JPH08208993A - Thermally conductive silicone composition - Google Patents
Thermally conductive silicone compositionInfo
- Publication number
- JPH08208993A JPH08208993A JP30735795A JP30735795A JPH08208993A JP H08208993 A JPH08208993 A JP H08208993A JP 30735795 A JP30735795 A JP 30735795A JP 30735795 A JP30735795 A JP 30735795A JP H08208993 A JPH08208993 A JP H08208993A
- Authority
- JP
- Japan
- Prior art keywords
- group
- component
- platinum
- weight
- particle size
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000203 mixture Substances 0.000 title claims abstract description 42
- 229920001296 polysiloxane Polymers 0.000 title claims description 7
- 239000002245 particle Substances 0.000 claims abstract description 35
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims abstract description 20
- 125000003342 alkenyl group Chemical group 0.000 claims abstract description 12
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 8
- 229910052697 platinum Inorganic materials 0.000 claims abstract description 8
- 239000003054 catalyst Substances 0.000 claims abstract description 6
- 239000011231 conductive filler Substances 0.000 claims abstract description 6
- 125000000524 functional group Chemical group 0.000 claims abstract description 5
- 150000003961 organosilicon compounds Chemical class 0.000 claims abstract description 4
- 150000003058 platinum compounds Chemical class 0.000 claims abstract description 4
- 229940045985 antineoplastic platinum compound Drugs 0.000 claims abstract description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 12
- 125000003545 alkoxy group Chemical group 0.000 claims description 12
- -1 acryloxy group Chemical group 0.000 claims description 10
- 238000009826 distribution Methods 0.000 claims description 8
- 125000003700 epoxy group Chemical group 0.000 claims description 6
- 229910052710 silicon Inorganic materials 0.000 claims description 6
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 5
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 claims description 4
- 239000000853 adhesive Substances 0.000 abstract description 5
- 230000001070 adhesive effect Effects 0.000 abstract description 5
- 238000013329 compounding Methods 0.000 abstract description 2
- 239000004593 Epoxy Substances 0.000 abstract 1
- 239000000945 filler Substances 0.000 description 10
- 230000017525 heat dissipation Effects 0.000 description 9
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 6
- 238000002156 mixing Methods 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 230000001965 increasing effect Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 4
- 230000005855 radiation Effects 0.000 description 4
- 239000000919 ceramic Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- KBPLFHHGFOOTCA-UHFFFAOYSA-N 1-Octanol Chemical compound CCCCCCCCO KBPLFHHGFOOTCA-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 239000004734 Polyphenylene sulfide Substances 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 238000007259 addition reaction Methods 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000004205 dimethyl polysiloxane Substances 0.000 description 2
- 229920001971 elastomer Polymers 0.000 description 2
- 239000004519 grease Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- 125000000962 organic group Chemical group 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 2
- 229920000069 polyphenylene sulfide Polymers 0.000 description 2
- 238000004382 potting Methods 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 230000000191 radiation effect Effects 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 229920002379 silicone rubber Polymers 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- 239000000454 talc Substances 0.000 description 2
- 229910052623 talc Inorganic materials 0.000 description 2
- 125000004973 1-butenyl group Chemical group C(=CCC)* 0.000 description 1
- 125000006039 1-hexenyl group Chemical group 0.000 description 1
- FRWYFWZENXDZMU-UHFFFAOYSA-N 2-iodoquinoline Chemical compound C1=CC=CC2=NC(I)=CC=C21 FRWYFWZENXDZMU-UHFFFAOYSA-N 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- 229910052580 B4C Inorganic materials 0.000 description 1
- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000005909 Kieselgur Substances 0.000 description 1
- 239000004944 Liquid Silicone Rubber Substances 0.000 description 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 1
- 239000002318 adhesion promoter Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- LTPBRCUWZOMYOC-UHFFFAOYSA-N beryllium oxide Inorganic materials O=[Be] LTPBRCUWZOMYOC-UHFFFAOYSA-N 0.000 description 1
- INAHAJYZKVIDIZ-UHFFFAOYSA-N boron carbide Chemical compound B12B3B4C32B41 INAHAJYZKVIDIZ-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 125000004218 chloromethyl group Chemical group [H]C([H])(Cl)* 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- 239000011362 coarse particle Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 239000002305 electric material Substances 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 229910021485 fumed silica Inorganic materials 0.000 description 1
- 239000005350 fused silica glass Substances 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001183 hydrocarbyl group Chemical group 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 239000012763 reinforcing filler Substances 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
Abstract
Description
【0001】[0001]
【発明の技術分野】本発明は熱伝導性シリコーン組成物
に関し、さらに詳しくは電気・電子材料等の放熱性ポッ
ティング剤、接着剤として有用な熱伝導性シリコーン組
成物に関する。TECHNICAL FIELD The present invention relates to a heat conductive silicone composition, and more particularly to a heat conductive silicone composition useful as a heat radiating potting agent or an adhesive for electric / electronic materials.
