JPH08160736A - Developing sleeve and developing device - Google Patents

Abstract

PURPOSE: To decrease melt sticking of a developer and to prevent decrease in the charge amt. on a developing layer by forming such a surface that has lots of polygonal ridge projections in the plane and has a fine rugged pattern in an area except for the area near the peaks. CONSTITUTION: The surface of this developing sleeve has lots of polygonal ridge like projections P', and the area S-S' except for the area near the ridge projections P' are finely roughened. In this method, The height h (μm) of the ridge projection defined by the difference between the lowest bottom P surrounded by the ridges and the highest peak P' of the ridges is preferably controlled to satisfy 0.01×r<=h<=2.5×r, wherein r (μm) is the average particle size of the developer. Further, the max. diagonal length d (μm) of the polygonal ridge projections is preferably controlled to satisfy 0.25×r<=d<=35×r, wherein (r) is the average particle size r (μm) of the developer, and the number (n) of projections per unit area (1mm<2> ) is controlled to satisfy 15<=n<=12000.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a developing sleeve used in an electrophotographic system or an electrostatic recording system and a developing device using the developing sleeve, and more particularly to an electrostatic latent image carrier electrostatic latent image carrier. The present invention relates to a developing device having a developing sleeve that carries and conveys a developer for visualizing an image, and is suitably used in various image forming apparatuses such as electrophotographic printers and copying machines. .

[0002]

2. Description of the Related Art As a developing device used in an image forming apparatus such as an electrophotographic copying machine, there is known a developing device for developing and visualizing an electrostatic latent image carried on an electrostatic latent image carrier. In such a developing device, for example, Japanese Patent Laid-Open No.
As described in JP-A-1878771, a developing sleeve made of metal is used, and the developer contained in the developing container is carried on the developing sleeve and conveyed to a developing area facing the electrostatic latent image carrier. By developing the electrostatic latent image formed on the electrostatic latent image carrier with a developer, the electrostatic latent image is visualized as a developer image. As the developer, there are a one-component developer such as a one-component developer having a magnetic toner, a one-component non-magnetic developer having a non-magnetic toner, and a two-component developer having a non-magnetic toner and a magnetic carrier. The material of the developing sleeve is selected depending on the developer. In this case, a non-magnetic metal is used as the material of the developing sleeve. When a magnetic developer is used, a magnetism generating means such as a magnet is provided inside the developing sleeve. A developing bias is applied to the developing sleeve at the time of development in order to perform good development. AC and D as bias
A voltage of C or a combination of both is used, and therefore, a conductor is often used as the metal of the developing sleeve.

When the developer on the developing sleeve is conveyed to the developing area by using the developing device as described above, the surface of the developing sleeve is roughened as disclosed in, for example, JP-A-56-113172. By the constitution which is changed, the transportability of the developer is improved and the developer layer can be uniformly coated on the surface. The reason for this is that by roughening the surface of the developing sleeve, the frictional force between the surface and the developer is increased, slippage is prevented and the pushing force is stable, and the unevenness of the surface causes the developer pool on the upstream side of the blade to cycle. This is because a slight developer vibration is applied to loosen the developer lump and form a uniform developer layer.

As a method of roughening the surface of the developing sleeve, a sandpaper method of rubbing the developing sleeve surface with sandpaper, a bead blasting method using spherical particles, a sandblasting method using amorphous particles, or a mixing method thereof,
A chemical etching method by chemical treatment has been proposed,
It is also being implemented.

However, the conventional developing sleeve has the following problems.

In the developing device using the developing sleeve roughened by the above method, the developer or the component in the developer is easily fused to the roughened portion of the roughened surface, and the surface is contaminated. Due to this contamination, the contact between the developer and the surface having a different charging series is reduced, and conversely, the contact with a contaminant having the same charging series is increased, resulting in poor charging of the developer. There was a problem that the charge amount of the developer layer was lowered. Further, when the contamination progresses with the increase in the usage amount and the durability amount, the development of white spots or the like on the image easily occurs in the rotation cycle of the developing sleeve.

As a method for preventing or reducing this contamination, it is desired to make the surface of the developing sleeve smoother. However, if the surface is made smooth, it becomes difficult to form a uniform developer layer, and blotches and density stripes are formed. And so on.

As a method for solving these problems, as described in JP-A-2-64561 and JP-A-2-284163, a plurality of spherical traces are formed by blasting the surface of the developing sleeve with regular particles. There is a method of forming the unevenness by the depression. By this method, it is possible to prevent or reduce the fusion of the developer on the surface of the developing sleeve, and simultaneously coat the surface of the developing sleeve with the developer layer uniformly. However, according to this method, phenomena such as uneven coating of the developer layer on the surface of the sleeve and a decrease in image density occur in an environment of low humidity.

