JPH0674463B2 - Copper alloy for lead frame - Google Patents
Copper alloy for lead frameInfo
- Publication number
- JPH0674463B2 JPH0674463B2 JP1316983A JP1316983A JPH0674463B2 JP H0674463 B2 JPH0674463 B2 JP H0674463B2 JP 1316983 A JP1316983 A JP 1316983A JP 1316983 A JP1316983 A JP 1316983A JP H0674463 B2 JPH0674463 B2 JP H0674463B2
- Authority
- JP
- Japan
- Prior art keywords
- alloy
- lead frame
- conductivity
- heat resistance
- copper alloy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
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- Conductive Materials (AREA)
- Lead Frames For Integrated Circuits (AREA)
Description
【発明の詳細な説明】 本発明は半導体を要素とするIC、LSI等の機器のリード
フレーム用銅合金特に電気(熱)伝導性、耐熱性、曲げ
加工性及びメツキ密着性に優れた銅合金に関するもので
ある。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a copper alloy for a lead frame of a device such as an IC and an LSI having a semiconductor as an element, particularly a copper alloy excellent in electric (thermal) conductivity, heat resistance, bending workability and mating adhesion. It is about.
一般に半導体を要素とするIC、LSI等の機器は何れも半
導体ペレツト、リード、ボンデイングワイヤにより構成
されたものをハーメチツクシール、セラミツクシール或
いはプラスチツクシール技術により封止したものであ
り、種々の型式のものが使用されている。Generally, devices such as ICs and LSIs, which are semiconductors, are all composed of semiconductor pellets, leads, bonding wires and sealed with hermetic seal, ceramic seal or plastic seal technology. Are used.
而して従来これら機器のリードフレーム材としては鉄系
材料としてコバール(Fe−29wt% Ni−17wt%Co合
金)、Fe−42Ni合金、Fe、コバールに金を被覆したクラ
ツド材、Fe−Ni合金にAlを被覆したクラツド材、銅合金
としてリン青銅、アロイ194(Cu−Fe−Zn−P合金)、
アロイ195(Cu−Fe−Co−Sn−P合金)、Cu−Sn−P合
金等が用いられている。しかしながら上記鉄系材料は耐
熱性、強度は優れているがコストが高いとともに導電性
が悪く加工性も悪いため近時コストが安くかつ加工性、
メツキ密着性及び半田付性が良好な銅系合金が主流を占
めつつある。しかしながら上記の如き銅合金は耐熱性及
び曲げ加工性が劣るためリードフレーム材として充分な
特性を発揮することができないものであつた。特に最近
のように高密度、高集積度が強く要求されるところから
高い導電率、強度、曲げ加工性及び耐熱性を有しメツキ
加工され易い表面品質を有する材料が必要となつてき
た。Thus, as lead frame materials for these devices, Kovar (Fe-29wt% Ni-17wt% Co alloy), Fe-42Ni alloy, Fe, Kovar's clad material, Fe-Ni alloy have been used as lead frame materials for these devices. A cladding material coated with Al, phosphor bronze as a copper alloy, Alloy 194 (Cu-Fe-Zn-P alloy),
Alloy 195 (Cu-Fe-Co-Sn-P alloy), Cu-Sn-P alloy, etc. are used. However, the above iron-based materials are excellent in heat resistance and strength, but cost is high and conductivity is poor and workability is poor.
Copper-based alloys, which have good adhesion and solderability, are becoming the mainstream. However, the above-mentioned copper alloy is inferior in heat resistance and bending workability, so that it cannot exhibit sufficient characteristics as a lead frame material. Especially since high density and high degree of integration have been strongly demanded recently, a material having high conductivity, strength, bending workability and heat resistance and having a surface quality which is easily processed by plating has been required.
