JPH07178310A - Multi-tube gas-liquid contact device - Google Patents
Multi-tube gas-liquid contact deviceInfo
- Publication number
- JPH07178310A JPH07178310A JP5346515A JP34651593A JPH07178310A JP H07178310 A JPH07178310 A JP H07178310A JP 5346515 A JP5346515 A JP 5346515A JP 34651593 A JP34651593 A JP 34651593A JP H07178310 A JPH07178310 A JP H07178310A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- liquid
- liquid tank
- partition member
- gas introduction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Treating Waste Gases (AREA)
- Gas Separation By Absorption (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Abstract
(57)【要約】
【目的】 下部周壁面にガス噴出孔を有するガス導入管
を多数液体中に垂設した構造の多管式気液接触装置にお
いて、そのガス噴出孔から液体中へのガス噴出に起因す
る液槽内フロス層の大きな動揺の発生を未然に防止し、
液槽壁やガス導入管等の設備に大きな外力を与えること
の少ない装置を提供する。
【構成】 大型液槽内に下部周壁面にガス噴出孔を有す
るガス導入管の多数をそのガス噴出孔が液槽内静止液面
より下方に位置するように垂設した構造を有する気液接
触装置において、その液槽内に1本又は複数本のガス導
入管を包囲するように仕切部材を配設し、気泡通過区画
を複数形成させたことを特徴とする多管式気液接触装
置。(57) [Summary] [Purpose] In a multi-tube type gas-liquid contactor having a structure in which a large number of gas introduction pipes having gas ejection holes on the lower peripheral wall are suspended in the liquid, the gas from the gas ejection holes into the liquid Prevents the occurrence of large fluctuations of the floss layer in the liquid tank due to jetting,
(EN) Provided is a device that does not apply a large external force to equipment such as a liquid tank wall and a gas introduction pipe. [Structure] Gas-liquid contact having a structure in which a large number of gas introduction pipes having gas ejection holes on the lower peripheral wall in a large liquid tank are vertically installed so that the gas ejection holes are located below the stationary liquid surface in the liquid tank. In the apparatus, a multi-tube gas-liquid contactor is characterized in that a partition member is arranged in the liquid tank so as to surround one or a plurality of gas introduction tubes, and a plurality of bubble passage sections are formed.
Description
【0001】[0001]
【産業上の利用分野】本発明は、気体と液体(スラリー
液を含む)とを接触させる多管式気液接触装置、特に排
煙脱硫装置として好適な多管式気液接触装置に関するも
のである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a multi-tube gas-liquid contactor for contacting a gas with a liquid (including a slurry liquid), and more particularly to a multi-tube gas-liquid contactor suitable as a flue gas desulfurizer. is there.
【0002】[0002]
【従来の技術】大型液槽内に液体を収容させ、その液体
内に下部周壁面にガス噴出孔を有するガス導入管の多数
を垂設し、そのガス導入管内に導入させたガスをガス噴
出孔から液体中に噴出させて気液接触を行わせる装置は
広く知られている(特公昭55−37295号、特公昭
57−6375号、特公昭59−11322号等)。2. Description of the Related Art A liquid is contained in a large liquid tank, and a large number of gas introducing pipes having gas ejection holes on the lower peripheral wall are vertically provided in the liquid, and the gas introduced into the gas introducing pipe is ejected. Apparatuses for ejecting gas into a liquid through a hole to make gas-liquid contact are widely known (Japanese Patent Publication No. 55-37295, Japanese Patent Publication No. 57-6375, Japanese Patent Publication No. 59-11322, etc.).
