JPH0711195A - Wax - Google Patents
WaxInfo
- Publication number
- JPH0711195A JPH0711195A JP17998293A JP17998293A JPH0711195A JP H0711195 A JPH0711195 A JP H0711195A JP 17998293 A JP17998293 A JP 17998293A JP 17998293 A JP17998293 A JP 17998293A JP H0711195 A JPH0711195 A JP H0711195A
- Authority
- JP
- Japan
- Prior art keywords
- wax
- antibacterial agent
- compounds
- antibacterial
- floor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000003242 anti bacterial agent Substances 0.000 claims abstract description 21
- 239000000839 emulsion Substances 0.000 abstract description 18
- 230000000844 anti-bacterial effect Effects 0.000 abstract description 13
- -1 pentachlorophenol) Chemical class 0.000 abstract description 11
- 241000894006 Bacteria Species 0.000 abstract description 6
- 241000233866 Fungi Species 0.000 abstract description 5
- IZUPBVBPLAPZRR-UHFFFAOYSA-N pentachlorophenol Chemical compound OC1=C(Cl)C(Cl)=C(Cl)C(Cl)=C1Cl IZUPBVBPLAPZRR-UHFFFAOYSA-N 0.000 abstract description 4
- 239000000463 material Substances 0.000 abstract description 3
- 238000005498 polishing Methods 0.000 abstract description 3
- 229940096826 phenylmercuric acetate Drugs 0.000 abstract description 2
- 150000001875 compounds Chemical class 0.000 abstract 4
- JCIIKRHCWVHVFF-UHFFFAOYSA-N 1,2,4-thiadiazol-5-amine;hydrochloride Chemical compound Cl.NC1=NC=NS1 JCIIKRHCWVHVFF-UHFFFAOYSA-N 0.000 abstract 1
- APQHKWPGGHMYKJ-UHFFFAOYSA-N Tributyltin oxide Chemical compound CCCC[Sn](CCCC)(CCCC)O[Sn](CCCC)(CCCC)CCCC APQHKWPGGHMYKJ-UHFFFAOYSA-N 0.000 abstract 1
- 238000013329 compounding Methods 0.000 abstract 1
- 238000009408 flooring Methods 0.000 abstract 1
- 150000002989 phenols Chemical class 0.000 abstract 1
- 150000003464 sulfur compounds Chemical class 0.000 abstract 1
- DUBNHZYBDBBJHD-UHFFFAOYSA-L ziram Chemical compound [Zn+2].CN(C)C([S-])=S.CN(C)C([S-])=S DUBNHZYBDBBJHD-UHFFFAOYSA-L 0.000 abstract 1
- 239000001993 wax Substances 0.000 description 20
- 229920001817 Agar Polymers 0.000 description 8
- 241000589517 Pseudomonas aeruginosa Species 0.000 description 8
- 239000008272 agar Substances 0.000 description 8
- 239000004698 Polyethylene Substances 0.000 description 5
- 229920000573 polyethylene Polymers 0.000 description 5
- 235000014469 Bacillus subtilis Nutrition 0.000 description 4
- 241000588724 Escherichia coli Species 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 230000009036 growth inhibition Effects 0.000 description 4
- 239000002609 medium Substances 0.000 description 4
- 239000004925 Acrylic resin Substances 0.000 description 3
- 229920000178 Acrylic resin Polymers 0.000 description 3
- 244000063299 Bacillus subtilis Species 0.000 description 3
- 241000293869 Salmonella enterica subsp. enterica serovar Typhimurium Species 0.000 description 3
- 241000191967 Staphylococcus aureus Species 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000001802 infusion Methods 0.000 description 3
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 150000001495 arsenic compounds Chemical class 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 150000001880 copper compounds Chemical class 0.000 description 2
