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JPH0636342A - Information recording medium - Google Patents

Information recording medium

Info

Publication number
JPH0636342A
JPH0636342A JP4193655A JP19365592A JPH0636342A JP H0636342 A JPH0636342 A JP H0636342A JP 4193655 A JP4193655 A JP 4193655A JP 19365592 A JP19365592 A JP 19365592A JP H0636342 A JPH0636342 A JP H0636342A
Authority
JP
Japan
Prior art keywords
layer
recording
information recording
recording medium
laser light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP4193655A
Other languages
Japanese (ja)
Inventor
Tetsuya Nishida
哲也 西田
Motoyasu Terao
元康 寺尾
Shinkichi Horigome
信吉 堀籠
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Maxell Ltd
Original Assignee
Hitachi Ltd
Hitachi Maxell Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd, Hitachi Maxell Ltd filed Critical Hitachi Ltd
Priority to JP4193655A priority Critical patent/JPH0636342A/en
Publication of JPH0636342A publication Critical patent/JPH0636342A/en
Withdrawn legal-status Critical Current

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Abstract

(57)【要約】 【構成】情報記録用媒体はレーザ光の照射を受けて形状
変化を伴わずに原子配列変化が生じて光学定数が変化す
る無機物からなる記録層,該レーザ光を吸収する吸収
層,レーザ光を多重干渉させる干渉層、及びレーザ光を
反射する反射層とを含み、基板側からのレーザ光に対す
る媒体反射率が未記録部で65%以上,記録部で45%
以下である。 【効果】記録・再生特性が良好で、レーザ光に対する媒
体反射率が65%以上と高く、データの保持寿命が優れ
た情報記録媒体を提供することができる。
(57) [Summary] [Structure] An information recording medium absorbs laser light, which is a recording layer made of an inorganic substance whose optical constants change due to changes in atomic arrangement without shape change upon irradiation with laser light. It includes an absorption layer, an interference layer that causes multiple interference of laser light, and a reflective layer that reflects laser light, and the medium reflectance with respect to the laser light from the substrate side is 65% or more in the unrecorded portion and 45% in the recorded portion.
It is the following. [Effect] It is possible to provide an information recording medium which has excellent recording / reproducing characteristics, a high medium reflectance with respect to laser light of 65% or more, and an excellent data holding life.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明はレーザ光によって、たと
えば映像や音声などのアナログ信号をFM変調したもの
や、たとえば電子計算機のデータや、ファクシミリ信号
やディジタルオーディオ信号などのディジタル情報を、
リアルタイムで記録することが可能な情報の記録用薄膜
に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to FM modulation of analog signals such as images and sounds by laser light, data of electronic computers and digital information such as facsimile signals and digital audio signals.
The present invention relates to a thin film for recording information that can be recorded in real time.

【0002】[0002]

【従来の技術】レーザ光によって薄膜に記録を行う記録
原理は種々あるが、無機物からなる記録層材料の相転移
(相変化とも呼ばれる),構成した薄膜の層間での原子
の拡散及びフォトダークニングなどの原子配列変化によ
る記録は、構成した薄膜の変形をほとんど伴わないの
で、2枚のディスクを直接貼り合わせた両面ディスクが
できるという長所を持っている。この種の記録に関する
発明は多数出願されており、記録層材料の相転移に関す
るもののうち最も早いものは特公昭47−26897 号公報に
開示されている。ここではTe−Ge系,As−Te−
Ge系,Te−O系など多くの薄膜について述べられて
いる。特開昭54−41902 号公報にもGe20l5Sb5
70など種々の組成が述べられている。さらに、特開昭
57−24039号公報にも、Sb25Te12.5Se62.5,Cd
14Te14Se72,Bi2Se3,Sb2Se3,In20Te
20Se60,Bi25Te12.5Se62.5,CuSe、及びT
33Se67の薄膜が述べられている。また、薄膜材料中
の原子の拡散に関するものは、特開昭61−188752号公報
にSb2Se3/Biの2層膜が述べられている。
2. Description of the Related Art Although there are various recording principles for recording on a thin film by laser light, a phase transition (also called a phase change) of a recording layer material made of an inorganic substance, diffusion of atoms between layers of a constituted thin film, and photodarkening Recording due to changes in the atomic arrangement, such as the one described above, has the advantage that a double-sided disc in which two discs are directly bonded together can be formed, because the deformation of the formed thin film is hardly accompanied. Many inventions relating to this type of recording have been filed, and the earliest one relating to the phase transition of the recording layer material is disclosed in Japanese Examined Patent Publication No. 47-26897. Here, Te-Ge system, As-Te-
Many thin films such as Ge-based and Te-O-based have been described. In Japanese Patent Laid-Open No. 54-41902, Ge 20 T 15 Sb 5 S is also disclosed.
Various compositions such as e 70 have been described. In addition,
No. 57-24039 also discloses Sb 25 Te 12.5 Se 62.5 , Cd.
14 Te 14 Se 72 , Bi 2 Se 3 , Sb 2 Se 3 , In 20 Te
20 Se 60 , Bi 25 Te 12.5 Se 62.5 , CuSe, and T
A thin film of e 33 Se 67 is described. Regarding the diffusion of atoms in a thin film material, Japanese Patent Application Laid-Open No. 61-188752 discloses a two-layer film of Sb 2 Se 3 / Bi.

【0003】さて、コンパクトディスク(CD),CD
−ROM,CD−I,レーザディスク、等の再生専用型
光ディスクでは、予め情報を持った凹又は凸状のプリピ
ットをインジェクション法,フォトポリメリゼイション
法等の転写技術によってポリカーボネイト基板,アクリ
ル基板等に形成し、この上にAl,Au等の再生用レー
ザ光に対して70%以上の高反射率を有する金属反射層
を直接形成し、さらにこの上に傷等の防止のための有機
物保護層を形成した構造を有している。従って、再生専
用型光ディスクの平坦部での再生用レーザ光に対する反
射率は70%以上とかなり高い。
Now, compact disc (CD), CD
-In read-only optical discs such as ROM, CD-I, and laser discs, concave or convex prepits having information in advance are transferred to a polycarbonate substrate, an acrylic substrate, or the like by a transfer technique such as an injection method or a photopolymerization method. A metal reflective layer having a high reflectance of 70% or more with respect to a reproducing laser beam such as Al or Au is directly formed on the above, and an organic protective layer for preventing scratches and the like is further formed thereon. It has a formed structure. Therefore, the reflectance of the reproduction laser beam on the flat portion of the reproduction-only optical disc is as high as 70% or more.

【0004】一方、記録用レーザ光の照射による反射率
変化により記録を行う光情報記録媒体における未記録部
での反射率が70%以上の媒体に関しては、記録層とし
て有機物を用い、記録層及び基板の形状変化により記録
を行うタイプの光情報記録媒体について、特開平2−873
39号公報,特開平2−87340号公報及び特開平2−87342号
公報に述べられている。
On the other hand, regarding an optical information recording medium in which the reflectance is 70% or more in an unrecorded portion in which recording is performed by changing the reflectance due to irradiation of a recording laser beam, an organic material is used as the recording layer, and the recording layer and An optical information recording medium of the type in which recording is performed by changing the shape of a substrate is disclosed in JP-A-2-873.
39, JP-A-2-87340 and JP-A-2-87342.

【0005】[0005]

【発明が解決しようとする課題】上記従来技術に示した
情報記録媒体のうち、無機物からなる記録層材料の原子
配列変化により記録を行うタイプの情報記録媒体では、
高反射率を有するための記録層材料および層構造が最適
化されていなかったので、未記録部のレーザ光に対する
媒体反射率を65%以上とすると情報を記録部での再生
信号強度が充分でなく、充分な再生信号強度を得るため
には未記録部のレーザ光に対する媒体反射率を65%未
満とする必要があった。そこで、このような無機物から
なる記録層材料の原子配列変化により記録を行うタイプ
の情報記録媒体では、未記録部のレーザ光に対する媒体
反射率が65%未満と低く、この情報記録媒体に情報を
記録しても、既に広く普及している再生専用型のCD,
レーザディスク等の装置では直接情報を読み出すことが
できない欠点があった。
Among the information recording media shown in the above-mentioned prior art, in the information recording medium of the type which records by changing the atomic arrangement of the recording layer material made of an inorganic material,
Since the recording layer material and layer structure for achieving high reflectance have not been optimized, if the medium reflectance for the unrecorded portion of the laser beam is set to 65% or more, the reproduced signal strength at the recording portion will be insufficient. In order to obtain a sufficient reproduction signal intensity, the medium reflectivity of the unrecorded portion with respect to the laser light needs to be less than 65%. Therefore, in an information recording medium of the type that records by changing the atomic arrangement of the recording layer material made of such an inorganic material, the medium reflectance of the unrecorded portion with respect to the laser beam is as low as less than 65%, and information is recorded on this information recording medium. Even if it is recorded, it is a read-only CD that is already widely used,
A device such as a laser disk has a drawback that information cannot be read directly.

【0006】一方、従来技術に示した情報記録媒体のう
ち、記録層として有機物を用い、記録層及び基板の形状
変化により記録を行うタイプの情報記録媒体では、未記
録部での反射率が70%以上の媒体でも再生信号強度を
充分得ることができる。しかし、このような有機物記録
層を用い、記録層及び基板の形状変化により記録を行う
タイプの情報記録媒体では、記録層材料である有機物と
して色素を用いているため、記録データの保持寿命が短
く、耐環境性が悪い。特に、太陽光線を直接当てると色
素が褪色して記録不能となってしまう欠点があった。
On the other hand, among the information recording media shown in the prior art, in an information recording medium of a type in which an organic material is used as the recording layer and recording is performed by changing the shape of the recording layer and the substrate, the reflectance at the unrecorded portion is 70. A sufficient reproduction signal strength can be obtained even with a medium of not less than%. However, in an information recording medium of a type that uses such an organic recording layer and performs recording by changing the shape of the recording layer and the substrate, since a dye is used as the organic material of the recording layer, the retention life of recorded data is short. , Environmental resistance is poor. In particular, there is a drawback in that when the sun rays are directly applied, the dye fades and recording becomes impossible.

【0007】本発明の目的は、無機物からなる記録層材
料の原子配列変化により記録を行うタイプの情報記録媒
体において、記録データの保持寿命が長く、耐環境性に
優れ、記録・再生特性が良好で、しかも、未記録部のレ
ーザ光に対する媒体反射率が65%以上と高媒体反射率
を有し、記録した情報を既に広く普及している再生専用
型のCD,レーザディスク等の装置で読み出すことがで
きる情報記録用媒体を提供することにある。
An object of the present invention is to provide an information recording medium of a type which records by changing the atomic arrangement of a recording layer material made of an inorganic material, has a long retention life of recorded data, is excellent in environmental resistance, and has excellent recording / reproducing characteristics. Moreover, the medium reflectivity of the unrecorded portion with respect to the laser beam is as high as 65% or more, and the recorded information is read by a device such as a read-only CD or a laser disc which is already widely used. It is to provide an information recording medium that can be used.

【0008】[0008]

【課題を解決するための手段】上記の目的を達成するた
めに、本発明の情報記録用媒体は基板上に直接もしくは
無機物及び有機物のうち少なくとも一つからなる保護層
を介して形成された、レーザ光の照射を受けて形状変化
を伴わずに原子配列変化が生じて光学定数が変化する無
機物からなる記録層,前記レーザ光を吸収する吸収層,
前記レーザ光を反射する反射層、及び前記吸収層と前記
反射層との間に位置した中間層とを含み、基板側からの
前記レーザ光に対する媒体反射率が未記録部で65%以
上であり、記録部で45%以下であるものとする。
In order to achieve the above object, the information recording medium of the present invention is formed directly on a substrate or through a protective layer composed of at least one of an inorganic substance and an organic substance, A recording layer made of an inorganic material, which is irradiated with a laser beam to change its atomic constant without causing a shape change and changes its atomic arrangement, an absorption layer which absorbs the laser beam,
The medium reflectivity for the laser beam from the substrate side is 65% or more in the unrecorded portion, including a reflective layer that reflects the laser beam, and an intermediate layer located between the absorbing layer and the reflective layer. , And 45% or less in the recording unit.

【0009】ここでは、レーザ光照射により、レーザ光
を吸収し、発熱した吸収層からの熱により記録層材料が
非晶質,結晶間または結晶,結晶間での相転移(相変
化)を起こすか、フォトダークニングが起きるか、ある
いは吸収層と記録層との層間での原子の拡散が起こる。
この様に記録層の原子配列変化が生じた結果、記録層の
光学定数が変化しレーザ光に対する媒体反射率が変化す
る。
Here, the laser beam is absorbed by the laser beam irradiation, and the recording layer material undergoes a phase transition (phase change) between amorphous and crystalline or between crystalline and crystalline due to heat from the absorbing layer which has generated heat. Or photodarkening occurs, or atomic diffusion occurs between the absorption layer and the recording layer.
As a result of the change in the atomic arrangement of the recording layer, the optical constant of the recording layer changes and the medium reflectance with respect to the laser light changes.

