JPH06347932A - Silver halide photographic sensitive material - Google Patents
Silver halide photographic sensitive materialInfo
- Publication number
- JPH06347932A JPH06347932A JP13600193A JP13600193A JPH06347932A JP H06347932 A JPH06347932 A JP H06347932A JP 13600193 A JP13600193 A JP 13600193A JP 13600193 A JP13600193 A JP 13600193A JP H06347932 A JPH06347932 A JP H06347932A
- Authority
- JP
- Japan
- Prior art keywords
- group
- silver halide
- emulsion
- sensitive material
- gelatin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- -1 Silver halide Chemical class 0.000 title claims abstract description 58
- 229910052709 silver Inorganic materials 0.000 title claims abstract description 51
- 239000004332 silver Substances 0.000 title claims abstract description 51
- 239000000463 material Substances 0.000 title claims abstract description 32
- 239000000839 emulsion Substances 0.000 claims abstract description 49
- 108010010803 Gelatin Proteins 0.000 claims abstract description 40
- 229920000159 gelatin Polymers 0.000 claims abstract description 40
- 239000008273 gelatin Substances 0.000 claims abstract description 40
- 235000019322 gelatine Nutrition 0.000 claims abstract description 40
- 235000011852 gelatine desserts Nutrition 0.000 claims abstract description 40
- 125000003118 aryl group Chemical group 0.000 claims abstract description 29
- 238000011033 desalting Methods 0.000 claims abstract description 15
- 125000001931 aliphatic group Chemical group 0.000 claims abstract description 12
- 150000003839 salts Chemical class 0.000 claims abstract description 7
- 238000004519 manufacturing process Methods 0.000 claims abstract description 4
- 239000000126 substance Substances 0.000 claims description 31
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 17
- 125000000217 alkyl group Chemical group 0.000 claims description 16
- 125000001424 substituent group Chemical group 0.000 claims description 14
- 239000000084 colloidal system Substances 0.000 claims description 8
- 125000002252 acyl group Chemical group 0.000 claims description 6
- 125000004391 aryl sulfonyl group Chemical group 0.000 claims description 3
- 125000001453 quaternary ammonium group Chemical group 0.000 claims description 3
- 230000001112 coagulating effect Effects 0.000 claims description 2
- 230000001376 precipitating effect Effects 0.000 claims description 2
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 claims 2
- 238000000034 method Methods 0.000 abstract description 35
- 150000002429 hydrazines Chemical class 0.000 abstract description 10
- 230000035945 sensitivity Effects 0.000 abstract description 7
- 230000006866 deterioration Effects 0.000 abstract description 2
- 230000016615 flocculation Effects 0.000 abstract 2
- 238000005189 flocculation Methods 0.000 abstract 2
- 238000001556 precipitation Methods 0.000 abstract 2
- 239000010410 layer Substances 0.000 description 31
- 239000000203 mixture Substances 0.000 description 26
- 150000001875 compounds Chemical class 0.000 description 23
- 238000012545 processing Methods 0.000 description 22
- 239000000243 solution Substances 0.000 description 20
- 125000004432 carbon atom Chemical group C* 0.000 description 17
- 239000003795 chemical substances by application Substances 0.000 description 16
- 238000011161 development Methods 0.000 description 14
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 12
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 12
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 12
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 10
- 238000009472 formulation Methods 0.000 description 9
- 125000003277 amino group Chemical group 0.000 description 8
- 239000002245 particle Substances 0.000 description 8
- 239000004094 surface-active agent Substances 0.000 description 8
- 125000000623 heterocyclic group Chemical group 0.000 description 7
- 239000004848 polyfunctional curative Substances 0.000 description 7
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 6
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 6
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- 239000007864 aqueous solution Substances 0.000 description 6
- 125000003710 aryl alkyl group Chemical group 0.000 description 6
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 6
- 238000003756 stirring Methods 0.000 description 6
- 239000002253 acid Substances 0.000 description 5
- 125000003917 carbamoyl group Chemical class [H]N([H])C(*)=O 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 5
- 239000011241 protective layer Substances 0.000 description 5
- CDAWCLOXVUBKRW-UHFFFAOYSA-N 2-aminophenol Chemical class NC1=CC=CC=C1O CDAWCLOXVUBKRW-UHFFFAOYSA-N 0.000 description 4
- 206010070834 Sensitisation Diseases 0.000 description 4
- 229960000583 acetic acid Drugs 0.000 description 4
- 239000000654 additive Substances 0.000 description 4
- 125000003545 alkoxy group Chemical group 0.000 description 4
- 238000009792 diffusion process Methods 0.000 description 4
- 239000000975 dye Substances 0.000 description 4
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 4
- 230000006911 nucleation Effects 0.000 description 4
- 238000010899 nucleation Methods 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
- 230000008313 sensitization Effects 0.000 description 4
- JHJLBTNAGRQEKS-UHFFFAOYSA-M sodium bromide Chemical compound [Na+].[Br-] JHJLBTNAGRQEKS-UHFFFAOYSA-M 0.000 description 4
- 235000011121 sodium hydroxide Nutrition 0.000 description 4
- 125000003396 thiol group Chemical group [H]S* 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 229910021607 Silver chloride Inorganic materials 0.000 description 3
- SJOOOZPMQAWAOP-UHFFFAOYSA-N [Ag].BrCl Chemical compound [Ag].BrCl SJOOOZPMQAWAOP-UHFFFAOYSA-N 0.000 description 3
- 239000006096 absorbing agent Substances 0.000 description 3
- 125000003342 alkenyl group Chemical group 0.000 description 3
- 125000000304 alkynyl group Chemical group 0.000 description 3
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 3
- 239000004327 boric acid Substances 0.000 description 3
- 125000003178 carboxy group Chemical class [H]OC(*)=O 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 150000005205 dihydroxybenzenes Chemical class 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 125000005843 halogen group Chemical group 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 3
- 235000019341 magnesium sulphate Nutrition 0.000 description 3
- 239000006224 matting agent Substances 0.000 description 3
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 3
- 235000010265 sodium sulphite Nutrition 0.000 description 3
- 238000001179 sorption measurement Methods 0.000 description 3
- 125000000472 sulfonyl group Chemical class *S(*)(=O)=O 0.000 description 3
- 239000006228 supernatant Substances 0.000 description 3
- 229910052721 tungsten Inorganic materials 0.000 description 3
- GGZHVNZHFYCSEV-UHFFFAOYSA-N 1-Phenyl-5-mercaptotetrazole Chemical compound SC1=NN=NN1C1=CC=CC=C1 GGZHVNZHFYCSEV-UHFFFAOYSA-N 0.000 description 2
- JKFYKCYQEWQPTM-UHFFFAOYSA-N 2-azaniumyl-2-(4-fluorophenyl)acetate Chemical compound OC(=O)C(N)C1=CC=C(F)C=C1 JKFYKCYQEWQPTM-UHFFFAOYSA-N 0.000 description 2
- PLIKAWJENQZMHA-UHFFFAOYSA-N 4-aminophenol Chemical compound NC1=CC=C(O)C=C1 PLIKAWJENQZMHA-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical group C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- 229910021612 Silver iodide Inorganic materials 0.000 description 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical compound OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 description 2
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical group C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 2
- XCFIVNQHHFZRNR-UHFFFAOYSA-N [Ag].Cl[IH]Br Chemical compound [Ag].Cl[IH]Br XCFIVNQHHFZRNR-UHFFFAOYSA-N 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 125000004453 alkoxycarbonyl group Chemical class 0.000 description 2
- 125000002947 alkylene group Chemical group 0.000 description 2
- DIZPMCHEQGEION-UHFFFAOYSA-H aluminium sulfate (anhydrous) Chemical compound [Al+3].[Al+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O DIZPMCHEQGEION-UHFFFAOYSA-H 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- 125000004397 aminosulfonyl group Chemical class NS(=O)(=O)* 0.000 description 2
- XYXNTHIYBIDHGM-UHFFFAOYSA-N ammonium thiosulfate Chemical compound [NH4+].[NH4+].[O-]S([O-])(=O)=S XYXNTHIYBIDHGM-UHFFFAOYSA-N 0.000 description 2
- 150000001450 anions Chemical class 0.000 description 2
- 239000002518 antifoaming agent Substances 0.000 description 2
- 125000005161 aryl oxy carbonyl group Chemical class 0.000 description 2
- 125000000732 arylene group Chemical group 0.000 description 2
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical compound C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 2
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 2
- 239000012964 benzotriazole Substances 0.000 description 2
- 125000002619 bicyclic group Chemical group 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000002738 chelating agent Substances 0.000 description 2
- 125000006165 cyclic alkyl group Chemical group 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 238000000586 desensitisation Methods 0.000 description 2
- DOIRQSBPFJWKBE-UHFFFAOYSA-N dibutyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCCCC DOIRQSBPFJWKBE-UHFFFAOYSA-N 0.000 description 2
- FLKPEMZONWLCSK-UHFFFAOYSA-N diethyl phthalate Chemical compound CCOC(=O)C1=CC=CC=C1C(=O)OCC FLKPEMZONWLCSK-UHFFFAOYSA-N 0.000 description 2
- 239000003623 enhancer Substances 0.000 description 2
- 229940050521 gelatin agent Drugs 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- LEQAOMBKQFMDFZ-UHFFFAOYSA-N glyoxal Chemical compound O=CC=O LEQAOMBKQFMDFZ-UHFFFAOYSA-N 0.000 description 2
- 229910001385 heavy metal Inorganic materials 0.000 description 2
- 125000002887 hydroxy group Chemical class [H]O* 0.000 description 2
- 208000015181 infectious disease Diseases 0.000 description 2
- 230000002458 infectious effect Effects 0.000 description 2
- 239000003112 inhibitor Substances 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 239000004816 latex Substances 0.000 description 2
- 229920000126 latex Polymers 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 125000002950 monocyclic group Chemical group 0.000 description 2
- 125000001624 naphthyl group Chemical group 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- PTMHPRAIXMAOOB-UHFFFAOYSA-N phosphoramidic acid Chemical compound NP(O)(O)=O PTMHPRAIXMAOOB-UHFFFAOYSA-N 0.000 description 2
- 239000004014 plasticizer Substances 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 229920000098 polyolefin Polymers 0.000 description 2
- IOLCXVTUBQKXJR-UHFFFAOYSA-M potassium bromide Chemical compound [K+].[Br-] IOLCXVTUBQKXJR-UHFFFAOYSA-M 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 239000003755 preservative agent Substances 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- NDGRWYRVNANFNB-UHFFFAOYSA-N pyrazolidin-3-one Chemical class O=C1CCNN1 NDGRWYRVNANFNB-UHFFFAOYSA-N 0.000 description 2
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 2
- YGSDEFSMJLZEOE-UHFFFAOYSA-N salicylic acid Chemical compound OC(=O)C1=CC=CC=C1O YGSDEFSMJLZEOE-UHFFFAOYSA-N 0.000 description 2
- ADZWSOLPGZMUMY-UHFFFAOYSA-M silver bromide Chemical compound [Ag]Br ADZWSOLPGZMUMY-UHFFFAOYSA-M 0.000 description 2
- ZUNKMNLKJXRCDM-UHFFFAOYSA-N silver bromoiodide Chemical compound [Ag].IBr ZUNKMNLKJXRCDM-UHFFFAOYSA-N 0.000 description 2
- 229940045105 silver iodide Drugs 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000003381 stabilizer Substances 0.000 description 2
- 230000000087 stabilizing effect Effects 0.000 description 2
- 125000000547 substituted alkyl group Chemical group 0.000 description 2
- CNHDIAIOKMXOLK-UHFFFAOYSA-N toluquinol Chemical compound CC1=CC(O)=CC=C1O CNHDIAIOKMXOLK-UHFFFAOYSA-N 0.000 description 2
- URAYPUMNDPQOKB-UHFFFAOYSA-N triacetin Chemical compound CC(=O)OCC(OC(C)=O)COC(C)=O URAYPUMNDPQOKB-UHFFFAOYSA-N 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- SOBDFTUDYRPGJY-UHFFFAOYSA-N 1,3-bis(ethenylsulfonyl)propan-2-ol Chemical compound C=CS(=O)(=O)CC(O)CS(=O)(=O)C=C SOBDFTUDYRPGJY-UHFFFAOYSA-N 0.000 description 1
- FLBAYUMRQUHISI-UHFFFAOYSA-N 1,8-naphthyridine Chemical group N1=CC=CC2=CC=CN=C21 FLBAYUMRQUHISI-UHFFFAOYSA-N 0.000 description 1
- KJUGUADJHNHALS-UHFFFAOYSA-N 1H-tetrazole Substances C=1N=NNN=1 KJUGUADJHNHALS-UHFFFAOYSA-N 0.000 description 1
- JAAIPIWKKXCNOC-UHFFFAOYSA-N 1h-tetrazol-1-ium-5-thiolate Chemical compound SC1=NN=NN1 JAAIPIWKKXCNOC-UHFFFAOYSA-N 0.000 description 1
- DBCKMJVEAUXWJJ-UHFFFAOYSA-N 2,3-dichlorobenzene-1,4-diol Chemical compound OC1=CC=C(O)C(Cl)=C1Cl DBCKMJVEAUXWJJ-UHFFFAOYSA-N 0.000 description 1
- GPASWZHHWPVSRG-UHFFFAOYSA-N 2,5-dimethylbenzene-1,4-diol Chemical compound CC1=CC(O)=C(C)C=C1O GPASWZHHWPVSRG-UHFFFAOYSA-N 0.000 description 1
- BDKLKNJTMLIAFE-UHFFFAOYSA-N 2-(3-fluorophenyl)-1,3-oxazole-4-carbaldehyde Chemical compound FC1=CC=CC(C=2OC=C(C=O)N=2)=C1 BDKLKNJTMLIAFE-UHFFFAOYSA-N 0.000 description 1
- UQRQFLMLMSIRPO-UHFFFAOYSA-N 2-(4-aminophenyl)-1,3-dihydropyrazol-5-amine Chemical compound N1C(N)=CCN1C1=CC=C(N)C=C1 UQRQFLMLMSIRPO-UHFFFAOYSA-N 0.000 description 1
- JHKKTXXMAQLGJB-UHFFFAOYSA-N 2-(methylamino)phenol Chemical compound CNC1=CC=CC=C1O JHKKTXXMAQLGJB-UHFFFAOYSA-N 0.000 description 1
- HIGSPBFIOSHWQG-UHFFFAOYSA-N 2-Isopropyl-1,4-benzenediol Chemical compound CC(C)C1=CC(O)=CC=C1O HIGSPBFIOSHWQG-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- CMZYMAFXGOVIHW-UHFFFAOYSA-N 2-[4-(methylamino)phenyl]-1,3-dihydropyrazol-5-amine Chemical compound C1=CC(NC)=CC=C1N1NC(N)=CC1 CMZYMAFXGOVIHW-UHFFFAOYSA-N 0.000 description 1
- REFDOIWRJDGBHY-UHFFFAOYSA-N 2-bromobenzene-1,4-diol Chemical compound OC1=CC=C(O)C(Br)=C1 REFDOIWRJDGBHY-UHFFFAOYSA-N 0.000 description 1
- 125000006290 2-hydroxybenzyl group Chemical group [H]OC1=C(C([H])=C([H])C([H])=C1[H])C([H])([H])* 0.000 description 1
- FLFWJIBUZQARMD-UHFFFAOYSA-N 2-mercapto-1,3-benzoxazole Chemical compound C1=CC=C2OC(S)=NC2=C1 FLFWJIBUZQARMD-UHFFFAOYSA-N 0.000 description 1
- KRTDQDCPEZRVGC-UHFFFAOYSA-N 2-nitro-1h-benzimidazole Chemical compound C1=CC=C2NC([N+](=O)[O-])=NC2=C1 KRTDQDCPEZRVGC-UHFFFAOYSA-N 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- QOXOZONBQWIKDA-UHFFFAOYSA-N 3-hydroxypropyl Chemical group [CH2]CCO QOXOZONBQWIKDA-UHFFFAOYSA-N 0.000 description 1
