JPH08234448A - Developing method of photosensitive planographic printing plate - Google Patents

Abstract

PURPOSE: To provide a developing method for photosensitive planographic printing plate by which corrosion of the back surface of an aluminum base body can be prevented, deterioration in developing property is prevented in the part where plural transmissive documents are overlapped and exposed to light, production of precipitation due to corrosion of aluminum can be suppressed, and deterioration in the solubility of a developer component and deterioration in developing property except for the part above described can be prevented. CONSTITUTION: A photosensitive planographic printing plate is developed with a developer containing a surfactant, org. solvent, alkali agent, water, silicate by 0.7-2.0wt.% expressed in terms of SiO2 concn., and containing (1) a softening agent for hard water having at least 50% sequestering rate for calcium ion and magnesium ion, or containing (2) a nonion surfactant by 0.0005-0.01wt.%. Or a photosensitive planographic printing plate is developed by using the above developer above in (2) as the developer base liquid and replenishing the developer with a replenisher having the same compsn. as the developer base liquid and containing 0.015-0.3wt.% nonion surfactant.

Description

Detailed Description of the Invention

[0001]

FIELD OF THE INVENTION The present invention relates to a method for developing a photosensitive lithographic printing plate.

[0002]

2. Description of the Related Art Conventionally, a development capable of commonly developing a negative photosensitive lithographic printing plate using a diazo resin as a photosensitive substance and a positive photosensitive lithographic printing plate using an o-quinonediazide compound as a photosensitive substance. A liquid (hereinafter sometimes referred to as a "negative / positive common developing liquid") is known, and as this type of developing liquid, an alkali metal silicate is used for developing the positive photosensitive lithographic printing plate. Further, an alkaline aqueous solution containing an organic solvent for developing the negative photosensitive lithographic printing plate and also containing a surfactant, a sulfite and the like is known.

By the way, if the concentration of the silicate is too high in this type of developing solution, the solubility of the developing solution material (for example, a surfactant, an organic acid, an inorganic salt used as a reducing agent, etc.) is lowered and the developing solution is deteriorated. Due to problems such as poor development due to increased viscosity,
It is known that it is preferable to set the silicate concentration to 4.0% by weight or less (JP-A-54-62004 and JP-A-6-35174). However, when the concentration of silicate is low, the aluminum of the support corrodes significantly, and the uncoated aluminum of the photosensitive layer is eroded from the back side of the support to become cloudy, or the aluminum plate in the part where the photosensitive layer is removed Surface is corroded and hydrophilicity is impaired to cause scumming, which makes it cheaper, or it causes precipitation in the developer, which causes stains on the automatic processor and adhesion of sludge to the plate to be processed. .

As a technique for preventing corrosion of an aluminum support, a method of adding an alkanolamine to a developing solution (JP-A-4-70756) and a method of adding a lithium salt (JP-A-3-91355) are disclosed. However, none of these are still insufficient in the effect of suppressing the occurrence of precipitation due to the corrosion of aluminum and the erosion of the back surface of the aluminum support, and the transparent parts of the originals overlapped when a plurality of transparent originals were overlapped and exposed. However, there is a problem that the developability is lowered. Therefore, there is a demand for a developing solution that is free from the erosion of the back surface of the aluminum support and the deterioration of the developability of the portion on which the original is overlapped, and has a large effect of suppressing the occurrence of precipitation due to the corrosion of aluminum.

[0005]

SUMMARY OF THE INVENTION Therefore, an object of the present invention is to prevent the backside of an aluminum support from being corroded, to prevent deterioration of the developability of a portion in which originals are overlapped and exposed, and to prevent precipitation caused by corrosion of aluminum. It is an object of the present invention to provide a method for developing a photosensitive lithographic printing plate in which the occurrence of the above is suppressed and the solubility of the developer material and the developability other than the above are not deteriorated.

[0006]

The above objects of the present invention are achieved by the following items.

Hard water containing a surfactant, an organic solvent, an alkali agent and water, and having a blockage rate of at least 50% of silicate and calcium ion and magnesium ion of 0.7 to 2.0% by weight in terms of SiO ₂ concentration. 0.01 to 5% by weight of softener
A method for developing a photosensitive lithographic printing plate, which comprises using a developer contained therein.

It contains a surfactant, an organic solvent, an alkaline agent and water, and contains 0.7 to 2.0% by weight of silicate and 0.0005 to 0.01% by weight of a nonionic surfactant in terms of SiO ₂ concentration. A developing method for a photosensitive lithographic printing plate, which comprises using a developing solution.

It contains a surfactant, an organic solvent, an alkali agent and water, and contains 0.7 to 2.0% by weight of silicate and 0.0005 to 0.01% by weight of a nonionic surfactant in terms of SiO ₂ concentration. The developing mother liquor contains a surfactant, an organic solvent, an alkaline agent and water, and contains 0.7 to 2.0 wt% silicate and 0.015 to 0.3 wt% nonionic surfactant in terms of SiO ₂ concentration. A method for developing a photosensitive lithographic printing plate comprising replenishing a developing replenisher and developing.

