JPH07216541A - Electron beam scanning method and device therefor - Google Patents

Abstract

PURPOSE:To uniformly irradiate selectively whole surface of a material for vapor deposition with electron beams without irradiating a crucible by arranging an electromagnet for deflecting electron beams between an electron beam source and the material for vapor deposition at the time of irradiating the circular material for vapor deposition in the crucible with the electron beams. CONSTITUTION:When an evaporation material 3 filled in a circular recessed part of the crucible 4 is irradiated to be heated and evaporated with the electron beams from the electron beam source 1, the electromagnet for deflecting electron beams 2 is provided between the electron beam source 1 and the evaporation material 3. A control signal having a waveform in which amplitude changes step-by-step is outputted from a waveform generator 6 of a control power source 5 in the electromagnet for deflection 2 by the electron beam from the source 1 and then inputted to a sine-wave generator 7. A sinusoidal current having amplitude corresponding to the control signal is outputted therefrom and is inputted in a Y-axis current output driving circuit 9 through a X-axis current output driving circuit 10 and a 90 deg. phase shifter 8. The surface of the circular evaporation material 3 is thoroughly and uniformly scanned and irradiated with the electron beams by an electromagnet for X-axis deflection 2X and an electromagnet for Y-axis deflection 2Y, respectively connected to the X-axis current output driving circuit 10 and the Y-axis current output driving circuit 9. At that time, the crucible 4 is not irradiated with the electron beams and is not damaged.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electron beam scanning method and apparatus used in a vacuum vapor deposition apparatus and other apparatuses using an electron beam.

[0002]

2. Description of the Related Art Conventionally, as shown in FIG. 4, an electron beam scanning method in which an electron beam scans (C) a square or rectangular region b of a material surface a, or as shown in FIG. There is known an electron beam scanning method in which a minute area d on the surface a is moved while scanning and a circular area b on the material surface a is scanned (C).

[0003]

According to the method shown in FIGS. 4 and 5, it is difficult to uniformly irradiate the entire area of the circular material surface a with the electron beam, and the crucible containing the material is electronized. There was a problem that the beam was irradiated and damaged.

An object of the present invention is to solve the problems of the conventional electron beam scanning method.

[0005]

In order to achieve the above-mentioned object, the present invention deflects electron beams in directions orthogonal to each other on a plane perpendicular to the traveling direction of the electron beam.
In the method of scanning an electron beam by applying a control current or voltage to one deflection means, the two deflection means have a phase difference of 90 degrees and the same frequency, and their amplitudes change in synchronization with each other. Apply current or voltage,
An electron beam scanning method characterized in that an electron beam scans in a circle having a radius corresponding to the control current or voltage, and is orthogonal to each other on a plane perpendicular to the traveling direction of the electron beam. Deflects the electron beam in two directions 2
In an electron beam scanning device having two deflecting means, as a control power source for applying a control current or a voltage to each of the two deflecting means, they have a phase difference of 90 degrees and the same frequency, and their amplitudes can change in synchronization with each other. An electron beam scanning device comprising a control power supply for outputting two control currents or voltages.

[0006]

When a control voltage or current having a phase difference of 90 degrees and the same frequency and amplitudes synchronized with each other is applied to the two deflecting means and the magnitude thereof is changed, the electron beam causes the material surface to move to a predetermined level. , And then move in the radial direction to scan circles with different radii. The number of times of scanning on the circle of each radius of the material surface can be freely changed by changing the amplitude of the control current or voltage.

Therefore, by changing the amplitude of the control current or voltage from zero to a predetermined value at an arbitrary time, the electron beam uniformly irradiates the circular material surface with desired energy and deviates from the material surface. Without damaging the crucible.

[0008]

Embodiments of the present invention will be described below with reference to the drawings.

FIG. 1 is a diagram showing an example of the configuration of an electron beam evaporation source for carrying out the electron beam scanning method according to the present invention, and FIG. 2 is a block diagram of the main part thereof.

In FIG. 1, reference numeral 1 denotes an electron beam source, 2
Is a deflecting electromagnet, and 3 is a material put in the crucible 4.