【0010】記録層,吸収層,中間層、及び反射層は、
その積層順序が、基板に近い側から順に記録層,吸収
層,中間層,反射層となるものとする。また、これらの
記録層,吸収層,中間層、及び反射層は、それぞれが隣
接しているものとする。
The recording layer, the absorption layer, the intermediate layer, and the reflection layer are
It is assumed that the stacking order is the recording layer, the absorbing layer, the intermediate layer, and the reflecting layer in order from the side closer to the substrate. The recording layer, the absorbing layer, the intermediate layer, and the reflecting layer are adjacent to each other.

【0011】本発明の情報記録媒体中の無機物からなる
レーザ光の照射を受けて形状変化を伴わずに原子配列変
化が生じて光学定数が変化する記録層は未記録状態での
前記レーザ光に対する複素屈折率の虚数部である消衰係
数が0.2 以下であるものとする。また、前記記録層は
SeまたはSのうち少なくとも一元素を含有するカルコ
ゲナイドであるものとする。
The recording layer in which the optical constant is changed by the change of the atomic arrangement without the change of the shape upon the irradiation of the laser beam made of the inorganic substance in the information recording medium of the present invention with respect to the laser beam in the unrecorded state It is assumed that the extinction coefficient, which is the imaginary part of the complex refractive index, is 0.2 or less. The recording layer is made of chalcogenide containing at least one element of Se and S.

【0012】本発明の情報記録媒体中のレーザ光を吸収
する吸収層は、前記レーザ光に対する複素屈折率の虚数
部である消衰係数が2.0 以上であれば金属,半金属,
半導体、およびこれらの合金が使用可能である。
The absorption layer that absorbs laser light in the information recording medium of the present invention is a metal, a semimetal, if the extinction coefficient, which is the imaginary part of the complex refractive index with respect to the laser light, is 2.0 or more.
Semiconductors and their alloys can be used.

【0013】本発明の吸収層と反射層との間に位置する
中間層は、前記レーザ光に対する複素屈折率の虚数部で
ある消衰係数が0.2 以下であれば酸化物,弗化物,窒
化物,硫化物,セレン化物等の無機物、これらの混合
物、または、有機化合物、及び無機物と有機物の混合物
が使用可能である。
The intermediate layer located between the absorbing layer and the reflecting layer of the present invention is an oxide, a fluoride, if the extinction coefficient, which is the imaginary part of the complex refractive index with respect to the laser beam, is 0.2 or less. Inorganic substances such as nitrides, sulfides, and selenides, mixtures thereof, or organic compounds, and mixtures of inorganic substances and organic substances can be used.

【0014】本発明の情報記録媒体中のレーザ光を反射
する反射層は、前記レーザ光に対する反射率が70%以
上と十分にあれば、金属,半金属,半導体、及びこれら
の合金が使用可能である。
The reflective layer for reflecting laser light in the information recording medium of the present invention can be made of metal, semi-metal, semiconductor, and alloys thereof as long as the reflectance for the laser light is sufficient at 70% or more. Is.

【0015】本発明の情報記録媒体中の記録層,吸収
層,中間層及び反射層では複素屈折率および反射率が上
記の範囲内にあれば、組成は膜厚方向に変化していても
よい。ただし、組成の変化は不連続的でないほうがより
好ましい。
If the complex refractive index and reflectance of the recording layer, the absorbing layer, the intermediate layer and the reflecting layer in the information recording medium of the present invention are within the above ranges, the composition may change in the film thickness direction. . However, it is more preferable that the change in composition is not discontinuous.

【0016】また、本発明の情報記録媒体中で一部分が
同じ情報を持つ情報記録媒体を大量に作製する場合に
は、本発明の情報記録媒体の一部分に再生専用型の情報
(ROM)を予め凹又は凸状のプリピットの形で形成し、混
在させておくことが好ましい。
In the case where a large number of information recording mediums, some of which have the same information, are manufactured in the information recording medium of the present invention, read-only information is recorded in a portion of the information recording medium of the present invention.
It is preferable to form (ROM) in advance in the form of concave or convex prepits and mix them together.

【0017】[0017]

【作用】本発明の情報記録用媒体は基板上に直接もしく
は無機物及び有機物のうち少なくとも一つからなる保護
層を介して形成された、レーザ光の照射を受けて形状変
化を伴わずに原子配列変化が生じて光学定数が変化する
無機物からなる記録層,該レーザ光を吸収する吸収層,
レーザ光を反射する反射層、及び吸収層と反射層との間
に位置する中間層とから少なくとも形成される。
The information recording medium of the present invention is formed on the substrate directly or through the protective layer composed of at least one of an inorganic material and an organic material, and the atomic arrangement without being changed by the irradiation of the laser beam. A recording layer made of an inorganic material that undergoes changes to change optical constants, an absorption layer that absorbs the laser light,
At least a reflective layer that reflects laser light and an intermediate layer located between the absorbing layer and the reflective layer are formed.

【0018】本発明の情報記録媒体中の記録層では無機
物質の原子配列変化として相転移(一つの非晶質または
結晶相から他の結晶相への転移),フォトダークニン
グ、及び原子の拡散(記録層と吸収層との層間での原子
の拡散)が起こりうる。情報の記録は上記の原子配列変
化を起こさせることができ、かつ記録層に大きな変形を
生じさせることのない照射時間及びパワーのレーザ光で
行い、情報の再生は原子配列変化を起こすことのない照
射時間及びパワーのレーザ光で行う。また、本発明では
記録を行う前の、Arレーザ光の照射,半導体レーザ光
の照射及びフラッシュアニール等による記録層の初期結
晶化は一切必要無い。このような初期化をしなくても、
未記録部の初期反射率が65%以上で、記録部での反射
率が45%以下となる良好な記録・再生特性を記録感度
良く得ることができる。また、本発明の情報記録媒体の
うち、未記録部の初期反射率が70%以上で記録部の反
射率が28%以下のものは、CD−WO(追記型CD)
規格であるオレンジブックに完全準拠できる点で好まし
い。
In the recording layer of the information recording medium of the present invention, phase transition (transition from one amorphous or crystalline phase to another crystalline phase), photodarkening, and diffusion of atoms occur as an atomic arrangement change of an inorganic substance. (Diffusion of atoms between the recording layer and the absorption layer) may occur. Information is recorded by laser light having an irradiation time and power that can cause the above-mentioned atomic arrangement change and does not cause a large deformation in the recording layer, and information reproduction does not cause the atomic arrangement change. Irradiation time and power of laser light are used. Further, in the present invention, the initial crystallization of the recording layer by irradiation of Ar laser light, irradiation of semiconductor laser light, flash annealing, etc. before recording is not necessary at all. Even without such initialization
It is possible to obtain good recording / reproducing characteristics with good recording sensitivity, in which the initial reflectance of the unrecorded portion is 65% or more and the reflectance of the recorded portion is 45% or less. Further, among the information recording media of the present invention, those having an initial reflectance of 70% or more in the unrecorded portion and 28% or less in the recording portion are CD-WO (write-once type CD)
It is preferable because it can fully comply with the standard Orange Book.

【0019】本発明の情報記録媒体中の上記無機物から
なる記録用レーザ光の照射を受けて形状変化を伴わずに
原子配列変化が生じて光学定数が変化する記録層は未記
録状態での再生用レーザ光に対する複素屈折率の虚数部
である消衰係数が0.2 以下であるものとする。消衰係
数は、未記録部の媒体反射率をより高くできるという点
で、0.1 以下が好ましい。また、記録層は上記消衰係
数の値を有するためにSeまたはSのうち少なくとも一
元素を含有するカルコゲナイドであるものとする。記録
層中のSeまたはSの含有量は、記録層の消衰係数を小
さくし、耐酸化性を向上できるという点で、40原子%
以上が好ましく、55原子%以上が特に好ましい。ま
た、記録層は、SeまたはSのうち少なくとも一元素
と、Sb,Sn,In,Tl,Te,Bi,Si,G
e,Pb,Gaのうちの少なくとも一元素とを含むこと
が好ましい。また、記録層はCo,Pd,Ti,V,C
r,Mn,Fe,Co,Ni,Cu,Ag,Au等の遷
移金属を10原子%以下の少量添加することにより、非
晶質状態の安定性が向上するので好ましい。上記のう
ち、SeとSbを主成分として含む合金系では非晶質状
態の安定性を保持したまま記録時の結晶化を高速で行う
ことができ、記録層の耐酸化性が著しく高い。さらに、
Sn,Si,Ge,Pb等の4b属元素を添加すること
で、非晶質状態の安定性をさらに高め、かつ記録時の結
晶化をより高速で行うことができるようになるため、追
記型媒体として適している。SeとInを主成分として
含む合金系では結晶状態と非晶質状態との層転移を多数
回繰り返して行うことができる。さらに、Tl,Co等
の元素を添加することで、結晶化速度がさらに向上する
ため、書き換え型媒体として適している。
In the information recording medium of the present invention, the recording layer in which the optical constant is changed by the change of the atomic arrangement without the change of the shape under the irradiation of the recording laser beam made of the above-mentioned inorganic substance is reproduced in the unrecorded state. It is assumed that the extinction coefficient, which is the imaginary part of the complex index of refraction for laser light, is 0.2 or less. The extinction coefficient is preferably 0.1 or less in that the medium reflectance of the unrecorded portion can be further increased. Further, the recording layer is assumed to be chalcogenide containing at least one element of Se or S because it has the value of the above extinction coefficient. The content of Se or S in the recording layer is 40 atomic% in that the extinction coefficient of the recording layer can be reduced and the oxidation resistance can be improved.
The above is preferable, and 55 atomic% or more is particularly preferable. The recording layer contains at least one element of Se or S and Sb, Sn, In, Tl, Te, Bi, Si and G.
It is preferable to contain at least one element of e, Pb, and Ga. The recording layers are Co, Pd, Ti, V, C
It is preferable to add a small amount of a transition metal such as r, Mn, Fe, Co, Ni, Cu, Ag, and Au in an amount of 10 atomic% or less because the stability of the amorphous state is improved. Among the above, in the alloy system containing Se and Sb as the main components, crystallization at the time of recording can be performed at high speed while maintaining the stability of the amorphous state, and the oxidation resistance of the recording layer is remarkably high. further,
By adding a Group 4b element such as Sn, Si, Ge, or Pb, the stability of the amorphous state can be further increased, and crystallization at the time of recording can be performed at a higher speed. Suitable as a medium. In the alloy system containing Se and In as the main components, the layer transition between the crystalline state and the amorphous state can be repeated many times. Furthermore, by adding an element such as Tl or Co, the crystallization speed is further improved, and thus it is suitable as a rewritable medium.

【0020】また、本発明の情報記録媒体中の上記記録
層をスパッタリング法で作製する場合は、通常アルゴン
ガスを用いるが、アルゴンガス中に窒素ガスを混合した
ガスを用いてスパッタリングしてもよい。これにより、
SeまたはSの含有量の少ない組成の場合でも消衰係数
を小さくすることができる。ここで、窒素ガスの濃度は
3モル%以上30モル%以下が好ましい。
When the recording layer in the information recording medium of the present invention is produced by a sputtering method, argon gas is usually used, but sputtering may be performed using a gas in which nitrogen gas is mixed in argon gas. . This allows
The extinction coefficient can be reduced even in the case of a composition having a small content of Se or S. Here, the concentration of nitrogen gas is preferably 3 mol% or more and 30 mol% or less.

【0021】本発明の情報記録媒体中のレーザ光を吸収
する吸収層は、レーザ光に対する複素屈折率の虚数部で
ある消衰係数が2.0 以上であれば金属,半金属,半導
体、及びこれらの合金が使用可能である。吸収層として
Sb,Te,Biのうち少なくとも一元素を含む合金等
のように、熱伝導率が0.3W/cm・deg 以下の低熱
伝導率材料を主成分とするものを用いると、記録層以外
への余分な熱伝導を抑え、低パワーレーザ光を照射した
ときでも確実に記録できるようにする効果を持つ。低熱
伝導率材料として、Sb合金,Te合金,Bi合金,S
b−Te系合金,Sb−Bi系合金,Ti合金系,マン
ガニン,コンスタンタン,ステンレススチール,ニクロ
ーム,インコネル,モネル、等のうち少なくとも一つを
含む合金が好ましい。
The absorption layer for absorbing laser light in the information recording medium of the present invention has the extinction coefficient of 2.0 or more, which is the imaginary part of the complex refractive index with respect to laser light, if it is metal, semimetal, semiconductor, and These alloys can be used. When the absorption layer is made of a material having a low thermal conductivity of 0.3 W / cm · deg or less, such as an alloy containing at least one element of Sb, Te and Bi, the recording layer It has the effect of suppressing extra heat conduction to other parts and ensuring recording even when irradiated with low power laser light. As a low thermal conductivity material, Sb alloy, Te alloy, Bi alloy, S
An alloy containing at least one of b-Te alloy, Sb-Bi alloy, Ti alloy alloy, manganin, constantan, stainless steel, nichrome, inconel, monel and the like is preferable.

