JPH07110570A - Laminated adhesive film for protecting photomask - Google Patents

Abstract

PURPOSE:To provide a laminated adhesive film for protecting a photomask capable of preventing the generation of wrinkles while maintaining a high beam transmittance by using a thin substrate. CONSTITUTION:An adhesive layer 12 having 2mum thickness is provided on one side of a transparent polyester substrate 11 having 6mum thickness and a releasable layer 13 on the other side of the substrate 11 to constitute a film 1 for protecting a photomask. A releasable paper 2 consisting of a polyester film is laminated on the adhesive layer 12, and a protective material 3 consisting of a poly(ethylene terephthalate) film 31 having 25mum thickness and an acrylic adhesive layer 32 is laminated on the releasable layer 13.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an adhesive film for protecting a photographic material film such as a photomask used for plate making.

[0002]

2. Description of the Related Art Conventionally, as an adhesive film for protecting a photomask, an adhesive layer is provided on one side of a polyester substrate and a release layer is provided on the other side, as described in JP-A-4-355759, for example. Is used. The polyester base material has a thickness of 3 to 25 μm.

Further, US Pat. No. 4,077,830 discloses a photolithographic material in which an adhesive layer is provided on one surface of a protective sheet having a thickness of less than 0.002 inch, and a release paper is laminated on the adhesive layer. Has been done.

[0004]

The materials described in the above publications require a high light transmittance, and thus all use a thin base material. In use, the release paper is peeled off and attached to the plate-making material. At this time, since the thickness of the base material is very thin, wrinkles are likely to occur on the base material when the base material is attached to the plate-making material, which causes a problem in plate-making.

The present invention solves the above-mentioned conventional problems and uses a thin base material while maintaining high light transmittance.
An object of the present invention is to provide a laminated adhesive film for protecting a photomask, which can prevent wrinkles from occurring.

[0006]

A film for protecting a photomask has (1) a high light transmittance,
(2) The quality such as adhesive strength does not deteriorate due to ultraviolet rays,
(3) It is required that the plate-making material can be peeled off without leaving an adhesive. Therefore, if the thickness of the base material is simply increased for the purpose of improving the workability of bonding without generating wrinkles, the light transmittance will be reduced, and the object of the present invention cannot be achieved. The present invention has the following means to achieve the above object.

The laminated adhesive film for protecting a photomask according to claim 1, wherein an adhesive layer is provided on one surface of a transparent synthetic resin substrate and a release layer is provided on the other surface of the adhesive layer surface of the photomask protecting film. A release paper is laminated on the above, and a pressure-sensitive adhesive layer of a protective material having a pressure-sensitive adhesive layer on one side is laminated on the above-mentioned release layer.

In the laminated adhesive film for protecting a photomask according to a second aspect of the present invention, a transparent synthetic resin substrate is provided with an adhesive layer on one surface and a release layer on the other surface to remove a photomask protecting film. One of the layers is a release layer, and the other side is laminated with a pressure-sensitive adhesive layer of a protective material having a pressure-sensitive adhesive layer.

The synthetic resin substrate used in the photomask protecting film of the present invention is preferably a transparent polyester film having a high light transmittance. Its thickness is 4 to 2
5 μm is preferable. As the pressure-sensitive adhesive layer provided on one surface of the base material, one having a high light transmittance is used, and one having a thickness of 25 μm or less based on an acrylic resin is preferable. The release layer is made of a silicon-based material which is conventionally used. The release layer may be directly provided on the base material, but it is preferred that the antistatic layer is formed on the surface of the base material and the release layer is provided on this surface.

In the laminated adhesive film for protecting a photomask according to claim 1, the release paper laminated on the adhesive layer of the film for protecting a photomask may be a conventionally used one such as a polyester film.

The protective material laminated on the release layer may be a synthetic resin film such as polyester, polypropylene or polyamide as a support, or a synthetic resin film having transparency, and the thickness thereof is 10 to 50 μm. Are preferred. The pressure-sensitive adhesive layer provided on the above-mentioned protective material can be made of an acrylic type, a rubber type, or the like, and preferably has a pressure-sensitive adhesive force equal to or lower than that of the pressure-sensitive adhesive layer of the photomask protecting film. The thickness of the pressure-sensitive adhesive layer is preferably 30 μm or less.

