JPH0636476Y2 - Constant temperature bath for supplying metal - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION [Industrial field of application] The present invention relates to a thermostatic bath for supplying an organic metal for supplying an organic metal for forming a semiconductor layer to a reaction chamber of a semiconductor manufacturing apparatus.

[Conventional technology]

In the semiconductor manufacturing process, a semiconductor layer is formed by blowing an organometallic gas onto the surface of a wafer placed in a reaction chamber, and such an organometal is heated and held at a low temperature. It is accommodated in a liquid state in a container and is fed as vaporized gas into the reaction chamber through a pipe provided with a flow rate control system set to a high temperature. That is, since the organic metal has a property of easily decomposing at high temperature, it is contained in a liquid state in a container set at a low temperature of 40 to 70 ° C. and sent to the reaction chamber as vaporized gas. In addition, it is heated by a flow rate control system set at a temperature of about 80 ° C. to prevent reliquefaction, and the flow rate is adjusted to an appropriate state and sent to the reaction chamber. As described above, since the set temperatures of the container and the flow rate control system are different from each other, heat retention of these containers is performed by disposing them in separate thermostats set to proper temperatures, respectively, or Both of them are arranged in individual thermostats, the container is heated only by the heating means provided in the thermostat, and the flow rate control system is further heated to a high temperature by a band heater or the like.

[Problems to be solved by the invention]

However, of the above methods, the former requires two thermostats.
There is a problem that the number of devices is required, the device becomes large in size, and the cost is high. Further, in the latter case, the heat generated by the heating means of the flow rate control system affects the temperature of the container, so that there is a problem that it is difficult to accurately control the temperature of each of the container and the flow rate control system.

This invention has been made in view of such circumstances.
An object of the present invention is to provide a thermostatic bath for supplying an organic metal, in which a container and a flow rate control system can be arranged in an individual thermostatic bath while maintaining an appropriate temperature.

[Means for solving problems]

In order to achieve the above-mentioned object, the constant temperature bath for supplying an organic metal of the present invention is divided into a bath lower part and a bath upper part by a heat insulating plate,
A container for containing an organic metal in the lower part of the tank and a heating means for heating the container are provided, and a pipe extending from the container in the upper part of the tank to supply the organic metal in the container to a reaction chamber and A flow rate control system is installed in the pipe, and a ventilation path is extended from the lower side of the upper part of the tank to the outside, and its tip is connected to the upper side of the upper part of the tank. By providing a means, the air in the upper part of the tank is sucked from the lower side of the upper part of the tank into the ventilation passage, and is further returned from the inside of the ventilation path to the upper side of the upper part of the tank, and the recirculated air is heated. The above-mentioned flow rate control system is heated and held by heated reflux air.

[Action]

That is, the constant temperature bath for supplying organic metal of the present invention, the inside of the bath is partitioned by a heat insulating plate into a lower bath and an upper bath, an organic metal container is stored in the lower bath, and a pipe and a flow control system are stored in the upper bath. It is about to do. The container is heated and kept at a low temperature by a heating means provided in the lower part of the tank, and the flow rate control system is provided in the ventilation path with air that flows back into the upper part of the tank and the ventilation path by the operation of the fan. Heating with heating means,
The heated recirculation air is used for heating and holding. At this time, the flow of the above-mentioned reflux air flows from the lower side of the upper part of the tank toward the inside of the air passage, and after passing through the heating means in the air passage, flows from the upper end of the air passage to the upper side of the upper part of the tank. The hot air cooled by heating the flow rate control system in the upper part of the tank flows into the upper part of the lower part of the tank. Therefore, the lower part of the tank is less likely to be affected by the warm air, and since the heat insulating plate is arranged between the upper part and the lower part of the tank, the space between the lower part and the upper part of the tank is blocked, and It becomes possible to keep the flow rate control systems at proper temperatures different from each other.

Next, this invention will be described in detail based on embodiments.

