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JPH06183851A - Soldering pretreatment of ceramic - Google Patents

Soldering pretreatment of ceramic

Info

Publication number
JPH06183851A
JPH06183851A JP4185391A JP4185391A JPH06183851A JP H06183851 A JPH06183851 A JP H06183851A JP 4185391 A JP4185391 A JP 4185391A JP 4185391 A JP4185391 A JP 4185391A JP H06183851 A JPH06183851 A JP H06183851A
Authority
JP
Japan
Prior art keywords
ceramics
ceramic
brazing
metal
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4185391A
Other languages
Japanese (ja)
Inventor
Yasuhiro Fukaya
保博 深谷
Toshiro Kobayashi
敏郎 小林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Heavy Industries Ltd
Original Assignee
Mitsubishi Heavy Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Heavy Industries Ltd filed Critical Mitsubishi Heavy Industries Ltd
Priority to JP4185391A priority Critical patent/JPH06183851A/en
Publication of JPH06183851A publication Critical patent/JPH06183851A/en
Pending legal-status Critical Current

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  • Ceramic Products (AREA)

Abstract

PURPOSE:To provide a pretreatment method for firm joining of ceramic parts. CONSTITUTION:Prior to soldering a pair of ceramics or a ceramic and a metal, one of Ti, Zr or Al is vacuum-evaporated to form a film coat on a soldering surface of the ceramic and subsequently a film of Cu or Au is overlaid on the film coat.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明はセラミックス部材の接合
のための前処理方法に関し、さらに詳しくはセラミック
スとセラミックス、セラミックスと金属のろう付け接合
に際するセラミックスの前処理方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a pretreatment method for joining ceramic members, and more particularly to a pretreatment method for ceramics in brazing and joining ceramics and ceramics and ceramics and metal.

【0002】[0002]

【従来の技術】従来、Si3 4 ,Al2 3 ,ZrO
2 等のセラミックスとセラミックス又はセラミックスと
金属のろう付けには、ろう材としてTi,Zr,Al等
の活性金属あるいは、それらの活性金属を含有する合金
が用いられている。このろう材は一般に粉末状あるいは
薄板として接合面に挿入されている。
2. Description of the Related Art Conventionally, Si 3 N 4 , Al 2 O 3 and ZrO have been used.
In brazing ceramics such as 2 and ceramics or ceramics and metal, an active metal such as Ti, Zr, Al or an alloy containing these active metals is used as a brazing material. This brazing material is generally inserted into the joint surface as a powder or a thin plate.

【0003】[0003]

【発明が解決しようとする課題】セラミックスと溶融金
属、すなわちろう材とのぬれ性は金属と溶融金属に比較
すると小さく、接合欠陥が発生しやすい。そのため、一
般にはMn−Mo法(MoとMnの粉末を水蒸気を含ん
だ水素雰囲気で約1500℃で加熱焼成するメタライズ
法)等のメタライズ法が用いられるが、1500℃以上
での加湿水素雰囲気での加熱等多くの複雑な工程が必要
であり、また、この方法はSi3 4 等には適用でき
ず、適用範囲が限定される。すなわち、Si3 4 に対
しては、約1500℃での加熱焼成中にSi3 4 の分
解又は酸化が生じ、Si3 4 の表面層が変質してしま
うからである。
The wettability between the ceramics and the molten metal, that is, the brazing filler metal is smaller than that of the metal and the molten metal, and a bonding defect is likely to occur. Therefore, generally, a metallizing method such as Mn-Mo method (metallizing method in which powders of Mo and Mn are heated and fired at about 1500 ° C. in a hydrogen atmosphere containing water vapor) is used, but in a humidified hydrogen atmosphere at 1500 ° C. or higher. Many complicated steps such as heating are required, and this method cannot be applied to Si 3 N 4 etc., and the applicable range is limited. That is, for the Si 3 N 4, decomposition or oxidation caused the Si 3 N 4 during heating and firing at about 1500 ° C., because the surface layer the Si 3 N 4 will be altered.

【0004】本発明は上記技術水準に鑑み、従来技術に
おけるような不具合を発生することなく、セラミックス
とセラミックス又はセラミックスと金属を強固にろう付
けによって接合しうるようにすることができるセラミッ
クスの前処理方法を提供しようとするものである。
In view of the above-mentioned state of the art, the present invention is a pretreatment of ceramics capable of firmly bonding ceramics and ceramics or ceramics and metal by brazing without causing the problems of the prior art. It is intended to provide a method.

