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JPH08236690A - Three-dimensional mounting module and manufacture thereof - Google Patents

Three-dimensional mounting module and manufacture thereof

Info

Publication number
JPH08236690A
JPH08236690A JP3571695A JP3571695A JPH08236690A JP H08236690 A JPH08236690 A JP H08236690A JP 3571695 A JP3571695 A JP 3571695A JP 3571695 A JP3571695 A JP 3571695A JP H08236690 A JPH08236690 A JP H08236690A
Authority
JP
Japan
Prior art keywords
semiconductor chip
wiring
metal
exposed
photoresist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3571695A
Other languages
Japanese (ja)
Other versions
JP3032692B2 (en
Inventor
Akira Nagata
公 永田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Electric Works Co Ltd
Original Assignee
Matsushita Electric Works Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Works Ltd filed Critical Matsushita Electric Works Ltd
Priority to JP3571695A priority Critical patent/JP3032692B2/en
Publication of JPH08236690A publication Critical patent/JPH08236690A/en
Application granted granted Critical
Publication of JP3032692B2 publication Critical patent/JP3032692B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)

Abstract

PURPOSE: To laminate a large number of semiconductor chips by laminating the wiring pads exposed to the side faces of a semiconductor chip and other exposed wiring pads while connecting through a wiring part formed on each side face of the semiconductor chip through metal deposition. CONSTITUTION: A plurality of semiconductor chips 1, each formed with a semiconductor laminated circuit, are laminated vertically. In other words, the wiring pads 2 exposed to the side face of the semiconductor chips 1 are connected with the wiring pads 2 exposed to the side face of another semiconductor chip 1 laminated thereon through the wiring parts 3 formed on each side face of the semiconductor chips 1 through metal 5 deposition. When the wiring pads 2 provided on the side face of the semiconductor chips 1 are interconnected through the wiring parts 3, the wiring pads 2 can be prevented from being concealed even if another semiconductor chip 1 is laminated on one semiconductor chip 1. With such arrangement, a large number of semiconductor chips 1 can be laminated.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、複数個の半導体チップ
を一つのパッケージに実装するために用いられる三次元
実装(マルチチップ)モジュール及びその製造方法に関
するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a three-dimensional mounting (multi-chip) module used for mounting a plurality of semiconductor chips in one package and a manufacturing method thereof.

【0002】[0002]

【従来の技術】従来より、複数個の半導体チップをまと
めてモジュールを形成し、このモジュールを一つのパッ
ケージに実装することがおこなわれているが、その大部
分は半導体チップを隣り同士に並べて配置してパッケー
ジに実装しているために、実装面積が大きくなるという
問題があった。そこで複数個の半導体チップを上下に積
層して一つのパッケージに実装することが試みられてい
る。
2. Description of the Related Art Conventionally, it has been practiced to form a module by combining a plurality of semiconductor chips and to mount the module in one package, but most of the semiconductor chips are arranged side by side. Then, there is a problem that the mounting area becomes large because it is mounted in the package. Therefore, it has been attempted to stack a plurality of semiconductor chips on top of each other and mount them in one package.

【0003】例えば特開昭64−28856号公報では
図10に示すように、第一層半導体チップ30の上に第
二層半導体チップ31を積層すると共に第二層半導体チ
ップ31の上に第三層半導体チップ32を積層し、各半
導体チップ30、31、32の上面に設けたパッド34
同士をワイヤ35でボンディングしてモジュールを形成
し、パッケージのパッド36と各半導体チップ30、3
1、32の上面に設けたパッド34とをワイヤ35でボ
ンディングしてモジュールをパッケージに実装すること
がおこなわれている。
For example, in Japanese Unexamined Patent Publication No. 64-28856, as shown in FIG. 10, a second layer semiconductor chip 31 is stacked on the first layer semiconductor chip 30, and a third layer is formed on the second layer semiconductor chip 31. Pad 34 provided on the upper surface of each semiconductor chip 30, 31, 32
The modules are formed by bonding the wires to each other with the wires 35, and the pads 36 of the package and the semiconductor chips 30, 3 are formed.
A module is mounted on a package by bonding a pad 34 provided on the upper surfaces of the substrates 1 and 32 with a wire 35.

【0004】また特開平6−5665号公報には図11
に示すように、上面及び側面に開口する切欠部40に電
極部41を形成した複数のICチップ42を重ね合わせ
て実装し、帯状の電極43を設けた金属棒44を切欠部
40に差し込むと共にICチップ42の電極部41と金
属棒44の電極43とを接触させて上下のICチップ4
2を電気的に導通させるようにしたマルチICチップが
記載されている。
Further, in Japanese Patent Laid-Open No. 6-5665, FIG.
As shown in FIG. 3, a plurality of IC chips 42 each having an electrode portion 41 formed on the cutout portion 40 opened on the upper surface and the side surface are stacked and mounted, and a metal rod 44 having a strip-shaped electrode 43 is inserted into the cutout portion 40. The electrode portion 41 of the IC chip 42 and the electrode 43 of the metal rod 44 are brought into contact with each other to bring the upper and lower IC chips 4 into contact with each other.
There is described a multi-IC chip in which 2 is electrically connected.

