JPH08180352A - Magnetic head slider and its production - Google Patents
Magnetic head slider and its productionInfo
- Publication number
- JPH08180352A JPH08180352A JP32072894A JP32072894A JPH08180352A JP H08180352 A JPH08180352 A JP H08180352A JP 32072894 A JP32072894 A JP 32072894A JP 32072894 A JP32072894 A JP 32072894A JP H08180352 A JPH08180352 A JP H08180352A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic head
- film
- head slider
- slider
- protective film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims 2
- 230000001590 oxidative effect Effects 0.000 claims abstract description 5
- 239000011253 protective coating Substances 0.000 claims description 11
- 239000000203 mixture Substances 0.000 claims description 3
- 239000010408 film Substances 0.000 abstract description 79
- 230000001681 protective effect Effects 0.000 abstract description 38
- 238000000034 method Methods 0.000 abstract description 8
- 238000010438 heat treatment Methods 0.000 abstract description 7
- 239000010409 thin film Substances 0.000 abstract description 5
- 238000004544 sputter deposition Methods 0.000 abstract description 4
- 229910003070 TaOx Inorganic materials 0.000 abstract description 3
- 239000000758 substrate Substances 0.000 description 8
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 6
- 230000003647 oxidation Effects 0.000 description 6
- 238000007254 oxidation reaction Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- 229910052799 carbon Inorganic materials 0.000 description 4
- 239000012790 adhesive layer Substances 0.000 description 3
- 230000006866 deterioration Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- AOWKSNWVBZGMTJ-UHFFFAOYSA-N calcium titanate Chemical compound [Ca+2].[O-][Ti]([O-])=O AOWKSNWVBZGMTJ-UHFFFAOYSA-N 0.000 description 2
- 150000001721 carbon Chemical class 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 229910000859 α-Fe Inorganic materials 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910034327 TiC Inorganic materials 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 230000001050 lubricating effect Effects 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000005341 toughened glass Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- Adjustment Of The Magnetic Head Position Track Following On Tapes (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、磁気ディスク装置の磁
気ヘッドスライダに関するBACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a magnetic head slider of a magnetic disk device.
【従来の技術】一般に、磁気ディスク装置ではコンタク
トスタートストップ（ＣＳＳ）方式が採用されている。
ＣＳＳ方式では、装置の起動停止時に磁気ディスクと磁
気ヘッドが接触摺動状態にあり、長期間に亘り磁気ディ
スクと磁気ヘッドは接触摺動を繰り返す。そのため、Ｃ
ＳＳ時の磁気ディスクおよび磁気ヘッドスライダの耐摩
耗特性、摩擦特性の向上などの機械的耐久性の確保は磁
気ディスク装置における重要な課題のひとつに位置付け
られている。2. Description of the Related Art Generally, a contact start stop (CSS) system is adopted in a magnetic disk device.
In the CSS method, the magnetic disk and the magnetic head are in a contact sliding state when the apparatus is stopped, and the magnetic disk and the magnetic head repeat the contact sliding for a long period of time. Therefore, C
Ensuring mechanical durability such as improvement in wear resistance and frictional characteristics of the magnetic disk and the magnetic head slider during SS is positioned as one of important issues in the magnetic disk device.
【０００２】従来、磁気ディスク装置では機械的耐久性
を向上させるために、保護膜の形成や記録膜上への各種
潤滑剤の塗布などの対策が施されている。特に、保護膜
はＣＳＳ時における機械的耐久性の劣化を防止するこ
と、および磁気ディスク装置稼働中の磁気ヘッドスライ
ダとの接触による磁気ディスクの損傷を防止する目的
で、主に記録膜上に設けられている。近年では、高記録
密度化の要求から、磁気ディスク／磁気ヘッドスライダ
間の微小隙間（以下、スペーシングと記す）の狭小化が
急速に進んでおり、保護膜による磁気スペーシングの増
加を少なくするため媒体保護膜の薄膜化は必須である。
しかし、スペーシングの狭小化により、磁気ディスク装
置稼働中に磁気ディスクと磁気ヘッドスライダが接触す
る可能性が増大する。そのため、媒体保護膜としてカー
ボン、セラミックス、酸化シリコンなどの硬質膜が用い
られている。Conventionally, in order to improve mechanical durability, magnetic disk devices have been provided with measures such as formation of a protective film and coating of various lubricants on a recording film. In particular, the protective film is provided mainly on the recording film for the purpose of preventing deterioration of mechanical durability during CSS and preventing damage to the magnetic disk due to contact with the magnetic head slider during operation of the magnetic disk device. Has been. In recent years, due to the demand for higher recording density, a narrow gap (hereinafter referred to as a spacing) between a magnetic disk and a magnetic head slider is rapidly narrowed, and an increase in magnetic spacing due to a protective film is reduced. Therefore, it is essential to make the medium protective film thinner.