【0005】[0005]

【課題を解決するための手段】本発明はセラミックスと
セラミックス又はセラミックスと金属をろう付けするに
際し、同セラミックスのろう付け面に、Ti,Zr又は
Alのうち1種を蒸着により皮膜を形成し、次いで同皮
膜上にCu又はAuの皮膜を形成することを特徴とする
セラミックスのろう付け前処理方法である。
The present invention, when brazing ceramics and ceramics or ceramics and metal, forms a film on the brazing surface of the ceramics by vapor deposition of one of Ti, Zr or Al, Then, a method for pre-brazing ceramics is characterized in that a Cu or Au film is formed on the same film.

【0006】すなわち、本発明はSi3 4 ,Al2
3 ,ZrO2 等のセラミックスの接合面に、Ti,Zr
又はAlのうちの1種の活性金属を高真空プロセスで成
膜後、Cu又はAgを成膜して2層構造のメタライズ層
を形成することによってセラミックスの前処理がなされ
る。
That is, the present invention is based on Si 3 N 4 , Al 2 O
Ti, Zr on the joint surface of ceramics such as 3 , ZrO 2
Alternatively, a ceramic pretreatment is performed by forming a film of Cu or Ag after forming a film of one active metal of Al by a high vacuum process to form a metallized layer having a two-layer structure.

【0007】その際、活性金属を形成後、ただちにCu
又はAgを成膜するかあるいは活性金属層の形成後期に
二元蒸着又は二元スパッタ装置を用い、Cu又はAgも
成膜を始め活性金属層と、Cu又はAg層の間に混合層
を形成することが望ましい。
At this time, immediately after forming the active metal, Cu is formed.
Alternatively, a film of Ag is formed, or a binary vapor deposition or a binary sputtering device is used in the latter stage of formation of the active metal layer, and then Cu or Ag is also formed into a film to form a mixed layer between the active metal layer and the Cu or Ag layer. It is desirable to do.

【0008】ろう材としては一般のAgろう系、Niろ
う系のほか、Cu−Ti系、Cu−Cr系、Cu−Zr
系、Al、Al−Si系のものも使用しうる。
As the brazing material, in addition to general Ag brazing system and Ni brazing system, Cu-Ti system, Cu-Cr system, Cu-Zr system
A type, Al, Al-Si type may also be used.

【0009】[0009]

【作用】Ti,Zr又はAlの活性金属を第一層として
成膜するのはセラミックスとの密着性に優れ剥離が生じ
ないためと、ろう付け時にセラミックスと反応し、反応
生成物を形成し強固な接合強さが得られるためである。
[Function] The active metal of Ti, Zr or Al is formed as the first layer because it has excellent adhesion to ceramics and does not cause peeling, and it reacts with ceramics during brazing to form a reaction product, which is strong. This is because a high joining strength can be obtained.

【0010】上記活性金属の上にCu又はAuを成膜す
るのはろう材とのぬれ性を向上させるためである。つま
り活性金属だけのメタライズでは大気中に取り出した時
活性金属表面は酸化され、TiO2 ,ZrO2 ,Al2
3 等のセラミックス層を形成し、ぬれ性がよくなくな
るからである。
The reason why the Cu or Au film is formed on the active metal is to improve the wettability with the brazing material. That is, in the metallization of only the active metal, the surface of the active metal is oxidized when taken out into the atmosphere, and TiO 2 , ZrO 2 , Al 2
This is because a ceramic layer of O 3 or the like is formed and the wettability becomes poor.

【0011】また、活性金属を形成後ただちに又は活性
金属形成後期にCu又はAgを成膜始めるのは活性金属
層表面の酸化を極力おさえ、活性金属層とCu又はAg
層との密着性を劣化させないためである。(真空中でも
酸素分圧が存在すれば活性金属は酸化する。)
In addition, starting the formation of Cu or Ag immediately after forming the active metal or at the latter stage of forming the active metal suppresses the oxidation of the surface of the active metal layer as much as possible, and the active metal layer and Cu or Ag are formed.
This is because the adhesiveness with the layer is not deteriorated. (Even in a vacuum, if an oxygen partial pressure exists, the active metal will be oxidized.)

