JPH08173875A - Coater and coating method - Google Patents

Abstract

PURPOSE: To provide a coater by which a coating soln. is efficiently used as compared with a spin coater, suitable to a large-sized or square substrate and capable of forming a coating film on the entire surface of the substrate in uniform thickness. CONSTITUTION: A substrate 10 is held by a holder 12, and the reservoir 44 of the coating soln. discharged from a nozzle head 14 is formed between the substrate 10 surface and the head 14. Further, a space 46 is formed at the rear in the moving direction, and the head 14 is relatively moved in a specified direction (+X direction) by a driving means not shown in the figure with respect to the substrate 10 surface so that the head 14 and substrate 10 are relatively moved.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a coating apparatus and a coating method for coating a predetermined coating liquid on the surface of a substrate, and more specifically, a rectangular substrate such as a glass substrate for liquid crystal, a solar cell substrate, a color filter substrate, The present invention also relates to a coating apparatus and a coating method for coating a surface of a circular substrate such as a semiconductor wafer with a coating liquid such as photoresist and color filter resist.

[0002]

2. Description of the Related Art Conventionally, a substrate is held on a rotatable spin chuck, a predetermined coating liquid is dropped on the central portion of the surface thereof, and then the substrate is rotated to diffuse the coating liquid over the entire surface of the substrate by centrifugal force. The so-called spin coater configured to apply the coating liquid to the substrate by the above method is disclosed in Japanese Patent Laid-Open No.
Various are known, for example, in JP-A-61955.

[0003]

However, in such a spin coater, a large centrifugal force is required in order to uniformly diffuse the coating solution dropped on the central portion of the substrate surface even over the entire substrate surface. Since 90% or more of the coating liquid dropped on the substrate surface is scattered from the substrate, there is a drawback that the consumption amount of the coating liquid is large.

Particularly, when the size of the substrate is increased, this drawback becomes more remarkable, and in a rectangular substrate such as a glass substrate for liquid crystal, the corners and the center of each side have different distances from the center of rotation. The centrifugal force increases the amount of the coating liquid that is scattered from the central portion of each side of the substrate. Therefore, the present invention has been made in view of such drawbacks, and an object thereof is that the coating liquid can be used more efficiently and is suitable for a large-sized substrate or a rectangular substrate and is uniform. An object of the present invention is to provide a coating device capable of forming a coating film having a thickness on the entire surface of a substrate.

A further object of the present invention is to provide the above coating apparatus having a simple structure. A further object of the present invention is to provide the above coating apparatus that is less likely to cause a region where the coating liquid is not applied or a region where the film thickness is not uniform on the substrate surface. A further object of the present invention is to provide the above coating apparatus in which the thickness of the coating film does not increase at the edge of the substrate on the coating completion side.

Another object of the present invention is that the coating liquid can be used more efficiently and is suitable for a large substrate or a rectangular substrate, and a coating film having a uniform thickness is formed on the entire substrate surface. An object of the present invention is to provide a possible coating method.

[0007]

In order to achieve the above object, the invention described in claim 1 is a coating device for coating a predetermined coating liquid on the surface of a substrate, and a substrate holding means for holding the substrate, The coating liquid is supplied from the coating liquid supply unit that supplies the coating liquid toward the surface of the substrate held by the substrate holding unit and between the surface of the substrate held by the substrate holding unit and the coating liquid supply unit. Holding the substrate so that the coating liquid supply means and the substrate can be moved relative to each other while forming a reservoir of the coating liquid and forming a space behind the coating liquid supply means in the moving direction viewed from the substrate. Drive means for moving the coating liquid supply means relative to a surface of the substrate held by the means in a predetermined movement direction.

Further, in the invention described in claim 2, the coating liquid supply means has a nozzle head in which a storage space for storing the coating liquid is formed, and one end is connected to the storage space formed in the nozzle head. And a coating liquid supply path whose other end is opened toward the surface of the substrate held by the substrate holding means. In addition, claim 3
In the invention described in claim 2, the coating liquid supply passage described in claim 2 is inclined with respect to the surface of the substrate held by the substrate holding means so as to discharge the coating liquid toward the front side in the moving direction. Is formed.

Further, in the invention described in claim 4, the surface of the nozzle head described in claim 2 facing the substrate surface is a flat surface parallel to the substrate surface. further,
In the invention described in claim 5, the surface of the nozzle head according to claim 2 facing the substrate surface is composed of two flat surfaces having different distances from the substrate surface, and has a smaller distance from the substrate surface. One of the flat surfaces is arranged in front of the moving direction.

Further, in the invention described in claim 6, the distance between the surface of the nozzle head described in claim 2 facing the substrate surface and the surface of the substrate gradually increases toward the rear in the moving direction. It is an inclined surface. In the invention described in claim 7, there is further provided a suction means for sucking a liquid pool of the coating liquid formed between the surface of the substrate and the coating liquid supply means to the front side in the moving direction of the coating liquid supply means. Has been.

Further, in the invention described in claim 8, a guide which is in close contact with the edge of the substrate held by the substrate holding means on the front side in the moving direction and has a pool of the coating liquid formed on the upper surface thereof. A member is provided. further,
According to a ninth aspect of the present invention, there is provided a coating method for coating a surface of a substrate with the coating liquid by relatively moving a coating liquid supply means for supplying a predetermined coating liquid to the surface of the substrate in a predetermined moving direction. Forming a pool of the coating liquid discharged from the coating liquid supply unit between the surface of the substrate and the coating liquid supply unit, and forming a space behind the coating liquid supply unit in the moving direction as seen from the substrate. While the coating liquid supply means and the substrate are moved relative to each other, the coating liquid supply means is relatively moved in the moving direction with respect to the surface of the substrate held by the substrate holding means. To do.

[0012]

In the invention described in claim 1, the substrate is held by the substrate holding means and is discharged from the coating liquid supply means between the surface of the substrate held by the substrate holding means and the coating liquid supply means. Form a pool of coating liquid,
Further, on the surface of the substrate held by the substrate holding means so that the coating liquid supply means and the substrate are relatively moved while forming a space behind the coating liquid supply means in the moving direction viewed from the substrate. On the other hand, the coating liquid supply means is relatively moved in the predetermined movement direction by the driving means.

