JPH08153747A - Semiconductor chip and semiconductor device using the chip - Google Patents
Semiconductor chip and semiconductor device using the chipInfo
- Publication number
- JPH08153747A JPH08153747A JP29523494A JP29523494A JPH08153747A JP H08153747 A JPH08153747 A JP H08153747A JP 29523494 A JP29523494 A JP 29523494A JP 29523494 A JP29523494 A JP 29523494A JP H08153747 A JPH08153747 A JP H08153747A
- Authority
- JP
- Japan
- Prior art keywords
- chip
- pad
- semiconductor chip
- substrate
- connection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 74
- 239000011347 resin Substances 0.000 claims abstract description 23
- 229920005989 resin Polymers 0.000 claims abstract description 23
- 230000003014 reinforcing effect Effects 0.000 claims description 23
- 230000015572 biosynthetic process Effects 0.000 claims description 20
- 230000002093 peripheral effect Effects 0.000 claims description 7
- 239000000758 substrate Substances 0.000 abstract description 57
- 230000000593 degrading effect Effects 0.000 abstract 1
- 230000035882 stress Effects 0.000 description 7
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 4
- 239000010931 gold Substances 0.000 description 4
- 229910052737 gold Inorganic materials 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 3
- 230000001771 impaired effect Effects 0.000 description 3
- 238000007789 sealing Methods 0.000 description 3
- 229910052709 silver Inorganic materials 0.000 description 3
- 239000004332 silver Substances 0.000 description 3
- 230000008646 thermal stress Effects 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 201000001880 Sexual dysfunction Diseases 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
- H01L2224/161—Disposition
- H01L2224/16151—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/16221—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/16225—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32225—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73201—Location after the connecting process on the same surface
- H01L2224/73203—Bump and layer connectors
- H01L2224/73204—Bump and layer connectors the bump connector being embedded into the layer connector
Landscapes
- Semiconductor Integrated Circuits (AREA)
- Wire Bonding (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、半導体チップおよびそ
れを用いた半導体装置に係り、特に片面樹脂封止型パッ
ケージ構造を有する半導体装置およびそれに使用される
半導体チップに関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor chip and a semiconductor device using the same, and more particularly to a semiconductor device having a single-sided resin-sealed package structure and a semiconductor chip used therein.
【0002】[0002]
【従来の技術】例えば集積回路カード、ゲーム用マスク
ROMカード、小型携帯電話器などに使用される半導体
装置は、パッケージの小型化・薄型化に対する要求が特
に強い。このような要求に応じるべく、ベア状態の半導
体チップ(ベア・チップ)の実装技術が発展しており、
チップ・オン・ボード(COB)実装、フリップチップ
実装などが知られている。2. Description of the Related Art For semiconductor devices used in, for example, integrated circuit cards, mask ROM cards for games, small mobile phones, etc., there is a strong demand for miniaturization and thinning of packages. In order to meet such demands, mounting technology of bare semiconductor chips (bare chips) has been developed,
Chip-on-board (COB) mounting, flip-chip mounting, etc. are known.
【0003】上記フリップチップ実装は、ベア・チップ
の素子形成面の金属バンプ電極を配線基板上の一主面に
形成されている電極パッドに押し付けて接続(フリップ
チップボンディング)するものである。これは、ワイヤ
ーボンディングを必要とするCOB実装よりも実装密度
が優れているが、基板の熱膨脹などに起因する応力が基
板・チップの接続部に加わって接続の信頼性を損なうと
いう問題がある。In the flip chip mounting, the metal bump electrodes on the element forming surface of the bare chip are pressed against the electrode pads formed on one main surface of the wiring board to connect (flip chip bonding). This has a higher mounting density than the COB mounting which requires wire bonding, but has a problem that stress due to thermal expansion of the substrate is applied to the connecting portion between the substrate and the chip to impair the reliability of the connection.
【0004】上記フリップチップ実装の改良例として、
ベア・チップと基板との間に樹脂を介在させて基板・チ
ップ相互を機械的に固定した片面樹脂封止型パッケージ
構造が例えば特公平2−7180号などにより知られて
いる。As an improved example of the flip chip mounting,
A single-sided resin-sealed package structure in which a resin is interposed between a bare chip and a substrate to mechanically fix the substrate and the chip together is known, for example, from Japanese Patent Publication No. 2-7180.
【0005】さらに、上記片面樹脂封止型パッケージ構
造の改良例およびその製造方法として、本願出願人の出
願に係る特願平6−32296号、特願平6−5075
7号、特願平6−60493号などにより種々の提案が
なされている。Further, as an improved example of the single-sided resin-encapsulated package structure and a manufacturing method thereof, Japanese Patent Application Nos. Hei 6-32296 and Hei 6-5075, filed by the applicant of the present application, are disclosed.
Various proposals have been made in Japanese Patent No. 7 and Japanese Patent Application No. 6-60493.
