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JPH0729164A - Amorphous carbon substrate for magnetic disk - Google Patents

Amorphous carbon substrate for magnetic disk

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Publication number
JPH0729164A
JPH0729164A JP17007693A JP17007693A JPH0729164A JP H0729164 A JPH0729164 A JP H0729164A JP 17007693 A JP17007693 A JP 17007693A JP 17007693 A JP17007693 A JP 17007693A JP H0729164 A JPH0729164 A JP H0729164A
Authority
JP
Japan
Prior art keywords
substrate
head
amorphous carbon
magnetic disk
surface roughness
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17007693A
Other languages
Japanese (ja)
Inventor
Tetsuo Suzuki
哲雄 鈴木
Nobuhiro Hara
宣宏 原
Hitomi Matsumura
仁実 松村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kobe Steel Ltd
Original Assignee
Kobe Steel Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kobe Steel Ltd filed Critical Kobe Steel Ltd
Priority to JP17007693A priority Critical patent/JPH0729164A/en
Publication of JPH0729164A publication Critical patent/JPH0729164A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To obtain an amorphous carbon substrate of which a highly reliable and high performance magnetic disk which facilitates the decrease of the floating height of a head can be composed. CONSTITUTION:The flatness of a whole amorphous carbon substrate is made to be not larger than 10mum and the average surface roughness Ra1 on the center line of the substrate is made to be not larger than 1nm and the surface roughness Ra2 of a region which is brought into contact with a magnetic head at the time of start and stop of a magnetic disk apparatus is made to be not less than 2nm. Therefore, attraction between the magnetic disk surface and the head which is easily produced at the time of stop and start can be avoided and, further, high density recording can be realized.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、磁気ヘッド浮揚面と磁
気ディスク表面との間に吸着現象が発生することを防止
するためにゾーンテクスチャー(Zone Texture)処理を
施した磁気ディスク用非晶質炭素基板に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an amorphous for a magnetic disk which has been subjected to a zone texture treatment in order to prevent an adsorption phenomenon from occurring between the magnetic head levitating surface and the magnetic disk surface. Regarding carbon substrate.

【0002】[0002]

【従来の技術】従来、磁気ディスク用基板には、Ni-
P(ニッケルリン)合金メッキを施したAl(アルミニ
ウム)基板が広く使用されている。しかし、磁気ディス
クの小型化及び高記録密度化が進むにつれて、従来のA
l基板ではこれに対応できなくなっている。磁気ディス
クの小型化に伴い、携帯用の装置の中にも磁気ディスク
が組み込まれるようになり、磁気ディスク用基板として
は、高い耐衝撃性といった新たな特性が要求されるよう
になってきている。そこで、Al基板に代替するものと
して、強化ガラス、セラミックス及び非晶質炭素等の新
しい基板が開発されている。特に、非晶質炭素基板は、
軽量且つ高強度であると共に、耐熱性、耐衝撃性、表面
平滑性及び表面硬さに影響される耐摩耗性等が優れてお
り、Al基板を凌ぐものである。このため、非晶質炭素
基板の実用化が要望されている。
2. Description of the Related Art Conventionally, a Ni-
An Al (aluminum) substrate plated with P (nickel phosphorus) alloy is widely used. However, as the magnetic disk becomes smaller and the recording density becomes higher, the conventional A
The l-board cannot support this. With the miniaturization of magnetic disks, magnetic disks have also been incorporated in portable devices, and new characteristics such as high impact resistance are required for magnetic disk substrates. . Therefore, as a substitute for the Al substrate, new substrates such as tempered glass, ceramics, and amorphous carbon have been developed. In particular, the amorphous carbon substrate is
It is lightweight and has high strength, and is excellent in heat resistance, impact resistance, surface smoothness, and wear resistance affected by surface hardness, and is superior to Al substrates. Therefore, there is a demand for practical use of the amorphous carbon substrate.

