JPH0645401A - Package for semiconductor device - Google Patents
Package for semiconductor deviceInfo
- Publication number
- JPH0645401A JPH0645401A JP19576192A JP19576192A JPH0645401A JP H0645401 A JPH0645401 A JP H0645401A JP 19576192 A JP19576192 A JP 19576192A JP 19576192 A JP19576192 A JP 19576192A JP H0645401 A JPH0645401 A JP H0645401A
- Authority
- JP
- Japan
- Prior art keywords
- chip
- semiconductor chip
- semiconductor device
- melting point
- low melting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 67
- 229910000679 solder Inorganic materials 0.000 claims abstract description 34
- 239000000463 material Substances 0.000 claims abstract description 25
- 238000005219 brazing Methods 0.000 claims abstract description 23
- 238000002844 melting Methods 0.000 claims abstract description 22
- 230000008018 melting Effects 0.000 claims abstract description 21
- 239000002184 metal Substances 0.000 abstract description 12
- 229910052751 metal Inorganic materials 0.000 abstract description 12
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 abstract description 7
- 238000007789 sealing Methods 0.000 abstract description 2
- 230000004048 modification Effects 0.000 abstract 1
- 238000012986 modification Methods 0.000 abstract 1
- 239000000919 ceramic Substances 0.000 description 13
- 239000000758 substrate Substances 0.000 description 9
- 230000000694 effects Effects 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 2
- 230000017525 heat dissipation Effects 0.000 description 2
- 230000020169 heat generation Effects 0.000 description 2
- 238000001465 metallisation Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 229910017944 Ag—Cu Inorganic materials 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 230000000191 radiation effect Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73251—Location after the connecting process on different surfaces
- H01L2224/73253—Bump and layer connectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/153—Connection portion
- H01L2924/1531—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
- H01L2924/15312—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a pin array, e.g. PGA
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/301—Electrical effects
- H01L2924/3011—Impedance
Landscapes
- Wire Bonding (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は半導体装置用パッケージ
に関し、特にフリップチップ接続を特徴とする半導体装
置用パッケージに関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor device package, and more particularly to a semiconductor device package featuring flip chip connection.
【0002】[0002]
【従来の技術】従来の技術について図面を参照して説明
する。2. Description of the Related Art A conventional technique will be described with reference to the drawings.
【0003】図7は従来の半導体装置用パッケージの一
例の部分拡大断面図、図8は図7の半導体装置用パッケ
ージの一部切欠き斜視図である。FIG. 7 is a partially enlarged sectional view of an example of a conventional semiconductor device package, and FIG. 8 is a partially cutaway perspective view of the semiconductor device package of FIG.
【0004】図7及び図8に示すように、セラミック基
板24は、4層構造を呈している。即ち、外部リード2
9をろう付するメタライズパターンを形成する層,半導
体チップ2との接地端子及び信号配線を形成する層,電
源メタライズ層28及び接地メタライズ層27の全面メ
タライズパターン層である。これらのセラミック層を積
層しスルーホールにより所望の接地を施し、焼成するこ
とにより、セラミック基板24は形成される。この後、
セラミック基板24の表面に露出したメタライズパター
ンにNiめっきを施し外部リード29をAg−Cuろう
材によりろう付し、更に、NiおよびAuめっきを施
す。半田バンプ4は円柱状の高さ50μmのCuコアバ
ンプの表面にNiとAuがそれぞれ2〜3,1.5〜2
μm、更に、その上に半田めっきが30μm被着されて
いる。このセラミック基板24に半導体チップ2をフリ
ップチップ接続法により接続する。次に、放熱と半導体
チップ2保護の為にキャップ3にて封止する。キャップ
3の材質は、高発熱密度,高消費電力に対応する高熱伝
導金属であるCu,AlやAlN,SiC等のセラミッ
クスを用いる。半導体チップ2はキャップ3の内面にC
uやAl薄膜の50μm程度の厚さの純金属薄膜32を
介して接触しキャップ3に圧力を掛けながらセラミック
基板24に半導体チップ2をおおうように樹脂31で接
着する。以上により半導体装置用パッケージが完成す
る。As shown in FIGS. 7 and 8, the ceramic substrate 24 has a four-layer structure. That is, the external lead 2
9 is a layer for forming a metallized pattern for brazing, a layer for forming a ground terminal and a signal wiring with the semiconductor chip 2, a power source metallized layer 28 and a grounded metallized layer 27. The ceramic substrate 24 is formed by laminating these ceramic layers, providing desired grounding through the through holes, and firing. After this,
The metallized pattern exposed on the surface of the ceramic substrate 24 is plated with Ni, the external leads 29 are brazed with an Ag-Cu brazing material, and further plated with Ni and Au. The solder bump 4 has a columnar Cu core bump having a height of 50 μm and Ni and Au of 2 to 3 and 1.5 to 2 respectively.
