JPH07134137A - Probe microscope device and method for measuring distance between probes - Google Patents
Probe microscope device and method for measuring distance between probesInfo
- Publication number
- JPH07134137A JPH07134137A JP5283415A JP28341593A JPH07134137A JP H07134137 A JPH07134137 A JP H07134137A JP 5283415 A JP5283415 A JP 5283415A JP 28341593 A JP28341593 A JP 28341593A JP H07134137 A JPH07134137 A JP H07134137A
- Authority
- JP
- Japan
- Prior art keywords
- probe
- microscope
- probe microscope
- sample
- stage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000523 sample Substances 0.000 title claims abstract description 214
- 238000000034 method Methods 0.000 title claims description 7
- 238000005259 measurement Methods 0.000 claims abstract description 75
- 239000000463 material Substances 0.000 claims description 3
- 230000010287 polarization Effects 0.000 claims description 3
- 230000003287 optical effect Effects 0.000 abstract description 22
- 230000000007 visual effect Effects 0.000 abstract description 4
- 238000010586 diagram Methods 0.000 description 6
- 239000000758 substrate Substances 0.000 description 4
- 238000006073 displacement reaction Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000004611 spectroscopical analysis Methods 0.000 description 2
- 230000005641 tunneling Effects 0.000 description 2
- 208000019901 Anxiety disease Diseases 0.000 description 1
- 230000036506 anxiety Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q30/00—Auxiliary means serving to assist or improve the scanning probe techniques or apparatus, e.g. display or data processing devices
- G01Q30/02—Non-SPM analysing devices, e.g. SEM [Scanning Electron Microscope], spectrometer or optical microscope
- G01Q30/025—Optical microscopes coupled with SPM
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q30/00—Auxiliary means serving to assist or improve the scanning probe techniques or apparatus, e.g. display or data processing devices
- G01Q30/04—Display or data processing devices
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q70/00—General aspects of SPM probes, their manufacture or their related instrumentation, insofar as they are not specially adapted to a single SPM technique covered by group G01Q60/00
- G01Q70/06—Probe tip arrays
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
- Radiology & Medical Imaging (AREA)
- Measurement Of Length, Angles, Or The Like Using Electric Or Magnetic Means (AREA)
- Investigating Or Analyzing Materials By The Use Of Magnetic Means (AREA)
Abstract
(57)【要約】
【目的】 プローブ顕微鏡を取り付け取外す交換を行な
うことなく、複数種の測定を行なうことができるプロー
ブ顕微鏡装置の提供。
【構成】 ＸＹステージ２上には試料３が載置されてい
る。又、ブリッジ４には光学顕微鏡５、ＣＣＤカメラ
６、原子間力顕微鏡７および磁気力顕微鏡８が装架され
ている。原子間力顕微鏡７と磁気力顕微鏡８との間の距
離は標準試料１１を用いて予め測定され、記憶されてい
る。試料３の目標個所を光学顕微鏡５の視野に捉えてＸ
Ｙステージ２により原子間力顕微鏡７に対向させ、形状
を測定した後、ＸＹステージ２を記憶されている距離だ
け移動させて目標個所を磁気力顕微鏡８に対向させ、磁
気特性を測定する。
(57) [Abstract] [Purpose] To provide a probe microscope apparatus capable of performing a plurality of types of measurements without the need to attach and detach the probe microscope and exchange. [Structure] A sample 3 is placed on the XY stage 2. An optical microscope 5, a CCD camera 6, an atomic force microscope 7 and a magnetic force microscope 8 are mounted on the bridge 4. The distance between the atomic force microscope 7 and the magnetic force microscope 8 is measured in advance using the standard sample 11 and stored. Capture the target part of the sample 3 in the visual field of the optical microscope 5 and
After the Y stage 2 is made to face the atomic force microscope 7 to measure the shape, the XY stage 2 is moved by the stored distance to make the target point face the magnetic force microscope 8 and the magnetic characteristics are measured.
Description
【０００１】[0001]
【産業上の利用分野】本発明は、トンネル顕微鏡や原子
間力顕微鏡等のプローブ顕微鏡を用いて試料の表面形
状、電気特性、磁気特性等を測定し、又は試料表面を加
工するプローブ顕微鏡装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a probe microscope apparatus for measuring the surface shape, electrical characteristics, magnetic characteristics, etc. of a sample using a probe microscope such as a tunnel microscope or an atomic force microscope, or for processing the sample surface. .
【０００２】[0002]
【従来の技術】プローブ顕微鏡は、先端の尖った探針を
試料に対してナノメートル（ｎｍ）オーダまで接近さ
せ、そのとき探針と試料との間に生じるトンネル電流や
原子間力等を測定することにより、試料表面の形状、電
気特性、磁気特性等を計測し、又は探針により試料表面
を加工する装置である。このようなプローブ顕微鏡を備
えたプローブ顕微鏡装置を図により説明する。2. Description of the Related Art In a probe microscope, a probe with a sharp tip is brought close to the sample to the order of nanometers (nm), and the tunnel current, atomic force, etc. generated between the probe and the sample at that time are measured. By doing so, the apparatus measures the shape, electrical characteristics, magnetic characteristics, etc. of the sample surface, or processes the sample surface with a probe. A probe microscope apparatus equipped with such a probe microscope will be described with reference to the drawings.
