JPH06171975A - Low melting point sealing composition - Google Patents
Low melting point sealing compositionInfo
- Publication number
- JPH06171975A JPH06171975A JP35312592A JP35312592A JPH06171975A JP H06171975 A JPH06171975 A JP H06171975A JP 35312592 A JP35312592 A JP 35312592A JP 35312592 A JP35312592 A JP 35312592A JP H06171975 A JPH06171975 A JP H06171975A
- Authority
- JP
- Japan
- Prior art keywords
- melting point
- glass
- low melting
- powder
- sealing composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
- C03C8/24—Fusion seal compositions being frit compositions having non-frit additions, i.e. for use as seals between dissimilar materials, e.g. glass and metal; Glass solders
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Glass Compositions (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、低融点封着組成物に関
し、より具体的には、半導体集積回路、水晶振動子等の
熱に弱い素子を搭載したセラミックパッケージや金属パ
ッケージを気密封着するのに好適な低融点封着組成物に
関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a low melting point sealing composition, and more specifically, to a hermetically sealing ceramic package or metal package having a heat-sensitive element such as a semiconductor integrated circuit or a crystal unit mounted thereon. The present invention relates to a low melting point sealing composition suitable for
【0002】[0002]
【従来の技術】従来より半導体集積回路や水晶振動子等
の素子を搭載した高信頼性のパッケージの気密封着に
は、ガラス粉末を用いた低融点封着組成物が使用されて
いる。2. Description of the Related Art Conventionally, a low melting point sealing composition using glass powder has been used for hermetically sealing a highly reliable package on which elements such as a semiconductor integrated circuit and a crystal oscillator are mounted.
【0003】このような低融点封着組成物としては、P
bO−B2 O3 系ガラスに、チタン酸鉛やウイレマイト
等の低膨張の耐火性物質粉末を添加したものが広く知ら
れている。しかしながらこの系のガラスを用いた低融点
封着組成物は、400℃以下の温度で封着することが困
難であるため、集積度の高いLSIや特殊な水晶振動子
等の熱に極めて敏感な素子を搭載したパッケージの気密
封着を行う場合には、素子の特性が劣化する恐れがあ
る。As such a low melting point sealing composition, P
to bO-B 2 O 3 based glass, a material obtained by adding refractory material powder of a low expansion, such as lead titanate or willemite is widely known. However, since a low melting point sealing composition using this type of glass is difficult to seal at a temperature of 400 ° C. or less, it is extremely sensitive to heat such as highly integrated LSI and special crystal oscillators. When airtight sealing of a package having an element mounted thereon is performed, the characteristics of the element may be deteriorated.
【0004】近年、上記事情から、より低い温度で封着
することが可能な低融点封着組成物が各種提案されてい
る。例えば、特開昭63−315536号公報には、P
bO−B2 O3 −Tl2 O系ガラスを使用した低融点封
着組成物が示され、また特表昭63−502583号公
報には、PbO−V2 O5 −Bi2 O3 系ガラスを使用
した低融点封着組成物が示されている。In view of the above circumstances, various low-melting point sealing compositions capable of sealing at lower temperatures have been proposed in recent years. For example, in JP-A-63-315536, P
bO-B 2 O 3 -Tl low melting point sealing composition using 2 O-based glass is shown, also in the Kohyo Sho 63-502583 JP, PbO-V 2 O 5 -Bi 2 O 3 based glass A low melting point sealing composition using is shown.
【0005】[0005]
【発明が解決しようとする課題】しかしながら上記した
低融点封着組成物は、使用するガラスの転移点が低く、
400℃以下での封着が可能であるが、いずれも問題を
有している。即ち、特開昭63−315536号公報に
開示の封着組成物は、350℃で封着することが可能で
あるが、毒性の強いTl2 Oを多量に含有するため、製
造時や封着作業時に粉塵の飛散を防ぐ設備が必要であ
り、実用上の問題がある。However, the above low melting point sealing composition has a low transition point of the glass used,
Sealing at 400 ° C or lower is possible, but all have problems. That is, the sealing composition disclosed in JP-A-63-315536 can be sealed at 350 ° C., but since it contains a large amount of highly toxic Tl 2 O, it cannot be sealed during production or sealing. There is a problem in practical use because it requires equipment to prevent dust from scattering during work.