The present invention will be described in detail below.

The surfactant contained in the developing solution and the developing replenishing solution used in the inventions according to claims 1 to 3 may be any of nonionic, cationic, anionic and amphoteric.

There are polyethylene glycol type and polyhydric alcohol type nonionic surfactants, but both can be used. From the viewpoint of developing performance, a polyethylene glycol type nonionic surfactant is preferable, and among them, it has 3 or more ethyleneoxy groups (-CH ₂ CH ₂ O-) and has an HLB value (HLB value).
Is more preferably a nonionic surfactant having a Hydropile-Lipophile Balance of 5 or more (more preferably 8 to 20, more preferably 15 to 20). Among the nonionic surfactants, those having both an ethyleneoxy group and a propyleneoxy group are particularly preferable, and among them, those having an HLB value of 8 or more are more preferable.

Preferred examples of the nonionic surfactant include compounds represented by the following formulas [1] to [8].

[0014]

Embedded image

In the formulas [1] to [8], R represents a hydrogen atom or a monovalent organic group. The organic group is, for example, a linear or branched alkyl group having 1 to 30 carbon atoms, which may have a substituent {for example, an aryl group (phenyl etc.)}, an alkylcarbonyl in which the alkyl moiety is the above alkyl group. Examples thereof include a group and a phenyl group which may have a substituent (for example, a hydroxyl group, the above-mentioned alkyl group and the like). a, b, c, m, n, x and y are each 1 to 40
Represents the integer.

Next, specific examples of the nonionic surfactant will be shown.

Polyethylene glycol, polyoxyethylene lauryl ether, polyoxyethylene nonyl ether, polyoxyethylene cetyl ether, polyoxyethylene stearyl ether, polyoxyethylene oleyl ether, polyoxyethylene behenyl ether,
Polyoxyethylene polyoxypropylene cetyl ether, polyoxyethylene polyoxypropylene behenyl ether, polyoxyethylene nonyl phenyl ether, polyoxyethylene octyl phenyl ether, polyoxyethylene stearyl amine, polyoxyethylene oleyl amine, polyoxyethylene stearic acid amide, Polyoxyethylene oleic acid amide, polyoxyethylene castor oil, polyoxyethylene abiethyl ether, polyoxyethylene lanolin ether, polyoxyethylene monolaurate, polyoxyethylene monostearate, polyoxyethylene glyceryl monooleate, polyoxyethylene Glycer monostearate,
Polyoxyethylene propylene glycol monostearate, oxyethylene oxypropylene block polymer, distyrenated phenol polyethylene oxide adduct, tribenzylphenol polyethylene oxide adduct, octylphenol polyoxyethylene polyoxypropylene adduct, glycerol monostearate, sorbitan monolaurate Rate, polyoxyethylene sorbitan monolaurate, etc.

The weight average molecular weight of the nonionic surfactant is 30.
A range of 0 to 10,000 is preferable, and a range of 500 to 5000 is particularly preferable. One type of nonionic surfactant may be contained alone, or two or more types may be used in combination.

Cationic surfactants are roughly classified into amine type and quaternary ammonium salt type, and any of these can be used.

Examples of the amine type include polyoxyethylene alkyl amine, N-alkyl propylene amine, N-alkyl polyethylene polyamine, N-alkyl polyethylene polyamine dimethyl sulfate, alkyl biguanide, long chain amine oxide, alkyl imidazoline, 1- Hydroxyethyl-2-alkylimidazoline, 1-acetylaminoethyl-2-alkylimidazoline, 2-alkyl-4-methyl
-4-hydroxymethyloxazoline and the like.

Examples of the quaternary ammonium salt type are long-chain primary amine salt, alkyltrimethylammonium salt, dialkyldimethylethylammonium salt, alkyldimethylammonium salt, alkyldimethylbenzylammonium salt, alkylpyridinium salt, and alkylquinone. Norinium salt, alkylisoquinolinium salt, alkylpyridinium sulfate, stearamidomethylpyridinium salt, acylaminoethyldiethylamine salt, acylaminoethylmethyldiethylammonium salt, alkylamidopropyldimethylbenzylammonium salt, fatty acid polyethylene polyamide, acylamino Ethyl viridinium salt, acyl cholaminoformylmethyl pyridinium salt, stearooxymethyl pyridinium salt, fatty acid triethanolamine, fat Acid triethanolamine formate, trioxyethylene fatty acid triethanolamine,
Examples include fatty acid dibutylaminoethanol, cetyloxymethylpyridinium salt, p-isooctylphenoxyethoxyethyldimethylbenzylammonium salt and the like. (The "alkyl" in the examples of the above compounds represents a straight chain or partially substituted alkyl group having 6 to 20 carbon atoms, specifically,
Straight-chain alkyl such as hexyl, octyl, cetyl and stearyl is preferably used. Among these, water-soluble quaternary ammonium salt type cationic surfactants are particularly effective, and among them, alkyl trimethyl ammonium salt, alkyl dimethyl benzyl ammonium salt, ethylene oxide addition ammonium salt and the like are preferable. Further, a polymer having a cation component as a repeating unit is also a cationic surfactant in a broad sense and is included in the cationic surfactant of the present invention. In particular,
A polymer containing a quaternary ammonium salt obtained by copolymerizing with a lipophilic monomer can be preferably used. The weight average molecular weight of the polymer is in the range of 300 to 50,000, particularly preferably 500 to 5,000. These cationic surfactants may be used alone or in combination of two or more.

