JPH06239903A - Cyclodextrin derivative and its production - Google Patents
Cyclodextrin derivative and its productionInfo
- Publication number
- JPH06239903A JPH06239903A JP5477593A JP5477593A JPH06239903A JP H06239903 A JPH06239903 A JP H06239903A JP 5477593 A JP5477593 A JP 5477593A JP 5477593 A JP5477593 A JP 5477593A JP H06239903 A JPH06239903 A JP H06239903A
- Authority
- JP
- Japan
- Prior art keywords
- cyclodextrin
- reaction
- cyclodextrin derivative
- added
- butyldimethylsilyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- HFHDHCJBZVLPGP-UHFFFAOYSA-N schardinger α-dextrin Chemical class O1C(C(C2O)O)C(CO)OC2OC(C(C2O)O)C(CO)OC2OC(C(C2O)O)C(CO)OC2OC(C(O)C2O)C(CO)OC2OC(C(C2O)O)C(CO)OC2OC2C(O)C(O)C1OC2CO HFHDHCJBZVLPGP-UHFFFAOYSA-N 0.000 title claims abstract description 39
- 238000004519 manufacturing process Methods 0.000 title claims description 15
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 claims abstract description 39
- 229920000858 Cyclodextrin Polymers 0.000 claims abstract description 20
- QOSSAOTZNIDXMA-UHFFFAOYSA-N Dicylcohexylcarbodiimide Chemical compound C1CCCCC1N=C=NC1CCCCC1 QOSSAOTZNIDXMA-UHFFFAOYSA-N 0.000 claims abstract description 7
- 239000003880 polar aprotic solvent Substances 0.000 claims abstract description 7
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 26
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 claims description 18
- DLYUQMMRRRQYAE-UHFFFAOYSA-N tetraphosphorus decaoxide Chemical compound O1P(O2)(=O)OP3(=O)OP1(=O)OP2(=O)O3 DLYUQMMRRRQYAE-UHFFFAOYSA-N 0.000 claims description 12
- QAEDZJGFFMLHHQ-UHFFFAOYSA-N trifluoroacetic anhydride Chemical compound FC(F)(F)C(=O)OC(=O)C(F)(F)F QAEDZJGFFMLHHQ-UHFFFAOYSA-N 0.000 claims description 10
- 125000006239 protecting group Chemical group 0.000 claims description 8
- 239000000126 substance Substances 0.000 claims description 7
- UDYFLDICVHJSOY-UHFFFAOYSA-N sulfur trioxide-pyridine complex Substances O=S(=O)=O.C1=CC=NC=C1 UDYFLDICVHJSOY-UHFFFAOYSA-N 0.000 claims description 7
- 239000003153 chemical reaction reagent Substances 0.000 claims description 6
- CTSLXHKWHWQRSH-UHFFFAOYSA-N oxalyl chloride Chemical compound ClC(=O)C(Cl)=O CTSLXHKWHWQRSH-UHFFFAOYSA-N 0.000 claims description 6
- 230000003213 activating effect Effects 0.000 claims description 5
- 230000006315 carbonylation Effects 0.000 claims description 5
- 238000005810 carbonylation reaction Methods 0.000 claims description 5
- 230000001590 oxidative effect Effects 0.000 claims description 4
- 229920001353 Dextrin Polymers 0.000 claims 1
- 239000004375 Dextrin Substances 0.000 claims 1
- 235000019425 dextrin Nutrition 0.000 claims 1
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 abstract description 8
- 239000012299 nitrogen atmosphere Substances 0.000 abstract description 8
- WHGYBXFWUBPSRW-FOUAGVGXSA-N beta-cyclodextrin Chemical compound OC[C@H]([C@H]([C@@H]([C@H]1O)O)O[C@H]2O[C@@H]([C@@H](O[C@H]3O[C@H](CO)[C@H]([C@@H]([C@H]3O)O)O[C@H]3O[C@H](CO)[C@H]([C@@H]([C@H]3O)O)O[C@H]3O[C@H](CO)[C@H]([C@@H]([C@H]3O)O)O[C@H]3O[C@H](CO)[C@H]([C@@H]([C@H]3O)O)O3)[C@H](O)[C@H]2O)CO)O[C@@H]1O[C@H]1[C@H](O)[C@@H](O)[C@@H]3O[C@@H]1CO WHGYBXFWUBPSRW-FOUAGVGXSA-N 0.000 abstract description 5
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 abstract description 4
- 239000001116 FEMA 4028 Substances 0.000 abstract description 2
- 235000011175 beta-cyclodextrine Nutrition 0.000 abstract description 2
- 229960004853 betadex Drugs 0.000 abstract description 2
- 239000003795 chemical substances by application Substances 0.000 abstract 1
- 238000005828 desilylation reaction Methods 0.000 abstract 1
- 230000003647 oxidation Effects 0.000 abstract 1
- 238000007254 oxidation reaction Methods 0.000 abstract 1
- BCNZYOJHNLTNEZ-UHFFFAOYSA-N tert-butyldimethylsilyl chloride Chemical compound CC(C)(C)[Si](C)(C)Cl BCNZYOJHNLTNEZ-UHFFFAOYSA-N 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 description 52
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 29
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 21
- 239000002244 precipitate Substances 0.000 description 19
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 18
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 18
- 238000010898 silica gel chromatography Methods 0.000 description 17
- 239000012044 organic layer Substances 0.000 description 15
- 239000000203 mixture Substances 0.000 description 11
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 10
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 10
- 239000000243 solution Substances 0.000 description 9
- 239000000706 filtrate Substances 0.000 description 8
- 238000003756 stirring Methods 0.000 description 8
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 7
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- 239000007864 aqueous solution Substances 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- FVAUCKIRQBBSSJ-UHFFFAOYSA-M sodium iodide Chemical compound [Na+].[I-] FVAUCKIRQBBSSJ-UHFFFAOYSA-M 0.000 description 6
- 238000001035 drying Methods 0.000 description 5
- 150000003222 pyridines Chemical class 0.000 description 5
- 239000012141 concentrate Substances 0.000 description 4
- 239000012046 mixed solvent Substances 0.000 description 4
- 239000011734 sodium Substances 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 230000003993 interaction Effects 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 238000010992 reflux Methods 0.000 description 3
- 125000001424 substituent group Chemical group 0.000 description 3
- WIHNLLGPCMTDQO-UHFFFAOYSA-N ClCCCCCCN=C=N Chemical compound ClCCCCCCN=C=N WIHNLLGPCMTDQO-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000012042 active reagent Substances 0.000 description 2
