JPH0730147B2 - Curable resin composition - Google Patents
Curable resin compositionInfo
- Publication number
- JPH0730147B2 JPH0730147B2 JP1795993A JP1795993A JPH0730147B2 JP H0730147 B2 JPH0730147 B2 JP H0730147B2 JP 1795993 A JP1795993 A JP 1795993A JP 1795993 A JP1795993 A JP 1795993A JP H0730147 B2 JPH0730147 B2 JP H0730147B2
- Authority
- JP
- Japan
- Prior art keywords
- parts
- resin composition
- general formula
- heat
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000011342 resin composition Substances 0.000 title claims description 9
- 239000000126 substance Substances 0.000 claims description 9
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 7
- 150000004945 aromatic hydrocarbons Chemical class 0.000 claims description 5
- 238000010894 electron beam technology Methods 0.000 claims description 5
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 5
- 239000003504 photosensitizing agent Substances 0.000 claims description 5
- 239000007870 radical polymerization initiator Substances 0.000 claims description 5
- 239000003999 initiator Substances 0.000 claims description 4
- -1 hydroxyalkyl acrylate Chemical compound 0.000 description 11
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 8
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 6
- KMNCBSZOIQAUFX-UHFFFAOYSA-N 2-ethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)C(=O)C1=CC=CC=C1 KMNCBSZOIQAUFX-UHFFFAOYSA-N 0.000 description 5
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 5
- CNCOEDDPFOAUMB-UHFFFAOYSA-N N-Methylolacrylamide Chemical compound OCNC(=O)C=C CNCOEDDPFOAUMB-UHFFFAOYSA-N 0.000 description 5
- 239000003795 chemical substances by application Substances 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 5
- 238000001723 curing Methods 0.000 description 5
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 150000002148 esters Chemical class 0.000 description 4
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 239000002841 Lewis acid Substances 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- JDVIRCVIXCMTPU-UHFFFAOYSA-N ethanamine;trifluoroborane Chemical compound CCN.FB(F)F JDVIRCVIXCMTPU-UHFFFAOYSA-N 0.000 description 3
- 150000007517 lewis acids Chemical class 0.000 description 3
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 3
- 229910052753 mercury Inorganic materials 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 238000010526 radical polymerization reaction Methods 0.000 description 3
- 238000007151 ring opening polymerisation reaction Methods 0.000 description 3
- QEQBMZQFDDDTPN-UHFFFAOYSA-N (2-methylpropan-2-yl)oxy benzenecarboperoxoate Chemical compound CC(C)(C)OOOC(=O)C1=CC=CC=C1 QEQBMZQFDDDTPN-UHFFFAOYSA-N 0.000 description 2
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 2
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 2
- NXXYKOUNUYWIHA-UHFFFAOYSA-N 2,6-Dimethylphenol Chemical compound CC1=CC=CC(C)=C1O NXXYKOUNUYWIHA-UHFFFAOYSA-N 0.000 description 2
- RSWGJHLUYNHPMX-UHFFFAOYSA-N Abietic-Saeure Natural products C12CCC(C(C)C)=CC2=CCC2C1(C)CCCC2(C)C(O)=O RSWGJHLUYNHPMX-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- 229910015900 BF3 Inorganic materials 0.000 description 2
- 239000004342 Benzoyl peroxide Substances 0.000 description 2
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- KHPCPRHQVVSZAH-HUOMCSJISA-N Rosin Natural products O(C/C=C/c1ccccc1)[C@H]1[C@H](O)[C@@H](O)[C@@H](O)[C@@H](CO)O1 KHPCPRHQVVSZAH-HUOMCSJISA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 2
- 235000019400 benzoyl peroxide Nutrition 0.000 description 2