However, the narrowing of the spacing increases the possibility that the magnetic disk and the magnetic head slider will come into contact with each other during operation of the magnetic disk device. Therefore, a hard film made of carbon, ceramics, silicon oxide or the like is used as the medium protection film.
【０００３】しかし、媒体保護膜が硬質化されると磁気
ヘッドや磁気ヘッドスライダ摺動面が摩耗する可能性が
高くなる。それらは、ヘッド性能の低下やＣＳＳ特性の
劣化につながるため、磁気ヘッドの保護およびスライダ
摺動面の耐摩耗性の確保が必要になっている。However, when the medium protective film is hardened, the magnetic head and the sliding surface of the magnetic head slider are likely to be worn. Since these lead to deterioration of head performance and deterioration of CSS characteristics, it is necessary to protect the magnetic head and ensure wear resistance of the slider sliding surface.
【０００４】磁気ディスク装置の磁気ヘッドスライダ面
上に保護膜を設けることに関しては、媒体保護膜と比較
してあまり例は多くなかったが、最近いくつかの材料が
提案されている。例えば、特開平４−３６４２１７号公
報に保護被膜を有する磁気ヘッドスライダーとして、磁
気ヘッドスライダの空気支持面に接着層としてシリコン
膜を用いたアモルファス水素添加炭素膜を形成すること
が開示されている。これは、スライダ加工プロセス時に
磁気ヘッドを保護するとともに、磁気記録装置の使用中
に磁気ヘッドを摩耗および腐食から保護することを目的
としたものである。Regarding the provision of the protective film on the surface of the magnetic head slider of the magnetic disk device, there have been few examples as compared with the medium protective film, but recently several materials have been proposed. For example, Japanese Patent Application Laid-Open No. 4-364217 discloses a magnetic head slider having a protective coating, in which an amorphous hydrogenated carbon film using a silicon film as an adhesive layer is formed on the air bearing surface of the magnetic head slider. This is intended to protect the magnetic head during the slider processing process and to protect the magnetic head from wear and corrosion during use of the magnetic recording device.
【０００５】特開平４−３０２８８０号公報に高硬度の
保護膜を有する磁気ヘツドスライダについて開示されて
いる。これはスライダ摺動面にＳｉＯ2 、ＺｒＯ2 −Ｙ
2 Ｏ3 或いは、ＭｇＯ−ＳｉＯ2 のいずれかの系からな
る保護膜を形成したものである。Japanese Unexamined Patent Publication No. 4-302880 discloses a magnetic head slider having a protective film of high hardness. This is because the slider sliding surface has SiO 2 , ZrO 2 -Y
A protective film made of either 2 O 3 or MgO-SiO 2 is formed.
【０００６】特開昭５８−１５０１２２号公報には耐摩
擦特性、摩耗特性を向上させる目的で、スライダ上に潤
滑作用を有する薄膜を形成することが開示されている。
材料としてはカーボンやＭｏＳ2 などが記載されてい
る。Japanese Unexamined Patent Publication (Kokai) No. 58-150122 discloses that a thin film having a lubricating action is formed on a slider for the purpose of improving friction resistance and wear characteristics.
Materials such as carbon and MoS 2 are described.
