JPH07142827A - Manufacture of flexible printed circuit board - Google Patents
Manufacture of flexible printed circuit boardInfo
- Publication number
- JPH07142827A JPH07142827A JP31113093A JP31113093A JPH07142827A JP H07142827 A JPH07142827 A JP H07142827A JP 31113093 A JP31113093 A JP 31113093A JP 31113093 A JP31113093 A JP 31113093A JP H07142827 A JPH07142827 A JP H07142827A
- Authority
- JP
- Japan
- Prior art keywords
- solvent
- precursor resin
- polyimide precursor
- metal foil
- bis
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 13
- 229920005989 resin Polymers 0.000 claims abstract description 47
- 239000011347 resin Substances 0.000 claims abstract description 47
- 239000002243 precursor Substances 0.000 claims abstract description 38
- 229920001721 polyimide Polymers 0.000 claims abstract description 37
- 239000004642 Polyimide Substances 0.000 claims abstract description 32
- 229910052751 metal Inorganic materials 0.000 claims abstract description 30
- 239000002184 metal Substances 0.000 claims abstract description 30
- 239000011888 foil Substances 0.000 claims abstract description 27
- 239000002904 solvent Substances 0.000 claims abstract description 18
- 238000009835 boiling Methods 0.000 claims abstract description 15
- 239000012046 mixed solvent Substances 0.000 claims abstract description 13
- 239000002798 polar solvent Substances 0.000 claims abstract description 7
- 239000000758 substrate Substances 0.000 claims 1
- 238000000034 method Methods 0.000 abstract description 9
- 150000004985 diamines Chemical class 0.000 abstract description 5
- 238000010438 heat treatment Methods 0.000 abstract description 5
- 239000000203 mixture Substances 0.000 abstract description 5
- NJRWLESRYZMVRW-UHFFFAOYSA-N carboxy carboxyoxycarbonyl carbonate Chemical compound OC(=O)OC(=O)OC(=O)OC(O)=O NJRWLESRYZMVRW-UHFFFAOYSA-N 0.000 abstract 1
- 229920001577 copolymer Polymers 0.000 abstract 1
- 239000000178 monomer Substances 0.000 abstract 1
- 239000000243 solution Substances 0.000 description 25
- 229920005575 poly(amic acid) Polymers 0.000 description 10
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 6
- 238000001035 drying Methods 0.000 description 5
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 239000011259 mixed solution Substances 0.000 description 4
- -1 2,4′-diaminodiphenyl sulfide Chemical compound 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 150000000000 tetracarboxylic acids Chemical class 0.000 description 3
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 2
- LJGHYPLBDBRCRZ-UHFFFAOYSA-N 3-(3-aminophenyl)sulfonylaniline Chemical compound NC1=CC=CC(S(=O)(=O)C=2C=C(N)C=CC=2)=C1 LJGHYPLBDBRCRZ-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- GCAIEATUVJFSMC-UHFFFAOYSA-N benzene-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1C(O)=O GCAIEATUVJFSMC-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 239000011889 copper foil Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000013007 heat curing Methods 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 239000012299 nitrogen atmosphere Substances 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- CYIDZMCFTVVTJO-UHFFFAOYSA-N pyromellitic acid Chemical compound OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C=C1C(O)=O CYIDZMCFTVVTJO-UHFFFAOYSA-N 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- YFOOEYJGMMJJLS-UHFFFAOYSA-N 1,8-diaminonaphthalene Chemical compound C1=CC(N)=C2C(N)=CC=CC2=C1 YFOOEYJGMMJJLS-UHFFFAOYSA-N 0.000 description 1
- MPXKIFWZOQVOLN-UHFFFAOYSA-N 1-(1-adamantyl)adamantane Chemical compound C1C(C2)CC(C3)CC2CC13C(C1)(C2)CC3CC2CC1C3 MPXKIFWZOQVOLN-UHFFFAOYSA-N 0.000 description 1
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 description 1
- WCZNKVPCIFMXEQ-UHFFFAOYSA-N 2,3,5,6-tetramethylbenzene-1,4-diamine Chemical compound CC1=C(C)C(N)=C(C)C(C)=C1N WCZNKVPCIFMXEQ-UHFFFAOYSA-N 0.000 description 1
- BAHPQISAXRFLCL-UHFFFAOYSA-N 2,4-Diaminoanisole Chemical compound COC1=CC=C(N)C=C1N BAHPQISAXRFLCL-UHFFFAOYSA-N 0.000 description 1
- VOZKAJLKRJDJLL-UHFFFAOYSA-N 2,4-diaminotoluene Chemical compound CC1=CC=C(N)C=C1N VOZKAJLKRJDJLL-UHFFFAOYSA-N 0.000 description 1
- 229940075142 2,5-diaminotoluene Drugs 0.000 description 1
- FNJYNTJIZBHPGP-UHFFFAOYSA-N 2,5-dichlorobenzene-1,3-diamine Chemical compound NC1=CC(Cl)=CC(N)=C1Cl FNJYNTJIZBHPGP-UHFFFAOYSA-N 0.000 description 1
- QAYVHDDEMLNVMO-UHFFFAOYSA-N 2,5-dichlorobenzene-1,4-diamine Chemical compound NC1=CC(Cl)=C(N)C=C1Cl QAYVHDDEMLNVMO-UHFFFAOYSA-N 0.000 description 1
- RLYCRLGLCUXUPO-UHFFFAOYSA-N 2,6-diaminotoluene Chemical compound CC1=C(N)C=CC=C1N RLYCRLGLCUXUPO-UHFFFAOYSA-N 0.000 description 1
