JPH08213737A - Conductor formation method - Google Patents
Conductor formation methodInfo
- Publication number
- JPH08213737A JPH08213737A JP1531195A JP1531195A JPH08213737A JP H08213737 A JPH08213737 A JP H08213737A JP 1531195 A JP1531195 A JP 1531195A JP 1531195 A JP1531195 A JP 1531195A JP H08213737 A JPH08213737 A JP H08213737A
- Authority
- JP
- Japan
- Prior art keywords
- thick film
- wiring pattern
- photosensitive resin
- film conductor
- conductor paste
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Manufacturing Of Printed Circuit Boards (AREA)
Abstract
(57)【要約】
【目的】 セラミック多層基板上に、より精緻な厚膜導
体の配線パターンを形成できるようにする。
【構成】 セラミック基板2上に厚膜導体ペースト1を
一面に印刷し乾燥する(図(a))。この時、導体焼成
は行わない。厚膜導体ペースト1上に感光性樹脂4を形
成し、配線パターン形状にフォトエッチングする(図
(b),(c))。硬化した感光性樹脂4をマスクとし
て不必要な厚膜導体ペーストを除去すると図(e)に示
す状態となる。ここで導体焼成を行うと、感光性樹脂4
は除去され、精緻な配線パターンを形成することができ
る。
(57) [Summary] [Purpose] To enable formation of a more precise wiring pattern of thick film conductors on a ceramic multilayer substrate. [Structure] The thick film conductor paste 1 is printed on one surface of a ceramic substrate 2 and dried (Fig. (A)). At this time, the conductor is not fired. A photosensitive resin 4 is formed on the thick film conductor paste 1 and photo-etched into a wiring pattern shape (FIGS. (B) and (c)). When the unnecessary thick film conductor paste is removed using the cured photosensitive resin 4 as a mask, the state shown in FIG. When the conductor is fired here, the photosensitive resin 4
Is removed, and a fine wiring pattern can be formed.
Description
【0001】[0001]
【産業上の利用分野】本発明は、セラミック基板上の導
体形成方法に関するものであり、特により精緻な配線パ
ターンを簡易に形成できるよう改善するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for forming a conductor on a ceramic substrate, and in particular, to improve it so that a finer wiring pattern can be easily formed.
【0002】[0002]
【従来の技術】近年、電子機器の小型化及び回路のデジ
タル化に伴い、高密度な回路基板が要求されるようにな
ってきている。それに伴い回路パターンもよりファイン
ピッチなラインが求められてきている。2. Description of the Related Art In recent years, with the miniaturization of electronic devices and the digitization of circuits, high density circuit boards have been required. Along with this, circuit patterns are required to have finer pitch lines.
【0003】従来、セラミック基板上の厚膜導体は、ス
クリーン印刷法により、所望の配線パターンに厚膜ペー
ストを印刷してから、乾燥、焼成することにより形成さ
れていた。Conventionally, a thick film conductor on a ceramic substrate is formed by printing a thick film paste on a desired wiring pattern by a screen printing method, followed by drying and firing.
【0004】[0004]
【発明が解決しようとする課題】しかしながら上記従来
のスクリーン印刷による厚膜導体の形成方法では、ファ
インピッチで細い配線パターンを形成することは難し
く、特に100μm以下のラインの配線パターンでは、
安定して量産を行えなかった。However, it is difficult to form a fine wiring pattern with a fine pitch by the above-mentioned conventional method of forming a thick film conductor by screen printing. Particularly, in the wiring pattern of 100 μm or less lines,
We could not mass-produce it stably.
【0005】本発明はこの様な問題点を解決するもので
あり、セラミック基板上により精緻な厚膜導体の配線パ
ターンを形成できるようにすることを目的とするもので
ある。The present invention solves such a problem, and an object thereof is to make it possible to form a finer wiring pattern of a thick film conductor on a ceramic substrate.
