JPH08124112A - Magnetic head and its production - Google Patents
Magnetic head and its productionInfo
- Publication number
- JPH08124112A JPH08124112A JP25820594A JP25820594A JPH08124112A JP H08124112 A JPH08124112 A JP H08124112A JP 25820594 A JP25820594 A JP 25820594A JP 25820594 A JP25820594 A JP 25820594A JP H08124112 A JPH08124112 A JP H08124112A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic head
- substrate
- film
- magnetic
- chromium boride
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
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- Physical Vapour Deposition (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、磁気テープ、フロッピ
ィディスク、ハードディスク等の磁気記録媒体と摺動す
ることにより磁気記録情報の記憶、再生、消去を行う磁
気ヘッド及びその製造方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a magnetic head for storing, reproducing and erasing magnetic recording information by sliding on a magnetic recording medium such as a magnetic tape, a floppy disk, a hard disk and the like, and a method for manufacturing the same.
【0002】[0002]
【従来の技術】従来の磁気ヘッドの主要部分であるコア
部を図4に示す。磁気ヘッドのコア部1は磁性材料から
なる略U字型のコア11を有し、コア11の両脚部には
それぞれ書込みコイル12及び読出しコイル13が巻き
つけられている。また、コア11のエアギャップには、
非磁性スペーサ14が設けられている。さらに、通常複
数の磁気ヘッドのコア部1が近接して図示しないシール
ドケースに収められている。またコア部1をシールドケ
ースに収めるに当たり、該両者の間隙には樹脂等の充填
材が充填される。2. Description of the Related Art A core portion which is a main part of a conventional magnetic head is shown in FIG. The core portion 1 of the magnetic head has a substantially U-shaped core 11 made of a magnetic material, and a write coil 12 and a read coil 13 are wound around both legs of the core 11, respectively. Also, in the air gap of the core 11,
A non-magnetic spacer 14 is provided. Further, usually, the core portions 1 of a plurality of magnetic heads are close to each other and housed in a shield case (not shown). Further, when the core portion 1 is housed in the shield case, the gap between the two is filled with a filler such as resin.
【0003】このような磁気ヘッドは、コア、スペー
サ、シールドケース及び充填材等にわたる摺動面で磁気
テープと摺動することにより磁気記録情報の記憶、再
生、消去を行う。従って、磁気ヘッドの磁気記録媒体と
の摺動面は、磁気記録媒体との摺動に耐えるだけの耐摩
耗性及び低摩擦係数等が要求されると共に、例えば高温
・高湿等の苛酷な環境下でも変性せず、その機能を発揮
できるだけの化学的安定性が要求される。しかし、従来
より磁気ヘッドの磁気記録媒体との摺動面には何らの処
理もされず、磁性体コアやその他の非磁性体部分がその
まま磁気記録媒体と摺動している。その結果、該摺動面
が摩耗したり、磁性体コアが変性してその電磁変換特性
が低下したりし易かった。Such a magnetic head stores, reproduces, and erases magnetic recording information by sliding on a magnetic tape on a sliding surface extending over a core, a spacer, a shield case, a filler, and the like. Therefore, the sliding surface of the magnetic head with respect to the magnetic recording medium is required to have abrasion resistance and a low coefficient of friction sufficient to withstand sliding with the magnetic recording medium, and in a severe environment such as high temperature and high humidity. It is required to be chemically stable enough to exert its function without denaturing even under the temperature. However, conventionally, no treatment is performed on the sliding surface of the magnetic head with respect to the magnetic recording medium, and the magnetic core and other non-magnetic parts slide on the magnetic recording medium as they are. As a result, the sliding surface was easily worn or the magnetic core was modified so that the electromagnetic conversion characteristics were easily deteriorated.
【0004】そこで、前記の要求される諸特性を向上さ
せるために磁気ヘッドの磁気記録媒体との摺動面に耐摺
動性、耐食性に優れた材質からなる膜を被覆させること
が提案されている。例えば、特開昭62−275308
号公報によると、磁気ヘッドの磁気記録媒体との摺動面
に窒化ホウ素膜を形成することにより、該磁気ヘッドと
磁気記録媒体との間の摩耗係数を低減させることができ
ると共に、水分等の環境に対する磁性体の耐食性を向上
させられることが開示されている。Therefore, in order to improve the above-mentioned required characteristics, it has been proposed to coat the sliding surface of the magnetic head with the magnetic recording medium with a film made of a material having excellent sliding resistance and corrosion resistance. There is. For example, JP-A-62-275308
According to the publication, by forming a boron nitride film on the sliding surface of the magnetic head with respect to the magnetic recording medium, it is possible to reduce the wear coefficient between the magnetic head and the magnetic recording medium and at the same time to prevent moisture and the like. It is disclosed that the corrosion resistance of the magnetic material with respect to the environment can be improved.
【0005】また、例えば特開昭63−263618号
公報によると、磁気ヘッドの磁気記録媒体との摺動面
に、ホウ素、ケイ素、4ホウ化炭素、炭化ケイ素、炭
素、ロジウム、白金、2酸化ジルコニウム、アルミナ、
2酸化ケイ素、窒化ホウ素、炭化チタン、炭化タングス
テンからなる物質のうち、少なくとも一種からなる膜を
形成することにより、磁気ヘッドと磁気記録媒体との間
のスペースを大きくすることなく、磁気ヘッドの耐摺動
性及び耐食性を向上させられることが開示されている。Further, according to, for example, Japanese Patent Laid-Open No. 63-263618, boron, silicon, carbon tetraboride, silicon carbide, carbon, rhodium, platinum, and 2 oxide are formed on the sliding surface of the magnetic head with respect to the magnetic recording medium. Zirconium, alumina,
By forming a film made of at least one of substances made of silicon dioxide, boron nitride, titanium carbide, and tungsten carbide, the resistance of the magnetic head can be increased without increasing the space between the magnetic head and the magnetic recording medium. It is disclosed that slidability and corrosion resistance can be improved.
【0006】[0006]
【発明が解決しようとする課題】しかしながら、特開昭
62−275308号公報による磁気ヘッドは、窒化ホ
ウ素が絶縁性材料であるため、磁気ヘッド表面に形成さ
れた窒化ホウ素膜と磁気記録媒体との摺動により発生す
る静電気が該膜に蓄積され、それが情報を記憶、再生す
る際のノイズとなる。However, in the magnetic head according to Japanese Patent Laid-Open No. 62-275308, since boron nitride is an insulating material, the boron nitride film formed on the surface of the magnetic head and the magnetic recording medium are separated from each other. Static electricity generated by sliding is accumulated on the film, which becomes noise when information is stored and reproduced.
