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JPH07273456A - Manufacturing method of laminated layer ceramic substrate - Google Patents

Manufacturing method of laminated layer ceramic substrate

Info

Publication number
JPH07273456A
JPH07273456A JP6085953A JP8595394A JPH07273456A JP H07273456 A JPH07273456 A JP H07273456A JP 6085953 A JP6085953 A JP 6085953A JP 8595394 A JP8595394 A JP 8595394A JP H07273456 A JPH07273456 A JP H07273456A
Authority
JP
Japan
Prior art keywords
baked
ceramic substrate
laminated
melting point
high melting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6085953A
Other languages
Japanese (ja)
Inventor
Akiyoshi Kosakata
明義 小阪田
Nobuhiro Nishijima
信広 西島
Sumio Nakano
澄夫 中野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Steel and Sumikin Electronics Devices Inc
Original Assignee
Sumitomo Metal Ceramics Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Metal Ceramics Inc filed Critical Sumitomo Metal Ceramics Inc
Priority to JP6085953A priority Critical patent/JPH07273456A/en
Publication of JPH07273456A publication Critical patent/JPH07273456A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To manufacture the title laminated layer ceramic substrate having conductive patterns such as bumps, etc., having excellent surface flatness by a method wherein a green sheet laminated bodies having conductor patterns in the surface and inner layer are baked and then the baked bodies whose surfaces and rear surfaces held by the same or homogeneous quality high melting point metallic sheet are re-baked. CONSTITUTION:Green sheets 1a, 3a, 4a printed with conductor patterns are laminated, heated and pressurized to produce a laminated body 7 furthermore, baked in a baking furnace in a reducing atmosphere to produce a baked body 8. Next, so as to avoid the warping of the baked body 8 due to the thermal deformation in the baking step, the surface and rear surface of the baked board 8 are held by high melting point metallic sheets 9, 10 to be mounted on a jig 11 for re-baking in the baking furnace in reducing atmosphere. At this time, the high melting point metallic sheets 9, 10 in the same or homogeneous quality are used to keep the warping not more than 5m/25.4mm. Furthermore, the surface roughness Ra of the minimum conductor pattern 2 side of the high melting point metallic sheet 9 is specified to be 1.0mum-50.0mum by honing process.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、積層セラミック基板の
製造方法に係り、より詳細には、表層に半導体チップを
搭載し、該半導体チップと電気的に接続するためのバン
プ等の導体パターンを備え、かつ焼成時の熱変形による
反りの発生を抑制した積層セラミック基板の製造方法に
関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a laminated ceramic substrate, and more particularly to mounting a semiconductor chip on the surface layer and providing a conductor pattern such as a bump for electrically connecting to the semiconductor chip. The present invention relates to a method for manufacturing a monolithic ceramic substrate, which is provided and suppresses warpage due to thermal deformation during firing.

【0002】[0002]

【従来の技術】積層セラミック基板は、一般的に、セラ
ミック粉末、樹脂およびバインダーを含む原料からグリ
ーンシートを作製し、該グリーンシートの表面にタング
ステン等の導体パターン形成用ペーストを印刷し、該グ
リーンシートを複数枚重ね合わせた後、金型を用いて所
定圧力下、一定時間、加熱・加圧し、該積層体を150
0〜1600℃の還元性雰囲気下で焼成して作製されて
いる。
2. Description of the Related Art Generally, a laminated ceramic substrate is prepared by forming a green sheet from a raw material containing a ceramic powder, a resin and a binder, and printing a conductor pattern forming paste such as tungsten on the surface of the green sheet. After stacking a plurality of sheets, they are heated and pressed under a predetermined pressure for a certain period of time by using a mold, and the laminated body is heated to 150.
It is produced by firing in a reducing atmosphere of 0 to 1600 ° C.

【0003】しかし、この積層セラミック基板にあって
は、高温で焼成して作製されるため熱変形を受けやす
く、該熱変形による『反り』が発生し、製品の歩留りが
低下するという問題がある。このような問題は、通常、
『反り』の発生した面を研磨して、その『反り』を無く
し、表面平坦性を出している。
However, since this monolithic ceramic substrate is manufactured by firing at a high temperature, it is susceptible to thermal deformation, and "warpage" occurs due to the thermal deformation, which lowers the yield of products. . Such problems are usually
The surface where "warpage" has occurred is polished to eliminate the "warpage" and to provide surface flatness.