【０００７】[0007]
【発明が解決しようとする課題】上述のように高記録密
度を達成するためには、スペーシングの狭小化が不可欠
であり、媒体保護膜については薄膜化が進んでいる。ス
ライダ保護膜についてもその厚さは直接スペーシングの
ロスにつながるため、薄膜化は必須となる。As described above, in order to achieve a high recording density, it is necessary to narrow the spacing, and the medium protective film is being thinned. Since the thickness of the slider protective film also directly causes a loss in spacing, it is essential to reduce the film thickness.
【０００８】しかしながら、従来技術に記載されたスラ
イダ保護膜では、薄膜化が困難であるという問題点があ
った。例えば、特開平４−３６４２１７号公報に記載さ
れた保護被膜を有する磁気ヘッドスライダーでは、アモ
ルファス水素添加炭素膜とスライダ材料との密着性が不
十分であるため、密着性を確保するためにシリコンの接
着層を設けなければならない。シリコン接着層の膜厚は
１０〜５０オングストローム（以後、Ａと略す）と記載
されている。また、特開平４−３０２８８０号公報では
保護被膜の厚さは２００〜５００Ａと記載されている。
特開昭５８−１５０１２２号公報では、スライダ上の薄
膜の厚さは２００〜８００Ａと記載されている。低スペ
ーシングが要求される現在では実用的な厚さとは言えな
い。However, the slider protective film described in the prior art has a problem that it is difficult to reduce the film thickness. For example, in the magnetic head slider having the protective coating described in Japanese Patent Laid-Open No. 4-364217, the adhesion between the amorphous hydrogenated carbon film and the slider material is insufficient. An adhesive layer must be provided. The film thickness of the silicon adhesive layer is described as 10 to 50 angstrom (hereinafter abbreviated as A). Further, in JP-A-4-302880, the thickness of the protective film is described as 200 to 500A.
In JP-A-58-150122, the thickness of the thin film on the slider is described as 200 to 800A. At present, when low spacing is required, it cannot be said that the thickness is practical.
【０００９】このように、従来技術に記載されたスライ
ダ保護膜ではスライダ保護膜の薄膜化が困難であった。
本発明の目的は、機械的耐久性に優れた薄型の磁気ヘッ
ドスライダ保護膜を提供するものである。As described above, it is difficult to reduce the thickness of the slider protective film in the slider protective film described in the prior art.
An object of the present invention is to provide a thin magnetic head slider protective film having excellent mechanical durability.
【００１０】[0010]
【課題を解決するための手段】本発明は、前記課題点に
鑑みて提案されたもので、この問題点を解決するための
技術的手段は、スパッタリング法などの成膜方法によ
り、磁気ヘッドスライダの空気支持面にＴａから成る薄
膜を成膜し、酸化雰囲気中１００〜３００℃で熱処理を
施すことにより、少なくとも最外層がＴａＯx 膜（ｘ＝
１．８〜２．５）となるような膜を形成し、磁気ヘッド
スライダ保護被膜とすることである。The present invention has been proposed in view of the above problems, and a technical means for solving the problems is a magnetic head slider by a film forming method such as a sputtering method. A thin film of Ta is formed on the air-supporting surface of the film and heat-treated at 100 to 300 ° C. in an oxidizing atmosphere, so that at least the outermost layer is a TaO x film (x =
1.8 to 2.5) to form a magnetic head slider protective film.
【００１１】この保護被膜は、膜全体がＴａＯx 膜
（１．８≦ｘ≦２．５）であっても良いし、スライダと
の接触面がＴａ膜もしくは酸素含有率の少ないＴａＯx
膜（０＜ｘ＜１．８）であってもよい。いずれにしても
酸化被膜全体として２０Ａあれば十分な耐磨耗性が得ら
れる。また膜厚が厚くなれば耐磨耗性は向上するが低ス
ペーシングの要望を満足するために１００Ａ程度が好適
である。The protective film may be a TaO x film (1.8 ≦ x ≦ 2.5) as a whole, or a Ta film having a contact surface with the slider or a TaO x film having a low oxygen content.
It may be a film (0 <x <1.8). In any case, sufficient wear resistance can be obtained if the oxide film as a whole has a thickness of 20A. Further, as the film thickness increases, the abrasion resistance improves, but about 100 A is preferable in order to satisfy the demand for low spacing.