【0003】図3に、排煙脱硫装置として用いられてい
る気液接触装置の模式図を示す。図3において、SO2
を含む排煙は、導管101からガス導入管103を通
り、そのガス導入管103の下部周壁面に設けたガス噴
出口から炭酸カルシウムや水酸化カルシウム等のカルシ
ウム化合物のスラリー液中に噴出される。この場合のガ
ス導入管103は、図4に示すように、その下部周壁面
に配設されたガス噴出孔104を有する。液槽内のカル
シウム化合物スラリー液中に噴出された排煙は、そのス
ラリー液と接触し、排煙中に含まれるSO2がカルシウ
ム化合物と反応してCaSO3になる。そして、このC
aSO3は、液槽下部の空気導入管106から液中に導
入された空気中酸素と反応してCaSO4(石こう)に
なる。なお、112はガス中の液体を捕捉する気液分離
器を示し、105は攪拌羽根を示し、108は石こうス
ラリー抜出管を示す。図3に示した排煙脱硫装置は、実
際には極めて大型の装置であり、その液槽102の内径
は10m以上、通常25m以上もあり、また、そのガス
導入管103の数も1,000本以上という極めて多い
数である。FIG. 3 shows a schematic view of a gas-liquid contact device used as a flue gas desulfurization device. In FIG. 3, SO 2
The flue gas containing the gas passes from the conduit 101 through the gas introduction pipe 103 and is ejected into the slurry liquid of the calcium compound such as calcium carbonate or calcium hydroxide from the gas ejection port provided on the lower peripheral wall surface of the gas introduction pipe 103. . As shown in FIG. 4, the gas introduction pipe 103 in this case has a gas ejection hole 104 arranged on the lower peripheral wall surface thereof. The flue gas ejected into the calcium compound slurry liquid in the liquid tank comes into contact with the slurry liquid, and SO 2 contained in the flue gas reacts with the calcium compound to become CaSO 3 . And this C
aSO 3 reacts with oxygen in the air introduced into the liquid from the air introduction pipe 106 at the lower part of the liquid tank to become CaSO 4 (gypsum). Incidentally, 112 is a gas-liquid separator for capturing the liquid in the gas, 105 is a stirring blade, and 108 is a gypsum slurry withdrawal pipe. The flue gas desulfurization device shown in FIG. 3 is actually a very large device, and the inner diameter of the liquid tank 102 is 10 m or more, usually 25 m or more, and the number of the gas introduction pipes 103 is 1,000. This is an extremely large number of books or more.
【0004】このような気液接触装置においては、ガス
導入管のガス噴出孔からガスを液中に噴出させることか
ら、このことが原因となって、液槽内のフロス層(泡沫
層)に全体として定常的で周期的な大きな動揺が生じる
場合がある。そして、そのフロス層の動揺により、液槽
内のフロス層上面が大きく変動するようになる。このフ
ロス層の定常的動揺は、液槽が大型のものになるに従っ
て大きなものとなり、気液接触効率悪化の原因となった
り、場合によっては、液槽壁や液槽内に設置したガス導
入管等の設備に大きな外力を与え、それらの設備の故障
の原因となることが考えられる。In such a gas-liquid contact device, gas is ejected into the liquid from the gas ejection holes of the gas introduction pipe, which causes the floss layer (foam layer) in the liquid tank. As a whole, steady and periodic large fluctuations may occur. Then, due to the fluctuation of the floss layer, the upper surface of the floss layer in the liquid tank largely changes. The steady fluctuation of the floss layer becomes larger as the liquid tank becomes larger, which may cause deterioration of gas-liquid contact efficiency, and in some cases, the wall of the liquid tank or the gas introduction pipe installed in the liquid tank. It is conceivable that a large external force will be applied to equipment such as the above, which will cause failure of those equipment.
【0005】[0005]
【発明が解決しようとする課題】本発明は、下部周壁面
にガス噴出孔を有するガス導入管を多数液体中に垂設し
た構造の多管式気液接触装置において、そのガス噴出孔
から液体中へのガス噴出に起因する液槽内フロス層の大
きな動揺の発生を未然に防止し、液槽壁やガス導入管等
の設備に大きな外力を与えることの少ない装置を提供す
ることをその課題とする。SUMMARY OF THE INVENTION The present invention relates to a multi-tube gas-liquid contactor having a structure in which a large number of gas introducing pipes having gas ejection holes on the lower peripheral wall are suspended in the liquid. It is an object of the present invention to prevent the occurrence of large fluctuations of the floss layer in the liquid tank due to the gas jet into the inside thereof, and to provide a device that does not give a large external force to the equipment such as the liquid tank wall and the gas introduction pipe. And
