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JPH0817864A - Semiconductor package - Google Patents

Semiconductor package

Info

Publication number
JPH0817864A
JPH0817864A JP6166150A JP16615094A JPH0817864A JP H0817864 A JPH0817864 A JP H0817864A JP 6166150 A JP6166150 A JP 6166150A JP 16615094 A JP16615094 A JP 16615094A JP H0817864 A JPH0817864 A JP H0817864A
Authority
JP
Japan
Prior art keywords
semiconductor chip
package
lead
semiconductor
semiconductor package
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6166150A
Other languages
Japanese (ja)
Inventor
Hikari Matsushita
光 松下
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
New Japan Radio Co Ltd
Original Assignee
New Japan Radio Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by New Japan Radio Co Ltd filed Critical New Japan Radio Co Ltd
Priority to JP6166150A priority Critical patent/JPH0817864A/en
Publication of JPH0817864A publication Critical patent/JPH0817864A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/48247Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item

Landscapes

  • Lead Frames For Integrated Circuits (AREA)
  • Wire Bonding (AREA)

Abstract

PURPOSE:To obtain a semiconductor package which is even thin but small in an area rate to a semiconductor chip by a method wherein a semiconductor package is composed of a semiconductor chip provided with a bump electrode and an insulating film fitted with a foil lead art its one side and an inter lead bonding hole. CONSTITUTION:A semiconductor package is composed of a semiconductor chip 1 provided with a bump electrode 2 and an insulating film 3 fitted with a foil lead 5 which comprises an inner lead 6 and an outer lead 7 on its one side and an inner lead bonding hole 4. The semiconductor chip 1 is placed on the other side of the insulating film 3, and the bump electrode 2 is bonded to the corresponding inner lead 6 through the intermediary of the hole 4. A part of the insulating film 3 including the outer lead 7 is so formed as to rise along the side edge of the semiconductor chip 1 making nearly right angles with the surface of the semiconductor chip 1.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、半導体装置の構造に関
し、特に半導体素子の小型化されたパッケージの構造に
関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a structure of a semiconductor device, and more particularly to a structure of a miniaturized package of semiconductor elements.

【0002】[0002]

【従来の技術】半導体チップを収納し、これを外部環境
から保護すると共に、半導体素子として外部回路との接
続を容易にするための機能をもつ容器、半導体パッケー
ジは、ICの高集積化と共に、これに対応する高密度実
装の要求が強く、小型化が進んできている。パッケージ
の種類としては、形状面から基板挿入型と表面実装型に
大別されるが、現在では、薄型化の利点が大きい後者の
表面実装型が主流になりつつある。
2. Description of the Related Art A container and a semiconductor package that house a semiconductor chip, protect it from the external environment, and have a function of facilitating connection with an external circuit as a semiconductor element, are highly integrated ICs, There is a strong demand for high-density packaging to meet this demand, and miniaturization is progressing. The types of packages are roughly classified into a board insertion type and a surface mounting type in terms of shape, but at present, the latter surface mounting type, which has a great advantage of thinning, is becoming the mainstream.

【0003】従来、表面実装型の小型化パッケージとし
て広く利用されているものに、SOP(Small O
utline Package)、SSOP(Shri
nkSmall Outline Package)、
TCP(Tape Carrier Package)
等がある。上記のうち、SOPおよびSSOPは樹脂モ
ールド型のパッケージであり、以下のような構成とされ
ている。
Conventionally, SOP (Small O
utline Package), SSOP (Shri
nkSmall Outlook Package),
TCP (Tape Carrier Package)
Etc. Among the above, SOP and SSOP are resin mold type packages and have the following configurations.