- 239000001963 growth medium Substances 0.000 description 2
- 125000001475 halogen functional group Chemical group 0.000 description 2
- 230000005764 inhibitory process Effects 0.000 description 2
- 239000002304 perfume Substances 0.000 description 2
- 239000002504 physiological saline solution Substances 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000000725 suspension Substances 0.000 description 2
- LDVVMCZRFWMZSG-OLQVQODUSA-N (3ar,7as)-2-(trichloromethylsulfanyl)-3a,4,7,7a-tetrahydroisoindole-1,3-dione Chemical compound C1C=CC[C@H]2C(=O)N(SC(Cl)(Cl)Cl)C(=O)[C@H]21 LDVVMCZRFWMZSG-OLQVQODUSA-N 0.000 description 1
- DTCCVIYSGXONHU-CJHDCQNGSA-N (z)-2-(2-phenylethenyl)but-2-enedioic acid Chemical compound OC(=O)\C=C(C(O)=O)\C=CC1=CC=CC=C1 DTCCVIYSGXONHU-CJHDCQNGSA-N 0.000 description 1
- PWWOTFIYHLNHRT-UHFFFAOYSA-N 4-bromo-4-(4-chlorophenyl)but-3-en-2-one Chemical compound CC(=O)C=C(Br)C1=CC=C(Cl)C=C1 PWWOTFIYHLNHRT-UHFFFAOYSA-N 0.000 description 1
- OSDLLIBGSJNGJE-UHFFFAOYSA-N 4-chloro-3,5-dimethylphenol Chemical compound CC1=CC(O)=CC(C)=C1Cl OSDLLIBGSJNGJE-UHFFFAOYSA-N 0.000 description 1
- 241000228245 Aspergillus niger Species 0.000 description 1
- 241001149956 Cladosporium herbarum Species 0.000 description 1
- 239000005749 Copper compound Substances 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- 241000108056 Monas Species 0.000 description 1
- 241000228153 Penicillium citrinum Species 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 241000191940 Staphylococcus Species 0.000 description 1
- KYPYTERUKNKOLP-UHFFFAOYSA-N Tetrachlorobisphenol A Chemical compound C=1C(Cl)=C(O)C(Cl)=CC=1C(C)(C)C1=CC(Cl)=C(O)C(Cl)=C1 KYPYTERUKNKOLP-UHFFFAOYSA-N 0.000 description 1
- DHXVGJBLRPWPCS-UHFFFAOYSA-N Tetrahydropyran Chemical compound C1CCOCC1 DHXVGJBLRPWPCS-UHFFFAOYSA-N 0.000 description 1
- GCTFWCDSFPMHHS-UHFFFAOYSA-M Tributyltin chloride Chemical compound CCCC[Sn](Cl)(CCCC)CCCC GCTFWCDSFPMHHS-UHFFFAOYSA-M 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- WIIZWVCIJKGZOK-RKDXNWHRSA-N chloramphenicol Chemical compound ClC(Cl)C(=O)N[C@H](CO)[C@H](O)C1=CC=C([N+]([O-])=O)C=C1 WIIZWVCIJKGZOK-RKDXNWHRSA-N 0.000 description 1
- 229960005091 chloramphenicol Drugs 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000012258 culturing Methods 0.000 description 1
- 239000013530 defoamer Substances 0.000 description 1
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 1
- DSMQXOWTWIRWQO-UHFFFAOYSA-N diphenylmercury;4-dodec-1-enoxy-4-oxobutanoic acid Chemical compound C=1C=CC=CC=1[Hg]C1=CC=CC=C1.CCCCCCCCCCC=COC(=O)CCC(O)=O DSMQXOWTWIRWQO-UHFFFAOYSA-N 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 229940079593 drug Drugs 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229940049964 oleate Drugs 0.000 description 1
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 1
- KDNVJBRRDKAHDA-UHFFFAOYSA-L phenyl-[3-[[3-(phenylmercuriooxysulfonyl)naphthalen-2-yl]methyl]naphthalen-2-yl]sulfonyloxymercury Chemical compound C=1C2=CC=CC=C2C=C(CC=2C(=CC3=CC=CC=C3C=2)S(=O)(=O)O[Hg]C=2C=CC=CC=2)C=1S(=O)(=O)O[Hg]C1=CC=CC=C1 KDNVJBRRDKAHDA-UHFFFAOYSA-L 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 239000001965 potato dextrose agar Substances 0.000 description 1