【００１２】また、酸化雰囲気中の熱処理温度は、１０
０℃より低い温度であるとＴａの酸化が進行せず、３０
０℃以上であると酸化被膜下の磁気ヘッド部分が劣化す
るため適当でない。The heat treatment temperature in the oxidizing atmosphere is 10
If the temperature is lower than 0 ° C, the oxidation of Ta does not proceed,
If the temperature is higher than 0 ° C, the magnetic head portion under the oxide film deteriorates, which is not suitable.
【００１３】[0013]
【作用】Ｔａ膜やＴａＯx 膜がセラミックス薄膜（Ａｌ
2 Ｏ3 −ＴｉＣ、窒化シリコン、チタン酸カルシウム
等）、強化ガラス、石英ガラス、カーボン、フェライト
等と密着性がよいことは特開平３−２４８３４３号公
報、Ｓ６３−２９２４１７号公報等で知られている。し
かし、これら公報においては磁気ヘッドの保護被膜とし
て最も重要な要素である耐磨耗性については全く考慮さ
れていない。本発明はＴａＯx 膜が薄膜化しても密着性
・耐磨耗性ともに優れていることを鑑みてなされたもの
である。[Function] Ta film or TaO x film is a ceramic thin film (Al
2 O 3 -TiC, silicon nitride, calcium titanate, etc.), tempered glass, quartz glass, carbon, ferrite, etc. are known to have good adhesiveness in JP-A-3-248343 and S63-292417. There is. However, in these publications, the wear resistance, which is the most important factor as a protective coating for a magnetic head, is not considered at all. The present invention has been made in view of the fact that even if the TaO x film is thinned, the adhesion and abrasion resistance are excellent.
【００１４】本発明の技術手段によれば、磁気ヘッドス
ライダの磁気ディスクと対向し、接触する面つまり空気
支持面は高い硬度を有し長期にわたり磁気ヘッドを保護
するとともに、優れた機械的耐久性を示す。保護被膜を
設けることによるスペーシングロスが従来のスライダ保
護被膜と比較して少ないため、磁気ディスク装置のスラ
イダ保護膜として適している。According to the technical means of the present invention, the surface of the magnetic head slider facing and contacting the magnetic disk, that is, the air supporting surface has a high hardness and protects the magnetic head for a long period of time, and also has excellent mechanical durability. Indicates. Since the spacing loss caused by providing the protective film is smaller than that of the conventional slider protective film, it is suitable as a slider protective film of a magnetic disk device.
【００１５】[0015]
【実施例】以下、本発明について図に示す実施例によっ
て詳細に説明する。The present invention will be described in detail below with reference to the embodiments shown in the drawings.
【００１６】図１は本発明に係る磁気ヘッドスライダを
示す断面図である。磁気ヘッドスライダ４の少なくとも
空気支持面２上に、スライダ保護被膜１としてＴａＯx
膜（ｘ＝１．８〜２．５）が成膜されている。FIG. 1 is a sectional view showing a magnetic head slider according to the present invention. At least on the air bearing surface 2 of the magnetic head slider 4, TaO x is used as a slider protective film 1.
A film (x = 1.8 to 2.5) is formed.
【００１７】本発明の実施例を、図２に示す形状の磁気
ヘッドスライダ４に本発明によるスライダ保護被膜を適
用した一例をもとに説明する。An embodiment of the present invention will be described based on an example in which the slider protective coating of the present invention is applied to the magnetic head slider 4 having the shape shown in FIG.