- JTURATSJVPIURD-UHFFFAOYSA-N 3-nitro-1h-benzo[g]indazole Chemical compound C1=CC2=CC=CC=C2C2=C1C([N+](=O)[O-])=NN2 JTURATSJVPIURD-UHFFFAOYSA-N 0.000 description 1
- JLAMDELLBBZOOX-UHFFFAOYSA-N 3h-1,3,4-thiadiazole-2-thione Chemical compound SC1=NN=CS1 JLAMDELLBBZOOX-UHFFFAOYSA-N 0.000 description 1
- SJSJAWHHGDPBOC-UHFFFAOYSA-N 4,4-dimethyl-1-phenylpyrazolidin-3-one Chemical compound N1C(=O)C(C)(C)CN1C1=CC=CC=C1 SJSJAWHHGDPBOC-UHFFFAOYSA-N 0.000 description 1
- FBTQPCXUTWYBDX-UHFFFAOYSA-N 4-(5-amino-1,3-dihydropyrazol-2-yl)phenol Chemical compound N1C(N)=CCN1C1=CC=C(O)C=C1 FBTQPCXUTWYBDX-UHFFFAOYSA-N 0.000 description 1
- DSVIHYOAKPVFEH-UHFFFAOYSA-N 4-(hydroxymethyl)-4-methyl-1-phenylpyrazolidin-3-one Chemical compound N1C(=O)C(C)(CO)CN1C1=CC=CC=C1 DSVIHYOAKPVFEH-UHFFFAOYSA-N 0.000 description 1
- FQQGQVUWBXURTA-UHFFFAOYSA-N 4-ethyl-1-phenylpyrazolidin-3-one Chemical compound N1C(=O)C(CC)CN1C1=CC=CC=C1 FQQGQVUWBXURTA-UHFFFAOYSA-N 0.000 description 1
- ZZEYCGJAYIHIAZ-UHFFFAOYSA-N 4-methyl-1-phenylpyrazolidin-3-one Chemical compound N1C(=O)C(C)CN1C1=CC=CC=C1 ZZEYCGJAYIHIAZ-UHFFFAOYSA-N 0.000 description 1
- ZFIQGRISGKSVAG-UHFFFAOYSA-N 4-methylaminophenol Chemical compound CNC1=CC=C(O)C=C1 ZFIQGRISGKSVAG-UHFFFAOYSA-N 0.000 description 1
- FIARATPVIIDWJT-UHFFFAOYSA-N 5-methyl-1-phenylpyrazolidin-3-one Chemical compound CC1CC(=O)NN1C1=CC=CC=C1 FIARATPVIIDWJT-UHFFFAOYSA-N 0.000 description 1
- LRUDIIUSNGCQKF-UHFFFAOYSA-N 5-methyl-1H-benzotriazole Chemical compound C1=C(C)C=CC2=NNN=C21 LRUDIIUSNGCQKF-UHFFFAOYSA-N 0.000 description 1
- BOPVGQUDDIEQAO-UHFFFAOYSA-N 7-methyl-1h-[1,2,4]triazolo[1,5-a]pyrimidin-5-one Chemical compound CC1=CC(=O)N=C2N=CNN12 BOPVGQUDDIEQAO-UHFFFAOYSA-N 0.000 description 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Natural products OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 description 1
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- PQUCIEFHOVEZAU-UHFFFAOYSA-N Diammonium sulfite Chemical compound [NH4+].[NH4+].[O-]S([O-])=O PQUCIEFHOVEZAU-UHFFFAOYSA-N 0.000 description 1
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 1
- SXRSQZLOMIGNAQ-UHFFFAOYSA-N Glutaraldehyde Chemical compound O=CCCCC=O SXRSQZLOMIGNAQ-UHFFFAOYSA-N 0.000 description 1
- JLVVSXFLKOJNIY-UHFFFAOYSA-N Magnesium ion Chemical compound [Mg+2] JLVVSXFLKOJNIY-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 239000000020 Nitrocellulose Substances 0.000 description 1
- ZCQWOFVYLHDMMC-UHFFFAOYSA-N Oxazole Chemical compound C1=COC=N1 ZCQWOFVYLHDMMC-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 229920000388 Polyphosphate Polymers 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- YSMRWXYRXBRSND-UHFFFAOYSA-N TOTP Chemical compound CC1=CC=CC=C1OP(=O)(OC=1C(=CC=CC=1)C)OC1=CC=CC=C1C YSMRWXYRXBRSND-UHFFFAOYSA-N 0.000 description 1
- ZMZDMBWJUHKJPS-UHFFFAOYSA-M Thiocyanate anion Chemical compound [S-]C#N ZMZDMBWJUHKJPS-UHFFFAOYSA-M 0.000 description 1
- 241001061127 Thione Species 0.000 description 1
- FJWGYAHXMCUOOM-QHOUIDNNSA-N [(2s,3r,4s,5r,6r)-2-[(2r,3r,4s,5r,6s)-4,5-dinitrooxy-2-(nitrooxymethyl)-6-[(2r,3r,4s,5r,6s)-4,5,6-trinitrooxy-2-(nitrooxymethyl)oxan-3-yl]oxyoxan-3-yl]oxy-3,5-dinitrooxy-6-(nitrooxymethyl)oxan-4-yl] nitrate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](O[N+]([O-])=O)[C@H]1O[N+]([O-])=O)O[C@H]1[C@@H]([C@@H](O[N+]([O-])=O)[C@H](O[N+]([O-])=O)[C@@H](CO[N+]([O-])=O)O1)O[N+]([O-])=O)CO[N+](=O)[O-])[C@@H]1[C@@H](CO[N+]([O-])=O)O[C@@H](O[N+]([O-])=O)[C@H](O[N+]([O-])=O)[C@H]1O[N+]([O-])=O FJWGYAHXMCUOOM-QHOUIDNNSA-N 0.000 description 1
- HOLVRJRSWZOAJU-UHFFFAOYSA-N [Ag].ICl Chemical compound [Ag].ICl HOLVRJRSWZOAJU-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 239000012190 activator Substances 0.000 description 1
- 125000004442 acylamino group Chemical group 0.000 description 1
- 125000004423 acyloxy group Chemical class 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 125000005257 alkyl acyl group Chemical group 0.000 description 1
- 125000005115 alkyl carbamoyl group Chemical group 0.000 description 1
- 125000005037 alkyl phenyl group Chemical group 0.000 description 1
- 125000004390 alkyl sulfonyl group Chemical group 0.000 description 1
- 125000004414 alkyl thio group Chemical class 0.000 description 1
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical class [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 235000011126 aluminium potassium sulphate Nutrition 0.000 description 1
- XIWMTQIUUWJNRP-UHFFFAOYSA-N amidol Chemical compound NC1=CC=C(O)C(N)=C1 XIWMTQIUUWJNRP-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- SOIFLUNRINLCBN-UHFFFAOYSA-N ammonium thiocyanate Chemical compound [NH4+].[S-]C#N SOIFLUNRINLCBN-UHFFFAOYSA-N 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 125000005251 aryl acyl group Chemical group 0.000 description 1
- 125000005116 aryl carbamoyl group Chemical group 0.000 description 1
- 125000005110 aryl thio group Chemical class 0.000 description 1
- 125000004104 aryloxy group Chemical class 0.000 description 1
- 235000010323 ascorbic acid Nutrition 0.000 description 1
- 229960005070 ascorbic acid Drugs 0.000 description 1
- 239000011668 ascorbic acid Substances 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Chemical compound [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 description 1
- 229910001864 baryta Inorganic materials 0.000 description 1
- 125000005605 benzo group Chemical group 0.000 description 1
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 238000004061 bleaching Methods 0.000 description 1
- WLZRMCYVCSSEQC-UHFFFAOYSA-N cadmium(2+) Chemical compound [Cd+2] WLZRMCYVCSSEQC-UHFFFAOYSA-N 0.000 description 1
- 125000001951 carbamoylamino group Chemical group C(N)(=O)N* 0.000 description 1
- 125000005521 carbonamide group Chemical class 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- AJPXTSMULZANCB-UHFFFAOYSA-N chlorohydroquinone Chemical compound OC1=CC=C(O)C(Cl)=C1 AJPXTSMULZANCB-UHFFFAOYSA-N 0.000 description 1
- 229960004106 citric acid Drugs 0.000 description 1
- 230000015271 coagulation Effects 0.000 description 1
- 238000005345 coagulation Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 229920001940 conductive polymer Polymers 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000000502 dialysis Methods 0.000 description 1
- FGRVOLIFQGXPCT-UHFFFAOYSA-L dipotassium;dioxido-oxo-sulfanylidene-$l^{6}-sulfane Chemical compound [K+].[K+].[O-]S([O-])(=O)=S FGRVOLIFQGXPCT-UHFFFAOYSA-L 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000004945 emulsification Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- BQINTNNSPWSRCD-UHFFFAOYSA-N ethyl n-amino-n-(carbamoylamino)carbamate Chemical class CCOC(=O)N(N)NC(N)=O BQINTNNSPWSRCD-UHFFFAOYSA-N 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- 239000001087 glyceryl triacetate Substances 0.000 description 1
- 235000013773 glyceryl triacetate Nutrition 0.000 description 1
- 229940015043 glyoxal Drugs 0.000 description 1
- 229940093915 gynecological organic acid Drugs 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 125000001072 heteroaryl group Chemical group 0.000 description 1
- ZMZDMBWJUHKJPS-UHFFFAOYSA-N hydrogen thiocyanate Natural products SC#N ZMZDMBWJUHKJPS-UHFFFAOYSA-N 0.000 description 1
- 229920001600 hydrophobic polymer Polymers 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N hydroquinone methyl ether Natural products COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- AQYSYJUIMQTRMV-UHFFFAOYSA-N hypofluorous acid Chemical compound FO AQYSYJUIMQTRMV-UHFFFAOYSA-N 0.000 description 1
- 125000002883 imidazolyl group Chemical group 0.000 description 1
- 125000002183 isoquinolinyl group Chemical group C1(=NC=CC2=CC=CC=C12)* 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- TYQCGQRIZGCHNB-JLAZNSOCSA-N l-ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(O)=C(O)C1=O TYQCGQRIZGCHNB-JLAZNSOCSA-N 0.000 description 1
- 239000002346 layers by function Substances 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 229910001425 magnesium ion Inorganic materials 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- MGFYIUFZLHCRTH-UHFFFAOYSA-N nitrilotriacetic acid Chemical compound OC(=O)CN(CC(O)=O)CC(O)=O MGFYIUFZLHCRTH-UHFFFAOYSA-N 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 229920001220 nitrocellulos Polymers 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 125000001741 organic sulfur group Chemical group 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 125000002971 oxazolyl group Chemical group 0.000 description 1
- 238000010979 pH adjustment Methods 0.000 description 1
- 239000006174 pH buffer Substances 0.000 description 1
- 239000006179 pH buffering agent Substances 0.000 description 1
- FJKROLUGYXJWQN-UHFFFAOYSA-N papa-hydroxy-benzoic acid Natural products OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 1
- CMCWWLVWPDLCRM-UHFFFAOYSA-N phenidone Chemical compound N1C(=O)CCN1C1=CC=CC=C1 CMCWWLVWPDLCRM-UHFFFAOYSA-N 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 125000001476 phosphono group Chemical group [H]OP(*)(=O)O[H] 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920000417 polynaphthalene Polymers 0.000 description 1
- 239000001205 polyphosphate Substances 0.000 description 1
- 235000011176 polyphosphates Nutrition 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 229940050271 potassium alum Drugs 0.000 description 1
- GRLPQNLYRHEGIJ-UHFFFAOYSA-J potassium aluminium sulfate Chemical compound [Al+3].[K+].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O GRLPQNLYRHEGIJ-UHFFFAOYSA-J 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- BHZRJJOHZFYXTO-UHFFFAOYSA-L potassium sulfite Chemical compound [K+].[K+].[O-]S([O-])=O BHZRJJOHZFYXTO-UHFFFAOYSA-L 0.000 description 1
- 235000019252 potassium sulphite Nutrition 0.000 description 1
- ZNNZYHKDIALBAK-UHFFFAOYSA-M potassium thiocyanate Chemical compound [K+].[S-]C#N ZNNZYHKDIALBAK-UHFFFAOYSA-M 0.000 description 1
- 229940116357 potassium thiocyanate Drugs 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000002335 preservative effect Effects 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- CPNGPNLZQNNVQM-UHFFFAOYSA-N pteridine Chemical group N1=CN=CC2=NC=CN=C21 CPNGPNLZQNNVQM-UHFFFAOYSA-N 0.000 description 1
- 125000003373 pyrazinyl group Chemical group 0.000 description 1
- 125000003226 pyrazolyl group Chemical group 0.000 description 1
- PBMFSQRYOILNGV-UHFFFAOYSA-N pyridazine Chemical group C1=CC=NN=C1 PBMFSQRYOILNGV-UHFFFAOYSA-N 0.000 description 1
- 125000004076 pyridyl group Chemical group 0.000 description 1
- 125000000714 pyrimidinyl group Chemical group 0.000 description 1
- 229940079877 pyrogallol Drugs 0.000 description 1
- 125000000168 pyrrolyl group Chemical group 0.000 description 1
- 150000003856 quaternary ammonium compounds Chemical class 0.000 description 1
- 239000001397 quillaja saponaria molina bark Substances 0.000 description 1
- 125000002943 quinolinyl group Chemical group N1=C(C=CC2=CC=CC=C12)* 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000007363 ring formation reaction Methods 0.000 description 1
- 230000005070 ripening Effects 0.000 description 1
- 229960004889 salicylic acid Drugs 0.000 description 1
- 238000005185 salting out Methods 0.000 description 1
- 229930182490 saponin Natural products 0.000 description 1
- 150000007949 saponins Chemical class 0.000 description 1
- 230000001235 sensitizing effect Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000017281 sodium acetate Nutrition 0.000 description 1
- 229940087562 sodium acetate trihydrate Drugs 0.000 description 1
- 229940077386 sodium benzenesulfonate Drugs 0.000 description 1
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 description 1
- 229960000999 sodium citrate dihydrate Drugs 0.000 description 1
- HRZFUMHJMZEROT-UHFFFAOYSA-L sodium disulfite Chemical compound [Na+].[Na+].[O-]S(=O)S([O-])(=O)=O HRZFUMHJMZEROT-UHFFFAOYSA-L 0.000 description 1
- 229940001584 sodium metabisulfite Drugs 0.000 description 1
- 235000010262 sodium metabisulphite Nutrition 0.000 description 1
- VGTPCRGMBIAPIM-UHFFFAOYSA-M sodium thiocyanate Chemical compound [Na+].[S-]C#N VGTPCRGMBIAPIM-UHFFFAOYSA-M 0.000 description 1
- AKHNMLFCWUSKQB-UHFFFAOYSA-L sodium thiosulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=S AKHNMLFCWUSKQB-UHFFFAOYSA-L 0.000 description 1
- 235000019345 sodium thiosulphate Nutrition 0.000 description 1
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 description 1
- 239000007962 solid dispersion Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 125000005017 substituted alkenyl group Chemical group 0.000 description 1
- 125000003107 substituted aryl group Chemical group 0.000 description 1
- 125000000475 sulfinyl group Chemical class [*:2]S([*:1])=O 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-L sulfite Chemical class [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 description 1
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 description 1
- 229940124530 sulfonamide Drugs 0.000 description 1
- 125000000565 sulfonamide group Chemical group 0.000 description 1
- 150000003456 sulfonamides Chemical class 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 150000003536 tetrazoles Chemical class 0.000 description 1
- 150000003557 thiazoles Chemical class 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- 150000003567 thiocyanates Chemical class 0.000 description 1
- 125000000101 thioether group Chemical group 0.000 description 1
- 150000004764 thiosulfuric acid derivatives Chemical class 0.000 description 1
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea group Chemical group NC(=S)N UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 1
- 229960002622 triacetin Drugs 0.000 description 1
- 150000003852 triazoles Chemical class 0.000 description 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 230000002087 whitening effect Effects 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は印刷製版用ハロゲン化銀
写真感光材料に関し、詳しくは高コントラストが得られ
るハロゲン化銀写真感光材料に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a silver halide photographic light-sensitive material for printing plate making, and more particularly to a silver halide photographic light-sensitive material capable of obtaining high contrast.