In the invention described in claim 2, the coating liquid is temporarily stored in the storage space formed inside the nozzle head, and the coating liquid is supplied to the surface of the substrate through the coating liquid supply passage connected to the storage space. To be done. In the invention described in claim 3, the coating liquid supply path is formed so as to be inclined with respect to the surface of the substrate held by the substrate holding means so as to discharge the coating liquid toward the front side in the moving direction. Through
The coating liquid is supplied to the substrate surface toward the front side in the moving direction.

According to another aspect of the present invention, a space is formed between the flat surface of the nozzle head facing the substrate surface and the substrate surface, and the nozzle head and the substrate are relatively moved in the moving direction. And the coating liquid is applied. In the invention described in claim 5, the surface of the nozzle head facing the substrate surface is composed of two flat surfaces having different distances from the substrate surface, and the flat surface having a smaller distance from the substrate surface is the flat surface. Since it is arranged in the front in the moving direction, the flat surface with the larger distance from the substrate surface,
That is, the nozzle head and the substrate are relatively moved in the moving direction while the space is formed between the flat surface and the substrate surface that are arranged in the rear of the moving direction, so that the coating liquid is applied. .

In the invention described in claim 6, since the surface of the nozzle head facing the substrate surface is an inclined surface whose distance from the substrate surface gradually increases toward the rear in the moving direction, the distance becomes smaller. While the space is formed in a relatively large area, the nozzle head and the substrate are relatively moved in the moving direction to apply the coating liquid. In the invention described in claim 7, while further sucking the liquid pool of the coating liquid formed between the surface of the substrate and the coating liquid supply unit by the suction unit in the forward direction of the moving direction of the coating liquid supply unit. The coating liquid is applied by relatively moving the coating liquid supply means and the substrate in the moving direction.

In the invention described in claim 8, the guide member is further in close contact with the edge of the substrate held by the substrate holding means on the front side in the moving direction, and a liquid pool of the coating liquid is formed on the upper surface thereof. Is provided, the coating liquid supplied from the coating liquid supply means is applied not only on the surface of the substrate but also on the guide member. Further, in the coating method of the invention described in claim 9, a liquid pool of the coating liquid discharged from the coating liquid supply unit is formed between the surface of the substrate and the coating liquid supply unit, and the coating liquid supply unit is formed. Of the coating liquid supply means with respect to the surface of the substrate held by the substrate holding means so that the coating liquid supply means and the substrate are relatively moved while forming a space behind the substrate in the moving direction. Are relatively moved in the moving direction.

[0017]

Embodiments of the present invention will now be described in detail with reference to the drawings. 1 to 5 show a coating apparatus and a coating method according to a first embodiment of the present invention. FIG. 1 is a longitudinal sectional view thereof, FIG. 2 is a top view, FIG. 3 is a side view, and FIG. FIG. 5 is an enlarged vertical cross-sectional view showing a main part in a coating start state, and FIG.

In FIG. 1, a glass rectangular substrate 10 for liquid crystal is used.
Is placed on the substrate holding table 12 so that its two opposite sides extend in the direction perpendicular to the paper surface and is held by vacuum suction. Here, as shown in the figure, a direction orthogonal to the surface of the substrate 10 is defined as a Z direction, a downward direction is defined as a + Z direction, and a direction opposite to the Z direction is defined as a −Z direction, and a horizontal direction in the drawing is defined as an X direction. In particular, the right direction is the + X direction, and the opposite direction is the -X direction. Although not shown, the direction perpendicular to the plane of FIG. 1 (that is, the vertical direction in FIG. 2) is the Y direction. As shown in FIG. 1 and FIG.
Since it is slightly smaller in the direction, the edges of the two opposite sides of the substrate 10 project outward from the substrate holding table 12, respectively.

A nozzle head 14 made of stainless steel is arranged above the substrate holder 12 in order to discharge the coating liquid toward the surface of the substrate 10 held on the substrate holder 12. The nozzle head 14 has a rectangular tube shape extending in the Y direction (that is, the width direction of the substrate 10), and a storage space 14 a whose both ends are closed is formed inside the nozzle head 14. The bottom wall 16 of the nozzle head 14 is formed with a projecting portion 16a projecting further downward, and the lower surface 20 of the projecting portion 16a is separated from the substrate 10 held by the substrate holding table 12 by a gap G
It is formed so as to be parallel to each other with 2 in between. Further, a slit 18 having a width of 0.1 mm and long in the Y direction is connected to the reservoir space 14a of the nozzle head 14 through an inlet 26, and the lower end of the slit 18 is opened to the lower surface 20 of the nozzle head 14 and the discharge port. 24 are formed. However, here, the length of the ejection port 24 in the Y direction is set to be slightly smaller than the length (width) of the substrate 10 in the Y direction, and the ejected coating liquid should adhere to the surface of the substrate 10. It is prevented from falling without it. Further, as shown in FIG. 4, the slit 18 is inclined so as to descend rightward (+ X direction) so that an angle Q1 with the X direction is an obtuse angle. The nozzle head 14 is moved in the left-right direction (X direction) in FIG. 1 by a linear drive mechanism (not shown).
Can be moved to Further, the substrate holding table 12 of the substrate 10
The nozzle head 14 can be retracted upward (-Z direction) so as not to hinder the loading and unloading of the nozzle head to the left (-X direction) from the coating start position shown in FIG.
It is also possible to move to the right (X direction) from the coating end position indicated by the chain double-dashed line in FIG.