- WGQKYBSKWIADBV-UHFFFAOYSA-N benzylamine Chemical compound NCC1=CC=CC=C1 WGQKYBSKWIADBV-UHFFFAOYSA-N 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- LSXWFXONGKSEMY-UHFFFAOYSA-N di-tert-butyl peroxide Chemical compound CC(C)(C)OOC(C)(C)C LSXWFXONGKSEMY-UHFFFAOYSA-N 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 239000000976 ink Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- DNTMQTKDNSEIFO-UHFFFAOYSA-N n-(hydroxymethyl)-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NCO DNTMQTKDNSEIFO-UHFFFAOYSA-N 0.000 description 2
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 2
- 150000001451 organic peroxides Chemical class 0.000 description 2
- 239000003973 paint Substances 0.000 description 2
- CTRLRINCMYICJO-UHFFFAOYSA-N phenyl azide Chemical compound [N-]=[N+]=NC1=CC=CC=C1 CTRLRINCMYICJO-UHFFFAOYSA-N 0.000 description 2
- 238000000016 photochemical curing Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 2
- 239000002966 varnish Substances 0.000 description 2
- DHKHKXVYLBGOIT-UHFFFAOYSA-N 1,1-Diethoxyethane Chemical compound CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 1
- MSAHTMIQULFMRG-UHFFFAOYSA-N 1,2-diphenyl-2-propan-2-yloxyethanone Chemical compound C=1C=CC=CC=1C(OC(C)C)C(=O)C1=CC=CC=C1 MSAHTMIQULFMRG-UHFFFAOYSA-N 0.000 description 1
- BGJQNPIOBWKQAW-UHFFFAOYSA-N 1-tert-butylanthracene-9,10-dione Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=CC=C2C(C)(C)C BGJQNPIOBWKQAW-UHFFFAOYSA-N 0.000 description 1
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 1
- XMNIXWIUMCBBBL-UHFFFAOYSA-N 2-(2-phenylpropan-2-ylperoxy)propan-2-ylbenzene Chemical compound C=1C=CC=CC=1C(C)(C)OOC(C)(C)C1=CC=CC=C1 XMNIXWIUMCBBBL-UHFFFAOYSA-N 0.000 description 1
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 1
- FRIBMENBGGCKPD-UHFFFAOYSA-N 3-(2,3-dimethoxyphenyl)prop-2-enal Chemical compound COC1=CC=CC(C=CC=O)=C1OC FRIBMENBGGCKPD-UHFFFAOYSA-N 0.000 description 1
- PYSRRFNXTXNWCD-UHFFFAOYSA-N 3-(2-phenylethenyl)furan-2,5-dione Chemical compound O=C1OC(=O)C(C=CC=2C=CC=CC=2)=C1 PYSRRFNXTXNWCD-UHFFFAOYSA-N 0.000 description 1
- PQXPAFTXDVNANI-UHFFFAOYSA-N 4-azidobenzoic acid Chemical compound OC(=O)C1=CC=C(N=[N+]=[N-])C=C1 PQXPAFTXDVNANI-UHFFFAOYSA-N 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- 239000004641 Diallyl-phthalate Substances 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 238000004566 IR spectroscopy Methods 0.000 description 1
- YIVJZNGAASQVEM-UHFFFAOYSA-N Lauroyl peroxide Chemical compound CCCCCCCCCCCC(=O)OOC(=O)CCCCCCCCCCC YIVJZNGAASQVEM-UHFFFAOYSA-N 0.000 description 1
- 229920000459 Nitrile rubber Polymers 0.000 description 1
- 244000028419 Styrax benzoin Species 0.000 description 1
- 235000000126 Styrax benzoin Nutrition 0.000 description 1
- 229920000147 Styrene maleic anhydride Polymers 0.000 description 1
- 235000008411 Sumatra benzointree Nutrition 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- ATLHPJVMSPHFLN-UHFFFAOYSA-K [F-].[F-].[F-].N1CCCCC1.[B+3] Chemical compound [F-].[F-].[F-].N1CCCCC1.[B+3] ATLHPJVMSPHFLN-UHFFFAOYSA-K 0.000 description 1
- XUGUHTGSMPZQIW-UHFFFAOYSA-N [[4-(4-diazonioiminocyclohexa-2,5-dien-1-ylidene)cyclohexa-2,5-dien-1-ylidene]hydrazinylidene]azanide Chemical group C1=CC(N=[N+]=[N-])=CC=C1C1=CC=C(N=[N+]=[N-])C=C1 XUGUHTGSMPZQIW-UHFFFAOYSA-N 0.000 description 1
- HWEONUWVYWIJPF-UHFFFAOYSA-N [[4-[2-(4-diazonioiminocyclohexa-2,5-dien-1-ylidene)ethylidene]cyclohexa-2,5-dien-1-ylidene]hydrazinylidene]azanide Chemical group C1=CC(N=[N+]=[N-])=CC=C1C=CC1=CC=C(N=[N+]=[N-])C=C1 HWEONUWVYWIJPF-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000011354 acetal resin Substances 0.000 description 1
- 239000003377 acid catalyst Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 150000005215 alkyl ethers Chemical class 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 1
- 229960002130 benzoin Drugs 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- CHFBCXOSLARLKB-UHFFFAOYSA-N bis(4-azidophenyl)methanone Chemical compound C1=CC(N=[N+]=[N-])=CC=C1C(=O)C1=CC=C(N=[N+]=[N-])C=C1 CHFBCXOSLARLKB-UHFFFAOYSA-N 0.000 description 1
