JPH0730097B2 - Method for producing chlorosilanes - Google Patents
Method for producing chlorosilanesInfo
- Publication number
- JPH0730097B2 JPH0730097B2 JP62026761A JP2676187A JPH0730097B2 JP H0730097 B2 JPH0730097 B2 JP H0730097B2 JP 62026761 A JP62026761 A JP 62026761A JP 2676187 A JP2676187 A JP 2676187A JP H0730097 B2 JPH0730097 B2 JP H0730097B2
- Authority
- JP
- Japan
- Prior art keywords
- disiloxanes
- reaction
- phosgene
- chlorosilanes
- producing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Description
【発明の詳細な説明】 〈産業上の利用分野〉 本発明はジシロキサン類からクロルシラン類の製造する
方法に関する。DETAILED DESCRIPTION OF THE INVENTION <Field of Industrial Application> The present invention relates to a method for producing chlorosilanes from disiloxanes.
クロルシラン類はシリコンゴム、シリコン油、シリコン
樹脂などの有機ケイ素製品の主要中間体として、また医
薬品、農薬、染料などの有機薬品製造の原料として、広
範囲な産業分野に利用される重要な化合物である。Chlorsilanes are important compounds used in a wide range of industrial fields as major intermediates for organosilicon products such as silicone rubber, silicone oil, and silicone resin, and as raw materials for the production of organic chemicals such as pharmaceuticals, agricultural chemicals, and dyes. .
〈従来の技術〉 ジシロキサン類からクロルシラン類を製造する方法とし
て、 (イ)ジシロキサン類に硫酸と塩化アンモニウムを反応
させる方法(J.Amer.Chem.Soc.,70,433,445(1948)) (ロ)ジシロキサン類に塩化水素を反応させる方法(特
開昭52-144628号公報および特開昭55-92392号公報) (ハ)強無機酸の存在下でジシロキサン類に塩化チオニ
ルを作用させる方法(特公昭56-19355号公報) (ニ)無機鉄化合物の存在下にジメチルハロゲノシラン
と反応させる方法(特公昭57-7639号公報) が知られている。<Prior Art> As a method for producing chlorosilanes from disiloxanes, (a) a method of reacting disiloxanes with sulfuric acid and ammonium chloride (J. Amer. Chem. Soc., 70 , 433, 445 (1948)) ( (B) Method of reacting disiloxane with hydrogen chloride (JP-A-52-144628 and JP-A-55-92392) (C) Reaction of disiloxane with thionyl chloride in the presence of a strong inorganic acid Method (JP-B-56-19355) (D) A method (JP-B-57-7639) of reacting with dimethylhalogenosilane in the presence of an inorganic iron compound is known.
〈発明が解決しようとする問題点〉 しかしながら、上記の公知の方法では反応温度が高温ま
たは低温であって、工業的に不利な条件下での反応であ
るのみならず、不要の副生物を供なったり、場合によっ
ては反応の後処理の際に生じる廃液の処理などの環境保
全上の問題を伴い、満足できるものではない。<Problems to be Solved by the Invention> However, in the above-mentioned known method, the reaction temperature is a high temperature or a low temperature, which is not only a reaction under industrially disadvantageous conditions, but also an unnecessary by-product is produced. It is unsatisfactory because of environmental problems such as the treatment of waste liquid generated in the post-treatment of the reaction.
かかる事情に鑑み、本発明者らはジシロキサン類からク
ロルシラン類を工業的に有利に製造する方法を鋭意検討
した結果、ジシロキサン類にホスゲンを反応させること
により、穏やかな条件で極めて選択的かつ高収率でクロ
ルシラン類を製造できることを見いだし、本発明を完成
させるに至った。In view of such circumstances, the inventors of the present invention have earnestly studied a method for industrially producing chlorosilanes from disiloxanes, and as a result, by reacting disiloxanes with phosgene, they are extremely selective under mild conditions. It was found that chlorosilanes can be produced in high yield, and the present invention has been completed.