- AGEZXYOZHKGVCM-UHFFFAOYSA-N benzyl bromide Chemical compound BrCC1=CC=CC=C1 AGEZXYOZHKGVCM-UHFFFAOYSA-N 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 238000005984 hydrogenation reaction Methods 0.000 description 2
- 230000002209 hydrophobic effect Effects 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 238000001226 reprecipitation Methods 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 239000000741 silica gel Substances 0.000 description 2
- 229910002027 silica gel Inorganic materials 0.000 description 2
- 235000009518 sodium iodide Nutrition 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- -1 After drying Substances 0.000 description 1
- 229920001450 Alpha-Cyclodextrin Polymers 0.000 description 1
- HFHDHCJBZVLPGP-RWMJIURBSA-N alpha-cyclodextrin Chemical compound OC[C@H]([C@H]([C@@H]([C@H]1O)O)O[C@H]2O[C@@H]([C@@H](O[C@H]3O[C@H](CO)[C@H]([C@@H]([C@H]3O)O)O[C@H]3O[C@H](CO)[C@H]([C@@H]([C@H]3O)O)O[C@H]3O[C@H](CO)[C@H]([C@@H]([C@H]3O)O)O3)[C@H](O)[C@H]2O)CO)O[C@@H]1O[C@H]1[C@H](O)[C@@H](O)[C@@H]3O[C@@H]1CO HFHDHCJBZVLPGP-RWMJIURBSA-N 0.000 description 1
- 229940043377 alpha-cyclodextrin Drugs 0.000 description 1
- 239000012300 argon atmosphere Substances 0.000 description 1
- PASDCCFISLVPSO-UHFFFAOYSA-N benzoyl chloride Chemical compound ClC(=O)C1=CC=CC=C1 PASDCCFISLVPSO-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- GDSRMADSINPKSL-HSEONFRVSA-N gamma-cyclodextrin Chemical compound OC[C@H]([C@H]([C@@H]([C@H]1O)O)O[C@H]2O[C@@H]([C@@H](O[C@H]3O[C@H](CO)[C@H]([C@@H]([C@H]3O)O)O[C@H]3O[C@H](CO)[C@H]([C@@H]([C@H]3O)O)O[C@H]3O[C@H](CO)[C@H]([C@@H]([C@H]3O)O)O[C@H]3O[C@H](CO)[C@H]([C@@H]([C@H]3O)O)O[C@H]3O[C@H](CO)[C@H]([C@@H]([C@H]3O)O)O3)[C@H](O)[C@H]2O)CO)O[C@@H]1O[C@H]1[C@H](O)[C@@H](O)[C@@H]3O[C@@H]1CO GDSRMADSINPKSL-HSEONFRVSA-N 0.000 description 1
- 229940080345 gamma-cyclodextrin Drugs 0.000 description 1
- 239000000543 intermediate Substances 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 239000000693 micelle Substances 0.000 description 1
- 229910001392 phosphorus oxide Inorganic materials 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000000707 stereoselective effect Effects 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- VSAISIQCTGDGPU-UHFFFAOYSA-N tetraphosphorus hexaoxide Chemical compound O1P(O2)OP3OP1OP2O3 VSAISIQCTGDGPU-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Polysaccharides And Polysaccharide Derivatives (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は新規なシクロデキストリ
ン誘導体及びその製造方法に関するものである。FIELD OF THE INVENTION The present invention relates to a novel cyclodextrin derivative and a method for producing the same.
【0002】[0002]
【従来の技術】シクロデキストリンは分子内に疎水性の
空洞を有し、外側は親水性で水中油型ミセルに似た機能
を示す化合物である。このようなシクロデキストリンは
その空洞径に応じて疎水性のゲスト分子を取り込み水溶
液中で複合体を形成し、調製法によっては固体の包接化
合物を単離することもできる。この立体選択的な相互作
用によりゲスト分子の物理化学的性質を微妙に変化させ
ることができるため、製剤等への有効利用が期待でき、
各方面で種々に利用され、またその利用が図られている
化合物である。Cyclodextrin is a compound that has a hydrophobic cavity in its molecule, is hydrophilic on the outside, and functions like an oil-in-water micelle. Such a cyclodextrin incorporates a hydrophobic guest molecule depending on its cavity diameter to form a complex in an aqueous solution, and a solid inclusion compound can be isolated depending on the preparation method. This stereoselective interaction allows the physicochemical properties of the guest molecule to be subtly changed, so that it can be expected to be effectively used in formulations, etc.
It is a compound that has been and is being used in various ways in various fields.
【0003】特にシクロデキストリンの2,3又は6位
の水酸基を部分的に残してなるか又は他の置換基に置換
せしめたシクロデキストリン誘導体の場合は、その水酸
基又は他の置換基との相互作用により包接能が大幅に変
化するため、ゲスト分子の種類、その物性等を大きく変
化させうることが期待できる。Particularly, in the case of a cyclodextrin derivative in which the hydroxyl groups at the 2, 3 or 6-positions of cyclodextrin are partially left or substituted with other substituents, the interaction with the hydroxyl groups or other substituents. As a result, the inclusion capacity is significantly changed, so that it is expected that the type of guest molecule, its physical properties, etc. can be changed significantly.
【0004】従ってこのような水酸基を他の置換基に置
換せしめたシクロデキストリン誘導体について種々の研
究がなされてきたが、水酸基のいずれかをカルボニル基
で置換したものは全く報告されていなかった。Therefore, various studies have been conducted on cyclodextrin derivatives in which such a hydroxyl group is substituted with other substituents, but none of those in which any of the hydroxyl groups is substituted with a carbonyl group has been reported.
【0005】[0005]
【発明が解決しようとする課題】また、実際シクロデキ
ストリンが種々の物質を包接すると考えられるのは6位
の水酸基の側よりも空洞径の広い2位又は3位の水酸基
の側であるが、これらをカルボニル基に置換した化合
物、特に、2位の水酸基のすべて、又は3位の水酸基の
すべてをカルボニル基に置換した化合物についても全く
報告はない。従って、このような化合物の場合更に水酸
基又はカルボニル基との相互作用が変化するため包接現
象の顕著な変化が予想される。It is believed that cyclodextrin actually encloses various substances on the side of the hydroxyl group at the 2- or 3-position, which has a larger cavity diameter than the side of the hydroxyl group at the 6-position. There are no reports on compounds in which these are substituted with carbonyl groups, particularly compounds in which all of the 2-position hydroxyl groups or all of the 3-position hydroxyl groups are replaced with carbonyl groups. Therefore, in the case of such a compound, since the interaction with the hydroxyl group or the carbonyl group is further changed, a remarkable change in the inclusion phenomenon is expected.
【0006】すなわち本発明の目的は、2位又は3位の
各々のすべての水酸基をカルボニル基に置換せしめたシ
クロデキストリン誘導体及びこれらの誘導体の製造方法
を提供することにある。That is, an object of the present invention is to provide a cyclodextrin derivative in which all the hydroxyl groups at the 2-position or the 3-position are substituted with carbonyl groups, and a method for producing these derivatives.
