JPH07202433A - Multilayer printed wiring board and production thereof - Google Patents
Multilayer printed wiring board and production thereofInfo
- Publication number
- JPH07202433A JPH07202433A JP33467993A JP33467993A JPH07202433A JP H07202433 A JPH07202433 A JP H07202433A JP 33467993 A JP33467993 A JP 33467993A JP 33467993 A JP33467993 A JP 33467993A JP H07202433 A JPH07202433 A JP H07202433A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- printed wiring
- wiring board
- adhesive
- resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 18
- 229920005989 resin Polymers 0.000 claims abstract description 76
- 239000011347 resin Substances 0.000 claims abstract description 76
- 239000000945 filler Substances 0.000 claims abstract description 42
- 239000007788 liquid Substances 0.000 claims abstract description 36
- 239000004020 conductor Substances 0.000 claims abstract description 26
- 239000000853 adhesive Substances 0.000 claims abstract description 19
- 230000001070 adhesive effect Effects 0.000 claims abstract description 19
- 239000011342 resin composition Substances 0.000 claims abstract description 19
- 238000010030 laminating Methods 0.000 claims abstract description 8
- 239000010410 layer Substances 0.000 claims description 106
- 238000000034 method Methods 0.000 claims description 29
- 238000009413 insulation Methods 0.000 claims description 19
- 239000012790 adhesive layer Substances 0.000 claims description 16
- 239000002253 acid Substances 0.000 claims description 15
- 239000000203 mixture Substances 0.000 claims description 13
- 239000007800 oxidant agent Substances 0.000 claims description 13
- 229920006015 heat resistant resin Polymers 0.000 claims description 11
- 239000000843 powder Substances 0.000 claims description 10
- 239000002131 composite material Substances 0.000 claims description 7
- 230000001590 oxidative effect Effects 0.000 claims description 7
- 239000011256 inorganic filler Substances 0.000 claims description 5
- 229910003475 inorganic filler Inorganic materials 0.000 claims description 5
- 239000011159 matrix material Substances 0.000 claims description 5
- 229920001187 thermosetting polymer Polymers 0.000 claims description 5
- 238000003825 pressing Methods 0.000 claims description 3
- 230000001747 exhibiting effect Effects 0.000 claims 2
- 239000000758 substrate Substances 0.000 abstract description 49
- 238000007747 plating Methods 0.000 abstract description 14
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract description 8
- 229910052802 copper Inorganic materials 0.000 abstract description 8
- 239000010949 copper Substances 0.000 abstract description 8
- 239000002313 adhesive film Substances 0.000 abstract description 7
- 239000011248 coating agent Substances 0.000 abstract description 6
- 238000000576 coating method Methods 0.000 abstract description 6
- 239000000805 composite resin Substances 0.000 abstract description 2
- 239000000243 solution Substances 0.000 description 11
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 9
- 238000007772 electroless plating Methods 0.000 description 8
- 239000003822 epoxy resin Substances 0.000 description 8
- 229920000647 polyepoxide Polymers 0.000 description 8
- 238000010586 diagram Methods 0.000 description 7
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 6
- 239000003795 chemical substances by application Substances 0.000 description 6
- 238000007796 conventional method Methods 0.000 description 6
- 238000001723 curing Methods 0.000 description 6
- 238000011049 filling Methods 0.000 description 6
- 238000007788 roughening Methods 0.000 description 6
- 239000004593 Epoxy Substances 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 239000003054 catalyst Substances 0.000 description 5
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 4
- 238000002844 melting Methods 0.000 description 4
- 230000008018 melting Effects 0.000 description 4
- -1 neopentyl glycol modified trimethylolpropane diacrylate Chemical class 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 239000002245 particle Substances 0.000 description 3
- 239000004576 sand Substances 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 2
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 229930003836 cresol Natural products 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000011229 interlayer Substances 0.000 description 2
- 238000003475 lamination Methods 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 229920003986 novolac Polymers 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 239000013557 residual solvent Substances 0.000 description 2
- 238000005096 rolling process Methods 0.000 description 2
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000000725 suspension Substances 0.000 description 2
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 1
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- NQBXSWAWVZHKBZ-UHFFFAOYSA-N 2-butoxyethyl acetate Chemical compound CCCCOCCOC(C)=O NQBXSWAWVZHKBZ-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 238000003848 UV Light-Curing Methods 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 238000010306 acid treatment Methods 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- ZCDOYSPFYFSLEW-UHFFFAOYSA-N chromate(2-) Chemical class [O-][Cr]([O-])(=O)=O ZCDOYSPFYFSLEW-UHFFFAOYSA-N 0.000 description 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical group C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 238000000016 photochemical curing Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- PDEDQSAFHNADLV-UHFFFAOYSA-M potassium;disodium;dinitrate;nitrite Chemical compound [Na+].[Na+].[K+].[O-]N=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O PDEDQSAFHNADLV-UHFFFAOYSA-M 0.000 description 1
- 238000006748 scratching Methods 0.000 description 1
- 230000002393 scratching effect Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000009751 slip forming Methods 0.000 description 1
- 235000010265 sodium sulphite Nutrition 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 230000009974 thixotropic effect Effects 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Landscapes
- Production Of Multi-Layered Print Wiring Board (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、多層プリント配線板の
製造方法およびこの方法の下に製造される多層プリント
配線板に関し、特に、内層回路に設けられたスルーホー
ル,バイアホールまたは導体回路間段差によって生じる
隙間内への異物の混入,気泡の巻き込みを排除して、液
状充填剤を緻密に充填することにより、平滑性に優れ、
かつ接続信頼性の高い多層プリント配線板を有利に製造
する技術について提案する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a multilayer printed wiring board and a multilayer printed wiring board manufactured under this method, and more particularly to a through hole, a via hole or a conductor circuit between inner layers. By excluding foreign matter and air bubbles from getting into the gap caused by the step, and by filling the liquid filler densely, the smoothness is excellent,
And, we propose the technology to manufacture the multilayer printed wiring board with high connection reliability.
【0002】[0002]
【従来の技術】多層プリント配線板は、交互に積層した
導体回路と樹脂絶縁層を有し、その内・外層の回路を、
スルーホールまたはバイアホールによって接続,導通さ
せてなるものである。したがって、この多層プリント配
線板は、一般に、スルーホール、バイアホールまたは回
路間の段差を起因とするミクロな凹凸が不可避に生じ、
いわゆる平滑性に乏しいという問題点があった。2. Description of the Related Art A multilayer printed wiring board has conductor circuits and resin insulation layers that are alternately laminated, and circuits of the inner and outer layers are
These are connected and conducted by through holes or via holes. Therefore, in general, this multilayer printed wiring board inevitably has microscopic unevenness caused by through holes, via holes, or steps between circuits,
There is a problem that the so-called smoothness is poor.
【0003】このような問題点を克服するために従来、
樹脂絶縁層を形成する前に予め、内層回路板を樹脂液に
浸漬する,いわゆるディッピング法により、上記スルー
ホール、バイアホールまたは回路間の段差を樹脂で埋め
る方法が採られていた。Conventionally, in order to overcome such problems,
Before forming the resin insulating layer, a method of previously filling the through hole, the via hole or the step between the circuits with the resin by a so-called dipping method of immersing the inner layer circuit board in the resin liquid has been adopted.