- HCJLVWUMMKIQIM-UHFFFAOYSA-M sodium;2,3,4,5,6-pentachlorophenolate Chemical compound [Na+].[O-]C1=C(Cl)C(Cl)=C(Cl)C(Cl)=C1Cl HCJLVWUMMKIQIM-UHFFFAOYSA-M 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- KUAZQDVKQLNFPE-UHFFFAOYSA-N thiram Chemical compound CN(C)C(=S)SSC(=S)N(C)C KUAZQDVKQLNFPE-UHFFFAOYSA-N 0.000 description 1
- 229960002447 thiram Drugs 0.000 description 1
- DFNPRTKVCGZMMC-UHFFFAOYSA-M tributyl(fluoro)stannane Chemical compound CCCC[Sn](F)(CCCC)CCCC DFNPRTKVCGZMMC-UHFFFAOYSA-M 0.000 description 1
- BDIWFCKBPZPBQT-UHFFFAOYSA-N tributyl(tributylstannylsulfanyl)stannane Chemical compound CCCC[Sn](CCCC)(CCCC)S[Sn](CCCC)(CCCC)CCCC BDIWFCKBPZPBQT-UHFFFAOYSA-N 0.000 description 1
- PWBHRVGYSMBMIO-UHFFFAOYSA-M tributylstannanylium;acetate Chemical compound CCCC[Sn](CCCC)(CCCC)OC(C)=O PWBHRVGYSMBMIO-UHFFFAOYSA-M 0.000 description 1
- WTLBZVNBAKMVDP-UHFFFAOYSA-N tris(2-butoxyethyl) phosphate Chemical compound CCCCOCCOP(=O)(OCCOCCCC)OCCOCCCC WTLBZVNBAKMVDP-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Agricultural Chemicals And Associated Chemicals (AREA)
Abstract
Description
【０００１】[0001]
【技術分野】本発明は、ワックス（ポリッシュ）に関す
る。TECHNICAL FIELD The present invention relates to a wax (polish).
【０００２】[0002]
【従来技術】現在、種々のワックスが市販されている
が、抗菌剤を含有するワックスは、いまだ市販されてい
ない。2. Description of the Related Art Currently, various waxes are on the market, but waxes containing an antibacterial agent have not yet been on the market.
【０００３】[0003]
【目的】本発明の目的は、床などを磨くと同時に抗菌性
を付与できるワックスを提供する点にある。特に本発明
者等の研究によれば、抗菌剤を配合した床に普通のワッ
クスをかけると全く抗菌性を示さなくなってしまうこと
が見出されたので、本発明のもう１つの目的は、抗菌剤
を配合した床を磨いたとき、抗菌性を失わないようなワ
ックスを提供する点にある。[Purpose] An object of the present invention is to provide a wax capable of imparting antibacterial properties at the same time as polishing a floor or the like. In particular, according to the study by the present inventors, it was found that when a common wax is applied to a floor containing an antibacterial agent, the antibacterial property is not exhibited at all. Therefore, another object of the present invention is The point is to provide a wax that does not lose antibacterial properties when the floor containing the agent is polished.
【０００４】[0004]
【構成】本発明の第１は、抗菌剤を含有するワックスに
関する。本発明のワックスで床などを磨けば床自体に抗
菌性がなくても、磨いた結果として抗菌作用が発現す
る。また、抗菌剤を配合した床であっても、抗菌剤を含
有してないワックスをかけた場合には、おどろくべきこ
とに実質上抗菌性が発現されなくなってしまう。したが
って、本発明の第２は、抗菌剤を配合した床面に請求項
２記載の床用ワックスを塗布してなる床構造に関する。The first aspect of the present invention relates to a wax containing an antibacterial agent. If the floor or the like is polished with the wax of the present invention, the antibacterial action is exhibited as a result of polishing even if the floor itself has no antibacterial property. Even if the floor is mixed with an antibacterial agent, when wax containing no antibacterial agent is applied, it is surprising that the antibacterial property is not substantially exhibited. Therefore, a second aspect of the present invention relates to a floor structure obtained by applying the floor wax according to claim 2 to a floor surface containing an antibacterial agent.