Further, as a means for solving the uneven coating of the developer layer and the reduction of the image density under the environment of low humidity, Japanese Patent Laid-Open No.
As described in Japanese Patent Publication No. 131586, there is one having a shape in which the surface of the developing sleeve has a finely roughened surface area and a relatively smoothed concave area in a mixed manner.
With such a structure, it is possible to stabilize the triboelectrification and the transportability of the developer for a long period of time, but further solve the problem that the blotch or the like is likely to occur in the relatively smooth recessed area. There is a need.

Further, as described in JP-A-2-236577, the surface of the developing sleeve is roughened so as to have sharp projections and recesses, and the recesses are formed while preserving the shape of the projections. It is proposed to have a smoothed shape. With this configuration, it is possible to satisfy the characteristics to some extent by selectively smoothing only the recesses, but the smoothing of the recesses reduces the carrying force. If the pitch width of the sharp convex portion is narrowed to compensate for this decrease, problems such as fusion will occur again, and it will be necessary to have a configuration that makes both the problem of conveyance force and the problem of fusion coexist. It is difficult to selectively smooth only. Higher speed and higher durability are required for electrophotographic copiers, etc., and if the transport of the developer depends only on the part that has a locally protruding shape, the wear of this part Is selectively promoted, which causes a problem that the carrying force is lowered in the long term.

[0011]

SUMMARY OF THE INVENTION An object of the present invention is to provide a developing sleeve and a developing device that solve the above problems.

That is, according to the present invention, the fusing of the developer to the surface of the developing sleeve which has been roughened is reduced, and at the same time, the charge amount of the developer layer is prevented from being reduced, and the developer is always uniform on the surface of the developing sleeve. Layers can be formed, and uneven coating of developer layer and reduction of image density can be eliminated under low humidity environment, and further, reduction of wear amount and conveyance force at high speed and high durability can be minimized. It is an object of the present invention to provide a developing sleeve that can be used.

[0013]

Means and Actions for Solving the Problems The present invention achieves the above object by the following constitutions.

According to the present invention, the surface of the sleeve base has a large number of ridge-like protrusions each having a polygonal shape in a plane,
Further, the present invention relates to a developing sleeve having a surface having fine irregularities provided on a portion other than the vicinity of the apex of the ridge-like protruding portion.

The present invention is a developing device having a developing sleeve for carrying and carrying a developer for visualizing an electrostatic latent image on an electrostatic latent image carrier, wherein the developing sleeve has a surface of a sleeve substrate. The present invention relates to a developing device having a large number of ridge-like protrusions each having a polygonal shape in a plane and having a surface having fine irregularities provided on a portion other than the vicinity of the apex of the ridge-like protrusions.

The present invention will be described in detail below.

The inventors of the present invention have found that the developer is fused to the surface of the developing sleeve and that the developer can be conveyed, the uneven coating of the developer layer in a low humidity environment, and the high speed of the developing sleeve. As a result of diligent research on the point of suppressing the amount of wear during high durability, the surface of the sleeve base has a large number of ridge-like protrusions having a polygonal shape in a plane, and a portion other than the vicinity of the vertex of the ridge-like protrusion By having a surface provided with fine irregularities on, it is difficult for the developer to be fused, and the developer transporting power is excellent, and the charge-up phenomenon does not easily occur even in an environment of low humidity. It has been found that it is possible to perform uniform coating and that the surface of the developing sleeve has excellent wear resistance.

The developing sleeve of the present invention will be described with reference to FIGS.

FIG. 2 is a schematic view of an embodiment of the surface portion of the developing sleeve according to the present invention as seen from above. In the developing sleeve of the present embodiment, the shape of the ridge protruding on the surface is a surface shape in which the surface is continuously formed into a polygonal shape when viewed from above (in a plane).

FIG. 3 is a schematic view of a surface portion of a developing sleeve according to another embodiment of the present invention as viewed from above. In the developing sleeve of the present embodiment, the shape of the ridge projecting on the surface is formed in a polygonal shape when the surface is viewed from above, and the diagonal lines d and d ′ of the polygon of the ridge-shaped projection are formed. Is a surface with non-uniform distribution.

FIG. 4 is a schematic top view of a surface portion of a developing sleeve according to still another embodiment of the present invention.
The developing sleeve according to the present embodiment does not necessarily need to have the ridge-shaped protrusions having a polygonal shape formed on the surface thereof continuously formed. For example, when the masked sleeve substrate is etched, Even if a discontinuity occurs, if it is a partial discontinuity and macroscopically constitutes a polygon, the carrying force will not be reduced.

FIG. 5 is a schematic view showing a cross section of the surface layer of the developing sleeve shown in FIG. The height h of the ridgeline on the surface of the developing sleeve in this embodiment means the difference between the lowermost portion P surrounded by the ridgeline and the highest portion P ′ of the ridgeline portion as shown in the figure.
Further, as shown in the figure, the portion other than the vicinity of the apex of the ridge of the ridge on the surface of the developing sleeve means a portion between S and S ', and it is possible to improve the charge amount by providing fine unevenness in this portion. Become.