【0007】[0007]
【課題を解決するための手段】本発明の上記目的は、下
記式[I]又は式[II]で表わされるシクロデキストリ
ン誘導体を提供することにより達成される。The above object of the present invention is achieved by providing a cyclodextrin derivative represented by the following formula [I] or formula [II].
【0008】[0008]
【化2】 [Chemical 2]
【0009】また、本発明の上記目的は、(1) 2位
の水酸基を保護基にて保護した(6−O−tert−ブチル
ジメチルシリル)シクロデキストリン又は(2,6−ジ
−O−tert−ブチルジメチルシリル)シクロデキストリ
ンの3位の水酸基を、カルボニル化した後に脱シリル化
することを特徴とするシクロデキストリン誘導体の製造
方法、(2) 上記(1)記載のカルボニル化を極性非
プロトン性溶媒中で、非電子活性試薬を用い水酸基を酸
化することによって行なう上記(1)記載のシクロデキ
ストリン誘導体の製造方法、(3) 3位及び6位の水
酸基を保護基にて保護したシクロデキストリン、又は3
位を保護基にて保護した(6−O−tert−ブチルジメチ
ルシリル)シクロデキストリンの2位の水酸基をカルボ
ニル化した後保護基を除去することを特徴とするシクロ
デキストリン誘導体の製造方法、又は、(4) 上記
(3)記載のカルボニル化を極性非プロトン性溶媒中
で、非電子活性試薬を用い水酸基を酸化することによっ
て行なう上記(3)記載のシクロデキストリン誘導体の
製造方法、により達成される。Further, the above object of the present invention is (1) (6-O-tert-butyldimethylsilyl) cyclodextrin or (2,6-di-O-tert) in which a hydroxyl group at the 2-position is protected by a protecting group. -Butyldimethylsilyl) cyclodextrin 3-position hydroxyl group is carbonylated and then desilylated, (2) The carbonylation described in (1) above is polar aprotic. The method for producing a cyclodextrin derivative according to (1) above, which comprises oxidizing a hydroxyl group using a non-electron active reagent in a solvent, (3) cyclodextrin in which the hydroxyl groups at the 3- and 6-positions are protected with a protective group Or 3
Position-protected with a protecting group (6-O-tert-butyldimethylsilyl) cyclodextrin, the method for producing a cyclodextrin derivative, characterized by removing the protecting group after carbonylating the 2-position hydroxyl group, or (4) The method for producing a cyclodextrin derivative according to the above (3), wherein the carbonylation according to the above (3) is performed by oxidizing a hydroxyl group with a non-electron active reagent in a polar aprotic solvent. .
【0010】以下に本発明を更に具体的に説明する。The present invention will be described in more detail below.
【0011】本発明において、シクロデキストリンはn
が6のものをα−シクロデキストリン、nが7のものを
β−シクロデキストリン、nが8のものをγ−シクロデ
キストリンという。In the present invention, cyclodextrin is n
6 is referred to as α-cyclodextrin, n is referred to as β-cyclodextrin, and n is referred to as γ-cyclodextrin.
【0012】また、本発明において水酸基のカルボニル
化において用いられる極性非プロトン性溶媒としては好
ましくはジメチルスルホキシド(以下DMSOと略記す
る)が用いられ、親電子活性化試薬としては、好ましく
はジシクロヘキシルカルボジイミド(以下DCCと略記
する)、無水酢酸、五酸化リン、三酸化硫黄−ピリジン
錯体、無水トリフルオロ酢酸、塩化オキサリル等が用い
られる。In the present invention, the polar aprotic solvent used in the carbonylation of the hydroxyl group is preferably dimethyl sulfoxide (hereinafter abbreviated as DMSO), and the electrophilic activating reagent is preferably dicyclohexylcarbodiimide ( Hereinafter, abbreviated as DCC), acetic anhydride, phosphorus pentoxide, sulfur trioxide-pyridine complex, trifluoroacetic anhydride, oxalyl chloride and the like are used.
【0013】以下に、式[I]で表わされる本発明のシ
クロデキストリン誘導体の具体的反応例を示す。但し以
下場合によりシクロデキストリンをCDと略記する。Specific reaction examples of the cyclodextrin derivative of the present invention represented by the formula [I] are shown below. However, in the following cases, cyclodextrin is abbreviated as CD.
【0014】[0014]
【化3】 [Chemical 3]
【0015】上記反応は具体的には以下のような方法に
より行なわれる。 反応[1] β−CD(n=7)を脱水ピリジン中に溶解し窒素雰囲
気下0〜5℃に冷却する。次いで脱水ピリジンに溶解し
た tBDMSiClを滴下し、滴下終了後0〜5℃で1
時間、室温で12時間攪拌する。反応終了後、大量の水よ
り再沈殿を行ない、沈殿を濾別、よく水洗し乾燥する。
その後シリカゲルカラムクロマトグラフィーにより精製
し、得られた[A]はエタノールより3回再結晶を行な
う。(収率:約80%)The above reaction is specifically carried out by the following method. Reaction [1] β-CD (n = 7) is dissolved in dehydrated pyridine and cooled to 0 to 5 ° C under a nitrogen atmosphere. Then, t BDMSiCl dissolved in dehydrated pyridine was added dropwise, and after completion of the addition, 1 at 0-5 ° C.
Stir for 12 hours at room temperature. After completion of the reaction, reprecipitation is carried out from a large amount of water, the precipitate is filtered off, washed well with water and dried.
Then, the product is purified by silica gel column chromatography, and the obtained [A] is recrystallized from ethanol three times. (Yield: about 80%)
【0016】反応[2] [A]を脱水DMFに溶解し、窒素雰囲気下BaO、B
a(OH)2 ・8H2Oを加え、室温で1時間反応させ
る。その系に室温で臭化ベンジルを滴下し、滴下終了後
ヨウ化ナトリウムを加え24時間反応させる。反応終了後
メタノールを加え沈殿物は濾別し、濾液にCH2 Cl2
を加え、1M−H2 SO4 、水の順で洗浄、有機層は乾
燥後減圧下濃縮する。残渣に少量のエタノールを加え、
大量の水より再沈殿する。沈殿物は乾燥後シリカゲルカ
ラムクロマトグラフィーにより精製し[B]を得る。
(収率:約70%)Reaction [2] [A] was dissolved in dehydrated DMF, and BaO, B was added in a nitrogen atmosphere.
a (OH) 2 · 8H 2 O was added, reacted at room temperature for 1 hour. Benzyl bromide is added dropwise to the system at room temperature, and after completion of the addition, sodium iodide is added and reacted for 24 hours. After completion of the reaction, methanol was added and the precipitate was filtered off, and the filtrate was CH 2 Cl 2
Was added, 1M-H 2 SO 4, washed sequentially with water, the organic layer is concentrated after drying under reduced pressure. Add a small amount of ethanol to the residue,
Reprecipitate from a large amount of water. The precipitate is dried and then purified by silica gel column chromatography to obtain [B].