【0007】また、特開昭63−263618号公報に
よる磁気ヘッドのうち、2酸化ジルコニウム、アルミ
ナ、2酸化ケイ素、窒化ホウ素からなる膜は絶縁性膜で
あるため、これらの膜で被覆された磁気ヘッドは前記の
特開昭62−275308号公報の磁気ヘッドと同様の
欠点を有し、ホウ素、ケイ素、炭素からなる膜は膜と磁
気記録テープとの摺動により発生する摩擦熱で容易に酸
化劣化し、磁気ヘッドの保護膜として十分に機能できな
くなる。また、4ホウ化炭素、炭化ケイ素、炭化チタ
ン、炭化タングステンからなる膜は靱性が劣るため、磁
気記録媒体との摺動時に膜にクラックが入り易く、その
結果、磁気ヘッドの耐食性を向上させるための保護膜と
して十分に機能できなくなる。さらに、ロジウム、白金
からなる膜は比較的軟質であるため、これらの膜で被覆
された磁気ヘッドは十分な耐摩耗性が得られない。Further, in the magnetic head according to Japanese Patent Laid-Open No. 63-263618, since the film made of zirconium dioxide, alumina, silicon dioxide, and boron nitride is an insulating film, the magnetic film covered with these films is used. The head has the same drawbacks as the magnetic head disclosed in JP-A-62-275308, and a film made of boron, silicon, or carbon is easily oxidized by frictional heat generated by sliding between the film and the magnetic recording tape. It deteriorates and cannot function sufficiently as a protective film for the magnetic head. In addition, since the film made of carbon tetraboride, silicon carbide, titanium carbide, and tungsten carbide is inferior in toughness, the film is likely to be cracked when sliding on the magnetic recording medium, and as a result, the corrosion resistance of the magnetic head is improved. Cannot be fully functioned as a protective film of. Further, since the film made of rhodium and platinum is relatively soft, the magnetic head covered with these films cannot obtain sufficient wear resistance.
【0008】そこで本発明は、磁気記録媒体との摺動面
が、耐摩耗性に優れ、摩擦係数が小さく、多様な環境下
においても耐食性に優れる磁気ヘッド及びその製造方法
を提供することを課題とする。Therefore, the present invention is to provide a magnetic head whose sliding surface with respect to a magnetic recording medium is excellent in wear resistance, has a small friction coefficient, and is excellent in corrosion resistance even under various environments, and a manufacturing method thereof. And
【0009】[0009]
【課題を解決するための手段】前記課題を解決するため
に本発明は、磁気ヘッド基体の磁気記録媒体との摺動面
上にホウ化クロム膜が形成されたことを特徴とする磁気
ヘッドを提供する。本発明の磁気ヘッドはカセットテー
プレコーダ装置、VTR装置、FDD装置、HDD装
置、カードリーダー等の装置の部品として用いられるも
ので、その用途は特に制限されない。In order to solve the above-mentioned problems, the present invention provides a magnetic head characterized in that a chromium boride film is formed on a sliding surface of a magnetic head substrate with a magnetic recording medium. provide. The magnetic head of the present invention is used as a component of a device such as a cassette tape recorder device, a VTR device, an FDD device, an HDD device, and a card reader, and its use is not particularly limited.
【0010】また、本発明の磁気ヘッドの基体は、磁性
体コア部分及びその他の非磁性体部分を含む摺動面で磁
気記録媒体と摺動するが、前記基体の前記摺動面のうち
磁性体コア部分の材質としては、フェライト、パーマロ
イ、センダスト等の金属等を用いることができ、また非
磁性体部分の材質には各種の樹脂やセラミック等を用い
ることができる。Further, the base body of the magnetic head of the present invention slides on the magnetic recording medium on the sliding surface including the magnetic core portion and the other non-magnetic portion. As the material of the body core portion, a metal such as ferrite, permalloy, sendust, or the like can be used, and as the material of the non-magnetic body portion, various resins or ceramics can be used.
【0011】本発明の磁気ヘッドにおけるホウ化クロム
膜の厚さは30〜50000Å程度であることが考えら
れる。30Åより小さいと、保護膜としての該膜の機能
が十分なものではなく、50000Åより大きいと、磁
気ヘッドの電磁変換特性が劣化する。前記ホウ化クロム
膜中に含有されるホウ化クロムとしては、1ホウ化1ク
ロム(CrB)、2ホウ化1クロム(CrB2 )、1ホ
ウ化2クロム(Cr2 B)、4ホウ化3クロム(Cr3
B4 )、3ホウ化2クロム(Cr2 B3 )、4ホウ化1
クロム(CrB4 )、3ホウ化5クロム(Cr5 B3 )
等を挙げることができ、これらの1又は2以上が含まれ
る。It is considered that the thickness of the chromium boride film in the magnetic head of the present invention is about 30 to 50000Å. If it is less than 30Å, the function of the film as a protective film is not sufficient, and if it is more than 50000Å, the electromagnetic conversion characteristics of the magnetic head deteriorate. As chromium boride contained in the chromium boride film, 1 chromium boride (CrB), 1 chromium boride (CrB 2 ), 2 chromium boride (Cr 2 B), 4 boride Chrome (Cr 3
B 4 ), 3 borides of 2 chromium (Cr 2 B 3 ), 4 borides of 1
Chromium (CrB 4 ), 3 chromium boride (Cr 5 B 3 )
And the like, and one or more of these are included.
【0012】また、本発明の磁気ヘッドは、磁気ヘッド
基体のホウ化クロム膜との界面部分に窒素イオンが注入
された層を有していることが考えられる。これにより磁
気ヘッド基体自体の記録媒体との摺動面の耐摩耗性、耐
食性を一層向上させることができる。また、前記課題を
解決するために本発明は、磁気ヘッド基体の磁気記録媒
体との摺動面上へクロム及びホウ素を蒸着させると同
時、交互、又は該蒸着後に、不活性ガスイオンを該蒸着
面上に照射してホウ化クロム膜を形成させることを特徴
とする磁気ヘッドの製造方法を提供する。Further, it is conceivable that the magnetic head of the present invention has a layer in which nitrogen ions are implanted in the interface portion with the chromium boride film of the magnetic head substrate. As a result, the wear resistance and corrosion resistance of the sliding surface of the magnetic head substrate itself on the recording medium can be further improved. Further, in order to solve the above-mentioned problems, the present invention provides vapor deposition of chromium and boron on a sliding surface of a magnetic head substrate with a magnetic recording medium, at the same time, alternately, or after the vapor deposition, by depositing an inert gas ion. Provided is a method of manufacturing a magnetic head, which comprises irradiating a surface to form a chromium boride film.