〈問題点を解決するための手段〉 すなわち、本発明は一般式 で示されるジシロキサン類にホスゲンを反応させること
を特徴とするクロルシラン類の製造法である。<Means for Solving Problems> That is, the present invention provides a general formula The method for producing chlorosilanes is characterized by reacting phosgene with a disiloxane represented by
本発明において用いられるジシロキサン類としてはヘキ
サメチルジシロキサン、ヘキサエチルジシロキサン、ビ
スクロルテトラメチルジシロキサン、トリエチルトリプ
ロピルジシロキサン、ビスクロルメチルテトラメチルジ
シロキサン、ビスエチニルテトラメチルジシロキサン、
ジブチルテトラメチルジジロキサンなどを挙げることが
できるが、これらに限定されるものではない。Examples of disiloxanes used in the present invention include hexamethyldisiloxane, hexaethyldisiloxane, bischlorotetramethyldisiloxane, triethyltripropyldisiloxane, bischloromethyltetramethyldisiloxane, bisethynyltetramethyldisiloxane,
Examples thereof include, but are not limited to, dibutyltetramethyldidyloxane.
これらのジシロキサン類は容易に入手可能であり、また
有機薬品の製造において官能基の保護または活性化のた
めに用いられるクロルシラン類から副生するジシロキサ
ン類を用いることもできる。These disiloxanes are readily available, and disiloxanes by-produced from chlorosilanes used for protecting or activating functional groups in the production of organic chemicals can also be used.
ジシロキサン類との反応に供されるホスゲンの使用量
は、ジシロキサン類中のケイ素−酸素結合をすべてケイ
素−塩素結合に変換するためにはケイ素−酸素結合1当
量に対して1当量以上必要である。過剰のホスゲンは反
応後、未反応のまま残存するので、必要以上に使用する
ことは回収操作に多大な労力を要するので好ましくな
い。ホスゲンが残ることが不都合な場合は1当量以下に
することもできる。この場合には反応に供されたホスゲ
ンはすべて目的物の生成に消費される。通常ジシロキサ
ン類中のケイ素−酸素結合1当量に対して約0.7〜3当
量のホスゲンが用いられる。The amount of phosgene used for the reaction with disiloxanes must be 1 equivalent or more per 1 equivalent of silicon-oxygen bonds in order to convert all silicon-oxygen bonds in disiloxanes into silicon-chlorine bonds. Is. Since excess phosgene remains unreacted after the reaction, it is not preferable to use more than necessary because a great amount of labor is required for the recovery operation. When it is inconvenient for phosgene to remain, the amount can be 1 equivalent or less. In this case, all of the phosgene used in the reaction is consumed to produce the desired product. Usually, about 0.7 to 3 equivalents of phosgene are used for one equivalent of silicon-oxygen bond in disiloxanes.
本反応は一般には溶媒の存在下に実施されるが、無溶媒
でも実施できる。This reaction is generally carried out in the presence of a solvent, but it can also be carried out without a solvent.
かかる溶媒としてはベンゼン、トルエン、キシレン、モ
ノクロルベンゼン、ジクロルベンゼンなどの芳香族炭化
水素、シクロヘキサン、ヘキサン、n−ヘプタン、n−
オクタン、メチルシクロヘキサン、イソオクタンなどの
脂肪族炭化水素、ジエチルエーテル、ジブチルエーテル
などのエーテル、酢酸エチル、酢酸ブチルなどのエステ
ル、N,N−ジメチルホルムアミド、N−メチル−N−フ
ェニルホルムアミドなどの酸アミド、クロロホルム、1,
2−ジクロルエタン、1,1,1−トリクロルエタン、1,1,2
−トリクロルエタン、テトラクロルエチレンなどの低級
ハロゲン化炭化水素等を挙げることができる。Examples of the solvent include aromatic hydrocarbons such as benzene, toluene, xylene, monochlorobenzene, and dichlorobenzene, cyclohexane, hexane, n-heptane, n-
Aliphatic hydrocarbons such as octane, methylcyclohexane and isooctane, ethers such as diethyl ether and dibutyl ether, esters such as ethyl acetate and butyl acetate, acid amides such as N, N-dimethylformamide and N-methyl-N-phenylformamide , Chloroform, 1,
2-dichloroethane, 1,1,1-trichloroethane, 1,1,2
And lower halogenated hydrocarbons such as trichloroethane and tetrachloroethylene.
反応は一般には約0℃〜200℃、好ましくは40℃〜150℃
の温度で実施される。反応温度が約200℃を越すと、ホ
スゲンが熱分解を起こし好ましくないし、また0℃より
低いと反応速度が遅くなり、反応完結に長時間を要する
ので好ましくない。The reaction is generally about 0 ° C to 200 ° C, preferably 40 ° C to 150 ° C.