In the developing sleeve of the present invention, as shown in FIG. 5, the height h (of the ridge-like protruding portion defined by the difference between the lowermost bottom portion of the portion surrounded by the ridgeline and the top vertex portion of the ridgeline) μ
As is clear from Table 1, m) preferably satisfies the following condition 0.01 × r ≦ h ≦ 2.5 × r with respect to the average particle size r (μm) of the developer used, More preferably, the following condition 0.05 × r ≦ h ≦ 1.2 × r should be satisfied.

When the relationship between h and n is h <0.01 × r, it is difficult to obtain the required conveying force, and when 2.5 × r <h, the developer is uniformly coated on the surface of the developing sleeve. This is not preferable because it makes things difficult.

As shown in Table 2, the longest diagonal length d (μm) of the ridge-like protrusion having a polygonal shape as shown in FIGS. 2 to 5 is the average particle size r (μ of the developer used.
m), the following condition 0.25 × r ≦ d ≦ 35 × r is preferably satisfied, and more preferably the following condition 1.2 × r ≦ d ≦ 27 × r is satisfied. Good, further unit area (1 square mm)
The number n of ridge-like protrusions per unit preferably satisfies the following condition 15 ≦ n ≦ 12000, and more preferably satisfies the following condition 300 ≦ n ≦ 7500.

The relationship between d, r and n is d <0.25 × r
Alternatively, when 12000 <n, the pitch of the ridge-like protruding portions is too narrow, and the developer is easily fused to the sleeve surface.
If 5 × r <d or n <15, it is difficult to obtain the necessary conveying force, which is not preferable.

A portion other than the vicinity of the apex of the ridge-shaped protruding portion having a polygonal shape provided on the surface of the developing sleeve, that is, Ra of unevenness formed between S and S'shown in FIG.
(Center line average roughness) and Rz (ten-point average roughness) are preferably 0.001 × r ≦ Ra with respect to the average particle diameter r (μm) of the developer used as shown in Table 3. ≦ 0.5 × r 0.01 × r ≦ Rz ≦ 1.2 × r is preferably satisfied, and more preferably 0.008 × r ≦ Ra ≦ 0.1 × r 0.03 × r ≦ It is preferable that Rz ≦ 0.7 × r is satisfied.

[0028]

[Table 1]

[0029]

[Table 2]

[0030]

[Table 3]

Table 1 shows the carrying force and coating unevenness when a developing sleeve having a surface shape having a ratio between the height h of the ridge-like protrusion and the average particle diameter r of the developer is the value shown in Table 1. Is a table showing.

Table 2 shows the longest diagonal length d of the ridge-like protrusion.
And the average particle size r of the developer have the values shown in Table 2, in the developing sleeve having a surface shape, the number n of ridge-like protrusions
Is a table showing the observed values and the fusing and conveying forces when this developing sleeve is used.

Table 3 shows the developing sleeve having a surface shape in which the ratio of the fine particle roughness Ra and Rz other than near the apex of the ridge-like protrusion and the average particle diameter r of the developer is the value shown in Table 3. 9 is a table showing charging and fusion when used.

When Ra and Rz are Ra <0.001 × r or Rz <0.01 × r, the charge amount of the developer is reduced, and the charge amount is remarkably lowered particularly in an environment of low humidity. If 0.5 × r <Ra or 1.2 × r <Rz,
This is not preferable because the developer is likely to be fused on the surface of the developing sleeve.

At least one layer selected from the group consisting of a conductive resin coating layer, a non-magnetic metallized layer, a chemical conversion coating layer and an electrodeposition coating layer is formed on the surface of the developing sleeve. These layers can hold the fine irregularities provided on the surface of the developing sleeve for a longer period of time.

In the present invention, the electrodeposition coating is a method in which the powder dispersed with the resin in the electrodeposition coating material is co-deposited with the electrodeposition resin which is deposited by the electrophoretic action.

Here, the mechanism of the surface shape of the electrodeposition coating layer is that H ₂ bubbles are generally generated when the object to be coated is a cathode and O ₂ bubbles when the object is an anode due to hydrolysis of water during the electrodeposition coating treatment. appear. By the heating and curing process, the resin flows into the portion where the bubbles are generated to form a uniform smooth surface shape. However, in the present invention, it is possible to control the formation state of bubbles on the surface and the flow state of the resin by setting the electrodeposition conditions, the composition of the electrodeposition bath, the curing conditions, etc. Further, it is possible to form fine irregularities other than the vicinity of the ridge-shaped convex portion. According to this method, it is possible to simultaneously form the uneven shape and the protective treatment layer without forming the fine uneven shape on the sleeve base material in advance, and therefore, the electrodeposition coating layer is the uppermost layer among the layers. Is the most preferable method.

As other methods, the non-magnetic metal surface is arbitrarily patterned with a photoresist or the like and then an etching treatment is performed, or a non-metal member made of a plastic or ceramic material is molded and fired into an arbitrary shape. Although there are methods and the like, it is necessary to perform the formation of the uneven shape and the formation of the protective treatment layer in separate steps.