【０００５】抗菌剤としては例えば下記のようなものを
挙げることができる。 （１）有機窒素硫黄系化合物 亜鉛ジメチルジチオカルバメート、テトラメチルチウラ
ムジスルファイド、２−メルカプトベンゾチアゾール、
４′−チアゾリール−２−ベンゾイミダゾール、Ｎ−ト
リクロロメチルメルカプト−４−シクロヘキセン−１，
２−ジカルボキシイミド。 （２）フェノール系 ペンタクロロフェノール、ペンタクロロフェノールナト
リウムデルドリン、パラクロロメタキシレノール、２，
２′−メチレン−ビス−４−クロロフェノール、２，
２′−チオビス（４，６−ジクロロフェノール）、サル
メチルアニリド、サルチルアニリドのハロゲン化物。 （３）有機水銀化合物 酢酸フェニル水銀、オレイン酸フェニル水銀、ジフェニ
ル水銀ドデセニルサクシネート、ジナフチルメタンジス
ルホン酸フェニル水銀、ジオクチルスルホサクシニルフ
ェニル水銀。 （４）有機錫化合物 ビス（トリブチル錫）オキサイド、トリブチル錫アセテ
ート、トリブチル錫クロライド、トリブチル錫フルオラ
イド、ビス（トリブチル錫）スルファイド、ヘキサブチ
ル−ジスタインオキサン（ビス−トリ−Ｓ−ブチル錫オ
キサイド）。 （５）有機ひ素化合物 （６）有機銅化合物 （７）その他 α−ブロム−ｐ−クロルベンザルアセトン。Examples of the antibacterial agent include the followings. (1) Organic nitrogen-sulfur compounds Zinc dimethyldithiocarbamate, tetramethylthiuram disulfide, 2-mercaptobenzothiazole,
4'-thiazolyl-2-benzimidazole, N-trichloromethylmercapto-4-cyclohexene-1,
2-dicarboximide. (2) Phenol-based pentachlorophenol, pentachlorophenol sodium deldrin, parachlorometaxylenol, 2,
2'-methylene-bis-4-chlorophenol, 2,
Halides of 2'-thiobis (4,6-dichlorophenol), salmethylanilide and saltylanilide. (3) Organic Mercury Compounds Phenylmercuric acetate, phenylmercuric oleate, diphenylmercury dodecenyl succinate, phenylmercuric dinaphthylmethanedisulfonate, dioctylsulfosuccinylphenylmercury. (4) Organotin compound Bis (tributyltin) oxide, tributyltin acetate, tributyltin chloride, tributyltin fluoride, bis (tributyltin) sulfide, hexabutyl-distane oxane (bis-tri-S-butyltin oxide). (5) Organic arsenic compound (6) Organic copper compound (7) Others α-bromo-p-chlorobenzalacetone.
【０００６】本発明ワックスの樹脂成分としては、アク
リル系樹脂エアルジョン、たとえば、（メタ）アクリル
酸メチル、（メタ）アクリル酸エチルなどの（メタ）ア
クリル酸エステルのエマルジョン、低分子ポリエチレン
エマルジョン、低分子ポリエチレンエマルジョン、低分
子ポリプロピレンエマルジョンなどの通常用いられてい
る樹脂成分を挙げることができる。As the resin component of the wax of the present invention, acrylic resin emulsion, for example, emulsion of (meth) acrylic acid ester such as methyl (meth) acrylate, ethyl (meth) acrylate, low molecular weight polyethylene emulsion, low molecular weight Examples of the commonly used resin component include polyethylene emulsion and low-molecular polypropylene emulsion.
【０００７】本発明のワックスへの他の添加成分として
は消泡剤、レベリング剤、香料など、通常ワックスの添
加剤として使用されているものであれば、いずれも使用
できる。As the other additive component to the wax of the present invention, any defoaming agent, leveling agent, perfume and the like can be used as long as they are commonly used as additives for wax.
【０００８】[0008]
実施例１ アクリル系樹脂エマルジョン＊1 ３１．１２ｗｔ％ スチレンマレイン酸共重合体エマルジョン＊2 ５．１４ｗｔ％ 低分子量ポリエチレンエマルジョン＊3 ５．７８ｗｔ％ グリコールエーテル（溶剤） ６．３４ｗｔ％ トリブトキシエチルホスフェイト（溶剤） １．１１ｗｔ％ 消泡剤 ０．０２ｗｔ％ レベリング剤（フッ素系） １．８５ｗｔ％ 香料 ０．０９ｗｔ％ 水 ４８．５５ｗｔ％ ＊1 アクリル系樹脂エマルジョンの濃度は４０ｗｔ％ ＊2 スチレンマレイン酸共重合体エマルジョンの濃度
は１５ｗｔ％ ＊3 低分子ポリエチレンエマルジョンの濃度は４０ｗ
ｔ％ 以上の組成のワックスに、抗菌剤をつぎの割合で配合し
た。Example 1 Acrylic resin emulsion * 1 31.12 wt% Styrene-maleic acid copolymer emulsion * 2 5.14 wt% Low molecular weight polyethylene emulsion * 3 5.78 wt% Glycol ether (solvent) 6.34 wt% Tributoxyethyl phosphate (Solvent) 1.11 wt% Defoamer 0.02 wt% Leveling agent (fluorine) 1.85 wt% Perfume 0.09 wt% Water 48.55 wt% * 1 Concentration of acrylic resin emulsion is 40 wt% * 2 Styrene maleic acid Concentration of copolymer emulsion is 15wt% * 3 Concentration of low molecular weight polyethylene emulsion is 40w
An antibacterial agent was added to the wax having a composition of t% or more in the following proportions.