As shown in FIG. 3, the nozzle head 14
A pressure adjusting system 30 for adjusting the atmospheric pressure in the storage space 14a and a coating liquid supply system 32 for supplying the coating liquid to the storage space 14a are connected to the storage space 14a. The pressure adjusting system 30 includes a communication pipe 36 communicating with a pressure adjusting unit (not shown), an atmosphere opening pipe 38 communicating with the atmosphere,
And a switching valve 34 for connecting either one of them with the storage space 14a. The coating liquid supply system 32 has an opening / closing valve 40 that opens and closes a coating liquid supply pipe 33 connected to a coating liquid supply pump (not shown). Further, a detector 42 for detecting the liquid amount of the coating liquid stored in the storage space 14 a of the nozzle head 14 is fixed to the nozzle head 14.

The operation of this embodiment having such a configuration will be described. First, the substrate 10 is placed on the substrate holder 12 and held on the substrate holder 12 by vacuum suction. Then, the nozzle head 14 is moved to the coating start position shown in FIGS. Then, the switching valve 34 of the pressure adjusting system 30 is set to the atmosphere opening pipe 38 side to open the inside of the storage space 14a in the nozzle head 14 to the atmosphere.
In this state, the opening / closing valve 40 of the coating liquid supply system 32 is opened to inject the coating liquid into the storage space 14a. Here, the storage space 14a is opened to the atmosphere to prevent the coating liquid introduced into the storage space 14a from being pressurized and directly discharged toward the surface of the substrate 10 through the slit 18. is there. Note that, depending on the physical properties or flow characteristics of the supplied coating liquid, the inside of the storage space 14a may be in a depressurized state or an atmospheric pressure state in order to prevent direct discharge as described above. In this reduced pressure or atmospheric pressure state, the switching valve 34 of the pressure adjusting system 30 is set on the communication pipe 36 side, and the pressure inside the storage space 14a is adjusted from the pressure adjusting unit (not shown) via the communication pipe 36. Obtained by Further, depending on the physical properties or flow characteristics of the applied coating liquid, the nozzle head 14 is rotated around the Y axis extending in the Y direction to prevent direct ejection as described above, and the tip end of the slit 18 is rotated. The ejection port 24 may be directed upward. In FIG. 1, 28 is the nozzle head 14.
The coating liquid stored in the storage space 14a of FIG. In the above description, the coating liquid is injected into the storage space 14a after the nozzle head 14 is moved to the coating start position shown in FIGS. 1 and 2, but the nozzle head 14 is directed to the coating start position. May be injected before being moved, or may be injected while the nozzle head 14 is being moved to the coating start position. Here, in the case where the coating liquid stored in the storage space 14a is discharged from the discharge port 24 before the nozzle head 14 is moved to the coating start position, the pressure adjusting system 30 is used to prevent this. The pressure in the storage space 14a may be adjusted to prevent the discharge.

In this way, the coating liquid 28 is stored in the storage space 14a. Then, when the switching valve 34 of the pressure adjusting system 30 is set to the atmosphere opening pipe 38 side and the inside of the storage space 14a is opened to the atmosphere, the coating liquid 28 stored in the storage space 14a enters the slit 18 by its own weight and capillary action. Then, a part thereof is discharged from the discharge port 24 at the tip of the slit 18 toward the surface of the substrate 10. This state is enlarged and shown in FIG. As shown in FIG. 4, when the nozzle head 14 is located at the application start position and the ejection of the application liquid is started, the application liquid ejected from the ejection port 24 moves in the moving direction of the nozzle head 14 (X direction). ), The substrate 10 and the nozzle head 14 are pushed forward.
The gap 22 with the lower surface 20 of the protruding portion 16a is filled with the liquid and the liquid pool 44 is formed. Therefore, the application start end 11 of the application liquid supplied to the surface of the substrate 10 coincides with the edge of the substrate 10. Here, if the coating liquid discharged in the storage space 14a by its own weight and the capillary action does not reach the coating start end 11, the switching valve 34 of the pressure adjusting system 30 is connected to the communication pipe 36 side. It is sufficient to positively push out the coating liquid 28 from the storage space 14a by setting the pressure in the storage space 14a through a communication pipe 36 from a pressure adjusting unit (not shown).

Here, the coating liquid 28 is applied to the coating start end 1
In order to confirm that the number has reached 1, it is possible to visually confirm from the back surface (lower surface) of the substrate 10 held by the substrate holding base 12 by utilizing the fact that the substrate 10 is transparent. You may provide a suitable detection means. Furthermore, the substrate 1
When 0 is not transparent, an optical detecting means may be provided on the front surface side (upper surface side) of the substrate 10, or the coating liquid 2
It is also possible to make a calculation based on the supply amount of 8 and these can be applied even when the substrate 10 is transparent.

From this state, the nozzle head 14 is moved in parallel to the surface of the substrate 10 in the + X direction (backward of the moving direction of the nozzle head 14 as viewed from the substrate) by a driving mechanism (not shown) to apply the entire surface of the substrate. Apply liquid. The state during this application is shown in FIG. As is clear from FIG. 5, the coating liquid 28 stored in the storage space 14a of the nozzle head 14 is continuously supplied to the surface of the substrate 10 from the discharge port 24 via the slit 18 by its own weight and capillary action, and the nozzle head 14 is As it moves, the coating film is sequentially formed from the left end of the substrate 10 in the drawing. here,
At the coating start position shown in FIG. 4, the coating liquid was filled between the surface of the substrate 10 and the lower surface 20 of the projecting portion 16a of the nozzle head 14 to form a liquid pool 44. In this state, the space 46 is formed at the position behind the liquid pool 44 (-X direction). This is for the following reasons.

That is, as the nozzle head 14 is moved to the right (X direction), the amount of the coating liquid adhering to the surface of the substrate 10 naturally increases, but the nozzle head 14 is only about the increased amount. Since the coating liquid is not supplied from the ejection port 24 of the nozzle head 14, the rear end (the end in the −X direction) 23 of the liquid pool 44 formed in the gap 22 is the lower surface 20 of the nozzle head 14.
It will not reach the rear end 20a. Therefore, while the coating liquid is pulled by the surface tension between the rear end 23 of the liquid pool 44 and the coating liquid already attached to the surface of the substrate 10,
It will be supplied to the surface of the substrate. With this configuration, the gap 22 is formed on the surface of the substrate 10.
It is possible to form a coating film having a thickness (for example, 10 μm) smaller than the interval G (that is, 0.1 mm) over the entire surface of the substrate 10.