【0004】ところで、近年、予め表層に半導体チップ
を搭載し、該半導体チップと電気的に接続するためのバ
ンプが設けられているコントロール・コレプス・チップ
・コネクションと呼ばれる積層セラミック基板がある。
この積層セラミック基板は、通常、該基板上に薄膜とポ
リイミドによって回路が後付け形成されている。しか
し、この構成の場合、その作製に多くの工程を要し、か
つ薄膜技術によるため製造コストがかかるという問題が
ある。
By the way, in recent years, there is a multilayer ceramic substrate called a control-collapse chip connection in which a semiconductor chip is mounted on the surface layer in advance and bumps for electrically connecting to the semiconductor chip are provided.
In this laminated ceramic substrate, a circuit is usually formed afterward by a thin film and polyimide on the substrate. However, in the case of this configuration, there are problems that many steps are required for its fabrication and that the manufacturing cost is high because of the thin film technology.

【0005】そこで、本発明者は、この表層にバンプを
有する積層セラミック基板を、該バンプもグリーンシー
ト上に印刷し、他の導体パターンと共に、同時焼成して
作製することを提案した。しかし、この表層にバンプを
有する積層セラミック基板の場合も、該バンプの上に半
導体チップを搭載するので、該バンプの表面平坦性が要
求されるため、前述した『反り』の問題がある。
Therefore, the present inventor has proposed to manufacture a multilayer ceramic substrate having bumps on its surface layer by printing the bumps on a green sheet and co-firing with other conductor patterns. However, even in the case of the laminated ceramic substrate having bumps on its surface layer, since the semiconductor chip is mounted on the bumps, the surface flatness of the bumps is required, so that there is the above-mentioned "warpage" problem.

【0006】そこで、近年では、このような『反り』の
問題に鑑み、次のような方法が提案されている。すなわ
ち、 グリーンシートの上に導体パターンを形成した後、
該導体パターンを除く該グリーンシート上に、該導体パ
ターンの膜厚以上の厚みの絶縁被膜を形成して焼成した
後、該導体パターン側の面に高融点金属板を載せて再焼
成する積層セラミック基板の製造方法(特開昭61−2
93002号公報参照)。 積層セラミック基板とは異なるが、一般的なセラミ
ック基板の反りの修正方法であって、焼成時に反りを生
じたセラミック基板を平板状の治具に載せると共に、該
セラミック基板上に等分布荷重を加えて再焼成する反り
の修正方法(特開平4−31368号公報参照)。 が提案されている。そして、この方法によれば、焼成時
の熱変形による『反り』の発生を抑制でき、あるいは
『反り』を修正できる。
Therefore, in recent years, in view of such a problem of "warpage", the following method has been proposed. That is, after forming the conductor pattern on the green sheet,
A laminated ceramic in which an insulating coating having a thickness equal to or larger than the film thickness of the conductor pattern is formed on the green sheet excluding the conductor pattern and fired, and then a refractory metal plate is placed on the surface of the conductor pattern and refired. Substrate manufacturing method (JP-A-61-2
No. 93002). Although it is different from the laminated ceramic substrate, it is a general method of correcting the warp of the ceramic substrate, in which the warped ceramic substrate is placed on a flat jig and a uniform load is applied on the ceramic substrate. A method of correcting the warp by re-baking (see Japanese Patent Laid-Open No. 4-31368). Is proposed. Then, according to this method, it is possible to suppress the occurrence of "warpage" due to thermal deformation during firing, or to correct the "warpage".

【0007】[0007]

【発明が解決しようとする課題】しかしながら、上述し
たような従来の積層セラミック基板の製造方法や、反り
の修正方法の場合、次のような課題がある。すなわち、 前者にあっては、グリーンシート上に導体パターン
の膜厚以上の厚みの絶縁被膜を形成する必要があり、そ
の絶縁被膜の形成が難しい。またグリーンシートを焼成
した後、その上面に高融点金属板による重しを載せて、
該荷重でもって再焼成の際に、反りを修正する構成であ
るが、その均一荷重が得難い。 後者にあっては、積層セラミック基板に適用した場
合、等分布荷重を加えても内層に導体パターンが存在す
るので、反りの修正に限度がある。等の課題が残る。
However, the conventional method for manufacturing a laminated ceramic substrate and the method for correcting warpage as described above have the following problems. That is, in the former case, it is necessary to form an insulating coating having a thickness equal to or larger than the thickness of the conductor pattern on the green sheet, and it is difficult to form the insulating coating. Also, after firing the green sheet, put a weight with a refractory metal plate on the upper surface,
The warp is corrected by the load at the time of re-firing, but it is difficult to obtain the uniform load. In the latter case, when applied to a monolithic ceramic substrate, there is a limit to the correction of warpage because the conductor pattern exists in the inner layer even if a uniform load is applied. And other issues remain.

