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JPH07232354A - Disc master for molding disc substrate, mold and combination thereof - Google Patents

Disc master for molding disc substrate, mold and combination thereof

Info

Publication number
JPH07232354A
JPH07232354A JP33221194A JP33221194A JPH07232354A JP H07232354 A JPH07232354 A JP H07232354A JP 33221194 A JP33221194 A JP 33221194A JP 33221194 A JP33221194 A JP 33221194A JP H07232354 A JPH07232354 A JP H07232354A
Authority
JP
Japan
Prior art keywords
master
disk
film
mold
wear
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP33221194A
Other languages
Japanese (ja)
Inventor
Takao Saito
隆雄 齋藤
Toshifumi Tanaka
敏文 田中
Yumi Sakai
由美 坂井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TDK Corp
Original Assignee
TDK Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TDK Corp filed Critical TDK Corp
Priority to JP33221194A priority Critical patent/JPH07232354A/en
Publication of JPH07232354A publication Critical patent/JPH07232354A/en
Pending legal-status Critical Current

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  • Moulds For Moulding Plastics Or The Like (AREA)

Abstract

PURPOSE:To reduce wear of the contact surface between a disc master and the mirror finished surface of a mold, suppress the amount of deformation of the disc master and prolong its lifetime by a method wherein wear relieving layer, which is made of metallic or ceramic film having the specified hardness, is provided on the rear surface of the disc master. CONSTITUTION:On the rear surface of a disc master made of Ni or the like, wear relieving layer 15 made of metallic film or ceramic film having the hardness of Hv 250 or higher is provided. In this case, the metallic film or ceramic film preferably has the coefficient of dynamic friction, which is measured by the pin-on-disc abrasion test with SUJ 2 pin, of 0.01-0.6. A wear-relieving layer, the metallic film of which is metal plated film, in which at least one selected from the group of lubricous particle consisting of silicon, molybdenum, PTFE and the like is dispersed, is provided. Further, the ceramic film is preferably made of PVD or CVD.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、光ディスク基板成形用
金型及びディスク原盤(スタンパー)に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a mold for molding an optical disk substrate and a disk master (stamper).

【0002】[0002]

【従来技術と解決課題】現在、光ディスクは、射出成形
によって製造されている。ディスク金型には、ピット、
グルーブ等の情報を該ディスクに転写させるためディス
ク原盤を一方の金型鏡面に装着する。ディスク成形に使
用するディスク原盤は、光学的精度の出ているガラス原
盤上でフォトレジストを行い、ピット、グルーブ等の情
報をカッティングした後、スパッタリング等により導電
膜を形成し、その上にニッケル等の電鋳を行う。こうし
てできたニッケル等の薄板を該ガラス原盤より剥離さ
せ、内外径を打ち抜き、裏面を研磨して仕上げ、該ディ
スク原盤が得られる。しかし、該ディスク原盤は、ニッ
ケル電鋳等により作られるため、十分な強度が得られな
かった。特にCD等よりも高温高圧が必要とされる記録
可能なディスクの成形では該ディスク原盤の劣化が早い
ために、その修理及び交換などにかかる費用・時間等が
無視できないものであった。
2. Description of the Related Art Optical disks are currently manufactured by injection molding. The disc mold has a pit,
In order to transfer information such as grooves to the disc, a disc master is mounted on one of the mold mirror surfaces. For the disc master used for disc molding, photoresist is applied on the glass master disc with optical accuracy, and after cutting information such as pits and grooves, a conductive film is formed by sputtering, etc., and nickel etc. is formed on it. Electroforming. The thin plate of nickel or the like thus formed is peeled from the glass master, the inner and outer diameters are punched out, and the back surface is polished to finish, whereby the disk master is obtained. However, since the disk master was made by nickel electroforming or the like, sufficient strength could not be obtained. In particular, in molding a recordable disc that requires higher temperature and pressure than a CD or the like, the cost and time required for repair and replacement of the disc master cannot be ignored because the disc master deteriorates quickly.

【0003】これと同様に、金型鏡面にも同じことが言
える。ディスク原盤装着側鏡面は、ディスク成形に耐え
得る硬度及び温度の変動に対する寸法精度を持った鋼材
を鏡面研磨した後、TiN(PVD)、TiCN(プラ
ズマCVD)等の硬度の高いコーティングを施してい
る。該コーティング等において、該ディスク原盤と金型
鏡面との変形度合いが異なることから、摩擦摩耗現象が
その接触面に起こる。また型締めの時の衝撃等も加わ
る。この時、硬度の劣る従来のディスク原盤が欠損し、
次いで該金型鏡面のコーティングが損傷を受ける。該コ
ーティングの劣化が進むと下地である鋼材も損傷を受け
るため、該金型鏡面の修理及び交換などにかかる費用・
時間等が無視できないものになった。
Similarly, the same can be said for the mirror surface of the mold. The disk master mounting side mirror surface is mirror-polished of a steel material having hardness that can withstand disk molding and dimensional accuracy against fluctuations in temperature, and is then coated with a high hardness such as TiN (PVD) or TiCN (plasma CVD). . In the coating or the like, the degree of deformation between the disk master and the mirror surface of the mold is different, so that a frictional wear phenomenon occurs on the contact surface. In addition, shocks are added when the mold is clamped. At this time, the conventional disc master with inferior hardness was damaged,
Then the coating on the mirror surface of the mold is damaged. As the deterioration of the coating progresses, the underlying steel material will also be damaged, so the cost of repairing and replacing the mirror surface of the mold
Time has become something that cannot be ignored.