When the nozzle head 14 is moved to the coating end position shown by the chain double-dashed line in FIG. 1, the coating operation is completed. Then, the nozzle head 14 is moved further to the right from the coating end position and retracted from above the substrate 10, the vacuum suction of the substrate 10 is released, and the substrate 10 is unloaded from the substrate holding table 12. Here, in order to prevent the coating liquid from dropping from the ejection port 24 when the nozzle head 14 is moved further to the right from the coating end position, as described above, in the storage space 14. The pressure may be reduced so that the coating liquid 28 is not supplied any more.

As in this embodiment, the nozzle head 1 is placed between the nozzle head 14 and the coating liquid adhering to the substrate 10.
By moving the nozzle head 14 while forming the space 46 behind the moving direction of 4, the coating film having a film thickness smaller than the gap G of the gap 22 between the surface of the substrate 10 and the lower surface 20 of the nozzle head 14 is formed. It can be formed, and wasteful consumption of the coating liquid can be suppressed.

In this embodiment, the gap G between the surface of the substrate 10 and the bottom surface of the protrusion 16a of the nozzle head 14 is 0.1 mm, and the slit 18 for the substrate 10 is 18 mm.
The angle Q1 indicating the inclination of is 135 degrees, and the moving speed of the nozzle head is 15 mm / sec. Under these conditions, a photoresist (trade name "MIC" manufactured by Shipley Far East Co., Ltd. is formed on the surface of the glass rectangular substrate for liquid crystal.
ROPOSIT S1400-17 PHOTORES
IST "and" MICROPOSIT S1400-
22 PHOTORESIST ”), and a coating film of about 10 μm was measured immediately after the coating.
Could be formed uniformly over the entire surface.

In this embodiment, the nozzle head 1
The bottom surface shape of the bottom wall 16 of No. 4 (the portion other than the protruding portion 16a) may be any shape that does not affect the coating operation, and need not be a flat surface as illustrated. Further, in the present embodiment, even when the surface of the substrate 10 is not flat and has undulations, a coating film having a uniform film thickness can be formed on the surface without being affected by the undulations. This will be described with reference to FIG. That is, when the plate thickness of the substrate 10 is locally small as shown by A in FIG. 6 and when the plate thickness of the substrate 10 is locally large as shown by B, liquid pooling occurs in both cases. Since the coating liquid is applied to the surface of the substrate 10 by being pulled from 44, it is possible to uniformly apply the coating liquid to the surface of the substrate without taking any special measures against the change in the thickness of the substrate 10 and the waviness of the surface of the substrate 10. It is possible to form a coating film having a film thickness.

Further, in this embodiment, the liquid pool 4 can be formed without extremely strictly controlling the amount of the coating liquid supplied from the storage space 14a of the nozzle head 14 to the discharge port 24.
No problem will occur as long as the position of the rear end 23 of No. 4 changes. Next, a second embodiment of the present invention will be described with reference to FIG. FIG. 7 is an enlarged vertical cross-sectional view showing the main part of the coating apparatus according to the second embodiment of the present invention in the coating start state. In this embodiment, the same members as those in the first embodiment shown in FIGS. 1 to 5 are designated by the same reference numerals, and the description thereof will be omitted. This embodiment is different from the first embodiment shown in FIGS. 1 to 5 in that the lower surface 20 of the protrusion 16a of the nozzle head 14 is a flat surface parallel to the surface of the substrate 10 in the first embodiment. On the other hand, the lower surface 21a located in front of the slit 18 in the moving direction of the nozzle head 14 (X direction) and the slit 18
The only difference is that the amount of protrusion (the amount of protrusion from the bottom wall 16 of the nozzle head 14) is different from that of the lower surface 21b located on the rear side of.
That is, as illustrated, the amount of protrusion of the lower surface 21b located behind the slit 18 is smaller than the amount of protrusion of the lower surface 21a located in front of the slit 18. In other words, the gap Gb between the lower surface 21b located behind the slit 18 and the surface of the substrate 10 is larger than the gap Ga between the lower surface 21a located in front of the slit 18 and the surface of the substrate 10. With this configuration, it is possible to more easily form a space behind the liquid pool 44 in the mid-application state as compared with the first embodiment. Since the operation of this embodiment is similar to that of the first embodiment, its explanation is omitted.

Further, FIG. 8 shows the third embodiment of the present invention.
Will be explained. FIG. 8 is an enlarged vertical cross-sectional view showing the main part of the coating apparatus of the third embodiment of the present invention in the coating start state. In this embodiment, the same members as those in the second embodiment shown in FIG. 7 are designated by the same reference numerals, and the description thereof will be omitted. The present embodiment differs from the second embodiment shown in FIG. 7 in that in the second embodiment, a lower surface 21a located in front of the slit 18 and a lower surface 21b located behind the slit 18 with the slit 18 as a boundary. However, in the present embodiment, the protruding portion 16a is divided into two and the front lower surface 21a having a large protruding amount and the rear lower surface 21 having a small protruding amount are divided.
b and the front lower surface 21a is provided with the opening of the slit 18, that is, the discharge port 24. With such a configuration, it is possible to more easily form the space behind the liquid pool 44 in the mid-application state as compared with the first embodiment. Since the operation of this embodiment is similar to that of the first embodiment, its explanation is omitted.