【０００３】図７は従来のプローブ顕微鏡装置の側面図
である。この図で、１は基台、２Ｘは基台１に固定され
Ｘ軸方向に駆動されるＸステージ、２ＹはＹ軸方向に駆
動されるＹステージであり、これらでＸＹステージ２が
構成される。３はＸＹステージ２上に載置される測定対
象の試料、４はＸＹステージ２にまたがった状態で基台
１に固定されるブリッジ、５は広視野を得るためブリッ
ジ４に固定される光学顕微鏡、６は光学顕微鏡５で得ら
れた像を撮像するＣＣＤカメラ、７はプローブ顕微鏡の
一種である原子間力顕微鏡、７ａは原子間力顕微鏡７の
カンチレバー、７ｂはカンチレバー７ａの先端の探針で
ある。なお、原子間力顕微鏡７は探針７ｂを試料３に接
近させる接近機構やカンチレバー７ａを走査させる走査
機構を備えているが図示は省略する。FIG. 7 is a side view of a conventional probe microscope apparatus. In this figure, 1 is a base, 2X is an X stage fixed to the base 1 and driven in the X-axis direction, 2Y is a Y stage driven in the Y-axis direction, and these constitute an XY stage 2. . Reference numeral 3 is a sample to be measured placed on the XY stage 2, 4 is a bridge fixed to the base 1 while straddling the XY stage 2, and 5 is an optical microscope fixed to the bridge 4 to obtain a wide field of view. , 6 is a CCD camera for capturing an image obtained by the optical microscope 5, 7 is an atomic force microscope which is a kind of probe microscope, 7a is a cantilever of the atomic force microscope 7, and 7b is a probe at the tip of the cantilever 7a. is there. The atomic force microscope 7 includes an approach mechanism for moving the probe 7b closer to the sample 3 and a scanning mechanism for scanning the cantilever 7a, but the illustration thereof is omitted.
【０００４】次に、上記プローブ顕微鏡装置の動作を簡
単に説明する。通常、探針７ｂの走査範囲は数１００μ
ｍであるので、試料３の測定個所と探針７ｂとを目視に
より対向させることはできない。このため、まず、ＸＹ
ステージ２を駆動して試料３の測定個所を光学顕微鏡５
の視野内に捉え、ＣＣＤカメラ６で撮像し、この像を図
示しない画像処理装置を介して図示しないモニタ装置に
表示する。図８は上記モニタ装置に表示された試料３の
像を示す図である。図で３０は試料３の像を示す。試料
３として、例えば光ディスクが用いられた場合、３１は
トラック、３２はピットであり、Ｐは測定個所を示す。
ｘ1 、ｙ1 は基準点から測定個所までの間隔を示す。Next, the operation of the probe microscope apparatus will be briefly described. Normally, the scanning range of the probe 7b is several 100 μm.
Since it is m, the measurement point of the sample 3 and the probe 7b cannot be visually opposed. Therefore, first, XY
The stage 2 is driven to move the measurement point of the sample 3 to the optical microscope 5
The image is captured by the CCD camera 6 and displayed on a monitor device (not shown) via an image processing device (not shown). FIG. 8 is a diagram showing an image of the sample 3 displayed on the monitor device. In the figure, 30 shows the image of the sample 3. When an optical disk is used as the sample 3, 31 is a track, 32 is a pit, and P is a measurement point.
x 1 and y 1 indicate the distance from the reference point to the measurement point.
【０００５】次いで、上記の間隔ｘ1 、ｙ1 、および光
学顕微鏡５の視野の中心と探針７ｂとの間の距離Ｌ1
（既知の二次元の距離）に基づいて、ＸＹステージ２を
移動させ，試料３の測定個所を探針７ｂと対向する位置
に移動させる。この状態で探針７ｂを試料３の測定個所
に接近させてゆくと、両者間の距離がある距離に達した
とき原子間力が検出され、以後、探針７ｂによる走査が
行われる。この走査により、測定個所Ｐの形状が得られ
る。Next, the above-mentioned intervals x 1 and y 1 and the distance L 1 between the center of the visual field of the optical microscope 5 and the probe 7b.
Based on (known two-dimensional distance), the XY stage 2 is moved to move the measurement point of the sample 3 to a position facing the probe 7b. When the probe 7b is brought closer to the measurement point of the sample 3 in this state, the atomic force is detected when the distance between them reaches a certain distance, and thereafter, the scanning by the probe 7b is performed. The shape of the measurement point P is obtained by this scanning.
【０００６】[0006]
【発明が解決しようとする課題】ところで、プローブ顕
微鏡による測定目的は、１つの試料に対して１つである
とは限らず、むしろ複数種の測定が必要となることが多
い。例えば上記光ディスクの例では、ピット３２の形状
とともに、そこに記憶されている磁気情報を知ることが
必要となる場合が多い。この場合には、磁気情報を知る
ためのプローブ顕微鏡として磁気力顕微鏡が用いられ、
ブリッジ４から原子間力顕微鏡７が取り外され、磁気力
顕微鏡と交換されることとなる。By the way, the purpose of measurement by the probe microscope is not limited to one for one sample, but rather a plurality of types of measurement are often required. For example, in the case of the above-mentioned optical disk, it is often necessary to know the shape of the pit 32 and the magnetic information stored therein. In this case, a magnetic force microscope is used as a probe microscope for knowing magnetic information,
The atomic force microscope 7 is removed from the bridge 4 and replaced with the magnetic force microscope.
【０００７】ここで、プローブ顕微鏡の代表的な種類と
しては、上記の原子間力顕微鏡、磁気力顕微鏡の外に、
走査型プローブ分光法顕微鏡、走査型力顕微鏡（加工
用）、フォトン走査トンネル顕微鏡（形状測定と加工の
両用）がある。一方、広視野を得るための顕微鏡（広視
野顕微鏡）としては、上記の光学顕微鏡５の外に、偏光
顕微鏡、電子顕微鏡等がある。そして、広視野顕微鏡と
プローブ顕微鏡各種の組合せは、試料３の種類と測定目
的により種々存在する。以下に、そのうちのいくつかを
例示する。Here, as typical types of probe microscopes, in addition to the above atomic force microscope and magnetic force microscope,
There are scanning probe spectroscopy microscopes, scanning force microscopes (for processing), and photon scanning tunneling microscopes (for both shape measurement and processing). On the other hand, as a microscope (wide-field microscope) for obtaining a wide field of view, in addition to the above-mentioned optical microscope 5, there are a polarization microscope, an electron microscope and the like. There are various combinations of wide-field microscope and probe microscope depending on the type of sample 3 and the purpose of measurement. Below, some of them are illustrated.
