JPH06347848A - Second harmonic generation device - Google Patents
Second harmonic generation deviceInfo
- Publication number
- JPH06347848A JPH06347848A JP13702893A JP13702893A JPH06347848A JP H06347848 A JPH06347848 A JP H06347848A JP 13702893 A JP13702893 A JP 13702893A JP 13702893 A JP13702893 A JP 13702893A JP H06347848 A JPH06347848 A JP H06347848A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor laser
- diffraction grating
- harmonic generation
- beam splitter
- harmonic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Semiconductor Lasers (AREA)
Abstract
(57)【要約】
【目的】 第二高調波発生装置において回折格子と半導
体レーザだけで外部共振器を構成することで、安定な波
長制御性をもつ第二高調波発生装置を実現する。
【構成】 半導体レーザ1からの光をビームスプリッタ
2により分離し、一方を第二高調波素子4に導き、もう
一方で回折格子5と半導体レーザ1による外部共振器を
構成することで波長を選択する。半導体レーザ1から出
射された光はレンズ7で平行ビームとし30%以上を反
射分離するビームスプリッタ2からリトロー配置された
回折格子5に入射される。回折格子5の1次反射光が同
じ光路を通って半導体レーザ1に戻される。分極反転格
子12の周期に対応した位相整合波長に基本波波長が一
致するように回折格子5の角度を調整し、第二高調波6
を発生する。
(57) [Summary] [Object] To realize a second harmonic generation device having stable wavelength controllability by constructing an external resonator with only a diffraction grating and a semiconductor laser in the second harmonic generation device. [Structure] The light from the semiconductor laser 1 is separated by a beam splitter 2, one of them is guided to a second harmonic element 4, and the other is composed of a diffraction grating 5 and an external resonator composed of the semiconductor laser 1 to select a wavelength. To do. The light emitted from the semiconductor laser 1 is made into a parallel beam by the lens 7 and is incident on the diffraction grating 5 arranged in the Littrow arrangement from the beam splitter 2 which reflects and separates 30% or more. The primary reflected light of the diffraction grating 5 returns to the semiconductor laser 1 through the same optical path. The angle of the diffraction grating 5 is adjusted so that the fundamental wavelength matches the phase matching wavelength corresponding to the period of the polarization inversion grating 12, and the second harmonic wave 6
To occur.
Description
【0001】[0001]
【産業上の利用分野】レーザを基本波光源とする第二高
調波発生装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a second harmonic generation device using a laser as a fundamental wave light source.
【0002】[0002]
【従来の技術】特開平4ー107536に記載された第
二高調波発生装置においては第二高調波発生素子の位相
整合条件を満足させるために半導体レーザの基本波を選
択する手段として、回折格子と半導体レーザ間に第二高
調波発生素子を配している。この従来例を図2に示す。
半導体レーザ1の一方の端面を低反射面11として、半
導体レーザ1から出射したTEモ−ド光を1/2波長板
3でTMモ−ドに変換し、擬位相整合法による分極反転
領域12を持つ導波路型第二高調波発生素子4に結合さ
せ、その出射光をレンズ9により平行ビームとし回折格
子5に入射する。回折格子5からの反射光を第二高調波
発生素子の導波路13を通して半導体レーザ1に戻すこ
とで、回折格子5の回転角度θにより発振波長を可変し
第二高調波発生素子の位相整合条件を満足する波長に選
択制御する。擬位相整合法による第二高調波発生素子と
してはElectronics,Letters第25
巻、第731〜732頁で示されているLiNbO3基
板に自発分極の方向を等ピッチで反転させた分極反転層
12とプロトン交換法により形成された光導波路13を
設けたものである。2. Description of the Related Art In a second harmonic generating device disclosed in Japanese Patent Laid-Open No. 4-107536, a diffraction grating is used as a means for selecting a fundamental wave of a semiconductor laser in order to satisfy a phase matching condition of a second harmonic generating element. The second harmonic generation element is arranged between the semiconductor laser and the semiconductor laser. This conventional example is shown in FIG.
The TE mode light emitted from the semiconductor laser 1 is converted into the TM mode by the half-wave plate 3 using one end face of the semiconductor laser 1 as the low reflection surface 11, and the polarization inversion region 12 by the quasi phase matching method is used. Is coupled to the waveguide type second harmonic generation element 4, and the emitted light is made into a parallel beam by the lens 9 and is incident on the diffraction grating 5. By returning the reflected light from the diffraction grating 5 to the semiconductor laser 1 through the waveguide 13 of the second harmonic generation element, the oscillation wavelength can be changed by the rotation angle θ of the diffraction grating 5 and the phase matching condition of the second harmonic generation element can be obtained. Selectively control the wavelength to satisfy The second harmonic generation element by the quasi-phase matching method is described in Electronics, Letters No. 25.