【0005】[0005]

【発明が解決しようとする課題】しかし上記特開昭64
−28856号公報のものでは、パッド34を半導体チ
ップ30、31、32の上面に露出させるために第一層
半導体チップ30よりも第二層半導体チップ31を、ま
た第二層半導体チップ31よりも第三層半導体チップ3
2をそれぞれ小さく形成しなければならず、半導体チッ
プの積層数に限界があって多数の半導体チップを積層す
ることができないという問題があった。また上記特開平
6−5665号公報のものでは、金属棒44を高い精度
で位置決めして差し込まなければなければならず、マル
チICチップを簡単に製造をおこなうことができないと
いう問題があった。
However, the above-mentioned Japanese Patent Application Laid-Open No. 64
No. 28856 discloses a second layer semiconductor chip 31 rather than the first layer semiconductor chip 30 and a second layer semiconductor chip 31 rather than the first layer semiconductor chip 30 in order to expose the pads 34 on the upper surfaces of the semiconductor chips 30, 31, 32. Third layer semiconductor chip 3
2 must be formed smaller, and there is a problem that a large number of semiconductor chips cannot be stacked due to a limit in the number of stacked semiconductor chips. Further, in the above-mentioned Japanese Laid-Open Patent Publication No. 6-5665, the metal rod 44 must be positioned and inserted with high accuracy, and there is a problem that the multi-IC chip cannot be easily manufactured.

【0006】本発明は上記の点に鑑みてなされたもので
あり、多数の半導体チップを積層することができ、しか
も簡単に製造することができる三次元実装モジュール及
びその製造方法を提供することを目的とするものであ
る。
The present invention has been made in view of the above points, and it is an object of the present invention to provide a three-dimensional mounting module which can stack a large number of semiconductor chips and can be easily manufactured, and a manufacturing method thereof. It is intended.

【0007】[0007]

【課題を解決するための手段】本発明に係る三次元実装
モジュールは、半導体チップ1の側面に露出させた配線
用パッド2と、この半導体チップ1の上に積層される他
の半導体チップ1の側面に露出させた配線用パッド2と
を金属5の蒸着にて半導体チップ1の各側面に形成され
る配線部3で接続して形成して成ることを特徴とするも
のである。
A three-dimensional mounting module according to the present invention includes a wiring pad 2 exposed on a side surface of a semiconductor chip 1 and another semiconductor chip 1 stacked on the semiconductor chip 1. It is characterized in that it is formed by connecting the wiring pad 2 exposed on the side surface to the wiring portion 3 formed on each side surface of the semiconductor chip 1 by vapor deposition of metal 5.

【0008】また本発明に係る三次元実装モジュールの
製造方法は、側面に配線用パッド2を露出させて形成し
た半導体チップ1の上に他の半導体チップ1を積層し、
半導体チップ1の側面にフォトレジスト4を形成すると
共にフォトレジスト4に露光及び現像処理を施して配線
用パッド2部分及びその周辺部分のフォトレジスト4を
除去し、半導体チップ1の側面に金属5を蒸着して各半
導体チップ1の配線用パッド2同士を接続する配線部3
を形成すると共に配線部3以外の金属5とフォトレジス
ト4とを除去することを特徴とするものである。
In the method for manufacturing a three-dimensional mounting module according to the present invention, another semiconductor chip 1 is laminated on the semiconductor chip 1 formed by exposing the wiring pads 2 on the side surface,
The photoresist 4 is formed on the side surface of the semiconductor chip 1, and the photoresist 4 is exposed and developed to remove the photoresist 4 on the wiring pad 2 portion and its peripheral portion. Wiring part 3 for connecting wiring pads 2 of each semiconductor chip 1 by vapor deposition
And the metal 5 other than the wiring part 3 and the photoresist 4 are removed.

【0009】また本発明に係る三次元実装モジュールの
製造方法は、側面に配線用パッド2を露出させて形成し
た半導体チップ1の上に他の半導体チップ1を積層し、
半導体チップ1の側面に金属5を蒸着すると共に金属5
の表面にフォトレジスト4を形成し、フォトレジスト4
に露光及び現像処理を施して配線用パッド2部分及びそ
の周辺部分以外のフォトレジスト4を除去して金属5を
露出させると共に露出した金属5をエッチングにて除去
して各半導体チップ1の配線用パッド2同士を接続する
配線部3を形成することを特徴とするものである。
In the method for manufacturing a three-dimensional mounting module according to the present invention, another semiconductor chip 1 is laminated on the semiconductor chip 1 formed by exposing the wiring pads 2 on the side surface,
The metal 5 is deposited on the side surface of the semiconductor chip 1 and
Photoresist 4 is formed on the surface of the
Is exposed and developed to remove the photoresist 4 except for the wiring pad 2 portion and its peripheral portion to expose the metal 5, and the exposed metal 5 is removed by etching for wiring of each semiconductor chip 1. The wiring part 3 for connecting the pads 2 to each other is formed.

【0010】また本発明に係る三次元実装モジュールの
製造方法は、側面に配線用パッド2を露出させて形成し
た半導体チップ1の上に他の半導体チップ1を積層し、
半導体チップ1の側面に金属5を蒸着すると共に配線用
パッド2部分及びその周辺部分以外の金属5を物理的手
段にて除去して各半導体チップ1の配線用パッド2同士
を接続する配線部3を形成することを特徴とするもので
ある。
In the method for manufacturing a three-dimensional mounting module according to the present invention, another semiconductor chip 1 is stacked on the semiconductor chip 1 formed by exposing the wiring pads 2 on the side surface,
A wiring portion 3 for connecting the wiring pads 2 of each semiconductor chip 1 by vapor-depositing the metal 5 on the side surface of the semiconductor chip 1 and removing the metal 5 except the wiring pad 2 portion and its peripheral portion by physical means. Is formed.

