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JPH07182711A - Production of magneto-optical recording medium - Google Patents

Production of magneto-optical recording medium

Info

Publication number
JPH07182711A
JPH07182711A JP311494A JP311494A JPH07182711A JP H07182711 A JPH07182711 A JP H07182711A JP 311494 A JP311494 A JP 311494A JP 311494 A JP311494 A JP 311494A JP H07182711 A JPH07182711 A JP H07182711A
Authority
JP
Japan
Prior art keywords
substrate
magnetic layer
magneto
layer
oxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP311494A
Other languages
Japanese (ja)
Inventor
Toshihiko Yoshitomi
敏彦 吉富
Yoshimitsu Kobayashi
喜光 小林
Yoshiyuki Shirosaka
欣幸 城阪
Yukio Watabe
行男 渡部
Masao Komatsu
昌生 小松
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Mitsubishi Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Chemical Corp filed Critical Mitsubishi Chemical Corp
Priority to JP311494A priority Critical patent/JPH07182711A/en
Publication of JPH07182711A publication Critical patent/JPH07182711A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To obtain a protective film which completely shuts off a magnetic layer and an external world, has good affinity to the magnetic layer and a synthetic resin substrate and is effective by providing the surface of a substrate with a protective layer contg. a Ta oxide, then providing the surface thereof with the magnetic layer. CONSTITUTION:An amorphous magnetic alloy of rare earths and transition metals, such as DyFeCo, and a polycrystalline perpendicularly magnetized film, such as MnBi, are used on the substrate consisting of glass or acrylic resin. a Ta oxide is formed as the protective film between the substrate and the magneto-optical active layer. The multi component oxide protective layer has excellent transparency and refractive index and is, therefore, disposed on a light incident side. There is a need for disposing the protective layer between the substrate and the magnetic layer as well in the case of the synthetic resin substrate. The protective film is formed by sputtering a Ta metal target in O2 and inert gas. The gaseous pressure is set as low as about 4m Torr. Next, the surface is bombarded by high-energy particles (K.E of 1 to 100eV) to reform the boundary state between the Ta oxide and the magnetic layer, etc. The magneto-optical recording medium having excellent corrosion resistance, recording sensitivity quality and productivity is obtd. by this constitution.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、光磁気記録等に好適な
光磁気媒体を製造する方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a magneto-optical medium suitable for magneto-optical recording.

【0002】[0002]

【従来の技術】光メモリー素子の中でも追加記録、消去
が可能な、イレーザブル(Erasable)型メモリ
ーは、光磁気記録方式が最も実用化に近い段階にいる。
光磁気記録媒体としては総合的な特性から見て、希土
類、遷移金属薄膜が最も優れているが、致命的欠陥とし
て耐食性に欠けるという欠点が挙げられる。
2. Description of the Related Art Among the optical memory devices, an erasable type memory capable of additional recording and erasing is in a stage where the magneto-optical recording system is the most practical.
As a magneto-optical recording medium, rare earth and transition metal thin films are the most excellent from the viewpoint of comprehensive characteristics, but there is a drawback that they are lacking in corrosion resistance as a fatal defect.

【0003】すなわち、腐食に伴ない高密度記録の必要
条件である保磁力の低下や高S/N比の必要条件である
カー回転角の減少、誤り率の増加など多くの欠陥を露呈
する事となる。
That is, many defects such as a decrease in coercive force which is a necessary condition for high density recording due to corrosion, a decrease in Kerr rotation angle which is a necessary condition for a high S / N ratio, and an increase in error rate are exposed. Becomes

【0004】従来、その対策としては2つの方法がとら
れてきた。即ち、 (i)磁性層に添加物を添加して耐食性を向上する。 (ii)保護膜を形成し耐食性を向上する。 本発明は上記2方法のうち保護膜を用いる方法に注目し
なされたものである。
Conventionally, two methods have been taken as countermeasures. That is, (i) an additive is added to the magnetic layer to improve the corrosion resistance. (Ii) A protective film is formed to improve corrosion resistance. The present invention focuses on the method of using the protective film among the above two methods.