Vol. 731-732, a LiNbO 3 substrate is provided with a polarization inversion layer 12 in which the direction of spontaneous polarization is inverted at an equal pitch and an optical waveguide 13 formed by a proton exchange method.
【0003】[0003]
【発明が解決しようとする課題】前記従来技術では、発
振波長を選択する回折格子と半導体レーザの低反射端面
間に導波路型第二高調波発生素子を配置しているため
に、光導波路への結合損失が往復で2倍となるため、回
折格子から半導体レーザへの反射戻り光量が不足し、安
定に半導体レーザの発振波長を制御できない問題点があ
った。In the above prior art, since the waveguide type second harmonic generating element is arranged between the diffraction grating for selecting the oscillation wavelength and the low reflection end face of the semiconductor laser, the optical waveguide is Since the coupling loss of 2 is doubled in a round trip, the amount of light reflected back from the diffraction grating to the semiconductor laser is insufficient, and there is a problem that the oscillation wavelength of the semiconductor laser cannot be controlled stably.
【0004】[0004]
【課題を解決するための手段】前記従来技術の課題を解
決するための手段として、第二高調波発生素子は半導体
レーザと回折格子間に配置しない構成とし、回折格子に
よる波長選択を半導体レーザの外部共振器とすることで
行い、半導体レーザからの光をビームスプリッタにより
分離し、一方を第二高調波素子へ導き、もう一方を回折
格子と半導体レーザによる外部共振器を構成することで
波長を選択する。また、ビームスプリッタを偏光ビーム
スプリッタとし、半導体レーザから出射されるTE、T
Mモ−ドの光を偏光ビームスプリッタにより分離し、一
方を第二高調波素子、もう一方の光を回折格子により戻
すことにより半導体レーザの波長を選択する。As means for solving the above-mentioned problems of the prior art, the second harmonic generating element is not arranged between the semiconductor laser and the diffraction grating, and wavelength selection by the diffraction grating is performed by the semiconductor laser. By using an external resonator, the light from the semiconductor laser is separated by a beam splitter, one is guided to the second harmonic element, and the other is configured as an external resonator with a diffraction grating and a semiconductor laser, thereby changing the wavelength. select. Further, the beam splitter is a polarization beam splitter, and TE, T emitted from the semiconductor laser
The wavelength of the semiconductor laser is selected by separating the light of M mode by the polarization beam splitter, returning one of the light by the second harmonic element and the other light by the diffraction grating.
【0005】[0005]
【作用】第二高調波発生装置において、導波路型の第二
高調波発生素子への結合損失を軽減するために、第二高
調波発生素子を透過させずに回折格子と半導体レーザだ
けで外部共振器を構成することで、安定な波長制御性を
もつ半導体レーザを基本波とした第二高調波発生装置を
実現できる。In the second harmonic generation device, in order to reduce the coupling loss to the waveguide type second harmonic generation element, only the diffraction grating and the semiconductor laser are used without passing through the second harmonic generation element. By forming the resonator, it is possible to realize a second harmonic generation device having a semiconductor laser having a stable wavelength controllability as a fundamental wave.
【0006】[0006]
【実施例】図1に本発明の実施例を示す。半導体レーザ
1からの光をビームスプリッタ2により分離し、一方を
第二高調波素子4、もう一方を回折格子5と半導体レー
ザ1による外部共振器を構成することで波長を選択す
る。半導体レーザは前方反射率が2%以下の低反射面1
1、もう一方は90%以上を反射する高反射面10を有
する。半導体レーザ1から出射された光はレンズ7で平
行ビームとし30%以上を反射分離するビームスプリッ
タ2からリトロー配置された回折格子5に入射される。
回折格子5の1次反射光が同じ光路を通って半導体レー
ザ1に戻される。この時、回折格子5の角度θによって
発振波長が選択される。一方、ビームスプリッタ2を透
過した光は1/2波長板3によって偏光方向をTEモ−
ドからTMモ−ドへ変換され、導波路型第二高調波発生
素子4の光導波路13に導かれる。分極反転格子12の
周期に対応した位相整合波長に基本波の波長が一致する
ように回折格子5の角度を調整することによって第二高
調波6を発生する。図3の本発明のもう一つの実施例を
示す。図1の実施例で用いたビームスプリッタの分離光
の比によっては波長制御に必要な10%以上の反射戻り
光を得られない場合がある。そのためビームスプリッタ
を偏光ビームスプリッタ33とし、半導体レーザ1から
出射される偏光モ−ドのTMモ−ド31のみを回折格子
5で反射させると、半導体レーザ1にTMモ−ドがほと
んど反射されるため良好な波長制御を行うことができ
る。偏光ビームスプリッタを透過したTEモ−ド32は
1/2波長板3でTMモ−ドに変換され第二高調波発生
素子によって第二高調波6を発生する。EXAMPLE FIG. 1 shows an example of the present invention. The light from the semiconductor laser 1 is separated by a beam splitter 2, one of which is a second harmonic element 4 and the other is a diffraction grating 5 and an external resonator formed of the semiconductor laser 1 to select a wavelength. Semiconductor laser has a low reflection surface with a front reflectance of 2% or less 1
The other one has a highly reflective surface 10 that reflects 90% or more. The light emitted from the semiconductor laser 1 is made into a parallel beam by the lens 7 and is incident on the diffraction grating 5 arranged in the Littrow arrangement from the beam splitter 2 which reflects and separates 30% or more.