- QUDWYFHPNIMBFC-UHFFFAOYSA-N bis(prop-2-enyl) benzene-1,2-dicarboxylate Chemical compound C=CCOC(=O)C1=CC=CC=C1C(=O)OCC=C QUDWYFHPNIMBFC-UHFFFAOYSA-N 0.000 description 1
- NTXGQCSETZTARF-UHFFFAOYSA-N buta-1,3-diene;prop-2-enenitrile Chemical compound C=CC=C.C=CC#N NTXGQCSETZTARF-UHFFFAOYSA-N 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 239000000378 calcium silicate Substances 0.000 description 1
- 229910052918 calcium silicate Inorganic materials 0.000 description 1
- OYACROKNLOSFPA-UHFFFAOYSA-N calcium;dioxido(oxo)silane Chemical compound [Ca+2].[O-][Si]([O-])=O OYACROKNLOSFPA-UHFFFAOYSA-N 0.000 description 1
- 239000004917 carbon fiber Substances 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 238000004581 coalescence Methods 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 238000006704 dehydrohalogenation reaction Methods 0.000 description 1
- LTYMSROWYAPPGB-UHFFFAOYSA-N diphenyl sulfide Chemical compound C=1C=CC=CC=1SC1=CC=CC=C1 LTYMSROWYAPPGB-UHFFFAOYSA-N 0.000 description 1
- 239000012990 dithiocarbamate Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 235000019382 gum benzoic Nutrition 0.000 description 1
- 238000013007 heat curing Methods 0.000 description 1
- 150000002440 hydroxy compounds Chemical class 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000006224 matting agent Substances 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- OHBCEHHJPNBVME-UHFFFAOYSA-N n-[[3,5-dimethyl-4-(oxiran-2-ylmethoxy)phenyl]methyl]prop-2-enamide Chemical compound CC1=CC(CNC(=O)C=C)=CC(C)=C1OCC1OC1 OHBCEHHJPNBVME-UHFFFAOYSA-N 0.000 description 1
- DNYZBFWKVMKMRM-UHFFFAOYSA-N n-benzhydrylidenehydroxylamine Chemical compound C=1C=CC=CC=1C(=NO)C1=CC=CC=C1 DNYZBFWKVMKMRM-UHFFFAOYSA-N 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 150000007519 polyprotic acids Polymers 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 239000012779 reinforcing material Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- CIHOLLKRGTVIJN-UHFFFAOYSA-N tert‐butyl hydroperoxide Chemical compound CC(C)(C)OO CIHOLLKRGTVIJN-UHFFFAOYSA-N 0.000 description 1
- 238000012719 thermal polymerization Methods 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- 239000013008 thixotropic agent Substances 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Landscapes
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明は、新規なアクリルアミド
系オリゴマーを用いてなる光、熱、光及び熱併用、また
は電子線によって硬化可能な樹脂組成物に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a resin composition curable by light, heat, a combination of light and heat, or an electron beam, which comprises a novel acrylamide oligomer.
【0002】[0002]
【従来の技術】近年、塗料、プリント配線板の製造時に
用いられる紫外線硬化型レジストインキ、絶縁ワニスの
分野において、光,熱,光及び熱併用、または電子線に
よって硬化可能な樹脂に対する関心が高まってきてい
る。従来、この種の樹脂としては多塩基酸のヒドロキシ
アルキルアクリレート半エステル、スチレン−無水マレ
イン酸のヒドロキシアルキルアクリレート、カルボキシ
ル基を有するポリエステル樹脂、アクリル樹脂、ロジ
ン、マレイン化ロジン等を使用したものが提案されてい
る。2. Description of the Related Art In recent years, in the fields of paints, UV-curable resist inks used in the production of printed wiring boards, and insulating varnishes, interest in resins curable by light, heat, light and heat, or electron beams has increased. Is coming. Conventionally, this type of resin has been proposed using a hydroxyalkyl acrylate half ester of polybasic acid, a hydroxyalkyl acrylate of styrene-maleic anhydride, a polyester resin having a carboxyl group, an acrylic resin, a rosin, a maleinized rosin, etc. Has been done.
【0003】[0003]
【発明が解決しようとする課題】しかし乍ら、上記の如
き樹脂は、いずれも耐熱性、電気特性、速硬化性の点で
充分にその要求を満足しえない憾みがある。However, all of the above-mentioned resins are not satisfactory in terms of heat resistance, electrical characteristics and rapid curing.