【0008】本発明は、上述した問題に対処して創作し
たものであって、その目的とする処は、表面平坦性の優
れたバンプ等の表層の導体パターンを有する積層セラミ
ック基板の製造方法を提供することにある。
The present invention has been made to solve the above-mentioned problems, and an object of the present invention is to provide a method for manufacturing a laminated ceramic substrate having a surface conductor pattern such as bumps having excellent surface flatness. To provide.

【0009】[0009]

【課題を解決するための手段】そして、上記目的を達成
するための手段としての本発明の積層セラミック基板の
製造方法は、表面に導体パターンを印刷したグリーンシ
ートを複数枚積層し、表層と内層に導体パターンを有す
るグリーンシート積層体を作製すると共に該グリーンシ
ート積層体を焼成した後、その表裏面を平板状の同一ま
たは同質の反りが5μm以下/25.4mm,表面粗さ
がRa=1μm〜50μmの高融点金属板で挟んで再焼
成してなる構成としている。
A method for manufacturing a laminated ceramic substrate according to the present invention as a means for achieving the above object is to laminate a plurality of green sheets each having a conductor pattern printed on the surface thereof, and to form a surface layer and an inner layer. After producing a green sheet laminate having a conductor pattern on the substrate and firing the green sheet laminate, the front and back surfaces thereof have a flat or uniform warp of 5 μm or less / 25.4 mm and a surface roughness Ra = 1 μm. It is structured such that it is sandwiched between high melting point metal plates of ˜50 μm and refired.

【0010】[0010]

【作用】本発明の積層セラミック基板の製造方法は、表
層と内層に導体パターンを有するグリーンシート積層体
を作製すると共に該グリーンシート積層体を焼成し、表
層に導体パターンを有する焼成体を作製した後、該焼成
体の表裏面を平板状の同一または同質の高融点金属板で
挟んだ状態で、これを治具の上に載せて再焼成すること
により、前記焼成体中のセラミック成分が軟化され、か
つ該焼成体の表裏面が平板状の同一または同質の高融点
金属板で挟み込まれているので、該表裏面から均一な加
圧状態が保持され、最初の焼成時に生じた『反り』が修
正され、更に冷却時の熱収縮による変形が抑制されるた
め、表面平坦性の優れた積層セラミック基板を製造でき
る。
According to the method for producing a laminated ceramic substrate of the present invention, a green sheet laminate having conductor patterns on the surface layer and the inner layer is produced and the green sheet laminate is fired to produce a fired body having conductor patterns on the surface layer. After that, the front and back surfaces of the fired body are sandwiched between flat or identical high-melting-point metal plates, and the fired body is placed on a jig and fired again to soften the ceramic components in the fired body. And, since the front and back surfaces of the fired body are sandwiched by flat plate-shaped same or similar high melting point metal plates, a uniform pressurization state is maintained from the front and back surfaces, and "warpage" generated during the first firing. Is corrected and deformation due to heat shrinkage during cooling is suppressed, so that a laminated ceramic substrate having excellent surface flatness can be manufactured.

【0011】[0011]

【実施例】以下、図面を参照しながら、本発明を具体化
した実施例について説明する。ここに、図1本発明の一
実施例を示し、積層セラミック基板の製造工程を説明す
る工程図である。
Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a process diagram showing one embodiment of the present invention and explaining a manufacturing process of a laminated ceramic substrate.

【0012】本実施例は、三層からなる積層セラミック
基板の製造方法であって、概略すると、図1に示すよう
に、グリーンシート作製・スルーホール穿設・導体詰
め工程、導体パターン印刷工程、グリーンシート積
層体作製工程、積層体焼成工程、再焼成工程、の五
工程を有し、〜の各工程は、従来の積層セラミック
基板の製造工程と同様であり、本実施例は、第5工程で
ある『再焼成工程』に特徴を有する。
This embodiment is a method of manufacturing a laminated ceramic substrate having three layers, and, as shown in FIG. 1, as shown in FIG. 1, green sheet preparation, through hole formation, conductor filling step, conductor pattern printing step, There are five steps of a green sheet laminated body manufacturing step, a laminated body firing step, and a re-firing step. Each step of to is the same as the conventional laminated ceramic substrate manufacturing step. It is characterized by the "refiring process".