【0022】本発明の情報記録媒体中の吸収層と反射層
との間に位置する中間層は、レーザ光に対する複素屈折
率の虚数部である消衰係数が0.2 以下であれば酸化
物,弗化物,窒化物,硫化物,セレン化物等の無機物、
これらの混合物、または、有機化合物、及び無機物と有
機物の混合物が使用可能である。消衰係数は、未記録部
の媒体反射率をより高くできるという点で、0.1 以下
が好ましい。
The intermediate layer located between the absorbing layer and the reflecting layer in the information recording medium of the present invention is an oxide if the extinction coefficient, which is the imaginary part of the complex refractive index for laser light, is 0.2 or less. , Fluoride, nitride, sulfide, selenide and other inorganic substances,
A mixture of these, or an organic compound, and a mixture of an inorganic substance and an organic substance can be used. The extinction coefficient is preferably 0.1 or less in that the medium reflectance of the unrecorded portion can be further increased.

【0023】無機物としては、Ce,La,Si,I
n,Al,Ge,Pb,Sn,Bi,Te,Ta,S
c,Y,Ti,Zr,V,Nb,Cr及びWよりなる群
より選ばれた少なくとも一元素の酸化物、Mg,Ce,
Caなどの弗化物、Si,Al,Ta,Bなどの窒化
物、Cd,Zn,Ga,In,Sb,Ge,Sn,P
b,Biよりなる群より選ばれた少なくとも一元素の硫
化物、Cd,Zn,Ga,In,Sb,Ge,Sn,P
b,Biよりなる群より選ばれた少なくとも一元素のセ
レン化物、およびこれらの混合物より成るものが使用可
能である。
As the inorganic substance, Ce, La, Si, I
n, Al, Ge, Pb, Sn, Bi, Te, Ta, S
oxides of at least one element selected from the group consisting of c, Y, Ti, Zr, V, Nb, Cr and W, Mg, Ce,
Fluoride such as Ca, nitride such as Si, Al, Ta, B, Cd, Zn, Ga, In, Sb, Ge, Sn, P
a sulfide of at least one element selected from the group consisting of b and Bi, Cd, Zn, Ga, In, Sb, Ge, Sn, P
It is possible to use a selenide of at least one element selected from the group consisting of b and Bi, and a mixture thereof.

【0024】例えば、主成分がCeO2,La23,S
iO,SiO2,In23,Al23,GeO,Ge
2,PbO,SnO,SnO2,Bi23,TeO2
Ta25,Sc23,Y23,TiO2,ZrO2,V2
5,Nb25,Cr23,WO2,WO3,MgF2,C
eF3,CaF2,TaN,Si34,AlN,BN,C
dS,ZnS,In23,Sb23,Ga23,Ge
S,SnS,SnS2,PbS,Bi23,CdSe,Z
nSe,In2Se3,Sb2Se3,Ga2Se3,GeS
e,SnSe,SnSe2,PbSe,Bi2Se3 、の
うちの一つに近い組成をもったもの及び、これらの混合
物である。
For example, the main components are CeO 2 , La 2 O 3 and S.
iO, SiO 2 , In 2 O 3 , Al 2 O 3 , GeO, Ge
O 2 , PbO, SnO, SnO 2 , Bi 2 O 3 , TeO 2 ,
Ta 2 O 5 , Sc 2 O 3 , Y 2 O 3 , TiO 2 , ZrO 2 , V 2
O 5 , Nb 2 O 5 , Cr 2 O 3 , WO 2 , WO 3 , MgF 2 , C
eF 3 , CaF 2 , TaN, Si 3 N 4 , AlN, BN, C
dS, ZnS, In 2 S 3 , Sb 2 S 3, Ga 2 S 3, Ge
S, SnS, SnS 2 , PbS, Bi 2 S 3 , CdSe, Z
nSe, In 2 Se 3 , Sb 2 Se 3 , Ga 2 Se 3 , GeS
e, SnSe, SnSe 2 , PbSe, Bi 2 Se 3 , and a mixture thereof having a composition close to one of e, SnSe 2 , SnSe 2 , PbSe, and Bi 2 Se 3 .

【0025】これらのうち、酸化物で好ましいのはY2
3,Sc23,CeO2,TiO2,ZrO2,SiO,
Ta25,In23,Al23,SnO2 またはSiO
2 に近い組成のものである。窒化物では、Si34,A
lN(窒化アルミニウム)またはTaNに近い組成のも
のが好ましい。硫化物ではZnSに近いものが好まし
い。さらに、記録層と全く同じ組成の物も使用可能であ
り、コストを低減できる点で好ましい。
Of these, the oxide is preferably Y 2
O 3 , Sc 2 O 3 , CeO 2 , TiO 2 , ZrO 2 , SiO,
Ta 2 O 5 , In 2 O 3 , Al 2 O 3 , SnO 2 or SiO
It has a composition close to 2 . For nitrides, Si 3 N 4 , A
It is preferable that the composition is close to 1N (aluminum nitride) or TaN. Among sulfides, those close to ZnS are preferable. Furthermore, a composition having exactly the same composition as the recording layer can be used, which is preferable in that the cost can be reduced.

【0026】有機物は、アクリル樹脂,ポリカーボネー
ト,ポリオレフィン,エポキシ樹脂,ポリイミド,ポリ
アミド,ポリスチレン,ポリエチレン,ポリエチレンテ
レフタレート,ポリ4フッ化エチレン(テフロン)など
のフッ素樹脂,エチレン−酢酸ビニル共重合体、および
紫外線硬化樹脂及びこれらの混合物が使用可能である。
該中間層は無機物層と無機物層,無機物層と有機物層,
有機物層と有機物層、等の多層構造にしてもよい。この
多層構造の場合は、吸収層との界面に熱伝導率の低い層
を形成することが記録感度が良くなるという点で好まし
い。
Organic substances include acrylic resin, polycarbonate, polyolefin, epoxy resin, polyimide, polyamide, polystyrene, polyethylene, polyethylene terephthalate, fluororesin such as polytetrafluoroethylene (Teflon), ethylene-vinyl acetate copolymer, and ultraviolet rays. Cured resins and mixtures thereof can be used.
The intermediate layer is an inorganic layer and an inorganic layer, an inorganic layer and an organic layer,
You may make it a multilayered structure, such as an organic material layer and an organic material layer. In the case of this multi-layer structure, it is preferable to form a layer having a low thermal conductivity at the interface with the absorbing layer in terms of improving recording sensitivity.

【0027】本発明の情報記録媒体中のレーザ光を反射
する反射層は、再生用レーザ光に対する反射率が70%
以上と十分にあれば、金属,半金属,半導体及びこれら
の合金が使用可能である。反射層として、Al,Au,
Ag,Cu等及びこれらを含む合金等のように、反射率
が80%以上の高反射率材料を主成分とするものを用い
ると、情報記録媒体の反射率を高めて70%以上にし、
記録した信号を再生する際の再生信号強度を大きくする
効果を持つ。即ち、高反射率材料としてはAl,Au,
Ag,Cu等及びこれらを含む合金等のうち少なくとも
一つを含む材料が好ましい。
The reflective layer that reflects the laser light in the information recording medium of the present invention has a reflectance of 70% with respect to the reproducing laser light.
Metals, semi-metals, semiconductors and alloys thereof can be used as long as the above is sufficient. As the reflective layer, Al, Au,
When a material mainly composed of a high-reflectance material having a reflectance of 80% or more, such as Ag and Cu and alloys containing these, is used, the reflectance of the information recording medium is increased to 70% or more,
This has the effect of increasing the reproduction signal strength when reproducing the recorded signal. That is, as the high reflectance material, Al, Au,
A material containing at least one of Ag, Cu and the like and alloys containing these is preferable.

【0028】本発明の情報記録媒体中の記録層,吸収
層,中間層及び反射層では複素屈折率および反射率が上
記の範囲内にあれば、組成は膜厚方向に変化していても
よい。ただし、組成の変化は不連続的でないほうがより
好ましい。
If the complex refractive index and reflectance of the recording layer, the absorbing layer, the intermediate layer and the reflecting layer in the information recording medium of the present invention are within the above ranges, the composition may change in the film thickness direction. . However, it is more preferable that the change in composition is not discontinuous.

【0029】また、本発明の情報記録媒体中で一部分が
同じ情報を持つ情報記録媒体を大量に作製する場合に
は、本発明の情報記録媒体の一部分に再生専用型の情報
(ReadOnly Memory;ROM)を予め凹又は凸状のプリピ
ットの形で形成し、混在させておくことが好ましい。
In the case where a large number of information recording mediums, some of which have the same information, are manufactured in the information recording medium of the present invention, read-only type information (Read Only Memory; ROM) is provided in a part of the information recording medium of the present invention. It is preferable to previously form () in the form of concave or convex pre-pits and to mix them.

【0030】記録層,吸収層,中間層及び、反射層を合
わせて情報記録媒体層とすると、本発明の情報記録媒体
層の少なくとも一方の面が他の物質からなる保護層で密
着して保護されていれば、情報記録媒体の耐環境性が向
上する。もちろん両側が保護されていれば、情報記録媒
体の耐環境性がさらに向上し、可逆型として用いた時の
書き換え可能回数が10倍以上向上する。
When the recording layer, the absorption layer, the intermediate layer, and the reflective layer are combined to form an information recording medium layer, at least one surface of the information recording medium layer of the present invention is protected by closely contacting it with a protective layer made of another substance. If so, the environment resistance of the information recording medium is improved. Of course, if both sides are protected, the environment resistance of the information recording medium is further improved, and the number of rewritable times when used as a reversible type is improved ten times or more.

【0031】これらの保護層は、たとえばアクリル樹
脂,ポリカーボネート,ポリオレフィン,エポキシ樹
脂,ポリイミド,ポリアミド,ポリスチレン,ポリエチ
レン,ポリエチレンテレフタレート,ポリ4フッ化エチ
レン(テフロン)などのフッ素樹脂、および紫外線硬化
樹脂などの有機物より形成されていてもよく、これらは
基板であってもよい。酸化物,弗化物,窒化物,硫化
物,炭化物,ホウ化物,ホウ素,炭素、あるいは金属な
どを主成分とする無機物より形成されていてもよい。ま
た、これらの複合材料でもよい。ガラス,石英,サファ
イア,鉄,チタン、あるいはアルミニウムを主成分とす
る基板も一方の無機物保護層として働き得る。
These protective layers are made of, for example, acrylic resin, polycarbonate, polyolefin, epoxy resin, polyimide, polyamide, polystyrene, polyethylene, polyethylene terephthalate, fluororesin such as polytetrafluoroethylene (Teflon), and ultraviolet curable resin. It may be formed of an organic substance, and these may be substrates. It may be formed of an oxide, a fluoride, a nitride, a sulfide, a carbide, a boride, boron, carbon, or an inorganic substance containing a metal as a main component. Also, a composite material of these may be used. A substrate containing glass, quartz, sapphire, iron, titanium, or aluminum as a main component can also serve as the inorganic protective layer.

【0032】有機物,無機物のうちでは無機物と密着し
ている方が耐熱性の面で好ましい。しかし無機物層(基
板の場合を除く)を厚くするのは、クラック発生,透過
率低下,感度低下のうちの少なくとも一つを起こしやす
いので無機物層は薄くし、無機物層の情報記録媒体層と
反対の側には、機械的強度を増すために厚い有機物層が
密着している方が好ましい。この有機物層は基板であっ
てもよい。これによって変形も起こりにくくなる。
Of the organic substances and the inorganic substances, it is preferable that they are in close contact with the inorganic substance in terms of heat resistance. However, increasing the thickness of the inorganic layer (excluding the case of the substrate) tends to cause at least one of crack generation, transmittance reduction, and sensitivity reduction, so the inorganic layer should be thin and opposite to the information recording medium layer of the inorganic layer. It is preferable that a thick organic layer is in close contact with the side of in order to increase the mechanical strength. This organic layer may be the substrate. This makes deformation less likely to occur.

【0033】有機物としては、例えば、ポリスチレン,
ポリ4フッ化エチレン(テフロン),ポリイミド,アクリ
ル樹脂,ポリオレフィン,ポリエチレンテレフタレー
ト,ポリカーボネート,エポキシ樹脂,ホットメルト接
着剤として知られているエチレン−酢酸ビニル共重合体
など、粘着剤、および紫外線硬化樹脂などが用いられ
る。
Examples of organic substances include polystyrene,
Polytetrafluoroethylene (Teflon), Polyimide, Acrylic resin, Polyolefin, Polyethylene terephthalate, Polycarbonate, Epoxy resin, Ethylene-vinyl acetate copolymer known as hot melt adhesive, Adhesive, UV curing resin, etc. Is used.

【0034】無機物よりなる保護層の場合は、そのまま
の形で電子ビーム蒸着,スパッタリング等で形成しても
よいが、反応性スパッタリングや、金属,半金属,半導
体の少なくとも一元素よりなる層を形成したのち、酸
素,硫黄,窒素のうちの少なくとも一つと反応させるよ
うにしてもよい。
In the case of the protective layer made of an inorganic substance, it may be formed as it is by electron beam evaporation, sputtering, etc., but reactive sputtering, or a layer made of at least one element of metal, semimetal and semiconductor is formed. After that, it may be reacted with at least one of oxygen, sulfur, and nitrogen.