【0004】[0004]
【課題を解決するための手段】本発明者らは、エポキシ
樹脂のもつ優れた耐熱性と電気特性などを保持しつつ、
それ自体がラジカル重合硬化や光硬化する樹脂組成物に
ついて鋭意研究を重ねた結果、本発明に到達した。すな
わち、本発明は、(a) 一般式(I)[Means for Solving the Problems] The inventors of the present invention maintain excellent heat resistance and electrical characteristics of epoxy resin,
The present invention has been achieved as a result of intensive research on a resin composition that itself undergoes radical polymerization curing or photocuring. That is, the present invention provides (a) the general formula (I)
【0005】[0005]
【化3】 [Chemical 3]
【0006】(式(I)中、Arは一般式 (II)(In the formula (I), Ar is represented by the general formula (II)
【0007】[0007]
【化4】 [Chemical 4]
【0008】を示し、nは2〜10である。一般式(I
I)中、Ar′はC6〜C20の芳香族炭化水素を表わ
し、Rは水素原子またはメチル基であり、n′は1〜4
の整数である) で表わされるアクリルアミド系オリゴマーと、 (b) 光重合開始剤、光増感剤またはラジカル重合開
始剤の1種または2種以上を混合してなることを特徴と
する光、熱、光及び熱併用、または電子線硬化可能な樹
脂組成物を内容とする。[0008] shows, n is 2-10. General formula (I
In I), Ar ′ represents a C 6 to C 20 aromatic hydrocarbon, R is a hydrogen atom or a methyl group, and n ′ is 1 to 4
Which is an integer of 1), and (b) a photopolymerization initiator, a photosensitizer, or a radical polymerization initiator. A resin composition that can be cured with light, heat, or electron beams is included.
【0009】本発明の一般式(I)で表わされるアクリ
ルアミド系オリゴマーは、たとえば一般式(III)The acrylamide oligomer represented by the general formula (I) of the present invention is, for example, the general formula (III)
【0010】[0010]
【化5】 [Chemical 5]
【0011】(式中、Ar″はグリシジル基を1つ有す
るC 6 〜C 20 の芳香族炭化水素を表し、R,n′は前
記に同じ)で表わされるグリシジル化合物のグリシジル
基をルイス酸を触媒として無溶剤又は溶剤中で開環重合
させることにより得られる。この際、アクリルアミド基
の熱重合を防ぐためハイドロキノン等のラジカル重合禁
止剤を加えておくことが好ましい。 一般式(III)で表わされる化合物は、一般式(V
I)(In the formula, Ar ″ has one glycidyl group.
That C 6 represents an aromatic hydrocarbon ~C 20, R, n 'is obtained by ring-opening polymerization without a solvent or in a solvent a glycidyl group of glycidyl compound represented by the same) to the Lewis acid as a catalyst To be At this time, it is preferable to add a radical polymerization inhibitor such as hydroquinone in order to prevent thermal polymerization of the acrylamide group. The compound represented by the general formula (III) has the general formula (V
I)
【0012】[0012]
【化6】 [Chemical 6]
【0013】(式中、Aは水酸基を1つ有するC6 〜C
20の芳香族炭化水素を表わし、Rは水素原子またはメチ
ル基であり、nは1〜4の整数である)で表わされる化
合物とエピハロヒドリンを付加させた後、アルカリで脱
ハロゲン化水素反応を行うことにより製造される。この
ような化合物及びその製造方法は特願昭58−2374
93号公報に詳細に開示されている。(In the formula, A is C 6 -C having one hydroxyl group.
20 represents an aromatic hydrocarbon, R is a hydrogen atom or a methyl group, and n is an integer of 1 to 4) and epihalohydrin are added, and then dehydrohalogenation reaction is carried out with alkali. It is manufactured by Such a compound and its production method are disclosed in Japanese Patent Application No. 58-2374.
This is disclosed in detail in Japanese Patent Publication No. 93.
【0014】一般式(VI)で表わされる化合物は、たとえ
ばフェノール性水酸基を有する芳香族炭化水素とN−メ
チロールアクリルアミドまたはN−メチロールメタアク
リルアミド、あるいはN−メチロールアクリルアミドま
たはN−メチロールメタアクリルアミドのアルキルエー
テル誘導体(以下、これらをN−メチロールアクリルア
ミド類という)を酸触媒で縮合させることにより容易に
えられる。たとえば出発物質として2,6−キシレノー
ルとN−メチロールアクリルアミド類を用いた場合、下
記構造式(IV)で表わされるグリシジル化合物をうるこ
とができる。The compound represented by the general formula (VI) is, for example, an aromatic hydrocarbon having a phenolic hydroxyl group and N-methylolacrylamide or N-methylolmethacrylamide, or an alkyl ether of N-methylolacrylamide or N-methylolmethacrylamide. It can be easily obtained by condensing a derivative (hereinafter, referred to as N-methylolacrylamides) with an acid catalyst. For example, when 2,6-xylenol and N-methylol acrylamides are used as starting materials, a glycidyl compound represented by the following structural formula (IV) can be obtained.
