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JPH0658450A - Solenoid-driven small valve - Google Patents

Solenoid-driven small valve

Info

Publication number
JPH0658450A
JPH0658450A JP20907692A JP20907692A JPH0658450A JP H0658450 A JPH0658450 A JP H0658450A JP 20907692 A JP20907692 A JP 20907692A JP 20907692 A JP20907692 A JP 20907692A JP H0658450 A JPH0658450 A JP H0658450A
Authority
JP
Japan
Prior art keywords
valve
small valve
hole
silicon
iron alloy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP20907692A
Other languages
Japanese (ja)
Other versions
JP2749231B2 (en
Inventor
Keiichi Yanagisawa
佳一 柳沢
Hiroki Kuwano
博喜 桑野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP4209076A priority Critical patent/JP2749231B2/en
Publication of JPH0658450A publication Critical patent/JPH0658450A/en
Application granted granted Critical
Publication of JP2749231B2 publication Critical patent/JP2749231B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Magnetically Actuated Valves (AREA)

Abstract

PURPOSE:To provide a solenoid-driven small valve, miniaturized in driving mechanical parts, capable of driving a very minute flow rate less than the specified value stably at high speed. CONSTITUTION:This valve is made up of installing a base plate consisting of a cover part 2 of a valve made of a silicon 1 and nickel-iron alloy film or nitriding silicon film valve with a through hole in the central part, a double holding beam 3 consisting of a nickel-iron alloy film of such a structure as uncontacted with this through hole on a surface of this base plate, and a driving coil 4 set up at the outside.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は各種半導体デバイスの製
造工程で用いられる反応ガスの微小流量制御に有利な電
磁駆動形小形弁に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electromagnetically actuated small valve which is advantageous for controlling a minute flow rate of a reaction gas used in various semiconductor device manufacturing processes.

【0002】[0002]

【従来の技術】半導体デバイスの製造工程においてCV
D法(化学的気相堆積法)は各種薄膜の作製プロセスと
して重要な役割を果たしており、さらにその反応ガスの
流量制御に用いられる小形弁には高い性能が要求され
る。従来の電磁力を用いた小形弁では主要部分は機械加
工で作製するため高い精度が得られず、流量が最小10
0μl(マイクロリットル)/min程度までしか制御
できないなど微小流量を安定に動作させることが困難で
あった。
CV in the manufacturing process of semiconductor devices
The D method (chemical vapor deposition method) plays an important role as a process for producing various thin films, and high performance is required for the small valve used for controlling the flow rate of the reaction gas. With a conventional small valve that uses electromagnetic force, high accuracy cannot be obtained because the main part is manufactured by machining, and the flow rate is a minimum of 10
It was difficult to operate a minute flow rate stably, for example, it could be controlled only up to about 0 μl (microliter) / min.

【0003】[0003]

【発明が解決しようとする課題】本発明は上記の事情に
鑑みてなされたもので、駆動機構部分をさらに小形化
し、流量が10μl/min以下の極微小流量を安定に
かつ高速で駆動可能な電磁駆動形小形弁を提供すること
を目的とする。
SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances, and further miniaturizes the drive mechanism so that a very small flow rate of 10 μl / min or less can be stably driven at high speed. An object is to provide an electromagnetically actuated small valve.

【0004】[0004]

【課題を解決するための手段】本発明の電磁駆動形小形
弁はホトリソグラフィ技術と薄膜技術とで弁の主要構成
部分をシリコン基板上に一体形成することにより高い寸
法精度が得られ、また薄膜の両持ち梁構造であるので高
速応答が可能となる。
The electromagnetically actuated small valve of the present invention has high dimensional accuracy obtained by integrally forming the main components of the valve on a silicon substrate by photolithography technology and thin film technology. The double-supported beam structure enables high-speed response.

【0005】[0005]

【作用】本発明は、駆動コイルを作動させると磁場勾配
により軟磁性体で作製された両持ち梁が変位し、駆動コ
イルへの電流の極性を変えることでシリコン基板上に形
成された貫通穴を有する蓋の部分を開閉動作させようと
するものである。
According to the present invention, when the drive coil is operated, the doubly supported beam made of the soft magnetic material is displaced by the magnetic field gradient, and the polarity of the current to the drive coil is changed to form a through hole formed on the silicon substrate. It is intended to open and close the portion of the lid having.

【0006】[0006]

【実施例】次に本発明の実施例について図面を参照して
説明する。
Embodiments of the present invention will now be described with reference to the drawings.