【0013】このように、磁気ヘッド基体上に膜構成原
子であるクロム(Cr)及びホウ素(B)を蒸着すると
同時、交互、又は該蒸着後に不活性ガスイオンを該基体
上に照射することにより、照射イオンとホウ化クロム膜
構成原子が衝突し、膜構成原子が反跳して該基体中に押
し込まれ、また基体構成原子が反跳して該基体からはじ
き出され、該膜と該基体との界面に該両者の構成原子よ
りなる混合層が形成される。これにより該ホウ化クロム
膜の密着性は優れたものとなる。As described above, when the film-forming atoms of chromium (Cr) and boron (B) are vapor-deposited on the magnetic head substrate, at the same time, alternately, or after the vapor deposition, the substrate is irradiated with an inert gas ion. The irradiated ions collide with the chromium boride film-constituting atoms, the film-constituting atoms recoil and are pushed into the substrate, and the substrate-constituting atoms recoil and are repelled from the substrate. A mixed layer composed of the constituent atoms of the both is formed at the interface. Thereby, the adhesion of the chromium boride film becomes excellent.
【0014】本発明の磁気ヘッドの製造方法における前
記CrやBの基体への蒸着は、Cr元素含有物質やB元
素含有物質を電子ビーム、レーザ、高周波等により蒸着
させる真空蒸着法や、Cr元素含有物質やB元素含有物
質をイオンビーム、マグネトロン、高周波等によりスパ
ッタするスパッタ蒸着法により行われる。前記クロム元
素含有物質としては、Cr単体の他、Cr化合物、例え
ばCrの窒化物、Crのホウ化物等を挙げることがで
き、これらの中から一又は二以上が用いられる。In the method of manufacturing a magnetic head of the present invention, the vapor deposition of Cr or B on a substrate is performed by a vacuum vapor deposition method in which a Cr element-containing substance or a B element-containing substance is vapor-deposited by an electron beam, a laser, high frequency, or the like. It is carried out by a sputter deposition method in which the contained substance or the B element-containing substance is sputtered by an ion beam, a magnetron, a high frequency or the like. Examples of the chromium element-containing substance include Cr compounds, such as Cr compounds such as Cr nitrides and Cr borides, and one or more of these are used.
【0015】前記B元素含有物質としては、B単体の
他、B化合物、例えば酸化ホウ素、窒化ホウ素、炭化ホ
ウ素、硫化ホウ素、ホウ化リン、ホウ化水素及び各種金
属ホウ化物等を挙げることができ、これらの中から一又
は二以上が用いられる。また、本発明の磁気ヘッドの製
造方法において用いられる不活性ガスイオンとしては、
ヘリウム(He)ガスイオン、ネオン(Ne)ガスイオ
ン、アルゴン(Ar)ガスイオン、クリプトン(Kr)
ガスイオン、キセノン(Xe)ガスイオン等を挙げるこ
とができ、これらの中から一又は二以上が用いられる。Examples of the B element-containing substance include B compounds, for example, B compounds such as boron oxide, boron nitride, boron carbide, boron sulfide, phosphorus boride, hydrogen boride, and various metal borides. , And one or more of these are used. Further, as the inert gas ions used in the method of manufacturing the magnetic head of the present invention,
Helium (He) gas ion, neon (Ne) gas ion, argon (Ar) gas ion, krypton (Kr)
Examples thereof include gas ions and xenon (Xe) gas ions, and one or more of them are used.
【0016】イオン照射時のイオン加速エネルギは、
0.05keV以上20keV以下であることが考えら
れる。0.05keVより小さいと、前記混合層の厚み
が小さくなり、形成されたホウ化クロム膜の磁気ヘッド
基体に対する密着性が十分でなく、20keVより大き
いと、該基体に与える熱損傷が過大になる。また、本発
明の磁気ヘッドの製造方法において磁気ヘッド基体上へ
のホウ化クロム膜形成に先立ち、該基体の磁気記録媒体
との摺動面上へ窒素イオンを照射することにより、該基
体の前記ホウ化クロム膜との界面部分に窒素イオンが注
入された層を形成しておくことが考えられる。The ion acceleration energy during ion irradiation is
It is considered that the value is not less than 0.05 keV and not more than 20 keV. If it is less than 0.05 keV, the thickness of the mixed layer becomes small, and the adhesion of the formed chromium boride film to the magnetic head substrate is insufficient. If it is more than 20 keV, the heat damage to the substrate becomes excessive. . Further, in the method of manufacturing a magnetic head of the present invention, prior to the formation of the chromium boride film on the magnetic head substrate, the sliding surface of the substrate with the magnetic recording medium is irradiated with nitrogen ions, whereby It is conceivable to form a layer in which nitrogen ions are implanted at the interface with the chromium boride film.
【0017】前記窒素イオン照射において、窒素イオン
を生成させるための原料ガスとしては、窒素(N2 )ガ
ス、アンモニア(NH3 )ガス等が考えられる。また窒
素イオン照射時のイオン加速エネルギは、0.05ke
V以上20keV以下であることが考えられる。0.0
5keVより小さいと、窒素イオン注入層の厚みが小さ
くなり、窒素イオン注入による十分な効果が得られず、
20keVより大きいと、磁気ヘッド基体に与える熱損
傷が過大になる。In the above nitrogen ion irradiation, nitrogen (N 2 ) gas, ammonia (NH 3 ) gas, etc. can be considered as the source gas for generating nitrogen ions. The ion acceleration energy during nitrogen ion irradiation is 0.05 ke.
It is considered that the voltage is V or more and 20 keV or less. 0.0
If it is less than 5 keV, the thickness of the nitrogen ion-implanted layer becomes small, and a sufficient effect due to nitrogen ion implantation cannot be obtained.
If it is higher than 20 keV, the heat damage to the magnetic head substrate will be excessive.
【0018】また、磁気ヘッド基体の単位面積当たりの
窒素イオン照射量は、1×1014個/cm2 以上1×1
018個/cm2 以下であることが考えられ、1×1014
個/cm2 より小さいと、窒素イオン注入による十分な
効果が得られず、1×1018個/cm2 より大きいと、
磁気ヘッド基体に与える熱的損傷が過大になる。イオン
照射量の制御は、例えばファラデーカップ等のイオン電
流測定器を用いて基体上へのイオン照射量をモニタする
ことで行える。The irradiation amount of nitrogen ions per unit area of the magnetic head substrate is 1 × 10 14 pieces / cm 2 or more and 1 × 1.
It is considered that the number is 0 18 pieces / cm 2 or less, and it is 1 × 10 14
If the number is less than 1 / cm 2 , the sufficient effect of nitrogen ion implantation cannot be obtained, and if it is greater than 1 × 10 18 / cm 2 ,
The thermal damage to the magnetic head substrate becomes excessive. The ion irradiation amount can be controlled by monitoring the ion irradiation amount on the substrate using an ion current measuring device such as a Faraday cup.