【0015】[0015]
【化7】 [Chemical 7]
【0016】(式中、Rは水素原子またはメチル基を示
し、nは1又は2である。)また出発物質としてオルト
クレゾールとN−メチロールアクリルアミドを用いた場
合、下記構造式(V)で表わされるグリシジル化合物を
うることができる。(In the formula, R represents a hydrogen atom or a methyl group, and n is 1 or 2.) When orthocresol and N-methylolacrylamide are used as starting materials, they are represented by the following structural formula (V). A glycidyl compound can be obtained.
【0017】[0017]
【化8】 [Chemical 8]
【0018】(式中、Rは水素原子またはメチル基を示
し、nは1または2である。)(In the formula, R represents a hydrogen atom or a methyl group, and n is 1 or 2.)
【0019】本発明に用いられるルイス酸としては、Sn
Cl4 、TiCl4 、BF3・O(C2H5)2、BF3・O(C4H9)2、あるいは
三フッ化ホウ素のアミン錯体たとえば三フッ化ホウ素モ
ノエチルアミン錯体、三フッ化ホウ素ピペリジン錯体、
その他三フッ化ホウ素とベンジルアミン、トリエチルア
ミン等との錯体が挙げられる。ルイス酸は一般式(III)
のグリシジル化合物100重量部に対して通常1〜6重
量部の範囲で用いられる。The Lewis acid used in the present invention is Sn
Cl 4, TiCl 4, BF 3 · O (C 2 H 5) 2, BF 3 · O (C 4 H 9) 2 or amine complex such as boron trifluoride monoethylamine complex of boron trifluoride, trifluoride Boron piperidine complex,
Other examples include complexes of boron trifluoride with benzylamine, triethylamine and the like. Lewis acids have the general formula (III)
It is usually used in the range of 1 to 6 parts by weight with respect to 100 parts by weight of the glycidyl compound.
【0020】本発明で用いられる光重合開始剤、もしく
は光増感剤とは、光(通常、紫外線)の照射によりラジ
カルまたはイオンを容易に発生する化合物であり、アジ
ドベンゼン、4−アジド安息香酸、4,4′−ジアジド
ビフェニル、1,2−ビス(4−アジドフェニル)エチ
レン、4−アミノフェニル−4′−アジドフェニルメタ
ン、4,4′−ジアジドベンゾフェノン、2,6−ビス
(4−アジドベンゼン)シタロヘキサンなどのアジド化
合物:ベンゾフェノン、ベンゾフェノンオキシム、ベン
ゾイン、ベンゾインメチルエーテル、ベンゾインエチル
エーテル、ベンゾインイソプロピルエーテル、アセトフ
ェノン、α−ハロケトン、ω−ブロムアセトフェノンシ
クロヘキサノンなどのカルボニル化合物:ジフェニルモ
ノスルフィド、S−アシル−ジチオカルバメートなどの
イオウ化合物:アゾイソブチルニトリルなどのアゾ化合
物:ベンゾイルパーオキサイド、ジ−t−ブチルパーオ
キサイドなどの有機過酸化物:ステアリン酸ジアルキル
ジチオカルバマート、t−ブチルアントラキノン、2−
メルカプトベンゾチアゾールなどが挙げられる。使用量
としてはアクリルアミド系オリゴマー100重量部に対
し、通常0.1〜10重量部の範囲で用いられる。The photopolymerization initiator or photosensitizer used in the present invention is a compound which easily generates radicals or ions upon irradiation with light (usually ultraviolet rays), and includes azidobenzene and 4-azidobenzoic acid. , 4,4'-diazidobiphenyl, 1,2-bis (4-azidophenyl) ethylene, 4-aminophenyl-4'-azidophenylmethane, 4,4'-diazidobenzophenone, 2,6-bis ( 4-azidobenzene) Cytarohexane and other azide compounds: benzophenone, benzophenone oxime, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, acetophenone, α-haloketone, ω-bromoacetophenone carbonyl compounds such as cyclohexanone: diphenyl monosulfide, S- Sulfur compounds such as acyl-dithiocarbamate: Azo compounds such as azoisobutyl nitrile: Organic peroxides such as benzoyl peroxide, di-t-butyl peroxide: Dialkyldithiocarbamate stearate, t-butylanthraquinone, 2-
Examples thereof include mercaptobenzothiazole. The amount used is usually in the range of 0.1 to 10 parts by weight with respect to 100 parts by weight of the acrylamide oligomer.