【表１】 [Table 1]
【０００９】供試試料 予め表面に紙やすりで傷をつけたポリエチレン製シート
（１５ｃｍ×１５ｃｍ）に前記Ｎｏ．１〜Ｎｏ．４のワ
ックスエマルジョンを適用したものを供試試料とした。 塗布方法 １）ワックスエマルジョン０．６５ｍｌを試験片上に滴
下し、コンラーシ棒で全体に均一になるように塗布す
る。 ２）常温で、約３０分ほど乾燥させる。 ３）さらに０．６ｍｌをその上に滴下し、コンラーシ棒
で全体に均一になるように塗布する。 ４）常温で、約３０分ほど乾燥させる。 供試菌 Ｅｓｃｈｅｒｉｃｈｉａ ｃｏｌｉ（大腸菌） Ｂａｃｉｌｌｕｓ ｓｕｂｔｉｌｉｓ（枯草菌） Ｓｔａｐｈｙｌｏｃｏｃｕｓ ａｕｒｅｕｓ（ブドウ状
球菌） Ｐｓｅｕｄｏｍｏｎａｓ ａｅｒｕｇｉｎｏｓａ（緑膿
菌） Ｓａｌｍｏｎｅｌｌａ ｔｙｐｈｉｍｕｒｉｕｍ（ネズ
ミチフス菌） 寒天平板培地の調製 ハートインヒュージョン寒天斜面培地２４時間培養菌
を、滅菌生理食塩水に約１０8個／ｍｌとなるよう懸濁
させたのち、その０．２ｍｌをハートインヒュージョン
寒天培地１５ｍｌと混釈して平板に固める。 抗菌力試験 試料を直径６０ｍｍの円形に切り取って、先に調製した
寒天平板上に載せ３０℃、４８時間培養後、生育阻止帯
（ハロー）の幅を測定した。 生育阻止帯（ｍｍ）＝（Ｔ−Ｄ）／２ Ｔ：試料を含めた阻止帯の直径（ｍｍ） Ｄ：試料の直径（ｍｍ） 結果 結果を表２に示す。Specimen sample A sheet made of polyethylene (15 cm × 15 cm) whose surface was previously scratched with sandpaper had the above-mentioned No. 1-No. The sample to which the wax emulsion of 4 was applied was used as a test sample. Coating method 1) 0.65 ml of wax emulsion is dripped on the test piece, and it is spread evenly on the whole with a conular stick. 2) Dry at room temperature for about 30 minutes. 3) Furthermore, 0.6 ml is added dropwise onto it, and a uniform stick is applied so that the whole is even. 4) Dry at room temperature for about 30 minutes. Test bacteria Escherichia coli (E. coli) Bacillus subtilis (Bacillus subtilis) Staphylococcus aureus (Staphylococcus) Pseudomonas aeruginosa cultivated on the agar culture medium of Pseudomonas aeruginosa agar cultures (Pseudomonas aeruginosa cultivars of Pseudomonas aeruginosa cultivars of Salmonella typhimurium). After suspending it in sterile physiological saline at a concentration of about 10 8 cells / ml, 0.2 ml of the suspension is poured into 15 ml of heart infusion agar medium to be solidified. Antibacterial activity test A sample was cut into a circle with a diameter of 60 mm, placed on the agar plate prepared above, cultured at 30 ° C for 48 hours, and then the width of the growth inhibition zone (halo) was measured. Growth inhibition zone (mm) = (T−D) / 2 T: Diameter of inhibition zone including sample (mm) D: Diameter of sample (mm) Results The results are shown in Table 2.
