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JPH06188234A - Wet processing apparatus - Google Patents

Wet processing apparatus

Info

Publication number
JPH06188234A
JPH06188234A JP33867992A JP33867992A JPH06188234A JP H06188234 A JPH06188234 A JP H06188234A JP 33867992 A JP33867992 A JP 33867992A JP 33867992 A JP33867992 A JP 33867992A JP H06188234 A JPH06188234 A JP H06188234A
Authority
JP
Japan
Prior art keywords
weight
cassettes
processing apparatus
wet processing
spin dryer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP33867992A
Other languages
Japanese (ja)
Inventor
Osamu Nozawa
修 野沢
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JFE Steel Corp
Original Assignee
Kawasaki Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kawasaki Steel Corp filed Critical Kawasaki Steel Corp
Priority to JP33867992A priority Critical patent/JPH06188234A/en
Publication of JPH06188234A publication Critical patent/JPH06188234A/en
Withdrawn legal-status Critical Current

Links

Landscapes

  • Drying Of Solid Materials (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

PURPOSE:To provide a wet processing apparatus wherein the faultiness and the failure of the apparatus which are caused by the weight difference between the wafer cassettes in a spin dryer of a semiconductor manufacturing process are eliminated and the labor caused by the same is reduced. CONSTITUTION:The weight difference between two wafer-cassettes 3 opposed to each other is sensed, and a movable weight 11 for compensating the weight difference is moved in the directions of arrows 12 to balance the angular moment relative to the weight of a spin dryer 1, and thereby, the labor caused by the filling-up of wafers, etc., is eliminated.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は半導体製造工程における
スピンドライヤのカセット間重量差調整機能を備えたウ
ェット処理装置に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a wet processing apparatus having a function of adjusting a weight difference between cassettes of a spin dryer in a semiconductor manufacturing process.

【0002】[0002]

【従来の技術】半導体製造工程で使用されるウェット処
理装置では、通常、ウエハを収納したカセットを2つ同
時に薬液漕に入れて処理を行い、2つ同時にスピンドラ
イヤに取り付けて遠心脱水し、ウエハ乾燥を行ってい
る。この場合は、スピンドライヤの回転軸に対して軸対
称な位置に2つのカセットを配置し、回転させることに
より、ウエハ上の水分を遠心力により除去する。
2. Description of the Related Art In a wet processing apparatus used in a semiconductor manufacturing process, usually, two cassettes each containing a wafer are put in a chemical bath at the same time for processing, and two cassettes are attached to a spin dryer at the same time for spin-drying. It is drying. In this case, the two cassettes are arranged at positions axially symmetric with respect to the rotation axis of the spin dryer and rotated to remove water on the wafer by centrifugal force.

【0003】[0003]

【発明が解決しようとする課題】このようにスピンドラ
イヤは、2つのカセットを回転軸に対して軸対称な位置
に配置して回転するため、カセット間に重量差(ウエハ
枚数差)があると振動が発生し、パーティクルの発生、
ウエハの割れ、装置の故障を引き起こす。したがって、
作業員が2つのカセットに収納したウエハの枚数を合わ
せる作業を行う必要があった。
As described above, since the spin dryer rotates by disposing the two cassettes at positions symmetrical with respect to the rotation axis, there is a difference in weight (difference in the number of wafers) between the cassettes. Vibrations, particles,
This may cause the wafer to crack or the device to fail. Therefore,
It was necessary for the worker to perform the work of matching the number of wafers stored in the two cassettes.

【0004】本発明は、半導体製造工程におけるスピン
ドライヤのカセット間重量差に起因するこのような不
良、装置故障をなくすと共に、省力化を図ったウェット
処理装置を提供することを目的とする。
SUMMARY OF THE INVENTION It is an object of the present invention to provide a wet processing apparatus which eliminates such defects and apparatus failures due to the difference in weight between cassettes of spin dryers in the semiconductor manufacturing process and saves labor.