.mu.m, and a solder plating of 30 .mu.m is deposited thereon. The semiconductor chip 2 is connected to the ceramic substrate 24 by the flip chip connection method. Next, a cap 3 is used for heat dissipation and protection of the semiconductor chip 2. As a material of the cap 3, a ceramic such as Cu, Al, AlN, or SiC which is a highly heat-conductive metal corresponding to high heat generation density and high power consumption is used. The semiconductor chip 2 has a C on the inner surface of the cap 3.
A u or Al thin film is contacted through a pure metal thin film 32 having a thickness of about 50 μm and pressure is applied to the cap 3, and the ceramic substrate 24 is bonded with a resin 31 so as to cover the semiconductor chip 2. As described above, the semiconductor device package is completed.
【0005】この時、接地電位,電源電位間の静電容量
は、単純な平行平板容量になる。このような方法によ
り、一般に、安定した歩留で半導体装置用パッケージを
製造できる。セラミック層厚は、最小0.2mm程度で
あるのでセラミック基板24の材質がアルミナ(Al2
O3 )の場合、1対当たりの静電容量は55pF/cm
2 程度になる。At this time, the electrostatic capacitance between the ground potential and the power supply potential becomes a simple parallel plate capacitance. By such a method, generally, a semiconductor device package can be manufactured with a stable yield. Since the minimum ceramic layer thickness is about 0.2 mm, the material of the ceramic substrate 24 is alumina (Al 2
In the case of O 3 ), the capacitance per pair is 55 pF / cm
It will be about 2 .
【0006】[0006]
【発明が解決しようとする課題】この従来の半導体装置
用パッケージでは、接地,電源のパッケージ内部での直
流抵抗,インダクタンスを低減する目的で、内部に接地
層,電源層を設け、これらの層に搭載する半導体チップ
の電源端子,接地端子や外部接続用の電源リード,接地
リードを接続している。この構造を採用することにより
半導体装置用パッケージ内部のインダクタンスなどによ
るノイズ発生を制御できる。しかし、半導体チップ内部
で発生した電源,接地ノイズは、コンデンサ等で平滑す
る必要があり、この効果をより良く得るためには、半導
体装置用パッケージ内部の接地層−電源層間に静電容量
を付与することが望ましい。In this conventional package for a semiconductor device, a ground layer and a power layer are provided inside for the purpose of reducing the DC resistance and inductance inside the package of the ground and the power source. The power supply terminal and ground terminal of the mounted semiconductor chip, the power supply lead for external connection, and the ground lead are connected. By adopting this structure, it is possible to control the noise generation due to the inductance inside the semiconductor device package. However, the power supply and ground noise generated inside the semiconductor chip must be smoothed by a capacitor or the like. In order to obtain this effect better, a capacitance is applied between the ground layer and the power supply layer inside the semiconductor device package. It is desirable to do.