【0006】図5は、上記提案に係る特願平6−507
57号に開示されている片面樹脂封止型パッケージ構造
の一例を示している。このパッケージ構造は、一主面に
被接続部(例えば接続パッド1b)を含む配線1aを有
する配線基板1と、上記基板の一主面にフェースダウン
型に実装された半導体チップ2と、上記チップと配線基
板との間に充填された樹脂層5と、前記基板の他の主面
側に導出・露出され、前記チップに電気的に接続された
外部接続用端子4とを具備する。なお、図5中、2aは
バンプ電極、3はスルーホール配線であり、チップ2の
露出している上面は、緻密、堅牢な素材(例えばシリコ
ン)からなり、樹脂封止を行わなくても信頼性上の問題
は少ない。[0006] FIG. 5 is a Japanese Patent Application No. 6-507 related to the above proposal.
57 shows an example of a single-sided resin-sealed package structure disclosed in No. 57. This package structure has a wiring board 1 having a wiring 1a including a connected portion (for example, a connection pad 1b) on one main surface, a semiconductor chip 2 mounted face down on the one main surface of the board, and the chip described above. And a wiring layer, and a resin layer 5 filled between the wiring board and the wiring board, and an external connection terminal 4 which is led out and exposed on the other main surface side of the board and electrically connected to the chip. In FIG. 5, 2a is a bump electrode, 3 is a through-hole wiring, and the exposed upper surface of the chip 2 is made of a dense and robust material (for example, silicon) and is reliable without resin sealing. There are few sexual problems.
【0007】図6は、前記提案に係る特願平6−604
93号に開示されている片面樹脂封止型パッケージ構造
の一例を示している。このパッケージ構造は、図5のパ
ッケージ構造の改良例であり、前記基板1の一主面に対
してほぼ同一平面(平面性が±10μm程度)を成すよ
うに前記配線1aを埋め込み形成している。なお、図6
において、図5中と同一部分には同一符号を付してい
る。FIG. 6 shows a Japanese Patent Application No. 6-604 relating to the above proposal.
An example of a single-sided resin-sealed package structure disclosed in No. 93 is shown. This package structure is an improved example of the package structure shown in FIG. 5, and the wiring 1a is formed by embedding so as to form substantially the same plane (planarity is about ± 10 μm) with respect to one main surface of the substrate 1. . Note that FIG.
5, the same parts as those in FIG. 5 are designated by the same reference numerals.
【0008】このパッケージ構造によれば、チップ・基
板間に対して毛細管現象を利用して樹脂を流し込む際、
チップ・基板間の平坦性がよく、樹脂が容易に流れ込む
ので、ボイドのない緻密な樹脂層を形成でき、チップ・
基板間固定の信頼性を高めることができる。According to this package structure, when the resin is poured between the chip and the substrate by utilizing the capillary phenomenon,
The flatness between the chip and substrate is good, and the resin easily flows in, so a dense resin layer without voids can be formed.
The reliability of fixation between substrates can be improved.
【0009】また、上記したような提案に係るパッケー
ジ構造を有する半導体装置は、樹脂封止後に温度ストレ
スおよび/または電界ストレスを印加するためのバーン
インテストを実施し得るので、樹脂封止を行わないフリ
ップチップ実装よりも優れている。In addition, since the semiconductor device having the package structure according to the above proposal can be subjected to the burn-in test for applying the temperature stress and / or the electric field stress after the resin sealing, the resin sealing is not performed. Better than flip chip mounting.
【0010】図7は、従来の樹脂封止型半導体装置に使
用される半導体チップの素子・パッド形成面の一例を示
している。このチップ70の素子・パッド形成面には、
コーナー部以外のパッド形成領域にパッド71が設けら
れている、つまり、コーナー部にはパッド71が設けら
れていない、あるいは、パッドが設けられるとしても、
それはTEG(テスト・エレメント・グループ)などの
テスト・パターン用のパッドである。FIG. 7 shows an example of an element / pad formation surface of a semiconductor chip used in a conventional resin-sealed semiconductor device. On the element / pad formation surface of this chip 70,
The pad 71 is provided in the pad formation region other than the corner portion, that is, the pad 71 is not provided in the corner portion, or even if the pad is provided,
It is a pad for a test pattern such as TEG (Test Element Group).
【0011】ところで、上記したような半導体チップ7
0を前記したような片面樹脂封止型パッケージ構造を有
する半導体装置に使用し、チップのパッド71上に形成
される導電性物質(例えば金属からなるバンプ電極)と
配線基板上に形成される平面型の接続パッドとが固定さ
れると共に電気的に接続した場合を考える。この場合、
このような構造を有する半導体装置においては、熱サイ
クルなどにより熱応力が最も集中するチップ・コーナー
部にパッドが存在しないので、チップ・コーナー近傍部
に設けられている回路接続用のパッド71が応力を受
け、このパッド部における配線基板との電気的な接続が
損なわれるおそれがあり、チップ・基板間の電気的な接
続の信頼性が低下する。By the way, the semiconductor chip 7 as described above is used.
0 is used for a semiconductor device having a single-sided resin-encapsulated package structure as described above, and a conductive material (for example, bump electrode made of metal) formed on the pad 71 of the chip and a flat surface formed on the wiring board. Consider the case where the mold connection pad is fixed and electrically connected. in this case,
In a semiconductor device having such a structure, there are no pads at the chip corners where thermal stress is most concentrated due to thermal cycles, etc., so that the circuit connection pads 71 provided near the chip corners are stressed. Accordingly, the electrical connection between the pad portion and the wiring substrate may be impaired, and the reliability of the electrical connection between the chip and the substrate may be reduced.