【0004】このように、該ディスク原盤及び該金型鏡
面の修理及び交換などにかかる費用・時間等が、ディス
ク成形に大きな影響を与えてきた。
As described above, the cost and time required for the repair and replacement of the master disk and the mirror surface of the mold have a great influence on the disk molding.

【0005】ディスク成形は高温高圧下で行われ、ディ
スク原盤裏面と金型鏡面の接触する部分では、熱による
膨張収縮、塑性変形、成形品が離型するときの変形等に
よって該ディスク原盤及び該金型鏡面は損傷を受ける。
該ディスク原盤及び該金型鏡面は素材が違い、熱膨張係
数、剛性率等が違うため、接触面では硬度の劣る該ディ
スク原盤の変形を伴う摩擦摩耗現象が起こる。この時、
該金型鏡面より硬度の低い従来のディスク原盤は、摩擦
による引き剥し現象等で損傷し、成形を重ねるうちにデ
ィスク成形に必要な精度を保てなくなっていく。そして
その結果、該ディスク原盤が損傷を受けると、欠落物等
が研磨剤となり鏡面の劣化をも促進する。
The disk molding is performed under high temperature and high pressure, and at the portion where the back surface of the disk master and the mirror surface of the mold come into contact with each other, expansion and contraction due to heat, plastic deformation, deformation when the molded product is released from the mold, and the like. The mirror surface of the mold is damaged.
Since the disk master and the mirror surface of the mold are made of different materials and have different coefficients of thermal expansion, rigidity, etc., a frictional wear phenomenon occurs due to deformation of the disk master having poor hardness at the contact surface. This time,
A conventional disk master having a hardness lower than the mirror surface of the mold is damaged by a peeling phenomenon due to friction, and the accuracy required for disk molding cannot be maintained during repeated molding. As a result, when the master disk is damaged, the missing material becomes an abrasive and promotes the deterioration of the mirror surface.

【0006】本発明の目的は、高温高圧下でのディスク
原盤と金型鏡面との該ディスク原盤の変形を伴う摩擦摩
耗現象において、ディスク原盤と金型鏡面との接触面の
間の摩耗量を緩和し、ディスク原盤の変形量を抑えるこ
とで、寿命の長いディスク原盤及び金型鏡面を提供する
ことである。
An object of the present invention is to determine the amount of wear between the contact surface between the disk master and the mold mirror surface in the friction and wear phenomenon involving deformation of the disk master and the mirror surface of the mold under high temperature and high pressure. The object is to provide a disk master and a mold mirror surface that have a long life by alleviating and suppressing the deformation amount of the disk master.

【0007】[0007]

【課題を解決するための手段】本発明は、上記課題を解
決する事を目的とし、Ni製等のディスク原盤の裏面に
硬度がHv250以上の金属膜もしくはセラミック膜か
らなる摩耗緩和層を設けることにより、耐摩耗性と潤滑
性を向上させ、ディスク原盤及び金型鏡面の寿命を延ば
すことを特徴としている。
SUMMARY OF THE INVENTION An object of the present invention is to provide a wear-relieving layer made of a metal film or a ceramic film having a hardness of Hv250 or more on the back surface of a disk master made of Ni or the like for the purpose of solving the above problems. This improves wear resistance and lubricity and extends the life of the disk master and the mirror surface of the mold.

【0008】好ましい金属膜は、シリコン、モリブデン
およびポリテトラフルオロエチレン(PTFE)等の潤
滑性粒子よりなる群から選択した少なくとも一種を分散
させた金属メッキ膜等の金属膜である。PTFE等の潤
滑物質を含む膜は、好ましくはNi−P無電解メッキ膜
中またはCrメッキ膜中にPTFE等を分散させてなる
ものである。その他の好ましい金属膜はCr単独のメッ
キ膜およびNi−P無電解メッキ膜がある。好ましいセ
ラミック膜にはAl23 、BN、CrN 、TiAl
Nがある。
A preferred metal film is a metal film such as a metal plating film in which at least one selected from the group consisting of silicon, molybdenum and polytetrafluoroethylene (PTFE) and other lubricating particles is dispersed. The film containing a lubricating substance such as PTFE is preferably one in which PTFE or the like is dispersed in a Ni—P electroless plating film or a Cr plating film. Other preferable metal films include a Cr-only plating film and a Ni-P electroless plating film. Preferred ceramic membranes include Al 2 O 3 , BN, CrN, TiAl
There is N.

【0009】これらの摩耗緩和層を構成する金属膜また
はセラミック膜は、SUJ2製ピンによるピン・オン・
ディスク摩擦摩耗試験で動摩擦係数0.01〜0.6を
有することが好ましい。これらの場合に、摩耗緩和層の
硬度はディスク原盤よりも高く(Hv約250〜90
0、好ましくはHv約300〜400)する。また摩耗
緩和層の硬度は好ましくは金属鏡面のTiN等の被覆の
硬度(TiNのHv:約2300)よりも軟らかくする
ことにより、摩耗緩和層の潤滑性と適度な硬さによる耐
久性が相まってディスク原盤及び金型鏡面の寿命を延ば
すことができる。
The metal film or the ceramic film that constitutes the wear-relieving layer is a pin-on / pull-on pin made by SUJ2.
It is preferable to have a dynamic friction coefficient of 0.01 to 0.6 in the disc friction wear test. In these cases, the hardness of the wear relaxation layer is higher than that of the disc master (Hv about 250 to 90).
0, preferably about 300-400 Hv). Further, the hardness of the wear-relieving layer is preferably softer than the hardness of the coating such as TiN on the metal mirror surface (Hv of TiN: about 2300), so that the wear-relieving layer has lubricity and durability due to an appropriate hardness. The life of the master and the mirror surface of the mold can be extended.