【0035】無機物保護層の例を挙げると、Ce,L
a,Si,In,Al,Ge,Pb,Sn,Bi,T
e,Ta,Sc,Y,Ti,Zr,V,Nb,Cr及び
Wよりなる群より選ばれた少なくとも一元素の酸化物、
Cd,Zn,Ga,In,Sb,Ge,Sn,Pb,B
iよりなる群より選ばれた少なくとも一元素の硫化物、
Mg,Ce,Caなどの弗化物、Si,Al,Ta,B
などの窒化物、B,Siなどの炭化物、Tiなどのホウ
化物,ホウ素,炭素より成るものであって、たとえば主
成分がCeO2,La23,SiO,SiO2,In
23,Al23,GeO,GeO2,PbO,SnO,S
nO2,Bi23,TeO2,Ta25,Sc23,Y2
3,TiO2,ZrO2,V25,Nb25,Cr23
WO2,WO3,CdS,ZnS,In23,Sb23
Ga23,GeS,SnS,SnS2,PbS,Bi2
3,MgF2,CeF3,CaF2,TaN,Si34,A
lN,BN,Si,TiB2,B4C,SiC,B,Cの
うちの一つに近い組成をもったもの及びこれらの混合物
である。
Examples of the inorganic protective layer include Ce, L
a, Si, In, Al, Ge, Pb, Sn, Bi, T
an oxide of at least one element selected from the group consisting of e, Ta, Sc, Y, Ti, Zr, V, Nb, Cr and W,
Cd, Zn, Ga, In, Sb, Ge, Sn, Pb, B
a sulfide of at least one element selected from the group consisting of i,
Fluoride such as Mg, Ce, Ca, Si, Al, Ta, B
Etc., nitrides such as B, Si, etc., borides such as Ti, boron, carbon, and the like, whose main components are CeO 2 , La 2 O 3 , SiO, SiO 2 , In.
2 O 3 , Al 2 O 3 , GeO, GeO 2 , PbO, SnO, S
nO 2 , Bi 2 O 3 , TeO 2 , Ta 2 O 5 , Sc 2 O 3 , Y 2 O
3 , TiO 2 , ZrO 2 , V 2 O 5 , Nb 2 O 5 , Cr 2 O 3 ,
WO 2 , WO 3 , CdS, ZnS, In 2 S 3 , Sb 2 S 3 ,
Ga 2 S 3 , GeS, SnS, SnS 2 , PbS, Bi 2 S
3 , MgF 2 , CeF 3 , CaF 2 , TaN, Si 3 N 4 , A
1N, BN, Si, TiB 2 , B 4 C, SiC, B, C, and mixtures thereof.

【0036】これらのうち、硫化物ではZnSに近いも
のが、屈折率が適当な大きさで層が安定である点で好ま
しい。窒化物では表面反射率があまり高くなく、層が安
定であり、強固である点で、TaN,Si34またはA
lN(窒化アルミニウム)に近い組成のものが好まし
い。酸化物で好ましいのはY23,Sc23,CeO2,
TiO2,ZrO2,SiO,Ta25,In23,Al
23,SnO2 またはSiO2 に近い組成のものであ
る。Siの水素を含む非晶質も好ましい。保護層を多層
にすればさらに保護効果が高まる。例えば厚さ30nm
以上300nm以下のSiO2 に近い組成の薄膜を情報
記録媒体層から遠い側に形成し、厚さ30nm以上〜3
00nm以下のZnSに近い組成の薄膜を情報記録媒体
層に近い側に形成すると、耐環境性および記録・消去特
性が大きく向上し、書き換え可能回数も大幅に向上でき
る。
Of these, sulfides close to ZnS are preferable in that the refractive index is appropriate and the layer is stable. In the case of nitride, the surface reflectance is not very high, and the layer is stable and strong, so TaN, Si 3 N 4 or A is used.
A composition close to 1N (aluminum nitride) is preferable. Preferred oxides are Y 2 O 3 , Sc 2 O 3 , CeO 2 ,
TiO 2 , ZrO 2 , SiO, Ta 2 O 5 , In 2 O 3 , Al
It has a composition close to that of 2 O 3 , SnO 2 or SiO 2 . Amorphous Si containing hydrogen is also preferred. If the protective layer is multilayered, the protective effect is further enhanced. For example, the thickness is 30 nm
A thin film having a composition close to that of SiO 2 and having a thickness of 300 nm or less is formed on the side far from the information recording medium layer and has a thickness of 30 nm or more to 3
If a thin film having a composition close to that of ZnS and having a thickness of 00 nm or less is formed on the side closer to the information recording medium layer, environmental resistance and recording / erasing characteristics are greatly improved, and the number of rewritable times is also greatly improved.

【0037】各部分の膜厚の好ましい範囲は下記のう
ち、基板からのレーザ光に対する未記録部の反射率が6
5%以上となる組合せである。
The preferable range of the film thickness of each portion is, of the following, that the reflectance of the unrecorded portion with respect to the laser beam from the substrate is 6:
The combination is 5% or more.

【0038】 記録層膜厚 : 10nm以上600nm以下 吸収層膜厚 : 2nm以上100nm以下 中間層膜厚 : 10nm以上600nm以下 反射層膜厚 : 10nm以上300nm以下 無機物保護層 : 20nm以上 1μm以下 有機物保護層 : 500nm以上 10mm以下 また、各部分の膜厚の特に好ましい範囲は下記のうち、
基板からのレーザ光に対する未記録部の反射率が65%
以上となる組合せである。
Recording layer film thickness: 10 nm or more and 600 nm or less Absorption layer film thickness: 2 nm or more and 100 nm or less Intermediate layer film thickness: 10 nm or more and 600 nm or less Reflective layer film thickness: 10 nm or more and 300 nm or less Inorganic material protective layer: 20 nm or more and 1 μm or less Organic material protective layer : 500 nm or more and 10 mm or less Moreover, the particularly preferable range of the film thickness of each part is as follows.
The reflectance of the unrecorded area for the laser light from the substrate is 65%
It is the above combination.

【0039】 記録層膜厚 : 20nm以上400nm以下 吸収層膜厚 : 5nm以上 50nm以下 中間層膜厚 : 20nm以上400nm以下 反射層膜厚 : 20nm以上150nm以下 無機物保護層 : 40nm以上600nm以下 有機物保護層 : 2μm以上 1mm以下 上記のうちの記録層以外の各層の材質や膜厚は本発明の
記録層に限らず他の相転移記録層,相互拡散型記録層、
また、光磁気記録層などにも有効である。
Recording layer film thickness: 20 nm or more and 400 nm or less Absorption layer film thickness: 5 nm or more and 50 nm or less Intermediate layer film thickness: 20 nm or more and 400 nm or less Reflective layer film thickness: 20 nm or more and 150 nm or less Inorganic material protective layer: 40 nm or more and 600 nm or less Organic material protective layer : 2 μm or more and 1 mm or less The materials and film thicknesses of the layers other than the recording layer are not limited to those of the recording layer of the present invention, and other phase transition recording layers, mutual diffusion type recording layers,
It is also effective for a magneto-optical recording layer and the like.

【0040】以上の各層の形成方法は、真空蒸着,ガス
中蒸着,スパッタリング,イオンビーム蒸着,イオンプ
レーティング,電子ビーム蒸着,射出成形,キャスティ
ング,回転塗布,プラズマ重合などのうちのいずれかを
適宜選ぶものである。記録層,反射層および無機物保護
層は、全てスパッタリングにより形成すると、組成およ
び膜厚を管理しやすく、製造コストが安価となるので好
ましい。
As a method for forming each of the layers described above, any one of vacuum vapor deposition, vapor deposition in gas, sputtering, ion beam vapor deposition, ion plating, electron beam vapor deposition, injection molding, casting, spin coating, plasma polymerization and the like can be appropriately used. To choose. It is preferable that the recording layer, the reflective layer and the inorganic protective layer are all formed by sputtering because the composition and the film thickness can be easily controlled and the manufacturing cost can be reduced.

【0041】本発明の記録層は形状変化をほとんど伴わ
ないなんらかの原子配列変化によって光学的性質の変化
を起こさせればよい。非晶質状態と結晶状態の間の変化
の他に、例えば、結晶粒径や結晶形の変化,結晶と準安
定状態との間の変化などでもよい。非晶質状態と結晶状
態の変化でも、非晶質は完全な非晶質でなく、結晶部分
が混在していてもよい。また、記録層と反射層との間
で、これらの層を構成する原子のうちの一部が移動(拡
散,化学反応などによる)することにより、あるいは移
動と相転移の両方により記録されてもよい。
The recording layer of the present invention may be changed in its optical properties by some kind of atomic arrangement change which hardly accompanies a change in shape. In addition to the change between the amorphous state and the crystalline state, for example, the change in the crystal grain size or the crystal form, the change between the crystal and the metastable state, and the like may be used. Even if the amorphous state and the crystalline state change, the amorphous portion is not completely amorphous and may have a mixed crystal portion. Further, even if recording is performed between the recording layer and the reflective layer, some of the atoms constituting these layers move (due to diffusion, chemical reaction, etc.) or both due to movement and phase transition. Good.

【0042】本発明の記録用部材は、ディスク状として
ばかりではなく、テープ状,カード状などの他の形態で
も使用可能である。
The recording member of the present invention can be used not only in the form of a disk, but also in other forms such as a tape or a card.

【0043】[0043]

【実施例】【Example】

<実施例1>図1に本発明の一実施例のディスクAの断
面図を示す。
<Embodiment 1> FIG. 1 shows a sectional view of a disk A according to an embodiment of the present invention.

【0044】直径120mm,厚さ1.2mm のディスク状
ポリカーボネイト板の表面に射出成形法によってトラッ
キング用1.5μm ピッチのスパイラル状溝を形成した
レプリカ基板1上に、高周波マグネトロンパッタリング
装置を用いてまず原子%でSn17Sb17Se66の組成の
記録層2を130nmの膜厚に形成した。続いて同一ス
パッタリング装置内で原子%でSb80Bi20の組成の吸
収層3を20nmの膜厚に形成した。続いて同一スパッ
タリング装置内で原子%で(ZnS)80(SiO2)20の組成の中
間層4を150nmの膜厚に形成した。続いて同一スパ
ッタリング装置内でAu反射層5を60nmの膜厚に形
成した。さらに、この反射層5の上に回転塗布した紫外
線硬化樹脂を硬化させて50μmの厚さの有機物層6を
形成した。同様にしてもう1枚の同様な基板1′上にS
17Sb17Se66の組成の記録層2′,Sb80Bi20
組成の吸収層3′,(ZnS)80(SiO2)20の組成の中
間層4′,Au反射層5′,有機物層6′を順次形成し
た。このようにして作製した2枚のディスクを有機物層
6及び6′側を内側にして接着剤層7によって貼り合わ
せを行い、ディスクAを作製した。
A high frequency magnetron sputtering device was used on a replica substrate 1 having a spiral groove with a pitch of 1.5 μm for tracking formed on the surface of a disk-shaped polycarbonate plate having a diameter of 120 mm and a thickness of 1.2 mm by an injection molding method. First, the recording layer 2 having a composition of Sn 17 Sb 17 Se 66 in atomic% was formed to have a film thickness of 130 nm. Then, the absorption layer 3 having a composition of Sb 80 Bi 20 in atomic% was formed in the same sputtering apparatus to have a film thickness of 20 nm. Subsequently, in the same sputtering apparatus, an intermediate layer 4 having a composition of (ZnS) 80 (SiO 2 ) 20 in atomic% was formed to have a film thickness of 150 nm. Then, the Au reflective layer 5 was formed in a film thickness of 60 nm in the same sputtering apparatus. Further, the ultraviolet curable resin spin-coated on the reflective layer 5 was cured to form the organic layer 6 having a thickness of 50 μm. Similarly, on another similar substrate 1 ', S
recording layer 2 of the composition of n 17 Sb 17 Se 66 ', the absorption layer 3 having the composition of Sb 80 Bi 20', (ZnS ) 80 (SiO 2) 20 intermediate layer 4 of the composition of the 'Au reflective layer 5', organics Layer 6'was formed sequentially. The two discs thus produced were bonded together with the adhesive layers 7 with the organic layers 6 and 6'side facing inward to produce a disc A.

【0045】図2に、本発明の比較例として、記録層自
身がレーザ光を吸収し、吸収層が無いタイプのGe−S
b−Te系記録層を有する従来技術のディスクBの断面
図を示す。このディスクBは以下の様にして作製した。
As a comparative example of the present invention, FIG. 2 shows a Ge-S type in which the recording layer itself absorbs laser light and there is no absorbing layer.
FIG. 3 shows a sectional view of a prior art disc B having a b-Te based recording layer. This disk B was manufactured as follows.