【0006】[0006]
【課題を解決するための手段】本発明者らは、前記課題
を解決すべく鋭意研究を重ねた結果、本発明を完成する
に至った。即ち、本発明によれば、大型液槽内に下部周
壁面にガス噴出孔を有するガス導入管の多数をそのガス
噴出孔が液槽内静止液面より下方に位置するように垂設
した構造を有する気液接触装置において、その液槽内に
1本又は複数本のガス導入管を包囲するように仕切部材
を配設し、気泡通過区画を複数形成させたことを特徴と
する多管式気液接触装置が提供される。また、本発明に
よれば、大型液槽内に下部周壁面にガス噴出孔を有する
ガス導入管の多数をそのガス噴出孔が液槽内静止液面よ
り下方に位置するように垂設した構造を有する気液接触
装置において、仕切部材をその下端がガス導入管のガス
噴出孔より下方に位置するように液槽内に垂設して、そ
の液槽内に1本又は複数本のガス導入管を包囲する気泡
通過区画を複数形成させたことを特徴とする多管式気液
接触装置が提供される。The present inventors have completed the present invention as a result of intensive studies to solve the above problems. That is, according to the present invention, a large number of gas introduction pipes having gas ejection holes on the lower peripheral wall surface in the large liquid tank are vertically installed so that the gas ejection holes are located below the stationary liquid surface in the liquid tank. In the gas-liquid contactor having a multi-tube type, a partition member is arranged in the liquid tank so as to surround one or a plurality of gas introduction pipes, and a plurality of bubble passage sections are formed. A gas-liquid contact device is provided. Further, according to the present invention, a large number of gas introducing pipes having gas ejection holes on the lower peripheral wall surface in the large liquid tank are vertically installed so that the gas ejection holes are located below the stationary liquid surface in the liquid tank. In the gas-liquid contactor having the above-mentioned, the partition member is vertically installed in the liquid tank such that the lower end thereof is located below the gas ejection hole of the gas introduction pipe, and one or a plurality of gases are introduced into the liquid tank. Provided is a multi-tubular gas-liquid contactor characterized in that a plurality of bubble passage sections surrounding a tube are formed.
【0007】本発明者らは、多管式気液接触装置におけ
る前述のように定常的フロス層の動揺がガス噴出に起因
することを突きとめ、かかるガス噴出エネルギーを分散
又は吸収せしめることによって液槽内フロス層面の大き
な動揺の発生を未然に防止できることを発見したもので
ある。すなわち、1本又は複数のガス導入管を包囲する
ように仕切部材を液槽内に設置するときには、該仕切部
材によってガス噴出による造波エネルギーの集積重畳が
きわめて効果的に抑制されることを見出し本発明を完成
したものである。The inventors of the present invention have found out that the steady fluctuation of the floss layer in the multi-tube type gas-liquid contactor is caused by the gas jet as described above, and the liquid jet energy is dispersed or absorbed to disperse the liquid. It was discovered that the occurrence of large fluctuations on the floss layer surface in the tank can be prevented. That is, when the partition member is installed in the liquid tank so as to surround one or a plurality of gas introduction pipes, it has been found that the partition member extremely effectively suppresses the accumulation and superposition of the wave-making energy due to the gas ejection. The present invention has been completed.
【0008】本発明で用いる仕切部材は、液体中に垂設
した多数のガス導入管を、1本毎又は複数本毎に設置し
実質的に槽内液を仕切ることができる形状であればよ
い。また、その仕切形態は、三角形、正方形、矩形、多
角形、円形、多重円形、楕円形、車軸形、放射形あるい
はこれらの組合せ等が用いられる。仕切部材の形状はガ
ス導入管から吹込まれたガス噴出エネルギーを吸収分散
し、あるいは、および液槽液面付近の造波エネルギーを
吸収分散できるものであれば任意のものを用いることが
できる。したがって仕切部材の形状としては通常の平板
又は円筒の他に、波板、格子板、多孔板およびこれらの
円筒状のもの、並びにこれらの表面に凹凸等の消波構造
を取付けたもの、あるいはそれらの組合せからなる形状
のもの等を用いることができる。仕切部材の材質は、金
属の他、プラスチックやセラミック並びにこれらの複合
材、組合せ材等および金属あるいは合成高分子等からな
る編物又は布並びにこれらの組合せ等であることができ
る。仕切部材は通常、液槽内液通に垂直に設置される
が、仕切部材の形状等によって液面に水平に固定または
浮遊させて設置することもできる。この場合、ガス導入
管の支持のために通常配設される格子状支持体を兼ねさ
せることもできる。また液槽内において仕切部材をフロ
ス層面上に露出させることによって、フロス層面動揺が
他の仕切区画に拡散することを防止することもできる
が、フロス層面下に設置してもよい。即ち、仕切部材の
上端がフロス層中に設置してあっても、その下端部にガ
ズ導入管から噴出されるガス仕切部に衝突すればガス噴