【0004】図3は、上記形式のSOPパッケージの構
造を示した説明図であり、(a)は、パッケージの外形
を表した斜視図、および(b)は、その側面を切断した
断面図である。これらの図において、1は半導体チッ
プ、6はインナーリード、7はアウターリード、8はタ
ブ、9は金属ワイヤ12は樹脂を示す。以下、図中にお
ける同一符号は、同一又は相当するものを示す。この形
式のパッケージは、その製作には一般に、リード部およ
び半導体チップマウント用タブを構成する部品としてリ
ードフレームが用いられ、概要下記のようにして製作さ
れる。
3A and 3B are explanatory views showing the structure of the SOP package of the above-described type. FIG. 3A is a perspective view showing the outer shape of the package, and FIG. 3B is a sectional view of the side surface thereof. is there. In these figures, 1 is a semiconductor chip, 6 is an inner lead, 7 is an outer lead, 8 is a tab, and 9 is a metal wire 12 is a resin. Hereinafter, the same reference numerals in the drawings indicate the same or corresponding ones. In this type of package, a lead frame is generally used as a component that constitutes a lead portion and a semiconductor chip mounting tab, and is manufactured as follows.

【0005】まず、半導体チップ1をリードフレームの
タブ8に固着し、該チップの各電極と各インナーリード
6とを金属ワイヤ9で接続した後、樹脂12でモールド
成形し、リードフレームのタイバー、リードの不用部分
を切断除去すると共に、アウターリード7を所定形状に
成形してパッケージの製作を完了する。
First, the semiconductor chip 1 is fixed to the tab 8 of the lead frame, each electrode of the chip is connected to each inner lead 6 by the metal wire 9, and then molded with the resin 12, and the tie bar of the lead frame, The unnecessary portion of the lead is cut and removed, and the outer lead 7 is formed into a predetermined shape to complete the manufacture of the package.

【0006】このような形式のパッケージにおける半導
体チップサイズと半導体パッケージサイズとの関係につ
いて例示する。図5は、これらのサイズ説明用の図であ
り、同図においてX1およびY1により半導体チップサ
イズ、X2およびY2により半導体パッケージサイズを
表すものとする。
The relationship between the semiconductor chip size and the semiconductor package size in a package of this type will be exemplified. FIG. 5 is a diagram for explaining these sizes. In FIG. 5, X1 and Y1 represent a semiconductor chip size, and X2 and Y2 represent a semiconductor package size.

【0007】上記パッケージについて特に小型化された
ものの例を挙げると、SOP型では、X1=2.7(単
位mm、以下略)、Y1=2.7、X2=6.8、Y2
=5.0、従って半導体チップに対する半導体パッケー
ジの面積比(X2・Y2)/(X1・Y1)は約4.
7、SSOP型では、X1=2.2、Y1=2.1、X
2=6.4、Y2=3.5で、同上面積比約4.8のも
のが用いられている。
To give an example of a particularly miniaturized package, the SOP type has X1 = 2.7 (unit: mm, hereinafter omitted), Y1 = 2.7, X2 = 6.8, Y2.
= 5.0, so the area ratio of the semiconductor package to the semiconductor chip (X2 · Y2) / (X1 · Y1) is about 4.
7, SSOP type, X1 = 2.2, Y1 = 2.1, X
2 = 6.4, Y2 = 3.5, and the same as above, with an area ratio of about 4.8.

【0008】また、TCP型パッケージは、いわゆるT
AB(Tape automated Bondin
g)方式を用いて作られるパッケージであり、多端子・
薄型化が可能なため集積度の高いLSI用のパッケージ
として利用が高まっている。図4は、TCP型パッケー
ジの構造説明図であり、(a)は、その平面図、および
(b)は、(a)の中央部分を切断して拡大した断面図
を示す。図中、1は半導体チップ、2はバンプ電極、5
はリード部、6はインナーリード、7はアウターリー
ド、10はフィルムキャリヤ・テープ、11はテスト・
パッド、12は樹脂を示す。
The TCP type package is a so-called T-type package.
AB (Tape automated Bondin
g) A package made using the
Since it can be thinned, it is increasingly used as a package for highly integrated LSI. 4A and 4B are structural explanatory views of the TCP type package, FIG. 4A is a plan view thereof, and FIG. 4B is a sectional view in which a central portion of FIG. In the figure, 1 is a semiconductor chip, 2 is a bump electrode, and 5
Is a lead portion, 6 is an inner lead, 7 is an outer lead, 10 is a film carrier tape, and 11 is a test tape.
The pad, 12 is a resin.