As the anionic surfactant, higher alcohol (C ₈ -C ₂₂ ) sulfate ester salts [for example, sodium salt of lauryl alcohol sulfate, sodium salt of octyl alcohol sulfate, ammonium salt of lauryl alcohol sulfate, "Teepol- 81 ''
(Trade name, manufactured by Ciel Chemical Co., Ltd.), secondary sodium alkyl sulfate, etc.], aliphatic alcohol phosphate ester salts (eg, cetyl alcohol phosphate ester sodium salt), alkylaryl sulfonates (eg, dodecylbenzene sulfonic acid) Sodium salt, isopropyl naphthalene sulfonic acid sodium salt, dinaphthalene disulfonic acid sodium salt, metanitrobenzene sulfonic acid sodium salt, etc., alkyl amide sulfonates (eg, C ₁₇ H ₃₃ CON (CH ₃ ) CH ₂ SO ₃ Na) and sulfonates of dibasic fatty acid ester (for example, dioctyl sodium sulfosuccinate, dihexyl sodium sulfosuccinate, etc.). Of these, sulfonates are particularly preferably used.

Examples of the amphoteric surfactant include N-methyl.
Compounds such as -N-pentadecylaminoacetate sodium can be used.

The surfactant is preferably contained in the developer at a concentration in the range of 0.01 to 10% by weight.

In the invention according to claim 2 or claim 3, the nonionic surfactant described above can be used as the nonionic surfactant contained in the developer, and preferably a compound having a polyoxyethylene group. Is. The developer contains a nonionic surfactant in a concentration range of 0.0005 to 0.01% by weight, preferably 0.001 to 0.01% by weight. The concentration of nonionic surfactant in the developer is 0.00
If it is less than 05% by weight, the effect of the present invention is not obtained because it is too dilute.
If it exceeds 0.01% by weight, generation of sludge due to aluminum erosion is promoted.

In the invention according to claim 2 or 3, the content of the nonionic surfactant in the developer is 0.0005% by weight.
If it is less than 0.01, the effect of the present invention cannot be obtained because it is too dilute.
If it exceeds the weight%, the generation of sludge due to aluminum erosion is promoted. The concentration of the nonionic surfactant in the developer replenisher with respect to the developer of the invention according to claim 2 may be 0.0005 to 0.01% by weight, which is the same as in the developer, but due to the decrease in the concentration of the nonionic surfactant. In order to prevent deterioration of development stability, it is preferably 0.15 to 0.3% by weight. However, if it exceeds 0.3% by weight, the generation of sludge due to erosion of aluminum becomes large.

The organic solvent contained in the developing solution and the developing replenishing solution used in the developing method of the invention according to any one of claims 1 to 3 has a solubility in water at 20 ° C. of not more than 10% by weight, for example, acetic acid. Carboxylic acid esters such as ethyl, propyl acetate, butyl acetate, benzyl acetate, ethylene glycol monobutyl acetate, butyl lactate, and butyl repurinate; ketones such as ethyl butyl ketone, methyl isobutyl ketone, and cyclohexanone; ethylene glycol monobutyl ether Alcohols such as ethylene glycol benzyl ether, ethylene glycol monophenyl ether, benzyl alcohol, methylphenyl carbinol, n-amyl alcohol, methyl amyl alcohol; alkyl-substituted aromatic hydrocarbons such as xylene; Range dichloride, ethylene dichloride, and the like halogenated hydrocarbons such as monochlorobenzene. One or more of these organic solvents may be used.

Examples of the alkaline agent contained in the developing solution and the developing replenishing solution used in the invention according to any one of claims 1 to 3 include potassium silicate, sodium silicate, lithium silicate, potassium hydroxide, sodium hydroxide, Lithium hydroxide, sodium phosphate tribasic, sodium phosphate dibasic, potassium phosphate tribasic, potassium phosphate dibasic, ammonium phosphate tribasic, ammonium phosphate dibasic, sodium metasilicate, sodium bicarbonate, sodium carbonate Inorganic alkaline agents such as potassium carbonate, ammonium carbonate, etc., organic alkaline agents such as mono-, di- or triethanolamine and tetraalkylammonium hydroxide, and organic ammonium silicates are useful. The content of the alkaline agent in the developer is suitably 0.05 to 20% by weight.