【0011】[0011]

【作用】半導体チップ1の側面に露出させた配線用パッ
ド2と、この半導体チップ1の上に積層される他の半導
体チップ1の側面に露出させた配線用パッド2とを金属
5の蒸着にて半導体チップ1の各側面に形成される配線
部3で接続して形成したので、半導体チップ1の側面に
設けた配線用パッド2同士を配線部3で接続することで
半導体チップ1の上に他の半導体チップ1を積層しても
配線用パッド2が覆い隠されないようにすることができ
る。
The wiring pad 2 exposed on the side surface of the semiconductor chip 1 and the wiring pad 2 exposed on the side surface of another semiconductor chip 1 stacked on the semiconductor chip 1 are deposited on the metal 5. Since the wiring pads 3 formed on the side surfaces of the semiconductor chip 1 are connected to each other by connecting the wiring pads 2 provided on the side surfaces of the semiconductor chip 1 to each other on the semiconductor chip 1, It is possible to prevent the wiring pad 2 from being covered even if another semiconductor chip 1 is stacked.

【0012】また半導体チップ1の側面にフォトレジス
ト4を形成すると共にフォトレジスト4に露光及び現像
処理を施して配線用パッド2部分及びその周辺部分のフ
ォトレジスト4を除去し、半導体チップ1の側面に金属
5を蒸着して各半導体チップ1の配線用パッド2同士を
接続する配線部3を形成すると共に配線部3以外の金属
5とフォトレジスト4とを除去したり、或いは半導体チ
ップ1の側面に金属5を蒸着すると共に金属5の表面に
フォトレジスト4を形成し、フォトレジスト4に露光及
び現像処理を施して配線用パッド2部分及びその周辺部
分以外のフォトレジスト4を除去して金属5を露出させ
ると共に露出した金属5をエッチングにて除去して各半
導体チップ1の配線用パッド2同士を接続する配線部3
を形成したり、或いは半導体チップ1の側面に金属5を
蒸着すると共に配線用パッド2部分及びその周辺部分以
外の金属5を物理的手段にて除去して各半導体チップ1
の配線用パッド2同士を接続する配線部3を形成したの
で、金属5の蒸着によって形成される配線部3で配線用
パッド2同士を接続することによって、半導体チップ1
同士を電気的に導通させる際に金属棒等の別部材を用い
ないようにすることができる。
Further, the photoresist 4 is formed on the side surface of the semiconductor chip 1, and the photoresist 4 is exposed and developed to remove the photoresist 4 on the wiring pad 2 portion and its peripheral portion. A metal 5 is vapor-deposited on the surface of the semiconductor chip 1 to form a wiring portion 3 for connecting the wiring pads 2 of each semiconductor chip 1, and the metal 5 and the photoresist 4 other than the wiring portion 3 are removed, or a side surface of the semiconductor chip 1 The metal 5 is deposited on the surface of the metal 5, and the photoresist 4 is formed on the surface of the metal 5. The photoresist 4 is exposed and developed to remove the photoresist 4 except the wiring pad 2 portion and its peripheral portion. And the exposed metal 5 are removed by etching to connect the wiring pads 2 of the respective semiconductor chips 1 to each other.
Or forming metal 5 on the side surface of the semiconductor chip 1 and removing the metal 5 except the wiring pad 2 portion and its peripheral portion by a physical means.
Since the wiring portion 3 for connecting the wiring pads 2 to each other is formed, the wiring pads 2 are connected to each other by the wiring portion 3 formed by vapor deposition of the metal 5 to thereby form the semiconductor chip 1
It is possible not to use a separate member such as a metal rod when electrically connecting the two.

【0013】[0013]

【実施例】以下本発明を実施例によって詳述する。図1
には本発明の三次元実装モジュールの一例が示してあ
る。1は半導体集積回路が形成された半導体チップであ
り、複数枚の半導体チップ1が上下に積層されている。
半導体チップ1の上面には全面に亘ってSiO2 やSN
x 等の保護膜14を成長させて形成してある。2はアル
ミニウム(Al)等で形成され半導体集積回路と導通す
る配線用パッドであって、保護膜14に上面と側面に開
口する切欠部16を設けて外部に露出させてある。3は
金属5の蒸着によって形成される配線部であって、この
配線部3によって異なる半導体チップ1の配線用パッド
2同士を電気的に接続してある。15はAl等で形成さ
れ半導体集積回路と導通するワイヤボンディング用パッ
ドであって、最上の半導体チップ1の保護膜14に上面
が開口する開口部17を設けて露出させてある。このよ
うに形成される三次元実装モジュールはワイヤボンディ
ング用パッド15とパッケージの端子のパッドとをワイ
ヤボンディングするようにしてパッケージに実装され
る。
EXAMPLES The present invention will be described in detail below with reference to examples. FIG.
Shows an example of the three-dimensional mounting module of the present invention. Reference numeral 1 is a semiconductor chip on which a semiconductor integrated circuit is formed, and a plurality of semiconductor chips 1 are vertically stacked.
The upper surface of the semiconductor chip 1 is entirely covered with SiO 2 or SN.
The protective film 14 such as x is grown and formed. Reference numeral 2 is a wiring pad made of aluminum (Al) or the like and electrically connected to the semiconductor integrated circuit. The protective film 14 is provided with a notch 16 opening to the upper surface and the side surface and is exposed to the outside. A wiring portion 3 is formed by vapor deposition of a metal 5, and the wiring portions 3 electrically connect the wiring pads 2 of different semiconductor chips 1 to each other. Reference numeral 15 is a wire bonding pad made of Al or the like that is electrically connected to the semiconductor integrated circuit, and is exposed by providing an opening 17 having an upper surface opened in the protective film 14 of the uppermost semiconductor chip 1. The three-dimensional mounting module thus formed is mounted on the package by wire-bonding the wire bonding pads 15 and the package terminal pads.