メツキ加工され易い表面品質とは、半導体ペレツトとリ
ードフレーム並びにボンデイングワイヤとリードフレー
ムの接続性を向上し、リードフレームの耐酸化性、耐腐
食性、半田付け性等を向上維持するために行なう銀、
金、ニツケル、スズ等のメツキ被覆性が優れていること
で、このようなメツキ加工はリードフレームの加工コス
ト中大きな比重を占め品質信頼性に大きく影響する。The surface quality that is easy to be plated is silver used to improve the connectivity between the semiconductor pellet and the lead frame and the bonding wire and the lead frame, and to improve the oxidation resistance, corrosion resistance and solderability of the lead frame. ,
Due to the excellent coating coverage of gold, nickel, tin, etc., such plating processing occupies a large proportion in the processing cost of the lead frame and greatly affects the quality reliability.
コバール、Fe−42Ni合金等の鉄系材料は、導電性、熱伝
導性が劣るばかりかメツキ加工が困難で特別の工夫を必
要とする。例えばこれ等基材の表面にニツケル層とSn−
Ni合金層とを順次被着した後、該Sn−Ni合金層上に銀層
を被着するか、或は基材の表面に銀及び銅を含むシアン
アルカリ性メツキ液にメツキを施し、その表面にメツキ
を行なつている。一般にリードフレーム材用銅合金とし
て次の7項目を満足する材料が強く要望されている。Iron-based materials such as Kovar and Fe-42Ni alloys are not only inferior in electrical conductivity and thermal conductivity, but also difficult to be plated and require special measures. For example, a nickel layer and Sn-
After sequentially depositing a Ni alloy layer, a silver layer is deposited on the Sn-Ni alloy layer, or the surface of the substrate is plated with a cyan alkaline plating solution containing silver and copper, and the surface thereof is coated. Is making a purchase. In general, there is a strong demand for materials satisfying the following seven items as copper alloys for lead frame materials.
(1)電気及び熱の伝導性が良いこと (2)耐熱性が良いこと (3)曲げ加工性が良いこと (4)強度が大きいこと (5)メツキ密着性が良いこと (6)半田付け性が良いこと (7)熱膨張係数がモールド材の熱膨張係数に近いこと 本発明はこれに鑑み種々研究の結果従来のリードフレー
ム用銅合金よりも耐熱性、曲げ加工性に優れ充分な強度
と電気(熱)伝導性及びメツキ密着性を有する半導体機
器のリードフレーム用銅合金を開発したものでCr0.03〜
0.40wt%(以下wt%を単に%に略記する)、Ni0.03〜0.
40%、P0.005〜0.03%を含み残部Cuからなる合金に係
る。(1) Good electrical and thermal conductivity (2) Good heat resistance (3) Good bending workability (4) Great strength (5) Good adhesion to solder (6) Soldering (7) The coefficient of thermal expansion is close to the coefficient of thermal expansion of the molding material. As a result of various studies in view of this, the present invention is superior in heat resistance and bending workability to conventional lead frame copper alloys and has sufficient strength. We have developed a copper alloy for lead frames of semiconductor devices that has electrical (heat) conductivity and adhesiveness of Cr 0.03 ~
0.40 wt% (hereinafter wt% is simply abbreviated to%), Ni 0.03 to 0.
It relates to an alloy containing 40% and P0.005 to 0.03% and the balance Cu.
即ち本発明合金はCuを基材としこれにCr、Ni、Pを添加
するものであり、CrNi3、NixPy等の金属間化合物及びC
r、NiをCu基中に微小析出物として析出させ、またPに
よる脱酸効果とにより銅合金としての従来の常識を超え
る強度、耐熱性及び導電性を有し、良好なメツキ密着
性、半田付け性を有するものである。That is, the alloy of the present invention has Cu as a base material and Cr, Ni, and P added thereto, and the intermetallic compounds such as CrNi 3 and NixPy and C
Precipitating r and Ni as fine precipitates in the Cu base, and the deoxidizing effect of P have strength, heat resistance and conductivity that exceed conventional wisdom as a copper alloy, and have good plating adhesion and solder. It has adhesiveness.