【0006】[0006]
【課題を解決するための手段】上記課題を解決するため
の本発明の導体形成方法は以下の通りである。すなわ
ち、セラミック基板上に厚膜導体ペーストを一面に印刷
し乾燥させる。この時、導体の焼成は行わない。そして
厚膜導体ペースト上に感光性樹脂を一面に形成し、配線
パターンを残すように前記感光性樹脂をフォトエッチン
グする。そして残された配線パターン上の硬化した感光
性樹脂をマスクとして、配線パターン以外の不必要な厚
膜導体ペーストを除去する。その後、厚膜導体ペースト
の焼成を行うことにより、配線パターン上の感光性樹脂
は除去され、厚膜導体を得ることができる。The conductor forming method of the present invention for solving the above problems is as follows. That is, a thick film conductor paste is printed on one surface of a ceramic substrate and dried. At this time, the conductor is not fired. Then, a photosensitive resin is formed on the entire surface of the thick film conductor paste, and the photosensitive resin is photoetched so as to leave a wiring pattern. Then, using the cured photosensitive resin on the remaining wiring pattern as a mask, unnecessary thick-film conductor paste other than the wiring pattern is removed. After that, by baking the thick film conductor paste, the photosensitive resin on the wiring pattern is removed, and a thick film conductor can be obtained.
【0007】[0007]
【作用】上記方法では、配線パターン形状にフォトエッ
チングした感光性樹脂をマスクとして、不要な厚膜導体
ペーストを除去し配線パターンを得るようにしたので、
スクリーン印刷に比べ、より細く狭ピッチの配線パター
ンも形成することが可能となる。In the above method, the photosensitive resin photo-etched into the wiring pattern shape is used as a mask to remove the unnecessary thick film conductor paste to obtain the wiring pattern.
It is also possible to form a finer wiring pattern with a narrower pitch than screen printing.
【0008】[0008]
【実施例】以下、本発明の導体形成方法の実施例を図面
を参照しながら説明する。図1は本発明の一実施例にお
ける導体形成方法の各工程図を示している。Embodiments of the conductor forming method of the present invention will be described below with reference to the drawings. 1A to 1C show process diagrams of a conductor forming method according to an embodiment of the present invention.
【0009】まず図(a)において、セラミック基板2
上に、市販のAg/Pdの厚膜ペースト1を一面に印刷
し、150℃で10分の乾燥を行う。First, in FIG. 1A, the ceramic substrate 2
A commercially available thick film paste 1 of Ag / Pd is printed on one side and dried at 150 ° C. for 10 minutes.
【0010】次いで図(b)に示すように、厚膜ペース
ト1上に感光性樹脂4を一面に塗布し、さらにその上部
に配線パターンを残すようにマスク3をして光を照射す
る。マスク3及びその下の硬化していない感光性樹脂4
を除去すると、図(c)に示すように、配線パターンの
形状にフォトエッチングされた感光性樹脂4を厚膜導体
ペースト1上に形成することができる。Then, as shown in FIG. 1B, a photosensitive resin 4 is applied to one surface of the thick film paste 1, and a mask 3 is left on the photosensitive resin 4 so as to leave a wiring pattern thereon, and light is irradiated. Mask 3 and uncured photosensitive resin 4 underneath
By removing, the photosensitive resin 4 photoetched into the shape of the wiring pattern can be formed on the thick film conductor paste 1 as shown in FIG.
【0011】この図(c)に示す状態で、例えば水とア
ルミナ粉の混合物を利用した液体ホーニングを行なえ
ば、硬化した感光性樹脂4がマスクとなり、図(d)に
示すように、配線パターン以外の厚膜導体ペースト1は
除去され、配線パターンのみに厚膜導体ペーストを得る
ことができる。なお不要な厚膜導体ペーストを除去する
には、サンドブラストや水圧を利用した方法でもかまわ
ない。If liquid honing is performed using a mixture of water and alumina powder in the state shown in FIG. 6C, the cured photosensitive resin 4 serves as a mask, and as shown in FIG. The thick film conductor paste 1 other than the above is removed, and the thick film conductor paste can be obtained only on the wiring pattern. A method using sand blast or water pressure may be used to remove unnecessary thick film conductor paste.