【0002】[0002]
【従来の技術】写真製版工程には連続調の原稿を網点画
像に変換する工程が含まれる。この工程には、超硬調の
画像再現をなしうる写真技術として、伝染現像による技
術が用いられてきた。2. Description of the Related Art The photolithography process includes a process of converting a continuous-tone original into a halftone dot image. In this process, a technique based on infectious development has been used as a photographic technique capable of reproducing an image in ultra-high contrast.
【0003】伝染現像に用いられるリス型ハロゲン化銀
写真感光材料(以下、単に「リス型感光材料」ともい
う)は、例えば平均粒子径が0.2μmで粒子分布が狭く粒
子の形も整っていて、かつ塩化銀の含有率の高い(少な
くとも50モル%以上)塩臭化銀乳剤よりなる。このリス
型感光材料を亜硫酸イオン濃度が低いアルカリ性ハイド
ロキノン現像液、いわゆるリス型現像液で処理すること
により、高いコントラスト、高鮮鋭度、高解像力の画像
が得られる。The lith-type silver halide photographic light-sensitive material (hereinafter, also simply referred to as "lith-type light-sensitive material") used for infectious development has, for example, an average particle diameter of 0.2 μm, a narrow particle distribution and a well-formed particle shape. And a silver chlorobromide emulsion having a high silver chloride content (at least 50 mol% or more). By processing the lith-type light-sensitive material with an alkaline hydroquinone developer having a low sulfite ion concentration, that is, a so-called lith-type developer, an image with high contrast, high sharpness and high resolution can be obtained.
【0004】しかしながら、これらのリス型現像液は空
気酸化を受け易く保恒性が極めて悪いため、連続使用の
際において現像品質を一定に保つことは難しい。However, since these lith-type developers are susceptible to air oxidation and have extremely poor preservability, it is difficult to keep the development quality constant during continuous use.
【0005】上記のリス型現像液を使わずに、迅速かつ
高コントラストの画像を得る方法が知られている。例え
ば特開昭56-106244号等に見られるように、ヒドラジン
誘導体を含有した感光材料をアルカリ現像液で処理する
というものである。これらの方法によれば、保恒性が良
く、迅速処理可能な現像液で処理することによっても硬
調な画像が得ることができる。A method is known in which a rapid and high-contrast image is obtained without using the lith developer. For example, as disclosed in JP-A-56-106244, a light-sensitive material containing a hydrazine derivative is processed with an alkali developing solution. According to these methods, it is possible to obtain a high-contrast image even by processing with a developing solution having good preservative property and capable of rapid processing.
【0006】これらの技術では、ヒドラジン誘導体の硬
調性を十分に発揮させるためにpH11.2以上のpHを有する
現像液で処理しなければならなかった。pH11.2以上の高
pH現像液は、空気に触れると現像主薬が酸化し易く、リ
ス現像液よりは安定であるが、現像主薬の酸化によっ
て、しばしば超硬調な画像が得られないことがある。[0006] In these techniques, in order to fully exert the high contrast property of the hydrazine derivative, it was necessary to carry out processing with a developer having a pH of pH 11.2 or higher. pH 11.2 or higher
The pH developing solution is more stable than the lith developing solution because the developing agent is easily oxidized when exposed to air, but due to the oxidation of the developing agent, a super-high contrast image may not be often obtained.
【0007】この欠点を補うため、特開昭63-29751号、
特開平1-179939号、同1-179940号及び米国特許4,975,35
4号等には、pH11.2未満の比較的低pHの現像液でも硬調
化するヒドラジン誘導体及び造核促進剤を含む感光材料
が開示されている。In order to compensate for this drawback, JP-A-63-29751
Japanese Patent Laid-Open Nos. 1-179939, 1-179940 and U.S. Pat.
No. 4 and the like disclose a light-sensitive material containing a hydrazine derivative and a nucleation accelerator which bring about a high contrast even in a developer having a relatively low pH of less than 11.2.
【0008】しかし、これらのような硬調化剤を含む感
光材料をpH11.0未満の現像液で処理する画像形成方法の
場合、経時によって増感や軟調化や、現像処理後の未露
光部に発生する砂状のカブリ、いわゆる黒ポツが劣化す
るという問題があり、満足な性能が得られないのが現状
である。また、これらの感材は処理後のフィルムの残色
も大きな問題となっている。However, in the case of an image forming method in which a light-sensitive material containing such a contrast-improving agent is processed with a developer having a pH of less than 11.0, sensitization or softening occurs over time, and unexposed areas after development processing are exposed. The current situation is that there is a problem that the sandy fog that occurs, so-called black spots, deteriorates, and satisfactory performance cannot be obtained. Further, the residual color of the film after processing these photosensitive materials is also a big problem.
【0009】[0009]
【発明が解決しようとする課題】従って本発明の第1の
目的は、pH11.0未満の現像液で処理しても感度低下や軟
調化、或いは未露光部分に発生する黒ポツの増加が防止
された超硬調画像を忠実に表現できるハロゲン化銀写真
感光材料を提供することにある。SUMMARY OF THE INVENTION Therefore, the first object of the present invention is to prevent deterioration of sensitivity and softening, or increase of black spots generated in an unexposed portion even when processed with a developer having a pH of less than 11.0. It is an object of the present invention to provide a silver halide photographic light-sensitive material capable of faithfully expressing a produced ultra-high contrast image.
【0010】また、本発明の第2の目的は、上記性能を
備えて、かつ処理後の残色が少ないハロゲン化銀写真感
光材料を提供することにある。A second object of the present invention is to provide a silver halide photographic light-sensitive material having the above-mentioned properties and having less residual color after processing.
【0011】[0011]
【課題を解決するための手段】本発明の上記目的は、支
持体上に少なくとも1層のハロゲン化銀乳剤層を有する
ハロゲン化銀写真感光材料において、該乳剤の製造工程
中、可溶性塩類を除去する脱塩処理が変性ゼラチンによ
り凝集沈殿することにより行われ、かつ該乳剤層又はそ
の他の親水性コロイド層に下記一般式(1)で表される
ヒドラジン誘導体を含有することを特徴とするハロゲン
化銀写真感光材料により達成される。The above object of the present invention is to eliminate soluble salts in a silver halide photographic light-sensitive material having at least one silver halide emulsion layer on a support during the production process of the emulsion. The desalting treatment is carried out by coagulating and precipitating with modified gelatin, and the emulsion layer or other hydrophilic colloid layer contains a hydrazine derivative represented by the following general formula (1). It is achieved by a silver photographic light-sensitive material.
【0012】以下、本発明について具体的に説明する。The present invention will be specifically described below.
【0013】本発明の感光材料は下記一般式(1)で表
されるヒドラジン誘導体を含有する。The light-sensitive material of the present invention contains a hydrazine derivative represented by the following general formula (1).
【0014】[0014]
【化2】 [Chemical 2]
【0015】式中、R1は脂肪族基又は芳香族基を表
し、更にその置換基の一部として−(CH2CH2O)n−、−(C
H2CH(CH3)O)n−、−(CH2CH(OH)CH2O)n−(ただし、nは
1以上の整数)の部分構造を含有するか、4級アンモニ
ウムカチオンを含有する。G1は−CO−基、−COCO−
基、−CS−基、−C(=NG2R2)−基、−SO−基、−SO2−
基又は−P(=O)(G2R2)−基を表す。G2は単なる結合
手、−O−基、−S−基又は−N(R2)−基を表し、R2は脂
肪族基、芳香族基又は水素原子を表す。分子内に複数の
R2が存在する場合、それらは同じでも異なってもよ
い。A1,A2の一方は水素原子であり、他方は水素原子
又はアシル基、アルキル基又はアリールスルホニル基を
表す。In the formula, R 1 represents an aliphatic group or an aromatic group, and-(CH 2 CH 2 O) n-,-(C
Contains a partial structure of H 2 CH (CH 3 ) O) n−, — (CH 2 CH (OH) CH 2 O) n− (where n is an integer of 1 or more) or contains a quaternary ammonium cation To do. G 1 is a -CO- group, -COCO-
Group, -CS- group, -C (= NG 2 R 2 ) - group, -SO- group, -SO 2 -
Group or -P (= O) (G 2 R 2) - represents a group. G 2 is a single bond, -O- group, -S- group, or -N (R 2) - represents a group, R 2 represents an aliphatic group, an aromatic group or a hydrogen atom. When multiple R 2's are present in the molecule, they may be the same or different. One of A 1 and A 2 is a hydrogen atom, and the other is a hydrogen atom or an acyl group, an alkyl group or an arylsulfonyl group.
【0016】一般式(1)について更に詳細に説明す
る。The general formula (1) will be described in more detail.
【0017】R1で表される脂肪族基は好ましくは炭素
数1〜30のものであって、特に炭素数1〜20の直鎖、分
岐又は環状のアルキル基が好ましい。このアルキル基は
置換基を有している。The aliphatic group represented by R 1 preferably has 1 to 30 carbon atoms, and particularly preferably a linear, branched or cyclic alkyl group having 1 to 20 carbon atoms. This alkyl group has a substituent.
【0018】R1で表される芳香族基は単環又は2環の
アリール基又は不飽和複素環基である。ここで不飽和複
素環基はアリール基と縮合して縮合複素環基を形成して
もよい。例えばベンゼン環、ナフタレン環、ピリジン
環、キノリン環、イソキノリン環等がある。中でもベン
ゼン環を含むものが好ましい。R1として特に好ましい
ものはアリール基である。R1のアリール基又は不飽和
複素環基は置換されている。The aromatic group represented by R 1 is a monocyclic or bicyclic aryl group or an unsaturated heterocyclic group. Here, the unsaturated heterocyclic group may be condensed with an aryl group to form a condensed heterocyclic group. Examples thereof include a benzene ring, a naphthalene ring, a pyridine ring, a quinoline ring and an isoquinoline ring. Of these, those containing a benzene ring are preferable. Particularly preferred as R 1 is an aryl group. The aryl group or unsaturated heterocyclic group of R 1 is substituted.