【0007】図1(a)は本発明の一実施例に係る電磁
駆動形小形弁の主要部分の上面図、図1(b)は同じく
断面図である。即ち、1は中央部に貫通穴を有するシリ
コン、2はニッケル鉄合金膜または窒化シリコン膜から
なる弁の蓋部分、3はシリコン1の貫通穴と接触しない
構造の軟磁性体のニッケル鉄合金膜からなる両持ち梁、
4は外部に配置した駆動コイル、5は両持ち梁の変位方
向である。この弁の動作は駆動コイル4に電流を印加す
るとコイル4の周辺部に磁場勾配が形成され、両持ち梁
3を磁場勾配の最も大きい位置に配置することにより梁
3の部分が磁化され大きな変位量が得られることを利用
して、両持ち梁3の下部に配置した円錐形の貫通穴を有
する弁の蓋部分2へ押し下げられ貫通穴が塞がれる。ま
たコイル4への印加電流方向を切り替えることにより図
中5で示すように梁3が変位し、弁の開閉動作が行われ
ることによる。
FIG. 1A is a top view of a main part of an electromagnetically driven small valve according to an embodiment of the present invention, and FIG. 1B is a sectional view of the same. That is, 1 is silicon having a through hole in the central portion, 2 is a valve lid portion made of a nickel iron alloy film or a silicon nitride film, and 3 is a soft magnetic nickel iron alloy film having a structure that does not contact the through hole of silicon 1. A doubly supported beam,
Reference numeral 4 is a drive coil arranged outside, and 5 is a displacement direction of the doubly supported beam. The operation of this valve is such that when a current is applied to the drive coil 4, a magnetic field gradient is formed in the peripheral portion of the coil 4, and by disposing the doubly supported beam 3 at a position where the magnetic field gradient is the largest, the beam 3 portion is magnetized and a large displacement occurs. Utilizing the fact that the amount is obtained, the through hole is closed by being pushed down to the lid portion 2 of the valve having the conical through hole arranged in the lower part of the both-supported beam 3. Further, by switching the direction of the current applied to the coil 4, the beam 3 is displaced as shown by 5 in the figure, and the valve opening / closing operation is performed.

【0008】図2は本発明の他の実施例で、図1の小形
弁の前後にオリフィス板及びコイルを設けた電磁駆動形
小形弁の断面図で、1はシリコン、2はニッケル鉄合金
膜または窒化シリコン膜からなる弁の蓋部分、3は軟磁
性体のニッケル鉄合金膜からなる両持ち梁、4a,4b
は外部に配置した駆動コイル、6a,6b,はシリコン
からなるオリフィス板である。オリフィス板6a,6b
を設けることで弁部分の損傷をまねく不純物粒子の侵入
を防ぐことができるなど弁部分を安定に動作させること
に対して有効であることがわかった。また、オリフィス
板6a,6bの前後にそれぞれコイル4a,4bを配置
した構成とすることで両持ち梁3の開閉動作を高効率で
行えることがわかった。
FIG. 2 is a cross-sectional view of another embodiment of the present invention, which is an electromagnetically driven small valve in which an orifice plate and a coil are provided before and after the small valve of FIG. 1, in which 1 is silicon and 2 is a nickel-iron alloy film. Alternatively, a valve lid portion 3 made of a silicon nitride film, 3 are both-supported beams made of a soft magnetic nickel iron alloy film, 4a, 4b.
Is a drive coil disposed outside, and 6a and 6b are orifice plates made of silicon. Orifice plates 6a, 6b
It has been found that the provision of the above is effective for the stable operation of the valve part, such as preventing the invasion of impurity particles which may damage the valve part. Further, it was found that the coils 4a and 4b are arranged in front of and behind the orifice plates 6a and 6b, respectively, so that the opening / closing operation of the both-supported beam 3 can be performed with high efficiency.

【0009】図3は本発明の他の実施例に係り、図2の
外部の駆動コイル部分を薄膜コイルでオリフィス板と一
体化した電磁駆動形小形弁の断面図で、1はシリコン、
2はニッケル鉄合金膜または窒化シリコン膜からなる弁
の蓋部分、3は軟磁性体のニッケル鉄合金膜からなる両
持ち梁、6a,6bはシリコンからなるオリフィス板、
7a,7bは薄膜コイルである。金または銅膜からなる
薄膜コイル7a,7bはホトリソグラフィ技術とスパッ
タおよびエッチングなどの薄膜技術により形成した。コ
イル7a,7bとオリフィス板6a,6bを一体化する
ことによりさらに小形化を図れた。
FIG. 3 is a cross-sectional view of an electromagnetically driven small valve in which the external drive coil portion of FIG. 2 is integrated with an orifice plate by a thin film coil according to another embodiment of the present invention.
Reference numeral 2 is a valve lid portion made of a nickel iron alloy film or silicon nitride film, 3 is a doubly supported beam made of a soft magnetic nickel iron alloy film, and 6a and 6b are orifice plates made of silicon,
Reference numerals 7a and 7b are thin film coils. The thin film coils 7a and 7b made of a gold or copper film were formed by a photolithography technique and a thin film technique such as sputtering and etching. By integrating the coils 7a and 7b and the orifice plates 6a and 6b, the size can be further reduced.