【0012】本発明方法は密着力に優れたTi,Zr又
はAlを中間層として成膜後、セラミックスに直接成膜
すると剥離するCu,Agを成膜することにより、ろう
付け時のぬれ性を改善し、接合時の欠陥発生を防止する
ものである。
According to the method of the present invention, after forming Ti, Zr or Al having an excellent adhesive force as an intermediate layer, Cu and Ag, which are exfoliated when they are directly formed on the ceramic, are formed. It is intended to improve and prevent the occurrence of defects during joining.

【0013】[0013]

【実施例】表1に本発明の各種実施例をまとめて示す。
セラミックス板への金属層の成膜は真空蒸着により行っ
た。真空蒸着の条件は5×10-5Torrの圧力のもとで電
子銃を用いて金属を溶融させて蒸発させた。セラミック
ス基材はヒーターにより200℃に加熱した。セラミッ
クス基板の表面粗さはSi3 4 は0.8S以下、Al
2 3 ,ZrO2 については1.5S以下に研摩して用
いた。(なお、Sは表面のあらさの単位で、JIS B
0659−1973年の表1による。)またAl2 3
は焼結助剤をほとんど含まない99.99%の高純度の
焼結体を用いた。
EXAMPLES Table 1 collectively shows various examples of the present invention.
The metal layer was formed on the ceramic plate by vacuum vapor deposition. The conditions of vacuum vapor deposition were such that the metal was melted and evaporated using an electron gun under a pressure of 5 × 10 −5 Torr. The ceramic base material was heated to 200 ° C. by a heater. The surface roughness of the ceramic substrate is 0.8 S or less for Si 3 N 4 and Al
2 O 3 and ZrO 2 were used after being polished to 1.5 S or less. (In addition, S is a unit of surface roughness, JIS B
According to Table 1 of 0659-1973. ) Also Al 2 O 3
Was a 99.99% high-purity sintered body containing almost no sintering aid.

【0014】密着力の評価はセロハンテープによる剥離
試験を行い剥れないものを合格(○印)とした。
The adhesion was evaluated by a peeling test using cellophane tape, and those which did not peel off were judged to be acceptable (marked with a circle).

【0015】ぬれ性は100μm×15mm×15mmの銀
ろう(成分は70%Ag−28%Cu−2%Ti)箔を
メタライズしたセラミックスの表面に置き、5×10-4
Torrの圧力下で900℃に加熱溶融し30分保持後のろ
う材の広がり面積で評価した。つまり、初期のろう材箔
の面積A0 (15mm×15mm=225mm2 )、加熱後の
ろう材の広がり面積Aとして、A/A0 >1.1である
ものをぬれ性が良好であると判断し合格(○印)とし
た。なお、セラミックスの基板の寸法が25mm×25mm
のため全面へぬれ広がったもののA/A0 は>2.9と
表示した。
A wettability of 100 μm × 15 mm × 15 mm silver braze (component: 70% Ag-28% Cu-2% Ti) foil was placed on the surface of the metallized ceramics and 5 × 10 −4
The spread area of the brazing filler metal after heating and melting at 900 ° C. under a pressure of Torr and holding for 30 minutes was evaluated. That is, as the initial brazing material foil area A 0 (15 mm × 15 mm = 225 mm 2 ) and the brazing material spreading area A after heating, A / A 0 > 1.1 is considered to have good wettability. It was judged and passed (marked with ○). The size of the ceramic substrate is 25 mm × 25 mm
Therefore, A / A 0 was displayed as> 2.9 although it spread over the entire surface.

【0016】以上よりメタライズ層とセラミックス基材
の密着力を得るためには活性金属層を形成する必要があ
るが、活性金属層表面は大気に曝されるなど安定な酸化
物層を形成し、ぬれ性は改善されないため、さらにその
上にCu,Ag等の金属層を形成することが有効である
ことがわかった。なお、ぬれ性試験時の圧力が5×10
-4Torrでは酸素分圧が高く、ぬれ性試験時に活性金属表
面がさらに酸化されるため、比較例7のように1×10
-6Torrでも実施したが、透明酸化層による干渉色が観察
され、活性金属層のみではたとえ高真空下で用いるにし
ても表面酸化層がさらに成長しぬれ性は改善できないこ
ともわかった。
From the above, it is necessary to form an active metal layer in order to obtain the adhesion between the metallized layer and the ceramic substrate, but the surface of the active metal layer forms a stable oxide layer by being exposed to the atmosphere, Since the wettability is not improved, it was found that it is effective to further form a metal layer of Cu, Ag or the like on it. The pressure during the wettability test is 5 × 10
At -4 Torr, the oxygen partial pressure is high, and the active metal surface is further oxidized during the wettability test.
It was also carried out at -6 Torr, but interference color due to the transparent oxide layer was observed, and it was also found that the wettability could not be improved by further growth of the surface oxide layer even when used under a high vacuum even if the active metal layer was used alone.

