catalyst are sequentially performed, and a compound (1-18),
(1-22), (1-23) or (1-25) can be synthesized.
【0090】[0090]
【化43】 [Chemical 43]
【0091】ただし、本発明の一般式(I)で示す液晶
性化合物において、Q−YがCF2H、CF2 CF
2 H、CF2 CFHCF3 、OCF2 H、OCF2 CF
HCF3またはOCF2 CF2 CF2 Hの場合には、上
記とは別に次の経路で環Z−Q−Y部位を導入するほう
が望ましい。However, in the liquid crystalline compound represented by the general formula (I) of the present invention, Q-Y is CF 2 H or CF 2 CF.
2 H, CF 2 CFHCF 3 , OCF 2 H, OCF 2 CF
In the case of HCF 3 or OCF 2 CF 2 CF 2 H, it is preferable to introduce a ring ZQY site by the following route, separately from the above.
【0092】[0092]
【化44】 [Chemical 44]
【0093】本発明により提供される液晶組成物は、一
般式(I)で示される液晶性化合物を少なくとも1種類
含む第一成分のみでもよいが、これに加え、第二成分と
して既述参照の一般式(II)、(III)および(IV)から
なる群から選ばれる少なくとも1種類の化合物(以下第
二A成分と称する)および/または一般式(V)、(V
I)、(VII)、(VIII)および(IX)からなる群から選
ばれる少なくとも1種類の化合物(以下第二B成分と称
する)を混合したものが好ましく、さらに、しきい値電
圧、液晶相温度範囲、Δn、Δεおよび粘度等を調整す
る目的で、公知の化合物を第三成分として混合すること
もできる。The liquid crystal composition provided by the present invention may include only the first component containing at least one liquid crystalline compound represented by the general formula (I), but in addition to this, the second component as described above may be used. At least one compound selected from the group consisting of general formulas (II), (III) and (IV) (hereinafter referred to as the second component A) and / or general formulas (V) and (V
A mixture of at least one compound selected from the group consisting of I), (VII), (VIII) and (IX) (hereinafter referred to as the second component B) is preferable, and further, a threshold voltage, a liquid crystal phase A known compound may be mixed as a third component for the purpose of adjusting the temperature range, Δn, Δε, viscosity and the like.
【0094】上記第二A成分のうち、一般式(II)に含
まれる化合物の好適例として次の(2−1)〜(2−1
5)、一般式(III)に含まれる化合物の好適例として
(3−1)〜(3−48)、一般式(IV)に含まれる化
合物の好適例として(4−1)〜(4−41)をそれぞ
れ挙げることができる。Among the above-mentioned second component A, suitable examples of the compound contained in the general formula (II) are the following (2-1) to (2-1).
5), (3-1) to (3-48) as preferable examples of the compound contained in the general formula (III), and (4-1) to (4-) as preferable examples of the compound contained in the general formula (IV). 41) can be mentioned respectively.
【0095】[0095]
【化45】 Embedded image
【0096】[0096]
【化46】 Embedded image
【0097】[0097]
【化47】 [Chemical 47]
【0098】[0098]
【化48】 Embedded image
【0099】[0099]
【化49】 [Chemical 49]
【0100】[0100]
【化50】 Embedded image
【0101】[0101]
【化51】 [Chemical 51]
【0102】[0102]
【化52】 Embedded image
【0103】[0103]
【化53】 Embedded image
【0104】[0104]
【化54】 [Chemical 54]
【0105】これらの一般式(II)〜(IV)で示される
化合物は、Δεが正を示し、熱安定性や化学的安定性が
非常に優れている。該化合物の使用量は、液晶組成物の
全重量に対して1〜99重量%の範囲が適するが、好ま
しくは10〜97重量%、より好ましくは40〜95重
量%である。The compounds represented by the general formulas (II) to (IV) have a positive Δε and are very excellent in thermal stability and chemical stability. The amount of the compound used is appropriately in the range of 1 to 99% by weight based on the total weight of the liquid crystal composition, preferably 10 to 97% by weight, more preferably 40 to 95% by weight.
【0106】次に、前記第二B成分のうち、一般式
(V)、(VI)および(VII)に含まれる化合物の好適例
として、それぞれ(5−1)〜(5−27)、(6−
1)〜(6−3)および(7−1)〜(7−13)を挙
げることができる。Next, among the second component B, preferred examples of the compounds contained in the general formulas (V), (VI) and (VII) are (5-1) to (5-27) and (5-27), respectively. 6-
1) to (6-3) and (7-1) to (7-13).
【0107】[0107]
【化55】 [Chemical 55]
【0108】[0108]
【化56】 [Chemical 56]
【0109】[0109]
【化57】 [Chemical 57]
【0110】[0110]
【化58】 Embedded image
【0111】[0111]
【化59】 Embedded image
【0112】これらの一般式(V)〜(VII)で示される
化合物は、Δεが正でその値が大きく、組成物成分とし
て特にしきい値電圧を小さくする目的で使用される。ま
た、粘度の調整、Δnの調整および液晶相温度範囲を広
げる等の目的や、さらに急峻性を改良する目的にも使用
される。また第二B成分のうち、一般式(VIII)および
(IX)に含まれる化合物の好適例として、それぞれ(8
−1)〜(8−15)および(9−1)〜(9−14)
を挙げることができる。The compounds represented by the general formulas (V) to (VII) have a positive Δε and a large value, and are used as a component of the composition for the purpose of particularly reducing the threshold voltage. It is also used for the purpose of adjusting viscosity, adjusting Δn and widening the temperature range of the liquid crystal phase, and for improving steepness. Further, among the second component B, preferred examples of the compounds contained in the general formulas (VIII) and (IX) are (8
-1) to (8-15) and (9-1) to (9-14)
Can be mentioned.
【0113】[0113]
【化60】 Embedded image
【0114】[0114]
【化61】 [Chemical formula 61]
【0115】[0115]
【化62】 Embedded image
【0116】[0116]
【化63】 [Chemical formula 63]
【0117】これらの一般式(VIII)および(IX)で示
される化合物は、Δεが負または弱い正の化合物であ
り、そのうち一般式(VIII)で示される化合物は、組成
物成分として、主に粘度低下やΔnの調整の目的に、ま
た一般式(IX)で示される化合物は、液晶相温度範囲を
広げる目的および/またはΔnの調整を目的に使用され
る。The compounds represented by the general formulas (VIII) and (IX) are compounds in which Δε is negative or weakly positive. Among them, the compound represented by the general formula (VIII) is mainly used as a composition component. The compound represented by the general formula (IX) is used for the purpose of decreasing the viscosity and adjusting Δn, and for the purpose of widening the temperature range of the liquid crystal phase and / or adjusting Δn.
【0118】上記の一般式(V)〜(IX)で示される化
合物は、特にSTN型表示方式や通常のTN型表示方式
用の液晶組成物を調製する場合に不可欠な化合物であ
る。該化合物の使用量は、通常のSTN型表示方式やT
N型表示方式用の液晶組成物を調製する場合には、液晶
組成物の全重量に対して1〜99重量%の範囲が適する
が、好ましくは10〜97重量%、より好ましくは40
〜95重量%の範囲である。The compounds represented by the above general formulas (V) to (IX) are indispensable compounds especially when preparing a liquid crystal composition for STN type display system or ordinary TN type display system. The amount of the compound used depends on the usual STN type display system or T
When preparing a liquid crystal composition for the N-type display system, a range of 1 to 99% by weight is suitable for the total weight of the liquid crystal composition, preferably 10 to 97% by weight, more preferably 40% by weight.
Is in the range of up to 95% by weight.
【0119】本発明に従い提供される液晶組成物は、一
般式(I)で示される液晶性化合物の少なくとも1種類
を0.1〜99重量%の割合で含有することが、優良な
特性を発現せしめるために好ましい。該液晶組成物はそ
れ自体公知の方法、例えば種々の成分を高温度下で相互
に溶解させる方法等により一般に調製される。また、必
要により、適当な添加物を加えることによって、意図す
る用途に応じた改良がなされ、最適化される。このよう
な添加物は当該業者によく知られており、文献などに詳
細に記載されている。通常、液晶のらせん構造を誘起し
て必要なねじれ角を調整し、逆ねじれを防ぐといった効
果を有するキラルドープ剤などが添加される。The liquid crystal composition provided according to the present invention exhibits excellent characteristics when it contains at least one liquid crystal compound represented by the general formula (I) in a proportion of 0.1 to 99% by weight. It is preferable because it is apt. The liquid crystal composition is generally prepared by a method known per se, for example, a method in which various components are mutually dissolved at high temperature. Further, if necessary, appropriate additives are added to improve and optimize according to the intended use. Such additives are well known to those skilled in the art, and are described in detail in the literature and the like. Usually, a chiral dopant or the like having an effect of inducing a helical structure of liquid crystal to adjust a necessary twist angle and preventing reverse twist is added.
【0120】また、メロシアニン系、スチリル系、アゾ
系、アゾメチン系、アゾキシ系、キノフタロン系、アン
トラキノン系およびテトラジン系等の二色性色素を添加
すれば、GH型用の液晶組成物として使用することもで
きる。本発明に係る組成物は、ネマチック液晶をマイク
ロカプセル化して作製したNCAPや、液晶中に三次元
網目状高分子を形成して作製したポリマー分散型液晶表
示素子(PDLCD)例えばポリマーネットワーク液晶
表示素子(PNLCD)用をはじめ、複屈折制御(EC
B)型やDS型用の液晶組成物としても使用できる。If a dichroic dye such as a merocyanine-based, styryl-based, azo-based, azomethine-based, azoxy-based, quinophthalone-based, anthraquinone-based or tetrazine-based dye is added, it can be used as a GH-type liquid crystal composition. You can also The composition according to the present invention is an NCAP produced by encapsulating nematic liquid crystal in a microcapsule, or a polymer dispersed liquid crystal display device (PDLCD) produced by forming a three-dimensional network polymer in the liquid crystal, for example, a polymer network liquid crystal display device. (PNLCD) and birefringence control (EC
It can also be used as a liquid crystal composition for B) type and DS type.
【0121】本発明の化合物を含有する液晶組成物例と
して以下のものを示すことができる。なお、化合物N
o.は後述の実施例中に示されているそれと同一であ
る。また1,4−シクロヘキシレンおよびアルキル鎖中
の二重結合はすべてトランス体である。The following can be shown as examples of liquid crystal compositions containing the compound of the present invention. Compound N
o. Is the same as that shown in the examples below. Also, all the double bonds in 1,4-cyclohexylene and the alkyl chain are in the trans form.
【0122】組成物例1Composition Example 1
【化64】 [Chemical 64]
【0123】組成物例2Composition Example 2
【化65】 Embedded image
【0124】組成物例3Composition Example 3
【化66】 [Chemical formula 66]
【0125】組成物例4Composition Example 4
【化67】 Embedded image
【0126】組成物例5Composition Example 5
【化68】 [Chemical 68]
【0127】組成物例6Composition Example 6
【化69】 [Chemical 69]
【0128】組成物例7Composition Example 7
【化70】 Embedded image
【0129】組成物例8Composition Example 8
【化71】 Embedded image
【0130】組成物例9Composition Example 9
【化72】 Embedded image
【0131】組成物例10Composition Example 10
【化73】 Embedded image
【0132】組成物例11Composition Example 11
【化74】 [Chemical 74]
【0133】組成物例12Composition Example 12
【化75】 [Chemical 75]
【0134】組成物例13Composition Example 13
【化76】 [Chemical 76]
【0135】組成物例14Composition Example 14
【化77】 Embedded image
【0136】組成物例15Composition Example 15
【化78】 Embedded image
【0137】組成物例16Composition Example 16
【化79】 Embedded image
【0138】組成物例17Composition Example 17
【化80】 Embedded image
【0139】組成物例18Composition Example 18
【化81】 [Chemical 81]
【0140】組成物例19Composition Example 19
【化82】 [Chemical formula 82]
【0141】このものの透明点は、113.8℃、セル
厚8.7μmでのしきい値は2.59V、Δεは4.
5、Δnは0.090、20℃における粘度は23.1
mPa・Sであった。The clearing point of this product was 113.8 ° C., the threshold at a cell thickness of 8.7 μm was 2.59 V, and Δε was 4.
5, Δn is 0.090, and the viscosity at 20 ° C. is 23.1.
It was mPa · S.
【0142】組成物例20Composition Example 20
【化83】 [Chemical 83]
【0143】このものの透明点は、92.1℃、セル厚
8.7μmでのしきい値は1.78V、Δεは9.1、
Δnは0.093、20℃における粘度は31.2mP
a・Sであった。The clearing point of this product was 92.1 ° C., the threshold at the cell thickness of 8.7 μm was 1.78 V, and Δε was 9.1.
Δn is 0.093, viscosity at 20 ° C is 31.2 mP
It was aS.
【0144】組成物例21Composition Example 21
【化84】 [Chemical 84]
【0145】このものの透明点は、89.5℃、セル厚
8.7μmでのしきい値は2.09V、Δεは5.5、
Δnは0.128、20℃における粘度は22.7mP
a・Sであった。The clearing point of this product was 89.5 ° C., the threshold value was 2.09 V, and Δε was 5.5 at a cell thickness of 8.7 μm.
Δn is 0.128, viscosity at 20 ° C is 22.7 mP
It was aS.
【0146】組成物例22Composition Example 22
【化85】 Embedded image
【0147】このものの透明点は、76.1℃、セル厚
8.7μmでのしきい値は1.89V、Δεは7.6、
Δnは0.124、20℃における粘度は18.4mP
a・Sであった。The clearing point of this product was 76.1 ° C., the cell thickness was 8.7 μm, the threshold was 1.89 V, and Δε was 7.6.
Δn is 0.124, viscosity at 20 ° C is 18.4 mP
It was aS.
【0148】組成物例23Composition Example 23
【化86】 [Chemical 86]
【0149】このものの透明点は、77.0℃、セル厚
8.7μmでのしきい値は0.96V、Δεは24.
2、Δnは0.145、20℃における粘度は39.8
mPa・Sであった。The clearing point of this product was 77.0 ° C., the threshold at a cell thickness of 8.7 μm was 0.96 V, and Δε was 24.
2, Δn is 0.145, and the viscosity at 20 ° C. is 39.8.
It was mPa · S.
【0150】[0150]
【発明の実施の形態】以下、実施例により本発明をさら
に詳しく説明する。なお、各実施例中において、Cは結
晶、Sはスメクチック相、Nはネマチック相、Iは等方
性液体相を示し、相転移点の単位は全て℃である。BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, the present invention will be described in more detail with reference to Examples. In each example, C is a crystal, S is a smectic phase, N is a nematic phase, I is an isotropic liquid phase, and the unit of the phase transition point is ° C.
【0151】実施例1 1−(2−(4−(3−フルオロプロピル)シクロヘキ
シル)エチル)−3,5−ジフルオロ−4−(3,5−
ジフルオロ−4−トリフルオロメチルフェニル)ベンゼ
ン((1)式において、n=3、環E=1,4−シクロ
ヘキシレン、G=共有結合、L=環Z=3,5−ジフル
オロ−1,4−フェニレン、k=1、l=0、m=0、
Q=共有結合、Y=CF3 である化合物(No.8
0))の製造Example 1 1- (2- (4- (3-fluoropropyl) cyclohexyl) ethyl) -3,5-difluoro-4- (3,5-
Difluoro-4-trifluoromethylphenyl) benzene (in the formula (1), n = 3, ring E = 1,4-cyclohexylene, G = covalent bond, L = ring Z = 3,5-difluoro-1,4 -Phenylene, k = 1, l = 0, m = 0,
A compound in which Q = covalent bond and Y = CF 3 (No. 8)
0)) production
【0152】(第一段)市販の3,5−ジフルオロブロ
モベンゼン150g(0.78mol)と乾燥したマグ
ネシウム18.9g(0.78mol)からエーテル6
00ml中にてグリニヤール試薬を調製し、これに−5
0℃の冷却下、エチレンオキシド100g(2.27m
ol)の100mlエーテル溶液を徐々に滴下した。滴
下終了後室温まで加温し、反応液を1時間攪拌した後、
6N塩酸500ml中に加え、生成物をトルエンで抽出
した。抽出液を飽和重曹水と水で順次洗浄した後、硫酸
マグネシウムで乾燥し、次いで溶媒を留去した。残分に
HBr水(47%)500mlを加えて7時間還流し、
次いでビグリュー管を用いて減圧蒸留した。かくして2
Torr下でb.p52℃〜53℃を示す無色透明な液
体である3,5−ジフルオロフェネチルブロミドを41
g(0.19mol)得た。このものの3,5−ジフル
オロブロモベンゼンからの収率は23.8%であった。
該3,5−ジフルオロフェネチルブロミド20.0g
(90.5mmol)と乾燥したマグネシウム2.2g
(90.5mmol)とから、エーテル150ml中に
てグリニヤール試薬を調製した後、0℃に冷却し、これ
に市販のシクロヘキサンジオンモノエチレンケタール1
4.2g (90.9mmol)の130mlエーテル
溶液を滴下した。滴下終了後、反応液を室温まで加温
し、3時間攪拌した。この反応液を6N塩酸500ml
に加え、生成物をトルエンで抽出後、飽和重曹水と水で
順次洗浄し、硫酸マグネシウムで乾燥した後、溶媒を留
去した。残分20gにトルエン100mlとアンバーリ
スト1gを加え、反応により生成する水をジーンスター
クにより除去しながら5時間還流した。その後エチレン
グリコール2gを加えてさらに2時間還流した。反応液
に水100mlを加え、有機層を飽和重曹水と水で順次
洗浄し、硫酸マグネシウムで乾燥した後、溶媒を留去し
た。残分を、展開溶媒としてトルエン/酢酸エチル=4
/1を用いてカラムクロマトグラフィー処理により精製
し、かくして得られる精製物を5%Pd/C触媒(1.
02g)の存在下、エタノール中で水素添加した。反応
終了後触媒を濾別し、エタノールを減圧にて留去した。
得られた濃縮物を蟻酸80ml中で3時間還流した後、
これに水200mlを加え、生成物をトルエン抽出した
後、抽出液を飽和重曹水と水で順次洗浄し、トルエン層
を硫酸マグネシウムで乾燥後トルエンを留去して、4−
(3,5−ジフルオロフェニルエチル)−1−シクロヘ
キサノン10.1g(42.4mmol)を得た。この
ものの3,5−ジフルオロブロモベンゼンからの収率は
46.6%であった。(First stage) 150 g (0.78 mol) of commercially available 3,5-difluorobromobenzene and 18.9 g (0.78 mol) of dried magnesium were added to ether 6
Prepare Grignard reagent in 00 ml and add -5
Under cooling at 0 ° C, 100 g of ethylene oxide (2.27 m
ol) in 100 ml ether solution was gradually added dropwise. After the dropping was completed, the reaction solution was warmed to room temperature and stirred for 1 hour.
It was added to 500 ml of 6N hydrochloric acid, and the product was extracted with toluene. The extract was washed successively with saturated aqueous sodium hydrogen carbonate and water, dried over magnesium sulfate, and then the solvent was evaporated. HBr water (47%) (500 ml) was added to the residue and the mixture was refluxed for 7 hours.
Then, vacuum distillation was performed using a Vigreux tube. Thus 2
B. Under Torr. 3,5-difluorophenethyl bromide, which is a colorless transparent liquid exhibiting a p.
g (0.19 mol) was obtained. The yield of this product from 3,5-difluorobromobenzene was 23.8%.
20.0 g of the 3,5-difluorophenethyl bromide
(90.5 mmol) and 2.2 g of dried magnesium
(90.5 mmol), a Grignard reagent was prepared in 150 ml of ether and then cooled to 0 ° C., and commercially available cyclohexanedione monoethylene ketal 1
4.2 g (90.9 mmol) of 130 ml ether solution was added dropwise. After completion of dropping, the reaction solution was warmed to room temperature and stirred for 3 hours. This reaction solution was added with 6N hydrochloric acid (500 ml)
In addition, the product was extracted with toluene, washed successively with saturated aqueous sodium hydrogen carbonate and water, dried over magnesium sulfate, and the solvent was evaporated. To the remaining 20 g, 100 ml of toluene and 1 g of Amberlyst were added, and the mixture was refluxed for 5 hours while removing water produced by the reaction with Gene Stark. Then, 2 g of ethylene glycol was added and the mixture was refluxed for another 2 hours. 100 ml of water was added to the reaction solution, the organic layer was washed successively with saturated aqueous sodium hydrogen carbonate and water, dried over magnesium sulfate, and the solvent was evaporated. Toluene / ethyl acetate = 4 as the developing solvent
Purification by column chromatography using 1/1, and the purified product thus obtained is 5% Pd / C catalyst (1.
Hydrogenated in ethanol in the presence of 02 g). After completion of the reaction, the catalyst was filtered off and ethanol was distilled off under reduced pressure.
After refluxing the obtained concentrate in 80 ml of formic acid for 3 hours,
After adding 200 ml of water to this and extracting the product with toluene, the extract was washed successively with saturated aqueous sodium hydrogen carbonate and water, the toluene layer was dried over magnesium sulfate, and the toluene was distilled off.
10.1 g (42.4 mmol) of (3,5-difluorophenylethyl) -1-cyclohexanone was obtained. The yield of this product from 3,5-difluorobromobenzene was 46.6%.