- JONTXEXBTWSUKE-UHFFFAOYSA-N 2-(2-aminoethylsulfanyl)ethanamine Chemical compound NCCSCCN JONTXEXBTWSUKE-UHFFFAOYSA-N 0.000 description 1
- KNRVAYVZVIKHHL-UHFFFAOYSA-N 2-methoxy-5-methylbenzene-1,4-diamine Chemical compound COC1=CC(N)=C(C)C=C1N KNRVAYVZVIKHHL-UHFFFAOYSA-N 0.000 description 1
- OBCSAIDCZQSFQH-UHFFFAOYSA-N 2-methyl-1,4-phenylenediamine Chemical compound CC1=CC(N)=CC=C1N OBCSAIDCZQSFQH-UHFFFAOYSA-N 0.000 description 1
- BCKLPBBBFNWJHH-UHFFFAOYSA-N 2-methylnaphthalene-1,4-diamine Chemical compound C1=CC=CC2=C(N)C(C)=CC(N)=C21 BCKLPBBBFNWJHH-UHFFFAOYSA-N 0.000 description 1
- AWCQGTAMYBFTTN-UHFFFAOYSA-N 2-methylnaphthalene-1,5-diamine Chemical compound NC1=CC=CC2=C(N)C(C)=CC=C21 AWCQGTAMYBFTTN-UHFFFAOYSA-N 0.000 description 1
- IJTBLNVJSBGHPF-UHFFFAOYSA-N 2-phenylnaphthalene-1,3-diamine Chemical compound NC1=CC2=CC=CC=C2C(N)=C1C1=CC=CC=C1 IJTBLNVJSBGHPF-UHFFFAOYSA-N 0.000 description 1
- HUWXDEQWWKGHRV-UHFFFAOYSA-N 3,3'-Dichlorobenzidine Chemical group C1=C(Cl)C(N)=CC=C1C1=CC=C(N)C(Cl)=C1 HUWXDEQWWKGHRV-UHFFFAOYSA-N 0.000 description 1
- JRBJSXQPQWSCCF-UHFFFAOYSA-N 3,3'-Dimethoxybenzidine Chemical group C1=C(N)C(OC)=CC(C=2C=C(OC)C(N)=CC=2)=C1 JRBJSXQPQWSCCF-UHFFFAOYSA-N 0.000 description 1
- NUIURNJTPRWVAP-UHFFFAOYSA-N 3,3'-Dimethylbenzidine Chemical group C1=C(N)C(C)=CC(C=2C=C(C)C(N)=CC=2)=C1 NUIURNJTPRWVAP-UHFFFAOYSA-N 0.000 description 1
- MHQULXYNBKWNDF-UHFFFAOYSA-N 3,4-dimethylbenzene-1,2-diamine Chemical compound CC1=CC=C(N)C(N)=C1C MHQULXYNBKWNDF-UHFFFAOYSA-N 0.000 description 1
- NBAUUNCGSMAPFM-UHFFFAOYSA-N 3-(3,4-dicarboxyphenyl)phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1C1=CC=CC(C(O)=O)=C1C(O)=O NBAUUNCGSMAPFM-UHFFFAOYSA-N 0.000 description 1
- LXJLFVRAWOOQDR-UHFFFAOYSA-N 3-(3-aminophenoxy)aniline Chemical compound NC1=CC=CC(OC=2C=C(N)C=CC=2)=C1 LXJLFVRAWOOQDR-UHFFFAOYSA-N 0.000 description 1
- NDXGRHCEHPFUSU-UHFFFAOYSA-N 3-(3-aminophenyl)aniline Chemical group NC1=CC=CC(C=2C=C(N)C=CC=2)=C1 NDXGRHCEHPFUSU-UHFFFAOYSA-N 0.000 description 1
- TYKLCAKICHXQNE-UHFFFAOYSA-N 3-[(2,3-dicarboxyphenyl)methyl]phthalic acid Chemical compound OC(=O)C1=CC=CC(CC=2C(=C(C(O)=O)C=CC=2)C(O)=O)=C1C(O)=O TYKLCAKICHXQNE-UHFFFAOYSA-N 0.000 description 1
- UCFMKTNJZCYBBJ-UHFFFAOYSA-N 3-[1-(2,3-dicarboxyphenyl)ethyl]phthalic acid Chemical compound C=1C=CC(C(O)=O)=C(C(O)=O)C=1C(C)C1=CC=CC(C(O)=O)=C1C(O)=O UCFMKTNJZCYBBJ-UHFFFAOYSA-N 0.000 description 1
- PAHZZOIHRHCHTH-UHFFFAOYSA-N 3-[2-(2,3-dicarboxyphenyl)propan-2-yl]phthalic acid Chemical compound C=1C=CC(C(O)=O)=C(C(O)=O)C=1C(C)(C)C1=CC=CC(C(O)=O)=C1C(O)=O PAHZZOIHRHCHTH-UHFFFAOYSA-N 0.000 description 1
- UVUCUHVQYAPMEU-UHFFFAOYSA-N 3-[2-(3-aminophenyl)-1,1,1,3,3,3-hexafluoropropan-2-yl]aniline Chemical compound NC1=CC=CC(C(C=2C=C(N)C=CC=2)(C(F)(F)F)C(F)(F)F)=C1 UVUCUHVQYAPMEU-UHFFFAOYSA-N 0.000 description 1
- DOAYUKLNEKRLCQ-UHFFFAOYSA-N 3-[2-(4-aminophenyl)-1,1,1,3,3,3-hexafluoropropan-2-yl]aniline Chemical compound C1=CC(N)=CC=C1C(C(F)(F)F)(C(F)(F)F)C1=CC=CC(N)=C1 DOAYUKLNEKRLCQ-UHFFFAOYSA-N 0.000 description 1
- SPXABFZECXRZBT-UHFFFAOYSA-N 3-[3-(3-aminophenyl)-1,1,2,2,3,3-hexafluoropropyl]aniline Chemical compound NC1=CC=CC(C(F)(F)C(F)(F)C(F)(F)C=2C=C(N)C=CC=2)=C1 SPXABFZECXRZBT-UHFFFAOYSA-N 0.000 description 1
- PXRANGAHBYKLGM-UHFFFAOYSA-N 3-[4-(3-aminophenyl)but-1-en-3-ynyl]aniline Chemical compound NC1=CC=CC(C=CC#CC=2C=C(N)C=CC=2)=C1 PXRANGAHBYKLGM-UHFFFAOYSA-N 0.000 description 1
- ZRJAHFLFCRNNMR-UHFFFAOYSA-N 3-amino-2-(4-aminophenyl)benzoic acid Chemical compound C1=CC(N)=CC=C1C1=C(N)C=CC=C1C(O)=O ZRJAHFLFCRNNMR-UHFFFAOYSA-N 0.000 description 1
- ICNFHJVPAJKPHW-UHFFFAOYSA-N 4,4'-Thiodianiline Chemical compound C1=CC(N)=CC=C1SC1=CC=C(N)C=C1 ICNFHJVPAJKPHW-UHFFFAOYSA-N 0.000 description 1
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 1
- LFBALUPVVFCEPA-UHFFFAOYSA-N 4-(3,4-dicarboxyphenyl)phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)C(C(O)=O)=C1 LFBALUPVVFCEPA-UHFFFAOYSA-N 0.000 description 1
- AVCOFPOLGHKJQB-UHFFFAOYSA-N 4-(3,4-dicarboxyphenyl)sulfonylphthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1S(=O)(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 AVCOFPOLGHKJQB-UHFFFAOYSA-N 0.000 description 1
- FPNXMUZTKHUSRQ-UHFFFAOYSA-N 4-(4-amino-4-methylcyclohexa-1,5-dien-1-yl)-2-methylaniline Chemical group C1=C(N)C(C)=CC(C=2C=CC(C)(N)CC=2)=C1 FPNXMUZTKHUSRQ-UHFFFAOYSA-N 0.000 description 1
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 1
- IWXCYYWDGDDPAC-UHFFFAOYSA-N 4-[(3,4-dicarboxyphenyl)methyl]phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1CC1=CC=C(C(O)=O)C(C(O)=O)=C1 IWXCYYWDGDDPAC-UHFFFAOYSA-N 0.000 description 1
- OSGFBINRYVUILV-UHFFFAOYSA-N 4-[(4-aminophenyl)-diethylsilyl]aniline Chemical compound C=1C=C(N)C=CC=1[Si](CC)(CC)C1=CC=C(N)C=C1 OSGFBINRYVUILV-UHFFFAOYSA-N 0.000 description 1