【0012】[0012]
【発明が解決しようとする課題】上記したように従来の
片面樹脂封止型パッケージ構造を有する半導体装置およ
びそれに使用される半導体チップは、チップ・コーナー
近傍部に設けられている回路接続用パッド部におけるチ
ップ・基板間の電気的な接続の信頼性が低下するという
問題があった。As described above, the conventional semiconductor device having the single-sided resin-sealed package structure and the semiconductor chip used in the semiconductor device have a circuit connecting pad portion provided in the vicinity of a chip corner. However, there is a problem that the reliability of electrical connection between the chip and the substrate is deteriorated.
【0013】本発明は上記の問題点を解決すべくなされ
たもので、片面樹脂封止型パッケージ構造を有する半導
体装置に使用した場合にチップ・コーナー近傍部に設け
られている回路接続用パッド部におけるチップ・基板間
の電気的な接続の信頼性の低下を防止し得る半導体チッ
プおよびそれを用いた半導体装置を提供することを目的
とする。The present invention has been made to solve the above problems, and when used in a semiconductor device having a single-sided resin-sealed package structure, a circuit connection pad portion provided in the vicinity of a chip corner. It is an object of the present invention to provide a semiconductor chip capable of preventing a decrease in reliability of electrical connection between a chip and a substrate in the above and a semiconductor device using the same.
【0014】[0014]
【課題を解決するための手段】本発明の半導体チップ
は、素子・パッド形成面における各コーナー部に形成さ
れた接続補強用パッドと、上記素子・パッド形成面の各
コーナー部以外のパッド形成領域に形成され、上記集積
回路に電気的に接続されている回路接続用パッドとを具
備することを特徴とする。A semiconductor chip according to the present invention comprises a connection reinforcing pad formed at each corner of an element / pad formation surface and a pad formation region other than each corner of the element / pad formation surface. And a circuit connection pad electrically connected to the integrated circuit.
【0015】なお、前記接続補強用パッドは、前記素子
を含む集積回路とは電気的に接続されていないダミーパ
ッドである、または、前記素子を含む集積回路の電源電
位あるいは接地電位が与えられる電源用パッドであり、
前記各コーナー部を含むコーナー周辺部に形成されてい
てもよい。The connection reinforcing pad is a dummy pad that is not electrically connected to an integrated circuit including the element, or a power supply to which a power supply potential or a ground potential of the integrated circuit including the element is applied. Pad for
It may be formed in a corner peripheral portion including each of the corner portions.
【0016】また、本発明の半導体装置は、上記半導体
チップと、一主面に被接続部を含む配線を有し、上記一
主面に上記半導体チップがフェースダウン型に実装さ
れ、上記被接続部に上記半導体チップのパッドがバンプ
電極を介して電気的に接続された状態で固定され、上記
被接続部から他の主面側に導出・露出された外部接続用
端子を有する配線基板と、上記半導体チップと配線基板
との間に充填されて硬化された樹脂層とを具備すること
を特徴とする。Further, the semiconductor device of the present invention has the semiconductor chip and a wiring including a connected portion on one main surface, the semiconductor chip is mounted face down on the one main surface, and the connected portion A pad of the semiconductor chip is fixed to the portion in a state of being electrically connected via a bump electrode, and a wiring board having an external connection terminal that is derived / exposed from the connected portion to the other main surface side, It is characterized by comprising a resin layer filled and cured between the semiconductor chip and the wiring board.
【0017】[0017]
【作用】本発明の半導体チップは、素子・パッド形成面
における各コーナー部に接続補強用パッドが形成されて
いる。また、本発明の半導体装置は、上記半導体チップ
を使用した片面樹脂封止型パッケージ構造を有する。In the semiconductor chip of the present invention, the connection reinforcing pad is formed at each corner of the element / pad formation surface. The semiconductor device of the present invention has a single-sided resin-sealed package structure using the semiconductor chip.
【0018】このような半導体チップおよびそれを用い
た半導体装置によれば、熱サイクルなどにより熱応力が
最も集中するチップ・コーナー部に接続補強用パッドが
存在するので、チップ・コーナー近傍部に設けられてい
る回路接続用パッドが応力を受けにくくなる。According to such a semiconductor chip and a semiconductor device using the same, since the connection reinforcing pad exists in the chip corner portion where the thermal stress is most concentrated due to the thermal cycle, it is provided in the vicinity of the chip corner. The circuit connection pads provided are less susceptible to stress.
【0019】従って、上記回路接続用パッド部における
配線基板との電気的な接続が損なわれなくなり、チップ
・基板間の接続の信頼性の低下を防止し、半導体装置の
信頼性および歩留りの向上、コストダウンが可能にな
る。Therefore, the electrical connection between the circuit connecting pad portion and the wiring substrate is not impaired, the reliability of the connection between the chip and the substrate is prevented from decreasing, and the reliability and yield of the semiconductor device are improved. Cost reduction is possible.