【0014】上記三次元実装モジュールにおいて、各半
導体チップ1間の絶縁は保護膜14によっておこない、
また配線部3同士の絶縁は、半導体チップ1の基板20
の導電型、電位と配線部3の電位とがショットキ接合の
逆バイアスとなるようにすることでおこなうことができ
る。このような三次元実装モジュールでは、上下方向に
半導体チップ1を多数に重ねて形成してあるので、半導
体チップ1を隣りに並べて実装するよりも占有面積を小
さくすることができる。また半導体チップ1の側面に露
出した配線用パッド2を配線部3で接続するようにして
あるので、上側に積層される半導体チップ1の大きさを
小さくする必要がなく、従って原理的には何層にも半導
体チップ1を積層することができる。そして例えば厚さ
50μmの半導体チップ1を20枚用いても、三次元実
装モジュールの厚さは1mmにしかならず、相当の高密
度実装が可能となる。
In the above three-dimensional mounting module, the insulation between the semiconductor chips 1 is provided by the protective film 14.
In addition, the insulation between the wiring parts 3 is provided by the substrate 20 of the semiconductor chip 1.
This can be performed by setting the conductivity type and the potential of the above and the potential of the wiring portion 3 to be the reverse bias of the Schottky junction. In such a three-dimensional mounting module, since a large number of semiconductor chips 1 are stacked in the vertical direction, the occupied area can be reduced as compared with mounting the semiconductor chips 1 side by side. Further, since the wiring pads 2 exposed on the side surface of the semiconductor chip 1 are connected by the wiring portion 3, it is not necessary to reduce the size of the semiconductor chip 1 stacked on the upper side, and therefore, in principle The semiconductor chip 1 can also be laminated on the layers. Then, for example, even if 20 semiconductor chips 1 having a thickness of 50 μm are used, the thickness of the three-dimensional mounting module is only 1 mm, and a considerably high density mounting becomes possible.

【0015】また半導体チップ1は50μm以下の厚さ
にも形成することもでき、しかも半導体チップ1として
図9に示すようなSOI(silcon on insulator )基板
等が普及しだすと、SIO基板等は基板20と半導体素
子21との間にSiO2 膜22を介在させて基板20と
半導体素子21とを電気的に分離しているために、基板
20の厚みが半導体素子21の物性に大きな影響を与え
ないようになっており、従って基板20の厚みを格段に
薄くすることができて三次元実装モジュールの厚みを非
常に薄くすることができる。
The semiconductor chip 1 can also be formed to a thickness of 50 μm or less, and when an SOI (silcon on insulator) substrate or the like as shown in FIG. 9 becomes widespread as the semiconductor chip 1, the SIO substrate or the like becomes a substrate. Since the SiO 2 film 22 is interposed between the semiconductor element 21 and the semiconductor element 21 to electrically separate the substrate 20 and the semiconductor element 21, the thickness of the substrate 20 greatly affects the physical properties of the semiconductor element 21. Therefore, the thickness of the substrate 20 can be remarkably reduced, and the thickness of the three-dimensional mounting module can be remarkably reduced.

【0016】次に三次元実装モジュールの製造方法につ
いて詳述する。図2には半導体チップ1の形成工程が示
してある。図2(a)に示す10はシリコン等で作成さ
れるウェハであって、このウェハ10にはデバイスが形
成してある。次に図2(b)に示すようにウェハ10の
上の全面にアルミニウム等の金属を蒸着して金属層12
を形成する。次に図2(c)に示すように金属層12の
必要箇所のみを残して不要部分を除去してパッド部13
を形成する。次に図2(d)に示すようにパッド部13
を覆うようにウェハ10の上にSiO2 やSNx等の保
護膜14を成長させて形成する。次に図2(e)に示す
ように後述するワイヤボンディング用パッド15として
用いられるパッド部13の上の保護膜14をエッチング
等で除去して開口部17を形成する。その後図2(e)
の破線で示すようにウェハ10を所定の大きさに切断す
ると共に切断端面を研磨して図3(c)に示すように保
護膜14に側面と上面とに開口する切欠部16を形成
し、最端部に位置するパッド部13を配線用パッド2と
して露出させることによって、図3(a)(b)に示す
ような基板20の上に配線用パッド部2とワイヤボンデ
ィング用パッド15と保護膜14とを形成した半導体チ
ップ1が作成される。尚、最上に積層される半導体チッ
プ1以外では開口部17を設ける必要がない。
Next, a method of manufacturing the three-dimensional mounting module will be described in detail. FIG. 2 shows a process of forming the semiconductor chip 1. Reference numeral 10 shown in FIG. 2A is a wafer made of silicon or the like, and devices are formed on the wafer 10. Next, as shown in FIG. 2B, a metal such as aluminum is deposited on the entire surface of the wafer 10 to deposit the metal layer 12 thereon.
To form. Next, as shown in FIG. 2C, the unnecessary portion is removed by leaving only the required portion of the metal layer 12 and the pad portion 13 is formed.
To form. Next, as shown in FIG.
A protective film 14 such as SiO 2 or SN x is grown and formed on the wafer 10 so as to cover it. Next, as shown in FIG. 2E, the protective film 14 on the pad portion 13 used as a wire bonding pad 15 described later is removed by etching or the like to form an opening 17. Then Fig. 2 (e)
3, the wafer 10 is cut into a predetermined size and the cut end face is polished to form a cutout portion 16 opening to the side surface and the upper surface of the protective film 14 as shown in FIG. 3C. By exposing the pad portion 13 located at the outermost end as the wiring pad 2, the wiring pad portion 2, the wire bonding pad 15, and the protection on the substrate 20 as shown in FIGS. The semiconductor chip 1 having the film 14 formed thereon is produced. Note that it is not necessary to provide the opening 17 except for the semiconductor chip 1 stacked on the top.