〔Example〕

1 and 2 show an embodiment of the present invention. That is, in the figure, numeral 11 is a rectangular box-shaped lower part of the tank which constitutes the lower part of the outer skin of the thermostatic chamber and has an open upper surface, in which the organometallic filling container 2 is arranged. The container 2
A band heater 4 with a thermometer 3 is wound around the outer peripheral surface of the device, and heating of the band heater 4 keeps the organic metal inside at 40 to 70 ° C. Reference numeral 5 denotes an upper part of a tubular tank having an L-shaped vertical cross-section which constitutes the upper side of the outer skin of the constant temperature bath, and is connected to the upper end of the lower bath part 1 and extends vertically, and from the upper end of the vertical part 5a. Reaction chamber (not shown)
And a horizontal portion 5b that extends horizontally toward the front.
The inside of the tank upper part 5 and the inside of the tank lower part 1 are separated by a partition plate 6 having a heat insulating property and are in a state of being blocked. In addition, a pipe 7 extending from the upper end of the container 2 in the tank lower portion 1 extends through the partition plate 6 in the tank upper portion 5, and the tip thereof is at the central portion of the horizontal portion 5b. Is connected to one end of a flow rate controller 8 arranged in the. And
A pipe 9 extends from the other end of the flow rate controller 8 toward the reaction chamber. Reference numeral 10 denotes an L-shaped duct having heat insulating properties that connects the lower end of the vertical portion 5a and the lower surface of the horizontal portion 5b on the other end side. A fan 11 is provided at the boundary between the vertical portion 5a and the vertical portion 5a. A heater 12 is provided. The fan 11 is adapted to recirculate the air in the tank upper part 5 in the direction of the arrow in FIG. 2, and the heater 12 heats the recirculated air to heat and maintain the flow rate controller 8 at 80 ° C. It is becoming like this. 13, 14 and 15 are on-off valves, respectively.

As a result of such a configuration, when the opening / closing valves 13, 14 and 15 are opened, the organic metal in the container 2 becomes gaseous and flows in the pipe 7 while being heated. Then, the flow rate is adjusted to an appropriate amount by the flow rate controller 8 and then sent to the reaction chamber through the pipe 9. At this time, due to the operation of the fan 11, the flow of the recirculated air is in the direction of the arrow shown in the figure. Therefore, the temperature inside the tank upper part 5 becomes higher on the flow controller 8 side,
The closer to, the lower the temperature. Therefore, the organic metal discharged from the container 2 is prevented from being liquefied in the middle of the pipe 7 due to the high temperature as the pipe 7 progresses, and the lower part 1 of the tank is less affected by the heat generated by the heater 12. Further, since the partition plate 6 blocks the space between the tank upper part 5 and the tank lower part 1, it is possible to keep the container 2 and the flow rate controller 8 at proper temperatures.

As the fan 11, a well-known one having a built-in motor and capable of withstanding a temperature of 80 ° C. is used.
As the heater 12, a finned pipe heater is used. Further, the flow rate controller 8 uses an MFC (mass flow controller).

[Effect of device]

As described above, in the organometallic supply constant temperature bath of the present invention, the inside of the bath is divided by the heat insulating plate into the bath bottom and the bath top so that different temperatures can be maintained and the flow controller is heated. The temperature of the heated reflux air to be held is set to be lower toward the lower part of the tank. Therefore, the lower part of the tank and the upper part of the tank are less likely to be affected by the heat of each other, and even if the container and the flow rate controller are arranged in one constant temperature tank, both can be maintained at appropriate temperatures. Like

[Brief description of drawings]

FIG. 1 is a perspective view of an embodiment of the present invention, and FIG. 2 is a vertical sectional view thereof. 1 ... Lower part of tank, 2 ... Container, 4 ... Band heater, 5 ... Upper part of tank, 6 ... Partition plate, 7, 9 ... Piping, 8 ... Flow controller, 10 ...
Duct, 11 ... Juan, 12 ... Heater

Claims (1)

[Scope of utility model registration request] 1. A tank is divided into a tank lower part and a tank upper part by a heat insulating plate, and a container for containing an organic metal and a heating means for heating the container are provided in the tank lower part. A pipe extending from the container to supply the organic metal in the container to the reaction chamber and a flow control system provided in the pipe are arranged, and a ventilation path is extended from the lower side of the upper part of the tank to the outside. The tip is connected to the upper side of the upper part of the tank, and a fan and heating means are provided in this ventilation path, and the air in the upper part of the tank is sucked into the ventilation path from the lower side of the upper part of the tank. A constant temperature bath for supplying an organic metal, characterized in that the reflux air is sent back to the upper side of the upper part, and the reflux air is heated so that the flow control system is heated and held by the heated reflux air.