(Yield: about 70%)
【0017】反応[3]方法−I [B]をDMSOに溶解し、次いで室温でDCC(ジシ
クロヘキシルカルボジイミド)を加える。さらにその系
を20〜30℃に保ちながら無水リン酸を少量ずつ加えて行
く。全て添加後、その温度で24時間攪拌し、沈殿物は濾
過後CH2 Cl 2 を加えNa2 CO3 水溶液で中和す
る。CH2 Cl2 で抽出後、有機層は水でよく洗浄し、
乾燥後減圧下濃縮し残渣をシリカゲルカラムクロマトグ
ラフィーにより精製し[C]を得る。(収率:約60%)Reaction [3]Method-I Dissolve [B] in DMSO and then at room temperature DCC
Chlorhexylcarbodiimide) is added. Furthermore the system
While keeping the temperature at 20 to 30 ° C, add phosphoric anhydride little by little.
Ku. After adding all, stir at that temperature for 24 hours and filter the precipitate.
After CH2 Cl 2 Add Na2 CO3 Neutralize with aqueous solution
It CH2 Cl2 After extraction with, the organic layer is washed well with water,
After drying, concentrate under reduced pressure and chromatograph the residue on a silica gel column.
Purify by Raffy to obtain [C]. (Yield: about 60%)
【0018】方法−II [B]をDMSOに溶解し、次いで無水酢酸を加える。
その後系を40〜50℃に加熱し4時間攪拌する。反応終了
後CH2 Cl2 を加え、次いで大量の水を加える。有機
層は分液し、Na2 CO3 水溶液で中和、水洗し、乾燥
後減圧下濃縮する。残渣はシリカゲルカラムクロマトグ
ラフィーにより精製し[C]を得る。(収率:約65%) Method-II [B] is dissolved in DMSO and acetic anhydride is added.
The system is then heated to 40-50 ° C and stirred for 4 hours. After the reaction is complete, CH 2 Cl 2 is added, followed by a large amount of water. The organic layer is separated, neutralized with an aqueous Na 2 CO 3 solution, washed with water, dried and concentrated under reduced pressure. The residue is purified by silica gel column chromatography to obtain [C]. (Yield: about 65%)
【0019】方法−III [B]をDMF/DMSO混合溶媒に溶解、そして五酸
化リンを加え、ゆっくりと加熱し50〜60℃下で3時間攪
拌する。反応終了後沈殿物を濾別、濾液にCH 2 Cl2
を加え、次いで大量の水を加え、有機層は分液し、Na
2 CO3 水溶液で中和、水洗し、乾燥後減圧下濃縮す
る。残渣はシリカゲルカラムクロマトグラフィーにより
精製し[C]を得る。(収率:約65%)[0019]Method-III Dissolve [B] in DMF / DMSO mixed solvent
Add phosphorus oxide, heat slowly and stir at 50-60 ° C for 3 hours.
Stir. After the reaction was completed, the precipitate was filtered off and the filtrate was CH 2 Cl2
Was added, and then a large amount of water was added, the organic layer was separated, and Na was added.
2 CO3 Neutralize with aqueous solution, wash with water, dry and concentrate under reduced pressure.
It The residue was subjected to silica gel column chromatography.
Purify to obtain [C]. (Yield: about 65%)
【0020】方法−IV [B]を脱水DMSOに溶解し室温下少量のトリエチル
アミンを添加する。次いで三酸化硫黄−ピリジン錯体の
DMSO溶液をゆっくり滴下する。滴下終了後室温下で
6時間撹拌し、反応終了後、三酸化硫黄−ピリジン錯体
を塩とし沈殿物として生じたものを濾別する。濾液は減
圧下40℃以下で濃縮し残渣はシリカゲルカラムクロマト
グラフィーにて精製、[C]を得る。(収率:約60%) Method-IV [B] is dissolved in dehydrated DMSO and a small amount of triethylamine is added at room temperature. Then, a DMSO solution of sulfur trioxide-pyridine complex is slowly added dropwise. After completion of the dropwise addition, the mixture is stirred at room temperature for 6 hours, and after the reaction is completed, the sulfur trioxide-pyridine complex is used as a salt, and what is formed as a precipitate is filtered off. The filtrate is concentrated under reduced pressure at 40 ° C. or lower, and the residue is purified by silica gel column chromatography to obtain [C]. (Yield: about 60%)
【0021】方法−V 脱水したDMSO/ジクロルメタン混合溶媒を窒素雰囲
気下約−60℃に冷却、その系に無水トリフルオロ酢酸の
ジクロルメタン溶液を添加する。約30分撹拌後[B]の
ジクロルメタン溶液を滴下し、−60℃で約3時間撹拌す
る。その後トリエチルアミンを加え、約30分撹拌後ゆっ
くり系内温度を室温までもどす。次いで系内に水を加え
有機層を分離、有機層は減圧下40℃以下で濃縮し残渣は
シリカゲルカラムクロマトグラフィーにて精製、[C]
を得る。(収率:約55%) Method-V The dehydrated DMSO / dichloromethane mixed solvent was cooled to about -60 ° C under a nitrogen atmosphere, and a solution of trifluoroacetic anhydride in dichloromethane was added to the system. After stirring for about 30 minutes, the dichloromethane solution of [B] is added dropwise, and the mixture is stirred at -60 ° C for about 3 hours. After that, triethylamine is added, and after stirring for about 30 minutes, the system temperature is slowly returned to room temperature. Next, water was added to the system to separate the organic layer. The organic layer was concentrated under reduced pressure at 40 ° C or lower, and the residue was purified by silica gel column chromatography, [C].
To get (Yield: about 55%)
【0022】方法−VI 上記方法−Vにおいてトリエチルアミンにかえてメタノ
ールを用いた以外は方法−Vと同様にして[C]を得
る。(収率:約65%) Method-VI [C] is obtained in the same manner as in Method-V except that methanol is used in place of triethylamine in the above Method-V. (Yield: about 65%)
【0023】反応[4] [C]をTHFに溶解し、室温下で1M−(n−C4 H
9 )4 N+ F- のTHF溶液を加え、滴下終了後ゆっく
りと加温し還流下24時間反応させる。反応終了後THF
を減圧下留去し、残渣をCH2 Cl2 /水系で抽出、有
機層は乾燥後減圧下で濃縮し、残渣はシリカゲルカラム
クロマトグラフィーにより精製し[D]を得る。(収
率:約85%)Reaction [4] [C] was dissolved in THF, and 1M- (n-C 4 H was added at room temperature.