【0019】R1の脂肪族基は又は芳香族基は置換され
ており、代表的な置換基としては、例えばハロゲン原
子、アルキル、アラルキル、アルケニル、アルキニル、
アルコキシ、アリール、置換アミノ、ウレイド、ウレタ
ン、アリールオキシ、スルファモイル、カルバモイル、
アルキルチオ、アリールチオ、スルホニル、スルフィニ
ル、ヒドロキシル、シアノ、スルホ、アリールオキシカ
ルボニル、アシル、アルコキシカルボニル、アシルオキ
シ、カルボンアミド、スルホンアミド、カルボキシル、
燐酸アミドなどの各基が挙げられ、好ましい置換基とし
ては直鎖、分岐又は環状のアルキル基(好ましくは炭素
数1〜20のもの)、アラルキル基(好ましくは炭素数7
〜30のもの)、アルコキシ基(好ましくは炭素数1〜30
のもの)、置換アミノ基(好ましくは炭素数1〜30のア
ルキル基で置換されたアミノ基)、アシルアミノ基(好
ましくは炭素数2〜40のもの)、スルホンアミド基(好
ましくは炭素数1〜40のもの)、ウレイド基(好ましく
は炭素数1〜40のもの)、燐酸アミド基(好ましくは炭
素数1〜40のもの)などである。The aliphatic group or aromatic group of R 1 is substituted, and typical examples of the substituent include halogen atom, alkyl, aralkyl, alkenyl, alkynyl,
Alkoxy, aryl, substituted amino, ureido, urethane, aryloxy, sulfamoyl, carbamoyl,
Alkylthio, arylthio, sulfonyl, sulfinyl, hydroxyl, cyano, sulfo, aryloxycarbonyl, acyl, alkoxycarbonyl, acyloxy, carbonamide, sulfonamide, carboxyl,
Examples of the substituents include phosphoric acid amide and the like. Preferred substituents are linear, branched or cyclic alkyl groups (preferably having 1 to 20 carbon atoms) and aralkyl groups (preferably having 7 carbon atoms).
~ 30), alkoxy groups (preferably 1 to 30 carbon atoms)
), A substituted amino group (preferably an amino group substituted with an alkyl group having 1 to 30 carbon atoms), an acylamino group (preferably having 2 to 40 carbon atoms), a sulfonamide group (preferably 1 to 1 carbon atoms) 40 groups), ureido groups (preferably having 1 to 40 carbon atoms), phosphoric acid amide groups (preferably having 1 to 40 carbon atoms) and the like.
【0020】R1の脂肪族基、芳香族基又はそれらの置
換基は−(CH2CH2O)n−、−(CH2CH(CH3)O)n−又は−(CH2
CH(OH)CH2O)n−を含有しているか、あるいは4級アンモ
ニウムカチオンを含有している。nは1〜15の整数が好
ましい。R1は好ましくは以下の一般式(II)、一般式
(III)、一般式(IV)又は一般式(V)で表される。The aliphatic group, aromatic group or their substituents for R 1 is-(CH 2 CH 2 O) n-,-(CH 2 CH (CH 3 ) O) n- or-(CH 2
It contains CH (OH) CH 2 O) n- or contains a quaternary ammonium cation. n is preferably an integer of 1 to 15. R 1 is preferably represented by the following general formula (II), general formula (III), general formula (IV) or general formula (V).
【0021】[0021]
【化3】 [Chemical 3]
【0022】上記一般式中、L1及びL2は各々−CON
(R7)−基、−N(R7)CON(R8)−基、−SO2N(R7)−基又は−
N(R7)S02N(R8)−基を表し、それぞれ同じでも異なって
もよい。R7及びR8は各々、水素原子又は炭素数1〜6
のアルキル基、炭素数6〜10のアリール基を表し、水素
原子が好ましい。mは0又は1である。R3、R4及びR
5は各々、2価の脂肪族基又は芳香族基であり、好まし
くはアルキレン基、アリーレン基又はそれらと−O−、
−CO−、−S−、−SO−、−SO2−、−N(R9)−(R9は一
般式(II)、(III)、(IV)のR7と同義)を組み合わ
せて作られる2価の基である。より好ましくは、R3は
炭素数1〜10のアルキレン基あるいは、それらと−S
−、−SO−、−SO2−を組み合わせて作られる2価の基
であり、R4及びR5は各々、炭素数6〜20のアリーレン
基である。特にR5はフェニレン基が好ましい。R3、R
4及びR5は置換されてもよく、好ましい置換基としては
R1の置換基として列挙したものが当てはまる。In the above general formula, L 1 and L 2 are each -CON.
(R 7 )-group, -N (R 7 ) CON (R 8 )-group, -SO 2 N (R 7 )-group or-
N (R 7 ) S0 2 N (R 8 )-represents a group, which may be the same or different. R 7 and R 8 are each a hydrogen atom or a carbon number of 1 to 6
Represents an alkyl group having 6 to 10 carbon atoms and is preferably a hydrogen atom. m is 0 or 1. R 3 , R 4 and R
5 is a divalent aliphatic group or aromatic group, preferably an alkylene group, an arylene group or -O-,
-CO -, - S -, - SO -, - SO 2 -, - N (R 9) - (R 9 is the formula (II), (III), R 7 as defined in (IV)) in combination It is a divalent group created. More preferably, R 3 is an alkylene group having 1 to 10 carbon atoms or those and --S
-, - SO -, - SO 2 - is a bivalent group produced by combining, R 4 and R 5 are each an arylene group having 6 to 20 carbon atoms. Particularly, R 5 is preferably a phenylene group. R 3 , R
4 and R 5 may be substituted, and preferable substituents are those listed as the substituents for R 1 .
【0023】一般式(II)及び(III)において、Z1は
含窒素芳香環を形成するに必要な原子群を表す。Z1と
窒素原子で形成される含窒素芳香複素環の好ましい例と
しては、ピリジン環、ピリミジン環、ピリダジン環、ピ
ラジン環、イミダゾール環、ピラゾール環、ピロール
環、オキサゾール環、チアゾール環及びこれらのベンゾ
縮合環の他、プテリジン環、ナフチリジン環などを挙げ
ることができる。In the general formulas (II) and (III), Z 1 represents an atomic group necessary for forming a nitrogen-containing aromatic ring. Preferable examples of the nitrogen-containing aromatic heterocycle formed by Z 1 and a nitrogen atom include pyridine ring, pyrimidine ring, pyridazine ring, pyrazine ring, imidazole ring, pyrazole ring, pyrrole ring, oxazole ring, thiazole ring and benzo thereof. In addition to the condensed ring, a pteridine ring, a naphthyridine ring and the like can be mentioned.
【0024】一般式(II)、(III)及び(IV)におい
て、X-は対アニオン又は分子内塩を形成する場合は対
アニオン部分を表す。In the general formulas (II), (III) and (IV), X - represents a counter anion or a counter anion moiety when forming an inner salt.
【0025】一般式(III)、(IV)及び(V)におい
て、R6は脂肪族基又は芳香族基を表す。好ましくはR6
は炭素数1〜20のアルキル基、炭素数6〜20のアリール
基である。In the general formulas (III), (IV) and (V), R 6 represents an aliphatic group or an aromatic group. Preferably R 6
Is an alkyl group having 1 to 20 carbon atoms and an aryl group having 6 to 20 carbon atoms.
【0026】一般式(IV)における三つのR6はそれぞ
れ同じでも異なってもよく、又、互いに結合して環を形
成してもよい。Z1及びR6は置換されてもよく、好まし
い置換基としてはR1の置換基として列挙したものが当
てはまる。The three R 6 s in the general formula (IV) may be the same or different, and may combine with each other to form a ring. Z 1 and R 6 may be substituted, and as the preferable substituents, those enumerated as the substituents of R 1 are applicable.
【0027】一般式(V)において、L3は−CH2CH2O−
基、−CH2CH(CH3)O−基又は−CH2CH(OH)CH2O−基を表
し、nは一般式(1)と同義である。In the general formula (V), L 3 is --CH 2 CH 2 O--
Group, a -CH 2 CH (CH 3) O- group or a -CH 2 CH (OH) CH 2 O- radical, n is as in formula (1) synonymous.
【0028】一般式(1)におけるG1としては−CO−
基、−SO2−基が好ましく、−CO−基が最も好ましい。
A1、A2としては水素原子が好ましい。As G 1 in the general formula (1), --CO--
The group, —SO 2 — group is preferred, and —CO— group is most preferred.
A hydrogen atom is preferable as A 1 and A 2 .
【0029】一般式(1)においてR2で表されるアル
キル基としては、好ましくは炭素数1〜4のアルキル基
であり、アリール基としては単環又は2環のアリール基
が好ましい(例えばベンゼン環を含むもの)。G1が−C
O−基の場合、R2で表される基のうち好ましいものは、
水素原子、アルキル基(例えばメチル、トリフルオロメ
チル、3-ヒドロキシプロピル、3-メタンスルホンアミド
プロピル、フェニルスルホニルメチル)、アラルキル
(例えばo-ヒドロキシベンジル)、アリール基(例えば
フェニル、3,5-ジクロロフェニル、o-メタンスルホンア
ミドフェニル等、4-メタンスルホニルフェニル、2-ヒド
ロキシメチルフェニル等)などであり、特に水素原子が
好ましい。R2は置換されてもよく、置換基としては、
R1に関して列挙した置換基が適用できる。又、R2はG1
−R2の部分を残余分子から分裂させ、−G1−R2部分の原
子を含む環式構造を生成させる環化反応を生起するよう
なものでもよく、その例としては例えば特開昭63-29751
号等に記載のものが挙げられる。The alkyl group represented by R 2 in the general formula (1) is preferably an alkyl group having 1 to 4 carbon atoms, and the aryl group is preferably a monocyclic or bicyclic aryl group (for example, benzene). Including rings). G 1 is -C
In the case of an O-group, preferred ones of the groups represented by R 2 are
Hydrogen atom, alkyl group (eg methyl, trifluoromethyl, 3-hydroxypropyl, 3-methanesulfonamidopropyl, phenylsulfonylmethyl), aralkyl (eg o-hydroxybenzyl), aryl group (eg phenyl, 3,5-dichlorophenyl) , O-methanesulfonamidophenyl, etc., 4-methanesulfonylphenyl, 2-hydroxymethylphenyl, etc.), and a hydrogen atom is particularly preferable. R 2 may be substituted, and as the substituent,
The substituents listed for R 1 are applicable. Also, R 2 is G 1
Portions of -R 2 disrupts the residual molecule, -G 1 -R 2 moiety of atoms may be such as to rise to cyclization reaction to form a cyclic structure containing, as an example, for example, JP 63 -29751
And the like.
【0030】一般式(1)のR1又はR2は、その中にカ
プラー等の不動性写真用添加剤において常用されている
バラスト基又はポリマーが組み込まれたものでよい。バ
ラスト基は8以上の炭素数を有する写真性に対して比較
的不活性な基であり、例えばアルキル基、アルコキシ
基、フェニル基、アルキルフェニル基、フェノキシ基、
アルキルフェノキシ基などの中から選ぶことができる。
又、ポリマーとして例えば特開平1-100530号に記載のも
のが挙げられる。R 1 or R 2 in the general formula (1) may have a ballast group or a polymer incorporated therein which is commonly used in a non-moving photographic additive such as a coupler. The ballast group is a group having a carbon number of 8 or more and relatively inert to photographic properties, and examples thereof include an alkyl group, an alkoxy group, a phenyl group, an alkylphenyl group, a phenoxy group,
It can be selected from among alkylphenoxy groups and the like.
Further, examples of the polymer include those described in JP-A No. 1-100530.
【0031】R1が有することのできるハロゲン化銀吸
着基としては、−S−基、−S−S−基、−NHC(=S)NH−
基、5〜6員の含窒素複素環基(ベンゾトリアゾール、
トリアゾール、イミダゾール、チアゾール、オキサゾー
ル等)、メルカプト基又はジスルフィド結合を有する5
〜6員の含窒素複素環基(2-メルカプトチアジアゾー
ル、5-メルカプトテトラゾール、2-メルカプトベンゾオ
キサゾール等)が挙げられる。特に、−S−基、メルカ
プト基又はジスルフィド結合を有する5〜6員の含窒素
複素環基を持つことが好ましい。As the silver halide adsorbing group which R 1 can have, --S-- group, --S--S-- group, --NHC (= S) NH--
Group, a 5- or 6-membered nitrogen-containing heterocyclic group (benzotriazole,
Triazole, imidazole, thiazole, oxazole, etc.), mercapto group or disulfide bond 5
And a 6-membered nitrogen-containing heterocyclic group (2-mercaptothiadiazole, 5-mercaptotetrazole, 2-mercaptobenzoxazole and the like). In particular, it is preferable to have a 5-S-membered nitrogen-containing heterocyclic group having a -S- group, a mercapto group or a disulfide bond.
【0032】本発明の一般式(1)の化合物は、例えば
特開昭61-213847号、同62-260153号、米国特許4,684,60
4号、特願昭63-98803号、米国特許3,379,529号、同3,62
0,746号、同4,377,634号、同4,332,878号、特開昭49-12
9536号、同56-153336号、同56-153342号、米国特許4,98
8,604号、同4,994,365号等に記載されている方法を利用
して合成できる。The compound of the general formula (1) of the present invention is, for example, disclosed in JP-A-61-213847, JP-A-62-260153 and US Pat. No. 4,684,60.
4, Japanese Patent Application No. 63-98803, U.S. Patents 3,379,529, 3,62
0,746, 4,377,634, 4,332,878, JP-A-49-12
9536, 56-153336, 56-153342, U.S. Pat.
It can be synthesized by utilizing the method described in No. 8,604, No. 4,994,365 and the like.
【0033】以下に本発明に用いられる化合物を列記す
るが、本発明はこれに限定されるものではない。The compounds used in the present invention are listed below, but the present invention is not limited thereto.