しかして本発明合金においてCr0.03〜0.40%、Ni0.03〜
0.40%、P0.005〜0.03%と限定した理由はCr0.03%、Ni
0.03%、P0.005%未満では必要とする強度、耐熱性が得
られず、Cr0.40%、Ni0.40%、P0.03%を超えると強
度、耐熱性において優れた性能が得られるが電気及び熱
伝導性が低下し、曲げ加工性、メツキ密着性及び半田付
け性も劣化するからである。However, in the alloy of the present invention, Cr 0.03 to 0.40%, Ni 0.03 to
The reason for limiting to 0.40%, P0.005-0.03% is Cr0.03%, Ni
If it is less than 0.03% and P0.005%, the required strength and heat resistance cannot be obtained, and if it exceeds Cr0.40%, Ni0.40% and P0.03%, excellent performance in strength and heat resistance is obtained. This is because electrical and thermal conductivity is reduced, and bending workability, plating adhesion and solderability are also deteriorated.
以下本発明合金を実施例について説明する。Examples of the alloy of the present invention will be described below.
黒鉛るつぼを使用してCuを溶解し、その湯面を木炭粉末
にて覆い十分溶解した後、Cu−Cr母合金、Ni、Pの順に
添加しこれを鋳造し第1表に示す組成の幅150mm、長さ2
00mm、厚さ25mmの鋳塊を得た。Cu was melted using a graphite crucible, the hot water surface was covered with charcoal powder and sufficiently melted, and then Cu-Cr mother alloy, Ni, and P were added in this order, and this was cast to give the composition width shown in Table 1. 150mm, length 2
An ingot having a thickness of 00 mm and a thickness of 25 mm was obtained.
次にこの鋳塊の表面を一面あたり2.5mm面削した後、熱
間圧延を行ない幅150mm、厚さ8mmの板とし、しかる後こ
の板に冷間圧延と焼鈍を繰り返し加え最終圧延率40%に
て厚さ0.45mmの冷間圧延上がり材を得た。Next, after the surface of this ingot is chamfered by 2.5 mm per side, hot rolling is performed to obtain a plate with a width of 150 mm and a thickness of 8 mm, and then cold rolling and annealing are repeatedly applied to this plate and the final rolling rate is 40%. A cold rolled rolled material having a thickness of 0.45 mm was obtained.
これらの板について曲げ加工性、導電率、引張り強さ、
耐熱性、メツキ密着性、半田付け性及び熱膨張係数を測
定した。これらの結果を第1表に示す。なお比較のため
に第1表に示す従来のリードフレーム用銅合金について
も同様な測定を行ない、その結果を第1表に併記した。Bendability, conductivity, tensile strength,
The heat resistance, adhesiveness to solder, solderability and coefficient of thermal expansion were measured. The results are shown in Table 1. For comparison, the same measurement was performed for the conventional copper alloy for lead frames shown in Table 1, and the results are also shown in Table 1.
曲げ加工性は板材より幅5mm、長さ50mmの短冊型試験片
を切り出しその中央部で180°密着曲げを行ない、該曲
げ部の表面状態を観察し割れ、しわの発生がなく平滑な
ものを曲げ加工性が良いということで○印、割れが明ら
かに発生しているものを曲げ加工性不良ということで×
印、その中間で割れ、しわがわずかに発生していること
を△印で表わした。Bending workability is 5 mm wide and 50 mm long from the plate material and cut out a rectangular test piece, and perform 180 ° close contact bending at the center part, observing the surface state of the bending part, cracking, smoothness without wrinkles Bending workability is good, and ○ indicates that cracking is apparent, and bending workability is bad.
A mark and a slight wrinkle in the middle are indicated by a mark.