As described above, the developing sleeve of the developing device of the present invention has a large number of ridge-like protrusions having a polygonal shape on the surface thereof, and further, fine irregularities are formed on the portions other than near the apex of the ridge-like protrusions. Further, at least one layer selected from the group consisting of a conductive resin coating layer, a non-magnetic metallization treatment layer, a chemical conversion coating treatment layer, and an electrodeposition coating coating layer is provided on the surface of the developing sleeve. By providing it, it is possible to realize a high speed and high durability of the developing sleeve, which has an extremely excellent carrying force and charge stability and does not impair the image characteristics. This is because, as shown in the publicly known example, the developer carrying force is less affected by the environment and the reaction force of the carrying force is smaller than that of the developing sleeve having only locally convex portions. This is because the particles are dispersed over the entire convex portion and then over the entire surface, so that the abrasion resistance with the developer is improved and a stable conveying force can be exhibited for a long period of time.

6 to 13 are schematic views showing cross sections of the surface layer of the developing sleeve according to the present invention.

In FIG. 6, the developing sleeve 9 of the present embodiment.
Is coated with a photoresist on the upper surface of a sleeve-shaped non-magnetic metal member by dipping or the like, exposed and developed to a polygon having an arbitrary size and shape with a laser, an ultraviolet ray, or the like. Non-magnetic metal member 10 having a ridge line shape by chemical etching treatment with alkali or the like
Becomes

In FIG. 7, the developing sleeve 9 of the present embodiment.
Is a nonmagnetic metal member 10 having a ridge line shape that has been chemically etched by the above method, and a conductive resin coating layer 11 is formed on the surface thereof.

In FIG. 8, the developing sleeve 9 of this embodiment is a generally known plating or vapor deposition on the surface of a non-magnetic metal member 10 having a ridge line shape which is chemically etched by the above method. The nonmagnetic metallized layer 12 is formed by a method or the like.

In FIG. 9, the developing sleeve 9 of the present embodiment.
Is formed by forming a chemical conversion coating layer 13 such as an oxide coating on the surface of a non-magnetic metal member 10 having a ridge line shape that has been chemically etched by the above method.

In FIG. 10, the developing sleeve 9 of this embodiment is a non-magnetic metal member 10 having a ridge line shape that has been chemically etched by the above-described method, and a conversion coating layer 13 such as an oxide coating is formed on the surface thereof. And a conductive resin film layer 11 is further formed on the upper surface of the film.

In FIG. 11, the developing sleeve 9 of the present embodiment is a non-metallic member 14 formed in a sleeve shape having a convex portion protruding in a ridge line shape on the surface thereof. The non-magnetic metallized layer 12 is formed by plating or vapor deposition performed on a metal member.

In FIG. 12, the developing sleeve 9 of the present embodiment has a non-metal member 14 formed into a sleeve shape having a convex portion protruding in a ridge shape on the surface by the above-mentioned method, and a conductive resin on the surface. A coating layer 11 is formed.

In FIG. 13, the developing sleeve 9 of this embodiment has a sleeve-shaped non-magnetic metal member 15 and an electrodeposition coating layer 16 formed on the surface thereof.

As described above, according to the present invention, the surface shape of the developing sleeve is formed by chemically etching a sleeve-shaped non-magnetic metal member, or formed into a sleeve shape having a ridge-shaped protruding portion on the surface. Non-metal member 14
Or the surface shape of the electrodeposition coating layer 16 or the like. Further, when the value of Ra or Rz is small in the portion other than the vicinity of the apex of the ridge of the ridge (between S and S '), it can be compensated by lightly sandblasting before providing the surface coating layer.

Note that the structure described here is an example, and even if it is another structure, a sufficient effect can be obtained as long as it has the above-mentioned surface shape.

According to the present invention, the sleeve base material used for the developing sleeve 9 may be either a non-magnetic metal member 10 such as aluminum or iron or a non-metal member 14 made of a plastic or ceramic material. The surface coating layers such as the conductive resin coating layer 11, the non-magnetic metallized layer 12, the chemical conversion coating layer 13 and the electrodeposition coating layer 16 are selected according to the material.

Further, according to the present invention, there are no particular restrictions on the type of photoresist and the coating method, and in the case of UV exposure, a pattern of the above surface shape can be formed by using a negative or positive mask depending on the type of resist. In the case of laser beam exposure, a positive type photoresist is applied, exposed with a laser beam regulated in a polygonal shape, and scanning is performed while rotating the sleeve, whereby a pattern of the surface shape is formed on the entire surface of the photoresist.

Further, the conductive resin coating layer 11 is formed by spray coating.
It can be formed by electrostatic coating, powder coating, electrodeposition coating, dipping coating, etc., and contains conductive powder or semi-conductive powder such as carbon black, graphite, conductive ceramic in the coating film. It is possible to make them electrically conductive or to make them electrically conductive by means of an electropolymerizable electrically conductive polymer such as pyrrole or thiophene.

The material used for the non-metal member 14 has rigidity and stability. Polysulfone, polycarbonate, polyetherimide, polyamideimide, etc. can be used for the plastic material, and SiO ₂ , Al _{2 for the} ceramic material. Oxide ceramics such as O ₃ or other ceramics and a plurality of sintered bodies can be used.