9) 4 N + F - THF was added and the reaction After completion of the dropwise slowly warmed under reflux for 24 hours. After completion of reaction THF
Is distilled off under reduced pressure, the residue is extracted with CH 2 Cl 2 / water system, the organic layer is dried and concentrated under reduced pressure, and the residue is purified by silica gel column chromatography to obtain [D]. (Yield: about 85%)
【0024】反応[5] [D]を酢酸に溶解し、10%Pd/Cを触媒として添加
後水素添加を行なう(40℃,5kg/cm2)。水素圧が減少
しなくなった時点で反応を終了させPd/Cを濾別、濾
液を減圧下濃縮し、残渣を大量のアセトンより再沈殿す
る。沈殿物を集めよくアセトンで洗浄することにより
[E]を得る。(収率:約90%)Reaction [5] [D] is dissolved in acetic acid and hydrogenation is carried out after adding 10% Pd / C as a catalyst (40 ° C., 5 kg / cm 2 ). When the hydrogen pressure has stopped decreasing, the reaction is terminated, Pd / C is filtered off, the filtrate is concentrated under reduced pressure, and the residue is reprecipitated from a large amount of acetone. The precipitate is collected and washed well with acetone to obtain [E]. (Yield: about 90%)
【0025】反応[6] β−CD(n=7)を脱水DMFに溶解し、室温でイミ
ダゾールを添加する。次いでアルゴン雰囲気下で tBD
MSiClを加え溶解させる。その系をゆっくり加熱
し、90〜 100℃で24時間反応させる。反応終了後放冷
し、減圧下DMFを留去、残渣をCH2 Cl2 /水系よ
り抽出し、CH2 Cl2 層は1M−H2 SO 4 、水、N
aHCO3 飽和水溶液で洗浄後乾燥する。CH2 Cl2
は減圧下濃縮し、残渣はCH2 Cl2 /メタノール系よ
り再結晶し精製することで[F]を得る。(収率:約65
%)Reaction [6] β-CD (n = 7) was dissolved in dehydrated DMF, and the mixture was allowed to stand at room temperature.
Add Dazole. Then under argon atmospheretBD
Add MSiCl and dissolve. Slowly heat the system
And react at 90-100 ° C for 24 hours. Allow to cool after completion of reaction
Then, DMF was distilled off under reduced pressure, and the residue was CH.2 Cl2 / Water system
Extracted, CH2 Cl2 Layer is 1M-H2 SO Four , Water, N
aHCO3 Wash with saturated aqueous solution and dry. CH2 Cl2
Is concentrated under reduced pressure and the residue is CH2 Cl2 / Methanol system
[F] is obtained by recrystallization and purification. (Yield: about 65
%)
【0026】反応[7] [B]にかえて[F]を用いた以外は反応[3]の方法
[I]〜[VI]の各々と同様にして[G]を得る。(方
法[I]については 収率:約70%)Reaction [7] [G] is obtained in the same manner as in each of methods [I] to [VI] of reaction [3] except that [F] is used instead of [B]. (For method [I], yield: about 70%)
【0027】反応[8] [G]をTHFに溶解し、室温下で1M−(n−C4 H
9 )4 N+ F- のTHF溶液を加え、滴下終了後ゆっく
りと加温し還流下24時間反応させる。反応終了後沈殿物
を濾別、沈殿物を水に溶解し大量のアセトンより再沈殿
する。沈殿物はよくアセトンで洗浄、乾燥することで
[E]を得る。(収率:約75%)Reaction [8] [G] was dissolved in THF, and 1M- (n-C 4 H) was added at room temperature.
9) 4 N + F - THF was added and the reaction After completion of the dropwise slowly warmed under reflux for 24 hours. After completion of the reaction, the precipitate is filtered off, the precipitate is dissolved in water and reprecipitated from a large amount of acetone. The precipitate is often washed with acetone and dried to obtain [E]. (Yield: about 75%)
【0028】次に式[II]で表わされる本発明のシクロ
デキストリン誘導体の具体的反応例を示す。Next, specific reaction examples of the cyclodextrin derivative of the present invention represented by the formula [II] will be shown.
【0029】[0029]
【化4】 [Chemical 4]
【0030】上記反応は具体的には以下のような方法に
より行なわれる。 反応[1] β−CD(n=7)を脱水ピリジン中に溶解し窒素雰囲
気下0〜5℃に冷却する。次いで脱水ピリジンに溶解し
た tBDMSiClを滴下し、滴下終了後0〜5℃で1
時間、室温で12時間攪拌する。反応終了後、大量の水よ
り再沈殿を行ない、沈殿を濾別、よく水洗し乾燥する。
その後シリカゲルカラムクロマトグラフィーにより精製
し、得られた[A]はエタノールより3回再結晶を行な
う。(収率:約80%)The above reaction is specifically carried out by the following method. Reaction [1] β-CD (n = 7) is dissolved in dehydrated pyridine and cooled to 0 to 5 ° C under a nitrogen atmosphere. Then, t BDMSiCl dissolved in dehydrated pyridine was added dropwise, and after completion of the addition, 1 at 0-5 ° C.
Stir for 12 hours at room temperature. After completion of the reaction, reprecipitation is carried out from a large amount of water, the precipitate is filtered off, washed well with water and dried.
Then, the product is purified by silica gel column chromatography, and the obtained [A] is recrystallized from ethanol three times. (Yield: about 80%)
【0031】反応[2] [A]を脱水DMFに溶解し、窒素雰囲気下BaO、B
a(OH)2 ・8H2Oを加え、室温で1時間反応させ
る。その系に室温で臭化ベンジルを滴下し、滴下終了後
ヨウ化ナトリウムを加え24時間反応させる。反応終了後
メタノールを加え、沈殿物は濾別し、濾液にCH2 Cl
2 を加え、1M−H2 SO4 、水の順で洗浄、有機層は
乾燥後減圧下濃縮する。残渣に少量のエタノールを加
え、大量の水より再沈殿する。沈殿物は乾燥後シリカゲ
ルカラムクロマトグラフィーにより精製し[B]を得
る。(収率:約70%)Reaction [2] [A] was dissolved in dehydrated DMF, and BaO and B were added in a nitrogen atmosphere.
a (OH) 2 · 8H 2 O was added, reacted at room temperature for 1 hour. Benzyl bromide is added dropwise to the system at room temperature, and after completion of the addition, sodium iodide is added and reacted for 24 hours. After completion of the reaction, methanol was added, the precipitate was filtered off, and CH 2 Cl was added to the filtrate.
2 was added, 1M-H 2 SO 4, washed sequentially with water, the organic layer is concentrated after drying under reduced pressure. Add a small amount of ethanol to the residue and reprecipitate from a large amount of water. The precipitate is dried and then purified by silica gel column chromatography to obtain [B]. (Yield: about 70%)
【0032】反応[3] [B]をTHFに溶解し、室温下で1M−(n−C4 H
9 )4 N+ F- のTHF溶液を加え、滴下終了後ゆっく
りと加温し還流下24時間反応させる。反応終了後THF
を減圧下留去し、残渣をCH2 Cl2 /水系で抽出、有
機層は乾燥後減圧下で濃縮し、残渣はシリカゲルカラム
クロマトグラフィーにより精製し[C]を得る。(収
率:約85%)Reaction [3] [B] was dissolved in THF, and 1M- (n-C 4 H) was added at room temperature.