Next, as the support and the pressure-sensitive adhesive layer of the protective material used in the photomask-protecting laminated pressure-sensitive adhesive film of the second aspect, those similar to those of the first aspect are used. The release layer provided on the protective material may be the same as that used for the release paper according to the first aspect.

[0013]

In the laminated adhesive film for protecting a photomask according to claim 1, since the protective material is laminated on the material for plate making laminated with the film for protecting a photomask, the film for protecting a photomask is thin and thick. Even if it is weak and easily wrinkles, it is supported by the protective material and bonded without wrinkling. The protective material is then peeled off.

In the laminated adhesive film for protecting a photomask according to a second aspect, since one side of the protective material is a release layer, a release paper is not required, and even when it is formed into a roll, it does not become bulky and the protective material is laminated. When the film is adhered to the plate-making material, the thin photomask protective film is supported by the protective material and adhered without wrinkles. The protective material is then peeled off.

[0015]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of a photomask protective laminated adhesive film of the present invention will be described below with reference to the drawings. (Embodiment 1) FIG. 1 is a sectional view showing an embodiment of the laminated adhesive film for protecting a photomask of the present invention according to claim 1.
Reference numeral 1 is a photomask protecting film, and a pressure-sensitive adhesive layer 1 having a thickness of 2 μm on one side of a transparent polyester substrate 11 having a thickness of 6 μm.
2, a release layer 13 is provided on the other surface of the base material 11. On the pressure-sensitive adhesive layer 12, a release paper 2 made of a polyester film having a thickness of 25 μm is laminated.

Reference numeral 3 denotes a protective material, which is a 25 μm-thick polyester sheet 31 having a 10 μm-thick acrylic pressure-sensitive adhesive layer 32 laminated on one side thereof. The pressure-sensitive adhesive layer 32 is bonded to the release layer 13. It becomes.

Next, as shown in FIG. 5, the laminated adhesive film for protecting the photomask is fed out from the roll-shaped tape 4 which is wound with the release paper 2 inside, and the release paper 2 is peeled off, and the pressure roll 5, 5, while the underfilm 6 is fed between the pressure rolls 5 and 5, a polyethylene terephthalate film 7 of 510 mm × 510 mm in thickness having a thickness of 100 μm is placed on the pressure roll 5, and the pressure roll 5 is pressed. It was pressure-bonded between 5 and laminated. Reference numerals 8 and 8 are guide plates of the under film 6. Ten laminated products were manufactured. The polyethylene terephthalate film 7 having a thickness of 100 μm was used as a substitute for a photomask. When the laminated state of the above-mentioned laminated product was observed, there was no wrinkle.

(Embodiment 2) FIG. 2 is a sectional view showing another embodiment of the laminated adhesive film for protecting a photomask according to the present invention according to claim 1, wherein an antistatic agent is applied to the other surface of the transparent polyester substrate 11. 14 has the same structure as that of the first embodiment except that a photomask protecting film 1'having a coating 14 and a release layer 13 provided on the surface of the antistatic agent 14 is used.

Using this, 510 mm as in the first embodiment
Ten pieces were laminated on a polyethylene terephthalate film having a size of × 510 mm and a thickness of 100 μm to produce 10 sheets. When the laminated state of the above-mentioned laminated product was observed, there was no wrinkle.

(Embodiment 3) FIG. 3 is a cross-sectional view showing an embodiment of the laminated adhesive film for protecting a photomask according to the present invention, which is the same as that used in Embodiment 1. Of the release layer 13 and the acrylic pressure-sensitive adhesive layer 32 on one side of the polyester sheet 31 having a thickness of 25 μm.
Is provided with a thickness of 10 μm, and the polyester sheet 31
The pressure-sensitive adhesive layer 3 of the protective material 3 ′ having the release layer 33 on the other surface
2 is pasted together.