【0153】(第二段)3−フルオロブロモプロパン2
00.0g(1.42mol)をトルエン3lに溶解
し、これにトリフェニルホスフィン37.2g(1.4
2mol)を加え15時間還流した。生成物をろ別し、
吸引乾燥して3−フルオロプロピルトリフェニルホスフ
ィンブロミド486g(1.21mol)を得た。収率
85.2%。(Second stage) 3-fluorobromopropane 2
00.0 g (1.42 mol) was dissolved in 3 l of toluene, and 37.2 g (1.4
(2 mol) was added and the mixture was refluxed for 15 hours. The product is filtered off,
It was sucked and dried to obtain 486 g (1.21 mol) of 3-fluoropropyltriphenylphosphine bromide. Yield 85.2%.
【0154】(第三段)上記の3−フルオロプロピルト
リフェニルホスフィンブロミド22.0g(54.6m
mol)にTHF100mlを加え窒素ガス雰囲気下−
50℃に冷却した。これにカリウム−t−ブトキシド
6.10g(54.5mmol)の70mlTHF溶液
を加えた後、3時間攪拌した。この反応液に、第一段で
合成した4−(3,5−ジフルオロフェネチル)−1−
シクロヘキサノン10.0g(42.0mmol)の8
0mlTHF溶液を滴下し、そのままの温度で1時間、
次いで室温まで加温して4時間攪拌した。得られた反応
液に水200mlを加え、生成物を酢酸エチルで抽出し
た後、抽出液を飽和重曹水と水で順次洗浄し、有機層を
硫酸マグネシウムで乾燥した。溶媒を減圧にて留去し、
残分を展開溶媒にトルエンを用いてカラムクロマトグラ
フィー処理により精製した。かくして得られる精製物を
5%Pd/C触媒の存在下、エタノール中で水素添加
し、反応終了後触媒を濾別し、エタノールを減圧にて留
去し、4−(3,5−ジフルオロフェネチル)−1−
(3−フルオロプロピル)シクロヘキサンを2.51g
(8.83mmol)得た。収率21.0%。(Third stage) 22.0 g (54.6 m) of the above 3-fluoropropyltriphenylphosphine bromide
mol) with 100 ml of THF, and under a nitrogen gas atmosphere-
Cooled to 50 ° C. A solution of 6.10 g (54.5 mmol) of potassium-t-butoxide in 70 ml of THF was added thereto, and the mixture was stirred for 3 hours. 4- (3,5-difluorophenethyl) -1- synthesized in the first step was added to this reaction solution.
Cyclohexanone 10.0 g (42.0 mmol) 8
0 ml of THF solution was added dropwise, and the temperature was kept as it was for 1 hour.
Then, the mixture was warmed to room temperature and stirred for 4 hours. 200 ml of water was added to the obtained reaction solution, the product was extracted with ethyl acetate, the extract was washed successively with saturated aqueous sodium hydrogen carbonate and water, and the organic layer was dried over magnesium sulfate. The solvent was distilled off under reduced pressure,
The residue was purified by column chromatography using toluene as a developing solvent. The purified product thus obtained is hydrogenated in ethanol in the presence of 5% Pd / C catalyst, the catalyst is filtered off after completion of the reaction, and ethanol is distilled off under reduced pressure to give 4- (3,5-difluorophenethyl). ) -1-
2.51-g of (3-fluoropropyl) cyclohexane
(8.83 mmol) was obtained. Yield 21.0%.
【0155】(第四段)上記の4−(3,5−ジフルオ
ロフェネチル)−1−(3−フルオロプロピル)シクロ
ヘキサン2.51g(8.83mmol)にTHF30
mlを加え、窒素ガス雰囲気下−50℃に冷却した。こ
れに1.63Nノルマルブチルリチウムのヘキサン溶液
7ml(11.4mmol)をシリンジで滴下し、その
ままの温度で1時間攪拌後、0.5モルの塩化亜鉛TH
F溶液22.8ml(11.4mmol)を滴下した。
滴下終了後、反応物の温度を室温まで加温し、さらに2
時間攪拌した。この反応液に触媒としてテトラキストリ
フェニルホスフィンパラジウムを250mg加えた後、
3,5−ジフルオロ−4−トリフルオロメチルフェニル
ブロミド2.97g(11.4mmol)を滴下し、2
時間還流した。この反応液を冷却した6N塩酸に加え、
生成物をトルエン抽出し、抽出液を飽和重曹水と水で順
次洗浄した後、硫酸マグネシウムで乾燥し、次いで溶媒
を留去し8.5gのオレンジ色懸濁液を得た。これをト
ルエン/ヘプタン=1/1を展開溶媒とし、シリカゲル
上でカラムクロマトグラフィー処理により精製し、次い
で再結晶して1−(2−(4−(3−フルオロプロピ
ル)シクロヘキシル)エチル)−3,5−ジフルオロ−
4−(3,5−ジフルオロ−4−トリフルオロメチルフ
ェニル)ベンゼンのトランス体を0.35g(0.75
mmol)得た。収率8.49%。C−I点83.7
℃。1H−NMR(CDCl3)δ(ppm):7.1
0(d,2H)、6.84(d,2H)、4.69
(t,1H)、4.16(t,1H)、2.66(t,
2H)、1.84〜0.88(m,18H)。(Fourth stage) 2.51 g (8.83 mmol) of 4- (3,5-difluorophenethyl) -1- (3-fluoropropyl) cyclohexane was added to THF30.
ml was added, and it cooled at -50 degreeC under nitrogen gas atmosphere. To this, 7 ml (11.4 mmol) of a hexane solution of 1.63N normal butyl lithium was dropped by a syringe, and after stirring at the same temperature for 1 hour, 0.5 mol of zinc chloride TH was added.
22.8 ml (11.4 mmol) of F solution was added dropwise.
After completion of the dropping, the temperature of the reaction product is warmed to room temperature, and further 2
Stir for hours. After adding 250 mg of tetrakistriphenylphosphine palladium as a catalyst to this reaction solution,
2.97 g (11.4 mmol) of 3,5-difluoro-4-trifluoromethylphenyl bromide was added dropwise and 2
Reflux for hours. This reaction solution was added to cooled 6N hydrochloric acid,
The product was extracted with toluene, and the extract was washed successively with saturated aqueous sodium hydrogen carbonate and water, dried over magnesium sulfate, and then the solvent was distilled off to obtain 8.5 g of an orange suspension. This was purified by column chromatography on silica gel using toluene / heptane = 1/1 as a developing solvent, and then recrystallized to give 1- (2- (4- (3-fluoropropyl) cyclohexyl) ethyl) -3. , 5-difluoro-
0.35 g (0.75 g) of trans-form of 4- (3,5-difluoro-4-trifluoromethylphenyl) benzene
mmol) obtained. Yield 8.49%. C-I point 83.7
° C. 1H-NMR (CDCl3) δ (ppm): 7.1
0 (d, 2H), 6.84 (d, 2H), 4.69
(T, 1H), 4.16 (t, 1H), 2.66 (t,
2H), 1.84 to 0.88 (m, 18H).
【0156】実施例2 1−(2−(4−(4−(2−フルオロエチル)シクロ
ヘキシル)シクロヘキシル)エチル)−4−トリフルオ
ロメトキシベンゼン((1)式においてn=2、環E=
1,4−シクロヘキシレン、G=共有結合、L=1,4
−シクロヘキシレン、環Z=1,4−フェニレン、k=
l=0、m=1、Q=−O−、Y=CF 3 である化合物
(No.17))の製造Example 2 1- (2- (4- (4- (2-fluoroethyl) cyclo)
Hexyl) cyclohexyl) ethyl) -4-trifluoro
Romethoxybenzene (n = 2 in the formula (1), ring E =
1,4-cyclohexylene, G = covalent bond, L = 1,4
-Cyclohexylene, ring Z = 1,4-phenylene, k =
l = 0, m = 1, Q = -O-, Y = CF 3The compound that is
(No. 17))
【0157】(第一段)エトキシカルボニルメチルジメ
チルホスホナート125g(0.556mol)にTH
F1lを加えたものを、窒素ガス雰囲気下−50℃に冷
却し、これにカリウム−t−ブトキシド62.3g
(0.556mol)を徐々に加え、この温度で1時間
攪拌した。これにビシクロヘキサンジオン モノエチレ
ンケタール117g(0.464mol)のTHF40
0ml溶液を徐々に加えた後、室温で10時間攪拌し
た。この反応液に水500mlを加え、トルエンにて生
成物を抽出した。抽出液を飽和重曹水と水で順次洗浄
し、硫酸マグネシウムにて乾燥後、減圧にて溶媒を留去
して黄色液体218.2gを得た。これをエタノール中
に溶解し、ラネーニッケル触媒の存在下、水素添加を行
なった。反応終了後触媒を濾別し、エタノールを減圧に
て留去した。残分をトルエンを展開溶媒として、シリカ
ゲル上でカラムクロマト処理により精製した。無色油状
の4−(1,4−ジオキサスピロ[4.5]デシル)シ
クロヘキシルメタノイックアシッドエチルエステルを1
83.2g(0.464mol)単離した。(First stage) 125 g (0.556 mol) of ethoxycarbonylmethyldimethylphosphonate was mixed with TH
What added F1l was cooled to -50 degreeC under nitrogen gas atmosphere, and potassium-t-butoxide 62.3g was added to this.
(0.556 mol) was gradually added, and the mixture was stirred at this temperature for 1 hour. Bicyclohexanedione monoethylene ketal 117 g (0.464 mol) THF40
After gradually adding 0 ml solution, the mixture was stirred at room temperature for 10 hours. 500 ml of water was added to this reaction solution, and the product was extracted with toluene. The extract was washed successively with saturated aqueous sodium hydrogen carbonate and water, dried over magnesium sulfate, and evaporated under reduced pressure to remove the solvent to obtain 218.2 g of a yellow liquid. This was dissolved in ethanol and hydrogenated in the presence of Raney nickel catalyst. After completion of the reaction, the catalyst was filtered off and ethanol was distilled off under reduced pressure. The residue was purified by column chromatography on silica gel using toluene as the developing solvent. A colorless oily 4- (1,4-dioxaspiro [4.5] decyl) cyclohexylmethanoic acid ethyl ester was added to
83.2 g (0.464 mol) was isolated.
【0158】(第二段)水素化リチウムアルミニウム1
7.6g(0.464mol)に乾燥THF100ml
を加えたものを、0℃に冷却し、これに上記4−(1,
4−ジオキサスピロ[4.5]デシル)シクロヘキシル
メタノイックアシッドエチルエステル183.2g
(0.464mol)の800mlTHF溶液を滴下
し、0℃で3時間攪拌した後、室温で2時間攪拌した。
反応液を3N塩酸、飽和重曹水および水で順次洗浄した
後、溶媒を留去し、次いで再結晶して2−(4−(1,
4−ジオキサスピロ[4.5]デシル)シクロヘキシ
ル)エタノールの無色結晶50.6g(0.179mo
l)を単離した。ビシクロヘキサンジオン モノエチレ
ンケタールからの収率は38%であった。(Second stage) lithium aluminum hydride 1
100 ml of dry THF to 7.6 g (0.464 mol)
Was cooled to 0 ° C., and the above 4- (1,
4-Dioxaspiro [4.5] decyl) cyclohexylmethanoic acid ethyl ester 183.2 g
A solution of (0.464 mol) in 800 ml of THF was added dropwise, and the mixture was stirred at 0 ° C. for 3 hours and then at room temperature for 2 hours.
The reaction mixture was washed successively with 3N hydrochloric acid, saturated aqueous sodium hydrogen carbonate and water, the solvent was evaporated, and the residue was recrystallized to give 2- (4- (1,
Colorless crystals of 4-dioxaspiro [4.5] decyl) cyclohexyl) ethanol 50.6 g (0.179 mo)
1) was isolated. The yield from bicyclohexanedione monoethylene ketal was 38%.
【0159】(第三段)上記2−(4−(1,4−ジオ
キサスピロ[4.5]デシル)シクロヘキシル)エタノ
ール20g(70.8mmol)をジクロロメタン70
mlに溶解した後これにDAST13g(80.7mm
ol)を滴下し、0℃で1時間攪拌した。この反応液に
水を加え、得られる有機層を飽和重曹水と水で順次洗浄
した後、溶媒を留去した。残分をヘプタン/酢酸エチル
=5/1を展開溶媒として、シリカゲル上でカラムクロ
マト処理により精製し、1−(4−(1,4−ジオキサ
スピロ[4.5]デシル)シクロヘキシル)−2−フル
オロエタンを得た。これに蟻酸80mlを加えて2時間
還流し、生成物をトルエンで抽出し、抽出液を飽和重曹
水と水で順次洗浄した後溶媒を留去し、4−(4−(2
−フルオロエチル)シクロヘキシル)シクロヘキサノン
8.0g(35.3mmol)を単離した。2−(4−
(1,4−ジオキサスピロ[4.5]デシル)シクロヘ
キシル)エタノールからの収率は49.9%であった。(Third step) 20 g (70.8 mmol) of 2- (4- (1,4-dioxaspiro [4.5] decyl) cyclohexyl) ethanol above was added to 70 ml of dichloromethane.
After dissolving in ml, DAST 13g (80.7mm
ol) was added dropwise and the mixture was stirred at 0 ° C. for 1 hour. Water was added to this reaction solution, the resulting organic layer was washed successively with saturated aqueous sodium hydrogen carbonate and water, and the solvent was evaporated. The residue was purified by column chromatography on silica gel using heptane / ethyl acetate = 5/1 as a developing solvent, and 1- (4- (1,4-dioxaspiro [4.5] decyl) cyclohexyl) -2-fluoro Got ethane. To this, 80 ml of formic acid was added and refluxed for 2 hours, the product was extracted with toluene, the extract was washed successively with saturated aqueous sodium hydrogen carbonate and water, and the solvent was evaporated to give 4- (4- (2
8.0 g (35.3 mmol) of -fluoroethyl) cyclohexyl) cyclohexanone were isolated. 2- (4-
The yield from (1,4-dioxaspiro [4.5] decyl) cyclohexyl) ethanol was 49.9%.
【0160】(第四段)4−トリフルオロメトキシブロ
モベンゼン54g(220mmol)と乾燥したマグネ
シウム5.4g(220mmol)とから250mlエ
ーテル溶媒中で調製したグリニヤール試薬を−50℃に
冷却し、ここへエチレンオキシド29.3g(670m
mol)を徐々に滴下した。滴下終了後、反応混合物を
徐々に室温にまで加温し、さらに1時間室温にて攪拌し
た。この反応液を6N塩酸300mlに加え、生成物を
酢酸エチルで抽出した後、抽出液を飽和重曹水と水で順
次洗浄し、次いで硫酸マグネシウムで乾燥した後溶媒を
留去した。残分をビグリュー管を用いて減圧蒸留した。
3.5Torr下でb.p82℃〜84℃を示す無色液
体である2−(4−トリフルオロメトキシフェニル)エ
タノール14.5g(70.3mmol)を単離した。
このものにキシレン60mlとHBr水 (47%)6
0mlを加えて9時間還流した。反応混合物に水を加
え、生成物をトルエンで抽出し、抽出液を飽和重曹水と
水で順次洗浄し、得られる有機層を硫酸マグネシウムで
乾燥した後溶媒を留去した。残分をビグリュー管を用い
て減圧蒸留した。4Torr下でb.p74℃を示す無
色液体である2−(4−トリフルオロメトキシフェニ
ル)ブロモエタン12.0g(51.9mmol)を単
離した。このものの4−トリフルオロメトキシブロモベ
ンゼンからの収率は23.6%であった。(Fourth stage) A Grignard reagent prepared from 54 g (220 mmol) of 4-trifluoromethoxybromobenzene and 5.4 g (220 mmol) of dried magnesium in a 250 ml ether solvent was cooled to -50 ° C. Ethylene oxide 29.3g (670m
(mol) was gradually added dropwise. After completion of the dropwise addition, the reaction mixture was gradually warmed to room temperature and further stirred at room temperature for 1 hour. The reaction solution was added to 300 ml of 6N hydrochloric acid, the product was extracted with ethyl acetate, the extract was washed successively with saturated aqueous sodium hydrogen carbonate and water, dried over magnesium sulfate, and the solvent was evaporated. The residue was distilled under reduced pressure using a Vigreux tube.
Under 3.5 Torr b. 14.5 g (70.3 mmol) of 2- (4-trifluoromethoxyphenyl) ethanol, which is a colorless liquid exhibiting a p82 ° C to 84 ° C, was isolated.
To this, 60 ml of xylene and HBr water (47%) 6
0 ml was added and the mixture was refluxed for 9 hours. Water was added to the reaction mixture, the product was extracted with toluene, the extract was washed successively with saturated aqueous sodium hydrogen carbonate and water, the resulting organic layer was dried over magnesium sulfate, and the solvent was evaporated. The residue was distilled under reduced pressure using a Vigreux tube. B. Under 4 Torr. 12.0 g (51.9 mmol) of 2- (4-trifluoromethoxyphenyl) bromoethane, which is a colorless liquid showing p74 ° C., was isolated. The yield of this product from 4-trifluoromethoxybromobenzene was 23.6%.
【0161】(第五段)上記の2−(4−トリフルオロ
メトキシフェニル)ブロモエタン7.0g(30.3m
mol)と乾燥したマグネシウム0.74g(30.4
mmol)とから40mlエーテル溶媒中で調製したグ
リニヤール試薬を0℃まで冷却し、これに第三段で合成
した4−(4−(2−フルオロエチル)シクロヘキシ
ル)シクロヘキサノン2.2g(9.7mmol)の3
0mlエーテル溶液を滴下し、0℃で3時間攪拌した。
この反応液に6N塩酸に加え、生成物をトルエンで抽出
した後、抽出液を飽和重曹水と水で順次洗浄し、次いで
硫酸マグネシウムで乾燥した後溶媒を留去した。得られ
た黄色油状物にトルエン100mlとアンバーリスト5
00mgを加え、反応により生成する水をジーンスター
クにより除去しながら4時間還流した。アンバーリスト
を濾別し、溶媒を留去した後、残分をトルエンを展開溶
媒として、シリカゲル上でカラムクロマトグラフィー処
理することにより精製し、4−(4−(2−フルオロエ
チル)シクロヘキシル)−1−(2−(4−トリフルオ
ロメトキシフェニル)エチル)−1−シクロヘキセン
1.8g(4.5mmol)を単離した。このものの
1.2g(3.0mmol)を、5%Pd/C触媒0.
12gの存在下、エタノール溶液中で水素添加した。反
応終了後触媒を濾別し、溶媒を減圧にて留去した。残分
を再結晶して、スメクチック相を呈する無色の1−(2
−(4−(4−(2−フルオロエチル)シクロヘキシ
ル)シクロヘキシル)エチル)−4−トリフルオロメト
キシベンゼンのトランス体のみを0.37g(0.90
mmol)単離した。このものの4−(4−(2−フル
オロエチル)シクロヘキシル)シクロヘキサノンからの
収率は9.3%であった。 SB −N点68.8℃、N−I点103.5℃。 1H−NMR(CDCl3)δ(ppm):7.19
(t,4H)、4.74(t,1H)、4.21(t,
1H)、2.58(t,2H)、1.82−0.99
(m,26H)。(Fifth stage) 7.0 g (30.3 m) of 2- (4-trifluoromethoxyphenyl) bromoethane as described above
mol) and dried magnesium 0.74 g (30.4
(4 mmol) and the Grignard reagent prepared in 40 ml ether solvent were cooled to 0 ° C., and then 2.2 g (9.7 mmol) of 4- (4- (2-fluoroethyl) cyclohexyl) cyclohexanone synthesized in the third step. Of 3
0 ml ether solution was added dropwise, and the mixture was stirred at 0 ° C. for 3 hours.
To the reaction solution was added 6N hydrochloric acid, and the product was extracted with toluene. The extract was washed successively with saturated aqueous sodium hydrogen carbonate and water, dried over magnesium sulfate, and the solvent was evaporated. 100 ml of toluene and Amberlyst 5 were added to the obtained yellow oily substance.
00 mg was added, and the mixture was refluxed for 4 hours while removing water generated by the reaction with Gene Stark. The amberlyst was filtered off, the solvent was distilled off, and the residue was purified by column chromatography on silica gel using toluene as a developing solvent to give 4- (4- (2-fluoroethyl) cyclohexyl)-. 1.8 g (4.5 mmol) of 1- (2- (4-trifluoromethoxyphenyl) ethyl) -1-cyclohexene was isolated. 1.2 g (3.0 mmol) of this product was added to 5% Pd / C catalyst 0.
Hydrogenated in ethanol solution in the presence of 12 g. After completion of the reaction, the catalyst was filtered off and the solvent was distilled off under reduced pressure. The residue is recrystallized to give a colorless 1- (2) which exhibits a smectic phase.
0.37 g (0.90) of only trans-form of-(4- (4- (2-fluoroethyl) cyclohexyl) cyclohexyl) ethyl) -4-trifluoromethoxybenzene
mmol) isolated. The yield of this product from 4- (4- (2-fluoroethyl) cyclohexyl) cyclohexanone was 9.3%. S B -N point 68.8 ° C, NI point 103.5 ° C. 1H-NMR (CDCl3) delta (ppm): 7.19
(T, 4H), 4.74 (t, 1H), 4.21 (t,
1H), 2.58 (t, 2H), 1.82-0.99
(M, 26H).