【0017】表1はセラミックとセラミックスのろう付
けの場合を示すが、セラミックスよりも金属の方がよい
ので、セラミックとのぬれ性がよいものは当型金属との
ろう付けにも良好である。
Table 1 shows the case of brazing ceramics and ceramics. Since metal is better than ceramics, those having good wettability with ceramics are also good for brazing with this type of metal.

【表1】 [Table 1]

【0018】[0018]

【発明の効果】本発明のセラミックスの前処理方法によ
り、セラミックスとセラミックス又はセラミックスと金
属をろう付けする際、ろう材のぬれ性が改善でき、セラ
ミックスとセラミックス又はセラミックスと金属の良好
な接合体を得ることができる。
According to the method for pretreating ceramics of the present invention, when brazing ceramics and ceramics or ceramics and metal, the wettability of the brazing material can be improved, and a good bonded body of ceramics and ceramics or ceramics and metal can be obtained. Obtainable.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 セラミックスとセラミックス又はセラミ
ックスと金属をろう付けするに際し、同セラミックスの
ろう付け面に、Ti,Zr又はAlのうち1種を蒸着に
より皮膜を形成し、次いで同皮膜上にCu又はAuの皮
膜を形成することを特徴とするセラミックスのろう付け
前処理方法。
1. When brazing ceramics and ceramics or ceramics and metal, a film is formed on the brazing surface of the ceramics by vapor deposition of Ti, Zr or Al, and then Cu or Cu is formed on the film. A method for pre-brazing ceramics, which comprises forming a film of Au.
JP4185391A 1991-03-07 1991-03-07 Soldering pretreatment of ceramic Pending JPH06183851A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4185391A JPH06183851A (en) 1991-03-07 1991-03-07 Soldering pretreatment of ceramic

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4185391A JPH06183851A (en) 1991-03-07 1991-03-07 Soldering pretreatment of ceramic

Publications (1)

Publication Number Publication Date
JPH06183851A true JPH06183851A (en) 1994-07-05

Family

ID=12619815

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4185391A Pending JPH06183851A (en) 1991-03-07 1991-03-07 Soldering pretreatment of ceramic

Country Status (1)

Country Link
JP (1) JPH06183851A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010258420A (en) * 2009-03-31 2010-11-11 Mitsubishi Materials Corp Substrate for power module with heat sink, power module, and method of manufacturing the substrate for power module with heat sink
WO2015141295A1 (en) * 2014-03-20 2015-09-24 三菱マテリアル株式会社 Bonded body, substrate for power modules, power module and method for producing bonded body
CN114874024A (en) * 2022-06-22 2022-08-09 衡阳凯新特种材料科技有限公司 Composite material, manufacturing method of composite material and piston

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010258420A (en) * 2009-03-31 2010-11-11 Mitsubishi Materials Corp Substrate for power module with heat sink, power module, and method of manufacturing the substrate for power module with heat sink
WO2015141295A1 (en) * 2014-03-20 2015-09-24 三菱マテリアル株式会社 Bonded body, substrate for power modules, power module and method for producing bonded body
JP2015193526A (en) * 2014-03-20 2015-11-05 三菱マテリアル株式会社 Joined body, substrate for power module, power module, and method for producing joined body
CN105829266A (en) * 2014-03-20 2016-08-03 三菱综合材料株式会社 Bonded body, substrate for power modules, power module and method for producing bonded body
US9735085B2 (en) 2014-03-20 2017-08-15 Mitsubishi Materials Corporation Bonded body, power module substrate, power module and method for producing bonded body
CN114874024A (en) * 2022-06-22 2022-08-09 衡阳凯新特种材料科技有限公司 Composite material, manufacturing method of composite material and piston

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