【0002】[0002]
【発明の技術的背景とその問題点】従来からパワートラ
ンジスタなどの半導体素子の発熱を防止するために放熱
フィンと半導体素子の間に熱伝導性の良い放熱グリース
及び放熱シートが用いられてきている。放熱グリースの
場合、半導体素子の形状に影響されることなく、手軽に
塗布できる点で現在でも多量に使用されている。しか
し、他の部品を汚損したり、長期間使用するとオイルの
流出があるなどの問題が生じる。一方、放熱シートは他
の部品を汚損したりオイルの流出等の問題はないもの
の、半導体素子の形状に合わせて成形する必要があり、
又、ネジ止め等で撓んで放熱性が劣る等の問題がある。
そのような理由から、液状シリコーンゴム組成物をポッ
ティング剤や接着剤として用いる方法が提示されている
(特開昭61−157569号公報)。しかしながら、
現行のこのような組成物は、放熱効果を上げるために充
填剤の配合量を増すと組成物の粘度が高くなりすぎて、
このような組成物を半導体及び放熱フィンに塗布する際
に均一な塗布が不可能になるばかりか、空気が混入し放
熱性を劣化させる原因にもなるという問題がある。TECHNICAL BACKGROUND AND PROBLEMS OF THE INVENTION In order to prevent heat generation of a semiconductor element such as a power transistor, a heat radiating grease and a heat radiating sheet having good thermal conductivity have been used between the heat radiating fin and the semiconductor element. . The heat-dissipating grease is still used in large quantities because it can be easily applied without being affected by the shape of the semiconductor element. However, there are problems such as contamination of other parts and oil outflow after long-term use. On the other hand, the heat dissipation sheet does not have a problem of polluting other parts or outflow of oil, but it needs to be molded according to the shape of the semiconductor element.
In addition, there is a problem that the heat is dissipated due to bending due to screwing or the like.
For that reason, a method of using the liquid silicone rubber composition as a potting agent or an adhesive has been proposed (Japanese Patent Laid-Open No. 61-157569). However,
Such a current composition has an excessively high viscosity when the amount of the filler is increased in order to improve the heat dissipation effect.
When applying such a composition to the semiconductor and the heat radiation fin, there is a problem that not only uniform coating becomes impossible, but also air is mixed and heat radiation is deteriorated.
【0003】[0003]
【発明の目的】本発明は、上記の問題を解消し、高い熱
伝導性をもちながら、組成物の粘度があまり高くならず
作業性の良い熱伝導性シリコーン組成物の提供を目的と
する。SUMMARY OF THE INVENTION It is an object of the present invention to solve the above problems and to provide a heat conductive silicone composition having a high heat conductivity, a high viscosity and a good workability.
【0004】[0004]
【発明の構成】本発明者は、上記の目的を達成するため
に鋭意研究を重ねた結果、熱伝導性充填剤の粒径を限定
することにより、熱伝導率を上げても粘度が余り高くな
らないことを見出し、本発明を完成するに至った。本発
明は即ち、 (A) ケイ素原子に結合せるアルケニル基が1分子中に少
なくとも2個存在する、25℃における粘度が50〜100,00
0cp のポリオルガノシロキサン 100重量部 (B) ケイ素原子に結合せる水素原子を1分子中に少なく
とも3個有するポリオルガノハイドロジェンシロキサ
ン、ケイ素原子に結合せる水素原子の数が(A) 成分に含
有されるアルケニル基1個に対して 0.5〜 4.0個になる
ような量 (C) 白金及び白金化合物からなる群より選ばれる触媒、
白金原子として(A) 成分重量に対して 0.1〜100ppmとな
る量 (D) 平均粒子径が5〜20μm で、且つ粒度分布として5
μm 以下の粒子及び10μm 以上の粒子をそれぞれ20%以
上含有する熱伝導性充填剤 100〜 800重量部 及び (E) 分子中に次のような官能基をもった有機ケイ素化合
物系接着助剤 0.001〜10重量部 Si-H結合とエポキシ基 Si-H結合とアルコキシ基 ビニル基、エポキシ基、アルコキシ基 アリル基とアルコキシ基 (メタ)アクリロキシ基とアルコキシ基 からなる熱伝導性シリコーン組成物である。The present inventor has conducted extensive studies to achieve the above object, and as a result, by limiting the particle size of the thermally conductive filler, the viscosity is too high even if the thermal conductivity is increased. The inventors have found that it does not occur and have completed the present invention. According to the present invention, (A) at least two alkenyl groups bonded to a silicon atom are present in one molecule, and the viscosity at 25 ° C. is 50 to 100,00.
