JPH08157566A - Photosetting and thermosetting undercoat material and production of multilayer printed wiring board - Google Patents
Photosetting and thermosetting undercoat material and production of multilayer printed wiring boardInfo
- Publication number
- JPH08157566A JPH08157566A JP30404494A JP30404494A JPH08157566A JP H08157566 A JPH08157566 A JP H08157566A JP 30404494 A JP30404494 A JP 30404494A JP 30404494 A JP30404494 A JP 30404494A JP H08157566 A JPH08157566 A JP H08157566A
- Authority
- JP
- Japan
- Prior art keywords
- epoxy resin
- thermosetting
- undercoat material
- printed wiring
- wiring board
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920001187 thermosetting polymer Polymers 0.000 title claims abstract description 38
- 239000000463 material Substances 0.000 title claims abstract description 22
- 238000004519 manufacturing process Methods 0.000 title claims description 12
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 42
- 239000011889 copper foil Substances 0.000 claims abstract description 39
- 239000003822 epoxy resin Substances 0.000 claims abstract description 38
- 229920000647 polyepoxide Polymers 0.000 claims abstract description 38
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 33
- 239000000853 adhesive Substances 0.000 claims abstract description 22
- 230000001070 adhesive effect Effects 0.000 claims abstract description 22
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 claims abstract description 15
- 239000007787 solid Substances 0.000 claims abstract description 13
- 239000000178 monomer Substances 0.000 claims abstract description 12
- 238000010030 laminating Methods 0.000 claims abstract description 10
- 239000003085 diluting agent Substances 0.000 claims abstract description 8
- 238000010438 heat treatment Methods 0.000 claims abstract description 8
- 239000003999 initiator Substances 0.000 claims abstract description 6
- 238000000034 method Methods 0.000 claims description 21
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 claims description 10
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 claims description 5
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 claims description 4
- -1 methacryloyl group Chemical group 0.000 claims description 4
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 claims 2
- 239000010410 layer Substances 0.000 abstract description 43
- 238000001723 curing Methods 0.000 abstract description 18
- 229930185605 Bisphenol Natural products 0.000 abstract description 3
- 239000012965 benzophenone Substances 0.000 abstract description 3
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 abstract description 2
- 239000012790 adhesive layer Substances 0.000 abstract description 2
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 abstract description 2
- 230000000694 effects Effects 0.000 abstract description 2
- 239000004841 bisphenol A epoxy resin Substances 0.000 abstract 1
- 238000013007 heat curing Methods 0.000 abstract 1
- 230000005855 radiation Effects 0.000 abstract 1
- 239000011229 interlayer Substances 0.000 description 12
- 239000004593 Epoxy Substances 0.000 description 6
- 239000011521 glass Substances 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 5
- 239000004744 fabric Substances 0.000 description 5
- 229920003986 novolac Polymers 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 4
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 3
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000009413 insulation Methods 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 239000002966 varnish Substances 0.000 description 3
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 2
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 2
- 239000002202 Polyethylene glycol Substances 0.000 description 2
- 239000006087 Silane Coupling Agent Substances 0.000 description 2
- 244000028419 Styrax benzoin Species 0.000 description 2
- 235000000126 Styrax benzoin Nutrition 0.000 description 2
- 235000008411 Sumatra benzointree Nutrition 0.000 description 2
- 229960002130 benzoin Drugs 0.000 description 2
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 description 2
- 229930003836 cresol Natural products 0.000 description 2
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 235000019382 gum benzoic Nutrition 0.000 description 2
- 150000002460 imidazoles Chemical class 0.000 description 2
- 239000003112 inhibitor Substances 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 238000003475 lamination Methods 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 2
- 229920001223 polyethylene glycol Polymers 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 238000007650 screen-printing Methods 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- HJIAMFHSAAEUKR-UHFFFAOYSA-N (2-hydroxyphenyl)-phenylmethanone Chemical compound OC1=CC=CC=C1C(=O)C1=CC=CC=C1 HJIAMFHSAAEUKR-UHFFFAOYSA-N 0.000 description 1
- SGCGFUOYEVLOPJ-UHFFFAOYSA-N (3-hydroxy-3-phenoxypropyl) prop-2-enoate Chemical compound C=CC(=O)OCCC(O)OC1=CC=CC=C1 SGCGFUOYEVLOPJ-UHFFFAOYSA-N 0.000 description 1
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 description 1
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 1
- 229920002818 (Hydroxyethyl)methacrylate Polymers 0.000 description 1
- MSAHTMIQULFMRG-UHFFFAOYSA-N 1,2-diphenyl-2-propan-2-yloxyethanone Chemical compound C=1C=CC=CC=1C(OC(C)C)C(=O)C1=CC=CC=C1 MSAHTMIQULFMRG-UHFFFAOYSA-N 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- DKEGCUDAFWNSSO-UHFFFAOYSA-N 1,8-dibromooctane Chemical compound BrCCCCCCCCBr DKEGCUDAFWNSSO-UHFFFAOYSA-N 0.000 description 1
- FBHPRUXJQNWTEW-UHFFFAOYSA-N 1-benzyl-2-methylimidazole Chemical compound CC1=NC=CN1CC1=CC=CC=C1 FBHPRUXJQNWTEW-UHFFFAOYSA-N 0.000 description 1
- KKKDZZRICRFGSD-UHFFFAOYSA-N 1-benzylimidazole Chemical compound C1=CN=CN1CC1=CC=CC=C1 KKKDZZRICRFGSD-UHFFFAOYSA-N 0.000 description 1
- BVEIKFLZWBDLJG-UHFFFAOYSA-N 1-butylanthracene-9,10-dione Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=CC=C2CCCC BVEIKFLZWBDLJG-UHFFFAOYSA-N 0.000 description 1
- HSKPJQYAHCKJQC-UHFFFAOYSA-N 1-ethylanthracene-9,10-dione Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=CC=C2CC HSKPJQYAHCKJQC-UHFFFAOYSA-N 0.000 description 1
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 description 1
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- PIZHFBODNLEQBL-UHFFFAOYSA-N 2,2-diethoxy-1-phenylethanone Chemical compound CCOC(OCC)C(=O)C1=CC=CC=C1 PIZHFBODNLEQBL-UHFFFAOYSA-N 0.000 description 1
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 1
- LCHAFMWSFCONOO-UHFFFAOYSA-N 2,4-dimethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC(C)=C3SC2=C1 LCHAFMWSFCONOO-UHFFFAOYSA-N 0.000 description 1
- FGTYTUFKXYPTML-UHFFFAOYSA-N 2-benzoylbenzoic acid Chemical compound OC(=O)C1=CC=CC=C1C(=O)C1=CC=CC=C1 FGTYTUFKXYPTML-UHFFFAOYSA-N 0.000 description 1