【００１０】[0010]
【表２】 [Table 2]
【００１１】考察 Ｐｓｅｕｄｏｍｏｎａｓ ａｅｒｕｇｉｎｏｓａに対し
ても抗菌剤３ｗｔ％以上の添加により、良好な抗菌性が
得られている。Consideration Pseudomonas aeruginosa has also obtained good antibacterial properties by adding 3 wt% or more of the antibacterial agent.
【００１２】実施例２ 供試試料 床材（抗菌剤を１ｗｔ％含有するポリ塩化ビニル製のも
の）を１５×１５ｃｍの大きさに切取り、供試薬剤を所
定濃度添加した実施例１のワックスエマルジョンＮｏ．
１〜４をそれぞれ表面に塗布したものを供試試料とし
た。 塗布方法 １）ワックスエマルジョン０．６５ｍｌを試験片上に滴
下し、コンラーシ棒で全体に均一になるように塗布す
る。 ２）常温で、約３０分ほど乾燥させる。 ３）さらに０．６ｍｌをその上に滴下し、コンラーシ棒
で全体に均一になるように塗布する。 ４）常温で、約３０分ほど乾燥させる。 供試菌 細菌：Ｅｓｃｈｅｒｉｃｈｉａ ｃｏｌｉ（大腸菌） Ｂａｃｉｌｌｕｓ ｓｕｂｔｉｌｉｓ（枯草菌） Ｓｔａｐｈｙｌｏｃｏｃｕｓ ａｕｒｅｕｓ（ブドウ状
球菌） Ｐｓｅｕｄｏｍｏｎａｓ ａｅｒｕｇｉｎｏｓａ（緑膿
菌） Ｓａｌｍｏｎｅｌｌａ ｔｙｐｈｉｍｕｒｉｕｍ（ネズ
ミチフス菌） 真菌：Ａｓｐｅｒｇｉｌｌｕｓ ｎｉｇｅｒ Ｐｅｎｉｃｉｌｌｉｕｍ ｃｉｔｒｉｎｕｍ Ｃｌａｄｏｓｐｏｒｉｕｍ ｈｅｒｂａｒｕｍ 寒天平板培地の調製 細菌：ハートインヒュージョン寒天斜面培地２４時間培
養菌を、滅菌生理食塩水に約１０8個／ｍｌとなるよう
懸濁させたのち、その０．２ｍｌをハートインヒュージ
ョン寒天培地１５ｍｌと混釈して平板に固める。 真菌：各供試菌の単一胞子懸濁液０．２ｍｌと、クロラ
ムフェニコール１０％アルコール溶液０．１５ｍｌをポ
テトデキストロース寒天培地１５ｍｌと混釈して平板に
固める。 抗菌力試験 試料を直径６０ｍｍの円形に切り取って、先に調製した
寒天平板上に載せ、細菌で３０℃、４８時間、真菌で２
８℃、１２０時間培養後、生育阻止帯（ハロー）の幅を
測定した。 生育阻止帯（ｍｍ）＝（Ｔ−Ｄ）／２ Ｔ：試料を含めた阻止帯の直径（ｍｍ） Ｄ：試料の直径（ｍｍ） 結果 結果を表３〜４に示す。Example 2 Test sample A wax emulsion of Example 1 in which a floor material (made of polyvinyl chloride containing 1 wt% of an antibacterial agent) was cut into a size of 15 × 15 cm, and a test reagent agent was added at a predetermined concentration. No.
The test samples were prepared by coating 1 to 4 on the surface. Coating method 1) 0.65 ml of wax emulsion is dripped on the test piece, and it is spread evenly on the whole with a conular stick. 2) Dry at room temperature for about 30 minutes. 3) Furthermore, 0.6 ml is added dropwise onto it, and a uniform stick is applied so that the whole is even. 4) Dry at room temperature for about 30 minutes. Test bacteria Bacteria: Escherichia coli (E. coli) Bacillus subtilis (B. subtilis) Staphylococus aureus (Staphylococcus aureus) Pseudomonas aeruginosa (P. aeruginosa) Salmonella typhimurium (Salmonella typhimurium) fungi: Aspergillus niger Penicillium citrinum Cladosporium herbarum agar plate medium prepared bacteria : Heart infusion agar slant culture medium 24 hours-cultured cells were suspended in sterile physiological saline at a concentration of about 10 8 cells / ml, 0.2 ml of which was mixed with 15 ml of heart infusion agar medium and plated. Harden. Fungus: 0.2 ml of a single spore suspension of each test bacterium and 0.15 ml of a 10% alcohol solution of chloramphenicol are mixed with 15 ml of potato dextrose agar medium to be solidified. Antibacterial activity test Cut a sample into a circle with a diameter of 60 mm, place it on the agar plate prepared above, and use bacteria for 2 hours at 30 ° C for 48 hours.
