JPH066030A - Manufacturing method of both surface flexible substrate - Google Patents
Manufacturing method of both surface flexible substrateInfo
- Publication number
- JPH066030A JPH066030A JP16259192A JP16259192A JPH066030A JP H066030 A JPH066030 A JP H066030A JP 16259192 A JP16259192 A JP 16259192A JP 16259192 A JP16259192 A JP 16259192A JP H066030 A JPH066030 A JP H066030A
- Authority
- JP
- Japan
- Prior art keywords
- manufacturing
- flexible substrate
- resin
- copper foil
- double
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は両面フレキシブル基板の
製造方法に係り,詳しくはホールレス・接着剤レス・両
面フレキシブル基板に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a double-sided flexible substrate, and more particularly to a holeless / adhesive-less double-sided flexible substrate.
【0002】[0002]
【従来の技術】図2は従来の両面フレキシブル基板Aの
製造方法の一例における各製造工程での基板断面を示す
説明図(a)〜(g)である。図2に示す如く,従来の
両面フレキシブル基板Aの製造方法では,先ずポリイミ
ドフイルム11を準備し(a),このポリイミドフイル
ム11の両面にスパッタ法を用いて銅箔12を蒸着した
後,電解メッキ法を用いて銅箔13を所定の厚みになる
ように形成する(b)。次に,銅箔13の表面にフォト
レジスト14を塗布し(c),エッチング法によりポリ
イミドフイルム11及び銅箔12,13に貫通穴15を
あける(d)。次に,無電解メッキ及び電解メッキ法を
用いて貫通穴15の側壁に銅箔16を形成し,両面の導
通をとる(e)。そして,フォトレジスト14を剥離後
(f),銅箔12,13両面に回路形成する(g)。こ
のようにして両面フレキシブル基板Aが製造できた。2. Description of the Related Art FIG. 2 is an explanatory view (a) to (g) showing a cross section of a substrate in each manufacturing process in an example of a conventional method for manufacturing a double-sided flexible substrate A. As shown in FIG. 2, in the conventional method for manufacturing a double-sided flexible substrate A, first, a polyimide film 11 is prepared (a), copper foil 12 is deposited on both surfaces of the polyimide film 11 by a sputtering method, and then electrolytic plating is performed. The copper foil 13 is formed to have a predetermined thickness by using the method (b). Next, a photoresist 14 is applied to the surface of the copper foil 13 (c), and a through hole 15 is formed in the polyimide film 11 and the copper foils 12 and 13 by an etching method (d). Next, a copper foil 16 is formed on the side wall of the through hole 15 using electroless plating and electrolytic plating, and electrical continuity is established on both sides (e). Then, after removing the photoresist 14 (f), circuits are formed on both surfaces of the copper foils 12 and 13 (g). In this way, the double-sided flexible substrate A could be manufactured.
【0003】[0003]
【発明が解決しようとする課題】上記したような従来の
両面フレキシブル基板Aの製造方法では,両面の銅箔1
2,13間の導通を得るためにエッチング法により貫通
穴15をあけている。エッチング法の場合,先ず銅箔1
2,13をエッチングしてからポリイミドフイルム11
のエッチングを行うが,ポリイミドフイルム11は化学
的に安定な物質であり,そのエッチングには比較的長時
間を要するという問題があった。このため,エッチング
法に代えてNCドリル法や金型で打抜く金型加工を用い
ることがある。しかし,NCドリル法の場合,小さな径
の穴はあけられず,最小でも0.3〜0.4m/m径で
ある。又,金型加工の場合でも0.4m/m径程度が限
界である。又,NCドリル法,金型加工ともバリの発生
には注意を要する。即ち,加工枚数が多くなるとバリが
発生しやすく,メッキを施した時の両面間の導通性の信
頼度である所謂スルーホールの信頼性が低下するおそれ
があった。更に,上記したいずれの方法においても貫通
穴15により,スルーホールの真上及びその近傍には部
品搭載が出来ないため,高い部品実装効率が得られな
い。しかも,エッチング法では擂鉢状の穴あけとなるた
め一層パターン密度が低くなるおそれがあった。その結
果,基板サイズが大きくなる場合があった。本発明は,
このような従来の技術における課題を解決するために,
両面フレキシブル基板の製造方法を改良し,スルーホー
ルの信頼性を低下させることなく比較的短時間に製造し
得る両面フレキシブル基板の製造方法を提供することを
目的とするものである。In the conventional method for manufacturing the double-sided flexible substrate A as described above, the copper foils 1 on both sides are
A through hole 15 is formed by an etching method in order to obtain conduction between 2 and 13. In the case of etching method, first copper foil 1
Polyimide film 11 after etching 2, 13
However, since the polyimide film 11 is a chemically stable substance, there is a problem that the etching takes a relatively long time. Therefore, instead of the etching method, an NC drill method or a die processing for punching with a die may be used. However, in the case of the NC drill method, a hole having a small diameter cannot be formed, and the diameter is at least 0.3 to 0.4 m / m. Further, even in the case of die processing, the limit is about 0.4 m / m diameter. In addition, attention must be paid to the occurrence of burrs in the NC drill method and die processing. That is, if the number of processed pieces increases, burrs are likely to occur, and there is a possibility that the reliability of the so-called through hole, which is the reliability of the conductivity between the two surfaces when plated, may be reduced. Further, in any of the above-described methods, the through hole 15 prevents components from being mounted right above the through hole and in the vicinity thereof, so that high component mounting efficiency cannot be obtained. Moreover, the etching method results in a mortar-shaped hole, which may further lower the pattern density. As a result, the substrate size may increase. The present invention is
In order to solve such problems in the conventional technology,
It is an object of the present invention to improve a method for manufacturing a double-sided flexible board and provide a method for manufacturing a double-sided flexible board that can be manufactured in a relatively short time without lowering the reliability of through holes.