【0004】[0004]
【発明が解決しようとする課題】しかしながら、上記従
来技術では、スルーホールまたはバイアホールの孔内,
あるいは回路間段差に、塵埃の巻き込みや気泡の巻き込
みによる残留付着が生じやすいという致命的な欠点があ
った。しかも、このことに起因した表面凹凸が一層激し
くなり、樹脂絶縁層の膜厚制御を困難にするという欠点
があった。しかも、この従来技術では、樹脂液の粘度や
量などの成膜管理が極めて難しいという欠点もあった。
それ故に、樹脂絶縁層の膜厚精度などの信頼性を悪化さ
せ、ひいてはプリント配線板としての信頼性および生産
性の低下を招くという欠点を抱えていた。However, in the above-mentioned prior art, the inside of the hole of the through hole or the via hole,
Alternatively, there is a fatal defect that dust or air bubbles are apt to cause residual adhesion at the step between circuits. Moreover, there is a drawback in that the surface irregularities resulting from this become more severe, making it difficult to control the film thickness of the resin insulating layer. Moreover, this conventional technique has a drawback that it is extremely difficult to control the film formation such as the viscosity and amount of the resin liquid.
Therefore, there is a drawback that reliability such as film thickness accuracy of the resin insulating layer is deteriorated, and eventually the reliability and productivity of the printed wiring board are deteriorated.
【0005】本発明の目的は、従来技術が抱える上述し
た諸問題を解消することにあり、特に、内層回路に設け
られたスルーホール,バイアホールまたは導体回路間段
差によって生じる隙間内への異物の混入,気泡の巻き込
みを排除して、液状充填剤を緻密に充填することによ
り、平滑性に優れ、かつ接続信頼性の高い多層プリント
配線板を有利に製造する技術を提供することにある。An object of the present invention is to eliminate the above-mentioned problems of the prior art, and in particular, to prevent foreign matters from entering into the gaps caused by through holes, via holes, or steps between conductor circuits provided in the inner layer circuit. It is an object of the present invention to provide a technique for advantageously manufacturing a multilayer printed wiring board having excellent smoothness and high connection reliability by densely filling a liquid filler by eliminating inclusion and entrainment of bubbles.
【0006】[0006]
【課題を解決するための手段】発明者は、上記目的の実
現に向け鋭意検討を行った結果、以下の内容を要旨構成
とする本発明に想到した。すなわち、本発明の多層プリ
ント配線板の製造方法は、樹脂絶縁層によって電気的に
絶縁された複数の導体回路を設けてなる多層プリント配
線板の製造方法において、スルーホールまたはバイアホ
ールを有する内層回路板上に、無溶剤感光性樹脂組成物
からなる液状充填剤を供給して付着させ、その上層にフ
ィルム状の接着剤を重ね合わせた後、減圧下で押圧して
ラミネートすることにより、充填剤層と接着剤層との複
合層からなる樹脂絶縁層を形成することを特徴とする多
層プリント配線板の製造方法である。As a result of intensive studies aimed at achieving the above object, the inventor has come up with the present invention having the following contents. That is, a method for manufacturing a multilayer printed wiring board according to the present invention is a method for manufacturing a multilayer printed wiring board, which comprises a plurality of conductor circuits electrically insulated by a resin insulating layer, the inner layer circuit having a through hole or a via hole. On the plate, a liquid filler composed of a solventless photosensitive resin composition is supplied and adhered, and a film-like adhesive is superposed on the upper layer thereof, followed by pressing and laminating under reduced pressure, thereby the filler. A method for manufacturing a multilayer printed wiring board, which comprises forming a resin insulating layer composed of a composite layer of a layer and an adhesive layer.
【0007】そして、この発明はさらに、下記の方法に
よることが、より好ましい実施形態となる。すなわち、
上記無溶剤感光性樹脂組成物は、感光性樹脂と熱硬化性
樹脂の混合物を用いることが望ましく、また、無機充填
材を含むものを用いることが望ましい。さらに、上記接
着剤は、酸あるいは酸化剤に対して可溶性の硬化処理済
の耐熱性樹脂微粉末を、硬化処理が施された場合には酸
あるいは酸化剤に対して難溶性となる特性を示す未硬化
の耐熱性樹脂マトリックス中に分散させてなる接着剤を
用いることが好適である。Further, the present invention is a more preferable embodiment by the following method. That is,
As the solventless photosensitive resin composition, it is desirable to use a mixture of a photosensitive resin and a thermosetting resin, and it is desirable to use a composition containing an inorganic filler. Furthermore, the above-mentioned adhesive exhibits a property that a hardened heat-resistant resin fine powder that is soluble in an acid or an oxidant is hardly soluble in an acid or an oxidant when it is hardened. It is preferable to use an adhesive that is dispersed in an uncured heat-resistant resin matrix.
【0008】このような製造方法によって得られる本発
明の多層プリント配線板は、複数層の導体回路を、樹脂
絶縁層によって電気的に絶縁してなる多層プリント配線
板において、この樹脂絶縁層を、内層回路板に設けられ
たスルーホール,バイアホールまたは導体回路間段差に
よって生じる隙間内に、それぞれ充填された感光性樹脂
組成物からなる充填剤層と、その上層を被覆する接着剤
層との複合層で構成したことを特徴とする多層プリント
配線板である。The multilayer printed wiring board of the present invention obtained by such a manufacturing method is a multilayer printed wiring board in which a plurality of layers of conductor circuits are electrically insulated by a resin insulating layer. A composite of a filler layer made of a photosensitive resin composition filled in a gap formed by a through hole, a via hole, or a step between conductor circuits provided in an inner layer circuit board, and an adhesive layer covering the upper layer thereof. It is a multilayer printed wiring board characterized by comprising layers.
【0009】ここに、上記感光性樹脂組成物は、感光性
樹脂と熱硬化性樹脂の混合物であることが望ましく、ま
た、無機充填材を含むことが望ましい。さらに、上記接
着剤層は、酸あるいは酸化剤に対して可溶性の硬化処理
済の耐熱性樹脂微粉末を、硬化処理が施された場合には
酸あるいは酸化剤に対して難溶性となる特性を示す未硬
化の耐熱性樹脂マトリックス中に分散させてなる接着剤
で構成することが好適である。Here, the above-mentioned photosensitive resin composition is preferably a mixture of a photosensitive resin and a thermosetting resin, and preferably contains an inorganic filler. Further, the adhesive layer has a characteristic that a hardened heat-resistant resin fine powder that is soluble in an acid or an oxidizing agent is hardly soluble in an acid or an oxidizing agent when the hardening treatment is performed. It is preferable to use an adhesive which is dispersed in the uncured heat-resistant resin matrix shown.
【0010】[0010]
【作用】本発明の特徴は、内層回路板上に、感光性樹脂
組成物からなる液状充填剤とフィルム状の接着剤を、減
圧下でラミネートすることにより、主として凹凸段差を
埋めならす作用を発揮する,感光性樹脂組成物からなる
充填剤層と、主として異物混入防止作用を発揮する,そ
の上層を被覆する接着剤層との複合層で構成した樹脂絶
縁層とする点にある。これにより、内層回路に設けられ
たスルーホール,バイアホールまたは導体回路間段差に
よって生じる隙間内への異物の混入,気泡の巻き込みを
排除して、液状充填剤を緻密に充填することが可能とな
り、平滑性に優れ、かつ接続信頼性の高い多層プリント
配線板を有利に製造することができる。The feature of the present invention is that the inner layer circuit board is mainly laminated with a liquid filler made of a photosensitive resin composition and a film-like adhesive under reduced pressure, thereby mainly exerting an effect of filling uneven steps. That is, the resin insulating layer is composed of a composite layer of a filler layer made of a photosensitive resin composition and an adhesive layer covering the upper layer, which mainly exhibits an effect of preventing foreign matter from entering. As a result, it is possible to eliminate the mixing of foreign matter and the entrainment of air bubbles in the gap caused by the through hole, the via hole provided in the inner layer circuit, or the step between the conductor circuits, and to densely fill the liquid filler. It is possible to advantageously manufacture a multilayer printed wiring board having excellent smoothness and high connection reliability.