出エネルギーが分散されるために、造波エネルギーの集
積重畳が抑制される。したがって仕切部材の前記下端部
付近をガス吹込管のガス噴出孔より下方に位置するのが
好ましいが、仕切部材の仕切形態、仕切られるガス吹込
管数、仕切部材の形状あるいは気液接触装置の運転条件
等により該ガス噴出孔よりも上部に位置してもよい。The partition member used in the present invention may have a shape capable of substantially partitioning the liquid in the tank by installing a large number of gas introducing pipes suspended in the liquid, one by one or a plurality of gas introducing pipes. . Further, the partition form may be a triangle, a square, a rectangle, a polygon, a circle, a multiple circle, an ellipse, an axle, a radial shape, or a combination thereof. The shape of the partition member may be any shape as long as it can absorb and disperse the gas ejection energy blown from the gas introduction pipe, or can absorb and disperse the wave-making energy near the liquid surface of the liquid tank. Therefore, as the shape of the partition member, in addition to an ordinary flat plate or cylinder, a corrugated plate, a lattice plate, a perforated plate and their cylindrical shape, and those having a wave-eliminating structure such as unevenness attached to their surface, or those It is possible to use a shape having a combination of the above. The material of the partition member may be metal, plastic or ceramic, a composite material or combination material thereof, and a knitted or cloth made of metal or synthetic polymer, or a combination thereof. The partition member is usually installed vertically to the liquid passage in the liquid tank, but it can be installed horizontally or fixed on the liquid surface depending on the shape of the partition member. In this case, it can also serve as a grid-like support that is usually arranged to support the gas introduction pipe. Further, by exposing the partition member on the surface of the floss layer in the liquid tank, it is possible to prevent the motion of the floss layer surface from diffusing to other partition sections, but it may be installed below the surface of the floss layer. That is, even if the upper end of the partition member is installed in the floss layer, if the lower end part of the partition member collides with the gas partition part ejected from the gas introduction pipe, the gas ejection energy is dispersed, so that Stacking is suppressed. Therefore, it is preferable that the vicinity of the lower end portion of the partition member is located below the gas ejection hole of the gas injection pipe, but the partition member partition shape, the number of gas injection pipes to be partitioned, the shape of the partition member or the operation of the gas-liquid contact device. It may be located above the gas ejection holes depending on the conditions.
【0009】図1に、仕切部材を用いて多数のガス導入
管を1本毎仕切って形成した本発明の1つの実施例の気
泡通過区画の説明図を示す。図1において、1はガス導
入管、2はその下部周壁面に形成されたガス噴出孔、3
は仕切部材、4は液槽内の静止液面、5は液槽内に形成
されたフロス層の上面(膨張液面)、6は気泡と液体と
の混合物からなるフロス層を示す。aは仕切部材3によ
って形成された気泡通過区画で、その内部にガス導入管
1を含む。FIG. 1 is an explanatory view of a bubble passage section according to one embodiment of the present invention, which is formed by partitioning a large number of gas introducing pipes one by one using a partition member. In FIG. 1, 1 is a gas introduction pipe, 2 is a gas ejection hole formed in the lower peripheral wall surface thereof, 3
Is a partition member, 4 is a static liquid surface in the liquid tank, 5 is an upper surface (expanded liquid surface) of the floss layer formed in the liquid tank, and 6 is a floss layer made of a mixture of bubbles and liquid. Reference numeral a is a bubble passage section formed by the partition member 3, and includes the gas introduction pipe 1 therein.