Using this, 510 mm as in the first embodiment
Ten pieces were laminated on a polyethylene terephthalate film having a size of × 510 mm and a thickness of 100 μm to produce 10 sheets. However, since the release paper 2 of the first embodiment is not used in the third embodiment, the release paper 2 of FIG.
Is not peeled off. When the laminated state of the above-mentioned laminated product was observed, there was no wrinkle.

(Embodiment 4) FIG. 4 is a cross-sectional view showing another embodiment of the laminated adhesive film for protecting a photomask according to the present invention, which is the same as that used in Embodiment 2. The structure is the same as that of the third embodiment except that the film 1'is used.

Using this, 510 mm as in the first embodiment
Ten pieces were laminated on a polyethylene terephthalate film having a size of × 510 mm and a thickness of 100 μm to produce 10 sheets. However, since the release paper 2 of the first embodiment is not used in the fourth embodiment, the release paper 2 of FIG.
Is not peeled off. When the laminated state of the above-mentioned laminated product was observed, there was no wrinkle.

Comparative Example A polyethylene terephthalate film having a thickness of 25 μm was formed on the adhesive layer surface of a protective film in which a non-treated surface of a polyethylene terephthalate film having a thickness of 6 μm and an acrylic adhesive layer having a thickness of 4 μm was provided. Is a film for protecting a photomask, which is formed by laminating the release-treated surface of a release film (not shown).

The above photomask protecting film was peeled off in the same manner as in Example 1 while the peeling film was being peeled off to 510 mm.
Ten pieces were laminated on a polyethylene terephthalate film having a size of × 510 mm and a thickness of 100 μm to produce 10 sheets. Observation of the laminated state of the above laminated product revealed wrinkles on four sheets.

[0026]

The laminated adhesive film for protecting a photomask of the present invention has the above-mentioned constitution. According to the first aspect of the invention, the protective material is laminated on the plate-making material laminated with the photomask protecting film. It is supported by a protective material and bonded without wrinkling.

In the laminated adhesive film for protecting a photomask of the present invention as defined in claim 2, since one surface of the protective material is a release layer, release paper is not required, and even if it is used as a roll, it does not become bulky and is protected. When the film is laminated on the plate-making material, it is adhered to the plate-making material without being wrinkled by being supported by the protective material.

Therefore, according to the laminated adhesive film for protecting a photomask of the present invention according to the first and second aspects, a plate-making process is performed without wrinkles while maintaining high light transmittance using a thin base material. Can be attached to the material.

[0029]

[Brief description of drawings]

FIG. 1 is a cross-sectional view showing an embodiment of a laminated adhesive film for protecting a photomask of the present invention according to claim 1.

FIG. 2 is a cross-sectional view showing another embodiment of the laminated adhesive film for protecting a photomask of the present invention according to claim 1.

FIG. 3 is a cross-sectional view showing an embodiment of the laminated adhesive film for protecting a photomask of the present invention according to claim 2.

FIG. 4 is a sectional view showing another embodiment of the laminated adhesive film for protecting a photomask of the present invention according to claim 2;

FIG. 5 is an explanatory view for explaining a state in which the laminated adhesive film for protecting a photomask of the present invention according to claim 1 is laminated on another film.

[Explanation of symbols]

 1, 1 ': Photomask protection film 2: Release paper 3, 3': Protective material 11: Polyester substrate 12: Adhesive layer 13, 33: Release layer 14: Antistatic agent 31: Polyester sheet 32: Acrylic type Adhesive layer

Claims (2)

[Claims] 1. A transparent synthetic resin substrate having a pressure-sensitive adhesive layer on one side and a release layer on the other side, and a release paper laminated on the pressure-sensitive adhesive layer side of a photomask protecting film, and the pressure-sensitive adhesive layer on one side. A laminated adhesive film for protecting a photomask, comprising a pressure-sensitive adhesive layer of a protective material having the above-mentioned structure laminated on the release layer. 2. A transparent synthetic resin base material having a pressure-sensitive adhesive layer on one side and a release layer on the other side, and a release layer on one side of the release layer of a photomask protecting film, which has a release layer on the other side. A laminated adhesive film for protecting a photomask, characterized in that an adhesive layer of a protective material having an agent layer is laminated.