【0003】ところで、一般に、磁気ディスク用基板に
は、基板表面を一旦平滑に研磨等で仕上げた後、微細に
粗面化するテクスチャー処理が施されている。これは、
磁気ディスク記録再生装置において、停止時にディスク
表面へのヘッドの吸着を防止したり、起動及び停止時に
生じる磁気ディスク表面とヘッドとの摩擦を低減するた
めである。従来の非晶質炭素基板は、固定砥粒研磨(テ
ープ研磨)又は遊離砥粒研磨等の機械式研磨法及び気体
酸素による表面酸化法等の化学的処理法により基板表面
全体にわたって均一にテクスチャー処理が施されてい
る。
By the way, in general, a magnetic disk substrate is subjected to a texture treatment for finely roughening the surface of the substrate after the substrate surface is once smoothed by polishing or the like. this is,
This is to prevent the head from being attracted to the disk surface when the magnetic disk recording / reproducing apparatus is stopped, and to reduce the friction between the magnetic disk surface and the head that occurs when starting and stopping. The conventional amorphous carbon substrate is uniformly textured over the entire substrate surface by a mechanical polishing method such as fixed-abrasive polishing (tape polishing) or free-abrasive polishing and a chemical treatment method such as a surface oxidation method using gaseous oxygen. Has been applied.

【0004】[0004]

【発明が解決しようとする課題】しかしながら、基板表
面へのヘッドの吸着防止及びヘッドと基板表面との摩擦
の低減のために、基板表面にテクスチャー処理を施す
と、基板の表面平滑性が低下するため、高記録密度化が
困難になるという難点がある。また、表面に微細な凹凸
をつけるために、ヘッドの浮上高さを低くできなくなる
と共に、ビットエラーが生じやすくなるという問題点も
ある。
However, if the substrate surface is subjected to a texture treatment in order to prevent the adsorption of the head to the substrate surface and to reduce the friction between the head and the substrate surface, the surface smoothness of the substrate decreases. Therefore, it is difficult to increase the recording density. In addition, since the surface has fine irregularities, the flying height of the head cannot be lowered, and bit errors easily occur.

【0005】本発明はかかる問題点に鑑みてなされたも
のであって、磁気ディスク表面及びヘッドとの吸着を防
止できると共に、高記録密度を実現でき、ヘッドの浮上
高さも低くでき、信頼性が高く高性能の磁気ディスクを
得ることができる磁気ディスク用非晶質炭素基板を提供
することを目的とする。
The present invention has been made in view of the above problems, and it is possible to prevent the magnetic disk surface and the head from being attracted to each other, realize a high recording density, reduce the flying height of the head, and improve the reliability. It is an object of the present invention to provide an amorphous carbon substrate for a magnetic disk that can obtain a high-performance and high-performance magnetic disk.

【0006】[0006]

【課題を解決するための手段】本発明に係る磁気ディス
ク用非晶質炭素基板は、基板全体の平面度が10μm以
下であると共に、基板の中心線上での平均表面粗さRa
1が1nm以下、磁気ディスク装置の起動及び停止時に
おけるヘッドとの接触領域の表面粗さRa2が2nm以
上である表面粗度を有することを特徴とする。
An amorphous carbon substrate for a magnetic disk according to the present invention has a flatness of the entire substrate of 10 μm or less and an average surface roughness Ra on the center line of the substrate.
1 is 1 nm or less, and the surface roughness Ra 2 of the contact area with the head at the time of starting and stopping the magnetic disk device is 2 nm or more.

【0007】なお、平面度とは基板表面全体において、
その最高位置と最低位置との間の高低差である。
The flatness means the entire surface of the substrate.
The height difference between the highest position and the lowest position.