【0017】図4には上記のように作成される半導体チ
ップ1を用いた三次元実装モジュールの製造法方法の一
例が示してある。この実施例では先ず上記半導体チップ
1の裏面を研磨して半導体チップ1の厚みをできるだけ
薄く(約50μm)し、この半導体チップ1を図4
(a)に示すように上下に重ね合わせて接着する。この
時電気的に接合される配線用チップ2を同じ方向に向け
る。次にこの積層物の側面を研磨して平坦にすると共に
浸漬やスプレー等の手段で図4(b)に斜線で示すよう
に積層物の全面にフォトレジスト4を形成する。次にこ
の積層物に光を照射して図4(c)に示すように配線用
チップ2の部分及びその周辺部分のフォトレジスト4が
抜けるように露光し、この後現像して配線用チップ2の
部分及びその周辺部分のフォトレジスト4を除去する。
次に図4(d)の矢印で示すように積層物の斜め上方か
らアルミニウム(Al)等の金属5(点々模様で示す)
を蒸着してフォトレジスト4が除去された配線用チップ
2の部分及びその周辺部分に配線部3を形成し、最後に
残りのフォトレジスト4とその上の金属5とをリフトオ
フ法等で除去することによって、図4(e)に示すよう
な三次元実装モジュールを形成することができる。尚、
図4においてはワイヤボンディング用パッド15は図示
省略されている。また図4においては半導体チップ1の
一側面のみに配線用チップ2が設けてあるが、他の側面
に配線用チップ2を設けてもよく、上記と同様にして配
線部3が形成される。さらに図4においては半導体チッ
プ1を二枚しか積層していないが、何層重ねてもよい。
FIG. 4 shows an example of a method of manufacturing a three-dimensional mounting module using the semiconductor chip 1 produced as described above. In this embodiment, first, the back surface of the semiconductor chip 1 is polished to make the thickness of the semiconductor chip 1 as thin as possible (about 50 μm).
As shown in (a), they are stacked on top of each other and bonded. At this time, the wiring chips 2 to be electrically joined are oriented in the same direction. Next, the side surface of this laminated body is polished to be flat, and a photoresist 4 is formed on the entire surface of the laminated body by means of dipping, spraying or the like as shown by hatching in FIG. Next, this laminated product is irradiated with light so that the photoresist 4 in the wiring chip 2 portion and the peripheral portion thereof is exposed as shown in FIG. And the photoresist 4 in the peripheral portion is removed.
Next, as shown by the arrow in FIG. 4 (d), the metal 5 such as aluminum (Al) is shown diagonally above the laminate (indicated by dots).
Is deposited to form the wiring portion 3 on the portion of the wiring chip 2 from which the photoresist 4 has been removed and its peripheral portion, and finally, the remaining photoresist 4 and the metal 5 thereon are removed by a lift-off method or the like. As a result, a three-dimensional mounting module as shown in FIG. 4 (e) can be formed. still,
In FIG. 4, the wire bonding pad 15 is not shown. Although the wiring chip 2 is provided only on one side surface of the semiconductor chip 1 in FIG. 4, the wiring chip 2 may be provided on the other side surface, and the wiring portion 3 is formed in the same manner as described above. Further, although only two semiconductor chips 1 are stacked in FIG. 4, any number of layers may be stacked.

【0018】図5には他の三次元実装モジュールの製造
方法が示してある。先ず上記半導体チップ1の裏面を研
磨して半導体チップ1の厚みをできるだけ薄く(約50
μm)し、この半導体チップ1を図5(a)に示すよう
に上下に重ね合わせて接着する。この時電気的に接合さ
れる配線用チップ2を同じ方向に向ける。次に図5
(b)に矢印で示すようにこの積層物の側面を研磨して
平坦にすると共に積層物の斜め上方から積層物の側面に
Al等の金属5(点々模様で示す)を蒸着する。次に浸
漬やスプレー等の手段で図5(c)に斜線で示すように
積層物の全面にフォトレジスト4を形成する。次にこの
積層物に光を照射して図5(d)に示すように配線用チ
ップ2の部分及びその周辺部分のフォトレジスト4が残
るように露光、現像する。次にフォトレジスト4で覆わ
れない部分の金属5を燐酸や塩酸等の薬液でエッチング
して除去して残った金属5を配線部3として形成し、そ
の後残った金属5の表面のフォトレジスト4を除去する
ことによって、図5(e)に示すような三次元実装モジ
ュールを形成することができる。尚、図5においてはワ
イヤボンディング用パッド15は図示省略されている。
また図5においては半導体チップ1の一側面のみに配線
用チップ2が設けてあるが、他の側面に配線用チップ2
を設けてもよく、上記と同様にして配線部3が形成され
る。さらに図5においては半導体チップ1を二枚しか積
層していないが、何層重ねてもよい。
FIG. 5 shows another method for manufacturing a three-dimensional mounting module. First, the back surface of the semiconductor chip 1 is polished to reduce the thickness of the semiconductor chip 1 as much as possible (about 50
μm), and this semiconductor chip 1 is vertically overlapped and bonded as shown in FIG. At this time, the wiring chips 2 to be electrically joined are oriented in the same direction. Next in FIG.
As shown by the arrow in (b), the side surface of this laminate is polished to be flat, and a metal 5 such as Al (shown by a dotted pattern) is vapor-deposited on the side surface of the laminate obliquely from above. Next, a photoresist 4 is formed on the entire surface of the layered product by means of dipping, spraying or the like, as shown by the hatching in FIG. Next, this laminate is irradiated with light and exposed and developed so that the photoresist 4 on the wiring chip 2 and its peripheral portion remains as shown in FIG. 5D. Next, the metal 5 in the portion not covered with the photoresist 4 is etched and removed with a chemical solution such as phosphoric acid or hydrochloric acid to form the remaining metal 5 as the wiring portion 3, and then the photoresist 4 on the surface of the remaining metal 5 is formed. By removing the, it is possible to form a three-dimensional mounting module as shown in FIG. The wire bonding pad 15 is not shown in FIG.
Further, in FIG. 5, the wiring chip 2 is provided only on one side surface of the semiconductor chip 1, but the wiring chip 2 is provided on the other side surface.
May be provided, and the wiring portion 3 is formed in the same manner as above. Further, although only two semiconductor chips 1 are stacked in FIG. 5, any number of layers may be stacked.