【0162】実施例3 1−(4−(3−フルオロプロピル)シクロヘキシル)
−3,5−ジフルオロ−4−(2−(3−フルオロ−4
−トリフルオロメトキシフェニル)エチル)ベンゼン
((1)式においてn=3、環E=1,4−シクロヘキ
シレン、G=共有結合、L=3,5−ジフルオロ−1,
4−フェニレン、環Z=3−フルオロ−1,4−フェニ
レン、k=l=0、m=1、Q=−O−、Y=CF3 で
ある化合物(No.122))の製造Example 3 1- (4- (3-fluoropropyl) cyclohexyl)
-3,5-difluoro-4- (2- (3-fluoro-4
-Trifluoromethoxyphenyl) ethyl) benzene (n = 3 in the formula (1), ring E = 1,4-cyclohexylene, G = covalent bond, L = 3,5-difluoro-1,
4-phenylene, the manufacture of ring Z = 3- fluoro-1,4-phenylene, k = l = 0, m = 1, Q = -O-, Y = CF 3 , compound (No.122))
【0163】(第一段)3,5−ジフルオロフェニルブ
ロミド193.1g(1.00mol)と乾燥したマグ
ネシウム24.3g(1.00mol)とからTHF溶
媒中で調製したグリニヤール試薬を0℃に冷却して、こ
れにシクロヘキサンジオン モノエチレンケタール15
6g(1.00mol)の300mlエーテル溶液を滴
下した。滴下終了後反応液を室温まで加温し、3時間攪
拌した後6N塩酸1lに加え、生成物をトルエンで抽出
した。抽出液を飽和重曹水と水で順次洗浄し、硫酸マグ
ネシウムで乾燥し、溶媒を減圧にて留去した。残分にア
ンバーリスト8gとトルエン1000mlを加え、反応
により生成する水をジーンスタークにより除去しながら
7時間還流した。反応物中のアンバーリストを濾別した
後、減圧にてトルエンを留去した。残分を、トルエンを
展開溶媒として、シリカゲル上でカラムクロマトグラフ
ィー処理により精製し、シクロヘキセン誘導体を得た。
このシクロヘキセン誘導体62gに蟻酸500mlを加
えて5時間還流した後、反応液に水500mlを加え、
生成物をトルエン抽出した。トルエン層を飽和重曹水と
水で順次洗浄した後、硫酸マグネシウムで乾燥した。ト
ルエンを減圧にて留去し、残分を減圧蒸留して4−
(3,5−ジフルオロフェニル)シクロヘキサノン4
3.8g(20.8mmol)を得た。収率20.8
%。(First stage) A Grignard reagent prepared from 193.1 g (1.00 mol) of 3,5-difluorophenyl bromide and 24.3 g (1.00 mol) of dried magnesium in a THF solvent was cooled to 0 ° C. And then add cyclohexanedione monoethylene ketal 15
6 g (1.00 mol) of a 300 ml ether solution was added dropwise. After completion of dropping, the reaction solution was warmed to room temperature, stirred for 3 hours, added to 1 L of 6N hydrochloric acid, and the product was extracted with toluene. The extract was washed successively with saturated aqueous sodium hydrogen carbonate and water, dried over magnesium sulfate, and the solvent was evaporated under reduced pressure. 8 g of Amberlyst and 1000 ml of toluene were added to the residue, and the mixture was refluxed for 7 hours while removing water produced by the reaction with Gene Stark. After removing the amberlyst in the reaction product by filtration, toluene was distilled off under reduced pressure. The residue was purified by column chromatography on silica gel using toluene as a developing solvent to obtain a cyclohexene derivative.
To 62 g of this cyclohexene derivative, 500 ml of formic acid was added and refluxed for 5 hours, then, 500 ml of water was added to the reaction solution,
The product was extracted with toluene. The toluene layer was washed successively with saturated aqueous sodium hydrogen carbonate and water, and dried over magnesium sulfate. Toluene was distilled off under reduced pressure, and the residue was distilled under reduced pressure to give 4-
(3,5-difluorophenyl) cyclohexanone 4
3.8 g (20.8 mmol) was obtained. Yield 20.8
%.
【0164】(第二段)実施例1の第二段で合成した3
−フルオロプロピルトリフェニルホスフィンブロミド1
0.3g(25.5mmol)にTHF60mlを加
え、窒素雰囲気下−50℃に冷却した。これにカリウム
−t−ブトキシド2.86g(25.5mmol)の4
0mlTHF溶液を加えた後、その温度で3時間攪拌し
た。この反応液に第一段で合成した4−(3,5−ジフ
ルオロフェニル)シクロヘキサノン43.8g(20.
8mmol)の100mlTHF溶液を滴下し、その温
度で1時間攪拌した後室温にして3時間攪拌した。この
反応液に水200mlを加え、生成物を酢酸エチルで抽
出した後、有機層を飽和重曹水と水で順次洗浄し、硫酸
マグネシウムで乾燥した。溶媒を留去して得られた黄色
溶液を、トルエンを展開溶媒として、シリカゲル上でカ
ラムクロマトグラフィー処理により精製した。得られた
シクロヘキシリデン誘導体をPd/Cを触媒としてエタ
ノール中で水素添加し、反応終了後触媒を濾別し、エタ
ノールを減圧にて留去した。生成物をヘプタンとエタノ
ールの混合溶媒を用いて再結晶し、4−(3,5−ジフ
ルオロフェニル)−1−(3−フルオロプロピル)シク
ロヘキサン1.50g(6.14mmol)を得た。収
率29.5%。(Second stage) 3 synthesized in the second stage of Example 1
-Fluoropropyltriphenylphosphine bromide 1
THF (60 ml) was added to 0.3 g (25.5 mmol), and the mixture was cooled to -50 ° C under a nitrogen atmosphere. To this was added 2.86 g (25.5 mmol) of potassium t-butoxide 4
After adding 0 ml THF solution, the mixture was stirred at that temperature for 3 hours. 43.8 g (20. 20%) of 4- (3,5-difluorophenyl) cyclohexanone synthesized in the first step was added to this reaction solution.
(8 mmol) in 100 ml of THF was added dropwise, and the mixture was stirred at that temperature for 1 hour and then brought to room temperature and stirred for 3 hours. 200 ml of water was added to the reaction solution, the product was extracted with ethyl acetate, and the organic layer was washed successively with saturated aqueous sodium hydrogen carbonate and water and dried over magnesium sulfate. The yellow solution obtained by distilling off the solvent was purified by column chromatography on silica gel using toluene as a developing solvent. The obtained cyclohexylidene derivative was hydrogenated in ethanol using Pd / C as a catalyst. After completion of the reaction, the catalyst was filtered off and ethanol was distilled off under reduced pressure. The product was recrystallized using a mixed solvent of heptane and ethanol to obtain 1.50 g (6.14 mmol) of 4- (3,5-difluorophenyl) -1- (3-fluoropropyl) cyclohexane. Yield 29.5%.
【0165】(第三段)上記の4−(3,5−ジフルオ
ロフェニル)−1−(3−フルオロプロピル)シクロヘ
キサン1.50g(6.14mmol)にTHF20m
lを加えたものを窒素雰囲気下−50℃に冷却し、これ
に1.63Nノルマルブチルリチウムのヘキサン溶液4
ml(6.51mmol)をシリンジで滴下し、そのま
まの温度で1時間攪拌した。この反応液にヨウ素1.6
5g(6.51mmol)のTHF10ml溶液を滴下
し、そのままの温度で30分攪拌した。この反応液を6
N塩酸に加え、生成物をトルエンで抽出し、抽出液を飽
和重曹水と水で順次洗浄し、有機層を硫酸マグネシウム
で乾燥した。溶媒を留去した後残分を、ヘプタンを展開
溶媒として、シリカゲル上でカラムクロマトグラフィー
処理により精製し、4−(3,5−ジフルオロフェニル
−4−ヨード)−1−(3−フルオロプロピル)シクロ
ヘキサン2.12g(5.73mmol)を得た。収率
93.3%。(Third step) 20 m of THF was added to 1.50 g (6.14 mmol) of 4- (3,5-difluorophenyl) -1- (3-fluoropropyl) cyclohexane.
The mixture to which 1 was added was cooled to −50 ° C. under a nitrogen atmosphere, and a hexane solution of 1.63N n-butyllithium 4 was added thereto.
ml (6.51 mmol) was added dropwise with a syringe, and the mixture was stirred at the same temperature for 1 hour. 1.6 Iodine was added to this reaction solution.
A solution of 5 g (6.51 mmol) in 10 ml of THF was added dropwise, and the mixture was stirred at the same temperature for 30 minutes. Add this reaction mixture to 6
In addition to N hydrochloric acid, the product was extracted with toluene, the extract was washed successively with saturated aqueous sodium hydrogen carbonate and water, and the organic layer was dried over magnesium sulfate. After the solvent was distilled off, the residue was purified by column chromatography on silica gel using heptane as a developing solvent, and 4- (3,5-difluorophenyl-4-iodo) -1- (3-fluoropropyl) was obtained. 2.12 g (5.73 mmol) of cyclohexane was obtained. Yield 93.3%.
【0166】(第四段)3−フルオロ−4−トリフルオ
ロメトキシフェニルブロミド200.0g(772mm
ol)と乾燥したマグネシウム18.8g(774mm
ol)とからエーテル中で調製したグリニヤール試薬を
窒素ガス雰囲気下−50℃に冷却し、これにエチレンオ
キシド100g(2.27mol)の100mlエーテ
ル溶液を滴下した。滴下終了後この反応液を0℃で2時
間攪拌した後反応物を6N塩酸に加え、生成物をトルエ
ンで抽出した。抽出液を飽和重曹水と水で順次洗浄した
後、有機層を硫酸マグネシウムで乾燥した。溶媒を留去
した後、残分に47%臭化水素酸300mlとキシレン
300mlを加え、反応により生成する水をジーンスタ
ークにより除去しながら9時間還流した。反応物に水5
00mlを加え、生成物をトルエン抽出し、抽出液を飽
和重曹水と水で順次洗浄した後、溶媒を留去した。残分
を減圧蒸留し、3−フルオロ−4−トリフルオロメトキ
シフェネチルブロミド68.3g(238mmol)を
得た。収率30.7%。(Fourth step) 3-fluoro-4-trifluoromethoxyphenyl bromide 200.0 g (772 mm)
ol) and dried magnesium 18.8g (774mm
Ol) and the Grignard reagent prepared in ether from the solution were cooled to -50 ° C under a nitrogen gas atmosphere, and 100 ml (2.27 mol) of ethylene oxide in 100 ml of ether was added dropwise thereto. After completion of dropping, the reaction solution was stirred at 0 ° C. for 2 hours, the reaction product was added to 6N hydrochloric acid, and the product was extracted with toluene. The extract was washed successively with saturated aqueous sodium hydrogen carbonate and water, and the organic layer was dried over magnesium sulfate. After the solvent was distilled off, 300 ml of 47% hydrobromic acid and 300 ml of xylene were added to the residue, and the mixture was refluxed for 9 hours while removing water produced by the reaction with Gene Stark. Water 5 for reaction
00 ml was added, the product was extracted with toluene, the extract was washed successively with saturated aqueous sodium hydrogen carbonate and water, and the solvent was evaporated. The residue was distilled under reduced pressure to obtain 68.3 g (238 mmol) of 3-fluoro-4-trifluoromethoxyphenethyl bromide. Yield 30.7%.
【0167】(第五段)上記の3−フルオロ−4−トリ
フルオロメトキシフェネチルブロミド1.64g(5.
71mmol)と乾燥したマグネシウム0.14g
(5.76mmol)とからエーテル10ml中でグリ
ニヤール試薬を調製したものを0℃に冷却し、これにニ
ッケルアセチルアセトナート0.10g(0.39mm
ol)を加えた後、第三段で合成した4−(3,5−ジ
フルオロフェニル−4−ヨード)−1−(3−フルオロ
プロピル)シクロヘキサン2.12g(5.73mmo
l)の20mlエーテル溶液を滴下した。この反応液を
0℃で1時間攪拌し、室温まで加温した後3時間攪拌し
た。次いで得られた反応液を6N塩酸に加え、生成物を
トルエン抽出し、抽出液を飽和重曹水と水で順次洗浄
し、有機層を硫酸マグネシウムで乾燥した。溶媒を留去
した後残分を、トルエンを展開溶媒として、シリカゲル
上でカラムクロマトグラフィー処理により精製し、次い
でヘプタンとエタノールの混合溶媒を用いて再結晶し、
1−(4−(3−フルオロプロピル)シクロヘキシル)
−3,5−ジフルオロ−4−(2−(3−フルオロ−4
−トリフルオロメトキシフェニル)エチル)ベンゼン3
20mg(0.692mmol)を得た。収率12.0
%。1H−NMRのデータはよく構造を支持した。(Fifth stage) 1.64 g (5.
71 mmol) and 0.14 g of dried magnesium
The Grignard reagent prepared in 10 ml of ether from (5.76 mmol) was cooled to 0 ° C., and 0.10 g (0.39 mm) of nickel acetylacetonate was added thereto.
was added, and then 2.12 g (5.73 mmo) of 4- (3,5-difluorophenyl-4-iodo) -1- (3-fluoropropyl) cyclohexane synthesized in the third step.
20 ml ether solution of l) was added dropwise. The reaction solution was stirred at 0 ° C. for 1 hour, warmed to room temperature and then stirred for 3 hours. Then, the obtained reaction solution was added to 6N hydrochloric acid, the product was extracted with toluene, the extract was washed successively with saturated aqueous sodium hydrogen carbonate and water, and the organic layer was dried over magnesium sulfate. After distilling off the solvent, the residue was purified by column chromatography on silica gel using toluene as a developing solvent, and then recrystallized using a mixed solvent of heptane and ethanol,
1- (4- (3-fluoropropyl) cyclohexyl)
-3,5-difluoro-4- (2- (3-fluoro-4
-Trifluoromethoxyphenyl) ethyl) benzene 3
20 mg (0.692 mmol) was obtained. Yield 12.0
%. 1H-NMR data well supported the structure.
【0168】実施例4 1−(4−(4−(3−フルオロプロピル)シクロヘキ
シル)シクロヘキシル)−3,5−ジフルオロ−4−
(3−フルオロ−4−トリフルオロメトキシフェニル)
ベンゼン((1)式においてn=3、環E=G=1,4
−シクロヘキシレン、L=3,5−ジフルオロ−1,4
−フェニレン、環Z=3−フルオロ−1,4−フェニレ
ン、k=l=m=0、Q=−O−、Y=CF3 である化
合物(No.240))の製造Example 4 1- (4- (4- (3-fluoropropyl) cyclohexyl) cyclohexyl) -3,5-difluoro-4-
(3-fluoro-4-trifluoromethoxyphenyl)
Benzene (n = 3 in formula (1), ring E = G = 1,4
-Cyclohexylene, L = 3,5-difluoro-1,4
- phenylene, production of ring Z = 3- fluoro-1,4-phenylene, k = l = m = 0 , Q = -O-, Y = CF 3 , compound (No.240))
【0169】(第一段)3,5−ジフルオロフェニルブ
ロミド107.1g(555mmol)と乾燥したマグ
ネシウム14.0g(575mmol)とからTHF6
00ml中で調製したグリニヤール試薬に、室温でビシ
クロヘキサンジオン モノプロピレンケタールの500
mlTHF溶液を滴下し、そのままの温度で5時間攪拌
した。この反応液を0℃に冷却し、これに飽和塩化アン
モニウムを加え、生成物を酢酸エチルで抽出し、抽出液
を水洗した後、有機層を硫酸マグネシウムで乾燥し、次
いで溶媒を留去することにより黄色結晶158gを得
た。これにトルエン700mlと5%パラトルエンスル
ホン酸7.9gを加え、9時間還流した。なお該還流の
終了2時間前に、系内にプロピレングリコール37gと
5%パラトルエンスルホン酸8.3gを加えた。この反
応液を6N塩酸、飽和重曹水および水で順次洗浄し、有
機層を硫酸マグネシウムで乾燥した。溶媒を留去して得
られた残分169gを、トルエン/酢酸エチル=1/9
を展開溶媒として、シリカゲル上でカラムクロマトグラ
フィー処理により精製し、4−(3,5−ジフルオロフ
ェニル)−3−シクロヘキセニル−1−シクロヘキサノ
ン プロピレンケタール114g(327mmol)を
得た。収率56.9%。(First step) From 107.1 g (555 mmol) of 3,5-difluorophenyl bromide and 14.0 g (575 mmol) of dried magnesium, THF6 was added.
Grignard reagent prepared in 00 ml was added with 500 of bicyclohexanedione monopropylene ketal at room temperature.
A ml THF solution was added dropwise, and the mixture was stirred at the same temperature for 5 hours. The reaction solution was cooled to 0 ° C., saturated ammonium chloride was added thereto, the product was extracted with ethyl acetate, the extract solution was washed with water, the organic layer was dried with magnesium sulfate, and then the solvent was distilled off. This gave 158 g of yellow crystals. To this, 700 ml of toluene and 7.9 g of 5% paratoluenesulfonic acid were added, and the mixture was refluxed for 9 hours. Two hours before the end of the reflux, 37 g of propylene glycol and 8.3 g of 5% paratoluenesulfonic acid were added to the system. The reaction solution was washed successively with 6N hydrochloric acid, saturated aqueous sodium hydrogen carbonate and water, and the organic layer was dried over magnesium sulfate. 169 g of the residue obtained by distilling off the solvent was added to toluene / ethyl acetate = 1/9
Was used as a developing solvent to purify by column chromatography on silica gel to obtain 114 g (327 mmol) of 4- (3,5-difluorophenyl) -3-cyclohexenyl-1-cyclohexanone propylene ketal. Yield 56.9%.
【0170】(第二段)上記の4−(3,5−ジフルオ
ロフェニル)−3−シクロヘキセニル−1−シクロヘキ
サノン プロピレンケタール114g(327mmo
l)を酢酸エチルとエタノールの混合溶媒中で、ラネー
ニッケル触媒44.8gの存在下に水素添加した。反応
終了後触媒を濾別し、溶媒を減圧にて留去した。残分に
蟻酸50.0g(1.09mol)とトルエン300m
lを加え、4時間還流した。この反応液に水を加え、有
機層を飽和重曹水と水で順次洗浄した後、硫酸マグネシ
ウムで乾燥し、次いでトルエンを減圧にて留去した。残
分を、トルエンを展開溶媒として、シリカゲル上でカラ
ムクロマトグラフィー処理により精製し、4−(3,5
−ジフルオロフェニル)シクロヘキシル−1−シクロヘ
キサノン56.8g(194mmol)を得た。収率5
9.3%。(Second stage) 114 g (327 mmo) of 4- (3,5-difluorophenyl) -3-cyclohexenyl-1-cyclohexanone propylene ketal as described above.
1) was hydrogenated in a mixed solvent of ethyl acetate and ethanol in the presence of 44.8 g of Raney nickel catalyst. After completion of the reaction, the catalyst was filtered off and the solvent was distilled off under reduced pressure. 50.0 g (1.09 mol) of formic acid and 300 m of toluene in the residue
1 was added and the mixture was refluxed for 4 hours. Water was added to this reaction solution, the organic layer was washed successively with saturated aqueous sodium hydrogen carbonate and water, dried over magnesium sulfate, and then toluene was distilled off under reduced pressure. The residue was purified by column chromatography on silica gel using toluene as a developing solvent, and 4- (3,5
56.8 g (194 mmol) of -difluorophenyl) cyclohexyl-1-cyclohexanone were obtained. Yield 5
9.3%.
【0171】(第三段)実施例1の第二段で合成した3
−フルオロプロピルトリフェニルホスフィンブロミド3
6.1g(89.5mmol)にTHF250mlを加
え、窒素ガス雰囲気下−50℃に冷却した。これにカリ
ウム−t−ブトキシド10.0g(89.5mmol)
の100mlTHF溶液を加えた後、3時間攪拌した。
この反応液に第二段で合成した4−(3,5−ジフルオ
ロフェニル)シクロヘキシル−1−シクロヘキサノン2
0.0g(68.9mmol)の200mlTHF溶液
を滴下し、そのままの温度で1時間攪拌した後、室温ま
で加温して4時間攪拌した。この反応液に水1lを加
え、生成物をトルエンで抽出し、抽出液を水で洗浄した
後有機層を硫酸マグネシウムで乾燥し、次いで溶媒を減
圧にて留去した。残分を、トルエンを展開溶媒として、
シリカゲル上でカラムクロマトグラフィー処理により精
製し、12.99gの黄色溶液を得た。これを5%Pd
/C触媒1.20gの存在下、エタノール中で水素添加
し、反応終了後触媒を濾別し、溶媒を留去した。残分
を、トルエンを展開溶媒として、シリカゲル上でカラム
クロマトグラフィー処理により精製し4−(3−フルオ
ロプロピルシクロヘキシル)シクロヘキシル−3,5−
ジフルオロベンゼン8.33g(24.6mmol)を
得た。収率35.7%。(Third stage) 3 synthesized in the second stage of Example 1
-Fluoropropyltriphenylphosphine bromide 3
250 ml of THF was added to 6.1 g (89.5 mmol), and the mixture was cooled to -50 ° C under a nitrogen gas atmosphere. 10.0 g (89.5 mmol) of potassium t-butoxide was added to this.
100 ml of THF solution was added and the mixture was stirred for 3 hours.