9) 4 N + F - THF was added and the reaction After completion of the dropwise slowly warmed under reflux for 24 hours. After completion of reaction THF
Is distilled off under reduced pressure, the residue is extracted with a CH 2 Cl 2 / water system, the organic layer is dried and then concentrated under reduced pressure, and the residue is purified by silica gel column chromatography to obtain [C]. (Yield: about 85%)
【0033】反応[4] [C]を脱水ピリジンに溶解し、室温で無水酢酸を加え
る。添加後90〜 100℃で6時間攪拌、反応終了後減圧下
ピリジンを留去し、残渣を大量の氷冷水に注ぐ。析出し
た沈殿物を集めシリカゲルカラムクロマトグラフィーに
て精製することで[D]を得る。(R2 ;CH3 CO
−,収率:約90%)Reaction [4] [C] is dissolved in dehydrated pyridine and acetic anhydride is added at room temperature. After the addition, the mixture is stirred at 90 to 100 ° C for 6 hours, after completion of the reaction, pyridine is distilled off under reduced pressure, and the residue is poured into a large amount of ice-cooled water. [D] is obtained by collecting the deposited precipitates and purifying by silica gel column chromatography. (R 2 ; CH 3 CO
-, Yield: about 90%)
【0034】反応[5] [D]をエタノール/酢酸=2/1に溶解し、10%Pd
/Cを触媒として添加後水素添加を行なう(40℃,5kg
/cm2)。水素圧が減少しなくなった時点で反応を終了さ
せ、Pd/Cを濾別、濾液を減圧下濃縮、残渣をシリカ
ゲルカラムクロマトグラフィーにて精製し[E]を得
る。(収率:約90%)Reaction [5] [D] was dissolved in ethanol / acetic acid = 2/1 to obtain 10% Pd.
/ C as a catalyst and then hydrogenation (40 ℃, 5kg
/ cm 2 ). When the hydrogen pressure has stopped decreasing, the reaction is terminated, Pd / C is filtered off, the filtrate is concentrated under reduced pressure, and the residue is purified by silica gel column chromatography to obtain [E]. (Yield: about 90%)
【0035】反応[6]方法−I [E]をDMSOに溶解し、次いで室温でDCC(ジシ
クロヘキシルカルボジイミド)を加える。さらにその系
を20〜30℃に保ちながら無水リン酸を少量ずつ加えて行
く。全て添加後、その温度で24時間攪拌し、沈殿物は濾
過後CH2 Cl 2 を加えNa2 CO3 水溶液で中和す
る。CH2 Cl2 で抽出後、有機層は水でよく洗浄し乾
燥後減圧下濃縮し、残渣をシリカゲルカラムクロマトグ
ラフィーにより精製し[F]を得る。(収率:約55%)Reaction [6]Method-I Dissolve [E] in DMSO and then at room temperature with DCC
Chlorhexylcarbodiimide) is added. Furthermore the system
While keeping the temperature at 20 to 30 ° C, add phosphoric anhydride little by little.
Ku. After adding all, stir at that temperature for 24 hours and filter the precipitate.
After CH2 Cl 2 Add Na2 CO3 Neutralize with aqueous solution
It CH2 Cl2 After extraction with, the organic layer is washed well with water and dried.
After drying, concentrate under reduced pressure and chromatograph the residue on a silica gel column.
Purify by Raffy to obtain [F]. (Yield: about 55%)
【0036】方法−II [E]をDMSOに溶解し、次いで無水酢酸を加える。
その後系を40〜50℃に加熱し4時間攪拌する。反応終了
後CH2 Cl2 を加え、次いで大量の水を加える。有機
層は分液しNa2 CO3 水溶液で中和、水洗し、乾燥後
減圧下濃縮する。残渣はシリカゲルカラムクロマトグラ
フィーにより精製し[F]を得る。(収率:約60%) Method-II [E] is dissolved in DMSO and then acetic anhydride is added.
The system is then heated to 40-50 ° C and stirred for 4 hours. After the reaction is complete, CH 2 Cl 2 is added, followed by a large amount of water. The organic layer is separated, neutralized with an aqueous Na 2 CO 3 solution, washed with water, dried and concentrated under reduced pressure. The residue is purified by silica gel column chromatography to obtain [F]. (Yield: about 60%)
【0037】方法−III [E]をDMF/DMSO混合溶媒に溶解、そして五酸
化リンを加えゆっくりと加熱し50〜60℃下で3時間攪拌
する。反応終了後沈殿物を濾別、濾液にCH2Cl2 を
加え、次いで大量の水を加え有機層は分液し、Na2 C
O3 水溶液で中和、水洗し、乾燥後減圧下濃縮する。残
渣はシリカゲルカラムクロマトグラフィーにより精製し
[F]を得る。(収率:約65%) Method-III [E] is dissolved in a DMF / DMSO mixed solvent, phosphorus pentoxide is added, and the mixture is slowly heated and stirred at 50-60 ° C for 3 hours. After the reaction was completed, the precipitate was filtered off, CH 2 Cl 2 was added to the filtrate, and then a large amount of water was added to separate the organic layer, and Na 2 C was added.
Neutralize with O 3 aqueous solution, wash with water, dry and concentrate under reduced pressure. The residue is purified by silica gel column chromatography to obtain [F]. (Yield: about 65%)
【0038】方法−IV [E]を脱水DMSOに溶解し室温下少量のトリエチル
アミンを添加する。次いで三酸化硫黄−ピリジン錯体の
DMSO溶液をゆっくり滴下する。滴下終了後室温下で
6時間撹拌し、反応終了後、三酸化硫黄−ピリジン錯体
を塩とし沈殿物として生じたものを濾別する。濾液は減
圧下40℃以下で濃縮し残渣はシリカゲルカラムクロマト
グラフィーにて精製、[F]を得る。(収率:約60%) Method-IV [E] is dissolved in dehydrated DMSO and a small amount of triethylamine is added at room temperature. Then, a DMSO solution of sulfur trioxide-pyridine complex is slowly added dropwise. After completion of the dropwise addition, the mixture is stirred at room temperature for 6 hours, and after the reaction is completed, the sulfur trioxide-pyridine complex is used as a salt, and what is formed as a precipitate is filtered off. The filtrate is concentrated under reduced pressure at 40 ° C. or lower, and the residue is purified by silica gel column chromatography to obtain [F]. (Yield: about 60%)
【0039】方法−V 脱水したDMSO/ジクロルメタン混合溶媒を窒素雰囲
気下約−60℃に冷却、その系に無水トリフルオロ酢酸の
ジクロルメタン溶液を添加する。約30分撹拌後[E]の
ジクロルメタン溶液を滴下し、−60℃で約3時間撹拌す
る。その後トリエチルアミンを加え、約30分撹拌後ゆっ
くり系内温度を室温までもどす。次いで系内に水を加え
有機層を分離、有機層は減圧下40℃以下で濃縮し残渣は
シリカゲルカラムクロマトグラフィーにて精製、[F]
を得る。(収率:約55%) Method-V The dehydrated DMSO / dichloromethane mixed solvent was cooled to about -60 ° C under a nitrogen atmosphere, and a solution of trifluoroacetic anhydride in dichloromethane was added to the system. After stirring for about 30 minutes, a solution of [E] in dichloromethane was added dropwise, and the mixture was stirred at -60 ° C for about 3 hours. After that, triethylamine is added, and after stirring for about 30 minutes, the system temperature is slowly returned to room temperature. Next, water is added to the system to separate the organic layer. The organic layer is concentrated under reduced pressure at 40 ° C or lower, and the residue is purified by silica gel column chromatography, [F].