- DZZAHLOABNWIFA-UHFFFAOYSA-N 2-butoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCCCC)C(=O)C1=CC=CC=C1 DZZAHLOABNWIFA-UHFFFAOYSA-N 0.000 description 1
- ZCDADJXRUCOCJE-UHFFFAOYSA-N 2-chlorothioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(Cl)=CC=C3SC2=C1 ZCDADJXRUCOCJE-UHFFFAOYSA-N 0.000 description 1
- KMNCBSZOIQAUFX-UHFFFAOYSA-N 2-ethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)C(=O)C1=CC=CC=C1 KMNCBSZOIQAUFX-UHFFFAOYSA-N 0.000 description 1
- IEVADDDOVGMCSI-UHFFFAOYSA-N 2-hydroxybutyl 2-methylprop-2-enoate Chemical compound CCC(O)COC(=O)C(C)=C IEVADDDOVGMCSI-UHFFFAOYSA-N 0.000 description 1
- MYISVPVWAQRUTL-UHFFFAOYSA-N 2-methylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC=C3SC2=C1 MYISVPVWAQRUTL-UHFFFAOYSA-N 0.000 description 1
- ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 2-phenyl-1h-imidazole Chemical compound C1=CNC(C=2C=CC=CC=2)=N1 ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 0.000 description 1
- LLEASVZEQBICSN-UHFFFAOYSA-N 2-undecyl-1h-imidazole Chemical compound CCCCCCCCCCCC1=NC=CN1 LLEASVZEQBICSN-UHFFFAOYSA-N 0.000 description 1
- RNLHGQLZWXBQNY-UHFFFAOYSA-N 3-(aminomethyl)-3,5,5-trimethylcyclohexan-1-amine Chemical compound CC1(C)CC(N)CC(C)(CN)C1 RNLHGQLZWXBQNY-UHFFFAOYSA-N 0.000 description 1
- GNSFRPWPOGYVLO-UHFFFAOYSA-N 3-hydroxypropyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCCO GNSFRPWPOGYVLO-UHFFFAOYSA-N 0.000 description 1
- QZPSOSOOLFHYRR-UHFFFAOYSA-N 3-hydroxypropyl prop-2-enoate Chemical compound OCCCOC(=O)C=C QZPSOSOOLFHYRR-UHFFFAOYSA-N 0.000 description 1
- UITKHKNFVCYWNG-UHFFFAOYSA-N 4-(3,4-dicarboxybenzoyl)phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1C(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 UITKHKNFVCYWNG-UHFFFAOYSA-N 0.000 description 1
- NDWUBGAGUCISDV-UHFFFAOYSA-N 4-hydroxybutyl prop-2-enoate Chemical compound OCCCCOC(=O)C=C NDWUBGAGUCISDV-UHFFFAOYSA-N 0.000 description 1
- 229910015900 BF3 Inorganic materials 0.000 description 1
- CAOTXAWVHZFVNG-UHFFFAOYSA-N C(C(=C)C)(=O)OCC(O)CO.C(C=C)(=O)OC(CCC)O Chemical compound C(C(=C)C)(=O)OCC(O)CO.C(C=C)(=O)OC(CCC)O CAOTXAWVHZFVNG-UHFFFAOYSA-N 0.000 description 1
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 1
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- NIPNSKYNPDTRPC-UHFFFAOYSA-N N-[2-oxo-2-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(CNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 NIPNSKYNPDTRPC-UHFFFAOYSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- UKMBKKFLJMFCSA-UHFFFAOYSA-N [3-hydroxy-2-(2-methylprop-2-enoyloxy)propyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(CO)OC(=O)C(C)=C UKMBKKFLJMFCSA-UHFFFAOYSA-N 0.000 description 1
- 150000008062 acetophenones Chemical class 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 239000002313 adhesive film Substances 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 150000004984 aromatic diamines Chemical class 0.000 description 1
- 150000008366 benzophenones Chemical class 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 235000013877 carbamide Nutrition 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 229910002026 crystalline silica Inorganic materials 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 1
- 239000005350 fused silica glass Substances 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229910003475 inorganic filler Inorganic materials 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 229940018564 m-phenylenediamine Drugs 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- RIWRFSMVIUAEBX-UHFFFAOYSA-N n-methyl-1-phenylmethanamine Chemical compound CNCC1=CC=CC=C1 RIWRFSMVIUAEBX-UHFFFAOYSA-N 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 239000013034 phenoxy resin Substances 0.000 description 1
- 229920006287 phenoxy resin Polymers 0.000 description 1
- LYXOWKPVTCPORE-UHFFFAOYSA-N phenyl-(4-phenylphenyl)methanone Chemical compound C=1C=C(C=2C=CC=CC=2)C=CC=1C(=O)C1=CC=CC=C1 LYXOWKPVTCPORE-UHFFFAOYSA-N 0.000 description 1
- 150000003003 phosphines Chemical class 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- FAGUFWYHJQFNRV-UHFFFAOYSA-N tetraethylenepentamine Chemical compound NCCNCCNCCNCCN FAGUFWYHJQFNRV-UHFFFAOYSA-N 0.000 description 1
- 238000012719 thermal polymerization Methods 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
- 150000003672 ureas Chemical class 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Landscapes
- Epoxy Resins (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Production Of Multi-Layered Print Wiring Board (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Laminated Bodies (AREA)
Abstract
Description
【発明の詳細な説明】Detailed Description of the Invention
【0001】[0001]
【産業上の利用分野】本発明は、活性エネルギー線照射
によりタックフリー化し熱により硬化する、低コストで
生産性の高い多層プリント配線板の製造に好適な新しい
光・熱硬化型アンダーコート材を提供するものであり、
更に、このアンダーコート材を用いた多層プリント配線
板の製造方法を提供するものである。FIELD OF THE INVENTION The present invention provides a new photo- and thermosetting undercoat material which is tack-free by irradiation with active energy rays and hardens by heat, which is suitable for the production of a low-cost and highly productive multilayer printed wiring board. Is provided,
Further, the present invention provides a method for manufacturing a multilayer printed wiring board using this undercoat material.
【0002】[0002]
【従来の技術】従来、多層プリント配線板を製造する場
合、回路作成された内層回路基板上にガラスクロス基材
にエポキシ樹脂を含浸して半硬化させたプリプレグシー
トを1枚以上重ね、更にその上に銅箔を重ね熱板プレス
にて加熱一体成形するという工程を経ている。しかし、
この工程では含浸樹脂を熱により再流動させ一定圧力下
で硬化させるため、均一に硬化成形するには1〜1.5
時間は必要である。このように製造工程が長くかかる上
に、多層積層プレス及びガラスクロスプリプレグのコス
ト等により高コストとなっている。加えてガラスクロス
に樹脂を含浸させる方法のため層間厚の極薄化も困難で
あった。2. Description of the Related Art Conventionally, when a multilayer printed wiring board is manufactured, one or more prepreg sheets obtained by impregnating a glass cloth base material with an epoxy resin and semi-cured are laminated on an inner layer circuit board on which a circuit is formed, and further The process of stacking copper foil on top and forming integrally with heating with a hot plate press is performed. But,
In this process, the impregnated resin is reflowed by heat and cured under a constant pressure.
I need time. As described above, the manufacturing process is long, and the cost is high due to the cost of the multi-layer laminating press and the glass cloth prepreg. In addition, it is difficult to make the interlayer thickness extremely thin because the glass cloth is impregnated with the resin.
【0003】近年、これらの問題を解決するため、熱板
プレスによる加熱加圧成形を行わず、層間絶縁材料にガ
ラスクロスを用いない、ビルドアップ方式による多層プ
リント配線板の技術が改めて注目されている。In recent years, in order to solve these problems, a technique of a multi-layer printed wiring board by a build-up method, which does not perform heat and pressure molding by a hot plate press and does not use glass cloth as an interlayer insulating material, has attracted attention again. There is.