- BLMSGSGJGUHKFW-UHFFFAOYSA-N 4-[(4-aminophenyl)-diphenylsilyl]aniline Chemical compound C1=CC(N)=CC=C1[Si](C=1C=CC(N)=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 BLMSGSGJGUHKFW-UHFFFAOYSA-N 0.000 description 1
- NMLVVZNIIWJNTI-UHFFFAOYSA-N 4-[(4-aminophenyl)-ethylphosphoryl]aniline Chemical compound C=1C=C(N)C=CC=1P(=O)(CC)C1=CC=C(N)C=C1 NMLVVZNIIWJNTI-UHFFFAOYSA-N 0.000 description 1
- KTZLSMUPEJXXBO-UHFFFAOYSA-N 4-[(4-aminophenyl)-phenylphosphoryl]aniline Chemical compound C1=CC(N)=CC=C1P(=O)(C=1C=CC(N)=CC=1)C1=CC=CC=C1 KTZLSMUPEJXXBO-UHFFFAOYSA-N 0.000 description 1
- XESBFJAZUUSMGS-UHFFFAOYSA-N 4-[1-(4-aminophenyl)-2,2,2-trifluoro-1-phenylethyl]aniline Chemical compound C1=CC(N)=CC=C1C(C(F)(F)F)(C=1C=CC(N)=CC=1)C1=CC=CC=C1 XESBFJAZUUSMGS-UHFFFAOYSA-N 0.000 description 1
- HSBOCPVKJMBWTF-UHFFFAOYSA-N 4-[1-(4-aminophenyl)ethyl]aniline Chemical compound C=1C=C(N)C=CC=1C(C)C1=CC=C(N)C=C1 HSBOCPVKJMBWTF-UHFFFAOYSA-N 0.000 description 1
- APXJLYIVOFARRM-UHFFFAOYSA-N 4-[2-(3,4-dicarboxyphenyl)-1,1,1,3,3,3-hexafluoropropan-2-yl]phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1C(C(F)(F)F)(C(F)(F)F)C1=CC=C(C(O)=O)C(C(O)=O)=C1 APXJLYIVOFARRM-UHFFFAOYSA-N 0.000 description 1
- GEYAGBVEAJGCFB-UHFFFAOYSA-N 4-[2-(3,4-dicarboxyphenyl)propan-2-yl]phthalic acid Chemical compound C=1C=C(C(O)=O)C(C(O)=O)=CC=1C(C)(C)C1=CC=C(C(O)=O)C(C(O)=O)=C1 GEYAGBVEAJGCFB-UHFFFAOYSA-N 0.000 description 1
- BEKFRNOZJSYWKZ-UHFFFAOYSA-N 4-[2-(4-aminophenyl)-1,1,1,3,3,3-hexafluoropropan-2-yl]aniline Chemical compound C1=CC(N)=CC=C1C(C(F)(F)F)(C(F)(F)F)C1=CC=C(N)C=C1 BEKFRNOZJSYWKZ-UHFFFAOYSA-N 0.000 description 1
- UHNUHZHQLCGZDA-UHFFFAOYSA-N 4-[2-(4-aminophenyl)ethyl]aniline Chemical compound C1=CC(N)=CC=C1CCC1=CC=C(N)C=C1 UHNUHZHQLCGZDA-UHFFFAOYSA-N 0.000 description 1
- ZYEDGEXYGKWJPB-UHFFFAOYSA-N 4-[2-(4-aminophenyl)propan-2-yl]aniline Chemical compound C=1C=C(N)C=CC=1C(C)(C)C1=CC=C(N)C=C1 ZYEDGEXYGKWJPB-UHFFFAOYSA-N 0.000 description 1
- BMIUMBLWVWZIHD-UHFFFAOYSA-N 4-[3-(4-aminophenyl)propyl]aniline Chemical compound C1=CC(N)=CC=C1CCCC1=CC=C(N)C=C1 BMIUMBLWVWZIHD-UHFFFAOYSA-N 0.000 description 1
- JCRRFJIVUPSNTA-UHFFFAOYSA-N 4-[4-(4-aminophenoxy)phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC(C=C1)=CC=C1OC1=CC=C(N)C=C1 JCRRFJIVUPSNTA-UHFFFAOYSA-N 0.000 description 1
- HWEMDPIPVVFWCB-UHFFFAOYSA-N 4-[4-[1-[4-(4-aminophenoxy)phenyl]-2,2,2-trifluoro-1-phenylethyl]phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=C(C(C=2C=CC=CC=2)(C=2C=CC(OC=3C=CC(N)=CC=3)=CC=2)C(F)(F)F)C=C1 HWEMDPIPVVFWCB-UHFFFAOYSA-N 0.000 description 1
- XSMDVEAKLJDEBE-UHFFFAOYSA-N 4-[4-[2-[4-(4-amino-2-chlorophenoxy)phenyl]-1,1,1,3,3,3-hexafluoropropan-2-yl]phenoxy]-3-chloroaniline Chemical compound ClC1=CC(N)=CC=C1OC1=CC=C(C(C=2C=CC(OC=3C(=CC(N)=CC=3)Cl)=CC=2)(C(F)(F)F)C(F)(F)F)C=C1 XSMDVEAKLJDEBE-UHFFFAOYSA-N 0.000 description 1
- HYDATEKARGDBKU-UHFFFAOYSA-N 4-[4-[4-(4-aminophenoxy)phenyl]phenoxy]aniline Chemical group C1=CC(N)=CC=C1OC1=CC=C(C=2C=CC(OC=3C=CC(N)=CC=3)=CC=2)C=C1 HYDATEKARGDBKU-UHFFFAOYSA-N 0.000 description 1
- HWKHQQCBFMYAJZ-UHFFFAOYSA-N 4-amino-n-(3-aminophenyl)benzamide Chemical compound C1=CC(N)=CC=C1C(=O)NC1=CC=CC(N)=C1 HWKHQQCBFMYAJZ-UHFFFAOYSA-N 0.000 description 1
- LBNFPUAJWZYIOQ-UHFFFAOYSA-N 4-n-(4-aminophenyl)-4-n-methylbenzene-1,4-diamine Chemical compound C=1C=C(N)C=CC=1N(C)C1=CC=C(N)C=C1 LBNFPUAJWZYIOQ-UHFFFAOYSA-N 0.000 description 1
- YFBMJEBQWQBRQJ-UHFFFAOYSA-N 4-n-(4-aminophenyl)-4-n-phenylbenzene-1,4-diamine Chemical compound C1=CC(N)=CC=C1N(C=1C=CC(N)=CC=1)C1=CC=CC=C1 YFBMJEBQWQBRQJ-UHFFFAOYSA-N 0.000 description 1
- BWBOGCDVWRKHOK-UHFFFAOYSA-N 5-[4-(4-amino-2-methoxypentyl)phenyl]-4-methoxypentan-2-amine Chemical compound CC(N)CC(OC)CC1=CC=C(CC(CC(C)N)OC)C=C1 BWBOGCDVWRKHOK-UHFFFAOYSA-N 0.000 description 1
- DUZDWKQSIJVSMY-UHFFFAOYSA-N 5-[4-(6-amino-2-methylhexan-2-yl)phenyl]-5-methylhexan-1-amine Chemical compound NCCCCC(C)(C)C1=CC=C(C(C)(C)CCCCN)C=C1 DUZDWKQSIJVSMY-UHFFFAOYSA-N 0.000 description 1
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- FDLQZKYLHJJBHD-UHFFFAOYSA-N [3-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=CC(CN)=C1 FDLQZKYLHJJBHD-UHFFFAOYSA-N 0.000 description 1
- ISKQADXMHQSTHK-UHFFFAOYSA-N [4-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=C(CN)C=C1 ISKQADXMHQSTHK-UHFFFAOYSA-N 0.000 description 1
- FOLJMFFBEKONJP-UHFFFAOYSA-N adamantane-1,3-diamine Chemical compound C1C(C2)CC3CC1(N)CC2(N)C3 FOLJMFFBEKONJP-UHFFFAOYSA-N 0.000 description 1
