JPH06308319A - Color filter manufacturing method - Google Patents
Color filter manufacturing methodInfo
- Publication number
- JPH06308319A JPH06308319A JP10131493A JP10131493A JPH06308319A JP H06308319 A JPH06308319 A JP H06308319A JP 10131493 A JP10131493 A JP 10131493A JP 10131493 A JP10131493 A JP 10131493A JP H06308319 A JPH06308319 A JP H06308319A
- Authority
- JP
- Japan
- Prior art keywords
- film
- transparent
- color filter
- color
- shielding film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 15
- 229910052751 metal Inorganic materials 0.000 claims abstract description 29
- 239000002184 metal Substances 0.000 claims abstract description 29
- 239000000758 substrate Substances 0.000 claims abstract description 21
- 238000004544 sputter deposition Methods 0.000 claims abstract description 5
- 239000011347 resin Substances 0.000 claims description 4
- 229920005989 resin Polymers 0.000 claims description 4
- 239000010408 film Substances 0.000 description 71
- 238000009499 grossing Methods 0.000 description 8
- 238000010304 firing Methods 0.000 description 6
- 239000004973 liquid crystal related substance Substances 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 241000519995 Stachys sylvatica Species 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 235000010724 Wisteria floribunda Nutrition 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229920003051 synthetic elastomer Polymers 0.000 description 1
- 239000005061 synthetic rubber Substances 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Landscapes
- Optical Filters (AREA)
- Liquid Crystal (AREA)
Abstract
(57)【要約】
【目的】高品質且つ高信頼性のカラーフィルタ製品
【構成】所定形状の金属遮光膜を形成した透明基板上に
酸化物から成る絶縁性透明膜を被覆するように塗布し、
その後に透明膜を４５０℃以下で熱処理し、しかる後に
色画素を形成し、更にその上に透明平滑膜を形成したカ
ラーフィルタの製造方法。あるいは所定形状の金属遮光
膜を形成した透明基板上に、酸化物から成るターゲット
を用いてスパッタリング法により絶縁性透明膜を被覆す
るように被着させ、その後に透明膜の上に色画素を形成
し、しかる後にその上に透明平滑膜を形成したカラーフ
ィルタの製造方法。
(57) [Abstract] [Purpose] High quality and highly reliable color filter product [Constitution] Applying so as to cover the insulating transparent film made of oxide on the transparent substrate on which the metal light shielding film of a predetermined shape is formed. ,
After that, the transparent film is heat-treated at 450 ° C. or lower, after which color pixels are formed, and a transparent smooth film is further formed on the color pixel. Alternatively, it is deposited on a transparent substrate on which a metal light-shielding film having a predetermined shape is formed so as to cover the insulating transparent film by a sputtering method using an oxide target, and then color pixels are formed on the transparent film. Then, a method for producing a color filter in which a transparent smooth film is then formed thereon.
Description
【０００１】[0001]
【産業上の利用分野】本発明は液晶等のカラー表示装置
を構成する場合に用いられるカラーフィルタの製造方法
に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a color filter used for constructing a color display device such as liquid crystal.
【０００２】[0002]
【従来の技術】カラーフィルタを用いたカラー表示装置
として、２枚の電極基板間に液晶を保持し、一方の電極
基板側に対応する他方の電極基板にカラー表示用の複数
の色フィルタと遮光膜を形成させ、これら両電極間に印
加する電圧を制御して表示部の光透過率を選択的に変化
させ、これにより、上記複数の色フィルタによる各種色
表示を行う技術が提案されている（特開昭５８−１０２
９７６号参照）。2. Description of the Related Art As a color display device using a color filter, liquid crystal is held between two electrode substrates, and a plurality of color filters for color display and light shielding are provided on the other electrode substrate corresponding to one electrode substrate side. A technique has been proposed in which a film is formed and the voltage applied between both electrodes is controlled to selectively change the light transmittance of the display unit, thereby performing various color display by the plurality of color filters. (JP-A-58-102
976).
【０００３】また、カラーフィルタの改良として、視角
による混色防止、およびコントラストの向上を目的とし
て色画素の境界部に遮光膜を形成することも提案されて
いる（特開昭５７−２０１２８８号参照）。Further, as an improvement of the color filter, it has been proposed to form a light-shielding film at the boundary of color pixels for the purpose of preventing color mixture due to the viewing angle and improving the contrast (see Japanese Patent Laid-Open No. 57-201288). .