【0006】また特表昭63−502583号公報に開
示の封着組成物は、封着温度を330〜370℃程度ま
で低下させることが可能であるが、結晶化傾向が強く、
加熱すると結晶が析出して流動性が悪くなるため、低温
で封着するには、封着時に金属クリップ等によって相当
の荷重をかけなければならない。The sealing composition disclosed in Japanese Patent Publication No. 63-502583 can reduce the sealing temperature to about 330 to 370 ° C., but has a strong tendency to crystallize.
When heated, crystals precipitate and the flowability deteriorates. Therefore, in order to perform sealing at a low temperature, a considerable load must be applied with a metal clip or the like during sealing.
【0007】本発明の目的は、Tl等の有害物質を含有
せず、しかも荷重をかけることなく、330〜350℃
の低温でパッケージを気密封着することが可能な低融点
封着組成物を提供することである。The object of the present invention is to contain no harmful substances such as Tl, and without applying a load, at 330 to 350 ° C.
To provide a low melting point sealing composition capable of hermetically sealing a package at low temperature.
【0008】[0008]
【課題を解決するための手段】本発明者等は、上記目的
を達成すべく、数々の研究を重ねた結果、TeO2 −V
2 O5 −PbO−Ag2 O−Cs2 O−Sb2 O5 系ガ
ラスのガラス転移点が非常に低く、しかも結晶化傾向が
少なく、この系のガラスの各構成成分を所定の割合で含
有させることによって、350℃以下の封着温度を有す
る低融点封着組成物を得ることが可能であることを見い
だし、本発明として提案するものである。Means for Solving the Problems The inventors of the present invention have conducted a number of studies in order to achieve the above object, and as a result, TeO 2 -V
2 O 5 -PbO-Ag 2 O-Cs 2 O-Sb 2 O 5 glass has a very low glass transition point and a low crystallization tendency, and contains each constituent component of the glass of this system in a predetermined ratio. It has been found that it is possible to obtain a low melting point sealing composition having a sealing temperature of 350 ° C. or lower, and it is proposed as the present invention.
【0009】すなわち本発明の低融点封着組成物は、重
量百分率で、TeO2 15〜34%、V2 O5 15〜4
5%、PbO 5〜35%、Ag2 O 3〜40%、C
s2O 0.5〜10%、Sb2 O5 0.5〜10%の
組成を有するガラス粉末からなることを特徴とする。That is, the low melting point sealing composition of the present invention has a weight percentage of TeO 2 of 15 to 34% and V 2 O 5 of 15 to 4.
5%, PbO 5 to 35%, Ag 2 O 3 to 40%, C
It is characterized by comprising glass powder having a composition of s 2 O 0.5 to 10% and Sb 2 O 5 0.5 to 10%.
【0010】また本発明の他の態様の低融点封着組成物
は、上記ガラス粉末45〜90体積%と、耐火性物質粉
末10〜55体積%からなることを特徴とする。A low melting point sealing composition according to another aspect of the present invention is characterized by comprising 45 to 90% by volume of the above glass powder and 10 to 55% by volume of a refractory substance powder.
【0011】[0011]
【作用】本発明の低融点封着組成物において、ガラス粉
末の組成を上記のように限定した理由は、以下のとおり
である。The reason for limiting the composition of the glass powder in the low melting point sealing composition of the present invention as described above is as follows.
【0012】TeO2 は本発明のガラスの骨格を形成す
る成分であり、その含有量は15〜34%、好ましくは
20〜34%である。TeO2 が15%より少ない場合
は、ガラスが失透しやすいため、安定なガラスが得られ
ない。一方、34%より多い場合は、ガラスの熱膨張係
数が著しく大きくなり、熱膨張係数を低くするために低
膨張性の耐火性物質粉末を添加した場合、ガラス粉末と
耐火性物質粉末との熱膨張係数の差に起因して微小クラ
ックが発生しやすくなる。TeO 2 is a component forming the skeleton of the glass of the present invention, and its content is 15 to 34%, preferably 20 to 34%. When TeO 2 is less than 15%, the glass tends to devitrify, and stable glass cannot be obtained. On the other hand, when the content is more than 34%, the coefficient of thermal expansion of the glass becomes remarkably large. Microcracks are likely to occur due to the difference in expansion coefficient.
【0013】V2 O5 も本発明のガラスの骨格を形成す
る成分であり、その含有量は15〜45%、好ましくは
20〜35%である。V2 O5 がこの含有範囲をはずれ
る場合は、ガラスの結晶化傾向が著しくなり、良好な封
着ができなくなる。V 2 O 5 is also a component forming the skeleton of the glass of the present invention, and its content is 15 to 45%, preferably 20 to 35%. If the content of V 2 O 5 is out of this range, the glass tends to crystallize significantly and good sealing cannot be achieved.