【０００８】（１）光学顕微鏡と組み合わせて用いられ
る各プローブ顕微鏡 ａ：広範囲測定用の原子間力顕微鏡と微小範囲測定用の
原子間力顕微鏡（広範囲の形状と微小範囲の形状の測
定） ｂ：原子間力顕微鏡と磁気力顕微鏡（形状測定と磁気特
性の測定） ｃ：原子間力顕微鏡と走査型力顕微鏡（形状測定と試料
の加工） ｄ：原子間力顕微鏡と走査型プローブ分光法顕微鏡（形
状測定と電気特性の測定） ｅ：原子間力顕微鏡とフォトン走査トンネル顕微鏡（形
状測定、および形状測定と試料の加工） （２）偏光顕微鏡と組み合わせて用いられる各プローブ
顕微鏡 ａ：磁気力顕微鏡と原子間力顕微鏡（磁気特性の測定と
形状測定） （３）電子顕微鏡と組み合わせて用いられる各プローブ
顕微鏡 ａ：原子間力顕微鏡と磁気力顕微鏡（形状測定と磁気特
性の測定） 以上のように、広視野顕微鏡と各プローブ顕微鏡との組
合せは多数存在し、例えば広視野顕微鏡を固定して考え
ても各プローブ顕微鏡の組合せが種々存在する。そし
て、このような組合せによる測定を行なう場合、各測定
毎にプローブ顕微鏡の交換が必要となる。このプローブ
顕微鏡の交換は、面倒であるばかりでなく、交換により
図５に示す距離Ｌ1 が変化するので、交換の都度、距離
Ｌ1 の校正が必要となり、これに多くの時間を必要とす
る。(1) Each probe microscope used in combination with an optical microscope a: Atomic force microscope for wide range measurement and atomic force microscope for fine range measurement (measurement of wide range shape and fine range shape) b: Atomic force microscope and magnetic force microscope (shape measurement and magnetic property measurement) c: Atomic force microscope and scanning force microscope (shape measurement and sample processing) d: Atomic force microscope and scanning probe spectroscopy microscope ( Shape measurement and measurement of electrical characteristics) e: Atomic force microscope and photon scanning tunneling microscope (shape measurement, and shape measurement and processing of sample) (2) Each probe microscope used in combination with a polarization microscope a: Magnetic force microscope Atomic force microscope (measurement of magnetic properties and shape measurement) (3) Each probe microscope used in combination with electron microscope a: Atomic force microscope and magnetic force microscope (shape measurement And as the measurement) or of the magnetic properties, the combination of the wide-field microscope and the probe microscope are numerous, for example be considered to fix the wide-field microscope combinations of each probe microscope variously present. Then, when performing measurement by such a combination, it is necessary to replace the probe microscope for each measurement. This replacement of the probe microscope is not only troublesome, but since the distance L 1 shown in FIG. 5 changes due to the replacement, it is necessary to calibrate the distance L 1 each time the replacement is performed, which requires a lot of time. .
【０００９】本発明の目的は、上記従来技術における課
題を解決し、プローブ顕微鏡を取り付け取外す交換を行
なうことなく、複数種の測定を行なうことができるプロ
ーブ顕微鏡装置を提供することにある。An object of the present invention is to solve the above problems in the prior art and to provide a probe microscope apparatus capable of performing a plurality of types of measurements without the need to attach and detach the probe microscope for replacement.
【００１０】[0010]
【課題を解決するための手段】上記の目的を達成するた
め、本発明は、試料をＸ軸およびＹ軸方向に移動させる
ＸＹステージと、このＸＹステージの移動を高精度で測
定する測定手段と、前記試料と対向する探針を有するプ
ローブ顕微鏡とを備えたプローブ顕微鏡装置において、
前記プローブ顕微鏡とは精度又は測定目的が異なる他の
少なくとも１つのプローブ顕微鏡を設けるとともに、各
プローブ顕微鏡の探針の相互の間隔の測定値を記憶する
記憶手段を設けたことを特徴とする。又、本発明は、上
記手段において、前記試料を観察する広視野顕微鏡を用
いることも特徴とする。To achieve the above object, the present invention provides an XY stage for moving a sample in the X-axis and Y-axis directions, and a measuring means for measuring the movement of the XY stage with high accuracy. A probe microscope apparatus comprising a probe microscope having a probe facing the sample,
At least one other probe microscope different in accuracy or measurement purpose from the probe microscope is provided, and a storage means for storing the measurement value of the distance between the probes of each probe microscope is provided. The present invention is also characterized in that, in the above means, a wide-field microscope for observing the sample is used.
【００１１】さらに、本発明は、上記各構成における各
プローブ顕微鏡の探針の相互の間隔を測定するため、前
記各プローブ顕微鏡の測定対象となる材料で形成された
パターンとそのパターン上に前記各プローブ顕微鏡によ
り測定される共通測定点とを備えた標準試料を前記ＸＹ
ステージに載置し、前記各プローブ顕微鏡により対応す
るパターンを測定し、各測定結果における前記共通測定
点の位置に基づいて当該各プローブ顕微鏡の探針の相互
の間隔を測定する方法を用いることを特徴とする。Further, according to the present invention, in order to measure the mutual distance between the probes of the probe microscopes in the above-mentioned respective structures, a pattern formed of the material to be measured by each probe microscope and each of the patterns formed on the pattern. A standard sample having a common measurement point measured by a probe microscope is referred to as the XY
It is mounted on a stage, a corresponding pattern is measured by each of the probe microscopes, and a method of measuring the mutual distance between the tips of the probe microscopes based on the position of the common measurement point in each measurement result is used. Characterize.