【0046】すなわち、ディスクAと同様に、直径12
0mm,厚さ1.2mm のディスク状ポリカーボネイト板の
表面に射出成形法によってトラッキング用1.5μm ピ
ッチのスパイラル状溝を形成したレプリカ基板8上に、
高周波マグネトロンパッタリング装置を用いてまず原子
%で(ZnS)40(SiO2)60の組成の保護層9を100n
mの膜厚に形成した。続いて同一スパッタリング装置内
で原子%でGe21Sb26Te53の組成の記録層10を2
0nmの膜厚に形成した。続いて同一スパッタリング装
置内で原子%で(ZnS)40(SiO2)60の組成の中間層
11を132nmの膜厚に形成した。続いて同一スパッ
タリング装置内でAu反射層12を60nmの膜厚に形
成した。さらに、この反射層12の上に回転塗布した紫
外線硬化樹脂を硬化させて50μmの厚さの有機物層1
3を形成した。同様にしてもう1枚の同様な基板8′上
に(ZnS)40(SiO2)60保護層9′,Ge21Sb26
53の組成の記録層10′,(ZnS)40(SiO2)60
組成の中間層11′,Au反射層12′,有機物層1
3′を順次形成した。このようにして作製した2枚のデ
ィスクを有機物層13及び13′側を内側にして接着剤
層14によって貼り合わせを行い、ディスクBを作製し
た。
That is, as with the disk A, the diameter 12
On a replica substrate 8 in which a spiral groove having a pitch of 1.5 μm for tracking is formed on the surface of a disk-shaped polycarbonate plate having a thickness of 0 mm and a thickness of 1.2 mm by an injection molding method,
First, a protective layer 9 having a composition of (ZnS) 40 (SiO 2 ) 60 at 100% by atomic% was formed using a high frequency magnetron sputtering device.
It was formed to a film thickness of m. Subsequently, two recording layers 10 having a composition of Ge 21 Sb 26 Te 53 in atomic% are formed in the same sputtering apparatus.
It was formed to a film thickness of 0 nm. Then, the intermediate layer 11 having a composition of (ZnS) 40 (SiO 2 ) 60 in atomic% was formed in the same sputtering apparatus to have a film thickness of 132 nm. Then, the Au reflective layer 12 was formed to a film thickness of 60 nm in the same sputtering apparatus. Further, the ultraviolet curable resin spin-coated on the reflective layer 12 is cured to form an organic layer 1 having a thickness of 50 μm.
Formed 3. Similarly, another (ZnS) 40 (SiO 2 ) 60 protective layer 9 ', Ge 21 Sb 26 T is formed on another similar substrate 8'.
recording layer 10 of the composition of the e 53 ', (ZnS) 40 intermediate layer 11 of the composition (SiO 2) 60', Au reflective layer 12 ', the organic layer 1
3'was formed sequentially. The two discs thus produced were bonded together with the adhesive layers 14 with the organic layers 13 and 13 'side facing inward to produce disc B.

【0047】このように作製したディスクA及びBの記
録・再生評価を、光ディスクドライブ(記録・再生装置)
を用い、下記の様にして行った。ディスクを一定回転数
で回転させ、任意の半径位置に波長780nmの半導体
レーザからの連続光を記録が行われない低パワーレベル
に保って、光ヘッド中の開口数(Numerical Aperture)
0.55 の対物レンズで集光して基板1を通して記録層
2に照射し、反射光を検出することによって、トラッキ
ング用の溝と溝の中間に光スポットの中心が常に一致す
るようにヘッドを駆動した。溝と溝の中間を記録トラッ
クとすることによって溝から発生するノイズの影響を避
けることができる。この様にトラッキングを行いなが
ら、さらに記録層上に焦点が来るように自動焦点合わせ
をして記録を行う。この記録トラック上に結晶化により
記録を行う場合、結晶化するのに適当なレーザパワーの
範囲は、結晶化が起こる程度に高く、非晶質化が起こる
より低い範囲である。また、非晶質化により記録を行う
場合、非晶質化するのに適当なレーザパワーの範囲は、
結晶化するパワーより高く、強い変形を生じたり穴があ
くよりも低い範囲である。
The recording / reproducing evaluation of the discs A and B produced in this way is performed by an optical disc drive (recording / reproducing apparatus).
Was carried out as follows. The disk is rotated at a constant rotation speed, and continuous light from a semiconductor laser with a wavelength of 780 nm is kept at a low power level where recording is not performed at an arbitrary radial position, and the numerical aperture (Numerical Aperture) in the optical head
By focusing with a 0.55 objective lens and irradiating the recording layer 2 through the substrate 1 and detecting the reflected light, the head is adjusted so that the center of the light spot is always aligned with the tracking groove and the middle of the groove. Driven. The influence of noise generated from the groove can be avoided by setting the recording track in the middle of the groove. While tracking is performed in this manner, recording is performed by further performing automatic focusing so that the focus is on the recording layer. When recording is performed on this recording track by crystallization, the range of laser power suitable for crystallization is a range that is high enough to cause crystallization and lower than a range where amorphous is generated. In addition, when recording by amorphization, the range of laser power suitable for amorphization is:
The range is higher than the crystallization power and lower than that which causes strong deformation or has holes.

【0048】ディスクA及びBを追記型媒体として用
い、ディスク線速度を1.2m/s (回転数270r
pm,半径位置43mm)で、再生光レベルを(ディスク
面上)1.0mW として、レーザパワーを再生光レベル
と結晶化による記録パワーレベル(ディスク面上)6.
5mW との間で図3に示したように変化させることに
より情報の記録を行った。こうして記録したトラック上
で、トラッキングと自動焦点合わせを行いながら、記録
及び消去が行われない再生光レベルのディスク面1.0
mW の連続光を照射し、この反射光の強弱を検出して
情報を再生した。まず、8−14変調(EMF)での1
1Tの繰り返し信号(0.17MHz,デューティ50
%)を初期化せずに記録したところ、記録用レーザ光照
射部の反射率はディスクAでは80%から18%へ変化
したが、ディスクBでは変化が見られず記録されなかっ
た。そこで、ディスクBのみ15mWのレーザ光で全面
初期化した後記録したところ、67%から49%へ変化
した。ここで、未記録部の媒体反射率(Ro)と情報記
録部での媒体反射率(Rw)とから、情報記録部での再
生信号変調度(Mod)を下記の式1で示すように定義
すると、
Disks A and B were used as a write-once medium, and the disk linear velocity was 1.2 m / s (rotation speed 270r.
pm, radial position 43 mm), the reproducing light level is 1.0 mW (on the disk surface), the laser power is the reproducing light level, and the recording power level by crystallization (on the disk surface) 6.
Information was recorded by changing as shown in FIG. 3 between 5 mW. On the track recorded in this way, the disk surface of the reproduction light level 1.0 where recording and erasing are not performed while performing tracking and automatic focusing.
Information was reproduced by irradiating continuous light of mW and detecting the intensity of the reflected light. First, 1 at 8-14 modulation (EMF)
1T repetitive signal (0.17MHz, duty 50
%) Was recorded without initializing, the reflectance of the recording laser beam irradiation portion changed from 80% in the disk A to 18%, but was not recorded in the disk B because no change was observed. Therefore, when only the disk B was initialized after the entire surface was initialized with a laser beam of 15 mW, it was changed from 67% to 49%. Here, based on the medium reflectance (Ro) of the unrecorded portion and the medium reflectance (Rw) of the information recording portion, the reproduction signal modulation degree (Mod) in the information recording portion is defined as shown in the following Equation 1. Then,

【0049】[0049]

【数1】 Mod(%)=|Ro−Rw|/Ro*100 ……数1 ディスクAでは再生信号変調度78%,測定帯域10k
Hzで搬送波対雑音比61dBの再生信号出力が得ら
れ、ディスクBでは再生信号変調度27%,測定帯域1
0kHzで搬送波対雑音比51dBの再生信号出力が得
られた。次に、EMFでの3Tの繰り返し信号(0.72
MHz,デューティ50%)を記録パワー6.5mW で
初期化せずに記録した場合、ディスクAでは再生信号変
調度38%,測定帯域10kHzで搬送波対雑音比56
dBの再生信号出力が得られ、ディスクBでは再生信号
変調度13%,測定帯域10kHzで搬送波対雑音比4
6dBの再生信号出力が得られた。
[Equation 1] Mod (%) = | Ro-Rw | / Ro * 100 ... Equation 1 In the disk A, the reproduction signal modulation degree is 78% and the measurement band is 10 k.
A reproduction signal output with a carrier-to-noise ratio of 61 dB can be obtained at Hz, and a reproduction signal modulation degree of 27% for the disk B and a measurement band of 1
A reproduced signal output with a carrier-to-noise ratio of 51 dB was obtained at 0 kHz. Next, a 3T repetitive signal (0.72
When the disk A is recorded at a recording power of 6.5 mW without being initialized, the reproduction signal modulation degree is 38%, the carrier band to noise ratio is 56 at a measurement band of 10 kHz.
The reproduced signal output of dB is obtained, and the reproduced signal modulation degree is 13% in the disk B and the carrier-to-noise ratio is 4 in the measurement band of 10 kHz.
A reproduction signal output of 6 dB was obtained.

【0050】ディスクA及びBをディスク線速度8m/
s(回転数1800rpm,半径位置43mm)で、再生
光レベルを(ディスク面上)1.0mW として、レーザパ
ワーを再生光レベルと結晶化による記録パワーレベル、
(ディスク面上)17.0mWとの間で図3と同じように
して変化させることにより情報の記録を行い、記録部で
の反射光の強弱を検出して情報を再生した。2MHz,
デューティ50%の信号を記録した場合、ディスクAで
は再生信号変調度78%,測定帯域30kHzで搬送波
対雑音比62dBの再生信号出力が得られ、ディスクB
では再生信号変調度27%,測定帯域30kHzで搬送
波対雑音比52dBの再生信号出力が得られた。次に、
4.5MHz,デューティ50%の信号を記録パワー1
7.5mWで記録した場合、ディスクAでは再生信号変
調度38%,測定帯域30kHzで搬送波対雑音比57
dBの再生信号出力が得られ、ディスクBでは再生信号
変調度13%,測定帯域30kHzで搬送波対雑音比4
7dBの再生信号出力が得られた。
Disks A and B were set at a disk linear velocity of 8 m /
At s (rotation speed 1800 rpm, radial position 43 mm), the reproduction light level is 1.0 mW (on the disk surface), the laser power is the reproduction light level and the recording power level by crystallization,
Information was recorded by changing it between 17.0 mW (on the disc surface) in the same manner as in FIG. 3, and the information was reproduced by detecting the intensity of reflected light at the recording portion. 2MHz,
When a signal with a duty of 50% is recorded, a reproduction signal output of a reproduction signal modulation degree of 78% and a carrier-to-noise ratio of 62 dB is obtained at a measurement band of 30 kHz in the disk A,
In the case of a reproduction signal modulation degree of 27% and a measurement band of 30 kHz, a reproduction signal output of a carrier-to-noise ratio of 52 dB was obtained. next,
Recording power 1 for a signal of 4.5 MHz and 50% duty
When recorded at 7.5 mW, the reproduction signal modulation degree is 38% in the disk A, and the carrier-to-noise ratio is 57 at the measurement band of 30 kHz.
A reproduction signal output of dB is obtained, and the reproduction signal modulation degree is 13% in the disk B and the carrier-to-noise ratio is 4 in the measurement band of 30 kHz.
A reproduction signal output of 7 dB was obtained.

【0051】この様に従来技術のディスクBでは未記録
部の反射率を67%と65%以上に高くすると、記録部
の反射率が49%と45%以上になり、あまり大きな再
生信号出力が得られないのに対し、本発明のディスクA
では記録部の反射率を80%と65%以上に高くして
も、記録部の反射率が18%と45%以上になり、十分
に大きな再生信号出力が得られた。
As described above, in the prior art disc B, when the reflectance of the unrecorded portion is increased to 67% and 65% or more, the reflectance of the recording portion becomes 49% and 45% or more, and a very large reproduction signal output is produced. Although not obtained, the disk A of the present invention
However, even if the reflectance of the recording portion was increased to 80% and 65% or more, the reflectance of the recording portion was 18% and 45% or more, and a sufficiently large reproduced signal output was obtained.

【0052】本発明の比較例(従来技術)であるディス
クBにおいて、他の層の膜厚を一定に保って(ZnS)
40(SiO2)60の組成の中間層11を20nmから32
00nmまで変化させた場合、初期化後の再未記録部で
の媒体反射率と上記のように2MHz,デューティ50
%の信号を記録した記録部での媒体反射率は図4に示す
ように変化した。未記録部での媒体反射率が65%以
上,記録部での媒体反射率が45%以下となるところは
存在しない。
In the disk B which is a comparative example (prior art) of the present invention, the film thickness of the other layers was kept constant (ZnS).
The intermediate layer 11 having a composition of 40 (SiO 2 ) 60 is formed from 20 nm to 32
When changed to 00 nm, the medium reflectivity in the re-unrecorded portion after the initialization and the above-mentioned 2 MHz, duty 50
The medium reflectance at the recording portion where the signal of% was recorded changed as shown in FIG. There is no place where the medium reflectance in the unrecorded area is 65% or more and the medium reflectance in the recorded area is 45% or less.