【0034】[0034]
【化4】 [Chemical 4]
【0035】[0035]
【化5】 [Chemical 5]
【0036】[0036]
【化6】 [Chemical 6]
【0037】[0037]
【化7】 [Chemical 7]
【0038】[0038]
【化8】 [Chemical 8]
【0039】[0039]
【化9】 [Chemical 9]
【0040】一般式(1)の化合物の添加量としては、
ハロゲン化銀1モル当たり1×10-6〜5×10-2モル含有
されるのが好ましく、特に1×10-5〜2×10-2モルの範
囲が好ましい。The amount of the compound of the general formula (1) added is
It is preferably contained in an amount of 1 × 10 −6 to 5 × 10 −2 mol, and particularly preferably 1 × 10 −5 to 2 × 10 −2 mol, per mol of silver halide.
【0041】一般式(1)の化合物は、適当な水混和性
有機溶媒、例えばアルコール類(メタノール、エタノー
ル、プロパノール、弗化アルコール等)、ケトン類(ア
セトン、メチルエチルケトン等)、ジメチルホルムアミ
ド、ジメチルスルホキシド、メチルセロソルブ等に溶解
して用いることができる。又、既に良く知られている乳
化分散法によって、ジブチルフタレート、トリクレジル
ホスフェート、グリセリルトリアセテートあるいはジエ
チルフタレートなどのオイル、酢酸エチルやシクロヘキ
サノンなどの補助溶媒を用いて溶解し、機械的に乳化分
散物を作成して用いることもできる。あるいは固体分散
法として知られている方法によって、レドックス化合物
の粉末を水の中にボールミル、コロイドミル、あるいは
超音波によって分散して用いることもできる。The compound of the general formula (1) is a suitable water-miscible organic solvent such as alcohols (methanol, ethanol, propanol, fluoroalcohol, etc.), ketones (acetone, methylethylketone, etc.), dimethylformamide, dimethylsulfoxide. , Dissolved in methyl cellosolve and the like. Also, by well-known emulsification dispersion method, dibutyl phthalate, tricresyl phosphate, oil such as glyceryl triacetate or diethyl phthalate, and dissolved using an auxiliary solvent such as ethyl acetate or cyclohexanone, mechanically emulsified dispersion Can also be created and used. Alternatively, the redox compound powder may be dispersed in water by a ball mill, a colloid mill, or ultrasonic waves according to a method known as a solid dispersion method.
【0042】次に本発明で用いられる脱塩法を説明す
る。ハロゲン化銀乳剤は、一般的に物理熟成後、不要の
塩類を除去するため脱塩する。脱塩の方法としては、ゲ
ル化、透析による方法、あるいは水溶性硫酸等による塩
析法があるが、本発明では変性ゼラチン剤を用いる方法
によりその目的を達成した。Next, the desalting method used in the present invention will be described. The silver halide emulsion is generally desalted after physical ripening in order to remove unnecessary salts. As a desalting method, there are a gelation method, a dialysis method, and a salting-out method using water-soluble sulfuric acid. In the present invention, the object was achieved by a method using a modified gelatin agent.
【0043】変性ゼラチン剤を用いて脱塩する理論は以
下のように考えられている。即ちゼラチンに二塩基酸無
水物を反応させると、ゼラチンのアミノ基と反応し、Ge
l-NH-CO-R-COOHの形となり、アミノ基が消え、酸基が1
個増す。このようなゼラチンは酸基のpK値以下にpHを下
げると酸基は非解離型になり、アミノ基は反応して大部
分がなくなり、水溶性が減少し、ゼラチンを凝集するこ
とができる。本発明において使用されるかかる変性ゼラ
チンとは、ゼラチン分子のアミノ基の少なくとも50%以
上がアシル、カルバモイル、スルホニル、チオカルバモ
イル、アルキル及び/又はアリールの各基で置換された
変性ゼラチンである。The theory of desalting using a modified gelatin agent is considered as follows. That is, when dibasic acid anhydride is reacted with gelatin, it reacts with the amino group of gelatin and Ge
l-NH-CO-R-COOH is formed, the amino group disappears, and the acid group becomes 1
Add more. When the pH of such gelatin is lowered below the pK value of the acid group, the acid group becomes a non-dissociative type, the amino group reacts with most of it, water solubility is reduced, and gelatin can be aggregated. The modified gelatin used in the present invention is a modified gelatin in which at least 50% or more of amino groups of gelatin molecules are substituted with acyl, carbamoyl, sulfonyl, thiocarbamoyl, alkyl and / or aryl groups.
【0044】ゼラチンのアミノ基に対する置換基例は、
米国特許2,691,582号、同2,614,928号、同2,525,753号
に記載がある。Examples of substituents for the amino group of gelatin are:
U.S. Pat. Nos. 2,691,582, 2,614,928 and 2,525,753 are described.
【0045】有用な置換基としては、(1)アルキルア
シル,アリールアシル,アセチル及び置換,無置換のベ
ンゾイル等のアシル基、(2)アルキルカルバモイル,
アリールカルバモイル等のカルバモイル基、(3)アル
キルスルホニル,アリールスルホニル等のスルホニル
基、(4)アルキルチオカルバモイル,アリールチオカ
ルバモイル等のチオカルバモイル基、(5)炭素数1〜
18の直鎖,分岐のアルキル基、(6)置換,無置換のフ
ェニル,ナフチル及びピリジル,フリル等の芳香族複素
環等のアリール基が挙げられる。Examples of useful substituents include (1) alkylacyl, arylacyl, acetyl and acyl groups such as substituted and unsubstituted benzoyl, (2) alkylcarbamoyl,
Carbamoyl groups such as arylcarbamoyl, (3) sulfonyl groups such as alkylsulfonyl, arylsulfonyl, etc., (4) thiocarbamoyl groups such as alkylthiocarbamoyl, arylthiocarbamoyl, etc., (5) C1-C1
18 straight-chain or branched alkyl groups, and (6) substituted or unsubstituted phenyl, naphthyl and aryl groups such as pyridyl and furyl aromatic heterocycles.
【0046】好ましい変性ゼラチンとしては、アシル基
−COR1、またはカルバモイル基−CON(R1)R2
により置換されたゼラチンである。Preferred modified gelatin is an acyl group --COR 1 or a carbamoyl group --CON (R 1 ) R 2
It is gelatin replaced by.
【0047】前記R1は置換、無置換の脂肪族基(例え
ば炭素数1〜18のアルキル基、アリル基)、アリール基
またはアラルキル基(例えばフェネチル基)であり、R
2は水素原子、脂肪族基、アリール基、またはアラルキ
ル基である。R 1 is a substituted or unsubstituted aliphatic group (eg, an alkyl group having 1 to 18 carbon atoms, an allyl group), an aryl group or an aralkyl group (eg, a phenethyl group), and R 1
2 is a hydrogen atom, an aliphatic group, an aryl group, or an aralkyl group.
【0048】特に好ましいものは、R1がアリール基、
R2が水素原子の場合である。Particularly preferred is when R 1 is an aryl group,
This is the case where R 2 is a hydrogen atom.
【0049】以下に、変性ゼラチンのアミノ基置換基の
具体例を例示するが、本発明はこれに限定されるもので
はない。Specific examples of the amino group substituent of modified gelatin are shown below, but the present invention is not limited thereto.
【0050】[0050]
【化10】 [Chemical 10]
【0051】変性ゼラチンはハロゲン化銀乳剤中の脱塩
工程以前で用いることができるが、好ましくは脱塩工程
時である。また変性ゼラチンの添加量は特に制限はない
が、脱塩に際して使用する場合、脱塩後、保護コロイド
として含まれている物質(好ましくはゼラチン)の0.1
〜10倍量(重量)が適当であり、特に好ましくは0.2〜
5倍量(重量)である。The modified gelatin can be used before the desalting step in the silver halide emulsion, but is preferably during the desalting step. The amount of modified gelatin added is not particularly limited, but when used for desalting, it is 0.1% of the substance (preferably gelatin) contained as a protective colloid after desalting.
~ 10 times the amount (weight) is suitable, and particularly preferably 0.2 ~
It is 5 times (weight).
【0052】変性ゼラチンはハロゲン化銀粒子を保護コ
ロイドと共に凝集せしめるものであるが、該変性ゼラチ
ンを添加した後、pH調整してハロゲン化銀乳剤を凝集せ
しめるようにすることができる。凝析を行わせるpHとし
ては、5.5以下、特に4.8〜2が好ましい。pH調整に用い
る酸には特に制限はないが、酢酸、クエン酸、サリチル
酸等の有機酸や、塩酸、硝酸、硫酸、燐酸等の無機酸は
好ましく用いられる。変性ゼラチンに併用して重金属イ
オン例えばマグネシウムイオン、カドミウムイオン、鉛
イオン、ジルコニウムイオン等を添加してもよい。The modified gelatin coagulates the silver halide grains together with the protective colloid. After the modified gelatin is added, the pH may be adjusted to coagulate the silver halide emulsion. The pH for coagulation is preferably 5.5 or less, particularly 4.8 to 2. The acid used for pH adjustment is not particularly limited, but organic acids such as acetic acid, citric acid and salicylic acid, and inorganic acids such as hydrochloric acid, nitric acid, sulfuric acid and phosphoric acid are preferably used. Heavy metal ions such as magnesium ions, cadmium ions, lead ions and zirconium ions may be added in combination with the modified gelatin.
【0053】溶存物除去(脱塩)は1回でもよいが、数
回繰返してもよい。数回繰返す場合、除去の度に変性ゼ
ラチンを添加してもよいが、最初に変性ゼラチンを添加
しただけでもよい。The removal of dissolved substances (desalting) may be carried out once, or may be repeated several times. When it is repeated several times, modified gelatin may be added each time it is removed, or modified gelatin may be added first.
【0054】本発明において、ヒドラジン誘導体として
前記一般式(1)を含有するので、特開平4-98239号7
頁左下欄1行目〜26頁左下欄11行目に記載されている造
核促進化合物の少なくとも1種をハロゲン化銀乳剤層及
び/又は支持体上のハロゲン化銀乳剤層側にある非感光
性層に含むことが好ましい。In the present invention, since the above-mentioned general formula (1) is contained as a hydrazine derivative, JP-A-4-98239 7
At least one of the nucleation accelerating compounds described on page 26, lower left column, line 1 to page 26, lower left column, line 11 is located on the silver halide emulsion layer and / or the silver halide emulsion layer side of the support and is not exposed to light. It is preferable to include it in the functional layer.
【0055】造核促進剤としては下記一般式(2)また
は(3)に示すものが挙げられる。Examples of the nucleation accelerator include those represented by the following general formula (2) or (3).
【0056】[0056]
【化11】 [Chemical 11]
【0057】一般式(2)において、R21、R22、R23
は水素原子、アルキル基、置換アルキル基、アルケニル
基、置換アルケニル基、アルキニル基、アリール基、置
換アリール基を表す。R21、R22、R23で環を形成する
ことができる。特に好ましくは脂肪族の3級アミン化合
物である。これらの化合物は分子中に耐拡散性基または
ハロゲン化銀吸着基を有するものが好ましい。耐拡散性
を有するためには分子量100以上の化合物が好ましく、
さらに好ましくは分子量300以上である。また、好まし
い吸着基としては含窒素複素環、メルカプト基、チオエ
ーテル基、チオン基、チオウレア基などが挙げられる。In the general formula (2), R 21 , R 22 , R 23
Represents a hydrogen atom, an alkyl group, a substituted alkyl group, an alkenyl group, a substituted alkenyl group, an alkynyl group, an aryl group or a substituted aryl group. A ring can be formed by R 21 , R 22 , and R 23 . Particularly preferred are aliphatic tertiary amine compounds. These compounds preferably have a diffusion resistant group or a silver halide adsorption group in the molecule. A compound having a molecular weight of 100 or more is preferable to have diffusion resistance,
More preferably, the molecular weight is 300 or more. Further, preferable adsorption groups include nitrogen-containing heterocycles, mercapto groups, thioether groups, thione groups, thiourea groups and the like.
【0058】具体的化合物としては以下に示すものが挙
げられる。Specific compounds include those shown below.
【0059】[0059]
【化12】 [Chemical 12]
【0060】[0060]
【化13】 [Chemical 13]
【0061】[0061]
【化14】 [Chemical 14]
【0062】一般式(3)において、Arは置換または
無置換のアリール基、複素芳香環を表す。R31は置換さ
れていてもよいアルキル基、アルケニル基、アルキニル
基、アリール基を表す。これらの化合物は分子内に耐拡
散性基またはハロゲン化銀吸着基を有するものが好まし
い。好ましい耐拡散基をもたせるためには分子量120以
上が好ましく、特に好ましくは300以上である。In the general formula (3), Ar represents a substituted or unsubstituted aryl group or heteroaromatic ring. R 31 represents an optionally substituted alkyl group, alkenyl group, alkynyl group or aryl group. These compounds preferably have a diffusion resistant group or a silver halide adsorption group in the molecule. In order to have a preferable diffusion resistant group, the molecular weight is preferably 120 or more, particularly preferably 300 or more.
【0063】具体的化合物としては以下に示すものが挙
げられる。Specific compounds include those shown below.
【0064】[0064]
【化15】 [Chemical 15]
【0065】本発明の一般式(2)又は(3)で表され
る化合物は、写真感光材料中に含有させることが好まし
い。写真感光材料中に含有させる場合、ハロゲン化銀乳
剤層又は隣接する親水性コロイド層に含有させる。特に
好ましくは本発明のヒドラジン誘導体を含有する層に含
有させることである。The compound represented by formula (2) or (3) of the present invention is preferably contained in the photographic light-sensitive material. When incorporated in a photographic light-sensitive material, it is incorporated in a silver halide emulsion layer or an adjacent hydrophilic colloid layer. Particularly preferably, it is contained in the layer containing the hydrazine derivative of the present invention.