【0013】グリーンシート作製・スルーホール穿設・
導体詰め工程、導体パターン印刷工程、グリーンシート
積層体作製工程、および積層体焼成工程は、図1(a)
〜(d)に示すように、従来の積層セラミック基板の製
造工程と同様であるので、詳しい説明は省略するが、本
実施例の積層セラミック基板では、導体パターン印刷工
程において、グリーンシート作製・スルーホール穿設・
導体詰め工程で作製された表層1を形成するグリーンシ
ート1aの表面に、半導体チップを搭載し、かつ該半導
体チップを電気的に接続するためのバンプよりなる微小
導体パターン2が複数個印刷されている。また、内層
3、裏面層4を形成するグリーンシート3a、4aに
は、内部導体パターン5、6が印刷されている。なお、
13、14、15は導体詰めしたスルーホールである。
Green sheet production / through hole drilling /
The conductor filling step, the conductor pattern printing step, the green sheet laminate manufacturing step, and the laminate firing step are shown in FIG.
As shown in (d) to (d), the manufacturing process of the conventional laminated ceramic substrate is the same as the manufacturing process of the conventional laminated ceramic substrate, and thus detailed description thereof will be omitted. Hole drilling
On the surface of the green sheet 1a forming the surface layer 1 produced in the conductor packing step, a plurality of fine conductor patterns 2 each having a semiconductor chip mounted thereon and bumps for electrically connecting the semiconductor chips are printed. There is. Internal conductor patterns 5 and 6 are printed on the green sheets 3 a and 4 a forming the inner layer 3 and the back surface layer 4. In addition,
Reference numerals 13, 14, and 15 are through holes filled with conductors.

【0014】そして、次のグリーンシート積層体作製工
程で、グリーンシート1a、2a、3aを積み重ね、金
型を用いて、温度:100〜130℃、圧力:50〜8
0kg/cm2 で加熱・加圧しグリーンシートの積層体
7を作製し、更に積層体焼成工程で、内部温度が150
0〜1600℃の還元雰囲気下の焼成炉で焼成し、焼成
体8を作製している。ところで、この焼成体8は、焼成
の際に熱変形を受けて『反り』の発生するものがある。
そこで、本実施例においては、この焼成体8を再焼成す
る第5工程である『再焼成工程』を有する。
Then, in the next step of producing a green sheet laminate, the green sheets 1a, 2a and 3a are stacked and the temperature is 100 to 130 ° C. and the pressure is 50 to 8 by using a mold.
A green sheet laminate 7 is produced by heating and pressurizing at 0 kg / cm 2 , and the internal temperature is 150 in the laminate firing process.
The fired body 8 is manufactured by firing in a firing furnace in a reducing atmosphere of 0 to 1600 ° C. By the way, some of the fired bodies 8 undergo "warping" due to thermal deformation during firing.
Therefore, in this embodiment, there is a "rebaking step" which is a fifth step of rebaking the fired body 8.

【0015】この再焼成工程は、積層体焼成工程におい
て生じた『反り』を修正して、表面平坦性に優れた積層
セラミック基板を作製する工程である。すなわち、本工
程においては、図1(e)に示すように、焼成体8の表
裏面8a、8bに平板状の高融点金属板9、10を配し
て、焼成板8の表裏面を高融点金属板9、10で挟み、
これを治具11の上に載せて、前記積層体焼成工程と同
じく、内部温度が1500〜1600℃の還元雰囲気下
の焼成炉で再焼成することにより、『反り』を修正する
工程である。
This re-firing step is a step of correcting the "warpage" generated in the step of firing the laminated body to produce a monolithic ceramic substrate having excellent surface flatness. That is, in this step, as shown in FIG. 1E, flat refractory metal plates 9 and 10 are arranged on the front and back surfaces 8a and 8b of the fired body 8 so that the front and back surfaces of the fired plate 8 are raised. Sandwiched between melting point metal plates 9 and 10,
This is a step of correcting the "warpage" by placing it on a jig 11 and re-baking it in a baking furnace in a reducing atmosphere having an internal temperature of 1500 to 1600 ° C., as in the above-mentioned laminated body baking step.