【0011】すなわち、本発明によれば、 .液状充填剤を用いることにより、内層回路に設けら
れたスルーホール,バイアホールまたは導体回路間段差
によって生じる隙間(窪み)をそれぞれ平滑に埋めるこ
とができると同時に、真空ラミネーターなどを用いるこ
とにより、樹脂絶縁層を連続形成できるので、平滑性と
生産性とに優れる多層プリント配線板を安価に製造でき
る。 .充填剤層の上層をフィルム状の接着剤で被覆するこ
とにより、粉塵や異物の混入を防止でき、樹脂絶縁層の
信頼性を向上させることができる。しかも、フィルム状
の接着剤を使用することにより、平滑性に優れるととも
に膜厚制御が容易で膜厚精度に優れる樹脂絶縁層を形成
することができる。 .減圧下でラミネートすることにより、気泡の巻き込
みを防止することができる。That is, according to the present invention: By using the liquid filler, it is possible to smoothly fill the through holes, the via holes provided in the inner layer circuit or the gaps (dents) caused by the step between the conductor circuits, and at the same time, by using the vacuum laminator, Since the insulating layer can be continuously formed, a multilayer printed wiring board excellent in smoothness and productivity can be manufactured at low cost. . By covering the upper layer of the filler layer with a film-like adhesive, it is possible to prevent dust and foreign matter from entering, and improve the reliability of the resin insulating layer. Moreover, by using a film-like adhesive, it is possible to form a resin insulating layer having excellent smoothness, easy film thickness control, and excellent film thickness accuracy. . By laminating under reduced pressure, inclusion of bubbles can be prevented.
【0012】以下に、本発明の多層プリント配線板を製
造する方法について説明する。まず、製造に当たって、
必要に応じてスルーホールまたはバイアホールが設けら
れた内層回路板を常法に従って作製する。ここで、上記
内層回路板に用いる基板としては、例えばプラスチック
基板,セラミック基板,金属基板およびフィルム基板な
どを使用することができる。例えば、ガラスエポキシ基
板,ガラスポリイミド基板,アルミナ基板,低温焼成セ
ラミック基板,窒化アルミニウム基板,アルミニウム基
板,鉄基板およびポリイミドフィルム基板などである。The method for producing the multilayer printed wiring board of the present invention will be described below. First of all, in manufacturing,
An inner layer circuit board provided with through holes or via holes as required is manufactured by a conventional method. Here, as the substrate used for the inner layer circuit board, for example, a plastic substrate, a ceramic substrate, a metal substrate, a film substrate or the like can be used. For example, a glass epoxy substrate, a glass polyimide substrate, an alumina substrate, a low temperature fired ceramic substrate, an aluminum nitride substrate, an aluminum substrate, an iron substrate and a polyimide film substrate.
【0013】次に、上述のようにして作製した内層回路
板上に、無溶剤感光性樹脂組成物からなる液状充填剤を
供給して付着させ、次いで、その液状充填剤上にフィル
ム状の接着剤を重ね合わせ、基板を挟む両側から前記フ
ィルムを押圧して掻きならしながら減圧下でラミネート
する。この工程での作業により、充填剤層と接着剤層と
の複合層からなる樹脂絶縁層を形成する。ここで、基板
上に、液状充填剤を付着させたのち接着剤フィルムを重
ね合わせて減圧下でラミネートする方法として、例えば
図1〜図4に示すような種々の方法がある。図1は、基
板を液状充填剤中に浸漬することにより、基板全面に液
状充填剤を付着させ、この基板を真空ラミネーターに送
給して接着剤フィルムをラミネートする方法を示す図で
ある。図2は、基板上にロールコーターなどで液状充填
剤を塗布することにより、基板全面に液状充填剤を付着
させ、この基板を真空ラミネーターに送給して接着剤フ
ィルムをラミネートする方法を示す図である。図3は、
ケミカルスポイトなどを用いて基板両面の端部に液状充
填剤を付着させ、この基板端部を先にして真空ラミネー
ターに送給して接着剤フィルムをラミネートする方法を
示す図である。図4は、真空ラミネーターの圧延ロール
のロールキス部に、液状充填剤を噴射等によって供給
し、このロールキス部に基板を送給することにより、基
板への液状充填剤の供給と接着剤フィルムのラミネート
を同時に行う方法を示す図である。Next, a liquid filler composed of a solventless photosensitive resin composition is supplied and adhered onto the inner layer circuit board produced as described above, and then a film-like adhesive is applied onto the liquid filler. The agents are overlaid, and the films are laminated under reduced pressure while pressing the films from both sides of the substrate to scrape them. By the work in this step, the resin insulating layer including the composite layer of the filler layer and the adhesive layer is formed. Here, there are various methods as shown in FIGS. 1 to 4, for example, as a method of depositing a liquid filler on a substrate, superposing an adhesive film and laminating it under reduced pressure. FIG. 1 is a diagram showing a method of immersing a substrate in a liquid filler to deposit the liquid filler on the entire surface of the substrate, feed the substrate to a vacuum laminator, and laminate the adhesive film. FIG. 2 is a diagram showing a method of applying a liquid filler on a substrate with a roll coater or the like to adhere the liquid filler to the entire surface of the substrate and feeding the substrate to a vacuum laminator to laminate an adhesive film. Is. Figure 3
It is a figure which shows the method of making a liquid filler adhere to the edge part of both surfaces of a board | substrate using a chemical dropper, etc., and sending this board edge part to a vacuum laminator first, and laminating an adhesive film. FIG. 4 shows the liquid filler is supplied to the roll kiss portion of the rolling roll of the vacuum laminator by jetting or the like, and the substrate is fed to the roll kiss portion to supply the liquid filler to the substrate and laminate the adhesive film. It is a figure which shows the method of performing simultaneously.
【0014】本発明において、上記液状充填剤として、
無溶剤感光性樹脂組成物を用いる理由は、溶剤を含む組
成物では、低圧状態にすると、溶剤が揮発してしまい粘
度が変化してしまうからである。上記感光性樹脂組成物
は、感光性樹脂と熱硬化性樹脂の混合物であることが望
ましい。この理由は、感光性樹脂単独の組成物を用いる
と、スルーホールまたはバイアホール内部に充填された
樹脂に露光光が届かず、光硬化が不十分となるからであ
る。また、この感光性樹脂組成物は、シリカ,アルミ
ナ,ジルコニア,タルクなどの無機充填剤を含むことが
望ましい。硬化収縮が低減されるからである。In the present invention, as the liquid filler,
The reason why the solventless photosensitive resin composition is used is that in a composition containing a solvent, the solvent is volatilized and the viscosity is changed in a low pressure state. The photosensitive resin composition is preferably a mixture of a photosensitive resin and a thermosetting resin. The reason for this is that when a composition containing only a photosensitive resin is used, exposure light does not reach the resin filled in the through hole or the via hole, resulting in insufficient photo-curing. Further, this photosensitive resin composition preferably contains an inorganic filler such as silica, alumina, zirconia or talc. This is because curing shrinkage is reduced.