【0019】図6には他の三次元実装モジュールの製造
方法が示してある。先ず上記半導体チップ1の裏面を研
磨して半導体チップ1の厚みをできるだけ薄く(約50
μm)し、この半導体チップ1を図6(a)に示すよう
に上下に重ね合わせて接着する。この時電気的に接合さ
れる配線用チップ2を同じ方向に向ける。次にこの積層
物の側面を研磨して平坦にすると共に図6(b)に矢印
で示すように積層物の斜め上方から積層物の側面にAl
等の金属5(点々模様で示す)を蒸着する。次に配線用
チップ2の部分及びその周辺部分のフォトレジスト4が
残るように、図6(c)に矢印で示すように高出力レー
ザを金属5に照射して不要部分の金属5を蒸発させて除
去したり、或いは図6(d)に示すようにグラインダー
19等で不要部分の金属5を削り取ることによって残っ
た金属5を配線部3として形成し、図6(e)に示すよ
うな三次元実装モジュールを作成することができる。
尚、図6においてはワイヤボンディング用パッド15は
図示省略されている。また図6においては半導体チップ
1の一側面のみに配線用チップ2が設けてあるが、他の
側面に配線用チップ2を設けてもよく、上記と同様にし
て配線部3が形成される。さらに図6においては半導体
チップ1を二枚しか積層していないが、何層重ねてもよ
い。
FIG. 6 shows another method for manufacturing a three-dimensional mounting module. First, the back surface of the semiconductor chip 1 is polished to reduce the thickness of the semiconductor chip 1 as much as possible (about 50
μm), and the semiconductor chip 1 is vertically overlapped and bonded as shown in FIG. At this time, the wiring chips 2 to be electrically joined are oriented in the same direction. Next, the side surface of this laminate is polished to be flat, and as shown by an arrow in FIG.
And the like metal 5 (indicated by dots) is deposited. Next, as shown by the arrow in FIG. 6C, the metal 5 is irradiated with a high-power laser so that the photoresist 4 in the wiring chip 2 portion and the peripheral portion thereof remains, and the unnecessary portion of the metal 5 is evaporated. 6E, or the remaining metal 5 is formed as the wiring portion 3 by scraping off the unnecessary portion of the metal 5 with the grinder 19 or the like as shown in FIG. 6D. The original implementation module can be created.
The wire bonding pad 15 is not shown in FIG. Although the wiring chip 2 is provided only on one side surface of the semiconductor chip 1 in FIG. 6, the wiring chip 2 may be provided on the other side surface, and the wiring portion 3 is formed in the same manner as described above. Further, although only two semiconductor chips 1 are stacked in FIG. 6, any number of layers may be stacked.

【0020】図7には本発明の三次元実装モジュールに
用いられる他の半導体チップ1が示してある。この半導
体チップ1は図2(e)に示すようにウェハ10を所定
の大きさに切断した後、切断端面を研磨して半導体チッ
プ1の側面に配線用パッド2の側面のみを露出させるよ
うにしたものである。つまりこの半導体チップ1には切
欠部16を設けないようにしたものである。
FIG. 7 shows another semiconductor chip 1 used in the three-dimensional mounting module of the present invention. In this semiconductor chip 1, the wafer 10 is cut into a predetermined size as shown in FIG. 2E, and then the cut end surface is polished to expose only the side surface of the wiring pad 2 to the side surface of the semiconductor chip 1. It was done. That is, the semiconductor chip 1 does not have the cutout portion 16.

【0021】この図7に示す半導体チップ1を用いて上
記と同様にすることによって図8に示すような三次元実
装モジュールを形成することができるが、図1のものと
比較して図8の方が配線部3の幅寸法を小さくすること
ができる。
By using the semiconductor chip 1 shown in FIG. 7 in the same manner as above, a three-dimensional mounting module as shown in FIG. 8 can be formed. The width dimension of the wiring portion 3 can be made smaller.