【0008】[0008]

【作用】非晶質炭素材料は、前述したように、軽量且つ
高強度であると共に、表面硬さが硬く、更に耐熱性、耐
衝撃性及び表面平滑性等が優れているという特長を有す
るが、磁気ディスク用基板として非晶質材料を活用する
ためには、基板全体の平面性を高めることが必要であ
る。
As described above, the amorphous carbon material has the features of being lightweight and high strength, having a hard surface hardness, and being excellent in heat resistance, impact resistance, surface smoothness, etc. In order to utilize an amorphous material as a magnetic disk substrate, it is necessary to improve the flatness of the entire substrate.

【0009】基板の回転及びヘッドの基板表面上での移
動に際し、ヘッドの浮上高さを安定に保つためには基板
全体の平面度を10μm以下にする必要がある。基板全
体の平面性が悪いと、基板の回転及びヘッドの基板表面
上での移動時にヘッド全体が上下運動するため、浮上高
さが不安定になる。
When the substrate is rotated and the head is moved on the substrate surface, the flatness of the entire substrate must be 10 μm or less in order to keep the flying height of the head stable. When the flatness of the entire substrate is poor, the flying height becomes unstable because the entire head moves up and down when the substrate rotates and the head moves on the substrate surface.

【0010】また、高密度での記録再生をおこなう磁気
ディスクにおいては、基板の表面粗度Ra1を1nm以
下にする必要がある。基板表面の平滑性は、ヘッドの浮
上高さ及び記録再生信号の強度の変動に大きく影響す
る。高記録密度を実現するためには、ヘッドの浮上高さ
を低くすると共に、基板表面の凹凸に起因する記録再生
信号の変動を小さくする必要がある。これらの要求を満
たすためには、基板の表面粗さRa1を1nm以下にす
る必要がある。
Further, in a magnetic disk for recording / reproducing at high density, the surface roughness Ra 1 of the substrate needs to be 1 nm or less. The smoothness of the substrate surface greatly affects the flying height of the head and variations in the intensity of the recording / reproducing signal. In order to realize a high recording density, it is necessary to reduce the flying height of the head and reduce the fluctuation of the recording / reproducing signal due to the unevenness of the substrate surface. In order to satisfy these requirements, the surface roughness Ra 1 of the substrate needs to be 1 nm or less.

【0011】一方、基板表面全体に亘って表面粗さRa
1を1nm以下という高い平滑度にすると、信号の記録
再生にとっては好都合であるが、磁気ディスク装置の停
止時にヘッドがディスク表面に吸着したり、又は、停止
及び起動時にヘッドとディスク表面との摩擦が大きくな
る。このため、ディスクの駆動に多大なエネルギーが必
要となるだけでなく、ヘッド及びディスク表面を破壊す
る虞れがある。このため、停止及び起動時にヘッドが接
触する接触領域は、表面粗度Ra2が2nm以上になる
ようにする。この表面粗度Ra2が2nm以上の領域を
専ら磁気ディスク装置の起動及び停止時におけるヘッド
及びディスク表面との接触領域とすることにより、ヘッ
ドとディスク表面との実効的な接触面積を低減すること
ができ、停止時におけるヘッドのディスク表面への吸着
を防止することができる。
On the other hand, the surface roughness Ra over the entire surface of the substrate.
When 1 is set to a high smoothness of 1 nm or less, it is convenient for recording and reproducing signals, but the head is attracted to the disk surface when the magnetic disk device is stopped, or the friction between the head and the disk surface is generated during stop and start. Grows larger. For this reason, not only a large amount of energy is required to drive the disk, but also the head and disk surface may be destroyed. For this reason, the contact area where the head contacts at the time of stopping and starting has the surface roughness Ra 2 of 2 nm or more. The effective contact area between the head and the disk surface is reduced by exclusively using the area where the surface roughness Ra 2 is 2 nm or more as the contact area between the head and the disk surface when the magnetic disk device is started and stopped. It is possible to prevent the head from adsorbing to the disk surface when stopped.