【0015】本発明においては、基板を挟む両側からフ
ィルム状接着剤を押圧して掻きならしながら減圧下でラ
ミネートするが、このラミネートは、以下に示す条件で
行うことが望ましい。 .真空度:2〜3torr .ロール圧:3kgf/cm2 .ロール温度:80℃ .搬送速度:2m/secIn the present invention, the film adhesive is pressed from both sides sandwiching the substrate and laminating under reduced pressure while scratching, but it is desirable to carry out the lamination under the following conditions. . Degree of vacuum: 2-3 torr. Roll pressure: 3kgf / cm 2 . Roll temperature: 80 ℃. Transport speed: 2m / sec
【0016】次の工程は、上述のようにして基板上に設
けた樹脂絶縁層の表面を粗化する処理である。この樹脂
絶縁層の表面粗化を容易にするため、本発明では、上記
樹脂絶縁層を形成する際に、充填剤層の上に被覆する接
着剤層として、酸あるいは酸化剤に対して可溶性の硬化
処理済の耐熱性樹脂微粉末を、硬化処理が施された場合
には酸あるいは酸化剤に対して難溶性となる特性を示す
未硬化の耐熱性樹脂マトリックス中に分散させてなるフ
ィルム状の接着剤を用いることが好適である。かかる接
着剤層を含む樹脂絶縁層の表面粗化処理は、樹脂絶縁層
を形成した基板を、酸もしくは酸化剤の溶液中に浸漬す
るか、この基板に酸もしくは酸化剤溶液をスプレーする
方法などによって、樹脂絶縁層を構成する接着剤層表面
に分散している耐熱性微粉末の少なくとも一部を、溶解
除去することにより行うことができる。このような処理
によって、樹脂絶縁層の表面はめっきに適した粗化面と
なる。ここで、接着剤層を粗化する酸化剤としては、ク
ロム酸やクロム酸塩,過マンガン酸塩,オゾンなどがよ
く、酸としては、塩酸や硫酸,有機酸などがよい。な
お、この耐熱性樹脂微粉末の溶解除去を効果的に行わせ
ることを目的として、前記接着剤層の表面部分を、例え
ば微粉研磨剤によるポリシングや液体ホーニングを行う
ことにより、予め軽く粗化することは極めて有効であ
る。The next step is a treatment for roughening the surface of the resin insulating layer provided on the substrate as described above. In order to facilitate the roughening of the surface of the resin insulating layer, in the present invention, when forming the resin insulating layer, the adhesive layer covering the filler layer is soluble in an acid or an oxidizing agent. A film of a heat-resistant resin fine powder that has been cured, and is dispersed in an uncured heat-resistant resin matrix that has the property of being sparingly soluble in acid or oxidant when cured. It is preferable to use an adhesive. The surface roughening treatment of the resin insulation layer including the adhesive layer is performed by immersing the substrate on which the resin insulation layer is formed in a solution of an acid or an oxidant, or spraying the substrate with an acid or an oxidant solution. Thus, at least a part of the heat resistant fine powder dispersed on the surface of the adhesive layer forming the resin insulating layer can be dissolved and removed. By such a treatment, the surface of the resin insulating layer becomes a roughened surface suitable for plating. Here, the oxidizing agent for roughening the adhesive layer is preferably chromic acid, chromate salt, permanganate, ozone or the like, and the acid is preferably hydrochloric acid, sulfuric acid, organic acid or the like. For the purpose of effectively dissolving and removing the heat-resistant resin fine powder, the surface portion of the adhesive layer is lightly roughened in advance, for example, by polishing with a fine powder abrasive or liquid honing. That is extremely effective.
【0017】そして、粗化した樹脂絶縁層の表面に、例
えば無電解めっきを施して、必要な導体パターンを形成
し、さらに、必要に応じて上述した工程を繰り返すこと
により、所望の多層プリント配線板を得る。この無電解
めっきとしては、例えば無電解銅めっき,無電解ニッケ
ルめっき,無電解スズめっき,無電解金めっきおよび無
電解銀めっきなどが適用でき、特に無電解銅めっき,無
電解ニッケルめっきおよび無電解金めっきのいずれか少
なくとも1種の方法を用いることが好適である。なお、
本発明の製造方法においては、前記無電解めっきを施し
た上に、さらに異なる種類の無電解めっきあるいは電気
めっきを行ったり、ハンダをコートしたりすることもで
きる。Then, for example, electroless plating is applied to the surface of the roughened resin insulation layer to form a necessary conductor pattern, and the above-mentioned steps are repeated as necessary to obtain a desired multilayer printed wiring. Get the board. As this electroless plating, for example, electroless copper plating, electroless nickel plating, electroless tin plating, electroless gold plating and electroless silver plating can be applied, and especially electroless copper plating, electroless nickel plating and electroless plating It is preferable to use at least one method of gold plating. In addition,
In the manufacturing method of the present invention, different types of electroless plating or electroplating may be performed on the electroless plating, or solder may be coated.
【0018】また、本発明方法において上記の導体回路
は、既知のプリント配線板について実施されている種々
の方法でも導体回路を形成することができる。例えば、
基板に無電解めっきを施してから回路をエッチングする
方法や無電解めっきを施す際に直接回路を形成する方法
などを適用してもよい。In the method of the present invention, the conductor circuit described above can also be formed by various methods that have been carried out for known printed wiring boards. For example,
A method of etching a circuit after applying electroless plating to the substrate or a method of directly forming a circuit when applying electroless plating may be applied.
【0019】以上説明したような本発明の製造方法の下
に製造される本発明の多層プリント配線板について説明
する。本発明の多層プリント配線板は、複数層の導体回
路を、樹脂絶縁層によって電気的に絶縁してなる多層プ
リント配線板において、この樹脂絶縁層を、内層回路板
に設けられたスルーホール,バイアホールまたは導体回
路間段差によって生じる隙間や窪み内に、それぞれ充填
された感光性樹脂組成物からなる充填剤層と、その上層
を被覆する接着剤層とからなる複合層で構成したことを
特徴とする多層プリント配線板であり、例えば、基板両
面の樹脂絶縁層とスルーホールを介して導体回路を形成
してなる両面スルーホールプリント配線板、および第1
導体層を形成させた基板上に、バイアホールを有する層
間絶縁層(樹脂絶縁層)を介して導体回路を多層形成さ
せてなるビルドアップ多層配線板などがある。The multilayer printed wiring board of the present invention manufactured under the manufacturing method of the present invention as described above will be described. The multilayer printed wiring board of the present invention is a multilayer printed wiring board in which a plurality of layers of conductor circuits are electrically insulated by a resin insulating layer, and the resin insulating layer is provided with through holes and vias provided in the inner layer circuit board. A hole or a gap formed by a step between conductor circuits is formed in a composite layer including a filler layer made of a photosensitive resin composition and an adhesive layer covering the upper layer of the photosensitive resin composition. And a double-sided through-hole printed wiring board formed by forming a conductor circuit via a resin insulating layer on both sides of the substrate and through holes, and
There is a build-up multilayer wiring board in which a conductor circuit is formed in multiple layers on a substrate on which a conductor layer is formed with an interlayer insulating layer (resin insulating layer) having via holes.