4- (3,5-difluorophenyl) cyclohexyl-1-cyclohexanone 2 synthesized in the second step in this reaction solution
0.0 g (68.9 mmol) of 200 ml THF solution was added dropwise, and the mixture was stirred at the same temperature for 1 hour, then warmed to room temperature and stirred for 4 hours. 1 l of water was added to this reaction solution, the product was extracted with toluene, the extract was washed with water, the organic layer was dried over magnesium sulfate, and then the solvent was distilled off under reduced pressure. Toluene was used as a developing solvent for the residue,
Purification by column chromatography on silica gel gave 12.99 g of a yellow solution. This is 5% Pd
In the presence of 1.20 g of / C catalyst, hydrogenation was carried out in ethanol. After completion of the reaction, the catalyst was filtered off and the solvent was distilled off. The residue was purified by column chromatography on silica gel using toluene as a developing solvent, and 4- (3-fluoropropylcyclohexyl) cyclohexyl-3,5-
8.33 g (24.6 mmol) of difluorobenzene was obtained. Yield 35.7%.
【0172】(第四段)上記の4−(3−フルオロプロ
ピルシクロヘキシル)シクロヘキシル−3,5−ジフル
オロベンゼン8.10g(23.9mmol)にTHF
80mlを加えたものを窒素ガス雰囲気下−50℃に冷
却し、これに1.63Nノルマルブチルリチウムのヘキ
サン溶液16.9ml(28.7mmol)をシリンジ
で滴下し、そのままの温度で1時間攪拌した後、さらに
0.5モル塩化亜鉛THF溶液58.4ml(29.2
mmol)を滴下した。滴下終了後、反応液の温度を室
温まで加温し、さらに2時間攪拌した。この反応液にテ
トラキストリフェニルホスフィンパラジウムを0.72
g(622mmol)加えた後、3−フルオロ−4−ト
リフルオロメトキシフェニルブロミド7.44g(2
8.7mmol)を滴下して、2時間還流した。この反
応液に冷却した6N塩酸を加え、生成物を酢酸エチルで
抽出し、抽出液を飽和重曹水と水で順次洗浄した後、有
機層を硫酸マグネシウムで乾燥し、溶媒を留去した。残
分13.9gを、ヘプタンを展開溶媒として、シリカゲ
ル上でカラムクロマトグラフィー処理により精製し、次
いでヘプタンとエタノールの混合溶媒を用いて再結晶
し、1−(4−(4−(3−フルオロプロピル)シクロ
ヘキシル)シクロヘキシル)−3,5−ジフルオロ−4
−(3−フルオロ−4−トリフルオロメトキシフェニ
ル)ベンゼン1.31g(2.54mmol)を得た。
収率10.6%。C−N点78.5℃、N−I点22
4.5℃。1H−NMR(CDCl3 )δ(ppm):
7.37(t,3H)、6.85(d,2H)、4.6
9(t,1H)、4.16(t,1H)、2.46
(m,1H)、2.02〜0.81(m,23H)。(Fourth stage) THF was added to 8.10 g (23.9 mmol) of 4- (3-fluoropropylcyclohexyl) cyclohexyl-3,5-difluorobenzene as described above.
The mixture to which 80 ml was added was cooled to −50 ° C. under a nitrogen gas atmosphere, and 16.9 ml (28.7 mmol) of a hexane solution of 1.63N n-butyllithium was added dropwise thereto with a syringe, and the mixture was stirred for 1 hour at the same temperature. After that, an additional 0.5 molar zinc chloride THF solution 58.4 ml (29.2
mmol) was added dropwise. After completion of the dropping, the temperature of the reaction solution was warmed to room temperature and further stirred for 2 hours. 0.72 of tetrakistriphenylphosphine palladium was added to this reaction solution.
After adding g (622 mmol), 7.44 g (2-fluoro-4-trifluoromethoxyphenyl bromide
(8.7 mmol) was added dropwise and the mixture was refluxed for 2 hours. Cooled 6N hydrochloric acid was added to the reaction solution, the product was extracted with ethyl acetate, the extract was washed successively with saturated aqueous sodium hydrogen carbonate and water, and the organic layer was dried over magnesium sulfate, and the solvent was evaporated. The residue (13.9 g) was purified by column chromatography on silica gel using heptane as a developing solvent, and then recrystallized using a mixed solvent of heptane and ethanol to give 1- (4- (4- (3-fluoro Propyl) cyclohexyl) cyclohexyl) -3,5-difluoro-4
1.31 g (2.54 mmol) of-(3-fluoro-4-trifluoromethoxyphenyl) benzene was obtained.
Yield 10.6%. C-N point 78.5 ° C, N-I point 22
4.5 ° C. 1 H-NMR (CDCl 3 ) δ (ppm):
7.37 (t, 3H), 6.85 (d, 2H), 4.6
9 (t, 1H), 4.16 (t, 1H), 2.46
(M, 1H), 2.02-0.81 (m, 23H).
【0173】実施例5 1−(2−(4−(3−フルオロプロピル)シクロヘキ
シル)エチル)−3,5−ジフルオロ−4−(3−フル
オロ−4−トリフルオロメトキシフェニル)ベンゼン
((1)式において、n=3、環E=1,4−シクロヘ
キシレン、G=共有結合、L=3,5−ジフルオロ−
1,4−フェニレン、環Z=3−フルオロ−1,4−フ
ェニレン、k=1、l=0、m=0、Q=−O−、Y=
CF3である化合物(No.77)の製造Example 5 1- (2- (4- (3-fluoropropyl) cyclohexyl) ethyl) -3,5-difluoro-4- (3-fluoro-4-trifluoromethoxyphenyl) benzene ((1) In the formula, n = 3, ring E = 1,4-cyclohexylene, G = covalent bond, L = 3,5-difluoro-
1,4-phenylene, ring Z = 3-fluoro-1,4-phenylene, k = 1, l = 0, m = 0, Q = -O-, Y =
Production of compound (No. 77) which is CF 3
【0174】(第一段)実施例1で行った方法と同様に
して合成した4−(3,5−ジフルオロフェネチル)−
1−(3−フルオロプロピル)シクロヘキサン5.0g
(17.6mmol)にTHF50mlを加え、窒素ガ
ス雰囲気下−50℃に冷却した。これに1.68Nノル
マルブチルリチウムのヘキサン溶液13ml(21.8
mmol)をシリンジで滴下し、そのままの温度で1時
間攪拌後、0.5(mol/l)塩化亜鉛THF溶液4
3.6ml(21.8mmol)を滴下した。滴下終了
後、反応物の温度を室温まで加温し、さらに2時間攪拌
した。この反応液に触媒としてテトラキストリフェニル
ホスフィンパラジウムを500mg加えた後、3−フル
オロ−4−トリフルオロメトキシブロモベンゼン5.6
4g(21.8mmol)を滴下し、2時間還流した。
この反応液を冷却した6N塩酸に加え、生成物をトルエ
ン抽出し、抽出液を飽和重曹水と水で順次洗浄した後、
硫酸マグネシウムで乾燥し、次いで溶媒を留去し7.7
gの黄色懸濁液を得た。これをトルエン/ヘプタン=1
/1を展開溶媒とし、シリカゲル上でカラムクロマトグ
ラフィー処理により精製し、次いで再結晶して1−(2
−(4−(3−フルオロプロピル)シクロヘキシル)エ
チル)−3,5−ジフルオロ−4−(3−フルオロ−4
−トリフルオロメトキシフェニル)ベンゼンのトランス
体を0.58g(1.25mmol)得た。収率7.1
%。C−I点44.8℃、(N−I点13.6℃)。1
H−NMR(CDCl3)δ(ppm):7.38〜
6.77(m,5H)、4.69(t,1H)、4.1
6(t,1H)、2.65(t,2H),1.84〜
0.93(m,16H)。(First stage) 4- (3,5-difluorophenethyl) -synthesized in the same manner as in Example 1.
5.0 g of 1- (3-fluoropropyl) cyclohexane
THF (50 ml) was added to (17.6 mmol), and the mixture was cooled to -50 ° C under a nitrogen gas atmosphere. 13 ml of a hexane solution of 1.68 N normal butyl lithium (21.8
mmol) with a syringe and stirred at the same temperature for 1 hour, and then 0.5 (mol / l) zinc chloride THF solution 4
3.6 ml (21.8 mmol) was added dropwise. After the dropping was completed, the temperature of the reaction product was warmed to room temperature and further stirred for 2 hours. After adding 500 mg of tetrakistriphenylphosphine palladium as a catalyst to this reaction liquid, 3-fluoro-4-trifluoromethoxy bromobenzene 5.6 was added.
4 g (21.8 mmol) was added dropwise, and the mixture was refluxed for 2 hours.
The reaction solution was added to chilled 6N hydrochloric acid, the product was extracted with toluene, and the extract was washed successively with saturated aqueous sodium hydrogen carbonate and water,
Dry over magnesium sulphate, then remove the solvent by evaporation 7.7.
g yellow suspension was obtained. Toluene / heptane = 1
/ 1 as a developing solvent, and purified by column chromatography on silica gel, and then recrystallized to give 1- (2
-(4- (3-Fluoropropyl) cyclohexyl) ethyl) -3,5-difluoro-4- (3-fluoro-4)
0.58 g (1.25 mmol) of trans-form of -trifluoromethoxyphenyl) benzene was obtained. Yield 7.1
%. C-I point 44.8 ° C, (N-I point 13.6 ° C). 1
H-NMR (CDCl3) δ (ppm): 7.38-
6.77 (m, 5H), 4.69 (t, 1H), 4.1
6 (t, 1H), 2.65 (t, 2H), 1.84-
0.93 (m, 16H).
【0175】実施例6 1−(2−(4−(4−(3−フルオロプロピル)シク
ロヘキシル)シクロヘキシル)エチル)−4−トリフル
オロメチルベンゼン((1)式においてn=3、環E=
G=1,4−シクロヘキシレン、L=共有結合、環Z=
1,4−フェニレン、k=l=0,m=1,Q=共有結
合、Y=CF3である化合物(No.18))の製造Example 6 1- (2- (4- (4- (3-fluoropropyl) cyclohexyl) cyclohexyl) ethyl) -4-trifluoromethylbenzene (n = 3 in the formula (1), ring E =
G = 1,4-cyclohexylene, L = covalent bond, ring Z =
1,4-phenylene, k = 1 = 0, m = 1, Q = covalent bond, Y = CF 3 (Compound (No. 18))
【0176】(第一段)メトキシメチルトリフェニルホ
スフィンクロリド128g(370mmol)にTHF
1lを加え、0℃でこれにカリウム−t−ブトキシド4
1.5g(370mmol)を加えた後、その温度で3
時間攪拌した。この反応液に市販の4−トリフルオロメ
チルベンザルデヒド50.0g(287mmol)の5
00mlTHF溶液を滴下し、その温度で1時間攪拌し
た後室温にして3時間攪拌した。この反応液に水1.5
lを加え、生成物を酢酸エチルで抽出した後、有機層を
飽和重曹水と水で順次洗浄し、硫酸マグネシウムで乾燥
した。溶媒を留去して得られた黄色溶液を、ヘプタン/
酢酸エチル=3/2を展開溶媒として、シリカゲル上で
カラムクロマトグラフィー処理により精製し、精製物を
ビグリュー管を用いて減圧蒸留した。かくして9Tor
r下でb.p93.5℃で1−トリフルオロメチル−4
−(2−メトキシビニル)ベンゼンを19.5g(9
6.5mmol)得た。収率33.6%。(First stage) 128 g (370 mmol) of methoxymethyltriphenylphosphine chloride in THF
1 l was added, and potassium-t-butoxide 4 was added thereto at 0 ° C.
After adding 1.5 g (370 mmol), 3 at that temperature
Stir for hours. 50.0 g (287 mmol) of commercially available 4-trifluoromethylbenzaldehyde was added to this reaction solution.
A 00 ml THF solution was added dropwise, and the mixture was stirred at that temperature for 1 hour and then brought to room temperature and stirred for 3 hours. Water 1.5 in this reaction solution
l was added, the product was extracted with ethyl acetate, and the organic layer was washed successively with saturated aqueous sodium hydrogen carbonate and water and dried over magnesium sulfate. The yellow solution obtained by distilling off the solvent was converted into heptane /
It was purified by column chromatography on silica gel using ethyl acetate = 3/2 as a developing solvent, and the purified product was distilled under reduced pressure using a Vigreux tube. Thus 9 Tor
under r.b. 1-trifluoromethyl-4 at p93.5 ° C
19.5 g of (-2-methoxyvinyl) benzene (9
6.5 mmol) was obtained. Yield 33.6%.
【0177】(第二段)上記1−トリフルオロメチル−
4−(2−メトキシビニル)ベンゼン19.5g(9
6.5mmol)をアセトン100ml中に溶解し、こ
の溶液に6N塩酸100mlを加え5時間攪拌した。生
成物を酢酸エチルで抽出後、有機層を飽和重曹水と水で
順次洗浄し、硫酸マグネシウムで乾燥した。溶媒を留去
して4−トリフルオロメチルベンジルアルデヒドを1
7.5g(93.0mmol)得た。収率96.4%。(Second stage) The above 1-trifluoromethyl-
4- (2-methoxyvinyl) benzene 19.5 g (9
(6.5 mmol) was dissolved in 100 ml of acetone, 100 ml of 6N hydrochloric acid was added to this solution, and the mixture was stirred for 5 hours. The product was extracted with ethyl acetate, the organic layer was washed successively with saturated aqueous sodium hydrogen carbonate and water, and dried over magnesium sulfate. The solvent was distilled off, and 4-trifluoromethylbenzyl aldehyde was added to 1
7.5 g (93.0 mmol) was obtained. Yield 96.4%.
【0178】(第三段)上記4−トリフルオロメチルベ
ンジルアルデヒド17.5g(93.0mmol)にエ
タノール200mlを加え、窒素ガス雰囲気下0℃に冷
却した。これに液温が10℃を越えないように水素化ホ
ウ素ナトリウム1.78g(47.1mmol)を加え
0℃で2時間攪拌した。生成物を酢酸エチルで抽出した
後、有機層を飽和重曹水と水で順次洗浄し、硫酸マグネ
シウムで乾燥した。溶媒を留去した後、残分約18gに
HBr水(47%)100mlを加えて7時間還流し、
次いでビグリュー管を用いて減圧蒸留した。かくして9
Torr下でb.p94℃で2−(4−トリフルオロメ
チルフェニル)ブロモエタンを19.5g(77.1m
mol)得た。収率82.9%。(Third step) 200 ml of ethanol was added to 17.5 g (93.0 mmol) of 4-trifluoromethylbenzyl aldehyde, and the mixture was cooled to 0 ° C. under a nitrogen gas atmosphere. Sodium borohydride (1.78 g, 47.1 mmol) was added thereto so that the liquid temperature did not exceed 10 ° C, and the mixture was stirred at 0 ° C for 2 hours. The product was extracted with ethyl acetate, and the organic layer was washed successively with saturated aqueous sodium hydrogen carbonate and water and dried over magnesium sulfate. After distilling off the solvent, 100 ml of HBr water (47%) was added to about 18 g of the residue and the mixture was refluxed for 7 hours.
Then, vacuum distillation was performed using a Vigreux tube. Thus 9
B. Under Torr. 19.5 g (77.1 m) of 2- (4-trifluoromethylphenyl) bromoethane at 94 ° C.
mol) was obtained. Yield 82.9%.
【0179】(第四段)上記の2−(4−トリフルオロ
メチルフェニル)ブロモエタン19.5g(77.1m
mol)と乾燥したマグネシウム1.90g(78.2
mmol)とから100mlエーテル溶媒中で調製した
グリニヤール試薬を0℃まで冷却し、これにビシクロヘ
キサンジオン モノプロピレンケタール19.4g(7
6.9mmol)の100mlエーテル溶液を滴下し、
室温まで加温し3時間攪拌した。この反応液を6N塩酸
100mlに加え、生成物をトルエンで抽出した後、抽
出液を飽和重曹水と水で順次洗浄し、次いで硫酸マグネ
シウムで乾燥した後溶媒を留去した。得られた淡黄色油
状物約30gにトルエン300mlとアンバーリスト
1.5gを加え、反応により生成する水をジーンスター
クにより除去しながら4時間還流した。アンバーリスト
を濾別し、溶媒を留去した後、残分を酢酸エチル/トル
エン=1/1を展開溶媒として、シリカゲル上でカラム
クロマトグラフィー処理することにより精製し、4−
(4−オキソシクロヘキシル)−1−(2−(4−トリ
フルオロメチルフェニル)エチル)−1−シクロヘキセ
ン プロピレンアセタール20.0g(48.9mmo
l)を単離した。これを5%Pd/C触媒1.0gの存
在下、エタノール溶液中で水素添加した。反応終了後触
媒を濾別し、溶媒を減圧にて留去した。残分に蟻酸2
0.0g(444mmol)とトルエン100mlを加
え5時間還流した後、有機層を飽和重曹水と水で順次洗
浄し、硫酸マグネシウムで乾燥した。溶媒を留去し、残
分を酢酸エチル/トルエン=1/3を展開溶媒として、
シリカゲル上でカラムクロマトグラフィー処理すること
により精製し、精製物をヘプタンで再結晶して4−(4
−オキソシクロヘキシル)−1−(2−(4−トリフル
オロメチルフェニル)エチル)シクロヘキサンを2.7
g(7.7mmol)単離した。このもののビシクロヘ
キサンジオン モノプロピレンケタールからの収率は1
0.0%であった。(Fourth stage) 19.5 g (77.1 m) of 2- (4-trifluoromethylphenyl) bromoethane as described above
mol) and dried magnesium 1.90 g (78.2)
of the Grignard reagent prepared in 100 ml ether solvent was cooled to 0 ° C., and 19.4 g of bicyclohexanedione monopropylene ketal (7
6.9 mmol) in 100 ml ether solution,
The mixture was warmed to room temperature and stirred for 3 hours. The reaction solution was added to 100 ml of 6N hydrochloric acid, the product was extracted with toluene, the extract was washed successively with saturated aqueous sodium hydrogen carbonate and water, dried over magnesium sulfate, and the solvent was evaporated. 300 ml of toluene and 1.5 g of Amberlyst were added to about 30 g of the obtained pale yellow oily substance, and the mixture was refluxed for 4 hours while removing water produced by the reaction with Gene Stark. The amberlyst was filtered off, the solvent was distilled off, and the residue was purified by column chromatography on silica gel using ethyl acetate / toluene = 1/1 as a developing solvent.
(4-oxocyclohexyl) -1- (2- (4-trifluoromethylphenyl) ethyl) -1-cyclohexene propylene acetal 20.0 g (48.9 mmo)
1) was isolated. This was hydrogenated in an ethanol solution in the presence of 1.0 g of 5% Pd / C catalyst. After completion of the reaction, the catalyst was filtered off and the solvent was distilled off under reduced pressure. Formic acid 2 in the balance
After adding 0.0 g (444 mmol) and 100 ml of toluene and refluxing for 5 hours, the organic layer was washed successively with saturated aqueous sodium hydrogen carbonate and water, and dried over magnesium sulfate. The solvent was distilled off, and the residue was treated with ethyl acetate / toluene = 1/3 as a developing solvent,
The product was purified by column chromatography on silica gel, and the purified product was recrystallized from heptane to give 4- (4
-Oxocyclohexyl) -1- (2- (4-trifluoromethylphenyl) ethyl) cyclohexane was added to 2.7
g (7.7 mmol) was isolated. The yield of this product from bicyclohexanedione monopropylene ketal is 1
It was 0.0%.
【0180】(第五段)1,3−ジオキサン−2−イル
エチルトリフェニルホスフィンブロミド6.80g(1
4.9mmol)にTHF70mlを加え、0℃でこれ
にカリウム−t−ブトキシド1.68g(14.9mm
ol)を加えた後、その温度で3時間攪拌した。この反
応液に上記の4−(4−オキソシクロヘキシル)−1−
(2−(4−トリフルオロメチルフェニル)エチル)シ
クロヘキサン2.7g(7.7mmol)の10mlT
HF溶液を滴下し、その温度で1時間攪拌した後室温に
して3時間攪拌した。この反応液に水50mlを加え、
生成物を酢酸エチルで抽出した後、有機層を飽和重曹水
と水で順次洗浄し、硫酸マグネシウムで乾燥した。溶媒
を留去して得られた残分を、ヘプタン/酢酸エチル=3
/1を展開溶媒として、シリカゲル上でカラムクロマト
グラフィー処理により精製し、溶媒を留去した。残分
3.2gを5%Pd/C触媒0.15gの存在下、エタ
ノール溶液中で水素添加した。反応終了後触媒を濾別
し、溶媒を減圧にて留去した。残分をヘプタン/エタノ
ール=5/1で再結晶し、4−(4−(1,3−ジオキ
サン−2−イルエチル)シクロヘキシル)−1−(2−
(4−トリフルオロメチルフェニル)エチル)シクロヘ
キサンを1.46g(3.23mmol)得た。このも
のの4−(4−オキソシクロヘキシル)−1−(2−
(4−トリフルオロメチルフェニル)エチル)シクロヘ
キサンからの収率は42%であった。(5th step) 1,3-dioxan-2-ylethyltriphenylphosphine bromide 6.80 g (1
THF (70 ml) was added to 4.9 mmol), and potassium-t-butoxide (1.68 g, 14.9 mm) was added thereto at 0 ° C.
ol) was added, and the mixture was stirred at that temperature for 3 hours. 4- (4-oxocyclohexyl) -1-
(2- (4-Trifluoromethylphenyl) ethyl) cyclohexane 2.7 g (7.7 mmol) of 10 ml T
The HF solution was added dropwise, and the mixture was stirred at that temperature for 1 hour and then brought to room temperature and stirred for 3 hours. 50 ml of water was added to this reaction solution,
The product was extracted with ethyl acetate, and the organic layer was washed successively with saturated aqueous sodium hydrogen carbonate and water and dried over magnesium sulfate. The residue obtained by distilling off the solvent was converted to heptane / ethyl acetate = 3.