【0005】[0005]

【発明が解決しようとする課題】基板側の保護膜に関し
ては信号品質を高めるために光の高透過率(吸収係数が
低い)、高屈折率のものが望まれ、さらに記録感度向上
のために低熱伝導性のものが好ましい材料となる。保護
膜としては、SiO2 などが知られているがこれは屈折
率が極めて低く(1.4〜1.5)て、上記の条件に適
合しない。
The protective film on the substrate side is desired to have a high light transmittance (low absorption coefficient) and a high refractive index in order to improve the signal quality, and to further improve the recording sensitivity. A material having low thermal conductivity is a preferable material. As a protective film, SiO 2 or the like is known, but it has a very low refractive index (1.4 to 1.5) and does not meet the above conditions.

【0006】次にSiOなどの酸素の欠乏したSi酸化
物が考えられているが、これはあるSiとOの比より酸
素が多すぎれば磁性層とSiO層が反応し磁気光学特性
を劣化させ、少なすぎれば樹脂基板との密着性が下がる
という欠陥がある。さらに、上記酸化物系以外の保護膜
として、AlN、Si3 4 をはじめとする窒化物膜は
酸素を含有しない材質であり、従って磁性層を酸化させ
ることが少ないので、良好な保護特性をもつことが明ら
かにされてきた。しかしながら、窒化物は熱伝導性が極
めて高く、記録媒体へのレーザー照射時に熱の逃げの大
きいこと樹脂基板との接着性が悪く、そのために高温高
湿下での剥離が問題であった。
Next, an oxygen-deficient Si oxide such as SiO is considered. This is because if the oxygen content is too large compared to a certain Si: O ratio, the magnetic layer reacts with the SiO layer to deteriorate the magneto-optical characteristics. However, if it is too small, there is a defect that the adhesiveness with the resin substrate decreases. Further, as a protective film other than the above-mentioned oxide-based one, a nitride film such as AlN and Si 3 N 4 is a material that does not contain oxygen, and therefore, the magnetic layer is less likely to be oxidized, so that a good protective property is obtained. It has been revealed that it has. However, the nitride has a very high thermal conductivity, and the heat release during the laser irradiation to the recording medium is large, so that the adhesion to the resin substrate is poor, and therefore the peeling under high temperature and high humidity is a problem.

【0007】更に、光磁気媒体は、合成樹脂やガラス等
を基板として用い、これに磁性層を設けた構造とされて
いるが、特に基板をポリカーボネート樹脂やアクリル樹
脂等の合成樹脂とした場合、基板に含有されていたり、
透過してくる微量の空気や水分等による磁性層の劣化が
問題となるので、保護層は磁性層や基板と親和性があ
り、水分や空気を透過せず、自身も水分や空気等により
劣化することがないものであることが要求される。
Further, the magneto-optical medium has a structure in which a synthetic resin, glass or the like is used as a substrate and a magnetic layer is provided on the substrate. Especially when the substrate is made of a synthetic resin such as polycarbonate resin or acrylic resin, Contained in the substrate,
Deterioration of the magnetic layer due to a small amount of permeating air and moisture becomes a problem, so the protective layer has affinity with the magnetic layer and substrate, does not permeate moisture and air, and itself deteriorates due to moisture and air. It is required to be something that cannot be done.

【0008】本発明は上述のような諸問題、すなわち、
磁性層と外界とを完全に遮断し、しかも磁性層との界面
反応性が少なくて、磁性層及びポリカーボネート等の合
成樹脂基板との親和性に優れ、自身が水分や空気によっ
て劣化することがなく、熱伝導率が低く、屈折率の大き
い、しかも成膜が効率的に行なえる保護膜を提供するべ
くなされたものである。
The present invention has the following problems.
Completely shields the magnetic layer from the outside world, has low interfacial reactivity with the magnetic layer, has excellent affinity with the magnetic layer and synthetic resin substrates such as polycarbonate, and does not deteriorate itself by moisture or air. It is intended to provide a protective film having a low thermal conductivity and a large refractive index, and capable of efficiently forming a film.

【0009】[0009]

【課題を解決するための手段】本発明者らはTa酸化物
の化学的安定性、低熱伝導性、高屈折率に着目して検討
した結果、特定の方法で形成した保護膜は、磁性層との
反応が少なく安定な保護膜となることを見出し、本発明
に到達した。
DISCLOSURE OF THE INVENTION As a result of studying the chemical stability, low thermal conductivity and high refractive index of Ta oxide, the present inventors have found that a protective film formed by a specific method is a magnetic layer. The present invention has been accomplished by finding that a stable protective film with less reaction with is obtained.