- 125000005907 alkyl ester group Chemical group 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- HFACYLZERDEVSX-UHFFFAOYSA-N benzidine Chemical group C1=CC(N)=CC=C1C1=CC=C(N)C=C1 HFACYLZERDEVSX-UHFFFAOYSA-N 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- TUQQUUXMCKXGDI-UHFFFAOYSA-N bis(3-aminophenyl)methanone Chemical compound NC1=CC=CC(C(=O)C=2C=C(N)C=CC=2)=C1 TUQQUUXMCKXGDI-UHFFFAOYSA-N 0.000 description 1
- ZLSMCQSGRWNEGX-UHFFFAOYSA-N bis(4-aminophenyl)methanone Chemical compound C1=CC(N)=CC=C1C(=O)C1=CC=C(N)C=C1 ZLSMCQSGRWNEGX-UHFFFAOYSA-N 0.000 description 1
- WKDNYTOXBCRNPV-UHFFFAOYSA-N bpda Chemical compound C1=C2C(=O)OC(=O)C2=CC(C=2C=C3C(=O)OC(C3=CC=2)=O)=C1 WKDNYTOXBCRNPV-UHFFFAOYSA-N 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- UKJLNMAFNRKWGR-UHFFFAOYSA-N cyclohexatrienamine Chemical group NC1=CC=C=C[CH]1 UKJLNMAFNRKWGR-UHFFFAOYSA-N 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical group C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 1
- 229940018564 m-phenylenediamine Drugs 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- OBKARQMATMRWQZ-UHFFFAOYSA-N naphthalene-1,2,5,6-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C=CC2=C(C(O)=O)C(C(=O)O)=CC=C21 OBKARQMATMRWQZ-UHFFFAOYSA-N 0.000 description 1
- NTNWKDHZTDQSST-UHFFFAOYSA-N naphthalene-1,2-diamine Chemical compound C1=CC=CC2=C(N)C(N)=CC=C21 NTNWKDHZTDQSST-UHFFFAOYSA-N 0.000 description 1
- OLAPPGSPBNVTRF-UHFFFAOYSA-N naphthalene-1,4,5,8-tetracarboxylic acid Chemical compound C1=CC(C(O)=O)=C2C(C(=O)O)=CC=C(C(O)=O)C2=C1C(O)=O OLAPPGSPBNVTRF-UHFFFAOYSA-N 0.000 description 1
- OKBVMLGZPNDWJK-UHFFFAOYSA-N naphthalene-1,4-diamine Chemical compound C1=CC=C2C(N)=CC=C(N)C2=C1 OKBVMLGZPNDWJK-UHFFFAOYSA-N 0.000 description 1
- KQSABULTKYLFEV-UHFFFAOYSA-N naphthalene-1,5-diamine Chemical compound C1=CC=C2C(N)=CC=CC2=C1N KQSABULTKYLFEV-UHFFFAOYSA-N 0.000 description 1
- WSKHYOXDVZCOJP-UHFFFAOYSA-N naphthalene-1,6-diamine Chemical compound NC1=CC=CC2=CC(N)=CC=C21 WSKHYOXDVZCOJP-UHFFFAOYSA-N 0.000 description 1
- ZDWYJINCYGEEJB-UHFFFAOYSA-N naphthalene-1,7-diamine Chemical compound C1=CC=C(N)C2=CC(N)=CC=C21 ZDWYJINCYGEEJB-UHFFFAOYSA-N 0.000 description 1
- DOBFTMLCEYUAQC-UHFFFAOYSA-N naphthalene-2,3,6,7-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C=C2C=C(C(O)=O)C(C(=O)O)=CC2=C1 DOBFTMLCEYUAQC-UHFFFAOYSA-N 0.000 description 1
- GOGZBMRXLADNEV-UHFFFAOYSA-N naphthalene-2,6-diamine Chemical compound C1=C(N)C=CC2=CC(N)=CC=C21 GOGZBMRXLADNEV-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- FVDOBFPYBSDRKH-UHFFFAOYSA-N perylene-3,4,9,10-tetracarboxylic acid Chemical group C=12C3=CC=C(C(O)=O)C2=C(C(O)=O)C=CC=1C1=CC=C(C(O)=O)C2=C1C3=CC=C2C(=O)O FVDOBFPYBSDRKH-UHFFFAOYSA-N 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- VHNQIURBCCNWDN-UHFFFAOYSA-N pyridine-2,6-diamine Chemical compound NC1=CC=CC(N)=N1 VHNQIURBCCNWDN-UHFFFAOYSA-N 0.000 description 1
- ABYXFACYSGVHCW-UHFFFAOYSA-N pyridine-3,5-diamine Chemical compound NC1=CN=CC(N)=C1 ABYXFACYSGVHCW-UHFFFAOYSA-N 0.000 description 1
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Landscapes
- Laminated Bodies (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、耐熱性、密着性に優
れ、製造時に金属面とポリイミド前駆体樹脂乾燥面との
付着がなく生産性のよいポリイミド系フレキシブルプリ
ント回路用基板の製造方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing a polyimide-based flexible printed circuit board which is excellent in heat resistance and adhesiveness and has high productivity with no adhesion between a metal surface and a polyimide precursor resin dry surface during production. .
【0002】[0002]
【従来の技術】従来のポリイミド系フレキシブルプリン
ト回路用基板は、ポリイミドフィルムと金属箔とを接着
剤によって接着するか、また金属箔上に、ポリイミド前
駆体樹脂溶液を直接流延塗布し加熱硬化して製造されて
いる。2. Description of the Related Art A conventional polyimide-based flexible printed circuit board is prepared by bonding a polyimide film and a metal foil with an adhesive, or by directly casting a polyimide precursor resin solution on the metal foil and heat-curing it. Are manufactured.
【0003】しかしながら、前者のポリイミドフィルム
と金属箔とを接着剤によって接着したものは、接着剤の
耐熱性が低くポリイミドフィルムの最大の利点である耐
熱性が十分生かされないという欠点があった。また、後
者の金属箔上に、ポリイミド前駆体樹脂溶液を直接流延
塗布し加熱硬化させるものは、信頼性のあるポリイミド
フィルムを得るために高温で長時間硬化させる必要があ
り、生産設備が高価なものとなってしまう欠点がある。
そこで、金属箔上に、ポリイミド前駆体樹脂溶液を直接
流延塗布し加熱乾燥した後、金属箔を巻き取った状態で
加熱硬化させる方法が提案されている。しかし、この方
法では、金属箔上に、ポリイミド前駆体樹脂溶液を直接
流延塗布し加熱乾燥した後、金属箔を巻き取るため、塗
布面と塗布しない金属箔表面が接触し、金属箔表面に樹
脂が付着したり、フィルム自体が形成されないという欠
点があった。However, the former polyimide film and metal foil bonded with an adhesive has a drawback that the heat resistance of the adhesive is low and the heat resistance, which is the greatest advantage of the polyimide film, cannot be fully utilized. On the other hand, the latter metal foil, which is directly cast and coated with a polyimide precursor resin solution and heat-cured, needs to be cured at a high temperature for a long time in order to obtain a reliable polyimide film, and the production equipment is expensive. There is a disadvantage that it becomes a thing.