【0020】[0020]
【実施例】以下、図面を参照して本発明の実施例を詳細
に説明する。図1(a)は、本発明の一実施例に係る片
面樹脂封止型パッケージ構造を有する半導体装置に使用
される半導体チップの素子・パッド形成面の一例を概略
的に示している。Embodiments of the present invention will be described below in detail with reference to the drawings. FIG. 1A schematically shows an example of an element / pad formation surface of a semiconductor chip used in a semiconductor device having a single-sided resin-sealed package structure according to an embodiment of the present invention.
【0021】図1(b)は、図1(a)のチップがフリ
ップチップボンディングされる配線基板の一主面の一例
を概略的に示している。図2(a)および(b)は、図
1(a)のチップおよび図1(b)の基板を用いた片面
樹脂封止型パッケージ構造を有する半導体装置の一例を
示す斜視図および断面図である。FIG. 1B schematically shows an example of one main surface of a wiring board on which the chip of FIG. 1A is flip-chip bonded. 2A and 2B are a perspective view and a cross-sectional view showing an example of a semiconductor device having a single-sided resin-sealed package structure using the chip of FIG. 1A and the substrate of FIG. 1B. is there.
【0022】図1(a)に示した半導体チップは、素子
・パッド形成面における各コーナー部に接続補強用パッ
ド2c(本例では、前記素子を含む集積回路とは電気的
に接続されていないダミーパッド)が形成されており、
上記素子・パッド形成面の各コーナー部以外のパッド形
成領域には、上記集積回路に電気的に接続されている回
路接続用パッド2bが形成されている。この場合、本例
では、ダミーパッド2cが回路接続用パッド2bと同じ
大きさで形成されている。The semiconductor chip shown in FIG. 1A has connection reinforcing pads 2c (in this example, it is not electrically connected to the integrated circuit including the element) at each corner of the element / pad formation surface. Dummy pad) is formed,
Circuit-connecting pads 2b electrically connected to the integrated circuit are formed in the pad-forming regions other than the corners of the element / pad-forming surface. In this case, in this example, the dummy pad 2c is formed with the same size as the circuit connecting pad 2b.
【0023】また、上記半導体チップは、図2(b)中
に示すように、上記チップ2の素子形成面の各パッド部
2c、2b上には、フリップチップボンディングを行う
ための導電性物質、例えば金属からなるバンプ電極(例
えば直径100μm、高さ30μm)2aが形成されて
いる。上記バンプ電極2aは、例えば電気メッキ法によ
り形成された金バンプあるいはボールボンディング法に
より形成された金のボールバンプである。As shown in FIG. 2B, the semiconductor chip has a conductive material for flip-chip bonding on each pad portion 2c, 2b on the element forming surface of the chip 2. For example, bump electrodes 2a made of metal (for example, diameter 100 μm, height 30 μm) 2a are formed. The bump electrodes 2a are, for example, gold bumps formed by electroplating or gold ball bumps formed by ball bonding.
【0024】図1(b)に示した基板1は、一主面に被
接続部(接続パッド)1bを含む配線1aを有し、上記
一主面の各コーナー部に接続補強用パッド1cが形成さ
れている。上記基板1に被接続部1bを形成する際に
は、基板1を例えば真空吸着機構付きのスクリーン印刷
機のステージ上に固定し、基板上1で前記チップの金属
バンプ電極2aに対応する部分に導電性ペースト、例え
ば銀ペースト(銀の粒径1μm、粘度100ps)をス
クリーン印刷して平面型の接続パッド(例えば直径15
0μm、高さ80μm)1bを形成する。The substrate 1 shown in FIG. 1B has a wiring 1a including a connected portion (connection pad) 1b on one main surface, and a connection reinforcing pad 1c is provided at each corner of the one main surface. Has been formed. When forming the connected portion 1b on the substrate 1, the substrate 1 is fixed on, for example, a stage of a screen printing machine having a vacuum suction mechanism, and the portion on the substrate 1 corresponding to the metal bump electrode 2a of the chip is fixed. A conductive paste, for example, a silver paste (silver particle size: 1 μm, viscosity: 100 ps) is screen-printed to produce a flat-type connection pad (for example, diameter 15).
0 μm, height 80 μm) 1b is formed.
【0025】また、上記基板1は、図2(b)中に示す
ように、前記被接続部1bから例えばスルーホール配線
3を介して他の主面側に導出・露出された外部接続用端
子4を有する。Further, as shown in FIG. 2B, the substrate 1 has external connection terminals which are led out and exposed from the connected portion 1b to the other main surface side through, for example, the through-hole wiring 3. Have 4.
【0026】なお、本例では、上記基板1の配線1aお
よび外部接続用端子4は、基板1の一主面に対してほぼ
同一平面(平面性が±10μm程度)を成すように埋め
込み形成されている。また、上記基板1のサイズは、例
えば縦横とも15mm、厚さ0.2mmであり、前記チ
ップ2のサイズは、例えば縦横とも13mm、厚さ0.
25mmである。In this example, the wiring 1a of the substrate 1 and the external connection terminal 4 are embedded and formed so as to be substantially flush with the main surface of the substrate 1 (planarity is about ± 10 μm). ing. The size of the substrate 1 is, for example, 15 mm in length and width and 0.2 mm in thickness, and the size of the chip 2 is, for example, 13 mm in length and width and thickness of 0.
It is 25 mm.