【0019】本発明の磁気ヘッドの製造方法において、
形成される膜中のホウ化クロム分子のCr原子数とB原
子数の比の制御は、基体上に到達するCr原子数とB原
子数の比(Cr/B輸送比)及び照射イオンの加速エネ
ルギ等の条件を適宜組み合わせることにより行う。Cr
/B輸送比の制御は、例えば水晶振動子式膜厚モニタ等
の膜厚モニタを用いて基体上へのクロム及びホウ素の蒸
着量をモニタすることで行える。In the method of manufacturing a magnetic head of the present invention,
The control of the ratio of the number of Cr atoms and the number of B atoms of the chromium boride molecule in the formed film is controlled by the ratio of the number of Cr atoms and the number of B atoms reaching the substrate (Cr / B transport ratio) and the acceleration of irradiation ions. This is done by appropriately combining conditions such as energy. Cr
The / B transport ratio can be controlled by monitoring the vapor deposition amounts of chromium and boron on the substrate using a film thickness monitor such as a crystal oscillator film thickness monitor.
【0020】なお、前記ホウ化クロム膜形成及び窒素イ
オン注入層形成におけるイオン照射時の、磁気ヘッド基
体へのイオン入射角度は特に限定されず、基体を回転さ
せながら成膜を行ってもよい。イオン源の方式も特に限
定は無く、例えばカウフマン型、バケット型等のものが
考えられる。さらに、熱的なダメージを充分に避けなけ
ればならない基体については基体ホルダを冷却すること
で基体を冷却させながらホウ化クロム膜形成及び窒素イ
オン注入層形成を行うのが好ましい。The ion incident angle on the magnetic head substrate during ion irradiation in forming the chromium boride film and forming the nitrogen ion-implanted layer is not particularly limited, and the film may be formed while rotating the substrate. The method of the ion source is not particularly limited, and for example, Kauffman type, bucket type, etc. are conceivable. Further, for a substrate for which thermal damage must be sufficiently avoided, it is preferable to cool the substrate by cooling the substrate holder to form the chromium boride film and the nitrogen ion implantation layer.
【0021】[0021]
【作用】本発明の磁気ヘッドによると、磁気ヘッド基体
の磁気記録媒体との摺動面上にホウ化クロム膜が形成さ
れている。ホウ化クロム膜は、摩擦係数が小さいため、
磁気記録媒体との摺動がスムーズに行われると共に、過
大な摩擦熱を発生して磁気ヘッド及び記録媒体のそれぞ
れの摺動面に損傷を与えることがない。また、ホウ化ク
ロムは高硬度であり、また靱性が良好であるため記録媒
体との摺動時に該膜中にクラックが生じ難く、これらに
より磁気ヘッド基体のホウ化クロム膜形成面は耐摩耗性
に優れる。さらにホウ化クロムは化学的安定性に優れる
ため、ホウ化クロム膜形成面は多様な環境下においても
変性し難く、耐食性に優れる。According to the magnetic head of the present invention, the chromium boride film is formed on the sliding surface of the magnetic head substrate with respect to the magnetic recording medium. Chromium boride film has a small friction coefficient,
Sliding with the magnetic recording medium is performed smoothly, and excessive frictional heat is not generated to damage the sliding surfaces of the magnetic head and the recording medium. In addition, since chromium boride has high hardness and good toughness, cracks are less likely to occur in the film when sliding on a recording medium, which makes the surface of the magnetic head substrate on which the chromium boride film is formed resistant to wear. Excellent in. Further, since chromium boride has excellent chemical stability, the surface on which the chromium boride film is formed is not easily modified even under various environments, and has excellent corrosion resistance.
【0022】また、前記磁気ヘッド基体が、ホウ化クロ
ム膜との界面部分に窒素イオンが注入された層を有する
ときには、該基体自体の硬度及び化学的安定性が優れた
ものとなり、さらにその上に耐摩耗性及び耐食性の点で
優れたホウ化クロム膜が形成されているので、全体とし
て、耐摩耗性、耐食性が一層優れたものとなる。本発明
の磁気ヘッドの製造方法によると、磁気ヘッド基体の磁
気記録媒体との摺動面上にホウ化クロム膜が形成され
る。これにより照射イオンと膜構成原子であるCr原子
及びB原子とが衝突し、該原子が反跳して該基体中に押
し込まれると共に、基体構成原子が該基体からはじき出
され、該膜と該基体との界面に該両者の構成原子からな
る混合層が形成される。その結果、高硬度で靱性及び化
学的安定性に優れるホウ化クロム膜の基体に対する密着
性が向上し、該膜で被覆された磁気ヘッドは、耐摩耗性
が優れ、摩擦係数が小さく、耐食性に優れたものとな
る。また、比較的低温下で成膜を行うことができるた
め、磁気ヘッド基体に与える熱損傷が少ない。When the magnetic head substrate has a layer in which nitrogen ions are implanted at the interface with the chromium boride film, the substrate itself has excellent hardness and chemical stability. Since the chromium boride film having excellent wear resistance and corrosion resistance is formed on the surface, the wear resistance and the corrosion resistance are further improved as a whole. According to the method of manufacturing the magnetic head of the present invention, the chromium boride film is formed on the sliding surface of the magnetic head substrate with respect to the magnetic recording medium. As a result, the irradiated ions collide with the Cr atoms and B atoms that are the film-constituting atoms, the atoms recoil and are pushed into the substrate, and the substrate-constituting atoms are repelled from the substrate, and the film and the substrate. A mixed layer composed of the constituent atoms of the both is formed at the interface with. As a result, the adhesion of the chromium boride film having high hardness and excellent toughness and chemical stability to the substrate is improved, and the magnetic head covered with the film has excellent wear resistance, a small friction coefficient, and corrosion resistance. It will be excellent. Further, since the film formation can be performed at a relatively low temperature, the heat damage to the magnetic head substrate is small.
【0023】また、前記ホウ化クロム膜形成に先立ち、
前記磁気ヘッド基体の記録媒体との摺動面上へ窒素イオ
ンを照射することにより、該基体の前記ホウ化クロム膜
との界面部分に窒素イオンが注入された層を形成してお
くときには、該基体自体の記録媒体との摺動面の硬度及
び化学的安定性が向上し、そのため全体として耐摩耗性
及び耐食性が一層向上する。Prior to the formation of the chromium boride film,
When a layer in which nitrogen ions are implanted is formed in the interface portion of the substrate with the chromium boride film by irradiating the surface of the magnetic head substrate sliding with the recording medium with nitrogen ions, The hardness and chemical stability of the sliding surface of the substrate itself with respect to the recording medium are improved, and therefore the wear resistance and the corrosion resistance are further improved as a whole.