As shown in FIG. 2, the deflection electromagnet 2 has an X-axis.
It is composed of an electromagnet 2x for axis deflection and an electromagnet 2y for Y axis deflection,
Two deflecting means for deflecting the electron beam in directions orthogonal to each other are formed on a plane perpendicular to the traveling direction of the electron beam.

A control power supply 5 for applying a control current to each of the two deflection means includes a waveform generator 6 for generating a control signal having an arbitrary waveform, and a sine wave to which the control signal of the waveform generator 6 is applied to an amplitude control input terminal. The wave generator 7, a 90-degree phase shifter 8 for shifting the output of the sine wave generator 7 by 90 degrees, and
The Y-axis current output drive circuit 9 to which the output of the phase shifter 8 is input, and the X-axis current output drive circuit 10 to which the output of the sine wave generator 7 is input. The Y-axis current output drive circuit 9 has X
It is connected to the axis-deflecting electromagnet 2x and the Y-axis-deflecting electromagnet 2y.

The waveform generator 6 outputs a control signal having a waveform whose amplitude changes stepwise from a predetermined value to zero, and when this control signal is input to the sine wave generator 7, the sine wave generator 7 controls it. A sine wave current having an amplitude corresponding to the signal amplitude is output, and this sine wave current is input to the 90-degree phase shifter 8 and the X-axis current output drive circuit 10. Thus, the X-axis deflection electromagnet 2x and the Y-axis deflection electromagnet 2y have a sinusoidal X-axis deflection current having the same frequency as the phase difference of 90 degrees and the amplitude changing stepwise from a predetermined value to zero. And a Y-axis deflection current flows, and the electromagnets 2x and 2y cause the electron beam to stepwise change the amplitude of the X-axis and Y-axis deflection currents on the circular surface of the material 3 as shown in FIG. Scan a number of times corresponding to the length of each step into a circle having a radius corresponding to the section.

Although a sine wave generator is used in the above embodiment, a triangular wave generator and other waveform generators can be used. The above embodiment is suitable for evaporating a circular material of a compound, an oxide or the like having poor heat conduction, a sublimate, or a material having a high melting point and only partially melting.

The device of the present invention can also be applied to an electron gun which irradiates an electron beam by deflecting it from the generating portion to the material surface.

[0016]

Since the present invention has the above-described structure, it is possible to irradiate the electron beam uniformly over the entire area of the circular material surface, and the crucible containing the material irradiates the electron beam with the electron beam. It has an effect that it is not damaged by being damaged.

[Brief description of drawings]

FIG. 1 is a diagram showing an example of the configuration of an electron beam evaporation source for carrying out an electron beam scanning method according to the present invention.

FIG. 2 is a block diagram of an electron beam deflection unit of the electron beam evaporation source shown in FIG.

FIG. 3 is a diagram showing a scanning state of an electron beam by an electron beam scanning method according to the present invention.

FIG. 4 is a diagram showing an example of a scanning state of an electron beam by a conventional electron beam scanning method.

FIG. 5 is a diagram showing another example of a scanning state of an electron beam by a conventional electron beam scanning method.

[Explanation of symbols]

2 Electromagnet for deflection 2x Electromagnet for X-axis deflection 2y Y-axis deflection electromagnet 3 Material 4 Crucible 5 Control power supply 6 Waveform generator 7 Sine wave generator 8 90 degree phase shifter

Claims (2)

[Claims] 1. A method for scanning an electron beam by applying a control current or voltage to two deflecting means for deflecting the electron beam in directions orthogonal to each other on a plane perpendicular to the traveling direction of the electron beam, A control current or voltage having a phase difference of 90 degrees and the same frequency and changing amplitudes in synchronization with each other is applied to the two deflection means, and the electron beam is made into a circular shape having a radius corresponding to the control current or voltage. An electron beam scanning method characterized by scanning. 2. An electron beam scanning device comprising two deflecting means for deflecting an electron beam in directions orthogonal to each other on a plane perpendicular to the traveling direction of the electron beam, wherein a control current or a control current is supplied to each of the two deflecting means. Electron beam scanning, characterized in that the control power supply for applying a voltage includes a control power supply that outputs two control currents or voltages that have a phase difference of 90 degrees and the same frequency with each other and whose amplitudes can change in synchronization with each other. apparatus.