【0027】図2(a)、(b)に示した半導体装置
は、前記基板1の一主面に前記チップ2がフェースダウ
ン型に実装され、上記基板1の被接続部1bにチップ2
のパッド2cが電気的に接続された状態で固定されてお
り、上記チップ2と基板1との間に充填されて硬化され
た樹脂層5を具備する。In the semiconductor device shown in FIGS. 2A and 2B, the chip 2 is mounted face down on one main surface of the substrate 1, and the chip 2 is mounted on the connected portion 1b of the substrate 1.
The pad 2c is fixed in a state of being electrically connected, and includes a resin layer 5 filled between the chip 2 and the substrate 1 and cured.
【0028】上記基板1とチップ2とは、前記バンプ電
極2aを介して接続されると共に固定されている。この
固定に際しては、基板1の接続パッド1bにバンプ電極
2aの少なくとも先端部を埋め込むように圧入して両者
を固定させ、この状態で前記接続パッド1b用の銀ペー
ストを熱硬化させることにより両者を接合している。こ
の場合、チップ2の素子・パッド形成面には前記したよ
うに回路接続用パッド2bの他に各コーナー部に接続補
強用パッド2cが接続されており、これに対応して基板
1の一主面の各コーナー部にも接続補強用パッド1cが
形成されているので、チップ2・基板1間の対向面の平
面性がよくなり、チップ2・基板1の接合性が向上す
る。The substrate 1 and the chip 2 are connected and fixed via the bump electrodes 2a. At the time of this fixing, the bump electrode 2a is press-fitted into the connection pad 1b of the substrate 1 so as to embed at least the tip end portion of the bump electrode 2a to fix them, and in this state, the silver paste for the connection pad 1b is heat-cured to bond the two. It is joined. In this case, on the element / pad formation surface of the chip 2, in addition to the circuit connecting pad 2b, the connection reinforcing pads 2c are connected to the respective corners as described above. Since the connection reinforcing pad 1c is also formed at each corner of the surface, the flatness of the opposing surface between the chip 2 and the substrate 1 is improved, and the bondability between the chip 2 and the substrate 1 is improved.
【0029】なお、前記樹脂層5は、チップと基板との
間(本例では30〜40μm)に充填されると共にチッ
プの各外周側面部にほぼ均等なフィレットを有する。ま
た、上記樹脂層5を形成する際に使用される樹脂として
は、樹脂層として形成された状態でチップ・基板の材質
の違い(ヤング率、熱膨脹率など)から生じる内部応力
によりチップ・基板相互の接続部が劣化することを緩和
する性質を持ち、かつ、チップ・基板間への充填時にチ
ップ・基板間へ入り込める径(例えば25μm以下)の
フィラーを含むものを選択することが望ましい。The resin layer 5 is filled between the chip and the substrate (30 to 40 μm in this example), and has substantially even fillets on the outer peripheral side surfaces of the chip. In addition, the resin used when forming the resin layer 5 is a resin that is formed as the resin layer, and the internal stress caused by the difference in the material of the chip and the substrate (Young's modulus, coefficient of thermal expansion, etc.) causes mutual stress between the chip and the substrate. It is desirable to select one having a property of alleviating the deterioration of the connection part of (1) and containing a filler having a diameter (for example, 25 μm or less) that can enter between the chip and the substrate when filling between the chip and the substrate.
【0030】即ち、上記実施例の半導体チップは、素子
・パッド形成面における各コーナー部に接続補強用パッ
ド2cが形成されている。また、上記実施例の半導体装
置は、上記半導体チップ2を使用した超薄型、超小型の
片面樹脂封止型パッケージ構造を有する。That is, in the semiconductor chip of the above-mentioned embodiment, the connection reinforcing pad 2c is formed at each corner of the element / pad formation surface. Further, the semiconductor device of the above embodiment has an ultra-thin and ultra-small single-sided resin-sealed package structure using the semiconductor chip 2.
【0031】このような半導体チップと半導体装置によ
れば、熱サイクルなどにより熱応力が最も集中するチッ
プ・コーナー部に接続補強用パッド2cが存在するの
で、チップ・コーナー近傍部に設けられている回路接続
用パッド2bが応力を受けにくくなる。従って、上記回
路接続用パッド部における基板との電気的な接続が損な
われなくなり、チップ・基板間の接続の信頼性の低下を
防止し、半導体装置の信頼性および歩留りの向上、コス
トダウンが可能になる。According to such a semiconductor chip and a semiconductor device, since the connection reinforcing pad 2c exists at the chip corner portion where the thermal stress is most concentrated due to the thermal cycle, etc., it is provided in the vicinity of the chip corner. The circuit connecting pad 2b is less susceptible to stress. Therefore, the electrical connection between the circuit connection pad and the substrate is not impaired, the reliability of the connection between the chip and the substrate is prevented from decreasing, and the reliability and yield of the semiconductor device can be improved and the cost can be reduced. become.