【0007】この従来の半導体装置用パッケージで層間
のセラミックス厚は0.2mmの場合、接地層と電源層
間静電容量は、単純な平行平板間の静電容量となるた
め、接地層と電源層一対当たりの容量は55pF/cm
2 程度が限界であるという問題点があった。In this conventional semiconductor device package, when the thickness of ceramics between layers is 0.2 mm, the electrostatic capacitance between the ground layer and the power source layer is simply the capacitance between parallel plates, so that the ground layer and the power source layer The capacity per pair is 55 pF / cm
There was a problem that the limit was about 2 .
【0008】また、従来の半導体装置用パッケージでは
半田バンプ間に生じるクロストークを低減できないとい
う問題点もあった。Further, in the conventional semiconductor device package, there is also a problem that the crosstalk generated between the solder bumps cannot be reduced.
【0009】さらに、放熱性から見ても半導体チップ表
面で発生した熱を半導体チップ裏面のキャップ及び表面
の半田バンプからのみを放散していたので、半導体チッ
プとセラミック基板では熱膨張係数が異なるため半導体
チップ動作時の発熱により半田バンプ接続部に応力が発
生し、寿命が低下するという問題点があった。Further, from the viewpoint of heat dissipation, the heat generated on the front surface of the semiconductor chip is dissipated only from the cap on the back surface of the semiconductor chip and the solder bumps on the front surface, so that the semiconductor chip and the ceramic substrate have different thermal expansion coefficients. There is a problem that stress is generated in the solder bump connection portion due to heat generation during the operation of the semiconductor chip and the life is shortened.
【0010】本発明の目的は、半導体チップの内部で発
生する電源,接地ノイズやバンプ間に発生するクロスト
ークがなく、長寿命の半導体装置用パッケージを提供す
ることにある。An object of the present invention is to provide a long-life package for a semiconductor device, which is free from power supply and ground noise generated inside a semiconductor chip and crosstalk generated between bumps.
【0011】[0011]
【課題を解決するための手段】本発明は、フリップチッ
プ半導体装置用パッケージに於いて、 (1)半導体チップと、該半導体チップに形成されたパ
ッドと、該パッドに半田バンプ接続される内部端子と、
前記半田バンプとは絶縁され且つ前記半導体チップと接
地電位または電源電位として電気的導通をとる低融点ろ
う材とを有する。The present invention provides, in a package for a flip-chip semiconductor device, (1) a semiconductor chip, a pad formed on the semiconductor chip, and an internal terminal connected to the pad by a solder bump. When,
The solder bump has a low melting point brazing material which is insulated and electrically connects with the semiconductor chip as a ground potential or a power source potential.
【0012】(2)半導体チップと、回路基板に半田バ
ンプ接続される外部端子と、該外部端子とは絶縁され且
つ前記半導体チップと接地電位または電源電位として電
気的導通をとる低融点ろう材を有する。(2) A semiconductor chip, an external terminal connected to a circuit board by solder bumps, and a low melting point brazing material which is insulated from the external terminal and electrically connected to the semiconductor chip as a ground potential or a power supply potential. Have.
【0013】さらに、前記低融点ろう材が少くとも2分
割されそれぞれが接地電位,電源電位,電源を含む電気
信号の入出力を行うように半導体チップと電気的接続す
る構造とする。Further, the low melting point brazing material is divided into at least two parts, and each is electrically connected to the semiconductor chip so as to input / output an electric signal including a ground potential, a power source potential and a power source.
【0014】[0014]
【実施例】次に本発明の実施例について図面を参照して
説明する。Embodiments of the present invention will now be described with reference to the drawings.
【0015】図1は本発明の第1の実施例の断面図、図
2は図1の部分拡大一部切欠き斜視図である。FIG. 1 is a sectional view of a first embodiment of the present invention, and FIG. 2 is a partially enlarged partially cutaway perspective view of FIG.