【0010】図1には仕切部材を用いて多数のガス導入
管を1本毎に仕切って形成した気泡通過区画の説明図を
示したが、ガス導入管を1本毎に仕切る必要はなく、複
数本毎に仕切ることができる。この種の気液接触装置は
大型のもので、液槽内に配設されるガス導入管は数千本
と極めて多数である。仕切部材によって区画されるガズ
導入管数は、仕切部材の前記仕切形態、形状、設置方式
あるいは気液接触装置の運転条件等によって決められ
る。また仕切部材によって区画されるガス導入管数が少
ないほど、一般的にガス噴出による造波エネルギーが集
積重畳しにくくなるが、設置コストが多くなる他にも反
応原料(石灰石など)や生成物(石こうなど)が液槽内
に均一に拡散しにくくなる傾向がある。このため本発明
では、これらのガス導入管は、複数本、例えば、2〜2
0本、好ましくは4〜40本毎に仕切るのがよい。しか
し前述のような理由から数10本ないし数100本ごと
に仕切ることによって、より好ましい気液接触反応を行
なうことができる場合もある。また、仕切部材によって
仕切られるガス導入管数は液槽内全体において必ずしも
一定とする必要はない。FIG. 1 shows an explanatory view of a bubble passage section formed by partitioning a large number of gas introducing pipes one by one using a partition member, but it is not necessary to partition the gas introducing pipes one by one. It can be divided into multiple pieces. This type of gas-liquid contactor is large in size, and the number of gas introduction pipes arranged in the liquid tank is as large as several thousand. The number of gas introduction pipes divided by the partition member is determined by the partition form, shape, installation method, operating conditions of the gas-liquid contactor, etc. of the partition member. In addition, the smaller the number of gas introduction pipes partitioned by the partition member, the less likely it is that the wave-forming energy due to gas ejection will be accumulated and superposed, but in addition to the high installation cost, the reaction raw materials (limestone, etc.) and products ( Gypsum) tends to be difficult to diffuse uniformly in the liquid tank. Therefore, in the present invention, a plurality of these gas introduction pipes, for example, 2 to 2 are used.
It is good to partition every 0, preferably every 4 to 40. However, for the reasons described above, it may be possible to carry out a more preferable gas-liquid contact reaction by partitioning every several tens to several hundreds. Further, the number of gas introduction pipes partitioned by the partition member does not necessarily have to be constant throughout the liquid tank.
【0011】図2に、多数のガス導入管を複数本毎に仕
切って形成した多数の気泡通過区画を含む液槽内部の説
明平面図を示す。この図において、10は液槽壁を示
す。図2の液槽は、板体を液槽内に縦横に配設して、液
槽内に断面4角形の筒体状の仕切部材3を仕切壁とす
る、多数の気泡通過区画aを形成した構造のものであ
る。これらの各区画aには、複数のガス導入管(図示さ
れず)が配設されている。また、各区画aにおける縦の
寸法:n及び横の寸法:mは、その区画aの水平断面積
が10m2以下、好ましくは1〜4m2になるように規定
するのがよい。しかし、これらの水平断面積は必ずしも
一定とすることは必要なく、また前述のごとく仕切形
態、仕切部材の形状、設置方式あるいは気液接触装置の
運転条件等によって数10m2〜100m2になるように
規定する場合もある。本発明により液槽内に配設する仕
切部材3は、任意の方法で液槽内に支持させることがで
きる。例えば、その液槽内液面上方又は液面下に支持体
を配設し、これに支持させることができる他、ガス導入
管を支持させるために格子状に配設された支持体に支持
させることができる。FIG. 2 shows an explanatory plan view of the inside of the liquid tank including a large number of bubble passage sections formed by partitioning a plurality of gas introduction pipes. In this figure, 10 indicates a liquid tank wall. In the liquid tank of FIG. 2, the plate bodies are arranged vertically and horizontally in the liquid tank, and a large number of bubble passage sections a are formed in the liquid tank, with the partition member 3 having a cylindrical body having a quadrangular cross section as a partition wall. It has a structure. A plurality of gas introduction pipes (not shown) are arranged in each of these compartments a. The vertical dimension of each compartment a: n and horizontal dimensions: m, the horizontal cross-sectional area of the partition a is 10 m 2 or less, and it is preferably defined to be 1 to 4 m 2. However, these horizontal cross-sectional area without necessarily be a constant and the partition forms as described above, the shape of the partition member, so that several 10m 2 ~100m 2 by operating conditions such as the installation method or gas-liquid contact device May be prescribed in. The partition member 3 arranged in the liquid tank according to the present invention can be supported in the liquid tank by any method. For example, a support may be provided above or below the liquid level in the liquid tank and supported by the support, or may be supported by a support arranged in a grid pattern to support the gas introduction pipe. be able to.