【0032】なお、上記実施例では、チップの素子・パ
ッド形成面の各コーナー部にダミーパッドを形成した例
を示したが、これに限らず、素子・パッド形成面におけ
る各コーナー部(あるいはそれを含むコーナー周辺部)
に上記実施例のダミーパッド以外の接続補強用パッド、
例えば前記集積回路の電源電位あるいは接地電位が与え
られる電源用パッドを形成した場合にも、上記実施例と
同様の効果が得られる。しかも、この場合には、仮に上
記電源用パッドの一部と基板側の接続パッドとの接続が
損なわれても、集積回路の動作に殆んど影響を受けなく
て済む。In the above embodiment, the example in which the dummy pad is formed at each corner portion of the element / pad formation surface of the chip is shown, but the invention is not limited to this, and each corner portion on the element / pad formation surface (or Around the corner)
To the connection reinforcing pad other than the dummy pad of the above embodiment,
For example, when the power supply pad to which the power supply potential or the ground potential of the integrated circuit is applied is formed, the same effect as that of the above embodiment can be obtained. Moreover, in this case, even if the connection between a part of the power supply pad and the connection pad on the substrate side is lost, the operation of the integrated circuit is hardly affected.
【0033】また、上記実施例では、半導体チップの素
子・パッド形成面の各コーナー部に接続補強用パッドを
形成した例を示したが、これに限らず、各コーナー部を
含むコーナー周辺部に接続補強用パッドを形成した場合
には、上記実施例で述べた効果がより顕著に得られるよ
うになる。Further, in the above-mentioned embodiment, the example is shown in which the connection reinforcing pads are formed in the respective corner portions of the element / pad formation surface of the semiconductor chip, but the present invention is not limited to this, and in the corner peripheral portion including the respective corner portions. When the connection-reinforcing pad is formed, the effect described in the above embodiment can be more remarkably obtained.
【0034】この場合における半導体チップおよび基板
の一例を図3(a)および図3(b)に示す。図3
(a)に示す半導体チップ12は、素子・パッド形成面
の各コーナー部を含むコーナー周辺部に、例えば3個の
接続補強用パッド2cをL字形配列で形成した例を示し
ている。Examples of the semiconductor chip and the substrate in this case are shown in FIGS. 3 (a) and 3 (b). FIG.
The semiconductor chip 12 shown in (a) shows an example in which, for example, three connection reinforcing pads 2c are formed in an L-shaped arrangement in a corner peripheral portion including each corner portion of the element / pad formation surface.
【0035】図3(b)に示す基板11は、一主面上の
各コーナー部を含むコーナー周辺部に、前記接続補強用
パッド1cの例えば3個分を連結した大きさを有するほ
ぼL字形のベタ型の接続補強用パッド11cを形成した
例を示している。The substrate 11 shown in FIG. 3 (b) has a substantially L-shape having a size in which, for example, three connection reinforcing pads 1c are connected to a corner peripheral portion including each corner portion on one main surface. 2 shows an example in which the solid type connection reinforcing pad 11c is formed.
【0036】このように基板の一主面上の各コーナー部
を含むコーナー周辺部にベタ型の接続補強用パッド11
cを形成したものを用意すれば、フリップチップボンデ
ィングを行う際に、ベタ型の接続補強用パッド11cに
よる補強的な作用により、基板の割れや反りなどの発生
が抑制され、完成品の歩留りが良くなり、完成品をメモ
リカードなどに組み込んだ場合に耐ノイズ性も良好にな
る。また、前記バンプ電極を、チップ側ではなく基板側
に形成してもよい。As described above, the solid-type connection reinforcing pad 11 is provided around the corners including the corners on the main surface of the substrate.
If the product with c is prepared, the occurrence of cracks and warpage of the substrate is suppressed by the reinforcing action of the solid type connection reinforcing pad 11c during flip chip bonding, and the yield of finished products is improved. Improves noise resistance when the finished product is incorporated into a memory card. Further, the bump electrodes may be formed on the substrate side instead of the chip side.
【0037】図4(a)および(b)は、図3(a)の
チップおよび図3(b)の基板を用いた片面樹脂封止型
パッケージ構造を有する半導体装置の一例を示す斜視図
および断面図である。FIGS. 4A and 4B are perspective views showing an example of a semiconductor device having a single-sided resin-sealed package structure using the chip of FIG. 3A and the substrate of FIG. 3B. FIG.
【0038】なお、基板およびチップは、外形が正方形
のものに限らず、長方形のものを用いてもよい。また、
基板は、アルミナ系、窒化アルミ系のものに限らず、樹
脂系のもの(BTレジン基板など)を用いてもよい。The substrate and the chip are not limited to have a square outer shape, and may have a rectangular outer shape. Also,
The substrate is not limited to an alumina-based or aluminum nitride-based substrate, and a resin-based substrate (BT resin substrate or the like) may be used.
【0039】また、基板は、図6に示したように、配線
および外部接続用端子が配線基板に対してほぼ同一平面
を成すように埋め込まれているもの(例えばアルミナ系
の絶縁基材に対してグリーンシート法により形成された
ものとか、樹脂系の絶縁基材に対してプリプレグ法によ
り形成されたもの)に限らず、図5に示したように、配
線および外部接続用端子が配線基板から突出する状態で
形成されているものものを用いてもよい。Further, as shown in FIG. 6, the substrate is one in which wiring and external connection terminals are embedded so as to be substantially flush with the wiring substrate (for example, for an alumina-based insulating base material). Not formed by a green sheet method or a resin-based insulating base material formed by a prepreg method), as shown in FIG. What is formed in the protruding state may be used.