Further, according to the present invention, the electrodeposition coating layer 16 may be either anionic or cationic coating material, and the electrolysis conditions, heat curing conditions, filler content, resin flowability, etc. By selecting a factor, the surface shape of the electrodeposition coating film layer 16 can be controlled.

Next, the developing device of the present invention will be described.

The developing device of the present invention has a developing sleeve carrying and carrying a developer for visualizing the electrostatic latent image on the electrostatic latent image carrier.

As the electrostatic latent image carrier, a photosensitive drum or belt such as amorphous silicone or OPC is used.

The developing device of the present invention can use either one-component developer composed of toner or two-component developer composed of toner and carrier.

Further, in the developing device of the present invention, the electrostatic latent image carrier and the developing sleeve are arranged in the developing section so as to keep a constant distance, and the developer carried on the developing sleeve is electrostatically charged at the time of development. A jumping developing method in which the latent image carrier is scattered and developed can be used.

FIG. 1 is a sectional view showing the schematic arrangement of an example of the developing device of the present invention. In the figure, 4 is a fixed magnet roller, 2 is a movable developing sleeve, 8 is a hopper, 1 is a magnetic blade made of a magnetic material for controlling the thickness, 5 is a photosensitive drum, and 7 is a one-component magnetic developer. 6 is sleeve 2
And a photosensitive drum 5 is a power supply unit for applying a superimposed voltage of AC and DC.

In this developing device, the developer 7 is stored in the hopper 8 and is attracted onto the developing sleeve 2 by the magnetic force of the magnet roller 4. The developer on the developing sleeve is charged by friction with the developing sleeve as the developing sleeve rotates.

The developer is conveyed by the rotating developing sleeve and reaches the blade portion. A magnetic pole N ₁ is arranged at a position facing the magnetic blade 1. Blade 1
The developer layer 3 is applied with a certain thickness regulated by the magnetic field generated between the magnetic pole N ₁ and the magnetic pole N ₁ and the distance between the blade 1 and the developing sleeve 2. The sleeve further rotates and reaches the photosensitive drum 5 facing the sleeve. The developer layer 3 facing the photosensitive drum stands up due to the magnetic force of the developing magnetic pole S ₁ .
It reciprocates by the action of the electric field due to the superimposed voltage of AC and DC applied between the electrostatic latent image on the photosensitive drum and the developing sleeve, and adheres only to the place where the latent image charge exists.

The developer remaining on the developing sleeve after the development is further conveyed into the developing container by the rotation of the developing sleeve and the magnetic forces of the conveying magnetic poles N ₂ , S ₂ and N ₃ .

The methods for measuring the physical properties used in the present invention are shown below.

(1) Measurement of height (h) of ridge-like protrusion:
The difference between the lowermost portion P surrounded by the ridgeline shown in FIG. 5 and the highest portion P ′ of the ridgeline is defined as the height h of the ridgeline protrusion, and a contact type roughness meter (trade name: P-1, Tencor Corporation Manufactured), 60
An angle non-magnetic stylus was used to measure at a scan speed of 0.1 to 10 μm / sec, and an average value was obtained by measuring 3 points by this method.

(2) Measurement of the longest diagonal length (d) of the ridge-like protrusion: The surface of the developing sleeve was measured by observing with a scanning electron microscope (SEM), and an average value was obtained by measuring 10 points by this method. .

(3) Measurement of the number of polygons per unit area (1 mm 2) of the surface of the developing sleeve: The surface of the developing sleeve was measured by observation with a scanning electron microscope (SEM),
It was converted to the number per unit area (1 square mm).

(4) Measurement of Ra and Rz of parts other than the vicinity of the apex of the ridge-like convex portion Ra (center line average roughness) and Rz (10) of fine unevenness between S and S'shown in FIG. As a method for measuring (point average roughness), a contact type roughness meter (product name: P-1, manufactured by Tencor) is used, and a scan speed of 0.1 μm to 10 μm / sec is used using a 60 ° angle non-magnetic stylus. It was measured at.

(5) Measurement of average particle size of developer (toner): The particle size distribution can be measured by various methods, but in the present invention, it was measured using a Coulter counter.

As a measuring device, Coulter Counter TA-II type or Coulter Multisizer II (manufactured by Coulter) is used. As the electrolytic solution, about 1% NaCl aqueous solution is prepared using first-grade sodium chloride. For example, ISOTON-II (manufactured by Coulter Scientific Japan) can be used. As a measuring method, 0.1 to 5 ml of a surfactant, preferably an alkylbenzene sulfonate is added as a dispersant in 100 to 150 ml of the electrolytic aqueous solution, and a measurement sample is further added to 2 to 20 m.
Add g. The electrolytic solution in which the sample is suspended is subjected to a dispersion treatment for about 1 to 3 minutes by an ultrasonic disperser, and the volume and number of the toner are measured by using the measuring device with an aperture of 100 μm as an aperture to measure the volume distribution and the number. And the distribution was calculated. Then, a weight-based weight average particle diameter (D4) obtained from the volume distribution according to the present invention (the median value of each channel is used as a representative value for each channel).