【0010】すなわち、本発明の要旨は、基板上に光磁
気活性層(磁性層)を設けてなる光磁気媒体の製造方法
において、基板上にタンタルの酸化物を含有する保護層
を、タンタル金属ターゲットを酸素と不活性ガス中でス
パッターする反応性スパッターにより形成し、次いで磁
性層を設けることを特徴とする光磁気記録媒体の製造方
法にある。
That is, the gist of the present invention is to provide a method of manufacturing a magneto-optical medium comprising a magneto-optical active layer (magnetic layer) provided on a substrate, wherein a protective layer containing a tantalum oxide is provided on the substrate. A method for producing a magneto-optical recording medium is characterized in that a target is formed by reactive sputtering in which oxygen and an inert gas are sputtered, and then a magnetic layer is provided.

【0011】以下、本発明を詳細に説明する。まず、本
発明において用いられる基板としては、ガラス、アクリ
ル樹脂、ポリカーボネート樹脂等のプラスチック、又は
アルミニウム等の金属が挙げられる。基板の厚みは1〜
2mm程度が一般的である。
The present invention will be described in detail below. First, examples of the substrate used in the present invention include glass, plastic such as acrylic resin and polycarbonate resin, and metal such as aluminum. The thickness of the substrate is 1
It is generally about 2 mm.

【0012】この基板上に設けられる光磁気記録層とし
ては、たとえば、DyFeCo、TbFeCo、TbC
oなどの希土類と遷移金属の非晶質磁性合金、及びMn
Bi、MnCuBiなどの多結晶垂直磁化膜が用いられ
る。特に希土系の合金磁性膜に用いて大変効果的であ
る。
The magneto-optical recording layer provided on this substrate is, for example, DyFeCo, TbFeCo, TbC.
Amorphous magnetic alloys of rare earths such as o and transition metals, and Mn
A polycrystalline perpendicular magnetization film such as Bi or MnCuBi is used. It is particularly effective when used for a rare earth alloy magnetic film.

【0013】本発明においては、上記基板と光磁気活性
層の間にタンタルの酸化物を保護膜として形成させる。
本発明に係る光磁気媒体を光磁気記録媒体として用いる
場合、上記の複合酸化物保護層は透明性と屈折率に優れ
るため記録、再生光入射側に配置して用いるのが望まし
い。多くの場合記録再生光は基板側から入射させるの
で、本発明の保護膜は多くの場合基板上に堆積される。
In the present invention, tantalum oxide is formed as a protective film between the substrate and the magneto-optical active layer.
When the magneto-optical medium according to the present invention is used as a magneto-optical recording medium, it is desirable to arrange the compound oxide protective layer on the recording / reproducing light incident side for use because it has excellent transparency and refractive index. In many cases, the recording / reproducing light is incident from the substrate side, so that the protective film of the present invention is often deposited on the substrate.

【0014】ポリカーボネート等の合成樹脂を基板とし
た場合には、基板側からの水分や空気の浸入が考えられ
るので、基板と磁性層との間に本発明の保護層を設ける
必要がある。基板と磁性層間には本Ta酸化物層のみ、
または本層と接着性改良のための層をTa酸化物層と基
板の間に挿入する。但しこの接着層は300Å以下が好
ましい。
When a synthetic resin such as polycarbonate is used as the substrate, moisture or air may enter from the substrate side, so that the protective layer of the present invention must be provided between the substrate and the magnetic layer. Only the Ta oxide layer is provided between the substrate and the magnetic layer,
Alternatively, this layer and a layer for improving adhesion are inserted between the Ta oxide layer and the substrate. However, this adhesive layer is preferably 300 Å or less.

【0015】本発明の保護層を磁性層の1面に採用し、
他面側を他の保護層とすることも考えられ、その場合B
N、Si3 4 、TiN、ZrN、NbN、TaNなど
のチッ化物、または、TiC、NbC、TaC、Mo2
Cなどの炭化物、TaSi2、CrSi2 、CoS
2 、VSi2 、TiSi2 、Ta4.5 Siなどのケイ
化物及びSiO2 、SiO等が保護層として用いること
もできる。勿論本発明の保護層を他面に用いてもよい。
The protective layer of the present invention is used on one surface of the magnetic layer,
It is also possible to use another protective layer on the other side, in which case B
Nitride such as N, Si 3 N 4 , TiN, ZrN, NbN, TaN, or TiC, NbC, TaC, Mo 2
Carbides such as C, TaSi 2 , CrSi 2 , CoS
A silicide such as i 2 , VSi 2 , TiSi 2 , Ta 4.5 Si, or SiO 2 or SiO may be used as the protective layer. Of course, the protective layer of the present invention may be used on the other surface.