【0021】本発明で用いられるラジカル重合開始剤
は、加熱硬化を促進する目的で用いるもので、通常ラジ
カル重合の開始に広く使用されている有機過酸化物が適
している。ただし、硬化反応が行われる温度において所
望する時間内に分解するものを選択する必要がある。具
体的にはt−ブチルハイドロパーオキサイド、キュメン
ハイドロパーオキサイド、ジ−t−ブチルパーオキサイ
ド、ジクミルパーオキサイド、ラウロイルパーオキサイ
ド、ベンゾイルパーオキサイド、t−ブチルパーオキシ
ピパレート、t−ブチルパーオキシベンゾエートなどを
用いることができる。使用量としては、アクリルアミド
系オリゴマー100重量部に対し通常0.1〜10重量
部の範囲で使用される。これらラジカル重合開始剤は、
前記の光重合開始剤もしくは光増感剤あるいはそれらの
組合わせと併用してもよい。The radical polymerization initiator used in the present invention is used for the purpose of accelerating heat curing, and an organic peroxide which is widely used for initiation of radical polymerization is suitable. However, it is necessary to select one that decomposes within a desired time at the temperature at which the curing reaction is performed. Specifically, t-butyl hydroperoxide, cumene hydroperoxide, di-t-butyl peroxide, dicumyl peroxide, lauroyl peroxide, benzoyl peroxide, t-butyl peroxypiperate, t-butyl peroxy. Benzoate or the like can be used. The amount used is usually in the range of 0.1 to 10 parts by weight based on 100 parts by weight of the acrylamide oligomer. These radical polymerization initiators are
You may use together with the said photoinitiator, a photosensitizer, or those combinations.
【0022】本発明の樹脂組成物は、前記の光重合開始
剤もしくは光増感剤、またはラジカル重合開始剤(b)
の添加に対応して光(紫外線)、熱、光および熱、電子
線などによって容易に硬化できるものである。光硬化は
水銀灯その他の紫外線照射による。熱硬化の温度は通常
100〜200℃の範囲で行えばよい。The resin composition of the present invention comprises the above-mentioned photopolymerization initiator or photosensitizer, or radical polymerization initiator (b).
It can be easily cured by light (ultraviolet rays), heat, light and heat, electron beam, etc. The photo-curing is performed by irradiating a mercury lamp or other ultraviolet rays. The temperature for thermosetting may be usually in the range of 100 to 200 ° C.
【0023】本発明の樹脂組成物は塗料、注型品、成形
品、積層板、絶縁ワニス、レジストインキ、樹脂改質
剤、相溶化剤など種々の用途に用いられる。本発明の樹
脂組成物には、組成物本来の特性が損なわれない範囲
で、所望に応じて種々の添加物を配合することができ
る。これらの添加物としては接着性あるいは可撓性を調
整する目的で単官能又は多官能性ヒドロキシ化合物の
(メタ)アクリル酸のエステル、(メタ)アクリル酸の
エポキシエステル、(メタ)アクリル酸のアルケニルエ
ステルなどの(メタ)アクリル酸のエステル及びそれら
のプレポリマー;ジアリルフタレート、ジビニルベンゼ
ン、ジアリルベンゼンなどのポリアリル化合物及びその
プレポリマー;ジシクロペンタジエン及びそのプレポリ
マー;ポリビニルアセタール樹脂;ブタジエン−アクリ
ロニトリル共重合体などが適宜用いられる。The resin composition of the present invention is used in various applications such as paints, cast products, molded products, laminates, insulating varnishes, resist inks, resin modifiers and compatibilizers. Various additives can be added to the resin composition of the present invention as desired, as long as the characteristics inherent to the composition are not impaired. These additives include monofunctional or polyfunctional hydroxy compounds (meth) acrylic acid ester, (meth) acrylic acid epoxy ester, and (meth) acrylic acid alkenyl for the purpose of adjusting adhesiveness or flexibility. Esters of (meth) acrylic acid such as esters and prepolymers thereof; polyallyl compounds such as diallyl phthalate, divinylbenzene, diallylbenzene and prepolymers thereof; dicyclopentadiene and prepolymers thereof; polyvinyl acetal resin; butadiene-acrylonitrile copolymerization Coalescence or the like is appropriately used.
【0024】また補強材や充填剤として、チョップドマ
ット、クロス等のガラス繊維、カーボン繊維、石英ガラ
スあるいはシリカ、アルミナ、水酸化アルミニウム、炭
酸カルシウム、ケイ酸カルシウム等を用いることができ
る。これらの他に塗装適性や印刷適性を向上させるため
に、必要に応じて、増粘剤、レベリング剤、流動性改良
剤、つや消し剤、カップリング剤、可塑剤、顔料、染
料、消泡剤、揺変剤等を適宜添加して使用することがで
きる。As the reinforcing material and the filler, glass fiber such as chopped mat and cloth, carbon fiber, quartz glass or silica, alumina, aluminum hydroxide, calcium carbonate, calcium silicate and the like can be used. In addition to these, in order to improve coating suitability and printability, as necessary, a thickener, a leveling agent, a fluidity improver, a matting agent, a coupling agent, a plasticizer, a pigment, a dye, a defoaming agent, A thixotropic agent or the like can be appropriately added and used.