Furthermore, FIG. 9 shows the fourth embodiment of the present invention.
Will be explained. FIG. 9 is an enlarged vertical sectional view showing a main part of the coating apparatus of the fourth embodiment of the present invention in a coating start state. In this embodiment, the same members as those in the first embodiment shown in FIGS. 1 to 5 are designated by the same reference numerals, and the description thereof will be omitted. This embodiment is different from the first embodiment shown in FIGS. 1 to 5 in that the lower surface 20 of the protrusion 16a of the nozzle head 14 is a flat surface parallel to the surface of the substrate 10 in the first embodiment. Whereas, there is only a point where the lower surface 20 is an inclined surface. That is, in the fourth embodiment shown in FIG. 9, the nozzle head 1
The lower surface of the protruding portion 16a of No. 4 is not parallel to the surface of the substrate 10 and is an inclined surface 21 in which the gap 22 with the surface of the substrate 10 gradually decreases in the front direction (X direction) of the moving direction of the nozzle head 14. The angle of the inclined surface 21 is such that the gap G1 between the front end of the protruding portion 16a of the nozzle head 14 and the surface of the substrate 10 is 0.1 mm, and the substrate 1 at the rear end.
The distance G2 from the surface of 0 is set to 0.2 mm.

With this configuration, the first
As compared with the embodiment, it is possible to make it easier to form a space behind the liquid pool 44 during the coating process.
Since the operation of this embodiment is similar to that of the first embodiment,
The description is omitted. However, in the present embodiment, since the coating film of the coating liquid is not formed so as to coincide with the edge of the substrate 10 but the coating is started from the inside of the substrate, the coating liquid is applied to the edge of the substrate on the coating start position side. Therefore, it is not necessary to wash and remove the unnecessary coating film on the edge of the substrate on the coating start position side after the coating is completed.

In the fourth embodiment, the lower surface of the protruding portion 16a of the nozzle head 14 is an inclined surface in which the gap 22 between the surface of the substrate 10 and the front (X direction) of the moving direction of the nozzle head 14 is gradually reduced. However, instead of this, for example, the nozzle head 14 of the first embodiment is rotated about the Y axis parallel to the Y direction by a predetermined amount, and the lower surface 20 thereof moves forward (X) in the moving direction of the nozzle head 14. In the direction), the gap 22 with the surface of the substrate 10 may be an inclined surface that gradually decreases.

Furthermore, FIG. 1 shows the fifth embodiment of the present invention.
It will be described using 0. FIG. 10 is an enlarged vertical cross-sectional view showing the main parts of the coating apparatus of the fifth embodiment of the present invention in the coating start state. In this embodiment, the same members as those in the first embodiment shown in FIGS. 1 to 5 are designated by the same reference numerals, and the description thereof will be omitted. In this embodiment, the lower surface of the protruding portion 16a of the nozzle head 14 has the gap G on the surface of the substrate 10 instead of the flat surface 20 parallel to the surface of the substrate 10 as in the first embodiment. And a parallel flat surface 20a and an inclined surface 20b which is continuous with the flat surface 20a and gradually increases in the rear direction (-X direction) in the moving direction of the nozzle head. The discharge port 24 which is the opening of the slit 18 is formed on the flat surface 20a. The angle of the inclined surface 20b is determined according to the length of the flat surface 20a and the gap G2 at the rear end of the inclined surface 20b.

Further, in this embodiment, the discharge port 24
Pool 44 formed by the coating liquid supplied from
In order to prevent the space portion 46 from being formed in the -X direction and not being formed, the decompression member 54 for forming the decompression chamber 52 is fixed at the front end (X direction end) in the moving direction of the nozzle head 14. Has been done. This decompression chamber 52 is the substrate
Is opened in the direction opposite to the surface of and is connected to a suction mechanism (not shown) via a suction passage 56.
The lower end of the decompression member 54 has a protruding portion 16 of the nozzle head 14.
It is slightly higher than the flat surface 20a of the lower surface of a, and thus the gap G3 from the surface of the substrate 10 is the flat surface 2a.
It is slightly larger than the gap G of 0a.

With such a structure, the coating liquid in the liquid pool 44 is moved forward (X) in the moving direction of the nozzle head 14 by depressurizing the depressurizing chamber 52 by a suction mechanism (not shown).
Direction), the liquid pool 44 is prevented from advancing rearward in the moving direction of the nozzle head 14 (-X direction) to prevent the space from being filled with the coating liquid and disappearing. You can Since the operation of this embodiment is the same as that of the fourth embodiment, its explanation is omitted. The pressure reducing member 54 of this embodiment can be provided in any of the first to fourth embodiments shown in FIGS. 1 to 9.

Here, in any of the above embodiments,
The thickness of the coating film at the edge on the coating end position side becomes larger than the other portions. The reason is that the coating liquid in the liquid pool 44 formed during coating is pulled by the surface of the substrate 10 and a large amount adheres to the surface of the substrate 10. As described above, when the film thickness of the coating film locally increases at the edge of the substrate, there is a drawback that insufficient exposure or insufficient development occurs in that portion. An embodiment in which this drawback is resolved is shown in FIGS. 11 to 14.

11 to 14 show a sixth embodiment of the present invention, FIG. 11 is a longitudinal sectional view thereof, FIG. 12 is a top view, FIG. 13 is a side view, and FIG. It is an expanded longitudinal cross-sectional view shown. 1 to 5 in this embodiment.
The same members as those in the first embodiment shown so far are designated by the same reference numerals, and the description thereof will be omitted. The present embodiment is different from the first embodiment shown in FIGS. 1 to 5 in that the coating end side of the substrate 10 held by the substrate holding base 12 is located at the coating end side edge of the substrate holding base 12. The only difference is that the guide member 50 is fixed so as to be in close contact with the edge. As shown in FIGS. 11 and 14, the upper surface of the guide member 50 is the substrate 10 held by the substrate holder 12.
It is configured so as to be in close contact with the surface of and substantially flush with each other. Further, as shown in FIG. 12, the guide member 50
The Y-direction length (width) is larger than the Y-direction length (width) of the substrate 10 held by the substrate holding table 12. Further, the length of the guide member 50 in the X direction is configured to be sufficiently longer than the length of the liquid pool 44 in the X direction as shown in FIG. Further, in this embodiment, as shown in FIGS. 12 and 13, the length of the guide member 50 in the Y direction is larger than the length of the substrate 10 and the substrate holding table 12 in the Y direction. Even if it is not configured, it may be larger than the length of the slit for discharging the coating liquid toward the substrate 10 in the Y direction.