【0016】ここで、高融点金属板9、10は、同一ま
たは同質の金属板であって、平板状のモリブデン板やタ
ングステン板が用いられている。この高融点金属板9、
10としては反りが小さい平板状の金属板を用いること
が必要で、研磨処理により、反り=5μm以下/25.
4mmに押さえられている。そして、焼成体8の表面8
a側に配されている高融点金属板9は、焼成体8の表面
8aの上の微小導体パターン2側の面9aの表面粗さ
を、ホーニング処理によりRa=1.0μm〜50.0
μmとしている。Ra=1.0μm以上としたのは、再
焼成時に、高融点金属板9と微小導体パターン2との接
着を防止するためであり、Ra=50.0μm以下とし
たのは、ホーニング加工の作業性を考慮したことによ
る。
Here, the refractory metal plates 9 and 10 are the same or similar metal plates, and are flat molybdenum plates or tungsten plates. This high melting point metal plate 9,
It is necessary to use a flat metal plate having a small warpage as No. 10, and the warpage is 5 μm or less / 25.
It is held down to 4 mm. Then, the surface 8 of the fired body 8
The refractory metal plate 9 arranged on the a side has a surface roughness of the surface 9a on the side of the fine conductor pattern 2 on the surface 8a of the fired body 8 which is Ra = 1.0 μm to 50.0 by honing.
μm. Ra = 1.0 μm or more is to prevent the high melting point metal plate 9 and the fine conductor pattern 2 from adhering to each other at the time of re-firing, and Ra = 50.0 μm or less is the work of honing. It is due to consideration of sex.

【0017】そして、焼成体8の表裏面8a、8bを高
融点金属板9、10で挟み、これを治具11の上に載せ
て再焼成する。ここで、治具11としては、高融点金属
板9、10と同じくモリブデンやタングステンで形成さ
れた治具(載置台)が用いられる。この治具11は、高
融点金属板9、10程の反りの許容範囲は要求されるも
のではない。この焼成体8は、再焼成によって、焼成体
8中のセラミック成分が軟化されるが、その表裏面8
a、8bが平板状の同一または同質の高融点金属板9、
10で挟み込まれているので、該表裏面から均一な加圧
状態が保持され、積層体焼成工程の際に生じた『反り』
が修正され、更に冷却時の熱収縮による変形が抑制され
る。従って、表面平坦性の優れた積層セラミック基板を
作製することができる。
Then, the front and back surfaces 8a and 8b of the fired body 8 are sandwiched between the high melting point metal plates 9 and 10, and this is placed on the jig 11 and refired. Here, as the jig 11, a jig (mounting table) made of molybdenum or tungsten, like the refractory metal plates 9 and 10, is used. The jig 11 is not required to have an allowable warpage range of the high melting point metal plates 9 and 10. In this fired body 8, the ceramic components in the fired body 8 are softened by re-firing, but
a and 8b are flat plate-like high-melting metal plates 9 of the same or same quality,
Since it is sandwiched by 10, the uniform pressure state is maintained from the front and back surfaces, and "warpage" generated during the firing process of the laminated body.
Is corrected, and deformation due to heat shrinkage during cooling is further suppressed. Therefore, a laminated ceramic substrate having excellent surface flatness can be manufactured.

【0018】次に、本実施例の製造方法の作用・効果を
確認するために、本実施例による製造方法、再焼成
を行わない製造方法、焼成体にモリブデン板(反りが
20μmのものを用いた)の重しを載せて再焼成する製
造方法、のそれぞれにより、3層からなる積層セラミッ
ク基板を作製(サイズが、縦:35mm×横:35mm
×厚み:1.5mm)し、その『反り』の状態を調べ
た。なお、〜共に、グリーンシート作製・スルーホ
ール穿設・導体詰め工程、導体パターン印刷工程、グリ
ーンシート積層体作製工程、および積層体焼成工程につ
いては、同じ条件とした。また、本実施例の製造方法に
おいて、高融点金属板としては、モリブデン板(サイズ
が、縦:40mm×横:40mm×厚み:2mm、反り
が2μm)を用いた。
Next, in order to confirm the action and effect of the manufacturing method of this embodiment, the manufacturing method according to this embodiment, a manufacturing method without re-baking, and a molybdenum plate (having a warp of 20 μm are used. , And a re-firing method is used to fabricate a three-layer laminated ceramic substrate (size: length: 35 mm × width: 35 mm).
× thickness: 1.5 mm), and the state of “warpage” was examined. In all of the above, the same conditions were applied to the green sheet production / through hole drilling / conductor filling step, the conductor pattern printing step, the green sheet laminate producing step, and the laminate firing step. In the manufacturing method of this example, a molybdenum plate (size: length: 40 mm × width: 40 mm × thickness: 2 mm, warpage: 2 μm) was used as the high melting point metal plate.