【0053】一方、本発明のディスクAにおいて、他の
層の膜厚を一定に保ってSn17Sb17Se66の組成の記
録層2の膜厚を10nmから160nmまで変化させた
場合、再未記録部での媒体反射率と上記のように2MH
z,デューティ50%の信号を記録した記録部での媒体
反射率は図5に示すように変化し、再生信号変調度は図
6に示すように変化した。記録層膜厚が23nm以上2
9nm以下,67nm以上149nm以下と広範囲な記
録層膜厚で、未記録部での媒体反射率が65%以上,記
録部での媒体反射率が45%以下となる。また特に、記
録層膜厚が114nm以上145nm以下のところでは
未記録部での媒体反射率が70%以上,記録部の媒体反
射率が28%以下で、再生信号変調度が60%以上とな
り、CD−WO規格を満足できた。
On the other hand, in the disk A of the present invention, when the film thickness of the recording layer 2 having the composition of Sn 17 Sb 17 Se 66 was changed from 10 nm to 160 nm while keeping the film thickness of the other layers constant, it was not reproduced. The medium reflectance at the recording unit and 2MH as described above
The medium reflectivity in the recording portion which recorded a signal with z and a duty of 50% changed as shown in FIG. 5, and the reproduction signal modulation degree changed as shown in FIG. Recording layer thickness is 23 nm or more 2
With a wide range of recording layer thicknesses of 9 nm or less, 67 nm or more and 149 nm or less, the medium reflectance in the unrecorded portion is 65% or more and the medium reflectance in the recording portion is 45% or less. Particularly, when the recording layer thickness is 114 nm or more and 145 nm or less, the medium reflectance in the unrecorded portion is 70% or more, the medium reflectance in the recording portion is 28% or less, and the reproduction signal modulation degree is 60% or more. The CD-WO standard was satisfied.

【0054】また、ディスクAにおいて、他の層の膜厚
を一定に保ってSb80Bi20の組成の吸収層3の膜厚を
2nmから40nmまで変化させた場合、未記録部の媒
体反射率と情報記録部での媒体反射率は図7に示すよう
に変化し、再生信号変調度は図8に示すように変化し
た。吸収層膜厚が2nm以上29nm以下のところで、
未記録部での媒体反射率が65%以上,記録部での媒体
反射率が45%以下となった。また特に、吸収層膜厚が
2nm以上25.5nm 以下のところでは未記録部での
媒体反射率が70%以上,記録部での媒体反射率が28
%以下で、再生信号変調度が60%以上となり、CD−
WO規格を満足できた。但し、吸収層膜厚が2nm以上
8nm未満のところでは、吸収層での光吸収率が少ない
ため記録感度が低かった。
Further, in the disk A, when the film thickness of the absorption layer 3 having the composition of Sb 80 Bi 20 was changed from 2 nm to 40 nm while keeping the film thickness of the other layers constant, the medium reflectance of the unrecorded part The medium reflectance at the information recording portion changed as shown in FIG. 7, and the reproduction signal modulation degree changed as shown in FIG. Where the absorption layer thickness is 2 nm or more and 29 nm or less,
The medium reflectance in the unrecorded area was 65% or more, and the medium reflectance in the recorded area was 45% or less. Particularly, when the film thickness of the absorption layer is 2 nm or more and 25.5 nm or less, the medium reflectance in the unrecorded portion is 70% or more, and the medium reflectance in the recorded portion is 28% or more.
%, The reproduction signal modulation degree becomes 60% or more, and CD-
The WO standard was satisfied. However, when the film thickness of the absorption layer was 2 nm or more and less than 8 nm, the recording sensitivity was low because the light absorption rate in the absorption layer was small.

【0055】ディスクA中のSn17Sb17Se66の組成
の記録層2,Sb80Bi20の組成の吸収層3,(Zn
S)80(SiO2)20の組成の中間層4およびAu反射層5
はそれぞれ、耐酸化性が大変優れており、各層を単独で
ガラス上に形成したテストピースを60℃相対湿度95
%の条件下に三千時間放置してもレーザ光に対する媒体
反射率または透過率の変化は無く、ほとんど酸化されな
かった。また、予め線速度8m/sで2MHz,デュー
ティ50%の信号を記録したディスクAを60℃相対湿
度95%の条件下に三千時間放置しても再生信号出力は
再生信号変調度78%,搬送波対雑音比62dBのまま
変化が見られなかった。
In the disk A, a recording layer 2 having a composition of Sn 17 Sb 17 Se 66 2, an absorbing layer 3 having a composition of Sb 80 Bi 20 3, (Zn
S) 80 (SiO 2 ) 20 composition intermediate layer 4 and Au reflective layer 5
Have excellent oxidation resistance, and each test piece with each layer alone formed on glass was tested at 60 ° C and 95% relative humidity.
%, There was no change in the medium reflectance or transmittance with respect to the laser beam even after being left for 3,000 hours, and it was hardly oxidized. Further, even if the disk A on which a signal having a linear velocity of 8 m / s and a frequency of 2 MHz and a duty of 50% is recorded is left to stand for 3000 hours under the condition of 60 ° C. and 95% relative humidity, the reproduction signal output is 78%. No change was observed at the carrier-to-noise ratio of 62 dB.

【0056】ディスクAにおける記録層2の組成である
Sn17Sb17Se66薄膜のレーザ光波長780nmでの
光学定数(複素屈折率)を測定したところ、複素屈折率
の実数部である屈折率(n)は3.19 、複素屈折率の
虚数部である消衰係数(k)は0.01 であった。この
Sn−Sb−Se系記録層2において、他の元素の相対
的比率を一定に保ってTeを添加し、このTe含有量を
変化させた場合、記録層2のレーザ光波長780nmで
の消衰係数、及びディスクAにおける記録層2の膜厚を
120nm,吸収層3の膜厚を10nmとした時の基板
側からの媒体反射率は次のように変化した。
The optical constant (complex refractive index) of the Sn 17 Sb 17 Se 66 thin film, which is the composition of the recording layer 2 in the disk A, at the laser light wavelength of 780 nm was measured, and the refractive index (the real part of the complex refractive index) n) was 3.19, and the extinction coefficient (k), which is the imaginary part of the complex refractive index, was 0.01. In the Sn-Sb-Se recording layer 2, when Te is added while keeping the relative ratio of other elements constant and the Te content is changed, the recording layer 2 is erased at a laser light wavelength of 780 nm. The extinction coefficient and the medium reflectance from the substrate side when the film thickness of the recording layer 2 in the disk A is 120 nm and the film thickness of the absorbing layer 3 is 10 nm change as follows.

【0057】 Te含有量(at%) 消衰係数 媒体反射率(%) 0 0.01 92 2 0.05 85 4 0.1 78 6 0.15 71 8 0.2 65 10 0.25 60 12 0.3 55 14 0.35 51 ディスクAにおいて、記録層2の組成としてSn17Sb
17Se66の代わりに他の組成比のSn−Sb−Se系を
用いても同様な結果が得られた。但し、Seの含有量が
55原子%未満の場合は再生信号変調度が10%以上低
下し、40原子%未満の場合は再生信号変調度が20%
以上低下した。
Te content (at%) Extinction coefficient Medium reflectance (%) 0 0.01 92 2 0.05 5 85 4 0.1 78 6 0.15 71 7 8 0.2 65 65 10 0.25 60 12 0.3 55 14 0.35 51 In the disk A, the composition of the recording layer 2 was Sn 17 Sb.
Similar results were obtained by using Sn—Sb—Se system having other composition ratio instead of 17 Se 66 . However, when the content of Se is less than 55 atom%, the reproduction signal modulation degree is reduced by 10% or more, and when it is less than 40 atom%, the reproduction signal modulation degree is 20%.
It decreased more than that.

【0058】ディスクAにおいて、記録層2の組成とし
てSn−Sb−Se系の代わりにSn−Sb−Se系の
うちのSnに代えて、他のSi,Ge,Pbのうちの少
なくとも一元素とSbとSeとからなる系を用いても同
様な結果が得られた。また、Sn−Sb−Se系の代わ
りにSn−Sb−Se系のうちのSnとSbに代えて、
他のSn,Sb,Si,Ge,Pb,In,Ga,Bi
のうちの少なくとも一元素とSeとからなる系を用いて
も同様な結果が得られた。但し、Sbのない組成の記録
層では耐酸化性が劣る場合がある。
In the disk A, as the composition of the recording layer 2, in place of Sn—Sb—Se system, instead of Sn of Sn—Sb—Se system, at least one element of other Si, Ge and Pb was used. Similar results were obtained using a system consisting of Sb and Se. Further, instead of Sn-Sb-Se system, instead of Sn and Sb of Sn-Sb-Se system,
Other Sn, Sb, Si, Ge, Pb, In, Ga, Bi
Similar results were obtained using a system consisting of Se and at least one of the elements. However, the recording layer having a composition containing no Sb may have poor oxidation resistance.

【0059】ディスクAにおける吸収層3の組成である
Sb80Bi20薄膜のレーザ光波長780nmでの光学定
数(複素屈折率)を測定したところ、複素屈折率の実数
部である屈折率(n)は3.67 ,複素屈折率の虚数部
である消衰係数(k)は5.23 であった。このSb80
Bi20吸収層3において、他の元素の相対的比率を一定
に保ってさらにSeを添加し、この新たに添加したSe
含有量を変化させた場合、吸収層3のレーザ光波長78
0nmでの消衰係数、及びディスク線速度1.2m/s
で0.17MHz,デューティ50%の信号を記録した
時の記録パワーは次のように変化した。
The optical constant (complex refractive index) of the Sb 80 Bi 20 thin film, which is the composition of the absorption layer 3 in the disk A, at a laser light wavelength of 780 nm was measured, and the refractive index (n) which is the real part of the complex refractive index was measured. Was 3.67, and the extinction coefficient (k), which is the imaginary part of the complex refractive index, was 5.23. This Sb 80
In the Bi 20 absorption layer 3, Se is further added while keeping the relative ratio of other elements constant, and the newly added Se is added.
When the content is changed, the laser light wavelength of the absorption layer 3 is 78
Extinction coefficient at 0 nm and disk linear velocity of 1.2 m / s
The recording power when recording a signal of 0.17 MHz at a duty of 50% changed as follows.

【0060】 Se含有量(at%) 消衰係数 記録パワー(mW) 0 5.23 6.5 5 5 7.0 10 4.5 7.5 15 4 8.0 20 3.5 9.0 25 3 11.0 30 2.5 14.0 35 2 18.0 40 1.5 記録できず ディスクAにおける吸収層3として、Sb−Bi系の代
わりに、同じく、熱伝導率が0.3mW/cm・deg 以
下の熱伝導率を有するSb合金系,Te合金系,Bi合
金系,Sb−Te合金系,Sb−Bi合金系,マンガニ
ン,コンスタンタン,ステンレススチール,ニクロー
ム,インコネル,モネル等を少なくとも一つ含む合金を
用いても、ディスクAと同様の記録・再生特性が得られ
た。
Se content (at%) Extinction coefficient Recording power (mW) 0 5.23 6.5 5 5 5 7.0 7.0 10 4.5 7.5 15 4 4 8.0 20 20 3.5 9.0 25 3 11.0 30 2.5 14.0 35 2 18.0 40 1.5 Not recordable, as the absorption layer 3 in the disk A, instead of the Sb-Bi system, the same thermal conductivity was 0.3 mW / cm. At least one of Sb alloy system, Te alloy system, Bi alloy system, Sb-Te alloy system, Sb-Bi alloy system, manganin, Constantan, stainless steel, Nichrome, Inconel, Monel, etc. having a thermal conductivity of deg or less The same recording / reproducing characteristics as those of the disk A were obtained by using the alloy containing the same.

【0061】ディスクAにおける中間層4の組成である
(ZnS)80(SiO2)20のレーザ光波長780nmでの
光学定数(複素屈折率)を測定したところ、複素屈折率
の実数部である屈折率(n)は2.17,複素屈折率の
虚数部である消衰係数(k)は0.00 であった。この
(ZnS)80(SiO2)20中間層4において、他の元素の
相対的比率を一定に保ってさらにSiを添加し、この新
たに添加したSi含有量を変化させた場合、中間層4の
レーザ光波長780nmでの消衰係数、及びディスクA
における記録層2の膜厚を110nm,吸収層3の膜厚
を25nmとした時の基板側からの媒体反射率は次のよ
うに変化した。
The optical constant (complex refractive index) of (ZnS) 80 (SiO 2 ) 20 , which is the composition of the intermediate layer 4 in the disk A, was measured at a laser light wavelength of 780 nm. The index (n) was 2.17, and the extinction coefficient (k), which is the imaginary part of the complex refractive index, was 0.00. In this (ZnS) 80 (SiO 2 ) 20 intermediate layer 4, when Si is further added while keeping the relative ratio of other elements constant and the content of the newly added Si is changed, the intermediate layer 4 Extinction coefficient at a laser light wavelength of 780 nm and disk A
When the film thickness of the recording layer 2 was 110 nm and the film thickness of the absorbing layer 3 was 25 nm, the medium reflectance from the substrate side changed as follows.

【0062】 Si含有量(at%) 消衰係数 媒体反射率(%) 0 0.00 78 2.5 0.05 73 5 0.1 70 7.5 0.15 67 10 0.2 65 12.5 0.25 64 15 0.3 63 17.5 0.35 62 ディスクAにおける中間層4として、(ZnS)−(Si
2)の代わりに、同じく、レーザ光を多重干渉させるZ
nS,SiO2,SiO,CeO2,Al23,Ta
25,Y23,ZrO2、V25,TaN,Si34
AlN 等およびこれらの混合物を用いても、それぞれ
の光学定数に合せて、膜厚を制御することにより、ディ
スクAと同様の記録・再生特性が得られた。
Si content (at%) Extinction coefficient Medium reflectivity (%) 0 0.00 78 2.5 0.05 0.05 73 5 0.1 70 70 7.5 0.15 67 15 0.2 65 65 12. 5 0.25 64 15 0.3 0.3 63 17.5 0.356 As the intermediate layer 4 in the disk A, (ZnS)-(Si
Instead of O 2 ), Z which also causes multiple interference of laser beams
nS, SiO 2 , SiO, CeO 2 , Al 2 O 3 , Ta
2 O 5 , Y 2 O 3 , ZrO 2 , V 2 O 5 , TaN, Si 3 N 4 ,
Even if AlN 3 or the like and a mixture thereof were used, the recording / reproducing characteristics similar to those of the disk A were obtained by controlling the film thickness according to each optical constant.