With this structure, the nozzle head 14
Is moved to the coating end position indicated by the chain double-dashed line in FIG. 11, the coating operation ends. In this state, as shown in the enlarged view of FIG. 14, the liquid pool 44 is completely formed on the upper surface of the guide member 50 and is separated from the surface of the substrate 10. Therefore, in this state, even if the coating liquid in the liquid pool 44 is pulled by the surface tension, it only adheres in large amounts on the guide member 50 and does not affect the coating film formed on the surface of the substrate 10. do not do. Further, since the coating liquid in the liquid pool 44 formed during the coating is not regulated by the edge on the coating end position side and can be continuously moved on the guide member 50, the moving direction of the nozzle head 14 is the same. It is possible to favorably prevent the liquid pool 44 from protruding to the rear of the. Therefore, it is possible to form a coating film having a uniform thickness on the surface of the substrate 10. After that, the substrate 10 is unloaded from the substrate holder 12, but if the nozzle head 14 interferes with the substrate 10 at that time, the nozzle head 14 is moved further to the right of the coating end position and retracted. It may be configured as follows.

In order that the coating liquid pulled by the surface tension does not flow to the surface of the substrate 10, is the guide member 50 made of a material having a wettability higher than that of the substrate 10 with respect to the coating liquid? Alternatively, it is desirable to form a film of the material on the surface of the substrate. On the other hand, the coating liquid adhering to the upper surface of the guide member 50 needs to be cleaned after the coating is completed. For this purpose, it is desirable that the guide member 50 be made of a material having poor wettability with respect to the coating liquid, or that the coating film of the material be formed on the surface of the base material. Therefore, in this embodiment, the guide member 50 is made of fluororesin. With this configuration, the coating liquid in the liquid pool 44 on the guide member 50 easily diffuses to the upper surface of the guide member 50, but it does not reach the surface of the substrate 10, and therefore the coating film on the substrate surface is affected. In addition, since the coating liquid diffused on the upper surface of the guide member 50 is in the form of liquid drops, cleaning is easy. Further, if the guide member 50 is made of fluororesin, the substrate 1
It is possible to prevent the coating liquid from entering between the edge of 0 and the edge of the guide member 50, and also to prevent damage to the substrate 10 made of glass.

Further, in the sixth embodiment shown in FIGS. 11 to 14, the upper surface of the guide member 50 is the substrate 1
It was configured to be almost flush with the surface of 0,
However, the present invention is not limited to this, and the upper surface of the guide member is within a range in which it is possible to prevent the thickness of the coating film from becoming larger than other portions at the edge on the coating end position side. The upper surface of the substrate 10 held by the substrate holder 12 does not have to be the same surface. Needless to say, the guide member 50 can be combined with any of the nozzle heads 14 of the second to fifth embodiments, not limited to the first embodiment. Other Modifications In the above embodiment, the protrusion 16a is formed on the bottom wall 16 of the nozzle head 14, and the coating liquid is applied while the space 46 is formed between the protrusion 16a and the surface of the substrate 10. Although the present invention is not limited to this, the bottom surface of the bottom wall 16 is formed into the shape as in each of the embodiments even if the projection 16a is not formed on the bottom wall 16. A space 46 is formed between the bottom wall 16 and the surface of the substrate 10.
The coating liquid may be applied while the layer is formed.

Further, in the above embodiment, the slit 18 is formed from the storage space 14a of the nozzle head 14 to the discharge port 24 to supply the coating liquid, but the present invention is not limited to this. Not one
Instead of the one slit 18, a large number of straight or curved thin tubes may be arranged in the Y direction, or a plurality of thin tubes may be connected between the inlet 26 and the discharge port 24. It suffices that the coating liquid stored in the storage space 14a can be discharged from the discharge port 24 toward the surface of the substrate 10 via the coating liquid supply passage.

In addition, although the angle Q1 indicating the inclination between the slit 18 and the surface of the substrate 10 is set to an obtuse angle (135 degrees) in all the above-mentioned embodiments, the angle Q1 is not limited to this, and for example, It may be an acute angle or 90 degrees.
However, in the case where the nozzle head 14 is moved and coating is performed while the space 46 is well formed, the nozzle head 1
4, the coating liquid is once discharged from the slit 18 toward the front (X direction) in the moving direction of the nozzle head 1.
It is better to form the liquid pool 44 relatively ahead of 4.

In the above embodiments, the substrate 1 is used.
Although 0 is held in the horizontal posture by the substrate holding table 12, the present invention is not limited to this, and the substrate may be held in a tilted posture or in a vertical posture.
Further, in the above-mentioned embodiment, the coating liquid was configured to be supplied to the substrate surface by its own weight and capillary action during coating, but in order to perform coating while forming the space well, The pressure state in the storage space 14 may be adjusted according to the flow characteristics such as the viscosity, yield value and elastic modulus of the liquid and the physical properties such as surface tension, wettability and density.

Further, in the above embodiment, the substrate holding table 12
Although the nozzle head 14 is moved with respect to the substrate 10 held and held still, the coating operation is performed, but the present invention is not limited to this, and conversely the nozzle head 14 is stopped. The substrate may be moved by moving the nozzle head 14 and the substrate 10 together.

Further, the shape of the lower surface of the projecting portion 16a of the nozzle head 14 is not limited to the above embodiment, and the shapes of the respective embodiments may be combined. Further, for example, in the second and third embodiments, the lower surface of the protruding portion 16a is composed of two flat surfaces, but it may be composed of three or more flat surfaces, or a flat surface and an inclined surface. It may be combined with.

Further, in the above embodiment, the substrate holder 12 is configured to be smaller in the X direction and larger in the Y direction than the substrate 10, but the present invention is not limited to this, and the substrate holder is not limited to this. 12 may be larger than the substrate 10 in both the X and Y directions than the substrate 10, and X may be larger than the substrate 10.
The direction and the Y direction may be slightly smaller than the substrate 10, and are smaller in the Y direction than the substrate 10 and X
Great in the direction.