【0014】PbOはガラスを低融点化する成分であ
り、その含有量は5〜35%、好ましくは15〜25%
である。PbOが5%より少ない場合は、封着時にガラ
スが結晶化を起こして流動し難くなる。一方、35%よ
り多い場合は、ガラスの粘度が高くなって、十分に流動
しない。PbO is a component that lowers the melting point of glass, and its content is 5 to 35%, preferably 15 to 25%.
Is. When PbO is less than 5%, the glass is crystallized at the time of sealing and it becomes difficult to flow. On the other hand, when it is more than 35%, the viscosity of the glass becomes high and the glass does not flow sufficiently.
【0015】Ag2 Oもガラスを低融点化する成分であ
り、その含有量は3〜40%、好ましくは4〜30%で
ある。Ag2 Oが3%より少ない場合は、ガラスの粘度
が高くなって、十分に流動しない。一方、40%より多
い場合は、ガラスの熱膨張係数が高くなりすぎる。Ag 2 O is also a component for lowering the melting point of glass, and its content is 3-40%, preferably 4-30%. If the content of Ag 2 O is less than 3%, the viscosity of the glass becomes high and the glass does not flow sufficiently. On the other hand, when it is more than 40%, the thermal expansion coefficient of the glass becomes too high.
【0016】Cs2 Oもガラスを低融点化する成分であ
り、その含有量は0.5〜10%、好ましくは1〜8%
である。Cs2 Oが0.5%より少ない場合はその効果
がなく、10%より多い場合は熱膨張係数が高くなり過
ぎるとともに、ガラスに発泡が生じる。Cs 2 O is also a component for lowering the melting point of glass, and its content is 0.5 to 10%, preferably 1 to 8%.
Is. When Cs 2 O is less than 0.5%, the effect is not obtained, and when it is more than 10%, the coefficient of thermal expansion becomes too high and the glass is foamed.
【0017】Sb2 O5 はガラスの失透を抑制する効果
があり、その含有量は0.5〜10%、好ましくは1〜
8%である。Sb2 O5 が0.5%より少ない場合はそ
の効果がなく、10%より多い場合は軟化点が高くなり
過ぎて好ましくない。Sb 2 O 5 has an effect of suppressing devitrification of glass, and the content thereof is 0.5 to 10%, preferably 1 to
8%. If Sb 2 O 5 is less than 0.5%, the effect is not obtained, and if it is more than 10%, the softening point becomes too high, which is not preferable.
【0018】尚、本発明においては、特性を損なわない
範囲で上記成分以外にもZnO、Bi2 O3 、Cu2
O、Nb2 O5 、Al2 O3 、SiO2 、B2 O3 、W
O3 、MoO3 、SrO、BaO、CeO2 の1者ある
いは2者以上を選択して、10%まで含有させることが
可能である。In the present invention, in addition to the above components, ZnO, Bi 2 O 3 and Cu 2 may be used as long as the characteristics are not impaired.
O, Nb 2 O 5 , Al 2 O 3 , SiO 2 , B 2 O 3 , W
It is possible to select one or more of O 3 , MoO 3 , SrO, BaO and CeO 2 and to add up to 10%.
【0019】また本発明においては、上記ガラス粉末に
耐火性物質粉末を混合することによって、熱膨張係数を
調節したり、機械的強度を向上させることができる。In the present invention, the thermal expansion coefficient can be adjusted and the mechanical strength can be improved by mixing the glass powder with the refractory substance powder.
【0020】この場合、ガラス粉末45〜90体積%
と、耐火性物質粉末10〜55体積%からなるように混
合するが、各粉末の混合割合をこのように限定した理由
は、以下のとおりである。In this case, 45 to 90% by volume of glass powder
The refractory substance powder is mixed so as to be 10 to 55% by volume. The reason for limiting the mixing ratio of each powder in this way is as follows.
【0021】すなわち耐火性物質粉末が10体積%より
も少ない場合は、低融点封着組成物の熱膨張係数を調整
したり、機械的強度を向上させるという効果が小さく、
また55体積%より多い場合は、低融点封着組成物の流
動性が著しく低下して気密性の高い封着が行えなくな
る。That is, when the refractory powder is less than 10% by volume, the effect of adjusting the thermal expansion coefficient of the low melting point sealing composition and improving the mechanical strength is small,
On the other hand, if it is more than 55% by volume, the fluidity of the low-melting point sealing composition is remarkably lowered, and sealing with high airtightness cannot be performed.