【0004】[0004]
【課題を解決するための手段】上記目的を達成するため
に本発明は,導電性の金属板に感光性樹脂液を塗布乾燥
し,フォトプロセスを用いて上記樹脂の所定箇所にスル
ーホールを形成し,上記樹脂を所定温度に加熱してフイ
ルム化した後,上記樹脂の表面に前記金属板に導通する
金属箔を付着させてなる両面フレキシブル基板の製造方
法として構成されている。In order to achieve the above object, the present invention is to apply a photosensitive resin liquid to a conductive metal plate, dry it, and form a through hole at a predetermined portion of the resin by using a photo process. Then, the resin is heated to a predetermined temperature to form a film, and then a metal foil that conducts to the metal plate is attached to the surface of the resin to form a double-sided flexible substrate.
【0005】[0005]
【作用】本発明によれば,まず導電性の金属板に感光性
樹脂液が塗布乾燥される。次に,フォトプロセスを用い
て上記樹脂の所定箇所にスルーホールが形成される。そ
して,上記樹脂を所定温度に加熱してフイルム化した
後,上記樹脂の表面に前記金属板に導通する金属箔が付
着される。その結果,スルーホールの信頼性を低下させ
ることなく比較的短時間に両面フレキシブル基板を製造
することができる。According to the present invention, the photosensitive resin liquid is first applied and dried on the conductive metal plate. Next, a through hole is formed in a predetermined portion of the resin by using a photo process. Then, after heating the resin to a predetermined temperature to form a film, a metal foil that conducts to the metal plate is attached to the surface of the resin. As a result, the double-sided flexible substrate can be manufactured in a relatively short time without lowering the reliability of the through hole.
【0006】[0006]
【実施例】以下,添付図面を参照して本発明を具体化し
た実施例につき説明し,本発明の理解に供する。尚,以
下の実施例は,本発明を具体化した一例であって,本発
明の技術的範囲を限定する性格のものではない。ここ
に,図1は本発明の一実施例に係る両面フレキシブル基
板A′の製造方法における各製造工程での基板断面を示
す説明図(a)〜(e)である。図1に示す如く,本実
施例に係る両面フレキシブル基板A′の製造方法では,
まず,銅箔1(電解銅箔,圧延銅箔のどちらでも良い)
(導電性の金属板に相当)上へ溶剤に溶かした感光性ポ
リイミド樹脂液2(感光性樹脂液に相当)を塗布する
(a)。樹脂液2をプレベーク(乾燥)して乾燥状態の
樹脂2′とした後フォトプロセスを通す。即ち,樹脂
2′をマスク3を介して紫外光線4により露光する
(b)。露光後の樹脂2′を現像液により現像すると,
貫通していない穴5があけられ銅箔1の裏側の一部分が
露出する(c)。樹脂2′から感光基を除去するため
に,樹脂2′を300〜400℃で加熱硬化させて化学
的に安定したポリイミドフイルム2″とする。次に,ス
パッタ法を用いてポリイミドフイルム2″の表面に銅箔
1に導通するように銅箔6(金属箔に相当)を付着さ
せ,無電解又は電解メッキ法を用いて成長させる
(d)。この後は従来例と同様に,銅箔1,6の表面に
フォトレジストの塗布・プレベーク・露光・現像・エッ
チング・剥離の各工程を経由して上下の回路パターンが
形成される(e)。これら上下の回路パターン間は導通
がなされており,以上の一連の工程により両面フレキブ
ル基板A′が完成する。このように本実施例の製造方法
では,感光性ポリイミド樹脂2′をフォトプロセスに通
す時にスルーホールパターンをマスク3として感光・現
像・硬化すると,樹脂2′の穴あけとフイルム化が同時
に行える。従って,従来のエッチング法により貫通穴を
設ける場合に比べ比較的短時間に両面フレキシブル基板
A′を製造することができる。又,従来のNCドリル法
や金型加工におけるようなバリが発生するおそれがない
ため,スルーホールの信頼性の向上を図ることができ
る。さらに,上記実施例の製造方法では銅箔1,6を貫
通しない穴15があけられる。この穴15はストレート
にあけられ,エッチング法におけるような擂鉢状のもの
とはならない。このため,スルーホールの真上や近傍で
も部品搭載が可能となり実装効率の向上と基板サイズの
縮小化を図ることができる。更に,感光性ポリイミド樹
脂液2の塗布量を調整することによりポリイミドフイル
ム2″の厚さがコントロールでき,又フォトプロセスで
あるので異形穴にも対応できるため,各種の両面フレキ
シブル基板が製造可能である。又,穴数が多くても一括
同時処理であるのでコストに殆ど影響しない。Embodiments of the present invention will be described below with reference to the accompanying drawings for the understanding of the present invention. The following embodiments are examples of embodying the present invention and are not intended to limit the technical scope of the present invention. Here, FIG. 1 is explanatory views (a) to (e) showing substrate cross sections in each manufacturing step in the method for manufacturing a double-sided flexible substrate A ′ according to an embodiment of the present invention. As shown in FIG. 1, in the method for manufacturing the double-sided flexible substrate A ′ according to this embodiment,