【0009】この形式のパッケージを作るには、まず、
半導体チップ1の各電極に金属の突起よりなるバンプ電
極2を形成しておき、一方、長尺の耐熱性の絶縁体フィ
ルム上に上記6、7および11を含むリード部5の配線
パターンを形成したフィルムキャリヤ・テープ10(あ
らかじめ半導体チップ収容部分やアウターリード対応部
分を孔開けした絶縁体フィルムに銅箔を接着したテープ
からエッチング加工して作られる。)を用意し、その上
に上記半導体チップを載せ、各バンプ電極2を各インナ
ーリードと接続する。
To make a package of this type, first,
A bump electrode 2 made of a metal protrusion is formed on each electrode of the semiconductor chip 1, while a wiring pattern of the lead portion 5 including the above 6, 7 and 11 is formed on a long heat-resistant insulating film. A film carrier tape 10 (made by etching from a tape obtained by adhering a copper foil to an insulating film in which a semiconductor chip accommodating portion and outer lead corresponding portion are preliminarily perforated) is prepared, and the above semiconductor chip is provided thereon And each bump electrode 2 is connected to each inner lead.

【0010】次に、半導体チップ部を樹脂12で封止
し、テスト・パッド11を利用してテストを行い、その
後で不用部分の切断除去およびアウターリード部の所要
の成形をして製作を完了する。この形式の場合も、半導
体チップに対する半導体パッケージの面積比は、上述の
SOP型、SSOP型のものと同程度である。
Next, the semiconductor chip portion is sealed with resin 12, a test is performed using the test pad 11, after which the unnecessary portion is cut off and the outer lead portion is molded as required to complete the fabrication. To do. Also in this case, the area ratio of the semiconductor package to the semiconductor chip is about the same as that of the SOP type and SSOP type.

【0011】また、上記面積比を小さくしたものとし
て、樹脂モールド型パッケージの一種で、そのアウター
リードをモールドパッケージの裏側に折り込んだ構造の
PLCC(Plastic Leaded Chip
Carrier)と呼ばれるパッケージがある。
In order to reduce the area ratio, a PLCC (Plastic Leaded Chip) having a structure in which outer leads are folded into the back side of the mold package is a kind of resin mold type package.
There is a package called Carrier.

【0012】また、実装密度が極限的に高められる実装
方法として、バンプ電極を設けた半導体チップを裏返し
にして基板に載せ、バンプ電極を基板上の配線パターン
に直接接合するフリップチップ方式と呼ばれる方法があ
る。
As a mounting method for maximally increasing the mounting density, a method called a flip chip method in which a semiconductor chip provided with bump electrodes is turned upside down and placed on a substrate, and the bump electrodes are directly bonded to a wiring pattern on the substrate. There is.

【0013】[0013]

【発明が解決しようとする課題】上述した従来のパッケ
ージにおいては、SOP型、SSOP型やTCP型パッ
ケージでは、半導体チップに対する半導体パッケージの
面積比は数倍から数十倍となり、例示した4〜5倍程度
のものが限度である。
In the above-mentioned conventional packages, in the SOP type, SSOP type and TCP type packages, the area ratio of the semiconductor package to the semiconductor chip is several times to several tens of times. The limit is about double.

【0014】また、上記に比べ面積比を小さくできるP
LCC型の場合は、上記のものほど薄型にできないこ
と、また、実装する場合、パッケージの裏側に折り込ま
れたアウターリードを基板側に接着することになるの
で、ハンダ付け等の確認が難しいという問題がある。
Further, the area ratio P can be made smaller than the above.
In the case of the LCC type, it is not possible to make it as thin as the above, and when mounting, the outer leads folded into the back side of the package are bonded to the board side, so it is difficult to confirm soldering, etc. There is.