【0016】第1の実施例は、図1及び図2に示すよう
に、半導体チップ2をフリップチップ接続し搭載するた
めのフリップチップキャリア(またはフリップチップパ
ッケージ)6の半導体チップ2の接続面にフリップチッ
プ接続用の半田バンプ4を設ける。この半田バンプ4は
信号を入出力するための端子として設ける。また、半田
バンプ4と絶縁され且つ半導体チップ2に対し電源電位
(VDD)、または、接地電位(GND)になるように低
融点ろう材5を設ける。以上の半田バンプ4及びGND
(またはVDD)の低融点ろう材5をとり囲みチップで封
止できるよう周囲にチップシール部8を設ける。また、
回路基板1と電気的接続をとるために半導体チップ4を
搭載する面と反対の面に外部バンプ7を設ける。以上の
フリップチップキャリア(またはフリップチップパッケ
ージ)6に半導体チップ2をフリップチップ接続により
搭載し、半導体チップ2をキャップ(セラミック,金属
等)3により封止する。この状態で回路基板1と接続す
る。In the first embodiment, as shown in FIGS. 1 and 2, a flip chip carrier (or flip chip package) 6 for mounting the semiconductor chip 2 on the flip chip is mounted on the connecting surface of the semiconductor chip 2. Solder bumps 4 for flip chip connection are provided. The solder bumps 4 are provided as terminals for inputting / outputting signals. Further, a low melting point brazing material 5 is provided so as to be insulated from the solder bumps 4 and have a power supply potential (V DD ) or a ground potential (GND) with respect to the semiconductor chip 2. Solder bump 4 and GND
A chip seal portion 8 is provided around the low melting point brazing material 5 (or V DD ) so that it can be sealed with a chip. Also,
External bumps 7 are provided on the surface opposite to the surface on which the semiconductor chip 4 is mounted for electrical connection with the circuit board 1. The semiconductor chip 2 is mounted on the above flip chip carrier (or flip chip package) 6 by flip chip connection, and the semiconductor chip 2 is sealed with a cap (ceramic, metal, etc.) 3. In this state, the circuit board 1 is connected.
【0017】ここで半田バンプ4の半径は0.15m
m,高さ0.2mm,半田バンプ4中心から低融点ろう
材5迄の距離を0.25mmとすると、半田バンプ41
個と半田バンプ4を取り囲む低融点ろう材5間の静電容
量は約5pFとなる。また、低融点ろう材5を接地電位
とすることにより半田バンプ4は見掛け上同軸構造を取
ることができる。ここで、aは半田バンプ4の半径,b
は半田バンプ4中心から低融点ろう材5によって形成さ
れる金属台座迄の距離とするとZ0 =(μ0 /ε0 )
1/2 log(a/b)の式によりインピーダンスが算出
されるため、aとbの長さを調節することにより特定イ
ンピーダンス整合がとれる。Here, the radius of the solder bump 4 is 0.15 m.
m, height 0.2 mm, and the distance from the center of the solder bump 4 to the low melting point brazing material 5 is 0.25 mm, the solder bump 41
The electrostatic capacity between the low melting point brazing material 5 and the individual solder bumps 4 is about 5 pF. Further, by setting the low melting point brazing material 5 to the ground potential, the solder bump 4 can have an apparent coaxial structure. Where a is the radius of the solder bump 4, b
Is the distance from the center of the solder bump 4 to the metal pedestal formed by the low melting point brazing material 5, Z 0 = (μ 0 / ε 0 ).
Since the impedance is calculated by the formula of 1/2 log (a / b), specific impedance matching can be achieved by adjusting the lengths of a and b.
【0018】図3は本発明の第2の実施例の断面図、図
4は図3の部分拡大一部切欠き斜視図である。FIG. 3 is a sectional view of a second embodiment of the present invention, and FIG. 4 is a partially enlarged partially cutaway perspective view of FIG.