To get (Yield: about 55%)
【0040】方法−VI 上記方法−Vにおいてトリエチルアミンにかえてメタノ
ールを用いた以外は方法−Vと同様にして[F]を得
る。(収率:約65%) Method-VI [F] is obtained in the same manner as in Method-V except that methanol is used instead of triethylamine in the above Method-V. (Yield: about 65%)
【0041】反応[7] [F]をNaOHのメタノール溶液に溶解し室温で攪拌
する。3時間後反応を止め、得られた沈殿物を濾別、メ
タノールでよく洗浄後、少量のピリジンに溶解し大量の
アセトンから再沈殿を行なう。沈殿物を集め減圧乾燥を
することで[G]を得る。(収率:約80%)Reaction [7] [F] is dissolved in a methanol solution of NaOH and stirred at room temperature. After 3 hours, the reaction is stopped, the resulting precipitate is filtered off, washed thoroughly with methanol, dissolved in a small amount of pyridine, and reprecipitated from a large amount of acetone. [G] is obtained by collecting the precipitates and drying under reduced pressure. (Yield: about 80%)
【0042】反応[8] [B]を脱水CH2 Cl2 に溶解し、触媒としてピリジ
ンを加え窒素雰囲気下0〜5℃に冷却する。次いでその
系にCH2 Cl2 に溶解した塩化ベンゾイルをゆっくり
と滴下、滴下終了後室温で2時間攪拌する。反応終了後
氷冷水中に流し込み有機層を分液、減圧下留去する。残
渣はシリカゲルカラムクロマトグラフィーにて精製する
ことで[H]を得る。(収率:約60%)Reaction [8] [B] is dissolved in dehydrated CH 2 Cl 2 , pyridine is added as a catalyst, and the mixture is cooled to 0 to 5 ° C. under a nitrogen atmosphere. Then, benzoyl chloride dissolved in CH 2 Cl 2 is slowly added dropwise to the system, and after completion of the addition, the mixture is stirred at room temperature for 2 hours. After completion of the reaction, the mixture is poured into ice-cooled water, the organic layer is separated, and the solvent is evaporated under reduced pressure. The residue is purified by silica gel column chromatography to obtain [H]. (Yield: about 60%)
【0043】反応[9] [D]にかえて[H]を用いた以外は反応[5]と同様
にして[I]を得る。(収率:約85%)Reaction [9] [I] is obtained in the same manner as in Reaction [5] except that [H] is used instead of [D]. (Yield: about 85%)
【0044】反応[10] [E]にかえて[I]を用いた以外は反応[6]の方法
[I]〜[VI]の各々と同様にして[J]を得る。(方
法[I]については 収率:約60%)Reaction [10] [J] is obtained in the same manner as in each of the methods [I] to [VI] of reaction [6] except that [I] is used instead of [E]. (For method [I], yield: about 60%)
【0045】反応[11] [B]にかえて[J]を用いた以外は反応[3]と同様
にして[K]を得る。(収率:約90%)Reaction [11] [K] is obtained in the same manner as Reaction [3] except that [J] is used instead of [B]. (Yield: about 90%)
【0046】反応[12] [F]にかえて[K]を用いた以外は反応[7]と同様
にして[G]を得る。(収率:約70%)Reaction [12] [G] is obtained in the same manner as in Reaction [7] except that [K] is used instead of [F]. (Yield: about 70%)
【0047】本発明のシクロデキストリン誘導体の製造
に用いられる中間物質の合成については、J. Carbohyd
r. Chem.,7 293-308 (1988) ; Carbohydr. Res., 187 2
03-221 (1989) ; Carbohydr. Res., 192 366-369 (198
9)等の論文に詳細に記載されている。For the synthesis of intermediates used in the preparation of the cyclodextrin derivatives of the present invention, see J. Carbohyd.
r. Chem., 7 293-308 (1988); Carbohydr. Res., 187 2
03-221 (1989); Carbohydr. Res., 192 366-369 (198
It is described in detail in the papers such as 9).
【0048】[0048]
【発明の効果】本発明の製造方法により2位又は3位の
各々のすべての水酸基をカルボニル基に置換せしめたシ
クロデキストリン誘導体を提供することができる。INDUSTRIAL APPLICABILITY The production method of the present invention can provide a cyclodextrin derivative in which all hydroxyl groups at the 2-position or 3-position are substituted with carbonyl groups.
【0049】本発明によれば段階ごとにCDの持つ水酸
基を狙って化学修飾するために確実に目的物が得られ
る。また高価な試薬を用いず、しかも個々の反応におい
て副反応が生じにくいため収率が高い。さらに水酸基が
カルボニル基になることで水溶性も大きく変化し、CD
の包接能も大きく変化すると期待される。According to the present invention, since the hydroxyl group of CD is aimed at each step and chemically modified, the intended product can be obtained reliably. In addition, since expensive reagents are not used and side reactions are unlikely to occur in individual reactions, the yield is high. In addition, the hydroxyl group becomes a carbonyl group, which significantly changes the water solubility.
It is expected that the inclusion ability of will change greatly.
Claims (9)
シクロデキストリン誘導体。 【化1】 1. A cyclodextrin derivative represented by the following formula [I] or formula [II]. [Chemical 1]
−O−tert−ブチルジメチルシリル)シクロデキストリ
ン又は(2,6−ジ−O−tert−ブチルジメチルシリ
ル)シクロデキストリンの3位の水酸基を、カルボニル
化した後に脱シリル化することを特徴とするシクロデキ
ストリン誘導体の製造方法。2. A hydroxyl group at the 2-position is protected by a protecting group (6
-O-tert-butyldimethylsilyl) cyclodextrin or (2,6-di-O-tert-butyldimethylsilyl) cyclodextrin is characterized in that the 3-position hydroxyl group is carbonylated and then desilylated. Method for producing dextrin derivative.