【0040】また、基板は、ブラインドビアホールを介
して上下面が電気的に接続されているものや多層構造の
ものを用いてもよい。さらに、チップを基板上にフリッ
プチップボンディングする際、前記実施例のように接続
パッドにバンプ電極の少なくとも先端部を埋め込むよう
に圧入する方法に限らず、前記特願平6−50757号
に詳細に記載されているように、例えば金の接続パッド
と金のバンプ電極との間で固相拡散を起こさせて接合さ
せるようにしてもよい。Further, the substrate may have a structure in which the upper and lower surfaces are electrically connected via a blind via hole or a multilayer structure. Further, when the chip is flip-chip bonded onto the substrate, the method is not limited to the method of press-fitting so that at least the tip end of the bump electrode is embedded in the connection pad as in the above-described embodiment, but the details are described in Japanese Patent Application No. 6-50757. As described, solid phase diffusion may occur between the gold connection pads and the gold bump electrodes for bonding.
【0041】[0041]
【発明の効果】上述したように本発明によれば、チップ
外縁・基板外縁間の距離が微小の場合でも、樹脂により
ベア・チップの各外周側面部を覆うように封止でき、パ
ッケージ構造の一層の小型化、配線基板上のチップが占
める有効面積比の向上、コストダウンを図り得る片面樹
脂封止型パッケージ構造を有する半導体装置およびその
製造方法を提供することができる。As described above, according to the present invention, even if the distance between the outer edge of the chip and the outer edge of the substrate is very small, the resin can be sealed so as to cover the outer peripheral side surfaces of the bare chip. It is possible to provide a semiconductor device having a single-sided resin-encapsulated package structure capable of further miniaturization, improvement of an effective area ratio occupied by chips on a wiring board, and cost reduction, and a manufacturing method thereof.
【図1】本発明の一実施例に係る半導体チップおよびそ
れとフリップチップボンディングされる配線基板を概略
的に示す平面図。FIG. 1 is a plan view schematically showing a semiconductor chip and a wiring board flip-chip bonded to the semiconductor chip according to an embodiment of the present invention.
【図2】図1のチップと基板を使用して形成された半導
体装置の一例を示す斜視図および断面図。2A and 2B are a perspective view and a cross-sectional view showing an example of a semiconductor device formed using the chip and the substrate of FIG.
【図3】本発明の他の実施例に係る半導体チップおよび
それとフリップチップボンディングされる配線基板を概
略的に示す平面図。FIG. 3 is a plan view schematically showing a semiconductor chip and a wiring board flip-chip bonded to the semiconductor chip according to another embodiment of the present invention.
【図4】図3のチップと基板を使用して形成された半導
体装置の一例を示す斜視図および断面図。4A and 4B are a perspective view and a cross-sectional view showing an example of a semiconductor device formed using the chip and the substrate of FIG.
【図5】先願に係る片面樹脂封止型パッケージ構造の一
例を示す断面図。FIG. 5 is a sectional view showing an example of a single-sided resin-sealed package structure according to the prior application.
【図6】他の先願に係る片面樹脂封止型パッケージ構造
の一例を示す断面図。FIG. 6 is a sectional view showing an example of a single-sided resin-sealed package structure according to another prior application.
【図7】従来の樹脂封止型半導体装置に使用される半導
体チップの素子・パッド形成面の一例を示す図。FIG. 7 is a view showing an example of an element / pad formation surface of a semiconductor chip used in a conventional resin-sealed semiconductor device.
1、11…配線基板、1a…配線、1b…被接続部、1
c、11c…接続補強用パッド、2、12…半導体チッ
プ、2a…バンプ電極、2b…回路接続用パッド、2c
…接続補強用パッド(ダミーパッド)、3…スルーホー
ル配線、4…外部接続用端子、5…樹脂層、5a…樹
脂。1, 11 ... Wiring board, 1a ... Wiring, 1b ... Connected part, 1
c, 11c ... Pads for reinforcing connection, 2, 12 ... Semiconductor chips, 2a ... Bump electrodes, 2b ... Pads for circuit connection, 2c
... Connection reinforcing pads (dummy pads), 3 ... Through-hole wiring, 4 ... External connection terminals, 5 ... Resin layer, 5a ... Resin.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 H01L 27/04 21/822 ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 6 Identification code Internal reference number FI technical display location H01L 27/04 21/822
Claims (5)
部に形成された接続補強用パッドと、上記素子・パッド
形成面の各コーナー部以外のパッド形成領域に形成さ
れ、上記集積回路に電気的に接続されている回路接続用
パッドとを具備することを特徴とする半導体チップ。1. A connection-reinforcing pad formed at each corner of an element / pad formation surface and a pad formation region other than each corner of the element / pad formation surface, and electrically connected to the integrated circuit. A semiconductor chip comprising a connected circuit connection pad.
前記接続補強用パッドは、前記素子を含む集積回路とは
電気的に接続されていないダミーパッドであることを特
徴とする半導体チップ。2. The semiconductor chip according to claim 1, wherein
The semiconductor chip, wherein the connection reinforcing pad is a dummy pad that is not electrically connected to an integrated circuit including the element.