導電率及び引張り強さの測定はJIS−H0505及びJIS−Z22
41に基づいて行なつた。Conductivity and tensile strength are measured according to JIS-H0505 and JIS-Z22
Based on 41.
メツキ密着性は上記鈍し材についてリードフレームのメ
ツキ工程と同様アルカリ脱脂(1分間)−20%硝酸エツ
チング(30秒)−水洗−シアン化ストライクメツキ(10
A/dm2、10秒間)−シアン化銀メツキ(1A/dm2)により
厚さ7μの銀メツキを行ない。これを大気中で加熱して
銀メツキ層に発生する膨れを観察し、その結果550℃、
5分間加熱で全く膨れの見られないものを○印、450
℃、5分間加熱では膨れが見られないが、550℃、5分
間加熱で膨れが発生するものを△印、450℃、5分間で
すでに膨れが発生したものを×印で示した。The adhesion of the matting is the same as in the mating process of the lead frame for the blunted material. Alkali degreasing (1 minute) -20% nitric acid etching (30 seconds) -Washing-Cyanide strike plating (10
A / dm 2 , for 10 seconds) -silver cyanide plating (1 A / dm 2 ) gives a 7 μm thick silver plating. This is heated in the atmosphere and the swelling that occurs in the silver plating layer is observed.
○: No swelling after heating for 5 minutes
No swelling is observed after heating at 5 ° C. for 5 minutes, but swelling occurs at 550 ° C. for 5 minutes, and Δ indicates swelling at 450 ° C. for 5 minutes.
半田付け性は垂直式浸漬法により、230℃のSn−40%Pb
共晶半田浴に10秒間浸漬したものの表面を観察し、その
結果表面が滑らかなものを○印、表面に少し凹凸が見え
るものを△印、表面に凹凸が生じ半田が濡れていない部
分を生じているものを×印で示した。Solderability is measured by vertical dipping method at 230 ℃ Sn-40% Pb
Observe the surface of the product immersed in the eutectic solder bath for 10 seconds, and as a result, the one with a smooth surface is marked with a circle, and the one with a slight unevenness on the surface is marked with a triangle, and the unevenness is generated on the surface. What is shown is indicated by X.
また耐熱性は前記圧延材よりJIS−Z2201に規定する引張
り試験片を切り出し、これをアルゴン雰囲気中で350
℃、5分間加熱焼鈍した後、引張り試験を行ない、その
引張り強さを焼鈍前と比較し強さの低下率が30%以下の
ものを耐熱性良好として○印、30%を超えるものを耐熱
性不良として×印で表わした。Heat resistance is cut out from the tensile test specimen specified in JIS-Z2201 from the rolled material, and this is 350
After annealing at 5 ° C for 5 minutes, a tensile test is performed, and the tensile strength is 30% or less compared to that before annealing. Poorness is indicated by a cross.
熱膨張係数は圧縮荷重法を用いて測定し、試 料への荷重は天秤の非平衡を利用し、試料の変位を検出
し行なつた。The thermal expansion coefficient was measured using the compressive load method and tested. The non-equilibrium of the balance was used for the load on the material, and the displacement of the sample was detected.
第1表から明らかな如く本発明合金は導電率90〜93%IA
CS、引張り強さ39〜42kg/mm2の特性を示し良好な曲げ加
工性と耐熱性を有しておりCu−Fe−Zn−P合金に匹敵す
る引張り強度とはるかに優れた耐熱性、電気伝導性(熱
伝導性)を有していることがわかる。さらにメツキ密着
性、半田付け性もCu−Fe−Zn−P合金に比べ十分優れて
いるのがわかる。尚熱膨張係数は従来品のCu−Fe−Zn−
P合金、Cu−Sn−P合金とほぼ同様な値を示し問題はな
い。As is apparent from Table 1, the alloy of the present invention has an electric conductivity of 90 to 93% IA.