【0012】また、記録再生領域においては、基板の平
滑性を確保する必要上、基板中心線上での平均表面粗さ
Ra1は1nm以下にする。なお、本発明において、基
板中心線上での平均表面粗さRa1とは、前記接触領域
を除く記録再生領域の表面粗さを測定しその平均値を求
めたものである。
In the recording / reproducing area, the average surface roughness Ra 1 on the center line of the substrate is set to 1 nm or less in order to ensure the smoothness of the substrate. In the present invention, the average surface roughness Ra 1 on the center line of the substrate is obtained by measuring the surface roughness of the recording / reproducing area excluding the contact area and calculating the average value.

【0013】こうすることにより、磁気ディスクの停止
及び起動時のヘッドとディスク表面との摩擦を小さくで
きると共に、信号の記録密度が高い磁気ディスクを得る
ことができる。
By doing so, it is possible to reduce friction between the head and the disk surface when the magnetic disk is stopped and started, and it is possible to obtain a magnetic disk having a high signal recording density.

【0014】[0014]

【実施例】次に、本発明の実施例について説明する。先
ず、本実施例の非晶質炭素基板の製造方法について説明
する。上述の如く構成された非晶質炭素基板は、種々の
方法により製造することができる。非晶質炭素は、これ
らの原料である3次元編み目構造を有する熱硬化性樹
脂、例えばフェノール樹脂、フラン樹脂及びポリイミド
樹脂等を不活性雰囲気中で800乃至2700℃に熱処
理することにより得ることができる。そこで、これらの
原料樹脂を磁気ディスクの形状に成形した後、この成形
体を上述のような条件で熱処理することにより、ディス
ク形状の非晶質炭素焼成体を得ることができる。
EXAMPLES Next, examples of the present invention will be described. First, a method for manufacturing the amorphous carbon substrate of this example will be described. The amorphous carbon substrate configured as described above can be manufactured by various methods. Amorphous carbon can be obtained by heat-treating a thermosetting resin, such as a phenol resin, a furan resin, or a polyimide resin, which is a raw material of these materials and has a three-dimensional stitch structure, at 800 to 2700 ° C. in an inert atmosphere. it can. Therefore, by molding these raw material resins into the shape of a magnetic disk and then heat-treating the molded body under the conditions as described above, a disk-shaped amorphous carbon fired body can be obtained.

【0015】次に、この焼成体に所定の端面加工及び表
面研磨を施すことにより、表面粗度Ra1が1nm以下
の非晶質炭素ディスクに仕上げる。このようにして製造
した非晶質炭素ディスクは、その表面全体に亘って平滑
性が高いので、その表面の一部を以下に示すいずれかの
方法で粗面化することにより、本発明の非晶質炭素基板
を得ることができる。
Next, the fired body is subjected to predetermined end face processing and surface polishing to finish an amorphous carbon disk having a surface roughness Ra 1 of 1 nm or less. Since the amorphous carbon disk produced in this manner has a high smoothness over the entire surface thereof, a part of the surface is roughened by any of the following methods, so that A crystalline carbon substrate can be obtained.

【0016】即ち、第1の方法においては、図1に示す
ように、全面が1nm以下の表面粗度を有する非晶質炭
素ディスク1を、酸素を含有する雰囲気中にて、その内
周部のリング状の部分2をミクロバーナー、放電、又は
赤外線等の照射手段により局所的に加熱し、その加熱部
分のみを表面酸化して表面粗さRa2が2nm以上に粗
面化する。非晶質炭素は、制御された条件のもとでは、
研磨による加工応力が残留する部分が選択的に酸化され
るので、図2に示すように、ディスク1の平滑な研磨面
と粗面化部分2との間に段差を生じさせることなく表面
を粗面化することができる。
That is, in the first method, as shown in FIG. 1, an amorphous carbon disk 1 having an entire surface with a surface roughness of 1 nm or less is formed in an atmosphere containing oxygen in an inner peripheral portion thereof. The ring-shaped portion 2 is locally heated by irradiation means such as a microburner, discharge, or infrared rays, and only the heated portion is surface-oxidized to roughen the surface roughness Ra 2 to 2 nm or more. Amorphous carbon, under controlled conditions,
Since the portion where the processing stress due to polishing remains is selectively oxidized, as shown in FIG. 2, the surface is roughened without causing a step between the smooth polished surface of the disk 1 and the roughened portion 2. Can be faced.