【0016】本保護膜の製法としてはTa金属ターゲッ
トを酸素と不活性ガス中でスパッターする反応性スパッ
ターにより行なわれる。この方法は高速製膜に適する。
本発明のタンタル酸化物は緻密に作製しないとタンタル
酸化物中の酸素が磁性層と反応し、特性を劣化させるた
め緻密な膜を作る必要がある。またこれは高屈折率な膜
を得るためにも効果がある。
The protective film is produced by reactive sputtering in which a Ta metal target is sputtered in oxygen and an inert gas. This method is suitable for high speed film formation.
Unless the tantalum oxide of the present invention is densely formed, oxygen in the tantalum oxide reacts with the magnetic layer and deteriorates the characteristics, so that it is necessary to form a dense film. This is also effective for obtaining a film having a high refractive index.

【0017】この目的のためにはスパッタリング法が適
する。スパッタリング法で本タンタル酸化物膜を作製す
る際、膜が透明で且つ膜応力が極端に高くならない範囲
でできるだけスパッターガス圧を低くした方がよい。好
ましいガス圧としては4mtorr程度以下がよい。
The sputtering method is suitable for this purpose. When the present tantalum oxide film is formed by the sputtering method, it is preferable that the sputtering gas pressure be as low as possible within the range in which the film is transparent and the film stress does not become extremely high. A preferable gas pressure is about 4 mtorr or less.

【0018】次にタンタル酸化物の磁性層等との界面状
態を改質する目的で高エネルギー粒子(1〜100eV
の運動エネルギー)で表面を衝撃する。この方法は高エ
ネルギー粒子が得られればどのような方法でもよいが、
通常のスパッタリング装置ではプラズマエッチング処理
機構が備っており、これにより基板側にプラズマをたて
Arガスで作製した薄膜を衝撃するという手段をとる。
エッチング時間としては、0.1〜1W/cm2 で1分
から20分程度が代表的な値である。
Next, high energy particles (1 to 100 eV) are used for the purpose of modifying the state of the interface between the tantalum oxide and the magnetic layer.
The kinetic energy of) impacts the surface. This method may be any method as long as high-energy particles are obtained,
A normal sputtering apparatus is equipped with a plasma etching processing mechanism, and by this means, plasma is applied to the substrate side to bombard a thin film made of Ar gas.
The typical etching time is 0.1 to 1 W / cm 2 and about 1 to 20 minutes.

【0019】[0019]

【実施例】【Example】

実施例1、比較例1 5″φのTa金属ターゲットを真空槽内カソードに取り
つけポリカーボネート基板を装着し、9.0×10-1
orrまで排気後Arガスと適量の酸素ガスを30SC
CM流入させ、真空槽を1.0mtorrとした。予備
スパッター後高周波電力(13.56MHz)500W
を印加しスパッターした。極間距離は16cm、基板回
転数は90rpmとした。基板上にTa2 5 膜が10
00Å形成された。次にAr流量18SCCM、Arガ
ス圧3.0mtorrで基板側に50Wの高周波電力を
投入しTa2 5 膜の表面を5分間エッチング処理し
た。
Example 1, Comparative Example 1 A Ta metal target of 5 ″ φ was attached to a cathode in a vacuum chamber, a polycarbonate substrate was attached, and 9.0 × 10 −1 t
After exhausting to orr, Ar gas and appropriate amount of oxygen gas are 30SC
CM was introduced and the vacuum chamber was set to 1.0 mtorr. High frequency power (13.56MHz) 500W after pre-sputtering
Was applied to sputter. The distance between the electrodes was 16 cm, and the substrate rotation speed was 90 rpm. 10 Ta 2 O 5 film on the substrate
00Å formed. Next, a high-frequency power of 50 W was applied to the substrate side at an Ar flow rate of 18 SCCM and an Ar gas pressure of 3.0 mtorr to etch the surface of the Ta 2 O 5 film for 5 minutes.

【0020】次にTbFeCo層を800Å形成し上述
と同一条件でTa2 5 からなる保護層を1000Å形
成した。比較例として同様の条件でアルミニウム酸化物
保護層を形成した光磁気媒体を作製した。得られた媒体
はキヤリア対ノイズ比(C/N)、記録感度に優れたも
のが得られた。結果を表1に示した。
Next, a TbFeCo layer was formed to a thickness of 800 Å, and a protective layer made of Ta 2 O 5 was formed to a thickness of 1000 Å under the same conditions as described above. As a comparative example, a magneto-optical medium having an aluminum oxide protective layer formed under the same conditions was produced. The obtained medium was excellent in carrier-to-noise ratio (C / N) and recording sensitivity. The results are shown in Table 1.