【0015】また、フリップチップ方式は、実装密度は
最も大きくできるが、組立用の特殊なボンダー(フリッ
プチップ・ボンダー)を必要とし、また、基板と半導体
チップとのストレス緩和のため、基板と半導体チップと
の隙間に樹脂を流し込む必要があり、工程が複雑となる
という難点がある。
Further, the flip-chip method can maximize the mounting density, but requires a special bonder (flip-chip bonder) for assembly, and the substrate and the semiconductor are relieved in order to reduce the stress between the substrate and the semiconductor chip. Since it is necessary to pour the resin into the gap between the chip and the chip, the process becomes complicated.

【0016】本発明は、上記問題点を解消した新規構成
の半導体パッケージを提供することを目的とする。
It is an object of the present invention to provide a semiconductor package having a new structure that solves the above problems.

【0017】[0017]

【課題を解決するための手段】上記問題点を解消するた
めに、本発明は、半導体パッケージの構成を以下のよう
にしたものである。
In order to solve the above problems, the present invention has a semiconductor package having the following structure.

【0018】すなわち、バンプ電極を設けた半導体チッ
プと、インナーリードおよびアウターリードを含む箔状
のリード部をその片面に有し、かつインナーリード・ボ
ンディング用の孔を有する絶縁体フィルムとにより構成
され、前記半導体チップは前記絶縁体フィルムの前記片
面の反対面上に載置され、かつ各前記バンプ電極とそれ
に対応する各前記インナーリードとは前記孔を介してボ
ンディングされてなり、かつ前記絶縁体フィルムのアウ
ターリードを含む部分を、前記半導体チップの側面に沿
いかつ半導体チップ面に対し略垂直に立った形状に形成
した。
That is, it is composed of a semiconductor chip provided with bump electrodes, and an insulator film having a foil-shaped lead portion including an inner lead and an outer lead on one surface thereof and a hole for inner lead bonding. The semiconductor chip is mounted on the opposite surface of the one surface of the insulator film, and each bump electrode and each inner lead corresponding to the bump electrode are bonded to each other through the hole. A portion including the outer lead of the film was formed in a shape which is along the side surface of the semiconductor chip and stands substantially perpendicular to the semiconductor chip surface.

【0019】また、実施態様の一つとして、前記半導体
パッケージにおいて、前記絶縁体フィルムの垂直に折り
込んだ部分の高さを前記半導体チップの高さより高く
し、該より高くした部分と前記半導体チップとで形成さ
れる凹部に樹脂を充填した。
As one of the embodiments, in the semiconductor package, the height of the vertically folded portion of the insulating film is made higher than the height of the semiconductor chip, and the height of the portion and the semiconductor chip are made higher. A resin was filled in the concave portion formed in.

【0020】[0020]

【実施例】図1は、本発明の半導体パッケージの実施例
の説明図であり、(a)は斜視図、および(b)は断面
図である。また、図2に、同パッケージ製作の中間工程
の状態を表した説明図を示す。図中、1は半導体チッ
プ、2はバンプ電極、3は絶縁体フィルム、4はインナ
ーリード・ボンディング用の孔を示す。5は銅箔よりな
るリード部で、インナーリード6、アウターリード7お
よびテスト・パッド11を含む。12は樹脂を示す。
1 is an explanatory view of an embodiment of a semiconductor package of the present invention, (a) is a perspective view and (b) is a sectional view. Further, FIG. 2 shows an explanatory view showing a state of an intermediate step of manufacturing the package. In the figure, 1 is a semiconductor chip, 2 is a bump electrode, 3 is an insulator film, and 4 is a hole for inner lead bonding. A lead portion 5 made of copper foil includes an inner lead 6, an outer lead 7 and a test pad 11. Reference numeral 12 represents a resin.