【0010】図4(a)は本発明の他の実施例に係り卍
形の両持ち梁を用いた電磁駆動形小形弁の上面図、図4
(b)は同じく断面図で、1はシリコン、2はニッケル
鉄合金膜または窒化シリコン膜からなる弁の蓋部分、3
0は中央部が円錐形状の卍形からなる軟磁性体のニッケ
ル鉄合金膜の両持ち梁である。図4(a)の卍形両持ち
梁30の形状は約300μm角、梁の幅は約20μm、
梁の厚さは1〜5μm程度とした。その中央部は下部の
蓋部分2の形状にあわせた円錐形とした。作製方法はす
べてホトリソグラフィ技術と薄膜技術を用いた。構成材
料がシリコン単結晶とニッケル鉄合金または窒化シリコ
ンとの2種類であることおよび極めて安定な材料である
ことからパーティクルの発生は無い。さらに両持ち梁3
0が微小構造であることから高速応答が可能でかつ優れ
た安定性が得られる。図4で示した電磁駆動形小形弁を
外部の駆動コイルで作動させた。駆動コイルの電圧5
V、駆動電流60mAで行ったところ、第1次共振振動
数は約5KHzで梁の変位量は約3μmであった。ま
た、希ガス(アルゴン)を用いて実験したところ、0.
1〜10μl/minの流量をリークデテクタにより確
認することができた。卍形両持ち梁30の高次の共振点
は30KHzと高速応答可能であることがわかった。ま
た、両持ち梁30と蓋部分2との隙間は高々1μm程度
であり変位量も充分であるので弁部分の開閉動作を実現
できることがわかった。
FIG. 4A is a top view of an electromagnetically driven small valve using a swastika-type double-supported beam according to another embodiment of the present invention.
(B) is also a cross-sectional view, 1 is silicon, 2 is a valve lid part made of a nickel-iron alloy film or a silicon nitride film, 3
Reference numeral 0 is a double-supported beam of a nickel-iron alloy film of a soft magnetic material having a conical shape in the central part. The shape of the swollen double-supported beam 30 of FIG. 4A is about 300 μm square, and the width of the beam is about 20 μm.
The thickness of the beam was about 1 to 5 μm. The central portion thereof has a conical shape that matches the shape of the lower lid portion 2. All fabrication methods used photolithography technology and thin film technology. No particles are generated because the constituent materials are two kinds of silicon single crystal and nickel iron alloy or silicon nitride and are extremely stable materials. Double-supported beam 3
Since 0 is a minute structure, high-speed response is possible and excellent stability is obtained. The electromagnetically driven small valve shown in FIG. 4 was operated by an external drive coil. Drive coil voltage 5
When the test was performed at V and a driving current of 60 mA, the primary resonance frequency was about 5 KHz and the beam displacement was about 3 μm. Moreover, when an experiment was conducted using a rare gas (argon), it was found that
A flow rate of 1 to 10 μl / min could be confirmed by a leak detector. It was found that the high-order resonance point of the swollen double-supported beam 30 is capable of high-speed response at 30 KHz. Further, it was found that the gap between the doubly supported beam 30 and the lid portion 2 was at most about 1 μm and the displacement was sufficient, so that the opening / closing operation of the valve portion could be realized.

【0011】[0011]

【発明の効果】以上説明したように本発明によれば、
0.1〜10μl/minの流量を高い精度で制御可能
な極微小流量制御用小形弁を実現することができる。
As described above, according to the present invention,
It is possible to realize a small valve for controlling an extremely minute flow rate that can control a flow rate of 0.1 to 10 μl / min with high accuracy.

【図面の簡単な説明】[Brief description of drawings]

【図1】(a)は本発明の一実施例に係る電磁駆動形小
形弁の主要部分の上面図、(b)は同じく断面図であ
る。
FIG. 1A is a top view of a main portion of an electromagnetically driven small valve according to an embodiment of the present invention, and FIG. 1B is a sectional view of the same.

【図2】本発明の他の実施例で、図1の小形弁の前後に
オリフィス板及びコイルを設けた電磁駆動形小形弁の断
面図である。
FIG. 2 is a cross-sectional view of an electromagnetically driven small valve in which an orifice plate and a coil are provided before and after the small valve of FIG. 1 according to another embodiment of the present invention.