【0010】本発明はまた光ディスクの射出成形に使用
するNi製等のディスク原盤を支持するための金型鏡面
において、前記金型鏡面にシリコン粒子、モリブデン粒
子及びPTFE粒子等の少なくとも一種を分散したNi
−Pメッキ等の金属メッキ膜よりなる摩耗緩和層を設け
たことを特徴とする。この態様によっても同様に摩耗緩
和層の潤滑性と適度な硬さによる耐久性が相まってディ
スク原盤及び金型鏡面の寿命を延ばすことができる。
The present invention also provides a mold mirror surface for supporting a disk master made of Ni or the like used for injection molding of an optical disk, wherein at least one kind of silicon particles, molybdenum particles, PTFE particles and the like is dispersed on the mold mirror surface. Ni
A feature is that a wear relaxation layer made of a metal plating film such as P plating is provided. Also according to this aspect, the life of the disk master and the mirror surface of the mold can be extended by combining the lubricity of the wear-relieving layer and the durability due to the appropriate hardness.

【0011】更に本発明では、ディスク原盤の裏面と、
金型鏡面の両者にシリコン粒子、モリブデン粒子及びP
TFE粒子等の少なくとも一種を分散したNi−Pメッ
キ膜よりなる摩耗緩和層を設けることができる。この場
合には、ディスク原盤側の摩耗緩和層の硬度を金属鏡面
側のそれよりも小さくする。
Further, according to the present invention, the back surface of the disc master and
Silicon particles, molybdenum particles and P on both surfaces of the mold
A wear relaxation layer made of a Ni-P plated film in which at least one kind of TFE particles or the like is dispersed can be provided. In this case, the hardness of the wear reducing layer on the disk master side is made smaller than that on the metal mirror surface side.

【0012】上記の各場合において、硬度の関係は一般
に金型鏡面の被覆、ディスク原盤の裏面の被覆、次いで
ディスク原盤の順に小さくする。耐摩耗性を考えた場合
に、上記の硬度差を持たせることにより、一般にディス
ク原盤を消耗品として扱うことができ、金型鏡面は耐久
面とし得る。一般に、金型鏡面およびディスク原盤に対
する要求特性としては、金型鏡面側が硬く、ディスク原
盤側がディスク原盤裏面において適度な硬さを有し、両
者間の滑りが良好であり、形状精度が金型鏡面の方が高
精度であると共にディスク原盤の裏面の精度が充分で
(例えばRmax約40nm程度でディスク原盤の裏面
が2.0〜3.0μm程度)あることである。後者が粗
面になり過ぎると製品特性への悪影響が生じる。
In each of the above cases, the hardness relationship is generally made smaller in the order of coating the mirror surface of the die, coating the back surface of the disk master, and then the disk master. In consideration of wear resistance, by giving the above hardness difference, the disk master can be generally treated as a consumable item, and the die mirror surface can be a durable surface. Generally, the required characteristics for the die mirror surface and the disc master are that the die mirror surface side is hard, the disc master side has an appropriate hardness on the back side of the disc master, the sliding between them is good, and the shape accuracy is Is more accurate and the back surface of the disk master has a sufficient accuracy (for example, Rmax is about 40 nm and the back surface of the disk master is about 2.0 to 3.0 μm). If the latter becomes too rough, the product characteristics will be adversely affected.

【0013】[0013]

【作用】本発明の金型鏡面において、該ディスク原盤と
該金型鏡面の間で起こる摩擦摩耗現象が、双方の摺動性
を向上させる事で、摩耗による劣化現象が軽減される。
そのために従来必要であった該ディスク原盤及び該金型
鏡面の修理・交換にかかる費用及び時間を削減すること
ができる。
In the die mirror surface of the present invention, the frictional wear phenomenon occurring between the disk master and the die mirror surface improves the slidability of both surfaces, and the deterioration phenomenon due to wear is reduced.
Therefore, it is possible to reduce the cost and time required for the repair / replacement of the disk master and the mirror surface of the mold, which are conventionally required.

【0014】[0014]

【実施例】図5は、本発明の実施例を示す。本発明の実
施例によるディスク用金型10は、光ディスク原盤13
と耐摩耗性の向上を目的とした膜15とから構成される
ディスク原盤17を含む。以下にその形成手順を示す。
FIG. 5 shows an embodiment of the present invention. The disk mold 10 according to the embodiment of the present invention is an optical disk master 13.
And a disk master 17 composed of a film 15 for improving wear resistance. The forming procedure is shown below.

【0015】まず、図1において、従来の製法で作られ
た光ディスク原盤13の情報面12を保護するためにマ
スキング剤11をコーティングする。その後、光ディス
ク原盤13の裏面14に、図2(図1を180度回転さ
せたもの)のように、耐摩耗性の向上を目的とした膜1
5を設ける。また、膜15の粗さが一様でない場合、図
2のように膜表面15Aを研磨して使用する。その後、
図3のように、光ディスク原盤の情報面12よりマスキ
ング剤11を除去すると、図4のような耐摩耗性の高い
ディスク原盤17が得られる。こうして得たディスク原
盤17は、図5のように金型鏡面16と膜15が接する
ように固定されてディスク用金型10として使用され
る。なお以下の実施例1〜11では金属鏡面はTiN膜
で被覆されたものを使用した。
First, in FIG. 1, a masking agent 11 is coated to protect the information surface 12 of an optical disk master 13 produced by a conventional manufacturing method. Then, on the back surface 14 of the optical disk master 13, as shown in FIG. 2 (rotated by 180 degrees in FIG. 1), a film 1 for the purpose of improving wear resistance is provided.
5 is provided. When the roughness of the film 15 is not uniform, the film surface 15A is polished and used as shown in FIG. afterwards,
As shown in FIG. 3, by removing the masking agent 11 from the information surface 12 of the optical disc master, a disc master 17 having high wear resistance as shown in FIG. 4 is obtained. The disc master 17 thus obtained is fixed as the die mirror surface 16 and the film 15 are in contact with each other as shown in FIG. In Examples 1 to 11 below, the metal mirror surface used was a TiN film.