Carried out at a temperature of. When the reaction temperature exceeds about 200 ° C., phosgene causes thermal decomposition, which is not preferable. When the reaction temperature is lower than 0 ° C., the reaction rate becomes slow and it takes a long time to complete the reaction, which is not preferable.
反応圧力は加圧でも減圧でも別段差し支えないが、通常
は常圧付近で実施される。The reaction pressure may be increased or decreased, and there is no difference in level, but it is usually carried out at around normal pressure.
反応方法は連続式、半連続式または回分式のいずれでも
行うことができる。The reaction method may be a continuous system, a semi-continuous system or a batch system.
反応は通常、ジシロキサン類に、または場合によりジシ
ロキサン類に溶媒をあらかじめ混合した混合物中にホス
ゲンを導入することにより行われる。またホスゲンをあ
らかじめ溶媒に導入した混合物中にジシロキサン類を加
えることによっても行われる。ホスゲンとジシロキサン
類を反応器に同時に導入することによっても実施するこ
とができる。The reaction is usually carried out by introducing phosgene into the disiloxanes, or optionally into a mixture of the disiloxanes premixed with a solvent. It is also carried out by adding disiloxanes to a mixture in which phosgene is previously introduced into a solvent. It can also be carried out by introducing phosgene and disiloxanes into the reactor at the same time.
上記反応方法によって得られた反応液からクロルシラン
類は蒸留など公知の方法によって容易に原料であるジシ
ロキサン類およびホスゲン、副生物または溶媒と分離す
ることができる。The chlorosilanes can be easily separated from the starting disiloxanes and phosgene, by-products or solvents by a known method such as distillation from the reaction solution obtained by the above reaction method.
(発明の効果) 本発明のジシロキサン類にホスゲンを反応させる方法
は、穏やかな条件下で反応ができ、高収率でクロルシラ
ン類を製造することが出来る。さらに副生物が蒸留など
の操作により容易に分離できるため、高純度のクロルシ
ラン類を容易に製造することができる。また本発明は有
機薬品の製造において、官能基の保護等に使用したクロ
ルシラン類から副生するジシロキサン類からクロルシラ
ン類を回収するのに有用である。(Effect of the Invention) The method for reacting phosgene with the disiloxanes of the present invention enables the reaction under mild conditions and can produce chlorosilanes in high yield. Furthermore, since by-products can be easily separated by an operation such as distillation, high-purity chlorosilanes can be easily produced. Further, the present invention is useful for recovering chlorosilanes from disiloxanes by-produced from chlorosilanes used for protecting functional groups in the production of organic chemicals.
〈実施例〉 以下、本発明を実施例により更に具体的に説明するが、
本発明はこれらの実施例に限定されるものではない。<Examples> Hereinafter, the present invention will be described in more detail with reference to Examples.
The invention is not limited to these examples.
実施例1 ガス導入管、還流冷却器、温度計、撹拌器を備えたガラ
ス製反応器に、ヘキサメチルジシロキサン81.1g(0.5モ
ル)、1,2−ジクロルエタン306gを仕込み、撹拌下にこ
の中にホスゲン98.9g(0.748モル)を温度50〜55℃で9
時間にわたって導入した。Example 1 A glass reactor equipped with a gas inlet tube, a reflux condenser, a thermometer, and a stirrer was charged with 81.1 g (0.5 mol) of hexamethyldisiloxane and 306 g of 1,2-dichloroethane, while stirring the mixture. Phosgene 98.9g (0.748mol) at a temperature of 50-55 ℃
Introduced over time.
導入終了後、同温度でさらに3時間攪拌を続けた後、反
応混合物を蒸留することによりトリメチルクロルシラン
56.0g(沸点;56〜57℃、収率51.5%)を得た。After the completion of the introduction, stirring was continued for another 3 hours at the same temperature, and then the reaction mixture was distilled to remove trimethylchlorosilane.
56.0 g (boiling point; 56-57 ° C., yield 51.5%) was obtained.
実施例2 実施例1と同様の反応器にヘキサエチルジシロキサン6
1.6g(0.25モル)、o−ジクロルベンゼン300gを仕込
み、撹拌下にこの中にホスゲン39.6g(0.4モル)を130
〜135℃で7時間にわたって導入した。Example 2 Hexaethyldisiloxane 6 was added to the same reactor as in Example 1.
1.6 g (0.25 mol) and 300 g of o-dichlorobenzene were charged, and 39.6 g (0.4 mol) of phosgene was added to this with stirring.