【0022】本発明の低融点封着組成物の熱膨張係数
を、ICパッケージとして使用されるアルミナパッケー
ジの熱膨張係数に合致させるためには、特に熱膨張係数
の低い耐火性物質粉末を添加する必要がある。この種の
耐火性物質粉末としては、本出願人の出願に係る特願昭
61−87542号、特願平1−86958号及び特願
平3−197136号に示すチタン酸鉛固溶体粉末が有
用であり、さらに通常のジルコン粉末、酸化すず粉末、
酸化ニオブ粉末、チタン酸鉛粉末、β−ユークリプタイ
ト粉末、コージェライト粉末等を併用することも可能で
ある。In order to match the coefficient of thermal expansion of the low melting point sealing composition of the present invention with the coefficient of thermal expansion of an alumina package used as an IC package, a refractory substance powder having a particularly low coefficient of thermal expansion is added. There is a need. As the refractory substance powder of this kind, the lead titanate solid solution powders shown in Japanese Patent Application Nos. 61-87542, 1-86958 and 3-197136, which are filed by the present applicant, are useful. Yes, normal zircon powder, tin oxide powder,
It is also possible to use niobium oxide powder, lead titanate powder, β-eucryptite powder, cordierite powder and the like together.
【0023】また本発明の低融点封着組成物をアルミナ
パッケージに比べて高い熱膨張係数を有する金属パッケ
ージに使用する場合、ガラス粉末に添加される耐火性物
質粉末には、特に熱膨張係数が低いことは要求されな
い。そのためこの場合は、通常のアルミナ粉末、ジルコ
ニア粉末、チタニア粉末、スピネル粉末、すず酸亜鉛粉
末等を使用することができる。When the low melting point sealing composition of the present invention is used in a metal package having a higher coefficient of thermal expansion than an alumina package, the refractory substance powder added to the glass powder has a particularly high coefficient of thermal expansion. Low is not required. Therefore, in this case, usual alumina powder, zirconia powder, titania powder, spinel powder, zinc stannate powder, etc. can be used.
【0024】[0024]
【実施例】以下、本発明の低融点封着組成物を実施例に
基づいて詳細に説明する。EXAMPLES The low melting point sealing composition of the present invention will be described in detail below with reference to examples.
【0025】表1は、ガラス粉末からなる本発明の低融
点封着組成物を示すものである。Table 1 shows the low melting point sealing composition of the present invention comprising glass powder.
【0026】[0026]
【表1】 [Table 1]
【0027】表1のガラス粉末(試料A〜F)は、以下
のように調製した。The glass powders in Table 1 (Samples A to F) were prepared as follows.
【0028】まず表1の組成になるように二酸化テル
ル、五酸化バナジウム、鉛丹、酸化銀、炭酸セシウム、
五酸化アンチモン、酸化ビスマス、五酸化ニオブ、アル
ミナ、酸化セリウムを調合し、混合した。次いでこれを
白金ルツボに入れ、電気炉で700℃、1時間の条件で
溶融し、薄板状に成形した後、ボールミルで粉砕し、2
50メッシュ(目開き63μm)の篩を通過させた。First, so as to have the composition shown in Table 1, tellurium dioxide, vanadium pentoxide, red lead, silver oxide, cesium carbonate,
Antimony pentoxide, bismuth oxide, niobium pentoxide, alumina and cerium oxide were prepared and mixed. Then, this was put in a platinum crucible, melted in an electric furnace at 700 ° C. for 1 hour, formed into a thin plate, and then pulverized with a ball mill to obtain 2
It was passed through a 50-mesh (opening 63 μm) sieve.
【0029】表1から明らかなように、いずれのガラス
粉末も転移点が214〜220℃と極めて低く、また結
晶は析出しておらず、良好な流動性を有していた。As is clear from Table 1, all the glass powders had a very low transition point of 214 to 220 ° C., and no crystals were precipitated, and they had good fluidity.
【0030】尚、流動性の判断は、ガラスの比重に相当
する重量の粉末試料を外径20mm、高さ約5mmのボ
タンに成形した後、350℃、10分間の条件で加熱
し、このときのボタンの直径が23mmを超えるものを
良とした。また結晶析出の有無は、流動性試験後のボタ
ン表面を顕微鏡で観察し、結晶が全く認められなかった
ものを良とした。The fluidity was judged by molding a powder sample having a weight corresponding to the specific gravity of glass into a button having an outer diameter of 20 mm and a height of about 5 mm, and then heating it at 350 ° C. for 10 minutes. A button having a diameter of more than 23 mm was considered good. Regarding the presence or absence of crystal precipitation, the button surface after the fluidity test was observed with a microscope and no crystal was observed at all, which was regarded as good.