【0004】[0004]
【発明が解決しようとする課題】本発明は、上記熱板プ
レスで成形する方法に対して、短時間で簡素化されたビ
ルドアップ方式により多層プリント配線板を低コストで
製造する方法を完成させたものである。SUMMARY OF THE INVENTION The present invention has completed a method for manufacturing a multilayer printed wiring board at a low cost by a simplified build-up method in a short time, which is different from the above-mentioned hot plate pressing method. It is a thing.
【0005】ビルドアップ方式による多層プリント配線
板において、フィルム状の層間絶縁樹脂層を用いた場
合、プリプレグで層間絶縁樹脂層を形成する方法と比べ
て作業効率が著しく向上する。しかし、内層回路板の絶
縁基板と回路との段差部分にある空気を巻き込むことが
予想され、それを防止するためは、減圧の環境下でラミ
ネートを行わねばならず、特殊な設備が必要になってく
る。また、ラミネートした絶縁層が内層回路板の絶縁基
板と回路との段差に追従するため、表面平滑性が得られ
ず、部品実装時に半田付け不良等が発生したり、エッチ
ングレジスト形成工程でレジストの剥離やパターン現像
度の低下が発生して、安定したレジスト形成ができない
等の問題がある。When a film-shaped interlayer insulating resin layer is used in a multilayer printed wiring board by a build-up method, work efficiency is remarkably improved as compared with the method of forming the interlayer insulating resin layer with a prepreg. However, it is expected that air will be entrained in the stepped portion between the insulating substrate of the inner layer circuit board and the circuit, and in order to prevent this, lamination must be performed under a reduced pressure environment, and special equipment is required. Come on. In addition, since the laminated insulating layer follows the step between the insulating substrate of the inner layer circuit board and the circuit, surface smoothness cannot be obtained, and soldering failure etc. may occur during component mounting, or resist There is a problem that peeling and a decrease in pattern development occur, and stable resist formation cannot be performed.
【0006】さらに、プリプレグを使用した場合も同様
であるが、内層回路パターンの銅箔残存率によって埋め
込む樹脂量が変化することから同じフィルムを使用して
も成形後の板厚が同じにならない。つまり、銅箔残存率
が大きく埋め込むべき部分が少ない場合は板厚が厚くな
り、銅箔残存率が小さく埋め込むべき部分が多い場合は
板厚が薄くなることから、銅箔残存率によってフィルム
厚も変えなければ同じ板厚を達成することができない。
また、一枚の内層回路板でも場所により銅箔残存率に差
がある場合には得られた多層プリント配線板の板厚が均
一にならない欠点が生じることになる。Further, the same applies to the case of using a prepreg, but since the amount of resin to be embedded changes depending on the copper foil residual rate of the inner layer circuit pattern, the same film does not have the same plate thickness after molding. In other words, if the copper foil residual rate is large and the portion to be embedded is small, the plate thickness will be thick, and if the copper foil residual rate is small and the portion to be embedded is large, the plate thickness will be thin. Unless changed, the same plate thickness cannot be achieved.
In addition, even if one inner layer circuit board has a different copper foil residual rate depending on the location, the resulting multilayer printed wiring board may have a non-uniform thickness.
【0007】[0007]
【課題を解決するための手段】本発明は、以下に説明す
るように、多層プリント配線板を製造するために、内層
回路板に塗工され、活性エネルギー線照射によりタック
フリー化する光・熱硬化型アンダーコート材、及びかか
るアンダーコート剤を塗工された内層回路板に熱硬化型
絶縁性接着剤層を有する銅箔をラミネートし、次いで、
加熱により一体硬化させて多層プリント配線板を製造す
る方法に関するものである。SUMMARY OF THE INVENTION As will be described below, the present invention is a light / heat treatment applied to an inner layer circuit board for producing a multilayer printed wiring board, which is tack-free by irradiation with active energy rays. Curable undercoat material, and a copper foil having a thermosetting insulating adhesive layer is laminated on the inner layer circuit board coated with such an undercoat agent, and then,
The present invention relates to a method for manufacturing a multilayer printed wiring board by heating and integrally curing.
【0008】即ち、スクリーン印刷、ローラーコータ
ー、カーテンコーターなどで前記液状のアンダーコート
剤を塗工して、内層回路板の銅箔回路間隙を充填し、U
V照射コンベア等の露光機によって活性エネルギー線照
射によりタックフリー化させる。その後、熱硬化型絶縁
性接着剤付き銅箔を接着させる際に加熱された硬質ロー
ル等でラミネートすることにより該アンダーコート剤を
再溶融させ、表面平滑性を得ることができる。そのと
き、銅箔にコートされた熱硬化型絶縁接着剤は重量平均
分子量10000以上のエポキシ樹脂成分が配合されて
いれば、この成分により形状を維持したまま、すなわち
層間厚みを保った状態で接着されるため、内層銅箔残存
率に依存することなく板厚精度に優れた多層プリント配
線板を作製することができる。そして、ラミネート後加
熱して同時一体硬化反応させることにより多層プリント
配線板用光・熱硬化型アンダーコート材と熱硬化型絶縁
性接着剤付き銅箔とを一体成形させる。That is, the liquid undercoat agent is applied by screen printing, a roller coater, a curtain coater or the like to fill the copper foil circuit gap of the inner layer circuit board, and U
It is tack-free by irradiation with active energy rays by an exposure device such as a V irradiation conveyor. After that, the undercoat agent can be remelted by laminating with a hard roll heated when the copper foil with a thermosetting insulating adhesive is adhered to obtain surface smoothness. At this time, if the thermosetting insulating adhesive coated on the copper foil is mixed with an epoxy resin component having a weight average molecular weight of 10,000 or more, the adhesive is adhered while maintaining the shape by this component, that is, maintaining the interlayer thickness. Therefore, a multilayer printed wiring board having excellent board thickness accuracy can be produced without depending on the inner layer copper foil remaining rate. Then, the laminate is heated to cause simultaneous curing reaction to integrally mold the optical / thermosetting undercoat material for a multilayer printed wiring board and the thermosetting copper foil with an insulating adhesive.
【0009】本発明において、アンダーコート剤は内層
回路板の銅箔回路間隙を充填し、内層回路表面を平滑化
するもので、下記の成分(イ)、(ロ)、(ハ)及び
(ニ)からなることを特徴とするものである。 (イ)常温で固形状態にあるエポキシ樹脂、(ロ)エポ
キシ樹脂硬化剤、(ハ)光重合性及び熱反応性モノマー
からなる希釈剤、(ニ)光重合開始剤。In the present invention, the undercoat agent fills the copper foil circuit gap of the inner layer circuit board and smoothes the inner layer circuit surface. The following components (a), (b), (c) and (d) ) Consists of. (A) Epoxy resin in a solid state at room temperature, (b) epoxy resin curing agent, (c) diluent composed of photopolymerizable and heat-reactive monomer, and (d) photopolymerization initiator.