【0016】次に、ディスク原盤裏面に金属膜を摩耗緩
和層として形成する場合について実施例を説明する。
Next, an embodiment will be described in which a metal film is formed as a wear-relieving layer on the back surface of the master disk.

【0017】(実施例1)金型鏡面と接するディスク原
盤裏面にビッカース硬度1,000程度の硬質クロムメ
ッキ層を0.3μm設ける。表面粗さRmaxは2μm
であった。ディスク原盤裏面のニッケル素地が、SUJ
2製ピンによるピン・オン・ディスク摩擦摩耗試験で摩
擦係数1.2であるのに対し、該メッキ膜が0.4であ
ることと、硬度が増加し摩擦係数が減少することにより
摩擦摩耗現象が軽減される。該メッキ層を設けたディス
ク原盤で成形実験を行ったところ、成形されたディスク
基板にディスク原盤の劣化を原因とするエラーが見られ
るまでに、裏面に成膜を行っていない従来品の2倍程度
の時間がかかった。
Example 1 A hard chrome plating layer having a Vickers hardness of about 1,000 is provided on the rear surface of the disk master in contact with the mirror surface of the die to a thickness of 0.3 μm. Surface roughness Rmax is 2 μm
Met. The nickel base on the back of the disc master is SUJ
The friction coefficient of 1.2 on the pin-on-disk friction test using the pin made by No. 2 is 1.2, while the plating film has 0.4 and the hardness increases and the friction coefficient decreases, so that the friction wear phenomenon occurs. Is reduced. When a molding experiment was performed on the disk master provided with the plating layer, it was twice as much as the conventional product in which no film was formed on the back surface until an error due to deterioration of the disk master was observed on the molded disk substrate. It took some time.

【0018】(実施例2)金型鏡面と接するディスク原
盤裏面にニッケル−ボロン無電解メッキの層を4μm設
けた。この面を研磨した後の膜厚は3μmであった。こ
の層はビッカース硬度900かつ前記摩擦摩耗試験で摩
擦係数0.6の耐摩耗性の高い層ができる。該層を設け
たディスク原盤の劣化を原因とするエラーが見られるま
でに、裏面に成膜を行っていない従来品の2倍程度の時
間がかかった。
(Embodiment 2) A nickel-boron electroless plating layer of 4 μm was provided on the back surface of the disk master in contact with the mirror surface of the mold. The film thickness after polishing this surface was 3 μm. This layer has a Vickers hardness of 900 and a high wear resistance with a friction coefficient of 0.6 in the friction wear test. It took about twice as much time as the conventional product in which no film was formed on the back surface until an error caused by deterioration of the master disk provided with the layer was observed.

【0019】(実施例3)金型鏡面と接するディスク原
盤裏面にニッケル−リン無電解メッキにPTFE粒子を
分散させた層を7μm設ける。該分散層に熱処理を加
え、この面を研磨して膜厚3μmとした。この層のビッ
カース硬度350かつ前記摩擦摩耗試験で摩擦係数0.
02の耐摩耗性の高い層ができる。この面を研磨した後
の表面粗さRmaxは2.5μmであった。該分散層を
設けたディスク原盤の劣化を原因とするエラーが見られ
るまでに、裏面に成膜を行っていない従来品の5倍程度
の時間がかかった。
(Embodiment 3) 7 μm of a layer in which PTFE particles are dispersed by nickel-phosphorus electroless plating is provided on the back surface of the disk master in contact with the mirror surface of the mold. Heat treatment was applied to the dispersion layer, and this surface was polished to a film thickness of 3 μm. This layer had a Vickers hardness of 350 and a friction coefficient of 0.
02, which has a high wear resistance. The surface roughness Rmax after polishing this surface was 2.5 μm. It took about 5 times as long as that of a conventional product in which a film was not formed on the back surface until an error due to deterioration of the master disk provided with the dispersion layer was observed.

【0020】(実施例4)金型鏡面と接するディスク原
盤裏面にニッケル−リン無電解メッキにPTFE粒子を
分散させた層を7μm設ける。この面を研磨した後の厚
さは3μmであり、表面粗さRmaxは2.5μmであ
り、該分散層は、ビッカース硬度250かつ前記摩擦摩
耗試験で摩擦係数0.1の耐摩耗性の高い層ができる。
該分散層を設けたディスク原盤の劣化を原因とするエラ
ーが見られるまでに、裏面に成膜を行っていない従来品
の3倍程度の時間がかかった。
(Embodiment 4) A layer in which PTFE particles are dispersed by nickel-phosphorus electroless plating is provided in a thickness of 7 .mu.m on the back surface of the disk master in contact with the mirror surface of the die. The thickness of this surface after polishing is 3 μm, the surface roughness Rmax is 2.5 μm, and the dispersion layer has a high Vickers hardness of 250 and a friction coefficient of 0.1 in the friction wear test and high wear resistance. There are layers.
It took about three times as long as that of a conventional product in which a film was not formed on the back surface until an error due to deterioration of the master disk provided with the dispersion layer was observed.

