JPH0668591B2 - Method for manufacturing electrode substrate for liquid crystal device - Google Patents

Description

The present invention relates to a method of manufacturing an electrode substrate for a liquid crystal device used for a transmissive liquid crystal display device for a television or a liquid crystal optical shutter for an electrophotographic printer.

[Technical Background of the Invention and Problems Thereof] Recently, for example, in a liquid crystal display device for a television, particularly a color liquid crystal display device, light leakage from a non-electrode portion of a transparent substrate is suppressed, and an image display contrast is improved. For this purpose, a light shielding film has been formed on the non-electrode portion. In other words, the liquid crystal does not operate in the non-electrode portion such as the area between the adjacent electrodes, which causes a problem that light leaks from the non-electrode portion and causes a reduction in display contrast. A film is formed to prevent light leakage. In particular, in a color liquid crystal display device, a method of forming a light shielding film by a color filter has been proposed.

FIG. 5 shows a step of forming a light-shielding film by the above-described color filter. First, electrodes 2 made of a transparent conductive material are formed in stripes on one surface (upper surface) of the transparent substrate 1 (step a). Then, a dyeable negative type photoresist 3 such as casein is uniformly applied onto the transparent substrate 1 (step b). Next, the patterning mask 4 is arranged on the transparent substrate 1. This patterning mask 4
The same pattern 5 as that of the electrode 2 is formed on one surface (lower surface) of chromium, emulsion or the like. Then, the pattern 5 of the patterning mask 4 and the electrode 2 of the transparent substrate 1 are aligned with each other, and in this state, parallel light rays such as ultraviolet rays are irradiated from above the patterning mask 4 (step c). At this time, a part of the irradiated light beam is blocked by the pattern 5, and the other part reaches the coated surface of the photoresist 3 through the vacant portions (windows) between the patterns 5, and therefore this portion, that is, the electrode 2 is exposed. Only the photoresist 3 arranged between the adjacent portions is exposed to light, and changes in quality and hardens. After that, the photoresist 3 is developed (step d). By this development processing, in the negative type photoresist 3, only the exposed portion remains on the transparent substrate 1 and the other portions are removed. Then, the photoresist 3 remaining on the transparent substrate 1 is dyed with a black dye (step e). As a result, a light shielding film, that is, a black stripe 3a is formed between adjacent electrodes 2.

It should be noted that the scanning electrode substrate for color liquid crystal display ends with this step e, and the signal electrode substrate has this step e.
Of the red, green and blue color filter layers 6a. 6b. 6c is formed (step f).

However, in such a conventional manufacturing method, an apparatus and a troublesome work for aligning the pattern 5 of the patterning mask 4 and the electrode 2 of the transparent substrate 1 are required, which complicates the process and lowers the manufacturing efficiency. Moreover, there is a problem that an inappropriate light-shielding film (black stripe 3a) is formed unless the matching accuracy is always kept accurate. Such a problem remarkably occurs in a liquid crystal device such as a television, in which a gap width between adjacent electrodes is as narrow as 10 to 30 μm.

[Object of the Invention]

The present invention has been made by paying attention to such a point, and an object thereof is to easily and efficiently form a light-shielding film on a non-electrode part by omitting a step of patterning mask alignment. Another object of the present invention is to provide a method of manufacturing an electrode substrate for a liquid crystal device, which is capable of performing the above.

[Outline of Invention]

That is, according to the present invention, an electrode made of a transparent conductive material whose surface is covered with an opaque film is formed in an array on one surface of a transparent substrate, and is uniformly formed on the surface of the transparent substrate on the side where the electrode is formed. A negative type photoresist that can be dyed is applied to the surface of the transparent substrate, and the photoresist is exposed from the other surface side of the transparent substrate and developed to leave the exposed photoresist, and the remaining photoresist is dyed to shield the light. Is formed, and then the opaque film is removed to expose the electrode.

Example of Invention

An embodiment of the present invention will be described below with reference to FIGS. 1 to 4.

In FIG. 1, 11 is a transparent substrate, and this transparent substrate 11
A transparent conductive material film made of indium oxide, tin oxide or the like and an opaque material, for example, a film made of chrome, are formed in a laminated state on one surface (upper surface) of the one surface, and then a stripe made of the transparent conductive material is formed by pattern etching. Electrode 12
Is formed with the chromium film 13 adhered to the surface thereof (step a). Then, a negative type photoresist 14 such as casein that can be dyed uniformly is formed on the transparent substrate 11.
Is applied and dried (step b). Next, the transparent substrate 1
The photoresist 14 is exposed by irradiating parallel rays such as ultraviolet rays from below 1 (step c). At this time, the photoresist 14 arranged between the adjacent electrodes 12 is exposed to the irradiation light beam to be exposed to light, and is deteriorated to be hardened. However, the other portions of the photoresist 14 are exposed to light because the chromium film 13 blocks the light beam. Not done. After that, the photoresist 14 is developed (step d). By this development processing, in the negative type photoresist 14, only the exposed portions arranged between the adjacent electrodes 12 remain as the light shielding film base 14a, and the other portions are removed.