【0066】本発明の感光材料は、支持体上に少なくと
も1層の導電性層を設けることが好ましい。導電性層を
形成する代表的方法としては、水溶性導電性ポリマー、
疎水性ポリマー、硬化剤を用いて形成する方法と金属酸
化物を用いて形成する方法がある。これらの方法につい
ては例えば特開平3-265842号第5頁右下欄1行目〜第15
頁左上欄6行目記載の方法を用いることができる。本発
明に使用されるハロゲン化銀乳剤(以下ハロゲン化銀乳
剤乃至単に乳剤などと称する。)には、ハロゲン化銀と
して例えば臭化銀、沃臭化銀、沃塩化銀、塩臭化銀、及
び塩化銀等の通常のハロゲン化銀乳剤に使用される任意
のものを用いることができるが、好ましくは、塩臭化
銀、臭化銀又は4モル%以下の沃化銀を含む沃臭化銀又
は塩沃臭化銀である。The light-sensitive material of the present invention preferably has at least one conductive layer on the support. As a typical method for forming the conductive layer, a water-soluble conductive polymer,
There are a method of forming using a hydrophobic polymer and a curing agent and a method of forming using a metal oxide. For these methods, see, for example, JP-A-3-265842, page 5, lower right column, line 1 to line 15.
The method described in the upper left column of the page and the sixth line can be used. The silver halide emulsion used in the present invention (hereinafter referred to as a silver halide emulsion or simply an emulsion) includes, for example, silver bromide, silver iodobromide, silver iodochloride, silver chlorobromide, And any of those used for ordinary silver halide emulsions such as silver chloride can be used, but silver chlorobromide, silver bromide or iodobromide containing 4 mol% or less of silver iodide is preferable. It is silver or silver chloroiodobromide.
【0067】また(粒径の標準偏差)/(粒径の平均値)
×100で表される変動係数15%以下である単分散粒子が
好ましい。[(Standard deviation of particle size)] / (average value of particle size)
Monodisperse particles represented by × 100 and having a coefficient of variation of 15% or less are preferable.
【0068】本発明の感光材料は、乳剤層側のゼラチン
量の総和が3.5g/m2以下であることが特徴である。乳剤
層側とは、支持体に対してハロゲン化銀乳剤を有する層
の側を言い、ハロゲン化銀乳剤層、酸化されることによ
り現像抑制化合物を放出しうるレドックス化合物を含む
親水性コロイド層及びその他の層を含む。その他の層と
しては、例えば乳剤保護層、アンチハレーション層、U
V吸収層、中間層、導電層等が挙げられる。ハロゲン化
銀乳剤層、レドックス化合物を含む親水性コロイド層及
びその他の層に含まれるゼラチン量の合計が3.5g/m2以
下であるが、好ましくは0.5〜3.3g/m2である。The light-sensitive material of the present invention is characterized in that the total amount of gelatin on the emulsion layer side is 3.5 g / m 2 or less. The emulsion layer side means the side of the layer having a silver halide emulsion with respect to the support, the silver halide emulsion layer, the hydrophilic colloid layer containing a redox compound capable of releasing a development inhibitor compound when oxidized, and Including other layers. Other layers include, for example, emulsion protective layer, antihalation layer, U
Examples thereof include a V absorption layer, an intermediate layer and a conductive layer. Silver halide emulsion layers, although the total amount of gelatin contained in the hydrophilic colloid layer and other layers containing a redox compound is 3.5 g / m 2 or less, preferably 0.5~3.3g / m 2.
【0069】本発明のハロゲン化銀乳剤には当業界公知
の各種技術、添加剤等を用いることができる。例えば、
本発明で用いるハロゲン化銀写真乳剤及びバッキング層
には、各種の化学増感剤、色調剤、硬膜剤、界面活性
剤、増粘剤、可塑剤、スベリ剤、現像抑制剤、紫外線吸
収剤、イラジェーション防止剤染料、重金属、マット剤
等を各種の方法で更に含有させることができる。又、本
発明ハロゲン化銀写真乳剤及びバッキング層中にはポリ
マーラテックスを含有させることができる。Various techniques and additives known in the art can be used in the silver halide emulsion of the present invention. For example,
The silver halide photographic emulsion and backing layer used in the present invention include various chemical sensitizers, toning agents, hardeners, surfactants, thickeners, plasticizers, sliding agents, development inhibitors, and ultraviolet absorbers. , An anti-irradiation dye, a heavy metal, a matting agent and the like can be further contained by various methods. Further, a polymer latex can be contained in the silver halide photographic emulsion of the present invention and the backing layer.
【0070】これらの添加剤は、より詳しくは、リサー
チディスクロージャ第176巻Item/7643(1978年12月)お
よび同187巻Item/8716(1979年11月)に記載されてお
り、その該当個所を下記にまとめて示した。These additives are described in more detail in Research Disclosure Vol. 176 Item / 7643 (December 1978) and Vol. 187 Item / 8716 (November 1979). It is summarized below.
【0071】 添加剤種類 RD/7643 RD/8716 1.化学増感剤 23頁 648頁右欄 2.感度上昇剤 同上 3.分光増感剤 23〜24頁 648頁右欄〜 強色増感剤 649頁右欄 4.増白剤 24頁 5.かぶり防止剤および安定剤 24〜25頁 649頁右欄 6.光吸収剤、フイルター染料 25〜26頁 649頁右欄〜 紫外線吸収剤 650頁左欄 7.ステイン防止剤 25頁右欄 650頁左〜右欄 8.色素画像安定剤 25頁 9.硬膜剤 26頁 651頁左欄 10.バインダー 26頁 同上 11.可塑剤、潤滑剤 27頁 650頁右欄 12.塗布助剤、表面活性剤 26〜27頁 同上 13.スタチック防止剤 27頁 同上 本発明のハロゲン化銀写真感光材料に用いることができ
る支持体としては、酢酸セルロース、硝酸セルロース、
ポリエチレンテレフタレートのようなポリエステル、ポ
リエチレンのようなポリオレフィン、ポリスチレン、バ
ライタ紙、ポリオレフィンを塗布した紙、ガラス、金属
等を挙げることができる。これらの支持体は必要に応じ
て下地加工が施される。Additive Type RD / 7643 RD / 8716 1. Chemical sensitizer Page 23 Page 648 Right column 2. Sensitivity enhancer Same as above 3. Spectral sensitizer, pages 23 to 24, page 648, right column to supersensitizer, page 649, right column 4. Whitening agent Page 24 5. Antifoggants and stabilizers 24 to 25 pages 649 right column 6. Light absorbers, filter dyes 25 to 26 pages 649 right column ~ ultraviolet absorbers 650 page left column 7. Anti-stain agent page 25 right column page 650 left-right column 8. Dye image stabilizer page 25 9. Hardener 26 pages 651 left column 10. Binder page 26 Same as above 11. Plasticizer, lubricant Page 27 Page 650 Right column 12. Coating aid, surface active agent, pages 26 to 27, same as above 13. Antistatic Agent Page 27 As above As a support which can be used in the silver halide photographic light-sensitive material of the present invention, cellulose acetate, cellulose nitrate,
Examples thereof include polyester such as polyethylene terephthalate, polyolefin such as polyethylene, polystyrene, baryta paper, paper coated with polyolefin, glass and metal. These supports are subjected to a surface treatment if necessary.
【0072】本発明に係るハロゲン化銀写真感光材料は
露光後種々の方法、例えば通常用いられる方法により現
像処理することができる。The silver halide photographic light-sensitive material according to the present invention can be developed after exposure by various methods, for example, a commonly used method.
【0073】本発明において用いることのできる現像主
薬としては、ジヒドロキシベンゼン類(例えばハイドロ
キノン、クロルハイドロキノン、ブロムハイドロキノ
ン、2,3-ジクロロハイドロキノン、メチルハイドロキノ
ン、イソプロピルハイドロキノン、2,5-ジメチルハイド
ロキノン等)、3-ピラゾリドン類(例えば1-フェニル-3
-ピラゾリドン、1-フェニル-4-メチル-3-ピラゾリド
ン、1-フェニル-4,4-ジメチル-3-ピラゾリドン、1-フェ
ニル-4-エチル-3-ピラゾリドン、1-フェニル-5-メチル-
3-ピラゾリドン等)、アミノフェノール類(例えばo-ア
ミノフェノール、p-アミノフェノール、N-メチル-o-ア
ミノフェノール、N-メチル-p-アミノフェノール、2,4-
ジアミノフェノール等)、ピロガロール、アスコルビン
酸、1-アリール-3-ピラゾリン類(例えば1-(p-ヒドロキ
シフェニル)-3-アミノピラゾリン、1-(p-メチルアミノ
フェニル)-3-アミノピラゾリン、1-(p-アミノフェニル)
-3-アミノピラゾリン、1-(p-アミノ-N-メチルフェニル)
-3-アミノピラゾリン等)などを、単独もしくは組み合
わせて使用することができるが、3-ピラゾリドン類とジ
ヒドロキシベンゼン類との組合せ、又はアミノフェノー
ル類とジヒドロキシベンゼン類との組合せで使用するこ
とが好ましい。現像主薬は、通常0.01〜1.4モル/リッ
トルの量で用いられるのが好ましい。The developing agents that can be used in the present invention include dihydroxybenzenes (for example, hydroquinone, chlorohydroquinone, bromohydroquinone, 2,3-dichlorohydroquinone, methylhydroquinone, isopropylhydroquinone, 2,5-dimethylhydroquinone, etc.), 3-pyrazolidones (eg 1-phenyl-3
-Pyrazolidone, 1-phenyl-4-methyl-3-pyrazolidone, 1-phenyl-4,4-dimethyl-3-pyrazolidone, 1-phenyl-4-ethyl-3-pyrazolidone, 1-phenyl-5-methyl-
3-pyrazolidone, etc., aminophenols (eg o-aminophenol, p-aminophenol, N-methyl-o-aminophenol, N-methyl-p-aminophenol, 2,4-
Diaminophenol, etc.), pyrogallol, ascorbic acid, 1-aryl-3-pyrazolines (eg 1- (p-hydroxyphenyl) -3-aminopyrazoline, 1- (p-methylaminophenyl) -3-aminopyrazoline , 1- (p-aminophenyl)
-3-aminopyrazoline, 1- (p-amino-N-methylphenyl)
-3-aminopyrazoline etc.) can be used alone or in combination, but it is preferable to use them in combination with 3-pyrazolidones and dihydroxybenzenes or with aminophenols and dihydroxybenzenes. preferable. The developing agent is usually preferably used in an amount of 0.01 to 1.4 mol / liter.
【0074】本発明においては、銀スラッジ防止剤とし
て特公昭62-4702号、特開平3-51844号、同4-26838号、
同4-362942号、同1-319031号、更に好ましくは次の一般
式(VI)又は(VII)で表される化合物を用いることが
できる。In the present invention, as a silver sludge-preventing agent, JP-B-62-4702, JP-A-3-51844, JP-A-4-26838,
4-362942 and 1-319031, more preferably compounds represented by the following general formula (VI) or (VII) can be used.
【0075】[0075]
【化16】 [Chemical 16]
【0076】式中、R11、R12は水素原子、アルキル
基、アリール基、アラルキル基、ヒドロキシ基、メルカ
プト基、カルボキシ基、スルホ基、ホスホノ基、アミノ
基、ニトロ基、シアノ基、ハロゲン原子、アルコキシカ
ルボニル基、アリールオキシカルボニル基、カルバモイ
ル基、スルファモイル基、アルコキシ基を表す。またR
11、R12が連結して環構造を形成しても良い。In the formula, R 11 and R 12 are hydrogen atom, alkyl group, aryl group, aralkyl group, hydroxy group, mercapto group, carboxy group, sulfo group, phosphono group, amino group, nitro group, cyano group, halogen atom. , An alkoxycarbonyl group, an aryloxycarbonyl group, a carbamoyl group, a sulfamoyl group, and an alkoxy group. Also R
11 and R 12 may combine to form a ring structure.
【0077】又一般式(VII)のM1、M2は水素原子、N
a、K、NH4を表し、X1は水素原子又はハロゲン原子を
表す。In the general formula (VII), M 1 and M 2 are hydrogen atoms and N
represents a, K, NH 4 , and X 1 represents a hydrogen atom or a halogen atom.
【0078】以下に一般式(VI)及び(VII)で示され
る化合物の代表例を示す。Typical examples of the compounds represented by formulas (VI) and (VII) are shown below.
【0079】[0079]
【化17】 [Chemical 17]
【0080】[0080]
【化18】 [Chemical 18]
【0081】[0081]
【化19】 [Chemical 19]
【0082】[0082]
【化20】 [Chemical 20]
【0083】本発明において保恒剤として用いる亜硫酸
塩、メタ重亜硫酸塩としては、亜硫酸ナトリウム、亜硫
酸カリウム、亜硫酸アンモニウム、メタ重亜硫酸ナトリ
ウムなどがある。亜硫酸塩は0.25モル/リットル以上が
好ましい。特に好ましくは0.4モル/リットル以上であ
る。Examples of sulfites and metabisulfites used as preservatives in the present invention include sodium sulfite, potassium sulfite, ammonium sulfite, and sodium metabisulfite. The sulfite is preferably 0.25 mol / liter or more. It is particularly preferably 0.4 mol / liter or more.
【0084】現像液には、その他必要によりアルカリ剤
(水酸化ナトリウム、水酸化カリウム等)、pH緩衝剤
(例えば炭酸塩、燐酸塩、硼酸塩、硼酸、酢酸、枸櫞
酸、アルカノールアミン等)、溶解助剤(例えばポリエ
チレングリコール類、それらのエステル、アルカノール
アミン等)、増感剤(例えばポリオキシエチレン類を含
む非イオン界面活性剤、四級アンモニウム化合物等)、
界面活性剤、消泡剤、カブリ防止剤(例えば臭化カリウ
ム、臭化ナトリウムの如きハロゲン化物、ニトロベンズ
インダゾール、ニトロベンズイミダゾール、ベンゾトリ
アゾール、ベンゾチアゾール、テトラゾール類、チアゾ
ール類等)、キレート化剤(例えばエチレンジアミン四
酢酸又はそのアルカリ金属塩、ニトリロ三酢酸塩、ポリ
燐酸塩等)、現像促進剤(例えば米国特許2,304,025
号、特公昭47-45541号に記載の化合物等)、硬膜剤(例
えばグルタルアルデヒド又は、その重亜硫酸塩付加物
等)、あるいは消泡剤などを添加することができる。現
像液のpHは9.5〜12.0に調整されることが好ましい。In the developing solution, if necessary, an alkaline agent (sodium hydroxide, potassium hydroxide, etc.), a pH buffering agent (eg, carbonate, phosphate, borate, boric acid, acetic acid, oxalic acid, alkanolamine, etc.) , Solubilizers (eg polyethylene glycols, their esters, alkanolamines, etc.), sensitizers (eg nonionic surfactants containing polyoxyethylenes, quaternary ammonium compounds etc.),
Surfactants, antifoaming agents, antifoggants (for example, halides such as potassium bromide and sodium bromide, nitrobenzindazole, nitrobenzimidazole, benzotriazole, benzothiazole, tetrazoles, thiazoles, etc.), chelating agents (For example, ethylenediaminetetraacetic acid or its alkali metal salt, nitrilotriacetate, polyphosphate, etc.), development accelerator (for example, US Pat. No. 2,304,025)
Nos. 5,047,456 and Japanese Patent Publication No. 47-45541), a hardener (eg glutaraldehyde or its bisulfite adduct), an antifoaming agent and the like can be added. The pH of the developer is preferably adjusted to 9.5-12.0.