Therefore, a method has been proposed in which a polyimide precursor resin solution is directly cast onto a metal foil, heated and dried, and then the metal foil is wound and cured by heating. However, in this method, on the metal foil, the polyimide precursor resin solution is directly cast and applied, and after heating and drying, since the metal foil is wound up, the coated surface and the uncoated metal foil surface come into contact with each other, and There is a drawback that the resin does not adhere and the film itself is not formed.
【0004】[0004]
【発明が解決しようとする課題】本発明は、上記の欠点
を解消するためになされたもので、耐熱性、密着性に優
れ、その製造時においても、高価な製造設備を必要とせ
ずに、金属箔面と樹脂との付着がなく、フィルム形成性
のよい信頼性の高いフレキシブルプリント回路用基板の
製造方法を提供しようとするものである。SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned drawbacks and is excellent in heat resistance and adhesion, and does not require expensive manufacturing equipment at the time of manufacturing the same. An object of the present invention is to provide a highly reliable method for producing a flexible printed circuit board, which is free from adhesion of a metal foil surface to a resin and has good film formability.
【0005】[0005]
【課題を解決するための手段】本発明者は、上記の目的
を達成しようと鋭意研究を重ねた結果、塗布するポリイ
ミド前駆体樹脂溶液の溶剤として特定の混合溶剤を用い
たことによって、上記の目的を達成できることを見いだ
し、本発明を完成したものである。Means for Solving the Problems As a result of earnest studies to achieve the above object, the present inventor has found that the use of a specific mixed solvent as a solvent for a polyimide precursor resin solution to be coated results in The inventors have found that the object can be achieved and completed the present invention.
【0006】即ち、本発明は、金属箔上に、溶剤に溶解
したポリイミド前駆体樹脂溶液を直接流延塗布し加熱乾
燥した後、金属箔を巻取加熱してポリイミド前駆体樹脂
を硬化するフレキシブルプリント回路用基板において、
前記前駆体樹脂溶液の溶剤が高沸点の極性溶剤と低沸点
の溶剤との混合溶剤であることを特徴とするフレキシブ
ルプリント回路用基板の製造方法である。That is, according to the present invention, a flexible polyimide precursor resin solution dissolved in a solvent is directly cast on a metal foil, heated and dried, and then the metal foil is wound and heated to cure the polyimide precursor resin. In printed circuit boards,
In the method for manufacturing a flexible printed circuit board, the solvent of the precursor resin solution is a mixed solvent of a polar solvent having a high boiling point and a solvent having a low boiling point.
【0007】以下、本発明を詳細に説明する。The present invention will be described in detail below.
【0008】本発明に用いる金属箔としては、フレキシ
ブルプリント回路用基板の導体として用いるもので銅
箔、ニッケル箔、アルミニウム箔等があげられる。これ
らの金属箔は、厚さが 5〜200 μm のものであることが
望ましい。The metal foil used in the present invention is used as a conductor of a flexible printed circuit board, and examples thereof include copper foil, nickel foil, and aluminum foil. It is desirable that these metal foils have a thickness of 5 to 200 μm.
【0009】本発明に用いるポリイミド前駆体樹脂溶液
としては、ポリイミド前駆体樹脂を混合溶剤で溶解した
ものである。このポリイミド前駆体樹脂としては、ジア
ミンとテトラカルボン酸の単独又は共重合によって合成
される前駆体樹脂および数種の前駆体樹脂の混合物等を
使用することができる。ここで用いるジアミンとしては
例えば、m-フェニレンジアミン、p-フェニレンジアミ
ン、1,3-ビス(4-アミノフェニル)プロパン、2,2-ビス
(4-アミノフェニル)プロパン、1,2-ビス(4-アミノフ
ェニル)エタン、1,1-ビス(4-アミノフェニル)エタ
ン、 4,4′−ジアミノジフェニルメタン、 2,2′−ジア
ミノジエチルスルフィド、 2,4′−ジアミノジフェニル
スルフィド、ビス(4-アミノフェニル)スルフィド、ビ
ス(3-アミノフェニル)スルホン、ビス(4-アミノフェ
ニル)スルホン、 4,4′−ジアミノジベンジルスルホキ
シド、ビス(3-アミノフェニル)エ―テル、ビス(4-ア
ミノフェニル)エ―テル、ビス(4-アミノフェニル)ジ
エチルシラン、ビス(4-アミノフェニル)ジフェニルシ
ラン、ビス(4-アミノフェニル)エチルホスフィンオキ
シド、ビス(4-アミノフェニル)フェニルホスフィンオ
キシド、ビス(4-アミノフェニル)−N−フェニルアミ
ン、ビス(4-アミノフェニル)−N−メチルアミン、1,
2-ジアミノナフタレン、1,4-ジアミノナフタレン、1,5-
ジアミノナフタレン、1,6-ジアミノナフタレン、1,7-ジ
アミノナフタレン、1,8-ジアミノナフタレン、 2.3−ジ
アミノナフタレン、2,6-ジアミノナフタレン、1,4-ジア
ミノ-2−メチルナフタレン、1,5-ジアミノ−2-メチルナ
フタレン、1,3-ジアミノ−2-フェニルナフタレン、 4,
4′−ジアミノビフェニル、 3,3′−ジアミノビフェニ
ル、 3,3′−ジクロロ-4,4′−ジアミノビフェニル、
3,3′−ジメチル-4,4′−ジアミノビフェニル、 3,4′
−ジメチル-4,4′−ジアミノビフェニル、 3,3′−ジメ
トキシ-4,4′−ジアミノビフェニル、 4,4′−ビス(4-
アミノフェノキシ)ビフェニル、2,4-ジアミノトルエ
ン、2,5-ジアミノトルエン、2,6-ジアミノトルエン、1,
3-ジアミノ−2,5-ジクロロベンゼン、1,4-ジアミノ−2,
5-ジクロロベンゼン、1-メトキシ−2,4-ジアミノベンゼ
ン、1,4-ジアミノ−2-メトキシ−5-メチルベンゼン、1,
4-ジアミノ−2,3,5,6-テトラメチルベンゼン、1,4-ビス
(2-メトキシ−4-アミノペンチル)ベンゼン、1,4-ビス
(1,1-ジメチル-5−アミノペンチル)ベンゼン、1,4-ビ
ス(4-アミノフェノキシ)ベンゼン、o-キシレンジアミ
ン、m-キシレンジアミン、p-キシレンジアミン、 3,3′
−ジアミノベンゾフェノン、 4,4′−ジアミノベンゾフ
ェノン、2,6-ジアミノピリジン、3,5-ジアミノピリジ
ン、1,3-ジアミノアダマンタン、 3,3′−ジアミノ-1,
1,1′−ジアダマンタン、N−(3-アミノフェニル)-4
−アミノベンズアミド、4-アミノフェニル-3−アミノベ
ンゾエ―ト、2,2-ビス(4-アミノフェニル)ヘキサフル
オロプロパン、2,2-ビス(3-アミノフェニル)ヘキサフ
ルオロプロパン、2-(3-アミノフェニル)-2−(4-アミ
ノフェニル)ヘキサフルオロプロパン、2,2-ビス[4-
(4-アミノフェノキシ)ヘキサフルオロプロパン、2,2-
ビス[4-(2-クロロ-4−アミノフェノキシ)フェニル]
ヘキサフルオロプロパン、1,1-ビス(4-アミノフェニ
ル)-1−フェニル−2,2,2-トリフルオロエタン、1,1-ビ
ス[4-(4-アミノフェノキシ)フェニル]-1−フェニル
-2,2,2-トリフルオロエタン、1,4-ビス(3-アミノフェ
ニル)ブタ-1−エン-3−イン、1,3-ビス(3-アミノフェ
ニル)ヘキサフルオロプロパン、1,3-ビス(3-アミノフ
ェニル)デカフルオロプロパン等が挙げられ、これらは