First, copper foil 1 (either electrolytic copper foil or rolled copper foil is acceptable)
A photosensitive polyimide resin liquid 2 (corresponding to a photosensitive resin liquid) dissolved in a solvent is applied onto (corresponding to a conductive metal plate) (a). The resin liquid 2 is pre-baked (dried) to form a resin 2'in a dried state and then passed through a photo process. That is, the resin 2'is exposed by the ultraviolet ray 4 through the mask 3 (b). When the exposed resin 2'is developed with a developer,
A hole 5 that does not penetrate is opened and a part of the back side of the copper foil 1 is exposed (c). In order to remove the photosensitive group from the resin 2 ′, the resin 2 ′ is heated and cured at 300 to 400 ° C. to form a chemically stable polyimide film 2 ″. Next, the polyimide film 2 ″ is sputtered. A copper foil 6 (corresponding to a metal foil) is attached to the surface so as to be electrically connected to the copper foil 1, and is grown using an electroless or electrolytic plating method (d). Thereafter, similarly to the conventional example, upper and lower circuit patterns are formed on the surfaces of the copper foils 1 and 6 through the steps of photoresist coating, prebaking, exposure, development, etching, and peeling (e). The upper and lower circuit patterns are electrically connected to each other, and the double-sided flexible substrate A'is completed by the above series of steps. As described above, according to the manufacturing method of this embodiment, when the photosensitive polyimide resin 2'is passed through the photo process, the through hole pattern is used as the mask 3 to expose, develop and cure, so that the resin 2'can be punched and formed into a film at the same time. Therefore, the double-sided flexible substrate A'can be manufactured in a comparatively short time as compared with the case where the through holes are provided by the conventional etching method. Also, since there is no possibility of burrs occurring in the conventional NC drill method or die machining, the reliability of the through hole can be improved. Further, in the manufacturing method of the above-described embodiment, the holes 15 which do not penetrate the copper foils 1 and 6 are formed. This hole 15 is made straight and does not have a mortar shape as in the etching method. As a result, components can be mounted directly above or in the vicinity of the through holes, and the mounting efficiency can be improved and the board size can be reduced. Furthermore, the thickness of the polyimide film 2 ″ can be controlled by adjusting the coating amount of the photosensitive polyimide resin liquid 2, and since it is a photo process, it can also handle irregular holes, so that various double-sided flexible substrates can be manufactured. Also, even if the number of holes is large, the batch processing is performed at the same time, so there is almost no effect on the cost.