【0019】そして、その結果、再焼成する前の焼成体
の反りの平均値:126.3μm、最大値:142.4
μm、最小値:109.7μmであったのが、本実施例
の製造方法によれば、その平均値:2.6μm、最大
値:3.7μm、最小値:1.5μmと殆ど『反り』を
修正できたのに対し、焼成体にモリブデン板の重しを載
せて再焼成した場合は、その平均値:26.2μm、最
大値:37.7、最小値:20.4μmの『反り』が認
められた。
As a result, the warp of the fired body before re-fired had an average value of 126.3 μm and a maximum value of 142.4.
According to the manufacturing method of this embodiment, the average value: 2.6 μm, the maximum value: 3.7 μm, and the minimum value: 1.5 μm. However, when the weight of molybdenum plate was placed on the fired body and re-fired, the average value: 26.2 μm, maximum value: 37.7, minimum value: 20.4 μm "warpage" Was recognized.

【0020】このことから判るように、本実施例の製造
方法によれば、積層体焼成工程で生じた焼成体の反り
を、殆ど修正でき、表面平坦性の優れた積層セラミック
基板を作製できることが確認できた。これは、反りを生
じた焼成体の表裏面を、平板状の高融点金属板で挟み込
み、再焼成した際、軟化したセラミック成分を確実に保
持状態とし、かつ冷却時の熱収縮による熱変形の発生を
抑制できることによる。
As can be seen from the above, according to the manufacturing method of this embodiment, the warp of the fired body generated in the firing step of the laminate can be almost corrected, and the laminated ceramic substrate having excellent surface flatness can be manufactured. It could be confirmed. This is because the front and back surfaces of the fired body that has warped are sandwiched by flat plate-shaped high melting point metal plates, and when re-fired, the softened ceramic component is surely held, and thermal deformation due to thermal contraction during cooling is caused. Because it can suppress the occurrence.

【0021】なお、本発明は上述した実施例に限定され
るものではなく、本発明の要旨を変更しない範囲内で変
形実施できる構成を含むものである。因に、前述した実
施例においては、表層の導体パターンがバンプの場合で
説明したが、他の導体パターンの場合であっても同様で
ある。
It should be noted that the present invention is not limited to the above-mentioned embodiment, but includes a configuration that can be modified and implemented within the scope of the present invention. Incidentally, in the above-described embodiment, the case where the conductor pattern on the surface layer is a bump has been described, but the same applies to the case where other conductor patterns are used.

【0022】[0022]

【発明の効果】以上の説明より明らかなように、本発明
の積層セラミック基板の製造方法によれば、表層と内層
に導体パターンを有するグリーンシート積層体を作製す
ると共に該グリーンシート積層体を焼成し、表層に導体
パターンを有する焼成体を作製した後、該焼成体の表裏
面を平板状の同一または同質の高融点金属板で挟んだ状
態で、これを治具の上に載せて再焼成することにより、
前記焼成体中のセラミック成分が軟化され、かつ該焼成
体の表裏面が平板状の同一または同質の高融点金属板で
挟み込まれているので、該表裏面から均一な加圧状態が
保持され、最初の焼成時に生じた『反り』が修正され、
更に冷却時の熱収縮による変形が抑制されるため、表面
平坦性の優れた積層セラミック基板を製造できるという
効果を有する。
As is apparent from the above description, according to the method for producing a laminated ceramic substrate of the present invention, a green sheet laminate having conductor patterns on the surface layer and the inner layer is produced and the green sheet laminate is fired. Then, after producing a fired body having a conductor pattern on the surface layer, the front and back surfaces of the fired body are sandwiched between flat or identical high-melting-point metal plates, and this is placed on a jig and refired. By doing
Since the ceramic component in the fired body is softened, and the front and back surfaces of the fired body are sandwiched between flat or the same high-melting-point metal plates, a uniform pressure state is maintained from the front and back surfaces. The "warpage" that occurred during the first firing was corrected,
Further, since deformation due to heat shrinkage during cooling is suppressed, there is an effect that a laminated ceramic substrate having excellent surface flatness can be manufactured.