【００１２】さらに又、本発明は、各プローブ顕微鏡の
１つが加工用プローブ顕微鏡である場合、その探針と他
のプローブ顕微鏡の探針の相互の間隔を測定するため、
距離測定用試料を前記ＸＹステージに載置し、前記加工
用プローブ顕微鏡により前記距離測定用試料の表面を加
工し、この加工部分を前記他のプローブ顕微鏡により測
定することを特徴とするFurther, according to the present invention, when one of the probe microscopes is a processing probe microscope, the mutual distance between the probe and the probe of another probe microscope is measured.
The distance measuring sample is placed on the XY stage, the surface of the distance measuring sample is processed by the processing probe microscope, and the processed portion is measured by the other probe microscope.
【００１３】[0013]
【作用】測定目的が異なる複数のプローブ顕微鏡がブリ
ッジ等の構造物に装架される。各プローブ顕微鏡の相互
間の距離は最初に測定され、その値は記憶手段に記憶さ
れている。測定時において１つのプローブ顕微鏡による
測定又は加工の後、他のプローブ顕微鏡により測定又は
加工を行なう場合には、記憶されている両者間の距離に
応じてＸＹステージが移動せしめられ、試料の目標個所
がプローブ顕微鏡の探針に正確に対向する。Function A plurality of probe microscopes having different measurement purposes are mounted on a structure such as a bridge. The distance between the probe microscopes is first measured, and the value is stored in the storage means. When performing measurement or processing by one probe microscope at the time of measurement and then performing measurement or processing by another probe microscope, the XY stage is moved according to the stored distance between the two, and the target location of the sample. Exactly faces the probe of the probe microscope.
【００１４】各プローブ顕微鏡の探針間の距離の測定
は、各プローブ顕微鏡の測定対象となる材料で形成され
たパターンとそのパターン上に各プローブ顕微鏡により
測定される共通測定点とを備えた標準試料をＸＹステー
ジに載置し、各プローブ顕微鏡により対応するパターン
を測定し、各測定結果における共通測定点の位置に基づ
いて当該各プローブ顕微鏡の探針の相互の間隔を測定す
ることにより行なう。The distance between the tips of the probe microscopes is measured by a standard provided with a pattern formed of a material to be measured by each probe microscope and a common measurement point measured by each probe microscope on the pattern. The sample is placed on the XY stage, the corresponding pattern is measured by each probe microscope, and the mutual distance between the probes of each probe microscope is measured based on the position of the common measurement point in each measurement result.
【００１５】各プローブ顕微鏡の１つが加工用プローブ
顕微鏡である場合、その探針と他のプローブ顕微鏡の探
針の相互の間隔の測定は、距離測定用試料を前記ＸＹス
テージに載置し、加工用プローブ顕微鏡により距離測定
用試料の表面を加工し、この加工部分を他のプローブ顕
微鏡により測定することにより行なう。When one of the probe microscopes is a processing probe microscope, the distance between the probe and the probe of another probe microscope is measured by placing a distance measuring sample on the XY stage and processing the sample. This is performed by processing the surface of the distance measuring sample with a probe microscope and measuring the processed portion with another probe microscope.
【００１６】[0016]
【実施例】以下、本発明を図示の実施例に基づいて説明
する。図１は本発明の実施例に係るプローブ顕微鏡装置
の側面図である。図１で、図５に示す部分と同一又は等
価な部分には同一符号を付して説明を省略する。このプ
ローブ顕微鏡装置は、試料（光ディスク）３の目標個所
の形状測定と磁気特性の測定を行なう装置である。８は
磁気力顕微鏡であり、先端にカンチレバーと探針（これ
らに対する符号は省略されている）を備えている。９は
ＸＹステージ２に載置された測定用ミラー、１０は測定
用ミラー９に対向するブリッジ４上の位置に固定された
レーザ干渉式変位計、１１はＸＹステージ２に載置され
た標準試料である。この標準試料１１を用いて原子間力
顕微鏡７と磁気力顕微鏡８との距離Ｌ2 （二次元の距
離）が測定される。標準試料１１およびこれを用いた測
定方法を図２により説明する。The present invention will be described below with reference to the illustrated embodiments. FIG. 1 is a side view of a probe microscope apparatus according to an embodiment of the present invention. In FIG. 1, portions that are the same as or equivalent to those shown in FIG. This probe microscope apparatus is an apparatus for measuring the shape and magnetic properties of a target portion of a sample (optical disk) 3. Reference numeral 8 is a magnetic force microscope, which is provided with a cantilever and a probe (reference numerals for these are omitted) at the tip. Reference numeral 9 is a measuring mirror mounted on the XY stage 2, 10 is a laser interferometric displacement meter fixed at a position on the bridge 4 facing the measuring mirror 9, and 11 is a standard sample mounted on the XY stage 2. Is. Using this standard sample 11, the distance L 2 (two-dimensional distance) between the atomic force microscope 7 and the magnetic force microscope 8 is measured. The standard sample 11 and the measuring method using the standard sample 11 will be described with reference to FIG.