100 parts by weight of 0 cp polyorganosiloxane (B) Polyorganohydrogensiloxane having at least 3 hydrogen atoms bonded to silicon atoms in one molecule, the number of hydrogen atoms bonded to silicon atoms is contained in component (A) An amount of 0.5 to 4.0 per 1 alkenyl group (C) a catalyst selected from the group consisting of platinum and platinum compounds,
Amount of platinum atom as 0.1 to 100 ppm with respect to component weight (A) (D) Average particle size of 5 to 20 μm and particle size distribution of 5
100 to 800 parts by weight of a thermally conductive filler containing 20% or more of particles each having a particle size of less than 10 μm and 10 μm or more, respectively, and (E) an organosilicon compound-based adhesion aid having the following functional groups in the molecule 0.001 -10 parts by weight Si-H bond and epoxy group Si-H bond and alkoxy group A thermally conductive silicone composition comprising a vinyl group, an epoxy group, an alkoxy group, an allyl group, an alkoxy group, a (meth) acryloxy group and an alkoxy group.
【0005】本発明の組成物を構成する(A) 成分のポリ
オルガノシロキサンは、ケイ素原子に直結したアルケニ
ル基を1分子中に少なくとも2個有するもので、直鎖状
でも分岐状でもよく、またこれらの混合物でもよい。ア
ルケニル基としては、ビニル基、アリル基、1−ブテニ
ル基、1−ヘキセニル基などが例示されるが、合成のし
易さからビニル基が最も有利である。ケイ素原子に結合
せる残余の有機基としては、メチル基、エチル基、プロ
ピル基、ブチル基、ヘキシル基、ドデシル基などのアル
キル基、フェニル基などのアリール基、2−フェニルエ
チル基、2−フェニルプロピル基などのアラルキル基が
例示され、さらに、クロロメチル基、3,3,3 −トリフル
オロプロピル基などの置換炭化水素基も例として挙げら
れる。これらのうち、合成の容易さ、硬化後の良好な物
理的性質を保持するために必要なポリオルガノシロキサ
ンの重合度をもちながら硬化前の低い粘度を保持しうる
点から、メチル基が最も好ましい。ケイ素原子に結合せ
るアルケニル基は、ポリオルガノシロキサンの分子鎖の
末端、途中のいずれに存在しても、またその双方に存在
してもよいが、硬化後の組成物に優れた機械的性質を与
えるためには、少なくとも末端に存在することが好まし
い。また、このポリオルガノシロキサン(A) は25℃にお
ける粘度は10〜100,000cPであり、50〜10,000cPが更に
好ましい。粘度が低すぎると組成物の充填剤がすぐに分
離してしまい、また粘度が高すぎると配合できる充填剤
の量が限定されるために必要な熱伝導性が得られなくな
る。The polyorganosiloxane as the component (A) constituting the composition of the present invention has at least two alkenyl groups directly bonded to silicon atoms in one molecule and may be linear or branched. A mixture of these may be used. Examples of the alkenyl group include a vinyl group, an allyl group, a 1-butenyl group, a 1-hexenyl group, and the like, and the vinyl group is most advantageous from the viewpoint of easy synthesis. Examples of the residual organic group bonded to the silicon atom include an alkyl group such as a methyl group, an ethyl group, a propyl group, a butyl group, a hexyl group, and a dodecyl group, an aryl group such as a phenyl group, a 2-phenylethyl group, and a 2-phenylpropenyl group. Examples thereof include an aralkyl group such as an alkyl group, and further examples include a substituted hydrocarbon group such as a chloromethyl group and a 3,3,3-trifluoropropyl group. Of these, a methyl group is most preferred because it is easy to synthesize and has a degree of polymerization of polyorganosiloxane necessary for maintaining good physical properties after curing, while maintaining a low viscosity before curing. . The alkenyl group bonded to the silicon atom may be present either at the terminal of the molecular chain of the polyorganosiloxane, in the middle thereof, or at both of them, but it does not give the cured composition excellent mechanical properties. In order to give it, it is preferable to exist at least at the terminal. The viscosity of this polyorganosiloxane (A) at 25 ° C. is 10 to 100,000 cP, and more preferably 50 to 10,000 cP. If the viscosity is too low, the filler of the composition will be separated immediately, and if the viscosity is too high, the necessary thermal conductivity cannot be obtained because the amount of the filler that can be blended is limited.