[0072]

EXAMPLES The present invention will be described in detail below with reference to examples.

(Production of Developing Sleeve A) Aluminum 53S was used as a sleeve member. 5 vol% alkaline degreasing agent (trade name: VJP31
20-4, manufactured by Henkel Hakusui Co., Ltd.) for 2 minutes and then washed with deionized water to prepare a sleeve substrate. Cationic type electrodeposition coating (Product name: New Payton ER-F
50V with a paint containing 3 phr of carbon black and 40 phr of titanium oxide in (2, Uemura Kogyo Co., Ltd.)
A coating film of about 8 μm was formed on the sleeve substrate by electrodeposition at a voltage of 1 to 70 ° C. and a developing sleeve A was obtained. By coating with this method, the above-mentioned shape is obtained, and it is not necessary to perform blast treatment with glass beads, so that waste of glass beads is not generated, which promotes ecology.

(Production of Developing Sleeve B) Aluminum 53S was used as a sleeve member. In the developing step, a positive type photoresist (trade name: AZ-1350J, manufactured by Shipley Co.) is dipping on the surface of the sleeve to about 1.
It was applied to a thickness of 5 μm, prebaked at 80 ° C. for 30 minutes, placed on a photomask, and exposed to ultraviolet rays while rotating the sleeve to be used as a developing step. Furthermore, as an etching process, 60
After immersion in 30 ° C./30% caustic soda, the resist was peeled off in fuming nitric acid to obtain a sleeve substrate. This sleeve substrate was anodized in a 20 g / 1 oxalic acid solution at a current of 4 A / dm ² to form an alumite layer having a thickness of about 10 μm, and the anion type electrodeposition was performed without the generally used sealing treatment. 3 phr of carbon black and titanium oxide (trade name: ET) in paint (trade name: C-1L, manufactured by Honey Kasei Co.)
-500 W, manufactured by Ishihara Sangyo Co., Ltd.) was used for electrodeposition at a voltage of 150 V using a coating material containing 40 phr, and a coating film of about 8 μm was formed on the sleeve substrate by curing at 120 ° C. to obtain a developing sleeve B. By coating with this method, the above-mentioned shape can be obtained, and there is no need to perform blast treatment with glass beads, so waste of glass beads is not generated, which promotes ecology.

(Production of Developing Sleeve C) Developing Sleeve B
Using the same sleeve substrate as used in the production of Polyol (trade name: Takelac E
-550A, manufactured by Takeda Pharmaceutical Co., Ltd. and isocyanate (trade name: Takenate D140N, manufactured by Takeda Pharmaceutical Co., Ltd.) in a carbon black (trade name:
Ketjenblack EC600JD, manufactured by AKZO, 3 phr (weight% of additive based on 100% by weight of resin solid content) and graphite fine particles (trade name: GP-60S,
(Hitachi Powder Metallurgical Co., Ltd.) using a paint containing 12 phr, the sleeve substrate is applied by spray coating while rotating at a speed of 400 rpm, and a coating film of about 12 μm is obtained after a curing process at 150 ° C. A developing sleeve C formed on the above was obtained. By coating with this method, the above-mentioned shape can be obtained, and there is no need to perform blast treatment with glass beads, so waste of glass beads is not generated, which promotes ecology.

(Production of Developing Sleeve D) Aluminum 53S was used as a sleeve member. In the developing process, a positive photoresist (product name: AZ1350J, manufactured by Shipley Co.) on the surface of the sleeve is dip-coated to about 1.5.
It was applied to a thickness of μm, prebaked at 80 ° C. for 30 minutes, placed on a photomask, and exposed to ultraviolet rays while rotating the sleeve to obtain a developing step. Furthermore, as an etching process, 60
After immersion in 30 ° C./30% caustic soda, the resist was peeled off in fuming nitric acid to obtain a developing sleeve D.

(Production of Developing Sleeve E) Aluminum 53S was used as a sleeve member. In the developing step, a positive type photoresist (trade name: AZ-1350J, manufactured by Shipley Co.) is dipping on the surface of the sleeve to about 1.
It was applied to a thickness of 5 μm, prebaked at 80 ° C. for 30 minutes, placed on a photomask, and exposed to ultraviolet rays while rotating the sleeve, and the development step was performed. After the developed sleeve was etched in a mixed acid solution, the resist was peeled off in fuming nitric acid to form a ridged surface. This surface was further blast-treated with amorphous particles at an air pressure of 1.5 kg / cm ² for about 1 minute to obtain a developing sleeve E.

(Production of Developing Sleeve F) Developing Sleeve B
Using the same sleeve substrate as used in the production of, a surface of the substrate was replaced with zinc and an electroless nickel plating layer of about 3 μm was formed to obtain a developing sleeve F.