【0005】[0005]

【課題を解決するための手段】本発明は、半導体製造工
場におけるウェット処理装置において、2つのカセット
中に保持されているウエハの枚数、またはカセットの重
量を検出し、この検出に基づいて、2つのカセット間の
重量差を補償する移動重錐を備えたスピンドライヤを内
蔵したことを特徴とするウェット処理装置である。
The present invention detects the number of wafers held in two cassettes or the weight of the cassettes in a wet processing apparatus in a semiconductor manufacturing factory, and based on this detection, 2 The wet processing apparatus is characterized by having a built-in spin dryer having a moving weight cone for compensating the weight difference between two cassettes.

【0006】[0006]

【作用】ウェット装置にカセット内のウエハ枚数を測定
するウエハ枚数センサを内蔵させ、スピンドライヤでウ
エハの乾燥を行う時に、同時に処理される2つのカセッ
ト間のウエハ枚数差を自動認識し、その重量差を打ち消
すように回転系の重心を移動する機能を持たせる。ウエ
ハ枚数センサの代わりにカセットごと重量を測定するセ
ンサを設けてもよい。
The wetting apparatus has a built-in wafer number sensor for measuring the number of wafers in the cassette, and when the wafers are dried by the spin dryer, the difference in the number of wafers between the two cassettes to be processed at the same time is automatically recognized and the weight thereof is measured. It has a function to move the center of gravity of the rotating system so as to cancel the difference. Instead of the wafer number sensor, a sensor for measuring the weight of each cassette may be provided.

【0007】2つのカセットの重量差を補償する移動重
錐は例えばねじ棒に螺合した重錐であって、ねじ棒を回
転させることによって重錐が移動するようにしたものを
用いるとよい。この重錐は、回転中心からカセットの置
かれている方向に微動し、回転中心からの重量の回転モ
ーメントが左右バランスするように移動させる。その所
要移動量とカセット重量差との関係は予め求めておく。
The moving weight for compensating for the weight difference between the two cassettes is, for example, a weight that is screwed into a screw rod, and it is preferable to use a weight that is moved by rotating the screw rod. This heavy cone moves slightly from the center of rotation in the direction in which the cassette is placed, and moves so that the rotational moment of the weight from the center of rotation balances left and right. The relationship between the required movement amount and the cassette weight difference is obtained in advance.

【0008】なお、移動重錐は2個のカセットの重心を
結ぶ線上に設けることが最も望ましいが、スピンドライ
ヤの回転部の剛性の許容範囲内で、上下方向に偏りがあ
っても問題はない。
It is most desirable to provide the moving weight cone on the line connecting the centers of gravity of the two cassettes, but there is no problem even if there is a vertical deviation within the allowable range of the rigidity of the rotating portion of the spin dryer. .

【0009】[0009]

【実施例】図1は半導体製造工場におけるウェット処理
装置に内蔵されるスピンドライヤ1の側面図、図2はそ
の平面図、図3は移動重錐11を斜視図、図4はウェッ
ト処理装置20の全体構成を示した。ローダ21でカセ
ット内のウエハ枚数を検出し、薬液槽22でウエハを洗
浄した後、回転式乾燥機23を経てアンローダ24によ
り排出する。回転式乾燥機23には、図1、図2に示す
スピンドライヤ1が内蔵されている。スピンドライヤ1
は2個のカセット3を、回転軸4に対して軸対称に配置
されているカセットホールダ2に収納し、回転軸4を回
転させ遠心力によってカセットを乾燥させる。本発明の
実施例ではローダ21でカセットの枚数を検出し、スピ
ンドライヤにこのカセットがきた段階で枚数差に相当す
る分だけ重錐11を移動し、バランス調整を行う。
1 is a side view of a spin dryer 1 incorporated in a wet processing apparatus in a semiconductor manufacturing plant, FIG. 2 is a plan view thereof, FIG. 3 is a perspective view of a moving weight 11 and FIG. 4 is a wet processing apparatus 20. The overall configuration of is shown. The number of wafers in the cassette is detected by the loader 21, the wafers are washed in the chemical liquid tank 22, and then the wafer is discharged by the unloader 24 via the rotary dryer 23. The rotary dryer 23 incorporates the spin dryer 1 shown in FIGS. 1 and 2. Spin dryer 1
Stores the two cassettes 3 in the cassette holder 2 arranged symmetrically with respect to the rotation shaft 4, and rotates the rotation shaft 4 to dry the cassette by centrifugal force. In the embodiment of the present invention, the loader 21 detects the number of cassettes, and when the cassette arrives at the spin dryer, the weight cone 11 is moved by an amount corresponding to the difference in the number of cassettes for balance adjustment.