【０００４】その他、この遮光膜の形成方法に関して各
種改良が提案されているが（特開昭５７−２２２０９
号、特開平１−１５２４４９号、特開平２−３４８０３
号等参照）、遮光性、カラーフィルタ表面の平坦性の点
では金属薄膜を使用するのが有利であり、その金属薄膜
として一般的にＣｒ等が使用されている。In addition, various improvements have been proposed regarding the method of forming the light-shielding film (Japanese Patent Laid-Open No. 57-22209).
JP-A-1-152449, JP-A-2-34803
It is advantageous to use a metal thin film in terms of light-shielding property and flatness of the color filter surface, and Cr or the like is generally used as the metal thin film.
【０００５】[0005]
【発明が解決しようとする問題点】しかしながら、金属
薄膜で遮光膜を形成した場合、２枚の基板上に形成した
ストライプ状の透明電極を直交するように重ね合わせて
配置し、その重なり部分を画素とするような時分割駆動
による液晶表示装置においては、透明電極に印加すべき
電圧が遮光膜にリークするという問題点があった。この
問題点を図２により説明する。However, when a light-shielding film is formed of a metal thin film, stripe-shaped transparent electrodes formed on two substrates are arranged so as to be orthogonal to each other, and the overlapping portions are overlapped. In a liquid crystal display device which is driven by time division driving such as pixels, there is a problem that a voltage to be applied to the transparent electrode leaks to the light shielding film. This problem will be described with reference to FIG.
【０００６】同図のカラーフィルタＢにおいて、透明基
板１の上には金属遮光膜２が所定形状に形成され、この
遮光膜２の間に色画素４が配置され、更に平滑膜５と透
明電極６が順次積層されている。しかしながら、色画素
４の中に、または平滑膜５の中に導電性異物７が混入し
ていた場合、その上に積層させる透明電極６と遮光膜２
とが短絡し、その状態で液晶表示装置を構成した場合、
透明電極６に印加すべき電圧が遮光膜２にリークしてい
まい、重大な表示欠陥を生じていた。In the color filter B shown in the figure, a metal light-shielding film 2 is formed on a transparent substrate 1 in a predetermined shape, color pixels 4 are arranged between the light-shielding film 2, and a smoothing film 5 and a transparent electrode. 6 are sequentially stacked. However, when the conductive foreign matter 7 is mixed in the color pixel 4 or the smoothing film 5, the transparent electrode 6 and the light-shielding film 2 to be laminated thereon are formed.
When and are short-circuited and the liquid crystal display device is configured in that state,
The voltage to be applied to the transparent electrode 6 did not leak to the light-shielding film 2, resulting in a serious display defect.
【０００７】[0007]
【問題点を解決するための手段】本発明のカラーフィル
タの製造方法は、所定形状の遮光膜を形成した透明基板
上に酸化物から成る絶縁性透明膜を被覆するように塗布
し、その後にその透明膜を４５０℃以下で熱処理し、し
かる後に色画素を形成し、更にその上に有機系樹脂から
成る透明平滑膜を形成したことを特徴とする。According to the method of manufacturing a color filter of the present invention, an insulative transparent film made of an oxide is coated on a transparent substrate on which a light shielding film having a predetermined shape is formed, and then applied. The transparent film is heat-treated at 450 ° C. or lower, after which color pixels are formed, and a transparent smooth film made of an organic resin is further formed thereon.
【０００８】また、本発明のカラーフィルタの製造方法
は、所定形状の金属遮光膜を形成した透明基板上に、酸
化物から成るターゲットを用いてスパッタリング法によ
り絶縁性透明膜を被覆するように被着させ、その後に絶
縁性透明膜の上に色画素を形成し、しかる後にその上に
有機系樹脂から成る透明平滑膜を形成したことを特徴と
する。Further, in the method of manufacturing a color filter of the present invention, a transparent substrate on which a metal light-shielding film having a predetermined shape is formed is coated with an insulating transparent film by a sputtering method using a target made of an oxide. It is characterized in that a color pixel is formed on the insulating transparent film, and then a transparent smooth film made of an organic resin is formed thereon.