【0012】上述のごとくパターニングが終了した後に
850℃で焼成を行なうと、図(e)に示すように、厚
膜導体ペースト1上の感光性樹脂4は除去され、精緻な
厚膜導体が焼成される。When the firing is performed at 850 ° C. after the patterning is completed as described above, the photosensitive resin 4 on the thick film conductor paste 1 is removed and the delicate thick film conductor is fired, as shown in FIG. To be done.
【0013】[0013]
【発明の効果】以上の様に本発明の導体形成方法によれ
ば、厚膜導体ペーストを用いたスクリーン印刷では困難
な細く狭ピッチの配線パターンでも、セラミック基板上
に安易に形成することができる。As described above, according to the conductor forming method of the present invention, it is possible to easily form even a fine and narrow pitch wiring pattern on a ceramic substrate, which is difficult by screen printing using a thick film conductor paste. .
【図1】本発明の導体形成方法を示す工程図FIG. 1 is a process diagram showing a conductor forming method of the present invention.
1 印刷乾燥した厚膜導体ペ−スト 2 セラミック基板 3 マスク 4 感光性樹脂 1 Printed and dried thick film conductor paste 2 Ceramic substrate 3 Mask 4 Photosensitive resin
Claims (1)
面に印刷し乾燥させるる工程と、前記厚膜導体ペースト
上に感光性樹脂を一面に印刷し、所望の配線パターンを
残して、前記感光性樹脂をフォトエッチングする工程
と、配線パターン上の硬化した前記感光性樹脂をマスク
として、配線パターン以外の不要な厚膜導体ペーストを
除去する工程と、焼成により前記硬化した感光性樹脂を
除去し、厚膜導体を得る工程とからなる導体形成方法。1. A step of printing a thick film conductor paste on one surface of a ceramic substrate and drying it, and a step of printing a photosensitive resin on the thick film conductor paste on one surface thereof, leaving a desired wiring pattern, and exposing the photosensitive film. Of the conductive resin by photo-etching, the photosensitive resin cured on the wiring pattern is used as a mask to remove unnecessary thick film conductor paste other than the wiring pattern, and the cured photosensitive resin is removed by firing. And a step of obtaining a thick film conductor.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1531195A JPH08213737A (en) | 1995-02-01 | 1995-02-01 | Conductor formation method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1531195A JPH08213737A (en) | 1995-02-01 | 1995-02-01 | Conductor formation method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH08213737A true JPH08213737A (en) | 1996-08-20 |
Family
ID=11885249
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1531195A Pending JPH08213737A (en) | 1995-02-01 | 1995-02-01 | Conductor formation method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH08213737A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10037818A1 (en) * | 2000-08-03 | 2002-03-07 | Bosch Gmbh Robert | Process for structuring unburned layers used in high frequency switches comprises preparing a layer succession of two layers, and structuring at least one of the layers on the outer side of the succession using a photosensitive layer |
WO2007046143A1 (en) * | 2005-10-19 | 2007-04-26 | Tokyo Electron Limited | Method for patterning and apparatus for patterning |
-
1995
- 1995-02-01 JP JP1531195A patent/JPH08213737A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10037818A1 (en) * | 2000-08-03 | 2002-03-07 | Bosch Gmbh Robert | Process for structuring unburned layers used in high frequency switches comprises preparing a layer succession of two layers, and structuring at least one of the layers on the outer side of the succession using a photosensitive layer |
WO2007046143A1 (en) * | 2005-10-19 | 2007-04-26 | Tokyo Electron Limited | Method for patterning and apparatus for patterning |
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