【0021】本発明の半導体パッケージは、以下のよう
にして作る。まず、各半導体チップ1の各電極には、ウ
エハ処理を終わりチップにする前のウエハの状態で、
金、高温ハンダ等のバンプ付けしてバンプ電極2を形成
(バンプの高さは、後述の絶縁体フィルムの孔を介して
ボンディングできる程度に高くする。)し、その後、個
々のチップにダイシングする。
The semiconductor package of the present invention is manufactured as follows. First, for each electrode of each semiconductor chip 1, in the state of the wafer before finishing the wafer processing into chips,
Bumps such as gold or high-temperature solder are formed to form the bump electrodes 2 (the height of the bumps is made high enough to allow bonding through holes in an insulating film described later), and then the individual chips are diced. .

【0022】絶縁体フィルム3としては、TAB方式で
使用されるような例えば厚さ75μmのポリイミド樹脂
のフィルムを用いる。まず、パッケージングの際バンプ
電極2に対面すべき同フィルムの各個所に、電極より若
干大きい径のインナーリード・ボンディング用の孔4を
開けたものを作り、このフィルムの片面に例えば厚さ2
5μmの銅箔を接着剤(例えば厚さ約15μm)で張り
付ける。
As the insulator film 3, for example, a film of polyimide resin having a thickness of 75 μm, which is used in the TAB method, is used. First, an opening 4 for inner lead bonding having a diameter slightly larger than that of the electrode is formed in each portion of the same film which should face the bump electrode 2 during packaging.
A 5 μm copper foil is attached with an adhesive (for example, a thickness of about 15 μm).

【0023】次に、上記銅箔からエッチング加工により
不用部分を除去し、リード部5を形成する。図2(a)
は、この状態を示したものである(一点鎖線は半導体チ
ップ1に対応する部分を示す。)。リード部5は、イン
ナーリード、アウターリードとなるべき部分およびテス
ト・パッド11を含んでおり、これらには錫、金等の金
属メッキが施される。
Next, unnecessary portions are removed from the copper foil by etching to form lead portions 5. Figure 2 (a)
Shows this state (the one-dot chain line shows the portion corresponding to the semiconductor chip 1). The lead portion 5 includes portions to be inner leads, outer leads and a test pad 11, which are plated with metal such as tin or gold.

【0024】次に、上記絶縁体フィルムのリード部5の
反対面に、上記バンブ電極付きの半導体チップを載せて
目合わせをし、上記孔4を介して各バンプ電極2と対応
する各インナーリード6とを熱圧着によりボンディング
する。
Next, the semiconductor chip with the bump electrode is placed on the surface of the insulating film opposite to the lead portion 5 for alignment, and each inner lead corresponding to each bump electrode 2 through the hole 4. 6 and 6 are bonded by thermocompression bonding.

【0025】次に、テスト・パッド11を用いてテスト
を行った後、同パッドを絶縁体フィルムごと切断・除去
すると共に、絶縁体フィルムの外形を次工程(折り込み
加工)に所要な形状に切断・成形する。図2(b)はこ
の状態を示したものである。
Next, after performing a test using the test pad 11, the pad is cut and removed together with the insulating film, and the outer shape of the insulating film is cut into a shape required for the next step (folding).・ Mold. FIG. 2B shows this state.

【0026】次に、図1に示すように、アウターリード
の付されている絶縁体フィルムの周辺部を半導体チップ
1の側面に沿って垂直に折り込んだ形状に加熱成形す
る。この折り込みによってできる側面部の絶縁体フィル
ム高さは、上記切断の寸法決めにより、半導体チップの
上面より100〜200μm程度高くされる。
Next, as shown in FIG. 1, the peripheral portion of the insulating film provided with the outer leads is heat-molded into a shape in which it is vertically folded along the side surface of the semiconductor chip 1. The height of the insulator film on the side surface formed by this folding is set to be about 100 to 200 μm higher than the upper surface of the semiconductor chip by the dimensioning of the cutting.