The developing solution according to the first to third aspects of the invention and the developing replenisher according to the third aspect of the invention contain 0.7 to 2.0% by weight of silicate in terms of SiO ₂ concentration. If the SiO ₂ concentration is less than 0.7% by weight, the buffering property cannot be maintained and the development stability becomes poor, and if it exceeds 2.0% by weight, the solubility and concentration of the developer material are adversely affected. The content of silicate is 0.8 to 1.0% by weight converted to the amount of SiO _2.
Is particularly preferred.

Since the developer is alkaline, the water softener used in the invention according to claim 1 contains at least calcium ions and magnesium ions under alkaline conditions.
It can be blocked at a blocking rate of 50%. More preferably p
A water softener having a blockage rate of 50% or more in H9 is used. As a typical example of such a water softener, for example, Na
₂ P ₂ O ₇ , Na ₅ P ₃ O ₃ , Na ₃ P ₃ O ₉ , Na ₂ O ₄ P (NaO ₃ P) PO ₃ Na ₂ ,
Polyphosphate such as Calgon (sodium pormetaphosphate),
For example ethylenediaminetetraacetic acid, its potassium salt,
Its sodium salt; diethylenetriaminepentaacetic acid,
Triethylenetetramine hexaacetic acid, its potassium salt, its sodium salt; Hydroxyethylethylenediamine triacetic acid, its potassium salt, its sodium salt; Nitrilotriacetic acid, its potassium salt, its sodium salt; 1,2- Examples thereof include aminopolycarboxylic acids such as diaminocyclohexanetetraacetic acid, its potassium salt and its sodium salt; 1,3-diamino-2-propanoltetraacetic acid, its potassium salt and its sodium salt. The optimum amount of such a water softener varies depending on the hardness of the hard water used and the amount used, but if the general amount is shown, it is 0.01 to 5% by weight in the developing solution at the time of use. Preferably 0.01 to 0.
It is contained in the range of 5% by weight. If the content of the water softener is less than 0.01% by weight, the effect of the present invention cannot be obtained because it is too dilute, and if it is more than this amount, the effect of the present invention cannot be expected to increase. Adversely affect.

The above water softening agent can be contained in the developing solution and the developing replenishing solution of the invention according to claim 2 or 3.

The remaining component of the developing solution and the developing replenishing solution according to the first to third aspects is water, but various additives known in the art can be further contained if necessary. Such additives include reducing agents, organic amine compounds and the like.

As the reducing agent, water-soluble or alkaline-bathable organic and inorganic reducing agents can be contained. Examples of the organic reducing agent include phenol compounds such as hydroquinone, metol and methoxyquinone, amine compounds such as phenylenediamine and phenylhydrazine, and examples of the inorganic reducing agent include sodium sulfite, potassium sulfite, ammonium sulfite and hydrogen sulfite. Sodium, sulfites such as potassium bisulfite, sodium phosphite, potassium phosphite, sodium hydrogen phosphite, potassium hydrogen phosphite, sodium dihydrogen phosphite, phosphates such as dipotassium hydrogen phosphite , Hydrazine, sodium thiosulfate, sodium dithionite and the like.

These water-soluble or alkali-soluble reducing agents can be contained in at least 0.1 to 10% by weight.

As the organic amine compound, R ₁ -N (R ₂ )
-J-OH (in the formula, R ₁ and R ₂ are each a hydrogen atom, -C ₂ H ₄ OH
Or -C ₃ H ₆ OH, and J represents -C ₂ H ₄ -or -C ₃ H _6- ), and specific examples thereof include monoethanolamine, diethanolamine, and Examples include triethanolamine, monopropanolamine, dipropanolamine, tripropanolamine and the like. The content of the compound is suitably 0.1 to 10% by weight.