【００１８】まず、本発明によるスライダ保護被膜の作
成方法について示す。スライダ保護被膜の成膜はスパッ
タリング法、蒸着法などにより成膜したＴａ膜を酸化雰
囲気中で熱処理を施すことにより形成される。例えば、
Ａｌ2 Ｏ3 −ＴｉＣ焼結体を基板に用いて高周波マグネ
トロンスパッタリング法により成膜する場合、スパッタ
ガスは水素ガスを５％含むアルゴンガス、ガス圧は約
１．６Ｐａ、投入電力３００Ｗの条件で成膜し、大気中
約１００〜３００の温度で熱処理を行う。熱処理時間は
熱処理温度により異なるが２〜１６時間の範囲で変化さ
せる。図３に熱処理温度２００で成膜したＴａ膜の時間
に対する酸化量をＴａＯｘ膜の深さで示す。酸化時間８
時間でＴａ膜は５０Ａ程度酸化される。その後スライダ
形状に加工を施すことにより図１に示した、磁気ヘッド
スライダ４の少なくとも空気支持面２上にＴａからなる
スライダ保護膜１を有する磁気ヘッドスライダが得られ
る。この方法により作成されるＴａ酸化膜の組成は、Ｔ
ａＯx 、ｘ＝１．８〜２．５であり、Ａｌ2 Ｏ3 −Ｔｉ
Ｃ焼結体基板と良好な密着性が保たれる。First, a method of forming the slider protective coating according to the present invention will be described. The slider protective film is formed by subjecting a Ta film formed by a sputtering method, a vapor deposition method or the like to a heat treatment in an oxidizing atmosphere. For example,
When a film is formed by a high frequency magnetron sputtering method using an Al 2 O 3 —TiC sintered body as a substrate, the sputtering gas is an argon gas containing 5% of hydrogen gas, the gas pressure is about 1.6 Pa, and the input power is 300 W. A film is formed and heat treatment is performed at a temperature of about 100 to 300 in the atmosphere. The heat treatment time varies depending on the heat treatment temperature, but is changed within the range of 2 to 16 hours. FIG. 3 shows the amount of oxidation of the Ta film formed at the heat treatment temperature 200 with respect to time by the depth of the TaOx film. Oxidation time 8
The Ta film is oxidized by about 50 A in time. After that, the slider shape is applied to obtain the magnetic head slider having the slider protective film 1 made of Ta on at least the air supporting surface 2 of the magnetic head slider 4 shown in FIG. The composition of the Ta oxide film formed by this method is T
aO x , x = 1.8 to 2.5, Al 2 O 3 —Ti
Good adhesion with the C sintered body substrate is maintained.
【００１９】次に、本発明により作成したスライダ保護
膜の硬度および機械的耐久性の実験につき図４および図
５を用いて説明する。図４にＡｌ2 Ｏ3 −ＴｉＣ焼結体
基板上に作成したＴａＯx 膜の硬度を保護膜を設けない
基板の硬度と比較して示す。ＴａＯx 膜の厚さは５０Ａ
である。図４に示したようにＴａＯx 膜の硬度は、ｘ＝
１．８〜２．５の範囲においてＡｌ2 Ｏ3 −ＴｉＣ焼結
体基板の硬度と比較して高硬度であり、最大３０ＧＰａ
硬度が大きい。このように、ＴａＯx 膜がスライダ保護
被膜として設けることにより磁気ヘッドスライダのディ
スクと摺動する面は高い硬度を有するように形成でき
る。そのため、磁気ヘッド５は長期にわたる接触摺動か
ら保護される。Next, an experiment on the hardness and mechanical durability of the slider protective film produced according to the present invention will be described with reference to FIGS. 4 and 5. FIG. 4 shows the hardness of the TaO x film formed on the Al 2 O 3 —TiC sintered body substrate in comparison with the hardness of the substrate having no protective film. The thickness of the TaO x film is 50 A
Is. As shown in FIG. 4, the hardness of the TaO x film is x =
In the range of 1.8 to 2.5, the hardness is higher than that of the Al 2 O 3 —TiC sintered body substrate, and the maximum hardness is 30 GPa.
Great hardness. In this way, by providing the TaO x film as the slider protective film, the surface of the magnetic head slider that slides on the disk can be formed to have high hardness. Therefore, the magnetic head 5 is protected from long-term contact sliding.