【図3】本発明の他の実施例に係り、図2の外部の駆動
コイル部分を薄膜コイルでオリフィス板と一体化した電
磁駆動形小形弁の断面図である。
FIG. 3 is a sectional view of an electromagnetically driven small valve in which the external drive coil portion of FIG. 2 is integrated with an orifice plate by a thin film coil according to another embodiment of the present invention.

【図4】(a)は本発明の他の実施例に係り卍形の両持
ち梁を用いた電磁駆動形小形弁の上面図、(b)は同じ
く断面図である。
FIG. 4A is a top view of an electromagnetically driven small valve using a swastika double-supported beam according to another embodiment of the present invention, and FIG. 4B is a sectional view of the same.

【符号の説明】[Explanation of symbols]

1…シリコン、2…ニッケル鉄合金膜または窒化シリコ
ン膜からなる弁の蓋部分、3…ニッケル鉄合金膜からな
る両持ち梁、4,4a,4b…駆動コイル、5…両持ち
梁の変位方向、6a,6b…オリフィス板、7a,7b
…薄膜コイル。
1 ... Silicon, 2 ... Valve lid part made of nickel iron alloy film or silicon nitride film, 3 ... Doubly supported beam made of nickel iron alloy film, 4, 4a, 4b ... Drive coil, 5 ... Displacement direction of doubly supported beam , 6a, 6b ... Orifice plate, 7a, 7b
… Thin film coils.

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 中央部に貫通穴を有するシリコンとニッ
ケル鉄合金膜もしくは窒化シリコン膜からなる基板と、
この基板の表面に前記貫通穴と接触しない構造のニッケ
ル鉄合金膜からなる両持ち梁と、外部に配置した駆動コ
イルとを具備することを特徴とする電磁駆動形小形弁。
1. A substrate made of silicon having a through hole in the center and a nickel-iron alloy film or a silicon nitride film,
An electromagnetically actuated small valve, comprising: a double-supported beam made of a nickel-iron alloy film having a structure that does not come into contact with the through hole, and a drive coil arranged outside, on the surface of the substrate.
【請求項2】 両持ち梁が、中央部分が円錐形状の卍形
梁構造であることを特徴とする請求項1記載の電磁駆動
形小形弁。
2. The electromagnetically actuated small valve according to claim 1, wherein the doubly supported beam has a swastika beam structure having a conical center portion.
【請求項3】 基板および両持ち梁の前後に、中央部に
貫通穴を有するシリコンからなるオリフィス板を設ける
ことを特徴とする請求項1記載の電磁駆動形小形弁。
3. An electromagnetically actuated small valve according to claim 1, wherein an orifice plate made of silicon having a through hole in the central portion is provided before and after the substrate and the both-supported beam.
【請求項4】 オリフィス板の貫通穴の周辺部に金もし
くは銅薄膜のコイルを一体化させたことを特徴とする請
求項3記載の電磁駆動形小形弁。
4. An electromagnetically actuated small valve according to claim 3, wherein a coil of a gold or copper thin film is integrated around the through hole of the orifice plate.
JP4209076A 1992-08-05 1992-08-05 Electromagnetic driven small valve Expired - Fee Related JP2749231B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4209076A JP2749231B2 (en) 1992-08-05 1992-08-05 Electromagnetic driven small valve

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4209076A JP2749231B2 (en) 1992-08-05 1992-08-05 Electromagnetic driven small valve

Publications (2)

Publication Number Publication Date
JPH0658450A true JPH0658450A (en) 1994-03-01
JP2749231B2 JP2749231B2 (en) 1998-05-13

Family

ID=16566863

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4209076A Expired - Fee Related JP2749231B2 (en) 1992-08-05 1992-08-05 Electromagnetic driven small valve

Country Status (1)

Country Link
JP (1) JP2749231B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8042126B2 (en) 2006-03-15 2011-10-18 Clarion Co., Ltd. Disc player

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0338541U (en) * 1989-08-08 1991-04-15
JPH04136577A (en) * 1990-09-26 1992-05-11 Nippon Telegr & Teleph Corp <Ntt> Miniaturized flow control element
JPH0465952U (en) * 1990-10-09 1992-06-09

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0338541U (en) * 1989-08-08 1991-04-15
JPH04136577A (en) * 1990-09-26 1992-05-11 Nippon Telegr & Teleph Corp <Ntt> Miniaturized flow control element
JPH0465952U (en) * 1990-10-09 1992-06-09

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8042126B2 (en) 2006-03-15 2011-10-18 Clarion Co., Ltd. Disc player

Also Published As

Publication number Publication date
JP2749231B2 (en) 1998-05-13

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