【0019】第2の実施例は、図3及び図4に示すよう
に、第1の実施例と同様なフリップチップキャリア(ま
たはフリップチップパッケージ)6に於いて、第1の実
施例では半導体チップ2とフリップチップキャリア(ま
たはフリップチップパッケージ)6間に設けられていた
接地電位または電源電位となる低融点ろう材5を第2の
実施例ではフリップチップキャリア(または、フリップ
チップパッケージ)6と回路基板1の間に設ける。即
ち、フリップチップキャリア(またはフリップチップパ
ッケージ)6の外部バンプ7を信号の入出力用の外部端
子として設け、外部バンプ7に絶縁され、且つ、半導体
チップ2に対し接地電位または電源電位となるように低
融点ろう材5を設ける。半導体チップ2より低融点ろう
材5迄の導通は半導体チップ2で半田バンプ4を封止す
るためのチップシール部8を介して導通する。As shown in FIGS. 3 and 4, the second embodiment is a flip chip carrier (or flip chip package) 6 similar to that of the first embodiment. In the first embodiment, a semiconductor chip is used. 2 and the flip-chip carrier (or flip-chip package) 6 are provided with a low melting point brazing material 5 at ground potential or power supply potential in the second embodiment. It is provided between the substrates 1. That is, the external bumps 7 of the flip chip carrier (or flip chip package) 6 are provided as external terminals for signal input / output, insulated from the external bumps 7 and at the ground potential or the power supply potential with respect to the semiconductor chip 2. A low melting point brazing material 5 is provided on the. The conduction from the semiconductor chip 2 to the low melting point brazing material 5 is conducted via the chip seal portion 8 for sealing the solder bump 4 in the semiconductor chip 2.
【0020】図5は本発明の第3の実施例のフリップチ
ップキャリアの平面図、図6は図5の斜視図である。FIG. 5 is a plan view of a flip chip carrier according to a third embodiment of the present invention, and FIG. 6 is a perspective view of FIG.
【0021】第3の実施例は図5及び図6に示すよう
に、フリップチップキャリア(またはフリップチップパ
ッケージ)6に半導体チップとフリップチップ接続し電
気的信号の入出力をとるための半田バンプ4を設け、こ
の半田バンプ4に絶縁され半導体チップと電気的導通が
とれるように低融点ろう材を設ける。この低融点ろう材
によって形成される金属台座各々を電源電位層22と接
地電位層21になるように少くとも2つに分割する。In the third embodiment, as shown in FIGS. 5 and 6, a solder bump 4 for flip-chip connecting a semiconductor chip to a flip-chip carrier (or flip-chip package) 6 for inputting and outputting an electrical signal. And a low melting point brazing material is provided so as to be insulated from the solder bumps 4 and electrically connected to the semiconductor chip. Each of the metal pedestals formed by this low melting point brazing material is divided into at least two so as to become the power supply potential layer 22 and the ground potential layer 21.
【0022】または、低融点ろう材によって形成される
金属台座を少くとも2分割し電源電位層22,接地電位
層21を回路基板接続側に設ける。Alternatively, the metal pedestal formed by the low melting point brazing material is divided into at least two parts, and the power supply potential layer 22 and the ground potential layer 21 are provided on the circuit board connection side.
【0023】[0023]
【発明の効果】以上説明したように本発明の半導体装置
用パッケージでは、フリップチップ接続用の半田バンプ
を信号用入出力端子として、それら半田バンプを個々に
取り囲み電源電位または接地電位になるように低融点ろ
う材によって形成される金属台座を設けることにより、
半導体装置で発生したノイズを発生源により近いところ
でフィルタリングすることができ、この構造にすること
により半導体装置用パッケージ内で電源電位,接地電位
となるメタライズ層を設けることが必要でなくなるた
め、半導体装置用パッケージは軽薄短小化できる効果が
ある。As described above, in the semiconductor device package of the present invention, the solder bumps for flip chip connection are used as signal input / output terminals, and these solder bumps are individually surrounded so as to have the power supply potential or the ground potential. By providing a metal pedestal formed by a low melting point brazing material,
The noise generated in the semiconductor device can be filtered at a position closer to the generation source, and with this structure, it is not necessary to provide a metallization layer for the power supply potential and the ground potential in the semiconductor device package. The package has the effect of being light, thin, short and compact.