【0023】従って、本発明によれば、表面平坦性の優
れたバンプ等の表層の導体パターンを有する積層セラミ
ック基板の製造方法が提供できる。
Therefore, according to the present invention, it is possible to provide a method for manufacturing a laminated ceramic substrate having a surface conductor pattern such as bumps having excellent surface flatness.

【図面の簡単な説明】[Brief description of drawings]

【図1】 積層セラミック基板の製造工程を説明する工
程図である。
FIG. 1 is a process diagram illustrating a manufacturing process of a laminated ceramic substrate.

【符号の説明】[Explanation of symbols]

1・・・表層、1a・・・グリーンシート、2・・・バ
ンプよりなる微小導体パターン、3・・・内層、3a・
・・グリーンシート、4・・・裏面層、4a・・・グリ
ーンシート、5,6・・・内部導体パターン、7・・・
グリーンシートの積層体、8・・・グリーンシートの焼
成体、8a・・・焼成体の表面、8b・・・焼成体の裏
面、9・・・高融点金属板、9a・・・微小導体パター
ン側の面、10・・・高融点金属板、11・・・治具、
13,14,15・・・導体詰めしたスルーホール
DESCRIPTION OF SYMBOLS 1 ... Surface layer, 1a ... Green sheet, 2 ... Micro conductor pattern consisting of bumps, 3 ... Inner layer, 3a.
..Green sheets, 4 ... Back surface layer, 4a ... Green sheets, 5, 6 ... Internal conductor patterns, 7 ...
Green sheet laminate, 8 ... Green sheet fired body, 8a ... Front of fired body, 8b ... Back side of fired body, 9 ... Refractory metal plate, 9a ... Micro conductor pattern Side surface, 10 ... high melting point metal plate, 11 ... jig,
13, 14, 15 ... Through holes filled with conductors

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 表面に導体パターンを印刷したグリーン
シートを複数枚積層し、表層と内層に導体パターンを有
するグリーンシート積層体を作製すると共に該グリーン
シート積層体を焼成した後、その表裏面を平板状の同一
または同質の反りが5μm以下/25.4mm,表面粗
さがRa=1μm〜50μmの高融点金属板で挟んで再
焼成してなることを特徴とする積層セラミック基板の製
造方法。
1. A plurality of green sheets each having a conductor pattern printed on the surface thereof are laminated to form a green sheet laminate having conductor patterns on the surface and inner layers, and the green sheet laminate is fired, and then the front and back surfaces thereof are A method for producing a laminated ceramic substrate, which is characterized in that it is sandwiched between high melting point metal plates having a flat plate-like warp of the same or the same quality of 5 μm or less / 25.4 mm and a surface roughness Ra = 1 μm to 50 μm, and is fired again.
JP6085953A 1994-03-30 1994-03-30 Manufacturing method of laminated layer ceramic substrate Pending JPH07273456A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6085953A JPH07273456A (en) 1994-03-30 1994-03-30 Manufacturing method of laminated layer ceramic substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6085953A JPH07273456A (en) 1994-03-30 1994-03-30 Manufacturing method of laminated layer ceramic substrate

Publications (1)

Publication Number Publication Date
JPH07273456A true JPH07273456A (en) 1995-10-20

Family

ID=13873128

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6085953A Pending JPH07273456A (en) 1994-03-30 1994-03-30 Manufacturing method of laminated layer ceramic substrate

Country Status (1)

Country Link
JP (1) JPH07273456A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6217990B1 (en) 1997-05-07 2001-04-17 Denso Corporation Multilayer circuit board having no local warp on mounting surface thereof
JP2018148163A (en) * 2017-03-09 2018-09-20 日本特殊陶業株式会社 Method of manufacturing component for semiconductor manufacturing equipment

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6217990B1 (en) 1997-05-07 2001-04-17 Denso Corporation Multilayer circuit board having no local warp on mounting surface thereof
JP2018148163A (en) * 2017-03-09 2018-09-20 日本特殊陶業株式会社 Method of manufacturing component for semiconductor manufacturing equipment

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