【0025】〔実施例〕 つぎに本発明を実施例により説明するが、本発明はこれ
ら実施例のみに限定されるものではない。なお、以下の
実施例において、部とあるのは重量部である。参考例1 N−(4−グリシジルオキシ−3,5−ジメチルフェニ
ルメチル)アクリルアミド(前記構造式(IV)でRが
水素原子であるもの、n=1)100部、三フッ化ホウ
素モノエチルアミン6部およびハイドロキノン0.01
部の混合物を還流冷却器を取付けたフラスコ中で攪拌し
ながら140℃で4時間反応させ、グリシジル基の開環
重合を行った。なお反応の終点は、IRスペクトにより
10.95μの[Examples] Next, the present invention will be described with reference to Examples, but the present invention is not limited to these Examples. In the following examples, “parts” means “parts by weight”. Reference Example 1 100 parts of N- (4-glycidyloxy-3,5-dimethylphenylmethyl) acrylamide (the above structural formula (IV) wherein R is a hydrogen atom , n = 1 ), boron trifluoride monoethylamine 6 Parts and hydroquinone 0.01
Part of the mixture was reacted in a flask equipped with a reflux condenser at 140 ° C. for 4 hours with stirring to carry out ring-opening polymerization of glycidyl groups. The end point of the reaction was determined to be 10.95μ by IR spectroscopy.
【0026】[0026]
【化9】 [Chemical 9]
【0027】の吸収が消滅する点とした。得られたオリ
ゴマーは反応温度で粘稠液体、常温では固体であった。
またポリスチレン換算の分子量は1100であった。The point at which the absorption of [1] disappeared was set. The obtained oligomer was a viscous liquid at the reaction temperature and a solid at room temperature.
The polystyrene-equivalent molecular weight was 1,100.
【0028】実施例1 参考例1で得られたオリゴマー100部、アセトン10
0部、ベンゾインエチルエーテル3部及びレベリング剤
(BYKETOL社:BYKETOL SPECIAL)4部を混合し、
ガラス板に塗布し、約10μ厚さの塗膜を作成、風乾2
0分後、400W高圧水銀ランプを用いて15cmの距離
から10分間紫外線を照射した。得られた塗膜は透明で
鉛筆硬度は4Hであった。Example 1 100 parts of the oligomer obtained in Reference Example 1, 10 parts of acetone
0 parts, 3 parts of benzoin ethyl ether and 4 parts of leveling agent (BYKETOL SPECIAL) are mixed,
Apply on a glass plate to create a coating film with a thickness of about 10μ, and air dry 2
After 0 minutes, ultraviolet rays were irradiated for 10 minutes from a distance of 15 cm using a 400 W high pressure mercury lamp. The resulting coating film was transparent and had a pencil hardness of 4H.
【0029】実施例2 参考例1で得られたオリゴマー100部、アセトン10
0部、ベンゾインエチルエーテル3部、t−ブチルパー
オキシベンゾエート3部及びレベリング剤(実施例1で
用いたもの)4部を混合し、テフロン板上で約100μ
厚さのフィルムになるように塗布し、風乾30分後40
0W高圧水銀ランプを用いて15cmの距離から10分間
紫外線を照射した。その後160℃にて30分間アフタ
ーキュアを行った。得られた硬化フィルムは褐色透明
で、引張強度5.8kg/mm2 、引張弾性率330kg/mm
2 であった。Example 2 100 parts of the oligomer obtained in Reference Example 1, 10 parts of acetone
0 part, 3 parts of benzoin ethyl ether, 3 parts of t-butyl peroxybenzoate and 4 parts of the leveling agent (used in Example 1) were mixed and about 100 μm on a Teflon plate.
Apply so that it becomes a thick film, and air dry 30 minutes later 40
Ultraviolet rays were irradiated from a distance of 15 cm for 10 minutes using a 0 W high pressure mercury lamp. After that, after-curing was performed at 160 ° C. for 30 minutes. The cured film obtained was transparent and brown, and had a tensile strength of 5.8 kg / mm 2 and a tensile elastic modulus of 330 kg / mm.
Was 2 .