【0024】[0024]
【実施例】以下、本発明の実施例を図面を参照して説明
する。図1は本発明の第1の磁気ヘッドの1例の一部の
拡大断面図であり、図2は本発明の第2の磁気ヘッドの
1例の一部の拡大断面図である。図3は図1及び図2に
示す磁気ヘッドの製造に用いる成膜装置の概略構成を示
したものである。Embodiments of the present invention will be described below with reference to the drawings. 1 is an enlarged sectional view of a part of an example of a first magnetic head of the present invention, and FIG. 2 is an enlarged sectional view of a part of an example of a second magnetic head of the present invention. FIG. 3 shows a schematic structure of a film forming apparatus used for manufacturing the magnetic head shown in FIGS.
【0025】図3に示す装置は、真空容器4を有し、容
器4内には、磁気ヘッドの基体Sを支持するホルダ5が
設置され、ホルダ5に対向する位置にCr元素含有物質
を蒸発させる蒸発源61、B元素含有物質を蒸発させる
蒸発源62及びイオン源7が設置されている。また、ホ
ルダ5近傍には基体S上に蒸着されるB原子の個数を測
定するための膜厚モニタ81、基体S上に蒸着されるB
原子の個数を測定するための膜厚モニタ82、基体S上
に照射されるイオンの個数を測定するためのイオン電流
測定器9が設置されている。また、容器4内は排気装置
41にて所望の真空度とされ得る。膜厚モニタ81、8
2はここでは水晶振動子式膜厚モニタであり、イオン電
流測定器9はここではファラデーカップである。The apparatus shown in FIG. 3 has a vacuum container 4, in which a holder 5 for supporting a substrate S of a magnetic head is installed, and a Cr element-containing substance is evaporated at a position facing the holder 5. An evaporation source 61 for evaporating, an evaporation source 62 for evaporating a B element-containing substance, and an ion source 7 are installed. Further, in the vicinity of the holder 5, a film thickness monitor 81 for measuring the number of B atoms deposited on the substrate S, and B deposited on the substrate S.
A film thickness monitor 82 for measuring the number of atoms and an ion current measuring device 9 for measuring the number of ions irradiated on the substrate S are installed. Further, the inside of the container 4 can be made to have a desired vacuum degree by the exhaust device 41. Film thickness monitor 81, 8
2 is a crystal oscillator type film thickness monitor here, and the ion current measuring device 9 is a Faraday cup here.
【0026】本発明による第1の磁気ヘッドを作成する
に当たっては、まず基体Sを、その磁気記録媒体との摺
動面を蒸発源61、62及びイオン源7の方に向けるよ
うにしてホルダ5に支持させた後、真空容器4内を所定
の真空度にする。その後、基体Sに蒸発源61を用い
て、Cr元素含有物質61aを真空蒸着又はスパッタ蒸
着させると共に蒸発源62を用いて同様にしてB元素含
有物質62aを真空蒸着又はスパッタ蒸着させる。In producing the first magnetic head according to the present invention, first, the holder 5 is arranged so that the sliding surface of the substrate S with respect to the magnetic recording medium faces the evaporation sources 61, 62 and the ion source 7. Then, the inside of the vacuum container 4 is brought to a predetermined vacuum degree. Thereafter, the evaporation source 61 is used for the substrate S to vacuum-deposit or sputter-deposit the Cr element-containing substance 61a, and the evaporation source 62 is similarly used to similarly vacuum-deposit or sputter-deposit the B element-containing substance 62a.
【0027】このCr元素含有物質61a及びB元素含
有物質62aの真空蒸着(或いはスパッタ蒸着)と同
時、交互、又は蒸着後に、イオン源7より不活性ガスイ
オン7aを当該蒸着面に照射する。イオン7a照射時の
イオン加速エネルギは0.05keV以上20keV以
下とする。ホウ化クロム膜S1中のホウ化クロム分子の
Cr原子数とB原子数の比の制御は、Cr/B輸送比及
びイオン7aの加速エネルギの条件を適宜組み合わせる
ことにより行う。Cr/B輸送比の制御は、膜厚モニタ
81、82を用いて基体S上へのクロム61a及びホウ
素62bの蒸着量をモニタすることで行う。Simultaneously with, or alternately with, or after the vacuum vapor deposition (or sputter vapor deposition) of the Cr element-containing substance 61a and the B element-containing substance 62a, the vapor deposition surface is irradiated with the inert gas ions 7a from the ion source 7. The ion acceleration energy during irradiation of the ions 7a is set to 0.05 keV or more and 20 keV or less. The ratio of the number of Cr atoms to the number of B atoms of the chromium boride molecules in the chromium boride film S1 is controlled by appropriately combining the conditions of Cr / B transport ratio and the acceleration energy of the ions 7a. The Cr / B transport ratio is controlled by monitoring the vapor deposition amounts of chromium 61a and boron 62b on the substrate S using the film thickness monitors 81 and 82.
【0028】以上に述べた成膜操作により、図1に示す
ように、磁気ヘッド基体Sから最も離れた外側にホウ化
クロム膜S1が形成され、基体Sとホウ化クロム膜S1
の界面に該両者の混合層S2が形成された本発明の第1
の磁気ヘッドが得られる。本発明の第1の磁気ヘッドに
おいて、ホウ化クロム膜S1は摩擦係数が低く、高硬度
で、靱性及び化学的安定性に優れる。また、基体Sとホ
ウ化クロム膜S1との界面に該両者の構成原子からなる
混合層S2が形成されるため、膜S1の基体Sに対する
密着性は良好なものとなる。これらのことから本発明の
第1の磁気ヘッドは、摩擦係数が低く、耐摩耗性及び耐
食性に優れたものとなる。また、前記の方法によると比
較的低温下で成膜を行うことができるため、基体Sに与
える熱損傷が少なくて済む。By the film forming operation described above, as shown in FIG. 1, the chromium boride film S1 is formed on the outermost side from the magnetic head substrate S, and the substrate S and the chromium boride film S1 are formed.
The first aspect of the present invention in which the mixed layer S2 of the both is formed at the interface of
The magnetic head of In the first magnetic head of the present invention, the chromium boride film S1 has a low friction coefficient, high hardness, and excellent toughness and chemical stability. Further, since the mixed layer S2 composed of the constituent atoms of the two is formed at the interface between the substrate S and the chromium boride film S1, the adhesion of the film S1 to the substrate S becomes good. From these facts, the first magnetic head of the present invention has a low friction coefficient and is excellent in wear resistance and corrosion resistance. Further, according to the method described above, the film formation can be performed at a relatively low temperature, so that the heat damage to the substrate S can be reduced.