【００２０】前記基板を磁気ヘッドスライダの形状に加
工したスライダを用い、つまり第１図に示した磁気ヘッ
ドスライダを用いて、５万回のＣＳＳ試験を実施した結
果を図５に示す。図に示すように良好なＣＳＳ耐久性を
示した。また、媒体の損傷、スライダ保護膜の損傷およ
び剥離は確認されなかった。このように、本発明による
スライダ保護被膜をせいぜい５０Ａ程度設けることによ
り、磁気ヘッドスライダの空気支持面の耐摩耗性を高め
ることができ、良好な機械的耐久性が確保できる。FIG. 5 shows the results of carrying out a CSS test 50,000 times using a slider obtained by processing the substrate into the shape of a magnetic head slider, that is, using the magnetic head slider shown in FIG. As shown in the figure, good CSS durability was exhibited. Further, no damage to the medium, no damage to the slider protective film, and no peeling were confirmed. Thus, by providing the slider protective coating of the present invention at about 50 A at most, the wear resistance of the air bearing surface of the magnetic head slider can be enhanced, and good mechanical durability can be secured.
【００２１】次に、本発明の他の実施例として、表１に
示した熱酸化時間の異なる試料について、ＣＳＳ回数２
万回のＣＳＳ耐久性試験を実施した結果により説明す
る。各試料において保護被膜は、Ｔａ膜の厚さを１００
Ａとし、異なる熱酸化時間により作成された。各酸化時
間に対するＴａＯx （ｘ＝１．８〜２．５）膜の厚さは
表に示すように、２０〜５０Ａである。保護被膜はスラ
イダ基板に近いほど酸素含有量が少ない状態にあり、基
板との接触面での保護被膜の組成はＴａＯx （０≦ｘ＜
１．８）である。第１表に示すように、いずれの場合も
摩擦係数の増加が少なく、良好なＣＳＳ耐久性を示し
た。また、いずれの場合も、媒体保護膜損傷、スライダ
保護被膜損傷および剥離等は認められなかった。少なく
ともスライダ空気支持面の最外面にＴａＯx （ｘ＝１．
８〜２．５）が形成されることにより、十分な耐久性を
確保することができる。Next, as another embodiment of the present invention, for samples having different thermal oxidation times shown in Table 1, the number of CSS cycles is 2
It will be explained by the results of carrying out the CSS durability test ten thousand times. In each sample, the protective film has a Ta film thickness of 100.
A and prepared by different thermal oxidation times. The thickness of the TaO x (x = 1.8 to 2.5) film for each oxidation time is 20 to 50 A as shown in the table. The closer the protective film is to the slider substrate, the lower the oxygen content is, and the composition of the protective film on the contact surface with the substrate is TaO x (0 ≦ x <
1.8). As shown in Table 1, in all cases, the increase in the friction coefficient was small and good CSS durability was exhibited. Further, in any case, damage to the medium protective film, damage to the slider protective film, peeling and the like were not observed. At least on the outermost surface of the slider air supporting surface, TaO x (x = 1.
8 to 2.5), sufficient durability can be secured.
【００２２】[0022]
【表１】 [Table 1]
【００２３】なお、本発明の実施例としてＡｌ2 Ｏ3 −
ＴｉＣの焼結体をスライダ材料とした場合について記述
したが、本発明はこれに限定されるものではなく、窒化
シリコン、カーボン、フェライト、チタン酸カルシウム
などの他の材質から成るスライダについても密着性の面
で問題はなく、本実施例と同様の効果が得られる。ま
た、本発明の効果は図１に示した形状のスライダに限定
されず、磁気ディスクとの接触摺動面を有する磁気ヘッ
ドスライダについてその形状によることなく同様の効果
が得られることは明かである。As an example of the present invention, Al 2 O 3 −
Although the case where the sintered body of TiC is used as the slider material has been described, the present invention is not limited to this, and the adhesion of the slider made of other materials such as silicon nitride, carbon, ferrite, calcium titanate, etc. There is no problem in this regard, and the same effect as this embodiment can be obtained. Further, the effect of the present invention is not limited to the slider having the shape shown in FIG. 1, and it is apparent that the same effect can be obtained regardless of the shape of a magnetic head slider having a sliding contact surface with a magnetic disk. .
【００２４】[0024]
【発明の効果】以上説明したように本発明によれば、ス
ライダ保護被膜を設けることによるスペーシングロスを
抑え、機械的耐久性に優れた磁気ヘッドスライダを得る
ことができ、磁気ディスク装置の機械的信頼性を向上す
ることができる。As described above, according to the present invention, it is possible to obtain a magnetic head slider having excellent mechanical durability by suppressing spacing loss due to the provision of the slider protective coating. Reliability can be improved.