ロトン性溶媒中で、親電子活性化試薬を用い水酸基を酸
化することによって行う請求項2記載のシクロデキスト
リン誘導体の製造方法。3. The method for producing a cyclodextrin derivative according to claim 2, wherein the carbonylation according to claim 2 is performed by oxidizing a hydroxyl group using an electrophilic activating reagent in a polar aprotic solvent.
ルホキシドを用いる請求項3記載のシクロデキストリン
誘導体の製造方法。4. The method for producing a cyclodextrin derivative according to claim 3, wherein dimethyl sulfoxide is used as the polar aprotic solvent.
ルカルボジイミド、無水酢酸、五酸化リン、三酸化硫黄
−ピリジン錯体、無水トリフルオロ酢酸及び塩化オキサ
リルから選択される物質を用いる請求項3記載のシクロ
デキストリン誘導体の製造方法。5. The cyclodextrin derivative according to claim 3, wherein a substance selected from dicyclohexylcarbodiimide, acetic anhydride, phosphorus pentoxide, sulfur trioxide-pyridine complex, trifluoroacetic anhydride, and oxalyl chloride is used as the electrophilic activating reagent. Manufacturing method.
したシクロデキストリン、又は3位を保護基にて保護し
た(6−O−tert−ブチルジメチルシリル)シクロデキ
ストリンの2位の水酸基をカルボニル化した後保護基を
除去することを特徴とするシクロデキストリン誘導体の
製造方法。6. A cyclodextrin having hydroxyl groups at the 3- and 6-positions protected with a protecting group, or a hydroxyl group at 2-positions of (6-O-tert-butyldimethylsilyl) cyclodextrin protected with a 3-position protecting group. A method for producing a cyclodextrin derivative, which comprises carbonylating and then removing a protecting group.
ロトン性溶媒中で、親電子活性化試薬を用い水酸基を酸
化することによって行う請求項6記載のシクロデキスト
リン誘導体の製造方法。7. The method for producing a cyclodextrin derivative according to claim 6, wherein the carbonylation according to claim 6 is performed by oxidizing a hydroxyl group using an electrophilic activating reagent in a polar aprotic solvent.
ルホキシドを用いる請求項7記載のシクロデキストリン
誘導体の製造方法。8. The method for producing a cyclodextrin derivative according to claim 7, wherein dimethyl sulfoxide is used as the polar aprotic solvent.
ルカルボジイミド、無水酢酸、五酸化リン、三酸化硫黄
−ピリジン錯体、無水トリフルオロ酢酸及び塩化オキサ
リルから選択される物質を用いる請求項7記載のシクロ
デキストリン誘導体の製造方法。9. The cyclodextrin derivative according to claim 7, wherein a substance selected from dicyclohexylcarbodiimide, acetic anhydride, phosphorus pentoxide, sulfur trioxide-pyridine complex, trifluoroacetic anhydride and oxalyl chloride is used as the electrophilic activating reagent. Manufacturing method.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5477593A JPH06239903A (en) | 1993-02-19 | 1993-02-19 | Cyclodextrin derivative and its production |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5477593A JPH06239903A (en) | 1993-02-19 | 1993-02-19 | Cyclodextrin derivative and its production |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH06239903A true JPH06239903A (en) | 1994-08-30 |
Family
ID=12980152
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5477593A Pending JPH06239903A (en) | 1993-02-19 | 1993-02-19 | Cyclodextrin derivative and its production |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH06239903A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100411289B1 (en) * | 1996-11-29 | 2004-02-14 | 주식회사 포스코 | 6-allyldimethylsilyl-2,3-diethyl-beta-cyclodextrin useful for the separation of atropisomers and methods for preparing the same |
KR100435426B1 (en) * | 1996-11-29 | 2004-08-16 | 주식회사 포스코 | 6-dimethyloctylsilyl-2,3-diethyl-beta-cyclodextrin useful for stationary phase for cgc column separating structural isomers |
JP2005272664A (en) * | 2004-03-25 | 2005-10-06 | Hitachi Ltd | Soluble cyclodextrin polymer and process for producing the same |
-
1993
- 1993-02-19 JP JP5477593A patent/JPH06239903A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100411289B1 (en) * | 1996-11-29 | 2004-02-14 | 주식회사 포스코 | 6-allyldimethylsilyl-2,3-diethyl-beta-cyclodextrin useful for the separation of atropisomers and methods for preparing the same |
KR100435426B1 (en) * | 1996-11-29 | 2004-08-16 | 주식회사 포스코 | 6-dimethyloctylsilyl-2,3-diethyl-beta-cyclodextrin useful for stationary phase for cgc column separating structural isomers |
JP2005272664A (en) * | 2004-03-25 | 2005-10-06 | Hitachi Ltd | Soluble cyclodextrin polymer and process for producing the same |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
AU2017236669B2 (en) | An improved process for the preparation of sugammadex | |
JPH0651725B2 (en) | Partially methylated cyclodextrin and method for producing the same | |
EP0531016B1 (en) | Polysulfate of beta-cyclodextrin derivative and process for preparing the same | |
US5008386A (en) | Methylated cyclodextrin type compounds and process for preparing same | |
EP0672687B1 (en) | Process for producing amino-functional cyclodextrin derivatives | |
JPH06239903A (en) | Cyclodextrin derivative and its production | |
JP2762859B2 (en) | Cyclodextrin derivative and method for producing the same | |
JPH06206905A (en) | Cycloodextrin derivative and its production | |
KR20120138240A (en) | Substituted cyclodextrin derivatives useful as intermediates for producing biologically active materials | |
JP2734295B2 (en) | Cyclodextrin derivative and method for producing the same | |
JPH06220105A (en) | Cyclodextrain derivative and its production | |
JPH06136004A (en) | Cyclodextrin derivative and its production | |
JPH0753604A (en) | Production of cyclodextrin derivative | |
JPH06313002A (en) | Cyclodextrin derivative and its production | |
JPH06271602A (en) | Cyclodextrin derivative and its production | |
JP2643107B2 (en) | Partially methylated cyclodextrin | |
JP2643105B2 (en) | Partially methylated cyclodextrin | |
JP2643106B2 (en) | Partially methylated cyclodextrin | |
JPH0790006A (en) | Production of cyclodextrin derivative | |
JPH07252303A (en) | Cyclodextrin derivative and its preparation | |
JPH10265506A (en) | Production of acetylated cyclodexitrin | |
JPH0753605A (en) | Production of cyclodextrin derivative | |
JPS61266401A (en) | Trithylated beta-cyclodextrin and its production | |
JPH07102003A (en) | Production of cyclodextrin derivative | |
HU180580B (en) | New process for preparing partially methylated beta-cyclodextrin derivatives |