【0031】また表2は、表1のガラス粉末A、C及び
Eに各種の耐火性物質粉末を混合してなる低融店封着組
成物の実施例(試料No.1〜6)を示すものである。Table 2 shows examples (Sample Nos. 1 to 6) of low melting point sealing compositions obtained by mixing the glass powders A, C and E of Table 1 with various refractory substance powders. It is a thing.
【0032】[0032]
【表2】 [Table 2]
【0033】表2から明らかなように、各試料の熱膨張
係数は65〜75×10-7/℃であり、アルミナセラミ
ックの熱膨張係数(70×10-7/℃)に近い熱膨張係
数を示した。As is clear from Table 2, the coefficient of thermal expansion of each sample is 65 to 75 × 10 −7 / ° C., which is close to the coefficient of thermal expansion of alumina ceramics (70 × 10 −7 / ° C.). showed that.
【0034】また各試料を、通常行われているようにビ
ークルを添加してペースト状にした後、アルミナセラミ
ック基板に印刷し、封着温度を測定したところ、いずれ
も330〜340℃の低温で、荷重をかけることなく封
着することができた。Each sample was made into a paste by adding a vehicle as usual, and then printed on an alumina ceramic substrate, and the sealing temperature was measured. All were at a low temperature of 330 to 340 ° C. It could be sealed without applying a load.
【0035】表2で使用した各耐火性物質粉末は、以下
のようにして作製したものである。The refractory substance powders used in Table 2 are produced as follows.
【0036】Pb0.75Ca0.25TiO3 は、リサージ、
炭酸カルシウム、酸化チタンを重量百分率で、PbO6
4%、CaO5%、TiO2 31%になるように調合
し、乾式混合した後、1170℃で5時間焼成し、次い
で粉砕して350メッシュ(目開き45μm)の篩を通
過させた。Pb 0.75 Ca 0.25 TiO 3 is a litharge,
Calcium carbonate and titanium oxide in PbO6 by weight percentage
4%, CaO 5%, and TiO 2 31% were mixed, dry-mixed, fired at 1170 ° C. for 5 hours, then pulverized and passed through a 350-mesh sieve (opening 45 μm).
【0037】Pb0.90Ca0.10Fe0.15Nb0.15Ti
0.70O3 は、リサージ、酸化チタン、酸化第二鉄、五酸
化ニオブ、炭酸カルシウムを重量百分率で、PbO 6
8.2%、CaO 1.9%、Fe2 O3 4.1%、
Nb2 O5 6.8%、TiO2 19.0%になるよう
に調合し、乾式混合した後、1250℃で5時間焼成
し、次いで粉砕して350メッシュ(目開き45μm)
の篩を通過させた。Pb 0.90 Ca 0.10 Fe 0.15 Nb 0.15 Ti
0.70 O 3 is litharge, titanium oxide, ferric oxide, niobium pentoxide, calcium carbonate in a weight percentage, and PbO 6
8.2%, CaO 1.9%, Fe 2 O 3 4.1%,
Nb 2 O 5 6.8% and TiO 2 19.0% were mixed, dry-mixed, baked at 1250 ° C. for 5 hours, and then pulverized to 350 mesh (opening 45 μm).
Through the sieve.
【0038】SnO2 は、酸化第二錫と、焼結助剤とし
ての亜鉛華を、重量百分率で、SnO2 99%、ZnO
1%になるように調合、乾式混合し、1480℃で16
時間焼成後、粉砕し、350メッシュの篩を通過させ
た。SnO 2 is composed of stannic oxide and zinc white as a sintering aid, in terms of weight percentage, SnO 2 99%, ZnO 2.
Formulated to 1%, dry-mixed, 16 at 1480 ° C
After firing for an hour, it was crushed and passed through a 350 mesh screen.
【0039】Nb2 O5 は、五酸化ニオブ試薬を135
0℃で5時間焼成した後、粉砕し、次いで350メッシ
ュの篩を通過させた。Nb 2 O 5 is a niobium pentoxide reagent.
After firing at 0 ° C. for 5 hours, it was ground and then passed through a 350 mesh screen.