単独又は 2種以上混合して使用することができる。ま
た、テトラカルボン酸としては例えば、ピロメリット
酸、1,2,3,4-ベンゼンテトラカルボン酸、 3,3′,4,4′
−ビフェニルテトラカルボン酸、 2,3,3′,4′−ビフェ
ニルテトラカルボン酸、3,3′,4,4′−ビフェニルエ―
テルテトラカルボン酸、 2,3,3′,4′−ビフェニルエ―
テルテトラカルボン酸、2,2-ビス(3,4-ジカルボキシフ
ェニル)プロパン、2,2-ビス(2,3-ジカルボキシフェニ
ル)プロパン、ビス(3,4-ジカルボキシフェニル)メタ
ン、ビス(2,3-ジカルボキシフェニル)メタン、1,1-ビ
ス(2,3-ジカルボキシフェニル)エタン、2,2-ビス(3,
4-ジカルボキシフェニル)ヘキサフルオロプロパン、
3,3′,4,4′−ジフェニルスルホンテトラカルボン酸、
2,3,3′,4′−ジフェニルスルホンテトラカルボン酸、
2,3,6,7-ナフタレンテトラカルボン酸、1,4,5,8-ナフタ
レンテトラカルボン酸、1,2,5,6-ナフタレンテトラカル
ボン酸、 3,4,9,10-テトラカルボキシペリレン、2,2-ビ
ス[4-(3,4-ジカルボキシフェノキシ)フェニル]プロ
パン、2,2-ビス[4-(3,4-ジカルボキシフェノキシ)フ
ェニル]ヘキサフルオロパン等の無水物又はその低級ア
ルキルエステル等が挙げられ、これらは単独又は混合し
て使用することができる。The polyimide precursor resin solution used in the present invention is a solution of polyimide precursor resin dissolved in a mixed solvent. As the polyimide precursor resin, a precursor resin synthesized by homopolymerization or copolymerization of diamine and tetracarboxylic acid, a mixture of several kinds of precursor resins, and the like can be used. Examples of the diamine used here include m-phenylenediamine, p-phenylenediamine, 1,3-bis (4-aminophenyl) propane, 2,2-bis (4-aminophenyl) propane, 1,2-bis ( 4-aminophenyl) ethane, 1,1-bis (4-aminophenyl) ethane, 4,4′-diaminodiphenylmethane, 2,2′-diaminodiethyl sulfide, 2,4′-diaminodiphenyl sulfide, bis (4- Aminophenyl) sulfide, bis (3-aminophenyl) sulfone, bis (4-aminophenyl) sulfone, 4,4'-diaminodibenzyl sulfoxide, bis (3-aminophenyl) ether, bis (4-aminophenyl) ) Ether, bis (4-aminophenyl) diethylsilane, bis (4-aminophenyl) diphenylsilane, bis (4-aminophenyl) ethylphosphine oxide, bis (4 -Aminophenyl) phenylphosphine oxide, bis (4-aminophenyl) -N-phenylamine, bis (4-aminophenyl) -N-methylamine, 1,
2-diaminonaphthalene, 1,4-diaminonaphthalene, 1,5-
Diaminonaphthalene, 1,6-diaminonaphthalene, 1,7-diaminonaphthalene, 1,8-diaminonaphthalene, 2.3-diaminonaphthalene, 2,6-diaminonaphthalene, 1,4-diamino-2-methylnaphthalene, 1,5 -Diamino-2-methylnaphthalene, 1,3-diamino-2-phenylnaphthalene, 4,
4'-diaminobiphenyl, 3,3'-diaminobiphenyl, 3,3'-dichloro-4,4'-diaminobiphenyl,
3,3'-Dimethyl-4,4'-diaminobiphenyl, 3,4 '
-Dimethyl-4,4'-diaminobiphenyl, 3,3'-dimethoxy-4,4'-diaminobiphenyl, 4,4'-bis (4-
Aminophenoxy) biphenyl, 2,4-diaminotoluene, 2,5-diaminotoluene, 2,6-diaminotoluene, 1,
3-diamino-2,5-dichlorobenzene, 1,4-diamino-2,
5-dichlorobenzene, 1-methoxy-2,4-diaminobenzene, 1,4-diamino-2-methoxy-5-methylbenzene, 1,
4-diamino-2,3,5,6-tetramethylbenzene, 1,4-bis (2-methoxy-4-aminopentyl) benzene, 1,4-bis (1,1-dimethyl-5-aminopentyl) Benzene, 1,4-bis (4-aminophenoxy) benzene, o-xylenediamine, m-xylenediamine, p-xylenediamine, 3,3 '
-Diaminobenzophenone, 4,4'-diaminobenzophenone, 2,6-diaminopyridine, 3,5-diaminopyridine, 1,3-diaminoadamantane, 3,3'-diamino-1,
1,1'-diadamantane, N- (3-aminophenyl) -4
-Aminobenzamide, 4-aminophenyl-3-aminobenzoate, 2,2-bis (4-aminophenyl) hexafluoropropane, 2,2-bis (3-aminophenyl) hexafluoropropane, 2- (3- Aminophenyl) -2- (4-aminophenyl) hexafluoropropane, 2,2-bis [4-
(4-Aminophenoxy) hexafluoropropane, 2,2-
Bis [4- (2-chloro-4-aminophenoxy) phenyl]
Hexafluoropropane, 1,1-bis (4-aminophenyl) -1-phenyl-2,2,2-trifluoroethane, 1,1-bis [4- (4-aminophenoxy) phenyl] -1-phenyl
-2,2,2-trifluoroethane, 1,4-bis (3-aminophenyl) but-1-ene-3-yne, 1,3-bis (3-aminophenyl) hexafluoropropane, 1,3 -Bis (3-aminophenyl) decafluoropropane and the like can be mentioned, and these can be used alone or in combination of two or more kinds. Further, as the tetracarboxylic acid, for example, pyromellitic acid, 1,2,3,4-benzenetetracarboxylic acid, 3,3 ′, 4,4 ′
-Biphenyl tetracarboxylic acid, 2,3,3 ', 4'-biphenyl tetracarboxylic acid, 3,3', 4,4'-biphenyl ether-
Tertetracarboxylic acid, 2,3,3 ', 4'-biphenyl ether
Tertetracarboxylic acid, 2,2-bis (3,4-dicarboxyphenyl) propane, 2,2-bis (2,3-dicarboxyphenyl) propane, bis (3,4-dicarboxyphenyl) methane, bis (2,3-dicarboxyphenyl) methane, 1,1-bis (2,3-dicarboxyphenyl) ethane, 2,2-bis (3,
4-dicarboxyphenyl) hexafluoropropane,
3,3 ′, 4,4′-diphenylsulfone tetracarboxylic acid,
2,3,3 ', 4'-diphenylsulfone tetracarboxylic acid,
2,3,6,7-naphthalene tetracarboxylic acid, 1,4,5,8-naphthalene tetracarboxylic acid, 1,2,5,6-naphthalene tetracarboxylic acid, 3,4,9,10-tetracarboxyperylene , 2-bis [4- (3,4-dicarboxyphenoxy) phenyl] propane, 2,2-bis [4- (3,4-dicarboxyphenoxy) phenyl] hexafluoropan, etc. Lower alkyl esters and the like can be mentioned, and these can be used alone or in combination.