【0010】本発明に用いられる(イ)の常温で固形状
態のエポキシ樹脂は、ビスフェノール型エポキシ樹脂、
ノボラック型エポキシ樹脂、または、これらの混合物で
あり、常温で固形状のものである。融点は、通常、50
〜100℃の範囲にあれば良い。ビスフェノール型エポ
キシ樹脂としては、ビスフェノールA型またはビスフェ
ノールF型等が使用される。ノボラック型エポキシ樹脂
としては、フェノールノボラック型やクレゾールノボラ
ック型等が使用され、特にクレゾールノボラック型のも
のの使用が好ましい。The epoxy resin (a) used in the present invention in a solid state at room temperature is a bisphenol type epoxy resin,
It is a novolac type epoxy resin or a mixture thereof, which is solid at room temperature. The melting point is usually 50
It may be in the range of -100 ° C. As the bisphenol type epoxy resin, bisphenol A type or bisphenol F type is used. As the novolac type epoxy resin, a phenol novolac type, a cresol novolac type or the like is used, and a cresol novolac type is particularly preferable.
【0011】(ロ)エポキシ樹脂硬化剤としては、一般
に用いられる各種硬化剤が使用できる。例えば、4,
4’−ジアミノフェニルメタン、4,4’−ジアミノジ
フェニルスルホン、m−フェニレンジアミン、p−フェ
ニレンジアミン等の芳香族ジアミン、ジエチレントリア
ミン、トリエチレンテトラミン、テトラエチレンペンタ
ミン、ヘキサメチレントリアミン、メンセンジアミン、
イソホロンジアミン等の脂肪族ポリアミン、イミダゾー
ル、2−エチル−4−メチルイミダゾール、2−フェニ
ルイミダゾール、1−ベンジル−2−メチルイミダゾー
ル、2−ウンデシルイミダゾール等のイミダゾール類、
無水フタル酸、無水テトラヒドロフタル酸、無水ヘキサ
ヒドロフタル酸、無水トリメリット酸、無水ピロメリッ
ト酸、無水ベンゾフェノンテトラカルボン酸等の酸無水
物、三フッ化ホウ素のアミン錯体、ジシアンジアミド又
はその誘導体などが挙げられ、これらをエポキシアダク
ト化したものやマイクロカプセル化したものも使用でき
る。As the (b) epoxy resin curing agent, various commonly used curing agents can be used. For example, 4,
Aromatic diamines such as 4'-diaminophenylmethane, 4,4'-diaminodiphenylsulfone, m-phenylenediamine, p-phenylenediamine, diethylenetriamine, triethylenetetramine, tetraethylenepentamine, hexamethylenetriamine, mensendiamine,
Aliphatic polyamines such as isophoronediamine, imidazoles such as imidazole, 2-ethyl-4-methylimidazole, 2-phenylimidazole, 1-benzyl-2-methylimidazole, 2-undecylimidazole,
Acid anhydrides such as phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, trimellitic anhydride, pyromellitic anhydride, benzophenonetetracarboxylic acid anhydride, amine complexes of boron trifluoride, dicyandiamide or its derivatives Examples thereof include epoxy adducts and microencapsulated products thereof.
【0012】本発明においては、必要に応じてエポキシ
樹脂の硬化促進剤を添加しても良い。硬化促進剤として
は、一般に用いられる各種硬化促進剤が使用でき、例え
ば、トリブチルアミン、ベンジルメチルアミン、2,
4,6−トリス(ジメチルアミノメチル)フェノール等
の第三級アミン類、2−エチル−4−メチルイミダゾー
ル、N−ベンジルイミダゾール等のイミダゾール類、尿
素類、ホスフィン類、金属塩類等が挙げられ、これらは
単独で使用しても2種以上を併用しても良い。エポキシ
樹脂硬化剤量としては、硬化剤の種類によって異なる
が、通常グリシジル基に対して0.1〜1.0当量であ
る。In the present invention, a curing accelerator for the epoxy resin may be added if necessary. As the curing accelerator, various commonly used curing accelerators can be used, for example, tributylamine, benzylmethylamine, 2,
Tertiary amines such as 4,6-tris (dimethylaminomethyl) phenol, imidazoles such as 2-ethyl-4-methylimidazole, N-benzylimidazole, ureas, phosphines, metal salts and the like, These may be used alone or in combination of two or more. The amount of the epoxy resin curing agent varies depending on the type of the curing agent, but is usually 0.1 to 1.0 equivalent with respect to the glycidyl group.
【0013】(ハ)光重合及び熱反応性モノマーからな
る希釈剤としては、1分子中に少なくとも1個の水酸基
を有するアクリレート又はメタクリレート化合物、例え
ば、ヒドロキシエチルアクリレート、ヒドロキシエチル
メタクリレート、ヒドロキシプロピルアクリレート、ヒ
ドロキシプロピルメタクリレート、ヒドロキシブチルア
クリレート、ヒドロキシブチルメタクリレート、ブタン
ジオールモノアクリレートグリセロールメタクリレー
ト、フェノキシヒドロキシプロピルアクリレート、ポリ
エチレングリコールアクリレート、ポリエチレングリコ
ールメタクリレート、又はグリセロールジメタクリレー
ト等である。または、1分子中に1個以上のグリシジル
基を有するグリシジルアクリレート、グリシジルメタク
リレート等の光重合性モノマーが用いられる。好ましい
モノマーとしては、活性エネルギー線照射による固形タ
ックフリー化後、熱硬化可能なグリシジルアクリレー
ト、グリシジルメタクリレートである。通常、(ハ)成
分である希釈剤の量としては、(イ)成分のエポキシ樹
脂100重量部に対し、20〜100重量部、好ましく
は30〜70重量部の割合である。(C) As a diluent comprising a photopolymerizable and heat-reactive monomer, an acrylate or methacrylate compound having at least one hydroxyl group in one molecule, for example, hydroxyethyl acrylate, hydroxyethyl methacrylate, hydroxypropyl acrylate, Hydroxypropyl methacrylate, hydroxybutyl acrylate, hydroxybutyl methacrylate, butanediol monoacrylate glycerol methacrylate, phenoxyhydroxypropyl acrylate, polyethylene glycol acrylate, polyethylene glycol methacrylate, or glycerol dimethacrylate. Alternatively, a photopolymerizable monomer such as glycidyl acrylate or glycidyl methacrylate having one or more glycidyl groups in one molecule is used. Preferable monomers are glycidyl acrylate and glycidyl methacrylate, which are heat-curable after solid tack-free by irradiation with active energy rays. Usually, the amount of the diluent as the component (c) is 20 to 100 parts by weight, preferably 30 to 70 parts by weight, relative to 100 parts by weight of the epoxy resin as the component (a).