【0020】[0020]
(実施例1) (1) 85℃で軟化させ液状化した難燃性エポキシ樹脂(油
化シェル製)35重量部に、ビスフェノールA型エポキシ
樹脂(油化シェル製)を30重量部および硬化剤として酸
無水物系硬化剤(スリーボンド製)を35重量部、硬化促
進剤としてイミダゾール系硬化剤(四国化成製)を0.5
重量部混合したものを、3本ロールで混練し、固形分濃
度100 %の液状充填剤を調製した。この充填剤の粘度
は、JIS −K7117 に準じ、東京計器製デジタル粘度計を
用いて20℃で60秒間測定したところ、回転数6rpm で6.
0 Pa・s 、60rpm で3.1 Pa・s であり、そのSVI 値(チ
キソトロピック性)は2.2 であった。 (2) 両面銅張積層板にドリルにて口径0.2mm の貫通孔を
形成し、全面に活性触媒を付与して活性化を行った後、
常法に従って無電解めっきを行い、貫通孔の内壁に銅を
析出させ、スルーホール7を形成した。 (3) スルーホール7を形成した後、通常のサブトラクテ
ィブ法により表裏に内層導体回路4を有する内層基板1
を作成した(図5(a) 参照)。 (4) 前記(1) で調製した液状充填剤中に、前記(3) で作
成した内層基板1を浸漬して全面に樹脂を付着させてス
ルーホール7の充填を行い、次いで、両面同時真空ラミ
ネーター(日立化成工業製)を用いて接着剤ドライフィ
ルムをラミネートし、内層基板1の両面に充填剤層2と
接着剤フィルム貼着層3からなる複合樹脂絶縁層を形成
した(図5(b) 参照)。ここで、ドライフィルムとして
は、以下に説明する〜により調製した組成の接着剤
を使用し、この時のラミネート条件は、本ローラーはゴ
ム状のものを使用し、本ロール圧力は3kg/cm2、ロール
温度は50℃、搬送速度は2m/min であり、低圧状態(2
〜3torr)で行った。 .クレゾールノボラック型エポキシ樹脂(分子量:約
4000,エポキシ当量:220 ,融点:90〜95℃)の50%ア
クリル化物を65 vol%、ビスフェノールA型エポキシ樹
脂(分子量:約900 ,エポキシ当量:450 ,融点:60〜
75℃)16 vol%、ジペンタエリスリトールヘキサアクリ
レート(分子量:約300 )3 vol%およびネオペンチル
グリコール変成トリメチロールプロパンジアクリレート
(分子量:約300 )3 vol%を、エチレングリコールモ
ノブチルエーテルアセテート(BCA)に溶解して樹脂
液を作成した。 .エポキシ樹脂微粉末(粒子径0.5 μm) 5.5 vol%
に溶剤を加え、超音波振動により分散させて懸濁液とし
た。 .前記で作成した懸濁液に、上記で作成した樹脂
液を5回にわけて加え、樹脂液を加える毎に2mmφの
ジルコニアボールを充填したサンドミルに通して混合し
た。 .前記で作成した樹脂液に、エポキシ樹脂微粉末
(粒子径5.5 μm) 5.1 vol%,テフロン微粒子(ダイ
キン工業製,PTFE:粒子径5μm)5 vol%,ベッゾフ
ェノン5 vol%,ミヒラーケトン1 vol%およびイミダ
ゾール系硬化促進剤6%を加えて、サンドミルで混合し
た。 .前記で作成した樹脂液に、アクリル系レベリング
剤1 vol%を加えた後、ホモディスパー攪拌機にて混合
し、固形分濃度65%の感光性樹脂溶液を得た。 .前記で得た感光性樹脂溶液を、マッド処理を施し
た厚さ15μmポリプロピレンフィルム上に、ドクターブ
レードを用いて塗工した後、熱風循環炉にて80℃, 5分
間の乾燥を施し、厚さが40μmで、残留溶剤率が1.5 wt
%のシート状の接着剤を得た。 (5) 前記(4) により樹脂絶縁層を形成した基板を、バイ
アホール形成用のマスクを介して両面同時露光機(ハイ
テック製)にて、露光量300mj で露光し、次いで、エタ
ーナIR(旭化成)で60秒間現像して、樹脂絶縁層にバイ
アホール8を形成した。そしてさらに、この樹脂絶縁層
を、紫外線照射(UVキュアー)したのち熱処理してバイ
アホール8を有する樹脂絶縁層(厚さ40μm)とした
(図5(c)参照)。 (6) 70℃に調整した無水クロム酸800g/lの水溶液(この
時Cr3+の全Crに占める割合は0.50%であった)に、接着
剤層を形成した基板を20分間浸漬し、表面粗化を行っ
た。得られた表面は、面粗度RZ =12μm、Ra =2.0
μmであった。 (7) 表面粗化を行った後、水洗し、亜硫酸ナトリウム40
0g/lの水溶液に常温で20分間浸漬し、Cr6+の中和処理を
行った。水洗後、70℃で20分間湯洗し、さらに水洗し、
80℃で10分間乾燥させた。 (8) 常法により基板を脱脂し、界面活性剤により親水化
処理を施し、酸処理した後PdのSnコロイド触媒を付与
し、再び酸処理して不必要なSn除去した。この時表面に
吸着しているPdの量は5μg/cm2 であった。 (9) 触媒付与後、120 ℃で40分間熱処理して触媒核を表
面に固定した。 (10) 基板を80℃に予熱し、以下に示す方法で作成した
レジストフィルム(ドライフィルムレジスト)を100 ℃
で熱圧着し、その後、常法により露光、現像、UVキュア
ー、熱処理を行いレジスト層を形成した。なお、現像液
としては、1,1,1-トリクロロエタンを使用した。 .クレゾールノボラック型エポキシ樹脂(分子量約40
00、エポキシ当量220 、融点90〜95℃)の50%アクリル
化物を65 vol%、ビスフェノールA型エポキシ樹脂(分
子量約900 、エポキシ当量450 、融点60〜75℃)16 vol
%、ジペンタエリスリトールヘキサアクリレート(分子
量約300 )3 vol%およびネオペンチルグリコール変成
トリメチロールプロパンジアクリレート(分子量約300
)3 vol%を、BCAに溶解させて樹脂液を作成し
た。 .で作成した樹脂液に、ベンゾフェノン5 vol%、
ミヒラーケトン1 vol%およびイミダゾール系硬化促進
剤6 vol%を加えてサンドミルで混合した。 .で作成した樹脂液に、アクリル系レベリング剤1
vol%を加えた後ホモディスパー攪拌機で混合し、固形
分濃度65wt%の感光性樹脂溶液を得た。 .で得た感光性樹脂溶液をドクターブレードを用い
てマッド処理を施した厚さ15μmのポリプロピレンフィ
ルム上に塗工した後、熱風循環炉にて80℃で5分間の乾
燥を施して、厚さ40μm,残留溶剤率1.5 wt%のシート
状レジストフィルムを得た。 (11) 酸処理にて触媒を活性化した後、常法により表1
に示す組成の無電解銅めっき液に11時間浸漬して、めっ
き膜の厚さ25μmの無電解銅めっきを施し、プリント配
線板を製造した(図5(e) 参照)。このとき、レジスト
とめっき皮膜による導体パターンとの段差は5μmであ
った。(Example 1) (1) 35 parts by weight of a flame-retardant epoxy resin (made by oiled shell) softened and liquefied at 85 ° C., 30 parts by weight of bisphenol A type epoxy resin (made by oiled shell) and a curing agent 35 parts by weight of acid anhydride type curing agent (manufactured by ThreeBond) and 0.5% of imidazole type curing agent (manufactured by Shikoku Kasei) as a curing accelerator
The mixture of parts by weight was kneaded with a three-roll mill to prepare a liquid filler having a solid content of 100%. According to JIS-K7117, the viscosity of this filler was measured with a digital viscometer manufactured by Tokyo Keiki Co., Ltd. at 20 ° C. for 60 seconds.