After culturing at 8 ° C. for 120 hours, the width of the growth inhibition zone (halo) was measured. Growth inhibition zone (mm) = (TD) / 2 T: Diameter of inhibition zone including sample (mm) D: Diameter of sample (mm) Results The results are shown in Tables 3 and 4.
【００１３】[0013]
【表３】 [Table 3]
【表４】 [Table 4]
【００１４】考察 ワックスエマルジョン中に薬剤を添加しない場合でもＰ
ｓｅｕｄｏｍｏｎａｓａｅｒｕｇｉｎｏｓａを除いた菌
種においては生育阻止帯の形成が見られ、Ｐｓｅｕｄｏ
ｍｏｎａｓ ａｅｒｕｇｉｎｏｓａに対しても抗菌剤を
３〜５％添加することにより抗菌性が得られることが認
められた。また、カビ（真菌）に対しては十分な抗菌性
を示した。Discussion Even if no drug is added to the wax emulsion, P
In the strains excluding Pseudomonas aeruginosa, a growth arrest zone was observed, and Pseudo
It was confirmed that the antibacterial property can be obtained by adding 3 to 5% of the antibacterial agent to Monas aeruginosa. It also showed sufficient antibacterial activity against mold (fungus).
【００１５】[0015]
【効果】床材中に、抗菌剤を添加し、抗菌剤を添加した
ワックスエマルジョンにてメンテナンスを行うことによ
り、Ｐｓｅｕｄｏｍｏｎａｓ ａｅｒｕｇｉｎｏｓａを
はじめとした細菌および、真菌に対し良好な抗菌性を得
ることができる。[Effect] By adding an antibacterial agent to the floor material and performing maintenance with a wax emulsion containing the antibacterial agent, good antibacterial activity against bacteria such as Pseudomonas aeruginosa and fungi can be obtained. .
Claims (3)
ワックスを塗布してなる床構造。3. A floor structure obtained by applying the wax according to claim 2 to a floor surface containing an antibacterial agent.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17998293A JPH0711195A (en) | 1993-06-25 | 1993-06-25 | Wax |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17998293A JPH0711195A (en) | 1993-06-25 | 1993-06-25 | Wax |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0711195A true JPH0711195A (en) | 1995-01-13 |
Family
ID=16075390
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17998293A Pending JPH0711195A (en) | 1993-06-25 | 1993-06-25 | Wax |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0711195A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010275196A (en) * | 2009-05-26 | 2010-12-09 | Nippon Soda Co Ltd | Transparent film-forming liquid antimicrobial agent composition |
| CN102965027A (en) * | 2012-12-14 | 2013-03-13 | 吴江市利达上光制品有限公司 | Anticorrosive bactericidal glazing agent for leather |
| JPWO2011074188A1 (en) * | 2009-12-15 | 2013-04-25 | 日本曹達株式会社 | Transparent film-forming liquid antibacterial agent composition |
-
1993
- 1993-06-25 JP JP17998293A patent/JPH0711195A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010275196A (en) * | 2009-05-26 | 2010-12-09 | Nippon Soda Co Ltd | Transparent film-forming liquid antimicrobial agent composition |
| JPWO2011074188A1 (en) * | 2009-12-15 | 2013-04-25 | 日本曹達株式会社 | Transparent film-forming liquid antibacterial agent composition |
| JP5550661B2 (en) * | 2009-12-15 | 2014-07-16 | 日本曹達株式会社 | Transparent film-forming liquid antibacterial agent composition |
| CN102965027A (en) * | 2012-12-14 | 2013-03-13 | 吴江市利达上光制品有限公司 | Anticorrosive bactericidal glazing agent for leather |
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