【0014】(ニ)光重合開始剤としては、ベンゾフェ
ノン、ベンゾイル安息香酸、4−フェニルベンゾフェノ
ン、ヒドロキシベンゾフェノンなどのベンゾフェノン
類、ベンゾイン、ベンゾインエチルエーテル、ベンゾイ
ンイソプロピルエーテル、ベンゾインブチルエーテル、
ベンゾインイソブチルエーテルなどのベンゾインアルキ
ルエーテル類、4―フェノキシジクロロアセトフェノ
ン、4−t−ブチル−ジクロロアセトフェノン、4−t
−ブチル−トリクロロアセトフェノン、ジエトキシアセ
トフェノンなどのアセトフェノン類、チオキサンソン、
2-クロルチオキサンソン、2−メチルチオキサンソン、
2,4−ジメチルチオキサンソンなどのチオキサンソン
類、エチルアントラキノン、ブチルアントラキノンなど
のアルキルアントラキノン類などを挙げることができ
る。これらは単独、あるいは2種以上の混合物として用
いられる。この光重合開始剤の添加量は、通常 0.1〜
10重量%の範囲で用いられる。(D) Examples of the photopolymerization initiator include benzophenone, benzoylbenzoic acid, 4-phenylbenzophenone, benzophenones such as hydroxybenzophenone, benzoin, benzoin ethyl ether, benzoin isopropyl ether, benzoin butyl ether,
Benzoin alkyl ethers such as benzoin isobutyl ether, 4-phenoxydichloroacetophenone, 4-t-butyl-dichloroacetophenone, 4-t
-Butyl-trichloroacetophenone, acetophenones such as diethoxyacetophenone, thioxanthone,
2-chlorothioxanthone, 2-methylthioxanthone,
Examples thereof include thioxanthones such as 2,4-dimethylthioxanthone and alkylanthraquinones such as ethylanthraquinone and butylanthraquinone. These may be used alone or as a mixture of two or more kinds. The addition amount of this photopolymerization initiator is usually 0.1 to
Used in the range of 10% by weight.
【0015】その他、本発明の多層プリント配線板用光
・熱硬化型アンダーコート材には必要に応じて、保存安
定性のために紫外線防止剤、熱重合防止剤、可塑剤など
が添加できる。また、粘度調整のためにアクリレートモ
ノマー、メタクリレートモノマー、ビニルモノマーなど
を添加してもよい。更には、溶融シリカ、結晶性シリ
カ、炭酸カルシウム、水酸化アルミニウム、アルミナ、
マイカ、タルク、ホワイトカーボン、Eガラス粉末など
の無機充填材を配合することができ、銅箔や内層回路板
との密着性や耐湿性を向上させるためのエポキシシラン
カップリング剤、ボイドを防止するための消泡剤、ある
いは液状又は粉末の難燃剤等を添加することもできる。In addition, for the storage stability, an ultraviolet ray inhibitor, a thermal polymerization inhibitor, a plasticizer, etc. may be added to the light / thermosetting type undercoat material for a multilayer printed wiring board of the present invention, if necessary. Further, an acrylate monomer, a methacrylate monomer, a vinyl monomer or the like may be added to adjust the viscosity. Furthermore, fused silica, crystalline silica, calcium carbonate, aluminum hydroxide, alumina,
Inorganic fillers such as mica, talc, white carbon, and E glass powder can be added to prevent epoxy silane coupling agents and voids for improving adhesion and moisture resistance to copper foil and inner circuit boards. An antifoaming agent, a liquid or powder flame retardant, or the like may be added.
【0016】これらの成分からなる本発明の多層プリン
ト配線板用光・熱硬化型アンダーコート材は、実質的に
無溶剤系であり、内層回路板の銅箔回路間隙を充填し、
内層回路表面を平滑化する。また、活性エネルギー線照
射により簡単に固形タックフリー化できる。特に、従来
法では熱により乾燥・タックフリー化を行なう工程が、
本発明では活性エネルギー線の照射のみで可能であるこ
とについては、成分(イ)の常温で固形状態にあるエポ
キシ樹脂と成分(ハ)の光重合及び熱反応性モノマーか
らなる希釈剤とを用いることによるものである。The optical / thermosetting undercoat material for a multilayer printed wiring board of the present invention comprising these components is substantially solvent-free and fills the copper foil circuit gap of the inner layer circuit board,
Smooth the inner layer circuit surface. Further, solid tack-free can be easily achieved by irradiation with active energy rays. Especially, in the conventional method, the process of drying and tack-free by heat is
In the present invention, as to what is possible only by irradiation with active energy rays, the epoxy resin of component (a) in a solid state at room temperature and the diluent of photopolymerization and thermoreactive monomer of component (c) are used. This is due to the fact.
【0017】調製された本発明アンダーコート材中の成
分(ハ)は、まず溶剤として作用し、成分(イ)及びそ
の他の成分を溶解して内層回路板の銅箔回路間隙を充填
し、内層回路表面を平滑化するためにワニス状態として
いる。これに、活性エネルギー線を照射して溶剤として
作用している成分(ハ)を高分子化すると、成分(ハ)
は固形化に伴い溶剤としての効果を失うため成分(イ)
が析出する。このとき、高分子化した成分(ハ)及びそ
の他の成分は固形成分(イ)中に分散される。従って、
常温で適度なタックフリー固形状態にある成分(イ)が
選択されれば、本発明のアンダーコート材は、熱硬化反
応することなくタックフリー化される。このようなタッ
クフリー化機構が本発明の最大の特徴である。また、活
性エネルギー線を照射することにより高分子化した本発
明の成分(ハ)は熱反応性の官能基も有するため、後の
熱硬化反応時に主剤のエポキシ樹脂または硬化剤と一体
化反応するので、その硬化物は、耐熱性、耐薬品性等に
も優れる。The component (c) in the prepared undercoat material of the present invention acts as a solvent to dissolve the component (a) and other components to fill the copper foil circuit gap of the inner layer circuit board, A varnish is used to smooth the circuit surface. When the component (c) acting as a solvent is polymerized by irradiating this with active energy rays, the component (c) becomes
Is a component (a) because it loses its effect as a solvent as it solidifies.
Is deposited. At this time, the polymerized component (C) and other components are dispersed in the solid component (A). Therefore,
If the component (a) that is in a suitable tack-free solid state at room temperature is selected, the undercoat material of the present invention is tack-free without undergoing a thermosetting reaction. Such a tack free mechanism is the greatest feature of the present invention. In addition, since the component (c) of the present invention polymerized by irradiation with active energy rays also has a thermoreactive functional group, it reacts integrally with the main epoxy resin or curing agent during the subsequent thermosetting reaction. Therefore, the cured product is also excellent in heat resistance, chemical resistance and the like.
【0018】次に、銅箔にコートする熱硬化型絶縁性接
着剤について説明する。一般に層間絶縁層である接着剤
のフィルム化や巻物化の手法としてはゴム系化合物やポ
リビニルブチラール、フェノキシ樹脂、ポリエステル樹
脂などを配合しているが、これらの成分は多層プリント
配線板としての熱的性能を著しく低下させる。このた
め、本発明に用いる接着剤は前記アンダーコート剤との
一体化硬化させる際に流動性を小さく抑えて層間厚みを
保ち、且つフィルム成形性を持たせるために重量平均分
子量10000以上のビスフェノールA型エポキシ樹脂
又はビスフェノールF型エポキシ樹脂を配合している。
かかるエポキシ樹脂の配合割合は全エポキシ樹脂中30
〜90重量%、好ましくは50〜90重量%である。硬
化剤としては前述のアンダーコート剤に用いたものを使
用することができる。Next, the thermosetting insulating adhesive coating the copper foil will be described. Generally, rubber compounds, polyvinyl butyral, phenoxy resin, polyester resin, etc. are compounded as a method for forming an adhesive film, which is an interlayer insulating layer, into a film or a roll, but these components are thermally mixed as a multilayer printed wiring board. Significantly reduces performance. Therefore, the adhesive used in the present invention is a bisphenol A having a weight average molecular weight of 10000 or more in order to keep the fluidity small to maintain the interlayer thickness and to have film formability when integrally curing with the undercoat agent. Type epoxy resin or bisphenol F type epoxy resin is compounded.