Further, in the above-described embodiments, there are ones in which the coating liquid is supplied to the edge of the substrate on the coating start position side and ones in which the coating liquid is supplied from the inside of the substrate. The number is not limited to one, and both can be appropriately selected. Further, in the above-described embodiment, the coating liquid is applied from the reservoir space 14a of the nozzle head 14 to the substrate 10 by its own weight and capillary action during the coating process.
Although the coating liquid is continuously discharged from the coating liquid supply system 32, the storage space 14a is discharged.
The coating liquid may be supplied to the surface of the substrate 10 such that the coating liquid is filled with the coating liquid and the coating liquid is continuously supplied to push the coating liquid from the storage space 14a.

Finally, in all the above embodiments,
Although the nozzle head 14 is configured to move while ejecting the coating liquid from the ejection port 24 of the nozzle head 14, the ejection is temporarily stopped after the liquid pool 44 is once formed, and the movement of the nozzle head 14 is started. Then, the ejection speed may be restarted after the moving speed reaches a stable state.

[0051]

As described above in detail, according to the invention described in claim 1, in the coating apparatus for coating a predetermined coating liquid on the surface of the substrate, the substrate holding means for holding the substrate and the substrate holding means hold the substrate. Coating liquid supply means for supplying the coating liquid toward the surface of the coated substrate, and the coating liquid solution discharged from the coating liquid supply means between the surface of the substrate held by the substrate holding means and the coating liquid supply means. It was held by the substrate holding means so that the coating liquid supply means and the substrate were moved relative to each other while forming a pool and forming a space behind the coating liquid supply means in the moving direction as viewed from the substrate. And a drive unit that moves the coating liquid supply unit relative to the surface of the substrate in a predetermined movement direction. With this configuration, the substrate is held by the substrate holding unit. Once held In addition, a liquid pool of the coating liquid discharged from the coating liquid supply unit is formed between the surface of the substrate held by the substrate holding unit and the coating liquid supply unit, and a space is formed behind the moving direction. While the coating liquid supply means and the substrate are moved relative to each other, the coating liquid supply means is relatively moved in the predetermined moving direction by the driving means with respect to the surface of the substrate held by the substrate holding means. Therefore, it is not necessary to rotate the substrate to spread the coating liquid over the entire surface of the substrate by centrifugal force, and it is possible to use the coating liquid more efficiently, and it is also suitable for large substrates and square substrates, and is uniform. It is possible to provide a coating apparatus capable of forming a coating film of various thicknesses on the entire surface of a substrate.

Further, in the invention described in claim 2, the coating liquid supply means is formed in the nozzle head in which a storage space for storing the coating liquid is formed and the nozzle head, and one end is connected to the storage space. And a coating liquid supply path having the other end opened toward the surface of the substrate held by the substrate holding means, and the coating liquid is temporarily stored in a storage space formed inside the nozzle head and connected to it. Since the coating liquid is supplied to the surface of the substrate via the coating liquid supply passage formed as described above, the coating liquid can be uniformly supplied to the substrate from the entire coating liquid supply passage. It is possible to provide the above-mentioned coating device that is less likely to cause a region where the coating liquid is not applied or a region where the film thickness is not uniform.

In addition, in the invention described in claim 3, on the surface of the substrate held by the substrate holding means, the coating liquid supply passage discharges the coating liquid toward the front side in the moving direction. The coating liquid supply passage is formed so as to be inclined with respect to the surface of the substrate held by the substrate holding means so as to discharge the coating liquid toward the front side in the moving direction. Since the coating liquid is supplied to the substrate surface toward the front side in the moving direction via the above, it becomes easy to form a space on the rear side in the moving direction of the coating liquid supply path, and the coating liquid can be formed on the substrate surface with a simple configuration. It is possible to provide the above-mentioned coating device that is less likely to cause a non-coated region or a region where the film thickness is not uniform.

Further, in the invention described in claim 4, the surface of the nozzle head facing the substrate surface is a flat surface parallel to the substrate surface, and a space is provided between the flat surface and the substrate surface. While being formed, since the nozzle head and the substrate are relatively moved in the moving direction to apply the coating liquid, the area where the coating liquid is not applied and the film thickness are nonuniform on the substrate surface with a simple configuration. It is possible to provide the coating apparatus with less possibility of producing a region.

Further, in the invention described in claim 5, the surface of the nozzle head facing the substrate surface is composed of two flat surfaces having different intervals from the substrate surface, and
The flat surface having a smaller distance to the substrate surface is arranged in the front in the moving direction, and the flat surface having a larger distance to the substrate surface, that is, the flat surface arranged to the rear in the moving direction and the substrate. While the space is formed between the surface and the nozzle head and the substrate are relatively moved in the moving direction to apply the coating liquid, the nozzle head and the substrate surface are formed while forming the space. It is possible to provide the above coating apparatus in which it is easier to move the coating liquid relatively, and there is less possibility that a region where the coating liquid is not applied or a region where the film thickness is not uniform occur on the substrate surface.

Further, in the invention described in claim 6, the surface of the nozzle head facing the substrate surface is an inclined surface whose distance from the substrate surface gradually increases toward the rear in the moving direction, Since the nozzle head and the substrate are relatively moved in the movement direction to apply the coating liquid while the space is formed in the region where the space is relatively large, the nozzle head and the substrate are formed while forming the space. To provide the above-mentioned coating device with a simple structure, which is easier to move relative to the substrate surface and is less likely to cause a region where the coating liquid is not applied or a region where the film thickness is uneven on the substrate surface. be able to.

In the invention described in claim 7, further, suction means for sucking the liquid pool of the coating liquid formed between the surface of the substrate and the coating liquid supply means forward of the moving direction of the coating liquid supply means. Is provided, and while sucking the liquid pool of the coating liquid formed between the surface of the substrate and the coating liquid supply unit by the suction unit toward the front in the moving direction of the coating liquid supply unit, the coating liquid supply unit and the substrate Is relatively moved in the moving direction to apply the coating liquid, it is easier to relatively move the nozzle head and the substrate surface while forming the space portion, and the coating is performed on the substrate surface. It is possible to provide the above-mentioned coating apparatus that is less likely to cause a region where the liquid is not applied or a region where the film thickness is not uniform.