【0010】[0010]

【発明の効果】本発明によれば、スピンドライヤの2つ
のカセットの重量差の調整を自動的に行うので、重量差
による不良発生、装置故障は全く見られなくなった。ま
た、作業員によるウエハ枚数合わせ作業の必要がなくな
った。
According to the present invention, since the difference in weight between the two cassettes of the spin dryer is automatically adjusted, the occurrence of defects due to the difference in weight and the failure of the apparatus are completely eliminated. Further, it is no longer necessary for a worker to adjust the number of wafers.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明のウェット処理装置に内蔵されるスピン
ドライヤの側面図である。
FIG. 1 is a side view of a spin dryer incorporated in a wet processing apparatus of the present invention.

【図2】本発明のウェット処理装置に内蔵されるスピン
ドライヤの平面図である。
FIG. 2 is a plan view of a spin dryer incorporated in the wet processing apparatus of the present invention.

【図3】移動重錐の斜視図である。FIG. 3 is a perspective view of a moving weight cone.

【図4】ウェット処理装置の構成図である。FIG. 4 is a configuration diagram of a wet processing apparatus.

【符号の説明】[Explanation of symbols]

2 カセットホールダ 3 カセット 5 ケーシング 6 モータ 10 ねじ棒 11 移動重錐 12 矢印(ストローク) 13 ガイド棒 14 回転方向矢印 20 ウエット処理装置 21 ローダ 22 薬液槽 23 回転乾燥機 24 アンローダ 2 cassette holder 3 cassette 5 casing 6 motor 10 screw rod 11 moving weight 12 arrow (stroke) 13 guide rod 14 rotation direction arrow 20 wet processing device 21 loader 22 chemical liquid tank 23 rotary dryer 24 unloader

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 2つのカセット間の重量差補償用移動重
錐を備えたスピンドライヤを内蔵したことを特徴とする
ウェット処理装置。
1. A wet processing apparatus having a built-in spin dryer having a moving weight for compensating a weight difference between two cassettes.
JP33867992A 1992-12-18 1992-12-18 Wet processing apparatus Withdrawn JPH06188234A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP33867992A JPH06188234A (en) 1992-12-18 1992-12-18 Wet processing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP33867992A JPH06188234A (en) 1992-12-18 1992-12-18 Wet processing apparatus

Publications (1)

Publication Number Publication Date
JPH06188234A true JPH06188234A (en) 1994-07-08

Family

ID=18320440

Family Applications (1)

Application Number Title Priority Date Filing Date
JP33867992A Withdrawn JPH06188234A (en) 1992-12-18 1992-12-18 Wet processing apparatus

Country Status (1)

Country Link
JP (1) JPH06188234A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12112961B2 (en) 2021-02-01 2024-10-08 Taiwan Semiconductor Manufacturing Company, Ltd. Substrate processing system, load port and method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12112961B2 (en) 2021-02-01 2024-10-08 Taiwan Semiconductor Manufacturing Company, Ltd. Substrate processing system, load port and method

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Legal Events

Date Code Title Description
A300 Withdrawal of application because of no request for examination

Free format text: JAPANESE INTERMEDIATE CODE: A300

Effective date: 20000307