【0010】ジアミンとテトラカルボン酸との反応は、
できる限り等モルで行うことが好ましく、重合度も大き
くなる。いずれか一方の成分が 5%を超えると重合度が
著しく低下し、被膜形成性が悪く好ましくない。また、
ジアミン類の酸化を防止するため反応は、不活性ガス雰
囲気中で行われることが好ましく、一般に乾燥窒素ガス
が使用される。The reaction between diamine and tetracarboxylic acid is
It is preferable to carry out in equimolar amount as much as possible, and the degree of polymerization also becomes large. If either one of the components exceeds 5%, the degree of polymerization is remarkably lowered, and the film forming property is poor, which is not preferable. Also,
The reaction is preferably carried out in an inert gas atmosphere in order to prevent the oxidation of diamines, and dry nitrogen gas is generally used.
【0011】本発明に用いる混合溶剤としては、高沸点
の極性溶剤と低沸点の溶剤とを混合したものである。高
沸点の極性溶剤としては、N−メチル−2-ピロリドン、
N,N−ジメチルホルムアミド、N,N−ジメチルアセ
トアミド、ジメチルスルホオキサイド、フェノール、ハ
ロゲン化フェノール等が挙げられ、これらは単独又は混
合して使用することができる。また、低沸点の溶剤とし
ては、テトラヒドロフラン等が挙げられ、これらは単独
又は混合して使用することができる。混合溶剤中での低
沸点の溶剤の割合は、 5〜50%であることが望ましい。
5%未満では乾燥時の溶剤の揮発効果が十分でなく、ま
た50%を超えるとポリイミド前駆体であるポリアミック
酸が溶解せず好ましくない。ポリイミド前駆体に混合溶
剤を加える方法としては、高沸点の極性溶剤と低沸点の
溶剤とを混合した混合溶剤を加えるが、予めポリイミド
前駆体を高沸点の極性溶剤で溶解した後、所定割合にな
るように、低沸点溶剤を加えることもできる。このよう
にしてポリイミド前駆体を混合溶剤に溶解してポリイミ
ド前駆体樹脂溶液とすることができる。The mixed solvent used in the present invention is a mixture of a high boiling point polar solvent and a low boiling point solvent. As the high boiling point polar solvent, N-methyl-2-pyrrolidone,
Examples thereof include N, N-dimethylformamide, N, N-dimethylacetamide, dimethylsulfoxide, phenol and halogenated phenol, and these can be used alone or in combination. Further, examples of the low boiling point solvent include tetrahydrofuran and the like, and these can be used alone or in combination. The proportion of the low boiling point solvent in the mixed solvent is preferably 5 to 50%.
If it is less than 5%, the volatilizing effect of the solvent during drying is not sufficient, and if it exceeds 50%, the polyamic acid as the polyimide precursor is not dissolved, which is not preferable. As a method of adding a mixed solvent to the polyimide precursor, a mixed solvent prepared by mixing a high-boiling point polar solvent and a low-boiling point solvent is added, but after dissolving the polyimide precursor in the high-boiling point polar solvent in advance, at a predetermined ratio. As such, a low boiling point solvent can be added. In this way, the polyimide precursor can be dissolved in the mixed solvent to form a polyimide precursor resin solution.
【0012】こうして得られたポリイミド前駆体樹脂溶
液を金属箔に塗布する。塗布する方法としては、バーコ
ーター、ロールコーター、ナイフコーター、ドクターブ
レード、フローコーター等の公知の塗布手段で30〜1000
μm の均一な厚さに流延塗布する。次に、加熱乾燥によ
ってポリイミド前駆体樹脂溶液をフィルム状態にする。
この時の加熱は、80〜200 ℃で低温から徐々に高くなる
ように加熱する。乾燥後これを金属筒等に巻き取り最終
的に 200〜350 ℃で後硬化してイミド化を行う。金属筒
等に巻き取る方法は、金属箔面又はポリイミドフィルム
面を表にして巻き取ってもよい。従って、金属箔や耐熱
性フィルムをともまきする必要もない。加熱硬化の雰囲
気は、空気中で差支えない場合もあるが減圧下又は不活
性ガスを流しながら、非酸化状態下で行うことが好まし
い。こうしてフレキシブルプリント回路用基板を得るこ
とができる。The polyimide precursor resin solution thus obtained is applied to a metal foil. As a coating method, a known coating means such as a bar coater, a roll coater, a knife coater, a doctor blade, a flow coater, etc., is used for 30 to 1000.
Cast coating to a uniform thickness of μm. Next, the polyimide precursor resin solution is made into a film state by heating and drying.
At this time, the heating is performed at a temperature of 80 to 200 ° C so that the temperature gradually rises from a low temperature. After drying, it is wound on a metal tube or the like and finally post-cured at 200 to 350 ° C. for imidization. As a method of winding the metal cylinder or the like, the metal foil surface or the polyimide film surface may be faced up. Therefore, it is not necessary to wind the metal foil or the heat resistant film. The heat-curing atmosphere may be in air, but it is preferably performed under reduced pressure or under a non-oxidized state while flowing an inert gas. In this way, a flexible printed circuit board can be obtained.
【0013】[0013]
【作用】本発明のフレキシブルプリント回路用基板の製
造方法は、ポリイミド前駆体樹脂の溶剤として特定の混
合溶剤を使用したことによって、製造時に金属面と樹脂
乾燥面との付着がなく、フィルム形成能力がよく、耐熱
性、密着性に優れた信頼性の高いものを得ることができ
る。In the method for manufacturing a flexible printed circuit board of the present invention, since a specific mixed solvent is used as a solvent for the polyimide precursor resin, there is no adhesion between the metal surface and the resin dry surface during manufacturing, and the film forming ability is improved. It is possible to obtain a highly reliable product having excellent heat resistance and adhesiveness.
【0014】[0014]
【実施例】次に本発明を実施例によって説明するが、本
発明はこれらの実施例によって限定されるものではな
い。EXAMPLES Next, the present invention will be described with reference to examples, but the present invention is not limited to these examples.
【0015】実施例1 攪拌機、冷却器および窒素導入管を設けたフラスコにパ
ラフェニレンジアミン5.4g ( 0.05mol)とN−メチル-
2−ピロリドン80.4g を投入し溶解した。この溶液に室
温で乾燥窒素雰囲気下にて 3,3′,4,4′−ビフェニルテ
トラカルボン酸二無水物14.7g ( 0.05mol)を溶液の温
度上昇に注意しながら加え12時間攪拌反応させてポリア
ミック酸樹脂溶液(A)を得た。Example 1 A flask equipped with a stirrer, a condenser and a nitrogen inlet tube was equipped with 5.4 g (0.05 mol) of paraphenylenediamine and N-methyl-.