【0063】ディスクAにおける反射層5として、Al
−Au系の代わりに、同じく、反射率が80%以上の高
反射率であるAl,Au,Ag,Cu等及びこれらを含
むAl合金,Au合金,Ag合金,Cu合金等を用いて
も、ディスクAと同様の記録・再生特性が得られた。
As the reflective layer 5 in the disk A, Al
Similarly, instead of the Au system, Al, Au, Ag, Cu or the like having a high reflectance of 80% or more and an Al alloy, an Au alloy, an Ag alloy, a Cu alloy or the like containing these are used. Recording / reproducing characteristics similar to those of the disk A were obtained.

【0064】<実施例2>本実施例のディスクCの断面
構造図を図9に示す。
<Embodiment 2> FIG. 9 shows a sectional structural view of a disk C of the present embodiment.

【0065】直径300mm,厚さ1.2mm のディスク状
ポリオレフィン板の表面に射出成形法によってトラッキ
ング用1.5μm ピッチのスパイラル状溝を形成し、一
周を49セクタに分割し、各セクタの始まりで、溝と溝
の中間の山の部分に凹凸ピットの形でトラックアドレス
やセクタアドレスなどを入れた(この部分をヘッダ部と
呼ぶ)レプリカ基板15上に、高周波マグネトロンスパ
ッタリング装置を用いて、まず(ZnS)40(SiO2)60
の組成の保護層16を100nmの膜厚に形成した。続
いて原子%でIn49Se49Tl2 の組成の記録層17を
70nmの膜厚に形成した。続いて同一スパッタリング
装置内で原子%でSb40Te60の組成の吸収層18を2
0nmの膜厚に形成した。続いて同一スパッタリング装
置内で原子%で(ZnS)40(SiO2)60の組成の中間層
19を160nmの膜厚に形成した。続いて同一スパッ
タリング装置内で原子%でAl70Au30反射層20を6
0nmの膜厚に形成した。さらに、この反射層20の上
に回転塗布した紫外線硬化樹脂を硬化させて50μmの
厚さの有機物層21を形成した。
Spiral grooves with a pitch of 1.5 μm for tracking are formed on the surface of a disk-shaped polyolefin plate having a diameter of 300 mm and a thickness of 1.2 mm by injection molding, and one circumference is divided into 49 sectors. At the start of each sector. First, using a high-frequency magnetron sputtering apparatus, first, on a replica substrate 15 in which a track address, a sector address, etc. are provided in the form of concave and convex pits in the groove portion between the grooves and in the middle of the groove (this portion is called a header portion), ZnS) 40 (SiO 2 ) 60
The protective layer 16 having the above composition was formed to a film thickness of 100 nm. Subsequently, the recording layer 17 having a composition of In 49 Se 49 Tl 2 in atomic% was formed to a film thickness of 70 nm. Then, the absorption layer 18 having a composition of Sb 40 Te 60 in atomic% is formed in the same sputtering device.
It was formed to a film thickness of 0 nm. Then, an intermediate layer 19 having a composition of (ZnS) 40 (SiO 2 ) 60 in atomic% was formed in the same sputtering apparatus to have a film thickness of 160 nm. Then, the Al 70 Au 30 reflective layer 20 was formed in an atomic percentage of 6 in the same sputtering apparatus.
It was formed to a film thickness of 0 nm. Further, the ultraviolet curable resin spin-coated on the reflective layer 20 was cured to form an organic material layer 21 having a thickness of 50 μm.

【0066】同様にしてもう1枚の同様な基板15′上
に(ZnS)40(SiO2)60の組成の保護層16′,In
49Se49Tl2 の組成の記録層17′,Sb40Te60
組成の吸収層18′,(ZnS)40(SiO2)60の組成の
中間層19′,Al70Au30反射層20′,有機物層2
1′を順次形成した。このようにして作製した2枚のデ
ィスクを有機物層21及び21′側を内側にして接着剤
層22によって貼り合わせを行い、ディスクCを作製し
た。
Similarly, a protective layer 16 ', In having a composition of (ZnS) 40 (SiO 2 ) 60 is formed on another similar substrate 15'.
A recording layer 17 'having a composition of 49 Se 49 Tl 2 , an absorbing layer 18' having a composition of Sb 40 Te 60 , an intermediate layer 19 'having a composition of (ZnS) 40 (SiO 2 ) 60 , an Al 70 Au 30 reflective layer 20'. , Organic layer 2
1'was formed sequentially. The two disks thus produced were bonded together with the adhesive layers 22 with the organic material layers 21 and 21 'side facing inward to produce a disk C.

【0067】このように作製したディスクCを可逆型と
して用い、記録・消去・再生評価を、光ディスクドライ
ブ(記録・消去・再生装置)により下記の様にして行っ
た。ディスクを一定回転数で回転させ、任意の半径位置
に波長780nmの半導体レーザからの連続光を記録が
行われない低パワーレベルに保って、光ヘッド中の開口
数(Numerical Aperture)0.55の対物レンズで集光し
て基板1を通して記録層2に照射し、反射光を検出する
ことによって、トラッキング用の溝と溝の中間に光スポ
ットの中心が常に一致するようにヘッドを駆動した。溝
と溝の中間を記録トラックとすることによって溝から発
生するノイズの影響を避けることができる。この様にト
ラッキングを行いながら、さらに記録層上に焦点が来る
ように自動焦点合わせをして1ビームによるオーバライ
トで記録と消去を同時に行う。
Using the disk C thus produced as a reversible type, recording / erasing / reproducing evaluation was performed by the optical disk drive (recording / erasing / reproducing apparatus) as follows. The disk is rotated at a constant rotation speed, and continuous light from a semiconductor laser with a wavelength of 780 nm is maintained at an arbitrary radial position at a low power level where recording is not performed, and the numerical aperture (Numerical Aperture) of the optical head is set to 0.55. The head was driven so that the center of the light spot was always aligned with the tracking groove and the middle of the groove by detecting the reflected light by converging with the objective lens and irradiating the recording layer 2 through the substrate 1. The influence of noise generated from the groove can be avoided by setting the recording track in the middle of the groove. While tracking is performed in this manner, automatic focusing is performed so that the focus is on the recording layer, and recording and erasing are simultaneously performed by overwriting with one beam.

【0068】トラック(トラッキング用の溝と溝の中
間)上に結晶化により記録を行う場合、結晶化するのに
適当なレーザパワーの範囲は、結晶化が起こる程度に高
く、非晶質化が起こるより低い範囲である。また、非晶
質化により消去を行う場合、非晶質化するのに適当なレ
ーザパワーの範囲は、結晶化するパワーより高く、強い
変形を生じたり穴があくよりも低い範囲である。1ビー
ムによるオーバライトはレーザパワーを結晶化を起こす
中間パワーレベルと非晶質化を起こす高パワーレベルと
の間で変化させることにより行った。非晶質化の高パワ
ーレベルと結晶化の中間パワーレベルとの間のパワー比
は1:0.4〜1:0.8の範囲が特に好ましい。
When recording is performed by crystallization on a track (tracking groove and groove middle), the range of laser power suitable for crystallization is high enough to cause crystallization, and amorphization occurs. It's the lower range that happens. In the case of erasing by amorphization, the range of laser power suitable for amorphization is higher than the power for crystallization and lower than the range where strong deformation occurs or holes are formed. Overwriting with one beam was performed by changing the laser power between an intermediate power level causing crystallization and a high power level causing amorphization. The power ratio between the high power level for amorphization and the intermediate power level for crystallization is particularly preferably in the range of 1: 0.4 to 1: 0.8.

【0069】記録を行う部分を通り過ぎれば、レーザパ
ワーを何も変化を起こさない再生光レベルに下げてトラ
ッキング及び自動焦点合わせを続けた。なお、記録中も
トラッキング及び自動焦点合わせは継続される。これに
より、既に記録されている部分に対して行っても記録さ
れていた情報が新たに記録した情報に書き換えられる。
しかし、記録書き換え時の最初の1回転または複数回転
で、レーザパワー変調の高い方のパワーに近いパワーの
連続光を照射して一旦消去した後、次の1回転で情報信
号に従って高パワーレベルと中間パワーレベルとの間で
変調したレーザ光を照射して記録すれば、前に書かれて
いた情報の消え残りが少なく、高い搬送波対雑音比が得
られる。この場合に最初に照射する連続光のパワーは、
高いパワーレベルを1としたとき0.8〜1.1の範囲で
良好な書き換えが行えた。
After passing the portion to be recorded, the laser power was lowered to the reproduction light level which did not cause any change, and the tracking and the automatic focusing were continued. Note that tracking and automatic focusing are continued during recording. As a result, the recorded information is rewritten to the newly recorded information even if the already recorded portion is performed.
However, after erasing by irradiating continuous light with a power close to the higher power of the laser power modulation at the first rotation or multiple rotations at the time of recording / rewriting and then once erasing, a high power level is set according to the information signal according to the information signal. By irradiating and recording with laser light modulated to an intermediate power level, there is little unerased information previously written, and a high carrier-to-noise ratio can be obtained. In this case, the power of the continuous light that is emitted first is
When the high power level was set to 1, good rewriting could be performed in the range of 0.8 to 1.1.

【0070】ディスクCの線速度を1.2m/s(回転数
270rpm,半径位置43mm)で、再生光レベルを
1.0mW として、レーザパワーを結晶化による中間パ
ワーレベル(ディスク面上)と非晶質化による高パワー
レベル(ディスク面上)との間で図10と同じようにし
て変化させることにより情報の記録を行った。こうして
記録したトラック上で、トラッキングと自動焦点合わせ
を行いながら、記録及び消去が行われない再生光レベル
のディスク面1.0mW の連続光を照射し、この反射光
の強弱を検出して情報を再生した。ここでは、EMFで
の11Tの繰り返し信号(0.17MHz,デューティ
50%)と6Tの繰り返し信号(0.36MHz,デュ
ーティ50%)を高パワーレベル10mW,中間パワー
レベル6mWの記録用レーザ光で交互にオーバライトし
た。まず、EMFでの11Tの繰り返し信号(0.17M
Hz,デューティ50%)を初期化せずに記録したとこ
ろ、記録用レーザ光照射部の反射率は74%から21%
へ変化し、再生信号変調度71%,測定帯域10kHz
で搬送波対雑音比60dBの再生信号出力が得られた。
この上に、EMFでの6Tの繰り返し信号(0.36MH
z,デューティ50%)をオーバライトした場合、再生
信号変調度64%,測定帯域10kHzで搬送波対雑音
比58dB,前信号(11Tの繰り返し信号)の消去比
28dBの再生信号出力が得られた。また、この時の書
き換え可能回数は一万回以上であった。
At a linear velocity of the disk C of 1.2 m / s (rotation speed of 270 rpm, radial position of 43 mm), a reproducing light level of 1.0 mW, and a laser power of an intermediate power level (on the disk surface) due to crystallization and a non-power level. Information was recorded by changing between a high power level (on the disk surface) due to crystallization in the same manner as in FIG. On the track recorded in this way, while performing tracking and automatic focusing, continuous light of 1.0 mW of the disk surface at the reproduction light level where recording and erasing is not performed is irradiated, and the intensity of this reflected light is detected to obtain information. Replayed. Here, an 11T repetitive signal (0.17 MHz, duty 50%) and a 6T repetitive signal (0.36 MHz, duty 50%) in EMF are alternately used with a recording laser beam having a high power level of 10 mW and an intermediate power level of 6 mW. Was overwritten. First, 11T repetitive signal (0.17M in EMF)
Recording was performed without initializing (Hz, duty 50%), and the reflectance of the recording laser light irradiation portion was 74% to 21%.
Changes to, playback signal modulation degree 71%, measurement band 10 kHz
Thus, a reproduction signal output having a carrier-to-noise ratio of 60 dB was obtained.
On top of this, repeat signal of 6T in EMF (0.36MH
(z, duty 50%), a reproduction signal output was obtained with a reproduction signal modulation factor of 64%, a carrier-to-noise ratio of 58 dB, and a previous signal (repeated signal of 11T) erasing ratio of 28 dB in a measurement band of 10 kHz. Further, the rewritable number at this time was 10,000 times or more.