【０００９】[0009]
【作用】図２のカラーフィルタＢに示すように、色画素
４や平滑膜５の中に導電性異物７が混在していたとして
も、金属遮光膜上に絶縁性透明膜が形成されているた
め、透明平滑膜上に透明電極を形成しても金属遮光膜と
透明電極とが短絡しなくなる。As shown in the color filter B in FIG. 2, even if the conductive foreign matter 7 is mixed in the color pixels 4 and the smoothing film 5, the insulating transparent film is formed on the metal light shielding film. Therefore, even if the transparent electrode is formed on the transparent smooth film, the metal light-shielding film and the transparent electrode are not short-circuited.
【００１０】[0010]
（例１）図１は本発明の製造方法により得られたカラー
フィルタＡである。同図において、透明基板１の上には
金属遮光膜２が所定形状に形成され、この遮光膜２を被
覆するように絶縁性透明膜３が形成されている。また、
この絶縁性透明膜３の上には遮光膜２の間に位置するよ
うに色画素４が配置され、更に平滑膜５と透明電極６が
順次積層されている。(Example 1) FIG. 1 shows a color filter A obtained by the manufacturing method of the present invention. In the figure, a metal light-shielding film 2 is formed on a transparent substrate 1 in a predetermined shape, and an insulating transparent film 3 is formed so as to cover the light-shielding film 2. Also,
Color pixels 4 are arranged on the insulating transparent film 3 so as to be located between the light shielding films 2, and a smoothing film 5 and a transparent electrode 6 are sequentially laminated.
【００１１】次に上記カラーフィルタＡの製造工程を記
述する。予め洗浄した３００ｍｍ×３００ｍｍの透明基
板１に遮光用の金属薄膜としてスパッタによりＣｒを１
０００Ａ成膜し、フォトリソグラフィによりマトリクス
状のパターンを形成し、金属遮光膜２を所定形状に形成
した。Next, the manufacturing process of the color filter A will be described. On the transparent substrate 1 of 300 mm × 300 mm, which has been washed in advance, as a light-shielding metal thin film, sputtered Cr 1
000 A film was formed, a matrix pattern was formed by photolithography, and the metal light-shielding film 2 was formed in a predetermined shape.
【００１２】次いで、上記所定形状の金属遮光膜２を形
成した透明基板１を、アルコールを主体とする溶剤に水
酸化シリコンを希釈した溶液中に浸漬し、引き上げた後
に４００℃で焼成して絶縁性透明膜３である約１１００
Ａの酸化ケイ素膜を形成した。そして、顔料分散法によ
り色画素の形成を行った。この色画素の形成について
は、富士写真フィルム製の着色レジストＣＲ−２０００
（赤）、ＣＧ−２０００（緑）、ＣＢ−２０００（青）
の材料を使用し、最初に赤色画素４として着色レジスト
ＣＲ−２０００をスピンナーにて基板に塗布し、フォト
リソグラフィにより幅１００μｍの微細なストライプパ
ターンを形成し、同様に青色画素４と緑色画素４とを順
次色形成した。その後に平滑膜５として日本合成ゴム製
の平滑膜オプトマーＳＳ−７１８５を塗布した。次いで
透明電極６として酸化インジウムに酸化スズを混合させ
た膜をスパッタ法にて２０００Ａ成膜し、パターニング
形成した。Next, the transparent substrate 1 on which the metal light-shielding film 2 having the above-mentioned predetermined shape is formed is immersed in a solution of silicon hydroxide diluted in a solvent containing alcohol, pulled up, and fired at 400 ° C. for insulation. Transparent film 3 about 1100
A silicon oxide film of A was formed. Then, color pixels were formed by a pigment dispersion method. For the formation of this color pixel, a colored resist CR-2000 manufactured by Fuji Photo Film Co., Ltd.
(Red), CG-2000 (green), CB-2000 (blue)
First, a colored resist CR-2000 is applied as a red pixel 4 to the substrate with a spinner using a material of No. 3, and a fine stripe pattern having a width of 100 μm is formed by photolithography. Were sequentially formed in color. After that, a smooth film Optomer SS-7185 made by Japan Synthetic Rubber was applied as the smooth film 5. Next, a film in which tin oxide was mixed with indium oxide was formed as the transparent electrode 6 by a sputtering method to form a film of 2000 A, and patterning was performed.