【0024】また、金属台座を接地電位にすることによ
り半田バンプは見かけ上同軸構造になるため半田バンプ
の径をa,半田バンプの中心から金属台座迄の距離をb
とすると、インピーダンスはZ0 =(μ0 /ε0 )1/2
log(a/b)の式であたえられるため、aとbを任
意に設定することによりインピーダンスのマッチングが
可能となる効果がある。Further, since the solder bump has an apparent coaxial structure when the metal pedestal is set to the ground potential, the diameter of the solder bump is a and the distance from the center of the solder bump to the metal pedestal is b.
Then, the impedance is Z 0 = (μ 0 / ε 0 ) 1/2
Since it can be given by the expression of log (a / b), there is an effect that impedance matching becomes possible by arbitrarily setting a and b.
【0025】さらに、半導体チップと接続している面積
が増えるため、放熱効果が増加するとともに、接着強度
が増加し熱膨張係数の差による半田バンプ部の耐応力性
が向上するという効果がある。Furthermore, since the area connected to the semiconductor chip is increased, the heat radiation effect is increased, and the adhesive strength is increased, and the stress resistance of the solder bump portion due to the difference in thermal expansion coefficient is improved.
【図1】本発明の第1の実施例の断面図である。FIG. 1 is a cross-sectional view of a first embodiment of the present invention.
【図2】図1の部分拡大一部切欠き斜視図である。FIG. 2 is a partially enlarged partially cutaway perspective view of FIG.
【図3】本発明の第2の実施例の断面図である。FIG. 3 is a sectional view of a second embodiment of the present invention.
【図4】図3の部分拡大一部切欠き斜視図である。FIG. 4 is a partially enlarged perspective view with partial cutaway of FIG.
【図5】本発明の第3の実施例のフリップチップキャリ
アの平面図である。FIG. 5 is a plan view of a flip chip carrier according to a third embodiment of the present invention.
【図6】図5の斜視図である。FIG. 6 is a perspective view of FIG.
【図7】従来の半導体装置用パッケージの一例の部分拡
大断面図である。FIG. 7 is a partially enlarged cross-sectional view of an example of a conventional semiconductor device package.
【図8】図7の半導体装置用パッケージの一部切欠き斜
視図である。FIG. 8 is a partially cutaway perspective view of the semiconductor device package of FIG.
1 回路基板 2 半導体チップ 3 キャップ 4 半田バンプ 5 低融点ロウ材 6 フリップチップキャリアまたはフリップチップパ
ッケージ 7 外部バンプ 8 チップシール部 9 キャップシール部 21 接地電位層 22 電源電位層 24 セラミック基板 27 接地メタライズ層 28 電源メタライズ層 29 外部リード 30 内部配線引き回しパターン 31 樹脂 32 純金属薄膜1 circuit board 2 semiconductor chip 3 cap 4 solder bump 5 low melting point brazing material 6 flip chip carrier or flip chip package 7 external bump 8 chip seal part 9 cap seal part 21 ground potential layer 22 power supply potential layer 24 ceramic substrate 27 ground metallized layer 28 power source metallization layer 29 external lead 30 internal wiring routing pattern 31 resin 32 pure metal thin film
Claims (3)
に於いて、半導体チップと、該半導体チップに形成され
たパッドと、該パッドに半田バンプ接続される内部端子
と、前記半田バンプとは絶縁され且つ前記半導体チップ
と接地電位または電源電位として電気的導通をとる低融
点ろう材とを有することを特徴とする半導体装置用パッ
ケージ。1. In a flip-chip semiconductor device package, a semiconductor chip, pads formed on the semiconductor chip, internal terminals connected to the pads by solder bumps, and the solder bumps are insulated from each other. A package for a semiconductor device, comprising a semiconductor chip and a low melting point brazing material that is electrically conductive as a ground potential or a power supply potential.