Other additives include, for example, organic carboxylic acids such as aliphatic carboxylic acids having 6 to 20 carbon atoms, and aromatic carboxylic acids having a benzene ring or naphthalene ring substituted with a carboxyl group. The aliphatic carboxylic acid is an alkanoic acid having 6 to 20 carbon atoms, and specific examples include:
Aliphatic carboxylic acids such as caproic acid, enanthic acid, caprylic acid, pelargonic acid, capric acid, lauric acid, mistyric acid, palmitic acid, stearic acid are fatty acids having a double bond in the carbon chain, but branched carbon It may be a chain or may be used as a sodium or potassium salt or an ammonium salt. Specific compounds of the aromatic carboxylic acid include benzoic acid, o-chlorobenzoic acid, p-
Chlorobenzoic acid, o-hydroxybenzoic acid, p-hydroxybenzoic acid, p-tert-butylbenzoic acid, o-aminobenzoic acid, p-aminobenzoic acid, 2,4-dihydroxybenzoic acid, 2,
5-dihydroxybenzoic acid, 2,6-dihydroxybenzoic acid,
2,3-dihydroxybenzoic acid, 3,5-dihydroxybenzoic acid, gallic acid, 1-hydroxy-2-naphthoic acid, 3-hydroxy-2-naphthoic acid, 2-hydroxy-1-naphthoic acid, 1-naphthoic acid , 2-naphthoic acid, etc. The aromatic carboxylic acid may be used as a sodium or potassium salt or an ammonium salt. The content of the aliphatic carboxylic acid and the aromatic carboxylic acid is usually 0 to 30% by weight.

Further, the following additives may be mentioned as additives for the above-mentioned developing solution and developing replenishing solution. For example, JP-A-58
-75152, neutral salts such as NaCl, KCl, KBr, etc.
Complexes such as [Co (NH ₃ )] ₆ Cl ₃ described in JP-A-59-121336, JP
Ampholytic polymer electrolytes such as copolymers of vinylbenzyltrimethylammonium chloride and sodium acrylate described in JP-A-56-142528, inorganic lithium compounds such as lithium chloride described in JP-A-58-59444, JP-B-50-34442 Organolithium compounds such as lithium benzoate described in Japanese Patent Publication No.
Examples thereof include organic metal surfactants containing Si, Ti, etc. described in JP-A-59-75255, and organic boron compounds described in JP-A-59-84241.

The pH of the developer and the developer replenisher of the inventions according to claims 1 to 3 is preferably in the range of 8.0 to 13.8,
Particularly, the range of 12.5 to 13.8 is preferable. In the developing method of the invention according to any one of claims 1 to 3, the developing conditions such as developing temperature and developing time may be those normally used, usually the developing temperature is 20 to 40 ° C and the developing time is in the range of 5 to 40 seconds. Is appropriate.

A photosensitive lithographic printing plate to which the inventions according to claims 1 to 3 are applied are disclosed in JP-A-6-35174.
Examples of such photosensitive lithographic printing plates that are commonly used include quinonediazide type, photopolymerization type, diazo compound, and photocrosslinking type, as described in Japanese Patent Publication No. A lithographic printing plate may be used.

As the automatic developing machine used for developing the photosensitive lithographic printing plate, there are immersion developing type, shower developing type, and the like as described in JP-A-6-35174.
A commonly used automatic processor such as a coating and developing type can be used. For the post-treatment such as rinsing after development, washing with water, gumming, etc., an ordinary processing solution and an ordinary use method can be applied.

[0041]

【Example】

Examples 1 to 6 and Comparative Examples 1 to 2 A running experiment of the development processing of the photosensitive lithographic printing plate was carried out under the following conditions, and when 100 m ² per 1 l of the developer was processed, per unit area deposited on the bottom of the developer tank. The dry weight of the sludge was measured. In addition, 10 m of developer per liter and 0 m ² treatment
The photosensitive lithographic printing plate was developed at the time of 0 m ² treatment, and the erosion of the back surface of the support and the developability of the photosensitive lithographic printing plate exposed by overlapping the document were evaluated.

Development Processing Conditions Automatic processor: PSZ-910 (manufactured by Konica Corporation), water was used as washing water, and SGW-2 (manufactured by Konica Corporation) was used as a gum solution.

Photosensitive planographic printing plate and its exposure: Positive type photosensitive planographic printing plate KM (manufactured by Konica Corp.), 1080 m ² (1003 mm × 80)
0mm, 1350 sheets, exposure: 2kW metal halide lamp (Iwasaki Electric Co., Ltd., Idol Fin 2000), exposed for 60 seconds from 70cm distance (entire exposure) under conditions of 8.0mW / cm ² Negative photosensitive lithographic printing plate SWN -X (Konica Corp.), 120m ²
(150 sheets of 1003mm x 800mm) without exposure.

Developing solution (developing mother solution and developing replenisher): The following developing mother solution and developing replenisher were used in the combination shown in Table 1 below.