(Production of Developing Sleeve G) Developing Sleeve B
Using the same sleeve substrate as used in the production, the sleeve substrate was anodized in a 20 g / 1 oxalic acid solution at a current of 4 A / dm ² to form an alumite layer having a thickness of about 10 μm and developed. Sleeve G was obtained.

(Manufacture of Developing Sleeve H) A plastic containing mainly polyetherimide was used as a sleeve member and was molded into a sleeve having a polygonal ridge line on the upper surface to obtain a sleeve base. A developing sleeve H was obtained by applying a catalyst to the plastic material by the same treatment method as that of plastic plating generally performed on this substrate to form an electroless nickel plating layer of about 3 μm on the surface.

(Manufacture of Developing Sleeve I) As a sleeve member, a ceramic containing SiO ₂ as a main component was molded into a sleeve having a polygonal shape with ridges on the upper surface to obtain a sleeve base. A developing sleeve I was obtained by forming an electroless nickel plating layer of about 3 μm on this surface in the same manner as the developing sleeve H was manufactured.

(Production of developing sleeve J) As a sleeve member, a plastic containing polyetherimide as a main component is used, and an electroless nickel plating layer of about 3 μm is formed on this surface in the same manner as in the production of developing sleeve H. It was used as a sleeve substrate. Further, a coating film of about 12 μm was formed on this surface in the same manner as in the production of the developing sleeve C to obtain a developing sleeve J.

(Production of Developing Sleeve K) SUS304 was used as a sleeve member, and the surface was subjected to a blast treatment with regular particles to obtain a developing sleeve K formed into a plurality of spherical trace depressions.

(Production of developing sleeve L) SUS304 was used as a sleeve member, and the surface was blasted with a mixture of regular particles and irregular particles to form a finely rough surface area and a relatively smoothed recess. A developing sleeve L formed so as to have a mixture of

(Production of Developing Sleeve M) SUS304 is used as a sleeve member, and the surface is blasted with irregular particles, washed, and then dried. A methane gas was deposited on the blasted surface by a plasma CVD method and a diamond thin film was coated on the blasted surface to obtain a developing sleeve M in which the concave portions were smoothed while preserving the shape of the convex portions on the blasted surface.

(Production of Developing Sleeve N) Developing Sleeve A
A developing sleeve N was obtained in the same manner as the developing sleeve A, except that the curing condition was changed from 170 ° C. to 195 ° C. and butyl cellosolve was added in an amount of 3.5 phr.

Table 4 shows various physical properties of the developing sleeves A to N thus obtained.

[0088]

[Table 4]

(Examples 1 to 10 and Comparative Examples 1 to 4)
By using the developing device shown in FIG. 1, it was judged by observing pitch unevenness and image density under a low humidity environment (5%), observing occurrence of blotch, and further changing the carrying force before and after the durability test. Here, in the durability test, the developer 7 should be replaced at a proper time.
It was carried out by carrying out idle rotation for 0 hours.

In the developing device of FIG. 1, the magnetic pole strength of the magnet roll 4 is N ₁ = 700 Gauss, S ₁ = 8.
00G, N ₂ = S ₂ = N ₃ = S ₃ = 500G, the distance between the sleeve and the drum is 0.3 mm, the blade 1 is made of iron, which is a magnetic material, and the distance between the sleeve and the blade is 0.25 mm. Hold and D to AC as bias power supply 6
Cpp is used and Vpp = 1200 (V), f
= 1800 (Hz), DC = + 100 (V), and the outer diameter of the developing sleeve 9 was 32 mm. The outer diameter is 32 mm
200 seconds idle rotation of the developing sleeve of the copy speed 8
This corresponds to a state in which 1 million sheets of A4 size paper are copied by a copying machine of 5 sheets / minute. The average particle size of the developer used is 9 μm.

Table 5 shows the evaluation results.

[0092]

[Table 5]

[0093]

According to the present invention, the surface of the sleeve base of the developing sleeve has a large number of ridge-like protrusions each having a polygonal shape in a plane, and the ridge-like protrusions have fine ridge-like protrusions at portions other than the vicinity thereof. Since it has an uneven surface, it reduces fusion of the developer to the surface of the roughened developing sleeve and at the same time prevents a decrease in the charge amount of the developer layer.
Moreover, it is possible to always form a uniform developer layer on the surface of the developing sleeve, eliminate the uneven coating of the developer layer and the decrease in the image density in an environment of low humidity, and further wear at high speed and high durability. It has become possible to minimize the decrease in the amount and the carrying force. Further, by coating the developer carrier with the above-mentioned film, the above-mentioned shape is obtained, and the glass beads do not need to be blasted. Therefore, waste of the glass beads is not generated, which promotes ecology.

[Brief description of drawings]

FIG. 1 is a sectional view showing a schematic configuration of an example of a developing device according to the present invention.

FIG. 2 is a schematic view of a surface portion of an embodiment of the developing sleeve of the present invention as viewed from above.

FIG. 3 is a schematic view of a surface portion of another embodiment of the developing sleeve of the present invention viewed from above.