The primary reflected light of the diffraction grating 5 returns to the semiconductor laser 1 through the same optical path. At this time, the oscillation wavelength is selected according to the angle θ of the diffraction grating 5. On the other hand, the light transmitted through the beam splitter 2 has its polarization direction TE-controlled by the half-wave plate 3.
Mode is converted to TM mode and is guided to the optical waveguide 13 of the waveguide type second harmonic generation element 4. The second harmonic wave 6 is generated by adjusting the angle of the diffraction grating 5 so that the wavelength of the fundamental wave matches the phase matching wavelength corresponding to the period of the polarization inversion grating 12. 4 shows another embodiment of the invention of FIG. Depending on the ratio of the separated lights of the beam splitter used in the embodiment of FIG. 1, there is a case where 10% or more of the reflected return light necessary for wavelength control cannot be obtained. Therefore, when the beam splitter is the polarization beam splitter 33 and only the TM mode 31 of the polarization mode emitted from the semiconductor laser 1 is reflected by the diffraction grating 5, the TM mode is almost reflected by the semiconductor laser 1. Therefore, good wavelength control can be performed. The TE mode 32 transmitted through the polarization beam splitter is converted into a TM mode by the half-wave plate 3 and the second harmonic wave 6 is generated by the second harmonic wave generating element.
【0007】[0007]
【発明の効果】回折格子と半導体レーザだけでビームス
プリッタまたは偏光ビームスプリッタにより外部共振器
を構成することで、安定な波長制御性をもつ第二高調波
発生装置を実現できる。By constructing an external resonator with a beam splitter or a polarization beam splitter using only a diffraction grating and a semiconductor laser, a second harmonic wave generator having stable wavelength controllability can be realized.
【図1】本発明の実施例を説明する構成図FIG. 1 is a configuration diagram illustrating an embodiment of the present invention.
【図2】従来の技術を説明する構成図FIG. 2 is a configuration diagram illustrating a conventional technique.
【図3】本発明の実施例を説明する構成図FIG. 3 is a configuration diagram illustrating an embodiment of the present invention.
1 半導体レーザ、2 ビームスプリッタ、 3 1/
2波長板、 4 第二高調波発生素子、5 回折格子、
6 第二高調波、 7 レンズ、8 レンズ、9 レン
ズ、 10 高反射膜、11 低反射膜、12 分極反
転格子、13光導波路、31 TMモ−ド、 32 T
Eモ−ド、 33 偏光ビームスプリッタ1 semiconductor laser, 2 beam splitter, 3 1 /
2 wavelength plate, 4 second harmonic generation element, 5 diffraction grating,
6 second harmonic, 7 lens, 8 lens, 9 lens, 10 high reflection film, 11 low reflection film, 12 polarization inversion grating, 13 optical waveguide, 31 TM mode, 32 T
E-mode, 33 polarization beam splitter
───────────────────────────────────────────────────── フロントページの続き (72)発明者 伊藤 顕知 東京都国分寺市東恋ヶ窪1丁目280番地株 式会社日立製作所中央研究所内 (72)発明者 薦田 琢 東京都国分寺市東恋ヶ窪1丁目280番地株 式会社日立製作所中央研究所内 (72)発明者 川本 和民 東京都国分寺市東恋ヶ窪1丁目280番地株 式会社日立製作所中央研究所内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Kenchi Ito 1-280 Higashi Koigakubo, Kokubunji City, Tokyo Stock company Hitachi Central Research Laboratory (72) Inventor Takumi Mita 1-280 Higashi Koigakubo, Kokubunji City, Tokyo Hitachi, Ltd. Central Research Laboratory (72) Inventor, Kazutomi Kawamoto, 1-280 Higashi Koigakubo, Kokubunji City, Tokyo Stock Company Hitachi Central Research Laboratory
Claims (3)
発生装置において、少なくとも一方の端面を低反射端面
とした半導体レーザに対してレーザ発振を起こす外部共
振器を構成するための光学手段を持ち、第二高調波発生
素子の位相整合条件を満足する発振波長の基本波を選択
することを特徴とする第二高調波発生装置。1. A second harmonic generation device using a semiconductor laser as a fundamental wave, comprising optical means for constituting an external resonator for causing laser oscillation with respect to a semiconductor laser having at least one end face having a low reflection end face. A second harmonic generation device characterized by selecting a fundamental wave having an oscillation wavelength that satisfies the phase matching condition of the second harmonic generation element.