【0006】本発明の組成物を構成する(B) 成分のポリ
オルガノハイドロジェンシロキサンは、架橋により組成
物を網状化するために、ケイ素原子に結合した水素原子
を少なくとも3個有することが必要である。ケイ素原子
に結合せる残余の有機基としては、前述の(A) 成分にお
ける基と同様のものが例示されるが、合成の容易さか
ら、メチル基が最も好ましい。また、アルケニル基が存
在していてもよい。かかるポリオルガノハイドロジェン
シロキサンは、直鎖状、分岐状及び環状のいずれであっ
てもよく、またこれらの混合物であってもよい。(B) 成
分の配合量は、(A) 成分中のアルケニル基1個に対し、
(B) 成分中のケイ素原子に結合した水素原子が0.5 〜
4.0個、好ましくは 1.0〜 3.0個となるような量であ
る。このような好ましい範囲内にある場合は、組成物の
硬化が十分に進行して、硬化後の組成物の硬さが増大
し、さらに硬化後の組成物の物理的性質と耐熱性が向上
する。The polyorganohydrogensiloxane of the component (B) constituting the composition of the present invention needs to have at least three hydrogen atoms bonded to silicon atoms in order to reticulate the composition by crosslinking. is there. Examples of the residual organic group bonded to the silicon atom include the same groups as those in the above-mentioned component (A), but a methyl group is most preferable because of ease of synthesis. Further, an alkenyl group may be present. Such polyorganohydrogensiloxane may be linear, branched or cyclic, or may be a mixture thereof. The blending amount of the component (B) is based on one alkenyl group in the component (A).
(B) The hydrogen atom bonded to the silicon atom in the component is 0.5 to
The amount is 4.0, preferably 1.0 to 3.0. Within such a preferable range, the curing of the composition is sufficiently advanced, the hardness of the composition after curing is increased, and the physical properties and heat resistance of the composition after curing are improved. .
【0007】本発明の組成物を構成する(C) 成分の白金
及び白金化合物から選ばれる触媒は、(A) 成分のアルケ
ニル基と(B) 成分のヒドロシリル基との間の付加反応を
促進する成分である。この(C) 成分としては、例えば白
金の単体、塩化白金酸、白金−オレフィン錯体、白金−
アルコール錯体、白金配位化合物などが例示される。
(C) 成分の配合量は(A) 成分重量に対し白金原子として
0.1 〜100ppmの範囲である。 0.1ppm 未満では触媒とし
ての効果がなく、100ppmを超えても特に硬化速度の向上
は期待できない。The catalyst selected from the component (C) platinum and the platinum compound constituting the composition of the present invention promotes the addition reaction between the alkenyl group of the component (A) and the hydrosilyl group of the component (B). It is an ingredient. Examples of the component (C) include simple substance of platinum, chloroplatinic acid, platinum-olefin complex, platinum-
Examples thereof include alcohol complexes and platinum coordination compounds.
The blending amount of component (C) is platinum atom based on the weight of component (A).
It is in the range of 0.1 to 100 ppm. If it is less than 0.1 ppm, it has no effect as a catalyst, and if it exceeds 100 ppm, no particular improvement in the curing rate can be expected.