【0021】(実施例5)実施例3においてPTFE粒
子の代わりにSi粒子を用いた。厚さ5μmにメッキ
し、ついで厚さ3μmに研磨した。該分散層は、ビッカ
ース硬度400かつ前記摩擦摩耗試験で摩擦係数0.4
の耐摩耗性の高い層ができる。該分散層を設けたディス
ク原盤の劣化を原因とするエラーが見られるまでに、裏
面に成膜を行っていない従来品の2.5倍程度の時間が
かかった。
Example 5 Si particles were used in place of the PTFE particles in Example 3. It was plated to a thickness of 5 μm and then polished to a thickness of 3 μm. The dispersion layer had a Vickers hardness of 400 and a friction coefficient of 0.4 in the friction wear test.
A layer with high wear resistance is formed. It took about 2.5 times as long as that of a conventional product in which a film was not formed on the back surface until an error due to deterioration of the master disk provided with the dispersion layer was observed.

【0022】(実施例6)実施例3においてPTFE粒
子の代わりにMo粒子を用いた。厚さ5μmにメッキ
し、ついで厚さ2μmに研磨した。該分散層は、ビッカ
ース硬度400かつ前記摩擦摩耗試験で摩擦係数0.3
の耐摩耗性の高い層ができる。該分散層を設けたディス
ク原盤の劣化を原因とするエラーが見られるまでに、裏
面に成膜を行っていない従来品の2.5倍程度の時間が
かかった。
(Example 6) In Example 3, Mo particles were used in place of the PTFE particles. It was plated to a thickness of 5 μm and then polished to a thickness of 2 μm. The dispersion layer had a Vickers hardness of 400 and a friction coefficient of 0.3 in the friction wear test.
A layer with high wear resistance is formed. It took about 2.5 times as long as that of a conventional product in which a film was not formed on the back surface until an error due to deterioration of the master disk provided with the dispersion layer was observed.

【0023】(実施例7)金型鏡面と接するディスク原
盤裏面にCrメッキにPTFE粒子を分散させた層を2
μm設けた。該分散層は、ビッカース硬度500かつ前
記摩擦摩耗試験で摩擦係数0.1の耐摩耗性の高い層が
できる。該分散層を設けたディスク原盤の劣化を原因と
するエラーが見られるまでに、裏面に成膜を行っていな
い従来品の4倍程度の時間がかかった。
(Embodiment 7) Two layers of Cr-plated PTFE particles dispersed on the back surface of the disk master in contact with the mirror surface of the die are used.
μm was provided. The dispersion layer can be a layer having a Vickers hardness of 500 and a high wear resistance with a friction coefficient of 0.1 in the friction wear test. It took about four times as long as that of a conventional product in which a film was not formed on the back surface until an error caused by deterioration of the master disk provided with the dispersion layer was observed.

【0024】以上はディスク原盤の裏面の摩耗緩和層と
して金属膜を使用する場合を説明したが、次にディスク
原盤の裏面にセラミック膜を形成する場合の実施例を説
明する。
The case where the metal film is used as the wear reducing layer on the back surface of the disk master has been described above. Next, an embodiment in which a ceramic film is formed on the back surface of the disk master will be described.

【0025】(実施例8)金型鏡面と接するディスク原
盤裏面にアルミナ層をプラズマCVD法により、1μm
設ける。アルミナ層は、ビッカース硬度2,100かつ
前記摩擦摩耗試験で摩擦係数0.2であった。該アルミ
ナ層を設けたディスク原盤で成形実験を行ったところ、
成形されたディスク基板にディスク原盤の劣化を原因と
するエラーが見られるまでに、裏面に成膜を行っていな
い従来品の5倍程度の時間がかかった。
(Embodiment 8) An alumina layer is formed on the rear surface of the disk master in contact with the mirror surface of the die by a plasma CVD method to a thickness of 1 μm.
Set up. The alumina layer had a Vickers hardness of 2,100 and a friction coefficient of 0.2 in the friction wear test. When a molding experiment was carried out on a disk master provided with the alumina layer,
It took about 5 times as long as the time required for an error due to deterioration of the master disk to be observed on the molded disk substrate as compared with the conventional product in which no film was formed on the back surface.

【0026】(実施例9)金型鏡面と接するディスク原
盤裏面に窒化硼素層をスパッタリング法により2μm設
けた。窒化硼素層は、ビッカース硬度3,500かつ前
記摩擦摩耗試験で摩擦係数0.2であり、該窒化硼素層
を設けたディスク原盤で成形実験を行ったところ、成形
されたディスク基板にディスク原盤の劣化を原因とする
エラーは、裏面に成膜を行っていない従来品の4倍の時
間をかけても見られなかった。
(Embodiment 9) A boron nitride layer having a thickness of 2 μm was provided on the back surface of a disk master in contact with the mirror surface of a mold by a sputtering method. The boron nitride layer has a Vickers hardness of 3,500 and a friction coefficient of 0.2 in the friction and wear test. When a molding test was conducted on the disk master provided with the boron nitride layer, a molded disk substrate of the disk master was tested. No error due to deterioration was observed even after four times as long as that of the conventional product in which no film was formed on the back surface.

【0027】(実施例10)金型鏡面と接するディスク
原盤裏面にCrN層をイオンプレーティング法により3
μm設けた。CrN層は、ビッカース硬度2,000か
つ前記摩擦摩耗試験で摩擦係数0.3であり、該CrN
層を設けたディスク原盤で成形実験を行ったところ、成
形されたディスク基板にディスク原盤の劣化を原因とす
るエラーが見られるまでに、裏面に成膜を行っていない
従来品の3倍程度の時間がかかった。
(Embodiment 10) A CrN layer was formed on the back surface of the disk master in contact with the mirror surface of the mold by ion plating.
μm was provided. The CrN layer has a Vickers hardness of 2,000 and a friction coefficient of 0.3 in the friction and wear test.
When a molding experiment was performed on a disk master with layers, by the time an error due to deterioration of the disk master was found on the molded disk substrate, it was about three times as large as that of the conventional product in which no film was formed on the back surface. took time.