【0021】[0021]

【表1】 測定法:差動法検出[Table 1] Measurement method: Differential detection

【0022】[0022]

【表2】記録条件 r=45mm、600rpm ヒット長 5.0μm 2次歪最小になるレーザーパワーを記録感度とした。 再生条件 r=45mm、1800rpm レーザーパワー 2.4mW[Table 2] Recording conditions r = 45 mm, 600 rpm hit length 5.0 μm The laser power that minimizes the secondary distortion was defined as the recording sensitivity. Reproduction condition r = 45 mm, 1800 rpm, laser power 2.4 mW

【0023】[0023]

【発明の効果】本発明によれば、耐腐食性、記録感度信
号品質に優れ且つ生産しやすい光磁気媒体が得られる。
According to the present invention, a magneto-optical medium excellent in corrosion resistance and recording sensitivity signal quality and easy to produce can be obtained.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 渡部 行男 神奈川県横浜市緑区鴨志田町1000番地 三 菱化成株式会社総合研究所内 (72)発明者 小松 昌生 神奈川県横浜市緑区鴨志田町1000番地 三 菱化成株式会社総合研究所内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Yukio Watanabe 1000 Kamoshida-cho, Midori-ku, Yokohama, Kanagawa Sanryo Kasei Co., Ltd. (72) Inventor Masao Komatsu 1000 Kamoshida-cho, Midori-ku, Yokohama, Kanagawa Sanryo Kasei Co., Ltd.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 基板上に磁性層を設けてなる光磁気記録
媒体の製造方法において、基板上にタンタルの酸化物を
含有する保護層を、タンタル金属ターゲットを酸素と不
活性ガス中でスパッターする反応性スパッターにより形
成し、次いで磁性層を設けることを特徴とする光磁気記
録媒体の製造方法。
1. A method of manufacturing a magneto-optical recording medium comprising a magnetic layer provided on a substrate, wherein a protective layer containing a tantalum oxide is sputtered on a substrate using a tantalum metal target in oxygen and an inert gas. A method for manufacturing a magneto-optical recording medium, which comprises forming by reactive sputtering and then providing a magnetic layer.
【請求項2】 タンタルの酸化物を含有する保護層の磁
性層に接する表面を磁性層形成前にプラズマエッチング
処理することを特徴とする請求項1に記載の光磁気記録
媒体の製造方法。
2. The method for manufacturing a magneto-optical recording medium according to claim 1, wherein the surface of the protective layer containing the tantalum oxide in contact with the magnetic layer is subjected to plasma etching before forming the magnetic layer.
JP311494A 1994-01-17 1994-01-17 Production of magneto-optical recording medium Pending JPH07182711A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP311494A JPH07182711A (en) 1994-01-17 1994-01-17 Production of magneto-optical recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP311494A JPH07182711A (en) 1994-01-17 1994-01-17 Production of magneto-optical recording medium

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP61310116A Division JP2578418B2 (en) 1986-12-29 1986-12-29 Method for manufacturing magneto-optical recording medium

Publications (1)

Publication Number Publication Date
JPH07182711A true JPH07182711A (en) 1995-07-21

Family

ID=11548331

Family Applications (1)

Application Number Title Priority Date Filing Date
JP311494A Pending JPH07182711A (en) 1994-01-17 1994-01-17 Production of magneto-optical recording medium

Country Status (1)

Country Link
JP (1) JPH07182711A (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6134747A (en) * 1984-07-27 1986-02-19 Hitachi Ltd Magneto-optical multilayer media
JPS62170050A (en) * 1986-01-22 1987-07-27 Sumitomo Electric Ind Ltd magneto-optical disk
JPS6334754A (en) * 1986-07-29 1988-02-15 Seiko Epson Corp Production of magneto-optical recording medium

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6134747A (en) * 1984-07-27 1986-02-19 Hitachi Ltd Magneto-optical multilayer media
JPS62170050A (en) * 1986-01-22 1987-07-27 Sumitomo Electric Ind Ltd magneto-optical disk
JPS6334754A (en) * 1986-07-29 1988-02-15 Seiko Epson Corp Production of magneto-optical recording medium

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