【0008】本発明の組成物を構成する(D) 成分は、本
組成物に熱伝導性を付与するための充填剤である。この
ような充填剤としては、アルミ粉、銅粉、ニッケル粉等
の金属粉末;アルミナ、酸化マグネシウム、酸化ベリリ
ウム、酸化クロム、酸化チタン等の金属酸化物;窒化ケ
イ素、窒化ホウ素、炭化ホウ素、チタンカーバイト、炭
化ケイ素、窒化アルミニウム等のセラミックス類が例示
されるが、特に電気絶縁性が必要な場合は金属酸化物か
セラミックス類が好ましく、特に放熱効果の点からアル
ミナと窒化ケイ素が好ましい。本発明において特徴的な
ことは、この熱伝導性充填剤の平均粒子径が5〜20μm
であることである。平均粒子径が5μm 未満の場合は組
成物に充填する場合に必要な放熱効果を与えるだけの配
合ができず、また平均粒子径が20μm を超えると補強効
果が少なく、また放熱効果もよくない。The component (D) which constitutes the composition of the present invention is a filler for imparting thermal conductivity to the composition. Such fillers include metal powders such as aluminum powder, copper powder and nickel powder; metal oxides such as alumina, magnesium oxide, beryllium oxide, chromium oxide and titanium oxide; silicon nitride, boron nitride, boron carbide, titanium. Examples thereof include ceramics such as carbide, silicon carbide, and aluminum nitride. Particularly when electrical insulation is required, metal oxides or ceramics are preferable, and alumina and silicon nitride are particularly preferable from the viewpoint of heat dissipation effect. The characteristic of the present invention is that the average particle diameter of the heat conductive filler is 5 to 20 μm.
It is to be. If the average particle size is less than 5 μm, it cannot be blended so as to give the heat radiation effect required when the composition is filled, and if the average particle size exceeds 20 μm, the reinforcing effect is small and the heat radiation effect is not good.
【0009】さらに本発明において好ましいことは、該
充填剤の粒度分布が単分散でなく、広い粒度分布を持つ
ことである。即ち、前述の平均粒子径においても、粒度
の細かいものと比較的荒いものの混合体になることが系
への充填の容易さ、熱伝導率の高いこと、組成物の粘度
が適正値を保ちやすいことから好ましく、粒度分布にお
いて5μm 以下の粒子と10μm 以上の粒子が各々20%以
上存在していることがより好ましい。このような充填剤
は、例えばアルミナの場合は粒度分布が広くかつ平均粒
子径が5〜20μm のものを選んでも、また平均粒子径5
μm 以下の単分散のものと平均粒子径20μm 以上のもの
を配合して用いてもよい。(D) 成分の配合量は(A) 成分
100重量部に対し 100〜 800重量部である。 100重量部
未満では熱伝導性が十分でなく、 800重量部を超えると
系に配合して流動性を発揮できない。Further preferred in the present invention is that the particle size distribution of the filler is not monodisperse but has a broad particle size distribution. That is, even in the above-mentioned average particle size, a mixture of a fine particle and a relatively coarse particle is easily filled into the system, the thermal conductivity is high, and the viscosity of the composition is easy to maintain an appropriate value. Therefore, it is more preferable that particles having a particle size distribution of 5 μm or less and particles having a particle size of 10 μm or more are present in an amount of 20% or more. In the case of alumina, for example, such a filler having a wide particle size distribution and an average particle size of 5 to 20 μm is selected.
A monodisperse particle having a particle size of not more than μm and an average particle size of not less than 20 μm may be blended and used. The amount of component (D) is the same as component (A)
100 to 800 parts by weight based on 100 parts by weight. If it is less than 100 parts by weight, the thermal conductivity is not sufficient, and if it exceeds 800 parts by weight, it cannot be added to the system to exhibit fluidity.
【0010】本発明の(E) 接着助剤は、本発明の組成物
を発熱体と放熱フィンを接着し固定するような用途に用
いる際に、その接着性を増強する目的で配合される必須
の成分である。この(E) 成分の付加反応によって硬化す
るシリコーンゴムの接着助剤としては、例えば特公昭47
-36255号公報、特公昭50-3460 号公報、特公昭53-13508
号公報、特公昭56-39783号公報、特開昭48-16952号公
報、特開昭50-124953 号公報、特開昭52-22051号公報、
特開昭52-126455 号公報、特開昭53-144960 号公報、特
開昭54-37157号公報、特開昭54-80358号公報及び特開昭
54-91559号公報などに開示されているものが用いられ
る。具体的には、分子中に次のような官能基をもったシ
ラン誘導体やシロキサン誘導体が好ましい。 Si-H結合とエポキシ基 Si-H結合とアルコキシ基 ビニル基、エポキシ基、アルコキシ基 アリル基とアルコキシ基 (メタ)アクリロキシ基とアルコキシ基 これらの官能基を有する化合物として次のような化合物
が挙げられる。ただし、下記式中、Meはメチル基を表
す。When the composition (E) of the present invention is used for the purpose of adhering and fixing the composition of the present invention to the heating element and the radiation fin, it is essential to be added for the purpose of enhancing its adhesiveness. Is a component of. Examples of adhesion promoters for silicone rubber that cure by the addition reaction of component (E) include, for example, Japanese Patent Publication No.