After forming the light-shielding film base 14a between the adjacent electrodes 2 in this manner, the light-shielding film base 14a is dyed with a black dye to form a light-shielding film, that is, a black stripe 15 (step e). Then, the chromium film 13 deposited on the electrode 12 is removed by etching to expose the electrode 12 (step f). When it is desired to leave the chromium film 13 on the lead portion of the electrode 12 or the like, that portion may be covered with a photoresist and then etched in this state.

In the scanning electrode substrate for color liquid crystal display, the manufacturing process is completed in step f, and in the signal electrode substrate, each electrode 12 is divided into groups of three rows after the step f, and the electrodes of each group are separated. 12 on the red, green and blue color filter layers 16a. 16b16c are formed (step g). In the case of a signal electrode substrate for monochrome liquid crystal display, the process ends at step f.

Next, the step of forming the color filter layer in step g will be described with reference to FIG. First, a dyeable negative type photoresist 21 is uniformly applied on the transparent substrate 11 after the above step f (step a), and then a patterning mask 22 is arranged on the photoresist 21. First, the photoresist 21 in a portion corresponding to the red electrode 12 is exposed (step b), and then the photoresist 21 is developed to leave the filter base 21a on the red electrode 12 and remove the others ( Step c). Then, the filter base 21a is dyed with a red dye, and further subjected to a dye-proof treatment to form a red color filter layer 16a (step d).

Next, a similar process is repeated to form a green color filter layer 16b on the green electrode 12, and a similar process is repeated to form a blue color filter layer 16c on the blue electrode 12. To do.

3 and 4 show a state in which a color liquid crystal display device is constituted by the scanning electrode substrate A and the signal electrode substrate B manufactured in the above manufacturing process. Each electrode 12 of the scanning electrode substrate A is shown.
And the electrodes 12 of the signal electrode substrate B are arranged to face each other so as to be orthogonal to each other, and dot portions D that control the transmission of light are formed at the respective intersections. And this dot part C
The black stripe 15 as a light-shielding film is located on the outer peripheral portion of the, so that the black stripe 15 reliably suppresses light leakage. Although not shown, each substrate A. An alignment film is formed on the inner surface of each of the substrates A.B.
The liquid crystal filled between the substrates A and B is TN-oriented, and each substrate A. Polarizing plates are arranged on the outer surface of B in parallel Nicols.

By the way, in the above-mentioned embodiment, the conductive chrome film is applied as the opaque coating layer on the electrode, but the film is not limited to the chrome film, but may be a film made of another conductive material or a film made of an insulating material. May be. Further, the present invention can be similarly applied to a case of manufacturing an electrode substrate of a liquid crystal display device for a television or the like, and a case of manufacturing an electrode substrate of a liquid crystal optical shutter of an electrophotographic printer. .

〔The invention's effect〕

As described above, according to the present invention, it is possible to easily and efficiently form the light-shielding film on the non-electrode portion by omitting the troublesome step of aligning the pattern of the patterning mask and the electrode of the transparent substrate, and The film forming accuracy can be always kept good based on the opaque coating layer formed on the electrodes.

[Brief description of drawings]

FIG. 1 is a sectional view sequentially showing a manufacturing process of an electrode substrate according to an embodiment of the present invention, FIG. 2 is a sectional view sequentially showing a forming process of a color filter layer, and FIG. 3 is a sectional view according to an embodiment of the present invention. FIG. 4 is a perspective view schematically showing a state in which a color liquid crystal display device is constituted by the electrode substrate obtained in the manufacturing process, FIG. 4 is a plan view of the same, and FIG. 5 is a sectional view sequentially showing the manufacturing process of the conventional electrode substrate. . 11 ... Transparent substrate, 12 ... Electrode, 13 ... Chrome film (covering layer) 14 ... Photoresist, 15 ... Black stripe (light-shielding film).

Claims (1)

[Claims] 1. An electrode made of a transparent conductive material, the surface of which is covered with an opaque film, is formed in an array on one surface of a transparent substrate, and is uniformly formed on the surface of the transparent substrate on which the electrode is formed. A negative type photoresist that can be dyed is applied to the surface of the transparent substrate, and the photoresist is exposed from the other surface side of the transparent substrate and developed to leave the exposed photoresist, and the remaining photoresist is dyed to shield the light. Is formed, and then the opaque film is removed to expose the electrodes, which is a method for manufacturing an electrode substrate for a liquid crystal device.