【0007】[0007]
【発明の効果】本発明に係る両面フレキシブル基板の製
造方法は,上記したように構成されているため,感光性
ポリイミド樹脂をフォトプロセスに通す時にスルーホー
ルパターンをマスクとして感光・現像・硬化すると,樹
脂の穴あけとフイルム化が同時に行なえる。従って,従
来のエッチング法により貫通穴を設ける場合に比べて比
較的短時間に両面フレキシブル基板を製造することがで
きる。又,従来のNCドリル法や金型加工におけるよう
なバリが発生するおそれがないため,スルーホールの信
頼性の向上を図ることができる。更に,この方法では銅
箔を貫通していない穴があけられる。この穴はストレー
トにあけられ,エッチング法におけるような擂鉢状のも
のとはならない。このため,スルーホールの真上や近傍
でも部品搭載が可能となり実装効率の向上と基板サイズ
の縮小化を図ることができる。更に,感光性ポリイミド
樹脂液の塗布量を調整することによりポリイミドフイル
ムの厚さがコントロールでき,又フォトプロセスである
ので異形穴にも対応できるため,各種の両面フレキシブ
ル基板が製造可能である。又,穴数が多くても一括同時
処理であるのでコストに殆ど影響しない。Since the method of manufacturing a double-sided flexible substrate according to the present invention is configured as described above, when the photosensitive polyimide resin is exposed to the photo process, the through-hole pattern is used as a mask for exposure, development, and curing, Holes in resin and film can be formed at the same time. Therefore, the double-sided flexible substrate can be manufactured in a relatively short time compared to the case where the through hole is provided by the conventional etching method. Also, since there is no possibility of burrs occurring in the conventional NC drill method or die machining, the reliability of the through hole can be improved. In addition, this method creates holes that do not penetrate the copper foil. This hole is made straight and does not have a mortar-like shape as in the etching method. As a result, components can be mounted directly above or in the vicinity of the through holes, and the mounting efficiency can be improved and the board size can be reduced. Furthermore, the thickness of the polyimide film can be controlled by adjusting the coating amount of the photosensitive polyimide resin liquid, and since it is a photo process, it can also handle irregular holes, so that various double-sided flexible substrates can be manufactured. Further, even if the number of holes is large, the cost is hardly affected because the simultaneous processing is performed at once.
【図1】 本発明の一実施例に係る両面フレキシブル基
板A′の製造方法における各製造工程での基板断面を示
す説明図。FIG. 1 is an explanatory view showing a substrate cross section in each manufacturing process in a method for manufacturing a double-sided flexible substrate A ′ according to an embodiment of the present invention.
【図2】 従来の両面フレキシブル基板Aの製造方法の
一例における各製造工程での基板断面を示す説明図。FIG. 2 is an explanatory view showing a substrate cross section in each manufacturing process in an example of a conventional method for manufacturing a double-sided flexible substrate A.
A′…両面フレキシブル基板 1,6…銅箔(金属板及び金属箔に相当) 2…感光性ポリイミド樹脂液(感光性樹脂液に相当) 2′…樹脂 2″…ポリイミドフイルム 3…マスク 4…紫外光線 5…スルーホール A '... Double-sided flexible substrate 1, 6 ... Copper foil (corresponding to metal plate and metal foil) 2 ... Photosensitive polyimide resin liquid (corresponding to photosensitive resin liquid) 2' ... Resin 2 "... Polyimide film 3 ... Mask 4 ... Ultraviolet ray 5 ... through hole
Claims (1)
燥し, フォトプロセスを用いて上記樹脂の所定箇所にスルーホ
ールを形成し, 上記樹脂を所定温度に加熱してフイルム化した後, 上記樹脂の表面に前記金属板に導通する金属箔を付着さ
せてなる両面フレキシブル基板の製造方法。1. After a photosensitive resin liquid is applied to a conductive metal plate and dried, a through hole is formed at a predetermined portion of the resin by using a photo process, and the resin is heated to a predetermined temperature to form a film. A method for manufacturing a double-sided flexible substrate, which comprises attaching a metal foil that conducts to the metal plate to the surface of the resin.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16259192A JPH066030A (en) | 1992-06-22 | 1992-06-22 | Manufacturing method of both surface flexible substrate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16259192A JPH066030A (en) | 1992-06-22 | 1992-06-22 | Manufacturing method of both surface flexible substrate |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH066030A true JPH066030A (en) | 1994-01-14 |
Family
ID=15757504
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16259192A Pending JPH066030A (en) | 1992-06-22 | 1992-06-22 | Manufacturing method of both surface flexible substrate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH066030A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9314045B2 (en) | 2011-03-23 | 2016-04-19 | House Foods Corporation | Meat-like foodstuff and method for producing the same |
-
1992
- 1992-06-22 JP JP16259192A patent/JPH066030A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9314045B2 (en) | 2011-03-23 | 2016-04-19 | House Foods Corporation | Meat-like foodstuff and method for producing the same |
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