-36255, Japanese Patent Publication No. 50-3460, Japanese Patent Publication No. 53-13508
JP, JP-B-56-39783, JP-A-48-16952, JP-A-50-124953, JP-A-52-22051,
JP-A-52-126455, JP-A-53-144960, JP-A-54-37157, JP-A-54-80358 and JP-A-
The one disclosed in Japanese Patent Publication No. 54-91559 is used. Specifically, silane derivatives and siloxane derivatives having the following functional groups in the molecule are preferable. Si-H bond and epoxy group Si-H bond and alkoxy group Vinyl group, epoxy group, alkoxy group Allyl group and alkoxy group (meth) acryloxy group and alkoxy group The following compounds are listed as compounds with these functional groups. To be However, in the following formula, Me represents a methyl group.
【0011】[0011]
【化1】 Embedded image
【0012】[0012]
【化2】 Embedded image
【0013】この場合の(E) 成分の配合量は(A) 成分 1
00重量部に対して0.001 〜10重量部、好ましくは 0.1〜
5重量部である。少なすぎると接着性付与が不十分であ
り、多すぎるとゴムの特性に悪影響を及ぼす。In this case, the blending amount of the component (E) is 1
0.001 to 10 parts by weight, preferably 0.1 to 10 parts by weight
5 parts by weight. If the amount is too small, the adhesion is not sufficiently imparted, and if the amount is too large, the properties of the rubber are adversely affected.
【0014】本発明の組成物には上記した(A) 〜(E) 成
分以外に必要に応じて補強用の充填剤を配合できる。こ
の充填剤としては、ヒュームドシリカ、疎水化沈降法シ
リカ、溶融シリカ、石英微粉末、珪藻土、溶融タルク、
タルク、ガラス繊維、グラファイト、カーボン、顔料等
が例示される。この充填剤の量は(D) の充填剤による粘
度上昇が大きいため、多量に添加するのは好ましくな
く、(A) 成分 100重量部に対し30重量部以下である。In addition to the above-mentioned components (A) to (E), a reinforcing filler may be added to the composition of the present invention if necessary. As the filler, fumed silica, hydrophobized sedimentation silica, fused silica, fine quartz powder, diatomaceous earth, fused talc,
Examples thereof include talc, glass fiber, graphite, carbon and pigment. The amount of this filler is not preferable to be added in a large amount because the viscosity increase due to the filler of (D) is large, and is 30 parts by weight or less relative to 100 parts by weight of the component (A).
【0015】本発明の組成物は、上記した(A) 〜(E) 成
分を混合することによって得られるが、(A),(B) 及び
(C) 成分は、混合した場合常温でも反応し硬化してしま
うので、その使用に際して(A),(B) 及び(C) 成分のうち
いずれか1つの成分を保存しておいて、直前に混合して
用いるか、又は組成物中に公知の安定化剤を配合するこ
とにより硬化反応を防止する必要がある。The composition of the present invention can be obtained by mixing the above-mentioned components (A) to (E), which comprises (A), (B) and
Component (C) reacts and cures at room temperature when mixed, so store one of the components (A), (B), and (C) before using it. It is necessary to prevent the curing reaction by mixing or using a known stabilizer in the composition.
【0016】[0016]
【発明の効果】このようにして得られる本発明の組成物
は、例えばレギュレータ及びイグナイタなどのセラミッ
ク基板と放熱フィンの放熱接着、パワートランジスタと
放熱フィンの放熱接着及びプリンターのドットヘッドと
放熱フィンの放熱接着用に使用される。以上説明したと
おり、本発明の熱伝導性シリコーン組成物は、高い熱伝
導率を有しているため、発熱源からの熱を効率よく放熱
フィン等に伝えることができる。半導体等のパワーアッ
プ及び集積化に伴う発熱量の増大にも大きく役立つもの
である。また、接着性を付与した組成物はネジ止め等の
必要がなく、電気・電子部品の小型化にも十分役立つも
のである。特に車載用の電気・電子部品に好適に利用さ
れる。The composition of the present invention thus obtained is used for heat dissipation adhesion between a ceramic substrate such as a regulator and an igniter and heat dissipation fins, heat dissipation adhesion between power transistors and heat dissipation fins, and printer dot heads and heat dissipation fins. Used for heat dissipation bonding. As described above, the heat-conductive silicone composition of the present invention has a high heat conductivity, and therefore can efficiently transfer the heat from the heat source to the heat radiation fin or the like. It is also very useful for increasing the amount of heat generated by powering up and integrating semiconductors and the like. Further, the composition having adhesiveness does not require screwing or the like, and is sufficiently useful for miniaturization of electric / electronic parts. Particularly, it is suitably used for electric / electronic parts for vehicles.
