JPH08125093A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPH08125093A JPH08125093A JP6284081A JP28408194A JPH08125093A JP H08125093 A JPH08125093 A JP H08125093A JP 6284081 A JP6284081 A JP 6284081A JP 28408194 A JP28408194 A JP 28408194A JP H08125093 A JPH08125093 A JP H08125093A
- Authority
- JP
- Japan
- Prior art keywords
- heat
- die pad
- metal plate
- semiconductor device
- semiconductor element
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48245—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
- H01L2224/48247—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73251—Location after the connecting process on different surfaces
- H01L2224/73265—Layer and wire connectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/74—Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto
- H01L2224/78—Apparatus for connecting with wire connectors
- H01L2224/7825—Means for applying energy, e.g. heating means
- H01L2224/783—Means for applying energy, e.g. heating means by means of pressure
- H01L2224/78301—Capillary
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/83909—Post-treatment of the layer connector or bonding area
- H01L2224/8391—Cleaning, e.g. oxide removal step, desmearing
- H01L2224/83912—Mechanical cleaning, e.g. abrasion using hydro blasting, brushes, ultrasonic cleaning, dry ice blasting, gas-flow
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/85—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
- H01L2224/8512—Aligning
- H01L2224/85148—Aligning involving movement of a part of the bonding apparatus
- H01L2224/85169—Aligning involving movement of a part of the bonding apparatus being the upper part of the bonding apparatus, i.e. bonding head, e.g. capillary or wedge
- H01L2224/8518—Translational movements
- H01L2224/85181—Translational movements connecting first on the semiconductor or solid-state body, i.e. on-chip, regular stitch
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/91—Methods for connecting semiconductor or solid state bodies including different methods provided for in two or more of groups H01L2224/80 - H01L2224/90
- H01L2224/92—Specific sequence of method steps
- H01L2224/922—Connecting different surfaces of the semiconductor or solid-state body with connectors of different types
- H01L2224/9222—Sequential connecting processes
- H01L2224/92242—Sequential connecting processes the first connecting process involving a layer connector
- H01L2224/92247—Sequential connecting processes the first connecting process involving a layer connector the second connecting process involving a wire connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/181—Encapsulation
Landscapes
- Lead Frames For Integrated Circuits (AREA)
- Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、 本発明は、モータド
ライバ、音声増幅用パワーIC、高速動作論理素子等の
ように比較的発熱量の大きな半導体素子を封止するのに
適した半導体装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor device suitable for encapsulating a semiconductor element having a relatively large amount of heat generation such as a motor driver, a voice amplification power IC, and a high speed operation logic element. Regarding
【0002】[0002]
【従来の技術】従来のこの種の半導体装置のパッケージ
構造としてパッケージ本体に放熱用金属板を組み込んだ
半導体装置が知られている。以下、図10を参照して説
明する。半導体素子1は放熱用金属板2にダイボンディ
ングされているとともに、複数本のリード端子3との間
を金属細線4で電気的に接続されている。各リード端子
3はパッケージ本体5から導出されて、ほぼLの字状に
屈曲形成されている。放熱用金属板2は平面視でリード
端子3の先端部と重なる程の大きな面積であるので、放
熱用金属板2やリード端子3等を一枚の金属板を打ち抜
いたりして形成することはできない。そこで放熱用金属
板2は、リード端子3等を含むリードフレームとは個別
に形成され、半導体素子1が組み込まれる前にリード端
子3に絶縁性接着剤6を介して接続されている。2. Description of the Related Art As a conventional package structure of a semiconductor device of this type, there is known a semiconductor device in which a metal plate for heat dissipation is incorporated in a package body. This will be described below with reference to FIG. The semiconductor element 1 is die-bonded to a heat-dissipating metal plate 2, and is electrically connected to a plurality of lead terminals 3 by thin metal wires 4. Each lead terminal 3 is led out of the package body 5 and is bent in a substantially L-shape. Since the heat-dissipating metal plate 2 has such a large area that it overlaps with the tip portions of the lead terminals 3 in a plan view, it is not possible to form the heat-dissipating metal plate 2, the lead terminals 3, etc. by punching a single metal plate. Can not. Therefore, the heat dissipation metal plate 2 is formed separately from the lead frame including the lead terminals 3 and the like, and is connected to the lead terminals 3 via the insulating adhesive 6 before the semiconductor element 1 is assembled.