【0012】本発明の気液接触装置において、仕切部材
の上端をフロス層上面(膨張液面)5より下方に位置さ
せた場合には(図1参照)、その液槽内に収容させたフ
ロス層の上部を水平方向に連絡させることができる。フ
ロス層上部をこのようにして水平方向に連絡させること
により、フロス層の流動をその1つの区画内のみなら
ず、他の区画との間において流動させることができるの
で、液槽内に収容させた液体中に含まれる溶解成分の濃
度を全体的に均一化させることができる。この場合、仕
切部材の上端は、ガス噴出孔2のレベルからの高さが、
ガス噴出孔2と静止液面4との間の距離に対して、70
〜130%になるように位置させるのがよい。一般的に
は、その上端は、静止液面4のレベルからの高さで、−
5〜+10cmである。また、このようにして、上部フ
ロス層を水平方向に連絡させても、ガス噴出孔付近には
仕切部材による仕切壁が存在し、ガス噴出孔からガスが
噴出する際に液体の与える流動エネルギーの他の部分へ
の伝達が防止されることから、液槽内におけるフロス層
の波及び動揺の沈静化が図られる。In the gas-liquid contacting device of the present invention, when the upper end of the partition member is located below the floss layer upper surface (expanded liquid surface) 5 (see FIG. 1), the floss contained in the liquid tank. The tops of the layers can be connected horizontally. By horizontally connecting the upper part of the floss layer in this way, the flow of the floss layer can be made to flow not only in that one section but also between the other sections, so that the floss layer can be accommodated in the liquid tank. The concentration of the dissolved components contained in the liquid can be made uniform throughout. In this case, the height of the upper end of the partition member from the level of the gas ejection holes 2 is
For the distance between the gas ejection hole 2 and the stationary liquid level 4, 70
It is better to position it to be ~ 130%. Generally, its upper end is at a height from the level of the static liquid level 4,
It is 5 to +10 cm. Further, even when the upper floss layer is connected in the horizontal direction in this manner, a partition wall by a partition member exists near the gas ejection hole, and the flow energy of the liquid given when the gas is ejected from the gas ejection hole is Since the transmission to other parts is prevented, the wave and sway of the floss layer in the liquid tank are calmed down.
【0013】[0013]
【発明の効果】本発明によれば、液槽内を複数の気泡通
過区画に構成したことから、ガス導入管のガス噴出孔か
ら液体中にガスを噴出させる際に起る液体の造波エネル
ギーの伝幡は、一次的にその区画内に封止され、その液
体の造波エネルギーが他の区画に伝達されることが非常
に少なくなり、その結果、液槽内でのフロス層の波及び
フロス層の動揺の発生が防止される。従来の気液接触装
置においては、各ガス導入管のガス噴出孔から液体中に
ガスを噴出させる際に起る液体の各流動は、仕切部材が
存在しないことから、相互に干渉しフロス層の動揺を生
じやすい。このため、時として液体の流動が重畳し合っ
て全体として定常的で周期的な大きなフロス層の波動揺
となり、液面を変動させて気液接触効率の悪化を生じさ
せることもある。場合によっては液槽内設備の故障の原
因となることも考えられるが、本発明の場合には、前記
したように、液槽内を複数の気泡通過区画に構成したこ
とから、ガス噴出により起る気液の接線方向の流動は、
この区画内に封止され、他の区画への伝達が防止されて
いるため、従来の気液接触装置に見られた如き前記問題
は一挙に解決される。その上、気泡通過区画において
は、噴出ガスによるリフト効果が得られるため、気泡通
過区画内にはガス導入管の下方に存在する新鮮な液体が
上方にすい込まれ、区画内において気泡と混合されると
いう利点がある。According to the present invention, since the inside of the liquid tank is constituted of a plurality of bubble passage sections, the wave-making energy of the liquid generated when the gas is jetted into the liquid from the gas jet holes of the gas introduction pipe. Of the liquid is temporarily sealed in the compartment, and the wave-making energy of the liquid is much less transferred to other compartments, and as a result, the wave of the floss layer in the liquid tank and Generation of fluctuating floss layer is prevented. In the conventional gas-liquid contact device, each flow of the liquid that occurs when the gas is ejected from the gas ejection holes of each gas introduction pipe into the liquid, and since there is no partition member, they interfere with each other and the floss layer Prone to upset. For this reason, the liquid flows sometimes overlap each other to cause large fluctuations in the floss layer which are steady and periodic as a whole, and the liquid level is changed, which may cause deterioration of gas-liquid contact efficiency. In some cases, it may cause a failure of the equipment in the liquid tank, but in the case of the present invention, as described above, since the inside of the liquid tank is configured with a plurality of bubble passage sections, it is caused by gas ejection. The tangential flow of gas and liquid is