【0017】[0017]
【実施例】以下、実施例を掲げて本発明をさらに詳述す
る。なお、以下において「部」はすべて「重量部」を表
し、「%」はすべて「重量%」を表す。まず、本発明組
成物及び比較例組成物を形成する以下の各成分を用意し
た。 (A) 成分; A-1:両末端がジメチルビニルシリル基で封鎖され、25℃
における粘度が1,000cP のポリジメチルシロキサン A-2:両末端がジメチルビニルシリル基で封鎖され、25℃
における粘度が350cPのポリジメチルシロキサンEXAMPLES The present invention will be described in more detail below with reference to examples. In the following, all "parts" represent "parts by weight" and all "%" represent "% by weight". First, the following components forming the composition of the present invention and the composition of the comparative example were prepared. Component (A); A-1: Both ends are blocked with dimethylvinylsilyl groups, 25 ° C
Viscosity of 1,000 cP in Polydimethylsiloxane A-2: Both ends blocked with dimethylvinylsilyl group, 25 ℃
Viscosity of 350 cP in polydimethylsiloxane
【0018】[0018]
【化3】 Embedded image
【0019】(C) 成分; C-1:塩化白金酸のオクタノール溶液、白金原子として2
%含有 (D) 成分; D-1:平均粒子径 3.5μm 、粒子径2〜8μm の含有量が
85%の単分散アルミナ D-2:平均粒子径25μm 、粒子径10〜50μm の含有量が90
%の単分散アルミナ D-3:平均粒子径15μm 、粒子径5μm 以下の含有量が35
%で、かつ粒子径10μm 以上の含有量が35%の広い分布
を持つアルミナ D-4:平均粒子径10μm 、粒子径5μm 以下の含有量が40
%で、かつ粒子径10μm 以上の含有量が30%の広い分布
を持つアルミナ (E) 成分;Component (C); C-1: Octanol solution of chloroplatinic acid, 2 as platinum atom
% Content (D) component; D-1: content of average particle size 3.5 μm, particle size 2-8 μm
85% monodisperse alumina D-2: average particle size 25μm, particle size 10 ~ 50μm content 90
% Monodisperse alumina D-3: average particle size 15 μm, content of particle size 5 μm or less 35
%, And the content of particles having a particle size of 10 μm or more is 35% and having a wide distribution of 35%.
%, And an alumina (E) component having a broad distribution of 30% with a particle size of 10 μm or more;
【0020】[0020]
【化4】 [Chemical 4]
【0021】(A) 〜(E) 成分を以下のように混合して本
発明組成物及び比較例組成物を得た。即ち、容器に(A)
成分を取り、表1に示す配合量で(D) 成分を加え、徐々
に加熱して 150℃で1時間混練した後、30mmHg以下で加
熱減圧した。この混合体を常温になるまで冷却してベー
スコンパウンドとし、(B),(C) 及び(E) 成分を表1に示
す配合量で加えて均一になるように混合した。この組成
物について以下の評価を行った。 粘 度;回転粘度計にて測定(25℃) 熱伝導率;各組成物を2mm厚のシート状にして 150
℃、1時間加熱してゴム弾性体にした後、25℃に戻し、
昭和電工製 Shotherm QTM-DII 迅速熱伝導率計にて測定 剪断接着強さ;Al板及びポリフェニレンサルファイド
(PPS)板に1mm厚の接着体を作成し、JIS C-2107に
準じて行った。 結果を表1に示す。The components (A) to (E) were mixed as follows to obtain the composition of the present invention and the composition of the comparative example. That is, in the container (A)
The components were taken, the component (D) was added in the blending amount shown in Table 1, gradually heated and kneaded at 150 ° C. for 1 hour, and then heated and depressurized at 30 mmHg or less. This mixture was cooled to room temperature to obtain a base compound, and the components (B), (C) and (E) were added in the compounding amounts shown in Table 1 and mixed uniformly. The following evaluations were performed on this composition. Viscosity: Measured with a rotational viscometer (25 ℃) Thermal conductivity: Each composition was made into a sheet with a thickness of 2 mm 150
After heating to ℃ for 1 hour to make a rubber elastic body, return to 25 ℃,
Measured with Shotherm QTM-DII rapid thermal conductivity meter manufactured by Showa Denko. Shear adhesive strength: An Al plate and a polyphenylene sulfide (PPS) plate each having a thickness of 1 mm were prepared according to JIS C-2107. The results are shown in Table 1.