【0003】一方、パッケージ本体から放熱用フィンを
導出した別タイプのパッケージ構造も知られている。以
下、図11を参照して説明する。金属板で形成された放
熱フィン7は、略矩形状でパーケージ本体5に封止され
た一側辺部に形成された突出部(ダイパッド)8に半導
体素子1がダイボンディングされている。半導体素子1
は各リード端子3との間を金属細線4でワイヤーボンデ
ィングされ、半導体素子1および金属細線4等がパーケ
ージ本体5に封止されている。放熱フィン7の他方の側
辺部はパーケージ本体5から導出され、実装時には放熱
効果の大きな別の放熱フィンに連結される等して使用さ
れる。On the other hand, another type of package structure in which heat radiation fins are derived from the package body is also known. This will be described below with reference to FIG. The semiconductor element 1 is die-bonded to a projecting portion (die pad) 8 formed on one side of the heat radiation fin 7 formed of a metal plate and having a substantially rectangular shape and sealed in the package body 5. Semiconductor element 1
Is wire-bonded to each lead terminal 3 with a thin metal wire 4, and the semiconductor element 1 and the thin metal wire 4 are sealed in a package body 5. The other side of the heat radiation fin 7 is led out of the package body 5 and is used by being connected to another heat radiation fin having a large heat radiation effect at the time of mounting.
【0004】[0004]
【発明が解決しようとする課題】しかしながら、このよ
うな構成を有する従来例の場合には、次のような問題が
ある。すなわち、図10に示した従来の半導体装置によ
れば、絶縁性接着剤6の耐熱性はそれ程高くないので、
半導体装置の組み立て工程でリードフレームを高温に曝
すことができないという制約がある。また、ワイヤーボ
ンディング工程において、ヒーターブロック上にリード
フレームが載置されると、ヒーターブロックからの熱
は、放熱用金属板2、絶縁性接着剤6を介してリード端
子3の先端部に伝達される。絶縁性接着剤6は熱伝導性
が低いので、リード端子3が加熱され難い。そのため、
上記の熱的制約とあいまってワイヤーボンディング時の
リード端子3の温度が低くなり、金属細線4の接続に悪
影響を与えるという問題点もある。However, the prior art having such a structure has the following problems. That is, according to the conventional semiconductor device shown in FIG. 10, the heat resistance of the insulating adhesive 6 is not so high.
There is a restriction that the lead frame cannot be exposed to a high temperature in the process of assembling the semiconductor device. When a lead frame is placed on the heater block in the wire bonding step, heat from the heater block is transmitted to the distal end of the lead terminal 3 via the metal plate 2 for heat radiation and the insulating adhesive 6. You. Since the insulating adhesive 6 has low thermal conductivity, the lead terminal 3 is hard to be heated. for that reason,
There is also a problem that the temperature of the lead terminal 3 at the time of wire bonding becomes low in combination with the above-mentioned thermal restrictions, which adversely affects the connection of the thin metal wires 4.
【0005】図11に示した従来装置によれば、金属細
線4の垂れ下がりよるダイパッド8との短絡等を防止す
るために、ダイパッド8の周辺(半導体素子1に近づけ
て)にリード端子3の先端部を近接して配置させる必要
があることから、ダイパッド8の部分をあまり大きくす
ることができず、そのためパッケージの熱抵抗を十分下
げることが困難であるという問題点がある。According to the conventional device shown in FIG. 11, in order to prevent a short circuit with the die pad 8 due to the hanging of the fine metal wire 4, the tip of the lead terminal 3 is provided around the die pad 8 (close to the semiconductor element 1). Since it is necessary to dispose the portions close to each other, the portion of the die pad 8 cannot be made too large, which causes a problem that it is difficult to sufficiently reduce the thermal resistance of the package.