【００１３】かくして上記構成のカラーフィルタＡであ
れば、金属遮光膜２を被覆するように絶縁性透明膜３が
形成されていので、この金属遮光膜２と透明電極６とが
短絡することがなくなった。Thus, in the color filter A having the above structure, since the insulating transparent film 3 is formed so as to cover the metal light-shielding film 2, the metal light-shielding film 2 and the transparent electrode 6 are not short-circuited. It was
【００１４】（例２） （例１）のカラーフィルタＡを製造するに当たって、同
様に金属遮光膜２を形成した後に、アルコールを主体と
する溶剤に水酸化シリコンと水酸化アルミニウムを５：
１の比率で混合したのち、希釈した溶液中に浸漬し、引
き上げた後に４００℃で焼成して絶縁性透明膜３である
約１０００Ａの酸化ケイ素と酸化アルミニウムの混合物
よりなる膜を形成した。その後、（例１）と同様に色画
素４と平滑膜５を形成した。(Example 2) In manufacturing the color filter A of (Example 1), after the metal light-shielding film 2 was formed in the same manner, 5% silicon hydroxide and 5% aluminum hydroxide were used in a solvent mainly containing alcohol.
The mixture was mixed at a ratio of 1, then immersed in a diluted solution, pulled up, and baked at 400 ° C. to form a film of an insulating transparent film 3 made of a mixture of silicon oxide and aluminum oxide of about 1000 A. Then, the color pixel 4 and the smoothing film 5 were formed similarly to (Example 1).
【００１５】かくして得られた上記構成のカラーフィル
タＡであっても、金属遮光膜２を被覆するように絶縁性
透明膜３が形成されていので、この金属遮光膜２と透明
電極６とが短絡することがなくなった。Even in the thus-obtained color filter A having the above-mentioned structure, since the insulating transparent film 3 is formed so as to cover the metal light-shielding film 2, the metal light-shielding film 2 and the transparent electrode 6 are short-circuited. There is nothing to do.
【００１６】（例３） （例１）のカラーフィルタＡを製造するに当たって、同
様に金属遮光膜２を形成した後に、アルコールを主体と
する溶剤に塩化チタンを希釈した溶液中に浸漬し、引き
上げた後に４００℃で焼成して絶縁性透明膜３である約
９００Ａの酸化チタン膜を形成した。その後（例１）と
同様に色画素４と平滑膜５を形成した。かくして得られ
た上記構成のカラーフィルタＡであっても、金属遮光膜
２を被覆するように絶縁性透明膜３が形成されていの
で、この金属遮光膜２と透明電極６とが短絡することが
なくなった。(Example 3) In manufacturing the color filter A of (Example 1), after the metal light-shielding film 2 is formed in the same manner, it is immersed in a solution of titanium chloride diluted in a solvent containing alcohol as a main component and pulled up. Then, the insulating transparent film 3 was baked at 400 ° C. to form a titanium oxide film of about 900 A. After that, the color pixels 4 and the smoothing film 5 were formed in the same manner as in (Example 1). Even in the thus-obtained color filter A having the above-described structure, since the insulating transparent film 3 is formed so as to cover the metal light-shielding film 2, the metal light-shielding film 2 and the transparent electrode 6 may be short-circuited. lost.
【００１７】（例４） （例１）のカラーフィルタＡを製造するに当たって、同
様に金属遮光膜２を形成した後に、基板を３００℃に加
熱し高周波スパッタ法によりＳｉＯ2 を１０００Ａの厚
みでもって基板全面に成膜した。その後（例１）と同様
に色画素４と平滑膜５を形成した。(Example 4) In manufacturing the color filter A of (Example 1), after the metal light-shielding film 2 was similarly formed, the substrate was heated to 300 ° C. and SiO 2 was formed to a thickness of 1000 A by the high frequency sputtering method. A film was formed on the entire surface of the substrate. After that, the color pixels 4 and the smoothing film 5 were formed in the same manner as in (Example 1).