【0017】次に、第2の方法においては、非晶質炭素
ディスク1を回転させながら、その内周部の部分2に研
磨テープを接触させることにより、この接触部分2のみ
の表面粗さRa2を2nm以上に粗面化する。この際、
研磨テープを基板に押しつける圧力及び加工時間を最適
化することにより、平滑な研磨面との段差を実用上支障
のない範囲内に制御することができる。また、部分2の
テープ研磨した面がディスク1の平滑な面より低くなっ
ても、図3の上下図に示すように、ディスク1の平滑な
研磨面と粗面化部分2との間を滑らかな傾斜を有する部
分でつなげることにより、ヘッドの移動を支障なくおこ
なうことができる。
Next, in the second method, while the amorphous carbon disk 1 is being rotated, the polishing tape is brought into contact with the inner peripheral portion 2 of the amorphous carbon disk 1, whereby the surface roughness Ra of only the contact portion 2 is increased. 2 is roughened to 2 nm or more. On this occasion,
By optimizing the pressure with which the polishing tape is pressed against the substrate and the processing time, it is possible to control the level difference with the smooth polishing surface within a range that does not hinder practical use. Further, even if the tape-polished surface of the portion 2 becomes lower than the smooth surface of the disc 1, as shown in the upper and lower diagrams of FIG. 3, there is smoothness between the smooth polished surface of the disc 1 and the roughened portion 2. The head can be moved without hindrance by connecting the portions having different slopes.

【0018】第3の方法においては、非晶質炭素ディス
ク1の内周の一部の領域に、レーザー光を集光して照射
し、基板表面に微細な穴を多数あけ、これにより表面粗
さRa2を2nm以上にする。炭素材料は、Al又はガ
ラスと異なり、熱により溶融又は軟化することはない。
従って、レーザー光を照射した部分2の周辺部にかえり
又はもりあがりが生じることはない。このため、レーザ
ー光により粗面化した部分2の表面は、図4に示すよう
に、ディスク1の平滑な研磨面との段差がない。
In the third method, a laser beam is focused and irradiated on a part of the inner circumference of the amorphous carbon disk 1 to form a large number of fine holes on the surface of the substrate, which results in surface roughness. Ra 2 is set to 2 nm or more. Unlike Al or glass, a carbon material does not melt or soften due to heat.
Therefore, there is no burr or rise in the peripheral portion of the portion 2 irradiated with the laser beam. Therefore, the surface of the portion 2 roughened by the laser light has no step with the smooth polished surface of the disk 1 as shown in FIG.

【0019】このようにして本発明の実施例に係る磁気
ディスク用非晶質炭素基板を製造することができる。得
られた非晶質炭素基板は記録再生領域においては平滑性
が高いため、磁気ディスクの記録密度を高めることがで
きると共に、磁気ヘッドの浮上高さを小さくすることが
できる。このため、高性能の磁気ディスクを得ることが
できる。一方、ヘッドが接触する領域は表面粗さRa2
を2nm以上に粗面化してあるため、ヘッドの吸着を防
止することができる。
Thus, the amorphous carbon substrate for a magnetic disk according to the embodiment of the present invention can be manufactured. Since the obtained amorphous carbon substrate has high smoothness in the recording / reproducing area, the recording density of the magnetic disk can be increased and the flying height of the magnetic head can be reduced. Therefore, a high performance magnetic disk can be obtained. On the other hand, the area where the head comes into contact has a surface roughness Ra 2
Since the surface is roughened to 2 nm or more, head adsorption can be prevented.