Since it is sealed in this compartment and the transmission to other compartments is prevented, the above-mentioned problems found in the conventional gas-liquid contact device are solved all at once. Moreover, in the bubble passage section, since the lift effect due to the jetted gas is obtained, fresh liquid existing below the gas introduction pipe is swept upward in the bubble passage section and mixed with the bubbles in the section. There is an advantage that
【0014】本発明の気液接触装置は、各種の気液接触
を伴う反応装置として利用され、例えば、亜硫酸ガスを
含む排ガスと炭酸カルシウムスラリー液等のアルカリ性
液体との接触を行う排煙脱硫装置や、炭酸ガスを含む排
ガスとアルカリ性液体との接触を行う脱炭酸ガス装置等
として好ましく適用される。特に、本発明の装置は、液
槽の直径が10m以上、特に20m以上という大型の排
煙脱硫装置として有利に用いることができる。The gas-liquid contactor of the present invention is used as a reaction apparatus involving various kinds of gas-liquid contact, and for example, a flue gas desulfurization apparatus for contacting exhaust gas containing sulfurous acid gas with an alkaline liquid such as calcium carbonate slurry liquid. Alternatively, it is preferably applied as a decarbonation device for contacting an exhaust gas containing carbon dioxide with an alkaline liquid. In particular, the device of the present invention can be advantageously used as a large-scale flue gas desulfurization device having a liquid tank diameter of 10 m or more, particularly 20 m or more.
【0015】[0015]
【実施例】次に本発明を実施例によりさらに詳細に説明
する。EXAMPLES Next, the present invention will be described in more detail by way of examples.
【0016】実施例1 縦1m、横2m、高さ1mの槽型液槽内に、全体で8本
のガス導入管を、横方向2列、縦方向4列で配設した構
造のテスト装置を用いた。この場合、ガス導入管は、長
さ:2000mm、内径:100mmの円筒管の下端か
ら150〜300mmの位置の周壁面に孔径:20〜3
0mmの孔を横一列に穿設した構造のものを用いた。ま
た、このガス導入管は、そのガス噴出孔が静止水面下1
0〜25cmの深さになるように配設した。このテスト
装置において、その液槽内を、仕切板により、2本のガ
ス導入管毎に仕切って液槽内に4個の気泡通過区画を形
成した。この場合、仕切板の上端を静止水面上の位置
に、そしてその下端を静止水面下30〜40cmの深さ
になるように位置させた。このようなテスト装置の液槽
内に液体として水を高さ100cmの位置まで入れ、ガ
ス導入管1本当りのガス流量を30〜200m3/時の
条件で、空気をそのガス導入管のガス噴出口から噴出さ
せて空気−水系の気液接触を行った。このような気液接
触においては、繰返し、継続して実験を行ったところ、
液槽内のフロス層には有意な波動揺は生じず、また、フ
ロス層面の変動も実質上生じなかった。Example 1 A test device having a structure in which a total of eight gas introduction pipes are arranged in two rows in the horizontal direction and four rows in the vertical direction in a tank type liquid tank having a length of 1 m, a width of 2 m and a height of 1 m. Was used. In this case, the gas introducing pipe has a hole diameter of 20 to 3 on the peripheral wall surface at a position of 150 to 300 mm from the lower end of the cylindrical pipe having a length of 2000 mm and an inner diameter of 100 mm.
A structure having 0 mm holes formed in a horizontal row was used. In addition, the gas injection pipe has a gas ejection hole 1 below the stationary water surface.
It was arranged to have a depth of 0 to 25 cm. In this test device, the inside of the liquid tank was partitioned by a partition plate into two gas introduction pipes to form four bubble passage sections in the liquid tank. In this case, the upper end of the partition plate was positioned at a position above the stationary water surface, and the lower end thereof was positioned at a depth of 30 to 40 cm below the stationary water surface. Water is put into the liquid tank of such a test device as a liquid up to a position of 100 cm in height, and air is supplied to the gas of the gas introducing pipe under the condition that the gas flow rate per gas introducing pipe is 30 to 200 m 3 / hour. Air-water system gas-liquid contact was performed by jetting from the jet outlet. In such gas-liquid contact, repeated and continuous experiments showed that
No significant wave motion occurred in the floss layer in the liquid tank, and the floss layer surface did not substantially fluctuate.