前記接続補強用パッドは、前記素子を含む集積回路の電
源電位あるいは接地電位が与えられる電源用パッドであ
ることを特徴とする半導体チップ。3. The semiconductor chip according to claim 1, wherein
The semiconductor chip, wherein the connection reinforcing pad is a power supply pad to which a power supply potential or a ground potential of an integrated circuit including the element is applied.
前記接続補強用パッドは、前記素子・パッド形成面にお
ける各コーナー部を含むコーナー周辺部に形成されてい
ることを特徴とする半導体チップ。4. The semiconductor chip according to claim 1,
The semiconductor chip, wherein the connection reinforcing pad is formed at a corner peripheral portion including each corner portion on the element / pad formation surface.
に被接続部を含む配線を有し、上記一主面に上記半導体
チップがフェースダウン型に実装され、上記被接続部に
上記半導体チップのパッドがバンプ電極を介して電気的
に接続された状態で固定され、上記被接続部から他の主
面側に導出・露出された外部接続用端子を有する配線基
板と、上記半導体チップと配線基板との間に充填されて
硬化された樹脂層とを具備することを特徴とする半導体
装置。5. The semiconductor chip according to claim 1, and wiring having a connected portion on one main surface, wherein the semiconductor chip is mounted face down on the one main surface, and the connected portion has the above-mentioned structure. A wiring board having pads of a semiconductor chip fixed in a state of being electrically connected via bump electrodes, and a wiring board having external connection terminals that are led out / exposed from the connected portion to the other main surface side, and the semiconductor chip A semiconductor device comprising: a resin layer that is filled between the wiring board and the wiring board and cured.
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JP29523494A JP3277083B2 (en) | 1994-11-29 | 1994-11-29 | Semiconductor chip and semiconductor device using the same |
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Application Number | Priority Date | Filing Date | Title |
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JP29523494A JP3277083B2 (en) | 1994-11-29 | 1994-11-29 | Semiconductor chip and semiconductor device using the same |
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Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001244365A (en) * | 2000-02-28 | 2001-09-07 | Hitachi Chem Co Ltd | Wiring board, semiconductor device, and method of manufacturing wiring board |
JP2003068974A (en) * | 2001-08-28 | 2003-03-07 | Fujitsu Ltd | Semiconductor device |
US6777798B2 (en) | 2001-02-05 | 2004-08-17 | Renesas Technology Corp. | Stacked semiconductor device structure |
JP2006295156A (en) * | 2005-04-14 | 2006-10-26 | Samsung Electronics Co Ltd | Semiconductor module and manufacturing method thereof |
JP2009188075A (en) * | 2008-02-05 | 2009-08-20 | Fujitsu Ltd | Printed circuit board unit, semiconductor package, and connector for semiconductor package |
US8067950B2 (en) | 2008-12-01 | 2011-11-29 | Panasonic Corporation | Semiconductor device including chip |
US8653657B2 (en) | 2005-08-23 | 2014-02-18 | Rohm Co., Ltd. | Semiconductor chip, method of manufacturing semiconductor chip, and semiconductor device |
CN114023662A (en) * | 2021-09-17 | 2022-02-08 | 日月光半导体制造股份有限公司 | Fan-out type packaging structure |
JP2022143668A (en) * | 2021-03-18 | 2022-10-03 | アンリツ株式会社 | Chip mounting structure, chip mounting method, and sampling oscilloscope using the same |
-
1994
- 1994-11-29 JP JP29523494A patent/JP3277083B2/en not_active Expired - Lifetime
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001244365A (en) * | 2000-02-28 | 2001-09-07 | Hitachi Chem Co Ltd | Wiring board, semiconductor device, and method of manufacturing wiring board |
US7205645B2 (en) | 2000-02-28 | 2007-04-17 | Hitachi Chemical Co., Ltd. | Wiring board, semiconductor device, and method of manufacturing wiring board |
US7704799B2 (en) | 2000-02-28 | 2010-04-27 | Hitachi Chemical Co., Ltd. | Method of manufacturing wiring substrate |
US6777798B2 (en) | 2001-02-05 | 2004-08-17 | Renesas Technology Corp. | Stacked semiconductor device structure |
JP2003068974A (en) * | 2001-08-28 | 2003-03-07 | Fujitsu Ltd | Semiconductor device |
JP2006295156A (en) * | 2005-04-14 | 2006-10-26 | Samsung Electronics Co Ltd | Semiconductor module and manufacturing method thereof |
US8653657B2 (en) | 2005-08-23 | 2014-02-18 | Rohm Co., Ltd. | Semiconductor chip, method of manufacturing semiconductor chip, and semiconductor device |
JP2009188075A (en) * | 2008-02-05 | 2009-08-20 | Fujitsu Ltd | Printed circuit board unit, semiconductor package, and connector for semiconductor package |
US8067950B2 (en) | 2008-12-01 | 2011-11-29 | Panasonic Corporation | Semiconductor device including chip |
JP2022143668A (en) * | 2021-03-18 | 2022-10-03 | アンリツ株式会社 | Chip mounting structure, chip mounting method, and sampling oscilloscope using the same |
CN114023662A (en) * | 2021-09-17 | 2022-02-08 | 日月光半导体制造股份有限公司 | Fan-out type packaging structure |
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