The compounding ratio of such epoxy resin is 30 in all epoxy resins.
˜90 wt%, preferably 50-90 wt%. As the curing agent, the one used for the undercoat agent described above can be used.
【0019】本発明の目的を達成するための、内層回路
板へアンダーコート剤を塗工し、熱硬化型絶縁性接着剤
付き銅箔をラミネートし、一体的に硬化して多層プリン
ト配線板を製造する方法についての概要を図1を用いて
説明する。 (A):内層回路板(1)上に液状のアンダーコート剤
(3)をスクリーン印刷、ローラーコーター、カーテン
コーター等の従来のコーティング設備を使用して内層回
路(2)を完全に覆う厚さまで塗工する。埋め込み量が
不十分であると、この後のラミネートで空気を巻き込む
ことになる。その後、UV照射コンベア等の露光機で活
性エネルギー線を照射することによりタックフリー化す
る。 (B):表面に熱硬化型絶縁性接着剤(4)付き銅箔
(5)をラミネートする。ラミネーターは表面平滑性を
達成するために硬質ロール(6)を使用するのがよい。
ラミネート条件として内層回路のパターンによって異な
るが、圧力は 0.5〜6kgf/cm2 程度、表面温度
は常温から100℃程度、ラミネートスピードは0.1
〜6m/分程度で行う。このような条件ではアンダーコ
ート剤の粘度は1〜300ポイズとなり、硬質ロールを
用いることで表面平滑性を達成することができる。この
とき内層回路(2)と銅箔(5)との層間厚は熱硬化型
絶縁性接着剤の厚みで達成することができる。 (C):次いで、加熱して同時一体硬化反応を行うことに
よりアンダーコート剤(3)と銅箔にコートされた熱硬
化型絶縁接着剤(4)とを一体成形した多層プリント配
線板を形成することができる。In order to achieve the object of the present invention, an undercoating agent is applied to an inner layer circuit board, a copper foil with a thermosetting insulating adhesive is laminated, and integrally cured to form a multilayer printed wiring board. The outline of the manufacturing method will be described with reference to FIG. (A): A liquid undercoat agent (3) is applied on the inner layer circuit board (1) to a thickness to completely cover the inner layer circuit (2) by using conventional coating equipment such as screen printing, roller coater and curtain coater. To apply. If the filling amount is insufficient, air will be trapped in the subsequent laminate. After that, it is tack-free by irradiating the active energy ray with an exposure device such as a UV irradiation conveyor. (B): A copper foil (5) with a thermosetting insulating adhesive (4) is laminated on the surface. The laminator preferably uses hard rolls (6) to achieve surface smoothness.
The laminating condition varies depending on the pattern of the inner layer circuit, but the pressure is about 0.5 to 6 kgf / cm 2 , the surface temperature is from room temperature to about 100 ° C., and the laminating speed is 0.1.
~ 6 m / min. Under these conditions, the viscosity of the undercoating agent is 1 to 300 poise, and the surface smoothness can be achieved by using a hard roll. At this time, the interlayer thickness between the inner layer circuit (2) and the copper foil (5) can be achieved by the thickness of the thermosetting insulating adhesive. (C): Then, the undercoating agent (3) and the thermosetting insulating adhesive (4) coated on the copper foil are integrally molded to form a multilayer printed wiring board by heating and simultaneously performing a simultaneous curing reaction. can do.
【0020】[0020]
【実施例】以下、実施例により本発明を説明する。
「部」は重量部を表す。The present invention will be described below with reference to examples.
"Parts" represent parts by weight.
【0021】《実施例1》ビスフェノールA型エポキシ
樹脂(エポキシ当量6400、重量平均分子量3000
0)150部とビスフェノールF型エポキシ樹脂(エポ
キシ当量175、大日本インキ化学工業(株)製エピクロ
ン830)30部をMEKに撹拌しながら溶解し、そこ
へ硬化剤としてマイクロカプセル化した2−イミダゾー
ル120部とシランカップリング剤(日本ユニカー(株)
製 A-187)10部を添加して熱硬化型絶縁性接着剤
ワニスを作製した。このワニスを厚さ18μmの銅箔の
アンカー面に乾燥後の厚さが40μmとなるようにロー
ラーコーターにて塗布、乾燥し熱硬化型絶縁性接着剤付
き銅箔を作製した。Example 1 Bisphenol A type epoxy resin (epoxy equivalent 6400, weight average molecular weight 3000)
0) 150 parts and 30 parts of bisphenol F type epoxy resin (epoxy equivalent 175, Epicron 830 manufactured by Dainippon Ink and Chemicals, Inc.) were dissolved in MEK while stirring, and 2-imidazole which was microencapsulated as a curing agent was dissolved therein. 120 parts and silane coupling agent (Nippon Unicar Co., Ltd.)
A-187) (10 parts) was added to prepare a thermosetting insulating adhesive varnish. This varnish was applied to the anchor surface of a copper foil having a thickness of 18 μm by a roller coater so that the thickness after drying was 40 μm, and dried to produce a copper foil with a thermosetting insulating adhesive.
【0022】次に、ビスフェノールA型エポキシ樹脂
(エポキシ当量約470、重量平均分子量約900)1
00部をメタクリル酸グリシジル40部に溶解し、そこ
へ硬化剤としてジシアンジアミド5部、2−エチル−4
−メチルイミダゾール0.15部と光重合開始剤(チバ
ガイギー製イルガキュア651)1.2部を添加し、ホ
モミキサーにて十分撹拌してアンダーコート剤とした。Next, a bisphenol A type epoxy resin (epoxy equivalent of about 470, weight average molecular weight of about 900) 1
Dissolve 00 parts in 40 parts of glycidyl methacrylate and add 5 parts of dicyandiamide and 2-ethyl-4 as a curing agent therein.
-Methylimidazole (0.15 parts) and a photopolymerization initiator (Ciba-Geigy Irgacure 651) (1.2 parts) were added, and the mixture was sufficiently stirred with a homomixer to give an undercoating agent.
【0023】更に、基材厚 0.1mm、銅箔厚35μm
のガラスエポキシ両面銅張積層板をパターン加工して内
層回路板を得た。銅箔表面を黒化処理した後、上記アン
ダーコート剤をカーテンコーターにより厚さ約40μm
に塗工した。その後、UVコンベア機にて80W/cm
高圧水銀灯2本で約2J/cm2 の条件で紫外線照射
し、活性エネルギー線照射によりタックフリー化したア
ンダーコート剤上に温度100℃、圧力2kg/cm
2 、ラミネートスピード 0.8m/分の条件により、硬
質ロールを用いて上記熱硬化型絶縁性接着剤付き銅箔を
ラミネートし、180℃、20分間加熱硬化させ多層プ
リント配線板を作製した。Further, the substrate thickness is 0.1 mm and the copper foil thickness is 35 μm.
The glass-epoxy double-sided copper-clad laminate was processed by patterning to obtain an inner layer circuit board. After blackening the copper foil surface, the above undercoat agent is applied to a curtain coater to a thickness of about 40 μm.