【0017】一方、前記テスト装置において、仕切板を
用いないで同様の実験を行ったところ、この場合には、
フロス層面の変動を生じた。On the other hand, when the same experiment was conducted in the test device without using a partition plate, in this case,
Fluctuation of floss layer surface occurred.
【図1】仕切部材を用いて多数のガス導入管を1本毎に
仕切って形成した気泡通過区画の説明図を示す。FIG. 1 is an explanatory view of a bubble passage section formed by partitioning a large number of gas introduction pipes one by one using a partition member.
【図2】仕切部材を用いて多数のガス導入管を複数本毎
に仕切って形成した気泡通過区画を含む液槽内部の説明
平面図を示す。FIG. 2 is an explanatory plan view of the inside of a liquid tank including a bubble passage section formed by partitioning a plurality of gas introduction tubes into a plurality of sections using partitioning members.
【図3】排煙脱硫装置として用いられている従来の気液
接触装置の一例についての模式図を示す。FIG. 3 is a schematic view showing an example of a conventional gas-liquid contactor used as a flue gas desulfurizer.
【図4】ガス導入管の一例についての構造説明図であ
る。FIG. 4 is a structural explanatory view of an example of a gas introduction pipe.
1、103 ガス導入管 2、104 ガス噴出孔 3 仕切部材 4 静止液面 5 フロス層上面 6 フロス層 101 ガス導管 102 液槽 105 攪拌羽根 106 空気導入管 a 気泡通過区画 1, 103 Gas introduction pipe 2, 104 Gas ejection hole 3 Partition member 4 Still liquid surface 5 Fross layer upper surface 6 Floss layer 101 Gas conduit 102 Liquid tank 105 Stirring blade 106 Air introduction pipe a Bubble passing section
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 B01D 53/77 B01J 10/00 104 8822−4G B01D 53/34 125 E ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 6 Identification code Office reference number FI technical display location B01D 53/77 B01J 10/00 104 8822-4G B01D 53/34 125 E
Claims (3)
有するガス導入管の多数をそのガス噴出孔が液槽内静止
液面より下方に位置するように垂設した構造を有する気
液接触装置において、その液槽内に1本又は複数本のガ
ス導入管を包囲するように仕切部材を配設し、気泡通過
区画を複数形成させたことを特徴とする多管式気液接触
装置。1. A gas having a structure in which a large number of gas introduction pipes each having a gas ejection hole on a lower peripheral wall surface in a large liquid tank are vertically installed so that the gas ejection hole is located below a stationary liquid surface in the liquid tank. In the liquid contact device, a partition member is disposed in the liquid tank so as to surround one or more gas introduction pipes, and a plurality of bubble passage sections are formed to form a multi-tube gas-liquid contact. apparatus.
方に位置するように液槽内に垂設した請求項1の気液接
触装置。2. The gas-liquid contactor according to claim 1, wherein the partition member is vertically installed in the liquid tank so that its lower end is located below the gas ejection hole.
の接触反応を行うための請求項1の気液接触装置。3. The gas-liquid contactor according to claim 1, for carrying out a catalytic reaction between a gas containing an acidic gas and an alkaline liquid.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5346515A JP2796546B2 (en) | 1993-12-22 | 1993-12-22 | Multi-tube gas-liquid contact device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5346515A JP2796546B2 (en) | 1993-12-22 | 1993-12-22 | Multi-tube gas-liquid contact device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH07178310A true JPH07178310A (en) | 1995-07-18 |
JP2796546B2 JP2796546B2 (en) | 1998-09-10 |
Family
ID=18383949
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5346515A Expired - Lifetime JP2796546B2 (en) | 1993-12-22 | 1993-12-22 | Multi-tube gas-liquid contact device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2796546B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2024107913A (en) * | 2023-01-30 | 2024-08-09 | 株式会社ジョンクェルコンサルティング | Carbon dioxide treatment device and carbon dioxide treatment method |
-
1993
- 1993-12-22 JP JP5346515A patent/JP2796546B2/en not_active Expired - Lifetime
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2024107913A (en) * | 2023-01-30 | 2024-08-09 | 株式会社ジョンクェルコンサルティング | Carbon dioxide treatment device and carbon dioxide treatment method |
Also Published As
Publication number | Publication date |
---|---|
JP2796546B2 (en) | 1998-09-10 |
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