【0040】尚、各表における転移点と熱膨張係数は、
ディラトメーターによって測定された熱膨張曲線から求
めた。The transition point and the coefficient of thermal expansion in each table are
It was determined from the thermal expansion curve measured by a dilatometer.
【0041】[0041]
【発明の効果】以上のように本発明の低融点封着組成物
は、有害物質を含有せず、しかも荷重をかけることな
く、350℃以下の低温でパッケージを気密封着するこ
とが可能であるため、特にLSIや特殊な水晶振動子等
の熱に極めて弱い素子を搭載したセラミックパッケージ
や金属パッケージを気密封着するのに好適である。INDUSTRIAL APPLICABILITY As described above, the low melting point sealing composition of the present invention can be hermetically sealed at a low temperature of 350 ° C. or lower without containing a harmful substance and without applying a load. Therefore, it is particularly suitable for hermetically sealing a ceramic package or a metal package on which an extremely weak element such as an LSI or a special crystal oscillator is mounted.
Claims (2)
V2 O5 15〜45%、PbO 5〜35%、Ag2 O
3〜40%、Cs2 O 0.5〜10%、Sb2 O5
0.5〜10%の組成を有するガラス粉末からなること
を特徴とする低融点封着組成物。1. TeO 2 15-34% by weight,
V 2 O 5 15~45%, PbO 5~35%, Ag 2 O
3~40%, Cs 2 O 0.5~10% , Sb 2 O 5
A low melting point sealing composition comprising glass powder having a composition of 0.5 to 10%.
V2 O5 15〜45%、PbO 5〜35%、Ag2 O
3〜40%、Cs2 O 0.5〜10%、Sb2 O5
0.5〜10%の組成を有するガラス粉末45〜90体
積%と、耐火性物質粉末10〜55体積%からなること
を特徴とする低融点封着組成物。2. TeO 2 15-34% by weight percentage,
V 2 O 5 15~45%, PbO 5~35%, Ag 2 O
3~40%, Cs 2 O 0.5~10% , Sb 2 O 5
A low melting point sealing composition comprising 45 to 90% by volume of glass powder having a composition of 0.5 to 10% and 10 to 55% by volume of refractory material powder.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP35312592A JPH06171975A (en) | 1992-12-11 | 1992-12-11 | Low melting point sealing composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP35312592A JPH06171975A (en) | 1992-12-11 | 1992-12-11 | Low melting point sealing composition |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH06171975A true JPH06171975A (en) | 1994-06-21 |
Family
ID=18428739
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP35312592A Pending JPH06171975A (en) | 1992-12-11 | 1992-12-11 | Low melting point sealing composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH06171975A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012096993A (en) * | 2012-02-07 | 2012-05-24 | Hitachi Ltd | Bonding glass and flat panel display device using the same |
JP2014156369A (en) * | 2013-02-15 | 2014-08-28 | Hitachi Ltd | Glass and manufacturing method thereof |
JP2016050136A (en) * | 2014-08-29 | 2016-04-11 | 日立化成株式会社 | Lead-free low-melting point glass composition and low-temperature sealing glass frit, low-temperature sealing glass paste, conductive material and conductive glass paste containing the same, and glass-sealed component and electric and electronic component using them |
JP2016050135A (en) * | 2014-08-29 | 2016-04-11 | 日立化成株式会社 | Lead-free low-melting point glass composition and low-temperature sealing glass frit, low-temperature sealing glass paste, conductive material and conductive glass paste containing the same, and glass-sealed component and electric and electronic component using them |
-
1992
- 1992-12-11 JP JP35312592A patent/JPH06171975A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012096993A (en) * | 2012-02-07 | 2012-05-24 | Hitachi Ltd | Bonding glass and flat panel display device using the same |
JP2014156369A (en) * | 2013-02-15 | 2014-08-28 | Hitachi Ltd | Glass and manufacturing method thereof |
JP2016050136A (en) * | 2014-08-29 | 2016-04-11 | 日立化成株式会社 | Lead-free low-melting point glass composition and low-temperature sealing glass frit, low-temperature sealing glass paste, conductive material and conductive glass paste containing the same, and glass-sealed component and electric and electronic component using them |
JP2016050135A (en) * | 2014-08-29 | 2016-04-11 | 日立化成株式会社 | Lead-free low-melting point glass composition and low-temperature sealing glass frit, low-temperature sealing glass paste, conductive material and conductive glass paste containing the same, and glass-sealed component and electric and electronic component using them |
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