Purification was carried out by column chromatography on silica gel using 1/1 as the developing solvent, and the solvent was distilled off. The residue, 3.2 g, was hydrogenated in an ethanol solution in the presence of 0.15 g of 5% Pd / C catalyst. After completion of the reaction, the catalyst was filtered off and the solvent was distilled off under reduced pressure. The residue was recrystallized from heptane / ethanol = 5/1 to give 4- (4- (1,3-dioxan-2-ylethyl) cyclohexyl) -1- (2-
1.46 g (3.23 mmol) of (4-trifluoromethylphenyl) ethyl) cyclohexane was obtained. 4- (4-oxocyclohexyl) -1- (2-
The yield from (4-trifluoromethylphenyl) ethyl) cyclohexane was 42%.
【0181】(第六段)上記の4−(4−(1,3−ジ
オキサン−2−イルエチル)シクロヘキシル)−1−
(2−(4−トリフルオロメチルフェニル)エチル)シ
クロヘキサン1.46g(3.23mmol)に蟻酸
1.5g(33mmol)とトルエン10mlを加え5
時間還流した後、有機層を飽和重曹水と水で順次洗浄
し、硫酸マグネシウムで乾燥した。溶媒を留去して3−
(4−(4−(2−(4−トリフルオロメチルフェニ
ル)エチル)シクロヘキシル)シクロヘキシル)プロパ
ナールを1.21g(3.07mmol)得た。収率9
5.0%。(Sixth stage) 4- (4- (1,3-dioxan-2-ylethyl) cyclohexyl) -1-
(2- (4-Trifluoromethylphenyl) ethyl) cyclohexane 1.46 g (3.23 mmol) was added with formic acid 1.5 g (33 mmol) and toluene 10 ml to give 5
After refluxing for an hour, the organic layer was washed successively with saturated aqueous sodium hydrogen carbonate and water, and dried over magnesium sulfate. The solvent is distilled off and 3-
1.21 g (3.07 mmol) of (4- (4- (2- (4-trifluoromethylphenyl) ethyl) cyclohexyl) cyclohexyl) propanal was obtained. Yield 9
5.0%.
【0182】(第七段)上記の3−(4−(4−(2−
(4−トリフルオロメチルフェニル)エチル)シクロヘ
キシル)シクロヘキシル)プロパナール1.21g
(3.07mmol)にエタノール10mlを加え、窒
素ガス雰囲気下0℃に冷却した。これに液温が10℃を
越えないように水素化ホウ素ナトリウム0.13g
(3.43mmol)を加え0℃で2時間攪拌した。生
成物を酢酸エチルで抽出した後、有機層を飽和重曹水と
水で順次洗浄し、硫酸マグネシウムで乾燥した。溶媒を
留去して3−(4−(4−(2−(4−トリフルオロメ
チルフェニル)エチル)シクロヘキシル)シクロヘキシ
ル)プロパノール1.20g(3.03mmol)を得
た。収率98.7%。(Seventh stage) 3- (4- (4- (2-
(4-trifluoromethylphenyl) ethyl) cyclohexyl) cyclohexyl) propanal 1.21 g
10 ml of ethanol was added to (3.07 mmol), and the mixture was cooled to 0 ° C. under a nitrogen gas atmosphere. 0.13 g of sodium borohydride so that the liquid temperature does not exceed 10 ° C.
(3.43 mmol) was added and the mixture was stirred at 0 ° C. for 2 hours. The product was extracted with ethyl acetate, and the organic layer was washed successively with saturated aqueous sodium hydrogen carbonate and water and dried over magnesium sulfate. The solvent was distilled off to obtain 1.20 g (3.03 mmol) of 3- (4- (4- (2- (4-trifluoromethylphenyl) ethyl) cyclohexyl) cyclohexyl) propanol. Yield 98.7%.
【0183】(第八段)上記の3−(4−(4−(2−
(4−トリフルオロメチルフェニル)エチル)シクロヘ
キシル)シクロヘキシル)プロパノール1.20g
(3.03mmol)にジメトキシエタン10mlを加
え、これにジエチルアミノサルファートリフルオリド
(DAST)1.13g(7.01mmol)を滴下
し、5時間還流した。生成物をトルエン抽出し、有機層
を飽和重曹水と水で順次洗浄し、硫酸マグネシウムで乾
燥した。溶媒を留去し、残分をヘプタンを展開溶媒とし
て、シリカゲル上でカラムクロマトグラフィー処理によ
り精製し、溶媒を留去した。残分をエタノール/ヘプタ
ン=9/1で再結晶し、1−(2−(4−(4−(3−
フルオロプロピル)シクロヘキシル)シクロヘキシル)
エチル)−4−トリフルオロメチルベンゼンのトランス
体のみを0.60g(1.5mmol)単離した。収率
49.5%。SB−I点118.9℃。1H−NMR
(CDCl3)δ(ppm):7.52(d,2H)、
7.27(d,2H)、4.68(t,1H)、4.1
6(t,1H)、2.68(t,2H),1.75〜
0.99(m,26H)。(Eighth stage) 3- (4- (4- (2-
(4-Trifluoromethylphenyl) ethyl) cyclohexyl) cyclohexyl) propanol 1.20 g
Dimethoxyethane (10 ml) was added to (3.03 mmol), diethylaminosulfur trifluoride (DAST) 1.13 g (7.01 mmol) was added dropwise thereto, and the mixture was refluxed for 5 hours. The product was extracted with toluene, and the organic layer was washed successively with saturated aqueous sodium hydrogen carbonate and water and dried over magnesium sulfate. The solvent was distilled off, and the residue was purified by column chromatography on silica gel using heptane as a developing solvent, and the solvent was distilled off. The residue was recrystallized from ethanol / heptane = 9/1, and 1- (2- (4- (4- (3-
Fluoropropyl) cyclohexyl) cyclohexyl)
Only 0.60 g (1.5 mmol) of trans form of ethyl) -4-trifluoromethylbenzene was isolated. Yield 49.5%. S B -I point 118.9 ° C. 1H-NMR
(CDCl3) δ (ppm): 7.52 (d, 2H),
7.27 (d, 2H), 4.68 (t, 1H), 4.1
6 (t, 1H), 2.68 (t, 2H), 1.75-
0.99 (m, 26H).
【0184】実施例7 1−(2−(4−(4−(3−フルオロプロピル)シク
ロヘキシル)シクロヘキシル)エチル)−4−トリフル
オロメトキシベンゼン((1)式においてn=3、環E
=1,4−シクロヘキシレン、G=共有結合、L=1,
4−シクロヘキシレン、環Z=1,4−フェニレン、k
=l=0,m=1,Q=−O−、Y=CF3である化合
物(No.19))の製造Example 7 1- (2- (4- (4- (3-fluoropropyl) cyclohexyl) cyclohexyl) ethyl) -4-trifluoromethoxybenzene (n = 3 in the formula (1), ring E)
= 1,4-cyclohexylene, G = covalent bond, L = 1,
4-cyclohexylene, ring Z = 1,4-phenylene, k
= 1 = 0, m = 1, Q = -O-, Y = CF 3 (No. 19))
【0185】(第一段)メトキシメチルトリフェニルホ
スフィンクロリド350g(1.02mol)にTHF
1.8lを加え、0℃でこれにカリウム−t−ブトキシ
ド114g(1.02mol)を加えた後、その温度で
3時間攪拌した。この反応液に市販の4−トリフルオロ
メトキシベンザルデヒド150.0g(0.79mo
l)の750mlTHF溶液を滴下し、その温度で1時
間攪拌した後室温にして3時間攪拌した。この反応液に
水1.5lを加え、生成物を酢酸エチルで抽出した後、
有機層を飽和重曹水と水で順次洗浄し、硫酸マグネシウ
ムで乾燥した。溶媒を留去して得られた黄色溶液を、ヘ
プタン/酢酸エチル=3/2を展開溶媒として、シリカ
ゲル上でカラムクロマトグラフィー処理により精製し、
精製物をビグリュー管を用いて減圧蒸留した。かくして
9Torr下でb.p91℃で1−トリフルオロメトキ
シ−4−(2−メトキシビニル)ベンゼンを138g
(0.63mol)得た。収率79.7%。(First stage) 350 g (1.02 mol) of methoxymethyltriphenylphosphine chloride in THF
1.8 l was added, and 114 g (1.02 mol) of potassium t-butoxide was added thereto at 0 ° C., and then the mixture was stirred at that temperature for 3 hours. Commercially available 4-trifluoromethoxybenzaldehyde 150.0 g (0.79 mo)
A 750 ml THF solution of 1) was added dropwise, and the mixture was stirred at that temperature for 1 hour and then brought to room temperature and stirred for 3 hours. After adding 1.5 l of water to the reaction solution and extracting the product with ethyl acetate,
The organic layer was washed successively with saturated aqueous sodium hydrogen carbonate and water, and dried over magnesium sulfate. The yellow solution obtained by distilling off the solvent was purified by column chromatography on silica gel using heptane / ethyl acetate = 3/2 as a developing solvent,
The purified product was distilled under reduced pressure using a Vigreux tube. Thus under 9 Torr b. 138 g of 1-trifluoromethoxy-4- (2-methoxyvinyl) benzene at 91 ° C
(0.63 mol) was obtained. Yield 79.7%.
【0186】(第二段)上記1−トリフルオロメトキシ
−4−(2−メトキシビニル)ベンゼン138g(0.
63mol)をアセトン500ml中に溶解し、この溶
液に6N塩酸500mlを加え5時間攪拌した。生成物
を酢酸エチルで抽出後、有機層を飽和重曹水と水で順次
洗浄し、硫酸マグネシウムで乾燥した。溶媒を留去して
4−トリフルオロメトキシベンジルアルデヒドを123
g(0.60mol)得た。収率95.2%。(Second stage) 138 g (0.1%) of 1-trifluoromethoxy-4- (2-methoxyvinyl) benzene described above.
(63 mol) was dissolved in 500 ml of acetone, 500 ml of 6N hydrochloric acid was added to this solution, and the mixture was stirred for 5 hours. The product was extracted with ethyl acetate, the organic layer was washed successively with saturated aqueous sodium hydrogen carbonate and water, and dried over magnesium sulfate. The solvent was distilled off to give 4-trifluoromethoxybenzyl aldehyde 123
g (0.60 mol) was obtained. Yield 95.2%.
【0187】(第三段)上記4−トリフルオロメトキシ
ベンジルアルデヒド123g(0.60mol)にエタ
ノール1.5lを加え、窒素ガス雰囲気下0℃に冷却し
た。これに液温が10℃を越えないように水素化ホウ素
ナトリウム11.7g(0.31mol)を加え0℃で
2時間攪拌した。生成物を酢酸エチルで抽出した後、有
機層を飽和重曹水と水で順次洗浄し、硫酸マグネシウム
で乾燥した。溶媒を留去した後、残分にHBr水(47
%)750mlを加えて7時間還流し、次いでビグリュ
ー管を用いて減圧蒸留した。かくして1Torr下で
b.p52.0℃で2−(4−トリフルオロメトキシフ
ェニル)ブロモエタンを52.8g(0.20mol)
得た。収率33.3%。(Third step) To 123 g (0.60 mol) of 4-trifluoromethoxybenzyl aldehyde described above, 1.5 l of ethanol was added, and the mixture was cooled to 0 ° C. under a nitrogen gas atmosphere. 11.7 g (0.31 mol) of sodium borohydride was added to this so that the liquid temperature did not exceed 10 ° C., and the mixture was stirred at 0 ° C. for 2 hours. The product was extracted with ethyl acetate, and the organic layer was washed successively with saturated aqueous sodium hydrogen carbonate and water and dried over magnesium sulfate. After distilling off the solvent, HBr water (47
%) (750 ml) and refluxed for 7 hours, and then distilled under reduced pressure using a Vigreux tube. Thus under 1 Torr b. At 52.0 ° C., 52.8 g (0.20 mol) of 2- (4-trifluoromethoxyphenyl) bromoethane
Obtained. Yield 33.3%.
【0188】(第四段)上記の2−(4−トリフルオロ
メトキシフェニル)ブロモエタン25.0g(92.9
mmol)と乾燥したマグネシウム2.26g(93.
0mmol)とから100mlエーテル溶媒中で調製し
たグリニヤール試薬を0℃まで冷却し、これにビシクロ
ヘキサンジオン モノプロピレンケタール22.0g
(87.2mmol)の100mlエーテル溶液を滴下
し、室温まで加温し3時間攪拌した。この反応液を6N
塩酸100mlに加え、生成物をトルエンで抽出した
後、抽出液を飽和重曹水と水で順次洗浄し、次いで硫酸
マグネシウムで乾燥した後溶媒を留去した。残分にトル
エン300mlとアンバーリスト2.0gを加え、反応
により生成する水をジーンスタークにより除去しながら
5時間還流した。アンバーリストを濾別し、溶媒を留去
した後、残分を酢酸エチル/トルエン=1/2を展開溶
媒として、シリカゲル上でカラムクロマトグラフィー処
理することにより精製し、4−(4−オキソシクロヘキ
シル)−1−(2−(4−トリフルオロメトキシフェニ
ル)エチル)−1−シクロヘキセン プロピレンアセタ
ール22.2g(52.3mmol)を単離した。これ
を5%Pd/C触媒1.2gの存在下、エタノール溶液
中で水素添加した。反応終了後触媒を濾別し、溶媒を減
圧にて留去した。残分に蟻酸20.0g(444mmo
l)とトルエン100mlを加え5時間還流した後、有
機層を飽和重曹水と水で順次洗浄し、硫酸マグネシウム
で乾燥した。溶媒を留去し、残分を酢酸エチル/トルエ
ン=1/3を展開溶媒として、シリカゲル上でカラムク
ロマトグラフィー処理することにより精製し、精製物を
ヘプタンで再結晶して4−(4−オキソシクロヘキシ
ル)−1−(2−(4−トリフルオロメトキシフェニ
ル)エチル)シクロヘキサンを5.7g(15.6mm
ol)単離した。このもののビシクロヘキサンジオン
モノプロピレンケタールからの収率は17.9%であっ
た。(Fourth stage) 25.0 g (92.9) of 2- (4-trifluoromethoxyphenyl) bromoethane as described above.
2.26 g (93.
(0 mmol) and 100 ml of a Grignard reagent prepared in an ether solvent were cooled to 0 ° C., and 22.0 g of bicyclohexanedione monopropylene ketal was added thereto.
A 100 ml ether solution of (87.2 mmol) was added dropwise, and the mixture was warmed to room temperature and stirred for 3 hours. This reaction solution is 6N
After adding to 100 ml of hydrochloric acid and extracting the product with toluene, the extract was washed successively with saturated aqueous sodium hydrogen carbonate and water, dried over magnesium sulfate, and the solvent was evaporated. To the residue were added 300 ml of toluene and 2.0 g of Amberlyst, and the mixture was refluxed for 5 hours while removing water produced by the reaction with Gene Stark. The amberlyst was filtered off, the solvent was distilled off, and the residue was purified by column chromatography on silica gel using ethyl acetate / toluene = 1/2 as a developing solvent to give 4- (4-oxocyclohexyl). ) -1- (2- (4-Trifluoromethoxyphenyl) ethyl) -1-cyclohexene propylene acetal 22.2 g (52.3 mmol) was isolated. This was hydrogenated in an ethanol solution in the presence of 1.2 g of 5% Pd / C catalyst. After completion of the reaction, the catalyst was filtered off and the solvent was distilled off under reduced pressure. Formic acid 20.0 g (444 mmo)
l) and 100 ml of toluene were added and the mixture was refluxed for 5 hours. The organic layer was washed successively with saturated aqueous sodium hydrogen carbonate and water, and dried over magnesium sulfate. The solvent was distilled off, and the residue was purified by column chromatography on silica gel using ethyl acetate / toluene = 1/3 as a developing solvent, and the purified product was recrystallized from heptane to give 4- (4-oxo). 5.7 g (15.6 mm) of cyclohexyl) -1- (2- (4-trifluoromethoxyphenyl) ethyl) cyclohexane.
ol) isolated. Bicyclohexanedione of this thing
The yield based on monopropylene ketal was 17.9%.
【0189】(第五段)1,3−ジオキサン−2−イル
エチルトリフェニルホスフィンブロミド10.0g(2
1.9mmol)にTHF100mlを加え、0℃でこ
れにカリウム−t−ブトキシド2.46g(21.9m
mol)を加えた後、その温度で3時間攪拌した。この
反応液に上記の4−(4−オキソシクロヘキシル)−1
−(2−(4−トリフルオロメトキシフェニル)エチ
ル)シクロヘキサン5.7g(15.6mmol)の2
0mlTHF溶液を滴下し、その温度で1時間攪拌した
後室温にして3時間攪拌した。この反応液に水100m
lを加え、生成物を酢酸エチルで抽出した後、有機層を
飽和重曹水と水で順次洗浄し、硫酸マグネシウムで乾燥
した。溶媒を留去して得られた残分を、ヘプタン/酢酸
エチル=3/1を展開溶媒として、シリカゲル上でカラ
ムクロマトグラフィー処理により精製し、溶媒を留去し
た。残分5.1gを5%Pd/C触媒0.30gの存在
下、エタノール溶液中で水素添加した。反応終了後触媒
を濾別し、溶媒を減圧にて留去した。残分をヘプタン/
エタノール=5/1で再結晶し、4−(4−(1,3−
ジオキサン−2−イルエチル)シクロヘキシル)−1−
(2−(4−トリフルオロメトキシフェニル)エチル)
シクロヘキサンを3.25g(6.94mmol)得
た。このものの4−(4−オキソシクロヘキシル)−1
−(2−(4−トリフルオロメトキシフェニル)エチ
ル)シクロヘキサンからの収率は44.5%であった。(5th stage) 1,3-dioxan-2-ylethyltriphenylphosphine bromide 10.0 g (2
THF (100 ml) was added to 1.9 mmol), and potassium-t-butoxide (2.46 g, 21.9 m) was added thereto at 0 ° C.
(mol) and then stirred at that temperature for 3 hours. 4- (4-oxocyclohexyl) -1 above was added to this reaction solution.
-(2- (4-trifluoromethoxyphenyl) ethyl) cyclohexane 5.7 g (15.6 mmol) of 2
A 0 ml THF solution was added dropwise, and the mixture was stirred at that temperature for 1 hour and then brought to room temperature and stirred for 3 hours. 100m of water in this reaction liquid
l was added, the product was extracted with ethyl acetate, and the organic layer was washed successively with saturated aqueous sodium hydrogen carbonate and water and dried over magnesium sulfate. The residue obtained by distilling off the solvent was purified by column chromatography on silica gel using heptane / ethyl acetate = 3/1 as a developing solvent, and the solvent was distilled off. The residue, 5.1 g, was hydrogenated in an ethanol solution in the presence of 0.30 g of 5% Pd / C catalyst. After completion of the reaction, the catalyst was filtered off and the solvent was distilled off under reduced pressure. Residue in heptane /
Recrystallized with ethanol = 5/1, 4- (4- (1,3-
Dioxan-2-ylethyl) cyclohexyl) -1-
(2- (4-trifluoromethoxyphenyl) ethyl)
3.25 g (6.94 mmol) of cyclohexane was obtained. 4- (4-oxocyclohexyl) -1
The yield from-(2- (4-trifluoromethoxyphenyl) ethyl) cyclohexane was 44.5%.
【0190】(第六段)上記の4−(4−(1,3−ジ
オキサン−2−イルエチル)シクロヘキシル)−1−
(2−(4−トリフルオロメトキシフェニル)エチル)
シクロヘキサン3.25g(6.94mmol)に蟻酸
3.0g(66mmol)とトルエン20mlを加え5
時間還流した後、有機層を飽和重曹水と水で順次洗浄
し、硫酸マグネシウムで乾燥した。溶媒を留去して3−
(4−(4−(2−(4−トリフルオロメトキシフェニ
ル)エチル)シクロヘキシル)シクロヘキシル)プロパ
ナールを2.70g(6.58mmol)得た。収率9
4.8%。(Sixth stage) 4- (4- (1,3-dioxan-2-ylethyl) cyclohexyl) -1-
(2- (4-trifluoromethoxyphenyl) ethyl)
Formic acid 3.0 g (66 mmol) and toluene 20 ml were added to cyclohexane 3.25 g (6.94 mmol) 5
After refluxing for an hour, the organic layer was washed successively with saturated aqueous sodium hydrogen carbonate and water, and dried over magnesium sulfate. The solvent is distilled off and 3-
2.70 g (6.58 mmol) of (4- (4- (2- (4-trifluoromethoxyphenyl) ethyl) cyclohexyl) cyclohexyl) propanal was obtained. Yield 9
4.8%.
【0191】(第七段)上記の3−(4−(4−(2−
(4−トリフルオロメトキシフェニル)エチル)シクロ
ヘキシル)シクロヘキシル)プロパナール2.70g
(6.58mmol)にエタノール20mlを加え、窒
素ガス雰囲気下0℃に冷却した。これに液温が10℃を
越えないように水素化ホウ素ナトリウム0.13g
(3.43mmol)を加え0℃で2時間攪拌した。生
成物を酢酸エチルで抽出した後、有機層を飽和重曹水と
水で順次洗浄し、硫酸マグネシウムで乾燥した。溶媒を
留去し、残分をヘプタンを用いて再結晶して3−(4−
(4−(2−(4−トリフルオロメトキシフェニル)エ
チル)シクロヘキシル)シクロヘキシル)プロパノール
2.10g(5.09mmol)を得た。収率77.4
%。(Seventh stage) 3- (4- (4- (2-
(4-Trifluoromethoxyphenyl) ethyl) cyclohexyl) cyclohexyl) propanal 2.70 g
20 ml of ethanol was added to (6.58 mmol), and the mixture was cooled to 0 ° C. under a nitrogen gas atmosphere. 0.13 g of sodium borohydride so that the liquid temperature does not exceed 10 ° C.