【0085】本発明の化合物は現像処理の特殊な形式と
して、現像主薬を感光材料中、例えば乳剤層中に含み、
感光材料をアルカリ水溶液中で処理して現像を行わせる
アクチベータ処理液に用いてもよい。このような現像処
理は、チオシアン酸塩による銀塩安定化処理と組み合わ
せて、感光材料の迅速処理の方法の一つとして利用され
ることが多く、そのような処理液に適用も可能である。
このような迅速処理の場合、本発明の効果が特に大き
い。The compounds of the present invention, as a special form of development processing, include a developing agent in a light-sensitive material, for example, an emulsion layer,
You may use it for the activator processing liquid which makes a photosensitive material process in alkaline aqueous solution and develops. Such a developing treatment is often used as one of the rapid processing methods for a light-sensitive material in combination with a silver salt stabilizing treatment with a thiocyanate, and can be applied to such a processing solution.
In the case of such rapid processing, the effect of the present invention is particularly great.
【0086】定着液としては一般に用いられる組成のも
のを用いることができる。定着液は一般に定着剤とその
他から成る水溶液であり、pHは通常3.8〜5.8である。定
着剤としては、チオ硫酸ナトリウム、チオ硫酸カリウ
ム、チオ硫酸アンモニウム等のチオ硫酸塩、チオシアン
酸ナトリウム、チオシアン酸カリウム、チオシアン酸ア
ンモニウム等のチオシアン酸塩の他、可溶性安定銀錯塩
を生成し得る有機硫黄化合物で定着剤として知られてい
るものを用いることができる。As the fixing solution, those having a generally used composition can be used. The fixer is generally an aqueous solution containing a fixer and others, and the pH is usually 3.8 to 5.8. Examples of the fixing agent include thiosulfates such as sodium thiosulfate, potassium thiosulfate and ammonium thiosulfate, thiocyanates such as sodium thiocyanate, potassium thiocyanate and ammonium thiocyanate, and organic sulfur capable of forming a soluble stable silver complex salt. A compound known as a fixing agent can be used.
【0087】定着液には、硬膜剤として作用する水溶性
アルミニウム塩、例えば塩化アルミニウム、硫酸アルミ
ニウム、カリ明礬などを加えることができる。A water-soluble aluminum salt acting as a hardening agent, for example, aluminum chloride, aluminum sulfate, potassium alum and the like can be added to the fixing solution.
【0088】定着液には、所望により、保恒剤(例えば
亜硫酸塩、重亜硫酸塩)、pH緩衡剤(例えば酢酸)、pH
調整剤(例えば硫酸)、硬水軟化能のあるキレート剤等
の化合物を含むことができる。If desired, the fixer may contain preservatives (eg, sulfite, bisulfite), pH buffer (eg, acetic acid), and pH.
A compound such as a modifier (for example, sulfuric acid), a chelating agent having the ability to soften water, or the like can be included.
【0089】現像液は、固定成分の混合物でも、グリコ
ールやアミンを含む有機性水溶液でも、粘度の高い半練
り状態の粘稠液体でもよい。又、使用時に希釈して用い
てもよいし、あるいはそのまま用いてもよい。The developer may be a mixture of fixed components, an organic aqueous solution containing glycol or amine, or a semi-kneaded viscous liquid having a high viscosity. Further, it may be diluted before use, or may be used as it is.
【0090】本発明の現像処理に際しては、現像温度を
20〜30℃の通常の温度範囲に設定することもできるし、
30〜40℃の高温処理の範囲に設定することもできる。In the development processing of the present invention, the development temperature is
It can be set to a normal temperature range of 20-30 ° C,
It can also be set to a high temperature treatment range of 30 to 40 ° C.
【0091】本発明による黒白感光材料は、自動現像機
を用いて処理されることが好ましい。その際に感光材料
の面積に比例した一定量の現像液を補充しながら処理さ
れる。その現像補充量は、廃液量を少なくするために1
m2当たり250cc以下である。好ましくは1m2当たり75〜2
00ccである。1m2当たり75cc未満の現像液補充量では減
感、軟調化等で満足な写真性能が得られない。The black-and-white light-sensitive material according to the present invention is preferably processed using an automatic processor. At that time, the processing is performed while replenishing a fixed amount of developing solution proportional to the area of the photosensitive material. The development replenishment amount is 1 in order to reduce the amount of waste liquid.
250cc or less per m 2 . Preferably 75 to 2 per m 2
It is 00cc. If the developer replenishment rate is less than 75 cc per m 2, desensitization, softening, etc. will not be possible to obtain satisfactory photographic performance.
【0092】本発明は現像時間短縮の要望から自動現像
機を用いて処理する時にフィルム先端が自動現像機に挿
入されてから乾燥ゾーンから出て来るまでの全処理時間
(Dry to Dry)が20〜60秒であることが好ましい。ここ
でいう全処理時間とは、黒白感光材料を処理するのに必
要な全工程時間を含み、具体的には処理に必要な、例え
ば現像、定着、漂白、水洗、安定化処理、乾燥等の工程
の時間を全て含んだ時間、つまりDry to Dryの時間であ
る。全処理時間が20秒未満では減感、軟調化等で満足な
写真性能が得られない。更に好ましくは全処理時間(Dr
y to Dry)が30〜60秒である。According to the present invention, the total processing time (Dry to Dry) from when the film front end is inserted into the automatic developing machine to when it comes out of the drying zone is 20 when the processing is performed by using the automatic developing machine in order to shorten the developing time. It is preferably -60 seconds. The total processing time referred to here includes all process times required for processing the black-and-white light-sensitive material, and specifically, for processing, for example, developing, fixing, bleaching, washing, stabilizing, drying, etc. It is the time that includes all the process time, that is, the time to Dry to Dry. If the total processing time is less than 20 seconds, satisfactory photographic performance cannot be obtained due to desensitization and softening. More preferably, the total processing time (Dr
y to Dry) is 30 to 60 seconds.
【0093】[0093]
【実施例】以下に本発明の具体的実施例を述べるが、本
発明の実施の態様はこれらに限定されない。EXAMPLES Specific examples of the present invention will be described below, but the embodiments of the present invention are not limited to these.
【0094】実施例1 (ハロゲン化銀乳剤Aの調製)同時混合法を用いて塩沃
臭化銀(銀1モル当たり塩化銀70モル%、沃化銀0.2モ
ル%)を調製した。この混合時にK3RhBr6を銀1モ
ル当たり8.1×10-8モル添加した。得られた乳剤は平均
粒径0.2μm、変動係数9%の立方体粒子からなる乳剤で
あった。Example 1 (Preparation of silver halide emulsion A) Silver chloroiodobromide (70 mol% of silver chloride and 0.2 mol% of silver iodide per 1 mol of silver) was prepared by the simultaneous mixing method. At the time of this mixing, K 3 RhBr 6 was added in an amount of 8.1 × 10 -8 mol per mol of silver. The obtained emulsion was an emulsion composed of cubic grains having an average grain size of 0.2 μm and a coefficient of variation of 9%.
【0095】(脱塩)得られた乳剤を苛性ソーダにより
pH5.5に調整した後、分割し、下記の条件でそれぞれ脱
塩を行った。(Desalting) The obtained emulsion was treated with caustic soda.
After adjusting to pH 5.5, the mixture was divided and desalted under the following conditions.
【0096】a)比較 分割した前記乳剤1.0Kg(含有率44g、オセインゼラチン
4g)に40℃で10%のオセインゼラチン溶液80mlを添加
し、10分間撹拌した後、5%のポリナフタレンスルホン
酸溶液90mlと20%硫酸マグネシウム90mlを添加した。5
分間の撹拌の後、静置し、乳剤を沈降させた後、上澄液
800mlを除去した。A) Comparative To 1.0 Kg of the divided emulsion (content: 44 g, 4 g of ossein gelatin), 80 ml of 10% ossein gelatin solution was added at 40 ° C., and after stirring for 10 minutes, 5% polynaphthalene sulfone was added. 90 ml of acid solution and 90 ml of 20% magnesium sulphate were added. 5
After stirring for 1 minute, let stand and allow the emulsion to settle, and then clear the supernatant.
800 ml was removed.
【0097】次いで、40℃の純水800mlを加え、5分間
撹拌した後、20%の硫酸マグネシウム溶液を30ml加え、
5分間撹拌後、静置し、上澄液800mlを除去した。20%
の硫酸マグネシウム30mlを用いて同様の脱塩操作をさら
にもう1回実施した。Then, 800 ml of pure water at 40 ° C. was added and stirred for 5 minutes, then 30 ml of 20% magnesium sulfate solution was added,
After stirring for 5 minutes, the mixture was left standing and 800 ml of the supernatant was removed. 20%
The same desalting operation was carried out once again using 30 ml of magnesium sulfate.
【0098】操作中の液温度は40℃を保持した。The liquid temperature during the operation was kept at 40 ° C.
【0099】得られた乳剤に下記化合物〔A〕、
〔B〕、〔C〕の混合物を含む10%のオセインゼラチン
溶液80mlを添加し、55℃にて再分散し、目的の乳剤を得
た。The following compound [A] was added to the obtained emulsion.
80 ml of a 10% ossein gelatin solution containing the mixture of [B] and [C] was added and redispersed at 55 ° C. to obtain a target emulsion.
【0100】[0100]
【化21】 [Chemical 21]
【0101】b)分割した前記乳剤1.0Kg(含有量44g、
オセインゼラチン4g)に40℃で10%の変成ゼラチン溶
液80mlを添加し、10分間撹拌した。その後5%の硫酸溶
液にてpHを4.4に調整し、5分間の撹拌の後、静置し、
乳剤を沈降させた後、上澄液800mlを除去した。B) 1.0 kg of the divided emulsion (content: 44 g,
80 ml of a 10% modified gelatin solution was added to ossein gelatin (4 g) at 40 ° C., and the mixture was stirred for 10 minutes. After that, adjust the pH to 4.4 with a 5% sulfuric acid solution, stir for 5 minutes, then let stand,
After allowing the emulsion to settle, 800 ml of the supernatant was removed.
【0102】次いで、40℃の純水800mlを加え、5%の
苛性ソーダにてpHを5.7に調整した後、5分間撹拌し分
散した。Next, 800 ml of pure water at 40 ° C. was added, the pH was adjusted to 5.7 with 5% caustic soda, and the mixture was stirred for 5 minutes for dispersion.
【0103】さらに続けて硫酸溶液と苛性ソーダ溶液を
用いて上記と同様の脱塩操作を2回実施した。Further, the desalting operation similar to the above was carried out twice using a sulfuric acid solution and a caustic soda solution.
【0104】操作中の液温度は40℃を保持した。The liquid temperature during the operation was kept at 40 ° C.
【0105】得られた乳剤にa)と同様の化合物
〔A〕、〔B〕、〔C〕の混合物を含む10%のオセイン
ゼラチン溶液80mlを添加し、55℃にて再分散し、目的の
乳剤を得た。a)、b)とも得られた乳剤の40℃でのpA
gは7.6であった。To the resulting emulsion was added 80 ml of a 10% ossein gelatin solution containing a mixture of the same compounds [A], [B] and [C] as in a), and redispersed at 55 ° C. An emulsion of was obtained. pA of the emulsions obtained in both a) and b) at 40 ° C
g was 7.6.
【0106】引き続き乳剤の温度を60℃に合わせ、pH
は5.58に、EAgは123mVに調整した。更に、HAuC
l4を銀1モル当たり2.2×10-5モル添加し、2分撹拌
後、S8を銀1モル当たり2.9×10-6モル添加し更に78分
間撹拌して化学増感を行った。化学増感終了時に下記の
化合物を添加した後、40℃に下げ、化学増感を完了し
た。表示した数字は銀1モル当たりの添加量を示す。Subsequently, the temperature of the emulsion was adjusted to 60 ° C. and the pH was adjusted.
Was adjusted to 5.58 and EAg was adjusted to 123 mV. Furthermore, HAuC
The chemical sensitization was carried out by adding l 4 of 2.2 × 10 -5 mol per mol of silver and stirring for 2 minutes, and then adding S 8 of 2.9 × 10 -6 mol per mol of silver and further stirring for 78 minutes. At the end of the chemical sensitization, the following compounds were added and then the temperature was lowered to 40 ° C. to complete the chemical sensitization. The number shown indicates the amount added per mol of silver.