Concentrated developing mother liquor 1a (6 times concentrated solution) Water 300 parts by weight Phenylpropylene glycol 5 parts by weight Propylene glycol 100 parts by weight p-tert-Butylbenzoic acid 50 parts by weight Emulgen 147 (manufactured by Kao Corporation, nonionic interface) Activator) 1 part by weight Perex NB-L (manufactured by Kao Corporation, anionic surfactant) 50 parts by weight 50% potassium sulfite aqueous solution 200 parts by weight 50% gluconic acid aqueous solution 50 parts by weight triethanolamine 100 parts by weight potassium silicate aqueous solution (26% by weight containing SiO _2, 13% by weight containing K ₂ O) 200 parts by weight 190% by weight aqueous potassium hydroxide solution 190 parts by weight Ethylenediaminetetraacetic acid 3 parts by weight Concentrated developer replenisher 1b (4 times concentrated solution) Water 400 parts by weight Phenyl Propylene glycol 5 parts by weight Propylene glycol 80 parts by weight p-tert-Butylbenzoic acid 50 parts by weight Emulgen 147 (Kao Corporation, non-ionic surfactant) 5 parts by weight Part Perex NB-L (manufactured by Kao Corporation, anionic surfactant) 20 parts by weight 50% potassium sulfite aqueous solution 200 parts by weight 50% gluconic acid aqueous solution 50 parts by weight triethanolamine 100 parts by weight potassium silicate aqueous solution (SiO ₂ content 26 % By weight, 13% by weight containing K ₂ O) 140 parts by weight 50% potassium hydroxide aqueous solution 230 parts by weight Ethylenediaminetetraacetic acid 2 parts by weight Concentrated developing mother liquor 2a (6 times concentrated solution) Water 300 parts by weight Phenylpropylene glycol 5 parts by weight Propylene Glycol 100 parts by weight p-tert-Butylbenzoic acid 50 parts by weight Emulgen 147 (Kao Corporation, non-ionic surfactant) 1 part by weight Perex NB-L (Kao Corporation, anion surfactant) 50 parts by weight parts 50% sulfite aqueous potassium 200 parts by weight of 50% gluconic acid aqueous solution 50 parts by weight of triethanolamine 100 parts by weight of potassium silicate solution (SiO ₂ content 26 wt%, K ₂ O containing 13 %) 200 parts by weight 50% aqueous potassium hydroxide solution 190 parts by weight Nitrilotriacetic acid 3 parts by weight Concentrated developer replenisher 2b (4 times concentrated solution) Water 400 parts by weight Phenylpropylene glycol 5 parts by weight Propylene glycol 80 parts by weight p-tert- Butylbenzoic acid 50 parts by weight Emulgen 147 (manufactured by Kao Corporation, nonionic surfactant) 5 parts by weight Perex NB-L (manufactured by Kao Corporation, anionic surfactant) 20 parts by weight 50% potassium sulfite aqueous solution 200 parts by weight Parts 50% gluconic acid aqueous solution 50 parts by weight triethanolamine 100 parts by weight potassium silicate aqueous solution (SiO ₂ content 26% by weight, K ₂ O content 13% by weight) 140 parts by weight 50% potassium hydroxide solution 230 parts by weight nitrilotriacetic acid 2 parts by weight Part Concentrated developing mother liquor 3a (6x concentrate) Water 300 parts by weight Phenylpropylene glycol 5 parts by weight Propylene glycol 100 parts by weight p-tert-Butylbenzoic acid 50 parts by weight Margen 147 (Kao Corporation, non-ionic surfactant) 0.5 parts by weight Perex NB-L (Kao Corporation, anion surfactant) 50 parts by weight 50% potassium sulfite aqueous solution 200 parts by weight gluconic acid aqueous solution 50 parts by weight Triethanolamine 100 parts by weight Potassium silicate aqueous solution (26% by weight of SiO _{2 and} 13% by weight of K ₂ O) 200 parts by weight 50% aqueous solution of potassium hydroxide 190 parts by weight Concentrated developer replenisher 3b (4 times concentrated solution) ) Water 400 parts by weight Phenylpropylene glycol 5 parts by weight Propylene glycol 80 parts by weight p-tert-Butylbenzoic acid 50 parts by weight Emulgen 147 (manufactured by Kao Corporation, nonionic surfactant) 0.3 parts by weight Perex NB-L (Kao) Ltd., anionic surfactant), 20 parts by weight of 50% potassium sulfite aqueous solution 200 parts by weight of 50% gluconic acid aqueous solution 50 parts by weight of triethanolamine 100 parts by weight of potassium silicate solution (SiO ₂ containing 26 wt%, K ₂ O content 13 wt%) 140 parts by weight of 50% potassium hydroxide aqueous solution 230 parts by weight concentrated replenisher 3c (4-fold concentrate) Water 400 parts by weight of phenyl propylene glycol 5 parts by weight of propylene glycol 80 parts by weight p-tert-Butylbenzoic acid 50 parts by weight Emulgen 147 (manufactured by Kao Corporation, nonionic surfactant) 4 parts by weight Perex NB-L (manufactured by Kao Corporation, anionic surfactant) 20 parts by weight 50% sulfite Aqueous solution of potassium 200 parts by weight 50% Solution of gluconic acid 50 parts by weight Triethanolamine 100 parts by weight Potassium silicate solution (26% by weight of SiO _{2 and} 13% by weight of K ₂ O) 140 parts by weight 230% by weight aqueous solution of potassium hydroxide Concentrated developing mother liquor 4a (6 times concentrated solution) Water 300 parts by weight Phenylpropylene glycol 5 parts by weight Propylene glycol 100 parts by weight p-tert-Butylbenzoic acid 50 parts by weight Emulgen 147 (Kao Corporation, non 0.5 parts by weight Perex NB-L (manufactured by Kao Corporation, anionic surfactant) 50 parts by weight 50% aqueous solution of potassium sulfite 190 parts by weight 50% aqueous solution of gluconic acid 50 parts by weight triethanolamine 100 parts by