【0027】最後に、図1(b)に示すように、上記の
より高くした部分と半導体チップで作られる凹部にエポ
キシ系の樹脂12をポッティングし、本発明による半導
体パッケージの組立を完了する。
Finally, as shown in FIG. 1 (b), epoxy resin 12 is potted in the above-mentioned raised portion and the recess formed by the semiconductor chip to complete the assembly of the semiconductor package according to the present invention.

【0028】本発明の半導体パッケージでは、絶縁体フ
ィルムは半導体チップの絶縁・保護の役をしているが、
上記樹脂12は半導体チップの更なる保護と共に、折り
込み部分の成形を補強するのに役立つ。
In the semiconductor package of the present invention, the insulating film plays a role of insulating / protecting the semiconductor chip.
The resin 12 serves to reinforce the molding of the folded portion as well as to further protect the semiconductor chip.

【0029】本発明の半導体パッケージは、上述したよ
うに極めて薄い絶縁体フィルムを主容器とし、アウター
リード部を半導体チップ面に対し垂直に立てた構成とし
たことから、極めて小型なものに製作できる。そのた
め、前述の従来例として挙げたSSOPの半導体チップ
(チップサイズ:X1=2.2、Y1=2.1)を上述
の本発明の実施例で例示した厚さの絶縁体フィルム、銅
箔等の材料を用いて本方式のパッケージにすると、パッ
ケージサイズは略X2=2.45、Y2=2.35とな
り、従って半導体チップに対する半導体パッケージの面
積比は約2.2となり、前述の従来例(面積比約4.
8)の半分以下に小型化したものになる。
As described above, the semiconductor package of the present invention can be manufactured in an extremely small size because the main container is the extremely thin insulator film and the outer lead portions are erected perpendicularly to the semiconductor chip surface. . Therefore, the SSOP semiconductor chip (chip size: X1 = 2.2, Y1 = 2.1) given as the above-mentioned conventional example is an insulator film, copper foil, etc. having the thickness illustrated in the above-mentioned embodiment of the present invention. When the package of this system is formed by using the above material, the package size becomes approximately X2 = 2.45 and Y2 = 2.35, and therefore the area ratio of the semiconductor package to the semiconductor chip becomes approximately 2.2. Area ratio about 4.
It is smaller than half of 8).

【0030】本発明の半導体パッケージを回路基板に実
装するには、パッケージをハンダでコートされた配線パ
ターンの所定個所に載せ、ハンダをリフローさせること
により装着する。この場合ハンダは、基板面に対し垂直
となっているアウターリードの下部を濡らし、基板の配
線とで作られる隅部に溜まるのてハンダ付けの接着状態
を目視検査で容易に確認することがてきる。
To mount the semiconductor package of the present invention on a circuit board, the package is placed on a predetermined portion of a wiring pattern coated with solder, and the solder is reflowed to be mounted. In this case, the solder wets the lower part of the outer lead, which is perpendicular to the board surface, and accumulates in the corners formed by the wiring of the board so that the soldering adhesion state can be easily checked by visual inspection. It

【0031】上記実施例の説明では、インナーリード・
ボンディング用の孔4として、円形の孔を各電極ごと設
けた場合を示したが、形状は円形に限られるものではな
く、また絶縁体フィルムによる絶縁に支障がない限り、
複数個の電極に対応するスリット状の孔を開けたものを
用いることも可能である。
In the description of the above embodiment, the inner leads,
Although the case where a circular hole is provided for each electrode as the bonding hole 4 is shown, the shape is not limited to the circular shape, and as long as the insulation by the insulating film is not hindered,
It is also possible to use the one having slit-shaped holes corresponding to a plurality of electrodes.