【００１８】かくして得られた上記構成のカラーフィル
タＡであっても、金属遮光膜２を被覆するように絶縁性
透明膜３が形成されていので、この金属遮光膜２と透明
電極６とが短絡することがなくなった。Even in the thus-obtained color filter A having the above-mentioned structure, since the insulating transparent film 3 is formed so as to cover the metal light-shielding film 2, the metal light-shielding film 2 and the transparent electrode 6 are short-circuited. There is nothing to do.
【００１９】また、本発明者等が繰り返し行った実験に
よれば、（例１）〜（例３）のカラーフィルタＡを製造
するに当たって、絶縁性透明膜３の塗布後の４５０℃以
下で熱処理について、次のような実験結果が得られた。According to experiments conducted by the inventors of the present invention repeatedly, in manufacturing the color filter A of (Example 1) to (Example 3), heat treatment was performed at 450 ° C. or lower after coating the insulating transparent film 3. The following experimental results were obtained.
【００２０】（実験）金属遮光膜上に形成する酸化物形
成時の焼成温度については、５００℃前後で焼成するの
が一般的であるが、４５０℃を越える温度で焼成した場
合、３００ｍｍ×３００ｍｍの基板において、２０〜３
０μｍ程度の基板の収縮が認められることが判明した。
即ち、色画素形成時に図３の色画素４の平面図が示すよ
うなパターンに設定しなくてはならないが、これに対し
て、４５０℃を越える温度で焼成した場合には、そのパ
ターンが図４に示すようににズレが発生し、白抜け８と
なることが確認された。(Experiment) Regarding the firing temperature at the time of forming the oxide formed on the metal light-shielding film, the firing temperature is generally around 500 ° C., but when firing at a temperature higher than 450 ° C., 300 mm × 300 mm On the substrate of 20 to 3
It was found that the shrinkage of the substrate of about 0 μm was recognized.
That is, it is necessary to set the pattern as shown in the plan view of the color pixel 4 in FIG. 3 at the time of forming the color pixel. On the other hand, when firing is performed at a temperature higher than 450 ° C., the pattern is changed. As shown in 4, it was confirmed that misalignment occurred and white spots 8 were formed.
【００２１】本発明者等は、４００℃の焼成での基板収
縮量は５μｍ以下であり、実用上問題ないことを確認し
た。また、焼成温度を下げたことにより、耐薬品性の低
下が懸念されたが、耐酸性、耐アルカリ性等、実用上問
題のないことも確認した。The present inventors have confirmed that the amount of shrinkage of the substrate upon firing at 400 ° C. is 5 μm or less, which is not a practical problem. Moreover, although it was feared that the chemical resistance would be lowered by lowering the firing temperature, it was confirmed that there is no practical problem such as acid resistance and alkali resistance.
【００２２】尚、本発明は上記実施例に限定されるもの
ではなく、本発明の要旨を逸脱しない範囲内で種々の変
更、改良等は何ら差し支えない。The present invention is not limited to the above embodiments, and various changes and improvements may be made without departing from the scope of the present invention.
【００２３】[0023]
【発明の効果】以上のように、本発明のカラーフィルタ
の製造方法によれば、金属遮光膜を形成したカラーフル
タにおいて、遮光膜形成後に絶縁性透明膜を形成するこ
とによって遮光膜と透明電極との短絡が防止でき、製造
歩留りの向上し、これにより、カラーフィルタを用いた
高品質且つ高信頼性のカラー表示装置が低コストの提供
できた。As described above, according to the color filter manufacturing method of the present invention, in the color filter having the metal light-shielding film formed thereon, the light-shielding film and the transparent electrode are formed by forming the insulating transparent film after the light-shielding film is formed. It is possible to prevent a short circuit between the two and to improve the manufacturing yield. As a result, a high quality and highly reliable color display device using a color filter can be provided at low cost.
【図１】本発明に係るカラーフィルタの断面概略図であ
る。FIG. 1 is a schematic sectional view of a color filter according to the present invention.
【図２】従来のカラーフィルタの断面概略図である。FIG. 2 is a schematic sectional view of a conventional color filter.
【図３】カラーフィルタの要部平面図である。FIG. 3 is a plan view of a main part of a color filter.
【図４】カラーフィルタの要部平面図である。FIG. 4 is a plan view of a main part of a color filter.