Applied to. After that, 80 W / cm on UV conveyor machine
Ultraviolet irradiation with two high-pressure mercury lamps under conditions of about 2 J / cm 2 , and tack-free undercoating agent by activation energy ray irradiation, temperature 100 ° C, pressure 2 kg / cm
2. Lamination speed: The above-mentioned thermosetting type copper foil with insulating adhesive was laminated using a hard roll under the conditions of 0.8 m / min, and heat-cured at 180 ° C. for 20 minutes to prepare a multilayer printed wiring board.
【0024】《実施例2》内層回路板の回路銅厚が70
μm、アンダーコート剤の厚さが80μmとすること以
外は実施例1と全く同様にして多層プリント配線板を作
製した。<Embodiment 2> The circuit copper thickness of the inner layer circuit board is 70.
A multilayer printed wiring board was produced in exactly the same manner as in Example 1 except that the thickness of the undercoating agent was 80 μm.
【0025】《比較例1》内層回路板の上に塗布し、1
80℃、60分間加熱して完全硬化させる以外は実施例
1と全く同様にして多層プリント配線板を作製した。<< Comparative Example 1 >> Coating on an inner layer circuit board
A multilayer printed wiring board was produced in exactly the same manner as in Example 1 except that it was heated at 80 ° C. for 60 minutes to completely cure it.
【0026】《比較例2》アンダーコート剤を塗工しな
い以外は実施例1と同様にして多層プリント配線板を作
製した。Comparative Example 2 A multilayer printed wiring board was prepared in the same manner as in Example 1 except that the undercoating agent was not applied.
【0027】得られた多層プリント配線板は次表に示す
ような特性を有している。 ──────────────────────────────── 表面平滑性 吸湿半田耐熱性 埋込み性 層間絶縁層厚 ──────────────────────────────── 実施例1 3μm ○ ○ 35μm 実施例2 3 ○ ○ 35 比較例1 15 ○ ○ 40 比較例2 5 × × 30 ────────────────────────────────The resulting multilayer printed wiring board has the characteristics shown in the following table. ──────────────────────────────── Surface smoothness Moisture absorption Solder heat resistance Implantability Interlayer insulation layer thickness ───── ─────────────────────────── Example 1 3 μm ○○ 35 μm Example 2 3 ○○ 35 Comparative Example 1 15 ○○ 40 Comparative Example 25 × × 30 ─────────────────────────────────
【0028】(試験方法) 内層回路板試験片:線間150μmピッチ、クリアラン
スホール 1.0mmφ 1.表面平滑性:JIS B 0601 R(max) 2.吸湿半田耐熱試験 吸湿条件:プレッシャークッカー処理、125℃、2.
3気圧、30分間 試験条件:n=5で、全てが280℃、120秒間で膨
れが無かったものを○とした 3.埋込み性:外層銅箔を剥離後、内層回路への埋め込
み性を光学顕微鏡を用い目視によって判断し、埋め込ま
れているものを○とした。 4.層間絶縁層厚:多層プリント配線板を切断し、その
断面を光学顕微鏡で観察し、内層回路と表面銅箔との層
間絶縁層厚さを測定した。(Test method) Inner layer circuit board test piece: 150 μm pitch between lines, clearance hole 1.0 mmφ 1. Surface smoothness: JIS B 0601 R (max) 2. Moisture absorption solder heat resistance test Moisture absorption conditions: Pressure cooker treatment, 125 ° C, 2.
3. Atmospheric pressure, 30 minutes Test condition: n = 5, all of which did not swell at 280 ° C. for 120 seconds were evaluated as ◯. Embedding property: After the outer layer copper foil was peeled off, the embedding property in the inner layer circuit was visually judged using an optical microscope, and the embedding property was marked as ◯. 4. Interlayer insulating layer thickness: The multilayer printed wiring board was cut, the cross section was observed with an optical microscope, and the interlayer insulating layer thickness between the inner layer circuit and the surface copper foil was measured.
【0029】[0029]
【発明の効果】本発明の方法に従うと、熱硬化型絶縁接
着剤付き銅箔を硬質ロール等でラミネートすることによ
り、内層回路板に塗工後光照射によりタックフリー化し
たアンダーコート剤が再溶融して表面が平滑化し、銅箔
にコートされた熱硬化型絶縁接着剤が厚さを維持してい
るため、内層銅箔残存率に依存することなく板厚制御に
優れた多層プリント配線板を作製することができる。更
に、ラミネート後加熱して同時一体硬化反応を行うこと
によりアンダーコート剤と銅箔にコートされた熱硬化型
絶縁接着剤とを一体成形することができる。また、従来
のようにプリプレグと熱板プレスを用いず、またアディ
ティブ法のようにメッキを施すこともなく、ラミネート
法により外層銅箔を有した多層プリント配線板を製造す
ることができるため、絶縁層形成及び外層導電層形成に
要する時間は非常に短縮化され、工程の単純化や低コス
ト化に貢献できる。更にガラスクロスを用いないため層
間絶縁層を極薄にすることが可能である。According to the method of the present invention, by laminating a copper foil with a thermosetting insulating adhesive on a hard roll or the like, an undercoat agent which is tack-free by being irradiated with light after being applied to an inner layer circuit board is regenerated. The surface is smoothed by melting and the thermosetting insulation adhesive coated on the copper foil maintains its thickness, so it is a multilayer printed wiring board with excellent board thickness control without depending on the residual rate of the inner copper foil. Can be produced. Furthermore, the undercoating agent and the thermosetting insulating adhesive coated on the copper foil can be integrally molded by heating after laminating and simultaneously performing an integral curing reaction. In addition, since it is possible to manufacture a multilayer printed wiring board having an outer copper foil by a laminating method without using a prepreg and a hot plate press as in the past and without plating as in an additive method, insulation can be obtained. The time required for layer formation and outer conductive layer formation is greatly shortened, which can contribute to simplification of the process and cost reduction. Furthermore, since no glass cloth is used, the interlayer insulating layer can be made extremely thin.
【図1】本発明の多層プリント配線板(一例)を作製す
る工程を示す概略断面図FIG. 1 is a schematic cross-sectional view showing a process for producing a multilayer printed wiring board (one example) of the present invention.
1 内層回路板 2 内層回路 3 アンダーコート剤 4 熱硬化型絶縁性接着剤 5 銅箔 6 硬質ロール 7 多層プリント配線板 1 Inner Layer Circuit Board 2 Inner Layer Circuit 3 Undercoat Agent 4 Thermosetting Insulating Adhesive 5 Copper Foil 6 Hard Roll 7 Multilayer Printed Wiring Board
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 H05K 3/46 T 6921−4E ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 6 Identification code Office reference number FI technical display location H05K 3/46 T 6921-4E
Claims (10)
(ニ)からなることを特徴とする光・熱硬化型アンダー
コート材。 (イ)常温で固形状態にあるエポキシ樹脂、(ロ)エポ
キシ樹脂硬化剤、(ハ)光重合及び熱反応性モノマーか
らなる希釈剤、(ニ)光重合開始剤。1. A light / thermosetting undercoat material comprising the following components (a), (b), (c) and (d): (A) Epoxy resin in a solid state at room temperature, (b) epoxy resin curing agent, (c) diluent composed of photopolymerization and heat-reactive monomer, and (d) photopolymerization initiator.
固形状態にあるエポキシ樹脂である請求項1記載の光・
熱硬化型アンダーコート材。2. The light according to claim 1, wherein the component (a) is an epoxy resin having a molecular weight of 500 or more and which is in a solid state at room temperature.