【0006】本発明は、このような事情に鑑みてなされ
たものであって、パッケージの熱抵抗が十分に小さく、
かつ耐熱性に優れてワイヤーボンディング性を低下させ
ることのない半導体装置提供することを目的とする。The present invention has been made in view of such circumstances, and has a sufficiently small thermal resistance of a package.
Moreover, it is an object of the present invention to provide a semiconductor device which is excellent in heat resistance and does not deteriorate wire bondability.
【0007】[0007]
【課題を解決するための手段】本発明は、このような目
的を達成するために、次のような構成をとる。すなわ
ち、本発明は、放熱フィンのパッケージ本体内部に封止
された部分にダイパッドが形成され、このダイパッドに
半導体素子が固着され、ダイパッドの周辺に配置された
複数本のリード端子の先端部と半導体素子とを金属細線
でそれぞれ接続し、半導体素子および金属細線等をパッ
ケージ本体内に封止し、パッケージ本体内から放熱フィ
ンおよびリード端子の他端部を導出してなる半導体装置
において、平面視で前記リード端子の先端部と重なり合
う大きさの放熱板を、前記リード端子の先端部との間に
小間隙を介在させて、前記ダイパッドの下面に直接的に
接合したものである。The present invention has the following constitution in order to achieve such an object. That is, according to the present invention, a die pad is formed in a portion sealed inside the package body of the heat dissipation fin, a semiconductor element is fixed to the die pad, and a tip portion of a plurality of lead terminals arranged around the die pad and a semiconductor In a semiconductor device in which the element and the thin metal wire are connected to each other by a metal wire, the semiconductor element and the metal wire are sealed in the package body, and the heat radiation fin and the other end of the lead terminal are led out from the package body, in plan view A heat dissipation plate having a size overlapping the tip portion of the lead terminal is directly joined to the lower surface of the die pad with a small gap interposed between the heat dissipation plate and the tip portion of the lead terminal.
【0008】[0008]
【作用】本発明の作用は次のとおりである。本発明によ
れば、半導体装置が駆動されることに伴って半導体素子
から発生した熱は、ダイパッドから放熱フィンに伝達さ
れて外部へ放出されるとともに、前記ダイパッドから熱
容量の大きな放熱板にも効率よく伝達され、さらに放熱
板からパッケージ本体やリード端子等を介して外部へ放
出される。ダイパッドの下面に放熱板が直接的に接合さ
れているので、放熱板を接着剤を介してリード端子に接
続したときのような熱的制約がない。また、ワイヤーボ
ンディング時には、リード端子の先端部を放熱板側に押
し付けて接触させることにより、通常、放熱板の下面に
配備されるヒーターブロックの熱は放熱板を介してリー
ド端子に効率よく伝達される。The operation of the present invention is as follows. According to the present invention, the heat generated from the semiconductor element when the semiconductor device is driven is transmitted from the die pad to the radiating fins and released to the outside, and the heat is efficiently transferred from the die pad to the radiating plate having a large heat capacity. It is well transmitted and further released from the heat sink through the package body and lead terminals. Since the heat radiating plate is directly joined to the lower surface of the die pad, there is no thermal restriction as in the case where the heat radiating plate is connected to the lead terminal via an adhesive. During wire bonding, the tip of the lead terminal is pressed against the radiator plate and brought into contact with it, so that the heat of the heater block normally provided on the lower surface of the radiator plate is efficiently transmitted to the lead terminal via the radiator plate. You.
【0009】[0009]
【実施例】以下、図面を参照して本発明の一実施例を説
明する。図1は本発明に係る半導体装置の一実施例の構
成を示した斜視図、図2は図1の02−02矢視断面図
である。なお、図1では便宜上、パッケージ本体はその
外形のみが鎖線で示されている。An embodiment of the present invention will be described below with reference to the drawings. 1 is a perspective view showing the configuration of an embodiment of a semiconductor device according to the present invention, and FIG. 2 is a sectional view taken along the line 02-02 of FIG. Note that, in FIG. 1, for convenience, only the outer shape of the package body is shown by a chain line.