【0022】[0022]
【表1】 [Table 1]
─────────────────────────────────────────────────────
─────────────────────────────────────────────────── ───
【手続補正書】[Procedure amendment]
【提出日】平成7年12月26日[Submission date] December 26, 1995
【手続補正1】[Procedure Amendment 1]
【補正対象書類名】明細書[Document name to be amended] Statement
【補正対象項目名】特許請求の範囲[Name of item to be amended] Claims
【補正方法】変更[Correction method] Change
【補正内容】[Correction content]
【特許請求の範囲】[Claims]
Claims (1)
1分子中に少なくとも2個存在する、25℃における粘度
が50〜100,000cp のポリオルガノシロキサン 100重量部 (B) ケイ素原子に結合せる水素原子を1分子中に少なく
とも3個有するポリオルガノハイドロジェンシロキサ
ン、ケイ素原子に結合せる水素原子の数が(A) 成分に含
有されるアルケニル基1個に対して 0.5〜 4.0個になる
ような量 (C) 白金及び白金化合物からなる群より選ばれる触媒、
白金原子として(A) 成分重量に対して 0.1〜100ppmとな
る量 (D) 平均粒子径が5〜20μm で、且つ粒度分布として5
μm 以下の粒子及び10μm 以上の粒子をそれぞれ20%以
上含有する熱伝導性充填剤 100〜 800重量部 及び (E) 分子中に次のような官能基をもった有機ケイ素化合
物系接着助剤 0.001〜10重量部 Si-H結合とエポキシ基 Si-H結合とアルコキシ基 ビニル基、エポキシ基、アルコキシ基 アリル基とアルコキシ基 (メタ)アクリロキシ基とアルコキシ基 からなる熱伝導性シリコーン組成物。1. (A) 100 parts by weight of a polyorganosiloxane having at least two alkenyl groups bonded to silicon atoms in one molecule and having a viscosity at 25 ° C. of 50 to 100,000 cp (B) bonded to silicon atoms Polyorganohydrogensiloxane having at least 3 hydrogen atoms in one molecule, such that the number of hydrogen atoms bonded to silicon atom is 0.5 to 4.0 per 1 alkenyl group contained in the component (A). Amount (C) a catalyst selected from the group consisting of platinum and platinum compounds,
Amount of platinum atom as 0.1 to 100 ppm with respect to component weight (A) (D) Average particle size of 5 to 20 μm and particle size distribution of 5
100 to 800 parts by weight of a thermally conductive filler containing 20% or more of particles each having a particle size of less than 10 μm and 10 μm or more, respectively, and (E) an organosilicon compound-based adhesion aid having the following functional groups in the molecule 0.001 ~ 10 parts by weight Si-H bond and epoxy group Si-H bond and alkoxy group Vinyl group, epoxy group, alkoxy group Allyl group and alkoxy group A thermally conductive silicone composition consisting of (meth) acryloxy group and alkoxy group.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP30735795A JPH08208993A (en) | 1995-11-27 | 1995-11-27 | Thermally conductive silicone composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP30735795A JPH08208993A (en) | 1995-11-27 | 1995-11-27 | Thermally conductive silicone composition |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63249607A Division JPH0297559A (en) | 1988-10-03 | 1988-10-03 | Thermal conductive silicone composition |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH08208993A true JPH08208993A (en) | 1996-08-13 |
Family
ID=17968128
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP30735795A Pending JPH08208993A (en) | 1995-11-27 | 1995-11-27 | Thermally conductive silicone composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH08208993A (en) |
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Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0297559A (en) * | 1988-10-03 | 1990-04-10 | Toshiba Silicone Co Ltd | Thermal conductive silicone composition |
-
1995
- 1995-11-27 JP JP30735795A patent/JPH08208993A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0297559A (en) * | 1988-10-03 | 1990-04-10 | Toshiba Silicone Co Ltd | Thermal conductive silicone composition |
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