【0020】なお、一般に高密度非晶質炭素とは、ガラ
ス質炭素に超高温HIP(熱間静水圧加圧)処理を施す
ことにより、気孔を殆ど消失させて密度を1.80g/
cm3以上と高くしたものをいうが、本発明における非
晶質炭素はHIP処理条件における温度及び圧力を下げ
てHIP処理することより密度が1.80g/cm3
満たないようにしたものをも含み、その特性をグラファ
イトに近づけた非晶質炭素も含む。
Generally, high-density amorphous carbon means that glassy carbon is subjected to an ultra-high temperature HIP (hot isostatic pressing) treatment so that most of the pores are eliminated and the density is 1.80 g /
refers to those as high as cm 3 or more, but what density than that amorphous carbon in the present invention is to HIP treatment by lowering the temperature and pressure in the HIP processing conditions were as less than 1.80 g / cm 3 It also includes amorphous carbon whose properties are close to those of graphite.

【0021】次に、本発明の実施例に係る磁気ディスク
用非晶質炭素基板を実際に製造し、その特性を比較例と
比較した結果について説明する。
Next, the results of actually manufacturing the amorphous carbon substrate for a magnetic disk according to the embodiment of the present invention and comparing the characteristics thereof with the comparative example will be described.

【0022】先ず、フェノールホルムアルデヒド樹脂を
磁気ディスクの形状に成形した後、窒素雰囲気中で約1
500℃まで加熱処理することにより、非晶質炭素ディ
スクを得た。次に、このディスクを外径65mm、内径
20mm、厚さ0.635mmに加工した。その後、両
面研磨機で、非晶質炭素ディスクの表面粗さRa1
0.7nmになるように表面を研磨した。
First, a phenol-formaldehyde resin is molded into a magnetic disk shape, and then, in a nitrogen atmosphere, about 1
An amorphous carbon disk was obtained by heat treatment to 500 ° C. Next, this disk was processed into an outer diameter of 65 mm, an inner diameter of 20 mm, and a thickness of 0.635 mm. Then, the surface was polished by a double-sided polishing machine so that the surface roughness Ra 1 of the amorphous carbon disk was 0.7 nm.

【0023】次に、上記ディスクを回転させながら、内
周部の幅が約4mmの領域をミクロバーナーで加熱し、
カーボン基板の表面を軽度に酸化した。加熱時間を変え
ることにより、加熱処理部分の表面粗さRa2を1.5
乃至8.0nmまで変化させることができた。なお、表
面粗さは、非接触表面粗さ計(TOPO3D;WYKO
社製)を用いて測定した。
Next, while rotating the disc, an area having an inner peripheral width of about 4 mm was heated by a microburner,
The surface of the carbon substrate was slightly oxidized. By changing the heating time, the surface roughness Ra 2 of the heat-treated portion is 1.5.
To 8.0 nm. The surface roughness is measured using a non-contact surface roughness meter (TOPO3D; WYKO).
(Manufactured by the company).

【0024】次に、上述の如くして製造した各ディスク
用非晶質炭素基板を精密洗浄した後、この非晶質炭素基
板上にCrの下地層、CoNiCrからなるメディア層
(磁性膜)及びカーボン保護膜とを順次蒸着成膜し、更
にその表面に潤滑剤を塗布して磁気ディスクを作製し
た。
Next, the amorphous carbon substrate for each disk manufactured as described above is precisely cleaned, and then a Cr underlayer, a CoNiCr media layer (magnetic film) and a CrNi underlayer are formed on the amorphous carbon substrate. A carbon protective film and a carbon protective film were sequentially formed by vapor deposition, and a lubricant was applied to the surface of the film to prepare a magnetic disk.