Introduced at ~ 135 ° C for 7 hours.
導入後終了後、同温度で2時間撹拌を続けた後、反応混
合物を蒸留することにより、トリエチルクロルシラン5
3.7g(沸点;144〜145℃、収率71.3%)を得た。After completion of the introduction, stirring was continued for 2 hours at the same temperature, and then the reaction mixture was distilled to give triethylchlorosilane 5
3.7 g (boiling point; 144-145 ° C., yield 71.3%) was obtained.
実施例3 実施例1と同様の反応器に1,3−ジ−t−ブチル−1,1,
3,3−テトラメチルジシロキサン24.7g(0.1モル)、o
−ジクロルベンゼン100gを仕込み、撹拌下にこの中にホ
スゲン29.7g(0.3モル)を115〜120℃で7時間にわたっ
て導入した。導入終了後、同温度で4時間撹拌を続けた
後、反応混合物を蒸留することにより、t−ブチルジメ
チルクロルシラン19.7g(沸点;124〜126℃、収率65.2
%)を得た。Example 3 A reactor similar to Example 1 was charged with 1,3-di-t-butyl-1,1,
2,3-Tetramethyldisiloxane 24.7 g (0.1 mol), o
100 g of dichlorobenzene were charged and 29.7 g (0.3 mol) of phosgene were introduced into this with stirring at 115 to 120 ° C. over 7 hours. After the introduction was completed, stirring was continued for 4 hours at the same temperature, and then the reaction mixture was distilled to give 19.7 g of t-butyldimethylchlorosilane (boiling point; 124 to 126 ° C., yield 65.2).
%) Was obtained.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 増本 勝久 愛媛県新居浜市惣開町5番1号 住友化学 工業株式会社内 (72)発明者 鴨田 勝 愛媛県新居浜市惣開町5番1号 住友化学 工業株式会社内 (56)参考文献 Chemical Abstract s,91(1979),140988. ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Katsuhisa Masumoto 5-1, Sokai-cho, Niihama-shi, Ehime Sumitomo Chemical Co., Ltd. (72) Inventor, Katsuta Kamoda 5-5, Sokai-cho, Niihama-shi Sumitomo Chemical Co., Ltd. Incorporated (56) References Chemical Abstracts, 91 (1979), 140988.
Claims (2)
を特徴とするクロルシラン類の製造法。1. A general formula A method for producing chlorosilanes, which comprises reacting phosgene with a disiloxane represented by:
ン、ヘキサエチルジシロキサンおよび1,3−ジ−t−ブ
チル−1,1,3,3−テトラメチルジシロキサンである特許
請求の範囲第1項記載のクロルシラン類の製造法。2. The disiloxanes are hexamethyldisiloxane, hexaethyldisiloxane and 1,3-di-t-butyl-1,1,3,3-tetramethyldisiloxane. A method for producing the described chlorosilanes.
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62026761A JPH0730097B2 (en) | 1987-02-06 | 1987-02-06 | Method for producing chlorosilanes |
US07/150,902 US4780556A (en) | 1987-02-06 | 1988-02-01 | Method for producing chlorosilanes |
DE8888101482T DE3860612D1 (en) | 1987-02-06 | 1988-02-02 | METHOD FOR PRODUCING CHLOROSILANES. |
EP88101482A EP0278368B1 (en) | 1987-02-06 | 1988-02-02 | A method for producing chlorosilanes |
CA000557994A CA1310655C (en) | 1987-02-06 | 1988-02-02 | Method for producing chlorosilanes |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62026761A JPH0730097B2 (en) | 1987-02-06 | 1987-02-06 | Method for producing chlorosilanes |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS63192789A JPS63192789A (en) | 1988-08-10 |
JPH0730097B2 true JPH0730097B2 (en) | 1995-04-05 |
Family
ID=12202268
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62026761A Expired - Fee Related JPH0730097B2 (en) | 1987-02-06 | 1987-02-06 | Method for producing chlorosilanes |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0730097B2 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4513285B2 (en) * | 2003-07-18 | 2010-07-28 | 住友化学株式会社 | Method for producing chlorosilane compound |
-
1987
- 1987-02-06 JP JP62026761A patent/JPH0730097B2/en not_active Expired - Fee Related
Non-Patent Citations (1)
Title |
---|
ChemicalAbstracts,91(1979),140988. |
Also Published As
Publication number | Publication date |
---|---|
JPS63192789A (en) | 1988-08-10 |
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