【0010】半導体素子10は、半田等の低融点金属や
銀ペースト等によってダイパッド11上にダイボンディ
ングされている。このダイパッド11は、略矩形上の放
熱フィン12の一側辺部に突出形成されたもので、両者
が一体になっている。ダイパッド11の周辺に複数本の
リード端子13の先端部が配置され、これらのリード端
子13と半導体素子10とが金属細線14で電気的に接
続されている。ダイパッド11、放熱フィン12および
リード端子13は、銅合金や鉄・ニッケル合金等からな
る同じリードフレームから分離形成されたものである。
ダイパッド11の基端部が下方へ屈曲されることで、ダ
イパッド11がリード端子13よりも下方へ若干沈み込
んだ状態になっている。The semiconductor element 10 is die-bonded onto the die pad 11 with a low melting point metal such as solder or silver paste. The die pad 11 is formed so as to project from one side portion of the radiating fin 12 having a substantially rectangular shape, and both are integrated. The tips of a plurality of lead terminals 13 are arranged around the die pad 11, and these lead terminals 13 and the semiconductor element 10 are electrically connected to each other by the thin metal wires 14. The die pad 11, the radiation fins 12, and the lead terminals 13 are formed separately from the same lead frame made of a copper alloy, an iron / nickel alloy, or the like.
The base end of the die pad 11 is bent downward, so that the die pad 11 is slightly sunk below the lead terminals 13.
【0011】ダイパッド11の下面に放熱用金属板15
が接着剤等を介さずに直接的に接合されている。放熱用
金属板15は、平面視でリード端子13の先端部と重な
り合う大きさの矩形状を呈している。放熱用金属板15
は熱伝導性の良い銅合金やアルミニウムなどで形成され
ている。放熱用金属板15はダンウンセットされたダイ
パッド11の下面に接合されているので、放熱用金属板
15とリード端子13との間に小間隙が介在している。
この間隙は例えば、0.2〜0.4mm程度である。放
熱用金属板15をダイパッド11に直接的に接合する手
法としては、例えば超音波接合、スポット溶接、カシメ
結合などが用いることができる。ただし、接合の容易性
および広範囲の良好な接合性を得る上で、超音波接合が
好ましい。超音波による接合手法については、後に詳し
く説明する。A metal plate 15 for heat radiation is provided on the lower surface of the die pad 11.
Are directly joined without using an adhesive or the like. The heat-dissipating metal plate 15 has a rectangular shape that is large enough to overlap the tip end portion of the lead terminal 13 in a plan view. Heat dissipation metal plate 15
Is formed of a copper alloy or aluminum having good thermal conductivity. Since the heat-dissipating metal plate 15 is bonded to the lower surface of the die pad 11 that has been unset, there is a small gap between the heat-dissipating metal plate 15 and the lead terminal 13.
This gap is, for example, about 0.2 to 0.4 mm. As a method of directly bonding the heat-dissipating metal plate 15 to the die pad 11, for example, ultrasonic bonding, spot welding, crimping bonding, or the like can be used. However, ultrasonic bonding is preferable from the viewpoint of easy bonding and wide range of good bonding properties. The joining method using ultrasonic waves will be described later in detail.
【0012】上述した半導体素子10、金属細線13、
放熱用金属板15等がエポキシ樹脂等で一体成型される
ことにより、パッケージ本体16が形成されている。こ
のパッケージ本体16から放熱フィン12およびリード
端子13が導出されている。The above-mentioned semiconductor element 10, thin metal wire 13,
The package body 16 is formed by integrally molding the heat-dissipating metal plate 15 with epoxy resin or the like. The radiation fins 12 and the lead terminals 13 are led out of the package body 16.