１ 透明基板 ２ 金属遮光膜 ３ 絶縁性透明膜 ４ 色画素 ５ 平滑膜 ６ 透明電極 1 transparent substrate 2 metal light-shielding film 3 insulating transparent film 4 color pixel 5 smoothing film 6 transparent electrode
Claims (2)
板上に酸化物から成る絶縁性透明膜を被覆するように塗
布し、その後に該透明膜を４５０℃以下で熱処理し、し
かる後に色画素を形成し、更にその上に有機系樹脂から
成る透明平滑膜を形成したことを特徴とするカラーフィ
ルタの製造方法。1. A transparent substrate, on which a metal light-shielding film having a predetermined shape is formed, is coated so as to cover an insulating transparent film made of an oxide, and then the transparent film is heat-treated at 450 ° C. or lower, and then colored. A method for producing a color filter, comprising forming a pixel and further forming a transparent smooth film made of an organic resin on the pixel.
板上に、酸化物から成るターゲットを用いてスパッタリ
ング法により絶縁性透明膜を被覆するように被着させ、
その後に絶縁性透明膜の上に色画素を形成し、しかる後
にその上に有機系樹脂から成る透明平滑膜を形成したこ
とを特徴とするカラーフィルタの製造方法。2. A transparent substrate, on which a metal light-shielding film having a predetermined shape is formed, is deposited by a sputtering method using an oxide target so as to cover the insulating transparent film.
After that, a color pixel is formed on the insulating transparent film, and then a transparent smooth film made of an organic resin is formed on the color pixel, and a method for producing a color filter.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10131493A JPH06308319A (en) | 1993-04-27 | 1993-04-27 | Color filter manufacturing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10131493A JPH06308319A (en) | 1993-04-27 | 1993-04-27 | Color filter manufacturing method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH06308319A true JPH06308319A (en) | 1994-11-04 |
Family
ID=14297360
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10131493A Pending JPH06308319A (en) | 1993-04-27 | 1993-04-27 | Color filter manufacturing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH06308319A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100313248B1 (en) * | 1999-12-14 | 2001-11-07 | 구본준, 론 위라하디락사 | Color Filter |
| WO2011158287A1 (en) * | 2010-06-16 | 2011-12-22 | パナソニック株式会社 | El display panel, el display device provided with el display panel, organic el display device, and method for manufacturing el display panel |
| WO2011158288A1 (en) * | 2010-06-16 | 2011-12-22 | パナソニック株式会社 | El display panel, el display device provided with el display panel, organic el display device, and method for manufacturing el display panel |
-
1993
- 1993-04-27 JP JP10131493A patent/JPH06308319A/en active Pending
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100313248B1 (en) * | 1999-12-14 | 2001-11-07 | 구본준, 론 위라하디락사 | Color Filter |
| WO2011158287A1 (en) * | 2010-06-16 | 2011-12-22 | パナソニック株式会社 | El display panel, el display device provided with el display panel, organic el display device, and method for manufacturing el display panel |
| WO2011158288A1 (en) * | 2010-06-16 | 2011-12-22 | パナソニック株式会社 | El display panel, el display device provided with el display panel, organic el display device, and method for manufacturing el display panel |
| US8350471B2 (en) | 2010-06-16 | 2013-01-08 | Panasonic Corporation | EL display panel, EL display device provided with EL display panel, organic EL display device, and method for manufacturing EL display panel |
| KR101356865B1 (en) * | 2010-06-16 | 2014-01-28 | 파나소닉 주식회사 | El display panel, el display device provided with el display panel, organic el display device, and method for manufacturing el display panel |
| KR101356871B1 (en) * | 2010-06-16 | 2014-01-28 | 파나소닉 주식회사 | El display panel, el display device provided with el display panel, organic el display device, and method for manufacturing el display panel |
| US8717260B2 (en) | 2010-06-16 | 2014-05-06 | Panasonic Corporation | EL display panel, EL display device provided with EL display panel, organic EL display device, and method for manufacturing EL display panel |
| JP5654590B2 (en) * | 2010-06-16 | 2015-01-14 | パナソニック株式会社 | EL display panel, EL display device provided with EL display panel, organic EL display device, and method of manufacturing EL display panel |
| JP5654591B2 (en) * | 2010-06-16 | 2015-01-14 | パナソニック株式会社 | EL display panel, EL display device provided with EL display panel, organic EL display device, and method of manufacturing EL display panel |
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