【００１７】図２は標準試料１１の斜視図である。この
図で、１１０は四角形状の基板、１１１は基板１１０上
に四角形状に塗布された磁性膜である。この磁性膜１１
１により基板１１０上に２つの直線段差が生じ、これら
段差の交点Ａが原子間力顕微鏡７と磁気力顕微鏡８の共
通の測定点（距離測定の基準点）となる。図３は標準試
料１１の測定像を示す図である。この図で、１１７は原
子間力顕微鏡７の測定像、１１８は磁気力顕微鏡８の測
定像を示す。Ａは図２に示す基準点Ａの像、１１１は図
２に示す磁性膜１１１の像であり、これらは図２と同じ
符号で示されている。図示の例では、原子間力顕微鏡７
の測定像１１７では磁性膜１１１が右上方に偏って表示
され、磁気力顕微鏡８の測定像１１８では磁性膜１１１
が原子間力顕微鏡７の測定像１１７よりも中央寄りに表
示されている。FIG. 2 is a perspective view of the standard sample 11. In this figure, 110 is a quadrilateral substrate, and 111 is a quadrilateral magnetic film applied on the substrate 110. This magnetic film 11
1 causes two linear steps on the substrate 110, and the intersection A of these steps is a common measurement point (reference point for distance measurement) between the atomic force microscope 7 and the magnetic force microscope 8. FIG. 3 is a diagram showing a measurement image of the standard sample 11. In this figure, 117 is a measurement image of the atomic force microscope 7, and 118 is a measurement image of the magnetic force microscope 8. A is an image of the reference point A shown in FIG. 2, and 111 is an image of the magnetic film 111 shown in FIG. 2, which are denoted by the same reference numerals as in FIG. In the illustrated example, the atomic force microscope 7
In the measurement image 117 of No. 1, the magnetic film 111 is displayed biased to the upper right, and in the measurement image 118 of the magnetic force microscope 8, the magnetic film 111 is displayed.
Is displayed closer to the center than the measurement image 117 of the atomic force microscope 7.
【００１８】今、原子間力顕微鏡７で標準試料１１を測
定した像１１７のＡ点の像中の座標を、図示のように
（ｘ17、ｙ17）とする。この測定後、ＸＹステージ２を
移動して標準試料１１を磁気力顕微鏡８に対向させ、こ
れにより磁気的特性を測定して像１１８を得る。この場
合の標準点Ａの座標を、図示のように（ｘ18、ｙ18）と
する。各座標（ｘ17、ｙ17）、（ｘ18、ｙ18）とＸＹス
テージ２の移動距離に基づいて原子間力顕微鏡７と磁気
力顕微鏡８との距離Ｌ2 が得られる。この距離は適当な
記憶手段に記憶せしめられる。Now, the coordinates in the image of the point A of the image 117 obtained by measuring the standard sample 11 with the atomic force microscope 7 are (x 17 , y 17 ) as shown in the figure. After this measurement, the XY stage 2 is moved to make the standard sample 11 face the magnetic force microscope 8, and the magnetic characteristics are measured by this to obtain an image 118. The coordinates of the standard point A in this case are (x 18 , y 18 ) as shown in the figure. The distance L 2 between the atomic force microscope 7 and the magnetic force microscope 8 is obtained based on the coordinates (x 17 , y 17 ), (x 18 , y 18 ) and the moving distance of the XY stage 2. This distance is stored in a suitable storage means.
【００１９】次に、本実施例の動作を説明する。最初
に、光ディスク３の目標個所が光学顕微鏡５に捉えら
れ、次いで、ＸＹステージ２を前述の既知の距離Ｌ1 移
動させて目標個所を原子間力顕微鏡７の探針に対向さ
せ、形状測定を行なう。次に、ＸＹステージ２を記憶手
段に記憶されている距離Ｌ2 だけ移動させる。これによ
り、光ディスク３の目標個所が磁気力顕微鏡８に対向せ
しめられ、当該目標個所の磁気的特性が測定される。Next, the operation of this embodiment will be described. First, the target portion of the optical disk 3 is captured by the optical microscope 5, and then the XY stage 2 is moved by the above-mentioned known distance L 1 so that the target portion is opposed to the probe of the atomic force microscope 7 to measure the shape. To do. Next, the XY stage 2 is moved by the distance L 2 stored in the storage means. As a result, the target portion of the optical disk 3 is made to face the magnetic force microscope 8, and the magnetic characteristics of the target portion are measured.
【００２０】このように、本実施例では、原子間力顕微
鏡７と磁気力顕微鏡８とをブリッジ４に設置し、両者の
間隔を予め測定、記憶しておくようにしたので、原子間
力顕微鏡７と磁気力顕微鏡８とを交換する必要はなく、
目的を異にする測定が著しく容易になる。As described above, in this embodiment, the atomic force microscope 7 and the magnetic force microscope 8 are installed in the bridge 4, and the distance between the two is preliminarily measured and stored. 7 and the magnetic force microscope 8 do not need to be replaced,
Measurements for different purposes are significantly facilitated.
【００２１】図４は本発明の他の実施例に係るプローブ
顕微鏡装置の側面図である。この図で、図１に示す部分
と同一部分には同一符号が付してある。本実施例の装置
では、光学顕微鏡５が除かれている。試料３によって
は、相当の精度で目標個所を直接原子間力顕微鏡７に対
向させることができる場合がある。このような場合に
は、光学顕微鏡５は必ずしも必要がないのは明らかであ
る。本実施例の測定動作および効果はさきの実施例の測
定動作および効果と同じである。FIG. 4 is a side view of a probe microscope apparatus according to another embodiment of the present invention. In this figure, the same parts as those shown in FIG. 1 are designated by the same reference numerals. In the apparatus of this embodiment, the optical microscope 5 is omitted. Depending on the sample 3, the target location may be able to directly face the atomic force microscope 7 with considerable accuracy. In such a case, it is obvious that the optical microscope 5 is not always necessary. The measuring operation and effect of this embodiment are the same as the measuring operation and effect of the previous embodiment.