Thermosetting undercoat material.
リロイル基又はメタクリロイル基、及び1個以上のグリ
シジル基を有する光重合及び熱反応性モノマーからなる
希釈剤である請求項1記載の光・熱硬化型アンダーコー
ト材。3. A diluent comprising a photopolymerizable and thermoreactive monomer having at least one acryloyl group or methacryloyl group and at least one glycidyl group in one molecule as the component (c). Light / thermosetting undercoat material.
ある請求項1記載の光・熱硬化型アンダーコート材。4. The photo / thermosetting undercoat material according to claim 1, wherein the component (c) is glycidyl methacrylate.
固形状態にあるエポキシ樹脂であり、成分(ハ)が1分
子中に1個以上のアクリロイル基又はメタクリロイル
基、及び1個以上のグリシジル基を有する光重合及び熱
反応性モノマーからなる希釈剤である請求項1記載の光
・熱硬化型アンダーコート材。5. The component (a) is an epoxy resin having a molecular weight of 500 or more and which is in a solid state at room temperature, and the component (c) is one or more acryloyl group or methacryloyl group in one molecule, and one or more glycidyl. The photo- and thermosetting undercoat material according to claim 1, which is a diluent comprising a photopolymerizable and thermoreactive monomer having a group.
固形状態にあるエポキシ樹脂であり、成分(ハ)がメタ
クリル酸グリシジルである請求項1記載の光・熱硬化型
アンダーコート材。6. The light / thermosetting undercoat material according to claim 1, wherein the component (a) is an epoxy resin having a molecular weight of 500 or more and which is in a solid state at room temperature, and the component (c) is glycidyl methacrylate.
ト配線板用光・熱硬化型アンダーコート材を塗工し、活
性エネルギー線照射によりタックフリー化させた後、熱
硬化型絶縁性接着剤層を有する銅箔をラミネートし、次
いで、加熱により一体硬化させることを特徴とする多層
プリント配線板の製造方法。7. An inner layer circuit board is coated with the light / thermosetting undercoat material for a multilayer printed wiring board according to claim 1 to be tack-free by irradiation with active energy rays, and then thermosetting insulating adhesive. A method for manufacturing a multilayer printed wiring board, comprising laminating a copper foil having an agent layer, and then integrally curing the copper foil by heating.
ト配線板用光・熱硬化型アンダーコート材を塗工し、活
性エネルギー線照射によりタックフリー化させた後、熱
硬化型絶縁性接着剤層を有する銅箔をラミネートし、次
いで、加熱により一体硬化させることを特徴とする多層
プリント配線板の製造方法。8. An inner-layer circuit board is coated with the light / thermosetting undercoat material for a multilayer printed wiring board according to claim 5, and is tack-free by irradiation with active energy rays, and then thermosetting insulating adhesive. A method for manufacturing a multilayer printed wiring board, comprising laminating a copper foil having an agent layer, and then integrally curing the copper foil by heating.
脂及びその硬化剤からなり、エポキシ樹脂の一成分が重
量平均分子量10000以上のビスフェノールA型エポ
キシ樹脂又はビスフェノールF型エポキシ樹脂からなる
請求項7記載の多層プリント配線板の製造方法。9. The thermosetting insulating adhesive comprises an epoxy resin and its curing agent, and one component of the epoxy resin comprises a bisphenol A type epoxy resin or a bisphenol F type epoxy resin having a weight average molecular weight of 10,000 or more. 7. The method for manufacturing a multilayer printed wiring board according to 7.
樹脂及びその硬化剤からなり、エポキシ樹脂の一成分が
重量平均分子量10000以上のビスフェノールA型エ
ポキシ樹脂又はビスフェノールF型エポキシ樹脂からな
る請求項8記載の多層プリント配線板の製造方法。10. The thermosetting insulating adhesive comprises an epoxy resin and its curing agent, and one component of the epoxy resin comprises a bisphenol A type epoxy resin or a bisphenol F type epoxy resin having a weight average molecular weight of 10,000 or more. 8. The method for manufacturing a multilayer printed wiring board according to item 8.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP30404494A JP2908258B2 (en) | 1994-12-07 | 1994-12-07 | Light / thermosetting undercoat material and method for manufacturing multilayer printed wiring board |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP30404494A JP2908258B2 (en) | 1994-12-07 | 1994-12-07 | Light / thermosetting undercoat material and method for manufacturing multilayer printed wiring board |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH08157566A true JPH08157566A (en) | 1996-06-18 |
JP2908258B2 JP2908258B2 (en) | 1999-06-21 |
Family
ID=17928379
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP30404494A Expired - Lifetime JP2908258B2 (en) | 1994-12-07 | 1994-12-07 | Light / thermosetting undercoat material and method for manufacturing multilayer printed wiring board |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2908258B2 (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1997016948A1 (en) * | 1995-10-31 | 1997-05-09 | Sumitomo Bakelite Company Limited | Multilayer printed circuit board and process for producing the same |
EP0851726A3 (en) * | 1996-12-26 | 1999-07-07 | Ajinomoto Co., Inc. | Inter-laminar adhesive film for multi-layer printed wiring board and multi-layer printed wiring board using the same |
US6483195B1 (en) * | 1999-03-16 | 2002-11-19 | Sumitomo Bakelite Company Limited | Transfer bump street, semiconductor flip chip and method of producing same |
GB2376917A (en) * | 2001-06-30 | 2002-12-31 | Ford Global Tech Inc | Bonding metal to non-metal using two layer adhesive |
JP2003105061A (en) * | 2001-09-27 | 2003-04-09 | Sanei Kagaku Kk | Photo-thermally curable resin composition, production method for hole-filled printed circuit board, and hole- filled printed circuit board |
-
1994
- 1994-12-07 JP JP30404494A patent/JP2908258B2/en not_active Expired - Lifetime
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1997016948A1 (en) * | 1995-10-31 | 1997-05-09 | Sumitomo Bakelite Company Limited | Multilayer printed circuit board and process for producing the same |
EP0851726A3 (en) * | 1996-12-26 | 1999-07-07 | Ajinomoto Co., Inc. | Inter-laminar adhesive film for multi-layer printed wiring board and multi-layer printed wiring board using the same |
US6881293B2 (en) * | 1996-12-26 | 2005-04-19 | Ajinomoto Co., Inc. | Process for producing a multi-layer printer wiring board |
US6483195B1 (en) * | 1999-03-16 | 2002-11-19 | Sumitomo Bakelite Company Limited | Transfer bump street, semiconductor flip chip and method of producing same |
GB2376917A (en) * | 2001-06-30 | 2002-12-31 | Ford Global Tech Inc | Bonding metal to non-metal using two layer adhesive |
GB2376917B (en) * | 2001-06-30 | 2005-04-06 | Ford Global Tech Inc | Bonding joint faces |
JP2003105061A (en) * | 2001-09-27 | 2003-04-09 | Sanei Kagaku Kk | Photo-thermally curable resin composition, production method for hole-filled printed circuit board, and hole- filled printed circuit board |
EP1553450A1 (en) | 2001-09-27 | 2005-07-13 | San-Ei Kagaku Co. Ltd. | Process for preparing plugged-through-hole printed wiring board and plugged-through-hole printed wiring board |
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JP2908258B2 (en) | 1999-06-21 |
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