【0013】以上のように構成された半導体装置がプリ
ント配線基板等に実装されて駆動されると、半導体素子
10から発生した熱は、ダイパッド11から放熱フィン
12に伝達されて外部を放出されるとともに、ダイパッ
ド11から熱容量の大きな放熱用金属板15にも効率よ
く伝達され、さらに放熱用金属板15からパッケージ本
体16やリード端子13等を介して外部へ放出される。When the semiconductor device constructed as described above is mounted and driven on a printed wiring board or the like, the heat generated from the semiconductor element 10 is transmitted from the die pad 11 to the radiating fins 12 and released to the outside. At the same time, the heat is efficiently transmitted from the die pad 11 to the heat dissipating metal plate 15 having a large heat capacity, and further discharged from the heat dissipating metal plate 15 to the outside via the package body 16 and the lead terminals 13.
【0014】次に、上述した半導体装置の製造方法を説
明する。図3に示すように、上述した半導体装置を組み
立てるために、ダイパッド11、放熱フィン12および
リード端子13等が一体的に形成されたリードフレーム
20が用いられる。このリードフレーム20に半導体素
子10が組み込まれる前に、ダイパッド11の下面に放
熱用金属板15が超音波で接合される。以下、図4〜図
6を参照して説明する。Next, a method of manufacturing the above-described semiconductor device will be described. As shown in FIG. 3, in order to assemble the above-described semiconductor device, a lead frame 20 in which a die pad 11, a radiation fin 12, a lead terminal 13, and the like are integrally formed is used. Before the semiconductor element 10 is incorporated into the lead frame 20, the heat dissipating metal plate 15 is bonded to the lower surface of the die pad 11 by ultrasonic waves. Hereinafter, description will be made with reference to FIGS.
【0015】図4に示すように、受け金具31上に放熱
用金属板15を載置し、さらに放熱用金属板15とダイ
パッド11とが当接して重なり合うように、リードフレ
ーム20を位置決め載置する。受け金具31の上方に超
音波を供給する超音波ホーン32が配備され、その先端
部に押さえ金具33が取り付けられている。受け金具3
1の上面および押さえ金具33の下面に多数の小突起3
1a,33aがそれぞれ形成されている。As shown in FIG. 4, a heat dissipating metal plate 15 is placed on a receiving metal fitting 31, and a lead frame 20 is positioned and placed so that the heat dissipating metal plate 15 and the die pad 11 abut and overlap. I do. An ultrasonic horn 32 for supplying ultrasonic waves is provided above the receiving metal member 31, and a holding metal member 33 is attached to a distal end portion thereof. Bracket 3
1 and a large number of small projections 3
1a and 33a are formed respectively.
【0016】放熱用金属板15とリードフレーム20の
位置決めが終わると、図5に示すように、超音波ホーン
32が下降して押さえ金具33でダイパッド11上を加
圧するとともに、押さえ金具33を介して超音波を印加
する。放熱用金属板15の下面は受け金具31の小突起
31aに食い込み、またダイパッド11の上面は押さえ
金具33の小突起33aに食い込んでいるので、各金具
31,33との間の滑りは発生しない。その結果、印加
された超音波が放熱用金属板15とダイパッド11との
界面に作用することにより、放熱用金属板15とダイパ
ッド11とが接合される。図6に接合された状態を示
す。放熱用金属板15の下面には、受け金具31の小突
起31aの食い込み跡である小さな窪み15aが形成さ
れる。When the positioning of the metal plate 15 for heat dissipation and the lead frame 20 is completed, the ultrasonic horn 32 descends and presses the die pad 11 with the metal fitting 33 as shown in FIG. And apply ultrasonic waves. The lower surface of the heat-dissipating metal plate 15 digs into the small protrusion 31a of the receiving metal fitting 31, and the upper surface of the die pad 11 digs into the small projection 33a of the pressing metal fitting 33, so that no slip between the metal fittings 31 and 33 occurs. . As a result, the applied ultrasonic wave acts on the interface between the metal plate for heat radiation 15 and the die pad 11, so that the metal plate for heat radiation 15 and the die pad 11 are joined. FIG. 6 shows the joined state. On the lower surface of the heat-dissipating metal plate 15, a small recess 15a, which is a mark of the small protrusion 31a of the receiving metal fitting 31, is formed.