【００２２】図５は本発明のさらに他の実施例に係るプ
ローブ顕微鏡装置の側面図である。この図で、図１に示
す部分と同一部分には同一符号が付してある。本実施例
の装置では、原子間力顕微鏡７のカンチレバー７ａの探
針７ｂ装着部分と磁気力顕微鏡８カンチレバー７ａの探
針７ｂ装着部分の両方が光学顕微鏡５の視野内に入るよ
うに原子間力顕微鏡７と磁気力顕微鏡８とがブリッジ４
に装着されている。FIG. 5 is a side view of a probe microscope apparatus according to still another embodiment of the present invention. In this figure, the same parts as those shown in FIG. 1 are designated by the same reference numerals. In the apparatus of this embodiment, the atomic force is adjusted so that both the probe 7b mounting portion of the cantilever 7a of the atomic force microscope 7 and the magnetic force microscope 8 cantilever 7a mounting portion of the cantilever 7a are within the visual field of the optical microscope 5. The microscope 7 and the magnetic force microscope 8 are bridges 4
Is attached to.
【００２３】図６は図５に示す装置における光学顕微鏡
５の像を示す図である。この図で、５０は光学顕微鏡５
の視野、７ａ、８ａは原子間力顕微鏡７と磁気力顕微鏡
８の各カンチレバーの先端部分、Ｃは視野５０の中心を
示す。Ｌ1 は中心Ｃとカンチレバー７ａの先端（探針７
ｂの位置）、Ｌ2 はカンチレバー７ａの先端（探針７ｂ
の位置）とカンチレバー８ａの先端（探針８ｂの位置）
の距離を示す。FIG. 6 is a diagram showing an image of the optical microscope 5 in the apparatus shown in FIG. In this figure, 50 is an optical microscope 5.
Of the cantilever of the atomic force microscope 7 and the magnetic force microscope 8, and C represents the center of the field of view 50. L 1 is the center C and the tip of the cantilever 7a (probe 7
b position), L 2 is the tip of the cantilever 7a (probe 7b).
Position) and the tip of the cantilever 8a (position of the probe 8b)
Indicates the distance.
【００２４】図１および図４に示す装置では、測定を実
施していてもこれを目で見ることができないので、測定
者にとって実際に測定が行なわれているか否かは不明で
あり、不安を感じることとなって信頼性の点で問題があ
る。しかし、本実施例では、測定中に測定が行なわれて
いるか否かを目で確かめることができるので（光学顕微
鏡５により、測定中のカンチレバー７ａ、８ａの微小な
動きが目視できる）、測定者の装置に対する信頼性を向
上させることができる。In the apparatus shown in FIGS. 1 and 4, even if the measurement is carried out, it cannot be seen with the eyes. Therefore, it is unknown to the measurer whether or not the measurement is actually carried out, and the anxiety is not felt. There is a problem in terms of reliability as it is felt. However, in the present embodiment, it is possible to visually confirm whether or not the measurement is being performed during the measurement (the optical microscope 5 allows visual observation of minute movements of the cantilevers 7a and 8a during the measurement). The reliability of the device can be improved.
【００２５】なお、上記各実施例の説明では、プローブ
顕微鏡として原子間力顕微鏡および磁気力顕微鏡の組合
せを例示して説明したが、これらのように、異なる目的
のプローブ顕微鏡の組合せに限ることはなく、さきに述
べたように、広範囲測定用の原子間力顕微鏡と微小範囲
測定用（高精度測定用）の原子間力顕微鏡の組合わせと
することもできる。この場合には、前者で、広視野顕微
鏡よりも正確に測定個所を把握しておき、後者で精度の
高い測定を行なうことになる。又、このような精度の異
なる組合せは、原子間力顕微鏡に限らず、他のプローブ
顕微鏡においても可能である。In the description of each of the above embodiments, the combination of the atomic force microscope and the magnetic force microscope has been exemplified as the probe microscope, but the combination of probe microscopes for different purposes is not limited thereto. Alternatively, as described above, the atomic force microscope for wide range measurement and the atomic force microscope for fine range measurement (for high precision measurement) may be combined. In this case, in the former case, the measurement location is grasped more accurately than in the wide-field microscope, and in the latter case, highly accurate measurement is performed. Further, such a combination with different accuracy is possible not only in the atomic force microscope but also in other probe microscopes.
【００２６】さらに、プローブ顕微鏡の組合せは、原子
間力顕微鏡と磁気力顕微鏡に限ることはなく、さきに示
したように種々の組合せが存在し、これらの組合せのい
ずれにも本発明を適用できるのは明らかである。又、プ
ローブ顕微鏡を３つ以上備えることができるのも明らか
である。Further, the combination of the probe microscope is not limited to the atomic force microscope and the magnetic force microscope, and there are various combinations as shown above, and the present invention can be applied to any of these combinations. Is clear. It is also clear that more than two probe microscopes can be provided.
【００２７】さらに、プローブ顕微鏡間の距離の測定に
は、上記各実施例で用いるような特殊な標準試料は必ず
しも必要ではなく、例えば、形状測定と加工を行なう場
合には、標準試料として平板な基板を用い、最初に加工
用のプローブ顕微鏡で加工を行なった後、当該加工の形
状を形状測定用のプローブ顕微鏡で測定し、そのときの
ＸＹステージの移動量を両プローブ顕微鏡の距離として
記憶すればよい。Further, in order to measure the distance between the probe microscopes, it is not always necessary to use a special standard sample as used in each of the above embodiments. For example, in the case of shape measurement and processing, a flat sample is used as the standard sample. After the substrate is first processed by the probe microscope for processing, the shape of the process is measured by the probe microscope for shape measurement, and the movement amount of the XY stage at that time is stored as the distance between both probe microscopes. Good.
【００２８】[0028]
【発明の効果】以上述べたように、本発明では、目的の
異なる各プローブ顕微鏡を設置するようにしたので、プ
ローブ顕微鏡の交換を行なうことなく必要な測定や加工
を実施することができ、交換に要する手間と時間を省く
ことができる。As described above, according to the present invention, since probe microscopes having different purposes are installed, it is possible to carry out necessary measurement and processing without replacing the probe microscopes. It can save the labor and time required for.