CS and tensile strength of 39 to 42 kg / mm 2 and excellent bending workability and heat resistance. Tensile strength comparable to Cu-Fe-Zn-P alloy and much better heat resistance and electrical resistance. It can be seen that it has conductivity (heat conductivity). Further, it can be seen that the plating adhesion and solderability are sufficiently superior to the Cu-Fe-Zn-P alloy. The coefficient of thermal expansion is Cu-Fe-Zn-
The values are almost the same as those of the P alloy and Cu-Sn-P alloy, and there is no problem.
これに対しCr、Ni、Pの含有量が本発明合金の組成範囲
より少ない比較合金No.7,8,9ではいずれも耐熱性が改善
されず、Cr、Niの含有量が本発明合金の組成範囲より多
い比較合金No.10Cr、Ni、Pの含有量が本発明合金の組
成範囲より多い比較合金No.11,12,13では引張り強さ、
耐熱性は十分であるが導電率の低下が著しく、曲げ加工
性、メツキ密着性、半田付け性が劣ることがわかる。On the other hand, in Comparative Alloys Nos. 7, 8 and 9 in which the contents of Cr, Ni and P are less than the composition range of the alloy of the present invention, the heat resistance was not improved and the contents of Cr and Ni of the alloy of the present invention were not improved. Comparative alloys Nos. 10, 12, and 13 in which the contents of comparative alloys No. 10 Cr, Ni, and P, which are higher than the composition range, are higher than the compositional range of the alloy of the present invention, tensile strength,
It can be seen that although the heat resistance is sufficient, the conductivity is remarkably lowered, and the bending workability, the plating adhesion, and the solderability are poor.
以上詳述したように本発明合金は優れた強度、耐熱性と
十分な導電性を併せ持ち、かつ曲げ加工性、メツキ密着
性、半田付け性も良好な銅合金であり、熱膨張係数も従
来の銅合金とほぼ同様な値を示し、半導体機器のリード
フレーム材として顕著な効果を奏するものである。As described in detail above, the alloy of the present invention is a copper alloy having both excellent strength, heat resistance and sufficient conductivity, bending workability, mating adhesion, and solderability, and has a thermal expansion coefficient of the conventional level. It exhibits almost the same value as copper alloy, and has a remarkable effect as a lead frame material for semiconductor devices.
Claims (1)
0.005〜0.03wt%を含み残部がCuよりなることを特徴と
するリードフレーム用銅合金。1. Cr0.03-0.40 wt%, Ni0.03-0.40 wt%, P
A copper alloy for a lead frame, characterized by containing 0.005 to 0.03 wt% and the balance being Cu.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1316983A JPH0674463B2 (en) | 1983-01-29 | 1983-01-29 | Copper alloy for lead frame |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1316983A JPH0674463B2 (en) | 1983-01-29 | 1983-01-29 | Copper alloy for lead frame |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59140338A JPS59140338A (en) | 1984-08-11 |
JPH0674463B2 true JPH0674463B2 (en) | 1994-09-21 |
Family
ID=11825669
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1316983A Expired - Lifetime JPH0674463B2 (en) | 1983-01-29 | 1983-01-29 | Copper alloy for lead frame |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0674463B2 (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62120450A (en) * | 1985-11-19 | 1987-06-01 | Nakasato Kk | Spring material for use in electromechanical connection for electrical and electronic machine parts and its production |
KR890004860B1 (en) * | 1986-06-19 | 1989-11-30 | 풍산금속공업 주식회사 | Copper alloy of electric parts and manufacturing method of copper alloy sheet |
FR2751990B1 (en) * | 1996-07-30 | 1998-10-02 | Griset Ets | COPPER-BASED ALLOY WITH HIGH ELECTRICAL CONDUCTIVITY AND SOFTENING TEMPERATURE FOR ELECTRONIC APPLICATIONS |
-
1983
- 1983-01-29 JP JP1316983A patent/JPH0674463B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPS59140338A (en) | 1984-08-11 |
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