(3.43 mmol) was added and the mixture was stirred at 0 ° C. for 2 hours. The product was extracted with ethyl acetate, and the organic layer was washed successively with saturated aqueous sodium hydrogen carbonate and water and dried over magnesium sulfate. The solvent was distilled off, and the residue was recrystallized from heptane to give 3- (4-
2.10 g (5.09 mmol) of (4- (2- (4-trifluoromethoxyphenyl) ethyl) cyclohexyl) cyclohexyl) propanol was obtained. Yield 77.4
%.
【0192】(第八段)上記の3−(4−(4−(2−
(4−トリフルオロメトキシフェニル)エチル)シクロ
ヘキシル)シクロヘキシル)プロパノール2.10g
(5.09mmol)にジメトキシエタン20mlを加
え、これにジエチルアミノサルファートリフルオリド
(DAST)1.73g(10.7mmol)を滴下
し、5時間還流した。生成物をトルエン抽出し、有機層
を飽和重曹水と水で順次洗浄し、硫酸マグネシウムで乾
燥した。溶媒を留去し、残分をヘプタン/トルエン=3
/1を展開溶媒として、シリカゲル上でカラムクロマト
グラフィー処理により精製し、溶媒を留去した。残分を
エタノールで再結晶し、1−(2−(4−(4−(3−
フルオロプロピル)シクロヘキシル)シクロヘキシル)
エチル)−4−トリフルオロメチルベンゼンのトランス
体のみを0.88g(2.12mmol)単離した。収
率41.7%。SB−N点73.8℃、N−I点13
1.8℃。1H−NMR(CDCl3)δ(ppm):
7.20(d,4H)、4.68(t,1H)、4.1
5(t,1H)、2.62(t,2H),1.75〜
0.99(m,26H)。(Eighth stage) 3- (4- (4- (2-
(4-Trifluoromethoxyphenyl) ethyl) cyclohexyl) cyclohexyl) propanol 2.10 g
20 ml of dimethoxyethane was added to (5.09 mmol), 1.73 g (10.7 mmol) of diethylaminosulfur trifluoride (DAST) was added dropwise thereto, and the mixture was refluxed for 5 hours. The product was extracted with toluene, and the organic layer was washed successively with saturated aqueous sodium hydrogen carbonate and water and dried over magnesium sulfate. The solvent was distilled off, and the residue was heptane / toluene = 3.
Purification was carried out by column chromatography on silica gel using 1/1 as the developing solvent, and the solvent was distilled off. The residue was recrystallized from ethanol and 1- (2- (4- (4- (3-
Fluoropropyl) cyclohexyl) cyclohexyl)
0.88 g (2.12 mmol) of only the trans form of ethyl) -4-trifluoromethylbenzene was isolated. Yield 41.7%. S B -N point 73.8 ° C, NI point 13
1.8 ° C. 1H-NMR (CDCl3) δ (ppm):
7.20 (d, 4H), 4.68 (t, 1H), 4.1
5 (t, 1H), 2.62 (t, 2H), 1.75-
0.99 (m, 26H).
【0193】実施例8 1−(4−(3−フルオロプロピル)シクロヘキシル)
−3−フルオロ−4−トリフルオロメトキシベンゼン
((1)式においてn=3、環E=1,4−シクロヘキ
シレン、G、L=共有結合、環Z=3−フルオロ−1,
4−フェニレン、k=1、l=m=0、Q=−O−、Y
=CF3である化合物(No.13)の製造Example 8 1- (4- (3-fluoropropyl) cyclohexyl)
-3-fluoro-4-trifluoromethoxybenzene (n = 3 in the formula (1), ring E = 1,4-cyclohexylene, G, L = covalent bond, ring Z = 3-fluoro-1,
4-phenylene, k = 1, l = m = 0, Q = -O-, Y
Of the compound (No. 13) in which ═CF 3
【0194】(第一段)1,3−ジオキサン−2−イル
エチルトリフェニルホスフィンブロミド500g(1.
09mol)にTHF3lを加え、0℃でこれにカリウ
ム−t−ブトキシド122g(1.09mol)を加え
た後、その温度で3時間攪拌した。この反応液にシクロ
ヘキサンジオンモノエチレンケタール141.9g
(0.91mol)の700mlTHF溶液を滴下し、
その温度で1時間攪拌した後室温にして3時間攪拌し
た。この反応液に水2lを加え、生成物を酢酸エチルで
抽出した後、有機層を飽和重曹水と水で順次洗浄し、硫
酸マグネシウムで乾燥した。溶媒を留去して得られた残
分を、ヘプタン/酢酸エチル=1/1を展開溶媒とし
て、シリカゲル上でカラムクロマトグラフィー処理によ
り精製し、溶媒を留去した。残分を5%Pd/C触媒
3.0gの存在下、エタノール溶液中で水素添加した。
反応終了後触媒を濾別し、溶媒を減圧にて留去して、4
−オキソ−1−(1,3−ジオキサン−2−イルエチ
ル)シクロヘキサン モノエチレンアセタールを98g
(0.38mol)得た。このもののシクロヘキサンジ
オンモノエチレンケタールからの収率は42%であっ
た。(First stage) 500 g of 1,3-dioxan-2-ylethyltriphenylphosphine bromide (1.
THF (3 l) was added to (09 mol), potassium-t-butoxide (122 g, 1.09 mol) was added thereto at 0 ° C, and the mixture was stirred at that temperature for 3 hr. Cyclohexanedione monoethylene ketal 141.9 g was added to this reaction liquid.
700 ml of THF solution (0.91 mol) was added dropwise,
The mixture was stirred at that temperature for 1 hour and then brought to room temperature and stirred for 3 hours. After adding 2 liters of water to the reaction solution and extracting the product with ethyl acetate, the organic layer was washed successively with saturated aqueous sodium hydrogen carbonate and water, and dried over magnesium sulfate. The residue obtained by distilling off the solvent was purified by column chromatography on silica gel using heptane / ethyl acetate = 1/1 as a developing solvent, and the solvent was distilled off. The residue was hydrogenated in an ethanol solution in the presence of 3.0 g of 5% Pd / C catalyst.
After completion of the reaction, the catalyst was filtered off, the solvent was distilled off under reduced pressure, and 4
98 g of -oxo-1- (1,3-dioxan-2-ylethyl) cyclohexane monoethylene acetal
(0.38 mol) was obtained. The yield of this product from cyclohexanedione monoethylene ketal was 42%.
【0195】(第二段)上記の4−オキソ−1−(1,
3−ジオキサン−2−イルエチル)シクロヘキサン エ
チレンアセタール60g(234mmol)に3N塩酸
200mlとアセトン200mlを加え5時間攪拌し
た。生成物を酢酸エチルで抽出した後、有機層を飽和重
曹水と水で順次洗浄し、硫酸マグネシウムで乾燥した。
溶媒を留去して得られた残分を、ヘプタン/酢酸エチル
=3/2を展開溶媒として、シリカゲル上でカラムクロ
マトグラフィー処理により精製し、溶媒を留去して、4
−オキソ−1−(1,3−ジオキサン−2−イルエチ
ル)シクロヘキサンを35.5g(167mmol)得
た。収率71.3%。(Second stage) 4-oxo-1- (1,
3-dioxan-2-ylethyl) cyclohexane To 60 g (234 mmol) of ethylene acetal was added 200 ml of 3N hydrochloric acid and 200 ml of acetone, and the mixture was stirred for 5 hours. The product was extracted with ethyl acetate, and the organic layer was washed successively with saturated aqueous sodium hydrogen carbonate and water and dried over magnesium sulfate.
The residue obtained by distilling off the solvent was purified by column chromatography on silica gel using heptane / ethyl acetate = 3/2 as a developing solvent, and the solvent was distilled off to give 4
35.5 g (167 mmol) of -oxo-1- (1,3-dioxan-2-ylethyl) cyclohexane was obtained. Yield 71.3%.
【0196】(第三段)ジメトキシエタン280ml中
に窒素ガス雰囲気下で60%水素化ナトリウム7.12
g(178mmol)を加え、室温で10分間攪拌し
た。この溶液にジエチルホスホノ酢酸エチル40.0g
(178mmol)を滴下し、水素ガスの発生が終了す
るまで、その温度で攪拌した後、上記の、4−オキソ−
1−(1,3−ジオキサン−2−イルエチル)シクロヘ
キサン30.0g(141mmol)を液温が30℃を
越えないようにして滴下し、30分間攪拌した。反応液
を水300mlに加え、生成物をエーテルで抽出した
後、有機層を硫酸マグネシウムで乾燥した。溶媒を留去
し、残分36.6gを5%Pd/C触媒1.8gの存在
下、エタノール溶液中で水素添加した。反応終了後触媒
を濾別し、溶媒を減圧にて留去して、エチル 2−(4
−(1,3−ジオキサン−2−イルエチル)シクロヘキ
シルエタノアートを30.2g(106mmol)得
た。このものの4−オキソ−1−(1,3−ジオキサン
−2−イルエチル)シクロヘキサンからの収率は75.
1%であった。(Third stage) 60% sodium hydride 7.12 in 280 ml of dimethoxyethane under a nitrogen gas atmosphere.
g (178 mmol) was added, and the mixture was stirred at room temperature for 10 minutes. 40.0 g of ethyl diethylphosphonoacetate in this solution
(178 mmol) was added dropwise, and the mixture was stirred at that temperature until the generation of hydrogen gas was completed.
30.0 g (141 mmol) of 1- (1,3-dioxan-2-ylethyl) cyclohexane was added dropwise so that the liquid temperature did not exceed 30 ° C., and the mixture was stirred for 30 minutes. The reaction solution was added to 300 ml of water, the product was extracted with ether, and the organic layer was dried over magnesium sulfate. The solvent was distilled off, and the residue 36.6 g was hydrogenated in an ethanol solution in the presence of 1.8 g of 5% Pd / C catalyst. After completion of the reaction, the catalyst was filtered off, the solvent was distilled off under reduced pressure, and ethyl 2- (4
30.2 g (106 mmol) of-(1,3-dioxan-2-ylethyl) cyclohexylethanoate was obtained. The yield of this product from 4-oxo-1- (1,3-dioxan-2-ylethyl) cyclohexane was 75.
It was 1%.
【0197】(第四段)上記のエチル 2−(4−
(1,3−ジオキサン−2−イルエチル)シクロヘキシ
ルエタノアート30.2g(106mmol)に窒素ガ
ス雰囲気下で、トルエン450mlを加え、−65℃に
冷却した。この溶液に水素化ジイソブチルアルミニウム
トルエン溶液(1.01mol/l)120ml(1
21mmol)を滴下し、その温度で45分間攪拌した
後、飽和塩化アンモニウム水溶液を33ml滴下し、室
温まで加温した。反応液にエーテル100mlを加え、
その温度で1.5時間攪拌し、硫酸マグネシウムを10
g加えて1時間攪拌した後、反応液を濾過した。濾液を
水洗し、硫酸マグネシウムで乾燥した後溶媒を留去し
て、2−(4−(1,3−ジオキサン−2−イルエチ
ル)シクロヘキシル)エタナールを22.0g(91.
5mmol)得た。収率86.3%。(Fourth stage) The above ethyl 2- (4-
450 ml of toluene was added to 30.2 g (106 mmol) of (1,3-dioxan-2-ylethyl) cyclohexylethanoate under a nitrogen gas atmosphere, and the mixture was cooled to -65 ° C. To this solution, 120 ml of diisobutylaluminum hydride toluene solution (1.01 mol / l) (1
(21 mmol) was added dropwise, and the mixture was stirred at that temperature for 45 minutes, then 33 ml of saturated aqueous ammonium chloride solution was added dropwise, and the mixture was warmed to room temperature. Add 100 ml of ether to the reaction mixture,
Stir at that temperature for 1.5 hours and add 10% magnesium sulfate.
After adding g and stirring for 1 hour, the reaction solution was filtered. The filtrate was washed with water, dried over magnesium sulfate, and the solvent was evaporated to give 2 (4- (1,3-dioxan-2-ylethyl) cyclohexyl) ethanal (22.0 g, 91.
5 mmol) was obtained. Yield 86.3%.
【0198】(第五段)3−フルオロ−4−トリフルオ
ロメトキシブロモベンゼン9.3g(38.7mmo
l)と乾燥したマグネシウム0.97g(39.9mm
ol)とから50mlエーテル溶媒中で調製したグリニ
ヤール試薬を0℃まで冷却し、これに上記の2−(4−
(1,3−ジオキサン−2−イルエチル)シクロヘキシ
ル)エタナール6.3g(26.2mmol)の40m
lエーテル溶液を滴下し、室温まで加温し3時間攪拌し
た。この反応液を6N塩酸100mlに加え、生成物を
酢酸エチルで抽出した後、抽出液を飽和重曹水と水で順
次洗浄し、次いで硫酸マグネシウムで乾燥した後溶媒を
留去した。残分にトルエン150mlとアンバーリスト
3.0gを加え、反応により生成する水をジーンスター
クにより除去しながら5時間還流した後、トリメチレン
グリコール1.0g(13.1mmol)を加えさらに
1時間還流した。アンバーリストを濾別し、溶媒を留去
した後、残分を酢酸エチル/トルエン=1/2を展開溶
媒として、シリカゲル上でカラムクロマトグラフィー処
理することにより精製し、溶媒を留去して1−(2−
(4−(1,3−ジオキサン−2−イルエチル)シクロ
ヘキシル)ビニル−3−フルオロ−4−トリフルオロメ
トキシベンゼン5.5g(13.7mmol)を単離し
た。このものの2−(4−(1,3−ジオキサン−2−
イルエチル)シクロヘキシル)エタナールからの収率は
52.3%であった。(Fifth stage) 9.3 g (38.7 mmo) of 3-fluoro-4-trifluoromethoxybromobenzene
l) and 0.97 g of dried magnesium (39.9 mm)
ol) and the Grignard reagent prepared in 50 ml ether solvent was cooled to 0 ° C., and the above 2- (4-
40 g of (1,3-dioxan-2-ylethyl) cyclohexyl) ethanal 6.3 g (26.2 mmol)
l ether solution was added dropwise, warmed to room temperature and stirred for 3 hours. The reaction solution was added to 100 ml of 6N hydrochloric acid, the product was extracted with ethyl acetate, the extract was washed successively with saturated aqueous sodium hydrogen carbonate and water, dried over magnesium sulfate, and the solvent was evaporated. To the residue were added 150 ml of toluene and 3.0 g of Amberlyst, the mixture was refluxed for 5 hours while removing water produced by the reaction with Gene Stark, and then 1.0 g (13.1 mmol) of trimethylene glycol was added and further refluxed for 1 hour. . The amberlyst was filtered off, the solvent was distilled off, and the residue was purified by column chromatography on silica gel using ethyl acetate / toluene = 1/2 as a developing solvent. -(2-
5.5 g (13.7 mmol) of (4- (1,3-dioxan-2-ylethyl) cyclohexyl) vinyl-3-fluoro-4-trifluoromethoxybenzene were isolated. 2- (4- (1,3-dioxane-2-
The yield based on ylethyl) cyclohexyl) ethanal was 52.3%.
【0199】(第六段)上記の1−(2−(4−(1,
3−ジオキサン−2−イルエチル)シクロヘキシル)ビ
ニル−3−フルオロ−4−トリフルオロメトキシベンゼ
ン5.5g(13.7mmol)を5%Pd/C触媒
0.3gの存在下、エタノール溶液中で水素添加した。
反応終了後触媒を濾別し、溶媒を減圧にて留去した。残
分に蟻酸2.8g(60.8mmol)とトルエン50
mlを加え5時間還流した後、有機層を飽和重曹水と水
で順次洗浄し、硫酸マグネシウムで乾燥した。溶媒を留
去して3−(4−(2−(3−フルオロ−4−トリフル
オロメトキシフェニル)エチル)シクロヘキシル)プロ
パナールを1.76g(5.1mmol)得た。このも
のの1−(2−(4−(1,3−ジオキサン−2−イル
エチル)シクロヘキシル)ビニル−3−フルオロ−4−
トリフルオロメトキシベンゼンからの収率は37.2%
であった。(Sixth stage) 1- (2- (4- (1,
Hydrogenation of 5.5 g (13.7 mmol) of 3-dioxan-2-ylethyl) cyclohexyl) vinyl-3-fluoro-4-trifluoromethoxybenzene in an ethanol solution in the presence of 0.3 g of 5% Pd / C catalyst. did.
After completion of the reaction, the catalyst was filtered off and the solvent was distilled off under reduced pressure. 2.8 g (60.8 mmol) of formic acid and 50 toluene in the residue
After adding ml and refluxing for 5 hours, the organic layer was washed successively with saturated aqueous sodium hydrogen carbonate and water, and dried over magnesium sulfate. The solvent was distilled off to obtain 1.76 g (5.1 mmol) of 3- (4- (2- (3-fluoro-4-trifluoromethoxyphenyl) ethyl) cyclohexyl) propanal. 1- (2- (4- (1,3-dioxan-2-ylethyl) cyclohexyl) vinyl-3-fluoro-4-
Yield from trifluoromethoxybenzene is 37.2%
Met.
【0200】(第七段)上記の3−(4−(2−(3−
フルオロ−4−トリフルオロメトキシフェニル)エチ
ル)シクロヘキシル)プロパナールを1.76g(5.
1mmol)にエタノール12mlを加え、窒素ガス雰
囲気下0℃に冷却した。これに液温が10℃を越えない
ように水素化ホウ素ナトリウム0.19g(5.0mm
ol)を加え0℃で2時間攪拌した。生成物を酢酸エチ
ルで抽出した後、有機層を飽和重曹水と水で順次洗浄
し、硫酸マグネシウムで乾燥した。溶媒を留去し、残分
をヘプタンを用いて再結晶して3−(4−(2−(3−
フルオロ−4−トリフルオロメトキシフェニル)エチ
ル)シクロヘキシル)プロパノール1.52g(4.4
mmol)を得た。収率86.3%。(Seventh stage) 3- (4- (2- (3-
Fluoro-4-trifluoromethoxyphenyl) ethyl) cyclohexyl) propanal 1.76 g (5.
1 ml) was added with 12 ml of ethanol and cooled to 0 ° C. under a nitrogen gas atmosphere. Sodium borohydride 0.19 g (5.0 mm) so that the liquid temperature does not exceed 10 ° C
ol) was added and the mixture was stirred at 0 ° C. for 2 hours. The product was extracted with ethyl acetate, and the organic layer was washed successively with saturated aqueous sodium hydrogen carbonate and water and dried over magnesium sulfate. The solvent was distilled off, and the residue was recrystallized from heptane to give 3- (4- (2- (3-
Fluoro-4-trifluoromethoxyphenyl) ethyl) cyclohexyl) propanol 1.52 g (4.4
mmol) was obtained. Yield 86.3%.
【0201】(第八段)上記の3−(4−(2−(3−
フルオロ−4−トリフルオロメトキシフェニル)エチ
ル)シクロヘキシル)プロパノール1.52g(4.4
mmol)にジメトキシエタン15mlを加え、これに
DAST1.40g(8.7mmol)を滴下し、5時
間還流した。生成物をトルエン抽出し、有機層を飽和重
曹水と水で順次洗浄し、硫酸マグネシウムで乾燥した。
溶媒を留去し、残分をヘプタンを展開溶媒として、シリ
カゲル上でカラムクロマトグラフィー処理により精製
し、溶媒を留去した。残分をエタノールで再結晶し、1
−(3−フルオロプロピル)シクロヘキシル)−3−フ
ルオロ−4−トリフルオロメトキシベンゼン0.12g
(0.34mmol)単離した。収率7.7%。PER
KIN−ELMER 7Series Thermal
Analysis Systemで測定した透明点は
−5.89℃であった。1H−NMR(CDCl3)δ
(ppm):7.26〜6.89(m,3H)、4.6
8(t,1H)、4.15(t,1H)、2.61
(t,2H),1.82〜0.91(m,16H)。(Eighth stage) 3- (4- (2- (3-
Fluoro-4-trifluoromethoxyphenyl) ethyl) cyclohexyl) propanol 1.52 g (4.4
Dimethoxyethane (15 ml) was added to (mmol), DAST (1.40 g, 8.7 mmol) was added dropwise thereto, and the mixture was refluxed for 5 hours. The product was extracted with toluene, and the organic layer was washed successively with saturated aqueous sodium hydrogen carbonate and water and dried over magnesium sulfate.
The solvent was distilled off, and the residue was purified by column chromatography on silica gel using heptane as a developing solvent, and the solvent was distilled off. Recrystallize the residue with ethanol and
-(3-Fluoropropyl) cyclohexyl) -3-fluoro-4-trifluoromethoxybenzene 0.12 g
(0.34 mmol) isolated. Yield 7.7%. PER
KIN-ELMER 7 Series Thermal
The clearing point measured by the Analysis System was −5.89 ° C. 1H-NMR (CDCl3) δ
(Ppm): 7.26 to 6.89 (m, 3H), 4.6
8 (t, 1H), 4.15 (t, 1H), 2.61
(T, 2H), 1.82-0.91 (m, 16H).