weight Silicic acid Aqueous potassium solution (26% by weight containing SiO _2, 13% by weight containing K ₂ O) 200 parts by weight 190% by weight aqueous potassium hydroxide solution 190 parts by weight nitrilotriacetic acid 3 parts by weight Concentrated developer replenisher 4b (4 times concentrated solution) 400 parts by weight water Phenyl propylene glycol 5 parts by weight Propylene glycol 80 parts by weight p-tert-Butylbenzoic acid 50 parts by weight Emulgen 147 (Kao Corporation, nonionic surfactant) 0.3 parts by weight Perex NB-L (Kao Corporation, Anionic surfactant) 20 parts by weight 50% potassium sulfite aqueous solution 200 parts by weight 50% gluconic acid aqueous solution 50 parts by weight triethanolamine 100 parts by weight potassium silicate aqueous solution (SiO ₂ containing 26 parts by weight) %, K ₂ O-containing 13% by weight) 140 parts by weight 50% aqueous potassium hydroxide 230 parts by weight Nitrilotriacetic acid 3 parts by weight Concentrated developing mother liquor 5a (6 times concentrated solution) Water 300 parts by weight Phenylpropylene glycol 5 parts by weight Propylene glycol 100 parts by weight p-tert-butylbenzoic acid 50 parts by weight Emulgen 147 (Kao Corporation, nonionic surfactant) 0.5 parts by weight Perex NB-L (Kao Corporation, anion surfactant) 50 parts by weight 50% aqueous solution of potassium sulfite 200 parts by weight 50% aqueous solution of gluconic acid 50 parts by weight triethanolamine 100 parts by weight aqueous solution of potassium silicate (26% by weight of SiO _{2 and} 13% by weight of K ₂ O) 200 parts by weight 50% aqueous solution of potassium hydroxide 190 parts by weight Ethylenediaminetetraacetic acid 3 parts by weight Concentrated developer replenisher 5b (4 times concentrated solution) Water 400 parts by weight Phenylpropylene glycol 5 parts by weight Propylene glycol 80 parts by weight p -tert-Butylbenzoic acid 50 parts by weight Emulgen 147 (manufactured by Kao Corporation, nonionic surfactant) 4 parts by weight Perex NB-L (manufactured by Kao Corporation, anionic surfactant) 20 parts by weight 50% potassium sulfite Aqueous solution 200 parts by weight 50% Gluconic acid aqueous solution 50 parts by weight Triethanolamine 100 parts by weight Potassium silicate aqueous solution (26% by weight containing SiO _2, 13% by weight containing K ₂ O) 140 parts by weight 50% aqueous solution of potassium hydroxide 230 parts by weight Ethylenediamine Tetraacetic acid 2 parts by weight Concentrated developing mother liquor 6a (6 times concentrated solution) Water 300 parts by weight Phenylpropylene glycol 5 parts by weight Propylene glycol 100 parts by weight p-tert-Butylbenzoic acid 50 parts by weight Emulgen 147 (Kao Corporation, non Ionic surfactant) 1 part by weight Perex NB-L (manufactured by Kao Corporation, anionic surfactant) 50 parts by weight 50% aqueous solution of potassium sulfite 200 parts by weight 50% aqueous solution of gluconic acid 50 parts by weight Triethanolamine 100 parts by weight of potassium silicate solution (SiO ₂ content 26 wt%, K ₂ O content 13 wt%) 200 parts by weight of 50% potassium hydroxide aqueous solution 190 parts by weight concentrated replenisher 6b (4-fold concentrate) water 400 Parts by weight phenyl propylene glycol 5 parts by weight propylene glycol 80 parts by weight p-tert-butyl benzoic acid 50 parts by weight Emulgen 147 (manufactured by Kao Corporation, nonionic surfactant) 8 parts by weight Perex NB-L (Kao Corporation) Anionic surfactant) 20 parts by weight 50% potassium sulfite aqueous solution 200 parts by weight 50% gluconic acid aqueous solution 50 parts by weight triethanolamine 100 parts by weight Potassium silicate aqueous solution (SiO ₂ content 26% by weight, K ₂ O content 13% by weight) ) 140 parts by weight 50% aqueous potassium hydroxide solution 230 parts by weight Concentrated developing mother liquor 7a (6 times concentrated solution) Water 220 parts by weight Phenylpropylene glycol 5 parts by weight Propylene glycol 100 parts by weight p-tert-Butylbenzoic acid 50 parts by weight Emulgen 147 (manufactured by Kao Corporation, nonionic surfactant) 1 part by weight Perex NB-L (manufactured by Kao Corporation, anionic surfactant) 50 parts by weight 50% sulfite Aqueous potassium solution 200 parts by weight 50% Gluconic acid solution 50 parts by weight Triethanolamine 100 parts by weight Potassium silicate solution (26% by weight of SiO _{2 and} 13% by weight of K ₂ O) 300 parts by weight 170% by weight aqueous solution of potassium hydroxide 170 parts by weight Concentrated developer replenisher 7b (4 times concentrated solution) Water 320 parts by weight Phenylpropylene glycol 5 parts by weight Propylene glycol 80 parts by weight p-tert-Butylbenzoic acid 50 parts by weight Emulgen 147 (Kao Corporation, nonionic surfactant) ) 8 parts by weight Perex NB-L (manufactured by Kao Corporation, anionic surfactant) 20 parts by weight 50% aqueous potassium sulfite solution 200 parts by weight 50% aqueous gluconic acid solution 50 parts by weight Triethanolamine 100 parts by weight Potassium silicate aqueous solution (26% by weight containing SiO _{2 and} 13% by weight containing K ₂ O) 240 parts by weight 50% aqueous solution of potassium hydroxide 210 parts by weight Running days: 5 days Sludging conditions: sampling area 10 cm x 10 cm, removing developer After that, the sludge accumulated on the bottom of the developing tank was collected. After collecting, the sample was dried at 100 ° C. for 5 hours, and then its weight was measured.