2-Pyrrolidone (80.4 g) was added and dissolved. 14.7 g (0.05 mol) of 3,3 ', 4,4'-biphenyltetracarboxylic dianhydride was added to this solution at room temperature in a dry nitrogen atmosphere while paying attention to the temperature rise of the solution, and the reaction was stirred for 12 hours. A polyamic acid resin solution (A) was obtained.
【0016】前記と同様にして設けたフラスコにジアミ
ノジフェニルエーテル 5.0g ( 0.05mol)とNメチル−
2-ピロリドン63.6g を投入し溶解した。この溶液に室温
で乾燥窒素雰囲気下にてピロメリット酸二無水物10.9g
( 0.05mol)を溶液の温度上昇に注意しながら加え12時
間攪拌反応させてポリアミック酸樹脂溶液(B)を得
た。In a flask prepared in the same manner as above, 5.0 g (0.05 mol) of diaminodiphenyl ether and N-methyl-
2-Pyrrolidone (63.6 g) was added and dissolved. 10.9 g of pyromellitic dianhydride was added to this solution at room temperature under a dry nitrogen atmosphere.
(0.05 mol) was added while paying attention to the temperature rise of the solution, and the mixture was stirred and reacted for 12 hours to obtain a polyamic acid resin solution (B).
【0017】ポリアミック酸樹脂溶液(A)50g にポリ
アミック酸樹脂溶液(B)50g を加えて攪拌しポリアミ
ック酸樹脂混合溶液を得た。このポリアミック酸樹脂混
合溶液 100g にテトラヒドロフラン25g を加えて攪拌し
ポリイミド前駆体樹脂溶液を得た。50 g of the polyamic acid resin solution (B) was added to 50 g of the polyamic acid resin solution (A) and stirred to obtain a polyamic acid resin mixed solution. 25 g of tetrahydrofuran was added to 100 g of this mixed solution of polyamic acid resin and stirred to obtain a polyimide precursor resin solution.
【0018】比較例1 実施例1と同様な方法で合成したポリアミック酸樹脂混
合溶液 100g にN−メチル−2-ピロリドン25.0g を加え
て攪拌し、ポリイミド前駆体樹脂溶液を得た。Comparative Example 1 25.0 g of N-methyl-2-pyrrolidone was added to 100 g of a mixed solution of a polyamic acid resin synthesized by the same method as in Example 1 and stirred to obtain a polyimide precursor resin solution.
【0019】比較例2 比較例1と同様な方法で合成したポリアミック酸樹脂混
合溶液 100g にN,N−ジメチルアセトアミドを25.0g
加えて攪拌し、ポリイミド前駆体樹脂溶液を得た。Comparative Example 2 25.0 g of N, N-dimethylacetamide was added to 100 g of a polyamic acid resin mixed solution prepared in the same manner as in Comparative Example 1.
The mixture was added and stirred to obtain a polyimide precursor resin solution.
【0020】実施例および比較例1〜2で得たポリアミ
ック酸樹脂溶液(ポリイミド前駆体樹脂溶液)を、バー
コーターで厚さ35μm の銅箔に塗布し、80℃から 120℃
まで徐々に加熱乾燥させた。乾燥後その金属箔をそのま
ま巻き取り 300℃まで徐々に加熱硬化してフレキシブル
プリント回路用基板を製造した。得られたフレキシブル
プリント回路用基板について、塗布面と金属箔面との付
着性、ピール強度について試験したのでその結果を表1
に示した。本発明はいずれの特性においても優れてお
り、本発明の効果を確認することができた。The polyamic acid resin solution (polyimide precursor resin solution) obtained in Examples and Comparative Examples 1 and 2 was applied to a copper foil having a thickness of 35 μm with a bar coater, and the temperature was from 80 ° C to 120 ° C.
It was gradually heated to dryness. After drying, the metal foil was wound up as it was and gradually heated and cured to 300 ° C. to manufacture a flexible printed circuit board. The obtained flexible printed circuit board was tested for adhesion between the coated surface and the metal foil surface and peel strength. The results are shown in Table 1.
It was shown to. The present invention is excellent in all characteristics, and the effects of the present invention could be confirmed.
【0021】[0021]
【表1】 *1 :○印…付着が全くなくカールもない、×印…付着
した。[Table 1] * 1: ○: No adhesion and no curl, ×: Adhesion
【0022】[0022]
【発明の効果】以上の説明および表1から明らかなよう
に、本発明のフレキシブルプリント回路用基板の製造方
法は、耐熱性、密着性に優れ、金属箔面と樹脂面の付着
がなく、フィルム形成能力があり、生産性がよく信頼性
の高いものである。As is clear from the above description and Table 1, the method for manufacturing a flexible printed circuit board of the present invention is excellent in heat resistance and adhesiveness, does not adhere to the metal foil surface and the resin surface, and is a film. It has forming ability, high productivity and high reliability.
Claims (1)
前駆体樹脂溶液を直接流延塗布し加熱乾燥した後、金属
箔を巻取加熱してポリイミド前駆体樹脂を硬化するフレ
キシブルプリント回路用基板の製造方法において、前記
前駆体樹脂溶液の溶剤が高沸点の極性溶剤と低沸点の溶
剤との混合溶剤であることを特徴とするフレキシブルプ
リント回路用基板の製造方法。1. A substrate for a flexible printed circuit in which a polyimide precursor resin solution dissolved in a solvent is directly cast onto a metal foil, heat-dried, and then the metal foil is wound and heated to cure the polyimide precursor resin. The method for producing a flexible printed circuit board according to claim 1, wherein the solvent of the precursor resin solution is a mixed solvent of a polar solvent having a high boiling point and a solvent having a low boiling point.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP31113093A JPH07142827A (en) | 1993-11-17 | 1993-11-17 | Manufacture of flexible printed circuit board |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP31113093A JPH07142827A (en) | 1993-11-17 | 1993-11-17 | Manufacture of flexible printed circuit board |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH07142827A true JPH07142827A (en) | 1995-06-02 |
Family
ID=18013497
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP31113093A Pending JPH07142827A (en) | 1993-11-17 | 1993-11-17 | Manufacture of flexible printed circuit board |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH07142827A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6052066A (en) * | 1996-10-31 | 2000-04-18 | University Of Florida Research Foundation, Inc. | Remote monitoring system for detecting termites |
US6404210B1 (en) | 1999-03-02 | 2002-06-11 | University Of Florida Research Foundation, Inc. | Dimensionally stable sensor for monitoring termite activity |
US6551729B2 (en) | 2000-08-24 | 2003-04-22 | Murata Manufacturing Co. Ltd | Conductive paste and ceramic electronic element using the same |
-
1993
- 1993-11-17 JP JP31113093A patent/JPH07142827A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6052066A (en) * | 1996-10-31 | 2000-04-18 | University Of Florida Research Foundation, Inc. | Remote monitoring system for detecting termites |
US6404210B1 (en) | 1999-03-02 | 2002-06-11 | University Of Florida Research Foundation, Inc. | Dimensionally stable sensor for monitoring termite activity |
US6551729B2 (en) | 2000-08-24 | 2003-04-22 | Murata Manufacturing Co. Ltd | Conductive paste and ceramic electronic element using the same |
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