【0202】実施例9 1−(2−(4−(3−フルオロプロピル)シクロヘキ
シル)エチル)−3,5−ジフルオロ−4−(4−
(1,1,2,3,3,3−ヘキサフルオロプロピルオ
キシ)フェニル)ベンゼン((1)式において、n=
3、環E=1,4−シクロヘキシレン、G=共有結合、
L=3,5−ジフルオロ−1,4−フェニレン、環Z=
1,4−フェニレン、k=1、l=0、m=0、Q=−
O−、Y=CF 2CFHCF3である化合物(No.7
4)の製造Example 9 1- (2- (4- (3-fluoropropyl) cyclohexyl)
Syl) ethyl) -3,5-difluoro-4- (4-
(1,1,2,3,3,3-hexafluoropropyl
(Xy) phenyl) benzene (in the formula (1), n =
3, ring E = 1,4-cyclohexylene, G = covalent bond,
L = 3,5-difluoro-1,4-phenylene, ring Z =
1,4-phenylene, k = 1, l = 0, m = 0, Q =-
O-, Y = CF 2CFHCF3Compound (No. 7)
4) Manufacturing
【0203】(第一段)実施例1で行った方法と同様に
して合成した4−(3,5−ジフルオロフェネチル)−
1−(3−フルオロプロピル)シクロヘキサン5.0g
(17.6mmol)にTHF50mlを加え、窒素ガ
ス雰囲気下−50℃に冷却した。これに1.63Nノル
マルブチルリチウムのヘキサン溶液14ml(22.8
mmol)をシリンジで滴下し、そのままの温度で1時
間攪拌後、0.5モルの塩化亜鉛THF溶液45.6m
l(22.8mmol)を滴下した。滴下終了後、反応
物の温度を室温まで加温し、さらに2時間攪拌した。こ
の反応液に触媒としてテトラキストリフェニルホスフィ
ンパラジウムを500mg加えた後、4−(1,1,
2,3,3,3−ヘキサフルオロプロピルオキシ)ブロ
モベンゼン7.37g(22.8mmol)を滴下し、
2時間還流した。この反応液を冷却した6N塩酸50m
lに加え、生成物をトルエン抽出し、抽出液を飽和重曹
水と水で順次洗浄した後、硫酸マグネシウムで乾燥し、
次いで溶媒を留去し、残分をトルエン/ヘプタン=1/
1を展開溶媒とし、シリカゲル上でカラムクロマトグラ
フィー処理により精製し、次いでエタノールを用いて再
結晶して1−(2−(4−(3−フルオロプロピル)シ
クロヘキシル)エチル)−3,5−ジフルオロ−4−
(4−(1,1,2,3,3,3−ヘキサフルオロプロ
ピルオキシ)フェニル)ベンゼンを1.25g(2.3
7mmol)得た。収率13.5%。(First stage) 4- (3,5-difluorophenethyl) -synthesized in the same manner as in Example 1.
5.0 g of 1- (3-fluoropropyl) cyclohexane
THF (50 ml) was added to (17.6 mmol), and the mixture was cooled to -50 ° C under a nitrogen gas atmosphere. 14 ml of a hexane solution of 1.63N normal butyl lithium (22.8
mmol) with a syringe, and the mixture is stirred at the same temperature for 1 hour, and then 0.5 mol of zinc chloride in THF solution 45.6 m
1 (22.8 mmol) was added dropwise. After the dropping was completed, the temperature of the reaction product was warmed to room temperature and further stirred for 2 hours. After adding 500 mg of tetrakistriphenylphosphine palladium as a catalyst to this reaction solution, 4- (1,1,
7.37 g (22.8 mmol) of 2,3,3,3-hexafluoropropyloxy) bromobenzene was added dropwise.
Refluxed for 2 hours. This reaction liquid was cooled, and 6m hydrochloric acid 50m
In addition to 1, the product was extracted with toluene, the extract was washed successively with saturated aqueous sodium hydrogen carbonate and water, and then dried over magnesium sulfate.
Then, the solvent is distilled off, and the residue is toluene / heptane = 1 /
Purified by column chromatography on silica gel using 1 as a developing solvent, and then recrystallized from ethanol to give 1- (2- (4- (3-fluoropropyl) cyclohexyl) ethyl) -3,5-difluoro. -4-
1.25 g (2.3 of 4- (1,1,2,3,3,3-hexafluoropropyloxy) phenyl) benzene
7 mmol) was obtained. Yield 13.5%.
【0204】1H−NMRの結果は構造をよく支持し
た。The 1 H-NMR results well supported the structure.
【0205】実施例1から9および発明の詳細な説明の
欄における記述を基に、次の化合物No.1〜No.2
86を製造することができる。なお、各化合物は、一般
式(1)で示される化合物において、パラメーターであ
るn、環E、k、G、l、L、m、環Zおよび基Q−Y
を抽出することにより表示した。またパラメーターのう
ち、環E、G、Lおよび環Zの欄における表示H、B、
MおよびDは、それぞれ1,4−シクロヘキシレン、
1,4−フェニレン、Based on the description in Examples 1 to 9 and the section of the detailed description of the invention, the following compound No. 1 to No. Two
86 can be manufactured. Each compound is a compound represented by the general formula (1), in which n, ring E, k, G, l, L, m, ring Z and group Q-Y, which are parameters, are used.
Was displayed by extracting. In addition, among the parameters, the symbols H, B, and
M and D are 1,4-cyclohexylene,
1,4-phenylene,
【0206】[0206]
【化87】 [Chemical 87]
【0207】であることを、GおよびLの欄における一
は共有結合であることを示す。That is, one in the G and L columns indicates a covalent bond.
【0208】[0208]
【表1】 [Table 1]
【0209】 [0209]
【0210】 [0210]
【0211】 [0211]
【0212】 [0212]
【0213】 [0213]
【0214】 [0214]
【0215】 [0215]
【0216】 [0216]
【0217】 [0217]
【0218】 [0218]
【0219】 [0219]
【0220】実施例10(使用例1) 4−(4−プロピルシクロヘキシル)ベンゾニトリル 24% 4−(4−ペンチルシクロヘキシル)ベンゾニトリル 36% 4−(4−ヘプチルシクロヘキシル)ベンゾニトリル 25% 4−(4−ペンチルフェニル)ベンゾニトリル 15% からなる液晶組成物(A1)を調製した。本ネマチック
液晶の透明点は72.4℃、セル厚9μmでのしきい値
電圧は1.78V、Δεは11.0、Δnは0.13
7、20℃における粘度は27.0mPaSであった。
この液晶組成物85%に本発明の実施例1の化合物1−
(2−(4−(3−フルオロプロピル)シクロヘキシ
ル)エチル)−3,5−ジフルオロ−4−(3,5−ジ
フルオロ−4−トリフルオロメチルフェニル)ベンゼン
を15%混合し液晶組成物(B1)を調製した。このも
ののセル厚8.8μmでのしきい値電圧は1.39V、
Δεは12.0、Δnは0.131、弾性定数K33/
K11は2.13であった。また混合比から算出した外
挿値はそれぞれ、Δεは17.7、Δnは0.097で
あった。また、この組成物を−20℃のフリーザーに6
0日間放置したが結晶の析出は認められなかった。Example 10 (Using Example 1) 4- (4-propylcyclohexyl) benzonitrile 24% 4- (4-pentylcyclohexyl) benzonitrile 36% 4- (4-heptylcyclohexyl) benzonitrile 25% 4- ( A liquid crystal composition (A1) containing 15% of 4-pentylphenyl) benzonitrile was prepared. The clearing point of this nematic liquid crystal is 72.4 ° C., the threshold voltage at a cell thickness of 9 μm is 1.78 V, Δε is 11.0, and Δn is 0.13.
The viscosities at 7 and 20 ° C were 27.0 mPaS.
85% of this liquid crystal composition was added with the compound 1-of Example 1 of the present invention.
15% of (2- (4- (3-fluoropropyl) cyclohexyl) ethyl) -3,5-difluoro-4- (3,5-difluoro-4-trifluoromethylphenyl) benzene was mixed to obtain a liquid crystal composition (B1). ) Was prepared. The threshold voltage of this product at a cell thickness of 8.8 μm is 1.39 V,
Δε is 12.0, Δn is 0.131, and elastic constant K33 /
K11 was 2.13. The extrapolated values calculated from the mixing ratio were Δε of 17.7 and Δn of 0.097, respectively. Also, this composition was placed in a freezer at -20 ° C.
After standing for 0 days, no precipitation of crystals was observed.
【0221】実施例11(使用例2) 4−(4−プロピルシクロヘキシル)ベンゾニトリル 30% 4−(4−ペンチルシクロヘキシル)ベンゾニトリル 40% 4−(4−ヘプチルシクロヘキシル)ベンゾニトリル 30% からなる液晶組成物(A2)を調製した。本ネマチック
液晶の透明点は52.3℃、セル厚9μmでのしきい値
電圧は1.60V、Δεは10.7、Δnは0.11
9、20℃における粘度は21.7mPaSであった。
この液晶組成物85%に本発明の実施例2の化合物1−
(2−(4−(4−(2−フルオロエチル)シクロヘキ
シル)シクロヘキシル)エチル)−4−トリフルオロメ
トキシベンゼンを15%混合し液晶組成物(B2)を調
製した。このものの透明点は56.1℃、セル厚8.8
μmでのしきい値電圧は1.55V、Δεは10.2、
Δnは0.112、20℃における粘度は22.3mP
aSであった。また混合比から算出した外挿値はそれぞ
れ、透明点は77.6℃、Δεは7.4、Δnは0.0
72、20℃における粘度は25.7mPaSであっ
た。また、この組成物を−20℃のフリーザーに60日
間放置したが結晶の析出は認められなかった。Example 11 (Use Example 2) 30% 4- (4-propylcyclohexyl) benzonitrile 4- (4-pentylcyclohexyl) benzonitrile 40% Liquid crystal consisting of 30% 4- (4-heptylcyclohexyl) benzonitrile A composition (A2) was prepared. This nematic liquid crystal has a clearing point of 52.3 ° C., a cell thickness of 9 μm, a threshold voltage of 1.60 V, Δε of 10.7, and Δn of 0.11.
The viscosities at 9 and 20 ° C. were 21.7 mPaS.
85% of this liquid crystal composition was added with the compound 1-of Example 2 of the present invention.
15% of (2- (4- (4- (2-fluoroethyl) cyclohexyl) cyclohexyl) ethyl) -4-trifluoromethoxybenzene was mixed to prepare a liquid crystal composition (B2). This product has a clearing point of 56.1 ° C and a cell thickness of 8.8.
The threshold voltage in μm is 1.55 V, Δε is 10.2,
Δn is 0.112, viscosity at 20 ° C is 22.3 mP
was aS. The extrapolated values calculated from the mixture ratios are 77.6 ° C. for the clearing point, 7.4 for Δε, and 0.0 for Δn.
The viscosities at 72 and 20 ° C. were 25.7 mPaS. The composition was left in a freezer at -20 ° C for 60 days, but no crystal precipitation was observed.
【0222】実施例12(使用例3) 上記の液晶組成物(A2)85%に本発明の実施例4の
化合物1−(1−(4−(3−フルオロプロピル)シク
ロヘキシル)シクロヘキシル)−3,5−ジフルオロ−
4−(3−フルオロ−4−トリフルオロメトキシフェニ
ル)ベンゼンを15%混合し液晶組成物(B3)を調製
した。このものの透明点は64.5℃、セル厚8.8μ
mでのしきい値電圧は1.52V、Δεは11.1、Δ
nは0.122、20℃における粘度は27.8mPa
Sであった。また混合比から算出した外挿値はそれぞ
れ、透明点は133.6℃、Δεは13.4、Δnは
0.139、20℃における粘度は62.4mPaSで
あった。また、この組成物を−20℃のフリーザーに6
0日間放置したが結晶の析出は認められなかった。Example 12 (Using Example 3) The compound 1- (1- (4- (3-fluoropropyl) cyclohexyl) cyclohexyl) -3 of Example 4 of the present invention was added to 85% of the above liquid crystal composition (A2). , 5-difluoro-
15% of 4- (3-fluoro-4-trifluoromethoxyphenyl) benzene was mixed to prepare a liquid crystal composition (B3). This product has a clearing point of 64.5 ° C and a cell thickness of 8.8μ.
The threshold voltage at m is 1.52 V, Δε is 11.1, Δ
n is 0.122 and viscosity at 20 ° C. is 27.8 mPas.
It was S. The extrapolated values calculated from the mixing ratio were 133.6 ° C. for the clearing point, 13.4 for Δε, 0.139 for Δn, and the viscosity at 20 ° C. was 62.4 mPaS. Also, this composition was placed in a freezer at -20 ° C.
After standing for 0 days, no precipitation of crystals was observed.
【0223】実施例13(使用例4) 上記の液晶組成物(A1)85%に本発明の実施例5の
化合物1−(2−(4−(3−フルオロプロピル)シク
ロヘキシル)エチル)−3,5−ジフルオロ−4−(3
−フルオロ−4−トリフルオロメトキシフェニル)ベン
ゼンを15%混合し液晶組成物(B4)を調製した。こ
のものの透明点は63.3℃、セル厚8.8μmでのし
きい値電圧は1.47V、Δεは11.4、Δnは0.
130、20℃における粘度は34.1mPaSであっ
た。また混合比から算出した外挿値はそれぞれ、透明点
は15.7℃、Δεは13.7、Δnは0.090、2
0℃における粘度は67.5mPaSであった。また、
この組成物を−20℃のフリーザーに60日間放置した
が結晶の析出は認められなかった。Example 13 (Use Example 4) The compound 1- (2- (4- (3-fluoropropyl) cyclohexyl) ethyl) -3 of Example 5 of the present invention was added to 85% of the above liquid crystal composition (A1). , 5-difluoro-4- (3
15% of -fluoro-4-trifluoromethoxyphenyl) benzene was mixed to prepare a liquid crystal composition (B4). This product has a clearing point of 63.3 ° C., a cell thickness of 8.8 μm, a threshold voltage of 1.47 V, Δε of 11.4, and Δn of 0.
The viscosities at 130 and 20 ° C were 34.1 mPaS. The extrapolated values calculated from the mixing ratios are 15.7 ° C. for the clearing point, 13.7 for Δε, and 0.090 for Δn, respectively.
The viscosity at 0 ° C. was 67.5 mPaS. Also,
The composition was left in a freezer at -20 ° C for 60 days, but no precipitation of crystals was observed.
【0224】実施例14(使用例5) 上記の液晶組成物(A1)85%に本発明の実施例6の
化合物1−(2−(4−(4−(3−フルオロプロピ
ル)シクロヘキシル)シクロヘキシル)エチル)−4−
トリフルオロメチルベンゼンを15%混合し液晶組成物
(B5)を調製した。このものの透明点は74.9℃、
セル厚8.9μmでのしきい値電圧は1.79V、Δε
は10.6、Δnは0.130、20℃における粘度は
29.7mPaSであった。また混合比から算出した外
挿値はそれぞれ、透明点は93.0℃、Δεは8.3、
Δnは0.090、20℃における粘度は46.7mP
aSであった。また、この組成物を−20℃のフリーザ
ーに60日間放置したが結晶の析出は認められなかっ
た。Example 14 (Using Example 5) The compound 1- (2- (4- (4- (3-fluoropropyl) cyclohexyl) cyclohexyl) of Example 6 of the present invention was added to 85% of the above liquid crystal composition (A1). ) Ethyl) -4-
15% of trifluoromethylbenzene was mixed to prepare a liquid crystal composition (B5). The clearing point of this product is 74.9 ° C,
The threshold voltage at a cell thickness of 8.9 μm is 1.79 V, Δε
Was 10.6, Δn was 0.130, and the viscosity at 20 ° C. was 29.7 mPaS. The extrapolated values calculated from the mixing ratios are 93.0 ° C. for the clearing point and 8.3 for Δε, respectively.
Δn is 0.090, viscosity at 20 ° C is 46.7 mP
was aS. The composition was left in a freezer at -20 ° C for 60 days, but no crystal precipitation was observed.
【0225】実施例15(使用例6) 上記の液晶組成物(A1)85%に本発明の実施例7の
化合物1−(2−(4−(4−(3−フルオロプロピ
ル)シクロヘキシル)シクロヘキシル)エチル)−4−
トリフルオロメトキシベンゼンを15%混合し液晶組成
物(B6)を調製した。このものの透明点は77.1
℃、セル厚8.7μmでのしきい値電圧は1.78V、
Δεは10.2、Δnは0.130、20℃における粘
度は27.8mPaSであった。また混合比から算出し
た外挿値はそれぞれ、透明点は107.7℃、Δεは
5.7、Δnは0.090、20℃における粘度は3
2.9mPaSであった。また、この組成物を−20℃
のフリーザーに60日間放置したが結晶の析出は認めら
れなかった。Example 15 (Use Example 6) The compound 1- (2- (4- (4- (3-fluoropropyl) cyclohexyl) cyclohexyl) of Example 7 of the present invention was added to 85% of the above liquid crystal composition (A1). ) Ethyl) -4-
15% of trifluoromethoxybenzene was mixed to prepare a liquid crystal composition (B6). This product has a clearing point of 77.1.
The threshold voltage at 1.degree. C. and the cell thickness of 8.7 .mu.m is 1.78 V,
Δε was 10.2, Δn was 0.130, and the viscosity at 20 ° C. was 27.8 mPaS. The extrapolated values calculated from the mixing ratios are 107.7 ° C. for the clearing point, 5.7 for Δε, 0.090 for Δn, and a viscosity at 20 ° C. of 3 respectively.
It was 2.9 mPaS. Moreover, this composition is -20 degreeC.
After leaving it in the freezer for 60 days, no precipitation of crystals was observed.
【0226】実施例16(使用例7) 上記の液晶組成物(A1)85%に本発明の実施例8の
化合物1−(3−フルオロプロピル)シクロヘキシル)
−3−フルオロ−4−トリフルオロメトキシベンゼンを
15%混合し液晶組成物(B7)を調製した。このもの
のΔεは9.9であった。また混合比から算出したΔε
は3.7であった。また、この組成物を−20℃のフリ
ーザーに60日間放置したが結晶の析出は認められなか
った。Example 16 (Use Example 7) The compound 1- (3-fluoropropyl) cyclohexyl of Example 8 of the present invention was added to 85% of the above liquid crystal composition (A1).
Liquid crystal composition (B7) was prepared by mixing 15% of -3-fluoro-4-trifluoromethoxybenzene. The Δε of this product was 9.9. In addition, Δε calculated from the mixing ratio
Was 3.7. The composition was left in a freezer at -20 ° C for 60 days, but no crystal precipitation was observed.
【0227】実施例17(比較例1) 上記の液晶組成物(A2)50%に、特表平04−50
6817号に開示のある(5)式参照の化合物1−(4
−(2−フルオロエチル)シクロヘキシル)−4−
(3,4,5−トリフルオロフェニル)ベンゼン50%
を混合し、液晶組成物(B4)を調製した。一方、液晶
組成物(A2)50%に、実施例2の化合物1−(4−
(2−フルオロエチル)シクロヘキシル)シクロヘキシ
ル)−4−(2−(4−トリフルオロメトキシフェニ
ル)エチル)シクロヘキサンを50%混合し、液晶組成
物(B5)を調製した。これらの液晶組成物B4とB5
をそれぞれ−20℃のフリーザーに60日間放置したと
ころ、B5の場合は結晶の析出は認められなかったが、
B4の場合は結晶の析出が認められた。Example 17 (Comparative Example 1) 50% of the above-mentioned liquid crystal composition (A2) was used, and
No. 6817 discloses compound 1- (4) of the formula (5) reference
-(2-Fluoroethyl) cyclohexyl) -4-
(3,4,5-Trifluorophenyl) benzene 50%
Were mixed to prepare a liquid crystal composition (B4). On the other hand, 50% of the liquid crystal composition (A2) was mixed with the compound 1- (4-) of Example 2.
50% of (2-fluoroethyl) cyclohexyl) cyclohexyl) -4- (2- (4-trifluoromethoxyphenyl) ethyl) cyclohexane was mixed to prepare a liquid crystal composition (B5). These liquid crystal compositions B4 and B5
Each of them was left in a freezer at -20 ° C for 60 days. In the case of B5, no crystal precipitation was observed, but
In the case of B4, precipitation of crystals was observed.