【0017】このようにして放熱用金属板15が接合さ
れたダイパッド11上に半導体素子10をダイボンディ
ングした後、半導体素子10とリード端子13とが金属
細線14で接続される。このワイヤーボンディング過程
を図7に示す。半導体素子10がダイボンディングされ
たリードフレーム20は、ヒーターブロック34上に載
置される。そして、リード端子13の先端部近傍がリン
グ状の押さえ板35で押さえ込まれることにより、リー
ド端子13が弾性変形して下方の放熱用金属板15に押
圧接触される。その結果、ヒーターブロック34の熱は
放熱用金属板15を介してリード端子13に効率よく伝
わるので、ワイヤーボンディング性が向上する。なお、
図中の符号36はワイヤーボンディング用のキャピラリ
である。ワイヤーボンディング後、押さえ板35を上昇
させると、リード端子13は弾性的に復元して、リード
端子13と放熱用金属板15との間隙が確保される。After the semiconductor element 10 is die-bonded on the die pad 11 to which the heat-dissipating metal plate 15 has been joined as described above, the semiconductor element 10 and the lead terminals 13 are connected by the thin metal wires 14. This wire bonding process is shown in FIG. The lead frame 20 to which the semiconductor element 10 is die-bonded is placed on the heater block 34. Then, the vicinity of the distal end of the lead terminal 13 is pressed by the ring-shaped pressing plate 35, so that the lead terminal 13 is elastically deformed and is brought into pressure contact with the lower metal plate 15 for heat radiation. As a result, the heat of the heater block 34 is efficiently transmitted to the lead terminals 13 via the heat-dissipating metal plate 15, so that the wire bonding property is improved. In addition,
Reference numeral 36 in the figure denotes a capillary for wire bonding. When the pressing plate 35 is lifted after the wire bonding, the lead terminals 13 are elastically restored, and a gap between the lead terminals 13 and the metal plate 15 for heat radiation is secured.
【0018】ワイヤーボンディングされたリードフレー
ム20はモールド工程に送られ、周知のトランスファモ
ールド法により成型されてパッケージ本体16が形成さ
れる。このとき、図8に示すように、放熱用金属板15
の下面に形成された多数の小さな窪み15a内に成型用
樹脂16aが入り込むので、放熱用金属板15と成型用
樹脂16aとの接触面積が拡がる。その結果、放熱用金
属板15と成型用樹脂16aの接合強度が向上して、放
熱用金属板15と成型用樹脂16aとの剥離や、パッケ
ージ本体16のクラック等を防止することができる。The wire-bonded lead frame 20 is sent to a molding step, and is molded by a well-known transfer molding method to form a package body 16. At this time, as shown in FIG.
Since the molding resin 16a enters into a large number of small recesses 15a formed on the lower surface of, the contact area between the heat dissipation metal plate 15 and the molding resin 16a is expanded. As a result, the bonding strength between the heat-dissipating metal plate 15 and the molding resin 16a is improved, and peeling of the heat-dissipating metal plate 15 from the molding resin 16a, cracking of the package body 16, and the like can be prevented.
【0019】なお、本発明は上述した実施例に限らず、
例えば次のように変形実施することができる。図1に示
した実施例では、放熱フィン12がパッケージ本体16
の一方の側辺部のみから導出される半導体装置を例に採
って説明したが、本発明はこれに限定されず、例えば図
9に示すような半導体装置にも適用することができる。
この半導体装置は、パッケージ本体16の両側辺部から
放熱フィン12の両端部がそれぞれ導出されている。放
熱フィン12の幅の狭い中間部がダウンセットされてダ
イパッド11になっている。このダイパッド11の下面
に放熱用金属板15が直接的に接合されている。このよ
うな構成の半導体装置によっても、第1実施例と同様に
パッケージの熱抵抗を十分小さくすることができる。The present invention is not limited to the above-described embodiment.