According to the eighth aspect of the invention, the guide is further in close contact with the edge of the substrate held by the substrate holding means on the front side in the moving direction, and a pool of the coating liquid is formed on the upper surface thereof. A member is provided, and the coating liquid supplied from the coating liquid supply means is applied not only on the surface of the substrate but also on the guide member to end the coating operation. It is possible to provide the above-mentioned coating device in which the film thickness does not increase.

Further, in the invention described in claim 9, the coating liquid is supplied to the surface of the substrate by relatively moving the coating liquid supply means for supplying the predetermined coating liquid to the surface of the substrate in the predetermined moving direction. In the coating method for coating, a liquid pool of the coating liquid discharged from the coating liquid supply unit is formed between the surface of the substrate and the coating liquid supply unit, and the coating liquid supply unit is provided behind the substrate in the moving direction viewed from the substrate. The coating liquid supply means is relatively moved in the moving direction with respect to the surface of the substrate held by the substrate holding means so that the coating liquid supply means and the substrate are relatively moved while forming the space portion. With this configuration, it is not necessary to rotate the substrate to diffuse the coating liquid over the entire surface of the substrate by centrifugal force, and it is possible to use the coating liquid more efficiently. Ah With suitable for large-sized substrate or square-shaped substrate, a coating film having a uniform thickness can provide a coating method capable of forming the entire substrate surface.

[Brief description of drawings]

FIG. 1 is a vertical sectional view of a coating apparatus according to a first embodiment of the present invention.

FIG. 2 is a top view of the first embodiment.

FIG. 3 is a side view of the first embodiment.

FIG. 4 is an enlarged vertical sectional view showing a main part of the first embodiment in a coating start state.

FIG. 5 is an enlarged vertical cross-sectional view showing a state during application of the first embodiment.

FIG. 6 is an enlarged vertical cross-sectional view showing that it is possible to apply a uniform coating film regardless of the waviness of the substrate in the first embodiment.

FIG. 7 is a vertical cross-sectional view showing a main part of a coating apparatus according to a second embodiment of the present invention in a coating start state.

FIG. 8 is a vertical cross-sectional view showing a main part of a coating apparatus according to a third embodiment of the present invention in a coating start state.

FIG. 9 is a vertical sectional view showing a main part of a coating apparatus according to a fourth embodiment of the present invention in a coating start state.

FIG. 10 is a vertical cross-sectional view showing a main part of a coating apparatus according to a fifth embodiment of the present invention in a coating start state.

FIG. 11 is a vertical sectional view of a coating apparatus according to a sixth embodiment of the present invention.

FIG. 12 is a top view of the coating apparatus according to the sixth embodiment.

FIG. 13 is a side view of the sixth embodiment.

FIG. 14 is a vertical cross-sectional view showing a finished state of coating in the sixth embodiment.

[Explanation of symbols]

 10 Substrate 12 Substrate Holding Means 14 Coating Liquid Supply Means 44 Liquid Reservoir 46 Space

Claims (9)

[Claims] 1. A coating device for coating a predetermined coating liquid on the surface of a substrate, a substrate holding means for holding the substrate, and a coating liquid supplying means for supplying the coating liquid toward the surface of the substrate held by the substrate holding means. And a liquid pool of the coating liquid discharged from the coating liquid supply unit is formed between the surface of the substrate held by the substrate holding unit and the coating liquid supply unit, and the movement direction of the coating liquid supply unit in the moving direction viewed from the substrate is The coating liquid supply means is relatively moved in a predetermined moving direction with respect to the surface of the substrate held by the substrate holding means so that the coating liquid supply means and the substrate can be relatively moved while forming a space portion in the rear. And a driving unit for moving the coating device to the coating device. 2. The coating liquid supply means has a nozzle head in which a storage space for storing the coating liquid is formed, one end of which is connected to the storage space formed in the nozzle head and the other end of which serves as a substrate holding means. The coating apparatus according to claim 1, further comprising: a coating liquid supply path opened toward the surface of the held substrate. 3. The coating liquid supply passage is formed so as to be inclined with respect to the surface of the substrate held by the substrate holding means so as to discharge the coating liquid toward the front side in the moving direction. The coating device according to claim 2. 4. The surface of the nozzle head facing the substrate surface is
The coating device according to claim 2, which is a flat surface parallel to the surface of the substrate. 5. The surface of the nozzle head facing the substrate surface is composed of two flat surfaces having different distances from the substrate surface, and the flat surface having the smaller distance from the substrate surface is arranged forward of the moving direction. The coating device according to claim 4, wherein the coating device is provided. 6. The surface of the nozzle head facing the substrate surface is
The coating apparatus according to claim 2, wherein the coating surface is an inclined surface whose distance from the substrate surface gradually increases toward the rear in the moving direction. 7. A suction means for sucking a pool of the coating liquid formed between the surface of the substrate and the coating liquid supply means to the front side in the moving direction of the coating liquid supply means. The coating device according to claim 1. 8. A guide member is provided, which is in close contact with an edge of the substrate held by the substrate holding means on the front side in the moving direction and has a pool of coating liquid formed on the upper surface thereof. The coating device according to claim 1. 9. A coating method of coating a coating liquid on the surface of a substrate by relatively moving a coating liquid supply means for supplying a coating liquid to the surface of the substrate in a predetermined moving direction. A liquid reservoir for the coating liquid discharged from the coating liquid supply device is formed between the coating liquid supply device and the coating liquid supply device while forming a space behind the moving direction of the coating liquid supply device when viewed from the substrate. A coating method, wherein the coating liquid supply means is moved relative to the surface of the substrate held by the substrate holding means in the moving direction so that the means and the substrate are moved relatively.