て、回折格子、ビームスプリッタを配置してなることを
特徴とする請求項1の第二高調波発生装置。2. The second harmonic generation device according to claim 1, wherein a diffraction grating and a beam splitter are arranged as optical means constituting the external resonator.
スプリッタを用いたことを特徴とする請求項2の第二高
調波発生装置。3. The second harmonic generation device according to claim 2, wherein a polarization beam splitter is used as the beam splitter.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13702893A JPH06347848A (en) | 1993-06-08 | 1993-06-08 | Second harmonic generation device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13702893A JPH06347848A (en) | 1993-06-08 | 1993-06-08 | Second harmonic generation device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH06347848A true JPH06347848A (en) | 1994-12-22 |
Family
ID=15189163
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13702893A Pending JPH06347848A (en) | 1993-06-08 | 1993-06-08 | Second harmonic generation device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH06347848A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000155093A (en) * | 1998-02-05 | 2000-06-06 | Fuji Photo Film Co Ltd | Surface plasmon sensor |
| JP2004101512A (en) * | 2002-08-03 | 2004-04-02 | Dr Johannes Heidenhain Gmbh | Location measuring apparatus |
| JP2006100415A (en) * | 2004-09-28 | 2006-04-13 | National Institutes Of Natural Sciences | Laser equipment |
| WO2014136943A1 (en) * | 2013-03-08 | 2014-09-12 | 国立大学法人京都大学 | Laser device |
-
1993
- 1993-06-08 JP JP13702893A patent/JPH06347848A/en active Pending
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000155093A (en) * | 1998-02-05 | 2000-06-06 | Fuji Photo Film Co Ltd | Surface plasmon sensor |
| JP2004101512A (en) * | 2002-08-03 | 2004-04-02 | Dr Johannes Heidenhain Gmbh | Location measuring apparatus |
| JP2006100415A (en) * | 2004-09-28 | 2006-04-13 | National Institutes Of Natural Sciences | Laser equipment |
| WO2014136943A1 (en) * | 2013-03-08 | 2014-09-12 | 国立大学法人京都大学 | Laser device |
| JP2014175488A (en) * | 2013-03-08 | 2014-09-22 | Kyoto Univ | Laser device |
| CN105191028A (en) * | 2013-03-08 | 2015-12-23 | 国立大学法人京都大学 | Laser device |
| US9698562B2 (en) | 2013-03-08 | 2017-07-04 | Kyoto University | Laser device |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2721436B2 (en) | Second harmonic generator | |
| US5295143A (en) | Three color laser | |
| US20040246583A1 (en) | Retro-reflecting device in particular for tunable lasers | |
| JPS62248284A (en) | System of locking frequency and phase for arrangement of lasers | |
| JPH04107536A (en) | Second harmonic generation device | |
| US5410560A (en) | Wavelength conversion apparatus | |
| JP2009198606A (en) | Wavelength converting apparatus | |
| JPH02179626A (en) | Optical wavelength conversion device | |
| JPH06347848A (en) | Second harmonic generation device | |
| CN110908129A (en) | Beam combining optical device | |
| CN110036543A (en) | Laser oscillation apparatus | |
| US20040247001A1 (en) | Laser configuration with resonator internal frequency conversion | |
| JP3069643B2 (en) | Tunable light source | |
| JP3111786B2 (en) | Short wavelength laser light source | |
| JPH10133243A (en) | Optical wavelength converter | |
| JPH09179155A (en) | Optical wavelength converting device | |
| JPH01152781A (en) | Laser light source | |
| CN221124993U (en) | Display device and head-up display system | |
| JP2934535B2 (en) | Waveguide type tunable ring laser | |
| US11803097B1 (en) | Self-seeded OPA system | |
| JPH05323404A (en) | Optical wavelength conversion element | |
| JPH0414024A (en) | 2nd harmonic generation device | |
| CN116339053B (en) | Polarization device, light source system and projection equipment | |
| JP2900576B2 (en) | Harmonic generator | |
| JPH06196802A (en) | Semiconductor laser beam source device |