【0030】参考例2 構造式Reference Example 2 Structural formula
【0031】[0031]
【化10】 [Chemical 10]
【0032】(前記構造式(V)でRが水素原子である
もの、n=1)で示されるグリシジル化合物100部、
三フッ化ホウ素モノエチルアミン6部およびハイドロキ
ノン0.01部の混合物を参考例1と同様の方法でグリ
シジル基の開環重合を行った。得られたオリゴマーは反
応温度で粘稠液体、常温では固体であった。またポリス
チレン換算の分子量は910であった。100 parts of a glycidyl compound represented by the above structural formula (V) wherein R is a hydrogen atom , n = 1
A mixture of 6 parts of boron trifluoride monoethylamine and 0.01 part of hydroquinone was subjected to ring-opening polymerization of a glycidyl group in the same manner as in Reference Example 1. The obtained oligomer was a viscous liquid at the reaction temperature and a solid at room temperature. The polystyrene-equivalent molecular weight was 910.
【0033】実施例3 参考例2で得られたオリゴマー100部、アセトン10
0部、ベンゾインエチルエーテル3部及びレベリング剤
(実施例1で用いたもの)4部を混合し、実施例1と同
様の方法でガラス板上に塗膜を作成した。得られた塗膜
は透明で鉛筆硬度は3Hであった。Example 3 100 parts of the oligomer obtained in Reference Example 2 and 10 parts of acetone
0 part, 3 parts of benzoin ethyl ether and 4 parts of the leveling agent (used in Example 1) were mixed, and a coating film was formed on a glass plate in the same manner as in Example 1. The obtained coating film was transparent and had a pencil hardness of 3H.
【0034】実施例4 参考例2で得られたオリゴマー100部、アセトン10
0部、ベンゾインエチルエーテル3部、t−ブチルパー
オキシベンゾエート3部及びレベリング剤(実施例1で
用いたもの)4部を混合し、実施例1と同様の方法で硬
化フィルムを作成した。得られたフィルムは褐色透明で
引張強度5.6kg/mm2 、引張弾性率320kg/mm2 で
あった。Example 4 100 parts of the oligomer obtained in Reference Example 2 and 10 parts of acetone
0 part, 3 parts of benzoin ethyl ether, 3 parts of t-butyl peroxybenzoate and 4 parts of the leveling agent (used in Example 1) were mixed and a cured film was prepared in the same manner as in Example 1. The obtained film was transparent in brown and had a tensile strength of 5.6 kg / mm 2 and a tensile elastic modulus of 320 kg / mm 2 .
【0035】[0035]
【発明の効果】本発明の樹脂組成物は、速硬化性で、耐
熱性及び電気特性を保持しつつ機械的特性に優れた硬化
物を提供する。EFFECT OF THE INVENTION The resin composition of the present invention provides a cured product which is fast-curing and has excellent mechanical properties while maintaining heat resistance and electrical properties.
Claims (1)
r′はC6〜C20の芳香族炭化水素を表わし、Rは水
素原子またはメチル基であり、n′は1〜4の整数であ
る) で表わされるアクリルアミド系オリゴマーと、 (b) 光重合開始剤、光増感剤またはラジカル重合開
始剤の1種または2種以上を混合してなることを特徴と
する光、熱、光及び熱併用、または電子線硬化可能な樹
脂組成物。1. (a) General formula (I): [Chemical 2] The indicated, n represents an 2-10. In general formula (II), A
r ′ represents a C 6 to C 20 aromatic hydrocarbon, R is a hydrogen atom or a methyl group, and n ′ is an integer of 1 to 4), and (b) photopolymerization. A resin composition curable by light, heat, a combination of light and heat, or electron beam, which comprises one or more of an initiator, a photosensitizer or a radical polymerization initiator.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1795993A JPH0730147B2 (en) | 1993-01-08 | 1993-01-08 | Curable resin composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1795993A JPH0730147B2 (en) | 1993-01-08 | 1993-01-08 | Curable resin composition |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP304185A Division JPS61161248A (en) | 1985-01-10 | 1985-01-10 | Acrylamide oligomer and preparation thereof |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0625368A JPH0625368A (en) | 1994-02-01 |
JPH0730147B2 true JPH0730147B2 (en) | 1995-04-05 |
Family
ID=11958290
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1795993A Expired - Lifetime JPH0730147B2 (en) | 1993-01-08 | 1993-01-08 | Curable resin composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0730147B2 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0808670A4 (en) * | 1995-12-06 | 2003-07-02 | Kansai Paint Co Ltd | Method of forming paint film |
US6855297B2 (en) | 1998-11-16 | 2005-02-15 | Honeywell International Inc. | NOx filter |
-
1993
- 1993-01-08 JP JP1795993A patent/JPH0730147B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
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JPH0625368A (en) | 1994-02-01 |
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