【0032】また、実施例として絶縁体フィルムの折り
込み部を高くし、その部分と半導体チップで作られる凹
部に樹脂をポッティングする場合を挙げたが、本発明
は、絶縁体フィルムで、半導体チップの拡散面および側
面を被い、アウターリードをその側面に沿わせて立てた
形状に構成したことにより、その主要な効果を生むもの
であり、上述の実施例の構成に限定されるものではな
く、またその製造方法に限定されるものではない。
As an example, the case where the folded portion of the insulating film is raised and the resin is potted in the recessed portion formed with the semiconductor chip has been described. By covering the diffusion surface and the side surface, and by constructing the outer lead in the shape of standing up along the side surface, the main effect thereof is produced, and it is not limited to the configuration of the above-mentioned embodiment, Further, it is not limited to the manufacturing method.

【0033】[0033]

【発明の効果】以上説明したように、本発明の半導体パ
ッケージでは、極めて薄い絶縁体フィルムを主容器と
し、アウターリード部を半導体チップの側面に沿い、か
つ半導体面に対し略垂直に立てた構成としたことから、
薄型でありながら従来の半導体パッケージに比べ格段に
半導体チップに対するパッケージサイズの面積比の小さ
い半導体パッケージを実現することができる。
As described above, in the semiconductor package of the present invention, the extremely thin insulator film is used as the main container, and the outer lead portions are erected along the side surface of the semiconductor chip and substantially perpendicular to the semiconductor surface. From that,
It is possible to realize a semiconductor package which is thin and has a much smaller area ratio of package size to a semiconductor chip than a conventional semiconductor package.

【0034】また、アウターリードがチップの側面に沿
って垂直に設けられるので、回路基板に実装する場合、
配線パターンとで作られる隅部を利用して接着すること
ができる。このため、従来のPLCC型やフリップチッ
プ方式の場合のようにハンダ付けの接着状態の確認が難
しいという問題がない。
Also, since the outer leads are provided vertically along the side surface of the chip, when mounted on a circuit board,
The corners made with the wiring pattern can be used for bonding. Therefore, unlike the conventional PLCC type or flip chip type, there is no problem that it is difficult to confirm the bonding state of soldering.

【0035】また、フリップチップ方式の場合のような
特殊なボンダーの必要がなく、基板と半導体チップとの
隙間に樹脂を流し込む必要もない。
Further, there is no need for a special bonder as in the case of the flip chip system, and there is no need for pouring resin into the gap between the substrate and the semiconductor chip.

【0036】上述のように、本発明の半導体パッケージ
は超小型化を容易にするが、同時にその構造が簡単であ
るため製作の全自動化が可能である。
As described above, the semiconductor package of the present invention facilitates ultra-miniaturization, but at the same time, its structure is simple, so that the production can be fully automated.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の半導体パッケージの説明図である。FIG. 1 is an explanatory diagram of a semiconductor package of the present invention.

【図2】本発明の半導体パッケージの中間工程での状態
を示した説明図である
FIG. 2 is an explanatory view showing a state in an intermediate step of the semiconductor package of the present invention.

【図3】従来の半導体パッケージの一例の説明図であ
る。
FIG. 3 is an explanatory diagram of an example of a conventional semiconductor package.

【図4】従来の半導体パッケージの別例の説明図であ
る。
FIG. 4 is an explanatory diagram of another example of a conventional semiconductor package.

【図5】半導体パッケージと半導体チップとの面積比を
説明するための図である。
FIG. 5 is a diagram for explaining an area ratio between a semiconductor package and a semiconductor chip.