【0107】 4-メチル-6-ヒドロキシ-1,3,3a,7-テトラザインデン 7.5×10-3モル 1-フェニル-5-メルカプトテトラゾール 3.5×10-4モル ゼラチン 28.5g (ハロゲン化銀写真感光材料の調製)特開平3-92175号
の実施例1記載のバッキング面側に帯電防止加工下引き
を施した厚さ100μmのポリエチレンテレフタレートフィ
ルムの一方の下塗層上に、下記処方(1)のハロゲン化
銀乳剤層をゼラチン量が2.6g/m2、銀量が3.3g/m2になる
様に塗設し、更にその上に下記処方(2)の乳剤保護層
をゼラチン量が1.0g/m2になる様に塗設し、又反対側の
もう一方の下塗層上には下記処方(3)に従ってバッキ
ング層をゼラチン量が2.7g/m2になる様に塗設し、更に
その上に下記処方(4)のバッキング保護層をゼラチン
量が1g/m2になる様に塗設して試料No.1〜18を得た。4-Methyl-6-hydroxy-1,3,3a, 7-tetrazaindene 7.5 × 10 -3 mol 1-phenyl-5-mercaptotetrazole 3.5 × 10 -4 mol Gelatin 28.5 g (silver halide photograph Preparation of Photosensitive Material) On one undercoat layer of 100 μm-thick polyethylene terephthalate film having a backing surface described in Example 1 of JP-A-3-92175 and antistatically processed undercoat, one of the following formulations (1) Is coated so that the amount of gelatin is 2.6 g / m 2 and the amount of silver is 3.3 g / m 2, and an emulsion protective layer of the following formulation (2) is applied on it with a gelatin amount of 1.0 g / m 2. g / m 2 and the backing layer on the other side on the other side according to the following prescription (3) so that the amount of gelatin is 2.7 g / m 2 . Further, a backing protective layer having the following formulation (4) was applied thereon so that the amount of gelatin would be 1 g / m 2 to obtain sample Nos. 1 to 18.
【0108】 処方(1)(ハロゲン化銀乳剤層組成) ゼラチン 2.6g/m2 ハロゲン化銀乳剤A 銀量 3.3g/m2 増感色素:A 6.0mg/m2 カブリ防止剤 1.7mg/m2 界面活性剤 100mg/m2 :S−1 0.64mg/m2 ラテックスポリマー: 0.5 g/m2 硬膜剤H−1 60mg/m2 本発明に係るヒドラジン誘導体(表1に示す) 2×10-4mol/Ag1mol 増核促進剤(2−9) 1×10-3mol/Ag1mol 表1に示す量Formulation (1) (Silver halide emulsion layer composition) Gelatin 2.6 g / m 2 Silver halide emulsion A Silver amount 3.3 g / m 2 Sensitizing dye: A 6.0 mg / m 2 Antifoggant 1.7 mg / m 2 surfactant 100mg / m 2: S-1 0.64mg / m 2 latex polymer: 0.5 g / m (shown in Table 1) a hydrazine derivative according to 2 hardener H-1 60 mg / m 2 present invention 2 × 10 -4 mol / Ag1mol Nucleation enhancer (2-9) 1 × 10 -3 mol / Ag1mol Amount shown in Table 1
【0109】[0109]
【化22】 [Chemical formula 22]
【0110】 処方(2)〔乳剤保護層組成〕 ゼラチン 1.0g/m2 界面活性剤:S−1 12mg/m2 界面活性剤:p-パーフロロノニルオキシ-ベンゼンスルフォン酸ソーダ 0.6mg/m2 マット剤:平均粒径3.5μmの単分散シリカ 22mg/m2 硬膜剤:1,3-ジビニルスルホニル-2-プロパノール 40mg/m2 処方(3)〔バッキング層組成〕Formulation (2) [emulsion protective layer composition] Gelatin 1.0 g / m 2 Surfactant: S-1 12 mg / m 2 Surfactant: p-perfluorononyloxy-sodium benzenesulfonate 0.6 mg / m 2 Matting agent: Monodisperse silica with an average particle size of 3.5 μm 22 mg / m 2 Hardener: 1,3-divinylsulfonyl-2-propanol 40 mg / m 2 Formulation (3) [Backing layer composition]
【0111】[0111]
【化23】 [Chemical formula 23]
【0112】 ゼラチン 2.7g/m2 界面活性剤:サポニン 133mg/m2 :S−1 6mg/m2 コロイダルシリカ 100mg/m2 硬膜剤:H−2 100mg/m2 [0112] Gelatin 2.7 g / m 2 Surfactant: Saponin 133mg / m 2: S-1 6mg / m 2 Colloidal silica 100 mg / m 2 Hardener: H-2 100mg / m 2
【0113】[0113]
【化24】 [Chemical formula 24]
【0114】 処方(4)〔バッキング保護層組成〕 ゼラチン 1g/m2 マット剤:平均粒径5.0μmの単分散 ポリメチルメタクリレート 50mg/m2 界面活性剤:ジ-(2-エチルヘキシル)-スルフォサクシネート- モノナトリウム塩 10mg/m2 硬膜剤:グリオキザール 5mg/m2 得られた試料を、ステップウェッジに密着しHe−Ne
レーザーの代用特性として633nmの干渉フィルターを通
して10-6秒の高照度露光を行った後、下記に示す組成の
現像液及び定着液を投入した、コニカ(株)社製迅速処
理用自動現像機GR−26SRにて下記の条件で現像処
理を行った。Formulation (4) [Composition of backing protective layer] Gelatin 1 g / m 2 Matting agent: Monodisperse with an average particle size of 5.0 μm Polymethyl methacrylate 50 mg / m 2 Surfactant: Di- (2-ethylhexyl) -sulfo Succinate-monosodium salt 10 mg / m 2 Hardener: Glyoxal 5 mg / m 2 The obtained sample was adhered to a step wedge and He-Ne
As a substitute for a laser, a high-intensity exposure for 10 -6 seconds was performed through an interference filter of 633 nm, and then a developing solution and a fixing solution having the compositions shown below were added, and an automatic developing machine GR for rapid processing manufactured by Konica Corporation A development process was carried out at -26SR under the following conditions.
【0115】現像液処方 亜硫酸ナトリウム 55g 炭酸カリウム 40g ハイドロキノン 24g 4-メチル-4-ヒドロキシメチル-1-フェニル-3-ピラゾリドン 0.9g 臭化ナトリウム 5g 5-メチルベンゾトリアゾール 0.13g 1-フェニル-5-メルカプトテトラゾール 0.02g ホウ酸 2.2g ジエチレングリコール 40g VI−5 100mg VII−2 300mg 水と水酸化カリウムを加えて 1l/pH10.5にする。 Developer Formulation Sodium sulfite 55g Potassium carbonate 40g Hydroquinone 24g 4-Methyl-4-hydroxymethyl-1-phenyl-3-pyrazolidone 0.9g Sodium bromide 5g 5-Methylbenzotriazole 0.13g 1-Phenyl-5-mercapto Tetrazole 0.02g Boric acid 2.2g Diethylene glycol 40g VI-5 100mg VII-2 300mg Add water and potassium hydroxide to make 1l / pH 10.5.
【0116】定着液処方 (組成A) チオ硫酸アンモニウム(72.5%W/V水溶液) 240ml 亜硫酸ナトリウム 17g 酢酸ナトリウム・3水塩 6.5g 硼酸 6.0g クエン酸ナトリウム・2水塩 2.0g (組成B) 純水(イオン交換水) 17ml 硫酸(50%W/Vの水溶液) 4.7g 硫酸アルミニウム(Al2O3換算含量が8.1%W/Vの水溶液) 26.5g 定着液の使用時に水500ml中に上記組成A、組成Bの順
に溶かし、1lに仕上げて用いた。この定着液のpHは酢
酸で4.8に調整した。 Fixer formulation (Composition A) Ammonium thiosulfate (72.5% W / V aqueous solution) 240 ml Sodium sulfite 17g Sodium acetate trihydrate 6.5g Boric acid 6.0g Sodium citrate dihydrate 2.0g (Composition B) Pure water (Ion-exchanged water) 17 ml Sulfuric acid (50% W / V aqueous solution) 4.7 g Aluminum sulfate (Al 2 O 3 equivalent content is 8.1% W / V aqueous solution) 26.5 g When using the fixer, the above composition A in 500 ml of water is used. , Composition B were melted in this order and finished to 1 l for use. The pH of this fixer was adjusted to 4.8 with acetic acid.
【0117】 (現像処理条件) (工程) (温度) (時間) 現像 38℃ 12秒 定着 35℃ 10秒 水洗 常温 10秒 乾燥 50℃ 13秒 合計 45秒 得られた現像処理済みの試料をコニカデジタル濃度計PD
A-65で測定し、試料No.1の濃度2.5における感度を100
とした相対感度で示し、更に濃度0.1と2.5との正接をも
ってガンマを表示した。6未満のガンマ値では使用不可
能であり、6以上10未満のガンマ値ではまだ不十分な硬
調性能である。ガンマ値10以上で超硬調な画像となり、
十分に実用可能となる。(Development processing conditions) (Process) (Temperature) (Time) Development 38 ° C 12 seconds Fixing 35 ° C 10 seconds Washing with water 10 seconds Normal temperature 10 seconds Drying 50 ° C 13 seconds Total 45 seconds Densitometer PD
Measured with A-65, the sensitivity of sample No. 1 at a concentration of 2.5 is 100.
The relative sensitivity is shown, and gamma is displayed with the tangent of the densities of 0.1 and 2.5. A gamma value of less than 6 cannot be used, and a gamma value of 6 or more and less than 10 still has insufficient hardness. With a gamma value of 10 or more, it becomes an ultra-high contrast image,
It is fully practical.
【0118】又、未露光部の黒ポツも40倍のルーペを使
って評価した。全く黒ポツの発生していないものを最高
ランク「5」とし、発生する黒ポツの発生度に応じてラ
ンク「4」、「3」、「2」、「1」とそのランクを順
次下げて評価するものとする。ランク「1」及び「2」
では黒ポツも実用上好ましくないレベルである。The black spots in the unexposed area were also evaluated with a magnifying glass of 40 times. The highest rank is "5" when black spots are not generated at all, and the rank is gradually lowered to "4", "3", "2", "1" according to the degree of occurrence of black spots. It shall be evaluated. Rank "1" and "2"
However, black spots are also levels that are not practically desirable.
【0119】残色については、露光をかけずに処理した
試料について4枚重ねをし、フィルムの残色を目視評価
した。5段階評価で、「5」は無色、「1」は強い残色
を示した。一般製版用として「3」を下廻る残色は実用
上好ましくないレベルである。その結果を表1に示し
た。Regarding the residual color, four sheets of the sample processed without exposure were piled up and the residual color of the film was visually evaluated. In the 5-level evaluation, "5" was colorless and "1" was a strong residual color. The residual color of less than "3" for general platemaking is a level that is not practically preferable. The results are shown in Table 1.
【0120】[0120]
【表1】 [Table 1]
【0121】表1の結果から、本発明の試料は高感度で
ガンマも高く黒ポツも良好で、かつ残色も少ないことが
分かる。From the results shown in Table 1, it can be seen that the samples of the present invention have high sensitivity, high gamma, good black spots, and little residual color.
【0122】[0122]
【発明の効果】本発明により、pH11.0未満の現像液で
処理しても感度を損なうことなく、硬調な写真特性を得
るとともに、網点画像中に発生する黒ポツを制御して高
コントラストな写真特性を得られ、しかも残色の少ない
ハロゲン化銀写真感光材料を提供することができた。According to the present invention, even if a developer having a pH of less than 11.0 is used, a high-contrast photographic characteristic can be obtained without deteriorating the sensitivity, and black spots generated in a halftone dot image can be controlled to obtain a high contrast. It was possible to provide a silver halide photographic light-sensitive material having excellent photographic characteristics and less residual color.
Claims (1)
銀乳剤層を有するハロゲン化銀写真感光材料において、
該乳剤の製造工程中、可溶性塩類を除去する脱塩処理が
変性ゼラチンにより凝集沈殿することにより行われ、か
つ該乳剤層又はその他の親水性コロイド層に下記一般式
(1)で表されるヒドラジン誘導体を含有することを特
徴とするハロゲン化銀写真感光材料。 【化1】 式中、R1は脂肪族基又は芳香族基を表し、更にその置
換基の一部として−(CH2CH2O)n−、−(CH2CH(CH3)O)n
−、−(CH2CH(OH)CH2O)n−(ただし、nは1以上の整
数)の部分構造を含有するか、4級アンモニウムカチオ
ンを含有する。又、R1はハロゲン化銀吸着基を含有し
てもよい。G1は−CO−基、−COCO−基、−CS−基、−C
(=NG2R2)−基、−SO−基、−SO2−基又は−P(=O)(G2R
2)−基を表す。G2は単なる結合手、−O−基、−S−基
又は−N(R2)−基を表し、R2は脂肪族基、芳香族基又は
水素原子を表す。分子内に複数のR2が存在する場合、
それらは同じでも異なってもよい。A1,A2の一方は水
素原子であり、他方は水素原子又はアシル基、アルキル
基又はアリールスルホニル基を表す。1. A silver halide photographic light-sensitive material having at least one silver halide emulsion layer on a support,
During the production process of the emulsion, desalting treatment for removing soluble salts is performed by coagulating and precipitating with modified gelatin, and the hydrazine represented by the following general formula (1) is added to the emulsion layer or other hydrophilic colloid layers. A silver halide photographic light-sensitive material containing a derivative. [Chemical 1] In the formula, R 1 represents an aliphatic group or an aromatic group, and-(CH 2 CH 2 O) n-,-(CH 2 CH (CH 3 ) O) n is used as a part of the substituent.
-, - (CH 2 CH ( OH) CH 2 O) n- ( where, n is an integer of 1 or more) or containing a partial structure of, containing quaternary ammonium cation. R 1 may also contain a silver halide adsorbing group. G 1 is -CO- group, -COCO- group, -CS- group, -C
(= NG 2 R 2) - group, -SO- group, -SO 2 - group or a -P (= O) (G 2 R
2 ) -represents a group. G 2 is a single bond, -O- group, -S- group, or -N (R 2) - represents a group, R 2 represents an aliphatic group, an aromatic group or a hydrogen atom. When multiple R 2's are present in the molecule,
They may be the same or different. One of A 1 and A 2 is a hydrogen atom, and the other is a hydrogen atom or an acyl group, an alkyl group or an arylsulfonyl group.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13600193A JPH06347932A (en) | 1993-06-07 | 1993-06-07 | Silver halide photographic sensitive material |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13600193A JPH06347932A (en) | 1993-06-07 | 1993-06-07 | Silver halide photographic sensitive material |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH06347932A true JPH06347932A (en) | 1994-12-22 |
Family
ID=15164875
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13600193A Pending JPH06347932A (en) | 1993-06-07 | 1993-06-07 | Silver halide photographic sensitive material |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH06347932A (en) |
-
1993
- 1993-06-07 JP JP13600193A patent/JPH06347932A/en active Pending
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