【0022】[0022]

【発明の効果】上記のように本発明は、半導体チップの
側面に露出させた配線用パッドと、この半導体チップの
上に積層される他の半導体チップの側面に露出させた配
線用パッドとを金属の蒸着にて半導体チップの各側面に
形成される配線部で接続して形成したので、半導体チッ
プの側面に設けた配線用パッド同士を接続することで半
導体チップの上に他の半導体チップを積層しても配線用
パッドが覆い隠されないようにすることができ、多数の
半導体チップを積層することができるものである。
As described above, according to the present invention, the wiring pad exposed on the side surface of the semiconductor chip and the wiring pad exposed on the side surface of another semiconductor chip stacked on this semiconductor chip are provided. Since it was formed by connecting the wiring parts formed on each side surface of the semiconductor chip by vapor deposition of metal, by connecting the wiring pads provided on the side surface of the semiconductor chip to another semiconductor chip on the semiconductor chip. Even if stacked, the wiring pads can be prevented from being covered up, and a large number of semiconductor chips can be stacked.

【0023】また半導体チップの側面にフォトレジスト
を形成すると共にフォトレジストに露光及び現像処理を
施して配線用パッド部分及びその周辺部分のフォトレジ
ストを除去し、半導体チップの側面に金属を蒸着して各
半導体チップの配線用パッド同士を接続する配線部を形
成すると共に配線部以外の金属とフォトレジストとを除
去したり、或いは半導体チップの側面に金属を蒸着する
と共に金属の表面にフォトレジストを形成し、フォトレ
ジストに露光及び現像処理を施して配線用パッド部分及
びその周辺部分以外のフォトレジストを除去して金属を
露出させると共に露出した金属をエッチングにて除去し
て各半導体チップの配線用パッド同士を接続する配線部
を形成したり、或いは半導体チップの側面に金属を蒸着
すると共に配線用パッド部分及びその周辺部分以外の金
属を物理的手段にて除去して各半導体チップの配線用パ
ッド同士を接続する配線部を形成することによって、半
導体チップ同士を電気的に導通させる際に金属棒等の別
部材を用いないようにすることができ、従って金属棒の
位置決めをおこなう必要がなくなって、三次元実装モジ
ュールを簡単に製造することができるものである。
Further, a photoresist is formed on the side surface of the semiconductor chip, the photoresist is exposed and developed to remove the photoresist on the wiring pad portion and its peripheral portion, and metal is deposited on the side surface of the semiconductor chip. Forming a wiring part for connecting the wiring pads of each semiconductor chip and removing the metal and photoresist other than the wiring part, or depositing a metal on the side surface of the semiconductor chip and forming a photoresist on the surface of the metal Then, the photoresist is exposed and developed to remove the photoresist other than the wiring pad portion and its peripheral portion to expose the metal, and the exposed metal is removed by etching to form the wiring pad of each semiconductor chip. For wiring while forming a wiring part that connects each other or depositing metal on the side surface of the semiconductor chip By removing the metal other than the pad portion and its peripheral portion by a physical means to form a wiring portion that connects the wiring pads of each semiconductor chip, a metal is used when electrically connecting the semiconductor chips to each other. Since it is possible to avoid using a separate member such as a rod, it is not necessary to position the metal rod, and the three-dimensional mounting module can be easily manufactured.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の三次元実装モジュールの一実施例を示
す斜視図である。
FIG. 1 is a perspective view showing an embodiment of a three-dimensional mounting module of the present invention.

【図2】本発明に用いる半導体チップの製造工程を示す
(a)乃至(e)は断面図である。
2A to 2E are cross-sectional views showing a manufacturing process of a semiconductor chip used in the present invention.

【図3】(a)は半導体チップの断面図、(b)は平面
図、(c)は一部の斜視図である。
3A is a sectional view of a semiconductor chip, FIG. 3B is a plan view, and FIG. 3C is a partial perspective view.

【図4】本発明の三次元実装モジュールの製造工程の一
実施例を示す(a)乃至(e)は斜視図である。
FIG. 4A to FIG. 4E are perspective views showing an embodiment of the manufacturing process of the three-dimensional mounting module of the present invention.

【図5】同上の他の実施例の製造工程を示す(a)乃至
(e)は斜視図である。
5A to 5E are perspective views showing manufacturing steps of another embodiment of the same.

【図6】同上のさらに他の実施例の製造工程を示す
(a)乃至(e)は斜視図である。
6 (a) to 6 (e) are perspective views showing a manufacturing process of still another embodiment of the same.

【図7】(a)は本発明に用いる他の半導体チップを示
す断面図、(b)は側面図である。
7A is a cross-sectional view showing another semiconductor chip used in the present invention, and FIG. 7B is a side view.

【図8】図7の半導体チップを用いた本発明の他の三次
元実装モジュールを示す斜視図である。
8 is a perspective view showing another three-dimensional mounting module of the present invention using the semiconductor chip of FIG.

【図9】SOI基板を示す断面図である。FIG. 9 is a cross-sectional view showing an SOI substrate.

【図10】従来例を示す平面図である。FIG. 10 is a plan view showing a conventional example.

【図11】他の従来例を示す斜視図である。FIG. 11 is a perspective view showing another conventional example.