に於いて、半導体チップと、回路基板に半田バンプ接続
される外部端子と、該外部端子とは絶縁され且つ前記半
導体チップと接地電位または電源電位として電気的導通
をとる低融点ろう材を有することを特徴とする半導体装
置用パッケージ。2. A flip chip semiconductor device package, wherein a semiconductor chip, an external terminal connected to a circuit board by solder bumps, and the external terminal are insulated from each other and electrically connected to the semiconductor chip as a ground potential or a power supply potential. A semiconductor device package characterized by having a low-melting point brazing material that provides electrical continuity.
それぞれが接地電位,電源電位,電源を含む電気信号の
入出力を行うように半導体チップと電気的接続する構造
としたことを特徴とする請求項1または2記載の半導体
装置用パッケージ。3. The low melting point brazing material is divided into at least two parts, and each is electrically connected to a semiconductor chip so as to input and output an electric signal including a ground potential, a power source potential and a power source. The semiconductor device package according to claim 1 or 2.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19576192A JPH0645401A (en) | 1992-07-23 | 1992-07-23 | Package for semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19576192A JPH0645401A (en) | 1992-07-23 | 1992-07-23 | Package for semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0645401A true JPH0645401A (en) | 1994-02-18 |
Family
ID=16346524
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP19576192A Withdrawn JPH0645401A (en) | 1992-07-23 | 1992-07-23 | Package for semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0645401A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07283336A (en) * | 1994-04-05 | 1995-10-27 | Toppan Printing Co Ltd | Chip carrier |
US6134428A (en) * | 1995-11-06 | 2000-10-17 | Seiko Epson Corporation | Wrist mounted communicator |
US6396144B1 (en) | 1996-12-03 | 2002-05-28 | Seiko Epson Corporation | Mounting structure of semiconductor device, and communication apparatus using the same |
KR100724505B1 (en) * | 2003-11-25 | 2007-06-04 | 인터내셔널 비지네스 머신즈 코포레이션 | High performance chip carrier substrate |
JP2014175642A (en) * | 2013-03-13 | 2014-09-22 | Sony Corp | Semiconductor device and semiconductor device manufacturing method |
US9893031B2 (en) | 2013-11-29 | 2018-02-13 | International Business Machines Corporation | Chip mounting structure |
-
1992
- 1992-07-23 JP JP19576192A patent/JPH0645401A/en not_active Withdrawn
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07283336A (en) * | 1994-04-05 | 1995-10-27 | Toppan Printing Co Ltd | Chip carrier |
US6134428A (en) * | 1995-11-06 | 2000-10-17 | Seiko Epson Corporation | Wrist mounted communicator |
US6396144B1 (en) | 1996-12-03 | 2002-05-28 | Seiko Epson Corporation | Mounting structure of semiconductor device, and communication apparatus using the same |
KR100724505B1 (en) * | 2003-11-25 | 2007-06-04 | 인터내셔널 비지네스 머신즈 코포레이션 | High performance chip carrier substrate |
JP2014175642A (en) * | 2013-03-13 | 2014-09-22 | Sony Corp | Semiconductor device and semiconductor device manufacturing method |
US9893031B2 (en) | 2013-11-29 | 2018-02-13 | International Business Machines Corporation | Chip mounting structure |
US10141278B2 (en) | 2013-11-29 | 2018-11-27 | International Business Machines Corporation | Chip mounting structure |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A300 | Withdrawal of application because of no request for examination |
Free format text: JAPANESE INTERMEDIATE CODE: A300 Effective date: 19991005 |