【0025】なお、比較例として、全くテクスチャー処
理を施さずに、研磨したままの基板と、基板の表面全体
に亘り均一にテクスチャー処理した基板とを用意し、こ
れらの基板の上に上述のメディア層等を形成した。
As a comparative example, a substrate that has not been textured at all and has been polished and a substrate that has been uniformly textured over the entire surface of the substrate are prepared. Layers etc. were formed.

【0026】これらの実施例1乃至4及び比較例5乃至
7に係る磁気ディスクについて、ヘッド吸着又はヘッド
クラッシュの発生状況試験及び記録再生エラー試験を実
施した。その結果を下記表1に示す。
With respect to the magnetic disks according to Examples 1 to 4 and Comparative Examples 5 to 7, a head adsorption or head crash occurrence status test and a recording / reproduction error test were carried out. The results are shown in Table 1 below.

【0027】なお、表1において実施例1乃至4及び比
較例5は研磨後、内周部のみを酸化することにより表面
粗度を粗くしたものであり、研磨面の粗度はいずれの基
板も表面粗さRaが0.7nmである。
In Table 1, in Examples 1 to 4 and Comparative Example 5, the surface roughness is roughened by oxidizing only the inner peripheral portion after polishing, and the roughness of the polished surface is the same for all substrates. The surface roughness Ra is 0.7 nm.

【0028】比較例6は、研磨後、表面全体にわたって
テクスチャー処理を施したものであり、比較例7は、研
磨しただけのものである。
In Comparative Example 6, the entire surface was subjected to texture treatment after polishing, and Comparative Example 7 was only polished.

【0029】各基板において、粗面化した部分の表面粗
さRa2は表1に記載した。
The surface roughness Ra 2 of the roughened portion of each substrate is shown in Table 1.

【0030】[0030]

【表1】 [Table 1]

【0031】この表1から明かなように、実施例1乃至
4に係る磁気ディスクはいずれもヘッドの吸着及びヘッ
ドクラッシュが発生することはなかった。また、実施例
1乃至4に係る磁気ディスクは記録再生特性が優れてい
た。
As is clear from Table 1, the magnetic disks according to Examples 1 to 4 did not cause head adsorption or head crash. The magnetic disks according to Examples 1 to 4 had excellent recording / reproducing characteristics.

【0032】一方、比較例5は記録再生特性は優れてい
るものの、表面粗さRa2が1.5nmと小さいので、
粗面化が不足し、ヘッド吸着及びヘッドクラッシュが発
生した。全面にわたってテクスチャー処理を施した比較
例6では、ヘッドの吸着及びヘッドクラッシュは発生し
なかったが、記録再生エラーの特性は悪化している。ま
た、研磨したままでテクスチャー処理を施していない比
較例7は、記録再生エラーは少ないが、ヘッドの吸着及
びヘッドクラッシュが発生している。
On the other hand, Comparative Example 5 has excellent recording and reproducing characteristics, but has a small surface roughness Ra 2 of 1.5 nm.
Roughening was insufficient, and head adsorption and head crash occurred. In Comparative Example 6 in which the entire surface was subjected to the texture treatment, head adsorption and head crash did not occur, but the characteristics of recording / reproduction error were deteriorated. Further, in Comparative Example 7 in which the texture treatment was not performed as it was polished, the recording / reproducing error was small, but the head adsorption and the head crash occurred.

【0033】[0033]

【発明の効果】以上説明したように本発明によれば、基
板全体の平面度が10μm以下であり、基板表面の内周
部のみにゾーンテクスチャー処理を施し、中心線平均表
面粗さRa1は1nm以下と平滑性を有すると共に、磁
気ディスク装置の起動及び停止時におけるヘッドとの接
触領域の表面粗さRa2は2nm以上に粗面化したの
で、磁気ディスク表面とヘッドの吸着を防止できると共
に、高記録密度を実現でき、ヘッドの浮上高さも低くで
き、信頼性が高く高性能の磁気ディスク用非晶質炭素基
板を得ることができる。
As described above, according to the present invention, the flatness of the entire substrate is 10 μm or less, the zone texture treatment is applied only to the inner peripheral portion of the substrate surface, and the center line average surface roughness Ra 1 is In addition to having a smoothness of 1 nm or less, the surface roughness Ra 2 of the contact area with the head at the time of starting and stopping the magnetic disk device is roughened to 2 nm or more, so that the magnetic disk surface and the head can be prevented from being attracted. A high recording density can be realized, the flying height of the head can be reduced, and a highly reliable and high-performance amorphous carbon substrate for a magnetic disk can be obtained.