【符号の説明】[Explanation of symbols]

1 半導体チップ 2 配線用パッド 3 配線部 4 フォトレジスト 5 金属 1 semiconductor chip 2 wiring pad 3 wiring part 4 photoresist 5 metal

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 半導体チップの側面に露出させた配線用
パッドと、この半導体チップの上に積層される他の半導
体チップの側面に露出させた配線用パッドとを金属の蒸
着にて半導体チップの各側面に形成される配線部で接続
して形成して成ることを特徴とする三次元実装モジュー
ル。
1. A wiring pad exposed on a side surface of a semiconductor chip and a wiring pad exposed on a side surface of another semiconductor chip stacked on the semiconductor chip are deposited on the semiconductor chip by metal deposition. A three-dimensional mounting module, which is formed by connecting wiring portions formed on each side surface.
【請求項2】 側面に配線用パッドを露出させて形成し
た半導体チップの上に他の半導体チップを積層し、半導
体チップの側面にフォトレジストを形成すると共にフォ
トレジストに露光及び現像処理を施して配線用パッド部
分及びその周辺部分のフォトレジストを除去し、半導体
チップの側面に金属を蒸着して各半導体チップの配線用
パッド同士を接続する配線部を形成すると共に配線部以
外の金属とフォトレジストとを除去することを特徴とす
る三次元実装モジュールの製造方法。
2. A semiconductor chip is formed on a side surface of which a wiring pad is exposed, another semiconductor chip is laminated on the side surface of the semiconductor chip, a photoresist is formed on the side surface of the semiconductor chip, and the photoresist is exposed and developed. The photoresist on the wiring pad portion and its peripheral portion is removed, and a metal is deposited on the side surface of the semiconductor chip to form a wiring portion for connecting the wiring pads of each semiconductor chip, and the metal and photoresist other than the wiring portion A method for manufacturing a three-dimensional mounting module, characterized in that and are removed.
【請求項3】 側面に配線用パッドを露出させて形成し
た半導体チップの上に他の半導体チップを積層し、半導
体チップの側面に金属を蒸着すると共に金属の表面にフ
ォトレジストを形成し、フォトレジストに露光及び現像
処理を施して配線用パッド部分及びその周辺部分以外の
フォトレジストを除去して金属を露出させると共に露出
した金属をエッチングにて除去して各半導体チップの配
線用パッド同士を接続する配線部を形成することを特徴
とする三次元実装モジュールの製造方法。
3. A semiconductor chip is formed on a side surface of which a wiring pad is exposed, another semiconductor chip is laminated on the side surface of the semiconductor chip, a metal is deposited on the side surface of the semiconductor chip, and a photoresist is formed on the surface of the metal. The photoresist is exposed and developed to remove the photoresist other than the wiring pad and its peripheral portion to expose the metal and the exposed metal is removed by etching to connect the wiring pads of each semiconductor chip. A method for manufacturing a three-dimensional mounting module, which comprises forming a wiring portion for forming the wiring part.
【請求項4】 側面に配線用パッドを露出させて形成し
た半導体チップの上に他の半導体チップを積層し、半導
体チップの側面に金属を蒸着すると共に配線用パッド部
分及びその周辺部分以外の金属を物理的手段にて除去し
て各半導体チップの配線用パッド同士を接続する配線部
を形成することを特徴とする三次元実装モジュールの製
造方法。
4. A semiconductor chip is formed on a side surface of which a wiring pad is exposed, another semiconductor chip is laminated on the side surface of the semiconductor chip, and a metal is vapor-deposited on the side surface of the semiconductor chip. A method for manufacturing a three-dimensional mounting module, characterized in that the wiring portion for connecting the wiring pads of each semiconductor chip is formed by removing the above by a physical means.
JP3571695A 1995-02-23 1995-02-23 Three-dimensional mounting module and manufacturing method thereof Expired - Fee Related JP3032692B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3571695A JP3032692B2 (en) 1995-02-23 1995-02-23 Three-dimensional mounting module and manufacturing method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3571695A JP3032692B2 (en) 1995-02-23 1995-02-23 Three-dimensional mounting module and manufacturing method thereof

Publications (2)

Publication Number Publication Date
JPH08236690A true JPH08236690A (en) 1996-09-13
JP3032692B2 JP3032692B2 (en) 2000-04-17

Family

ID=12449594

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3571695A Expired - Fee Related JP3032692B2 (en) 1995-02-23 1995-02-23 Three-dimensional mounting module and manufacturing method thereof

Country Status (1)

Country Link
JP (1) JP3032692B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007523482A (en) * 2004-02-18 2007-08-16 インフィネオン テクノロジーズ アクチエンゲゼルシャフト SEMICONDUCTOR ELEMENT HAVING LAMINATED SEMICONDUCTOR CHIP AND METHOD FOR MANUFACTURING SAME
KR100871708B1 (en) * 2007-04-03 2008-12-08 삼성전자주식회사 Chip having dimple, manufacturing method thereof and package using the chip
CN106847712A (en) * 2016-12-28 2017-06-13 华进半导体封装先导技术研发中心有限公司 A kind of fan-out-type wafer level packaging structure and preparation method thereof

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007523482A (en) * 2004-02-18 2007-08-16 インフィネオン テクノロジーズ アクチエンゲゼルシャフト SEMICONDUCTOR ELEMENT HAVING LAMINATED SEMICONDUCTOR CHIP AND METHOD FOR MANUFACTURING SAME
KR100871708B1 (en) * 2007-04-03 2008-12-08 삼성전자주식회사 Chip having dimple, manufacturing method thereof and package using the chip
CN106847712A (en) * 2016-12-28 2017-06-13 华进半导体封装先导技术研发中心有限公司 A kind of fan-out-type wafer level packaging structure and preparation method thereof
CN106847712B (en) * 2016-12-28 2019-06-14 华进半导体封装先导技术研发中心有限公司 A kind of fan-out-type wafer level packaging structure and preparation method thereof

Also Published As

Publication number Publication date
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