【0071】ディスクCにおいて、記録層の組成をIn
47Se47Tl6 としたディスクDについて、ディスク線
速度8m/s(回転数1800rpm,半径位置43m
m)で、再生光レベルを1.0mW として、2MHz,
デューティ50%の信号と3MHz,デューティ50%
の信号とを、レーザパワーを高パワーレベル(ディスク
面上)25mW,中間パワーレベル(ディスク面上)1
5mWの間で変調し、図10に示したように変化させる
ことにより交互にオーバライトした。まず、2MHz,
デューティ50%の信号を初期結晶化せずに記録したと
ころ、記録用レーザ光照射部の反射率は72%から22
%へ変化し、再生信号変調度69%,測定帯域30kH
zで搬送波対雑音比59dBの再生信号出力が得られ
た。この上に、3MHz,デューティ50%の信号をオ
ーバライトした場合、再生信号変調度62%,測定帯域
30kHzで搬送波対雑音比57dB,前信号(11T
の繰り返し信号)の消去比27dBの再生信号出力が得
られた。また、この時の書き換え可能回数は十万回以上
であった。
In the disc C, the composition of the recording layer is In
For disk D with 47 Se 47 Tl 6 , disk linear velocity 8 m / s (rotation speed 1800 rpm, radial position 43 m
m), the reproduction light level is 1.0 mW, 2 MHz,
50% duty signal and 3MHz, 50% duty
Signal, laser power is high power level (on disk surface) 25 mW, intermediate power level (on disk surface) 1
Modulation was performed between 5 mW, and the data was alternately overwritten by changing as shown in FIG. First, 2MHz,
When a signal with a duty of 50% was recorded without initial crystallization, the reflectance of the recording laser light irradiation portion was 72% to 22%.
%, Reproduced signal modulation degree 69%, measurement band 30 kHz
A reproduced signal output having a carrier-to-noise ratio of 59 dB was obtained at z. When a signal of 3 MHz and a duty of 50% is overwritten on this, the reproduction signal modulation degree is 62%, the carrier-to-noise ratio is 57 dB at the measurement band of 30 kHz, and the previous signal (11T
A reproduction signal output with an erasing ratio of 27 dB was obtained. The rewritable number at this time was 100,000 or more.

【0072】ディスクC及びDはそれぞれ、耐酸化性が
大変優れており、60℃相対湿度95%の条件下に三千
時間放置してもレーザ光に対する媒体反射率または透過
率の変化は無かった。また、予め線速度8m/sで2M
Hz,デューティ50%の信号を記録したディスクC及
びDを60℃相対湿度95%の条件下に三千時間放置し
ても再生信号出力には再生信号変調度及び搬送波対雑音
比ともに変化は見られなかった。
Each of the disks C and D had very excellent oxidation resistance, and there was no change in the medium reflectance or transmittance with respect to the laser beam even if the disks C and D were left under the condition of 60 ° C. and 95% relative humidity for 3000 hours. . Also, 2M at a linear velocity of 8m / s in advance.
Even if the disks C and D on which a signal of Hz and a duty of 50% is recorded are left under the condition of 60 ° C. and a relative humidity of 95% for 3,000 hours, the reproduced signal output shows no change in the reproduced signal modulation degree and the carrier-to-noise ratio. I couldn't do it.

【0073】ディスクC及びDにおいて、保護層9に用
いた(ZnS)−(SiO2)系の代わりに、同じく、レー
ザ光に対する複素屈折率の虚数部である消衰係数が0.
2 以下であるZnS,SiO2,SiO,CeO2,A
23,Ta25,Y23,ZrO2,V25,Ta
N,Si34,AlN 等およびこれらの混合物を用い
ても、それぞれの光学定数に合せて、膜厚を制御するこ
とにより、ディスクC及びDと同様の記録・消去特性が
得られた。
In the disks C and D, instead of the (ZnS)-(SiO 2 ) system used for the protective layer 9, the extinction coefficient, which is the imaginary part of the complex refractive index with respect to the laser light, is 0.
2 or less ZnS, SiO 2 , SiO, CeO 2 , A
l 2 O 3 , Ta 2 O 5 , Y 2 O 3 , ZrO 2 , V 2 O 5 , Ta
Even when N, Si 3 N 4 , AlN or the like and a mixture thereof were used, the recording / erasing characteristics similar to those of the disks C and D were obtained by controlling the film thickness in accordance with the respective optical constants.

【0074】保護層9を2層以上の積層膜とすると保護
強度を上げるのにさらに有効である。例えば情報記録媒
体層から遠い側に厚さ200nmのSiO2 層,情報記
録媒体層に近い側に厚さ100nmの(ZnS)−(Si
2)層を配置した2層構造とすると、三十万回以上の書
き換えが可能であり、書き換え特性が良好であった。
If the protective layer 9 is a laminated film of two or more layers, it is more effective to increase the protective strength. For example, a SiO 2 layer having a thickness of 200 nm is provided on the side far from the information recording medium layer, and (ZnS)-(Si having a thickness of 100 nm is provided on the side closer to the information recording medium layer.
With the two-layer structure in which the O 2 ) layer is arranged, rewriting is possible over 300,000 times, and the rewriting characteristics were good.

【0075】本実施例の基板として、射出成型法により
作製したポリカーボネート基板及びポリオレフィン基板
の他に化学強化ガラス板,ポリカーボネート板,ポリオ
レフィン板,エポキシ板およびアクリル樹脂板等の表面
にフォトポリメリゼイション法によりトラッキング用の
溝を有する紫外線硬化樹脂層を形成したレプリカを用い
ても同様な記録・消去・再生特性の結果が得られた。
As the substrate of this embodiment, in addition to the polycarbonate substrate and the polyolefin substrate manufactured by the injection molding method, the surface of the chemically strengthened glass plate, the polycarbonate plate, the polyolefin plate, the epoxy plate, the acrylic resin plate, etc. is subjected to the photopolymerization method. As a result, similar results of recording / erasing / reproducing characteristics were obtained even when a replica formed with an ultraviolet curable resin layer having a groove for tracking was used.

【0076】[0076]

【発明の効果】本発明によれば、無機物からなる記録層
材料の原子配列変化により記録を行うタイプの情報記録
媒体において、レーザ光に対する未記録部の反射率が6
5%以上と高くても記録・消去・再生特性が良好で、記
録データの保持寿命が長く、耐環境性に優れた情報記録
用媒体を得ることができる。また、本発明の情報記録用
媒体に記録した情報は、既に広く普及している再生専用
型のコンパクトディスク,レーザディスク等の再生装置
で読み出すことが可能である。
According to the present invention, in the information recording medium of the type in which recording is performed by changing the atomic arrangement of the recording layer material made of an inorganic material, the reflectance of the unrecorded portion with respect to the laser beam is 6
Even if it is as high as 5% or more, it is possible to obtain an information recording medium having good recording / erasing / reproducing characteristics, a long holding life of recorded data, and excellent environmental resistance. Further, the information recorded on the information recording medium of the present invention can be read by a reproducing apparatus such as a read-only compact disc or a laser disc which is already widely used.

【図面の簡単な説明】[Brief description of drawings]

【図1】実施例におけるディスクAの情報記録用媒体の
構造を示す断面図。
FIG. 1 is a sectional view showing the structure of an information recording medium of a disc A in an example.

【図2】実施例におけるディスクBの情報記録用媒体の
構造を示す断面図。
FIG. 2 is a cross-sectional view showing the structure of the information recording medium of the disc B in the example.

【図3】実施例における追記型用記録レーザの波形図。FIG. 3 is a waveform diagram of a write-once recording laser according to an example.

【図4】実施例のディスクBにおける媒体反射率の中間
層膜厚依存性を示す特性図。
FIG. 4 is a characteristic diagram showing the dependency of medium reflectance on the thickness of the intermediate layer in the disk B of the example.

【図5】実施例のディスクAにおける媒体反射率の記録
層膜厚依存性を示す特性図。
FIG. 5 is a characteristic diagram showing the recording layer film thickness dependence of the medium reflectance in the disk A of the example.

【図6】実施例のディスクAにおける再生信号変調度の
記録層膜厚依存性を示す特性図。
FIG. 6 is a characteristic diagram showing the dependence of the degree of modulation of the reproduced signal on the recording layer thickness in the disk A of the example.

【図7】実施例のディスクAにおける媒体反射率の吸収
層膜厚依存性を示す特性図。
FIG. 7 is a characteristic diagram showing the dependence of the medium reflectance on the absorption layer film thickness of the disk A of the example.

【図8】実施例のディスクAにおける再生信号変調度の
吸収層膜厚依存性を示す特性図。
FIG. 8 is a characteristic diagram showing the dependency of the reproduction signal modulation degree on the absorption layer film thickness in the disc A of the example.

【図9】実施例におけるディスクC及びDの情報記録用
媒体の構造を示す断面図。
FIG. 9 is a sectional view showing the structure of an information recording medium of disks C and D in the example.

【図10】実施例における可逆型,オーバライト用記録
レーザの波形図。
FIG. 10 is a waveform diagram of a reversible recording laser for overwriting according to an example.

【符号の説明】[Explanation of symbols]

1,1′…基板、2,2′…記録層、3,3′…吸収
層、4,4′…中間層、5,5′…反射層、6,6′…
有機物層、7…接着剤層。
1, 1 '... substrate, 2, 2' ... recording layer, 3, 3 '... absorption layer, 4, 4' ... intermediate layer, 5, 5 '... reflective layer, 6, 6' ...
Organic substance layer, 7 ... Adhesive layer.

フロントページの続き (72)発明者 堀籠 信吉 東京都国分寺市東恋ケ窪1丁目280番地 株式会社日立製作所中央研究所内Continuation of the front page (72) Inventor Shinkichi Horigo 1-280, Higashi Koigokubo, Kokubunji, Tokyo

Claims (8)

【特許請求の範囲】[Claims] 【請求項1】基板上に直接もしくは無機物及び有機物の
うちの少なくとも一つからなる保護層を介して形成され
た、レーザ光の照射を受けて形状変化を伴わずに原子配
列変化が生じて光学定数が変化する無機物からなる記録
層,前記レーザ光を吸収する吸収層,前記レーザ光を反
射する反射層、及び前記吸収層と前記反射層との間に位
置する中間層とを含む情報記録用媒体において、基板側
からの前記レーザ光に対する媒体反射率が未記録部で6
5%以上であり、記録部で45%以下であることを特徴
とする情報記録用媒体。
1. An optical arrangement, which is formed directly on a substrate or through a protective layer made of at least one of an inorganic material and an organic material and is irradiated with laser light to cause a change in atomic arrangement without a shape change. For information recording including a recording layer made of an inorganic material whose constant changes, an absorption layer that absorbs the laser light, a reflection layer that reflects the laser light, and an intermediate layer located between the absorption layer and the reflection layer In the medium, the medium reflectance with respect to the laser beam from the substrate side is 6 at the unrecorded portion.
An information recording medium, which is 5% or more and 45% or less in a recording portion.
【請求項2】請求項1において、積層順序が、前記基板
に近い側から順に前記記録層,前記吸収層,前記中間
層,前記反射層となる情報記録用媒体。
2. The information recording medium according to claim 1, wherein the stacking order is the recording layer, the absorbing layer, the intermediate layer, and the reflecting layer in order from the side closer to the substrate.
【請求項3】請求項1または2において、前記記録層,
前記吸収層,前記中間層、及び前記反射層がそれぞれ隣
接している情報記録用媒体。
3. The recording layer according to claim 1,
An information recording medium in which the absorbing layer, the intermediate layer, and the reflecting layer are adjacent to each other.
【請求項4】請求項1,2,3または4において、前記
記録層の未記録状態でのレーザ光に対する複素屈折率の
虚数部である消衰係数が0.2 以下である情報記録用媒
体。
4. The information recording medium according to claim 1, 2, 3 or 4, wherein the extinction coefficient, which is an imaginary part of a complex refractive index of the recording layer in the unrecorded state, is 0.2 or less. .
【請求項5】請求項1,2または3において、前記吸収
層のレーザ光に対する複素屈折率の虚数部である消衰係
数が2.0 以上である情報記録用媒体。
5. The information recording medium according to claim 1, wherein the extinction coefficient, which is an imaginary part of a complex refractive index of the absorption layer with respect to a laser beam, is 2.0 or more.
【請求項6】請求項1,2または3において、前記中間
層のレーザ光に対する複素屈折率の虚数部である消衰係
数が0.2 以下である情報記録用媒体。
6. The information recording medium according to claim 1, wherein an extinction coefficient, which is an imaginary part of a complex refractive index of the intermediate layer with respect to a laser beam, is 0.2 or less.
【請求項7】請求項1,2または3において、前記反射
層のレーザ光に対する反射率が70%以上である情報記
録用媒体。
7. The information recording medium according to claim 1, wherein the reflectance of the reflection layer with respect to the laser light is 70% or more.
【請求項8】請求項1,2,3または4において、前記
記録層がSeまたはSのうち少なくとも一元素を含有す
る情報記録用媒体。
8. The information recording medium according to claim 1, 2, 3 or 4, wherein the recording layer contains at least one element of Se and S.
JP4193655A 1992-07-21 1992-07-21 Information recording medium Withdrawn JPH0636342A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4193655A JPH0636342A (en) 1992-07-21 1992-07-21 Information recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4193655A JPH0636342A (en) 1992-07-21 1992-07-21 Information recording medium

Publications (1)

Publication Number Publication Date
JPH0636342A true JPH0636342A (en) 1994-02-10

Family

ID=16311563

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4193655A Withdrawn JPH0636342A (en) 1992-07-21 1992-07-21 Information recording medium

Country Status (1)

Country Link
JP (1) JPH0636342A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1294580C (en) * 1998-06-18 2007-01-10 皇家菲利浦电子有限公司 Rewritable optical information medium

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1294580C (en) * 1998-06-18 2007-01-10 皇家菲利浦电子有限公司 Rewritable optical information medium

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