【0029】また、本発明の第2の磁気ヘッドを作成す
るに当たっては、まず基体Sをホルダ5に支持させた
後、真空容器4内を所定の真空度にする。次いで、基体
Sに対しイオン源7より窒素イオン7bを照射する。こ
のようにして図2に示すように基体Sの表面部分に窒素
イオン注入層S3が形成される。その後、前記の本発明
の第1の磁気ヘッドの作成時と同様にして基体Sに蒸発
源61を用いて、Cr元素含有物質61aを真空蒸着又
はスパッタ蒸着させると共に蒸発源62を用いて同様に
してB元素含有物質62aを真空蒸着又はスパッタ蒸着
させる。このCr元素含有物質61a及びB元素含有物
質62aの蒸着と同時、交互、又は蒸着後に、イオン源
7より不活性ガスイオン7aを当該蒸着面に照射する。
窒素イオン7b照射時のイオン加速エネルギは0.05
keV以上20keV以下とする。また窒素イオン7b
の照射量は1×1014個/cm2 以上1×1018個/c
m2以下とする。イオン7b照射量の制御は、イオン電
流測定器9を用いて基体Sへのイオン照射量をモニタす
ることで行う。Further, in producing the second magnetic head of the present invention, first, the substrate S is supported by the holder 5, and then the inside of the vacuum container 4 is brought to a predetermined vacuum degree. Next, the substrate S is irradiated with nitrogen ions 7b from the ion source 7. In this way, the nitrogen ion-implanted layer S3 is formed on the surface portion of the substrate S as shown in FIG. After that, the evaporation source 61 is used for the substrate S, the Cr element-containing substance 61a is vacuum-deposited or sputter-deposited, and the evaporation source 62 is used in the same manner as when the first magnetic head of the present invention is formed. The B element-containing substance 62a is vacuum-deposited or sputter-deposited. Simultaneously with, or alternately with, or after vapor deposition of the Cr element-containing substance 61a and the B element-containing substance 62a, the vapor deposition surface is irradiated with the inert gas ions 7a from the ion source 7.
The ion acceleration energy during irradiation of nitrogen ions 7b is 0.05.
It is set to not less than keV and not more than 20 keV. Also nitrogen ion 7b
The irradiation dose is 1 × 10 14 pieces / cm 2 or more 1 × 10 18 pieces / c
m 2 or less. The control of the dose of ions 7b is performed by monitoring the dose of ions applied to the substrate S using the ion current measuring device 9.
【0030】以上に述べた成膜操作により、図2に示す
ように、磁気ヘッド基体Sの表面部分に窒素イオン注入
層S3が形成され、基体Sから最も離れた外側にホウ化
クロム膜S1が形成され、窒素イオン注入層S3とホウ
化クロム膜S1との界面に該両者の混合層S4が形成さ
れた本発明の第2の磁気ヘッドが得られる。本発明の第
2の磁気ヘッドは、基体Sの表面部分に窒素イオン注入
層S3が形成されていることにより、基体S自体の硬度
及び化学的安定性が向上し、磁気ヘッド全体の耐摩耗性
及び耐食性が一層優れたものとなる。By the film forming operation described above, as shown in FIG. 2, the nitrogen ion implantation layer S3 is formed on the surface portion of the magnetic head substrate S, and the chromium boride film S1 is formed on the outermost side from the substrate S. A second magnetic head according to the present invention is obtained in which a mixed layer S4 of the nitrogen ion-implanted layer S3 and the chromium boride film S1 is formed at the interface. In the second magnetic head of the present invention, since the nitrogen ion implantation layer S3 is formed on the surface portion of the substrate S, the hardness and chemical stability of the substrate S itself are improved, and the wear resistance of the entire magnetic head is improved. And the corrosion resistance is further improved.
【0031】次に図3に示す装置による本発明の磁気ヘ
ッドの製造の具体例と、それによって得られる磁気ヘッ
ドについて説明する。 実験例1 磁気記録媒体との摺動面にマンガン(Mn)−亜鉛(Z
n)フェライトよりなる磁性体コア部分及びガラスより
なる非磁性体部分が露出したVTR用の磁気ヘッド基体
Sを基体ホルダ5上に設置し、真空容器1内を5×10
-7Torrの真空度とした。その後、基体Sに対し、C
rペレット61aを電子ビーム蒸発源61を用いて蒸着
させると共に、Bペレット62aを電子ビーム蒸発源6
2を用いて蒸着させた。それと同時にイオン源7にAr
ガスを容器4内が5×10-5Torrになるまで導入
し、イオン化させ、Arイオン7aを0.5keVの加
速エネルギで基体Sに立てた法線に対し0°の角度で基
体Sに照射し、基体Sから最も離れた外側に膜厚300
Åのホウ化クロム膜S1を形成し、これに伴い、基体S
と膜S1との界面に該両者の混合層S2を形成した。Next, a specific example of manufacturing the magnetic head of the present invention by the apparatus shown in FIG. 3 and a magnetic head obtained thereby will be described. Experimental Example 1 Manganese (Mn) -zinc (Z
n) A magnetic head substrate S for a VTR in which a magnetic core portion made of ferrite and a non-magnetic material portion made of glass are exposed is placed on a substrate holder 5, and the inside of the vacuum container 1 is set to 5 × 10.
The degree of vacuum was −7 Torr. Then, for the substrate S, C
The r pellet 61a is vapor-deposited using the electron beam evaporation source 61, and the B pellet 62a is evaporated.
2 was used for vapor deposition. At the same time, Ar is applied to the ion source 7.
Gas is introduced until the inside of the container 4 reaches 5 × 10 −5 Torr, ionized, and the Ar ions 7a are irradiated onto the substrate S at an angle of 0 ° with respect to the normal line to the substrate S at an acceleration energy of 0.5 keV. Then, a film thickness of 300 is formed on the outermost side from the substrate S.
A Å chromium boride film S1 is formed, and along with this, the substrate S
A mixed layer S2 of the two was formed at the interface between the film and the film S1.