【図１】本発明の実施例に係るプローブ顕微鏡の側面図
である。FIG. 1 is a side view of a probe microscope according to an embodiment of the present invention.
【図２】図１に示す標準試料の斜視図である。FIG. 2 is a perspective view of the standard sample shown in FIG.
【図３】図２に示す標準試料を用いる各プローブ顕微鏡
間の距離の測定動作の説明図である。FIG. 3 is an explanatory diagram of an operation of measuring the distance between the probe microscopes using the standard sample shown in FIG.
【図４】本発明の他の実施例に係るプローブ顕微鏡装置
の側面図である。FIG. 4 is a side view of a probe microscope apparatus according to another embodiment of the present invention.
【図５】本発明のさらに他の実施例に係るプローブ顕微
鏡装置の側面図である。FIG. 5 is a side view of a probe microscope apparatus according to still another embodiment of the present invention.
【図６】図５に示す装置の光学顕微鏡の視野を示す図で
ある。6 is a diagram showing a field of view of an optical microscope of the apparatus shown in FIG.
【図７】従来のプローブ顕微鏡装置の側面図である。FIG. 7 is a side view of a conventional probe microscope apparatus.
【図８】図７に示す試料の測定像を示す図である。8 is a diagram showing a measurement image of the sample shown in FIG.
２ ＸＹステージ ３ 試料 ４ ブリッジ ５ 光学顕微鏡 ６ ＣＣＤカメラ ７ 原子間力顕微鏡 ８ 磁気力顕微鏡 ９ 測定用ミラー １０ レーザ変位計 １１ 標準試料 2 XY stage 3 sample 4 bridge 5 optical microscope 6 CCD camera 7 atomic force microscope 8 magnetic force microscope 9 measuring mirror 10 laser displacement meter 11 standard sample
Claims (6)
ＸＹステージと、このＸＹステージの移動を高精度で測
定する測定手段と、前記試料と対向する探針を有するプ
ローブ顕微鏡とを備えたプローブ顕微鏡装置において、
前記プローブ顕微鏡とは精度又は測定目的が異なる他の
少なくとも１つのプローブ顕微鏡を設けるとともに、各
プローブ顕微鏡の探針の相互の間隔の測定値を記憶する
記憶手段を設けたことを特徴とするプローブ顕微鏡装
置。1. An XY stage for moving a sample in the X-axis and Y-axis directions, a measuring means for measuring the movement of the XY stage with high accuracy, and a probe microscope having a probe facing the sample. In the probe microscope device,
At least one other probe microscope different in accuracy or measurement purpose from the probe microscope is provided, and a storage means for storing the measurement value of the distance between the probes of each probe microscope is provided. apparatus.
ＸＹステージと、このＸＹステージの移動を高精度で測
定する測定手段と、前記試料を観察する広視野顕微鏡
と、前記試料と対向する探針を有するプローブ顕微鏡と
を備えたプローブ顕微鏡装置において、前記プローブ顕
微鏡とは精度又は測定目的が異なる他の少なくとも１つ
のプローブ顕微鏡を設けるとともに、各プローブ顕微鏡
の探針の相互の間隔の測定値を記憶する記憶手段を設け
たことを特徴とするプローブ顕微鏡装置。2. An XY stage for moving a sample in the X-axis and Y-axis directions, a measuring means for measuring the movement of the XY stage with high accuracy, a wide-field microscope for observing the sample, and a sample facing the sample. In a probe microscope apparatus provided with a probe microscope having a probe, at least one other probe microscope different in accuracy or measurement purpose from the probe microscope is provided, and the measurement value of the mutual distance between the probe of each probe microscope. A probe microscope apparatus, characterized in that a storage means for storing is stored.
鏡の探針の少なくとも２つは前記広視野顕微鏡の視野内
に位置せしめられることを特徴とするプローブ顕微鏡装
置。3. The probe microscope apparatus according to claim 2, wherein at least two probes of each probe microscope are positioned within a field of view of the wide-field microscope.
偏光顕微鏡であり、かつ、前記プローブ顕微鏡の１つは
磁気力顕微鏡であることを特徴とするプローブ顕微鏡装
置。4. The probe microscope apparatus according to claim 2, wherein the wide-field microscope is a polarization microscope, and one of the probe microscopes is a magnetic force microscope.
ＸＹステージと、このＸＹステージの移動を高精度で測
定する測定手段と、前記試料と対向する探針を有するプ
ローブ顕微鏡とを備えたプローブ顕微鏡装置において、
前記プローブ顕微鏡とは測定目的が異なる他の少なくと
も１つのプローブ顕微鏡を設けるとともに、前記各プロ
ーブ顕微鏡の測定対象となる材料で形成されたパターン
とそのパターン上に前記各プローブ顕微鏡により測定さ
れる共通測定点とを備えた標準試料を前記ＸＹステージ
に載置し、前記各プローブ顕微鏡により対応するパター
ンを測定し、各測定結果における前記共通測定点の位置
に基づいて当該各プローブ顕微鏡の探針の相互の間隔を
測定し、これを記憶することを特徴とするプローブ顕微
鏡装置の探針間距離定方法。5. An XY stage for moving a sample in the X-axis and Y-axis directions, measuring means for measuring the movement of the XY stage with high accuracy, and a probe microscope having a probe facing the sample. In the probe microscope device,
At least one other probe microscope having a different measurement purpose from that of the probe microscope is provided, and a pattern formed of a material to be measured by each probe microscope and a common measurement measured by each probe microscope on the pattern A standard sample having points is placed on the XY stage, the corresponding pattern is measured by the probe microscopes, and the probes of the probe microscopes are interlocked with each other based on the position of the common measurement point in each measurement result. A method for determining an inter-probe distance of a probe microscope apparatus, which comprises measuring the distance between the two and storing the measured distance.