It was 3.1 Pa · s at 0 Pa · s and 60 rpm, and its SVI value (thixotropic property) was 2.2. (2) After forming a through hole with a diameter of 0.2 mm on the double-sided copper clad laminate with a drill and applying an active catalyst to the entire surface to activate it,
Electroless plating was performed according to a conventional method to deposit copper on the inner wall of the through hole to form a through hole 7. (3) Inner layer substrate 1 having inner layer conductor circuits 4 on the front and back by a normal subtractive method after forming through holes 7.
Was created (see Fig. 5 (a)). (4) Immerse the inner layer substrate 1 prepared in (3) above in the liquid filler prepared in (1) above to deposit resin on the entire surface to fill the through holes 7, and then to apply simultaneous double-sided vacuum. An adhesive dry film was laminated using a laminator (manufactured by Hitachi Chemical Co., Ltd.) to form a composite resin insulating layer composed of the filler layer 2 and the adhesive film sticking layer 3 on both surfaces of the inner layer substrate 1 (Fig. 5 (b )). Here, as the dry film, an adhesive having a composition prepared by the following will be used. The laminating condition at this time is that the roller is rubber-like and the pressure of the roll is 3 kg / cm 2 , The roll temperature is 50 ℃, the transfer speed is 2m / min, and the low pressure condition (2
~ 3 torr). . Cresol novolac type epoxy resin (molecular weight: approx.
65 vol% 50% acrylate of 4000, epoxy equivalent: 220, melting point: 90-95 ℃, bisphenol A type epoxy resin (molecular weight: about 900, epoxy equivalent: 450, melting point: 60-
75 ° C) 16 vol%, dipentaerythritol hexaacrylate (molecular weight: about 300) 3 vol% and neopentyl glycol modified trimethylolpropane diacrylate (molecular weight: about 300) 3 vol%, ethylene glycol monobutyl ether acetate (BCA) To prepare a resin solution. . Epoxy resin fine powder (particle size 0.5 μm) 5.5 vol%
The solvent was added to and dispersed by ultrasonic vibration to obtain a suspension. . The resin solution prepared above was added to the suspension prepared above in 5 batches, and each time the resin solution was added, it was passed through a sand mill filled with zirconia balls of 2 mmφ and mixed. . In the resin liquid prepared above, 5.1 vol% of epoxy resin fine powder (particle size 5.5 μm), Teflon fine particles (manufactured by Daikin Industries, Ltd., PTFE: particle size 5 μm) 5 vol%, Veszophenone 5 vol%, Michler's ketone 1 vol% and imidazole 6% of a system hardening accelerator was added and mixed by a sand mill. . After adding 1 vol% of an acrylic leveling agent to the resin liquid prepared above, they were mixed with a homodisper stirrer to obtain a photosensitive resin solution having a solid content concentration of 65%. . The photosensitive resin solution obtained above was applied onto a mud-treated 15 μm thick polypropylene film using a doctor blade, and then dried in a hot air circulation oven at 80 ° C. for 5 minutes to obtain a thickness of Is 40 μm and residual solvent ratio is 1.5 wt
% Sheet-like adhesive was obtained. (5) The substrate on which the resin insulation layer was formed in (4) above was exposed with a double-sided simultaneous exposure machine (manufactured by Hitec) through a mask for forming via holes at an exposure amount of 300 mj, and then Etana IR (Asahi Kasei ) For 60 seconds to form a via hole 8 in the resin insulating layer. Further, this resin insulation layer was irradiated with ultraviolet rays (UV cured) and then heat treated to form a resin insulation layer having a via hole 8 (thickness 40 μm) (see FIG. 5C). (6) Immerse the substrate on which the adhesive layer was formed in an aqueous solution of chromic anhydride 800 g / l adjusted to 70 ° C (the ratio of Cr 3+ to the total Cr was 0.50% at this time) for 20 minutes, Surface roughening was performed. The obtained surface has a surface roughness R Z = 12 μm and R a = 2.0.
was μm. (7) After roughening the surface, wash with water and wash with sodium sulfite 40
It was immersed in a 0 g / l aqueous solution at room temperature for 20 minutes to neutralize Cr 6+ . After washing with water, wash with hot water at 70 ° C for 20 minutes, then with water,
It was dried at 80 ° C for 10 minutes. (8) The substrate was degreased by a conventional method, subjected to hydrophilic treatment with a surfactant, acid-treated and then provided with a Pd Sn colloid catalyst, and then acid-treated again to remove unnecessary Sn. At this time, the amount of Pd adsorbed on the surface was 5 μg / cm 2 . (9) After applying the catalyst, heat treatment was performed at 120 ° C. for 40 minutes to fix the catalyst nuclei on the surface. (10) Preheat the substrate to 80 ℃ and apply the resist film (dry film resist) prepared by the following method to 100 ℃
After that, thermocompression bonding was performed, and thereafter, exposure, development, UV curing, and heat treatment were performed by a conventional method to form a resist layer. As the developing solution, 1,1,1-trichloroethane was used. . Cresol novolac type epoxy resin (molecular weight about 40
65 vol% of 50% acrylate with 00, epoxy equivalent 220, melting point 90-95 ° C, bisphenol A type epoxy resin (molecular weight about 900, epoxy equivalent 450, melting point 60-75 ° C) 16 vol
%, Dipentaerythritol hexaacrylate (molecular weight about 300) 3 vol% and neopentyl glycol modified trimethylolpropane diacrylate (molecular weight about 300)
) 3 vol% was dissolved in BCA to prepare a resin liquid. . 5% by volume of benzophenone,
1 vol% of Michler's ketone and 6 vol% of imidazole curing accelerator were added and mixed in a sand mill. . Acrylic leveling agent 1 to the resin liquid created in
After adding vol%, the mixture was mixed with a homodisper stirrer to obtain a photosensitive resin solution having a solid content concentration of 65 wt%. . After coating the photosensitive resin solution obtained in above with a mud-treated polypropylene film with a thickness of 15 μm using a doctor blade, it is dried in a hot air circulation oven at 80 ° C. for 5 minutes to give a thickness of 40 μm. A sheet resist film with a residual solvent ratio of 1.5 wt% was obtained. (11) After activating the catalyst by acid treatment, it is shown in Table 1 by a conventional method.
A printed wiring board was manufactured by immersing in an electroless copper plating solution having the composition shown in 11 hours for electroless copper plating with a plating film thickness of 25 μm (see FIG. 5 (e)). At this time, the step difference between the resist and the conductor pattern formed by the plating film was 5 μm.
【0021】[0021]
【表1】 [Table 1]
【0022】(実施例2)液状充填剤をロールコーター
(大日本スクリーン製)で塗布し、減圧下でラミネート
すること以外は実施例1と同様にして4層からなる多層
プリント配線板を製作した。この時の塗布条件は、コー
ティングロールとして中高粘度用レジスト用コーティン
グロール(大日本スクリーン製)を用い、コーティング
ロールとドクターバーとのギャップを0.4mm 、コーティ
ングロールとバックアップロールとのギャップを1.4mm
および搬送速度を200mm/s とした。Example 2 A multilayer printed wiring board consisting of 4 layers was manufactured in the same manner as in Example 1 except that the liquid filler was applied by a roll coater (manufactured by Dainippon Screen) and laminated under reduced pressure. . The coating conditions used at this time were a coating roll for medium and high viscosity resist (manufactured by Dainippon Screen), a gap between the coating roll and the doctor bar of 0.4 mm, and a gap between the coating roll and the backup roll of 1.4 mm.