【図１】本発明に係る磁気ヘッドスライダの一実施例を
示す断面図である。FIG. 1 is a sectional view showing an embodiment of a magnetic head slider according to the present invention.
【図２】本発明を適用した磁気ヘッドスライダの斜視図
である。FIG. 2 is a perspective view of a magnetic head slider to which the present invention is applied.
【図３】本発明による保護被膜の成膜条件を示す線図で
ある。FIG. 3 is a diagram showing film forming conditions for a protective film according to the present invention.
【図４】本発明による保護被膜の実験結果の一例を示す
線図である。FIG. 4 is a diagram showing an example of an experimental result of a protective film according to the present invention.
【図５】本発明の一実施例を示す線図である。FIG. 5 is a diagram showing an embodiment of the present invention.
１ 保護被膜 ２ 空気支持面 ３ 傾斜面 ４ 磁気ヘッドスライダ ５ 磁気ヘッド 1 Protective Coating 2 Air Support Surface 3 Inclined Surface 4 Magnetic Head Slider 5 Magnetic Head
Claims (3)
ドスライダであって、前記保護被膜の少なくとも最外面
がＴａＯx （但しｘ＝１．８〜２．５）なる組成である
ことを特徴とする磁気ヘッドスライダ。1. A magnetic head slider having a protective coating on an air bearing surface, wherein at least the outermost surface of the protective coating has a composition of TaO x (where x = 1.8 to 2.5). And magnetic head slider.
ロームであることを特徴とする請求項１記載の磁気ヘッ
ドスライダ。2. The magnetic head slider according to claim 1, wherein the protective coating has a film thickness of 20 to 100 angstroms.
膜を成膜した後、酸化雰囲気中１００〜３００℃で熱処
理することを特徴とする磁気ヘッドスライダの製造方
法。3. Ta on the air bearing surface of a magnetic head slider.
A method of manufacturing a magnetic head slider, which comprises heat-treating at 100 to 300 ° C. in an oxidizing atmosphere after forming the film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP32072894A JPH08180352A (en) | 1994-12-22 | 1994-12-22 | Magnetic head slider and its production |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP32072894A JPH08180352A (en) | 1994-12-22 | 1994-12-22 | Magnetic head slider and its production |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH08180352A true JPH08180352A (en) | 1996-07-12 |
Family
ID=18124661
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP32072894A Pending JPH08180352A (en) | 1994-12-22 | 1994-12-22 | Magnetic head slider and its production |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH08180352A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2747082A3 (en) * | 2012-12-21 | 2014-12-03 | Seagate Technology LLC | Magnetic devices with variable overcoats |
| US10049689B2 (en) | 2015-08-27 | 2018-08-14 | Seagate Technology Llc | Methods of forming magnetic devices with variable overcoats |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6323215A (en) * | 1986-07-16 | 1988-01-30 | Fuji Photo Film Co Ltd | Production of thin film magnetic head |
| JPH04302880A (en) * | 1991-03-29 | 1992-10-26 | Minebea Co Ltd | Floating type magnetic head slider |
| JPH04308085A (en) * | 1991-04-04 | 1992-10-30 | Sharp Corp | Sputtering device |
-
1994
- 1994-12-22 JP JP32072894A patent/JPH08180352A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6323215A (en) * | 1986-07-16 | 1988-01-30 | Fuji Photo Film Co Ltd | Production of thin film magnetic head |
| JPH04302880A (en) * | 1991-03-29 | 1992-10-26 | Minebea Co Ltd | Floating type magnetic head slider |
| JPH04308085A (en) * | 1991-04-04 | 1992-10-30 | Sharp Corp | Sputtering device |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2747082A3 (en) * | 2012-12-21 | 2014-12-03 | Seagate Technology LLC | Magnetic devices with variable overcoats |
| US9792935B2 (en) | 2012-12-21 | 2017-10-17 | Seagate Technology Llc | Magnetic devices with variable overcoats |
| US10049689B2 (en) | 2015-08-27 | 2018-08-14 | Seagate Technology Llc | Methods of forming magnetic devices with variable overcoats |
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