【0032】なお、基体S上へのCr及びBの蒸着量の
比がCr:B=1:2になるよう制御し、ホウ化クロム
膜S1をCrB2 からなる膜とした。また、Arイオン
照射量とCr及びBの蒸着量の総和との比がイオン照射
量:蒸着量=1:2になるよう制御した。 実験例2 実験例1において、磁気ヘッド基体Sとして、磁気記録
媒体との摺動面にパーマロイよりなる磁性体コア部分及
び樹脂よりなる非磁性体部分が露出した音声用磁気ヘッ
ドを採用し、その他の条件は実験例1と同様にして基体
Sから最も離れた外側に膜厚500ÅのCrB2 からな
るホウ化クロム膜S1を形成し、これに伴い基体Sと膜
S1との界面に該両者の混合層S2を形成した。 実験例3 実験例1と同様のVTR用の磁気ヘッド基体Sを基体ホ
ルダ5上に設置し、容器1内を5×10-7Torrの真
空度とした。次いでイオン源7に窒素(N2 )ガスを容
器4内が5×10-5Torrになるまで導入し、イオン
化させ、窒素イオン7bを1keVの加速エネルギで、
基体Sに立てた法線に対し0°の角度で基体Sに照射し
た。このようにして基体S表面部分に窒素イオン注入層
S3を形成した。なお、単位面積当たりの窒素イオン7
bの照射量を1×1016個/cm 2 とした。The deposition amount of Cr and B on the substrate S
Control so that the ratio becomes Cr: B = 1: 2, and chromium boride is used.
Membrane S1 is CrB2The film was made of. Also, Ar ion
The ratio of the irradiation amount to the total amount of Cr and B deposited is determined by ion irradiation.
Amount: evaporation amount = 1: 2 was controlled. Experimental Example 2 In Experimental Example 1, magnetic recording was performed as the magnetic head substrate S.
The magnetic core made of Permalloy and the sliding surface with the medium
And a magnetic head for audio with a non-magnetic part made of resin exposed
Other conditions are the same as in Experimental Example 1
CrB with a film thickness of 500Å on the outermost side from S2Empty
A chromium boride film S1 is formed, and along with this, the substrate S and the film are formed.
A mixed layer S2 of the both was formed at the interface with S1. Experimental Example 3 A magnetic head substrate S for VTR similar to that in Experimental Example 1 was used as a substrate substrate.
Installed on the Ruda 5 and the inside of the container 1 is 5 × 10-7True of Torr
It was vacant. Next, nitrogen (N2) Gas
5 × 10 inside the container 4-FiveIntroduce ion until it becomes Torr
The nitrogen ion 7b at an acceleration energy of 1 keV,
Irradiate the substrate S at an angle of 0 ° with respect to the normal line to the substrate S.
Was. In this way, the nitrogen ion-implanted layer is formed on the surface of the substrate S.
S3 was formed. In addition, nitrogen ions per unit area 7
The dose of b is 1 × 1016Pieces / cm 2And
【0033】次いで、実験例1と同様にして基体Sから
最も離れた外側に膜厚300ÅのCrB2 からなるホウ
化クロム膜S1を形成し、それに伴い窒素イオン注入層
S3と膜S1との界面に該両者の混合層S4を形成し
た。次に、実験例1による磁気ヘッド及びホウ化クロム
膜で被覆していない磁気ヘッド基体Sを用い、ガンマ酸
化鉄、コバルト酸化鉄及び二酸化クロムの合金からなる
膜で被覆されたVTR用テープを500時間走行させ
た。その後、該両者のVTR用テープとの摺動面の摩耗
量を測定したところ、実験例1による磁気ヘッドでは実
質上摩耗していなかったのに対し、ホウ化クロム膜で被
覆していない磁気ヘッド基体Sでは15μmの厚さ分摩
耗していた。また、実験例1による磁気ヘッドはVTR
用テープ走行後に該テープ構成物質の凝着は見られなか
った。なお、テープ走行は温度25℃、湿度60%の環
境下で行った。Then, in the same manner as in Experimental Example 1, a chromium boride film S1 made of CrB 2 having a film thickness of 300 Å is formed on the outermost side from the substrate S, and the interface between the nitrogen ion-implanted layer S3 and the film S1 is accordingly formed. Then, a mixed layer S4 of the both was formed. Next, using the magnetic head according to Experimental Example 1 and the magnetic head substrate S not coated with the chromium boride film, 500 tapes for VTR coated with a film made of an alloy of gamma iron oxide, cobalt iron oxide and chromium dioxide were used. I ran for hours. After that, when the amount of wear of the sliding surface between the both VTR tapes was measured, it was found that the magnetic head according to Experimental Example 1 was not substantially worn, whereas the magnetic head not coated with a chromium boride film was used. The substrate S was worn by a thickness of 15 μm. Further, the magnetic head according to Experimental Example 1 is a VTR.
No adhesion of the constituent materials of the tape was observed after running the tape. The tape was run in an environment of a temperature of 25 ° C. and a humidity of 60%.
【0034】次に、実験例2による磁気ヘッド及びホウ
化クロム膜で被覆していない磁気ヘッド基体Sを用い、
ガンマ酸化鉄からなる膜で被覆されたカセットテープを
500時間走行させた。その後、該両者のカセットテー
プとの摺動面の摩耗量を測定したところ、実験例2によ
る磁気ヘッドでは実質上摩耗していなかったのに対し、
ホウ化クロム膜で被覆していない磁気ヘッド基体Sでは
20μmの厚さ分摩耗していた。また、実験例2による
磁気ヘッドはカセットテープ走行後に該テープの構成物
質の凝着は見られなかった。なお、テープ走行は温度2
5℃、湿度60%の環境下で行った。Next, using the magnetic head according to Experimental Example 2 and the magnetic head substrate S not covered with the chromium boride film,
A cassette tape coated with a film made of gamma iron oxide was run for 500 hours. After that, when the amount of wear of the sliding surface between the both cassette tapes was measured, it was found that the magnetic head of Experimental Example 2 was not substantially worn.
The magnetic head substrate S not covered with the chromium boride film was worn by a thickness of 20 μm. Further, in the magnetic head according to Experimental Example 2, no adhesion of constituent materials of the tape was observed after running the cassette tape. The temperature of tape running is 2
It was performed in an environment of 5 ° C. and a humidity of 60%.
【0035】次に、実験例1及び3による磁気ヘッドを
用い、ガンマ酸化鉄、コバルト酸化鉄及び二酸化クロム
の合金からなる膜で被覆されたVTR用テープを100
0時間走行させた。その後、該両者のテープとの摺動面
の摩擦量を測定したところ、実験例1による磁気ヘッド
では150Å(0.015μm)の厚さ分摩耗していた
のに対し、実験例3による磁気ヘッドでは100Å
(0.01μm)の厚さ分摩耗していた。また、実験例
1、3による磁気ヘッドはVTR用テープ走行後に該テ
ープ構成物質の凝着は見られなかった。なお、テープ走
行は温度25℃、湿度60%の環境下で行った。Next, using the magnetic heads of Experimental Examples 1 and 3, 100 VTR tapes coated with a film made of an alloy of gamma iron oxide, cobalt iron oxide and chromium dioxide were used.