【0228】実施例18(比較例2) 1−(4−(4−エチルシクロヘキシル)シクロヘキシル)−3,4−ジフル オロベンゼン 16.67% 1−(4−(4−プロピルシクロヘキシル)シクロヘキシル)−3,4−ジフ ルオロベンゼン 16.67% 1−(4−(4−ペンチルシクロヘキシル)シクロヘキシル)−3,4−ジフ ルオロベンゼン 16.66% 1−(4−(2−(4−エチルシクロヘキシル)エチル)シクロヘキシル)− 3,4−ジフルオロベンゼン 10.00% 1−(4−(2−(4−プロピルシクロヘキシル)エチル)シクロヘキシル) −3,4−ジフルオロベンゼン 5.00% 1−(4−(2−(4−ペンチルシクロヘキシル)エチル)シクロヘキシル) −3,4−ジフルオロベンゼン 10.00% 1−(4−(4−エチルシクロヘキシル)フェニル)−3,4−ジフルオロベ ンゼン 6.25% 1−(4−(4−プロピルシクロヘキシル)フェニル)−3,4−ジフルオロ ベンゼン 6.25% 1−(4−(4−ペンチルシクロヘキシル)フェニル)−3,4−ジフルオロ ベンゼン 12.50% からなる液晶組成物(A3)を調製した。液晶組成物
(A3)57%に化合物(1−(2−(4−(4−プロ
ピルシクロヘキシル)シクロヘキシル)エチル)−4−
トリフルオロメトキシベンゼン)43%を混合し液晶組
成物(B9)を調製した。一方、液晶組成物(A2)5
0%に、実施例7の化合物(1−(2−(4−(4−
(3−フルオロプロピル)シクロヘキシル)シクロヘキ
シル)エチル)−4−トリフルオロメトキシベンゼン)
を43%混合し液晶組成物(B10)を調製した。これ
らの液晶組成物B9とB10をそれぞれ−40℃のフリ
ーザー中に18時間放置したところ、B10の場合は結
晶の析出は認められなかったが、B9の場合は結晶の析
出が認められた。Example 18 (Comparative Example 2) 1- (4- (4-ethylcyclohexyl) cyclohexyl) -3,4-difluorobenzene 16.67% 1- (4- (4-propylcyclohexyl) cyclohexyl) -3 , 4-difluorobenzene 16.67% 1- (4- (4-pentylcyclohexyl) cyclohexyl) -3,4-difluorobenzene 16.66% 1- (4- (2- (4-ethylcyclohexyl) ethyl) cyclohexyl ) -3,4-Difluorobenzene 10.00% 1- (4- (2- (4-propylcyclohexyl) ethyl) cyclohexyl) -3,4-difluorobenzene 5.00% 1- (4- (2- ( 4-pentylcyclohexyl) ethyl) cyclohexyl) -3,4-difluorobenzene 10.00% 1- (4 -(4-Ethylcyclohexyl) phenyl) -3,4-difluorobenzene 6.25% 1- (4- (4-propylcyclohexyl) phenyl) -3,4-difluorobenzene 6.25% 1- (4- ( A liquid crystal composition (A3) consisting of 4-pentylcyclohexyl) phenyl) -3,4-difluorobenzene 12.50% was prepared. The compound (1- (2- (4- (4-propylcyclohexyl) cyclohexyl) ethyl) -4-) was added to 57% of the liquid crystal composition (A3).
Trifluoromethoxybenzene) 43% was mixed to prepare a liquid crystal composition (B9). On the other hand, the liquid crystal composition (A2) 5
0% to the compound of Example 7 (1- (2- (4- (4-
(3-Fluoropropyl) cyclohexyl) cyclohexyl) ethyl) -4-trifluoromethoxybenzene)
Was mixed at 43% to prepare a liquid crystal composition (B10). When each of these liquid crystal compositions B9 and B10 was left in a freezer at -40 ° C for 18 hours, no crystal precipitation was observed in the case of B10, but crystal precipitation was observed in the case of B9.
【0229】[0229]
【発明の効果】本発明の化合物は、場合により20を超
えることもある非常に大きなΔεを有する上、従来高Δ
εをもつ化合物に共通する課題であった相溶性の悪さや
液晶レンジの狭さを克服し、かつ低粘性で、化学的にも
十分安定なものである。これらの化合物を成分として含
む液晶組成物は、化学的に極めて安定で、Δεが非常に
大きく、さらに該化合物がもつ良好な相溶性と広い液晶
レンジを反映して、広くかつ実用的な温度範囲でネマチ
ック相を呈する上に低粘性であるという優れた特性を有
する。よって、これらの化合物を使用することにより得
られる組成物は液晶表示素子を構成する上で非常に有用
である。INDUSTRIAL APPLICABILITY The compound of the present invention has a very large Δε, which sometimes exceeds 20, and in addition to the conventional high Δ
It overcomes poor compatibility and narrow liquid crystal range, which were problems common to compounds having ε, and has low viscosity and is chemically stable. A liquid crystal composition containing these compounds as components is extremely stable chemically, has a very large Δε, further reflects the good compatibility and wide liquid crystal range of the compound, and has a wide and practical temperature range. It has the excellent properties of exhibiting a nematic phase and low viscosity. Therefore, the composition obtained by using these compounds is very useful in forming a liquid crystal display device.
【0230】例えば、No.17とNo.19の化合物
は、化合物(1)と比較した場合、比抵抗値と相溶性は
同程度であるが、Δεは大きくかつ透明点が大きく上昇
している上、一方で粘性が大幅に低下しており、また、
化合物(5)と比較した場合、透明点、粘性、Δεおよ
びΔnは同程度であるが、相溶性が大幅に優れており、
TFT用表示素子の組成物成分として有用である。また
No.18、No.70およびNo.80の化合物は、
Δεが大きく、相溶性が良好で、Δnも大きくかつ高い
比抵抗値を示すため、TFT用表示素子の組成物成分と
しても有用である。またNo.240の化合物は、Δε
が大きく、Δnも大きい上、さらに透明点を非常に大き
く上げる性質を有するため、組成物成分として非常に有
用である。For example, in No. 17 and No. The compound of 19 has a resistivity and compatibility comparable to those of the compound (1), but has a large Δε and a large clearing point, and on the other hand, the viscosity is significantly decreased. And again
When compared with the compound (5), the clearing point, the viscosity, Δε and Δn are about the same, but the compatibility is significantly excellent,
It is useful as a composition component of a display device for TFT. In addition, No. 18, No. 70 and No. 70. 80 compounds are
It has a large Δε, good compatibility, a large Δn, and a high specific resistance value, and is therefore useful as a composition component of a display element for TFT. In addition, No. 240 compounds have Δε
Is large and Δn is large, and further, it has a property of significantly increasing the clearing point, and thus is very useful as a composition component.
【0231】No.74の化合物は、大きなΔεと非常
に大きなΔnを有し、かつ相溶性にも優れているため、
TFT用表示素子の組成物成分としても有用である。2
環化合物のNo.13は、透明点は低めだが、Δεが大
きくかつ非常に低粘性であるため、TFT用表示素子の
組成物成分としても有用である。No. The compound of 74 has a large Δε and a very large Δn, and is also excellent in compatibility,
It is also useful as a composition component of a display element for TFT. Two
No. of the ring compound. No. 13 has a low clearing point, but has a large Δε and an extremely low viscosity, and is therefore useful as a composition component of a display element for TFT.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 C07C 43/225 7419−4H C07C 43/225 C C09K 19/14 9279−4H C09K 19/14 19/30 9279−4H 19/30 19/42 9279−4H 19/42 G02F 1/13 500 G02F 1/13 500 (72)発明者 後藤 泰行 千葉県市原市西広462番2号 (72)発明者 中川 悦男 千葉県市原市五井8890番地 (72)発明者 澤田 信一 千葉県市原市西広316−1─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 6 Identification code Internal reference number FI Technical indication C07C 43/225 7419-4H C07C 43/225 C C09K 19/14 9279-4H C09K 19/14 19 / 30 9279-4H 19/30 19/42 9279-4H 19/42 G02F 1/13 500 G02F 1/13 500 (72) Inventor Yasuyuki Goto 462-2 Nishihiro, Ichihara-shi, Chiba (72) Inventor Etsushi Nakagawa Chiba 8890 Goi, Ichihara-shi, Japan (72) Inventor Shinichi Sawada 316-1, Nishihiro, Ichihara-shi, Chiba
Claims (17)
独立して0〜2の整数であり、環Eは六員環上の1個以
上の水素原子がフッ素原子で置換されていてもよい1,
4−シクロヘキシレン基または1,4−フェニレン基を
示し、GおよびLはそれぞれに独立して共有結合または
六員環上の1個以上の水素原子がフッ素原子で置換され
ていてもよい1,4−シクロヘキシレン基または1,4
−フェニレン基を示すが、共有結合である場合にはGが
優先し、環Zはフッ素置換されていてもよい1,4−フ
ェニレン基であり、Qは共有結合または−O−であり、
Yは炭素数1〜3のフルオロアルキル基またはフッ素原
子である。ただし、環Eが1,4−シクロヘキシレン基
でかつGおよびLの少なくとも一方が共有結合である場
合はk+l+m≠0であり、またQが−O−である場合
は、Yがフッ素原子であることはない。)で表わされる
液晶性化合物。1. A general formula (I) ## STR1 ## F- (CH 2) n -E- ( CH 2 CH 2) k -G- (CH 2 CH 2) 1 -L- (CH 2 CH 2) m- Z-Q-Y (I) (In the formula, n is an integer of 1 to 10, k, l and m are each independently an integer of 0 to 2, and ring E is 1 on the 6-membered ring. 1, more than one hydrogen atom may be replaced by a fluorine atom 1,
4-cyclohexylene group or 1,4-phenylene group, G and L are each independently a covalent bond or one or more hydrogen atoms on the 6-membered ring may be substituted with a fluorine atom, 1, 4-cyclohexylene group or 1,4
-A phenylene group is shown, but when it is a covalent bond, G is preferred, ring Z is a 1,4-phenylene group which may be fluorine-substituted, and Q is a covalent bond or -O-.
Y is a fluoroalkyl group having 1 to 3 carbon atoms or a fluorine atom. However, when ring E is a 1,4-cyclohexylene group and at least one of G and L is a covalent bond, k + l + m ≠ 0, and when Q is —O—, Y is a fluorine atom. There is no such thing. )).
は1であり、環Eが1,4−フェニレン基またはフッ素
置換1,4−フェニレン基である請求項1に記載の液晶
性化合物。2. The liquid crystallinity according to claim 1, wherein k, l and m are each independently 0 or 1, and ring E is a 1,4-phenylene group or a fluorine-substituted 1,4-phenylene group. Compound.
は1であり、環Eが1,4−シクロヘキシレン基である
請求項1に記載の液晶性化合物。3. The liquid crystal compound according to claim 1, wherein k, l and m are each independently 0 or 1, and ring E is a 1,4-cyclohexylene group.
であり、Lは1,4−シクロヘキシレン基、1,4−フ
ェニレン基またはフッ素置換1,4−フェニレン基であ
る請求項3に記載の液晶性化合物。4. k is 1, l and m are 0, G is a covalent bond, and L is a 1,4-cyclohexylene group, a 1,4-phenylene group or a fluorine-substituted 1,4-phenylene group. Item 4. The liquid crystal compound according to item 3.
請求項4に記載の液晶性化合物。5. The liquid crystal compound according to claim 4, wherein L is a 1,4-cyclohexylene group.
置換1,4−フェニレン基である請求項4に記載の液晶
性化合物。6. The liquid crystal compound according to claim 4, wherein L is a 1,4-phenylene group or a fluorine-substituted 1,4-phenylene group.
合、Lは1,4−シクロヘキシレン基、1,4−フェニ
レン基またはフッ素置換1,4−フェニレン基である請
求項3に記載の液晶性化合物。7. The k and l are 0, m is 1, G is a covalent bond, and L is a 1,4-cyclohexylene group, a 1,4-phenylene group or a fluorine-substituted 1,4-phenylene group. The liquid crystal compound according to item 1.
請求項7に記載の液晶性化合物。8. The liquid crystal compound according to claim 7, wherein L is a 1,4-cyclohexylene group.
置換1,4−フェニレン基である請求項7に記載の液晶
性化合物。9. The liquid crystalline compound according to claim 7, wherein L is a 1,4-phenylene group or a fluorine-substituted 1,4-phenylene group.
合、Lは1,4−シクロヘキシレン基、1,4−フェニ
レン基またはフッ素置換1,4−フェニレン基である請
求項3に記載の液晶性化合物。10. The k and m are 1, l is 0, G is a covalent bond, and L is a 1,4-cyclohexylene group, a 1,4-phenylene group or a fluorine-substituted 1,4-phenylene group. The liquid crystal compound according to item 1.
が共有結合である請求項3に記載の液晶性化合物。11. k is 1, l and m are 0, G and L
The liquid crystal compound according to claim 3, wherein is a covalent bond.
シクロヘキシレン基、1,4−フェニレン基またはフッ
素置換1,4−フェニレン基である請求項1に記載の液
晶性化合物。12. G and L are independently 1,4-
The liquid crystalline compound according to claim 1, which is a cyclohexylene group, a 1,4-phenylene group or a fluorine-substituted 1,4-phenylene group.
を少なくとも一種類含有することを特徴とする液晶組成
物。13. A liquid crystal composition comprising at least one kind of the liquid crystal compound according to claim 1.
ずれかに記載の液晶性化合物を少なくとも1種類含有
し、第二成分として、一般式(II)、(III)および(I
V) 【化2】 (式中、R1 は炭素数1〜10のアルキル基を示し、V
はF、Cl、CF3 、OCF3 、OCF2 Hまたは炭素
数1〜10のアルキル基を示し、L1 、L2 、L 3 、L
4 はそれぞれ独立してHまたはFを示し、Z1 、Z2 は
それぞれ独立して−(CH2)2 −、−CH=CH−また
は共有結合を示し、環Aはトランス−14−シクロヘキ
シレン基または1,4−フェニレン基を示し、aは1ま
たは2を示し、bは0または1を示す。)からなる群か
ら選択される化合物を少なくとも1種類含有することを
特徴とする液晶組成物。14. The method according to claim 1 as the first component.
Contains at least one kind of liquid crystalline compound
As the second component, the general formulas (II), (III) and (I
V) [Chemical 2](In the formula, R1Represents an alkyl group having 1 to 10 carbon atoms, V
Is F, Cl, CF3, OCF3, OCF2H or carbon
Represents an alkyl group of the number 1 to 10, L1, L2, L 3, L
FourEach independently represent H or F, and Z1, Z2Is
Independently- (CH2)2-, -CH = CH-
Indicates a covalent bond, and ring A is trans-14-cyclohexyl.
Represents a silene group or a 1,4-phenylene group, and a is 1 or
Or 2 is shown, and b is 0 or 1. ) Consists of
Containing at least one compound selected from
A characteristic liquid crystal composition.
ずれかに記載の液晶性化合物を少なくとも1種類含有
し、第二成分として、一般式(V)、(VI)、(VII)、
(VIII)および(IX) 【化3】 (式中、R2 はF、炭素数1〜10のアルキル基または
炭素数2〜10のアルケニル基を示す。いずれにおいて
もそのうちの任意のメチレン基(−CH2 −)は酸素原
子(−O−)によって置換されていてもよいが、2つ以
上のメチレン基が連続して酸素原子に置換されることは
ない。Z3 は−(CH2)2 −、−COOまたは共有結合
を示し、L5 およびL6 はそれぞれ独立してHまたはF
を示し、D 1 はトランス−1,4−シクロヘキシレン
基、1,4−フェニレン基または1,3−ジオキサン−
2,5−ジイル基を示し、環Uはトランス−1,4−シ
クロヘキシレン基または1,4−フェニレン基を示し、
c、dはそれぞれ独立して0または1を示す。) 【化4】 (式中、R3 は炭素数1〜10のアルキル基を示し、L
7 はHまたはFを示し、eは0または1を示す。) 【化5】 (式中、R4 は炭素数1〜10のアルキル基を示し、I
はトランス−1,4−シクロヘキシレン基または1,4
−フェニレン基を示し、L8 、L9 はそれぞれに独立し
てHまたはFを示し、Z4 は−COO−または共有結合
を示し、Z5 は−COO−または−C≡C−を示し、
f、gはそれぞれ独立して0または1を示す。) 【化6】 (式中、R5 、R6 はそれぞれ独立して炭素数1〜10
のアルキル基、アルコキシ基またはアルコキシメチル基
を示し、Wはトランス−1,4−シクロヘキシレン基、
1,4−フェニレン基または1,3−ピリミジン−2,
5−ジイル基を示し、Kはトランス−1,4−シクロヘ
キシレン基または1,4−フェニレン基を示し、Z6 は
−C≡C−、−COO−、−(CH2)2 −または共有結
合を示す) 【化7】 (式中、R7 は炭素数1〜10のアルキル基またはアル
コキシ基を示し、R8 は炭素数1〜10のアルキル基を
示す。R8 の任意のメチレン基(−CH2 −)は酸素原
子(−O−)によって置換されていてもよいが、2つ以
上のメチレン基が連続して酸素原子に置換されることは
ない。Mはトランス−1,4−シクロヘキシレン基また
は1,3−ピリミジン−2,5−ジイル基を示し、環N
およびPはそれぞれ独立してトランス−1,4−シクロ
ヘキシレン基または1,4−フェニレン基を示し、Z7
は−COO−、−(CH2)2 −、−CH=CH−または
共結合を示し、Z8 は−C≡C−、−COO−、または
共有結合を示し、hは0または1を示し、L10はHまた
はFを示す。)からなる群から選択される化合物を少な
くとも1種類含有することを特徴とする液晶組成物。15. The method according to claim 1 as the first component.
Contains at least one kind of liquid crystalline compound
As the second component, general formulas (V), (VI), (VII),
(VIII) and (IX)(In the formula, R2Is F, an alkyl group having 1 to 10 carbon atoms, or
An alkenyl group having 2 to 10 carbon atoms is shown. In which
And any methylene group (-CH2−) Is the oxygen source
May be substituted by a child (-O-), but two or more
The above methylene groups are continuously replaced by oxygen atoms
Absent. Z3Is-(CH2)2-, -COO or covalent bond
Indicates LFiveAnd L6Are independently H or F
Indicates D 1Is trans-1,4-cyclohexylene
Group, 1,4-phenylene group or 1,3-dioxane-
2,5-diyl group is shown, and ring U is trans-1,4-diyl.
Represents a chlorhexylene group or a 1,4-phenylene group,
c and d each independently represent 0 or 1. ) [Chemical 4](In the formula, R3Represents an alkyl group having 1 to 10 carbon atoms, L
7Represents H or F, and e represents 0 or 1. ) [Chemical 5](In the formula, RFourRepresents an alkyl group having 1 to 10 carbon atoms, and I
Is a trans-1,4-cyclohexylene group or 1,4
Represents a phenylene group, L8, L9Are independent of each other
Indicates H or F, and ZFourIs -COO- or a covalent bond
, ZFiveRepresents -COO- or -C≡C-,
f and g each independently represent 0 or 1. ) [Chemical 6](In the formula, RFive, R6Each independently has 1 to 10 carbon atoms.
Alkyl group, alkoxy group or alkoxymethyl group of
And W is a trans-1,4-cyclohexylene group,
1,4-phenylene group or 1,3-pyrimidine-2,
5-diyl group, K is trans-1,4-cyclohexyl
A xylene group or a 1,4-phenylene group, Z6Is
-C≡C-, -COO-,-(CH2)2-Or shared
The result is shown below.(In the formula, R7Is an alkyl group having 1 to 10 carbon atoms or ar
R represents a Coxy group8Is an alkyl group having 1 to 10 carbon atoms
Show. R8Any methylene group (-CH2−) Is the oxygen source
May be substituted by a child (-O-), but two or more
The above methylene groups are continuously replaced by oxygen atoms
Absent. M is a trans-1,4-cyclohexylene group or
Represents a 1,3-pyrimidine-2,5-diyl group, a ring N
And P are each independently trans-1,4-cyclo
A hexylene group or a 1,4-phenylene group, Z7
Is -COO-,-(CH2)2-, -CH = CH- or
Indicates co-bond, Z8Is -C≡C-, -COO-, or
Represents a covalent bond, h represents 0 or 1, and LTenIs H again
Indicates F. ) A compound selected from the group consisting of
A liquid crystal composition comprising at least one kind.
ずれかに記載の液晶性化合物を少なくとも1種類含有
し、第二成分の一部分として、一般式(II)、(III)お
よび(IV)からなる群から選択される化合物を少なくと
も1種類含有し、第二成分の他の部分として、一般式
(V)、(VI)、(VII)、(VIII)および(IX)からな
る群から選択される化合物を少なくとも1種類含有する
ことを特徴とする液晶組成物。16. A liquid crystal compound according to any one of claims 1 to 12 is contained as a first component, and as a part of the second component, one of the general formulas (II), (III) and (IV ) Containing at least one compound selected from the group consisting of, and as the other part of the second component, a group consisting of general formulas (V), (VI), (VII), (VIII) and (IX) A liquid crystal composition comprising at least one selected compound.
液晶組成物を用いて構成した液晶表示素子。17. A liquid crystal display device constituted by using the liquid crystal composition according to any one of claims 13 to 16.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7332329A JPH08245441A (en) | 1994-12-22 | 1995-12-20 | Liquid crystal compound containing fluoro-substituted alkyl group and liquid crystal composition |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP32021894 | 1994-12-22 | ||
JP6-320218 | 1994-12-22 | ||
JP7332329A JPH08245441A (en) | 1994-12-22 | 1995-12-20 | Liquid crystal compound containing fluoro-substituted alkyl group and liquid crystal composition |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH08245441A true JPH08245441A (en) | 1996-09-24 |
Family
ID=26570002
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7332329A Pending JPH08245441A (en) | 1994-12-22 | 1995-12-20 | Liquid crystal compound containing fluoro-substituted alkyl group and liquid crystal composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH08245441A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010090114A (en) * | 2008-09-12 | 2010-04-22 | Agc Seimi Chemical Co Ltd | Compound having 1,2-dicyclohexyltetrafluoroethylene skeleton and method for producing the same |
-
1995
- 1995-12-20 JP JP7332329A patent/JPH08245441A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010090114A (en) * | 2008-09-12 | 2010-04-22 | Agc Seimi Chemical Co Ltd | Compound having 1,2-dicyclohexyltetrafluoroethylene skeleton and method for producing the same |
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