And the transport speed was 200 mm / s.
【0023】(実施例3)ケミカルスポイトを用いて基
板の先端部に液状充填剤を付着させ、減圧下でラミネー
トすること以外は実施例1と同様にして4層からなる多
層プリント配線板を製作した。Example 3 A multilayer printed wiring board consisting of four layers was manufactured in the same manner as in Example 1 except that a liquid filler was attached to the tip of the substrate using a chemical dropper and laminated under reduced pressure. did.
【0024】(実施例4)液状充填剤を真空ラミネータ
ーの圧延ロールのロールキス部に供給し、このロールキ
ス部に基板を送給することにより、基板への液状充填剤
の供給と減圧下でのラミネートを同時に行うこと以外は
実施例1と同様にして4層からなる多層プリント配線板
を製作した。Example 4 The liquid filler is supplied to the roll kiss portion of the rolling roll of the vacuum laminator, and the substrate is fed to this roll kiss portion, whereby the liquid filler is supplied to the substrate and lamination under reduced pressure is performed. A multilayer printed wiring board consisting of four layers was manufactured in the same manner as in Example 1 except that the above steps were performed simultaneously.
【0025】(比較例1)内層基板を、液状充填剤の入
った槽の中に浸してから取り出し、その後、内層基板上
にある余分な充填剤をスキージーにより除去し、内層ス
ルーホール等に液状充填剤を充填すること以外は、実施
例1と同様にして多層プリント配線板を製作した。(Comparative Example 1) The inner layer substrate was dipped in a tank containing a liquid filler and then taken out. Then, the excess filler on the inner layer substrate was removed by a squeegee, and the inner layer through hole was filled with the liquid. A multilayer printed wiring board was produced in the same manner as in Example 1 except that the filler was filled.
【0026】このようにして製作した多層プリント配線
板に関し、スルーホール,バイアホールまたは導体回路
間段差によって生じる隙間内への異物の混入や気泡の巻
き込みの有無,樹脂絶縁層の平滑性や接続信頼性につい
て評価した。その結果を表2に示す。この表2に示す結
果から明らかなように、本発明にかかる多層プリント配
線板は、いずれの項目についても、従来技術に比べて優
れることが判った。With respect to the multilayer printed wiring board manufactured in this manner, whether foreign matter is mixed in or air bubbles are trapped in the gaps caused by through holes, via holes, or steps between conductor circuits, the smoothness of the resin insulation layer, and the connection reliability are ensured. The sex was evaluated. The results are shown in Table 2. As is clear from the results shown in Table 2, the multilayer printed wiring board according to the present invention was found to be superior to the prior art in any of the items.
【0027】[0027]
【表2】 [Table 2]
【0028】なお、上記異物の混入や気泡の巻き込みの
有無,樹脂絶縁層の平滑性や接続信頼性の評価方法を説
明する。 (1) 異物の混入の有無 基板の中心部の30mm□内にある10μm以上の異物の数を
測定して評価した。(サンプル数N=5) (2) 気泡の巻き込みの有無 φ0.2mm のスルーホール(N=30)を樹脂埋めした後、
このスルーホール部を切断し、スルーホール内の断面に
ある10μm以上の有無を調べた。 (3) 樹脂絶縁層の平滑性 樹脂絶縁層を形成したのち切断し、その断面を顕微鏡で
観察することにより、樹脂絶縁層表面の凹凸状態を評価
した(サンプル数N=5)。 (4) 樹脂絶縁層の接続信頼性 樹脂絶縁層を形成したのち切断し、その断面を顕微鏡で
観察することにより、穴埋め充填剤と樹脂絶縁層との層
間密着性を、剥がれ,浮き,気泡の有無により評価した
(サンプル数N=5)。A method for evaluating the presence or absence of the inclusion of foreign matter or the inclusion of bubbles, the smoothness of the resin insulation layer, and the connection reliability will be described. (1) Presence of foreign matter The number of foreign matter having a size of 10 μm or more within 30 mm □ in the central part of the substrate was measured and evaluated. (Number of samples N = 5) (2) Presence / absence of air bubbles After filling the φ0.2 mm through hole (N = 30) with resin,
The through-hole portion was cut, and the presence or absence of 10 μm or more in the cross-section inside the through-hole was examined. (3) Smoothness of Resin Insulation Layer After forming the resin insulation layer, the resin insulation layer was cut and the cross section thereof was observed with a microscope to evaluate the unevenness of the surface of the resin insulation layer (sample number N = 5). (4) Connection reliability of the resin insulation layer After forming the resin insulation layer and cutting it, and observing the cross section with a microscope, the interlayer adhesion between the filling filler and the resin insulation layer can be separated, lifted, and Evaluation was made based on the presence or absence (number of samples N = 5).
【0029】[0029]
【発明の効果】以上説明したように本発明によれば、内
層回路に設けられたスルーホール,バイアホールまたは
導体回路間段差によって生じる隙間内への異物の混入,
気泡の巻き込みを排除して、液状充填剤を緻密に充填す
ることが可能となり、平滑性に優れ、かつ接続信頼性の
高い多層プリント配線板を有利に製造することができ
る。As described above, according to the present invention, foreign matter is mixed into a gap formed by a through hole, a via hole provided in an inner layer circuit or a step between conductor circuits,
The inclusion of air bubbles can be eliminated and the liquid filler can be densely filled, and a multilayer printed wiring board having excellent smoothness and high connection reliability can be advantageously manufactured.
【図1】本発明にかかる樹脂絶縁層の形成技術の一実施
例を示す図である。FIG. 1 is a diagram showing an example of a technique for forming a resin insulating layer according to the present invention.
【図2】本発明にかかる樹脂絶縁層の形成技術の他の実
施例を示す図である。FIG. 2 is a diagram showing another embodiment of a technique for forming a resin insulating layer according to the present invention.
【図3】本発明にかかる樹脂絶縁層の形成技術の他の実
施例を示す図である。FIG. 3 is a diagram showing another embodiment of the resin insulating layer forming technique according to the present invention.
【図4】本発明にかかる樹脂絶縁層の形成技術の他の実
施例を示す図である。FIG. 4 is a diagram showing another embodiment of the technique for forming a resin insulating layer according to the present invention.
【図5】本発明の一実施例を示す製造工程図である。FIG. 5 is a manufacturing process diagram showing an embodiment of the present invention.
1 内層基板 2 充填剤層 3 接着剤層 4 内層導体回路 5 レジスト 6 導体回路 7 スルーホール 8 バイアホール 1 Inner Layer Substrate 2 Filler Layer 3 Adhesive Layer 4 Inner Layer Conductor Circuit 5 Resist 6 Conductor Circuit 7 Through Hole 8 Via Hole
Claims (8)
複数の導体回路を設けてなる多層プリント配線板の製造
方法において、 スルーホールまたはバイアホールを有する内層回路板上
に、無溶剤感光性樹脂組成物からなる液状充填剤を供給
して付着させ、その上層にフィルム状の接着剤を重ね合
わせた後、減圧下で押圧してラミネートすることによ
り、充填剤層と接着剤層との複合層からなる樹脂絶縁層
を形成することを特徴とする多層プリント配線板の製造
方法。1. A method for manufacturing a multilayer printed wiring board comprising a plurality of conductor circuits electrically insulated by a resin insulation layer, wherein a solventless photosensitive resin is provided on an inner layer circuit board having through holes or via holes. A composite layer of a filler layer and an adhesive layer is obtained by supplying and adhering a liquid filler composed of the composition, superposing a film-like adhesive on the upper layer, and pressing and laminating under pressure reduction. A method for manufacturing a multilayer printed wiring board, which comprises forming a resin insulating layer made of
樹脂と熱硬化性樹脂の混合物を用いることを特徴とする
請求項1に記載の製造方法。2. The method according to claim 1, wherein the solventless photosensitive resin composition uses a mixture of a photosensitive resin and a thermosetting resin.