【0028】(実施例11)金型鏡面と接するディスク
原盤裏面にTiAlN層をイオンプレーティング法によ
り3μm設けた。TiAlN層は、ビッカース硬度2,
200かつ前記摩擦摩耗試験で摩擦係数0.4であり、
該TiAlN層を設けたディスク原盤で成形実験を行っ
たところ、成形されたディスク基板にディスク原盤の劣
化を原因とするエラーが見られるまでに、裏面に成膜を
行っていない従来品の3倍程度の時間がかかった。以上
の実施例1〜11の結果を表1にまとめて示す。
(Embodiment 11) A TiAlN layer having a thickness of 3 μm was provided on the back surface of a disk master in contact with the mirror surface of a mold by an ion plating method. The TiAlN layer has a Vickers hardness of 2,
200 and a friction coefficient of 0.4 in the friction wear test,
When a molding experiment was performed on the disc master provided with the TiAlN layer, three times as much as that of the conventional product in which no film was formed on the back surface until an error due to deterioration of the disc master was observed on the molded disc substrate. It took some time. The results of Examples 1 to 11 above are summarized in Table 1.

【0029】[0029]

【表1】 [Table 1]

【0030】以上の各実施例では、ディスク原盤の裏面
に摩耗緩和層を形成したが、以下に金型鏡面に摩耗緩和
層を形成する例を示す。まず図6のように、ダイヤなど
によるラッピング及びポリッシングで仕上げられた金型
鏡面26の側面等に、マスキング剤21を塗布する。そ
の後図7のように、金型鏡面26にPTFE分散型無電
解メッキ複合被膜25を設ける。PTFE複合被膜表面
25Aは、上記と同様、研磨の必要があり、マスキング
剤21を除去した後、ラッピングなどの手段を用いて研
磨すると、図8のような耐摩耗性の高い金型鏡面26が
得られる。こうして得た金型鏡面26は、図9のよう
に、PTFE複合被膜25とディスク原盤23とが接す
るように固定されてディスク用金型20として使用され
る。
In each of the above embodiments, the wear reducing layer was formed on the back surface of the disk master, but the following shows an example of forming the wear reducing layer on the mirror surface of the mold. First, as shown in FIG. 6, the masking agent 21 is applied to the side surface of the mirror surface 26 of the mold finished by lapping and polishing with diamond or the like. Thereafter, as shown in FIG. 7, the PTFE dispersion type electroless plating composite coating 25 is provided on the die mirror surface 26. Similar to the above, the PTFE composite coating surface 25A needs to be polished, and when the masking agent 21 is removed and then polishing is performed using a means such as lapping, the mold mirror surface 26 having high wear resistance as shown in FIG. 8 is obtained. can get. The die mirror surface 26 thus obtained is fixed so that the PTFE composite coating 25 and the disc master 23 are in contact with each other as shown in FIG. 9, and is used as the disc die 20.

【0031】(実施例12)金型鏡面にニッケル−リン
無電解メッキにPTFE粒子を分散させた層を7μm設
け、該分散層に熱処理を加え、次いで研磨して厚さ3μ
mとした。ビッカース硬度900かつ前記摩擦摩耗試験
で摩擦係数0.02の耐摩耗性の高い層ができる。該分
散層を設けたディスク原盤の劣化を原因とするエラーが
見られるまでに、裏面に成膜を行っていない従来品の5
倍程度の時間がかかった。
(Embodiment 12) A layer of PTFE particles dispersed in nickel-phosphorus electroless plating is provided on the mirror surface of the die to a thickness of 7 μm, and the dispersion layer is heat treated and then polished to a thickness of 3 μm.
m. A layer with high wear resistance having a Vickers hardness of 900 and a friction coefficient of 0.02 in the friction wear test is formed. Before the error due to the deterioration of the disk master provided with the dispersion layer is observed, the film thickness of the conventional 5
It took about twice as long.

【0032】(実施例13)金型鏡面にニッケル−リン
無電解メッキにSi粒子を分散させた層を5μm設け、
該分散層に熱処理を加え、次いで研磨して厚さ3μmと
した。ビッカース硬度900かつ前記摩擦摩耗試験で摩
擦係数0.4の耐摩耗性の高い層ができる。該分散層を
設けたディスク原盤の劣化を原因とするエラーが見られ
るまでに、裏面に成膜を行っていない従来品の2倍程度
の時間がかかった。
(Embodiment 13) Nickel-phosphorus electroless plating was applied on the mirror surface of the mold to form a layer having 5 μm of Si particles dispersed therein,
The dispersion layer was heat treated and then polished to a thickness of 3 μm. A layer with high wear resistance having a Vickers hardness of 900 and a friction coefficient of 0.4 in the friction wear test is formed. It took about twice as long as that of a conventional product in which a film was not formed on the back surface until an error caused by deterioration of a disk master provided with the dispersion layer was observed.