For example, modifications can be made as follows. In the embodiment shown in FIG. 1, the radiating fin 12 has the package body 16
Although a semiconductor device derived from only one of the side portions has been described as an example, the present invention is not limited to this, and can be applied to, for example, a semiconductor device as shown in FIG.
In this semiconductor device, both ends of the heat radiation fin 12 are led out from both sides of the package body 16. A narrow intermediate portion of the heat radiation fin 12 is set down to form the die pad 11. The metal plate 15 for heat radiation is directly joined to the lower surface of the die pad 11. With the semiconductor device having such a structure, the thermal resistance of the package can be sufficiently reduced as in the first embodiment.
【0020】また、上記実施例では、ダイパッドの下面
に接合する放熱板として金属板を用いたが、必ずしも金
属板に限定されず、熱伝導性の良好な板材であればよ
い。In the above embodiment, the metal plate is used as the heat dissipation plate to be bonded to the lower surface of the die pad, but the heat dissipation plate is not necessarily limited to the metal plate and may be any plate material having good thermal conductivity.
【0021】[0021]
【発明の効果】以上の説明から明らかなように、本発明
によればパッケージ本体から放熱フィンが導出された半
導体装置において、半導体素子から発生した熱はダイパ
ッドから放熱フィンを介して外部を放出されるととも
に、ダイパッドの下面に直接的に接合された放熱板を介
してパッケージ本体やリード端子に伝達されて外部へ放
出されるので、熱抵抗の十分に小さなパッケージを実現
することができる。As is apparent from the above description, according to the present invention, in a semiconductor device in which the radiating fin is led out of the package body, the heat generated from the semiconductor element is radiated outside from the die pad through the radiating fin. At the same time, the heat is transmitted to the package body and the lead terminals via the heat radiating plate directly joined to the lower surface of the die pad and is emitted to the outside, so that a package having sufficiently small thermal resistance can be realized.
【0022】また、放熱板を接着剤を介してリード端子
に接続するものと比較して、半導体装置の組み立て工程
における熱的制約が少ない。また、ワイヤーボンディン
グ工程では、リード端子先端部を放熱板に押し付けて接
触させることにより、通常、放熱板の下面に配備される
ヒーターブロックからの熱を放熱板を介してリード端子
に効率よく伝達できるので、ワイヤーボンディングの信
頼性を向上することもできる。Further, as compared with the case where the heat dissipation plate is connected to the lead terminal via the adhesive, there are less thermal restrictions in the assembly process of the semiconductor device. Further, in the wire bonding step, the tip of the lead terminal is pressed against and brought into contact with the heat dissipation plate, so that heat from the heater block normally arranged on the lower surface of the heat dissipation plate can be efficiently transferred to the lead terminal through the heat dissipation plate. Therefore, the reliability of wire bonding can be improved.
【0023】さらに、本発明によれは、放熱板を取りつ
けるための接着剤が不要で、しかも放熱板とは個別に形
成されるリードフレームとしては通常の放熱フィン付き
のリードフレームを使うことができるので、製造コスト
を低減することができる。Further, according to the present invention, an adhesive for attaching the heat radiating plate is unnecessary, and a lead frame with a general heat radiating fin can be used as a lead frame formed separately from the heat radiating plate. Therefore, the manufacturing cost can be reduced.
【図1】第1実施例の構成を示した斜視図である。FIG. 1 is a perspective view showing a configuration of a first embodiment.
【図2】図1の02−02矢視断面図である。FIG. 2 is a sectional view taken along the line 02-02 of FIG.
【図3】リードフレームと放熱用金属板の斜視図であ
る。FIG. 3 is a perspective view of a lead frame and a heat dissipation metal plate.
【図4】放熱用金属板の接合過程を示す図である。FIG. 4 is a view showing a joining process of a metal plate for heat radiation.
【図5】放熱用金属板の接合過程を示す図である。FIG. 5 is a view showing a joining process of a metal plate for heat radiation.