ＸＹステージと、このＸＹステージの移動を高精度で測
定する測定手段と、前記試料と対向する探針を有するプ
ローブ顕微鏡とを備えたプローブ顕微鏡装置において、
前記プローブ顕微鏡とは測定目的が異なる他の少なくと
も１つのプローブ顕微鏡を設けるとともに、各プローブ
顕微鏡のうちの１つが加工用プローブ顕微鏡であると
き、距離測定用試料を前記ＸＹステージに載置し、前記
加工用プローブ顕微鏡により前記距離測定用試料の表面
を加工し、この加工部分を他のプローブ顕微鏡により測
定することにより、当該他のプローブ顕微鏡の探針と前
記加工用プローブ顕微鏡の探針の相互の間隔を測定し、
これを記憶することを特徴とするプローブ顕微鏡装置の
探針間距離定方法。6. An XY stage for moving a sample in the X-axis and Y-axis directions, a measuring means for measuring the movement of the XY stage with high accuracy, and a probe microscope having a probe facing the sample. In the probe microscope device,
At least one other probe microscope having a different measurement purpose from the probe microscope is provided, and when one of the probe microscopes is a processing probe microscope, a distance measuring sample is placed on the XY stage, The surface of the sample for distance measurement is processed by a processing probe microscope, and the processed portion is measured by another probe microscope, whereby the probe of the other probe microscope and the probe of the processing probe microscope Measure the distance,
A method for determining an inter-probe distance of a probe microscope apparatus characterized by storing this.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5283415A JPH07134137A (en) | 1993-11-12 | 1993-11-12 | Probe microscope device and method for measuring distance between probes |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5283415A JPH07134137A (en) | 1993-11-12 | 1993-11-12 | Probe microscope device and method for measuring distance between probes |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH07134137A true JPH07134137A (en) | 1995-05-23 |
Family
ID=17665239
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5283415A Pending JPH07134137A (en) | 1993-11-12 | 1993-11-12 | Probe microscope device and method for measuring distance between probes |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH07134137A (en) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004132745A (en) * | 2002-10-08 | 2004-04-30 | National Institute For Materials Science | Tip relative position calibration template for multi-tip scanning microscope |
| WO2004074816A1 (en) * | 2003-01-30 | 2004-09-02 | Hitachi, Ltd. | Scanning probe microscope and sample observing method using this and semiconductor device production method |
| JP2006071534A (en) * | 2004-09-03 | 2006-03-16 | Sii Nanotechnology Inc | Probe microscope system suitable for long specimen observation |
| JP2006349419A (en) * | 2005-06-14 | 2006-12-28 | Research Institute Of Biomolecule Metrology Co Ltd | Three-dimensional sample observation system and three-dimensional sample observation method |
| WO2008013268A1 (en) * | 2006-07-28 | 2008-01-31 | National Institute For Materials Science | Scanning type probe microscope, and its probe relative-position measuring method |
| EP2219036A1 (en) | 2009-02-13 | 2010-08-18 | NT-MDT Service & Logistics Ltd. | Multifunctional Scanning Probe Microscope |
| JP2010530971A (en) * | 2007-11-14 | 2010-09-16 | コリア リサーチ インスティチュート オブ スタンダーズ アンド サイエンス | High speed and large area precision measuring device and method |
| JP2016095228A (en) * | 2014-11-14 | 2016-05-26 | 大日本印刷株式会社 | Work method using scanning type probe microscope, and scanning type probe microscope |
-
1993
- 1993-11-12 JP JP5283415A patent/JPH07134137A/en active Pending
Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004132745A (en) * | 2002-10-08 | 2004-04-30 | National Institute For Materials Science | Tip relative position calibration template for multi-tip scanning microscope |
| WO2004074816A1 (en) * | 2003-01-30 | 2004-09-02 | Hitachi, Ltd. | Scanning probe microscope and sample observing method using this and semiconductor device production method |
| US7562564B2 (en) | 2003-01-30 | 2009-07-21 | Hitachi, Ltd. | Scanning probe microscope and sample observing method using this and semiconductor device production method |
| JP4563117B2 (en) * | 2004-09-03 | 2010-10-13 | エスアイアイ・ナノテクノロジー株式会社 | Microscope system, microscope system scanning method, and microscope system image composition method |
| JP2006071534A (en) * | 2004-09-03 | 2006-03-16 | Sii Nanotechnology Inc | Probe microscope system suitable for long specimen observation |
| JP2006349419A (en) * | 2005-06-14 | 2006-12-28 | Research Institute Of Biomolecule Metrology Co Ltd | Three-dimensional sample observation system and three-dimensional sample observation method |
| US8141168B2 (en) | 2006-07-28 | 2012-03-20 | National Institute For Materials Science | Scanning probe microscope and a method to measure relative-position between probes |
| WO2008013268A1 (en) * | 2006-07-28 | 2008-01-31 | National Institute For Materials Science | Scanning type probe microscope, and its probe relative-position measuring method |
| JP5156380B2 (en) * | 2006-07-28 | 2013-03-06 | 独立行政法人物質・材料研究機構 | Scanning probe microscope and method for measuring relative position of the probe |
| JP2010530971A (en) * | 2007-11-14 | 2010-09-16 | コリア リサーチ インスティチュート オブ スタンダーズ アンド サイエンス | High speed and large area precision measuring device and method |
| EP2219036A1 (en) | 2009-02-13 | 2010-08-18 | NT-MDT Service & Logistics Ltd. | Multifunctional Scanning Probe Microscope |
| US8312560B2 (en) | 2009-02-13 | 2012-11-13 | NT-MDT Service & Logistics Ltd. | Multifunctional scanning probe microscope |
| JP2016095228A (en) * | 2014-11-14 | 2016-05-26 | 大日本印刷株式会社 | Work method using scanning type probe microscope, and scanning type probe microscope |
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