FIG. 4 is a schematic view of a surface portion of another embodiment of the developing sleeve of the present invention viewed from above.

5 is a schematic view showing a cross section of a surface layer of the developing sleeve shown in FIG.

FIG. 6 is a schematic view showing a cross section of a surface layer of a developing sleeve according to the present invention.

FIG. 7 is a schematic view showing a cross section of a surface layer of a developing sleeve according to the present invention.

FIG. 8 is a schematic view showing a cross section of a surface layer of a developing sleeve according to the present invention.

FIG. 9 is a schematic view showing a cross section of a surface layer of a developing sleeve according to the present invention.

FIG. 10 is a schematic view showing a cross section of a surface layer of a developing sleeve according to the present invention.

FIG. 11 is a schematic view showing a cross section of a surface layer of a developing sleeve according to the present invention.

FIG. 12 is a schematic view showing a cross section of a surface layer of a developing sleeve according to the present invention.

FIG. 13 is a schematic view showing a cross section of a surface layer of a developing sleeve according to the present invention.

[Explanation of symbols]

1 Magnetic Blade for Controlling Thickness 2 Magnetic Sleeve 3 Movable Sleeve 3 Developer Layer 4 Fixed Magnet Roller 5 Photosensitive Drum 6 Power Supply Unit for Applying Superimposed Voltage of AC and DC between Sleeve 2 and Photosensitive Drum 5 7 One-Component Magnetic Developer 8 Hopper 9 Developing Sleeve 10 of this Example 10 Nonmagnetic Metal Member Having Ridge Line Shape 11 Conductive Resin Coating Layer 12 Nonmagnetic Metallization Treatment Layer 13 Chemical Conversion Coating Treatment Layer 14 Nonmetal Member 15 Nonmagnetic Metal member 16 Electrodeposition coating layer

Front page continuation (72) Inventor Kazushige Nishiyama 3-30-2 Shimomaruko, Ota-ku, Tokyo Canon Inc.

Claims (8)

[Claims] 1. The surface of the sleeve base has a large number of ridge-like protrusions each having a polygonal shape in a plane, and has a surface on which fine irregularities are provided in a portion other than the vicinity of the apex of the ridge-like protrusions. Development sleeve characterized by. 2. The developer to be used, wherein the height of the ridge-shaped protrusion having the polygonal shape is h (μm), and the longest diagonal length of the ridge-shaped protrusion having the polygonal shape is d (μm). Where r is the average particle diameter of r (μm) and n is the number of ridge-shaped protrusions per unit area (1 square mm), h · d · r · n is 0.01 × r ≦ h ≦ The developing sleeve according to claim 1, wherein 2.5 × r 0.25 × r ≦ d ≦ 35 × r 15 ≦ n ≦ 12000 is satisfied. 3. Ra (center line average roughness), Rz of fine irregularities other than near the apex of the polygonal ridge-shaped convex portion.
(10-point average roughness) is the average particle size of the development used, r (μ
m), the following condition 0.001 × r ≦ Ra ≦ 0.5 × r 0.01 × r ≦ Rz ≦ 1.2 × r is satisfied. Development sleeve. 4. The polygonal ridge-shaped protrusion comprises a conductive resin coating layer, a non-magnetic metallized layer, a chemical conversion coating layer and an electrodeposition coating layer on the surface of the developing sleeve substrate. 4. The developing sleeve according to claim 1, wherein the developing sleeve is formed by providing at least one layer selected from the group. 5. A developing device having a developing sleeve that carries and conveys a developer for visualizing an electrostatic latent image on an electrostatic latent image carrier, wherein the developing sleeve has a flat surface on a sleeve substrate. 2. A developing device having a large number of ridge-shaped protrusions having a polygonal shape, and having a surface having fine irregularities provided on a portion other than the vicinity of the apex of the ridge-shaped protrusions. 6. The developer to be used, wherein the height of the ridge-shaped protrusion having the polygonal shape is h (μm), and the longest diagonal length of the ridge-shaped protrusion having the polygonal shape is d (μm). Where r is the average particle diameter of r (μm) and n is the number of ridge-shaped protrusions per unit area (1 square mm), h · d · r · n is 0.01 × r ≦ h ≦ The developing device according to claim 5, wherein 2.5 × r 0.25 × r ≦ d ≦ 35 × r 15 ≦ n ≦ 12000 is satisfied. 7. Ra (center line average roughness), Rz of fine irregularities other than near the apex of the polygonal ridge-shaped convex portion
(10-point average roughness) is the average particle size of the developer used.
7. When (μm) is satisfied, the following condition 0.001 × r ≦ Ra ≦ 0.5 × r 0.01 × r ≦ Rz ≦ 1.2 × r is satisfied. Developing device. 8. The ridge-shaped protrusion having a polygonal shape comprises a conductive resin coating layer, a non-magnetic metallized layer, a chemical conversion coating layer and an electrodeposition coating layer on the surface of the developing sleeve substrate. The developing device according to claim 5, wherein the developing device is formed by providing at least one layer selected from the group.