【図6】放熱用金属板が接合された状態を示す断面図で
ある。FIG. 6 is a cross-sectional view showing a state in which a heat-dissipating metal plate is joined.
【図7】ワイヤーボンディング過程を示す図である。FIG. 7 is a diagram showing a wire bonding process.
【図8】成型後の要部拡大断面図である。FIG. 8 is an enlarged sectional view of a main part after molding.
【図9】別実施例の斜視図である。FIG. 9 is a perspective view of another embodiment.
【図10】従来例の断面図である。FIG. 10 is a sectional view of a conventional example.
【図11】別の従来例の一部破断斜視図である。FIG. 11 is a partially cutaway perspective view of another conventional example.
10…半導体素子 11…ダイパッド 12…放熱フィン 13…リード端子 15…放熱用金属板 16…パッケージ本体 DESCRIPTION OF SYMBOLS 10 ... Semiconductor element 11 ... Die pad 12 ... Heat radiation fin 13 ... Lead terminal 15 ... Metal plate for heat radiation 16 ... Package body
Claims (1)
された部分にダイパッドが形成され、このダイパッドに
半導体素子が固着され、ダイパッドの周辺に配置された
複数本のリード端子の先端部と半導体素子とを金属細線
でそれぞれ接続し、半導体素子および金属細線等をパッ
ケージ本体内に封止し、パッケージ本体内から放熱フィ
ンおよびリード端子の他端部を導出してなる半導体装置
において、平面視で前記リード端子の先端部と重なり合
う大きさの放熱板を、前記リード端子の先端部との間に
小間隙を介在させて、前記ダイパッドの下面に直接的に
接合したことを特徴とする半導体装置。1. A die pad is formed in a portion of the heat radiation fin sealed inside the package body, a semiconductor element is fixed to the die pad, and the tip end of a plurality of lead terminals arranged around the die pad and the semiconductor element. And a thin metal wire are respectively connected to each other, the semiconductor element and the thin metal wire are sealed in the package body, and the radiation fin and the other end of the lead terminal are led out from the package body. A semiconductor device, wherein a heat dissipation plate having a size overlapping the tip portion of the lead terminal is directly bonded to the lower surface of the die pad with a small gap interposed between the heat dissipation plate and the tip portion of the lead terminal.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6284081A JP2665170B2 (en) | 1994-10-24 | 1994-10-24 | Semiconductor device |
US08/551,925 US5666003A (en) | 1994-10-24 | 1995-10-23 | Packaged semiconductor device incorporating heat sink plate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6284081A JP2665170B2 (en) | 1994-10-24 | 1994-10-24 | Semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH08125093A true JPH08125093A (en) | 1996-05-17 |
JP2665170B2 JP2665170B2 (en) | 1997-10-22 |
Family
ID=17674019
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6284081A Expired - Fee Related JP2665170B2 (en) | 1994-10-24 | 1994-10-24 | Semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2665170B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103928422A (en) * | 2014-03-27 | 2014-07-16 | 张轩 | Lead frame suitable for high-temperature environment |
JP2017045909A (en) * | 2015-08-28 | 2017-03-02 | 三光合成株式会社 | Heat dissipation component, and manufacturing method of heat dissipation component |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5572065A (en) * | 1978-11-25 | 1980-05-30 | Mitsubishi Electric Corp | Plastic-molded type semiconductor device |
-
1994
- 1994-10-24 JP JP6284081A patent/JP2665170B2/en not_active Expired - Fee Related
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5572065A (en) * | 1978-11-25 | 1980-05-30 | Mitsubishi Electric Corp | Plastic-molded type semiconductor device |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103928422A (en) * | 2014-03-27 | 2014-07-16 | 张轩 | Lead frame suitable for high-temperature environment |
JP2017045909A (en) * | 2015-08-28 | 2017-03-02 | 三光合成株式会社 | Heat dissipation component, and manufacturing method of heat dissipation component |
Also Published As
Publication number | Publication date |
---|---|
JP2665170B2 (en) | 1997-10-22 |
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