【0033】(実施例14)金型鏡面にニッケル−リン
無電解メッキにMo粒子を分散させた層を5μm設け、
該分散層に熱処理を加え、次いで研磨して厚さ2μmと
した。ビッカース硬度900かつ前記摩擦摩耗試験で摩
擦係数0.3の耐摩耗性の高い層ができる。該分散層を
設けたディスク原盤の劣化を原因とするエラーが見られ
るまでに、裏面に成膜を行っていない従来品の2倍程度
の時間がかかった。
(Embodiment 14) 5 μm of a layer in which Mo particles are dispersed is provided on nickel-phosphorus electroless plating on the mirror surface of a die,
The dispersion layer was heat treated and then polished to a thickness of 2 μm. A layer with high wear resistance having a Vickers hardness of 900 and a friction coefficient of 0.3 in the friction wear test is formed. It took about twice as long as that of a conventional product in which a film was not formed on the back surface until an error caused by deterioration of a disk master provided with the dispersion layer was observed.

【0034】(実施例15)金型鏡面にCrメッキにP
TFE粒子を分散させた層を2μm設けた。ビッカース
硬度1,000かつ前記摩擦摩耗試験で摩擦係数0.1
の耐摩耗性の高い層ができる。該分散層を設けたディス
ク原盤の劣化を原因とするエラーが見られるまでに、裏
面に成膜を行っていない従来品の4倍程度の時間がかか
った。実施例12〜15の結果を表2にまとめて示す。
(Embodiment 15) The mirror surface of the mold is plated with Cr and then P
A layer in which TFE particles were dispersed was provided in a thickness of 2 μm. Vickers hardness of 1,000 and a friction coefficient of 0.1 in the friction wear test
A layer with high wear resistance is formed. It took about four times as long as that of a conventional product in which a film was not formed on the back surface until an error caused by deterioration of the master disk provided with the dispersion layer was observed. The results of Examples 12 to 15 are summarized in Table 2.

【0035】[0035]

【表2】 [Table 2]

【0036】(実施例16〜17)ディスク原盤の裏面
と、金型鏡面とにそれぞれ潤滑性粒子を分散したメッキ
膜を摩耗緩和層として形成して組み合わせで使用する例
を表3に示した。
(Examples 16 to 17) Table 3 shows an example in which a plating film in which lubricating particles are dispersed is formed as a wear-relieving layer on the back surface of the disk master and the mirror surface of the mold, and is used in combination.

【0037】[0037]

【表3】 [Table 3]

【0038】[0038]

【発明の効果】以上のような二つの手順により形成され
たディスク用金型は、高温高圧下でのディスク原盤の裏
面と金型鏡面との摩耗が軽減されて、従来品に比べて寿
命を延ばすことができるようになった。その結果、ディ
スク原盤及び金型鏡面の修理及び交換等にかかる費用及
び時間が低減できる。本発明の好ましい実施例と現在考
えられるものを図示し説明してきたが、当業者であれ
ば、本発明の技術思想から逸脱することなく種々の変更
及び修正が可能であることは明白であろう。かかる変更
及び修正は全て本発明の技術思想に包含されるべきもの
である。
EFFECTS OF THE INVENTION The disk mold formed by the above two steps has a shorter life than the conventional product because the abrasion between the back surface of the disk master and the mirror surface of the mold is reduced under high temperature and high pressure. It has become possible to postpone. As a result, it is possible to reduce the cost and time required for repair and replacement of the master disk and the mirror surface of the mold. While the preferred and presently contemplated embodiments of the invention have been illustrated and described, it will be obvious to those skilled in the art that various changes and modifications can be made without departing from the spirit of the invention. . All such changes and modifications should be included in the technical idea of the present invention.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明に従って光ディスク原盤の情報面を保護
するためにマスキング剤をコーティングした第一段階の
状態の断面図である。
FIG. 1 is a cross-sectional view showing a state of a first stage in which a masking agent is coated to protect an information surface of an optical disc master according to the present invention.

【図2】本発明に従って光ディスク原盤の裏面に耐摩耗
性を向上することを目的とした膜を設けた第二段階の状
態の断面図である。
FIG. 2 is a cross-sectional view of a second stage state in which a film for improving abrasion resistance is provided on the back surface of an optical disk master according to the present invention.

【図3】本発明に従って図2の状態の光ディスク原盤の
裏面からマスキング剤を取り外す第三段階の状態の断面
図である。
FIG. 3 is a cross-sectional view showing a third stage state of removing the masking agent from the back surface of the optical disc master in the state of FIG. 2 according to the present invention.

【図4】本発明に従って得られた耐摩耗性を向上するこ
とを目的とした膜を備えた光ディスク原盤の断面図であ
る。
FIG. 4 is a cross-sectional view of an optical disc master provided with a film for improving the wear resistance obtained according to the present invention.

【図5】本発明に従って得られた光ディスク原盤を使用
したディスク用金型の断面図である。
FIG. 5 is a cross-sectional view of a disk mold using an optical disk master obtained according to the present invention.

【図6】本発明に従って金型鏡面の側面にマスキング剤
を塗布した第一段階の状態の断面図である。
FIG. 6 is a cross-sectional view showing a state of a first stage in which a masking agent is applied to the side surface of a mirror surface of a mold according to the present invention.

【図7】本発明に従って金型鏡面にPTFE複合被膜を
設けた第二段階の状態の断面図である。
FIG. 7 is a cross-sectional view of a second stage state in which a PTFE composite coating is provided on the mirror surface of a mold according to the present invention.

【図8】本発明に従って得られたPTFE複合被膜を備
えた金型鏡面の断面図である。
FIG. 8 is a cross-sectional view of a mirror surface of a mold provided with a PTFE composite coating obtained according to the present invention.

【図9】本発明に従って得られた金型鏡面を使用したデ
ィスク原盤を装着したディスク用金型の断面図である。
FIG. 9 is a cross-sectional view of a disk mold equipped with a disk master using the mold mirror surface obtained according to the present invention.