填材を含むことを特徴とする請求項1または2に記載の
製造方法。3. The method according to claim 1, wherein the solventless photosensitive resin composition contains an inorganic filler.
て可溶性の硬化処理済の耐熱性樹脂微粉末を、硬化処理
が施された場合には酸あるいは酸化剤に対して難溶性と
なる特性を示す未硬化の耐熱性樹脂マトリックス中に分
散させてなる接着剤を用いる請求項1に記載の製造方
法。4. The above-mentioned adhesive becomes insoluble in an acid or an oxidant when a cured heat-resistant resin fine powder which is soluble in an acid or an oxidant is hardened. The manufacturing method according to claim 1, wherein an adhesive is used which is dispersed in an uncured heat-resistant resin matrix exhibiting characteristics.
て電気的に絶縁してなる多層プリント配線板において、
この樹脂絶縁層を、 内層回路板に設けられたスルーホール,バイアホールま
たは導体回路間段差によって生じる隙間内に、それぞれ
充填された感光性樹脂組成物からなる充填剤層と、 その上層を被覆する接着剤層、との複合層で構成したこ
とを特徴とする多層プリント配線板。5. A multilayer printed wiring board comprising a plurality of conductor circuits electrically insulated by a resin insulation layer,
This resin insulation layer is filled with a filler layer made of a photosensitive resin composition, which is filled in a gap formed by a through hole, a via hole, or a step between conductor circuits provided in an inner layer circuit board, and an upper layer thereof. A multi-layer printed wiring board comprising a composite layer including an adhesive layer.
熱硬化性樹脂の混合物であることを特徴とする請求項5
に記載の多層プリント配線板。6. The photosensitive resin composition according to claim 5, wherein the photosensitive resin composition is a mixture of a photosensitive resin and a thermosetting resin.
The multilayer printed wiring board according to.
含むことを特徴とする請求項5または6に記載の多層プ
リント配線板。7. The multilayer printed wiring board according to claim 5, wherein the photosensitive resin composition contains an inorganic filler.
して可溶性の硬化処理済の耐熱性樹脂微粉末を、硬化処
理が施された場合には酸あるいは酸化剤に対して難溶性
となる特性を示す未硬化の耐熱性樹脂マトリックス中に
分散させてなる接着剤で構成した請求項5に記載の多層
プリント配線板。8. The adhesive layer is made of a cured heat-resistant resin fine powder that is soluble in an acid or an oxidizing agent and is hardly soluble in an acid or an oxidizing agent when subjected to a curing treatment. The multilayer printed wiring board according to claim 5, comprising an adhesive dispersed in an uncured heat-resistant resin matrix exhibiting the following characteristics.
Priority Applications (1)
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JP33467993A JP3311450B2 (en) | 1993-12-28 | 1993-12-28 | Method of manufacturing multilayer printed wiring board and multilayer printed wiring board |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP33467993A JP3311450B2 (en) | 1993-12-28 | 1993-12-28 | Method of manufacturing multilayer printed wiring board and multilayer printed wiring board |
Publications (2)
Publication Number | Publication Date |
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JPH07202433A true JPH07202433A (en) | 1995-08-04 |
JP3311450B2 JP3311450B2 (en) | 2002-08-05 |
Family
ID=18280032
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JP33467993A Expired - Fee Related JP3311450B2 (en) | 1993-12-28 | 1993-12-28 | Method of manufacturing multilayer printed wiring board and multilayer printed wiring board |
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JP (1) | JP3311450B2 (en) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1997017824A1 (en) | 1995-11-10 | 1997-05-15 | Ibiden Co., Ltd. | Multilayered printed wiring board and its manufacture |
EP0817548A4 (en) * | 1996-01-11 | 1999-12-01 | Ibiden Co Ltd | Printed wiring board and method for manufacturing the same |
WO2001097582A1 (en) * | 2000-06-15 | 2001-12-20 | Ajinomoto Co., Inc. | Adhesive film and method for manufacturing multilayer printed wiring board comprising the same |
JP2002217547A (en) * | 2001-01-16 | 2002-08-02 | Ibiden Co Ltd | Method for manufacturing resin film and multilayer printed wiring board |
KR100349123B1 (en) * | 1999-12-17 | 2002-08-17 | 삼성전기주식회사 | Build-up substrate |
JP2012039143A (en) * | 2011-09-22 | 2012-02-23 | Sanei Kagaku Kk | Planarized resin-coated printed circuit board |
KR101218308B1 (en) * | 2008-03-14 | 2013-01-03 | 삼성테크윈 주식회사 | Method of manufacturing printed circuit board |
WO2013191117A1 (en) * | 2012-06-18 | 2013-12-27 | 株式会社村田製作所 | Method for manufacturing layered substrate, and layered substrate structure |
-
1993
- 1993-12-28 JP JP33467993A patent/JP3311450B2/en not_active Expired - Fee Related
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0804061A4 (en) * | 1995-11-10 | 2000-01-05 | Ibiden Co Ltd | Multilayered printed wiring board and its manufacture |
WO1997017824A1 (en) | 1995-11-10 | 1997-05-15 | Ibiden Co., Ltd. | Multilayered printed wiring board and its manufacture |
EP1677582A3 (en) * | 1996-01-11 | 2007-04-11 | Ibiden Co., Ltd. | Printed wiring board and manufacturing method thereof |
US6316738B1 (en) | 1996-01-11 | 2001-11-13 | Ibiden Co., Ltd. | Printed wiring board and manufacturing method thereof |
US6342682B1 (en) | 1996-01-11 | 2002-01-29 | Ibiden Co., Ltd. | Printed wiring board and manufacturing method thereof |
KR100485628B1 (en) * | 1996-01-11 | 2005-09-14 | 이비덴 가부시키가이샤 | Printed wiring board and its manufacturing method |
EP0817548A4 (en) * | 1996-01-11 | 1999-12-01 | Ibiden Co Ltd | Printed wiring board and method for manufacturing the same |
KR100349123B1 (en) * | 1999-12-17 | 2002-08-17 | 삼성전기주식회사 | Build-up substrate |
WO2001097582A1 (en) * | 2000-06-15 | 2001-12-20 | Ajinomoto Co., Inc. | Adhesive film and method for manufacturing multilayer printed wiring board comprising the same |
JP2002217547A (en) * | 2001-01-16 | 2002-08-02 | Ibiden Co Ltd | Method for manufacturing resin film and multilayer printed wiring board |
KR101218308B1 (en) * | 2008-03-14 | 2013-01-03 | 삼성테크윈 주식회사 | Method of manufacturing printed circuit board |
JP2012039143A (en) * | 2011-09-22 | 2012-02-23 | Sanei Kagaku Kk | Planarized resin-coated printed circuit board |
WO2013191117A1 (en) * | 2012-06-18 | 2013-12-27 | 株式会社村田製作所 | Method for manufacturing layered substrate, and layered substrate structure |
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