Evaluation of backside erosion of support: The photosensitive lithographic printing plate for evaluation was a positive type photosensitive lithographic printing plate KM (manufactured by Konica Corporation). Developing the unexposed LM during developer 1l per 0 m ² when processing a 100 m ² treatment was visually evaluated the extent of the rear surface of the erosion.

Evaluation of developability of the overlapped original portion: The photosensitive planographic printing plate for evaluation was a positive type photosensitive planographic printing plate KM (Konica Corporation).
Exposure): 2kW metal halide lamp (Iwasaki Electric Co., Ltd.)
Idol Fin 2000) exposed at a distance of 70 cm for 40 seconds under the condition of 8.0 mW / cm ² and the exposed original was exposed by superimposing four transparent parts of a step tablet No. 2 manufactured by Kodak Co., Ltd.

[0048] The developing solution at 1l per 0 m ² treated and 100 m ² above photosensitive lithographic printing plate during processing was developed to evaluate the degree of development failure visually.

The above results are shown in Table 1 below. The meanings of ◯, Δ and × in Table 1 are as follows.

Erosion of the back surface of the support ◯: Erosion is observed Δ: Slight erosion is observed ×: Erosion is clearly observed Poor development of the overlapped original portion ○: No development failure is observed Δ: Slight development failure Is observed x: Development failure is clearly observed

[0051]

[Table 1]

[0052]

According to the present invention, the backside of the aluminum support is prevented from being eroded, the developability of the exposed portion of the original document is prevented from being deteriorated, and the precipitation caused by the corrosion of aluminum is suppressed. Also provided is a method for developing a photosensitive lithographic printing plate that does not deteriorate the solubility of the developer material and the developability other than the above.

Claims (3)

[Claims] 1. A surfactant, an organic solvent, an alkali agent, and water, containing 0.7 to 2.0% by weight in terms of SiO ₂ concentration, and a blocking rate of calcium ions and magnesium ions of at least 50% in terms of SiO ₂ concentration. 0.01 to 5% by weight of water softener
A method for developing a photosensitive lithographic printing plate, which comprises using a developer contained therein. 2. A surfactant, an organic solvent, an alkali agent, and water, which are contained in an amount of 0.7 to 2.0% by weight in terms of SiO ₂ concentration and 0.0005 to 0.01% by weight of a nonionic surfactant. A method for developing a photosensitive lithographic printing plate, which comprises using a developer containing 3. A surfactant, an organic solvent, an alkaline agent, and water are contained, and 0.7 to 2.0% by weight of a silicate and 0.0005 to 0.01% by weight of a nonionic surfactant are converted in terms of SiO ₂ concentration. The developing mother liquor contained contains a surfactant, an organic solvent, an alkali agent and water, and in terms of SiO ₂ concentration 0.7 to 2.0 wt% silicate and 0.015 to 0.3 wt% nonionic surfactant. A method for developing a photosensitive lithographic printing plate, which comprises replenishing a developing replenisher containing the above to develop.