I ran for 0 hours. After that, when the amount of friction of the sliding surface between the both tapes was measured, the magnetic head according to Experimental Example 1 was worn by a thickness of 150 Å (0.015 μm), whereas the magnetic head according to Experimental Example 3 was worn. Then 100Å
It was worn out by a thickness of (0.01 μm). Further, in the magnetic heads of Experimental Examples 1 and 3, no adhesion of the tape constituent substances was observed after running the VTR tape. The tape was run in an environment of a temperature of 25 ° C. and a humidity of 60%.
【0036】以上の結果、本発明の第1及び第2の磁気
ヘッドは、高硬度で靱性に優れるホウ化クロム膜S1が
基体S上へ密着性良好に被覆されることにより、基体S
に比べて耐摩耗性が向上していることが分かる。また、
ホウ化クロム膜S1表面は比較的高湿度の環境下におい
ても、変性せずに保護膜としての機能を維持し、耐食性
に優れていることが分かる。また、テープ走行後にホウ
化クロム膜S1表面に該テープ構成物質の凝着が見られ
ず、摩擦係数が低いことが分かる。As a result of the above, in the first and second magnetic heads of the present invention, since the chromium boride film S1 having high hardness and excellent toughness is coated on the substrate S with good adhesion,
It can be seen that the wear resistance is improved as compared with. Also,
It can be seen that the surface of the chromium boride film S1 maintains the function as a protective film without denaturation even under an environment of relatively high humidity and is excellent in corrosion resistance. Further, no adhesion of the tape-constituting substance was observed on the surface of the chromium boride film S1 after running the tape, indicating that the friction coefficient was low.
【0037】また本発明の第2の磁気ヘッドは、磁気ヘ
ッド基体S自体のテープとの摺動面に窒素イオン注入層
S3が形成されていることにより第1の磁気ヘッドより
一層耐摩耗性が向上していることが分かる。The second magnetic head of the present invention has the nitrogen ion-implanted layer S3 formed on the sliding surface of the magnetic head substrate S itself with the tape, so that the second magnetic head has more wear resistance than the first magnetic head. You can see that it is improving.
【0038】[0038]
【発明の効果】本発明によると、磁気記録媒体との摺動
面が、耐摩耗性に優れ、摩擦係数が小さく、多様な環境
下においても耐食性に優れる磁気ヘッド及びその製造方
法を提供することができる。According to the present invention, there is provided a magnetic head whose sliding surface with respect to a magnetic recording medium has excellent wear resistance, a small friction coefficient, and excellent corrosion resistance even under various environments, and a method for manufacturing the same. You can
【図1】本発明の1実施例である磁気ヘッドの一部の拡
大断面図である。FIG. 1 is an enlarged sectional view of a part of a magnetic head according to an embodiment of the present invention.
【図2】本発明の他の実施例である磁気ヘッドの一部の
拡大断面図である。FIG. 2 is an enlarged cross-sectional view of a part of a magnetic head according to another embodiment of the present invention.
【図3】図1、2に示す磁気ヘッドの製造に用いる成膜
装置の概略構成を示す図である。FIG. 3 is a diagram showing a schematic configuration of a film forming apparatus used for manufacturing the magnetic head shown in FIGS.
【図4】従来の磁気ヘッドの主要部分の概略を示す図で
ある。FIG. 4 is a diagram showing an outline of a main part of a conventional magnetic head.
1 磁気ヘッドのコア部 11 コア 12 書込みコイル 13 読取りコイル 14 非磁性スペーサ 4 真空容器 41 排気装置 5 基体ホルダ 61、62 蒸発源 61a、62a 蒸発物質 7 イオン源 7a、7b イオン 8a、8b 膜厚モニタ 9 イオン電流測定器 S 磁気ヘッド基体 S1 ホウ化クロム膜 S2、S4 混合層 S3 磁気ヘッドSにおける窒素イオン注入層 DESCRIPTION OF SYMBOLS 1 Core part of magnetic head 11 Core 12 Writing coil 13 Reading coil 14 Nonmagnetic spacer 4 Vacuum container 41 Exhaust device 5 Substrate holder 61,62 Evaporation source 61a, 62a Evaporation substance 7 Ion source 7a, 7b Ion 8a, 8b Film thickness monitor 9 Ion current measuring device S Magnetic head substrate S1 Chromium boride film S2, S4 Mixed layer S3 Nitrogen ion implantation layer in magnetic head S
Claims (4)
面上にホウ化クロム膜が形成されたことを特徴とする磁
気ヘッド。1. A magnetic head comprising a chromium boride film formed on a sliding surface of a magnetic head substrate with respect to a magnetic recording medium.
膜との界面部分に窒素イオンが注入された層を有する請
求項1記載の磁気ヘッド。2. The magnetic head according to claim 1, wherein a nitrogen ion-implanted layer is provided in an interface portion of the magnetic head substrate with the chromium boride film.
面上へクロム及びホウ素を蒸着させると同時、交互、又
は該蒸着後に、不活性ガスイオンを該蒸着面上に照射し
てホウ化クロム膜を形成させることを特徴とする磁気ヘ
ッドの製造方法。3. Chromium and boron are vapor-deposited on the sliding surface of the magnetic head substrate with respect to the magnetic recording medium, at the same time, alternately or after the vapor deposition, inert gas ions are irradiated onto the vapor-deposited surface to form boride. A method of manufacturing a magnetic head, which comprises forming a chromium film.
膜形成に先立ち、該基体の磁気記録媒体との摺動面上へ
窒素イオンを照射することにより、該基体の前記ホウ化
クロム膜との界面部分に窒素イオンが注入された層を形
成する請求項3記載の磁気ヘッドの製造方法。4. Prior to forming a chromium boride film on the magnetic head substrate, the surface of the substrate sliding with the magnetic recording medium is irradiated with nitrogen ions to form a chromium boride film on the substrate. 4. The method of manufacturing a magnetic head according to claim 3, wherein a layer in which nitrogen ions are implanted is formed at an interface portion of the magnetic head.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP25820594A JPH08124112A (en) | 1994-10-24 | 1994-10-24 | Magnetic head and its production |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP25820594A JPH08124112A (en) | 1994-10-24 | 1994-10-24 | Magnetic head and its production |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH08124112A true JPH08124112A (en) | 1996-05-17 |
Family
ID=17316977
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP25820594A Withdrawn JPH08124112A (en) | 1994-10-24 | 1994-10-24 | Magnetic head and its production |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH08124112A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6494461B1 (en) * | 1998-08-24 | 2002-12-17 | Nippon Piston Ring Co., Ltd. | Sliding member |
-
1994
- 1994-10-24 JP JP25820594A patent/JPH08124112A/en not_active Withdrawn
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6494461B1 (en) * | 1998-08-24 | 2002-12-17 | Nippon Piston Ring Co., Ltd. | Sliding member |
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