【符号の説明】[Explanation of symbols]

10、20 ディスク用金型 11、21 マスキング剤 12 ディスク原盤の情報面 13、23 ディスク原盤 14 ディスク原盤の裏面 15 耐摩耗性が向上することを目的とした膜 15A 耐摩耗性が向上することを目的とした膜の表面 16、26 金型鏡面 17 摩耗緩和層を設けたディスク原盤 25 PTFE複合被膜 25A PTFE複合被膜表面 10, 20 Disk mold 11, 21 Masking agent 12 Information surface of the disk master 13, 23 Disk master 14 Back surface of the disk master 15 A film intended to improve wear resistance 15A Improves wear resistance Target film surface 16, 26 Mold mirror surface 17 Disc master with wear-relief layer 25 PTFE composite coating 25A PTFE composite coating surface

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】 光ディスクの射出成形に使用するディス
ク原盤において、該ディスク原盤の裏面に硬度がHv2
50以上の金属もしくはセラミック膜からなる摩耗緩和
層を設けたことを特徴とするディスク原盤。
1. A disc master used for injection molding of an optical disc, wherein the hardness of the back side of the disc master is Hv2.
A disc master having a wear-reducing layer made of 50 or more metal or ceramic films.
【請求項2】 前記金属膜もしくはセラミック膜がSU
J2製ピンによるピン・オン・ディスク摩擦摩耗試験で
動摩擦係数が0.01〜0.6である請求項1のディス
ク原盤。
2. The metal film or ceramic film is SU.
The disk master according to claim 1, which has a dynamic friction coefficient of 0.01 to 0.6 in a pin-on-disk friction and wear test using a J2 pin.
【請求項3】 前記金属膜がシリコン、モリブデン及び
PTFE等の潤滑性粒子よりなる群から選択した少なく
とも一種を分散した金属メッキ膜よりなる摩耗緩和層を
設けた請求項1または2のディスク原盤。
3. The disk master according to claim 1, wherein the metal film is provided with a wear-reducing layer made of a metal plating film in which at least one selected from the group consisting of lubricating particles such as silicon, molybdenum and PTFE is dispersed.
【請求項4】 前記セラミック膜がPVDまたはCVD
により形成される請求項1または2のディスク原盤。
4. The ceramic film is PVD or CVD.
The disc master according to claim 1, which is formed by
【請求項5】 光ディスクの射出成形に使用するディス
ク原盤を支持するための金型鏡面において、前記鏡面に
シリコン、モリブデン及びPTFE等の潤滑性粒子より
なる群から選択した少なくとも一種を分散した金属メッ
キ膜よりなる摩耗緩和層を設けたことを特徴とするディ
スク成形用金型。
5. A metal plating in which at least one selected from the group consisting of lubricating particles such as silicon, molybdenum and PTFE is dispersed on the mirror surface of a mold for supporting a disk master used for injection molding of an optical disk. A mold for molding a disk, comprising a wear-relieving layer made of a film.
【請求項6】 光ディスクの射出成形に使用するディス
ク原盤とそれを支持するための金型鏡面の組み合わせに
おいて、前記ディスク原盤の裏面及び金属鏡面にシリコ
ン、モリブデン及びPTFE等の潤滑性粒子よりなる群
から選択した少なくとも一種を分散した金属メッキ膜よ
りなる第1及び第2の摩耗緩和層をそれぞれ設け、且つ
第1摩耗緩和層の硬度を第2摩耗緩和層の硬度よりも小
さくしたことを特徴とするディスク成形用ディスク原盤
と金型の組み合わせ。
6. A combination of a disk master used for injection molding of an optical disk and a mirror surface of a mold for supporting the disk master, wherein the back surface of the disk master and the metal mirror surface are composed of lubricating particles such as silicon, molybdenum and PTFE. Characterized in that first and second wear mitigating layers each comprising a metal plating film in which at least one selected from the above are dispersed, and the hardness of the first wear mitigating layer is smaller than the hardness of the second wear mitigating layer. A combination of a disc master and a mold for disc molding.
JP33221194A 1993-12-28 1994-12-13 Disc master for molding disc substrate, mold and combination thereof Pending JPH07232354A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP33221194A JPH07232354A (en) 1993-12-28 1994-12-13 Disc master for molding disc substrate, mold and combination thereof

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP34950593 1993-12-28
JP5-349505 1993-12-28
JP33221194A JPH07232354A (en) 1993-12-28 1994-12-13 Disc master for molding disc substrate, mold and combination thereof

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JPH07232354A true JPH07232354A (en) 1995-09-05

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001084547A1 (en) * 2000-04-28 2001-11-08 Itac Limited Disc molding apparatus for compact disc
JP2003300227A (en) * 2002-04-08 2003-10-21 Seikoh Giken Co Ltd Mold for molding disc
JP2015037025A (en) * 2013-08-12 2015-02-23 積水化学工業株式会社 Conductive particles, conductive material and connection structure
CN115230026A (en) * 2022-07-21 2022-10-25 北京工业大学 Ultrasonic electroforming processing method for two-dimensional material reinforced self-lubricating nickel mold core

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001084547A1 (en) * 2000-04-28 2001-11-08 Itac Limited Disc molding apparatus for compact disc
JP2001312844A (en) * 2000-04-28 2001-11-09 Aitakku Kk Device for molding disk such as compact disk
JP2003300227A (en) * 2002-04-08 2003-10-21 Seikoh Giken Co Ltd Mold for molding disc
JP2015037025A (en) * 2013-08-12 2015-02-23 積水化学工業株式会社 Conductive particles, conductive material and connection structure
CN115230026A (en) * 2022-07-21 2022-10-25 北京工业大学 Ultrasonic electroforming processing method for two-dimensional material reinforced self-lubricating nickel mold core

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