【0034】従って、本発明に係る磁気ディスク用非晶
質炭素基板は、高性能の磁気ディスク用の基板として好
適である。
Therefore, the amorphous carbon substrate for a magnetic disk according to the present invention is suitable as a substrate for a high performance magnetic disk.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の実施例に係る非晶質炭素基板において
ゾーンテクスチャー処理部分を示す平面図である。
FIG. 1 is a plan view showing a zone texture processed portion in an amorphous carbon substrate according to an example of the present invention.

【図2】ミクロバーナー、放電及び赤外線照射等による
表面酸化法によりゾーンテクスチャー処理を施した本発
明の実施例に係る非晶質炭素基板を示す断面図である。
FIG. 2 is a cross-sectional view showing an amorphous carbon substrate according to an embodiment of the present invention, which has been subjected to zone texture treatment by a surface oxidation method such as a microburner, discharge and infrared irradiation.

【図3】テープ研磨によりゾーンテクスチャー処理を施
した本発明の実施例に係る非晶質炭素基板を示す断面図
である。
FIG. 3 is a cross-sectional view showing an amorphous carbon substrate according to an example of the present invention that has been subjected to zone texture processing by tape polishing.

【図4】レーザー光照射によるゾーンテクスチャー処理
を施した本発明の実施例に係る非晶質炭素基板を示す断
面図である。
FIG. 4 is a cross-sectional view showing an amorphous carbon substrate according to an example of the present invention that has been subjected to zone texture treatment by laser light irradiation.

【符号の説明】 1;非晶質炭素ディスク 2;部分[Explanation of symbols] 1; Amorphous carbon disk 2; Part

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 基板全体の平面度が10μm以下である
と共に、基板の中心線上での平均表面粗さRa1が1n
m以下、磁気ディスク装置の起動及び停止時におけるヘ
ッドとの接触領域の表面粗さRa2が2nm以上である
表面粗度を有することを特徴とする磁気ディスク用非晶
質炭素基板。
1. The flatness of the entire substrate is 10 μm or less, and the average surface roughness Ra 1 on the center line of the substrate is 1 n.
An amorphous carbon substrate for a magnetic disk having a surface roughness Ra of 2 nm or more in a contact area with a head when the magnetic disk device is started and stopped.
JP17007693A 1993-07-09 1993-07-09 Amorphous carbon substrate for magnetic disk Pending JPH0729164A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17007693A JPH0729164A (en) 1993-07-09 1993-07-09 Amorphous carbon substrate for magnetic disk

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17007693A JPH0729164A (en) 1993-07-09 1993-07-09 Amorphous carbon substrate for magnetic disk

Publications (1)

Publication Number Publication Date
JPH0729164A true JPH0729164A (en) 1995-01-31

Family

ID=15898201

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17007693A Pending JPH0729164A (en) 1993-07-09 1993-07-09 Amorphous carbon substrate for magnetic disk

Country Status (1)

Country Link
JP (1) JPH0729164A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5825596A (en) * 1996-02-13 1998-10-20 Kabushiki Kaisha Toshiba Hard disk drive

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5825596A (en) * 1996-02-13 1998-10-20 Kabushiki Kaisha Toshiba Hard disk drive
US5909341A (en) * 1996-02-13 1999-06-01 Kabushiki Kaisha Toshiba Hard disk drive

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