【符号の説明】[Explanation of symbols]

1:半導体チップ、2:バンプ電極、3:絶縁体フィル
ム、4:孔、5:リード部、6:インナーリード、7:
アウターリード、8:タブ、9:金属ワイヤ、10:フ
ィルムキャリヤ・テープ、11:テスト・パッド、1
2:樹脂。
1: semiconductor chip, 2: bump electrode, 3: insulator film, 4: hole, 5: lead part, 6: inner lead, 7:
Outer leads, 8: tab, 9: metal wire, 10: film carrier tape, 11: test pad, 1
2: Resin.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 バンプ電極を設けた半導体チップと、イ
ンナーリードおよびアウターリードを含む箔状のリード
部をその片面に有し、かつインナーリード・ボンディン
グ用の孔を有する絶縁体フィルムとにより構成され、前
記半導体チップは前記絶縁体フィルムの前記片面の反対
面上に載置され、かつ各前記バンプ電極とそれに対応す
る各前記インナーリードとは前記孔を介してボンディン
グされてなり、かつ前記絶縁体フィルムのアウターリー
ドを含む部分が、前記半導体チップの側面に沿いかつ半
導体チップ面に対し略垂直に立つ形状に形成されてなる
ことを特徴とする半導体パッケージ。
1. A semiconductor chip provided with bump electrodes, and an insulator film having a foil-shaped lead portion including an inner lead and an outer lead on one surface thereof and having a hole for inner lead bonding. The semiconductor chip is mounted on the opposite surface of the one surface of the insulator film, and each bump electrode and each inner lead corresponding to the bump electrode are bonded to each other through the hole. A semiconductor package, wherein a portion including an outer lead of the film is formed in a shape that stands along a side surface of the semiconductor chip and is substantially perpendicular to the semiconductor chip surface.
【請求項2】 請求項1の半導体パッケージに置いて、
前記絶縁体フィルムの垂直に立つ部分の高さを前記半導
体チップの高さより高くし、該より高くした部分と前記
半導体チップとで形成される凹部に樹脂を充填してなる
ことを特徴とする半導体パッケージ。
2. The semiconductor package according to claim 1, wherein
The height of a portion of the insulator film which stands vertically is made higher than the height of the semiconductor chip, and a recess formed by the raised portion and the semiconductor chip is filled with resin. package.
JP6166150A 1994-06-24 1994-06-24 Semiconductor package Pending JPH0817864A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6166150A JPH0817864A (en) 1994-06-24 1994-06-24 Semiconductor package

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6166150A JPH0817864A (en) 1994-06-24 1994-06-24 Semiconductor package

Publications (1)

Publication Number Publication Date
JPH0817864A true JPH0817864A (en) 1996-01-19

Family

ID=15825993

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6166150A Pending JPH0817864A (en) 1994-06-24 1994-06-24 Semiconductor package

Country Status (1)

Country Link
JP (1) JPH0817864A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999003153A2 (en) * 1997-07-07 1999-01-21 Infineon Technologies Ag Housing for at least one semiconductor body
EP0948048A1 (en) * 1998-03-20 1999-10-06 Caesar Technology Inc. Chip scale package
EP0798780A3 (en) * 1996-03-27 2000-09-13 Oki Electric Industry Co., Ltd. Semiconductor device, manufacturing method thereof and aggregate type semiconductor device

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0798780A3 (en) * 1996-03-27 2000-09-13 Oki Electric Industry Co., Ltd. Semiconductor device, manufacturing method thereof and aggregate type semiconductor device
US6208021B1 (en) 1996-03-27 2001-03-27 Oki Electric Industry Co., Ltd. Semiconductor device, manufacturing method thereof and aggregate type semiconductor device
US6403398B2 (en) 1996-03-27 2002-06-11 Oki Electric Industry Co, Ltd. Semiconductor device, manufacturing method thereof and aggregate type semiconductor device
WO1999003153A2 (en) * 1997-07-07 1999-01-21 Infineon Technologies Ag Housing for at least one semiconductor body
WO1999003153A3 (en) * 1997-07-07 1999-04-01 Siemens Ag Housing for at least one semiconductor body
US6288335B1 (en) 1997-07-07 2001-09-11 Infineon Technologies Ag Package for at least one semiconductor body
EP0948048A1 (en) * 1998-03-20 1999-10-06 Caesar Technology Inc. Chip scale package

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